JP2015010042A5 - - Google Patents
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- Publication number
- JP2015010042A5 JP2015010042A5 JP2013134740A JP2013134740A JP2015010042A5 JP 2015010042 A5 JP2015010042 A5 JP 2015010042A5 JP 2013134740 A JP2013134740 A JP 2013134740A JP 2013134740 A JP2013134740 A JP 2013134740A JP 2015010042 A5 JP2015010042 A5 JP 2015010042A5
- Authority
- JP
- Japan
- Prior art keywords
- vanillyl
- ether
- alkyl
- cosmetic
- butyl ether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000005215 alkyl ethers Chemical class 0.000 description 5
- VLDFMKOUUQYFGF-UHFFFAOYSA-N 4-(butoxymethyl)-2-methoxyphenol Chemical compound CCCCOCC1=CC=C(O)C(OC)=C1 VLDFMKOUUQYFGF-UHFFFAOYSA-N 0.000 description 3
- 239000002537 cosmetic Substances 0.000 description 3
- 229940078465 vanillyl butyl ether Drugs 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical group CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- KOCVACNWDMSLBM-UHFFFAOYSA-N 4-(Ethoxymethyl)-2-methoxyphenol Chemical compound CCOCC1=CC=C(O)C(OC)=C1 KOCVACNWDMSLBM-UHFFFAOYSA-N 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- ZENOXNGFMSCLLL-UHFFFAOYSA-N vanillyl alcohol Chemical compound COC1=CC(CO)=CC=C1O ZENOXNGFMSCLLL-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- BYUYRWRYAISPPF-UHFFFAOYSA-N cyclobutyloxycyclobutane Chemical compound C1CCC1OC1CCC1 BYUYRWRYAISPPF-UHFFFAOYSA-N 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 230000007794 irritation Effects 0.000 description 1
- ZUVAACFIEPYYOP-UHFFFAOYSA-N methoxycyclopropane Chemical compound COC1CC1 ZUVAACFIEPYYOP-UHFFFAOYSA-N 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013134740A JP6169421B2 (ja) | 2013-06-27 | 2013-06-27 | 化粧料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013134740A JP6169421B2 (ja) | 2013-06-27 | 2013-06-27 | 化粧料 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015010042A JP2015010042A (ja) | 2015-01-19 |
| JP2015010042A5 true JP2015010042A5 (https=) | 2016-07-07 |
| JP6169421B2 JP6169421B2 (ja) | 2017-07-26 |
Family
ID=52303511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013134740A Active JP6169421B2 (ja) | 2013-06-27 | 2013-06-27 | 化粧料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6169421B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7723504B2 (ja) * | 2021-06-16 | 2025-08-14 | 株式会社ファンケル | 洗浄料組成物 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0723295B2 (ja) * | 1986-03-03 | 1995-03-15 | 鐘紡株式会社 | 温感皮膚化粧料 |
| JPH09175982A (ja) * | 1995-12-28 | 1997-07-08 | Nikka Uisukii Kk | 化粧品 |
| JP2001213750A (ja) * | 2000-01-28 | 2001-08-07 | Ichimaru Pharcos Co Ltd | バラ科植物水蒸気蒸留水含有化粧料組成物 |
| JP2004161708A (ja) * | 2002-11-15 | 2004-06-10 | Pola Chem Ind Inc | ムクミ改善用の化粧料 |
| JP5072300B2 (ja) * | 2006-09-21 | 2012-11-14 | 丸善製薬株式会社 | サイクリックａｍｐホスホジエステラーゼ阻害剤 |
| JP5207697B2 (ja) * | 2007-09-25 | 2013-06-12 | 株式会社 資生堂 | 毛髪化粧料 |
| JP5558751B2 (ja) * | 2009-07-28 | 2014-07-23 | 北海道三井化学株式会社 | トリテルペン含有抽出物、フラボノイド含有抽出物の製造方法 |
| JP6219072B2 (ja) * | 2013-06-27 | 2017-10-25 | ポーラ化成工業株式会社 | 温感化粧料 |
-
2013
- 2013-06-27 JP JP2013134740A patent/JP6169421B2/ja active Active
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