JP2014236065A - Method for manufacturing organic thin film solar cell and organic thin film solar cell - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method capable of manufacturing an organic thin film solar cell which can suppress reduction in the power generation efficiency, with excellent productivity.SOLUTION: The method for manufacturing the organic thin film solar cell 100 comprises: at least of two steps of following steps (1) and (2); a step (1) is for preparing a laminated body 110 in which a transparent electrode layer 102 and an organic semiconductor layer 103 are laminated in the order is formed on a transparent substrate 101; and a step (2) is for forming a back electrode layer 104 on the organic semiconductor layer 103 by laminating and sticking a metal foil having 3.0 μm or less of a film thickness on the organic semiconductor layer 103.

Description

  The present invention relates to a method for producing an organic thin film solar cell and an organic thin film solar cell.

In general, an organic thin film solar cell has a configuration in which a transparent electrode layer, an organic semiconductor layer, and a back electrode layer are laminated in this order on a transparent substrate.
Such an organic thin-film solar cell has advantages such as a simpler manufacturing method, lower production costs, and imparting colorability, flexibility, and the like as compared with an inorganic solar cell using silicon or an inorganic compound material.

  As a method for forming a solar cell electrode, for example, a vacuum deposition method, a sputtering method, a PVD method such as an ion plating method, a CVD method, or the like is known.

  Patent Document 1 (Japanese Patent Application Laid-Open No. 2011-142217) describes a method of forming a solar cell electrode by thermocompression bonding a metal substrate on a photoelectric conversion layer.

  A method for forming an electrode for a solar cell by laminating such a metal substrate can be continuously manufactured by, for example, a roll-to-roll process. Are better. Furthermore, there is an advantage that the area of the electrode can be easily increased.

JP 2011-142217 A

  However, according to the study by the present inventors, the organic thin-film solar cell in which the back electrode layer is formed by laminating the metal base material has lower power generation efficiency than that in which the back electrode layer is formed by vacuum deposition or the like. It became clear.

  Therefore, the present invention provides a manufacturing method capable of manufacturing an organic thin film solar cell in which a decrease in power generation efficiency is suppressed with high productivity.

  The present inventors diligently studied the factors that cause a decrease in power generation efficiency. As a result, it has been found that by selecting a metal foil having a film thickness of 3.0 μm or less as a metal substrate to be used, a decrease in power generation efficiency of the obtained organic thin film solar cell can be suppressed, and the present invention has been achieved.

That is, according to the present invention,
A method for producing an organic thin-film solar cell in which at least a transparent electrode layer, an organic semiconductor layer, and a back electrode layer are laminated in this order on a transparent substrate,
Preparing a laminate in which the transparent electrode layer and the organic semiconductor layer are laminated in this order on the transparent substrate;
Forming a back electrode layer on the organic semiconductor layer by laminating and adhering a metal foil having a thickness of 3.0 μm or less on the organic semiconductor layer;
A method for producing an organic thin film solar cell is provided.

Furthermore, according to the present invention,
An organic thin film solar cell obtained by the method for producing an organic thin film solar cell of the present invention is provided.

  ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method which can manufacture the organic thin film solar cell by which the fall of power generation efficiency was suppressed with sufficient productivity can be provided.

It is sectional drawing which shows an example of a structure of the organic thin film solar cell of embodiment which concerns on this invention. It is sectional drawing which shows the manufacturing process of the organic thin-film solar cell of embodiment which concerns on this invention. It is a top view which shows an example of the structure by the side of the back surface electrode of the organic thin-film solar cell of embodiment which concerns on this invention. It is a top view which shows an example of the structure by the side of the back surface electrode of the organic thin-film solar cell of embodiment which concerns on this invention.

  Embodiments of the present invention will be described below with reference to the drawings. In all the drawings, the same reference numerals are given to the same components, and the description will be omitted as appropriate. The figure is a schematic view and does not necessarily match the actual dimensional ratio. In addition, unless otherwise specified, “to” represents the following.

<Method for producing organic thin-film solar cell>
Hereinafter, the manufacturing method of the organic thin film solar cell 100 which concerns on this embodiment is demonstrated.
FIG. 1 is a cross-sectional view illustrating an example of the configuration of an organic thin-film solar cell 100 according to an embodiment of the present invention. FIG. 2 is a cross-sectional view showing a manufacturing process of the organic thin-film solar cell 100 according to the embodiment of the present invention.

The manufacturing method of the organic thin film solar cell 100 of the present invention is an organic thin film solar cell 100 in which at least a transparent electrode layer 102, an organic semiconductor layer 103, and a back electrode layer 104 are laminated in this order on a transparent substrate 101 (FIG. The manufacturing method of 1) includes at least the following two steps (1) and (2).
(1) A step of preparing a laminate 110 in which a transparent electrode layer 102 and an organic semiconductor layer 103 are laminated in this order on a transparent substrate 101 (FIG. 2A).
(2) Step of forming the back electrode layer 104 on the organic semiconductor layer 103 by laminating and adhering a metal foil having a thickness of 3.0 μm or less on the organic semiconductor layer 103 (FIG. 2B).

  According to the method for manufacturing the organic thin film solar cell 100 of the present invention, the power generation of the organic thin film solar cell 100 obtained by laminating and adhering a metal foil having a film thickness of 3.0 μm or less on the organic semiconductor layer 103. Reduction in efficiency can be suppressed.

  Hereinafter, each step will be described in detail.

  First, the process (FIG. 2 (a)) which prepares the laminated body 110 is demonstrated. The stacked body 110 can be obtained, for example, by sequentially forming the transparent electrode layer 102 and the organic semiconductor layer 103 on the transparent substrate 101. Moreover, you may prepare what laminated | stacked the transparent electrode layer 102 and the organic-semiconductor layer 103 in this order on the transparent substrate 101 already.

  First, the transparent electrode layer 102 is formed on the entire surface of the transparent substrate 101 or in a predetermined pattern shape. As a method for forming the transparent electrode layer 102, a general electrode forming method can be used. For example, a dry process such as a PVD method such as a vacuum deposition method, a sputtering method, or an ion plating method, a CVD method, a wet process for applying a coating liquid, or the like can be given.

The transparent substrate 101 is not particularly limited as long as it is a substrate transparent to visible light, and a substrate generally used for an organic thin film solar cell can be used. For example, a glass substrate, a plastic film substrate, etc. are mentioned.
The thickness of the transparent substrate 101 is not particularly limited, but is usually in the range of 10 μm to 200 μm.

The transparent electrode layer 102 is provided on the transparent substrate 101 and is an electrode facing the back electrode layer 104. The transparent electrode layer 102 is not particularly limited as long as it is transparent to visible light and has electrical conductivity, and those generally used for organic thin-film solar cells can be used. Examples thereof include those formed of transparent conductive oxides such as tin-added indium oxide (ITO), tin oxide (SnO ₂ ), fluorine-doped tin oxide (FTO), and antimony-doped tin oxide (ATO).
The thickness of the transparent electrode layer 102 is not particularly limited, but is usually in the range of 5 nm to 100 μm.

  Next, the organic semiconductor layer 103 is formed on the transparent electrode layer 102.

The organic semiconductor layer 103 is formed between the transparent electrode layer 102 and the back electrode layer 104, contributes to charge separation of the organic thin film solar cell 100, and generates generated electrons and holes in opposite directions. It has the function of transporting towards.
The organic semiconductor layer 103 may be a single layer having both an electron accepting function and an electron donating function, or an electron accepting layer having an electron accepting function and an electron donating function having an electron donating function. It may be a laminate of a conductive layer.

The electron donating material (also referred to as a p-type organic semiconductor material) is not particularly limited as long as it has an electron donating function, and those generally used for organic thin film solar cells are used. be able to. For example, an electron-donating conductive polymer material can be given.
Examples of the electron-donating conductive polymer material include polyphenylene, polyphenylene vinylene, polysilane, polythiophene, polycarbazole, polyvinyl carbazole, porphyrin, polyacetylene, polypyrrole, polyaniline, polyfluorene, polyvinyl pyrene, polyvinyl anthracene, and derivatives thereof. , Phthalocyanine-containing polymer, carbazole-containing polymer, organometallic polymer, and the like.

  The electron-accepting material (also referred to as an n-type organic semiconductor material) is not particularly limited as long as it has an electron-accepting function, and is generally used for organic thin-film solar cells. Can be used. For example, fullerene derivatives, carbon nanotubes, perylene derivatives and the like can be mentioned.

  As the film thickness of the organic semiconductor layer 103, a film thickness generally employed in an organic thin film solar cell can be employed. For example, it is in the range of 0.2 nm to 3000 nm. When the film thickness is within the above range, the balance between conductivity and light absorption of the organic semiconductor layer 103 is excellent. Moreover, it can suppress further that a short circuit arises between the transparent electrode layer 102 and the back surface electrode layer 104 as a film thickness is more than the said lower limit.

  The mixing ratio of the electron-donating material and the electron-accepting material is appropriately adjusted to an optimal mixing ratio depending on the type of material used.

  When the organic semiconductor layer 103 is a laminate of an electron-accepting layer and an electron-donating layer, the thickness of the electron-accepting layer is, for example, in the range of 0.1 nm to 1500 nm, The film thickness of the donor layer is, for example, in the range of 0.1 nm to 1500 nm. When the film thickness is within the above range, the balance between conductivity and light absorption of the organic semiconductor layer 103 is excellent. Moreover, it can suppress that a short circuit arises between the transparent electrode layer 102 and the back surface electrode layer 104 as a film thickness is more than the said lower limit.

The organic semiconductor layer 103 may be provided with an organic hole transport layer (also referred to as a hole extraction layer) on the transparent electrode layer 102 side.
The organic hole transport layer is a layer provided so that holes can be easily taken out from the organic semiconductor layer 103 to the transparent electrode layer 102. Thereby, since the hole extraction efficiency from the organic semiconductor layer 103 to the transparent electrode layer 102 is increased, the power generation efficiency of the obtained organic thin film solar cell 100 can be further improved.

The material used for the organic hole transport layer is not particularly limited as long as it is a material that stabilizes the extraction of holes from the organic semiconductor layer 103 to the transparent electrode layer 102, and is generally an organic thin film solar cell. What is used for can be used. Examples thereof include conductive organic compounds such as doped polyethylene dioxythiophene (PEDOT) and tetraphenylphenylenediamine (TPD), and oxides such as vanadium oxide and molybdenum oxide.
Here, examples of the dopant doped into the conductive organic compound include polystyrene sulfonic acid (PSS).
As a combination of such a conductive organic compound and a dopant, a combination (PEDOT / PSS) of polyethylenedioxythiophene (PEDOT) and polystyrene sulfonic acid (PSS) is particularly preferable.

  As the film thickness of the organic hole transport layer, a film thickness generally employed in organic thin film solar cells can be employed. For example, it is in the range of 10 nm to 200 nm.

The organic semiconductor layer 103 may be provided with an organic electron transport layer (also referred to as an electron extraction layer) on the back electrode layer 104 side.
The organic electron transport layer is a layer provided so that electrons can be easily extracted from the organic semiconductor layer 103 to the back electrode layer 104. Thereby, since the electron extraction efficiency from the organic semiconductor layer 103 to the back electrode layer 104 is increased, the power generation efficiency of the obtained organic thin-film solar cell 100 can be further improved.

  The material used for the organic electron transport layer is not particularly limited as long as it is a material that stabilizes the extraction of electrons from the organic semiconductor layer 103 to the back electrode layer 104, and is used for an organic thin film solar cell. Generally known ones can be used. Examples thereof include alkali metals such as calcium and cesium, metal fluorides such as lithium fluoride and calcium fluoride, and oxides such as titanium oxide and zinc oxide.

  Further, an organic hole transport layer may be provided on the back electrode layer 104 side, and an organic electron transport layer may be provided on the transparent electrode layer 102 side. By setting it as such a structure, it can be set as an organic thin film solar cell of what is called a reverse structure.

  The method for forming the organic semiconductor layer 103 is not particularly limited as long as it can be uniformly formed to have a predetermined film thickness, and examples thereof include a wet coating method. When the wet coating method is used, the organic semiconductor layer 103 can be formed in the air, so that cost can be reduced and the area can be easily increased.

  The single organic semiconductor layer 103 having both the electron accepting and electron donating functions can be obtained, for example, by applying a coating liquid containing the above-described electron donating material, electron accepting material, and organic solvent on the transparent electrode layer 102. The organic solvent can be formed by coating and then drying to remove the organic solvent.

  On the other hand, the organic semiconductor layer 103 in which the electron-accepting layer and the electron-donating layer are stacked can be formed by, for example, the following method. First, the coating liquid containing the electron donating material and the organic solvent described above is applied onto the transparent electrode layer 102 to form a coating film, and then the organic solvent is dried and removed to make the electron donating layer transparent. It is formed on the electrode layer 102. Next, the above-described coating solution containing the electron-accepting material and the organic solvent is applied onto the electron-donating layer to form a coating film, and then the organic solvent is removed by drying to remove the electron-accepting layer. Form on the donor layer. By doing so, the organic semiconductor layer 103 in which the electron-accepting layer and the electron-donating layer are stacked can be formed on the transparent electrode layer 102.

  In addition, the organic hole transport layer and the organic electron transport layer can be formed according to the formation method of the electron accepting layer and the electron donating layer, respectively.

  The application method of the coating liquid is not particularly limited as long as it is a method capable of uniformly applying the coating liquid. For example, a die coating method, a spin coating method, a dip coating method, a roll coating method, Examples thereof include a bead coating method, a spray coating method, a bar coating method, a gravure coating method, an ink jet method, a screen printing method, and an offset printing method.

  The ratio of the electron-donating material and the electron-accepting material in the organic semiconductor layer 103 is a molar ratio, usually electron-donating material: electron-accepting material = 1: 0.5-7, preferably electron-donating property. Material: electron-accepting material = 1: 0.7-3.

  From the above, the laminate 110 can be obtained.

  Next, a process of forming the back electrode layer 104 on the organic semiconductor layer 103 (FIG. 2B) will be described.

  The back electrode layer 104 is formed on the organic semiconductor layer 103 and is an electrode facing the transparent electrode layer 102. As will be described later, the back electrode layer 104 is formed by laminating and adhering metal foils having a film thickness of 3.0 μm or less.

First, the metal foil to be used will be described.
The metal material constituting the metal foil is not particularly limited as long as it functions as an electrode. For example, aluminum, titanium, chromium, tungsten, molybdenum, platinum, tantalum, niobium, zirconium, zinc, silver, gold , Copper, various stainless steels, and alloys thereof. Among these, aluminum, silver, gold, and copper are preferable from the viewpoint that the reflectance of light is excellent and the power generation efficiency of the obtained organic thin film solar cell can be further improved. Any one of these metals or alloys can be used alone or in combination of two or more.
Further, a thin metal element foil for improving work function matching may be used on the organic semiconductor layer 103 side, and another metal foil having good electrical conductivity may be laminated on the back surface side. For example, by using a gold foil on the organic semiconductor layer 103 side and matching a copper foil on the back surface side, the material cost can be reduced.

  The upper limit of the thickness of the metal foil is 3.0 μm or less, preferably 2.5 μm or less, and particularly preferably 1.0 μm or less. The adhesiveness of the organic-semiconductor layer 103 and the back surface electrode layer 104 can be improved as the thickness of metal foil is below the said upper limit. As a result, the power generation efficiency of the obtained organic thin film solar cell 100 can be improved. In addition, it is preferable to use a thin foil in order to reduce material costs.

  Further, the lower limit of the thickness of the metal foil is preferably 0.01 μm or more, more preferably 0.05 μm or more, and particularly preferably 0.1 μm or more. When the thickness of the metal foil is not less than the above lower limit value, the strength of the metal foil can be sufficiently secured, and the occurrence of pinholes and the like can be suppressed. As a result, the power generation efficiency of the obtained organic thin film solar cell 100 can be further improved.

  A commercially available metal foil can be used, for example.

  Next, a method for laminating a metal foil on the organic semiconductor layer 103 will be described.

  In the method for manufacturing the organic thin film solar cell 100 of the present invention, the back electrode layer 104 is formed on the organic semiconductor layer 103 by laminating and adhering a metal foil having a thickness of 3.0 μm or less on the organic semiconductor layer 103. Form.

  A method for laminating and adhering a metal foil having a thickness of 3.0 μm or less on the organic semiconductor layer 103 is particularly limited as long as the metal foil can be disposed on the organic semiconductor layer 103 with good adhesion. For example, a method in which a metal foil is thermocompression bonded onto the organic semiconductor layer 103 can be used. By thermally laminating a metal foil on the organic semiconductor layer 103, the metal foil can be laminated with good adhesion.

  As a method of thermocompression bonding a metal foil on the organic semiconductor layer 103, for example, a metal foil wound in a roll shape is prepared and conveyed to a laminator together with the sheet-like laminate 110. The laminator pressurizes and laminates the metal foil and the sheet-like laminate 110.

  Commercially available laminators can be used.

In addition, when the metal foil is laminated on the organic semiconductor layer 103, it is preferable to provide a support base material on one surface of the metal foil. In this case, the back electrode layer 104 is formed on the organic semiconductor layer 103 by laminating the metal foil on the organic semiconductor layer 105 so that the metal foil and the organic semiconductor layer 103 are in contact with each other, and then peeling the supporting base material. To do.
By doing so, workability when handling a thin metal foil is improved, and a metal foil having a thickness of 3.0 μm or less can be efficiently laminated on the organic semiconductor layer 103.

  As the support substrate, a plastic film can be used. For example, polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polycarbonate (PC), acrylic resin (PMMA), cyclic polyolefin, triacetyl cellulose ( TAC), polyether sulfide (PES), polyether ketone, polyimide and the like. Among these, a PET film and a PEN film are preferable, and a PET film is particularly preferable.

  The thickness of the supporting substrate is preferably 1 μm or more and 100 μm or less, more preferably 10 μm or more and 50 μm or less. When the thickness of the support base is within the above range, the workability of the metal foil is further improved.

  In the manufacturing method of the organic thin film solar cell 100 according to the present embodiment, it is preferable to use a metal foil wound and laminated in a roll shape. Thereby, since the process of forming the back surface electrode layer 104 can be performed continuously by a roll-to-roll method, the productivity of the organic thin film solar cell 100 can be further improved.

In the step of forming the back electrode layer 104, it is preferable to stack the metal foil on the organic semiconductor layer 103 without providing an insulating adhesive layer between the metal foil and the organic semiconductor layer 103.
By carrying out like this, the electroconductivity between the organic-semiconductor layer 103 and the back surface electrode layer 104 improves, As a result, the electric power generation efficiency of the organic thin-film solar cell 100 obtained can be improved.
Further, the metal foil may be used by overlapping a plurality of metal foils. At this time, the first metal foil on the back electrode layer 104 side needs to have a film thickness of 3.0 μm or less. However, the second and subsequent layers may be different from the first layer metal foil. For example, a metal foil having better electrical conductivity than the first layer may be used. As a forming method, it is preferable to laminate two or more kinds of metal foils in advance and integrate them by rolling or the like, and then form an electrode in the same process as in the case of one layer. Thereby, workability | operativity improves more. When two or more layers of metal foil are used, the thickness of the first metal foil on the back electrode layer 104 side may be 3.0 μm or less, and the total of the plurality of metal foils is 3 μm or less. There is no need.

<Organic thin film solar cell>
FIG. 1 is a cross-sectional view illustrating an example of the configuration of an organic thin-film solar cell 100 according to an embodiment of the present invention.
The organic thin film solar cell 100 according to the present embodiment has a configuration in which at least a transparent electrode layer 102, an organic semiconductor layer 103, and a back electrode layer 104 are laminated in this order on a transparent substrate 101. Moreover, the organic thin film solar cell 100 which concerns on this embodiment can be obtained with the manufacturing method of the organic thin film solar cell of the said invention.

In the organic thin film solar cell 100 according to the present embodiment, in addition to the constituent members described above, constituent members generally employed in the organic thin film solar cell may be provided as necessary. For example, functional layers such as a barrier layer, a protective layer, a strength support layer, an antifouling layer, a high light reflection layer, a light containment layer, and a sealing material layer may be provided. Further, an adhesive layer may be provided between the functional layers depending on the layer configuration.
In this embodiment, the back electrode layer 104 may be formed by laminating a metal foil on the entire surface of the organic semiconductor layer 103. However, the back electrode layer 104 is formed by laminating and laminating strip-shaped metal foils as shown in FIG. Alternatively, the back electrode layer 104 may be formed by laminating metal foils in a grid pattern as shown in FIG. By laminating the metal foil in this way, the amount of metal foil used can be reduced compared to the case of laminating the entire surface. For this reason, it is advantageous from the viewpoint of resource saving and particularly in the case of a noble metal from the viewpoint of cost. It is difficult to partially laminate by vapor deposition or CVD, and even if a metal is laminated in a strip shape as shown in FIG. 3 using a mask, the metal attached to the mask is wasted.
In the case where the metal foils are arranged in a strip shape or a lattice shape as shown in FIG. 3 to form an electrode, in order to transport charges to the electrode with high efficiency, the underlayer is formed of an organic hole transport layer such as PEDOT: PSS described above or It is preferable to use an organic electron transport layer.
Further, when the metal foils are used in a strip shape or a lattice shape, the effect of reflection of the back electrode layer is reduced. Therefore, it is preferable to use a metal foil having a high reflectivity further behind the back electrode layer. Alternatively, at the stage of the solar cell module of, for example, by blending a reflective material such as TiO _2, highly reflective encapsulant or it is preferable to combine a high reflectivity backsheet.

As mentioned above, although embodiment of this invention was described, these are illustrations of this invention and various structures other than the above are also employable.
Further, the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within a scope that can achieve the object of the present invention are included in the present invention.

  Hereinafter, although an example and a comparative example explain the present invention, the present invention is not limited to these.

Example 1
A glass substrate obtained by patterning ITO (150 nm, surface resistance of 15Ω / □ or less) on a glass substrate was used. The effective area sandwiched between the counter electrodes of the power generation element portion was 2 × 5 mm.
A TiOx film having a thickness of 20 nm was formed on the ITO on the glass substrate by the following method using a sol-gel method. First, titanium [IV] isopropoxide, acetylacetone, acetic acid and ethanol were mixed at a molar ratio of 1: 0.3: 0.2: 200 and left at room temperature for 12 hours. Then, it spin-coated on the conditions of 6000 rpm for 60 seconds on the glass substrate, and formed by heat-processing at 150 degreeC for 1 hour.
Poly 3-hexylthiophene (P3HT, manufactured by Merck, lisicon SP001 EF430602) and a fullerene derivative (PC61BM: phenyl _{-C 61} - butanoic acid - methyl ester, Luminescence Technology Co., PC61BM LT-S905) a 1: 1 mixing ratio And dissolved in a chlorobenzene solvent. Next, the obtained P3HT / PC61BM solution was spin-coated on the TiOx film formed on the ITO under the conditions of 600 rpm and 60 seconds to form a P3HT / PC61BM layer.
Next, a dispersion of poly (3,4-ethylenedioxythiophene) (PEDOT) and poly (4-styrenesulfonic acid) (PSS) (manufactured by HC Starck Ltd., CLEVIOS PAI408) on the P3HT / PC61BM layer. Spin coating was performed under conditions of 1600 rpm and 60 seconds to form a PEDOT / PSS layer having a thickness.

  Subsequently, this support-supported Au foil was obtained by placing a PET film on an Au foil (Au foil thickness 0.2 μm, manufactured by Foil Co., Ltd., model number: JK-013) and cutting the entire PET film to a width of 2 mm. Was placed on the PEDOT / PSS layer and set at a position where the edge could be electrically connected to the ITO counter electrode pad on the glass substrate. Subsequently, after pressing with the hard rubber roll from the upper part of the support base material, the support base material was peeled off. Here, the supporting substrate is a PET film, and the film thickness is 20 μm.

  The obtained organic thin-film solar cell element was frame-sealed with a UV-cured epoxy resin with a grooved glass cap and subjected to heat treatment at 150 ° C. for 5 minutes to obtain an organic thin-film solar cell.

(Evaluation)
About the obtained organic thin-film solar cell, a sample is made at a position where light illuminance becomes 100 mW / cm ² using a simple solar simulator, TYPE: PEC-L10, air mass filter AM1.5G manufactured by Pexel Technology. Was set and irradiated with continuous light of the standard solar spectrum. The power generation characteristics were determined by measuring the IV curve using a Keithley 2400 source meter after 30 minutes. The power generation efficiency was 2.9%.

(Example 2)
In the same manner as in Example 1, a device before application of the back electrode was produced.
In Example 2, instead of the Au foil of Example 1, an 0.75 μm-thick Au foil (manufactured by Niraco, model number: AU-173058, with an acrylic support material) was used. The Au foil was cut into a required shape with a width of 2 mm with a cutter, with the acrylic support material still attached. Thereafter, the acrylic support material was immersed in acetone to completely remove it, and the one dried at room temperature was placed on a 20 μm-thick PET film support substrate.
This Au foil with a supporting substrate was placed on the PEDOT / PSS layer, and set at a position where an end portion could be electrically connected to the ITO counter electrode pad on the glass substrate. Subsequently, after pressing with the hard rubber roll from the upper part of the support base material, the support base material was peeled off.
The power generation characteristics were evaluated in the same manner as in Example 1. The power generation efficiency was 2.2%.

Example 3
In the same manner as in Example 1, a device before application of the back electrode was produced.
In Example 3, instead of the Au foil of Example 1, a 2.5 μm-thick Au foil (manufactured by Niraco, model number: AU-173102, with an acrylic support material) was used. The Au foil was cut into a required shape with a width of 2 mm with a cutter, with the acrylic support material still attached. Thereafter, the acrylic support material was immersed in acetone to completely remove it, and the one dried at room temperature was placed on a 20 μm-thick PET film support substrate.
This Au foil with a supporting substrate was placed on the PEDOT / PSS layer, and set at a position where an end portion could be electrically connected to the ITO counter electrode pad on the glass substrate. Subsequently, after pressing with a rubber roll from the upper part of the support substrate, the support substrate was peeled off.
The power generation characteristics were evaluated in the same manner as in Example 1. The power generation efficiency was 2.2%.

(Comparative Example 1)
An organic thin-film solar cell was obtained in the same manner as in Example 1 except that the thickness of the Au foil was 5 μm (manufactured by Niraco, model number: AU-173138).
However, since the 5 μm-thick Au foil is self-supporting and peeled off from the PET film as the supporting substrate, it was fixed with a mending tape from the top of the PET film when placed on the element. Next, after pressing with a rubber roll, it was further pressed with a stainless steel roll. Thereafter, the supporting substrate was peeled off.

  The power generation characteristics were evaluated in the same manner as in Example 1. The power generation efficiency was 0.1% or less.

100 Organic Thin Film Solar Cell 101 Transparent Substrate 102 Transparent Electrode Layer 103 Organic Semiconductor Layer 104 Back Electrode Layer 110 Laminate

Claims (9)

A method for producing an organic thin-film solar cell in which at least a transparent electrode layer, an organic semiconductor layer, and a back electrode layer are laminated in this order on a transparent substrate,
Preparing a laminate in which the transparent electrode layer and the organic semiconductor layer are laminated in this order on the transparent substrate;
Forming a back electrode layer on the organic semiconductor layer by laminating and adhering a metal foil having a thickness of 3.0 μm or less on the organic semiconductor layer;
A method for producing an organic thin film solar cell, comprising: In the manufacturing method of the organic thin-film solar cell of Claim 1,
The manufacturing method of the organic thin-film solar cell whose thickness of the said metal foil is 0.01 micrometer or more. In the manufacturing method of the organic thin-film solar cell of Claim 1 or 2,
The metal foil is provided with a support base on one surface of the metal foil,
In the step of forming the back electrode layer, an organic thin film solar in which the metal foil is laminated on the organic semiconductor layer so that the metal foil and the organic semiconductor layer are in contact with each other, and then the supporting substrate is peeled off. Battery manufacturing method. In the manufacturing method of the organic thin-film solar cell of Claim 3,
The method for producing an organic thin-film solar cell, wherein the support substrate is a plastic film. In the manufacturing method of the organic thin-film solar cell of Claim 3 or 4,
The thickness of the said support base material is a manufacturing method of the organic thin-film solar cell which is 1 micrometer or more and 100 micrometers or less. In the manufacturing method of the organic thin-film solar cell as described in any one of Claims 1 thru | or 5,
The metal foil is wound and laminated in a roll shape,
In the step of forming the back electrode layer,
An organic thin film solar which conveys the metal foil wound and laminated, and laminates the metal foil on the organic semiconductor layer continuously by a roll-to-roll method by conveying the sheet-like laminate. Battery manufacturing method. In the manufacturing method of the organic thin-film solar cell as described in any one of Claims 1 thru | or 6,
The said metal foil is a manufacturing method of the organic thin-film solar cell comprised by the 1 type, or 2 or more types of metal selected from the group which consists of aluminum, silver, gold | metal | money, and copper. In the manufacturing method of the organic thin-film solar cell as described in any one of Claims 1 thru | or 7,
In the step of forming the back electrode layer, an organic thin film solar cell in which the metal foil is laminated on the organic semiconductor layer without providing an insulating adhesive layer between the metal foil and the organic semiconductor layer Manufacturing method.   The organic thin film solar cell obtained by the manufacturing method of the organic thin film solar cell as described in any one of Claims 1 thru | or 8.

Images