JP2015072827A - Organic electroluminescence display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an organic El display device capable of suppressing parallax color mixture due to leakage of light to adjoining pixels and obtaining high efficiency of light extraction.SOLUTION: The organic EL display device includes: an organic EL element substrate having an organic EL element in which a back electrode layer, an organic El layer having at least a light-emitting layer, a transparent electrode layer, and a light-shielding part are disposed in this order on a support substrate; a color filter layer having color layers of a plurality of colors and an inter-pixel light-shielding part disposed between the color layers of the plurality of colors, on a transparent substrate; and a resin adhesive layer disposed between the organic El element substrate and the color filter layer. The light-shielding part is disposed, in a plan view, at least inside an outer circumference of a pixel part segmented by the inter-pixel light-shielding part.

Description

  The present invention relates to an organic electroluminescence display device capable of suppressing parallax color mixing due to light leakage to adjacent pixels and obtaining high light extraction efficiency.

  The organic electroluminescence display device has high visibility due to self-coloring, it is an all-solid-state display unlike a liquid crystal display device, so it has excellent impact resistance, has a fast response speed, is less affected by temperature changes, In addition, it has attracted attention because of its advantages such as a large viewing angle, and research and development and commercialization are being promoted as flat panel displays following liquid crystal display devices and plasma displays. Hereinafter, electroluminescence may be abbreviated as EL.

  The organic EL display device can be broadly divided into three colors, a color conversion method, and a color filter method. The three-color coating method uses a red, green, and blue light-emitting layer, the color conversion method uses a blue light-emitting layer to combine the color conversion layers, and the color filter method uses a white light-emitting layer. It is a method of using and combining color filters. In the three-color painting method, a color filter may be used in combination to increase color purity.

In an organic EL display device using a color filter, a colored layer is disposed for each pixel in the color filter, a light emitting layer is disposed for each pixel in the organic EL element, and the pixel element is controlled and driven by a TFT element. In such an organic EL display device, since there is usually a gap between the color filter and the organic EL element, light from the light emitting layer in a certain pixel region directly enters the colored layer in the adjacent pixel region. Alternatively, light leaks to adjacent pixels such as passing through the colored layer of the pixel region and entering the colored layer of the adjacent pixel region, and this causes a color shift of the display image, so-called parallax color mixing depending on the viewing direction. It has occurred. This is because the light emitted from the organic EL element has no directivity and has a problem of poor viewing angle characteristics.
Here, in general, in a color filter, a light shielding portion (hereinafter referred to as an inter-pixel light shielding portion) is formed between colored layers in order to define pixels. Therefore, when the light from the light emitting layer in a certain pixel region passes through the colored layer in that pixel region and enters the colored layer in the adjacent pixel region, it is absorbed or reflected by the inter-pixel light shielding portion located between the colored layers. Or absorbed when passing through the two colored layers, so that most of the light is absorbed without being emitted. Therefore, in particular, the direct incidence of light from the light emitting layer of a certain pixel region as leakage light on the colored layer of the adjacent pixel region greatly affects the parallax color mixing of the display image.

As a method of preventing light leakage to the adjacent pixels described above, for example, in a color filter, in order to prevent color mixture due to oblique light, a black matrix is interposed between adjacent color filters as an inter-pixel light-shielding portion, and the height is increased. Has been disclosed (see Patent Document 1). Patent Document 1 relates to a method for preventing color mixing in a liquid crystal display device.
Here, in general, the black matrix has sufficient light shielding properties and is formed by a photolithography method. However, in the case of a black matrix having a height higher than that of a color filter, since it is light-shielding and thick, exposure light cannot reach the deep part of the film, and patterning is very difficult. there were. For this reason, studies have been made on methods for preventing light leakage other than those described above.

  As another method for preventing light leakage to adjacent pixels, for example, there is a method of increasing the line width of the inter-pixel light shielding portion of the color filter. In this method, since it is not necessary to form the inter-pixel light-shielding portion in a thick film as described above, patterning can be easily performed. However, in this case, there is a problem that the energy efficiency of the organic EL display device is lowered because the pixel aperture ratio is lowered. In recent years, along with demands for higher definition and higher quality of displays, reduction of pixel size and reduction of line width of light shielding portions between pixels have been promoted, and this method is contrary to these requirements.

  On the other hand, on the organic EL element side, a method of making the line width of the organic EL element smaller than the line width of the colored layer for each pixel region has been studied. This is because the light irradiation range becomes narrow according to the line width of the light emitting layer in the organic EL element, so that the leaked light is incident on the adjacent pixel region even if the inter-pixel light shielding portion on the color filter side is narrow. As a result, occurrence of parallax color mixture is suppressed. However, in this case, there is a problem in that the light reflected by the back electrode layer of the organic EL element is incident on the adjacent pixel region, so that a sufficient effect for improving the viewing angle characteristics cannot be obtained. In addition, since the amount of light emission is relatively reduced due to the reduction in the size of the organic EL element, the luminance is lowered, and a large power consumption is required to secure a desired luminance. There was a problem of shortening the life.

JP 2010-72513 A

  The present invention has been made in view of the above problems, and provides an organic electroluminescence display device capable of suppressing parallax color mixing due to light leakage to adjacent pixels and obtaining high light extraction efficiency. Main purpose.

  In order to solve the above problems, the present invention provides an organic EL device having an organic EL device in which a back electrode layer, an organic EL layer having at least a light emitting layer, a transparent electrode layer, and a light shielding portion are arranged in this order on a support substrate. An element substrate, a color filter layer having a plurality of colored layers and an inter-pixel light shielding portion disposed between the colored layers of the plurality of colors on the transparent substrate, and disposed between the organic EL element substrate and the color filter layer An organic EL display device comprising: a resin adhesive layer, wherein the light shielding portion is disposed at least inside the outer periphery of the pixel portion defined by the inter-pixel light shielding portion in a plan view. An organic EL display device is provided.

  According to the present invention, the light shielding portion disposed on the transparent electrode layer is disposed on the inner side of the outer periphery of the pixel portion in plan view, thereby not only shielding light leaking to adjacent pixels but also organic EL. Light emitted in a region overlapping the light shielding portion of the layer in plan view can be used for light emission of the corresponding pixel portion. Thereby, it is possible to improve the light extraction efficiency while preventing the occurrence of parallax color mixing in the organic EL display device.

  In the said invention, it is preferable that the said light-shielding part is an absorption type light-shielding part which absorbs the light from the said organic EL layer at least. This is because light leaking to adjacent pixels is sufficiently absorbed by the absorption-type light shielding portion, and the occurrence of color parallax can be prevented.

  In the said invention, it is preferable that the said light shielding part is a reflective light shielding part which reflects the light from the said organic EL layer at least. By using the reflective light shielding portion, light from the organic EL layer is reflected on the bottom or side surface of the reflective light shielding portion, and the reflected light can be used for light emission of the pixel portion corresponding to the organic EL layer. This is because it is possible not only to prevent the incident on adjacent pixels and the occurrence of parallax color mixing, but also to further improve the light emission amount and the light extraction efficiency.

  In the said invention, it is preferable that the said light-shielding part is a wavelength selection type light-shielding part which light-shields light other than the wavelength light of the color of the said colored layer in the said adjacent pixel part among the light from the said organic EL layer. . By adopting the wavelength selection type light-shielding part, only the wavelength light of the color of the colored layer in the adjacent pixel is transmitted and the other wavelength light is shielded out of the light from the organic EL layer. This is because color mixing is less likely to occur, and the light extraction efficiency in the adjacent pixel region can be improved.

  In the present invention, a small number of light-shielding portions arranged on the transparent electrode layer are arranged inside the outer periphery of the pixel portion in plan view, thereby suppressing parallax color mixing due to light leakage to adjacent pixels and high Since the light extraction efficiency can be obtained, there is an effect that it is possible to realize low power consumption and long life of the organic EL element.

It is a schematic sectional drawing which shows an example of the organic electroluminescent display apparatus of this invention. It is the disassembled perspective view and schematic plan view which show the other example of the organic electroluminescence display of this invention. It is explanatory drawing for demonstrating the function of the light-shielding part in this invention. It is a schematic sectional drawing which shows the other example of the organic electroluminescent display apparatus of this invention.

  Hereinafter, the organic EL display device of the present invention will be described in detail.

  An organic EL display device of the present invention includes a back electrode layer, an organic EL layer having at least a light emitting layer, a transparent electrode layer, and an organic EL element substrate having an organic EL element arranged in this order on a support substrate, A color filter layer having a plurality of color layers and an inter-pixel light-shielding portion disposed between the color layers, and a resin disposed between the organic EL element substrate and the color filter layer on a transparent substrate; The light-shielding part is arranged at least inside the outer periphery of the pixel part defined by the inter-pixel light-shielding part in plan view.

The organic EL display device of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic sectional view showing an example of the organic EL display device of the present invention. As shown in FIG. 1, the organic EL display device 10 includes an organic EL element substrate 1 and a color filter layer 11 arranged via a resin adhesive layer 21. The organic EL element substrate 1 has a back electrode layer 4, an organic EL layer 5 including at least a light emitting layer, a transparent electrode layer 6, and a light shielding portion 7 as an organic EL element 3 on a support substrate 2. There is a non-light emitting area 8 between the EL elements 3. The non-light emitting area 8 is usually provided with a TFT element, an insulating layer, and the like. On the other hand, the color filter layer 11 is disposed between the colored layer 14 in which the red colored layer 14R, the green colored layer 14G, and the blue colored layer 14B are arranged on the transparent substrate 12, and between the colored layers 14, and the pixel portion P and the pixel And an inter-pixel light shielding portion 13 that defines the region Q.
In the organic EL display device 10 of the present invention, the light shielding portion 7 on the transparent electrode layer 6 is disposed at least inside the outer periphery of the pixel portion P in plan view. FIG. 1 shows a mode in which the light shielding portion 7 is arranged so as to cover the outer periphery of the pixel portion P.

  FIG. 2A is an exploded perspective view showing another example of the organic EL display device of the present invention, and FIG. 2B is a schematic plan view thereof. In the organic EL display device of FIG. 2, configurations other than the organic EL layer of the organic EL element substrate, the non-light emitting area and the light shielding portion, the color layer of the color filter layer, the interpixel light shielding portion, and the pixel portion are illustrated. Is omitted. As shown in FIG. 2, in the organic EL display device 10, the colored layers 14 R, 14 G and 14 B in the color filter layer 11 correspond to the organic EL layers 5 a, 5 b and 5 c in the organic EL element substrate 1, respectively. The pixel portion P and the pixel region are each defined by the inter-pixel light-shielding portion 13. The light shielding part 7 is arranged inside the outer periphery of the pixel part P in the plan view X, and the light shielding part 7 further covers the entire surface of the non-light emitting area 8 in FIG.

In the present invention, “pixel” or “pixel portion” is a minimum unit constituting an image. For example, when one pixel is composed of three sub-pixels of red, green, and blue, in the present invention, one sub-pixel is referred to as “pixel” or “pixel portion”. Specifically, as shown in FIG. 1, the organic EL display device 10 includes a colored layer 14 composed of a red colored layer 14R, a green colored layer 14G, and a blue colored layer 14B, and the colored layer 14 is between pixels. The pixel portion P is defined by the light shielding portion 13. Note that a pixel portion adjacent to one pixel portion may be referred to as an “adjacent pixel”.
Further, the “pixel region” refers to a region where a pixel portion and an organic EL element corresponding to the pixel portion are arranged. For example, when one pixel is composed of three subpixels of red, green, and blue, an area in which one subpixel is arranged is referred to as a “pixel area”. Specifically, as shown in FIG. 1, the color filter layer 11 has a colored layer 14 composed of a red colored layer 14R, a green colored layer 14G, and a blue colored layer 14B. The pixel region Q includes the pixel portion P defined by the portion 13 and the organic EL element 3 corresponding to each pixel portion P.

According to the present invention, the light shielding portion disposed on the transparent electrode layer is disposed at least inside the outer periphery of the pixel portion in plan view, thereby not only shielding light leaking to adjacent pixels but also organic Light emitted in a region overlapping the light shielding portion of the EL layer in plan view can be used for light emission of the corresponding pixel portion. For this reason, it is possible to obtain high light extraction efficiency while suppressing the occurrence of parallax color mixing in the organic EL display device.
Note that the inside of the outer periphery of the pixel portion refers to the colored layer side with respect to the outer periphery of the region defined by the inter-pixel light shielding portion.

Here, the light-shielding part in this invention needs to be arrange | positioned on a transparent electrode layer. Note that “the light-shielding portion is disposed on the transparent electrode layer” means that a protective film, an insulating film is provided between the transparent electrode layer and the light-shielding portion, in addition to the aspect having the light-shielding portion directly on the surface of the transparent electrode layer. The aspect which interposes other layers which comprise organic EL elements, such as a film | membrane, is also included.
Hereinafter, the reason why the light shielding portion is arranged as described above will be described.
FIG. 3 is an explanatory diagram for explaining the function of the light shielding portion in the present invention. Reference numerals not described in FIG. 3 are the same as those in FIG.
As a method for shielding light leaking to adjacent pixels by the light shielding portion, for example, as shown in FIG. 3B, the line width of the organic EL element 3 is made smaller than the line width of the colored layer 14 without providing the light shielding portion. There is a way. In this case, since the light irradiation range B of the emitted light L1 from the organic EL layer 5 in the pixel region Q1 overlaps with the corresponding pixel portion P1, but does not overlap with the adjacent pixel portion P2, the leaked light is emitted from the pixel portion P2. Thus, the occurrence of parallax color mixture can be prevented. However, in this case, since the light emitting region of the organic EL element is reduced, the amount of light incident on the corresponding pixel portion is reduced, and there is a problem that the light emission amount and the light extraction efficiency are lowered. In addition, since the light emitting area of the organic EL element is reduced, it is necessary to increase the amount of power consumption to ensure the light emission amount in order to make the corresponding pixel portion emit light with a desired luminance. It is guessed that it leads to.
On the other hand, in the present invention, as shown in FIG. 3A, the light shielding part 7 is provided on the transparent electrode layer 6 so that the leakage light L2 incident on the adjacent pixel part P2 is shielded by the light shielding part 7. Can do. Further, since the organic EL layer 5 in the region A where the light shielding portion 7 is disposed is in contact with the transparent electrode layer 6, light emission is possible. That is, the light emitting region of the organic EL element 3 is not reduced, and a part of the light L3 from the region A can be incident on the corresponding pixel portion P1 together with the light L1 from other than the region A. The light extraction efficiency can be improved.
As described above, the present invention has made it possible to both suppress the occurrence of parallax color mixing and improve the light extraction efficiency of the organic EL display device.

  In addition, as a method of shielding light leakage by providing a light shielding part, when the light shielding part is provided directly on the organic EL layer so as to be inside the outer periphery of the pixel part in a plan view, not on the transparent electrode layer described above. In the region where the light-shielding portion of the organic EL layer is provided, no light emission occurs because the transparent electrode layer cannot be provided on the upper surface. That is, in this case, the light emitting region is reduced as in FIG. 3B described above, and the light emission amount and the light extraction efficiency in the pixel region are reduced, and the organic EL element is shortened. Therefore, the light shielding part needs to be disposed on the transparent electrode layer.

  Hereinafter, each configuration in the organic EL display device of the present invention will be described.

1. Organic EL Element Substrate The organic EL element substrate in the present invention has an organic EL element in which a back electrode layer, an organic EL layer having at least a light emitting layer, a transparent electrode layer, and a light shielding portion are arranged in this order on a support substrate. In the plan view, the light shielding part is at least arranged inside the outer periphery of the pixel part defined by the inter-pixel light shielding part.

(1) Organic EL element The organic EL element in this invention has a back electrode layer, an organic EL layer, a transparent electrode layer, and a light-shielding part at least. The organic EL layer has at least a light emitting layer.

The organic EL element may emit white light or may emit each color such as red, green, and blue, but preferably emits white light. The configuration of the present invention is useful because white light-emitting type organic EL display devices are likely to cause parallax color mixing due to light leakage to adjacent pixels.
Hereinafter, each structure in an organic EL element is demonstrated.

(A) Light-shielding part The light-shielding part is on the transparent electrode layer and is disposed at least inside the outer periphery of the pixel part defined by the inter-pixel light-shielding part in plan view.
The light shielding part is not particularly limited as long as it can absorb or reflect part or all of the leaked light incident on the adjacent pixel and can prevent the occurrence of parallax color mixing in the adjacent pixel.
Hereinafter, for the light shielding portion, an absorption type light shielding portion that absorbs at least light from the organic EL layer, a reflective light shielding portion that reflects at least light from the organic EL layer, and an adjacent pixel portion among the light from the organic EL layer The wavelength selection type light shielding unit that shields light other than the wavelength light of the color of the colored layer in FIG.

(I) Absorption type light shielding part In this invention, it is preferable that a light shielding part is an absorption type light shielding part which absorbs the light from an organic EL layer at least. This is because leakage light to adjacent pixels is sufficiently absorbed, and the occurrence of parallax color mixing can be prevented.

  The absorption type light-shielding part is preferably one that can sufficiently absorb light leaking to adjacent pixels. Among these, those having an optical density (OD) of 3.0 or more are preferable. As such an absorption type light shielding part, for example, a material in which a black color material is dispersed in a binder resin is used. The optical density (OD) can be measured by, for example, a spectrocolorimeter and the optical density can be calculated from the spectral Y value. As the spectrocolorimeter, a spectrocolorimeter manufactured by OLYMPUS Co., Ltd. can be used.

  Examples of the black color material include carbon black and titanium black. These may be used alone or in a mixture of two or more.

Moreover, you may make a black color material contain another colored color material. This is because the light transmittance characteristic in the absorption type light shielding portion can be adjusted.
Examples of the other color materials include red, green, blue, yellow, orange, and purple color materials. As the colored material, both pigments and dyes can be used.
Colored color materials may be used singly or in combination of two or more. The colored color material may be a single color material or a mixture of two or more color materials.
The specific material of the colored material of each color can be the same as that usually used for the colored layer of the color filter.

  About binder resin, it selects suitably according to the formation method of an absorption type light shielding part. In the case where the forming method is a photolithography method, as the binder resin, for example, a photosensitive resin having a reactive vinyl group such as an acrylate type, a methacrylate type, a polyvinyl cinnamate type, or a cyclized rubber type is used. In the case of a printing method or inkjet method, examples of the binder resin include polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, Examples include melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin and the like.

  The absorption type light-shielding part may contain a photopolymerization initiator, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like as necessary.

  The light absorbed by the absorption type light-shielding part may include reflected light from the back electrode layer and the like, external light incident from the color filter layer side, in addition to the light emitted from the organic EL layer.

(Ii) Reflective light shielding part In the present invention, the light shielding part is preferably a reflective light shielding part that reflects at least light from the organic EL layer. By reflecting the light from the organic EL layer at the bottom surface (surface on the transparent electrode layer side) or the side surface of the reflective light shielding portion, the reflected light can be incident on the pixel portion corresponding to the organic EL layer. For this reason, it is possible not only to prevent the leakage light from entering adjacent pixels and the generation of color parallax, but also to further improve the light emission amount and the light extraction efficiency by using the reflected light.
In addition, the light reflected in the reflective light shielding unit may include reflected light on the back electrode layer and the like in addition to the emitted light on the organic EL layer.

  The reflective light-shielding part preferably has a reflectivity that can sufficiently reflect light from the organic EL layer. Specifically, it is preferable to use a material having a reflectance of 60% or more, and a material having a reflectance of 70% or more is particularly preferable. The reflectance is a value measured by the method described in JIS 8714.

  Examples of the material of the reflective light-shielding part having such a reflectivity include single metals such as silver, aluminum, chromium, molybdenum, titanium, and nickel, and alloys such as aluminum alloy and magnesium alloy. These may be used alone or in combination of two or more, but a combination in which a battery reaction occurs between two or more metals is not suitable.

Further, the reflection type light shielding portion may be a laminate of a metal film and a metal compound film. By setting it as the said laminated body, in addition to the function to reflect the light from an organic electroluminescent layer, a reflection type light-shielding part can have a function to absorb external light.
Specifically, when the reflective light-shielding portion is a laminate of a metal film and a metal compound film, the organic EL layer is formed on the side surface and the bottom surface by having the metal film on the side surface and the bottom surface and the metal compound film on the top surface. By reflecting the light from the color filter layer, it is possible to prevent the occurrence of parallax color mixing and to improve the light extraction efficiency. Deterioration can be suppressed.
Examples of the metal film in the laminate include films made of the above-described metal materials.
The metal compound film includes a metal oxide film such as a chromium oxide film, an aluminum oxide film, a magnesium oxide film, a titanium oxide film, a tin oxide film, an indium oxide alloy film, a chromium nitride film, an aluminum nitride film, and a titanium nitride film. And the like.

(Iii) Wavelength-selective light-shielding part In the present invention, the light-shielding part shields light other than the wavelength light of the color of the colored layer in the adjacent pixel part from the light from the organic EL layer. It is preferable that By adopting the wavelength selection type light-shielding part, only the wavelength light of the color of the colored layer in the adjacent pixel is transmitted among the light from the organic EL layer, and the other wavelength light is shielded. This is because color mixing is less likely to occur, and the light extraction efficiency in the adjacent pixel region can be improved.

  For the wavelength selection type light-shielding part, specifically, when a pixel region having a red coloring layer in the pixel portion and a pixel region having a blue coloring layer in the pixel portion are adjacent, the wavelength selection type in the pixel region having a red coloring layer The light-shielding part transmits only blue wavelength light, while the wavelength-selective light-shielding part in the pixel region having the blue colored layer transmits only red wavelength light.

The wavelength-selective light-shielding part is not particularly limited as long as it can shield light other than the wavelength light of the color of the colored layer in the adjacent pixel. For example, a material in which a colored color material is dispersed in a binder resin is used. By setting it as such a wavelength selection type light-shielding part, light other than the wavelength light of the color of the colored layer in an adjacent pixel can be absorbed.
As the colored color material, a color material having a complementary color relationship with the color of the color layer of the adjacent pixel is appropriately selected, and examples thereof include color materials such as red, green, blue, yellow, orange, and purple. As the colored material, both pigments and dyes can be used.
These colored materials may be used alone or in combination of two or more. In addition, the color material may be a single color material or a mixture of two or more color materials.
As for the various color materials, the same color materials as those used for color filters can be used. The red, green, and blue color materials may be the same as the color material of the colored layer described in the section “3. Color filter layer” described later.
In addition, the binder resin for dispersing the colored color material can be the same as that described in the above-mentioned section “(i) Absorption type light shielding portion”.

A dichroic mirror can also be used as the wavelength selection type light shielding portion. A dichroic mirror refers to a mirror that has wavelength selectivity, reflects a predetermined wavelength, and transmits other wavelengths. By using the dichroic mirror, light other than the wavelength light of the color of the colored layer in the adjacent pixel is reflected, so that the light extraction efficiency of not only the adjacent pixel but also the pixel region in which the dichroic mirror is arranged can be improved.
Examples of the material for the dichroic mirror include TiO ₂ , Ta ₂ O ₅ , and SiO ₂ . The dichroic mirror can be formed by vapor deposition, IAD (Ion beam Assisted Deposition), sputtering, CVD, or the like.

  The light that is shielded by the wavelength-selective light-shielding portion may be light other than the wavelength light of the color layer of the adjacent pixel. In addition to the light emitted from the organic EL layer, the reflected light from the back electrode layer, etc. Among them, light other than the wavelength light of the color of the colored layer of the adjacent pixel may be included.

(Iv) Light-shielding part The width of the light-shielding part may be any size as long as it can be arranged inside the outer periphery of the pixel part defined by the inter-pixel light-shielding part in plan view, and the organic EL element substrate, the color filter layer, , The width of the inter-pixel light-shielding portion in the color filter layer, the arrangement of the light-shielding portions, and the like.
When the light-shielding part is arranged only inside the outer periphery of the pixel part, the width is preferably within a range of 4 μm to 9 μm, more preferably within a range of 4 μm to 7 μm, and particularly preferably within a range of 4 μm to 6 μm. If the width of the light shielding portion is smaller than the above range, the leakage light cannot be sufficiently shielded and the effects of the present invention may not be exhibited. On the other hand, if it is larger than the above range, light other than the leakage light is also blocked, so that the amount of light that should be incident on the desired pixel portion is reduced, and the light emission amount and the light extraction efficiency may be reduced. .
Further, the width of the light-shielding portion in the arrangement mode is preferably equal to or more than a value obtained by subtracting the width of the non-light emitting area from the length of about 1.7 to 2 times the distance between the organic EL element and the color filter layer. . Here, the distance between the organic EL element and the color filter layer is equal to the film thickness of the resin adhesive layer described later. Further, the width of the non-light emitting area corresponds to the width of the opening of the back electrode layer formed in a pattern. Since the incident angle of the leaked light from the organic EL element when the parallax color mixture occurs is about 60 degrees, the leaked light affecting the adjacent pixels, that is, a sufficient amount of leaked light to make the adjacent pixels emit light is blocked. As for the width of the light shielding layer, the width of the light shielding layer needs to have the above-described relationship according to the trigonometric theorem. In addition, it is preferable that the above-mentioned relationship is similarly established not only in the case where the light-shielding portion is arranged as described above but also in a case where a part or the entire surface of the non-light-emitting area of the organic EL element substrate is covered as described later.

  Further, the cross-sectional shape of the light shielding portion is not particularly limited, and examples thereof include a polygonal shape such as a triangle, a quadrangle, and a pentagon, and a semicircular shape.

The film thickness of the light shielding part is not particularly limited as long as it is a thickness that can sufficiently block light leaking to adjacent pixels. For example, when the light shielding part is formed of a resin, the film thickness thereof is not limited. Is preferably in the range of 1.0 μm to 1.5 μm, more preferably in the range of 1.1 μm to 1.4 μm, and particularly preferably in the range of 1.2 μm to 1.3 μm. This is because the optical density (OD) can be secured at 3.0 or more. If the film thickness of the light shielding part is larger than the above range, the light shielding part may be exposed on a resin adhesive layer to be described later or cause a step on the surface of the resin adhesive layer. Optical density (OD) may not be obtained.
Moreover, when forming a light shielding part with a metal, the film thickness has the preferable range of 0.1 micrometer-0.2 micrometer. In the case of a metal, the required optical density (OD) can be obtained with a thinner film thickness than that of a resin.

The light shielding portion is disposed inside the outer periphery of the pixel portion, but may be disposed inside a part of the outer periphery or may be disposed inside the entire outer periphery. Among these, it is preferable to be disposed inside the entire outer periphery.
Further, in addition to the inside of the outer periphery of the pixel portion, the light shielding portion may be disposed so as to cover a part of the non-light emitting area of the organic EL element substrate, or may be disposed so as to cover the entire surface of the non-light emitting area.

  The light shielding portion may be formed of the same material, or may be formed of a different material depending on the location of the outer periphery. In the case where the light shielding portion is formed from the same material, it can be collectively formed according to the shape of the pixel portion. On the other hand, when the light-shielding part is a wavelength selective light-shielding part, as described above, it is necessary to shield light other than the wavelength light of the color of the colored layer in the adjacent pixel. It is preferable to change the material of the wavelength-selective light-shielding part disposed in the part.

Further, the light-shielding portion is disposed on the transparent electrode layer so as to be located at least inside the outer periphery of the pixel portion. However, as shown in FIG. When the film or insulating film 9 is provided, it may be disposed on the protective film or insulating film 9. This is because when the light-shielding part is formed by a wet process, the light-shielding part can be arranged at a desired position without moisture adversely affecting the electrode. FIG. 4 is a schematic cross-sectional view showing another example of the organic EL display device of the present invention, in which the light-shielding portion 7 is disposed so as to cover the entire surface of the non-light emitting area 8. Reference numerals not described in FIG. 4 are the same as those in FIG.
In addition, when forming a light shielding part by a dry process, it is preferable to arrange | position a light shielding part directly on a transparent electrode layer from the point that leakage light can be shielded more effectively.

The method for forming the light shielding portion is not particularly limited as long as it is a method that can be formed at least inside the outer periphery of the pixel portion in plan view, and may be appropriately selected according to the type of the light shielding portion and the material thereof. it can. As the method, for example, a printing method, photolithography, or the like can be used. Among them, photolithography is preferable.
Specifically, a method of forming a thin film of various materials in the light shielding portion and patterning using photolithography, a method of forming a resist by photolithography and forming a thin film of various materials in the light shielding portion, etc. Can do. Examples of the method for forming the thin film include vapor deposition, ion plating, and sputtering.

(B) Organic EL layer The organic EL layer has one or more organic layers including at least a light emitting layer. Examples of the organic layer constituting the organic EL layer other than the light emitting layer include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer. The hole transport layer is often integrated with the hole injection layer by adding a hole transport function to the hole injection layer. In addition, as an organic layer constituting the organic EL layer, holes or electrons such as a hole blocking layer and an electron blocking layer are prevented from penetrating, and further, exciton diffusion is prevented and excitons are placed in the light emitting layer. By confining, a layer for increasing the recombination efficiency can be cited. The organic EL layer may have a general configuration, and only the light emitting layer, hole injection layer / light emitting layer, hole injection layer / light emitting layer / electron injection layer, hole injection layer / hole blocking layer. / Light emitting layer / electron injection layer, hole injection layer / light emitting layer / electron transport layer and the like can be exemplified.

(I) Light-Emitting Layer The light-emitting layer may be a white light-emitting layer or may have a plurality of color light-emitting layers, but is preferably a white light-emitting layer. The configuration of the present invention is useful because a white light emitting type organic EL display device tends to generate parallax color due to light leakage to adjacent pixels. The light emitting material used for the white light emitting layer is hardly composed of a single compound, and generally light emitting materials having two to three colors are used. In this case, the emission spectrum of the white light-emitting layer is a combination of the spectra of the light-emitting materials of the respective colors.

  The light emitting material used for the light emitting layer may be any material that emits fluorescence or phosphorescence, and examples thereof include dye materials, metal complex materials, and polymer materials.

  Examples of dye-based materials include cyclopentadiene derivatives, tetraphenylbutadiene derivatives, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, silole derivatives, thiophene ring compounds, pyridine Examples thereof include a ring compound, a perinone derivative, a perylene derivative, an oligothiophene derivative, a coumarin derivative, an oxadiazole dimer, and a pyrazoline dimer.

  Examples of the metal complex material include an aluminum quinolinol complex, a benzoquinolinol beryllium complex, a benzoxazole zinc complex, a benzothiazole zinc complex, an azomethyl zinc complex, a porphyrin zinc complex, a europium complex, or a central metal such as Al, Zn, Be, etc. Alternatively, a metal complex having a rare earth metal such as Tb, Eu, or Dy and having a oxadiazole, thiadiazole, phenylpyridine, phenylbenzimidazole, quinoline structure, or the like as a ligand can be given. Specifically, tris (8-quinolinolato) aluminum complex (Alq3) can be used.

  Examples of the polymer material include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, polyvinylcarbazole, polyfluorenone derivatives, polyfluorene derivatives, polyquinoxaline derivatives, polydialkylfluorene derivatives, and Examples thereof include copolymers thereof. Moreover, what polymerized said pigment-type material and metal complex-type material as a polymeric material can also be used.

  As the phosphorescent material, for example, an iridium complex, a platinum complex, or a metal complex having a heavy metal having a large spin-orbit interaction such as Ru, Rh, Pd, Os, Ir, Pt, or Au as a central metal is used. Can do. Specific examples include iridium complexes having platinum pyridine, thienyl pyridine and the like as ligands, platinum porphyrin derivatives, and the like.

  These luminescent materials may be used alone or in combination of two or more.

  Further, a dopant that emits fluorescence or phosphorescence may be added to the light emitting material for the purpose of improving the light emission efficiency and changing the light emission wavelength. Examples of such dopants include perylene derivatives, coumarin derivatives, rubrene derivatives, quinacridone derivatives, squalium derivatives, porphyrin derivatives, styryl dyes, tetracene derivatives, pyrazoline derivatives, decacyclene, phenoxazone, quinoxaline derivatives, carbazole derivatives, and fluorene derivatives. Can be mentioned.

  The thickness of the light emitting layer is not particularly limited as long as it can provide a function of emitting light by providing a recombination field of electrons and holes, and is, for example, about 10 nm to 500 nm. be able to.

  Usually, the light emitting layer is formed corresponding to the pattern of the colored layer in the pixel region. About the pattern of a light emitting layer, although it depends on the pattern of a colored layer, linear shape, stripe shape, etc. are mentioned, for example.

  A method for forming the light emitting layer can be the same as the method for forming the light emitting layer in a general organic EL element, such as a printing method, an ink jet method, or a vacuum deposition method.

(Ii) Hole Injecting and Transporting Layer In the organic EL layer, a hole injecting and transporting layer may be formed between the light emitting layer and the anode.
The hole injection transport layer may be a hole injection layer having a hole injection function, or a hole transport layer having a hole transport function, and the hole injection layer and the hole transport layer are laminated. And may have both a hole injection function and a hole transport function.

  The material for the hole injecting and transporting layer is not particularly limited as long as it is a material that can stabilize the injection and transportation of holes to the light emitting layer. Conductives such as phenylamine, starburst amine, phthalocyanine, vanadium oxide, molybdenum oxide, ruthenium oxide, aluminum oxide, titanium oxide and other oxides, amorphous carbon, polyaniline, polythiophene, polyphenylene vinylene and their derivatives Can be used. Specifically, bis (N- (1-naphthyl) -N-phenyl) benzidine (α-NPD), 4,4,4-tris (3-methylphenylphenylamino) triphenylamine (MTDATA), poly-3 , 4 ethylenedioxythiophene-polystyrene sulfonic acid (PEDOT-PSS), polyvinylcarbazole and the like.

  The thickness of the hole injecting and transporting layer is not particularly limited as long as the hole injecting function and the hole transporting function are sufficiently exhibited, but specifically, within the range of 0.5 nm to 1000 nm, It is preferable to be within the range of 10 nm to 500 nm.

  As a method for forming the hole injecting and transporting layer, a method for forming a hole injecting and transporting layer in a general organic EL element such as a printing method, an ink jet method, and a vacuum deposition method can be used. It is selected appropriately.

(Iii) Electron injection / transport layer In the organic EL layer, an electron injection / transport layer may be formed between the light-emitting layer and the cathode.
The electron injection / transport layer may be an electron injection layer having an electron injection function, may be an electron transport layer having an electron transport function, or may be a laminate of an electron injection layer and an electron transport layer. It may have both an electron injection function and an electron transport function.

  The material of the electron injection layer is not particularly limited as long as it can stabilize the injection of electrons into the light emitting layer. In addition to the compounds exemplified as the light emitting material of the light emitting layer, an aluminum lithium alloy , Strontium, calcium, lithium, cesium, lithium fluoride, magnesium fluoride, strontium fluoride, calcium fluoride, barium fluoride, cesium fluoride, magnesium oxide, strontium oxide, sodium polystyrene sulfonate and other alkali metals and alkaline earth A metal, an alloy, a compound, an organic complex, or the like of a similar metal can be used.

  The material for the electron transport layer is not particularly limited as long as it can transport electrons injected from the cathode to the light emitting layer. For example, bathocuproine, bathophenanthroline, phenanthroline derivative, triazole derivative, oxalate Examples thereof include a diazole derivative and a derivative of tris (8-quinolinolato) aluminum complex (Alq3).

  Furthermore, as an electron injecting and transporting layer composed of a single layer having both an electron injecting function and an electron transporting function, a metal doped layer in which an alkali metal or an alkaline earth metal is doped on an electron transporting organic material is formed. This can be used as an electron injecting and transporting layer. Examples of the electron-transporting organic material include bathocuproin, bathophenanthroline, and phenanthroline derivatives. Examples of the metal to be doped include Li, Cs, Ba, and Sr.

  The thickness of the electron injection / transport layer is not particularly limited as long as the electron injection function and the electron transport function are sufficiently exhibited.

  As a method for forming the electron injecting and transporting layer, a method for forming an electron injecting and transporting layer in a general organic EL element such as a printing method, an ink jet method, and a vacuum deposition method can be used, and it is appropriately selected according to the type of material. Is done.

(C) Transparent electrode layer and back electrode layer The transparent electrode layer and the back electrode layer are provided to apply a voltage to the light emitting layer and cause light emission in the light emitting layer, one being an anode and the other being a cathode. is there. The back electrode layer is formed between the support substrate and the organic EL layer, and the transparent electrode layer is formed on the organic EL layer.

(I) Transparent electrode layer The material of the transparent electrode layer is not particularly limited as long as it is a conductive material having a desired light transmittance. For example, indium tin oxide (ITO), indium zinc oxide (IZO) In addition, a conductive oxide such as tin oxide, zinc oxide, indium oxide, and aluminum zinc oxide (AZO) can be used.
The light transmittance of the transparent electrode layer is preferably 60% or more, more preferably 70% or more, and particularly preferably 80% or more. This is because the light emitted from the light emitting layer can be sufficiently transmitted by the transparent electrode layer. The total light transmittance is a value measured using a haze meter (NDH2000 manufactured by Nippon Denshoku Industries Co., Ltd.) in accordance with JIS K 7361.

  The transparent electrode layer is formed in a pattern corresponding to the colored layer in the pixel region. The pattern of the transparent electrode layer is set by the pattern of the colored layer, and examples thereof include a linear shape and a stripe shape.

About the film thickness of a transparent electrode layer, a formation method, it can be made to be the same as that of a general organic EL element.
Further, the transparent electrode layer is formed on the organic EL layer of each organic EL element, but may be further formed on a non-light emitting area.

(Ii) Back electrode layer The material of the back electrode layer may be any conductive material having light impermeability, for example, a metal such as Li, Na, Mg, Al, Ca, Ag, In, or these An alloy containing one or more kinds of metals, specifically, an alloy such as MgAg, AlLi, AlCa, and AlMg can be given.

  About the film thickness, the formation method, etc. of a back electrode layer, it can be made to be the same as that of a general organic EL element.

(2) Support substrate The support substrate may be any substrate as long as it can support the above-described organic EL element, and those used for a general organic EL element substrate can be used. In the present invention, since the light is extracted from the color filter layer side, the support substrate may be transparent or opaque.
As the support substrate, for example, a non-flexible rigid material such as quartz glass, Pyrex (registered trademark) glass, or a synthetic quartz plate, or a flexible material such as a resin film or an optical resin plate is used. Can do. Moreover, you may use what formed the barrier layer in the resin film.

(3) Non-light emitting area In this invention, the opening part of the back electrode layer formed in the pattern form on the support substrate turns into a non-light-emitting area. The non-light emitting area is opposed to an inter-pixel light shielding portion of a color filter layer described later.

  A TFT element may be provided in the non-light emitting area. As the TFT element, those generally used for organic EL elements can be used.

An insulating layer may be formed in the non-light emitting area. The insulating layer is provided to prevent direct contact between the transparent electrode layer and the back electrode layer.
As an insulating layer, what is generally used for an organic EL element can be used.

2. Resin Adhesive Layer The resin adhesive layer in the present invention is disposed between the organic EL element substrate and the color filter layer. That is, in the present invention, the organic EL element substrate and the color filter layer are solid-sealed by the resin adhesive layer.
Here, the resin adhesive layer has a gas barrier property capable of suppressing contact between moisture entering from the outside and the organic EL element, and light reflection does not occur at an interlayer interface between the organic EL element substrate and the color filter layer. A layer whose optical refractive index is adjusted as described above.

  The resin adhesive layer is not particularly limited as long as it exhibits a desired gas barrier property and optical refractive index, and can be the same as a transparent resin film or the like generally used for a sealing material of an organic EL display device.

Examples of the material for the resin adhesive layer include a thermosetting resin and a photocurable resin.
As the photocurable resin, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used. A photopolymerization initiator, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added to the photosensitive resin as necessary.
Examples of the thermosetting resin include those using an epoxy compound and those using a thermal radical generator. Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid, an amine compound, and the like. Examples of such epoxy compounds include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used. The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides. Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide), and the like. Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t Butyl-4,4-di - (t-butylperoxy) Butaneto, and dicumyl peroxide.

  The film thickness of the resin adhesive layer may be any film thickness that can exhibit a desired gas barrier property, and is appropriately set according to the arrangement interval between the organic EL element substrate and the color filter layer. For example, it is preferably 10 μm or less, more preferably 8 μm or less, particularly preferably 5 μm or less, and at least 3 μm or less. If the thickness of the resin adhesive layer is larger than the above range, the scattering of incident light may not be suppressed and the visibility may be deteriorated. On the other hand, if the thickness is smaller than the above range, the gas barrier property is not exhibited. May not be prevented from moisture entering from the outside. In addition, a display abnormality or the like may occur due to foreign matter mixing between the organic EL element substrate and the color filter layer.

  The refractive index of the resin adhesive layer is not required to cause light reflection between the organic EL element substrate and the color filter layer, and is preferably about 1.4 to 1.6, for example. In addition, the said refractive index shall be measured using the light of the wavelength range within the range of 400 nm-700 nm.

  The resin adhesive layer may be disposed directly on the transparent electrode layer in the organic EL element substrate, or may be disposed via the protective layer or the like when a protective film or the like is provided on the transparent electrode layer.

  The method for forming the resin adhesive layer is appropriately selected depending on the material to be used, etc., but in the general organic EL display device, the filler is disposed between the organic EL element substrate and the color filter layer. It can be similar to the method. For example, a method of applying and curing the dispersion liquid of the resin material described above can be used.

3. Color filter layer The color filter layer in the present invention has a plurality of colored layers and an inter-pixel light-shielding portion disposed between the colored layers of the plurality of colors on a transparent substrate.
The color filter layer is disposed on the transparent electrode layer of the organic EL element substrate via a resin adhesive layer, and the surface on which the colored layer or the like of the transparent substrate is disposed is the organic EL element substrate side.

(1) Colored layer The colored layer is formed on a transparent substrate and has a plurality of colored layers.

  The colored layer has, for example, three colored layers of red, green, and blue. The color of the colored layer may be any color as long as it contains at least three colors of red, green, and blue. For example, three colors of red, green, and blue, four colors of red, green, blue, and yellow, or red, Five colors such as green, blue, yellow, and cyan may be used.

Examples of the colored layer include those in which a coloring material is dispersed in a binder resin.
Examples of the color material include pigments and dyes of each color. Examples of the color material used for the red colored layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. Examples of the color material used in the green coloring layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinone pigments. And pigments. Examples of the color material used in the blue colored layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. These pigments and dyes may be used alone or in combination of two or more.
As the binder resin, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
The colored layer may contain a photopolymerization initiator and, if necessary, a sensitizer, a coatability improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like.

  The arrangement of the colored layers is not particularly limited, and may be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type.

  Further, a white layer that does not contain the color material but contains the binder resin and transmits light from the organic EL element may be formed on the same plane on which the colored layer is formed. For example, when a red colored layer, a green colored layer, a blue colored layer, and a white layer are formed, at least one pixel out of three colors of red, green, and blue is not lit during display. The light leaks easily. On the other hand, in the present invention, since light leakage to adjacent pixels can be suppressed, it is particularly useful when a white layer is formed.

  The thickness of the colored layer can be the same as the thickness of the colored layer in a general color filter, and can be set, for example, within a range of 1 μm to 5 μm.

  As a method for forming the colored layer, any method can be used as long as a plurality of colored layers can be arranged on the same plane, and examples thereof include a photolithography method, an inkjet method, and a printing method. The same method as that for the colored layer can be used for the thickness and formation method of the white layer.

(2) Inter-pixel light-shielding part The inter-pixel light-shielding part is arranged between colored layers of a plurality of colors and demarcates a pixel part and a pixel region. The inter-pixel light shielding portion is usually formed in a pattern on a transparent substrate.

As the inter-pixel light shielding portion, for example, a material in which a black color material is dispersed in a binder resin is used. The inter-pixel light blocking portion may contain a colored color material in addition to the black color material. In addition, about a black color material, a colored color material, and binder resin, it can be made to be the same as that of the material of the light-shielding part in an organic EL element substrate.
Further, the inter-pixel light-shielding portion may contain a photopolymerization initiator, a sensitizer, a coatability improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc., as necessary. Good.

  The film thickness of the inter-pixel light-shielding part can be the same as the film thickness of the inter-pixel light-shielding part in a general color filter, and can be set, for example, within a range of 0.5 μm to 2.0 μm.

  An opening is provided between adjacent light shielding portions between pixels, and colored layers of the respective colors are disposed in the opening. The shape of the opening is not particularly limited, and examples thereof include those in which the arrangement of the colored layers is changed, such as a stripe shape, a dogleg shape, and a delta arrangement.

  The method for forming the inter-pixel light shielding portion is not particularly limited as long as it can be formed in a pattern on a transparent substrate, and examples thereof include a photolithography method, a printing method, and an ink jet method.

(3) Transparent substrate The transparent substrate is not particularly limited as long as it can support the above-described colored layer, inter-pixel light-shielding portion, and the like and is transparent to visible light. Can be used. The type of the transparent substrate can be the same as that described in the above-mentioned section of “1. Organic EL element substrate (2) Support substrate”, but it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate. Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates. This is because an alkali-free type glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and does not contain an alkali component in the glass, so that it can be suitably used as a display device.

(4) Other Configurations The color filter layer has at least the above-described configuration, but may have other configurations as necessary. Hereinafter, other possible configurations will be described.

(A) Protective layer The color filter layer may have a protective layer on the surface of the colored layer facing the transparent substrate. The surface of the colored layer can be flattened by the protective layer.
As a material for the protective layer, the same organic material or inorganic material as that for the protective layer in a general color filter can be used. When the protective layer is composed of an inorganic material, barrier performance can be ensured.
The thickness and the forming method of the protective layer can be the same as those of a protective layer used for a general color filter.

(B) Light absorption layer The color filter layer may have a light absorption layer. In addition to the effect of preventing color mixing, the light absorption layer can achieve a reduction in display luminance in addition to a reduction in external light reflection.

Examples of the light absorbing layer include those in which a color material is dispersed in a binder resin.
Examples of the color material include a black color material. The light absorbing layer may contain a main color material and a color material for color adjustment. The main color material includes a black color material, and the color adjustment color material includes a blue color material.
The black color material, the blue color material, and the binder resin are the same as those used for the light shielding portion in the above-described organic EL element substrate, the colored layer in the color filter layer, or the inter-pixel light shielding portion.

  The formation position of the light absorption layer is not particularly limited. For example, the light absorption layer may be provided between the colored layer and the transparent substrate, or may be provided on the surface of the colored layer facing the transparent substrate. At this time, the light absorption layer may be formed on the entire surface including the inter-pixel light shielding portion.

Examples of the method for forming the light absorption layer include a photolithography method (die coating method, spin coating method), an ink jet method, and the like, but a photolithography method is usually used.
The film thickness of the light absorption layer is preferably 0.3 μm or more from the viewpoint of coatability and external light reflection reduction.

(C) Scattering layer The color filter layer may have a scattering layer formed on the colored layer. The scattering layer can improve the parallax depending on the viewing direction of the observer. When the light absorption layer is formed, a scattering layer is formed on the light absorption layer.

4). Organic EL Display Device The organic EL display device of the present invention has the above-mentioned organic EL element substrate, color filter layer, and resin adhesive layer, but may have other configurations as necessary.

5. Manufacturing method of organic EL display device The manufacturing method of the organic EL display device of the present invention can be formed on the transparent electrode layer so that the light shielding portion is disposed at least inside the outer periphery of the pixel portion in plan view. The organic EL element substrate having the light shielding part and the transparent electrode layer, the resin adhesive layer, and the color filter layer are not particularly limited as long as the organic EL element substrate and the color filter layer can be laminated, and a general method for manufacturing an organic EL display device is used. be able to.
In addition, about the formation method of each structure in an organic EL element board | substrate, a resin contact bonding layer, and a color filter layer, since it is the same as that of the content mentioned above, description here is abbreviate | omitted.

6). Applications The organic EL display device of the present invention is suitable for high-definition displays. For example, it is used for mobile electronic devices such as mobile notebook computers and multifunction terminal devices (also referred to as high-function terminal devices). Can be mentioned.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples.

[Production example]
(Preparation of black matrix material)
First, 63 parts by mass of methyl methacrylate (MMA), 12 parts by mass of acrylic acid (AA), 6 parts by mass of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by mass of diethylene glycol dimethyl ether (DMDG) in the polymerization tank. After the parts were charged, stirred and dissolved, 7 parts by mass of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly. Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour. Further, 7 parts by mass of glycidyl methacrylate (GMA), 0.4 parts by mass of triethylamine, and 0.2 parts by mass of hydroquinone were added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
<Composition of curable resin composition>
-Copolymer resin solution (solid content 50%) ... 16 parts by mass-Dipentaerythritol pentaacrylate (Sartomer SR399) ... 24 parts by mass-Orthocresol novolac type epoxy resin (Oilized Shell Epoxy Epicoat 180S70) ... 4 parts by mass 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by mass Diethylene glycol dimethyl ether: 52 parts by mass

Next, the following components were mixed and sufficiently dispersed in a sand mill to prepare a black pigment dispersion.
<Composition of black pigment dispersion>
Black pigment (Mitsubishi Chemical Corporation # 2600) ... 20 parts by mass Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 111) ... 16 parts by mass Solvent (diethylene glycol dimethyl ether) ... 64 parts by mass

Thereafter, the following components were sufficiently mixed to obtain a black matrix material (optical density (OD) of 3.0 or more).
<Composition of black matrix material>
Black pigment dispersion: 43 parts by mass Curable resin composition: 19 parts by mass Diethylene glycol dimethyl ether: 38 parts by mass

[Example 1]
The organic EL display device illustrated in FIG. 1 was produced according to the following method.

(Preparation of organic EL element substrate)
As a supporting substrate, a glass substrate (Corning Corp., 1737 glass) having a size of 1500 mm × 1850 mm and a thickness of 0.7 mm was prepared, and a thin film transistor circuit was produced according to a standard method on the supporting substrate. On this, a back electrode layer made of aluminum was formed so as to correspond to a colored layer of each color of the color filter layer described later, and an insulating layer made of polyimide was formed in the gap between these back electrode layers. The insulating layer portion was a non-light emitting area of the organic EL element substrate, and its width was 18 μm.
Next, an organic EL element (laminated structure of a hole injection layer, a white light emitting layer, and an electron injection layer) was formed in the gap between the insulating layers, and a transparent electrode layer made of indium tin oxide (ITO) was formed thereon. .
Using the black matrix material prepared as described above at a position corresponding to the inner periphery of the pixel portion when a color filter layer described later is disposed on the surface of the transparent electrode layer, a width of 8.0 μm and a thickness are obtained by photolithography. The light-shielding part A was formed so that it might become 1.5 micrometers in thickness, and the organic EL element substrate was obtained. In addition, the light shielding part A in Example 1 is an absorption type light shielding part.

(Preparation of color filter layer)
Next, a color filter layer was produced. First, a light shielding part (line width: 9 μm) between adjacent pixels was formed on a glass substrate (AN material manufactured by Asahi Glass Co., Ltd.) as a transparent substrate using the black matrix material prepared as described above.
Next, red, green, blue, and white colored layers having the following composition were formed in the gaps between the light shielding portions between adjacent pixels by photolithography so as to form a line in this order. In addition, the curable resin composition contained in each colored layer is the same as the curable resin composition in the black matrix material prepared as described above.

<Red colored layer forming composition>
・ C. I. Pigment Red 254 ... 10 parts by mass, polysulfonic acid type polymer dispersant ... 8 parts by mass, the above curable resin composition ... 15 parts by mass, 3-methoxybutyl acetate ... 67 parts by mass

<Green colored layer forming composition>
・ C. I. Pigment Green 58: 10 parts by mass / C.I. I. Pigment Yellow 138 ... 3 parts by mass, polysulfonic acid type polymer dispersant ... 8 parts by mass, the curable resin composition ... 12 parts by mass, 3-methoxybutyl acetate ... 67 parts by mass

<Blue colored layer forming composition>
・ C. I. Pigment Blue 1 ... 5 parts by mass, polysulfonic acid type polymer dispersant ... 3 parts by mass, the above curable resin composition ... 25 parts by mass, 3-methoxybutyl acetate ... 67 parts by mass

<White layer forming composition>
-The above-mentioned curable resin composition ... 33 parts by mass-3-methoxybutyl acetate ... 67 parts by mass

(Production of organic EL display device)
The organic EL light-emitting element substrate and the color filter layer obtained as described above have a thickness of 10 μm so that the colored layer side surface of the color filter layer and the transparent electrode layer side surface of the organic EL element substrate face each other. The organic EL display device was produced by bonding with a resin adhesive layer.

[Example 2]
An organic EL display device was produced in the same manner as in Example 1 except that the light shielding part B was formed by the following method.

(Formation of light shielding part B)
After forming a titanium film by sputtering at a position corresponding to the inside of the outer periphery of the pixel portion when the color filter layer is disposed on the surface of the transparent electrode layer, an etching resist is formed by a photolithography method and an etching process is performed. As a result, the light-shielding portion B was formed to have a width of 8.0 μm and a thickness of 0.15 μm. In addition, the light-shielding part B in Example 2 is a reflective light-shielding part.

[Example 3]
An organic EL display device was produced in the same manner as in Example 1 except that the light shielding portion C was formed by the following method.

(Formation of light shielding part C)
A light-shielding portion C that absorbs light other than the wavelength of the color of the colored layer in the adjacent pixel is applied to the photolithographic method at a position corresponding to the inside of the outer periphery of the pixel portion when the color filter layer is disposed on the surface of the transparent electrode layer. The width was 8.0 μm and the thickness was 1.5 μm. In addition, the light shielding layer C in Example 3 is a wavelength selection type light shielding part.
The combination of adjacent colored layers at this time and the material composition of the light shielding portions C1 to C6 located on the colored layer side in the above combination are shown below. In addition, the composition of the colored layer forming composition of each color of red, green, blue, and white is the same as that of Example 1 described above.

<Composition of light shielding parts C1-6>
A light shielding part C1 positioned on the red colored layer side at the boundary between the red colored layer and the green colored layer: a mixture of the red colored layer forming composition, the blue colored layer forming composition, and the white layer forming composition.
A light shielding part C2 located on the green colored layer side at the boundary between the red colored layer and the green colored layer: a mixture of the green colored layer forming composition, the blue colored layer forming composition, and the white layer forming composition.
The light shielding part C3 located on the green colored layer side at the boundary between the green colored layer and the blue colored layer: a mixture of the red colored layer forming composition, the green colored layer forming composition, and the white layer forming composition.
-Light shielding part C4 located on the blue colored layer side at the boundary between the green colored layer and the blue colored layer: a mixture of the red colored layer forming composition, the blue colored layer forming composition, and the white layer forming composition.
A light shielding part C5 located on the blue colored layer side at the boundary between the blue colored layer and the white layer: a mixture of the red colored layer forming composition, the green colored layer forming composition, and the blue colored layer forming composition.
-Light-shielding part C6 located in the white layer side in the boundary of a blue colored layer and a white layer ... Mixture of the composition for red colored layer formation, the composition for green colored layer formation, and the composition for white layer formation.

[Comparative Example 1]
An organic EL display device was produced in the same manner as in Example 1 except that the light shielding portion was not provided on the organic EL element substrate.

[Comparative Example 2]
An organic EL display device was produced in the same manner as in Example 1 except that the light shielding portion was not provided in the organic EL element substrate and the line width of the light shielding portion between adjacent pixels in the color filter layer was 18 μm.

[Evaluation]
The organic EL display devices obtained in Examples 1 to 3 and Comparative Examples 1 and 2 were visually confirmed for occurrence of parallax color mixing and changes in luminance when viewed from the front and a direction at an angle of 60 degrees with respect to the front.
In the organic EL display devices of Examples 1 to 3, parallax color mixing did not occur even when viewed from an oblique direction of 60 degrees with respect to the front, and the same color tone as that in the front view was displayed.
On the other hand, in the organic EL display device of Comparative Example 1, when viewed from an oblique direction of 60 degrees with respect to the front, a color mixture of parallax occurred, and a color tone different from the front view was displayed.
In the organic EL display device of Comparative Example 2, no parallax coloration occurred when viewed from the direction at an angle of 60 degrees with respect to the front, but it was visually recognized both when viewed from the front and when viewed from the direction of 60 degrees. It was confirmed that the luminance was lower than the organic EL display devices of Examples 1 to 3 at the level.

DESCRIPTION OF SYMBOLS 1 ... Organic EL element substrate 2 ... Support substrate 3 ... Organic EL element 4 ... Back electrode layer 5 ... Organic EL layer 6 ... Transparent electrode layer 7 ... Light-shielding part 10 ... Organic EL display device 11 ... Color filter layer 12 ... Transparent substrate 13 ... Inter-pixel light shielding part 14, 14R, 14G, 14B ... Colored layer 21 ... Resin adhesive layer P, P1, P2 ... Pixel part Q, Q1 ... Pixel area

Claims (4)

An organic electroluminescence element substrate having an organic electroluminescence element in which a back electrode layer, an organic electroluminescence layer having at least a light emitting layer, a transparent electrode layer, and a light shielding portion are arranged in this order on a support substrate;
On the transparent substrate, a color filter layer having a plurality of colored layers and an inter-pixel light-shielding portion disposed between the colored layers of the plurality of colors;
A resin adhesive layer disposed between the organic electroluminescence element substrate and the color filter layer;
An organic electroluminescence display device comprising:
The organic electroluminescence display device, wherein the light shielding portion is disposed at least inside an outer periphery of a pixel portion defined by the inter-pixel light shielding portion in a plan view.   The organic electroluminescence display device according to claim 1, wherein the light shielding portion is an absorption type light shielding portion that absorbs at least light from the organic electroluminescence layer.   2. The organic electroluminescence display device according to claim 1, wherein the light shielding portion is a reflective light shielding portion that reflects at least light from the organic electroluminescence layer.   The light-shielding portion is a wavelength-selective light-shielding portion that shields light other than the wavelength light of the color of the colored layer in the adjacent pixel portion, out of the light from the organic electroluminescence layer. 2. The organic electroluminescence display device according to 1.