JP2015160182A - Sublimation refining apparatus and sublimation refining method - Google Patents

Sublimation refining apparatus and sublimation refining method Download PDF

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JP2015160182A
JP2015160182A JP2014037867A JP2014037867A JP2015160182A JP 2015160182 A JP2015160182 A JP 2015160182A JP 2014037867 A JP2014037867 A JP 2014037867A JP 2014037867 A JP2014037867 A JP 2014037867A JP 2015160182 A JP2015160182 A JP 2015160182A
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sublimation purification
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真司 吉田
Shinji Yoshida
真司 吉田
和裕 丹羽
Kazuhiro Niwa
和裕 丹羽
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Panasonic Intellectual Property Management Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To prevent the discharge of a valuable specimen to the outside of a system.SOLUTION: A sublimation refining apparatus 1 condensing a sublimed substance 14 to be treated includes: a discharge amount measurement means 12 detecting the substance 14 to be treated being discharged to the subsequent stage of a sublimation purification tube 2 from the sublimation purification tube 2; and an inert gas introduction amount adjustment means 6 introducing the inert gas to the sublimation purification tube 2 of the front stage of the sublimation purification tube 2. The inert gas is introduced when detecting the discharge of the substance 14 to be treated and the substance 14 to be treated is not discharged from the sublimation purification tube 2 by lowering the temperatures of heating means 4a, 4b, 4c and 4d.

Description

本発明は、昇華性を有する有機化合物などを被処理物質として含有する混合物から昇華温度の違いを利用して、被処理物質を精製、分離する昇華精製装置および昇華精製方法に関するものである。   The present invention relates to a sublimation purification apparatus and a sublimation purification method for purifying and separating a substance to be treated using a difference in sublimation temperature from a mixture containing a sublimable organic compound as a substance to be treated.

従来の昇華精製装置として、有機化合物の粉末を昇華した後に昇華精製管の内部で凝結させることで昇華精製を行う昇華精製装置が知られている(例えば特許文献1参照)。
以下、その昇華精製装置について図3を参照しながら説明する。
As a conventional sublimation purification apparatus, there is known a sublimation purification apparatus that performs sublimation purification by sublimating an organic compound powder and then condensing it inside a sublimation purification tube (see, for example, Patent Document 1).
Hereinafter, the sublimation purification apparatus will be described with reference to FIG.

図3に示すように、昇華精製装置101は昇華精製管102と昇華精製管(内管)102aと減圧手段103と加熱手段104a、加熱手段104b、加熱手段104cとフランジ105a、フランジ105bからなる。   As shown in FIG. 3, the sublimation purification apparatus 101 includes a sublimation purification pipe 102, a sublimation purification pipe (inner pipe) 102a, a decompression means 103, a heating means 104a, a heating means 104b, a heating means 104c, a flange 105a, and a flange 105b.

昇華精製管102は長手方向一ヶ所以上に開口部を有する円筒形状をしている。昇華精製管(内管)102aは長手方向一ヶ所以上に開口部を有する円筒形状をしており、昇華精製管102内に1個以上設置されている。加熱手段104a、加熱手段104b、加熱手段104cは中心に開口部を有するドーナツ形状をしており、昇華精製管102の外周部を円周方向に対して連続的に覆い、昇華精製管102に密着するように配置されている。
昇華精製管102の長手方向一ヶ所以上の開口部は、フランジ105a、フランジ105bが固定されており、フランジ105bは流出口106を備えている。途中の配管は省略しているが、フランジ105bの流出口106は減圧手段103と接続されている。昇華精製管102の内部には被処理物質加熱容器107が設置され、被処理物質加熱容器107には被処理物質108が充填されている。
The sublimation purification tube 102 has a cylindrical shape having openings at one or more locations in the longitudinal direction. The sublimation purification tube (inner tube) 102 a has a cylindrical shape having openings at one or more locations in the longitudinal direction, and one or more sublimation purification tubes 102 are installed in the sublimation purification tube 102. The heating means 104a, the heating means 104b, and the heating means 104c have a donut shape having an opening at the center, and continuously cover the outer periphery of the sublimation purification tube 102 in the circumferential direction, and are in close contact with the sublimation purification tube 102 Are arranged to be.
A flange 105 a and a flange 105 b are fixed to one or more openings in the longitudinal direction of the sublimation purification pipe 102, and the flange 105 b includes an outlet 106. Although piping in the middle is omitted, the outlet 106 of the flange 105 b is connected to the decompression means 103. A to-be-treated substance heating container 107 is installed inside the sublimation purification tube 102, and the to-be-treated substance heating container 107 is filled with the to-be-treated substance 108.

加熱手段104a、加熱手段104b、加熱手段104cはそれぞれ電熱線109を内蔵している。減圧手段103により昇華精製管102、昇華精製管(内管)102aの内部を減圧し、加熱手段104aの電熱線109に通電し加熱手段104aの温度を被処理物質108の昇華温度以上に加熱すると、被処理物質加熱容器107が加熱されるので被処理物質108が昇華する。   The heating means 104a, the heating means 104b, and the heating means 104c each include a heating wire 109. When the pressure inside the sublimation purification tube 102 and the sublimation purification tube (inner tube) 102a is reduced by the pressure reduction means 103, the heating wire 104 of the heating means 104a is energized and the temperature of the heating means 104a is heated above the sublimation temperature of the substance 108 to be treated. Since the target substance heating container 107 is heated, the target substance 108 is sublimated.

この際、昇華温度は減圧の程度に依存しており、減圧の度合いが大きいほど、昇華温度は低下する。加えて、減圧の程度と昇華された材料において平均自由行程という考え方の下、減圧の程度が大きいほど、昇華された材料は移動を阻害されるものが少なくなるため、他の昇華された材料と衝突することなく移動する距離(平均自由行程)は長くなる。反対に減圧の程度が小さいと、他の昇華された材料と衝突しやすくなるため、平均自由行程は短くなる。   At this time, the sublimation temperature depends on the degree of decompression, and the greater the degree of decompression, the lower the sublimation temperature. In addition, based on the idea of the degree of decompression and the mean free path in the sublimated material, the greater the degree of decompression, the less the sublimated material is impeded by movement, so other sublimated materials The distance traveled without collision (mean free path) becomes longer. On the other hand, if the degree of decompression is small, the mean free path is shortened because it easily collides with other sublimated materials.

加熱手段104cにおいては被処理物質108の昇華温度よりもわずかに低い温度で加熱手段104cを加熱する。その結果、昇華精製管(内管)102aの内壁面温度は被処理物質108の昇華温度よりも低い温度で加熱されている。   In the heating unit 104 c, the heating unit 104 c is heated at a temperature slightly lower than the sublimation temperature of the target material 108. As a result, the inner wall surface temperature of the sublimation purification tube (inner tube) 102a is heated at a temperature lower than the sublimation temperature of the material 108 to be treated.

被処理物質加熱容器107で昇華された被処理物質108は昇華精製管(内管)102aの内部を拡散し、昇華精製管(内管)102aの内壁面の温度が被処理物質108の凝結すべき場所、例えば昇華温度すなわち凝結温度よりも低い場所で昇華精製管(内管)102aの内壁面に接触した場合は凝結するが、接触しない場合はそのまま排出される。   The to-be-treated substance 108 sublimated in the to-be-treated substance heating container 107 diffuses in the sublimation purification pipe (inner pipe) 102a, and the temperature of the inner wall surface of the sublimation purification pipe (inner pipe) 102a condenses the to-be-treated substance 108. If it contacts the inner wall surface of the sublimation purification tube (inner tube) 102a at a place where it should be, for example, a temperature lower than the sublimation temperature, that is, the condensation temperature, it condenses, but if it does not contact, it is discharged as it is.

この従来の昇華精製装置においては、先に示したように、加熱手段104cの内側の昇華精製管(内管)102aの内壁面が被処理物質108の昇華温度よりも低いので、凝結している成分を昇華精製物質110として回収することができる。   In this conventional sublimation purification apparatus, as shown above, the inner wall surface of the sublimation purification pipe (inner pipe) 102a inside the heating means 104c is lower than the sublimation temperature of the substance to be treated 108, so that it is condensed. The components can be recovered as sublimation purified material 110.

一般に有機化合物は熱に弱いために、減圧の程度を大きくして昇華温度を低下させることで、有機化合物に与える熱を抑制している。そのため、平均自由行程は長くなっている。   In general, since organic compounds are vulnerable to heat, the degree of reduced pressure is increased to lower the sublimation temperature, thereby suppressing the heat applied to the organic compounds. Therefore, the mean free path is long.

特開2007−246424号公報JP 2007-246424 A

このような従来の昇華精製装置においては、高価で少量な未知試料、新規開発試料の昇華精製時に温度設定の不適合により昇華精製管外へ被処理物質を排出してしまう課題があった。   In such a conventional sublimation purification apparatus, there has been a problem that the substance to be treated is discharged out of the sublimation purification tube due to incompatibility of temperature setting during sublimation purification of an expensive and small amount of unknown sample or newly developed sample.

そこで本発明は、上記従来の課題を解決するものであり、被処理物質の排出を抑制する昇華精製装置を提供することを目的とする。   The present invention solves the above-described conventional problems, and an object of the present invention is to provide a sublimation purification apparatus that suppresses the discharge of a substance to be treated.

そして、この目的を達成するために、本発明は、少なくとも一ヶ所の開口部を有する昇華精製管と、この昇華精製管に昇華精製管を加熱する加熱手段と内部を減圧する減圧手段を備え、昇華精製管の内部には被処理物質を充填する被処理物質加熱容器を備え、前記加熱手段によって前記昇華精製管と前記被処理物質加熱容器を加熱することで、被処理物質加熱容器内の前記被処理物質を昇華させ、昇華させた前記被処理物質を前記昇華精製管に凝結させる昇華精製装置であって、前記昇華精製管後段に前記昇華精製管から排出される被処理物質を検出する排出量測定手段と、前記昇華精製管前段に前記昇華精製管へ不活性ガスを導入する不活性ガス導入量調整手段を設け、前記被処理物質の排出を検知した場合に不活性ガスを導入するとともに、前記加熱手段の温度を低下させることで、前記昇華精製管から被処理物質を排出させないようにする昇華精製装置とすることで、所期の目的を達成するものである。   In order to achieve this object, the present invention comprises a sublimation purification tube having at least one opening, a heating unit for heating the sublimation purification tube to the sublimation purification tube, and a decompression unit for reducing the pressure inside. A sublimation purification tube is provided with a target substance heating container filled with a target substance, and the sublimation purification pipe and the target substance heating container are heated by the heating means, whereby the submerged purification pipe is heated in the target substance heating container. A sublimation purification apparatus that sublimates a substance to be treated and condenses the sublimated substance to be treated on the sublimation purification pipe, and detects the substance to be treated discharged from the sublimation purification pipe downstream of the sublimation purification pipe. And an inert gas introduction amount adjusting means for introducing an inert gas into the sublimation purification pipe before the sublimation purification pipe, and introducing the inert gas when the discharge of the substance to be treated is detected. , By lowering the temperature of the heating means, by a sublimation purification apparatus from the sublimation purification tube so as not to discharge the substance to be treated, it is to achieve the intended purpose.

本発明によれば、昇華精製装置において、少なくとも一ヶ所の開口部を有する昇華精製管と、この昇華精製管に昇華精製管を加熱する加熱手段と内部を減圧する減圧手段を備え、
昇華精製管の内部には被処理物質を充填する被処理物質加熱容器を備え、前記加熱手段によって前記昇華精製管と前記被処理物質加熱容器を加熱することで、被処理物質加熱容器内の前記被処理物質を昇華させ、昇華させた前記被処理物質を前記昇華精製管に凝結させる昇華精製装置であって、前記昇華精製管後段に前記昇華精製管から排出される被処理物質を検出する排出量測定手段と、前記昇華精製管前段に前記昇華精製管へ不活性ガスを導入する不活性ガス導入量調整手段を設け、前記被処理物質の排出を検知した場合に不活性ガスを導入するとともに、前記加熱手段の温度を低下させることで、前記昇華精製管から被処理物質を排出させないようにする昇華精製装置とすることで、高価で少量の被処理物質を排出させないという効果を得ることができる。
According to the present invention, the sublimation purification apparatus includes a sublimation purification tube having at least one opening, a heating unit for heating the sublimation purification tube to the sublimation purification tube, and a pressure reduction unit for reducing the pressure inside.
A sublimation purification tube is provided with a target substance heating container filled with a target substance, and the sublimation purification pipe and the target substance heating container are heated by the heating means, whereby the submerged purification pipe is heated in the target substance heating container. A sublimation purification apparatus that sublimates a substance to be treated and condenses the sublimated substance to be treated on the sublimation purification pipe, and detects the substance to be treated discharged from the sublimation purification pipe downstream of the sublimation purification pipe. And an inert gas introduction amount adjusting means for introducing an inert gas into the sublimation purification pipe before the sublimation purification pipe, and introducing the inert gas when the discharge of the substance to be treated is detected. The sublimation purification apparatus prevents the treated substance from being discharged from the sublimation purification tube by lowering the temperature of the heating means, thereby preventing an expensive and small amount of the treated substance from being discharged. It is possible to obtain.

本発明の実施の形態1の昇華精製装置の概略断面図Schematic sectional view of the sublimation purification apparatus of Embodiment 1 of the present invention 本発明の実施の形態1の制御手段の信号処理を示す図The figure which shows the signal processing of the control means of Embodiment 1 of this invention 従来の昇華精製装置の概略断面図Schematic sectional view of a conventional sublimation purification device

本発明の請求項1記載の昇華精製装置は、少なくとも一ヶ所の開口部を有する昇華精製管と、この昇華精製管に昇華精製管を加熱する加熱手段と内部を減圧する減圧手段を備え、昇華精製管の内部には被処理物質を充填する被処理物質加熱容器を備え、前記加熱手段によって前記昇華精製管と前記被処理物質加熱容器を加熱することで、被処理物質加熱容器内の前記被処理物質を昇華させ、昇華させた前記被処理物質を前記昇華精製管に凝結させる昇華精製装置であって、前記昇華精製管後段に前記昇華精製管から排出される被処理物質を検出する排出量測定手段と、前記昇華精製管前段に前記昇華精製管へ不活性ガスを導入する不活性ガス導入量調整手段を設け、前記被処理物質の排出を検知した場合に不活性ガスを導入するとともに、前記加熱手段の温度を低下させることで、前記昇華精製管から被処理物質を排出させないようにしたものである。   The sublimation purification apparatus according to claim 1 of the present invention includes a sublimation purification tube having at least one opening, a heating unit for heating the sublimation purification tube, and a decompression unit for reducing the pressure inside the sublimation purification tube. An inside of the purification tube is provided with a to-be-treated substance heating container filled with the to-be-treated substance, and the sublimation purification pipe and the to-be-treated substance heating container are heated by the heating means, whereby the to-be-treated substance in the to-be-treated substance heating container is heated. A sublimation purification apparatus for sublimating a processing substance and condensing the sublimated purification target substance on the sublimation purification pipe, wherein a discharge amount for detecting the treatment substance discharged from the sublimation purification pipe at a subsequent stage of the sublimation purification pipe A measuring means and an inert gas introduction amount adjusting means for introducing an inert gas into the sublimation purification pipe before the sublimation purification pipe, and introducing the inert gas when the discharge of the substance to be treated is detected; Previous By lowering the temperature of the heating means, in which from the sublimation purification tube so as not to discharge the substance to be treated.

これにより、高価で少量の被処理物質が昇華精製管外に排出された際に、その排出量を検知し、排出量に応じて不活性ガスを導入し減圧の程度を小さくし、被処理物質の昇華を抑制し、昇華した被処理物質の平均自由行程を短くすることで昇華精製管内に保持させ、加熱手段の温度を低下させることで内壁面に付着させることで、昇華精製管外に排出させるのを抑制することができるという効果を奏する。   As a result, when an expensive and small amount of material to be treated is discharged out of the sublimation purification tube, the amount of discharge is detected, an inert gas is introduced according to the amount of discharge, and the degree of decompression is reduced. The sublimation is suppressed, the average free path of the sublimated material is shortened and held in the sublimation purification tube, and the temperature of the heating means is lowered to adhere to the inner wall surface. There is an effect that it can be suppressed.

また、請求項2記載の昇華精製方法は、昇華精製管の内部で被処理物質を加熱することにより昇華させ、昇華した前記被処理物質を凝結させる昇華精製方法であって、前記昇華精製管から排出される被処理物質を検出する排出量測定手段と、前記昇華精製管へ不活性ガスを導入する不活性ガス導入量調整手段を設け、前記被処理物質の排出を検知した場合に不活性ガスを導入するとともに、前記加熱手段の温度を低下させるものである。   Further, the sublimation purification method according to claim 2 is a sublimation purification method in which a material to be treated is sublimated by heating inside the sublimation purification tube, and the sublimated purification material is condensed. Discharge amount measuring means for detecting discharged substance to be processed and inert gas introduction amount adjusting means for introducing inert gas into the sublimation purification pipe are provided, and when the discharge of the to-be-treated substance is detected, the inert gas Is introduced, and the temperature of the heating means is lowered.

これにより、高価で少量の被処理物質が昇華精製管外に排出された際に、その排出量を検知し、排出量に応じて不活性ガスを導入し減圧の程度を小さくし、被処理物質の昇華を抑制し、昇華した被処理物質の平均自由行程を短くすることで管内に保持させ、加熱手段の温度を低下させることで、内壁面に付着させることで、昇華精製管外に排出させるのを抑制することができるという効果を奏する。   As a result, when an expensive and small amount of material to be treated is discharged out of the sublimation purification tube, the amount of discharge is detected, an inert gas is introduced according to the amount of discharge, and the degree of decompression is reduced. The sublimation is suppressed, the average free path of the sublimated material is shortened and held in the tube, and the temperature of the heating means is lowered, and it adheres to the inner wall surface and is discharged out of the sublimation purification tube. There is an effect that can be suppressed.

下、本発明の実施の形態について、図面を参照しながら説明する。   Embodiments of the present invention will be described below with reference to the drawings.

(実施の形態1)
1に実施の形態1の昇華精製装置の概略断面図を示す。
(Embodiment 1)
FIG. 1 shows a schematic cross-sectional view of the sublimation purification apparatus of the first embodiment.

昇華精製装置1の構成要素を下記に示す。   The components of the sublimation purification apparatus 1 are shown below.

端に開口部を有する円筒状の昇華精製管2が同じく両端に開口部を有する円筒状の昇華精製管外管3の内部に備えられている。   A cylindrical sublimation purification tube 2 having openings at the ends is also provided inside a cylindrical sublimation purification tube outer tube 3 having openings at both ends.

加熱手段4a、4b、4c、4dが昇華精製管外管3の外部に備えられている。   Heating means 4 a, 4 b, 4 c, 4 d are provided outside the sublimation purification outer tube 3.

加熱手段4a、4b、4c、4dはニクロム線等の電熱線を発熱体とするヒータである。   The heating means 4a, 4b, 4c and 4d are heaters using heating wires such as nichrome wires as heating elements.

昇華精製管外管3の後段に配管部材18がフランジ部9、Oリング10およびクランプ11によって気密状態で接合されており、通じている。   The piping member 18 is joined to the rear stage of the sublimation purification outer pipe 3 in an airtight state by the flange portion 9, the O-ring 10 and the clamp 11, and communicates therewith.

配管部材18は途中を省略した配管を介して減圧手段5と気密状態で接合されている。   The piping member 18 is joined to the decompression means 5 in an airtight manner through a piping that is omitted midway.

排出量測定手段12は気密性を阻害しないようにフランジ部を介し、配管部材18内に設けられている。   The discharge amount measuring means 12 is provided in the piping member 18 through a flange portion so as not to disturb the airtightness.

昇華精製管2の内部に被処理物質加熱容器8が備えられている。   A substance heating container 8 is provided inside the sublimation purification tube 2.

昇華精製管外管3の前段の不活性ガス導入配管7は不活性ガス導入量調整手段6と接続されており、ガスボンベ13から不活性ガスが供給されるので、昇華精製管2、配管部材18内部の気密状態を維持したまま、不活性ガスを供給することができるものである。   The inert gas introduction pipe 7 in the previous stage of the sublimation purification pipe outer pipe 3 is connected to the inert gas introduction amount adjusting means 6, and the inert gas is supplied from the gas cylinder 13. An inert gas can be supplied while maintaining an internal airtight state.

制御ユニット16が排出量測定手段12と不活性ガス導入量調整手段6と加熱手段4a、4b、4c、4dと電気的に接続されており、制御ユニット16は、テンキーとしてのしきい値入力手段と内部メモリーであるしきい値記憶手段と信号処理装置である判定手段を備えている。   A control unit 16 is electrically connected to the discharge amount measuring means 12, the inert gas introduction amount adjusting means 6, and the heating means 4a, 4b, 4c, 4d. The control unit 16 is a threshold value input means as a numeric keypad. And a threshold value storage means which is an internal memory and a determination means which is a signal processing device.

被処理物質加熱容器8には被処理物質14が充填されている。被処理物質14はトリス(8−キノリノラト)アルミニウムなどの有機ELに用いる有機色素や、ペンタセンなどの有機半導体である。   The substance to be treated heating container 8 is filled with a substance to be treated 14. The to-be-processed substance 14 is an organic pigment | dye used for organic EL, such as tris (8- quinolinolato) aluminum, and organic semiconductors, such as a pentacene.

昇華精製管2と昇華精製管外管3は、加熱手段4a、4b、4c、4dの加熱に耐えることができ、昇華精製物質15に対して不活性な素材である、貴金属類、フッ素やポリイミドなどの樹脂、アルミナなどのセラミック、石英などのガラスが使用される。   The sublimation purification tube 2 and the sublimation purification tube outer tube 3 can withstand the heating of the heating means 4a, 4b, 4c, and 4d, and are inert to the sublimation purification material 15, such as noble metals, fluorine, and polyimide. A resin such as alumina, a ceramic such as alumina, or a glass such as quartz is used.

ガスボンベ13内の不活性ガスは、窒素やアルゴンが用いられる。   Nitrogen or argon is used as the inert gas in the gas cylinder 13.

排出量測定手段12については、水晶振動子を用いた膜厚計や、レーザーなどの発光手段を利用した分光法を用いた手段や、質量分析を用いる手段などが使用される。   As the discharge amount measuring means 12, a film thickness meter using a crystal resonator, a means using a spectroscopic method using a light emitting means such as a laser, a means using mass spectrometry, or the like is used.

記構成において、減圧手段5により昇華精製管2、昇華精製管外管3、配管部材18の内部を減圧し、加熱手段4aの電熱線に通電し加熱手段4aの温度を被処理物質14の昇華温度より高温に加熱すると被処理物質加熱容器8が加熱されるので被処理物質14が昇華する。   In the above configuration, the pressure reducing means 5 depressurizes the sublimation purification pipe 2, the sublimation purification pipe outer pipe 3, and the piping member 18, and energizes the heating wire of the heating means 4a to sublimate the temperature of the heating means 4a. When heated to a temperature higher than the temperature, the material heating container 8 is heated, so that the material to be processed 14 is sublimated.

被処理物質加熱容器8で昇華された被処理物質14は昇華精製管2、昇華精製管外管3内部を拡散する。加熱手段4aによって加熱されている昇華精製管2の領域は、被処理物質14の昇華温度より高温であるので、凝結することなく接触、反射し拡散を続ける。   The substance to be treated 14 sublimated in the substance to be treated heating container 8 diffuses inside the sublimation purification pipe 2 and the sublimation purification pipe outer pipe 3. Since the region of the sublimation purification tube 2 heated by the heating means 4a is higher than the sublimation temperature of the substance 14 to be treated, it continues to contact, reflect and diffuse without condensing.

散した被処理物質14は被処理物質14の凝結すべき場所、例えば加熱手段4dによって昇華温度すなわち凝結温度以下に加熱されている領域に接触した際に凝結する。   The scattered material to be treated 14 condenses when it comes into contact with a place where the material to be treated 14 is to condense, for example, a region heated to a sublimation temperature or a condensing temperature by the heating means 4d.

だし、被処理物質14が新規試料など、材料特性が把握されておらず、加熱手段4b、4c、4dが凝結する昇華温度すなわち凝結温度に適切に設定されていない場合は、昇華精製管2に凝結することなく、昇華精製管2外へ排出され、排出物質17として排出量測定手段12にて検知される。   However, when the material properties of the substance 14 to be treated are not known, such as a new sample, and the heating means 4b, 4c, and 4d are not appropriately set to the sublimation temperature at which the heating means 4b, 4c, and 4d condense, that is, the condensation temperature is not set. Without condensing, it is discharged out of the sublimation purification pipe 2 and detected as the discharged substance 17 by the discharge amount measuring means 12.

知された値は、制御ユニット16によって判定され、しきい値を超えた場合は不活性ガス導入量調整手段6を介して不活性ガスを導入するとともに、加熱手段4a、4b、4c、4dの温度を低下させる。   The known value is determined by the control unit 16, and when the threshold value is exceeded, the inert gas is introduced through the inert gas introduction amount adjusting means 6, and the heating means 4a, 4b, 4c, 4d Reduce temperature.

活性ガスが導入されることで、昇華精製管2、昇華精製管外管3内部の圧力を上昇させることで、被処理物質14の昇華を抑制し、昇華した被処理物質14の平均自由行程を短くすることで、被処理物質14が不活性ガス分子などと接触、反射、屈折することで、昇華精製管2に接触する確率が上昇し、排出量を抑制させる。加えて加熱手段4a、4b、4c、4dの温度を低下させることで、昇華精製管2へ被処理物質14が凝結する。   By introducing the active gas, by increasing the pressure inside the sublimation purification pipe 2 and the sublimation purification pipe outer pipe 3, the sublimation of the substance to be treated 14 is suppressed, and the average free path of the sublimated substance 14 to be treated is reduced. By shortening, the probability that the to-be-processed substance 14 will contact, reflect, and refract an inert gas molecule etc. will raise the probability of contacting the sublimation purification pipe | tube 2, and will suppress discharge | emission amount. In addition, the to-be-processed substance 14 condenses to the sublimation purification pipe | tube 2 by reducing the temperature of heating means 4a, 4b, 4c, 4d.

制御ユニット16の動作について、図2を用いて説明する。制御ユニット16にはしきい値設定手段としきい値記憶手段と排出量変化演算手段と判定手段が備えられている。制御ユニット16は、排出量測定手段12からの信号により、排出量変化を演算する。昇華精製装置1を運転する前に設定したしきい値を、しきい値記憶手段に記憶しているので、判定手段により、しきい値と排出量変化を比較する。判定結果に基づいて、不活性ガス導入量調整手段6と加熱手段4a、4b、4c、4dを運転する。   The operation of the control unit 16 will be described with reference to FIG. The control unit 16 is provided with threshold value setting means, threshold value storage means, discharge amount change calculation means, and determination means. The control unit 16 calculates the discharge amount change based on the signal from the discharge amount measuring means 12. Since the threshold value set before operating the sublimation purification apparatus 1 is stored in the threshold value storage means, the determination means compares the threshold value with the discharge amount change. Based on the determination result, the inert gas introduction amount adjusting means 6 and the heating means 4a, 4b, 4c and 4d are operated.

加熱手段4b、4c、4dが被処理物質14に対して適切に設定されていれば、昇華精製管2に凝結した成分を昇華精製物質15として回収することができる。   If the heating means 4b, 4c, and 4d are appropriately set for the material 14 to be treated, the components condensed in the sublimation purification tube 2 can be recovered as the sublimation purification material 15.

製後、昇華精製物質15を回収する際は、昇華精製管2に凝結している昇華精製物質15をこそぎ落として回収する。   After the production, when the sublimation purification material 15 is collected, the sublimation purification material 15 condensed in the sublimation purification tube 2 is scraped off and collected.

加熱手段4b、4c、4dが被処理物質14に対して適切に設定されておらず、不活性ガスの導入と加熱手段4a、4b、4c、4dの温度低下により排出量を抑制し昇華精製管2に凝結させた場合は、昇華精製管2に凝結している被処理物質14をこそぎ落として回収する。そして加熱手段4a、4b、4c、4dの温度を変更し、昇華精製を再度行う。   The heating means 4b, 4c, and 4d are not appropriately set for the substance 14 to be treated, and the sublimation purification tube suppresses the discharge amount by introducing an inert gas and lowering the temperature of the heating means 4a, 4b, 4c, and 4d. When condensed to 2, the material 14 to be treated that has condensed in the sublimation purification pipe 2 is scraped off and collected. And the temperature of heating means 4a, 4b, 4c, 4d is changed, and sublimation purification is performed again.

本発明の実施の形態1で昇華精製する被処理物質14はトリス(8−キノリノラト)アルミニウムなどの有機ELに用いる有機色素や、ペンタセンなどの有機半導体であり、減圧下において昇華する特性を有するものであれば、他の有機化合物についても同様の効果を得ることができ、高価で、少量の材料をロスすることなく、昇華精製物質15としては、被処理物質14を高純度化したものが得られる。   The target substance 14 to be sublimated and purified in the first embodiment of the present invention is an organic dye used for organic EL such as tris (8-quinolinolato) aluminum or an organic semiconductor such as pentacene, and has a characteristic of sublimating under reduced pressure. If so, the same effect can be obtained with respect to other organic compounds, and the purified sublimation substance 15 is obtained by purifying the substance 14 to be purified without losing a small amount of material that is expensive. It is done.

以上のように、本実施の形態では、少なくとも一ヶ所の開口部を有する昇華精製管2と、この昇華精製管2に昇華精製管2を加熱する加熱手段4a、4b、4c、4dと内部を減圧する減圧手段5を備え、昇華精製管2の内部には被処理物質14を充填する被処理物質加熱容器8を備え、前記加熱手段4a、4b、4c、4dによって前記昇華精製管2と前記被処理物質加熱容器8を加熱することで、被処理物質加熱容器8内の前記被処理物質14を昇華させ、昇華させた前記被処理物質14を前記昇華精製管2に凝結させる昇華精製装置1であって、前記昇華精製管2後段に前記昇華精製管2から排出される被処理物質14を検出する排出量測定手段12と、前記昇華精製管2前段に前記昇華精製管2へ不活性ガスを導入する不活性ガス導入量調整手段6を設け、前記被処理物質14の排出を検知した場合に不活性ガスを導入するとともに、前記加熱手段4a、4b、4c、4dの温度を低下させることで、前記昇華精製管2から被処理物質14を排出させないようにしたものである。   As described above, in the present embodiment, the sublimation purification tube 2 having at least one opening, the heating means 4a, 4b, 4c, and 4d for heating the sublimation purification tube 2 to the sublimation purification tube 2 and the inside The sublimation purification pipe 2 is provided with a decompression means 5 for decompressing, and the sublimation purification pipe 2 is provided with a target substance heating container 8 filled with the target substance 14. A sublimation purification apparatus 1 that sublimates the target substance 14 in the target substance heating container 8 by heating the target substance heating container 8 and condenses the sublimated target substance 14 in the sublimation purification tube 2. And a discharge amount measuring means 12 for detecting a substance 14 to be treated discharged from the sublimation purification pipe 2 at the subsequent stage of the sublimation purification pipe 2, and an inert gas to the sublimation purification pipe 2 at the front stage of the sublimation purification pipe 2. Introducing inert gas The sublimation purification pipe 2 is provided by providing an amount adjusting means 6 and introducing an inert gas when the discharge of the substance 14 to be treated is detected and lowering the temperature of the heating means 4a, 4b, 4c, 4d. The material 14 to be treated is not discharged from the air.

これにより、高価で少量の被処理物質14が排出された際に、その排出量を検知し、排出量に応じて不活性ガスを導入し減圧の程度を小さくし、被処理物質14の昇華を抑制し、昇華した被処理物質14の平均自由行程を短くすることで、昇華精製管2内に存在する被処理物質14を管内に保持させ、加熱手段4a、4b、4c、4dの温度を低下させることで、内壁面に付着させることで、昇華精製管2外に排出させるのを抑制することができるという効果を奏する。   As a result, when an expensive and small amount of the material to be treated 14 is discharged, the amount of discharge is detected, and an inert gas is introduced according to the amount of discharge to reduce the degree of decompression, thereby sublimating the material to be processed 14. By suppressing the average free path of the treated substance 14 that has been sublimated, the treated substance 14 existing in the sublimation purification pipe 2 is held in the pipe, and the temperature of the heating means 4a, 4b, 4c, 4d is lowered. By making it adhere, it has the effect that it can suppress discharging outside the sublimation purification pipe | tube 2 by making it adhere to an inner wall surface.

また、本実施の形態では、昇華精製物質15は1種類としているが、複数種類存在していても、同様の効果を得ることが出来る。   Further, in the present embodiment, the sublimation purification material 15 is one type, but the same effect can be obtained even when a plurality of types exist.

また、本実施の形態では昇華精製物質15の回収方法について、特に限定しなかったが、被処理物質加熱容器8の内部に充填した被処理物質14が全て昇華された段階で、減圧手段5の運転を停止して、昇華精製管2の内部が常温常圧になった時点で昇華精製管2を取出し、スパーテル(薬さじ)等でかきとっても良い。   In the present embodiment, the recovery method of the sublimation purification material 15 is not particularly limited. However, when all of the target substance 14 filled in the target substance heating container 8 has been sublimated, The operation may be stopped, and the sublimation purification tube 2 may be taken out when the inside of the sublimation purification tube 2 reaches room temperature and normal pressure, and scraped with a spatula or the like.

また、本実施の形態では加熱手段4a、4b、4c、4dは電熱線を備えているとしたが、この構成に限ったものではなく、昇華精製管外管3の外部から昇華精製管外管3に密着した状態で加熱できるような構造であればリボンヒーター等で加熱しても同様の効果を得ることが可能である。   In the present embodiment, the heating means 4a, 4b, 4c, and 4d are provided with heating wires. However, the heating means 4a, 4b, 4c, and 4d are not limited to this configuration, and are not limited to the sublimation purification tube outer tube 3. 3 can be heated with a ribbon heater or the like if the structure can be heated in close contact with 3.

また、本実施の形態では減圧手段5の構造について特に限定しなかったが、ロータリーポンプ、ダイアフラムポンプ、ディフュージョンポンプ、ターボ分子ポンプなど、昇華精製管2の内部を10-5Pa程度まで減圧できるような能力を有する真空ポンプであればどのような真空ポンプでもよく、複数の真空ポンプを組み合わせて使用しても同様の効果を得ることが可能である。 In the present embodiment, the structure of the decompression means 5 is not particularly limited, but the interior of the sublimation purification pipe 2 such as a rotary pump, a diaphragm pump, a diffusion pump, and a turbo molecular pump can be decompressed to about 10 −5 Pa. Any vacuum pump may be used as long as it has a sufficient capability, and the same effect can be obtained even when a plurality of vacuum pumps are used in combination.

本発明にかかる昇華精製装置は、高価で、少量の材料をロスすることなく、昇華精製物質として得られるので、有機ELや有機太陽電池または有機半導体などに使用される昇華性を有する有機化合物の精製、分離手段等として有用である。   The sublimation purification apparatus according to the present invention is expensive and can be obtained as a sublimation purification substance without losing a small amount of material. Therefore, the sublimation purification apparatus used for organic EL, organic solar cells, organic semiconductors, etc. It is useful as a purification and separation means.

1 昇華精製装置
2 昇華精製管
3 昇華精製管外管
4a 加熱手段
4b 加熱手段
4c 加熱手段
4d 加熱手段
5 減圧手段
6 不活性ガス導入量調整手段
7 不活性ガス導入配管
8 被処理物質加熱容器
9 フランジ部
10 Oリング
11 クランプ
12 排出量測定手段
13 ガスボンベ
14 被処理物質
15 昇華精製物質
16 制御ユニット
17 排出物質
18 配管部材
101 昇華精製装置
102 昇華精製管
102a 昇華精製管(内管)
103 減圧手段
104a 加熱手段
104b 加熱手段
104c 加熱手段
105a フランジ
105b フランジ
106 流出口
107 被処理物質加熱容器
108 被処理物質
109 電熱線
110 昇華精製物質
DESCRIPTION OF SYMBOLS 1 Sublimation purification apparatus 2 Sublimation purification pipe 3 Sublimation purification pipe outer tube 4a Heating means 4b Heating means 4c Heating means 4d Heating means 5 Decompression means 6 Inert gas introduction amount adjustment means 7 Inert gas introduction pipe 8 Processed substance heating container 9 Flange 10 O-ring 11 Clamp 12 Discharge amount measuring means 13 Gas cylinder 14 Substance to be treated 15 Sublimation purification substance 16 Control unit 17 Discharge substance 18 Piping member 101 Sublimation purification apparatus 102 Sublimation purification pipe 102a Sublimation purification pipe (inner pipe)
103 Depressurizing means 104a Heating means 104b Heating means 104c Heating means 105a Flange 105b Flange 106 Outlet 107 Substance to be treated heating substance 108 Substance to be treated 109 Heating wire 110 Sublimation purification substance

Claims (2)

少なくとも一ヶ所の開口部を有する昇華精製管と、
この昇華精製管に昇華精製管を加熱する加熱手段と内部を減圧する減圧手段を備え、
昇華精製管の内部には被処理物質を充填する被処理物質加熱容器を備え、
前記加熱手段によって前記昇華精製管と前記被処理物質加熱容器を加熱することで、
被処理物質加熱容器内の前記被処理物質を昇華させ、
昇華させた前記被処理物質を前記昇華精製管に凝結させる昇華精製装置であって、
前記昇華精製管後段に前記昇華精製管から排出される被処理物質を検出する排出量測定手段と、
前記昇華精製管前段に前記昇華精製管へ不活性ガスを導入する不活性ガス導入量調整手段を設け、
前記被処理物質の排出を検知した場合に不活性ガスを導入するとともに、
前記加熱手段の温度を低下させることで、
前記昇華精製管から被処理物質を排出させないようにする昇華精製装置。
A sublimation purification tube having at least one opening;
The sublimation purification tube is equipped with a heating means for heating the sublimation purification tube and a decompression means for reducing the pressure inside.
The sublimation purification tube is equipped with a substance heating container to be treated to fill the substance to be treated,
By heating the sublimation purification tube and the material heating container by the heating means,
Sublimate the target substance in the target substance heating container,
A sublimation purification device for condensing the sublimated material to be treated in the sublimation purification tube,
A discharge amount measuring means for detecting a substance to be treated discharged from the sublimation purification tube downstream of the sublimation purification tube;
Provided with an inert gas introduction amount adjusting means for introducing an inert gas into the sublimation purification tube in the previous stage of the sublimation purification tube,
Introducing an inert gas when detecting the discharge of the substance to be treated,
By reducing the temperature of the heating means,
A sublimation purification apparatus for preventing the substance to be treated from being discharged from the sublimation purification tube.
昇華精製管の内部で被処理物質を加熱することにより昇華させ、昇華した前記被処理物質を凝結させる昇華精製方法であって、
前記昇華精製管から排出される被処理物質を検出する排出量測定手段と、
前記昇華精製管へ不活性ガスを導入する不活性ガス導入量調整手段を設け、
前記被処理物質の排出を検知した場合に不活性ガスを導入するとともに、
前記加熱手段の温度を低下させることで、
前記昇華精製管から被処理物質を排出させないようにする昇華精製方法。
A sublimation purification method for sublimating by heating a substance to be treated inside a sublimation purification tube and condensing the sublimated substance to be treated,
A discharge amount measuring means for detecting a substance to be processed discharged from the sublimation purification tube;
An inert gas introduction amount adjusting means for introducing an inert gas into the sublimation purification pipe is provided,
Introducing an inert gas when detecting the discharge of the substance to be treated,
By reducing the temperature of the heating means,
A sublimation purification method for preventing the substance to be treated from being discharged from the sublimation purification tube.
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WO2017175096A1 (en) * 2016-04-08 2017-10-12 株式会社半導体エネルギー研究所 Purification method, and purification device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017175096A1 (en) * 2016-04-08 2017-10-12 株式会社半導体エネルギー研究所 Purification method, and purification device
JP2017189766A (en) * 2016-04-08 2017-10-19 株式会社半導体エネルギー研究所 Purification method, and purification device
US11090577B2 (en) 2016-04-08 2021-08-17 Semiconductor Energy Laboratory Co., Ltd. Purification method and purification apparatus

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