JP2015052070A - Phosphorus-containing epoxy resin and composition and hardened product - Google Patents
Phosphorus-containing epoxy resin and composition and hardened product Download PDFInfo
- Publication number
- JP2015052070A JP2015052070A JP2013185980A JP2013185980A JP2015052070A JP 2015052070 A JP2015052070 A JP 2015052070A JP 2013185980 A JP2013185980 A JP 2013185980A JP 2013185980 A JP2013185980 A JP 2013185980A JP 2015052070 A JP2015052070 A JP 2015052070A
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- JP
- Japan
- Prior art keywords
- epoxy resin
- phosphorus
- equivalent
- group
- active hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 171
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 171
- 229910052698 phosphorus Inorganic materials 0.000 title claims abstract description 145
- 239000011574 phosphorus Substances 0.000 title claims abstract description 140
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims abstract description 111
- 239000000203 mixture Substances 0.000 title claims abstract description 50
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 56
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 47
- 239000004593 Epoxy Substances 0.000 claims abstract description 43
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 15
- 239000001257 hydrogen Substances 0.000 claims abstract description 15
- -1 phosphorus compound Chemical class 0.000 claims description 57
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 48
- 150000001875 compounds Chemical class 0.000 claims description 27
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 24
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 125000004437 phosphorous atom Chemical group 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000003063 flame retardant Substances 0.000 abstract description 19
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 11
- 239000002904 solvent Substances 0.000 abstract description 10
- 238000005470 impregnation Methods 0.000 abstract description 9
- 230000000740 bleeding effect Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 description 36
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- 238000006243 chemical reaction Methods 0.000 description 31
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 27
- 229910000831 Steel Inorganic materials 0.000 description 24
- 239000010959 steel Substances 0.000 description 24
- 238000001723 curing Methods 0.000 description 18
- 239000002253 acid Substances 0.000 description 17
- 239000003054 catalyst Substances 0.000 description 17
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 16
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 16
- 239000000047 product Substances 0.000 description 15
- 239000007810 chemical reaction solvent Substances 0.000 description 13
- 239000002966 varnish Substances 0.000 description 13
- 229910019142 PO4 Inorganic materials 0.000 description 12
- 239000010452 phosphate Substances 0.000 description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 229920003986 novolac Polymers 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 239000000835 fiber Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 5
- 150000003018 phosphorus compounds Chemical class 0.000 description 5
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 235000011007 phosphoric acid Nutrition 0.000 description 3
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- KMRIWYPVRWEWRG-UHFFFAOYSA-N 2-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(P2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 KMRIWYPVRWEWRG-UHFFFAOYSA-N 0.000 description 2
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 2
- LLOXZCFOAUCDAE-UHFFFAOYSA-N 2-diphenylphosphorylbenzene-1,4-diol Chemical compound OC1=CC=C(O)C(P(=O)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 LLOXZCFOAUCDAE-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XUMBMVFBXHLACL-UHFFFAOYSA-N Melanin Chemical compound O=C1C(=O)C(C2=CNC3=C(C(C(=O)C4=C32)=O)C)=C2C4=CNC2=C1C XUMBMVFBXHLACL-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- FJTUUPVRIANHEX-UHFFFAOYSA-N butan-1-ol;phosphoric acid Chemical compound CCCCO.OP(O)(O)=O FJTUUPVRIANHEX-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011151 fibre-reinforced plastic Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- CMLWFCUAXGSMBB-UHFFFAOYSA-N tris(2,6-dimethoxyphenyl)phosphane Chemical compound COC1=CC=CC(OC)=C1P(C=1C(=CC=CC=1OC)OC)C1=C(OC)C=CC=C1OC CMLWFCUAXGSMBB-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- JGVOASSDYQIBIF-KVVVOXFISA-N (z)-octadec-9-en-1-ol;phosphoric acid Chemical compound OP(O)(O)=O.CCCCCCCC\C=C/CCCCCCCCO JGVOASSDYQIBIF-KVVVOXFISA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KPAPHODVWOVUJL-UHFFFAOYSA-N 1-benzofuran;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2OC=CC2=C1 KPAPHODVWOVUJL-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
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- UYXQLQUXXCIFQM-UHFFFAOYSA-N 2-hydroxy-1,3,2$l^{5}-dioxaphospholane 2-oxide Chemical compound OP1(=O)OCCO1 UYXQLQUXXCIFQM-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- PSYZOUFWZJLEPS-UHFFFAOYSA-N 2-phenylethane-1,1-diamine Chemical compound NC(N)CC1=CC=CC=C1 PSYZOUFWZJLEPS-UHFFFAOYSA-N 0.000 description 1
- WDGCBNTXZHJTHJ-UHFFFAOYSA-N 2h-1,3-oxazol-2-id-4-one Chemical group O=C1CO[C-]=N1 WDGCBNTXZHJTHJ-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920003043 Cellulose fiber Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical compound CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 1
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- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- 102100031869 N-alpha-acetyltransferase 35, NatC auxiliary subunit Human genes 0.000 description 1
- LYAVXWPXKIFHBU-UHFFFAOYSA-N N-{2-[(1,2-diphenylhydrazinyl)carbonyl]-2-hydroxyhexanoyl}-6-aminohexanoic acid Chemical compound C=1C=CC=CC=1N(C(=O)C(O)(C(=O)NCCCCCC(O)=O)CCCC)NC1=CC=CC=C1 LYAVXWPXKIFHBU-UHFFFAOYSA-N 0.000 description 1
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- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
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- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N alpha-naphthol Natural products C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000005415 aminobenzoic acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
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- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- JWAZRIHNYRIHIV-UHFFFAOYSA-N beta-hydroxynaphthyl Natural products C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- BNMJSBUIDQYHIN-UHFFFAOYSA-N butyl dihydrogen phosphate Chemical compound CCCCOP(O)(O)=O BNMJSBUIDQYHIN-UHFFFAOYSA-N 0.000 description 1
- IKWKJIWDLVYZIY-UHFFFAOYSA-M butyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCC)C1=CC=CC=C1 IKWKJIWDLVYZIY-UHFFFAOYSA-M 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
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- 239000000378 calcium silicate Substances 0.000 description 1
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- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
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- SEGLCEQVOFDUPX-UHFFFAOYSA-N di-(2-ethylhexyl)phosphoric acid Chemical compound CCCCC(CC)COP(O)(=O)OCC(CC)CCCC SEGLCEQVOFDUPX-UHFFFAOYSA-N 0.000 description 1
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- 238000010790 dilution Methods 0.000 description 1
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- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SLAFUPJSGFVWPP-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;iodide Chemical compound [I-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 SLAFUPJSGFVWPP-UHFFFAOYSA-M 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
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- 230000009477 glass transition Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229940042795 hydrazides for tuberculosis treatment Drugs 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000005204 hydroxybenzenes Chemical class 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
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- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- QPPQHRDVPBTVEV-UHFFFAOYSA-N isopropyl dihydrogen phosphate Chemical compound CC(C)OP(O)(O)=O QPPQHRDVPBTVEV-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 125000002463 lignoceryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- ALTWGIIQPLQAAM-UHFFFAOYSA-N metavanadate Chemical compound [O-][V](=O)=O ALTWGIIQPLQAAM-UHFFFAOYSA-N 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- UHGIMQLJWRAPLT-UHFFFAOYSA-N octadecyl dihydrogen phosphate Chemical compound CCCCCCCCCCCCCCCCCCOP(O)(O)=O UHGIMQLJWRAPLT-UHFFFAOYSA-N 0.000 description 1
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- CASUWPDYGGAUQV-UHFFFAOYSA-M potassium;methanol;hydroxide Chemical compound [OH-].[K+].OC CASUWPDYGGAUQV-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- GAJQCIFYLSXSEZ-UHFFFAOYSA-N tridecyl dihydrogen phosphate Chemical compound CCCCCCCCCCCCCOP(O)(O)=O GAJQCIFYLSXSEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1405—Polycondensates modified by chemical after-treatment with inorganic compounds
- C08G59/1422—Polycondensates modified by chemical after-treatment with inorganic compounds containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Abstract
Description
本発明は、電気電子回路用の積層板、絶縁フィルム、接着剤、絶縁塗料、レジスト材料、封止材、注型材等に有用な難燃性を有するリン含有エポキシ樹脂及びその組成物、硬化物に関するものである。 The present invention relates to a phosphorus-containing epoxy resin having flame retardancy useful for laminates for electric and electronic circuits, insulating films, adhesives, insulating paints, resist materials, sealing materials, casting materials, etc., and compositions and cured products thereof. It is about.
エポキシ樹脂は接着性、耐熱性、成形性に優れていることから、電気・電子機器の積層板、封止剤、自動車部品、繊維強化プラスチック(FRP)、スポーツ用品等幅広く使用されている。特に、電気・電子機器に使用される積層板やフィルム材料等の絶縁材料は、難燃性の付与が強く要求されている。難燃化方法としては、環境問題の高まりから従来の臭素系難燃システムからハロゲン化物を用いないいわゆるハロゲンフリー難燃システムに移行されつつある。これに対して主にリン化合物の提案がされているが、添加型リン系難燃剤として赤リンを使用した場合は安全性が不十分であり、リン酸系化合物を使用する場合は硬化物表面にブリードアウトする問題があった。 Epoxy resins are widely used because they have excellent adhesion, heat resistance, and moldability, such as laminates for electrical and electronic equipment, sealants, automotive parts, fiber reinforced plastics (FRP), and sports equipment. In particular, insulating materials such as laminates and film materials used in electrical and electronic equipment are strongly required to impart flame retardancy. As a flame retardant method, a so-called halogen-free flame retardant system that does not use a halide is being transferred from a conventional bromine-based flame retardant system due to an increase in environmental problems. In contrast to this, phosphorus compounds are mainly proposed, but safety is insufficient when red phosphorus is used as an additive-type phosphorus flame retardant, and the surface of a cured product when phosphoric acid compounds are used. There was a problem bleeding out.
前記問題に対して、10−(2,5−ジヒドロキシフェニル)−10H−9−オキサ−10−ホスファフェナントレン−10−オキシド(三光株式会社製、商品名HCA−HQ)とエポキシ樹脂類とを所定のモル比で反応させて得られる熱硬化性樹脂及び組成物が開示されている(特許文献1、2)。また、2官能以上のエポキシ基を有する樹脂とジフェニルホスフィニルヒドロキノンとを反応させてなるリン含有エポキシ樹脂が開示されている(特許文献3)。また、リン含有ポリヒドロキシエーテル樹脂が開示されている(特許文献4)。この様な反応型のリン化合物を用いることで赤リンを使用した場合の危険性、添加型のリン化合物を配合した場合のブリードアウトの問題、リン酸エステル類を使用した場合のはんだ耐熱性、耐溶剤性の低下等の問題点は解決できている。ところが、このようなリン化合物とエポキシ樹脂との反応によって得られるリン含有エポキシ樹脂、リン含有ポリヒドロキシポリエーテル樹脂は、リン含有率が高くなるにつれて分子量が大きくなるため、十分な難燃性が得られる樹脂の粘度は高く、作業性やガラスクロス等の基材への含浸性が悪くなる問題があった。これらの問題に対して反応性希釈剤を併用して対応しているが、併用した反応性希釈剤の影響により物性の低下が起こった(特許文献3)。
また、エポキシ樹脂(a)とリン含有フェノール化合物を必須成分とする反応性官能基を有する化合物類(b)を理論エポキシ当量の60%から95%の範囲とするリン含有エポキシ樹脂が開示されており、末端反応基としてエポキシ基とフェノール性水酸基を併せ持つことによって分子量を低く抑え、粘度を低下する方法が開示されている(特許文献5)。しかし、この方法においてもエポキシ当量により配合比が決まってしまうため、所望のリン含有率に調整するには硬化剤も含めて再検討しなければならず、リン含有率の調整は困難であった。
For the above problem, 10- (2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide (trade name HCA-HQ, manufactured by Sanko Co., Ltd.) and epoxy resins Thermosetting resins and compositions obtained by reacting at a predetermined molar ratio are disclosed (
Also disclosed is a phosphorus-containing epoxy resin in which the epoxy resin (a) and the compound (b) having a reactive functional group containing a phosphorus-containing phenol compound as essential components are in the range of 60% to 95% of the theoretical epoxy equivalent. In addition, a method is disclosed in which the molecular weight is kept low and the viscosity is lowered by having an epoxy group and a phenolic hydroxyl group as terminal reactive groups (Patent Document 5). However, even in this method, since the compounding ratio is determined by the epoxy equivalent, in order to adjust to the desired phosphorus content, it is necessary to review including the curing agent, and it is difficult to adjust the phosphorus content .
本発明は添加型のリン系難燃剤と同様に添加量を調整することでリン含有率を任意に調整可能でありながら、ブリードアウトの問題が無く、溶剤溶解性、含浸性の優れるリン含有エポキシ樹脂を提供するものである。 The present invention is a phosphorus-containing epoxy having an excellent solvent solubility and impregnation property without any bleed-out problem, although the phosphorus content can be arbitrarily adjusted by adjusting the addition amount in the same manner as the additive type phosphorus flame retardant. Resin is provided.
本発明者らは、このリン含有エポキシ樹脂は該樹脂のエポキシ当量と活性水素当量を一定の範囲とし、この当量比ほぼ同等にすることにより、溶剤溶解性、含浸性を良好なものとすることが可能であることを見出し、本発明に完成した。 The inventors of the present invention have made the phosphorus-containing epoxy resin have good solvent solubility and impregnation property by keeping the epoxy equivalent and active hydrogen equivalent of the resin within a certain range and making this equivalent ratio almost equal. Was found to be possible, and the present invention was completed.
すなわち、本発明は、エポキシ基および活性水素基を有するリン含有エポキシ樹脂において、エポキシ当量が1000〜5000g/eqの範囲内であり、活性水素当量が1000〜5000g/eqの範囲内であり、かつエポキシ基1当量に対して活性水素基が0.95〜1.05当量の範囲であることを特徴とするリン含有エポキシ樹脂である。 That is, according to the present invention, in the phosphorus-containing epoxy resin having an epoxy group and an active hydrogen group, the epoxy equivalent is in the range of 1000 to 5000 g / eq, the active hydrogen equivalent is in the range of 1000 to 5000 g / eq, and The phosphorus-containing epoxy resin is characterized in that the active hydrogen group is in the range of 0.95 to 1.05 equivalent to 1 equivalent of epoxy group.
また、本発明は、エポキシ樹脂(a)と、活性水素基を有するリン化合物(b)を必須の成分とする活性水素基含有化合物(c)を、反応して得られることを特徴とする上記のリン含有エポキシ樹脂である。 In addition, the present invention is obtained by reacting an epoxy resin (a) with an active hydrogen group-containing compound (c) containing a phosphorus compound (b) having an active hydrogen group as an essential component. This is a phosphorus-containing epoxy resin.
活性水素基を有するリン化合物(b)は、一般式(1)で示されるリン化合物(b1)、一般式(2)で示されるリン化合物(b2)または両者であることができる。
エポキシ樹脂(a)と、活性水素基含有化合物(c)の比を、エポキシ樹脂(a)のエポキシ基1当量に対して活性水素基含有化合物(c)の活性水素基0.95〜1.05当量の範囲とすることがよい。また、活性水素基としては、フェノール性水酸基が挙げられる。 The ratio of the epoxy resin (a) to the active hydrogen group-containing compound (c) is set such that the active hydrogen group-containing compound (c) has an active hydrogen group ratio of 0.95 to 1.5 with respect to 1 equivalent of the epoxy group of the epoxy resin (a). A range of 05 equivalents is preferred. Moreover, a phenolic hydroxyl group is mentioned as an active hydrogen group.
また、本発明は、エポキシ樹脂と硬化剤(C)とを含むリン含有エポキシ樹脂組成物において、エポキシ樹脂の一部として上記のリン含有エポキシ樹脂を含むことを特徴とするリン含有エポキシ樹脂組成物である。 The present invention also provides a phosphorus-containing epoxy resin composition comprising the above-described phosphorus-containing epoxy resin as a part of the epoxy resin in a phosphorus-containing epoxy resin composition containing an epoxy resin and a curing agent (C). It is.
更に本発明は、上記のリン含有エポキシ樹脂組成物を繊維状基材に含浸してなるプリプレグであり、また上記のリン含有エポキシ樹脂組成物またはプリプレグを硬化させた硬化物である。 Furthermore, the present invention is a prepreg obtained by impregnating a fibrous base material with the above phosphorus-containing epoxy resin composition, and is a cured product obtained by curing the above phosphorus-containing epoxy resin composition or prepreg.
本発明のリン含有エポキシ樹脂は、同一樹脂中にエポキシ基と活性水素基をほぼ同数持っていることからそれ自体で硬化が可能である。また、難燃性がないか、不十分なエポキシ樹脂組成物中に本発明のリン含有エポキシ樹脂を配合することで、リン含有率を調整することができ、難燃性を向上できる。この時、リン含有エポキシ樹脂のエポキシ当量や活性水素当量を考慮する必要が無い。つまり、反応型リン含有エポキシ樹脂でありながら、添加型難燃剤の様に使用可能である。その上、本発明のリン含有エポキシ樹脂はエポキシ樹脂組成物中のエポキシ樹脂や硬化剤と反応するため、添加型難燃剤と異なり、ブリードアウトの問題は無い。 Since the phosphorus-containing epoxy resin of the present invention has almost the same number of epoxy groups and active hydrogen groups in the same resin, it can be cured by itself. Moreover, a phosphorus content rate can be adjusted and a flame retardance can be improved by mix | blending the phosphorus containing epoxy resin of this invention in the epoxy resin composition which does not have flame retardance, or is inadequate. At this time, there is no need to consider the epoxy equivalent or active hydrogen equivalent of the phosphorus-containing epoxy resin. That is, although it is a reactive phosphorus-containing epoxy resin, it can be used like an additive-type flame retardant. Moreover, since the phosphorus-containing epoxy resin of the present invention reacts with the epoxy resin and the curing agent in the epoxy resin composition, there is no bleed-out problem unlike the additive type flame retardant.
以下、本発明の実施形態について詳細に説明する。
本発明のリン含有エポキシ樹脂は、エポキシ基および活性水素基を有し、エポキシ当量が1000〜5000g/eqの範囲内であり、活性水素当量が1000〜5000g/eqの範囲内であり、活性水素当量/エポキシ当量比が0.95〜1.05の範囲である。活性水素基とはエポキシ基と反応性の活性水素を有する官能基のことであり、具体的には、カルボキシル基やアミノ基やフェノール性水酸基等が挙げられ、その中でもフェノール性水酸基が好ましい。なお、活性水素基に関して、1モルのカルボキシル基やフェノール性水酸基は1当量と、アミノ基(NH2)は2当量と計算される。
Hereinafter, embodiments of the present invention will be described in detail.
The phosphorus-containing epoxy resin of the present invention has an epoxy group and an active hydrogen group, has an epoxy equivalent in the range of 1000 to 5000 g / eq, an active hydrogen equivalent in the range of 1000 to 5000 g / eq, The equivalent / epoxy equivalent ratio is in the range of 0.95 to 1.05. The active hydrogen group is a functional group having an active hydrogen reactive with an epoxy group, and specifically includes a carboxyl group, an amino group, a phenolic hydroxyl group, and the like, and among them, a phenolic hydroxyl group is preferable. In addition, regarding an active hydrogen group, 1 mol of carboxyl groups and phenolic hydroxyl groups are calculated as 1 equivalent, and an amino group (NH 2 ) is calculated as 2 equivalents.
本発明のリン含有エポキシ樹脂は、エポキシ樹脂(a)と、活性水素基を有するリン化合物(b)を必須成分とする活性水素基含有化合物(c)を反応することで得られ、活性水素基を有するリン化合物(b)としては、耐熱性、耐水性等の観点から前記の一般式(1)で示されるリン化合物(b1)または前記の一般式(2)で示されるリン化合物(b2)がより好ましい。 The phosphorus-containing epoxy resin of the present invention is obtained by reacting an epoxy resin (a) with an active hydrogen group-containing compound (c) whose essential component is a phosphorus compound (b) having an active hydrogen group. The phosphorus compound (b) having a phosphorus compound (b1) represented by the general formula (1) or the phosphorus compound (b2) represented by the general formula (2) from the viewpoints of heat resistance, water resistance and the like Is more preferable.
エポキシ樹脂(a)は公知のエポキシ樹脂であれは特に制限はないが、好ましくは分子中に平均1〜4個のエポキシ基を持つものであり、分子中に平均1.5〜3.0個のエポキシ基を持つものがより好ましく、分子中に平均1.8〜2.2個程度のエポキシ基を持つものがさらに好ましい。特に好ましくは2官能型のエポキシ樹脂である。エポキシ基が、1個よりも少ないと活性水素基含有化合物(c)との反応時に官能基が減り高分子化しないことから接着力、耐熱性等に影響があり、4個よりも多いと反応時にゲル化したり、ゲル化しなくても得られるリン含有エポキシ樹脂の粘度が高くなることから含浸性、作業性に悪影響がある。 The epoxy resin (a) is not particularly limited as long as it is a known epoxy resin, but preferably has an average of 1 to 4 epoxy groups in the molecule, and an average of 1.5 to 3.0 in the molecule. Those having an epoxy group of 1 are more preferred, and those having an average of about 1.8 to 2.2 epoxy groups in the molecule are more preferred. Particularly preferred is a bifunctional epoxy resin. If the number of epoxy groups is less than one, the functional groups are reduced during the reaction with the active hydrogen group-containing compound (c) and the polymer is not polymerized. Since the viscosity of the phosphorus-containing epoxy resin obtained without gelation sometimes increases, the impregnation property and workability are adversely affected.
エポキシ樹脂(a)の具体的な例としては、エポトートYD−128、エポトートYD−8125、エポトートYD−825GS(新日鉄住金化学株式会社製ビスフェノールA型エポキシ樹脂)、エポトートYDF−170、エポトートYDF−170B、エポトートYDF−8170、YDF−870GS(新日鉄住金化学株式会社製ビスフェノールF型エポキシ樹脂)、YSLV−80XY(新日鉄住金化学株式会社製テトラメチルビスフェノールF型エポキシ樹脂)、エポトートYDC−1312(新日鉄住金化学株式会社製ヒドロキノン型エポキシ樹脂)、jERYX4000H(三菱化学株式会社製ビフェニル型エポキシ樹脂)、エポトートYDPN−638、エポトートYDPN−63X(新日鉄住金株式会社製フェノールノボラック型エポキシ樹脂)、エポトートYDCN−701(新日鉄住金化学株式会社製クレゾールノボラック型エポキシ樹脂)、エポトートZX−1201(新日鉄住金化学株式会社製ビスフェノールフルオレン型エポキシ樹脂)、TX−0710(新日鉄住金化学株式会社製ビスフェノールS型エポキシ樹脂)、エピクロンEXA−1515(大日本化学工業株式会社製ビスフェノールS型エポキシ樹脂)、NC−3000(日本化薬株式会社製ビフェニルアラルキルフェノール型エポキシ樹脂)、エポトートZX−1355、エポトートZX−1711(新日鉄住金化学株式会社製ナフタレンジオール型エポキシ樹脂)、エポトートESN−155(新日鉄住金化学株式会社製β−ナフトールアラルキル型エポキシ樹脂)、エポトートESN−355、エポトートESN−375(新日鉄住金化学株式会社製ジナフトールアラルキル型エポキシ樹脂)、エポトートESN−475V,エポトートESN−485(新日鉄住金化学株式会社製α−ナフトールアラルキル型エポキシ樹脂)、EPPN−501H(日本化薬株式会社製トリスフェニルメタン型エポキシ樹脂)、スミエポキシTMH−574(住友化学株式会社製トリスフェニルメタン型エポキシ樹脂)、YSLV−120TE(新日鉄住金化学株式会社製ビスチオエーテル型エポキシ樹脂)、エポトートZX−1684(新日鉄住金化学株式会社製レゾルシノール型エポキシ樹脂)、エピクロンHP−7200H(DIC株式会社製ジシクロペンタジエン型エポキシ樹脂)等のエポキシ樹脂がある。更に、TX−0929、TX−0934、TX−1032(新日鉄住金化学株式会社製アルキレングリコール型エポキシ樹脂)、セロキサイド2021(ダイセル化学工業株式会社製脂肪族環状エポキシ樹脂)、エポトートYH−434、(新日鉄住金化学株式会社製ジアミノジフェニルメタンテトラグリシジルアミン)等のエポキシ樹脂がある。更に、jER630(三菱化学株式会社製アミノフェノール型エポキシ樹脂)、エポトートFX−289B、エポトートFX−305、TX−0932A(新日鉄住金化学株式会社製リン含有エポキシ樹脂)、ウレタン変性エポキシ樹脂、オキサゾリドン環含有エポキシ樹脂等が挙げられるが、これらに限定されるものではない。また、これらのエポキシ樹脂は単独で使用しても2種類以上を併用して使用してもよい。 Specific examples of the epoxy resin (a) include Epototo YD-128, Epototo YD-8125, Epototo YD-825GS (Bisphenol A type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), Epototo YDF-170, Epototo YDF-170B. , Epototo YDF-8170, YDF-870GS (Nippon Steel & Sumikin Chemical Co., Ltd. bisphenol F type epoxy resin), YSLV-80XY (Nippon Steel & Sumikin Chemical Co., Ltd. tetramethylbisphenol F type epoxy resin), Epototo YDC-1312 (Nippon Steel & Sumikin Chemical) Hydroquinone type epoxy resin manufactured by Co., Ltd.), jERYX4000H (biphenyl type epoxy resin manufactured by Mitsubishi Chemical Co., Ltd.), Epototo YDPN-638, Epototo YDPN-63X (Phenol Novo manufactured by Nippon Steel & Sumikin Co., Ltd.) Type epoxy resin), Epototo YDCN-701 (Cresol novolak type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), Epototo ZX-1201 (Bisphenol fluorene type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), TX-0710 (Nippon Steel & Sumikin Chemical Co., Ltd.) Bisphenol S type epoxy resin manufactured by Co., Ltd.), Epicron EXA-1515 (Bisphenol S type epoxy resin manufactured by Dainippon Chemical Industry Co., Ltd.), NC-3000 (Biphenyl aralkyl phenol type epoxy resin manufactured by Nippon Kayaku Co., Ltd.), Epototo ZX- 1355, Epototo ZX-1711 (Naphthalenediol type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), Epototo ESN-155 (β-naphthol aralkyl type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), Epototo ESN -355, Epototo ESN-375 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., dinaphthol aralkyl epoxy resin), Epototo ESN-475V, Epototo ESN-485 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., α-naphthol aralkyl epoxy resin), EPPN-501H (Nippon Kayaku Co., Ltd. trisphenylmethane type epoxy resin), Sumiepoxy TMH-574 (Sumitomo Chemical Co., Ltd. trisphenylmethane type epoxy resin), YSLV-120TE (Nippon Steel & Sumikin Chemical Co., Ltd. bisthioether type epoxy resin), There are epoxy resins such as Epototo ZX-1684 (Resorcinol type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.) and Epicron HP-7200H (Dicyclopentadiene type epoxy resin manufactured by DIC Corporation). Furthermore, TX-0929, TX-0934, TX-1032 (alkylene glycol type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), Celoxide 2021 (aliphatic cyclic epoxy resin manufactured by Daicel Chemical Industries, Ltd.), Epototo YH-434, (Nippon Steel) There are epoxy resins such as diaminodiphenylmethanetetraglycidylamine manufactured by Sumikin Chemical Co., Ltd. Furthermore, jER630 (Mitsubishi Chemical Co., Ltd. aminophenol type epoxy resin), Epototo FX-289B, Epototo FX-305, TX-0932A (Nippon Steel & Sumikin Chemical Co., Ltd. phosphorus-containing epoxy resin), urethane-modified epoxy resin, oxazolidone ring-containing Examples include, but are not limited to, epoxy resins. These epoxy resins may be used alone or in combination of two or more.
活性水素基を有するリン化合物(b)は、リン酸、酸性リン酸エステル、酸性リン酸モノエステル、酸性亜リン酸ジエステル、前記の一般式(1)で示されるリン化合物(b1)、または前記の一般式(2)で示されるリン化合物(b2)等のエポキシ基と反応性の活性水素基を有するものである。具体的に例示すると、メチルアシッドホスフェート(混合物で平均分子量=119、大八化学工業製AP−1、堺化学工業製PhoslexA−1)、エチルアシッドホスフェート(混合物で平均分子量=139、堺化学工業製PhoslexA−2、城北化学工業製JP−501)、イソプロピルアシッドホスフェート(混合物で平均分子量=161、堺化学工業製PhoslexA−3)、ブチルアシッドホスフェート(混合物で平均分子量=182、堺化学工業製PhoslexA−4、大八化学工業製AP−4、城北化学工業製JP−504)、ジブチルホスフェート(単品で分子量=210、大八化学工業製DP−4、城北化学工業製DBP)、モノブチルホスフェート(単品で分子量=154、大八化学工業製MP−4)、ブトキシエチルアシッドホスフェート(混合物、城北化学工業製JP−508H)、2−エチルヘキシルアシッドホスフェート(混合物で平均分子量=266、堺化学工業製PhoslexA−8、大八化学工業製AP−8、城北化学工業製JP−508)、ビス(2−エチルヘキシル)ホスフェート(単品で分子量=322、大八化学工業製DP−8R、城北化学工業製LB−58、堺化学工業製PhoslexA−208)、イソデシルアシッドホスフェート(混合物で平均分子量=308、堺化学工業製PhoslexA−10、大八化学工業製AP−10)、モノイソデシルアシッドホスフェート(単品で分子量=238、大八化学工業製MP−10)、ラウリルアシッドホスフェート(混合物で平均分子量=355、堺化学工業製PhoslexA−12)、トリデシルアシッドホスフェート(混合物で平均分子量=371、堺化学工業製PhoslexA−13)、ステアリルアシッドホスフェート(混合物で平均分子量=437、堺化学工業製PhoslexA−18)、イソステアリルアシッドホスフェート(混合物で平均分子量=437、堺化学工業製PhoslexA−180L)、オレイルアシッドホスフェート(混合物で平均分子量=467、堺化学工業製PhoslexA−18D、城北化学製JP−518D)、ブチルピロホスフェート(城北化学製JP−504A)、テトラコシルアシッドホスフェート(城北化学製JP−524)、エチレングリコールアシッドホスフェート(城北化学製EGAP)、(2−ヒドロキシエチル)メタクリレートアシッドホスフェート(城北化学製JPA−514)等が挙げられるが、これらに限定されるものではない。 The phosphorus compound (b) having an active hydrogen group is phosphoric acid, acidic phosphoric acid ester, acidic phosphoric acid monoester, acidic phosphorous acid diester, the phosphorus compound (b1) represented by the general formula (1), or the above And having an active hydrogen group reactive with an epoxy group such as the phosphorus compound (b2) represented by the general formula (2). Specifically, methyl acid phosphate (mixture average molecular weight = 119, Daihachi Chemical Industry AP-1; Sakai Chemical Industry Phoslex A-1), ethyl acid phosphate (mixture average molecular weight = 139, Sakai Chemical Industry Co., Ltd.) Phoslex A-2, Johoku Chemical Industry JP-501), isopropyl acid phosphate (average molecular weight of mixture = 161, Sakai Chemical Industry's Phoslex A-3), butyl acid phosphate (average molecular weight of mixture = 182, Sakai Chemical Industry's Phoslex A- 4, Daihachi Chemical Industry AP-4, Johoku Chemical Industry JP-504), dibutyl phosphate (single product, molecular weight = 210, Daihachi Chemical Industry DP-4, Johoku Chemical Industry DBP), monobutyl phosphate (single product) And molecular weight = 154, MP-8 manufactured by Daihachi Chemical Industry, Buto Cyethyl acid phosphate (mixture, JP-508H manufactured by Johoku Chemical Industry Co., Ltd.), 2-ethylhexyl acid phosphate (average molecular weight of the mixture = 266, Phoslex A-8 manufactured by Sakai Chemical Industry Co., Ltd., AP-8 manufactured by Daihachi Chemical Industry Co., Ltd. JP-508), bis (2-ethylhexyl) phosphate (single product, molecular weight = 322, DP-8R manufactured by Daihachi Chemical Industry, LB-58 manufactured by Johoku Chemical Industry, Phoslex A-208 manufactured by Sakai Chemical Industry), isodecyl acid phosphate ( Average molecular weight of mixture = 308, Phoslex A-10 manufactured by Sakai Chemical Industry, AP-10 manufactured by Daihachi Chemical Industry, monoisodecyl acid phosphate (single product, molecular weight = 238, MP-10 manufactured by Daihachi Chemical Industry), lauryl acid phosphate (Average molecular weight of mixture = 355, Ph made by Sakai Chemical Industry slexA-12), tridecyl acid phosphate (average molecular weight of the mixture = 371, Phoslex A-13 manufactured by Sakai Chemical Industry), stearyl acid phosphate (average molecular weight of the mixture = 437, Phoslex A-18 manufactured by Sakai Chemical Industry), isostearyl acid phosphate (Molecular average in the mixture = 437, Phoslex A-180L manufactured by Sakai Chemical Industry), oleyl acid phosphate (average molecular weight in the mixture = 467, Phoslex A-18D manufactured by Sakai Chemical Industry, JP-518D manufactured by Johoku Chemical), Butyl pyrophosphate (Johoku Chemical) JP-504A), Tetracosyl Acid Phosphate (JP-524, Johoku Chemical), Ethylene Glycol Acid Phosphate (EGAP, Johoku Chemical), (2-Hydroxyethyl) Methacrylate Acid Phosphate (JPA-514 manufactured by Johoku Chemical Co., Ltd.) and the like can be mentioned, but are not limited thereto.
活性水素基を有するリン化合物(b)の中でも、一般式(1)で示されるリン化合物(b1)または一般式(2)で示されるリン化合物(b2)がより好ましい。一般式(1)および(2)において、R1、R2、R3及びR4は炭素数1〜6の炭化水素基、好ましくはアルキル基またはフェニル基を表し、同一であっても異なっていてもよく、R1及びR2、またはR3及びR4はリン原子と共に環状構造を形成してもよい。j、kは0または1を表す。Aは炭素数6〜20の3価の芳香族炭化水素基を表す。 Among the phosphorus compounds (b) having an active hydrogen group, the phosphorus compound (b1) represented by the general formula (1) or the phosphorus compound (b2) represented by the general formula (2) is more preferable. In the general formulas (1) and (2), R 1 , R 2 , R 3 and R 4 each represent a hydrocarbon group having 1 to 6 carbon atoms, preferably an alkyl group or a phenyl group, and may be the same or different. R 1 and R 2 , or R 3 and R 4 may form a cyclic structure with a phosphorus atom. j and k each represents 0 or 1; A represents a trivalent aromatic hydrocarbon group having 6 to 20 carbon atoms.
上記Aで表わされる芳香族炭化水素環としては、ベンゼン環、縮合多環式芳香族炭化水素環等が挙げられる。縮合多環式芳香族炭化水素環としては、縮合二環式炭化水素(例えば、インデン、ナフタレン等の炭素数8〜20の縮合二環式炭化水素、好ましくは炭素数10〜16の縮合二環式炭化水素)、縮合三環式炭化水素(例えば、アントラセン、フェナントレン等)等の縮合2〜4環式芳香族炭化水素環が挙げられる。好ましい縮合多環式芳香族炭化水素環としては、ナフタレン環、アントラセン環等が挙げられ、特にナフタレン環が好ましい。なお、それぞれの環は置換基としてメチル基またはフェニル基を有しても良い。 Examples of the aromatic hydrocarbon ring represented by A include a benzene ring and a condensed polycyclic aromatic hydrocarbon ring. The condensed polycyclic aromatic hydrocarbon ring includes a condensed bicyclic hydrocarbon (for example, a condensed bicyclic hydrocarbon having 8 to 20 carbon atoms such as indene and naphthalene, preferably a condensed bicyclic ring having 10 to 16 carbon atoms). And condensed 2-4 cyclic aromatic hydrocarbon rings such as condensed tricyclic hydrocarbons (for example, anthracene, phenanthrene, etc.). Preferred examples of the condensed polycyclic aromatic hydrocarbon ring include a naphthalene ring and an anthracene ring, and a naphthalene ring is particularly preferable. Each ring may have a methyl group or a phenyl group as a substituent.
一般式(1)、(2)で示されるリン化合物は、具体的には9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキシド(三光株式会社製、商品名HCA)、ジフェニルホスフィン等のリン原子に直結した活性水素基を有するリン化合物や10−(2,5−ジヒドロキシフェニル)−10H−9−オキサ−10−ホスファフェナントレン−10−オキシド(三光株式会社製、商品名HCA−HQ)、10−(1,4−ジオキシナフタレン)−10H−9−オキサ−10−ホスファフェナントレン−10−オキシド(以下DOPO−NQ)、ジフェニルホスフィニルヒドロキノン(北興化学工業株式会社製、商品名PPQ)、ジフェニルホスフェニル−1,4−ジオキシナフタリン、1,4−シクロオクチレンホスフィニル−1,4−フェニルジオール(日本化学工業株式会社製、商品名CPHO−HQ)、1,5−シクロオクチレンホスフィニル−1,4−フェニルジオール(日本化学工業株式会社製、商品名CPHO−HQ)等のリン含有フェノール類を挙げられる。リン化合物(b)はこれら例示したものに限定されるものではない。また、これらのリン化合物は単独で使用しても2種類以上を併用して使用してもよい。
Specifically, the phosphorus compounds represented by the general formulas (1) and (2) are 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (manufactured by Sanko Co., Ltd., trade name HCA), Phosphorus compounds having an active hydrogen group directly bonded to a phosphorus atom, such as diphenylphosphine, and 10- (2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide (manufactured by Sanko Co., Ltd., products Name HCA-HQ), 10- (1,4-dioxynaphthalene) -10H-9-oxa-10-phosphaphenanthrene-10-oxide (hereinafter DOPO-NQ), diphenylphosphinylhydroquinone (Hokuko Chemical Co., Ltd.) Product name PPQ), diphenylphosphenyl-1,4-dioxynaphthalene, 1,4-
エポキシ樹脂(a)と、活性水素基を有するリン化合物(b)を必須成分とする活性水素基含有化合物(c)反応はエポキシ樹脂の公知の反応方法を応用することができる。すなわち、反応温度60〜200℃、好ましくは、100〜180℃で撹拌することで反応を行う。60℃よりも低いと反応時間が長くなり経済的でなく、200℃を超える温度ではエポキシ当量と活性水素当量を制御することが難しくなる。 For the reaction of the active hydrogen group-containing compound (c) having the epoxy resin (a) and the phosphorus compound (b) having an active hydrogen group as essential components, a known reaction method of an epoxy resin can be applied. That is, the reaction is carried out by stirring at a reaction temperature of 60 to 200 ° C., preferably 100 to 180 ° C. When the temperature is lower than 60 ° C., the reaction time becomes longer and it is not economical, and at a temperature higher than 200 ° C., it becomes difficult to control the epoxy equivalent and the active hydrogen equivalent.
反応はエポキシ樹脂(a)と活性水素基含有化合物(c)を一括で仕込み反応しても良く、また、活性水素基含有化合物(c)を数回に分けて添加反応をしても良い。 In the reaction, the epoxy resin (a) and the active hydrogen group-containing compound (c) may be charged and reacted at once, or the active hydrogen group-containing compound (c) may be added and divided into several times.
反応には必要に応じて触媒を用いることもできる。触媒はエポキシ樹脂の製造で用いられる公知公用の触媒が使用できる。使用できる触媒としては、トリフェニルホスフィン、トリス(2,6−ジメトキシフェニル)ホスフィン等のホスフィン類、n−ブチルトリフェニルホスホニウムブロミド、エチルトリフェニルホスホニウムヨージド等の四級ホスホニウム塩類、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール等のイミダゾール類、テトラメチルアンモニウムクロリド、テトラエチルアンモニウムブロミド等の四級アンモニウム塩類、トリエチルアミン、ベンジルジメチルアミン等の三級アミン類等、公知慣用の触媒が挙げられ、これらに限定されるものではない。これら触媒の使用量は、活性水素基含有化合物(c)全量に対して0.005〜1質量%の範囲が好ましい。 A catalyst may be used for the reaction as necessary. As the catalyst, known and publicly used catalysts used in the production of epoxy resins can be used. Catalysts that can be used include phosphines such as triphenylphosphine and tris (2,6-dimethoxyphenyl) phosphine, quaternary phosphonium salts such as n-butyltriphenylphosphonium bromide and ethyltriphenylphosphonium iodide, 2-ethyl- Examples of known catalysts include imidazoles such as 4-methylimidazole and 2-phenylimidazole, quaternary ammonium salts such as tetramethylammonium chloride and tetraethylammonium bromide, and tertiary amines such as triethylamine and benzyldimethylamine. It is not limited to these. The amount of these catalysts used is preferably in the range of 0.005 to 1% by mass relative to the total amount of the active hydrogen group-containing compound (c).
活性水素基含有化合物(c)におけるリン化合物(b)の占める割合は、3wt%以上、好ましくは5〜100wt%である。リン化合物(b)の割合が大きいと得られたエポキシ樹脂の難燃効果が大きいので、難燃性の劣るエポキシ樹脂と共に使用して難燃性のエポキシ樹脂組成物とすることができる。また、リン化合物(b)の割合が小さい場合であっても、このエポキシ樹脂のみ、または他のエポキシ樹脂を少量使用して難燃性のエポキシ樹脂組成物とすることができる。添加型難燃剤では、リン含有率が多ければ添加量も少なくて済み、硬化物の物性に与える難燃剤の影響が少なくなるが、本発明のリン含有エポキシ樹脂の場合、硬化時に反応して硬化物と一体化するため、硬化物の物性に与える難燃剤の影響が少なく、多量に配合可能であり、リン含有率を高くする必要性は添加型難燃剤に比べ少ない。 The proportion of the phosphorus compound (b) in the active hydrogen group-containing compound (c) is 3 wt% or more, preferably 5 to 100 wt%. When the ratio of the phosphorus compound (b) is large, the obtained epoxy resin has a large flame retardant effect, so that it can be used together with an epoxy resin having inferior flame retardancy to form a flame retardant epoxy resin composition. Moreover, even if the ratio of a phosphorus compound (b) is small, it can be set as a flame-retardant epoxy resin composition using only this epoxy resin or a small amount of other epoxy resins. In the additive type flame retardant, if the phosphorus content is high, the addition amount may be small, and the influence of the flame retardant on the physical properties of the cured product is reduced. However, in the case of the phosphorus-containing epoxy resin of the present invention, it reacts and cures at the time of curing. Since it is integrated with the product, the effect of the flame retardant on the physical properties of the cured product is small, it can be blended in large amounts, and the need for increasing the phosphorus content is less than that of the additive-type flame retardant.
別の観点から、本発明のリン含有エポキシ樹脂のみをエポキシ樹脂として使用する場合、リン含有エポキシ樹脂のリン含有率が3〜6質量%の範囲となるように活性水素基を有するリン化合物(b)の量を調整することがよい。リン含有率が3質量%未満だと十分な難燃性が得られず、リン含有率が6質量%より大きいと溶剤溶解性、接着力、耐熱性等の諸物性が悪くなる。しかし、他のエポキシ樹脂と併用する場合は、エポキシ樹脂全体として上記範囲を満たすことがよい。 From another viewpoint, when only the phosphorus-containing epoxy resin of the present invention is used as an epoxy resin, the phosphorus compound (b) having an active hydrogen group so that the phosphorus content of the phosphorus-containing epoxy resin is in the range of 3 to 6% by mass. ) Amount may be adjusted. When the phosphorus content is less than 3% by mass, sufficient flame retardancy cannot be obtained, and when the phosphorus content is greater than 6% by mass, various physical properties such as solvent solubility, adhesive strength and heat resistance are deteriorated. However, when used in combination with other epoxy resins, the epoxy resin as a whole preferably satisfies the above range.
活性水素基含有化合物(c)が、リン化合物(b)以外の活性水素基含有化合物(c3)を含む場合、活性水素基含有化合物(c3)としては、次のような化合物が挙げられる。具体的にはカテコール、レゾルシノール、ヒドロキノン等のヒドロキシベンゼン類、ビフェノール類、ビナフトール類、トリスフェノール類、ビスフェノールA、ビスフェノールF、ビスフェノールS等の2価フェノール類、ショウノールBRG−555(昭和電工株式会社製フェノールノボラック樹脂)、クレゾールノボラック樹脂、アルキルフェノールノボラック樹脂、アラルキルフェノールノボラック樹脂、トリアジン環含有フェノールノボラック樹脂、ビフェニルアラルキルフェノール樹脂、レヂトップTPM−100(群栄化学工業株式会社製トリスヒドロキシフェニルメタン型ノボラック樹脂)、アラルキルナフタレンジオール樹脂等の一分子中に2個以上のフェノール性水酸基と有する化合物類、アジピン酸ジヒドラジド、セバシン酸ジヒドラジド等のヒドラジド類、イミダゾール化合物類及びその塩類、ジシアンジアミド、アミノ安息香酸エステル類、ジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、メタキシレンジアミン、イソホロンジアミン等の脂肪族アミン類、ジアミノジフェニルメタン、ジアミノジフェニルスルホン、ジアミノエチルベンゼン等の芳香族アミン類、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、無水メチルナジック酸等の酸無水物類等が挙げられ、これらを2種類以上使用してもよい。 When the active hydrogen group-containing compound (c) includes an active hydrogen group-containing compound (c3) other than the phosphorus compound (b), examples of the active hydrogen group-containing compound (c3) include the following compounds. Specifically, hydroxybenzenes such as catechol, resorcinol and hydroquinone, biphenols, binaphthols, trisphenols, dihydric phenols such as bisphenol A, bisphenol F and bisphenol S, Shonor BRG-555 (Showa Denko Co., Ltd.) Phenol novolak resin), cresol novolak resin, alkylphenol novolak resin, aralkyl phenol novolak resin, triazine ring-containing phenol novolak resin, biphenyl aralkyl phenol resin, Resitop TPM-100 (Trishydroxyphenylmethane type novolak resin manufactured by Gunei Chemical Industry Co., Ltd.) ), Compounds having two or more phenolic hydroxyl groups in one molecule such as aralkyl naphthalene diol resin, adipic acid dihydrazide, Hydrazides such as cyanodihydrazide, imidazole compounds and salts thereof, dicyandiamide, aminobenzoic acid esters, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, metaxylenediamine, isophoronediamine and other aliphatic amines, diaminodiphenylmethane, Aromatic amines such as diaminodiphenylsulfone and diaminoethylbenzene, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydro Examples thereof include acid anhydrides such as phthalic anhydride and methyl nadic anhydride, and two or more of these may be used.
本発明のリン含有エポキシ樹脂の活性水素基は、特性を損なわない範囲で使用できるその他の反応性化合物の活性水素基であっても良い。また、本発明のエポキシ樹脂は、上記エポキシ当量等の特性を満足する限り、未反応のエポキシ樹脂(a)または活性水素基含有化合物(c)を含有していてもよく、例えば、反応終了後に樹脂特性の微調整のため、原料の一部を追加混合したものでもよい。 The active hydrogen group of the phosphorus-containing epoxy resin of the present invention may be an active hydrogen group of another reactive compound that can be used as long as the characteristics are not impaired. Moreover, the epoxy resin of the present invention may contain an unreacted epoxy resin (a) or an active hydrogen group-containing compound (c) as long as the above-mentioned properties such as epoxy equivalent are satisfied. In order to finely adjust the resin characteristics, a part of the raw material may be additionally mixed.
反応して得られるリン含有エポキシ樹脂のエポキシ当量が1000〜5000g/eqの範囲内であり、活性水素当量が1000〜5000g/eqの範囲内であり、かつエポキシ基1当量に対して活性水素基が0.95〜1.05当量の範囲となるように反応を制御することが重要である。 The epoxy equivalent of the phosphorus-containing epoxy resin obtained by the reaction is in the range of 1000 to 5000 g / eq, the active hydrogen equivalent is in the range of 1000 to 5000 g / eq, and the active hydrogen group is equivalent to 1 equivalent of epoxy group. It is important to control the reaction so that is in the range of 0.95 to 1.05 equivalents.
反応制御には反応温度、触媒量、反応溶剤等を調整することで所望のエポキシ当量、活性水素当量とすることが可能である。すなわち、反応温度を低下させて反応速度を調整し、所定の反応率で停止したり、触媒量を調整することで、所定のエポキシ当量で停止する条件としたり、反応溶剤により希釈率を変えて反応を制御することができる。そして、エポキシ樹脂(a)と活性水素基含有化合物(c)のエポキシ基と活性水素基の当量比(活性水素基/エポキシ基)が1.0近辺、好ましくは0.95〜1.05になるように、反応原料の使用量を調整することがよい。当量比を1.0近辺とすることにより、未反応で残るエポキシ基と活性水素基の量がほぼ同じとなり、当量比も0.95〜1.05におさまることになる。 For the reaction control, the desired epoxy equivalent and active hydrogen equivalent can be obtained by adjusting the reaction temperature, the amount of catalyst, the reaction solvent, and the like. That is, the reaction rate is adjusted by lowering the reaction temperature and stopped at a predetermined reaction rate, or by adjusting the amount of catalyst, the reaction is stopped at a predetermined epoxy equivalent, or the dilution rate is changed by the reaction solvent. The reaction can be controlled. The reaction raw material is such that the equivalent ratio (active hydrogen group / epoxy group) of the epoxy group and the active hydrogen group of the epoxy resin (a) and the active hydrogen group-containing compound (c) is around 1.0, preferably 0.95 to 1.05. It is better to adjust the usage amount. By setting the equivalence ratio to around 1.0, the amount of the epoxy groups remaining unreacted and the active hydrogen groups becomes almost the same, and the equivalence ratio is also reduced to 0.95 to 1.05.
反応溶媒としては、非反応性であれば特に制限は無く、具体的にはベンゼン、トルエン、キシレン、エチルベンゼン、アセトン、メチルエチルケトン、メチルブチルケトン、ジプロピルケトン、シクロペンタノン、シクロヘキサノン、ジアルキルエーテル、2−エトキシエチルエチルエーテル、エタノール、2−ブトキシエタノール、グリコールエーテル、プロピレングリコールモノメチルエーテル、ジオキサン等が挙げられる。これらの反応溶媒は単独で、あるいは2種類以上を同時に使用してもよい。これらの反応溶媒の使用量は反応物全質量中の50%以下が好ましい。 The reaction solvent is not particularly limited as long as it is non-reactive. Specifically, benzene, toluene, xylene, ethylbenzene, acetone, methyl ethyl ketone, methyl butyl ketone, dipropyl ketone, cyclopentanone, cyclohexanone, dialkyl ether, 2 -Ethoxyethyl ethyl ether, ethanol, 2-butoxyethanol, glycol ether, propylene glycol monomethyl ether, dioxane and the like can be mentioned. These reaction solvents may be used alone or in combination of two or more. The amount of these reaction solvents used is preferably 50% or less of the total mass of the reaction product.
また、リン含有エポキシ樹脂の数平均分子量(Mn)は特に規定しないが、3000以下が好ましく、2000以下より好ましい。特に、Mnが5000を超えると含浸性、作業性に悪影響がある。 Further, the number average molecular weight (Mn) of the phosphorus-containing epoxy resin is not particularly limited, but is preferably 3000 or less, more preferably 2000 or less. In particular, when Mn exceeds 5000, the impregnation property and workability are adversely affected.
活性水素基を有するリン化合物(b)が一般式(2)で表わされるような2価フェノール化合物のみである場合、エポキシ樹脂(a)のエポキシ基1モルに対してフェノール性水酸基0.95〜1.05モルの範囲で反応することによって本発明のリン含有エポキシ樹脂を得ることができる。このモル比範囲とすることで、得られるリン含有エポキシ樹脂のエポキシ基1モルに対するフェノール性水酸基のモル比を0.95〜1.05モルの範囲とすることができる。 When the phosphorus compound (b) having an active hydrogen group is only a divalent phenol compound represented by the general formula (2), 0.95 to 0.55 of a phenolic hydroxyl group per 1 mol of the epoxy group of the epoxy resin (a). By reacting in the range of 1.05 mol, the phosphorus-containing epoxy resin of the present invention can be obtained. By setting it as this molar ratio range, the molar ratio of the phenolic hydroxyl group with respect to 1 mol of epoxy groups of the phosphorus containing epoxy resin obtained can be made into the range of 0.95-1.05 mol.
そして、上記当量範囲を満足するように活性水素基とエポキシ基の一部を残すように完全には反応させず、反応率を70〜92%とすることが好ましい。また、活性水素基またはエポキシ基のいずれか一方を完全に反応させ、残った活性水素基またはエポキシ基に、多官能のエポキシ化合物または活性水素基含有化合物を反応させて、消失した官能基を付与することもできる。特に、エポキシ樹脂(a)または活性水素基を有するリン化合物(b)が単官能のみからなる場合は、この方法が好ましい。 And it is preferable not to make it react completely so that a part of active hydrogen group and an epoxy group may remain so that the said equivalent range may be satisfied, and to set reaction rate to 70 to 92%. In addition, either the active hydrogen group or the epoxy group is completely reacted, and the remaining active hydrogen group or epoxy group is reacted with a polyfunctional epoxy compound or active hydrogen group-containing compound to give the lost functional group. You can also In particular, this method is preferred when the epoxy resin (a) or the phosphorus compound (b) having an active hydrogen group consists of only a monofunctional group.
こうして得られたリン含有エポキシ樹脂は溶剤溶解性に優れており、リン含有ポリヒドロキシポリエーテル樹脂では溶解できなかった溶剤でも容易に溶解することができ、溶液粘度も低いためガラスクロスへの含浸も容易である。 The phosphorus-containing epoxy resin thus obtained has excellent solvent solubility, can be easily dissolved even in a solvent that could not be dissolved by the phosphorus-containing polyhydroxy polyether resin, and the solution viscosity is low, so that the glass cloth can be impregnated. Easy.
本発明のリン含有エポキシ樹脂組成物は、エポキシ樹脂(D)と硬化剤(C)とを含み、エポキシ樹脂(D)は、本発明のリン含有エポキシ樹脂(A)と、それ以外のエポキシ樹脂(B)を含む。 The phosphorus-containing epoxy resin composition of the present invention includes an epoxy resin (D) and a curing agent (C), and the epoxy resin (D) includes the phosphorus-containing epoxy resin (A) of the present invention and other epoxy resins. (B) is included.
リン含有エポキシ樹脂組成物に用いられるエポキシ樹脂(B)は前記のエポキシ樹脂(a)と同様なものを用いることができる。エポキシ樹脂(B)はリン原子を分子内に含んでも良い。 As the epoxy resin (B) used in the phosphorus-containing epoxy resin composition, the same epoxy resin (a) as that described above can be used. The epoxy resin (B) may contain phosphorus atoms in the molecule.
リン含有エポキシ樹脂組成物に用いられる硬化剤(C)は前記の反応性化合物(c3)と同様なものを用いることができる。 As the curing agent (C) used in the phosphorus-containing epoxy resin composition, the same one as the reactive compound (c3) can be used.
エポキシ樹脂(D)と硬化剤(C)は通常のエポキシ樹脂組成物を作成する条件で配合可能であり、通常、硬化剤(C)はエポキシ樹脂(B)のエポキシ基1当量に対して活性水素基が0.2〜1.5当量となるように配合する。例えば、フェノール系、アミン系硬化剤を用いた場合は、エポキシ基に対して活性水素基をほぼ当量配合し、酸無水物系硬化剤を用いた場合、エポキシ基1当量に対して酸無水物基を0.5〜1.5当量、好ましくは、0.6〜1.0当量配合する。ジシアンジアミド(DICY)を使用した場合は、エポキシ基1当量に対して活性水素基を0.2〜1.2当量、好ましくは、0.3〜1.1当量配合して用いられる。イミダゾール化合物類の様に接触して反応が進行する場合はエポキシ樹脂に対する所定の質量比で配合されることもある。 The epoxy resin (D) and the curing agent (C) can be blended under the conditions for preparing a normal epoxy resin composition, and the curing agent (C) is usually active against 1 equivalent of epoxy group of the epoxy resin (B). It mix | blends so that a hydrogen group may be 0.2-1.5 equivalent. For example, when a phenolic or amine curing agent is used, an active hydrogen group is included in an equivalent amount with respect to the epoxy group, and when an acid anhydride curing agent is used, an acid anhydride with respect to 1 equivalent of the epoxy group. The group is blended in an amount of 0.5 to 1.5 equivalents, preferably 0.6 to 1.0 equivalents. When dicyandiamide (DICY) is used, 0.2 to 1.2 equivalents, preferably 0.3 to 1.1 equivalents, of active hydrogen groups are used per 1 equivalent of epoxy group. When the reaction proceeds by contact like imidazole compounds, they may be blended at a predetermined mass ratio with respect to the epoxy resin.
エポキシ樹脂と硬化剤(C)を配合したものに本発明のリン含有エポキシ樹脂(A)を配合することで本発明のリン含有エポキシ樹脂組成物を得ることができる。リン含有エポキシ樹脂の配合量は組成物中の所望のリン含有率により、配合量を増減するだけで良く、リン含有エポキシ樹脂を配合したことによるエポキシ樹脂または硬化剤と硬化反応が可能である。この反応が起きることから硬化物はより均一となり耐熱性、接着性等の高い特性が得られる。本発明のリン含有エポキシ樹脂(A)の配合量は、本発明のリン含有エポキシ樹脂(A)とそれ以外のエポキシ樹脂(B)と硬化剤(C)の合計に対し、0.5〜99.5質量%であり、好ましくは5〜90質量%であり、より好ましくは15〜75質量%であり、さらに好ましくは30〜60質量%である。 The phosphorus containing epoxy resin composition of this invention can be obtained by mix | blending the phosphorus containing epoxy resin (A) of this invention with what mix | blended the epoxy resin and the hardening | curing agent (C). The compounding amount of the phosphorus-containing epoxy resin only needs to be increased or decreased depending on the desired phosphorus content in the composition, and a curing reaction with the epoxy resin or the curing agent resulting from the compounding of the phosphorus-containing epoxy resin is possible. Since this reaction occurs, the cured product becomes more uniform and high properties such as heat resistance and adhesiveness can be obtained. The compounding quantity of the phosphorus containing epoxy resin (A) of this invention is 0.5-99 with respect to the sum total of the phosphorus containing epoxy resin (A) of this invention, the other epoxy resin (B), and a hardening | curing agent (C). 0.5 mass%, preferably 5-90 mass%, more preferably 15-75 mass%, and even more preferably 30-60 mass%.
また、本発明のリン含有エポキシ樹脂組成物には必要に応じて、充填材、熱硬化性樹脂、熱可塑性樹脂や、シランカップリング剤、酸化防止剤、離型剤、消泡剤、乳化剤、揺変性付与剤、平滑剤、難燃剤、顔料等の各種添加剤を配合することができる。
充填材としては、溶融シリカ、結晶シリカ、アルミナ、窒化ケイ素、水酸化アルミニウム、タルク、焼成タルク、クレー、カオリン、ベーマイト、マイカ、炭酸カルシウム、ケイ酸カルシウム、水酸化カルシウム、水酸化マグネシウム、炭酸マグネシウム、炭酸バリウム、硫酸バリウム、窒化ホウ素、酸化チタン、ガラス粉末、シリカバルーン、炭素、炭素繊維、ガラス繊維、アルミナ繊維、シリカアルミナ繊維、炭化ケイ素繊維、ポリエステル繊維、セルロース繊維、アラミド繊維、合成繊維、セラミック繊維等が挙げられる。
熱硬化性樹脂としては、エポキシ樹脂、メラニン樹脂、イソシアネート樹脂、フェノール樹脂、ポリエステル樹脂、シアネート樹脂、イミド樹脂、ビニル樹脂等が挙げられる。
熱可塑性樹脂としてはポリフェニルエーテル、ポリヒドロキシポリエーテル樹脂、アクリル樹脂、石油樹脂、インデン樹脂、ポリウレタン、ポリエステル、ポリアミド、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリエーテルスルホン、ポリスルホン、ポリエーテルエーテルケトン、ポリフェニレンスルフィド、ポリビニルホルマール等、クマロンインデン樹脂、微粒子ゴム、熱可塑性エラストマー等が挙げられる。
In addition, the phosphorus-containing epoxy resin composition of the present invention includes a filler, a thermosetting resin, a thermoplastic resin, a silane coupling agent, an antioxidant, a release agent, an antifoaming agent, an emulsifier, as necessary. Various additives such as thixotropic agents, smoothing agents, flame retardants, and pigments can be blended.
As fillers, fused silica, crystalline silica, alumina, silicon nitride, aluminum hydroxide, talc, calcined talc, clay, kaolin, boehmite, mica, calcium carbonate, calcium silicate, calcium hydroxide, magnesium hydroxide, magnesium carbonate , Barium carbonate, barium sulfate, boron nitride, titanium oxide, glass powder, silica balloon, carbon, carbon fiber, glass fiber, alumina fiber, silica alumina fiber, silicon carbide fiber, polyester fiber, cellulose fiber, aramid fiber, synthetic fiber, A ceramic fiber etc. are mentioned.
Examples of the thermosetting resin include an epoxy resin, a melanin resin, an isocyanate resin, a phenol resin, a polyester resin, a cyanate resin, an imide resin, and a vinyl resin.
Thermoplastic resins include polyphenyl ether, polyhydroxy polyether resin, acrylic resin, petroleum resin, indene resin, polyurethane, polyester, polyamide, polyimide, polyamideimide, polyetherimide, polyethersulfone, polysulfone, polyetheretherketone, Examples thereof include polyphenylene sulfide and polyvinyl formal, coumarone indene resin, fine particle rubber, and thermoplastic elastomer.
本発明のリン含有エポキシ樹脂組成物は特に回路基板用途として有用であり、シート状基材に含浸、乾燥することでプリプレグを得ることもできる。シート状基材としては、ガラス等の無機繊維や、ポリエステル等、ポリアミン、ポリアクリル、ポリイミド、ケブラー等の有機質繊維の織布または不織布を用いることができるが、これに限定されるものではない。プリプレグを製造する方法としては、特に限定するものではなく、例えば、シート状基材にリン含有エポキシ樹脂組成物を溶剤で粘度調整した樹脂ワニスに浸漬して含浸した後、加熱乾燥して樹脂成分を半硬化(Bステージ化)して得られるものであり、例えば100〜200℃で1〜40分間加熱乾燥することができる。また、プリプレグ中の樹脂量は、樹脂分30〜80質量%とすることが好ましい。 The phosphorus-containing epoxy resin composition of the present invention is particularly useful for circuit board applications, and a prepreg can also be obtained by impregnating and drying a sheet-like base material. As the sheet-like substrate, inorganic fibers such as glass, or woven or non-woven fabrics of organic fibers such as polyester, polyamine, polyacryl, polyimide, Kevlar, etc. can be used, but it is not limited thereto. The method for producing the prepreg is not particularly limited. For example, after impregnating a sheet-like substrate by dipping and impregnating a phosphorus-containing epoxy resin composition in a resin varnish whose viscosity is adjusted with a solvent, the resin component is dried by heating. Can be semi-cured (B-stage), and can be dried by heating at 100 to 200 ° C. for 1 to 40 minutes, for example. Moreover, it is preferable that the resin amount in a prepreg shall be 30-80 mass% of resin parts.
本発明のリン含有エポキシ樹脂組成物は、公知のエポキシ樹脂組成物と同様な方法により成型、硬化して硬化物とすることができる。成型方法、硬化方法は公知のエポキシ樹脂組成物と同様の方法をとることができ、本発明の樹脂組成物固有の方法は不要である。本発明のリン含有エポキシ樹脂硬化物は、積層物、成型物、接着物、塗膜、フィルム等の形態をとることができ、難燃性や耐熱性、接着性が良好であり、電気電子部品に用いられる封止材、銅張り積層板、絶縁塗料、難燃塗料、複合材、絶縁難燃接着剤等の材料として有用であることが判った。 The phosphorus-containing epoxy resin composition of the present invention can be molded and cured by the same method as known epoxy resin compositions to obtain a cured product. The molding method and the curing method can be the same methods as known epoxy resin compositions, and the method unique to the resin composition of the present invention is unnecessary. The cured phosphorus-containing epoxy resin of the present invention can take the form of a laminate, a molded product, an adhesive, a coating film, a film, etc., has good flame retardancy, heat resistance, and adhesiveness, and is an electric / electronic component. It was found to be useful as a material such as a sealing material, a copper-clad laminate, an insulating paint, a flame retardant paint, a composite material, and an insulating flame retardant adhesive.
次に本発明の実施例を示すが、本発明の範囲はこれら実施例に限定されるものではない。特に断りがない限り、部は質量部を表し、%は質量%を表す。また、分析方法、測定方法は以下の通りである。 Examples of the present invention are shown below, but the scope of the present invention is not limited to these examples. Unless otherwise specified, parts represent parts by mass, and% represents mass%. The analysis method and measurement method are as follows.
・不揮発分:JIS K 7235−1986
・ワニス粘度:コーンプレート型粘度計(東京計器株式会社製)を用い、ローターは標準コーン(1°34′)を使用して25℃の環境下、回転数10rpmで測定した。
Nonvolatile content: JIS K 7235-1986
Varnish viscosity: A cone plate viscometer (manufactured by Tokyo Keiki Co., Ltd.) was used, and the rotor was measured using a standard cone (1 ° 34 ') in an environment of 25 ° C at a rotation speed of 10 rpm.
・エポキシ当量:JIS K 7236に準じた。
・水酸基当量:試料に4%のメタノールを含むTHFを加え、10%テトラブチルアンモニウムヒドロキシドを加えて、紫外可視分光光度計を用いて波長400nmから250nm間の吸光度を測定し、フェノール性水酸基を水酸基1当量当たりの試料のg数として求めた。
Epoxy equivalent: Conforms to JIS K 7236.
・ Hydroxyl equivalent: THF containing 4% methanol was added to the sample, 10% tetrabutylammonium hydroxide was added, and the absorbance between 400 nm and 250 nm was measured using an ultraviolet-visible spectrophotometer. It calculated | required as g number of the samples per hydroxyl group equivalent.
・リン含有率:試料に硫酸、塩酸、過塩素酸を加え、加熱して湿式灰化し、全てのリン原子をオルトリン酸とした。硫酸酸性溶液中でメタバナジン酸塩及びモリブデン酸塩を反応させ、生じたリンバナードモリブデン酸錯体の420nmにおける吸光度を測定し、リン原子含有率を%で表した。積層板のリン含有率は、積層板の樹脂分に対する含有率として表した。 Phosphorus content: Sulfuric acid, hydrochloric acid and perchloric acid were added to the sample and heated to wet ash to convert all phosphorus atoms to orthophosphoric acid. Metavanadate and molybdate were reacted in a sulfuric acid acidic solution, and the absorbance at 420 nm of the resulting phosphomadomolybdate complex was measured, and the phosphorus atom content was expressed in%. The phosphorus content of the laminate was expressed as the content relative to the resin content of the laminate.
・数平均分子量(Mn):ゲルパーミエーションクロマトグラフィー(GPC)(東ソー株式会社製、HLC−8220GPC)を用いて分子量分布を測定し、標準ポリスチレンより求めた検量線より換算した。 -Number average molecular weight (Mn): molecular weight distribution was measured using gel permeation chromatography (GPC) (manufactured by Tosoh Corporation, HLC-8220GPC), and converted from a calibration curve obtained from standard polystyrene.
・赤外吸収スペクトル:フーリエ変換赤外分光光度計を用い、錠剤法(KBr)により測定した。 Infrared absorption spectrum: Measured by a tablet method (KBr) using a Fourier transform infrared spectrophotometer.
・ワニスの状態:配合後均一に混合し均一な溶液となったものを○、濁り、分離が生じたものを×で示した。
・含浸性:ガラスクロスに室温で含浸させ、含浸に要した時間で、3水準で評価した。5分以内;○、5-30分:△、30分超:×。
-State of varnish: The case where the mixture was uniformly mixed to form a uniform solution after blending was indicated by ○, and the case where turbidity and separation occurred was indicated by ×.
Impregnation property: Glass cloth was impregnated at room temperature, and the time required for impregnation was evaluated at three levels. Within 5 minutes; ○, 5-30 minutes: Δ, more than 30 minutes: ×.
・ガラス転移温度(Tg):示差走査熱量測定装置にて10℃/分の昇温条件で測定を行った時のDSC外挿値の温度で表した。 Glass transition temperature (Tg): Expressed by the DSC extrapolated temperature when measured with a differential scanning calorimeter at 10 ° C./min.
・接着力:JIS C 6481に準じた。
・難燃性:UL94(Underwriters Laboratories Inc.の安全認証規格)に準じた。評価はV−0,V−1,V−2で記した。但し、完全に燃焼したものは、「燃焼」と記した。
-Adhesive force: Conforms to JIS C 6481.
Flame retardance: Conforms to UL94 (Underwriters Laboratories Inc. safety certification standard). Evaluation was described by V-0, V-1, and V-2. However, what was completely burned was marked as “burning”.
実施例1
攪拌装置、温度計、冷却管、窒素ガス導入管を備えた4つ口のガラス製セパラブルフラスコ実験装置に、HCA(三光株式会社製、リン含有率14.2%)を305.4部、1,4−ナフトキノン(川崎化成工業株式会社製)を219.2部、トルエンを650部入れ、75℃で30分反応後昇温し、110℃で90分間反応させた。トルエンを除いてDOPO−NQを得た。これにエポトートYDF−170(新日鉄住金化学株式会社製、ビスフェノールF型液状エポキシ樹脂、エポキシ当量170g/eq)を475.4部、反応溶媒としてジエチレングリコールジメチルエーテル(以下、MDM)を52.6部、触媒としてトリフェニルホスフィン(TPP)を0.26部加えて160℃で3時間反応し、メチルエチルケトン(MEK)にて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.99であった。得られたリン含有エポキシ樹脂溶液は濃褐色透明で、不揮発分65%、ワニス粘度3650mPa・s、エポキシ当量1630g/eq、水酸基当量1630g/eq、リン含有率4.3%、数平均分子量1225であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は1.00モルであった。
Example 1
In a four-necked glass separable flask experimental apparatus equipped with a stirrer, a thermometer, a cooling pipe, and a nitrogen gas introduction pipe, 305.4 parts of HCA (manufactured by Sanko Co., Ltd., phosphorus content 14.2%), 219.2 parts of 1,4-naphthoquinone (manufactured by Kawasaki Kasei Kogyo Co., Ltd.) and 650 parts of toluene were added, reacted at 75 ° C. for 30 minutes, heated up, and reacted at 110 ° C. for 90 minutes. DOPO-NQ was obtained by removing toluene. 475.4 parts of Epototo YDF-170 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., bisphenol F type liquid epoxy resin, epoxy equivalent 170 g / eq), 52.6 parts of diethylene glycol dimethyl ether (hereinafter referred to as MDM) as a reaction solvent, catalyst Then, 0.26 part of triphenylphosphine (TPP) was added, reacted at 160 ° C. for 3 hours, and diluted with methyl ethyl ketone (MEK).
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.99. The resulting phosphorus-containing epoxy resin solution was dark brown and transparent with a non-volatile content of 65%, a varnish viscosity of 3650 mPa · s, an epoxy equivalent of 1630 g / eq, a hydroxyl group equivalent of 1630 g / eq, a phosphorus content of 4.3%, and a number average molecular weight of 1225. there were. From the results of epoxy equivalent and hydroxyl equivalent, the amount of hydroxyl group relative to 1 mol of epoxy group was 1.00 mol.
実施例2
実施例1と同様な装置にエポトートYDF−170を516.5部、HCA−HQ(三光株式会社製、融点256℃、リン含有率9.6%、水酸基当量162g/eq)を483.5部仕込んだ。これに、反応溶媒として1−メトキシ−2−プロパノール(以下PGM)を111部、触媒としてTPPを0.24部加えて150℃で6時間反応し、MEKにて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.98であった。得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分65%、ワニス粘度2850mPa・s、エポキシ当量2110g/eq、水酸基当量2220g/eq、リン含有率4.6%、数平均分子量973であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は0.95モルであった。
Example 2
483.5 parts of Epototo YDF-170 516.5 parts, HCA-HQ (manufactured by Sanko Co., Ltd., melting point 256 ° C., phosphorus content 9.6%, hydroxyl group equivalent 162 g / eq) in the same apparatus as in Example 1. Prepared. To this, 111 parts of 1-methoxy-2-propanol (hereinafter PGM) as a reaction solvent and 0.24 parts of TPP as a catalyst were added, reacted at 150 ° C. for 6 hours, and diluted with MEK.
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.98. The obtained phosphorus-containing epoxy resin solution was light yellow and transparent with a nonvolatile content of 65%, a varnish viscosity of 2850 mPa · s, an epoxy equivalent of 2110 g / eq, a hydroxyl group equivalent of 2220 g / eq, a phosphorus content of 4.6%, and a number average molecular weight of 973. there were. From the results of epoxy equivalent and hydroxyl equivalent, the hydroxyl group was 0.95 mole relative to 1 mole of the epoxy group.
実施例3
実施例1と同様な装置にエポトートYD−128(新日鉄住金化学株式会社製、ビスフェノールA型液状エポキシ樹脂、エポキシ当量187g/eq)を542部、PPQ(北興化学工業株式会社製、リン含有率10%、水酸基当量155g/eq)を458部仕込んだ。これに、反応溶媒としてMDMを176部、触媒として2−エチル−4−メチルイミダゾール(四国化成工業株式会社製、以下2E4MZ)を0.1部加えて155℃で5時間反応し、MEKにて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は1.02であった。得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分60%、ワニス粘度3050mPa・s、エポキシ当量4050g/eq、水酸基当量3930g/eq、リン含有率4.6%、数平均分子量1986であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は1.03モルであった。
Example 3
542 parts of Epototo YD-128 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., bisphenol A type liquid epoxy resin, epoxy equivalent 187 g / eq), PPQ (manufactured by Hokuko Chemical Co., Ltd., phosphorus content 10) %, Hydroxyl equivalent 155 g / eq) was charged in 458 parts. To this, 176 parts of MDM as a reaction solvent and 0.1 part of 2-ethyl-4-methylimidazole (manufactured by Shikoku Kasei Kogyo Co., Ltd., hereinafter 2E4MZ) as a catalyst were added and reacted at 155 ° C. for 5 hours. Diluted.
In the reaction, the molar ratio of the phenolic hydroxyl group to 1 mol of the epoxy group was 1.02. The resulting phosphorus-containing epoxy resin solution was light yellow and transparent, with a nonvolatile content of 60%, a varnish viscosity of 3050 mPa · s, an epoxy equivalent of 4050 g / eq, a hydroxyl group equivalent of 3930 g / eq, a phosphorus content of 4.6%, and a number average molecular weight of 1986. there were. From the results of epoxy equivalent and hydroxyl equivalent, the hydroxyl group was 1.03 mol per 1 mol of the epoxy group.
実施例4
実施例1と同様な装置にエポトートYDF−170を453部、エポトートYDPN−638(新日鉄住金化学株式会社製、フェノールノボラック型エポキシ樹脂、エポキシ当量177g/eq)を28部、DOPO−NQ(試薬、リン含有率8.2%、水酸基当量187g/eq)を519部仕込んだ。これに、反応溶媒としてPGMを176部、触媒としてトリス−(2,6−ジメトキシフェニル)ホスフィン(試薬)を0.26部加えて155℃で3時間反応し、MEKにて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.98であった。得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分65%、ワニス粘度3350mPa・s、エポキシ当量2410g/eq、水酸基当量2500g/eq、リン含有率4.3%、数平均分子量1365であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は0.96モルであった。
Example 4
In the same apparatus as in Example 1, 453 parts of Epototo YDF-170, 28 parts of Epototo YDPN-638 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., phenol novolac type epoxy resin, epoxy equivalent 177 g / eq), DOPO-NQ (reagent, 519 parts of a phosphorus content of 8.2% and a hydroxyl group equivalent of 187 g / eq) were charged. To this, 176 parts of PGM as a reaction solvent and 0.26 parts of tris- (2,6-dimethoxyphenyl) phosphine (reagent) as a catalyst were added, reacted at 155 ° C. for 3 hours, and diluted with MEK.
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.98. The obtained phosphorus-containing epoxy resin solution was light yellow and transparent, with a nonvolatile content of 65%, a varnish viscosity of 3350 mPa · s, an epoxy equivalent of 2410 g / eq, a hydroxyl group equivalent of 2500 g / eq, a phosphorus content of 4.3%, and a number average molecular weight of 1365. there were. From the results of the epoxy equivalent and the hydroxyl equivalent, the hydroxyl group was 0.96 mole relative to 1 mole of the epoxy group.
実施例5
実施例1と同様な装置にYSLV−80XY(新日鉄住金化学株式会社製、テトラメチルビスフェノールF型エポキシ樹脂、エポキシ当量191g/eq、融点79℃)を548部、HCA−HQを452部仕込んだ。これに、反応溶媒としてPGMを176部、触媒としてTPPを0.2部加えて155℃で6時間反応し、MEKにて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.97であった。得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分65%、ワニス粘度3600mPa・s、エポキシ当量1370g/eq、水酸基当量1390g/eq、リン含有率4.3%、数平均分子量1022であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は0.99モルであった。
Example 5
In the same apparatus as in Example 1, 548 parts of YSLV-80XY (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., tetramethylbisphenol F type epoxy resin, epoxy equivalent 191 g / eq, melting point 79 ° C.) and 452 parts of HCA-HQ were charged. To this, 176 parts of PGM as a reaction solvent and 0.2 part of TPP as a catalyst were added, reacted at 155 ° C. for 6 hours, and diluted with MEK.
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.97. The obtained phosphorus-containing epoxy resin solution was light yellow and transparent, with a non-volatile content of 65%, a varnish viscosity of 3600 mPa · s, an epoxy equivalent of 1370 g / eq, a hydroxyl group equivalent of 1390 g / eq, a phosphorus content of 4.3%, and a number average molecular weight of 1022. there were. From the results of epoxy equivalent and hydroxyl equivalent, the amount of hydroxyl group relative to 1 mol of epoxy group was 0.99 mol.
実施例6
実施例1と同様な装置にエポトートYDF−170を540部、ショウノールBRG−557(昭和電工株式会社製、フェノールノボラック樹脂、水酸基当量105g/eq)を80部、HCA−HQを380部仕込んだ。これに、反応溶媒としてPGMを111部、触媒としてTPPを0.24部加えて150℃で4時間反応し、MEKにて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.98であった。得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分65%、ワニス粘度4020mPa・s、エポキシ当量2950g/eq、水酸基当量2860g/eq、リン含有率3.5%、数平均分子量1630であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は1.03モルであった。
Example 6
In the same apparatus as in Example 1, 540 parts of Epototo YDF-170, 80 parts of Shonor BRG-557 (manufactured by Showa Denko KK, phenol novolac resin, hydroxyl group equivalent 105 g / eq) and 380 parts of HCA-HQ were charged. . To this, 111 parts of PGM as a reaction solvent and 0.24 parts of TPP as a catalyst were added, reacted at 150 ° C. for 4 hours, and diluted with MEK.
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.98. The resulting phosphorus-containing epoxy resin solution was light yellow and transparent, with a nonvolatile content of 65%, a varnish viscosity of 4020 mPa · s, an epoxy equivalent of 2950 g / eq, a hydroxyl group equivalent of 2860 g / eq, a phosphorus content of 3.5%, and a number average molecular weight of 1630. there were. From the results of epoxy equivalent and hydroxyl equivalent, the hydroxyl group was 1.03 mol per 1 mol of the epoxy group.
実施例7
実施例1と同様な装置にエポトートYDPN−638を504部、HCAを401部仕込んだ。これに、反応溶媒としてMDMを250部、触媒としてTPPを0.2部加えて150℃で4時間反応した。100℃まで冷却した後、無水トリメリット酸を95部加えて100℃で2時間反応し、MEKにて希釈した。
得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分65%、ワニス粘度6750mPa・s、エポキシ当量1029g/eq、活性水素当量(酸当量)1011g/eq、リン含有率5.7%、数平均分子量851であった。エポキシ当量、活性水素当量(酸当量)の結果からエポキシ基1モルに対する活性水素当量(酸当量)は1.02モルであった。なお、活性水素当量(酸当量)は、JIS K 0070規格に準拠して測定し、得られた酸価より計算で酸当量を求めた。具体的には、電位差滴定装置を用い、溶媒としてシクロヘキサノンを使用し、0.1N−KOHメタノール溶液を用いて測定した。
Example 7
In the same apparatus as in Example 1, 504 parts of Epototo YDPN-638 and 401 parts of HCA were charged. To this, 250 parts of MDM as a reaction solvent and 0.2 part of TPP as a catalyst were added and reacted at 150 ° C. for 4 hours. After cooling to 100 ° C., 95 parts of trimellitic anhydride was added, reacted at 100 ° C. for 2 hours, and diluted with MEK.
The obtained phosphorus-containing epoxy resin solution was light yellow and transparent, non-volatile content 65%, varnish viscosity 6750 mPa · s, epoxy equivalent 1029 g / eq, active hydrogen equivalent (acid equivalent) 1011 g / eq, phosphorus content 5.7%, The number average molecular weight was 851. From the results of the epoxy equivalent and the active hydrogen equivalent (acid equivalent), the active hydrogen equivalent (acid equivalent) per 1 mol of the epoxy group was 1.02 mol. In addition, the active hydrogen equivalent (acid equivalent) was measured based on JIS K 0070 standard, and the acid equivalent was calculated | required from the obtained acid value. Specifically, measurement was performed using a potentiometric titrator, cyclohexanone as a solvent, and a 0.1 N KOH methanol solution.
参考例1
実施例1と同様な装置に、エポトートYDF−170を687部、HCA−HQを314部仕込んだ。これに、反応溶媒としてPGMを110部、触媒としてTPPを0.06部加えて165℃で4時間反応を行った後、MEKを加えて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.48であった。得られたリン含有エポキシ樹脂溶液は淡黄色透明で、不揮発分70%、ワニス粘度510mPa・s、エポキシ当量301g/eq、水酸基当量850g/eq、リン含有率3.0%、数平均分子量587であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は0.35モルであった。
Reference example 1
In the same apparatus as in Example 1, 687 parts of Epototo YDF-170 and 314 parts of HCA-HQ were charged. To this, 110 parts of PGM as a reaction solvent and 0.06 part of TPP as a catalyst were added and reacted at 165 ° C. for 4 hours, and then diluted with MEK.
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.48. The obtained phosphorus-containing epoxy resin solution was light yellow and transparent, with a nonvolatile content of 70%, a varnish viscosity of 510 mPa · s, an epoxy equivalent of 301 g / eq, a hydroxyl group equivalent of 850 g / eq, a phosphorus content of 3.0%, and a number average molecular weight of 587. there were. From the results of epoxy equivalent and hydroxyl equivalent, the hydroxyl group was 0.35 mol relative to 1 mol of the epoxy group.
参考例2
実施例1と同様な装置に、HCA−HQを480.7部、エポトートYD−8125(新日鉄住金化学株式会社製、ビスフェノールA型液状エポキシ樹脂、エポキシ当量172g/eq)を519.3部、シクロヘキサノンを330部、触媒として2E4MZを0.1部仕込み、155℃〜170℃の温度で15時間反応させた後、シクロヘキサノン930部、N,N−ジメチルホルムアミド930部を加えて希釈した。
反応においてエポキシ基1モルに対するフェノール性水酸基のモル比は0.98であった。得られたリン含有エポキシ樹脂は淡黄色透明で、不揮発分36%、ワニス粘度5900mPa・s、エポキシ当量17200g/eq、水酸基当量18300、リン含有率4.6%、数平均分子量5960であった。エポキシ当量、水酸基当量の結果からエポキシ基1モルに対する水酸基は0.94モルであった。なお、エポキシ当量と水酸基当量は、指定溶剤に溶解しなかったため、シクロヘキサノンに溶解して測定を行った。また、数平均分子量は、GPC法で溶離液としてN,N−ジメチルホルムアミド(20mM臭化リチウム含有品)を使用し、標準ポリエチレンオキサイドの換算により求めた。
Reference example 2
In the same apparatus as Example 1, 480.7 parts of HCA-HQ, 519.3 parts of Epototo YD-8125 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., bisphenol A type liquid epoxy resin, epoxy equivalent 172 g / eq), cyclohexanone And 2E4MZ as a catalyst were added in an amount of 0.1 part and reacted at a temperature of 155 ° C to 170 ° C for 15 hours, and then diluted by adding 930 parts of cyclohexanone and 930 parts of N, N-dimethylformamide.
In the reaction, the molar ratio of phenolic hydroxyl group to 1 mol of epoxy group was 0.98. The obtained phosphorus-containing epoxy resin was light yellow and transparent, and had a nonvolatile content of 36%, a varnish viscosity of 5900 mPa · s, an epoxy equivalent of 17200 g / eq, a hydroxyl group equivalent of 18300, a phosphorus content of 4.6%, and a number average molecular weight of 5960. From the results of the epoxy equivalent and the hydroxyl equivalent, the hydroxyl group was 0.94 mole relative to 1 mole of the epoxy group. In addition, since the epoxy equivalent and the hydroxyl equivalent were not dissolved in the designated solvent, they were measured by dissolving in cyclohexanone. The number average molecular weight was determined by conversion of standard polyethylene oxide using N, N-dimethylformamide (containing 20 mM lithium bromide) as an eluent by the GPC method.
実施例、比較例のエポキシ樹脂組成物に使用した化合物は以下の通りである。
リン含有エポキシ樹脂(A)
・A1:実施例1で得たエポキシ樹脂
・A2:実施例2で得たエポキシ樹脂
・A3:実施例3で得たエポキシ樹脂
・A4:参考例1で得たエポキシ樹脂
・A5:参考例2で得たエポキシ樹脂
他のエポキシ樹脂(B)
・B1:エポトートYDCN−700−7(新日鉄住金化学株式会社製、オルソクレゾールノボラック型エポキシ樹脂、エポキシ当量202g/eq)
・B2:エポトートYD−903(新日鉄住金化学株式会社製、ビスフェノールA型固形エポキシ樹脂、エポキシ当量812g/eq)
硬化剤(C)
・C1:ショウノールBRG−557
・C2:DICY(試薬、ジシアンジアミド、活性水素当量=21g/eq)
その他
・硬化促進剤:2E4MZ
・難燃剤:PX−200(大八化学工業株式会社製、芳香族縮合リン酸エステル、リン含有率9%)
The compounds used in the epoxy resin compositions of Examples and Comparative Examples are as follows.
Phosphorus-containing epoxy resin (A)
A1: Epoxy resin obtained in Example 1 A2: Epoxy resin obtained in Example 2 A3: Epoxy resin obtained in Example 3 A4: Epoxy resin obtained in Reference Example 1 A5: Reference Example 2 Epoxy resin and other epoxy resin obtained in (B)
B1: Epototo YDCN-700-7 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., ortho-cresol novolac type epoxy resin, epoxy equivalent 202 g / eq)
B2: Epototo YD-903 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., bisphenol A type solid epoxy resin, epoxy equivalent 812 g / eq)
Curing agent (C)
・ C1: Shonorol BRG-557
C2: DICY (reagent, dicyandiamide, active hydrogen equivalent = 21 g / eq)
Others / Curing accelerator: 2E4MZ
Flame retardant: PX-200 (Daihachi Chemical Industry Co., Ltd., aromatic condensed phosphate ester, phosphorus content 9%)
実施例8〜12及び比較例1〜5
表1及び表2に示す処方で各化合物を配合してエポキシ樹脂組成物を得た。
得られたエポキシ樹脂ワニスをガラスクロス(日東紡株式会社製、IPC規格の2116)に含浸し、150℃の熱風循環オーブン中で10分間乾燥してプリプレグを得た。
さらに、得られたプリプレグ4枚と銅箔(3EC−III、三井金属鉱業株式会社製、厚み35μm)を重ね、130℃×15分+190℃×70分の温度条件で2MPaの真空プレスを行い、0.5mm厚の積層板を得た。
表1に実施例の積層板評価結果を、表2に比較例の積層板評価結果をそれぞれ示す。
なお、表2の比較例5は含浸性が悪くプリプレグができなかったため、積層板の作成は行わなかった。
Examples 8-12 and Comparative Examples 1-5
Each compound was mix | blended with the prescription shown in Table 1 and Table 2, and the epoxy resin composition was obtained.
The obtained epoxy resin varnish was impregnated into a glass cloth (Nittobo Co., Ltd., IPC standard 2116) and dried in a hot air circulating oven at 150 ° C. for 10 minutes to obtain a prepreg.
Furthermore, 4 sheets of the obtained prepreg and copper foil (3EC-III, manufactured by Mitsui Mining & Smelting Co., Ltd., thickness 35 μm) are stacked, and a 2 MPa vacuum press is performed under a temperature condition of 130 ° C. × 15 minutes + 190 ° C. × 70 minutes, A 0.5 mm thick laminate was obtained.
Table 1 shows the results of evaluation of the laminates of the examples, and Table 2 shows the results of evaluation of the laminates of the comparative examples.
In Comparative Example 5 in Table 2, the impregnation property was poor and a prepreg could not be made, so no laminate was prepared.
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JP7211744B2 (en) * | 2018-09-19 | 2023-01-24 | 日鉄ケミカル&マテリアル株式会社 | Epoxy resin composition and cured product thereof |
KR20220053606A (en) * | 2019-08-23 | 2022-04-29 | 가부시키가이샤 아데카 | Resin composition, formation method of cured product, and cured product |
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