JP2015087115A5 - - Google Patents

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Publication number
JP2015087115A5
JP2015087115A5 JP2013223134A JP2013223134A JP2015087115A5 JP 2015087115 A5 JP2015087115 A5 JP 2015087115A5 JP 2013223134 A JP2013223134 A JP 2013223134A JP 2013223134 A JP2013223134 A JP 2013223134A JP 2015087115 A5 JP2015087115 A5 JP 2015087115A5
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JP
Japan
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neutron
energy
reaction
gamma ray
radiation
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JP2013223134A
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English (en)
Japanese (ja)
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JP2015087115A (ja
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Priority to JP2013223134A priority Critical patent/JP2015087115A/ja
Priority claimed from JP2013223134A external-priority patent/JP2015087115A/ja
Publication of JP2015087115A publication Critical patent/JP2015087115A/ja
Publication of JP2015087115A5 publication Critical patent/JP2015087115A5/ja
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JP2013223134A 2013-10-28 2013-10-28 中性子数分析装置および放射線計測装置 Pending JP2015087115A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013223134A JP2015087115A (ja) 2013-10-28 2013-10-28 中性子数分析装置および放射線計測装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013223134A JP2015087115A (ja) 2013-10-28 2013-10-28 中性子数分析装置および放射線計測装置

Publications (2)

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JP2015087115A JP2015087115A (ja) 2015-05-07
JP2015087115A5 true JP2015087115A5 (ru) 2016-08-18

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JP2013223134A Pending JP2015087115A (ja) 2013-10-28 2013-10-28 中性子数分析装置および放射線計測装置

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JP (1) JP2015087115A (ru)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170099908A (ko) 2014-12-25 2017-09-01 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, 수지, 리소그래피용 하층막 형성 재료, 리소그래피용 하층막, 패턴 형성방법 및 정제방법
JP6766803B2 (ja) 2015-03-31 2020-10-14 三菱瓦斯化学株式会社 レジスト組成物、レジストパターン形成方法、及びそれに用いるポリフェノール化合物
SG11201706306SA (en) 2015-03-31 2017-09-28 Mitsubishi Gas Chemical Co Compound, resist composition, and method for forming resist pattern using it
KR20180048733A (ko) 2015-08-31 2018-05-10 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 리소그래피용 하층막 형성재료, 리소그래피용 하층막 형성용 조성물, 리소그래피용 하층막 및 그 제조방법, 패턴형성방법, 수지, 그리고 정제방법
US11137686B2 (en) 2015-08-31 2021-10-05 Mitsubishi Gas Chemical Company, Inc. Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
JP6848869B2 (ja) * 2015-09-10 2021-03-24 三菱瓦斯化学株式会社 化合物、樹脂、レジスト組成物又は感放射線性組成物、レジストパターン形成方法、アモルファス膜の製造方法、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、回路パターンの形成方法、及び、精製方法
CN107247286B (zh) * 2017-05-16 2019-06-07 北京大学 一种快中子能谱测量系统及方法
CN113126141A (zh) * 2019-12-31 2021-07-16 南京即衡科技发展有限公司 一种便携式中子及伽马射线剂量测量装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4090083A (en) * 1976-10-14 1978-05-16 Combustion Engineering, Inc. Nuclear reactor ex-core startup neutron detector
JPS56114382A (en) * 1980-02-15 1981-09-08 Nippon Telegr & Teleph Corp <Ntt> Neutron detecting device of semiconductor
JPS5770197U (ru) * 1980-10-17 1982-04-27
JPS5785269A (en) * 1980-11-18 1982-05-27 Fuji Electric Co Ltd Semiconductor radiation detector
JPS57151882A (en) * 1981-03-14 1982-09-20 Nippon Atom Ind Group Co Ltd Neutron counting device for nuclear fusion reactor
JPS61176876A (ja) * 1985-01-31 1986-08-08 Nippon Atom Ind Group Co Ltd 使用済燃料集合体の放射線測定装置
JPH0836058A (ja) * 1994-07-22 1996-02-06 Matsushita Electric Ind Co Ltd ポケット線量計の感度チェック装置
JP2001349951A (ja) * 2000-06-07 2001-12-21 ▲高▼野 直人 中性子検出装置
WO2013066882A1 (en) * 2011-11-01 2013-05-10 Slaughter David M Neutron spectrometer

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