JP2015158649A - Substrate for liquid crystal lens - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate for a liquid crystal lens that can form a liquid crystal lens excellent in electrical reliability of a liquid crystal layer.SOLUTION: There is provided a substrate for a liquid crystal lens that includes a substrate, columnar formations that are formed on the substrate by using a photosensitive resin composition and maintain a constant distance between the substrate and an opposing substrate that is used in forming a liquid crystal lens, a protective layer that is formed to cover at least side faces of the columnar formations, and an electrode layer that is formed on the substrate.

Description

  The present invention relates to a liquid crystal lens substrate capable of forming a liquid crystal lens excellent in electrical reliability of a liquid crystal layer.

  In recent years, in the field of display devices, there has been an increasing demand for three-dimensional display. In the display device, in order to perform three-dimensional display, it is necessary for the observer to observe the right eye image and the left eye image separately by some method. As a three-dimensional display method, for example, there is a method using glasses for three-dimensional display having a polarizing lens or the like. ing.

Examples of the naked-eye type three-dimensional display method include a parallax barrier method and a liquid crystal lens method. The liquid crystal lens method is a method using a liquid crystal lens having a substrate having two electrodes and a liquid crystal layer formed between the two substrates. In a liquid crystal lens, a lens function can be imparted by changing the orientation of liquid crystal in a liquid crystal layer by applying a voltage between both electrodes. In addition, there is an advantage that two types of display, two-dimensional display and three-dimensional display, can be performed.
In the liquid crystal lens, in order to ensure the lens thickness, the distance (cell gap) between the two substrates is required to be within a range of 30 μm to 100 μm.

  As a method of maintaining a predetermined distance between the substrates in the liquid crystal lens, for example, as shown in Patent Document 1 and Patent Document 2, a bead spacer or a columnar formation is disposed between the substrates having two electrodes. Is being considered.

JP 2006-293241 A JP 2012-173517 A

However, when a bead spacer is used for forming the liquid crystal lens, it is difficult to dispose the bead spacer at a predetermined position in the liquid crystal lens, and it is difficult to perform a good display.
Further, there is a problem that the electrical reliability of the liquid crystal layer may be lowered when a columnar formed article having a high aspect ratio and a high height as required for a liquid crystal lens is used.

  The main object of the present invention is to provide a liquid crystal lens substrate capable of forming a liquid crystal lens excellent in electrical reliability of a liquid crystal layer.

  As a method of forming a columnar product having a high aspect ratio and a high height, the present inventors have conducted research in order to solve the above-mentioned problems. After forming a photosensitive resin layer on a substrate, exposure is performed. When the developing method is used, the side surface portion of the columnar formed product, particularly the side surface portion near the substrate of the columnar formed product may not be sufficiently cured, and such a liquid crystal lens substrate is When a liquid crystal lens is used to form contaminants such as uncured components of the photosensitive resin composition from the side surface portion of the columnar product into the liquid crystal layer, the effective applied to the liquid crystal contained in the liquid crystal layer The inventors have found that the voltage is locally different and may cause a decrease in the electrical reliability of the liquid crystal layer, and the present invention has been completed.

  That is, the present invention includes a substrate and a columnar formed product formed on the substrate using a photosensitive resin composition, and holding the substrate and a counter substrate used when the liquid crystal lens is formed at a certain distance. A liquid crystal lens substrate comprising: a protective layer formed so as to cover at least a side surface of the columnar formed product; and an electrode layer formed on the substrate.

  According to the present invention, by having the protective layer, it is possible to form a liquid crystal lens excellent in the electrical reliability of the liquid crystal layer. In addition, by forming the columnar formation using a photosensitive resin composition by a photolithography method or the like, the columnar formation can be formed with high positional accuracy, so that good display can be performed.

  In the present invention, the protective layer preferably has transparency. This is because the columnar formation can be made inconspicuous.

  In the present invention, the material constituting the protective layer is preferably an organic material or an inorganic material. This is because, since the material is an organic material, a protective layer covering the columnar formation can be easily formed regardless of the shape of the columnar formation. This is because when the material is an inorganic material, the effect of suppressing the migration of contaminants can be improved.

  In this invention, it is preferable that the said inorganic material is the same material as the material which comprises the said electrode layer. This is because the electrode layer and the protective layer can be formed simultaneously, and even when the protective layer is formed, the number of steps can be prevented from increasing.

  In this invention, it is preferable that the said columnar formation is formed on the light-shielding part formed on the said board | substrate. This is because the columnar formation can be made inconspicuous.

  In this invention, it is preferable that the thickness of the said columnar formed product exists in the range of 30 micrometers-100 micrometers. This is because the cell gap of the liquid crystal lens can be maintained well. Moreover, it is because it is easy to make a favorable aspect ratio.

  In the present invention, there is an effect that a liquid crystal lens substrate capable of forming a liquid crystal lens excellent in electrical reliability of the liquid crystal layer can be provided.

It is a schematic sectional drawing which shows an example of the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows an example of the liquid crystal lens using the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows the other example of the liquid crystal lens using the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows the other example of the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows the other example of the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows the other example of the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows the other example of the board | substrate for liquid crystal lenses of this invention. It is explanatory drawing for demonstrating the shape of the columnar formation in this invention. It is a schematic sectional drawing which shows the other example of the board | substrate for liquid crystal lenses of this invention. It is a schematic sectional drawing which shows the other example of the board | substrate for liquid crystal lenses of this invention.

The present invention relates to a liquid crystal lens substrate.
Hereinafter, the liquid crystal lens substrate of the present invention will be described.

  The substrate for a liquid crystal lens of the present invention is a columnar shape that is formed using a photosensitive resin composition on the substrate and the substrate and a counter substrate that is used when the substrate is used as a liquid crystal lens. It has a formation, a protective layer formed so as to cover at least a side surface of the columnar formation, and an electrode layer formed on the substrate.

  Such a liquid crystal lens substrate of the present invention will be described with reference to the drawings. FIG. 1 is a schematic sectional view showing an example of a liquid crystal lens substrate of the present invention. As illustrated in FIG. 1, a liquid crystal lens substrate 10 of the present invention is formed when a substrate 1 and a photosensitive resin composition are formed on the substrate 1, and used as the substrate 1 and a liquid crystal lens. A columnar product 2 that holds a constant distance between the opposing substrates, a protective layer 3 that is formed so as to cover at least a side surface of the columnar product 2, and an electrode layer 4 that is formed on the substrate. It is what you have.

FIG. 2 is a schematic cross-sectional view showing an example of a liquid crystal lens formed using the liquid crystal lens substrate of the present invention. FIG. 3 is a schematic cross-sectional view showing another example of a liquid crystal lens formed using the liquid crystal lens substrate of the present invention. As shown in FIGS. 2 and 3, the liquid crystal lens 20 includes a liquid crystal lens substrate 10, a counter substrate 30, and a liquid crystal layer 40 formed between the liquid crystal lens substrate 10 and the counter substrate 30. The counter substrate 30 usually has an electrode layer 34 formed on the counter substrate 30. In the liquid crystal lens 20, the surface of the liquid crystal lens substrate 10 on the columnar formed product 2 side and the surface of the counter substrate 30 on which the electrode layer 34 is formed are usually opposed to each other. In addition, the electrode layer 4 formed on the liquid crystal lens substrate 10 and the electrode layer 34 formed on the counter substrate 30 are usually one in which the other is a long electrode. The layers are arranged in stripes. In addition, the liquid crystal lens 20 usually has a sealing material 50 for sealing the liquid crystal layer 40.
In the example shown in FIG. 3, a liquid crystal lens substrate 10 having a protective layer 3 formed integrally with the electrode layer 4 and covering the top of the columnar formed product is used. In addition, the electrode layer 34 formed on the counter substrate 30 is not electrically connected to the protective layer 3 (electrode layer 4) included in the liquid crystal lens substrate 10. It is formed in a pattern so as to have an opening in a region corresponding to the top.

According to the present invention, the protective layer is formed so as to cover at least the side surface of the columnar formed product, so that a liquid crystal lens excellent in electrical reliability of the liquid crystal layer can be formed.
For this reason, the two-dimensional image and the three-dimensional image can be stably switched and displayed.
In addition, by forming the columnar formation using a photosensitive resin composition by a photolithography method or the like, the columnar formation can be formed with high positional accuracy, so that good display can be performed.

Here, the reason why the liquid crystal lens having excellent electrical reliability of the liquid crystal layer can be formed by forming the protective layer so as to cover at least the side surface of the columnar formed product is as follows. It is guessed as follows.
That is, when a high-columnar formed product is formed by a photolithography method in which a photosensitive resin layer is formed using a photosensitive resin composition, and exposure and development are performed on the photosensitive resin layer, the vicinity of the substrate is sufficient. As a method for curing the exposure light, a method of increasing the light intensity of exposure light or a method of extending the exposure time can be considered. However, in this method, in plan view, curing proceeds even in the vicinity of a region to be cured in order to obtain a target columnar formed product, and it becomes difficult to obtain a columnar formed product having a high aspect ratio. For this reason, when a columnar product having a high height and aspect ratio is formed using a photosensitive resin composition, the side of the columnar product in the vicinity of the substrate is exposed to the exposure light reaching the upper side. This includes areas where the light intensity is weak.
And since the part where the light intensity which reaches | attains reaches | attains becomes a thing with low cure degree, when forming a liquid crystal lens, contaminants, such as an uncured component of the photosensitive resin composition, will transfer in a liquid crystal layer. As a result, the effective voltage applied to the liquid crystal contained in the liquid crystal layer is locally different due to the contaminant. Further, such migration of contaminants cannot be sufficiently suppressed even when an alignment film generally used for aligning the liquid crystal contained in the liquid crystal layer is formed so as to cover the columnar formation. .
On the other hand, since the protective layer is formed so as to cover at least the side surface of the columnar formed product, it is possible to suppress the migration of the contaminants from the low curing degree to the liquid crystal layer. It becomes. Therefore, when the liquid crystal lens is formed using the liquid crystal lens substrate of the present invention, the effective voltage applied to the liquid crystal contained in the liquid crystal layer due to the contaminants can be suppressed from being locally different, and the liquid crystal layer Therefore, it is possible to form a liquid crystal lens excellent in electrical reliability.

The liquid crystal lens substrate of the present invention has a substrate, a columnar formed product, a protective layer and an electrode layer.
Hereinafter, each configuration of the liquid crystal lens substrate of the present invention will be described in detail.

1. Protective layer The protective layer used in the present invention is formed so as to cover at least the side surface of the columnar product, and suppresses the migration of contaminants from the columnar product to the liquid crystal layer.
In addition, as said pollutant, it means what changes locally the effective voltage applied to a liquid crystal by moving to a liquid crystal layer among the uncured components of the photosensitive resin composition.
Specifically, the photoinitiator, monomer, surfactant, etc. which are contained in the uncured component of the photosensitive resin composition can be exemplified.

The material constituting the protective layer is not particularly limited as long as it can suppress the migration of contaminants to the liquid crystal layer, and any of organic materials and inorganic materials can be used.
When the material is an organic material, for example, a protective layer covering the side surface can be formed even in the case of a reverse tapered shape where the shape of the columnar formed product is thin on the substrate side, etc., regardless of the shape of the columnar formed product, There exists an advantage that the protective layer which covers a columnar formation can be formed easily. Further, since the material is an inorganic material, there is an advantage that the effect of suppressing the migration of contaminants can be obtained.

As the inorganic material, any of a conductive inorganic material having conductivity and an insulating inorganic material having no conductivity can be used.
In the present invention, from the viewpoint of enabling simultaneous formation of the electrode layer and the protective layer, it is preferably a conductive inorganic material, and in particular, the same material as that constituting the electrode layer. preferable. This is because by using the above material, the electrode layer and the protective layer can be formed at the same time, and even when the protective layer is formed, the number of steps can be prevented from increasing.

The organic material is not particularly limited as long as it can suppress migration of contaminants to the liquid crystal layer, and is not limited to a photosensitive resin material or a non-photosensitive resin material such as a thermosetting resin material. Can be used.
In the present invention, among these, a photosensitive resin material is preferable. This is because it is easy to form the protective layer with high positional accuracy.

Examples of the photosensitive resin material include those having a reactive vinyl group such as (meth) acrylate resin material, polyvinyl cinnamate resin material, or cyclized rubber resin material, among others. In the present invention, a (meth) acrylate resin material is preferable. It is because it can be made excellent in transparency.
As the (meth) acrylate resin material, specifically, the photosensitive resin composition can be used.
As said thermosetting resin material, an epoxy resin material etc. can be mentioned, for example.

  The conductive inorganic material is not particularly limited as long as it can suppress the migration of contaminants to the liquid crystal layer. For example, metals such as aluminum, molybdenum, palladium, silver, chromium, and copper And indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum-added oxide Zinc, potassium-doped zinc oxide, silicon-doped zinc oxide, and metal oxides such as zinc oxide-tin oxide, indium oxide-tin oxide, and zinc oxide-indium oxide-magnesium oxide are preferred. It is because it can be made excellent in transparency. As a result, it is easy to simultaneously form the electrode layer and the protective layer. In the present invention, two or more of these metal oxides may be combined.

  The insulating inorganic material is not particularly limited as long as it can suppress the migration of contaminants to the liquid crystal layer. For example, silicon oxide, silicon nitride, aluminum oxide, tantalum oxide, titanic acid Examples thereof include barium strontium (BST) and lead zirconate titanate (PZT).

The protective layer is preferably transparent.
Specifically, the total light transmittance of the protective layer is preferably 80% or more, and more preferably 90% or more. This is because the columnar formation can be made inconspicuous. Moreover, it is easy to form the protective layer and the electrode layer simultaneously. Furthermore, as shown in FIG. 1 already described, in plan view, even when the protective layer is formed in a region other than the region covering the columnar formation such as on the electrode layer, the light transmittance should be excellent. Because it can.
The total light transmittance means the total light transmittance in the thickness direction of the protective layer, and can be measured by JIS K7361-1 (Testing method for total light transmittance of plastic transparent material).

The protective layer may be a single layer or may have a structure in which two or more layers are laminated.
As a structure in which two or more layers are laminated, for example, as illustrated in FIG. 4, the protective layer 3 is formed integrally with the electrode layer, and the organic material or insulating material formed on the protective layer 3 a The thing containing the protective layer 3b which consists of inorganic materials can be mentioned.
Moreover, since the reference numerals in FIG. 4 indicate the same members as those in FIG. 1, description thereof is omitted here.

The thickness of the protective layer is not particularly limited as long as it can suppress the migration of the contaminants to the liquid crystal layer. For example, when the material constituting the protective layer is an organic material, the thickness is 0.5 μm. It is preferable to be in the range of ˜5 μm, and it is particularly preferable to be in the range of 1 μm to 3 μm. This is because the migration of the contaminants can be effectively suppressed when the thickness is within the above-described range. Moreover, it is because generation | occurrence | production of a pinhole etc. can be suppressed.
Moreover, when the material which comprises the said protective layer is an inorganic material, it is preferable to exist in the range of 50 to 3000 tons, it is preferable to be in the range of 600 to 1800 in particular, and the range of 400 to 1400 in particular is preferable. It is preferable to be within. This is because the migration of the contaminants can be effectively suppressed when the thickness is within the above-described range. Moreover, it is because generation | occurrence | production of a pinhole etc. can be suppressed.
In addition, when the said protective layer has a structure where two or more layers were laminated | stacked, it means the whole thickness.

As a formation part with respect to the said columnar formation of the said protective layer, what is necessary is just to include the at least side surface of the said columnar formation, and can aim at the transition suppression to the liquid crystal layer of the said contaminant.
In the present invention, it is preferable to include the substrate-side side surface of the columnar formed product, in particular, preferably to include the entire surface of the substrate-side side surface, particularly preferably to include the entire surface of the columnar formed side surface, Especially, it is preferable that the whole surface of a columnar formation is included. This is because the migration of the contaminants to the liquid crystal layer can be effectively suppressed. Moreover, it is because a patterning process can be made unnecessary by forming the said protective layer in the whole surface of the said columnar formation, and formation of a protective layer becomes easy.
Note that the substrate side surface of the columnar formed product refers to the side surface on the substrate side from the midpoint of the height of the columnar formed product.

The formation position of the protective layer in plan view with respect to the substrate is not particularly limited as long as it includes at least the side surface of the columnar formed product, and may be formed in a pattern on the substrate. It may be formed so as to cover the entire surface of the substrate.
In the present invention, from the viewpoint of excellent light transmittance, it is preferably formed in a pattern on the substrate, and in particular, only in the region covering the columnar formation, that is, the columnar formation. It is preferable that the protective layer is formed in a region where a protective layer covering the side surface is formed.
Moreover, it is preferable to form so that the whole surface of the said board | substrate may be covered from a viewpoint that the patterning process for protective layer formation can be made unnecessary.
Note that FIG. 1 already described shows an example in which the protective layer is formed so as to cover the entire surface of the substrate. FIG. 5 shows an example in which the protective layer is formed only in a region covering the columnar formation.
Moreover, since the reference numerals in FIG. 5 indicate the same members as those in FIG. 1, the description thereof is omitted here.

The protective layer may be formed in the thickness direction as long as it includes at least the side surface of the columnar formed product, can suppress migration of the contaminant to the liquid crystal layer, and can exhibit a function as a liquid crystal lens. good.
Such a formation location in the thickness direction is not particularly limited as long as it is at least on the liquid crystal layer side surface of the columnar formed material. For example, as illustrated in FIG. As illustrated in FIG. 6, it can be between the substrate and the electrode layer.
When the material forming the columnar formed material is a conductive inorganic material that is the same material as the electrode layer, it is formed on the substrate simultaneously with the electrode layer as illustrated in FIG. It may be a thing. When the protective layer and the electrode layer are formed simultaneously, as shown in FIG. 7, the protective layer and the electrode layer may be integrally formed, connected to the electrode layer, The two may not be connected.
6 and 7 indicate the same members as those in FIG. 1, and thus the description thereof is omitted here.

The method for forming the protective layer is not particularly limited as long as the protective layer can be formed with high accuracy, and a known forming method can be used.
For example, when the material is a photosensitive resin material, a method of exposing and developing the resin material layer formed on the entire surface of the substrate by applying the resin material can be used. When the material is a non-photosensitive resin material such as a thermosetting resin material, a predetermined resist pattern is applied to the surface of the resin material layer formed on the entire surface by applying the resin material. A method of removing the exposed portion from the resist pattern by wet etching, or after forming a resist pattern having an opening at a location where the protective layer is to be formed, and then applying a resin material into the opening, and then resist pattern A method of peeling the upper resin material layer simultaneously with the peeling of the resist pattern can be mentioned.

The application method of the resin material can be a general application method, for example, spin coating method, die coating method, spray coating method, dip coating method, roll coating method, bead coating method, bar coating method, ink jet method. Etc.
Moreover, as an exposure method in the said exposure and development process, the method of irradiating exposure light to a photosensitive resin layer through a photomask using a well-known exposure apparatus can be mentioned, for example. As the developer for the photosensitive resin layer in the exposure and development process, for example, it can be used water, an alkaline aqueous solution (KOH or K ₂ CO _3).

  In addition, when the material is an inorganic material, a method using a dry process such as a CVD method, a sputtering method, or a vacuum evaporation method can be given. Moreover, the method of patterning by the etching using a resist as needed can be used.

2. Columnar formation The columnar formation used in the present invention is formed on the substrate by using a photosensitive resin composition, and holds a constant distance between the substrate and the counter substrate used when the liquid crystal lens is used. Is.

(1) Photosensitive resin composition As the photosensitive resin composition used in the present invention, the photosensitive resin layer obtained by applying the photosensitive resin composition is exposed and developed to obtain a desired shape. In addition, any material can be used as long as it can obtain a columnar formed product having high strength, and those generally used for photolithography and the like can be used.
Specifically, those containing a monomer, a polymer and a photopolymerization initiator can be used.

(A) Monomer Examples of the monomer include allyl acrylate, benzyl acrylate, butoxyethyl acrylate, butoxyethylene glycol acrylate, cyclohexyl acrylate, dicyclopentanyl acrylate, 2-ethylhexyl acrylate, glycerol acrylate, glycidyl acrylate, and 2-hydroxyethyl. Acrylate, 2-hydroxypropyl acrylate, isobornyl acrylate, isodexyl acrylate, isooctyl acrylate, lauryl acrylate, 2-methoxyethyl acrylate, methoxyethylene glycol acrylate, phenoxyethyl acrylate, stearyl acrylate, ethylene glycol diacrylate, diethylene glycol di Acrylate, 1,4- Butanediol diacrylate, 1,5-pentanediol diacrylate, 1,6-hexanediol diacrylate, 1,3-propanediol acrylate, 1,4-cyclohexanediol diacrylate, 2,2-dimethylolpropane diacrylate, Glycerol diacrylate, tripropylene glycol diacrylate, glycerol triacrylate, trimethylolpropane triacrylate, polyoxyethylated trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, triethylene glycol diacrylate, polyoxypropyltri Methylolpropane triacrylate, butylene glycol diacrylate, 1,2,4-butantrio Lutriacrylate, 2,2,4-trimethyl-1,3-pentanediol diacrylate, diallyl fumarate, 1,10-decanediol dimethyl acrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, and the above acrylate Substituted with a methacrylate group, γ-methacryloxypropyltrimethoxysilane, 1-vinyl-2-pyrrolidone, 2-hydroxyethylacryloyl phosphate, tetrahydrofurfuryl acrylate, dicyclopentenyl acrylate, dicyclopentenyloxyethyl acrylate , 3-butanediol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, hydroxypivalic acid ester Luneopentyl glycol diacrylate, phenol-ethylene oxide modified acrylate, phenol-propylene oxide modified acrylate, N-vinyl-2-pyrrolidone, bisphenol A-ethylene oxide modified diacrylate, pentaerythritol diacrylate monostearate, tetraethylene glycol di Acrylate, polypropylene glycol diacrylate, trimethylolpropane propylene oxide modified triacrylate, isocyanuric acid ethylene oxide modified triacrylate, trimethylolpropane ethylene oxide modified triacrylate, pentaerythritol pentaacrylate, pentaerythritol hexaacrylate, pentaerythritol tetraacrylate, etc. The aclay Monomers, those obtained by substituting these acrylate groups with methacrylate groups, urethane acrylate oligomers obtained by bonding acrylate groups to oligomers having a polyurethane structure, polyester acrylate oligomers obtained by bonding acrylate groups to oligomers having a polyester structure, epoxy groups An epoxy acrylate oligomer in which an acrylate group is bonded to an oligomer having an epoxy group, a urethane methacrylate oligomer in which a methacrylate group is bonded to an oligomer having a polyurethane structure, a polyester methacrylate oligomer in which a methacrylate group is bonded to an oligomer having a polyester structure, and an epoxy group Epoxy methacrylate oligomer with methacrylate group bonded to oligomer, with acrylate group That polyurethane acrylates, polyester acrylates having an acrylate group, an epoxy acrylate resin having an acrylate group, a polyurethane methacrylate having a methacrylate group, an epoxy methacrylate resins having a polyester methacrylate, and methacrylate groups having methacrylate group. These monomers may be used alone or in combination of two or more. In the present invention, commercially available monomers can also be used. For example, SR399 (manufactured by Sartomer Co., Ltd.), Aronix M-400 (manufactured by Toagosei Co., Ltd.), and Aronix M-450 (manufactured by Toagosei Co., Ltd.) ) Is preferred.

The content of the monomer is not particularly limited as long as a columnar formed product having a desired shape can be formed. Specifically, the content of the monomer is 60% by mass to 95% by mass in the solid content of the photosensitive resin composition. Within the range, it is particularly preferable to be within the range of 65% to 93% by weight, particularly within the range of 70% to 90% by weight.
In addition, solid content means all components other than the solvent in the photosensitive resin composition.

(B) Polymer As the polymer, for example, ethylene-vinyl acetate copolymer, ethylene-vinyl chloride copolymer, ethylene vinyl copolymer, polystyrene, acrylonitrile-styrene copolymer, ABS resin, polymethacrylic acid resin, Ethylene methacrylate resin, polyvinyl chloride resin, chlorinated vinyl chloride, polyvinyl alcohol, cellulose acetate propionate, cellulose acetate butyrate, nylon 6, nylon 66, nylon 12, polyethylene terephthalate, polybutylene terephthalate, polycarbonate, polyvinyl acetal, Polyether ether ketone, polyether sulfone, polyphenylene sulfide, polyarylate, polyvinyl butyral, epoxy resin, phenoxy resin, polyimide resin, Polyamideimide resin, polyamic acid resin, polyetherimide resin, phenol resin, urea resin, etc., and polymerizable monomers such as methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, Isopropyl acrylate, isopropyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, tert-butyl acrylate, tert-butyl methacrylate, n-pentyl acrylate, n-pentyl methacrylate, n-hexyl acrylate, n-hexyl Methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, n One kind of octyl acrylate, n-octyl methacrylate, n-decyl acrylate, n-decyl methacrylate, 2-hydroxyethyl methacrylate, benzyl methacrylate, styrene, α-methylstyrene, N-vinyl-2-pyrrolidone, glycidyl (meth) acrylate Examples thereof include polymers or copolymers composed of at least one of acrylic acid, methacrylic acid, dimer of acrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof. It is done. These polymers may be used alone or in combination of two or more. In the present invention, commercially available polymers can also be used. For example, Epicoat 180S70 (manufactured by Yuka Shell Epoxy Co., Ltd.), Aronix M-5600 (manufactured by Toagosei Co., Ltd.), Aronix M-6200 (Toagosei Co., Ltd.) Alonix M-7100 (manufactured by Toagosei Co., Ltd.) and Aronix M-9050 (manufactured by Toagosei Co., Ltd.) are preferred.

  The content of the polymer is not particularly limited as long as a columnar formed product having a desired shape can be formed. Specifically, the polymer content is in the range of 5% by mass to 40% by mass in the solid content of the photosensitive resin composition. Of these, it is preferable that the content be in the range of 7% by mass to 35% by mass, particularly in the range of 10% by mass to 30% by mass.

(C) Photopolymerization initiator The photopolymerization initiator is a compound that generates free radicals by exposure light, and specifically includes benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine). ) Benzophenone, 4,4-bis (diethylamine) benzophenone, α-amino-acetophenone, 4,4-dichlorobenzophenone, 4-benzoyl-4-methyldiphenyl ketone, dibenzyl ketone, fluorenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxone Tontone, benzyldimethyl ketal, benzylmethoxyethyl acetal, benzoin methyl ether, benzoin butyl ether, anthraquinone, 2-tert-butylanthraquinone, 2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzsuberon, methyleneanthrone, 4-azido Benzylacetophenone, 2,6-bis (p-azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadion-2- (o-methoxycarbonyl) ) Oxime, 1-phenyl-propanedione-2- (o-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxy 1-phenyl-3-ethoxy-propanetrione-2- (o-benzoyl) oxime, Michler's ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2- Benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, naphthalenesulfonyl chloride, quinolinesulfonyl chloride, n-phenylthioacridone, 4,4-azobisisobutyronitrile, diphenyl disulfide, benzthiazole Photoreductive dyes such as disulfide, triphenylphosphine, camphorquinone, Adeka N1717, carbon tetrabromide, tribromophenylsulfone, benzoin peroxide, eosin, methylene blue, and reducing agents such as ascorbic acid and triethanolamine Combination The can be exemplified. In this embodiment, these photoinitiators can be used 1 type or in combination of 2 or more types.

  The content of the photopolymerization initiator is not particularly limited as long as desired photosensitivity can be imparted to the photosensitive resin layer so as to obtain a columnar formed product having a desired shape. Specifically, the photosensitive resin composition In the range of 0.5% by mass to 5.0% by mass, especially in the range of 1.0% by mass to 4.0% by mass, particularly 1.5% by mass to 3.0% by mass. It is preferable to be within the range.

(D) Other Although the said photosensitive resin composition contains a monomer, a polymer, and a photoinitiator normally, it can contain a solvent and an additive as needed.

  The solvent may be the same as that used in general resin compositions, specifically, alcohols such as methanol, ethanol, n-propanol, isopropanol, ethylene glycol, propylene glycol, α- Or terpenes such as β-terpineol, etc., ketones such as acetone, methyl ethyl ketone, cyclohexanone, N-methyl-2-pyrrolidone, aromatic hydrocarbons such as toluene, xylene, tetramethylbenzene, cellosolve, methyl cellosolve, ethyl cellosolve , Carbitol, methyl carbitol, ethyl carbitol, butyl carbitol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol Glycol ethers such as ethyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, ethyl acetate, butyl acetate, cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, carbitol acetate, ethyl carbitol acetate, butyl carbitol Examples thereof include acetates such as acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and 3-methoxybutyl acetate.

  Examples of the additive include a leveling agent, a crosslinking agent, a curing agent, a polymerization accelerator, a viscosity modifier, and a surfactant. Known additives can be used for these additives.

  The color of the photosensitive resin composition is preferably transparent. This is because the columnar formation can be made inconspicuous.

The ratio of the mass of the monomer and the mass of the polymer contained in the photosensitive resin composition is not particularly limited as long as a desired columnar formed product can be formed, but the mass of the monomer: the mass of the polymer = 70. : 30 to 90:10, in particular, 73:27 to 87:13, especially 75:25 to 85:15.
This is because when the ratio is within the above range, the columnar formed product can be stably formed.

  About the solid content concentration and viscosity of the said photosensitive resin composition, it can select suitably according to the application | coating method of the transparent resin composition to a board | substrate at the time of forming a columnar formation.

(2) Columnar formation The columnar formation in the present invention is to hold a constant distance between the substrate and the counter substrate used when the liquid crystal lens is used.

The height of such a columnar formed material is not particularly limited as long as the cell gap of the liquid crystal lens can be maintained satisfactorily, but is preferably in the range of 30 μm to 100 μm, Especially, it is preferable that it exists in the range of 33 micrometers-95 micrometers, and it is especially preferable that it exists in the range of 37 micrometers-90 micrometers.
This is because the cell gap of the liquid crystal lens can be satisfactorily maintained by the height. Moreover, it is because it is easy to make a favorable aspect ratio.
Note that “the height of the columnar formed product” refers to a vertical distance from the upper base to the lower base of the columnar formed product.
Further, the “upper bottom of the columnar formed product” refers to a surface of the columnar formed product on the side opposite to the substrate side. The “bottom bottom of the columnar formed product” refers to the surface of the columnar formed product on the substrate side.
Specifically, the height of the columnar formed product refers to a distance indicated by q in FIGS. 8A to 8D.

The absolute value of the difference between the width of the upper base and the width of the lower base is not particularly limited as long as the cell gap of the liquid crystal lens can be satisfactorily maintained. The thickness is preferably 5.0 μm or less, more preferably 4.5 μm or less, and particularly preferably 4.0 μm or less.
This is because when the absolute value of the difference between the width of the upper base and the width of the lower base is within the above range, sufficient strength can be imparted to the columnar formed product.
Note that the “width of the upper bottom of the columnar formation” refers to the straight line extending along the horizontal direction with the substrate at the top of the columnar formation, and the respective side surfaces of the columnar formation in the front shape of the columnar formation. The distance between two intersections with a straight line extending along. Specifically, it refers to the distance indicated by r in FIGS.
“Width of the bottom of the columnar formation” means two intersections of the front surface of the columnar formation and the surface of the substrate on which the columnar formation is formed and the straight line extending along each side surface of the columnar formation. The distance between. That is, “the width of the bottom of the columnar formed product” refers to a distance between two intersections between the surface of the substrate itself and the two straight lines described above. Further, when the columnar formation is formed on the substrate through another layer, the “width of the lower bottom of the columnar formation” is 2 of the surface of the other layer and the two straight lines described above. The distance between two intersections. Specifically, it refers to a distance indicated by s in FIGS.
The “front shape of the columnar formed product” refers to the shape of the columnar formed product when the substrate with the columnar formed product is viewed from the front direction. Further, when the columnar shaped product has a shape having a long side and a short side such as a rectangular shape and an elliptical shape in the plan view, the surface having the short side is defined as the front direction. Moreover, when the columnar formation is, for example, a square shape in a plan view, a surface having one side is defined as a front direction.

The width of the lower base of the columnar formed material is not particularly limited as long as the cell gap of the liquid crystal lens can be maintained satisfactorily. For example, it is within the range of 20 μm to 50 μm. In particular, it is preferably in the range of 25 μm to 47 μm, and particularly preferably in the range of 30 μm to 45 μm.
It is because it is excellent in the intensity | strength of a columnar formation and it can make it easy to form a columnar formation by being in the said range.
In addition, it is possible to obtain a columnar formation that is difficult to be visually recognized by an observer, and it is possible to perform good display in a display device using a liquid crystal lens.

The aspect ratio of the columnar formed material is not particularly limited as long as the cell gap of the liquid crystal lens can be maintained satisfactorily, but is within the range of 1.7 to 2.3. In particular, it is preferably in the range of 1.8 to 2.2, and particularly preferably in the range of 1.9 to 2.1.
It is because it can have sufficient intensity | strength because the said aspect ratio is in the range mentioned above. For this reason, the cell gap can be maintained satisfactorily, and good display can be performed in a display device using a liquid crystal lens. Moreover, it is because the said columnar formation can be formed stably.

The shape of the columnar formed product in plan view is not particularly limited as long as the cell gap of the liquid crystal lens can be maintained satisfactorily. For example, a circular shape, an elliptical shape, a rectangular shape, etc. Examples include polygonal shapes.
In the present invention, a shape having a small difference between the long side and the short side is preferable, and a circular shape or a square shape is preferable.
This is because it has good strength and can satisfactorily suppress alignment disorder of the liquid crystal in the liquid crystal layer.

The front shape of the columnar product is not particularly limited as long as the cell gap of the liquid crystal lens can be satisfactorily maintained. For example, FIG. 8A and FIG. As shown in FIG. 8, the width r of the upper base and the width s of the lower base may be equal to each other. As shown in FIG. 8C, the forward taper in which the width r of the upper base is smaller than the width s of the lower base. A shape may be sufficient, and the reverse taper shape where the width | variety r of an upper base is larger than the width | variety s of a lower base may be sufficient. Further, as shown in FIGS. 8A and 8B, when the width r of the upper base and the width s of the lower base are equal, the side surface is perpendicular to the substrate as shown in FIG. 8A. Even if it is a barrel shape in which the width t between the upper base and the lower base is larger than the width r of the upper base and the width s of the lower base as shown in FIG. Good. Especially in this invention, it is preferable that the front shape of the said columnar formation is a vertical shape.
This is because the columnar formed product can be excellent in strength and the like. For this reason, the cell gap can be maintained satisfactorily, and good display can be performed in a display device using a liquid crystal lens.

  The planar view shape and front shape of the columnar shaped product can be confirmed using, for example, a scanning electron microscope (SEM). Further, the height, the width of the upper base, the width of the lower base, the width of other portions, and the like of the columnar formation can be calculated based on the measured values of the observation image of the SEM. A general scanning electron microscope (SEM) can be used.

The method for forming the columnar product is not particularly limited as long as it is a method using the photosensitive resin composition. For example, by applying the photosensitive resin composition on the substrate, the photosensitive resin composition is used. Examples thereof include a photosensitive resin layer forming step for forming a layer, and an exposure developing step for forming a columnar formed product by developing the photosensitive resin layer after exposing the photosensitive resin layer.
Moreover, you may have a baking process process which bakes a columnar formation after the said photosensitive resin layer formation process and a drying process process after the said exposure image development process.

  As the developer used for the photosensitive resin composition coating method, exposure method, and development, a general method can be used. For example, the same as described in the above section “1. Protective layer”. be able to.

3. Electrode layer The electrode layer in the present invention is formed on the substrate. In addition, when the liquid crystal lens is formed, an electric field is applied to the liquid crystal layer together with the electrode layer formed on the counter substrate to change the alignment of the liquid crystal in the liquid crystal layer.

  The conductive material constituting such an electrode layer can be the same as that used in a general display device. For example, the conductive inorganic material described in the section “1. Protective layer” is used. Among them, indium tin oxide (ITO), indium zinc oxide (IZO), and the like can be preferably used.

  The thickness of the electrode layer is not particularly limited as long as it has predetermined conductivity, and for example, it is preferably in the range of 10 nm to 300 nm.

As a method for forming the electrode layer, a general method can be used, and examples thereof include a vapor deposition method and a sputtering method.
Moreover, when forming an electrode layer in pattern shape, after forming a thin film by a vapor deposition method or sputtering method, the method of patterning, for example by the photolithographic method is used suitably.

4). Substrate The substrate used in the present invention supports the columnar product, the electrode layer, and the protective layer.

The substrate preferably has transparency. For example, the total light transmittance is preferably 80% or more, and more preferably 90% or more.
Here, the measuring method of the total light transmittance can be the same as the content described in the section “1. Protective layer”.

  Examples of the substrate include inflexible rigid materials such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plates, or flexible materials such as resin films and optical resin plates. Can be used.

  The thickness of the substrate is not particularly limited as long as the columnar formed product, the electrode layer, and the protective layer can be stably supported, and can be, for example, in the range of 0.05 mm to 1.1 mm.

5. Liquid Crystal Lens Substrate The liquid crystal lens substrate in the present invention has a substrate, a columnar formed product, a protective layer, and an electrode layer, but may have other configurations as necessary.
As such another configuration, when the liquid crystal lens as illustrated in FIG. 9 is formed, the light shielding portion 12 formed between the alignment film 11 that aligns the liquid crystal contained in the liquid crystal layer, the substrate, and the columnar formation. Etc.
In addition, as shown in FIG. 7 which has already been described, when the liquid crystal lens is formed by including a protective layer integrally formed with the electrode layer as a protective layer on the top of the columnar formed product, the columnar shape included in the liquid crystal lens substrate is formed. When the protective layer formed on the top of the formed product and the electrode layer included in the counter substrate are stacked so as to overlap in plan view, the insulation formed to cover the protective layer on the top of the columnar formed product is provided. It may have a conduction preventing layer. By having the conduction preventing layer, when a liquid crystal lens is formed using the liquid crystal lens substrate of the present invention, conduction between the electrode layer included in the liquid crystal lens substrate and the electrode layer formed on the counter substrate is prevented. Because it is easy.

  The alignment film is not particularly limited as long as liquid crystal can be aligned, and can be the same as a general alignment film.

  Examples of the material constituting the alignment film include polyimide resins such as soluble polyimide, polyamic acid type polyimide, and modified polyimide, photoreactive materials that impart alignment regulating force by causing photoreactions, and photoisomerization reactions. A photo-alignment material such as a photoisomerization-type material that imparts alignment regulation force can be used when it occurs, and among them, a polyimide resin can be preferably used in the present invention. This is because the cost can be reduced. In addition, when forming an alignment film using a polyimide resin, an uncured product of a photosensitive resin composition such as N-methyl-2-pyrrolidone (NMP) is dissolved as a solvent used when the polyimide resin is applied. Easy solvents are generally used. For this reason, when an alignment film is formed using a polyimide resin, it is considered that contaminants such as the uncured material are extracted from the columnar formed product to the alignment film side, and more easily migrate to the liquid crystal layer side. . Therefore, by forming the alignment film using the polyimide resin, the effect of the present invention that the transition from the columnar formed product to the liquid crystal layer can be suppressed can be more effectively exhibited.

The alignment film may be rubbed or not rubbed.
The thickness of the alignment film is preferably in the range of 1 nm to 1000 nm, more preferably in the range of 3 nm to 100 nm.

  The formation position in the thickness direction of the alignment film is not particularly limited as long as the liquid crystal contained in the liquid crystal layer can be aligned when the liquid crystal lens is formed. Usually, the outermost surface of the liquid crystal lens substrate of the present invention, that is, the substrate It is a place which covers a columnar formation, a protective layer, and an electrode layer.

The light shielding part is formed between the substrate and the columnar formed product. In this invention, it is preferable to have the said light-shielding part, ie, the said columnar formation is formed on the light-shielding part formed on the said board | substrate. This is because the columnar formation can be made inconspicuous.
As the light-shielding portion, for example, the same one as used for a general display device such as a color filter can be used, and one using an inorganic material such as chromium may be used. The thing using the light-shielding resin to contain may be used.

  When the electrode layer is continuously formed, the light shielding part is formed in a pattern corresponding to the electrode layer formed in a pattern on the counter substrate when the liquid crystal lens is used. Is done. On the other hand, when the electrode layer is formed in a pattern shape, the light shielding portion is usually formed in a pattern shape corresponding to this.

  The size of the light shielding portion in plan view may be approximately the same as that of the columnar formation, but is preferably larger than the columnar formation as shown in FIG. This is because the effect that the columnar formation can be made inconspicuous can be more effectively exhibited. Moreover, it is because the said columnar formation can be formed stably.

  The conduction preventing layer is formed so as to cover the protective layer integrally formed with the electrode layer on the top of the columnar formed product, and has an insulating property.

The conduction preventing layer is not particularly limited as long as it can cover the protective layer integrally formed with the electrode layer on the top of the columnar formed product. As such a conduction preventing layer, specifically, as shown in FIG. 4 which has already been described, it may be formed on the top of the columnar product as a part of the protective layer having insulation, It may be formed separately from the protective layer on the top of the columnar product.
FIG. 10 shows an example of the conduction preventing layer 13 formed only on the top of the columnar formed product 2. Moreover, since the reference numerals in FIG. 10 indicate the same members as those in FIG. 1, the description thereof is omitted here.

  The color of the conduction preventing layer is preferably transparent when formed as a part of the protective layer as shown in FIG. Further, as shown in FIG. 10 already described, when it is formed only on the top of the columnar formed product, it preferably has a light shielding property. This is because the columnar formation can be made inconspicuous.

The material constituting the conduction preventing layer may be any material as long as it has insulating properties, and any of organic materials and inorganic materials can be used. In the present invention, it is particularly preferable to include an organic material. This is because it is easy to increase the thickness of the conduction preventing layer, and conduction prevention can be stably achieved.
Specifically, as the organic material and the inorganic material, for example, the organic material and the insulating inorganic material described in the section “1. Protective layer” can be used. The organic material may contain a light-shielding colorant, such as a light-shielding resin used for forming the light-shielding part.

  More specifically, when the liquid crystal lens is formed, the thickness of the conduction preventing layer includes a protective layer integrally formed with the electrode layer as the protective layer, and the top of the columnar formed material included in the liquid crystal lens substrate. The protective layer formed on the counter substrate and the electrode layer included in the counter substrate are not particularly limited as long as they can prevent conduction between both electrode layers when stacked so as to overlap in plan view, The thickness of the protective layer can be the same.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples.

[Example 1]
1. Preparation of curable resin composition 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), diethylene glycol dimethyl ether ( After adding 88 parts by weight of DMDG) and stirring to dissolve, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly. Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour. 7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours, and a curable resin composition. (Solid content 50%) was obtained.

2. Preparation of transparent photosensitive resin composition Next, the following materials were stirred and mixed at room temperature to obtain a transparent photosensitive resin composition.

(Composition of transparent photosensitive resin composition)
・ The above-mentioned curable resin composition (solid content 50%): 16 parts by weight ・ Dipentaerythritol pentaacrylate (Sartomer SR399): 24 parts by weight ・ Orthocresol novolac type epoxy resin (Oka Shell Epoxy Epicoat 180S70): 4 Parts by weight-2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by weight-diethylene glycol dimethyl ether: 52 parts by weight

3. Production of Substrate with Columnar Formation An ITO (thickness 1000 mm) film was formed on a 0.7 mm thick glass substrate (Asahi Glass Co., Ltd. AN material) by sputtering to produce an electrode layer. On the substrate, a transparent photosensitive resin composition was applied by a spin coating method and dried to form a coating film. A photomask was placed at a distance of 100 μm from the coating film of the transparent photosensitive resin composition, and ultraviolet rays were irradiated for 10 seconds only on the spacer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a transparent photosensitive resin composition was removed. Thereafter, the substrate was left to stand in an atmosphere of 200 ° C. for 30 minutes to perform heat treatment, and a columnar product-attached substrate having a columnar product having a thickness of 50 μm was produced.

4). Preparation of protective layer The above substrate with columnar formation is spin-coated with the above-mentioned transparent photosensitive resin composition, dried, exposed, and heat-treated at 200 ° C. for 30 minutes so as to cover the entire surface of the columnar formation. A formed protective layer having a thickness of 2.0 μm was produced to obtain a liquid crystal lens substrate.

5. Preparation of Liquid Crystal Lens An alignment film made of a polyimide resin was formed so as to cover the entire surface of the protective layer and the electrode layer of the liquid crystal lens substrate obtained as described above. Next, a required amount of TN liquid crystal is dropped on the TFT substrate, the liquid crystal lens substrate is overlaid, and UV curable resin is used as a sealing material, and irradiation is performed at 400 mJ / cm ² while applying a pressure of 0.3 kgf / cm ^{2 at} room temperature. Bonding was carried out by exposure in an amount, and cells were assembled to obtain a liquid crystal lens.

[Example 2]
A liquid crystal lens was produced in the same manner as in Example 1 except that the protective layer was formed of SiN (film thickness: 0.3 μm) by the CVD method.

[Example 3]
After forming the columnar product, a liquid crystal lens was produced in the same manner as in Example 1 except that an electrode layer was formed so as to cover the columnar product, that is, a protective layer and an electrode layer were formed simultaneously.

[Example 4]
The following components were mixed and sufficiently dispersed with a sand mill to prepare a black pigment dispersion.

(Composition of black pigment dispersion)
Black pigment: 23 parts by weight Polymer dispersing agent (Bicchemy Japan Co., Ltd. Disperbyk 111): 2 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight

  Next, the following components were sufficiently mixed to obtain a light shielding layer composition.

(Composition of composition for light shielding layer)
-Black pigment dispersion: 61 parts by weight-Curable resin composition: 20 parts by weight-Diethylene glycol dimethyl ether: 30 parts by weight

  The light shielding layer composition was applied onto a glass substrate with a spin coater and dried at 100 ° C. for 3 minutes to form a light shielding layer having a thickness of about 1 μm. The light-shielding layer is exposed to a light-shielding pattern with an ultrahigh pressure mercury lamp, developed with a 0.05 wt% aqueous potassium hydroxide solution, and then the substrate is left in an atmosphere at 180 ° C. for 30 minutes to form a black matrix pattern. A liquid crystal lens was produced in the same manner as in Example 1 except that the glass substrate formed in 1 was used as the glass substrate.

[Comparative Example 1]
A liquid crystal lens was produced in the same manner as in Example 1 except that the protective layer was not formed.

[Evaluation]
A voltage of 60 Hz and 5 V was applied to the produced liquid crystal lens, and the voltage holding ratio (manufactured by Toyo Technica Co., Ltd., VHR-1) was measured. Moreover, it shows in following Table 1 with the result evaluated by the following reference | standard.
Voltage holding ratio of 90% or more ...
Voltage holding ratio of 80% or more
Voltage holding ratio less than 80%

From Table 1, it was confirmed that the examples can be excellent in voltage holding ratio.
Moreover, when the liquid crystal lens was visually observed, the columnar formed product was not noticeable in Example 4 as compared with Examples 1-3.

DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Columnar formation 3 ... Protective layer 4 ... Electrode layer 10 ... Substrate for liquid crystal lens 20 ... Liquid crystal lens

Claims (7)

  A substrate, a columnar formation formed on the substrate using a photosensitive resin composition, and holding a constant distance between the substrate and the counter substrate used when the liquid crystal lens is formed; and the columnar formation A liquid crystal lens substrate comprising: a protective layer formed to cover at least a side surface; and an electrode layer formed on the substrate.   The liquid crystal lens substrate according to claim 1, wherein the protective layer has transparency.   The liquid crystal lens substrate according to claim 1, wherein the material constituting the protective layer is an organic material.   The liquid crystal lens substrate according to claim 1 or 2, wherein a material constituting the protective layer is an inorganic material.   The liquid crystal lens substrate according to claim 4, wherein the inorganic material is the same material as that of the electrode layer.   The liquid crystal lens substrate according to any one of claims 1 to 4, wherein the columnar formed product is formed on a light shielding portion formed on the substrate.   6. The liquid crystal lens substrate according to claim 1, wherein a thickness of the columnar formed product is in a range of 30 μm to 100 μm.

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