JP2015146413A - Display control device and substrate processing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve usability relevant to a user interface of a substrate processing apparatus.SOLUTION: A display control device 520 comprises: a receiving unit 522 for receiving an activation command of software relevant to an operation of a CMP (Chemical Mechanical Polishing) device; and a display control unit 526 for reading from a storage unit 514, a plurality of images which correspond to the activation command received by the receiving unit 522 and have functions different from each other and causing the read images to be displayed on a display unit 516. The display control unit 526 is composed to allow adjustment of the sizes or arrangement positions of the plurality of images displayed on the display unit 516 on the basis of an adjustment command input through an input operation unit 512. This allows a user to adjust the plurality of images to the optimum sizes or arrangement positions thereby to improve usability of a user interface.

Description

  The present invention relates to a display control apparatus and a substrate processing apparatus.

  In recent years, a substrate processing apparatus has been used to perform various processes on a substrate such as a semiconductor wafer. As an example of the substrate processing apparatus, there is a CMP (Chemical Mechanical Polishing) apparatus for polishing a substrate.

  The CMP apparatus is a polishing unit for performing a polishing process on a substrate, a cleaning unit for performing a cleaning process and a drying process on a substrate, a substrate that is transferred to the polishing unit and receives a substrate that has been cleaned and dried by the cleaning unit. Equipped with a load / unload unit. In addition, the CMP apparatus includes a polishing unit, a cleaning unit, and a transfer unit that transfers the substrate in the load / unload unit. The CMP apparatus sequentially performs various processes of polishing, cleaning, and drying while transporting the substrate by the transport unit.

  By the way, the substrate processing apparatus is provided with an operation PC so that a user can monitor the state of the substrate processing apparatus and perform various operations. For example, a monitoring system image and an operation system image are displayed on the display device (user interface) of the operation PC. The monitoring system image is an image for monitoring how the substrate processing apparatus is moving, and the operation system image is for the user to perform various operations such as substrate operation, JOB operation, and recipe editing. It is an image. The user monitors the state of the substrate processing apparatus and performs various operations via the display device of the operation PC.

JP 2005-85784 A

  However, the prior art has not been considered to improve usability regarding the user interface of the substrate processing apparatus.

  That is, the substrate processing apparatus has various operation states (process execution in each unit, automatic substrate transfer test, assembly of the substrate processing apparatus, etc.). On the other hand, in the prior art, the size and arrangement position of the image displayed on the display device are fixed to the default values regardless of the type of operation. For example, the monitoring system image is arranged in the left half area of the screen of the display device, and the operation system image is arranged in the right half area, and it is difficult to adjust the size or arrangement position of each image. As a result, it is difficult for the user to realize an optimal image arrangement according to the type of operation of the substrate processing apparatus, and the user interface is not easy to use.

  Therefore, an object of the present invention is to improve usability regarding the user interface of the substrate processing apparatus.

One aspect of the display control device of the present invention is made in view of the above-described problem, and corresponds to the reception command received by the reception unit that receives a software activation command related to the operation of the substrate processing apparatus, A display control unit that reads a plurality of images having different functions from the storage unit and causes the display unit to display the read plurality of images, and the display control unit receives an adjustment instruction input via the input operation unit. On the basis of this, it is configured such that the size or arrangement position of the plurality of images displayed on the display unit can be adjusted.

  In one form of the display control device, the storage control for storing the size and the arrangement position of the plurality of images displayed on the display unit in the storage unit in correspondence with the type of the start command for displaying the plurality of images The display control unit reads out the sizes and arrangement positions of a plurality of images corresponding to the type of the activation command received by the receiving unit from the storage unit, and reads the plurality of images read out The plurality of images can be displayed on the display unit based on the size and the arrangement position.

  In one form of the display control device, the sizes and arrangement positions of the plurality of images displayed on the display unit are input via the type of the start command that displayed the plurality of images and the input operation unit. Further comprising a storage control unit for storing in the storage unit in correspondence with the identifier, the display control unit is a type of activation command received by the receiving unit, and an identifier input via the input operation unit, Reading out the sizes and arrangement positions of a plurality of images corresponding to the image from the storage unit, and displaying the plurality of images on the display unit based on the read out sizes and arrangement positions of the plurality of images. Can do.

  In one form of the display control device, the plurality of images include base images that are commonly used regardless of the type of the start command, and the display control unit is related to the type of the start command received by the receiving unit. The base image can be displayed on the display unit with a fixed size and a fixed arrangement position.

  One form of the substrate processing apparatus of the present invention includes any one of the display control devices described above, a polishing unit for performing a polishing process on a substrate, and a cleaning unit for performing a cleaning process and a drying process on the substrate. And a load / unload unit for delivering the substrate to the polishing unit and receiving the substrate cleaned and dried by the cleaning unit.

  According to this invention of this application, the convenience regarding the user interface of a substrate processing apparatus can be improved.

FIG. 1 is a plan view showing the overall configuration of the substrate processing apparatus of the present embodiment. FIG. 2 is a perspective view schematically showing the polishing unit. FIG. 3A is a plan view showing the cleaning unit, and FIG. 3B is a side view showing the cleaning unit. FIG. 4 is a diagram illustrating the configuration of the display control apparatus and the CMP apparatus. FIG. 5 is a diagram illustrating an example of image display according to a conventional technique. FIG. 6 is a diagram illustrating an example of the image display adjusted according to the present embodiment. FIG. 7 is a diagram illustrating an example of image display adjusted according to the present embodiment. FIG. 8 is a diagram illustrating an example of an image display when the assembly / adjustment of the CMP apparatus is executed. FIG. 9 is a diagram showing an example of image display when executing process processing in the unit of the CMP apparatus. FIG. 10 is a diagram illustrating an example of an image display when the automatic transfer test of the substrate of the CMP apparatus is executed. FIG. 11 is a diagram illustrating an example of an image display when a trouble occurs during the process processing of the CMP apparatus. FIG. 12 is a flowchart of processing executed by the display control apparatus. FIG. 13 is a flowchart of processing executed by the display control apparatus. FIG. 14 is a flowchart of processing executed by the display control apparatus. FIG. 15 is a flowchart of processing executed by the display control apparatus.

  Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. Hereinafter, a CMP apparatus will be described as an example of a substrate processing apparatus, but the present invention is not limited to this. Hereinafter, a substrate processing apparatus including the load / unload unit 2, the polishing unit 3, and the cleaning unit 4 will be described, but the present invention is not limited to this.

  First, the configuration of the CMP apparatus will be described, and then the improvement of user interface usability will be described.

<Substrate processing equipment>
FIG. 1 is a plan view showing the overall configuration of a substrate processing apparatus according to an embodiment of the present invention. As shown in FIG. 1, the CMP apparatus includes a substantially rectangular housing 1, and the inside of the housing 1 is divided into a load / unload unit 2, a polishing unit 3, and a cleaning unit 4 by partition walls 1a and 1b. Has been. The load / unload unit 2, the polishing unit 3, and the cleaning unit 4 are assembled independently and exhausted independently. Further, the cleaning unit 4 has a control device 5 that controls the substrate processing operation.

<Load / Unload unit>
The load / unload unit 2 includes two or more (four in this embodiment) front load units 20 on which wafer cassettes for stocking a large number of wafers (substrates) are placed. These front load portions 20 are arranged adjacent to the housing 1 and are arranged along the width direction (direction perpendicular to the longitudinal direction) of the substrate processing apparatus. The front load unit 20 can be equipped with an open cassette, a SMIF (Standard Manufacturing Interface) pod, or a FOUP (Front Opening Unified Pod). Here, SMIF and FOUP are sealed containers that can maintain an environment independent of the external space by accommodating a wafer cassette inside and covering with a partition wall.

  The load / unload unit 2 has a traveling mechanism 21 laid along the front load portion 20, and two transfer robots that can move along the arrangement direction of the wafer cassettes on the traveling mechanism 21. (Loader, transport mechanism) 22 is installed. The transfer robot 22 can access the wafer cassette mounted on the front load unit 20 by moving on the traveling mechanism 21. Each transfer robot 22 has two hands up and down. The upper hand is used when returning processed wafers to the wafer cassette. The lower hand is used when a wafer before processing is taken out from the wafer cassette. In this way, the upper and lower hands can be used properly. Furthermore, the lower hand of the transfer robot 22 is configured to be able to reverse the wafer by rotating around its axis.

Since the load / unload unit 2 is an area where it is necessary to maintain the cleanest state, the load / unload unit 2 has a higher pressure inside the CMP apparatus, the polishing unit 3 and the cleaning unit 4 than the CMP apparatus. Always maintained. The polishing unit 3 is the most dirty region because slurry is used as the polishing liquid. Therefore, a negative pressure is formed inside the polishing unit 3, and the pressure is maintained lower than the internal pressure of the cleaning unit 4. The load / unload unit 2 is provided with a filter fan unit (not shown) having a clean air filter such as a HEPA filter, a ULPA filter, or a chemical filter. Clean air from which toxic gases have been removed is constantly blowing out.

<Polishing unit>
The polishing unit 3 is a region where the wafer is polished (flattened), and includes a first polishing unit 3A, a second polishing unit 3B, a third polishing unit 3C, and a fourth polishing unit 3D. The first polishing unit 3A, the second polishing unit 3B, the third polishing unit 3C, and the fourth polishing unit 3D are arranged along the longitudinal direction of the substrate processing apparatus as shown in FIG.

  As shown in FIG. 1, the first polishing unit 3A includes a polishing table 30A to which a polishing pad 10 having a polishing surface is attached, and polishing while holding the wafer and pressing the wafer against the polishing pad 10 on the polishing table 30A. A top ring 31A for polishing, a polishing liquid supply nozzle 32A for supplying a polishing liquid or a dressing liquid (for example, pure water) to the polishing pad 10, and a dresser 33A for dressing the polishing surface of the polishing pad 10. And an atomizer 34A for spraying a mixed fluid of liquid (for example, pure water) and gas (for example, nitrogen gas) or a liquid (for example, pure water) to the polishing surface in the form of a mist.

  Similarly, the second polishing unit 3B includes a polishing table 30B to which the polishing pad 10 is attached, a top ring 31B, a polishing liquid supply nozzle 32B, a dresser 33B, and an atomizer 34B. The third polishing unit 3C includes a polishing table 30C to which the polishing pad 10 is attached, a top ring 31C, a polishing liquid supply nozzle 32C, a dresser 33C, and an atomizer 34C. The fourth polishing unit 3D includes a polishing table 30D to which the polishing pad 10 is attached, a top ring 31D, a polishing liquid supply nozzle 32D, a dresser 33D, and an atomizer 34D.

  Since the first polishing unit 3A, the second polishing unit 3B, the third polishing unit 3C, and the fourth polishing unit 3D have the same configuration, the first polishing unit 31A will be described below.

  FIG. 2 is a perspective view schematically showing the first polishing unit 3A. The top ring 31 </ b> A is supported by the top ring shaft 36. A polishing pad 10 is affixed to the upper surface of the polishing table 30A, and the upper surface of the polishing pad 10 constitutes a polishing surface for polishing the wafer W. Note that fixed abrasive grains may be used in place of the polishing pad 10. The top ring 31 </ b> A and the polishing table 30 </ b> A are configured to rotate around their axial centers as indicated by arrows. The wafer W is held on the lower surface of the top ring 31A by vacuum suction. At the time of polishing, the polishing liquid is supplied from the polishing liquid supply nozzle 32A to the polishing surface of the polishing pad 10, and the wafer W to be polished is pressed against the polishing surface by the top ring 31A and polished.

Next, a transport mechanism for transporting the wafer will be described. As shown in FIG. 1, a first linear transporter 6 is disposed adjacent to the first polishing unit 3A and the second polishing unit 3B. The first linear transporter 6 has four transfer positions (first transfer position TP1, second transfer position TP2, and third transfer in order from the load / unload unit side) along the direction in which the polishing units 3A and 3B are arranged. This is a mechanism for transferring the wafer between the position TP3 and the fourth transfer position TP4.

  Further, the second linear transporter 7 is disposed adjacent to the third polishing unit 3C and the fourth polishing unit 3D. The second linear transporter 7 has three transfer positions (a fifth transfer position TP5, a sixth transfer position TP6, and a seventh transfer in order from the load / unload unit side) along the direction in which the polishing units 3C and 3D are arranged. This is a mechanism for transporting the wafer between the positions TP7.

  The wafer is transferred to the polishing units 3A and 3B by the first linear transporter 6. The top ring 31A of the first polishing unit 3A moves between the polishing position and the second transport position TP2 by the swing operation of the top ring head. Therefore, the wafer is transferred to the top ring 31A at the second transfer position TP2. Similarly, the top ring 31B of the second polishing unit 3B moves between the polishing position and the third transfer position TP3, and the delivery of the wafer to the top ring 31B is performed at the third transfer position TP3. The top ring 31C of the third polishing unit 3C moves between the polishing position and the sixth transfer position TP6, and the delivery of the wafer to the top ring 31C is performed at the sixth transfer position TP6. The top ring 31D of the fourth polishing unit 3D moves between the polishing position and the seventh transfer position TP7, and the delivery of the wafer to the top ring 31D is performed at the seventh transfer position TP7.

  A lifter 11 for receiving a wafer from the transfer robot 22 is disposed at the first transfer position TP1. The wafer is transferred from the transfer robot 22 to the first linear transporter 6 through the lifter 11. A shutter (not shown) is provided between the lifter 11 and the transfer robot 22 in the partition wall 1a. When the wafer is transferred, the shutter is opened so that the wafer is transferred from the transfer robot 22 to the lifter 11. It has become. A swing transporter 12 is disposed between the first linear transporter 6, the second linear transporter 7, and the cleaning unit 4. The swing transporter 12 has a hand that can move between the fourth transfer position TP4 and the fifth transfer position TP5, and transfers the wafer from the first linear transporter 6 to the second linear transporter 7. Is performed by the swing transporter 12. The wafer is transferred to the third polishing unit 3C and / or the fourth polishing unit 3D by the second linear transporter 7. Further, the wafer polished by the polishing unit 3 is conveyed to the cleaning unit 4 via the swing transporter 12.

<Washing unit>
FIG. 3A is a plan view showing the cleaning unit 4, and FIG. 3B is a side view showing the cleaning unit 4. As shown in FIGS. 3A and 3B, the cleaning unit 4 includes a first cleaning chamber 190, a first transfer chamber 191, a second cleaning chamber 192, a second transfer chamber 193, and a drying unit. It is partitioned into a chamber 194. In the first cleaning chamber 190, an upper primary cleaning module 201A and a lower primary cleaning module 201B arranged in the vertical direction are arranged. The upper primary cleaning module 201A is disposed above the lower primary cleaning module 201B. Similarly, in the second cleaning chamber 192, an upper secondary cleaning module 202A and a lower secondary cleaning module 202B arranged in the vertical direction are arranged. The upper secondary cleaning module 202A is disposed above the lower secondary cleaning module 202B. The primary and secondary cleaning modules 201A, 201B, 202A, and 202B are cleaning machines that clean the wafer using a cleaning liquid. Since these primary and secondary cleaning modules 201A, 201B, 202A, 202B are arranged along the vertical direction, there is an advantage that the footprint area is small.

A temporary wafer placement table 203 is provided between the upper secondary cleaning module 202A and the lower secondary cleaning module 202B. In the drying chamber 194, an upper drying module 205A and a lower drying module 205B arranged in the vertical direction are arranged. These upper drying module 205A and lower drying module 205B are isolated from each other. Filter fan units 207 and 207 for supplying clean air into the drying modules 205A and 205B are provided above the upper drying module 205A and the lower drying module 205B, respectively. The upper primary cleaning module 201A, the lower primary cleaning module 201B, the upper secondary cleaning module 202A, the lower secondary cleaning module 202B, the temporary placement table 203, the upper drying module 205A, and the lower drying module 205B are arranged on a frame (not shown). It is fixed via bolts.

  A first transfer robot (transfer mechanism) 209 that can move up and down is arranged in the first transfer chamber 191, and a second transfer robot 210 that can move up and down is arranged in the second transfer chamber 193. The first transfer robot 209 and the second transfer robot 210 are movably supported by support shafts 211 and 212 extending in the vertical direction. The first transfer robot 209 and the second transfer robot 210 have a drive mechanism such as a motor inside thereof, and are movable up and down along the support shafts 211 and 212. The first transfer robot 209 has two upper and lower hands like the transfer robot 22. As shown by the dotted line in FIG. 3A, the first transfer robot 209 is disposed at a position where the lower hand can access the temporary table 180 described above. When the lower hand of the first transfer robot 209 accesses the temporary table 180, a shutter (not shown) provided on the partition wall 1b is opened.

  The first transfer robot 209 transfers the wafer W between the temporary placing table 180, the upper primary cleaning module 201A, the lower primary cleaning module 201B, the temporary placing table 203, the upper secondary cleaning module 202A, and the lower secondary cleaning module 202B. Operates to carry. The first transfer robot 209 uses the lower hand when transferring the wafer before cleaning (the wafer to which the slurry is attached), and uses the upper hand when transferring the cleaned wafer. The second transfer robot 210 operates to transfer the wafer W between the upper secondary cleaning module 202A, the lower secondary cleaning module 202B, the temporary placement table 203, the upper drying module 205A, and the lower drying module 205B. Since the second transfer robot 210 transfers only the cleaned wafer, it has only one hand. The transfer robot 22 shown in FIG. 1 takes out the wafer from the upper drying module 205A or the lower drying module 205B using the upper hand, and returns the wafer to the wafer cassette. When the upper hand of the transfer robot 22 accesses the drying modules 205A and 205B, a shutter (not shown) provided on the partition wall 1a is opened.

<Improved user interface usability>
Next, improvement in usability of the user interface of the CMP apparatus will be described.

  FIG. 4 is a diagram illustrating the configuration of the display control apparatus and the CMP apparatus. As described above, the CMP apparatus includes a plurality of units such as the load / unload unit 2, the polishing unit 3, and the cleaning unit 4.

  The load / unload unit 2 is provided with a sequencer 260 for controlling the operations of a plurality of components 250-1 to 250-m (such as the transfer robot 22) in the load / unload unit 2. The load / unload unit 2 is provided with a plurality of sensors 270-1 to 270-a that detect data related to the control of the load / unload unit 2. The sensors 270-1 to 270-a include, for example, a sensor that detects whether or not a wafer is placed on the transfer robot 22.

The polishing unit 3 is provided with a sequencer 360 for controlling the operation of a plurality of components 350-1 to 350-n (polishing table, top ring, etc.) in the polishing unit 3. In addition, the polishing unit 3 is provided with a plurality of sensors 370-1 to 370-b that detect data related to the control of the polishing unit 3. The sensors 370-1 to 370-b include, for example, a sensor that detects the flow rate of the polishing liquid supplied to the polishing pad 10, a sensor that detects the rotational speed of the polishing table 30, and the rotational torque of the polishing table 30 or the top ring 31. And a sensor for detecting.

  The cleaning unit 4 is provided with a sequencer 460 for controlling operations of a plurality of components 450-1 to 450 -p (cleaning module, transfer robot, etc.) in the cleaning unit 4. Further, the cleaning unit 4 is provided with a plurality of sensors 470-1 to 470-c that detect data related to the control of the cleaning unit 4. The sensors 470-1 to 470-c include, for example, a sensor that detects the flow rate of the cleaning liquid supplied to the wafer.

  The control device 5 is connected to the load / unload unit 2 (sequencer 260), the polishing unit 3 (sequencer 360), and the cleaning unit 4 (sequencer 460). The control device 5 includes an input operation unit 512, a storage unit 514, a display unit 516, and a display control device 520.

  The input operation unit 512 is an input interface (for example, a mouse) for a user to execute various operations related to the CMP apparatus such as recipe editing. The storage unit 514 is a storage medium for storing various information such as the sizes and arrangement positions of a plurality of images displayed on the display unit 516. A display unit 516 is a user interface for displaying various data and allowing the user to perform various operations of the CMP apparatus.

  The display control device 520 includes a reception unit 522, a storage control unit 524, and a display control unit 526.

  The receiving unit 522 receives a software activation command related to the operation of the CMP apparatus. For example, when the user performs a software activation operation via the input operation unit 512, the reception unit 522 receives an activation instruction generated by the activation operation.

  The display control unit 526 reads an image corresponding to the activation command received by the reception unit 522 from the storage unit 514 and causes the display unit 516 to display the read image. Specifically, the image displayed on the display unit 516 includes a plurality of images having different functions (for example, a monitoring system image and an operation system image). In this case, the display control unit 526 reads the image size and arrangement position for each of the plurality of images from the storage unit 514, and displays each image based on the read image size and arrangement position. Be displayed on the part 516. In the present embodiment, an example of adjusting the size or position of the images related to the monitoring system image and the operation system image is shown, but the present invention is not limited to this.

  Further, the display control unit 526 can adjust the size or arrangement position of a plurality of images displayed on the display unit 516 based on the adjustment instruction input via the input operation unit 512. For example, when the input operation unit 512 is a mouse, when the user performs an operation of enlarging the size of the image displayed on the display unit 516 by drag & drop operation of the mouse, the display control unit 526 displays the enlargement input via the mouse. In accordance with the instruction, the image is displayed on the display unit 516 in an enlarged state. In addition, for example, when the user performs an operation of changing the arrangement position of the image displayed on the display unit 516 by the drag & drop operation of the mouse, the display control unit 526 displays the coordinates of the image according to the change instruction input via the mouse. And the image is displayed on the display unit 516 based on the changed coordinates.

The storage control unit 524 displays the sizes and arrangement positions of the plurality of images displayed on the display unit 516.
The plurality of images can be stored in the storage unit 514 in correspondence with the type of activation command that displayed the images. That is, each time the user starts the application software, it takes time to adjust the plurality of images to the optimum size and arrangement position. Therefore, the storage control unit 524 once adjusts the image size and arrangement position. The state can be stored in the storage unit 514.

  In this case, when the reception unit 522 receives the activation command, the display control unit 526 reads out the sizes and arrangement positions of a plurality of images corresponding to the types of activation commands received by the reception unit 522 from the storage unit. Then, the display control unit 526 causes the display unit 516 to display a plurality of images based on the read sizes and arrangement positions of the plurality of images. According to this, when the user starts the application software, a plurality of images are displayed in the state of the optimum size and arrangement position stored for the application software, so that the plurality of image sizes and arrangement positions are again displayed. There is no need to adjust the settings, making it easy to use.

  In addition, the storage control unit 524 inputs the size and arrangement position of the plurality of images displayed on the display unit 516 via the type of activation command that displayed the plurality of images and the input operation unit 512. It can be stored in the storage unit 514 in correspondence with the identifier. That is, the optimal size and arrangement position of a plurality of images may differ for each user. Accordingly, by storing the sizes and arrangement positions of a plurality of images corresponding to identifiers (for example, user names) input by the user, it is possible to save the optimum image sizes and arrangement positions for each individual user. Can do.

  In this case, when the reception unit 522 receives the activation command, the display control unit 526 has a plurality of images corresponding to the type of the activation command received by the reception unit 522 and the identifier input via the input operation unit 512. Is read from the storage unit 514. Then, the display control unit 526 can display a plurality of images on the display unit 516 based on the read sizes and arrangement positions of the plurality of images. According to this, when the user inputs an identifier (for example, a user name) when starting the application software, a plurality of images are displayed in the state of the size and arrangement position stored by the identifier. It is not necessary to adjust the size and arrangement state of the unique optimum image again, which is easy to use.

<Image adjustment example>
Adjustment of a plurality of images by the display control unit 526 will be described with reference to the drawings. FIG. 5 is a diagram illustrating an example of image display according to a conventional technique. 6 to 7 are diagrams illustrating examples of image display adjusted according to the present embodiment.

  As shown in FIG. 5, in the prior art, a title display image 602 is displayed at the top of the screen of the display unit 516, an operation menu image 604 is displayed at the left, and a main menu image 606 is displayed at the bottom. The title display image 602, the operation menu image 604, and the main menu image 606 constitute a base image 608 that is commonly used regardless of the type of software executed by the CMP apparatus. The title display image 602 is provided with operation buttons 661 for performing various operations related to the CMP apparatus. The operation menu image 604 is provided with operation buttons 662, 663, and 664 for performing various operations related to the CMP apparatus. The main menu image 606 is provided with operation buttons 665, 666, and 667 for performing various operations related to the CMP apparatus.

  On the screen of the display unit 516, the monitoring system image 620 and the operation system images 630, 640, and 650 are displayed in an area 610 excluding the title display image 602, the operation menu image 604, and the main menu image 606.

  Specifically, the monitoring system image 620 is displayed as the image 1 in the left half region of the region 610. The monitoring system image 620 is an image for the user to monitor the operating state of the CMP apparatus, for example. In the right half of the area 610, operation system images 630, 640, and 650 are displayed as image 2, image 3, and image 4. For example, the operation system image 630 is an image for the user to perform an operation related to the board. The operation system image 640 is an image for the user to perform an operation related to the carrier of the substrate. The operation system image 650 is an image for the user to perform an operation related to JOB.

  The CMP apparatus has various operation states such as process execution in each unit, automatic substrate transfer test, and assembly of the substrate processing apparatus, and application software is mounted for each operation. On the other hand, in the prior art, regardless of which application software is executed, the monitoring system image 620 is displayed in the left half area of the area 610 and the right half of the area 610, as shown in FIG. The operation system images 630, 640, and 650 are displayed in this area.

  On the other hand, in the present embodiment, the display control unit 526 can adjust the size or arrangement position of a plurality of images displayed on the display unit 516. For example, consider a state where the user mainly performs operations related to JOB while monitoring the operating state of the CMP apparatus (no operation related to the substrate or operation related to the substrate carrier). In this case, the display control unit 526 can expand the operation system image 650 of the image 4 to the entire area on the right half of the area 610 based on an adjustment instruction from the user, as shown in FIG.

  On the other hand, the user monitors the operating state of the CMP apparatus, but is not so important, and considers a state in which operations relating to the substrate, operations relating to the carrier of the substrate, and operations relating to JOB are mainly performed. In this case, the display control unit 526 reduces the size of the monitoring system image 620 of the image 1 based on the adjustment instruction from the user and operates the left half of the region 610 in the empty region as shown in FIG. The arrangement position of the system image 630 can be changed. Further, the display control unit 526 enlarges the operation system image 650 and moves the arrangement position upward in the right half area of the area 610 based on the adjustment instruction from the user, and is vacated by the movement of the operation system image 650. The arrangement position of the operation system image 640 can be moved downward.

  As described above, according to the present embodiment, the optimum image size and arrangement position can be adjusted by the user according to the type (operation state) of application software executed by the CMP apparatus. Usability regarding the user interface of the CMP apparatus can be improved.

  As shown in FIGS. 5 to 7, the plurality of images displayed on the display unit 516 include a base image 608 that is commonly used regardless of the type of application software activation command. The display control unit 526 can cause the display unit 516 to display the base image 608 with a fixed size and a fixed arrangement position regardless of the type of the activation command received by the reception unit 522. This is because the base image 608 is an image for operating the CMP apparatus regardless of the type of application software, and it is better to fix the size and arrangement position without changing the user interface. Because there is.

<Specific image adjustment example>
Next, a specific example of the image size and arrangement position according to the type of software (operation state) executed by the CMP apparatus will be described. FIG. 8 is a diagram illustrating an example of an image display when the assembly / adjustment of the CMP apparatus is executed.

  When assembling / adjusting a CMP apparatus, error information related to assembling / adjustment is monitored and multiple operations are performed. However, the importance of monitoring is not so high, and multiple operations are performed. The importance of the operation system image is high.

  Therefore, the display control unit 526 can adjust the size of the monitoring system image 620 for displaying the error information based on the user's adjustment instruction and arrange it at the lower left portion of the area 610 as shown in FIG. . In addition, the display control unit 526 can adjust the size of the operation system image 630 for operating each unit based on a user's adjustment instruction and arrange the operation system image 630 on the upper left side of the region 610. Further, the display control unit 526 can adjust the size of the operation system image 640 for editing manual parameters related to assembly / adjustment based on a user's adjustment instruction, and can arrange the size on the upper right side of the area 610. Further, the display control unit 526 can adjust the size of the operation system image 650 for editing the system parameters related to the assembly / adjustment based on the user's adjustment instruction, and arrange it on the upper right side of the area 610.

  Next, FIG. 9 is a diagram showing an example of image display when executing process processing in the unit of the CMP apparatus. When executing process processing, recipe editing and monitoring of various information related to process processing are performed, but the importance of recipe editing is not so high, and in comparison to this, various information related to process processing is monitored. high.

  Therefore, the display control unit 526 can adjust the size of the operation system image 630 for recipe editing and place it on the upper left side of the area 610 based on the user's adjustment instruction, as shown in FIG. In addition, the display control unit 526 can adjust the size of the monitoring system image 620 for monitoring the substrate transport state based on the user's adjustment instruction, and can arrange the monitoring system image 620 in the lower left portion of the region 610. In addition, the display control unit 526 can adjust the size of the monitoring system image 620 for monitoring the processing result of the process based on the adjustment instruction of the user and arrange the monitoring system image 620 on the upper right side of the region 610. Further, the display control unit 526 can adjust the size of the monitoring system image 620 for monitoring the state of the consumable member based on the user's adjustment instruction, and arrange it at the lower right side of the region 610.

  Next, FIG. 10 is a diagram illustrating an example of an image display when the automatic transfer test of the substrate of the CMP apparatus is executed. When executing the automatic transfer test of the board, the load port is operated and various information related to the automatic transfer of the board is monitored. However, the importance of the operation of the load port is not so high. The importance of monitoring various information related to automatic conveyance is high.

  Therefore, the display control unit 526 adjusts the size of the monitoring system image 620 for monitoring the substrate transport status and arranges it on the upper left side of the area 610 based on the user's adjustment instruction, as shown in FIG. Can be made. Further, the display control unit 526 can adjust the size of the monitoring system image 620 for monitoring error information related to the automatic conveyance of the substrate based on the adjustment instruction of the user and arrange the monitoring system image 620 in the lower left portion of the region 610. . In addition, the display control unit 526 can adjust the size of the operation system image 630 for operating the load port based on the user's adjustment instruction and arrange it on the upper right side of the region 610. In addition, the display control unit 526 adjusts the size of the monitoring image 620 for monitoring information related to the JOB operation for automatic substrate transfer based on the user's adjustment instruction, and arranges the size on the lower right side of the region 610. Can do.

Next, FIG. 11 is a diagram illustrating an example of image display when a trouble occurs during the process processing of the CMP apparatus. When trouble occurs during process processing, system parameters are edited and process processing results and error information are monitored, but the importance of editing system parameters is not so high. Monitoring of processing results and error information is very important.

  Therefore, the display control unit 526 adjusts the size of the monitoring system image 620 for monitoring the process processing result and arranges it on the left side of the region 610 based on the user's adjustment instruction, as shown in FIG. Can do. In addition, the display control unit 526 can adjust the size of the monitoring system image 620 for monitoring error information based on the user's adjustment instruction and arrange it on the upper right side of the region 610. In addition, the display control unit 526 can adjust the size of the operation system image 630 for operating the system parameters based on a user's adjustment instruction and arrange the operation system image 630 in the lower right portion of the area 610.

<Flowchart>
Next, processing executed by the display control device 520 will be described. 12 and 13 are flowcharts of processing executed by the display control device 520. FIG. FIG. 12 and FIG. 13 are examples in which a user-specific identifier is used to adjust a plurality of images and to reproduce the optimum image layout for each user in an easy-to-use manner. FIG. 12 assumes a case where a plurality of images have not been adjusted yet, and default values of the sizes and arrangement positions of the plurality of images are stored in the storage unit 514.

  As shown in FIG. 12, first, the receiving unit 522 receives an application software activation command (step S101). The application software activation instruction is generated, for example, when the user performs an application software activation operation via the input operation unit 512.

  Subsequently, the display control unit 526 reads from the storage unit 514 default values of a plurality of image sizes and arrangement positions corresponding to the activation command received by the reception unit 522 (step S102). Subsequently, the display control unit 526 displays a plurality of images on the display unit 516 based on the read image size and the default value of the arrangement position (step S103).

  Subsequently, the display control unit 526 adjusts the size and arrangement position of the plurality of images based on the user's adjustment instruction input via the input operation unit 512 (step S104).

  Subsequently, when an image save instruction and a save name are input via the input operation unit 512, the storage control unit 524 attaches the input save name to the storage unit 514 with the sizes and arrangement positions of the plurality of images. Save (step S105).

  Through the above processing, the sizes and arrangement positions of a plurality of images are adjusted, and the state is associated with the storage name and stored in the storage unit 514.

  Next, FIG. 13 assumes a case in which application software is activated in a state where a plurality of images are adjusted and the size and arrangement position of the adjusted images are stored in the storage unit 514.

  As shown in FIG. 13, first, the receiving unit 522 receives an application software activation command (step S201). The application software activation instruction is generated, for example, when the user performs an application software activation operation via the input operation unit 512.

Subsequently, the input operation unit 512 receives an input of a storage name from the user (step S20).
2). Subsequently, the display control unit 526 reads, from the storage unit 514, the sizes and arrangement positions of a plurality of images corresponding to the activation command received by the receiving unit 522 and the storage name received by the input operation unit 512. (Step S203).

  Subsequently, the display control unit 526 displays a plurality of images on the display unit 516 based on the read image size and arrangement position (step S204).

  According to the above processing, when the user inputs an identifier (for example, a user name) when starting the application software, a plurality of images are displayed in the size and arrangement position stored by the identifier. There is no need to readjust the optimal image size and arrangement specific to the user, which is convenient.

  Next, another example of processing executed by the display control device 520 will be described. 14 and 15 are flowcharts of processing executed by the display control device 520. FIG. FIG. 14 and FIG. 14 are examples in which a plurality of images are adjusted and the optimum image layout for each application is reproduced with ease. FIG. 14 assumes a case where a plurality of images have not yet been adjusted, and default values of the sizes and arrangement positions of the plurality of images are stored in the storage unit 514.

  As shown in FIG. 14, first, the receiving unit 522 receives an application software activation instruction (step S301). The application software activation instruction is generated, for example, when the user performs an application software activation operation via the input operation unit 512.

  Subsequently, the display control unit 526 reads from the storage unit 514 default values of a plurality of image sizes and arrangement positions corresponding to the activation command received by the reception unit 522 (step S302). Subsequently, the display control unit 526 displays a plurality of images on the display unit 516 based on the read image size and the default value of the arrangement position (step S303).

  Subsequently, the display control unit 526 adjusts the sizes and arrangement positions of the plurality of images based on the user's adjustment instruction input via the input operation unit 512 (step S304).

  Subsequently, when an image save instruction is input via the input operation unit 512, the storage control unit 524 has a plurality of image sizes and arrangements corresponding to the type of application software (start command) that is currently started. The position is stored in the storage unit 514 (step S305).

  Through the above processing, the sizes and arrangement positions of a plurality of images are adjusted, and the state is associated with the type of application software (startup command) and stored in the storage unit 514.

  Next, FIG. 15 assumes a case in which application software is activated in a state where a plurality of images are adjusted and the size and arrangement position of the adjusted images are stored in the storage unit 514.

  As shown in FIG. 15, the receiving unit 522 first receives an application software activation command (step S401). The application software activation instruction is generated, for example, when the user performs an application software activation operation via the input operation unit 512.

Subsequently, the display control unit 526 reads out the sizes and arrangement positions of a plurality of images corresponding to the type of the activation command received by the reception unit 522 from the storage unit 514 (Step S402).

  Subsequently, the display control unit 526 displays a plurality of images on the display unit 516 based on the read image size and arrangement position (step S403).

  According to the above processing, when the user activates the application software, a plurality of images are displayed with the optimum size and arrangement position stored for the application software. There is no need to adjust the placement position, making it easy to use.

512 Input operation unit 514 Storage unit 516 Display unit 520 Display control device 522 Reception unit 524 Storage control unit 526 Display control unit 608 Base image 620 Monitoring system image 630, 640, 650 Operation system image

Claims (5)

A receiving unit for receiving a software activation command related to the operation of the substrate processing apparatus;
A display control unit that reads a plurality of images having different functions corresponding to the activation command received by the reception unit from the storage unit, and displays the read plurality of images on the display unit;
The display control unit is configured to be able to adjust the size or arrangement position of a plurality of images displayed on the display unit based on an adjustment instruction input via the input operation unit.
A display control device characterized by that. The display control device according to claim 1,
A storage control unit that stores the size and arrangement position of the plurality of images displayed on the display unit in the storage unit in association with the type of the start command that displayed the plurality of images;
The display control unit reads the size and arrangement position of a plurality of images corresponding to the type of activation command received by the reception unit from the storage unit, and the size and arrangement position of the plurality of images read out And displaying the plurality of images on the display unit,
A display control device characterized by that. The display control device according to claim 1 or 2,
The size and arrangement position of the plurality of images displayed on the display unit are stored in correspondence with the type of activation command that displays the plurality of images and the identifier input via the input operation unit. Further comprising a storage control unit for storing in the unit,
The display control unit stores, from the storage unit, the sizes and arrangement positions of a plurality of images corresponding to the type of activation command received by the receiving unit and the identifier input via the input operation unit. Reading, and displaying the plurality of images on the display unit based on the size and arrangement position of the plurality of read-out images,
A display control device characterized by that. The display control device according to any one of claims 1 to 3,
The plurality of images include a base image that is commonly used regardless of the type of the activation command,
The display control unit causes the display unit to display the base image at a fixed size and a fixed arrangement position regardless of the type of the start command received by the receiving unit.
A display control device characterized by that. A display control device according to any one of claims 1 to 4,
A polishing unit for polishing a substrate;
A cleaning unit for cleaning and drying the substrate;
A load / unload unit that delivers a substrate to the polishing unit and receives a substrate that has been cleaned and dried by the cleaning unit;
A substrate processing apparatus comprising:

Images