JP2015153805A5 - Wiring board manufacturing method - Google Patents

Wiring board manufacturing method Download PDF

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Publication number
JP2015153805A5
JP2015153805A5 JP2014024147A JP2014024147A JP2015153805A5 JP 2015153805 A5 JP2015153805 A5 JP 2015153805A5 JP 2014024147 A JP2014024147 A JP 2014024147A JP 2014024147 A JP2014024147 A JP 2014024147A JP 2015153805 A5 JP2015153805 A5 JP 2015153805A5
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JP
Japan
Prior art keywords
manufacturing
wiring board
metal
wiring
board according
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Withdrawn
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JP2014024147A
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Japanese (ja)
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JP2015153805A (en
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Priority to JP2014024147A priority Critical patent/JP2015153805A/en
Priority claimed from JP2014024147A external-priority patent/JP2015153805A/en
Publication of JP2015153805A publication Critical patent/JP2015153805A/en
Publication of JP2015153805A5 publication Critical patent/JP2015153805A5/en
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Claims (11)

貫通孔を有する基板と、前記基板に含まれる成分に対して活性な活性金属、銀および銅を含む合金の金属塊と、を用意する工程と、
少なくとも一部が前記貫通孔内に位置するように前記金属塊を配置する工程と、
前記金属塊を溶融させ、その溶融物を前記貫通孔内に充填することで配線を形成する工程と、
を含むことを特徴とする配線基板の製造方法。
A step of preparing a substrate having a through-hole, and an active metal active against a component contained in the substrate, a metal block of an alloy containing silver and copper,
Arranging the metal mass so that at least a portion thereof is located in the through hole; and
Forming the wiring by melting the metal mass and filling the melt into the through hole; and
A method for manufacturing a wiring board, comprising:
前記配線を形成する工程では、前記基板に含まれる成分と前記活性金属とが反応し、前記貫通孔の内周面と前記配線との間に活性金属層が形成される請求項1に記載の配線基板の製造方法。   The component of the said board | substrate and the said active metal react in the process of forming the said wiring, The active metal layer is formed between the internal peripheral surface of the said through-hole, and the said wiring. A method for manufacturing a wiring board. 前記基板は、セラミックス基板であり、
前記活性金属は、前記セラミックス基板に含まれるセラミックス成分に対して活性である請求項1または2に記載の配線基板の製造方法。
The substrate is a ceramic substrate;
The method for manufacturing a wiring board according to claim 1, wherein the active metal is active against a ceramic component contained in the ceramic substrate.
前記活性金属は、周期律表の第4族に属する金属である請求項1ないし3のいずれか1項に記載の配線基板の製造方法。   The method for manufacturing a wiring board according to claim 1, wherein the active metal is a metal belonging to Group 4 of the periodic table. 前記周期律表の第4族に属する金属は、チタンである請求項4に記載の配線基板の製造方法。   The method for manufacturing a wiring board according to claim 4, wherein the metal belonging to Group 4 of the periodic table is titanium. 前記配線を形成する工程では、前記金属塊の融点よりも高く、前記基板の融点よりも低い温度範囲を含む請求項1ないし5のいずれか1項に記載の配線基板の製造方法。   The method for manufacturing a wiring board according to claim 1, wherein the step of forming the wiring includes a temperature range higher than a melting point of the metal block and lower than a melting point of the substrate. 前記配線を形成する工程では、前記金属塊とともに前記基板を加熱する請求項1ないし6のいずれか1項に記載の配線基板の製造方法。   The method for manufacturing a wiring board according to claim 1, wherein, in the step of forming the wiring, the board is heated together with the metal block. 前記配線を形成する工程では、前記溶融物が前記基板の少なくとも一方の主面に濡れ広がる請求項1ないし7のいずれか1項に記載の配線基板の製造方法。   The method for manufacturing a wiring board according to claim 1, wherein in the step of forming the wiring, the molten material wets and spreads on at least one main surface of the substrate. 前記貫通孔の体積よりも前記金属塊の体積の方が大きい請求項8に記載の配線基板の製造方法。   The method for manufacturing a wiring board according to claim 8, wherein the volume of the metal block is larger than the volume of the through hole. 前記配置する工程では、前記金属塊は、前記貫通孔の一方の開口側に配置される請求項1ないし9のいずれか1項に記載の配線基板の製造方法。   10. The method of manufacturing a wiring board according to claim 1, wherein in the arranging step, the metal block is arranged on one opening side of the through hole. 前記金属塊は、前記開口よりも幅が大きい請求項10に記載の配線基板の製造方法。 The method for manufacturing a wiring board according to claim 10, wherein the metal block has a width larger than that of the opening.
JP2014024147A 2014-02-12 2014-02-12 Method for manufacturing wiring board, wiring board, electronic device, electronic apparatus, and mobile body Withdrawn JP2015153805A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014024147A JP2015153805A (en) 2014-02-12 2014-02-12 Method for manufacturing wiring board, wiring board, electronic device, electronic apparatus, and mobile body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014024147A JP2015153805A (en) 2014-02-12 2014-02-12 Method for manufacturing wiring board, wiring board, electronic device, electronic apparatus, and mobile body

Publications (2)

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JP2015153805A JP2015153805A (en) 2015-08-24
JP2015153805A5 true JP2015153805A5 (en) 2017-02-16

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JP2014024147A Withdrawn JP2015153805A (en) 2014-02-12 2014-02-12 Method for manufacturing wiring board, wiring board, electronic device, electronic apparatus, and mobile body

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6551301B2 (en) * 2016-05-19 2019-07-31 株式会社デンソー Electronic device and method of manufacturing electronic device
KR102232858B1 (en) * 2020-01-08 2021-03-26 주식회사 우진더블유티피 Space transfomer fabricating method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0575253A (en) * 1991-08-27 1993-03-26 Hitachi Constr Mach Co Ltd Method of forming circuit pattern by laser beam and method of forming conductor in through-hole
JPH11351876A (en) * 1998-06-09 1999-12-24 Mitsubishi Electric Corp Angular velocity sensor and its manufacture
JP2002043740A (en) * 2000-07-24 2002-02-08 Matsushita Electric Works Ltd Method for filling metal into through hole in ceramic substrate
JP2007192587A (en) * 2006-01-17 2007-08-02 Seiko Instruments Inc Wiring board for dynamic quantity sensor, manufacturing method of the wiring board for dynamic quantity sensor, and dynamic quantity sensor

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