JP2014225605A - Processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a processing device reduced in probability of inducing defects such as falling of a sample table.SOLUTION: A processing device includes: an inner tank 2 capable of filling a treatment liquid 4 at the inside thereof; and a rotation mechanism 3 capable of agitating the treatment liquid 4 by rotating the inner tank 2.

Description

  The present invention relates to a processing apparatus, and more particularly to a processing apparatus for etching an aluminum thin film formed on a semiconductor wafer.

  When an aluminum wiring structure for forming, for example, a MOS (Metal Oxide Semiconductor) device is formed on the surface of a semiconductor wafer, the aluminum thin film formed on the semiconductor wafer is etched. The etching here is preferably performed by so-called wet etching using a chemical solution. However, in order to make the etching rate substantially uniform over the entire region to be etched, the chemical solution is supplied uniformly to the surface of the semiconductor wafer. It is necessary to.

  Therefore, when wet etching is performed on an aluminum thin film, it is necessary to increase the etching efficiency by supplying a sufficient amount of chemicals to the surface of the thin film to be etched. Thus, for example, a method is used in which a sample stage (basket or the like) on which a semiconductor wafer on which an aluminum thin film is formed is immersed in a chemical solution is swung in the vertical and horizontal directions. In this way, since the chemical solution adheres to the surface of the semiconductor wafer with high efficiency, the efficiency of the etching operation is enhanced.

  Other techniques similar to those described above are disclosed in, for example, the following Patent Documents 1 to 6.

JP 61-166134 A JP 60-119728 A JP 2000-311881 A Japanese Patent Laid-Open No. 5-198555 JP-A-4-17334 JP-A-5-267274

  In the above-described method of swinging the sample stage in the up, down, left, and right directions, the sample stage is swung while being suspended by the swing robot. In this method, there is a possibility that the sample table is detached from the rocking robot due to an impact applied to the sample table by rocking, and the sample table is dropped to the bottom of the chemical solution tank. Since the above Patent Documents 1 to 6 do not describe any countermeasures against such a problem, there is a possibility that the above problem occurs.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a processing apparatus in which the possibility of inducing a malfunction such as a drop of a sample stage is reduced.

  The processing apparatus which concerns on one embodiment of this invention is equipped with the inner tank which can be filled with a process liquid inside, and the rotation mechanism which makes it possible to stir a process liquid by rotating an inner tank. .

  A processing apparatus according to another embodiment of the present invention includes an inner tank capable of filling the processing liquid therein, a stirring rod for immersing the processing liquid in the inner tank and stirring the processing liquid, And a rotating mechanism that enables the processing liquid to be stirred by moving the stirring bar in an annular shape in the inner tank.

  A processing apparatus according to still another embodiment of the present invention includes an inner tank that can be filled with a processing solution, and a swing mechanism that is connected to the inner tank and that allows the inner tank to swing.

  According to the present invention, since the processing liquid in the inner tank can be agitated without swinging the sample stage in the vertical and horizontal directions, it is possible to reduce the possibility of inducing problems such as dropping of the sample stage.

2 is a schematic cross-sectional view showing a configuration of a processing apparatus according to Embodiment 1. FIG. It is a schematic sectional drawing which shows in detail the structure of the basket fixing stand, an inner tank protrusion part, and a basket protrusion part of the area | region II enclosed with the dotted line in FIG. It is the schematic plan view (A) which shows the 1st state in which an inner tank rotates with respect to a basket, and the schematic plan view (B) which shows the 2nd state in which an inner tank rotates with respect to a basket. FIG. 3 is a schematic cross-sectional view showing a configuration of a processing apparatus according to a second embodiment. FIG. 4 is a schematic plan view (A) showing a first state in which the stirring bar rotates with respect to the basket, and a schematic plan view (B) showing a second state in which the stirring bar rotates with respect to the basket. FIG. 5 is a schematic cross-sectional view showing in detail a configuration of a handle fixing portion and a top plate in a region VI surrounded by a round dotted line in FIG. 4. FIG. 6 is a schematic cross-sectional view illustrating a configuration of a processing apparatus according to a third embodiment. It is the schematic plan view (A) which shows the 1st state in which a 1st cylinder presses an inner tank, and the schematic plan view (B) which shows the 2nd state in which a 2nd cylinder presses an inner tank.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
(Embodiment 1)
First, the structure of an etching apparatus as a processing apparatus of this embodiment will be described with reference to FIG. Referring to FIG. 1, etching apparatus 10 of the present embodiment mainly has an outer tub 1, an inner tub 2, and a motor 3 as a rotation mechanism.

  The outer tub 1 is a main body portion of the etching apparatus 10 that houses the inner tub 2 so as to surround it from the outside. The outer tub 1 has a rectangular parallelepiped shape that can accommodate the inner tub 2 or a cylindrical shape (having a circular shape in a plan view extending in the vertical direction in FIG. 1).

  The inner tub 2 has a shape and size that can be accommodated in the outer tub 1, for example, a cylindrical shape (having a circular shape in a plan view extending in the vertical direction in FIG. 1). The inner tank 2 is preferably made of, for example, polytetrafluoroethylene (PTFE). An inner tank blade part (blade part) 2b is attached to the inner wall surface of the inner tank side surface 2a as the inner wall surface extending in the vertical direction in FIG.

  The inner tub blade portion 2b is preferably formed of a resin material such as PFA that is not corroded by an etching solution described later, and preferably has a flat plate shape, for example. For example, as shown in FIG. 1, a pair of inner tank blade portions 2 b are arranged at positions facing each other with respect to the central axis l of the inner tank 2 (positions 180 ° relative to the outer periphery in plan view of the inner tank 2). May be. Further, for example, as shown in FIG. 1, a plurality (two in FIG. 1) of the inner tub blade portions 2 b may be arranged so as to be spaced apart from each other with respect to the vertical direction of the inner tub blade portion 2 b. However, the present invention is not limited to this mode. For example, only one or three or more inner tank blades 2b may be arranged in the vertical direction of the inner tank 2, and the inner tank 2 may be arranged in the direction perpendicular to the paper surface of FIG. The inner tank blade portion 2b may be disposed on the inner wall surface of the tank side surface 2a.

  The inner tank blade portion 2b has a dimension in the horizontal direction of the figure of 6.6% or more and 10% or less of the dimension in the horizontal direction of the figure (in the region filled with the etching solution 4) in the inner tank 2. preferable. For example, when the inside (filled with the etching solution 4) of the inner tank 2 is a circle having a diameter of 30 cm in plan view, the dimension in the left-right direction of the inner tank blade portion 2b is preferably 2 cm or more and 3 cm or less. In this way, the inner tank blade part 2b can stir the etching solution 4 with high efficiency without interfering with the basket 5, the handle part 8 and the like in the inner tank 2.

  The motor 3 has a motor main body 3a and a motor rotating shaft 3b, and is provided outside the inner tank 2, specifically, for example, outside the inner tank bottom surface 2c (the lower surface in FIG. 1) of the inner tank 2. It is attached. The motor 3 makes it possible to rotate (spin) the inner tub 2 around the central axis l extending in the longitudinal direction of the inner tub 2 (vertical direction in FIG. 1).

  The inner tank 2 is filled with an etching solution 4 as a processing solution. Etching solution 4 is preferably a generally known chemical solution capable of etching, for example, an aluminum thin film formed on the surface of a semiconductor wafer.

  A basket 5 is installed inside the inner tank 2 so as to be immersed in the etching solution 4. The basket 5 is preferably formed of a resin material that does not corrode by the etching solution 4 such as PFA. The basket 5 is a jig (sample stage) having, for example, a columnar shape for setting the substrate 6 such as a semiconductor wafer as a processing target. The basket 5 has a shape capable of setting a plurality of substrates 6 at intervals so as not to contact each other.

  A basket fixing base 7 as a fixing base for fixing the basket 5 is installed on the inner bottom face (inner tank bottom face 2 c) of the inner tank 2. The basket fixing base 7 is preferably formed of a resin material that is not corroded by the etching solution 4 such as vinyl chloride or PFA.

  Referring to FIGS. 1 and 2, basket fixing base 7 has a fixing base body 7a that is circular in plan view, for example, although not shown. A fixed base lower groove 7b is formed on the lower surface (the side facing the inner tank bottom surface 2c) of the basket fixed base body 7a. The fixed base lower groove portion 7b is a groove portion having a shape into which the inner tank protrusion 2d extending from the inner tank bottom surface 2c of the inner tank 2 can be fitted. The inner tank protrusion 2d is a protrusion that is fixed to the inner tank bottom surface 2c in the inner tank 2 and extends from the inner tank bottom surface 2c toward the upper side of the figure (inside the inner tank 2). On the other hand, the fixed base lower groove 7b is formed so as to face the lower side of the figure. The basket fixing base 7 is fixed so as to be restrained by the inner tank 2 by fitting the inner tank protrusion 2 d extending upward into the fixing base lower groove 7 b facing downward.

  When both the inner tub 2 and the basket fixing base 7 have a circular planar shape, a fixing base upper groove portion 7c is formed on the upper surface of the basket fixing base 7 (the surface on the side where the basket 5 is set). ing. The fixed base upper groove 7c is a groove having a shape into which a basket protrusion 5a, which is a protrusion formed on the lower side of the basket 5, can be fitted. The basket protrusion 5a is a part of the basket 5, and is a protrusion that is fixed to the bottom of the basket 5 and extends from the basket 5 toward the lower side of the figure. On the other hand, the fixed base upper groove portion 7c is formed so as to face the upper side of the drawing. The basket 5 is fixed to the basket fixing base 7 by fitting the downwardly extending basket protrusion 5 a into the fixing base upper groove 7 c facing upward. As a result, the basket 5 can be firmly fixed.

  As described above, the lower side of the basket 5 is fixed by the fixing base upper groove portion 7c of the basket fixing base 7 (so as to be stationary with respect to the basket fixing base 7). It is fixed (to be stationary) by the fixing portion 9. The handle portion 8 and the handle fixing portion 9 are preferably formed of a resin material such as PFA that does not corrode with the etching solution 4.

  The handle portion 8 holds the upper portion of the basket 5. Although not shown, the handle fixing portion 9 is connected so as to be fixed to an arbitrary portion outside the etching apparatus 10, and the handle fixing portion 9 holds the handle portion 8. Therefore, the handle portion 8 is fixed to the handle fixing portion 9. Therefore, the basket 5 that is omitted from the handle portion 8 is fixed to the handle fixing portion 9.

  In the etching apparatus 10 having the above configuration, as shown in FIG. 1, the substrate 5 to be processed is set in the basket 5, and the basket 5 is placed inside the inner tank 2 filled with the etching solution 4. Set. The basket 5 is fixed from below by a basket fixing base 7 and fixed from above by a handle portion 8 and a handle fixing portion 9.

  In this state, the motor 3 is driven to rotate the inner tank 2 around the central axis l, whereby the etching solution 4 in the inner tank 2 is stirred while rotating around the central axis l. Specifically, referring to FIG. 1 and FIGS. 3A and 3B, for example, in the initial state, the points A, B, C, and D of the inner tank 2 are at the positions shown in FIG. 1 and FIG. Assume that FIG. 3B illustrates a state in which the inner tub 2 is rotated by 180 ° around the central axis 1 from the initial state. If the inner tank 2 further rotates 180 ° around the central axis l, the state returns to the state shown in FIG. In addition, it is preferable that the period (time required for one rotation) of the rotation motion of the inner tank 2 is 3 seconds or more and 4 seconds or less.

  However, the basket 5 does not rotate following the rotation of the inner tub 2, and the points E and F in both the state shown in FIGS. 1 and 3A and the state shown in FIG. It is stationary so that it has the same phase. Similarly, the handle 8 is stationary so that the points G and H have the same phase in both the state shown in FIGS. 1 and 3A and the state shown in FIG. 3B.

  Thus, even if the inner tank 2 rotates, the basket 5 in the inner tank 2 does not rotate. For example, the fixed base lower groove 7b shown in FIG. 2 (in which the inner tank protrusion 2d is fitted) is annular ( More preferably, it can be realized by forming a rail having a planar shape. Similarly, the inner tank protrusion 2d may be formed in an annular rail shape. If the inner tub 2 rotates in this configuration, the inner tub protrusion 2d can slide while rotating in the fixed base lower groove 7b while keeping the state of being fitted in the fixed base lower groove 7b. It becomes. That is, the basket fixing base 7 is not completely fixed to the inner tank 2, and is not completely released from the inner tank 2 as a separate body from the inner tank 2. ) Can be fixed (supported to be restrained) so as to be rotatable.

  In the fixed base lower groove portion 7b, the inner tub 2 is supported so as to be rotatable with respect to the fixed base lower groove portion 7b, while in the fixed base upper groove portion 7c, the basket 5 is fixed so as to be stationary. Is done.

Next, the effect of this Embodiment is demonstrated.
According to the present embodiment, the etching solution 4 in the inner tank 2 can be stirred by rotating the inner tank 2. Therefore, the etching solution 4 can be uniformly supplied to the surface of the thin film formed on the substrate 6 (processing object) in the inner tank 2. Therefore, the thin film can be etched uniformly.

  In the present embodiment, the etching solution 4 can be stirred only by rotating the inner tub 2, so that for example, the basket 5 on which the substrate 6 is set need not be swung vertically and horizontally in the inner tub 2. Since the basket 5 is not rotated and is fixed (to a stationary system) by the basket fixing base 7, the handle portion 8, and the handle fixing portion 9, the handle portion 8 is twisted by swinging the basket 5 up and down and left and right. Thus, it is possible to suppress the occurrence of a problem such that the basket 5 is dropped from the gripping force of the handle portion 8 or the like and the substrate 6 set in the basket 5 is damaged.

  In the present embodiment, since the motor 3 is installed outside the inner tank 2, the driving mechanism of the motor 3 is not in contact with the etching solution 4, such as being immersed in the etching solution 4. For this reason, the possibility that the motor 3 is damaged due to the etching solution 4 can be reduced.

  In this embodiment, since the inner tank blade part 2b is installed on the inner wall surface (inner tank side surface 2a) of the inner tank 2, the etching solution 4 can be stirred more efficiently by the action of the inner tank blade part 2b. it can. Moreover, the inner tank blade part 2b is only connected to the side surface 2a of the rotating inner tank 2, and it is not necessary to separately install a driving mechanism such as a motor in order to rotate the inner tank blade part 2b. For this reason, the facility can be further simplified, and the cost of the facility can be reduced.

  The etching solution 4 is stored in the inner tank 2 without being circulated between the inside and the outside of the inner tank 2, for example. Since the etching liquid 4 in the inner tank 2 can be stirred with high efficiency only by rotating the inner tank 2, for example, when a circulation mechanism for swinging the etching liquid 4 in the inner tank 2 is installed. Compared with this, the facility can be greatly simplified, and the cost of the facility can be reduced.

(Embodiment 2)
First, the structure of an etching apparatus as a processing apparatus of this embodiment will be described with reference to FIG. Referring to FIG. 4, the etching apparatus 20 of the present embodiment includes an inner tank 2, a stirring bar 12 for stirring the etching solution 4 inside the inner tank 2, and a rotating mechanism that rotates the stirring bar 12. The motor 3 is mainly included.

  The stirring rod 12 has a stirring rod shaft portion 12a as a main body, and a stirring rod blade portion 12b attached to the tip of the stirring rod shaft portion 12a. The stirring rod blade portion 12b is attached to the lower side (the inner tank bottom surface 2c side) of the stirring rod shaft portion 12a. The stirring rod shaft portion 12a and the stirring rod blade portion 12b are preferably formed of a resin material that is not corroded by the etching solution 4, such as PFA, and preferably has a flat plate shape, for example.

  At least one stirring rod 12 is disposed so as to extend in the vertical direction of the inner tank 2 (vertical direction in FIG. 4). In FIG. 4, a total of two stirring rods 12 are arranged one by one on the left and right sides of the inner tub 2, but the present invention is not limited to this. For example, in addition to the position shown in FIG. 4, the depth of the paper not shown in FIG. Also in the direction, for example, a pair of stirring rods 12 may be arranged at positions facing each other with respect to the central axis l of the inner tank 2 (positions 180 ° relative to the outer periphery in plan view of the inner tank 2).

  The blade portion 12b of the stirring rod 12 has a dimension in the horizontal direction in the figure of 7.5% to 10% of the dimension in the horizontal direction of the figure in the inner tank 2 (in the region filled with the etching solution 4). It is preferable. For example, when the inside of the inner tank 2 (filled with the etching solution 4) is a circle having a diameter of 40 cm in plan view, the dimension in the horizontal direction of the stirring rod blade 12b is preferably 3 cm or more and 4 cm or less.

  The upper end (in FIG. 4) of the stirring rod 12 is fixed by a top plate 13. Although the top plate 13 is not illustrated, it has a circular plane shape (for example (similar to a circular shape in plan view of the inner tank 2)). The top plate 13 is disposed at a position where its center substantially overlaps the central axis l of the inner tub 2. A stirring bar 12 is attached to the lower surface of the top plate 13 in the vicinity of the edge in a plan view, and the central portion of the lower surface of the top plate 13 (near the central axis l of the inner tank 2). A handle fixing portion 9 is attached. The handle fixing portion 9 fixes the handle portion 8 as in the first embodiment, and the handle portion 8 holds and holds the basket 5 in the same manner as in the first embodiment. The lower side of the basket 5 is fixed to the basket fixing base 7 as in the first embodiment, and the basket 5 is immersed in the etching solution 4 inside the inner tank 2.

  The motor 3 is attached to the top plate 13, and the motor 3 has a motor main body 3a and a motor rotating shaft 3b as in the first embodiment. The motor 3 is installed outside the inner tank 2. The motor 3 rotates the top plate 13 to rotate the stirring rod 12 attached to the top plate 13 inside the inner tank 2. That is, the stirring rod 12 rotates (revolves) around the central axis l of the inner tank 2 so as to move in an annular manner in the inner tank 2. Since the stirring rod 12 (particularly the stirring rod blade portion 12b) is immersed in the etching solution 4 in the inner tank 2, the etching solution 4 is stirred if the stirring rod 12 rotates and moves in a ring shape in plan view. .

  Specifically, referring to FIG. 4 and FIG. 5, the stirring bar 12 fixed to the lower surface of the top plate 13 rotates around the central axis l in the inner tank 2 by the rotation of the top plate 13. To do. It is preferable that the stirring rod 12 rotates at a speed of one rotation, for example, in a period of 3 seconds to 4 seconds. For this reason, for example, it is assumed that the initial state is a state in which the points I and J of the stirring bar 12 are arranged at the positions shown in FIGS. 4 and 5A, and the stirring bar 12 moves around the central axis l from the initial state. It is assumed that the state rotated 180 ° is shown in FIG. If the top plate 13 (stirring bar 12) is further rotated by 180 ° around the central axis l, the state shown in FIGS. 5A and 4 is restored.

  However, the inner tub 2, the basket 5 and the handle portion 8 do not rotate following the rotation of the top plate 13, and the state shown in FIGS. 4 and 5A and the state shown in FIG. Are stationary so that the points A to H have the same phase.

  As shown in FIG. 6, the handle fixing portion 9 (which fixes the basket 5 and the handle portion 8) is fixed to a stationary system. A through hole 13a that penetrates from one surface of the top plate 13 to the other surface facing the top plate 13 is formed at the center of the top plate 13, and the handle fixing portion 9 (extends in the vertical direction in FIG. 6). The shaft portion passes through the through hole 13a. The shaft portion of the handle fixing portion 9 is not in contact with the through hole 13a. For this reason, the handle fixing portion 9 (including the basket 5 and the handle portion 8) remains stationary without following the rotation of the top plate 13. The configuration of the handle fixing portion 9 and the top plate 13 in FIG. 4 is actually the configuration shown in FIG. 6, so that the handle portion 8 and the like can be kept stationary without following the rotation of the top plate 13. Become.

  Further, in the present embodiment, the inner tub 2 does not rotate like the basket 5, and the point A of the inner tub 2 in both the state shown in FIG. 5 (A) and the state shown in FIG. 5 (B). , B, C, D are stationary so that they have the same phase.

  In FIG. 4, the outer tank 1 is not shown, but the outer tank 1 may also be installed in the etching apparatus 20 of the present embodiment.

Next, the effect of this Embodiment is demonstrated.
Also according to the present embodiment, the etching solution 4 can be stirred by the rotation of the stirring rod 12, so that the thin film formed on the substrate 6 (processing object) in the inner tank 2 is the same as in the first embodiment. The etching solution 4 can be uniformly supplied to the surface. Therefore, the thin film can be etched uniformly.

  In the present embodiment, the etching solution 4 can be stirred only by rotating the stirring rod 12, so that it is not necessary to swing the basket 5 on which the substrate 6 is set up, down, left and right in the inner tank 2. Since the basket 5 is not rotated and is fixed (to a stationary system) by the basket fixing base 7, the handle portion 8, and the handle fixing portion 9, the handle portion 8 is twisted by swinging the basket 5 up and down and left and right. Thus, it is possible to suppress the occurrence of a problem such that the basket 5 is dropped from the gripping force of the handle portion 8 or the like and the substrate 6 set in the basket 5 is damaged.

  It is to be noted that the stirring rod 12 is stirred (rotated) so as to move in an annular manner as in the present embodiment, rather than being rotated (rotated) without moving at the position of the central axis l, for example. Can be further enhanced. Therefore, the etching solution 4 can be supplied more uniformly to the surface of the substrate 6, and for example, variations in the etching state among a plurality of substrates 6 processed simultaneously can be reduced.

  Also in the present embodiment, the motor 3 is installed outside the inner tank 2 as in the first embodiment. For this reason, the drive mechanism of the motor 3 is not in contact with the etching solution 4 such as being immersed in the etching solution 4. For this reason, the possibility that the motor 3 is damaged due to the etching solution 4 can be reduced.

  The second embodiment of the present invention is different from the first embodiment of the present invention only in each point described above. That is, the configuration, conditions, procedures, effects, and the like not described above for the second embodiment of the present invention are all the same as those of the first embodiment of the present invention.

(Embodiment 3)
First, the structure of an etching apparatus as a processing apparatus of this embodiment will be described with reference to FIG. Referring to FIG. 7, etching apparatus 30 according to the present embodiment includes an outer tank 1, an inner tank 2, and an air as a swinging mechanism that is connected to inner tank 2 and that allows inner tank 2 to swing. It mainly has a cylinder 22 and a sequencer 23 for driving the air cylinder 22.

  The air cylinder 22 is disposed outside the inner tub 2 and has a first air cylinder 22a and a second air cylinder 22b that form a pair. The first air cylinder 22a is on one side of the inner tank 2 in FIG. 7, for example, on the left side, and the second air cylinder 22b is on the other direction side facing the one direction side of the inner tank 2 in FIG. For example, they are arranged on the right side.

  The first air cylinder 22 a is in contact with the inner tank side surface 2 a on the left side of the inner tank 2 from the outside, and the second air cylinder 22 b is in contact with the inner tank side surface 2 a on the right side of the inner tank 2 from the outside. That is, the inner tank 2 is held so as to be sandwiched between the first air cylinder 22a and the second air cylinder 22b on the outer wall surface of the inner tank side surface 2a. The bottom face (outer tank bottom face 1a) of the outer tank 1 and the inner tank bottom face 2c do not contact each other, and a gap g1 is provided between them. For this reason, even if the inner tank 2 swings in the horizontal direction, it is possible to suppress the abrasion or damage of the outer tank bottom surface 1a and the inner tank bottom surface 2c.

  The first air cylinder 22a and the second air cylinder 22b alternately press the inner tank side surface 2a, so that the inner tank 2 sandwiched between them is moved in one direction and the other direction, that is, left and right in FIG. Swing alternately in the direction.

Specifically, referring to FIG. 8A, for example, first, at a first time t ₁ , when air is sent from a not-shown air pump, for example, to the first air cylinder 22a, the first air cylinder 22a is The inner tank 2 (inner tank side surface 2a) is pressed from one direction side to the other direction side, that is, from the left side to the right side in FIG. 7 (force F1 is applied in the direction of the arrow in FIG. 8A). . Thereby, the inner tank 2 moves to the right side of the figure.

Next, referring to FIG. 8B, at a second time t ₂ when a little time has elapsed from the first time t ₁ , air is sent from the air pump (not shown) to the second air cylinder 22b. The second air cylinder 22b presses the inner tank 2 (inner tank side surface 2a) from the other direction side to one direction side, that is, from the right side to the left side in FIG. 7 (the direction of the arrow in FIG. 8B). Force F2 is applied). Thereby, the inner tank 2 moves to the left side of the figure. For this reason, the positions of the points A and B of the inner tank 2 are moved to the left side of FIG.

With reference to FIG. 8 (A) again, the third time t ₃ when the same time further as t ₂ -t ₁ from the second time t ₂ has elapsed, the first in the same manner as the first time t ₁ The air cylinder 22a presses the inner tank 2 (inner tank side face 2a) from one direction side to the other direction side, that is, from the left side to the right side in FIG. Thereafter, the same operation (FIGS. 8A and 8B) as described above is repeated alternately, so that the inner tub 2 reciprocates in the horizontal direction (left-right direction in FIG. 7).

  The amplitude L1 (FIG. 8B) of the reciprocating motion of the inner tank 2 is preferably 7.5% or more and 10% or less of the dimension in the horizontal direction of the figure. When the diameter in an internal plan view is 40 cm, the amplitude L1 is preferably 3 cm or more and 4 cm or less. Further, it is preferable that the reciprocating motion of the inner tub 2 is repeated so that the period of reciprocating motion (time required for one reciprocating motion) is 3 seconds or more and 4 seconds or less.

  The first air cylinder 22 a and the second air cylinder 22 b are connected to the sequencer 23. The sequencer 23 is connected to the air cylinder 22 in order to send air alternately into the first air cylinder 22a and the second air cylinder 22b at a constant time interval.

The etching solution 4 in the inner tank 2 is stirred by the reciprocating motion of the inner tank 2 described above.
On the other hand, the basket 5 inside the inner tub 2 does not reciprocate following the reciprocating movement of the inner tub 2, and both the state shown in FIG. 8A and the state shown in FIG. At point E and F are stationary so that they are at the same position. Similarly, the handle portion 8 is stationary so that the points G and H are at the same position in both the state shown in FIG. 8A and the state shown in FIG. 8B.

  As described above, even if the inner tub 2 reciprocates, the basket 5 in the inner tub 2 does not reciprocate. For example, the fixed base lower groove 7b into which the inner tub protrusion 2d shown in FIG. This is realized by forming a rail having a linear planar shape arranged in parallel with an interval of. Two inner tank protrusions 2d may also be formed in a straight line arranged in parallel. If the inner tub 2 reciprocates in the left-right direction in FIG. 7 in this configuration, the inner tub protrusion 2d is moved in the left-right direction within the fixed base lower groove 7b while being fitted in the fixed base lower groove 7b. It is possible to slide to reciprocate. That is, as in the first embodiment, the basket fixing base 7 is not completely fixed to the inner tank 2, nor is it completely released from the inner tank 2 as a separate body from the inner tank 2. Can be fixed (supported so as to be constrained) with respect to the basket 5 (basket fixing base 7) so as to reciprocate.

  On the other hand, also in this embodiment, the lower side of the basket 5 is fixed to the basket fixing base 7 (so as to be stationary) by inserting the basket protrusion 5a into the fixing base upper groove 7c. Since the upper side of the basket 5 is fixed by the handle portion 8 and the handle fixing portion 9, the basket 5 is fixed so as to be stationary.

  From the above, in FIG. 8, the basket 5 and the handle portion 8 are illustrated as an annular plane shape (similar to the first embodiment), but the basket 5 (basket fixing base 7) and the handle portion of the present embodiment. For example, 8 may have a rectangular planar shape (that is, a rectangular parallelepiped shape).

  As shown in FIG. 7, the substrate 6 is set so that the main surface thereof faces the depth direction in the figure, and therefore the inner tank 2 reciprocates in the left-right direction in the figure. Thus, it is preferable that the direction in which the main surface of the substrate 6 faces and the moving direction of the inner tank 2 intersect each other. In this way, the stirred etching solution 4 can be supplied uniformly over the main surfaces of all the substrates 6.

Next, the effect of this Embodiment is demonstrated.
According to the present embodiment, the etching solution 4 in the inner tank 2 can be agitated by reciprocating the inner tank 2 with the air cylinder 22. Therefore, the etching solution 4 can be uniformly supplied to the surface of the thin film formed on the substrate 6 (processing object) in the inner tank 2. Therefore, the thin film can be etched uniformly.

  In this embodiment, since the etching solution 4 can be stirred only by reciprocating the inner tub 2, it is not necessary to swing the basket 5 on which the substrate 6 is set in the inner tub 2 vertically and horizontally. . Since the basket 5 does not reciprocate and is fixed (to a stationary system) by the basket fixing base 7, the handle portion 8, and the handle fixing portion 9, the handle portion 8 is moved by swinging the basket 5 up and down and left and right. It is possible to suppress the occurrence of a problem such that the basket 5 is twisted and falls off the gripping force of the handle portion 8 and the like, and the substrate 6 set in the basket 5 is damaged.

  Further, since the inner tank 2 is reciprocated, for example, the inner tank 2 moves only in one direction with respect to the horizontal direction and the etching solution 4 flows only in one direction. Etching uniformity can be improved.

  In the present embodiment, since the air cylinder 22 is installed outside the inner tank 2, the drive mechanism of the air cylinder 22 is not in contact with the etching solution 4, such as being immersed in the etching solution 4. Therefore, the possibility that the air cylinder 22 is damaged due to the etching solution 4 can be reduced.

  The third embodiment of the present invention differs from the first and second embodiments of the present invention only in the points described above. That is, the configuration, conditions, procedures, effects, and the like not described above for the third embodiment of the present invention are all the same as those of the first and second embodiments of the present invention. Moreover, you may combine the component of each above embodiment suitably.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

  DESCRIPTION OF SYMBOLS 1 Outer tank, 1a Outer tank bottom surface, 2 Inner tank, 2a Inner tank side surface, 2b Inner tank blade | wing part, 2c Inner tank bottom face, 2d Inner tank protrusion part, 3 Motor, 3a Motor main body, 3b Motor rotating shaft, 4 Etching liquid 5 basket, 5a basket protrusion, 6 substrate, 7 basket fixing base, 7a fixing base body, 7b fixing base lower groove, 7c fixing base upper groove, 8 handle part, 9 handle fixing part, 10, 20, 30 Etching device, 12 stirring rod, 12a stirring rod shaft, 12b stirring rod blade, 13 top plate, 13a through hole, 22 air cylinder, 22a first air cylinder, 22b second air cylinder, 23 sequencer.

Claims (11)

An inner tank capable of filling the processing liquid inside,
A processing apparatus comprising: a rotation mechanism that enables the processing liquid to be stirred by rotating the inner tank.   The processing apparatus according to claim 1, wherein the rotation mechanism is installed outside the inner tank.   The processing apparatus of Claim 1 or 2 provided with a blade | wing part in the inner wall face of the said inner tank. An inner tank capable of filling the processing liquid inside,
A stir bar for immersing the treatment liquid inside the inner tank and stirring the treatment liquid;
A processing apparatus, comprising: a rotation mechanism that enables the processing liquid to be stirred by the stirring bar moving in an annular manner in the inner tank.   The processing apparatus according to claim 4, wherein the rotation mechanism is installed outside the inner tank. An inner tank capable of filling the processing liquid inside,
A processing apparatus comprising: a swing mechanism connected to the inner tank and configured to swing the inner tank.   The processing apparatus according to claim 6, wherein the swing mechanism is installed outside the inner tank. The swing mechanism includes a first swing mechanism disposed on one side of the inner tank and a second swing disposed on the other direction opposite to the one direction of the inner tank. Moving mechanism,
The first swing mechanism presses the inner tub so as to move to the other direction side,
The processing apparatus according to claim 6 or 7, wherein the second swing mechanism presses the inner tank so as to move to the one direction side. A fixing base for fixing a jig for setting a processing object to be processed by the processing liquid is installed on the inner bottom surface of the inner tank,
The processing apparatus according to claim 1, wherein the fixing base has a groove portion that allows the jig to be fixed by fitting a part of the jig into the fixing base.   The processing apparatus according to claim 1, wherein the jig is fixed by a handle portion.   The processing apparatus according to claim 1, wherein the processing liquid is stored in the inner tank.

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