JP2015035446A5 - - Google Patents
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- Publication number
- JP2015035446A5 JP2015035446A5 JP2013164284A JP2013164284A JP2015035446A5 JP 2015035446 A5 JP2015035446 A5 JP 2015035446A5 JP 2013164284 A JP2013164284 A JP 2013164284A JP 2013164284 A JP2013164284 A JP 2013164284A JP 2015035446 A5 JP2015035446 A5 JP 2015035446A5
- Authority
- JP
- Japan
- Prior art keywords
- metal base
- adsorbing
- disposed
- cooling
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002184 metal Substances 0.000 claims 7
- 239000000919 ceramic Substances 0.000 claims 3
- 238000001816 cooling Methods 0.000 claims 3
- 239000003507 refrigerant Substances 0.000 claims 2
- 238000005219 brazing Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Claims (1)
該金属ベース部上に配置され、静電引力によって被吸着物を吸着する吸着用電極を有し、かつ、前記金属ベース部よりも熱伝導率が低いセラミック吸着部とを備え、
前記金属ベース部には、冷媒を流通させる冷媒流路を有する冷却部と、前記金属ベース部と前記セラミック吸着部との積層方向において前記冷却部よりも前記セラミック吸着部側に配置されたヒータ部とが設けられており、
前記積層方向において、前記冷却部と前記ヒータ部との間には、前記金属ベース部よりも熱伝導率が低い断熱部が配置されており、
該断熱部は、前記金属ベース部に対してろう材を介して接合されていることを特徴とする静電チャック。 A metal base,
A ceramic adsorbing portion disposed on the metal base portion, having an adsorbing electrode for adsorbing an object to be adsorbed by electrostatic attraction, and having a lower thermal conductivity than the metal base portion;
The metal base part includes a cooling part having a refrigerant flow path for circulating a refrigerant, and a heater part disposed on the ceramic adsorption part side of the cooling part in the stacking direction of the metal base part and the ceramic adsorption part. And is provided,
In the stacking direction, a heat insulating part having a lower thermal conductivity than the metal base part is disposed between the cooling part and the heater part,
The electrostatic chuck, wherein the heat insulating part is joined to the metal base part via a brazing material .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013164284A JP6158634B2 (en) | 2013-08-07 | 2013-08-07 | Electrostatic chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013164284A JP6158634B2 (en) | 2013-08-07 | 2013-08-07 | Electrostatic chuck |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015035446A JP2015035446A (en) | 2015-02-19 |
| JP2015035446A5 true JP2015035446A5 (en) | 2016-05-19 |
| JP6158634B2 JP6158634B2 (en) | 2017-07-05 |
Family
ID=52543797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013164284A Active JP6158634B2 (en) | 2013-08-07 | 2013-08-07 | Electrostatic chuck |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6158634B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6653535B2 (en) * | 2015-08-07 | 2020-02-26 | 日本発條株式会社 | Heater unit |
| KR20210144333A (en) * | 2020-05-22 | 2021-11-30 | 세메스 주식회사 | Electrostatic chuck, fabricating method thereof and substrate processing apparatus |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010045170A (en) * | 2008-08-12 | 2010-02-25 | Hitachi High-Technologies Corp | Sample mounting electrode |
| JP5482282B2 (en) * | 2009-03-03 | 2014-05-07 | 東京エレクトロン株式会社 | Mounting table structure and film forming apparatus |
-
2013
- 2013-08-07 JP JP2013164284A patent/JP6158634B2/en active Active
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