JP2015004644A - Eccentric quantity calculation method of optical system and optical system adjustment method using it - Google Patents

Eccentric quantity calculation method of optical system and optical system adjustment method using it Download PDF

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JP2015004644A
JP2015004644A JP2013131509A JP2013131509A JP2015004644A JP 2015004644 A JP2015004644 A JP 2015004644A JP 2013131509 A JP2013131509 A JP 2013131509A JP 2013131509 A JP2013131509 A JP 2013131509A JP 2015004644 A JP2015004644 A JP 2015004644A
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optical system
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eccentricity
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JP6238592B2 (en
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直人 道塲
Naoto Dojo
直人 道塲
融 松田
Toru Matsuda
融 松田
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Canon Inc
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Abstract

PROBLEM TO BE SOLVED: To provide an eccentric quantity calculation method of an optical system capable of readily measuring precision in assembling of optical elements constituting the optical system even if the optical system that is an object of measurement is large in size, and performing optical adjustment of eccentricity or the like of each of the optical elements so that desired image formation performance can be attained.SOLUTION: Included are a first process in which: a first measurement system allows a luminous flux to enter an optical system, and the luminous flux having passed through the optical system is used to measure a wave front aberration of the optical system; and a second measurement system allows a luminous flux to enter the optical system along an optical path different from an optical path along which the luminous flux emanating from the first measurement system has passed through the optical system, and the luminous flux having passed through the optical system is used to measure the wave front aberration of the optical system, and a second process in which an eccentric quantity of each of the optical elements constituting the optical system is calculated based on the wave front aberration obtained by the first measurement system and the wave front aberration obtained by the second measurement system.

Description

本発明は光学系の偏心量を容易に算出することができ、しかも光学系を構成する各光学素子の位置を容易に調整することができる光学系の偏芯量算出方法及びそれを用いた調整方法に関する。   The present invention can easily calculate the amount of eccentricity of an optical system, and can easily adjust the position of each optical element constituting the optical system, and an adjustment using the method. Regarding the method.

高い光学性能を有する光学系では、光学系を構成する各光学素子には偏心が少ないことが要望される。レンズ,ミラー等の光学素子を複数個組み立てて光学系を構成するとき、各光学素子の組立によって発生した偏芯を調整することを必要とする光学系では、使用する像高や画角に合わせた光線を光学系に入射させる。そして光学系を通過した光を用いて光学系の光学評価を行い、所望の結像性能が得られるように各光学素子の偏芯の調整を行うことが知られている(特許文献1)。   In an optical system having high optical performance, each optical element constituting the optical system is required to have little decentration. When an optical system is constructed by assembling a plurality of optical elements such as lenses and mirrors, it is necessary to adjust the eccentricity generated by assembling each optical element according to the image height and angle of view to be used. Incident light is incident on the optical system. It is known that optical evaluation of the optical system is performed using light that has passed through the optical system, and the eccentricity of each optical element is adjusted so as to obtain desired imaging performance (Patent Document 1).

特許文献1の収差補正系では、使用する像高や画角に合わせた光線を光学系に入射させて波面収差を測定し、zernike多項式のアス成分を補正するように各光学素子を回転させる。または、zernike多項式のコマ成分を補正するように光軸に対して各光学素子を偏芯調整している。   In the aberration correction system of Patent Document 1, a light beam that matches the image height and field angle to be used is incident on the optical system to measure wavefront aberration, and each optical element is rotated so as to correct the as component of the Zernike polynomial. Alternatively, each optical element is eccentrically adjusted with respect to the optical axis so as to correct the coma component of the Zernike polynomial.

一方、天体観察等における反射望遠鏡においては、大気分散に起因して色収差が多く発生してくる。従来、反射望遠鏡において主鏡(反射鏡)の結像位置近傍に配置して大気分散による色収差を良好に補正した主焦点補正光学系が知られている(特許文献2)。   On the other hand, in a reflective telescope for astronomical observation or the like, a large amount of chromatic aberration occurs due to atmospheric dispersion. 2. Description of the Related Art Conventionally, there is known a main focus correction optical system that is disposed in the vicinity of an image forming position of a main mirror (reflection mirror) in a reflection telescope and corrects chromatic aberration due to atmospheric dispersion well (Patent Document 2).

特開平6−230274号公報JP-A-6-230274 特開2009−036976号公報JP 2009-036976 A

天体観察用の反射望遠鏡等の大型の光学系や、他の光学系と組合せて収差を補正するような収差補正光学系の場合、使用する像高や画角に合わせた光線を測定する光学系に入射させるためには、より大型な光学系が必要となる。この他、あらかじめ収差が確認されている別の光学系を使用する必要がある。前者は大型の光学系を用いるため測定が困難になる。後者はあらかじめ別の光学系を準備する必要があるため、やはり測定が困難になる。   Optical system that measures light according to the image height and angle of view used in large optical systems such as reflective telescopes for astronomical observation and aberration correction optical systems that correct aberrations in combination with other optical systems In order to make the light incident on the optical system, a larger optical system is required. In addition, it is necessary to use another optical system whose aberration has been confirmed in advance. The former is difficult to measure because it uses a large optical system. In the latter case, since it is necessary to prepare another optical system in advance, the measurement is still difficult.

例えば天体観察用の反射望遠鏡の一部を構成する大型の主鏡によって発生する収差を補正する収差補正光学系を構成する各光学素子の偏心を測定し、光学素子を調整する場合には、実際に使用する像高や画角に合わせた光線を収差補正光学系に入射させる必要がある。このためには、大型の主鏡、または別途複雑な光学系を必要とする。大型の主鏡や複雑な光学系を用意して反射望遠鏡の光学性能を測定することは大変困難である。   For example, when adjusting the optical elements by measuring the decentration of each optical element that constitutes the aberration correction optical system that corrects aberrations generated by the large primary mirror that forms part of the astronomical observation telescope, Therefore, it is necessary to make the light beam adapted to the image height and angle of view used for the incident light enter the aberration correction optical system. For this purpose, a large primary mirror or a separate complicated optical system is required. It is very difficult to measure the optical performance of a reflective telescope using a large primary mirror or a complex optical system.

本発明は、測定対象となる光学系が大型であっても光学系を構成する光学素子の組立精度を容易に測定することができる光学系の偏心量算出方法の提供を目的とする。更に所望の結像性能が得られるように光学素子の偏芯等の光学調整が行える光学系の調整方法、そして全体としての光学系の光学性能を求めることができる光学系の光学性能の評価方法の提供を目的とする。   An object of the present invention is to provide an optical system eccentricity calculation method capable of easily measuring the assembly accuracy of optical elements constituting an optical system even when the optical system to be measured is large. Further, a method for adjusting an optical system capable of optical adjustment such as decentration of an optical element so as to obtain a desired imaging performance, and a method for evaluating the optical performance of the optical system capable of obtaining the optical performance of the optical system as a whole The purpose is to provide.

本発明の光学系の偏心量算出方法は、第1測定系より光学系に光束を入射し、前記光学系を介した光束を用いて前記光学系の波面収差を測定するとともに、第2測定系により前記第1測定系からの光束の前記光学系を通過する光路とは異なる光路で光束を前記光学系に入射し、前記光学系を介した光束を用いて前記光学系の波面収差を測定する第1工程と、前記第1測定系で得られた波面収差と前記第2測定系で得られた波面収差より前記光学系を構成する各光学素子の偏心量を算出する第2工程とを有することを特徴としている。   The method of calculating the amount of eccentricity of the optical system according to the present invention is configured such that a light beam is incident on the optical system from the first measurement system, the wavefront aberration of the optical system is measured using the light beam via the optical system, and the second measurement system. The light beam from the first measurement system is incident on the optical system through an optical path different from the optical path passing through the optical system, and the wavefront aberration of the optical system is measured using the light beam via the optical system. A first step, and a second step of calculating a decentering amount of each optical element constituting the optical system from the wavefront aberration obtained by the first measurement system and the wavefront aberration obtained by the second measurement system. It is characterized by that.

本発明によれば、測定対象となる光学系が大型であっても光学系を構成する光学素子の組立精度を容易に測定することができ、しかも所望の結像性能が得られるように光学素子の偏芯等の光学調整が行える光学系の偏心量算出方法が得られる。   According to the present invention, even if the optical system to be measured is large, the assembly accuracy of the optical elements constituting the optical system can be easily measured, and the desired optical performance can be obtained. Thus, a method for calculating the amount of eccentricity of the optical system capable of optical adjustment such as decentration is obtained.

本発明の光学系の偏心量算出方法等のフローチャートである。3 is a flowchart of an optical system eccentricity calculation method and the like according to the present invention. 光学系を有する反射望遠鏡の要部概略図である。It is a principal part schematic of the reflective telescope which has an optical system. 補正光学系の詳細図である。It is a detailed view of a correction optical system. (A),(B) 波面収差の測定形態の概略図である。(A), (B) It is the schematic of the measurement form of a wavefront aberration. 算出した偏芯量を光学モデルに組込み光学性能を評価した(横収差)図である。FIG. 5 is a diagram (transverse aberration) in which the calculated eccentricity is incorporated into an optical model and optical performance is evaluated. 図4の第1,第2測定系の説明図である。It is explanatory drawing of the 1st, 2nd measurement system of FIG.

以下、図を用いて本発明の実施例について説明する。本発明の光学系の偏心量算出方法では次の第1,第2工程を有する。第1工程では第1測定系より光学系に光束を入射し、光学系を介した光束を用いて光学系の波面収差を測定する。それとともに、第2測定系により第1測定系からの光束の光学系を通過する光路とは異なる光路で光束を光学系に入射し、光学系を介した光束を用いて光学系の波面収差を測定する。第2工程では第1測定系で得られた波面収差と第2測定系で得られた波面収差より光学系を構成する各光学素子の偏心量を算出する。   Embodiments of the present invention will be described below with reference to the drawings. The optical system eccentricity calculation method of the present invention includes the following first and second steps. In the first step, a light beam is incident on the optical system from the first measurement system, and the wavefront aberration of the optical system is measured using the light beam via the optical system. At the same time, the second measurement system causes the light beam from the first measurement system to enter the optical system through an optical path different from the optical path passing through the optical system, and uses the light beam via the optical system to reduce the wavefront aberration of the optical system. taking measurement. In the second step, the amount of eccentricity of each optical element constituting the optical system is calculated from the wavefront aberration obtained by the first measurement system and the wavefront aberration obtained by the second measurement system.

また本発明の光学系の調整方法では、光学系の偏心量算出方法における第2工程で算出された偏心量を用いて、光学系を構成する各光学素子の位置を調整する第3工程を有する。また、本発明の光学性能の評価方法では、光学系の偏心量算出方法における第2工程で算出された偏心量を用いて、光学系の各光学素子に関する偏心光学モデルを作成する。そして作成した偏心光学モデルを用いて光学系が他の光学系の一部に装着されて実際に使用される状態を想定してシミュレーションを行い、シミュレーションによって光学系の光学性能の評価を行う。   The optical system adjustment method of the present invention includes a third step of adjusting the position of each optical element constituting the optical system using the eccentric amount calculated in the second step of the optical system eccentricity calculation method. . In the optical performance evaluation method of the present invention, an eccentric optical model for each optical element of the optical system is created using the eccentric amount calculated in the second step in the optical system eccentricity calculating method. Then, using the created decentered optical model, a simulation is performed assuming that the optical system is actually used by being mounted on a part of another optical system, and the optical performance of the optical system is evaluated by the simulation.

まず本発明の光学系の偏心量算出方法における光学系の構成について説明する。ここで光学系は例えば天体観察を行うときの反射望遠鏡の主鏡と共に用いられる補正光学系である。補正光学系は主鏡の収差を補正するとともに、大気分散による色収差を補正する機能を有している。   First, the configuration of the optical system in the optical system eccentricity calculation method of the present invention will be described. Here, the optical system is, for example, a correction optical system that is used together with the primary mirror of the reflective telescope when performing astronomical observation. The correction optical system has a function of correcting aberration of the main mirror and correcting chromatic aberration due to atmospheric dispersion.

図2は本発明の光学系の偏心量算出方法で偏心量の算出対象とする光学系(補正光学系)を有する反射望遠鏡の光学配置の説明図である。図3は図2の光学系の拡大説明図である。図2において、1は反射望遠鏡である。M1は結像作用のある主鏡、100は光学系である。主鏡M1は凹形状の回転双曲面(反射鏡)よりなっている。光学系100は主鏡M1の焦点又はその近傍に配置され、主鏡M1によって発生する収差を補正する。天体からの光束は図中右方から主鏡M1に入射し、主鏡M1で反射したあとに光学系100を介して撮像素子(撮像手段)が配置される撮像面C1に結像する。   FIG. 2 is an explanatory diagram of an optical arrangement of a reflective telescope having an optical system (correction optical system) that is an object of calculation of the amount of eccentricity by the method of calculating the amount of eccentricity of the optical system of the present invention. FIG. 3 is an enlarged explanatory view of the optical system of FIG. In FIG. 2, 1 is a reflective telescope. M1 is a primary mirror having an imaging function, and 100 is an optical system. The primary mirror M1 is a concave rotating hyperboloid (reflecting mirror). The optical system 100 is disposed at or near the focal point of the primary mirror M1, and corrects aberrations generated by the primary mirror M1. The light beam from the celestial body is incident on the main mirror M1 from the right side in the figure, and after being reflected by the main mirror M1, the image is formed on the image pickup surface C1 on which the image pickup element (image pickup means) is arranged via the optical system 100.

図3に示した光学系100の構成について説明する。光学系100はレンズ(光学素子)L11からレンズL15、複合レンズ(光学素子)A1を有している。反射望遠鏡1ではレンズL11からレンズL15の5枚のレンズの形状を最適化している。具体的には光学系は主鏡M1から撮像面C1に向かって順に第1レンズL11、第2レンズL12、2枚の単レンズからなる大気分散補正用(大気色分解の補正用)の複合レンズ(ADC)A1を有する。更に第3レンズL13、第4レンズL14、第5レンズL15を有する。   The configuration of the optical system 100 shown in FIG. 3 will be described. The optical system 100 includes lenses (optical elements) L11 to L15 and a compound lens (optical element) A1. In the reflecting telescope 1, the shapes of the five lenses L11 to L15 are optimized. Specifically, the optical system is a compound lens for correcting atmospheric dispersion (for correcting atmospheric color separation) composed of a first lens L11, a second lens L12, and two single lenses in order from the main mirror M1 toward the imaging surface C1. (ADC) A1 is included. Furthermore, it has the 3rd lens L13, the 4th lens L14, and the 5th lens L15.

天体からやってきた光は主鏡M1で反射されたあと、光学系100の第1レンズL11、第2レンズL12、複合レンズ(A1)、第3レンズL13、第4レンズL14、第5レンズL15を順に通過したあと、撮像面C1に天体の像を結像する。これにより視野角1.6度の範囲内で良好に収差を補正している。光学系100は有効視野角は1.5度としている。F1とW1は透過波長帯域を選択するためのフィルタとCCDデュワーの窓材の厚みに相当する平行平面板である。   After the light coming from the celestial body is reflected by the primary mirror M1, it passes through the first lens L11, the second lens L12, the compound lens (A1), the third lens L13, the fourth lens L14, and the fifth lens L15 of the optical system 100. After passing in order, an image of a celestial body is formed on the imaging surface C1. As a result, aberrations are favorably corrected within a viewing angle range of 1.6 degrees. The optical system 100 has an effective viewing angle of 1.5 degrees. F1 and W1 are parallel plane plates corresponding to the thickness of the filter for selecting the transmission wavelength band and the window material of the CCD dewar.

複合レンズA1は大気分散を補正するため、分散の異なる材料よりなる2つのレンズA11,A12より構成されている。アクチュエータ(移動機構)により複合レンズA1を光軸に対し直交する方向の成分を持つように(図の矢印方向)に移動させることにより、大気分散による色ずれを補正する。   The compound lens A1 is composed of two lenses A11 and A12 made of materials having different dispersions in order to correct atmospheric dispersion. The compound lens A1 is moved by the actuator (moving mechanism) so as to have a component in the direction orthogonal to the optical axis (in the direction of the arrow in the figure), thereby correcting the color shift due to atmospheric dispersion.

複合レンズA1は屈折率が近く、互いに分散の異なる材料よりなる一対のレンズA11,A12を接合又は僅かの空気間隔(空気層)を隔てて隣接配置して構成している。具体的にはレンズA11を構成する材料(商品名BSL7Y)の屈折率ndが1.51633、アッベ数νdが64.2である。またレンズA12を構成する材料(商品名PBL1Y)の屈折率ndが1.54814、アッベ数νdが45.8である。このときレンズA11とレンズA12の材料の屈折率の比は
1.51633/1.54814=0.979
である。即ち屈折率は互いに2.1%異なっている。
The compound lens A1 has a structure in which a pair of lenses A11 and A12 made of materials having different refractive indexes and close to each other are joined or arranged adjacent to each other with a slight air gap (air layer). Specifically, the material constituting the lens A11 (trade name BSL7Y) has a refractive index nd of 1.51633 and an Abbe number νd of 64.2. The material constituting the lens A12 (trade name PBL1Y) has a refractive index nd of 1.54814 and an Abbe number νd of 45.8. At this time, the ratio of the refractive indexes of the materials of the lenses A11 and A12 is
1.51633 / 1.54814 = 0.979
It is. That is, the refractive indexes are 2.1% different from each other.

本実施例の複合レンズA1は材料の屈折率が互いに0.5%以上(好ましくは0.5%〜5%の範囲内)異なる正レンズ(レンズA12)と負レンズ(レンズA11)を光軸方向に隣接配置して構成されている。これらの材料の組み合わせ、しかも対向するレンズ面に同程度(曲率半径で±5%以内の差)の曲率を持たせている。これにより、複合レンズA1を光軸に対して直交する方向に移動させて大気分散の補正を行う場合に、必要な量の色収差を発生させている。なお、屈折率ndはd線(587.6nm)に対する屈折率である。アッベ数νdは以下によって定義される。   The compound lens A1 of the present embodiment has a positive lens (lens A12) and a negative lens (lens A11) that have different refractive indexes of 0.5% or more (preferably within a range of 0.5% to 5%). They are arranged adjacent to each other in the direction. The combination of these materials and the opposite lens surfaces have the same degree of curvature (difference within ± 5% in radius of curvature). As a result, when the compound lens A1 is moved in the direction orthogonal to the optical axis to correct atmospheric dispersion, a necessary amount of chromatic aberration is generated. The refractive index nd is a refractive index with respect to the d line (587.6 nm). The Abbe number νd is defined by:

νd=(nd−1)/(nF−nC)
但し、nd:d線(587.6nm)に対する屈折率
nF:F線(486.1nm)に対する屈折率
nC:C線(656.3nm)に対する屈折率
また、レンズA11は物体側(主鏡M1側)の面が平面、レンズA12は撮像面(IP)側のレンズ面が平面となっている。すなわち、複合レンズA1の光入射面と光出射面は共に平面となっている。
νd = (nd−1) / (nF−nC)
However, nd: refractive index with respect to d-line (587.6 nm) nF: refractive index with respect to F-line (486.1 nm) nC: refractive index with respect to C-line (656.3 nm) Lens A11 is a surface on the object side (primary mirror M1 side) Is flat, and the lens A12 has a flat lens surface on the imaging surface (IP) side. That is, the light incident surface and the light exit surface of the compound lens A1 are both flat.

これにより単色光線に対しては、複合レンズA1を光軸に対して直交する方向に移動させたときの項かは単純な平板ガラスを移動させた場合と大差がなくなり、単色収差の変化を小さく保っている。   As a result, for monochromatic light, the term when the compound lens A1 is moved in the direction orthogonal to the optical axis is not much different from that when a simple flat glass is moved, and the change in monochromatic aberration is reduced. I keep it.

次に表1に反射望遠鏡1の数値データを示す。表中の面番号は天体側から光束の進行順に各面に付した番号である。iは天体からの面の順序を示す。Riは各面の曲率半径、diは第i面と第(i+1)面との間の間隔を示す。R1は主鏡、R2からR15は光学系100の面である。   Next, Table 1 shows numerical data of the reflecting telescope 1. The surface numbers in the table are numbers assigned to the respective surfaces in the order of light flux from the celestial side. i indicates the order of the surfaces from the celestial body. Ri represents the radius of curvature of each surface, and di represents the distance between the i-th surface and the (i + 1) -th surface. R1 is a primary mirror, and R2 to R15 are surfaces of the optical system 100.

材料には石英(SILICA)と商品名BSL7Yと商品名PBL1Yの3種類の材料を用いている。詳細には、石英(SILICA)は屈折率ndが1.45846、アッベ数νdが67.8である。材料BSL7Yは屈折率ndが1.51633、アッベ数νdが64.2である。材料PBL1Yは屈折率ndが1.54814、アッベ数νdが45.8である。実施例中の材料名は(株)オハラのガラス名を使用したが、同等品を使用しても良い。   Quartz (SILICA), trade name BSL7Y and trade name PBL1Y are used as the material. Specifically, quartz (SILICA) has a refractive index nd of 1.45846 and an Abbe number νd of 67.8. The material BSL7Y has a refractive index nd of 1.51633 and an Abbe number νd of 64.2. The material PBL1Y has a refractive index nd of 1.54814 and an Abbe number νd of 45.8. Although the glass name of OHARA INC. Was used as the material name in the examples, an equivalent product may be used.

本実施例の光学系100は5つの非球面を有する。非球面形状は、光軸方向にz軸、光軸と垂直方向にh軸、光の進行方向を正とし、Rを近軸曲率半径、kを円錐定数、A〜Gを4次〜16次の非球面係数としたとき、   The optical system 100 of the present embodiment has five aspheric surfaces. The aspherical shape is the z axis in the optical axis direction, the h axis in the direction perpendicular to the optical axis, the light traveling direction is positive, R is the paraxial radius of curvature, k is the conic constant, and A to G are the 4th to 16th orders. When the aspheric coefficient is

なる式で表わしている。また、表1においてfは主鏡M1と光学系100の合成焦点距離、FNOはFナンバー、2ωは全画角(視野角)(度)を表す。 It is expressed by the following formula. In Table 1, f represents the combined focal length of the primary mirror M1 and the optical system 100, FNO represents the F number, and 2ω represents the total field angle (viewing angle) (degrees).

[表1]
f = 18334.3mm FNO = 2.25 2ω= 1.5°
面番号 曲率半径R 面間隔d 材質 有効径
1(主鏡) 30000.0000(非球面) 13456.4205 8200.0
2 760.000 100.0000 SILICA 820.0
3 1375.5000(非球面) 372.8500 801.0
4 -3530.0000(非球面) 46.0000 BSL7Y 320.8
5 656.2498 318.0000 574.6
6(ADC) 平面 40.0000 BSL7Y 611.0
7(ADC) 1058.0000 3.0000 611.0
8(ADC) 1040.0000 82.0000 PBL1Y 611.9
9(ADC) 平面 274.3000 611.2
10 -840.0002(非球面) 40.0000 PBL1Y 552.2
11 9800.0000 90.00000 568.9
12 480.0000(非球面) 102.0000 BSL7Y 628.0
13 4021.4590 100.2000 628.0
14 4176.7483 88.0000 SILICA 616.0
15 -1272.8222(非球面) 90.0412 616.0
16(Filter) ∞ 15.0000 SILICA 520.6
17(Filter) ∞ 32.5000 510.3
18(Window) ∞ 37.0000 SILICA 520.6
19(Window) ∞ 15.0000 510.3
20 像面 ∞ --- --- 500.3
[Table 1]
f = 18334.3mm FNO = 2.25 2ω = 1.5 °
Surface number Curvature radius R Surface spacing d Material Effective diameter
1 (Primary mirror) 30000.0000 (Aspherical surface) 13456.4205 8200.0
2 760.000 100.0000 SILICA 820.0
3 1375.5000 (Aspherical) 372.8500 801.0
4 -3530.0000 (Aspherical) 46.0000 BSL7Y 320.8
5 656.2498 318.0000 574.6
6 (ADC) Plane 40.0000 BSL7Y 611.0
7 (ADC) 1058.0000 3.0000 611.0
8 (ADC) 1040.0000 82.0000 PBL1Y 611.9
9 (ADC) Plane 274.3000 611.2
10 -840.0002 (Aspherical) 40.0000 PBL1Y 552.2
11 9800.0000 90.00000 568.9
12 480.0000 (Aspherical) 102.0000 BSL7Y 628.0
13 4021.4590 100.2000 628.0
14 4176.7483 88.0000 SILICA 616.0
15 -1272.8222 (Aspherical) 90.0412 616.0
16 (Filter) ∞ 15.0000 SILICA 520.6
17 (Filter) ∞ 32.5000 510.3
18 (Window) ∞ 37.0000 SILICA 520.6
19 (Window) ∞ 15.0000 510.3
20 Image plane ∞ --- --- 500.3

(非球面)
面1
k=-1.00835 A(4次)=0.00000 B(6次)=0.00000 C(8次)=0.00000
D(10次)=0.00000 E(12次)=0.00000 F(14次)=0.00000 G(16次)=0.00000

面3
k=0.00000 A(4次)=-1.49749E-11 B(6次)=-7.57907E-17
C(8次)=-7.70529 E-22 D(10次)=1.026626E-26 E(12次)=-7.07883E-32
F(14次)=2.559601E-37 G(16次)=-3.76155E-43

面4
k=0.00000 A(4次)=6.914718E-11 B(6次)=6.03728E-16
C(8次)=-1.53262E-20 D(10次)=3.61811E-25 E(12次)=-4.74168E-30
E(12次)=3.217309E-35 G(16次)=-8.85988E-41

面10
k=0.00000 A(4次)=2.768476E-09 B(6次)=-4.8556E-14
C(8次)=7.176113E-19 D(10次)=-1.07637E-24 E(12次)=1.187443E-28
F(14次)=-7.98382E-34 G(16次)=2.393557E-39

面12
k=0.00000 A(4次)=-4.35553E-09 B(6次)=3.635868E-14
C(8次)=-5.95127E-19 D(10次)=7.658840E-24 E(12次)=-7.19412E-29
F(14次)=3.942821E-34 G(16次)=-9.54343E-40

面15
k=0.00000 A(4次)=-1.06469E-09 B(6次)=3.377750E-14
C(8次)=-1.10265E-19 D(10次)=2.282369E-24 E(12次)=-2.74304E-29
F(14次)=1.755771E-34 G(16次)=-4.82195E-40
(Aspherical)
Face 1
k = -1.00835 A (4th order) = 0.00000 B (6th order) = 0.00000 C (8th order) = 0.00000
D (10th order) = 0.00000 E (12th order) = 0.00000 F (14th order) = 0.00000 G (16th order) = 0.00000

Surface 3
k = 0.00000 A (4th order) =-1.49749E-11 B (6th order) =-7.57907E-17
C (8th order) =-7.70529 E-22 D (10th order) = 1.026626E-26 E (12th order) =-7.07883E-32
F (14th) = 2.559601E-37 G (16th) =-3.76155E-43

Face 4
k = 0.00000 A (4th order) = 6.914718E-11 B (6th order) = 6.03728E-16
C (8th order) = -1.53262E-20 D (10th order) = 3.61811E-25 E (12th order) = -4.74168E-30
E (12th order) = 3.217309E-35 G (16th order) = -8.85988E-41

Face 10
k = 0.00000 A (4th order) = 2.768476E-09 B (6th order) =-4.8556E-14
C (8th order) = 7.176113E-19 D (10th order) = -1.07637E-24 E (12th order) = 1.187443E-28
F (14th) =-7.98382E-34 G (16th) = 2.393557E-39

Surface 12
k = 0.00000 A (4th order) =-4.35553E-09 B (6th order) = 3.635868E-14
C (8th order) =-5.95127E-19 D (10th order) = 7.658840E-24 E (12th order) =-7.19412E-29
F (14th order) = 3.942821E-34 G (16th order) =-9.54343E-40

Surface 15
k = 0.00000 A (4th order) =-1.06469E-09 B (6th order) = 3.377750E-14
C (8th order) = -1.10265E-19 D (10th order) = 2.282369E-24 E (12th order) = -2.74304E-29
F (14th) = 1.755771E-34 G (16th) = -4.82195E-40

次に本発明の光学系の偏心量算出方法、光学系の調整方法、そして光学系の光学性能の表方法等(以下「光学系の調整方法等」という。)について説明する。本発明に係る光学系は、天体観察用の反射望遠鏡等の大型で高重量であり、本来の使用状態において光学性能を測定することが困難な光学系を測定対象としている。   Next, the method for calculating the amount of eccentricity of the optical system, the method for adjusting the optical system, the method for displaying the optical performance of the optical system, etc. (hereinafter referred to as “the method for adjusting the optical system”) will be described. The optical system according to the present invention is an optical system that is large and heavy, such as a reflective telescope for astronomical observation, and whose optical performance is difficult to measure in its original use state.

図1は本発明の光学系の調整方法等のフローチャートである。図1のフローチャートは、例として図2に示す反射望遠鏡1で用いる光学系(補正光学系)を対象としている。本実施例では、本来の用途に近い画角(観察視野)、像高で光学性能を評価できない光学系を、光学系を通過する光路が互いに異なる光路を放射する第1測定系と第2測定系の2つの測定系によって光学系の波面収差を測定する(ステップS1)。その2つの波面収差からzernike係数のコマ成分をそれぞれ算出する(ステップS2)。   FIG. 1 is a flowchart of an optical system adjustment method and the like according to the present invention. The flow chart of FIG. 1 is intended for an optical system (correction optical system) used in the reflective telescope 1 shown in FIG. 2 as an example. In this embodiment, an optical system in which optical performance cannot be evaluated with an angle of view (observation field of view) close to the original application and image height, a first measurement system and a second measurement that radiate optical paths that pass through the optical system are different from each other. The wavefront aberration of the optical system is measured by the two measurement systems (step S1). The coma component of the zernike coefficient is calculated from the two wavefront aberrations (step S2).

光学系に関し、実測した屈折率、屈折率分布、面形状、レンズ肉厚を加味した設計値モデルをそれぞれ作成する(表4)。それぞれ算出したコマ収差を目標、光学系の各レンズ(各光学素子)の偏芯を変数にして、光学設計ソフトによって最適化する。最適化後の各レンズの偏芯量は光学系の光軸を基準とした偏芯量となる(表5)(ステップS3)。   With respect to the optical system, design value models taking into account the actually measured refractive index, refractive index distribution, surface shape, and lens thickness are created (Table 4). The calculated coma aberration is a target, and the eccentricity of each lens (each optical element) of the optical system is used as a variable, and is optimized by optical design software. The decentering amount of each lens after optimization is the decentering amount with reference to the optical axis of the optical system (Table 5) (step S3).

ここで、偏芯量が許容できない場合は、光学系の再組立(調整)を行う(ステップS4a)。また偏芯量のみで判定できない場合やより詳細な判定を行う場合、偏心光学モデルを作成する(ステップS4)。次いで実測した屈折率、屈折率分布、面形状、レンズ肉厚を加味した設計値に偏芯量も加味して、シミュレーションにより光学系の光学性能を評価する(ステップS5)。その後完成する(ステップS6)。   Here, when the amount of eccentricity is not allowable, the optical system is reassembled (adjusted) (step S4a). When the determination cannot be made only by the decentration amount or when more detailed determination is performed, an eccentric optical model is created (step S4). Next, the optical performance of the optical system is evaluated by simulation, taking into account the eccentricity in addition to the designed value that takes into account the actually measured refractive index, refractive index distribution, surface shape, and lens thickness (step S5). Thereafter, the process is completed (step S6).

図4(A),(B)は光学系100を通過する光路が互いに異なる光束を放射する第1測定系と第2測定系の2つの測定形態での波面測定を示す概念図である。1100a,110bは各々第1測定系と第2測定系である。第1測定系1100aでは光学系100の光軸中心を通過する光束を放射する。   FIGS. 4A and 4B are conceptual diagrams showing wavefront measurement in two measurement forms of a first measurement system and a second measurement system that emit light beams with different optical paths passing through the optical system 100. Reference numerals 1100a and 110b denote a first measurement system and a second measurement system, respectively. The first measurement system 1100 a emits a light beam that passes through the center of the optical axis of the optical system 100.

第2測定系1100bでは光学系100の有効径全体を通過する光束を放射する。第1測定系1100aと第2測定系1100bは各々干渉計を有している。L1,L2はそれぞれの波面測定形態で光学系100の波面収差を補正する測定光学系である。M2,M3は光学系100を通過した光束を測定系側へ折り返すミラー(凹面ミラー)である。表2に図4(A)の波面測定形態1における測定光学系L1の数値データを示す。   The second measurement system 1100b radiates a light beam that passes through the entire effective diameter of the optical system 100. The first measurement system 1100a and the second measurement system 1100b each have an interferometer. L1 and L2 are measurement optical systems that correct the wavefront aberration of the optical system 100 in the respective wavefront measurement forms. M2 and M3 are mirrors (concave mirrors) that fold the light beam that has passed through the optical system 100 back to the measurement system side. Table 2 shows numerical data of the measurement optical system L1 in the wavefront measurement mode 1 of FIG.

[表2]
面番号 曲率半径R 面間隔d 材質 有効径
1 平面 89.564
2 -97.428 10.000 BSL7Y 52
3 -446.097 20.000 56
4 -131.553 15.000 BSL7Y 68
5 -88.858 30.000 74
6 1272.822(非球面) 88.000 SILICA 661
7 -4176.748 100.200 661
8 -4021.459(非球面) 102.000 BSL7Y 646.26
9 -480.000(非球面) 90.000 674
10 -9800.000 40.000 PBL1Y 610
11 840.000(非球面) 274.300 561.62
12 平面 82.000 PBL1Y 636
13 -1040.201 3.000 636
14 -1058.165 40.000 BSL7Y 618
15 平面 318.000 638
16 -656.249 46.000 BSL7Y 626
17 3530.000(非球面) 372.85 662
18 -1375.500(非球面) 100.000 SILICA 821.24
19 -760.0000 156.400 854
20 -1700 -156.4 MIRROR 960
21 -760.0000 -100.000 SILICA 854
22 -1375.500(非球面) -372.85 821.24
23 3530.500(非球面) -46.000 BSL7Y 662
24 -656. 249 -318.000 626
25 平面 -40.000 BSL7Y 638
26 -1058.165 -3.000 618
27 -1040.201 -82.000 PBL1Y 636
28 平面 274.300 636
29 840.000(非球面) -40.000 PBL1Y 561.62
30 -9801.893 -90.000 610
31 -480.000(非球面) -102.000 BSL7Y 674
32 -4021.459(非球面) -100.200 646.26
33 -4176.798 -88.000 SILICA 661
34 1272.838(非球面) - 30.000 661
35 -88.8581 -15.000 BSL7Y 74
36 -131.553 -20.000 68
37 -446.097 -10.000 BSL7Y 56
38 -97.4287 -89.564 52
39 平面
[Table 2]
Surface number Curvature radius R Surface spacing d Material Effective diameter
1 plane 89.564
2 -97.428 10.000 BSL7Y 52
3 -446.097 20.000 56
4 -131.553 15.000 BSL7Y 68
5 -88.858 30.000 74
6 1272.822 (Aspherical) 88.000 SILICA 661
7 -4176.748 100.200 661
8 -4021.459 (Aspherical) 102.000 BSL7Y 646.26
9 -480.000 (Aspherical) 90.000 674
10 -9800.000 40.000 PBL1Y 610
11 840.000 (Aspherical) 274.300 561.62
12 Plane 82.000 PBL1Y 636
13 -1040.201 3.000 636
14 -1058.165 40.000 BSL7Y 618
15 Plane 318.000 638
16 -656.249 46.000 BSL7Y 626
17 3530.000 (Aspherical surface) 372.85 662
18 -1375.500 (Aspheric) 100.000 SILICA 821.24
19 -760.0000 156.400 854
20 -1700 -156.4 MIRROR 960
21 -760.0000 -100.000 SILICA 854
22 -1375.500 (Aspherical surface) -372.85 821.24
23 3530.500 (Aspherical) -46.000 BSL7Y 662
24 -656. 249 -318.000 626
25 Plane -40.000 BSL7Y 638
26 -1058.165 -3.000 618
27 -1040.201 -82.000 PBL1Y 636
28 Plane 274.300 636
29 840.000 (Aspherical) -40.000 PBL1Y 561.62
30 -9801.893 -90.000 610
31 -480.000 (Aspherical) -102.000 BSL7Y 674
32 -4021.459 (Aspherical) -100.200 646.26
33 -4176.798 -88.000 SILICA 661
34 1272.838 (Aspherical)-30.000 661
35 -88.8581 -15.000 BSL7Y 74
36 -131.553 -20.000 68
37 -446.097 -10.000 BSL7Y 56
38 -97.4287 -89.564 52
39 plane

(非球面)
面18, 22
k=-1.00835 A(4次)=0.00000 B(6次)=0.00000 C(8次)=0.00000
D(10次)=0.00000 E(12次)=0.00000 F(14次)=0.00000
G(16次)=0.00000

面17, 23
k=0.00000 A(4次)=-1.49749E-11 B(6次)=-7.57907E-17
C(8次)=-7.70529 E-22 D(10次)=1.026626E-26 E(12次)=-7.07883E-32
F(14次)=2.559601E-37 G(16次)=-3.76155E-43

面11, 29
k=0.00000 A (4次)=6.914718E-11 B(6次)=6.03728E-16
C(8次)=-1.53262E-20 D(10次)=3.61811E-25 E(12次)=-4.74168E-30
F(14次)=3.217309E-35 G(16次)=-8.85988E-41

面9, 31
k=0.00000 A (4次)=2.768476E-09 B(6次)=-4.8556E-14
C(8次)=7.176113E-19 D(10次)=-1.07637E-24 E(12次)=1.187443E-28
F(14次)=-7.98382E-34 G(16次)=2.393557E-39


面8, 32
k=0.00000 A (4次)=-4.35553E-09 B(6次)=3.635868E-14
C(8次)=-5.95127E-19 D(10次)=7.658840E-24 E(12次)=-7.19412E-29
F(14次)=3.942821E-34 G(16次)=-9.54343E-40

面6, 34
k=0.00000 A (4次)=-1.06469E-09 B(6次)=3.377750E-14
C(8次)=-1.10265E-19 D(10次)=2.282369E-24 E(12次)=-2.74304E-29
F(14次)=1.755771E-34 G(16次)-4.82195E-40
(Aspherical)
Surface 18, 22
k = -1.00835 A (4th order) = 0.00000 B (6th order) = 0.00000 C (8th order) = 0.00000
D (10th order) = 0.00000 E (12th order) = 0.00000 F (14th order) = 0.00000
G (16th) = 0.00000

Surface 17, 23
k = 0.00000 A (4th order) =-1.49749E-11 B (6th order) =-7.57907E-17
C (8th order) =-7.70529 E-22 D (10th order) = 1.026626E-26 E (12th order) =-7.07883E-32
F (14th) = 2.559601E-37 G (16th) =-3.76155E-43

Face 11, 29
k = 0.00000 A (4th order) = 6.914718E-11 B (6th order) = 6.03728E-16
C (8th order) = -1.53262E-20 D (10th order) = 3.61811E-25 E (12th order) = -4.74168E-30
F (14th order) = 3.217309E-35 G (16th order) = -8.85988E-41

Surface 9, 31
k = 0.00000 A (4th order) = 2.768476E-09 B (6th order) =-4.8556E-14
C (8th order) = 7.176113E-19 D (10th order) = -1.07637E-24 E (12th order) = 1.187443E-28
F (14th) =-7.98382E-34 G (16th) = 2.393557E-39


Surface 8, 32
k = 0.00000 A (4th order) =-4.35553E-09 B (6th order) = 3.635868E-14
C (8th order) =-5.95127E-19 D (10th order) = 7.658840E-24 E (12th order) =-7.19412E-29
F (14th order) = 3.942821E-34 G (16th order) =-9.54343E-40

Face 6, 34
k = 0.00000 A (4th order) =-1.06469E-09 B (6th order) = 3.377750E-14
C (8th order) = -1.10265E-19 D (10th order) = 2.282369E-24 E (12th order) = -2.74304E-29
F (14th) = 1.755771E-34 G (16th) -4.82195E-40

表3に図4(B)の波面測定形態2における測定光学系L2の数値データを示す。
[表3]
面番号 曲率半径R 面間隔d 材質 有効径
1 ∞ 315.730
2 -163.089 35.000 BSL7Y 150
3 -115.189 9.100 160
4 352.573 25.000 BSL7Y 170
5 151.4205 780.000 160
6 1272.822(非球面) 88.000 SILICA 661
7 -4176.748 100.200 661
8 -4021.459(非球面) 102.000 BSL7Y 646.26
9 -480.000(非球面) 90.000 674
10 -9800.000 40.000 PBL1Y 610
11 840.000(非球面) 274.300 561.62
12 平面 82.000 PBL1Y 636
13 -1040.201 3.000 636
14 -1058.165 40.000 BSL7Y 618
15 平面 318.000 638
16 -656.249 46.000 BSL7Y 626
17 3530.000(非球面) 372.85 662
18 -1375.500(非球面) 100.000 SILICA 821.24
19 -760.0000 156.400 854
20 -1700 -156.4 MIRROR 960
21 -760.0000 -100.000 SILICA 854
22 -1375.500(非球面) -372.85 821.24
23 3530.500(非球面) -46.000 BSL7Y 662
24 -656. 249 -318.000 626
25 平面 -40.000 BSL7Y 638
26 -1058.165 -3.000 618
27 -1040.201 -82.000 PBL1Y 636
28 平面 -274.300 636
29 840.000(非球面) -40.000 PBL1Y 561.62
30 -9801.893 -90.000 610
31 -480.000(非球面) -102.000 BSL7Y 674
32 -4021.459(非球面) -100.200 646.26
33 -4176.798 -88.000 SILICA 661
34 1272.838(非球面) -780.000 661
35 151.420 -25.000 BSL7Y 160
36 352.573 -9.100 170
37 -115.189 -35.000 BSL7Y 160
38 -163.089 -315.73 150
39 ∞
Table 3 shows numerical data of the measurement optical system L2 in the wavefront measurement mode 2 of FIG.
[Table 3]
Surface number Curvature radius R Surface spacing d Material Effective diameter
1 ∞ 315.730
2 -163.089 35.000 BSL7Y 150
3 -115.189 9.100 160
4 352.573 25.000 BSL7Y 170
5 151.4205 780.000 160
6 1272.822 (Aspherical) 88.000 SILICA 661
7 -4176.748 100.200 661
8 -4021.459 (Aspherical) 102.000 BSL7Y 646.26
9 -480.000 (Aspherical) 90.000 674
10 -9800.000 40.000 PBL1Y 610
11 840.000 (Aspherical) 274.300 561.62
12 Plane 82.000 PBL1Y 636
13 -1040.201 3.000 636
14 -1058.165 40.000 BSL7Y 618
15 Plane 318.000 638
16 -656.249 46.000 BSL7Y 626
17 3530.000 (Aspherical surface) 372.85 662
18 -1375.500 (Aspheric) 100.000 SILICA 821.24
19 -760.0000 156.400 854
20 -1700 -156.4 MIRROR 960
21 -760.0000 -100.000 SILICA 854
22 -1375.500 (Aspherical surface) -372.85 821.24
23 3530.500 (Aspherical) -46.000 BSL7Y 662
24 -656. 249 -318.000 626
25 Plane -40.000 BSL7Y 638
26 -1058.165 -3.000 618
27 -1040.201 -82.000 PBL1Y 636
28 Plane -274.300 636
29 840.000 (Aspherical) -40.000 PBL1Y 561.62
30 -9801.893 -90.000 610
31 -480.000 (Aspherical) -102.000 BSL7Y 674
32 -4021.459 (Aspherical) -100.200 646.26
33 -4176.798 -88.000 SILICA 661
34 1272.838 (Aspherical surface) -780.000 661
35 151.420 -25.000 BSL7Y 160
36 352.573 -9.100 170
37 -115.189 -35.000 BSL7Y 160
38 -163.089 -315.73 150
39 ∞

(非球面)
面18, 22
k =-1.00835 A (4次)=0.00000 B(6次)=0.00000 C(8次)=0.00000
D(10次)=0.00000 E(12次)=0.00000 F(14次)=0.00000
G(16次)=0.00000

面17, 23
k =0.00000 A (4次)=-1.49749E-11 B(6次)=-7.57907E-17
C(8次)=-7.70529 E-22 D(10次)=1.026626E-26 E(12次)=-7.07883E-32
F(14次)=2.559601E-37 G(16次)=-3.76155E-43

面11, 29
k =0.00000 A (4次)= 6.914718E-11 B(6次)= 6.03728E-16
C(8次)=-1.53262E-20 D(10次)=3.61811E-25 E(12次)=-4.74168E-30
F(14次)= 3.217309E-35 G(16次)=-8.85988E-41

面9, 31
k =0.00000 A (4次)=2.768476E-09 B(6次)=-4.8556E-14
C(8次)=7.176113E-19 D(10次)=-1.07637E-24 E(12次)=1.187443E-28
F(14次)=-7.98382E-34 G(16次)2.393557E-39


面8, 32
k =0.00000 A (4次)=-4.35553E-09 B(6次)=3.635868E-14
C(8次)=-5.95127E-19 D(10次)=7.658840E-24 E(12次)=-7.19412E-29
F(14次)=3.942821E-34 G(16次)=-9.54343E-40

面6, 34
k=0.00000 A (4次)=-1.06469E-09 B(6次)=3.377750E-14
C(8次)=-1.10265E-19 D(10次)=2.282369E-24 E(12次)=-2.74304E-29
F(14次)=1.755771E-34 G(16次)=-4.82195E-40
(Aspherical)
Surface 18, 22
k = -1.00835 A (4th order) = 0.00000 B (6th order) = 0.00000 C (8th order) = 0.00000
D (10th order) = 0.00000 E (12th order) = 0.00000 F (14th order) = 0.00000
G (16th) = 0.00000

Surface 17, 23
k = 0.00000 A (4th order) =-1.49749E-11 B (6th order) =-7.57907E-17
C (8th order) =-7.70529 E-22 D (10th order) = 1.026626E-26 E (12th order) =-7.07883E-32
F (14th) = 2.559601E-37 G (16th) =-3.76155E-43

Face 11, 29
k = 0.00000 A (4th order) = 6.914718E-11 B (6th order) = 6.03728E-16
C (8th order) = -1.53262E-20 D (10th order) = 3.61811E-25 E (12th order) = -4.74168E-30
F (14th order) = 3.217309E-35 G (16th order) = -8.85988E-41

Surface 9, 31
k = 0.00000 A (4th order) = 2.768476E-09 B (6th order) =-4.8556E-14
C (8th order) = 7.176113E-19 D (10th order) = -1.07637E-24 E (12th order) = 1.187443E-28
F (14th) =-7.98382E-34 G (16th) 2.393557E-39


Surface 8, 32
k = 0.00000 A (4th order) =-4.35553E-09 B (6th order) = 3.635868E-14
C (8th order) =-5.95127E-19 D (10th order) = 7.658840E-24 E (12th order) =-7.19412E-29
F (14th order) = 3.942821E-34 G (16th order) =-9.54343E-40

Face 6, 34
k = 0.00000 A (4th order) =-1.06469E-09 B (6th order) = 3.377750E-14
C (8th order) = -1.10265E-19 D (10th order) = 2.282369E-24 E (12th order) = -2.74304E-29
F (14th) = 1.755771E-34 G (16th) = -4.82195E-40

表2,表3においてRは曲率半径、dは面間隔を表す。表2において、面番号6〜19,21〜34は各々光学系100である。面番号2〜5,35〜38は各々測定光学系L1である。面番号20はミラーM1である。表3において面番号6〜19,21〜34は各々光学系である。面番号2〜5,35〜38は各々測定光学系L2である。面番号20はミラーM2である。   In Tables 2 and 3, R represents the radius of curvature, and d represents the surface spacing. In Table 2, surface numbers 6 to 19 and 21 to 34 are the optical system 100, respectively. Surface numbers 2 to 5 and 35 to 38 are measurement optical systems L1, respectively. Surface number 20 is mirror M1. In Table 3, surface numbers 6 to 19 and 21 to 34 are optical systems. Surface numbers 2 to 5 and 35 to 38 are measurement optical systems L2. Surface number 20 is mirror M2.

今、便宜上、図4(A),(B)の第1測定系1100aと第2測定系1100bの波面測定形態1,2において、光学系100のレンズL11からL15までが、表4に示すように偏芯したと仮定する。また表4においてミラーM2、ミラーM3の偏芯量は、レンズL11からL15までの偏芯によって発生したチルト成分(zernike2項、3項)を補正するために、ミラーM2、ミラーM3をそれぞれの偏芯させた量とする。   For convenience, in the wavefront measurement modes 1 and 2 of the first measurement system 1100a and the second measurement system 1100b in FIGS. 4A and 4B, the lenses L11 to L15 of the optical system 100 are as shown in Table 4. Is assumed to be eccentric. Further, in Table 4, the decentering amounts of the mirror M2 and the mirror M3 indicate that the decentering amounts of the mirrors M2 and M3 are corrected in order to correct the tilt components (zernike2 term, 3 term) generated by the decentering from the lenses L11 to L15. The amount is the centered amount.

[表4]
レンズ名 X偏芯量 Y偏芯量
L11 +50.000um -50.000um
L12 -50.000um +50.000um
L13 +50.000um +50.000um
L14 -50.000um +50.000um
L15 +50.000um +50.000um
M2 -39.900um +58.170um
M3 -56.820um +64.570um
[Table 4]
Lens name X eccentricity Y eccentricity L11 + 50.000um -50.000um
L12 -50.000um + 50.000um
L13 + 50.000um + 50.000um
L14 -50.000um + 50.000um
L15 + 50.000um + 50.000um
M2 -39.900um + 58.170um
M3 -56.820um + 64.570um

このとき、波面測定形態1,2における波面収差のコマ成分の計算値は表5に示すようになる。
[表5]
波面測定形態1 波面測定形態2
zernike7 -1.051458λ -7.837996λ
zernike8 0.921803λ 1.738226λ
zernike14 0.068602λ -1.227027λ
zernike15 -0.032967λ -0.012590λ
zernike23 -5.1506E-4λ -0.374624λ
zernike24 -1.005759E-3λ -0.012639λ
λ=632.8nm

表5の波面収差のコマ成分を目標に、光学系の各レンズL11〜L15の偏芯とミラーM2,ミラーM3の偏芯を変数にして、光学設計ソフトによって最適化した計算結果が表6となる。
At this time, the calculated values of the coma component of the wavefront aberration in the wavefront measurement modes 1 and 2 are as shown in Table 5.
[Table 5]
Wavefront measurement form 1 Wavefront measurement form 2
zernike7 -1.051458λ -7.837996λ
zernike8 0.921803λ 1.738226λ
zernike14 0.068602λ -1.227027λ
zernike15 -0.032967λ -0.012590λ
zernike23 -5.1506E-4λ -0.374624λ
zernike24 -1.005759E-3λ -0.012639λ
λ = 632.8nm

Table 6 shows the calculation results optimized by optical design software with the decentering of the lenses L11 to L15 and the decentering of the mirrors M2 and M3 as variables, with the coma component of the wavefront aberration in Table 5 as a target. Become.

[表6]
レンズ名 X偏芯算出結果 Y偏芯算出結果
L11 +50.000um -50.000um
L12 -50.000um +50.000um
L13 +50.000um +50.000um
L14 -50.000um +50.000um
L15 +50.000um +50.000um
M2 -39.900um +58.170um
M3 -56.820um +64.570um
[Table 6]
Lens name X eccentricity calculation result Y eccentricity calculation result L11 + 50.000um -50.000um
L12 -50.000um + 50.000um
L13 + 50.000um + 50.000um
L14 -50.000um + 50.000um
L15 + 50.000um + 50.000um
M2 -39.900um + 58.170um
M3 -56.820um + 64.570um

表4,表6の数値は一致し、これより偏心量を求めるために計算した光学設計最適化手法が正しく信頼できるものであることがわかる。表4と表5より、第1測定系1100aと第2測定系1100bの2つの測定形態での波面測定の結果から、光学系のレンズL11からレンズL15まで偏芯(表5)を正しく算出できることがわかる。   The numerical values in Tables 4 and 6 agree with each other, and it can be seen that the optical design optimization method calculated for obtaining the eccentricity is correct and reliable. From Tables 4 and 5, the eccentricity (Table 5) from the lens L11 to the lens L15 of the optical system can be correctly calculated from the results of wavefront measurement in the two measurement forms of the first measurement system 1100a and the second measurement system 1100b. I understand.

図5は表5を算出した偏芯の算出結果(算出方法)を光学ソフトのモデルに組込み、図2に示す反射望遠鏡1の光学性能をシミュレーションによって計算した横収差である。   FIG. 5 is a lateral aberration obtained by incorporating the calculation result (calculation method) of the eccentricity calculated in Table 5 into an optical software model and calculating the optical performance of the reflecting telescope 1 shown in FIG. 2 by simulation.

本発明の光学系の調整方法等では光学系の波面収差を改善するように調整するだけではなく、各レンズの偏芯を求めて光学ソフトのモデルに組み込む。これにより、図5に示すように実際に使用する図2に示すような画角や像高で測定できない場合でも光学性能をシミュレーションによって評価することができるようにしている。   In the optical system adjustment method and the like of the present invention, not only adjustment to improve the wavefront aberration of the optical system is performed, but also the eccentricity of each lens is obtained and incorporated in the optical software model. As a result, as shown in FIG. 5, the optical performance can be evaluated by simulation even when measurement is not possible with the angle of view and image height as shown in FIG.

図6は図4(A),(B)で示す実施例の第1測定系1100aと第2測定系1100bで用いる一例としてのフィゾー型の干渉計の説明図である。図6においてレーザ光源11から放射されたレーザ光(波長632.8nm)はビームエクスパンダ12とコリメータレンズ13によって平行光となり、ハーフミラー14に入射する。ハーフミラー14のハーフミラー面14aを通過したレーザ光の一部は参照光学系15のハーフミラーよりなる参照面15aで反射し、参照光となりハーフミラー面14aで反射し、結像レンズ16で集光されて検出手段17に入射する。   FIG. 6 is an explanatory diagram of a Fizeau interferometer as an example used in the first measurement system 1100a and the second measurement system 1100b of the embodiment shown in FIGS. 4 (A) and 4 (B). In FIG. 6, laser light (wavelength 632.8 nm) emitted from the laser light source 11 becomes parallel light by the beam expander 12 and the collimator lens 13 and enters the half mirror 14. Part of the laser light that has passed through the half mirror surface 14 a of the half mirror 14 is reflected by the reference surface 15 a made up of the half mirror of the reference optical system 15, becomes reference light, is reflected by the half mirror surface 14 a, and is collected by the imaging lens 16. The light is incident on the detection means 17.

一方、参照光学系15を通過したレーザ光は集光された後に、図4に示す測定光学系L1(L2)に入射する。測定光学系L1(L2)を通過したレーザ光は図4(A),(B)に示すように光学系100、ミラーM1(M2)を介して戻り、参照光学系15、ハーフミラー14a、結像レンズ16を介して検出手段17に入射する。そして、参照面15aで反射したレーザ光と干渉して干渉パターンを形成する。検出手段17で干渉パターンのフリンジを検出することによって、光学系100の波面収差を測定する(図1のステップ1)。   On the other hand, the laser beam that has passed through the reference optical system 15 is collected and then enters the measurement optical system L1 (L2) shown in FIG. As shown in FIGS. 4A and 4B, the laser light that has passed through the measurement optical system L1 (L2) returns via the optical system 100 and the mirror M1 (M2), and the reference optical system 15, the half mirror 14a, and the connection result. The light enters the detection means 17 through the image lens 16. Then, it interferes with the laser beam reflected by the reference surface 15a to form an interference pattern. The wavefront aberration of the optical system 100 is measured by detecting the fringe of the interference pattern by the detection means 17 (step 1 in FIG. 1).

尚、光学系100の波面収差の測定は、この干渉方法に限らず、どのような方法であっても良い。   The measurement of the wavefront aberration of the optical system 100 is not limited to this interference method, and any method may be used.

以上のように本発明によれば、測定対象となる光学系が大型であっても光学系を構成する光学素子の組立精度を容易に測定することができ、しかも所望の結像性能が得られるように光学素子の偏芯等の光学調整が容易に行える。   As described above, according to the present invention, it is possible to easily measure the assembly accuracy of the optical elements constituting the optical system even when the optical system to be measured is large, and to obtain desired imaging performance. Thus, optical adjustment such as decentration of the optical element can be easily performed.

1 反射望遠鏡 100 光学系 L11〜L15 光学部材
M1,M2 ミラー 1100a 第1測定系 1100b 第2測定系
L1,L2 測定光学系
DESCRIPTION OF SYMBOLS 1 Reflective telescope 100 Optical system L11-L15 Optical member M1, M2 Mirror 1100a 1st measurement system 1100b 2nd measurement system L1, L2 Measurement optical system

Claims (3)

第1測定系より光学系に光束を入射し、前記光学系を介した光束を用いて前記光学系の波面収差を測定するとともに、第2測定系により前記第1測定系からの光束の前記光学系を通過する光路とは異なる光路で光束を前記光学系に入射し、前記光学系を介した光束を用いて前記光学系の波面収差を測定する第1工程と、
前記第1測定系で得られた波面収差と前記第2測定系で得られた波面収差より前記光学系を構成する各光学素子の偏心量を算出する第2工程とを有することを特徴とする光学系の偏心量算出方法。
A light beam is incident on the optical system from the first measurement system, and the wavefront aberration of the optical system is measured using the light beam via the optical system, and the optical of the light beam from the first measurement system is measured by the second measurement system. A first step in which a light beam is incident on the optical system in an optical path different from an optical path passing through the system, and a wavefront aberration of the optical system is measured using the light beam via the optical system;
A second step of calculating a decentering amount of each optical element constituting the optical system from the wavefront aberration obtained by the first measurement system and the wavefront aberration obtained by the second measurement system. A method for calculating the amount of eccentricity of an optical system.
請求項1の光学系の偏心量算出方法における前記第2工程で算出された偏心量を用いて、前記光学系を構成する各光学素子の位置を調整する第3工程を有することを特徴とする光学系の調整方法。   A third step of adjusting the position of each optical element constituting the optical system using the amount of eccentricity calculated in the second step in the method of calculating the amount of eccentricity of the optical system according to claim 1 is provided. Adjustment method of optical system. 請求項1の光学系の偏心量算出方法における前記第2工程で算出された偏心量を用いて、前記光学系の各光学素子に関する偏心光学モデルを作成し、作成した偏心光学モデルを用いて前記光学系が他の光学系の一部に装着されて実際に使用される状態を想定してシミュレーションを行い、前記光学系の光学性能の評価を行うことを特徴とする光学系の評価方法。   A decentered optical model for each optical element of the optical system is created using the decentration amount calculated in the second step of the decentration amount calculation method for the optical system according to claim 1, and the decentered optical model is used to create the decentered optical model. A method for evaluating an optical system, wherein simulation is performed assuming that the optical system is actually used by being mounted on a part of another optical system, and the optical performance of the optical system is evaluated.
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