JP2014218056A - Laminate for flexible device - Google Patents
Laminate for flexible device Download PDFInfo
- Publication number
- JP2014218056A JP2014218056A JP2013100282A JP2013100282A JP2014218056A JP 2014218056 A JP2014218056 A JP 2014218056A JP 2013100282 A JP2013100282 A JP 2013100282A JP 2013100282 A JP2013100282 A JP 2013100282A JP 2014218056 A JP2014218056 A JP 2014218056A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide
- laminate
- glass substrate
- polyimide film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 claims abstract description 116
- 239000004642 Polyimide Substances 0.000 claims abstract description 58
- 239000000758 substrate Substances 0.000 claims abstract description 57
- 239000011521 glass Substances 0.000 claims abstract description 55
- 239000000853 adhesive Substances 0.000 claims abstract description 10
- 230000001070 adhesive effect Effects 0.000 claims abstract description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000002243 precursor Substances 0.000 description 44
- 239000010410 layer Substances 0.000 description 21
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 15
- 239000002904 solvent Substances 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 229920001187 thermosetting polymer Polymers 0.000 description 10
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000009719 polyimide resin Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 4
- -1 for example Substances 0.000 description 4
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 235000021355 Stearic acid Nutrition 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 3
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000008117 stearic acid Substances 0.000 description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- ORTVZLZNOYNASJ-UPHRSURJSA-N (z)-but-2-ene-1,4-diol Chemical compound OC\C=C/CO ORTVZLZNOYNASJ-UPHRSURJSA-N 0.000 description 1
- OFXSBTTVJAFNSJ-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7-tetradecafluoro-n,n'-diphenylheptane-1,7-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 OFXSBTTVJAFNSJ-UHFFFAOYSA-N 0.000 description 1
- VITYLMJSEZETGU-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5-decafluoro-n,n'-diphenylpentane-1,5-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 VITYLMJSEZETGU-UHFFFAOYSA-N 0.000 description 1
- JLTHXLWCVUJTFW-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octafluoro-n,n'-diphenylbutane-1,4-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 JLTHXLWCVUJTFW-UHFFFAOYSA-N 0.000 description 1
- UMMYYBOQOTWQTD-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoro-n,n'-diphenylpropane-1,3-diamine Chemical compound C=1C=CC=CC=1NC(F)(F)C(F)(F)C(F)(F)NC1=CC=CC=C1 UMMYYBOQOTWQTD-UHFFFAOYSA-N 0.000 description 1
- ZWVMLYRJXORSEP-UHFFFAOYSA-N 1,2,6-Hexanetriol Chemical compound OCCCCC(O)CO ZWVMLYRJXORSEP-UHFFFAOYSA-N 0.000 description 1
- LRMDXTVKVHKWEK-UHFFFAOYSA-N 1,2-diaminoanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C(N)C(N)=CC=C3C(=O)C2=C1 LRMDXTVKVHKWEK-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- WOOLAEUATDXVIQ-UHFFFAOYSA-N 1-[2-(methoxymethoxy)ethoxy]ethanol Chemical compound COCOCCOC(C)O WOOLAEUATDXVIQ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- YDYSEBSNAKCEQU-UHFFFAOYSA-N 2,3-diamino-n-phenylbenzamide Chemical compound NC1=CC=CC(C(=O)NC=2C=CC=CC=2)=C1N YDYSEBSNAKCEQU-UHFFFAOYSA-N 0.000 description 1
- KKTUQAYCCLMNOA-UHFFFAOYSA-N 2,3-diaminobenzoic acid Chemical compound NC1=CC=CC(C(O)=O)=C1N KKTUQAYCCLMNOA-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- STMZGJLCKJFMLQ-NXEZZACHSA-N 2-[(1s,3s)-3-(2-aminoethyl)cyclohexyl]ethanamine Chemical compound NCC[C@H]1CCC[C@H](CCN)C1 STMZGJLCKJFMLQ-NXEZZACHSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- STMZGJLCKJFMLQ-UHFFFAOYSA-N 2-[3-(2-aminoethyl)cyclohexyl]ethanamine Chemical compound NCCC1CCCC(CCN)C1 STMZGJLCKJFMLQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
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- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
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- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
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- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
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- 230000005674 electromagnetic induction Effects 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- NOUUUQMKVOUUNR-UHFFFAOYSA-N n,n'-diphenylethane-1,2-diamine Chemical compound C=1C=CC=CC=1NCCNC1=CC=CC=C1 NOUUUQMKVOUUNR-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- DSCIZKMHZPGBNI-UHFFFAOYSA-N naphthalene-1,3,5,8-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C2=CC(C(=O)O)=CC(C(O)=O)=C21 DSCIZKMHZPGBNI-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- DYFXGORUJGZJCA-UHFFFAOYSA-N phenylmethanediamine Chemical compound NC(N)C1=CC=CC=C1 DYFXGORUJGZJCA-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/02—Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments
- B32B17/04—Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments bonded with or embedded in a plastic substance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/34—Layered products comprising a layer of synthetic resin comprising polyamides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Landscapes
- Laminated Bodies (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
Abstract
Description
本発明は、優れた耐熱性と寸法安定性を有するポリイミド系フィルムとガラス基板との積層体に関するものであり、この積層体のポリイミドフィルム表面に、電子素子を形成しフレキシブルデバイスを製造する際に有用である。 The present invention relates to a laminate of a polyimide film having excellent heat resistance and dimensional stability and a glass substrate. When a flexible device is produced by forming an electronic element on the polyimide film surface of the laminate. Useful.
従来、液晶ディスプレイ(LCD)、プラズマディスプレイパネル(PDP)、有機ELディスプレイ(OLED)等のフラットパネルディスプレイ(FPD)や、電子ペーパー、などの電子デバイスの分野では、主としてガラス基板上に電子素子を形成したものが用いられているが、ガラス基板は剛直であり、しなやかさに欠けるため、フレキシブルになりにくいという問題がある。 Conventionally, in the field of electronic devices such as flat panel displays (FPD) such as liquid crystal displays (LCD), plasma display panels (PDP), organic EL displays (OLED), and electronic paper, electronic elements are mainly provided on glass substrates. Although the formed one is used, there is a problem that the glass substrate is rigid and lacks flexibility so that it is difficult to be flexible.
そこで、フレキシブル性を有しかつ耐熱性を有するポリイミド等の有機高分子材料を基板として用いる方法が提案されている。 Therefore, a method has been proposed in which an organic polymer material such as polyimide having flexibility and heat resistance is used as a substrate.
特許文献1〜3には、特定の化学構造を有するポリイミドフィルムを、キャリアとして使用するガラス基板上に積層し、このポリイミドフィルムを電子素子形成のための基板として利用することが提案されている。ここで用いられるガラス基板は、金属基板などと異なり、光透過性に優れるので、電子素子形成する際の検査工程が容易となる上、既存のガラス基板上に電子素子を形成するフレキシブルデバイス生産用の設備がそのまま転用できるという利点を有する。 Patent Documents 1 to 3 propose that a polyimide film having a specific chemical structure is laminated on a glass substrate used as a carrier, and this polyimide film is used as a substrate for forming an electronic element. The glass substrate used here is different from a metal substrate etc. in that it has excellent light transmittance, so that the inspection process when forming an electronic element is facilitated, and for producing a flexible device that forms an electronic element on an existing glass substrate. This equipment has the advantage that it can be diverted as it is.
このようなポリイミドが積層されたガラス基板においては、ガラス基板をキャリア用の基板として利用するので、ポリイミドフィルムの表面に電子素子を形成後、最後にポリイミドフィルムをガラス基板から剥離する必要があるが、ポリイミドフィルムとガラス基板が比較的強固に密着しているために、剥離が容易ではなく、これを工業的に行うためには、例えば、水等に浸漬することや、ガラス基板上に非晶質シリコン層を設けレーザー光を照射することによって剥離しなければならず、剥離性の改善が求められていた。 In such a glass substrate laminated with polyimide, since the glass substrate is used as a carrier substrate, it is necessary to finally peel off the polyimide film from the glass substrate after forming an electronic element on the surface of the polyimide film. Since the polyimide film and the glass substrate are relatively firmly adhered to each other, peeling is not easy. To industrially do this, for example, it is immersed in water or amorphous on the glass substrate. A high quality silicon layer must be provided and peeled off by irradiating a laser beam, and improvement in peelability has been demanded.
かかる剥離性を向上させるため、特許文献4には、ポリイミドフィルム層とガラス基板の間にパターン化された接着層(これが剥離層となる)を別途設ける方法が提案されている。 In order to improve such peelability, Patent Document 4 proposes a method of separately providing a patterned adhesive layer (this becomes a peelable layer) between the polyimide film layer and the glass substrate.
しかしながら、前記方法では、剥離性の改善は充分なものではなかった。また、前記方法に作成された積層体では、剥離後のポリイミドフィルムがカールしやすい傾向にあり、この点でも改良すべき点があった。 However, the above method has not improved the peelability sufficiently. Moreover, in the laminate produced by the above method, the polyimide film after peeling tends to curl, and there is a point to be improved in this respect as well.
そこで、本発明は前記課題を解決するものであって、かつ良好な剥離性と、ガラス基板から剥離して、フレキシブルデバイスとした時にカールしにくいポリイミドフィルムとなる積層体の提供を目的とする。 Then, this invention solves the said subject, and it aims at provision of the laminated body used as the polyimide film which is easy to curl when it peels from a glass substrate and makes it a flexible device.
本発明者らは、前記課題を解決するために鋭意研究した結果、前記積層体にておいて、ガラス基板とポリイミド系フィルム層からなる積層体の構成を特定のものとすることにより前記課題が解決されることを見出し、本発明の完成に至った。
即ち、本発明は下記を趣旨とするものである。
1) ガラス基板とポリイミド系フィルムとの積層体であって、ガラス基板とポリイミド系フィルムとの層間の接着強度が7N/cm以下であることを特徴とするフレキシブルデバイス用積層体。
2) ガラス基板から剥離したポリイミド系フィルムの曲率半径が30mm以上であることを特徴とする前記フレキシブルデバイス用積層体。
3) ポリイミド系フィルムが2層以上の多層構造であることを特徴とする前記フレキシブルデバイス用積層体。
4) ガラス基板に接するポリイミド系フィルム層に離型剤が配合されていることを特徴とする前記フレキシブルデバイス用積層体。
5) 前記多層構造を形成するポリイミド系フィルムが、それぞれの残留歪を打ち消すように配置されていることを特徴とするフレキシブルデバイス用積層体。
As a result of earnest research to solve the above problems, the present inventors have found that the above problems can be solved by specifying a specific structure of a laminate composed of a glass substrate and a polyimide film layer in the laminate. As a result, the present invention has been completed.
That is, the present invention has the following purpose.
1) A laminate for a flexible device, which is a laminate of a glass substrate and a polyimide film, and has an interlayer adhesive strength of 7 N / cm or less between the glass substrate and the polyimide film.
2) The said flexible device laminated body characterized by the curvature radius of the polyimide-type film peeled from the glass substrate being 30 mm or more.
3) The laminate for a flexible device, wherein the polyimide film has a multilayer structure of two or more layers.
4) A mold release agent is blended in the polyimide film layer in contact with the glass substrate.
5) A laminate for a flexible device, wherein the polyimide film forming the multilayer structure is disposed so as to cancel each residual strain.
本発明の積層体は、良好な剥離性を有しており、かつ剥離後のポリイミドフィルムのカールが抑制されているので、フレキシブルデバイスを製造する際の積層体として好適に用いることが出来る。 Since the laminated body of this invention has favorable peelability and curling of the polyimide film after peeling is suppressed, it can be used suitably as a laminated body at the time of manufacturing a flexible device.
以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
本発明の積層体は、ガラス基板とポリイミド系フィルムとからなるものである。ガラス基板としては、例えば、ソーダライムガラス、ホウ珪酸ガラス、無アルカリガラス等を用いることが出来、これらのなかで、無アルカリガラス基板を好ましく用いることが出来る。 The laminate of the present invention comprises a glass substrate and a polyimide film. As the glass substrate, for example, soda lime glass, borosilicate glass, non-alkali glass or the like can be used, and among these, the non-alkali glass substrate can be preferably used.
前記ガラス基板の厚みとしては、0.3〜5.0mmが好ましい。厚みが0.3mmより薄いと基板のハンドリング性が低下することがある。また、厚みが5.0mmより厚いと生産性が低下することがある。これらのガラス基板は、ポリイミドフィルム層との離型性を向上させるために、離型層が設けられていても良い。 The thickness of the glass substrate is preferably 0.3 to 5.0 mm. If the thickness is less than 0.3 mm, the handling property of the substrate may be lowered. Moreover, productivity may fall when thickness is thicker than 5.0 mm. These glass substrates may be provided with a release layer in order to improve releasability with the polyimide film layer.
本発明の積層体で用いられるポリイミド系フィルムとは、ポリイミド系樹脂をフィルム化したものである。ポリイミド系樹脂は、主鎖にイミド結合を有する樹脂であり、具体例としては、ポリイミド、ポリアミドイミド、ポリエステルイミド等が挙げられるがこれらに限定されるものではなく、主鎖にイミド結合を有する樹脂であれば如何なる樹脂も使用することができる。 これらの樹脂は通常は単独で用いられるが、2種以上を混合して用いてもよい。 The polyimide film used in the laminate of the present invention is a film formed from a polyimide resin. The polyimide resin is a resin having an imide bond in the main chain, and specific examples include polyimide, polyamideimide, polyesterimide, etc., but are not limited thereto, and a resin having an imide bond in the main chain. Any resin can be used. These resins are usually used alone, but two or more kinds may be mixed and used.
ポリイミドは溶媒に溶解したポリアミック酸等ポリイミド前駆体を熱硬化して得られる前駆体型ポリイミドや溶媒可溶型のポリイミドを用いることができ、前駆体型ポリイミドを好ましく用いることが出来る。 As the polyimide, a precursor type polyimide obtained by thermosetting a polyimide precursor such as polyamic acid dissolved in a solvent or a solvent soluble type polyimide can be used, and a precursor type polyimide can be preferably used.
前記ポリイミド系樹脂としては、イミド結合に由来する構成単位を50モル%以上有する(但し、全構成単位を100モル%とする)ことが好ましい。 As said polyimide resin, it is preferable to have 50 mol% or more of structural units derived from an imide bond (however, all the structural units shall be 100 mol%).
前記ポリイミド系樹脂としては、市販品を用いてもよい。 即ち、例えば、「UイミドAR」、「UイミドAH」、「UイミドCR」、「UイミドCH」(いずれもユニチカ社製)やUワニスA(宇部興産社製)等のポリアミック酸型ワニス、「リカコートSN−20」(新日本理化社製)や「マトリミド5218」(ハンツマン社製)等を溶媒に溶解させた溶媒可溶型ポリイミドワニス、バイロマックスHR−11NN(東洋紡社製)等のポリアミドイミドワニスを使用することができる。 A commercially available product may be used as the polyimide resin. That is, for example, polyamic acid type varnishes such as “Uimide AR”, “Uimide AH”, “Uimide CR”, “Uimide CH” (all manufactured by Unitika Ltd.) and U varnish A (manufactured by Ube Industries). Solica-soluble polyimide varnish, Viromax HR-11NN (manufactured by Toyobo Co., Ltd.), etc. dissolved in a solvent such as “Rika Coat SN-20” (manufactured by Shin Nippon Rika Co., Ltd.) Polyamideimide varnish can be used.
前記前駆体型ポリイミドは、原料となるテトラカルボン酸やその二無水物とジアミンの略等モルを、溶媒中で反応させて得られるポリイミド前駆体溶液をガラス基板上に塗布して、乾燥、熱硬化(イミド化)してポリイミドフィルムとするものである。 The precursor type polyimide is prepared by applying a polyimide precursor solution obtained by reacting a raw material of tetracarboxylic acid or its dianhydride and diamine in a solvent on a glass substrate, followed by drying and thermosetting. (Imidization) to make a polyimide film.
このポリイミド前駆体溶液を製造する際の、反応温度としては、−30〜60℃が好ましく、−15〜40℃がより好ましい。またこの反応において、モノマー及び溶媒の添加順序は特に制限はなく、いかなる順序でもよい。 As reaction temperature at the time of manufacturing this polyimide precursor solution, -30-60 degreeC is preferable and -15-40 degreeC is more preferable. In this reaction, the order of addition of the monomer and the solvent is not particularly limited, and may be any order.
ここでテトラカルボン酸もしくはその二無水物としては、例えばピロメリット酸、3,3′,4,4′−ビフェニルテトラカルボン酸、3,3′,4,4′−ベンゾフェノンテトラカルボン酸、3,3′,4,4′−ジフェニルスルホンテトラカルボン、酸、3,3′,4,4′−ジフェニルエーテルテトラカルボン酸、2,3,3′,4′−ベンゾフェノンテトラカルボン酸、2,3,6,7−ナフタレンテトラカルボン酸、1,4,5,7−ナフタレンテトラカルボン酸、1,2,5,6−ナフタレンテトラカルボン酸、3,3′,4,4′−ジフェニルメタンテトラカルボン酸、2,2−ビス(3,4−ジカルボキシフェニル)プロパン、2,2−ビス(3,4−ジカルボキシフェニル)ヘキサフルオロプロパン、3,4,9,10−テトラカルボキシペリレン、2,2−ビス[4−(3,4−ジカルボキシフェノキシ)フェニル]プロパン、2,2−ビス[4−(3,4−ジカルボキシフェノキシ)フェニル]ヘキサフルオロプロパン、1,2,3,4−シクロブタンテトラカルボン酸、1,2,4,5−シクロペンタンテトラカルボン酸、1,2,4,5−シクロヘキサンテトラカルボン酸、ビシクロ[2,2,2]オクト−7−エン−2,3,5,6−テトラカルボン酸やこれらの二無水物などを単体もしくは混合物として使用することが出来るがこれらに限定されるものではない。 Examples of the tetracarboxylic acid or dianhydride thereof include pyromellitic acid, 3,3 ′, 4,4′-biphenyltetracarboxylic acid, 3,3 ′, 4,4′-benzophenonetetracarboxylic acid, 3, 3 ', 4,4'-diphenylsulfone tetracarboxylic acid, acid, 3,3', 4,4'-diphenyl ether tetracarboxylic acid, 2,3,3 ', 4'-benzophenone tetracarboxylic acid, 2,3,6 , 7-Naphthalenetetracarboxylic acid, 1,4,5,7-naphthalenetetracarboxylic acid, 1,2,5,6-naphthalenetetracarboxylic acid, 3,3 ′, 4,4′-diphenylmethanetetracarboxylic acid, 2 , 2-bis (3,4-dicarboxyphenyl) propane, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane, 3,4,9,10- Tracarboxyperylene, 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane, 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] hexafluoropropane, 1, 2,3,4-cyclobutanetetracarboxylic acid, 1,2,4,5-cyclopentanetetracarboxylic acid, 1,2,4,5-cyclohexanetetracarboxylic acid, bicyclo [2,2,2] oct-7- En-2,3,5,6-tetracarboxylic acid and dianhydrides thereof can be used alone or as a mixture, but are not limited thereto.
ここで、ピロメリット酸、3,3′,4,4′−ビフェニルテトラカルボン酸もしくはこれらの二無水物が特に好ましく用いられる。 Here, pyromellitic acid, 3,3 ′, 4,4′-biphenyltetracarboxylic acid or their dianhydrides are particularly preferably used.
また、ジアミンとしては例えば、p−フェニレンジアミン、m−フェニレンジアミン、3,4′−ジアミノジフェニルエーテル、4,4′−ジアミノジフェニルエーテル、4,4′−ジアミノジフェニルメタン、3,3′−ジメチル−4,4′−ジアミノジフェニルメタン、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパン、1,2−ビス(アニリノ)エタン、ジアミノジフェニルスルホン、ジアミノベンズアニリド、ジアミノベンゾエート、ジアミノジフェニルスルフィド、2,2−ビス(p−アミノフェニル)プロパン、2,2−ビス(p−アミノフェニル)ヘキサフルオロプロパン、1,5−ジアミノナフタレン、ジアミノトルエン、ジアミノベンゾトリフルオライド、1,4−ビス(p−アミノフェノキシ)ベンゼン、4,4′−ビス(p−アミノフェノキシ)ビフェニル、ジアミノアントラキノン、4,4′−ビス(3−アミノフェノキシフェニル)ジフェニルスルホン、1,3−ビス(アニリノ)ヘキサフルオロプロパン、1,4−ビス(アニリノ)オクタフルオロブタン、1,5−ビス(アニリノ)デカフルオロペンタン、1,7−ビス(アニリノ)テトラデカフルオロヘプタン、1,2−エチレンジアミン、1,3−プロパンジアミン、1,4−ブタンジアミン、1,5−ペンタジアミン、1,6−ヘキサンジアミン、1,7―ヘプタンジアミン、1,8―オクタンジアミン、1,9−ノナンジアミン、1、10―デカンジアミン、1,12―ドデカンジアミン、cis−1,4―ジアミノシクロヘキサン、trans−1,4―ジアミノシクロヘキサン、1,4―ジアミノシクロヘキサン異性体混合物、cis−cis−4,4’−ジアミノジシクロヘキシルメタン、cis−trans−4,4’−ジアミノジシクロヘキシルメタン、trans−trans−4,4’−ジアミノジシクロヘキシルメタン、4,4’−ジアミノジシクロヘキシルメタン異性体混合物、cis−1,3−ビス(アミノエチル)シクロヘキサン、trans−1,3−ビス(アミノエチル)シクロヘキサン、1,3−ビス(アミノエチル)シクロヘキサン異性体混合物、cis−trans−4,4’−メチレンビス(2ーメチルシクロヘキシルアミン)、trans−trans−4,4’−メチレンビス(2ーメチルシクロヘキシルアミン)、4,4’−メチレンビス(2ーメチルシクロヘキシルアミン)異性体混合物、cis−cis−4,4’−ジアミノジシクロヘキシレンプロパン、cis−trans−4,4’−ジアミノジシクロヘキシレンプロパン、4,4’−ジアミノジシクロヘキシレンプロパン等を単体もしくは混合物として使用することが出来るがこれらに限定されるものではない。 Examples of the diamine include p-phenylenediamine, m-phenylenediamine, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 3,3'-dimethyl-4, 4'-diaminodiphenylmethane, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 1,2-bis (anilino) ethane, diaminodiphenyl sulfone, diaminobenzanilide, diaminobenzoate, diaminodiphenyl sulfide, 2 , 2-bis (p-aminophenyl) propane, 2,2-bis (p-aminophenyl) hexafluoropropane, 1,5-diaminonaphthalene, diaminotoluene, diaminobenzotrifluoride, 1,4-bis (p- Aminophenoxy) benze 4,4′-bis (p-aminophenoxy) biphenyl, diaminoanthraquinone, 4,4′-bis (3-aminophenoxyphenyl) diphenylsulfone, 1,3-bis (anilino) hexafluoropropane, 1,4- Bis (anilino) octafluorobutane, 1,5-bis (anilino) decafluoropentane, 1,7-bis (anilino) tetradecafluoroheptane, 1,2-ethylenediamine, 1,3-propanediamine, 1,4- Butanediamine, 1,5-pentadiamine, 1,6-hexanediamine, 1,7-heptanediamine, 1,8-octanediamine, 1,9-nonanediamine, 1,10-decanediamine, 1,12-dodecanediamine Cis-1,4-diaminocyclohexane, trans-1,4-diaminocyclohexane Xanthone, 1,4-diaminocyclohexane isomer mixture, cis-cis-4,4′-diaminodicyclohexylmethane, cis-trans-4,4′-diaminodicyclohexylmethane, trans-trans-4,4′-diaminodicyclohexylmethane 4,4′-diaminodicyclohexylmethane isomer mixture, cis-1,3-bis (aminoethyl) cyclohexane, trans-1,3-bis (aminoethyl) cyclohexane, 1,3-bis (aminoethyl) cyclohexane isomerism Body mixture, cis-trans-4,4′-methylenebis (2-methylcyclohexylamine), trans-trans-4,4′-methylenebis (2-methylcyclohexylamine), 4,4′-methylenebis (2-methylcyclohexyl) A Min)) isomer mixture, cis-cis-4,4′-diaminodicyclohexylenepropane, cis-trans-4,4′-diaminodicyclohexylenepropane, 4,4′-diaminodicyclohexylenepropane, etc. alone or Although it can be used as a mixture, it is not limited to these.
ここで、p−フェニレンジアミン、4,4′−ジアミノジフェニルエーテル、2,2−ビス[4−(4−アミノフェノキシ)フェニル]プロパンが特に好ましく用いられる。 Here, p-phenylenediamine, 4,4′-diaminodiphenyl ether, and 2,2-bis [4- (4-aminophenoxy) phenyl] propane are particularly preferably used.
ポリイミド前駆体の固形分濃度としては1〜50質量%が好ましく、5〜30質量%がより好ましい。このポリアミック酸溶液は部分的にイミド化されていても良い。 As solid content concentration of a polyimide precursor, 1-50 mass% is preferable, and 5-30 mass% is more preferable. This polyamic acid solution may be partially imidized.
また本発明のポリイミド前駆体溶液の25℃に於ける粘度は1〜150Pa・sが好ましく、5〜100Pa・sがより好ましい。 The viscosity of the polyimide precursor solution of the present invention at 25 ° C. is preferably 1 to 150 Pa · s, more preferably 5 to 100 Pa · s.
ポリイミド前駆体溶液に用いられる溶媒としては、ポリイミド前駆体を溶解する溶媒であれば如何なる溶媒でも使用することが出来るが、例えば、アミド系溶媒、エーテル系溶媒、水溶性アルコール系溶媒が挙げられる。 As a solvent used for the polyimide precursor solution, any solvent can be used as long as it dissolves the polyimide precursor. Examples thereof include amide solvents, ether solvents, and water-soluble alcohol solvents.
アミド系溶媒の具体例としては、N−メチル−2−ピロリドン(NMP)、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド(DMAc)等が挙げられる。 Specific examples of the amide solvent include N-methyl-2-pyrrolidone (NMP), N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAc) and the like.
また、エーテル系化合物としては、2−メトキシエタノール、2−エトキシエタノール、2−(メトキシメトキシ)エトキシエタノール、2−イソプロポキシエタノール、2−ブトキシエタノール、テトラヒドロフルフリルアルコール、ジエチレングリコール、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、トリエチレングリコール、トリエチレングリコールモノエチルエーテル、テトラエチレングリコール、1−メトキシ−2−プロパノール、1−エトキシ−2−プロパノール、ジプロピレングリコール、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、トリプロピレングリコールモノメチルエーテル、ポリエチレングリコール、ポリプロピレングリコール、テトラヒドロフラン、ジオキサン、1,2−ジメトキシエタン、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル等が挙げられる。 Examples of the ether compounds include 2-methoxyethanol, 2-ethoxyethanol, 2- (methoxymethoxy) ethoxyethanol, 2-isopropoxyethanol, 2-butoxyethanol, tetrahydrofurfuryl alcohol, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol. Monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol, triethylene glycol monoethyl ether, tetraethylene glycol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol, dipropylene glycol monomethyl ether, di Propylene glycol monoethyl ether, tripropylene glycol monomethyl ether, poly Ji glycol, polypropylene glycol, tetrahydrofuran, dioxane, 1,2-dimethoxyethane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and the like.
また、水溶性アルコール系化合物としては、メタノール、エタノール、1−プロパノール、2−プロパノール、tert−ブチルアルコール、エチレングリコール、1,2−プロパンジオール、1,3−プロパンジオール、1,3−ブタンジオール、1,4−ブタジオール、2,3−ブタンジオール、1,5−ペンタンジオール、2−ブテン−1,4−ジオール、2−メチル−2,4−ペンタンジオール、1,2,6−ヘキサントリオール、ジアセトンアルコール等が挙げられる。 Examples of water-soluble alcohol compounds include methanol, ethanol, 1-propanol, 2-propanol, tert-butyl alcohol, ethylene glycol, 1,2-propanediol, 1,3-propanediol, and 1,3-butanediol. 1,4-butadiol, 2,3-butanediol, 1,5-pentanediol, 2-butene-1,4-diol, 2-methyl-2,4-pentanediol, 1,2,6-hexanetriol And diacetone alcohol.
これらの溶媒は2種以上を混合して用いることができる。これらの溶媒のうち、特に好ましい例としては、単独溶媒としてはN,N−ジメチルアセトアミド、N−メチル−2−ピロリドンが挙げられ、また、混合溶媒としては、N,N−ジメチルアセトアミドとN−メチル−2−ピロリドン、N−メチル−2−ピロリドンとメタノール、N−メチル−2−ピロリドンと2―メトキシエタノール等の組み合わせが挙げられる。 These solvents can be used as a mixture of two or more. Among these solvents, particularly preferred examples include N, N-dimethylacetamide and N-methyl-2-pyrrolidone as the sole solvent, and examples of the mixed solvent include N, N-dimethylacetamide and N- Examples thereof include a combination of methyl-2-pyrrolidone, N-methyl-2-pyrrolidone and methanol, N-methyl-2-pyrrolidone and 2-methoxyethanol.
前記ポリアミック酸溶液等ポリイミド系樹脂溶液には、ガラス基板からの剥離性を向上させるために離型剤を配合することが好ましい。このようにすることにより、ガラス基板とポリイミド系フィルムとの層間の接着強度を、本発明で必要とする7N/cm以下にすることが容易に達成出来る。ここで、前記接着強度としては、6N/cm以下がより好ましく、4N/cm以下が更に好ましい。ここで接着強度はJIS K6854に基づいて測定した値である。 In the polyimide resin solution such as the polyamic acid solution, a release agent is preferably blended in order to improve releasability from the glass substrate. By doing in this way, it can be easily achieved that the adhesive strength between the glass substrate and the polyimide film is 7 N / cm or less required in the present invention. Here, as said adhesive strength, 6 N / cm or less is more preferable, and 4 N / cm or less is still more preferable. Here, the adhesive strength is a value measured based on JIS K6854.
離型剤としては、例えば、ステアリン酸、パルミチン酸等の高級脂肪酸や、そのアミド、金属塩が挙げられ、好ましくはステアリン酸である。 Examples of the mold release agent include higher fatty acids such as stearic acid and palmitic acid, amides and metal salts thereof, and stearic acid is preferable.
配合量としては、ポリイミド系樹脂固形分100質量部に対して0.01から2質量部添加することが好ましく、より好ましくは0.01から1質量部である。配合量が0.01質量部より少ないと効果に乏しく、2質量部前より多い場合には効果は変わらず、むしろポリイミド系フィルムの力学的強度等の物性が低下する傾向となる As a compounding quantity, it is preferable to add 0.01-2 mass parts with respect to 100 mass parts of polyimide resin solid content, More preferably, it is 0.01-1 mass part. If the blending amount is less than 0.01 parts by mass, the effect is poor, and if it is more than 2 parts by mass, the effect is not changed, but rather the physical properties such as the mechanical strength of the polyimide film tend to be lowered.
前記ポリイミド系樹脂溶液には、必要に応じて、例えば、各種界面活性剤、レベリング剤等の公知の添加物を本発明の効果を損なわない範囲で添加することができる。また、他の重合体が本発明の効果を損なわない範囲で添加されていてもよい。 If necessary, for example, various additives such as various surfactants and leveling agents may be added to the polyimide resin solution as long as the effects of the present invention are not impaired. Moreover, the other polymer may be added in the range which does not impair the effect of this invention.
本発明の積層体は、前記ガラス基板上に、例えば前記ポリイミド前駆体溶液を塗布、乾燥、熱硬化することにより製造することが出来る。 The laminated body of this invention can be manufactured by apply | coating, drying, and thermosetting the said polyimide precursor solution, for example on the said glass substrate.
ガラス基板上への前記ポリイミド前駆体溶液の塗布は、連続もしくは枚葉で行うことが出来る。 The polyimide precursor solution can be applied onto the glass substrate continuously or in a single sheet.
ガラス基板上への連続塗布は、ダイコーター、リップコーター、コンマコーター、グラビアコーター、リバースロールコーター等の塗工機を用いておこなうことが出来る。 The continuous coating on the glass substrate can be performed using a coating machine such as a die coater, lip coater, comma coater, gravure coater, reverse roll coater.
また、ガラス基板上への枚葉塗布は、バーコーター、ドクターブレードコーター、スピンコーター等の塗工機を用いて行うことができる。 Moreover, single wafer application | coating on a glass substrate can be performed using coating machines, such as a bar coater, a doctor blade coater, and a spin coater.
ここで、ガラス基材への連続塗布は、ガラスが剛直であるため、困難を伴うことが多いので、工業生産の観点からは枚葉塗布が好ましい。 Here, since continuous application to a glass substrate is often difficult because glass is rigid, single-wafer application is preferable from the viewpoint of industrial production.
塗布厚みとしては、熱硬化後のポリイミドフィルムの厚さが、3〜100μmとすることが好ましく、10〜50μmとすることがより好ましい。 As the coating thickness, the thickness of the polyimide film after thermosetting is preferably 3 to 100 μm, and more preferably 10 to 50 μm.
次にガラス基板上に塗布されたポリイミド前駆体溶液を乾燥する。ここでいう乾燥とは、加熱等の手段によりポリイミド前駆体溶液における溶媒量を減少させることをいう。この際、塗膜中の固形分濃度が50質量%以上となるまで溶媒の除去を行うことが好ましい。 乾燥には任意の装置を用いることができ、熱風乾燥機が好ましいが、赤外線加熱、電磁誘導加熱などを使用してもよい。乾燥のためには50〜200℃の温度範囲が適当である。 Next, the polyimide precursor solution applied on the glass substrate is dried. Drying as used herein refers to reducing the amount of solvent in the polyimide precursor solution by means such as heating. At this time, it is preferable to remove the solvent until the solid content concentration in the coating film is 50% by mass or more. Any device can be used for drying, and a hot air dryer is preferable, but infrared heating, electromagnetic induction heating, or the like may be used. A temperature range of 50 to 200 ° C. is suitable for drying.
本発明の積層体は前記乾燥された塗膜の表面に更にポリイミド前駆体を塗布、乾燥して2層以上の多層構造とすることが好ましい。 The laminate of the present invention preferably has a multilayer structure of two or more layers by further applying a polyimide precursor to the surface of the dried coating film and drying it.
この2層目のポリイミド前駆体は、1層目に使用したポリイミド前駆体と同種であっても異種であっても良いが、ポリイミド前駆体の熱硬化後に発生する、2層以上のポリイミドフィルム中のお互いの残留歪を打ち消すようにすることが好ましい。そのようにするには、例えば特許第4841103号公報に記載されているように1層目のポリイミド前駆体の硬化速度を2層目より遅くしたり、1層目のポリイミドの線膨張係数(CTE)を2層目のポリイミドのCTEよりも小さくしたりすれば良い。 The polyimide precursor of the second layer may be the same as or different from the polyimide precursor used in the first layer, but in the two or more layers of polyimide film generated after the thermosetting of the polyimide precursor It is preferable to cancel each other's residual strain. In order to do so, for example, as described in Japanese Patent No. 4841103, the curing rate of the first layer polyimide precursor is made slower than the second layer, or the linear expansion coefficient (CTE) of the first layer polyimide is set. ) May be made smaller than the CTE of the second polyimide layer.
このようにすることにより、硬化した後、ガラス基板から剥離することにより得られるポリイミドフィルムのカールを抑制することができる。 By doing in this way, after hardening, the curl of the polyimide film obtained by peeling from a glass substrate can be suppressed.
本発明の積層体から得られるポリイミド系フィルムは、そのカール性を評価する指標の一つであるフィルムの曲率半径は30mm以上であることが好ましく、50mm以上がより好ましく、70mm以上がさらに好ましい。ここで曲率半径は、10cm角に切り出したポリイミド系フィルム片の曲率半径を測定した値である。 In the polyimide film obtained from the laminate of the present invention, the radius of curvature of the film, which is one of the indexes for evaluating the curl property, is preferably 30 mm or more, more preferably 50 mm or more, and further preferably 70 mm or more. Here, the radius of curvature is a value obtained by measuring the radius of curvature of a polyimide film piece cut into a 10 cm square.
前記乾燥塗膜は次に熱硬化を行う。熱硬化温度としては200℃以上、好ましくは300℃以上である。また、上限は450℃程度である。このような高温で十分に加熱処理を行う。ポリイミドの熱硬化の際、水や溶媒などのガスが発生するため、熱硬化は熱風循環下で行うことが好ましい。 The dried coating is then heat cured. The thermosetting temperature is 200 ° C. or higher, preferably 300 ° C. or higher. Moreover, an upper limit is about 450 degreeC. Heat treatment is sufficiently performed at such a high temperature. When polyimide is thermally cured, a gas such as water or a solvent is generated. Therefore, the thermal curing is preferably performed under hot air circulation.
前記の如くして得られた積層体は、ポリイミド系フィルム表面に電子素子形成後、これをガラス基板から剥離することによりフレキシブルデバイスとする。剥離するには、公知の方法、例えば駆動ロール、ロボット等の機械装置を用いて容易に剥離することができる。 The laminate obtained as described above is made into a flexible device by forming an electronic element on the polyimide film surface and then peeling it from the glass substrate. In order to peel, it can peel easily using well-known methods, for example, mechanical apparatuses, such as a drive roll and a robot.
なお、本発明のポリイミド系フィルムは、透明であることが好ましい。透明性の指標である500nmでの光線透過率としては、70%以上であることが好ましく、80%以上であることがより好ましい。 In addition, it is preferable that the polyimide-type film of this invention is transparent. The light transmittance at 500 nm, which is an index of transparency, is preferably 70% or more, and more preferably 80% or more.
以上のべたように、本発明の積層体は、ポリイミド系フィルムの剥離が容易であり、剥離されたポリイミド系フィルムが優れた耐熱性と寸法安定性を有する上、そのカールが抑制されているので、フレキシブルデバイス製造用の積層体として好適に用いることができる。 As described above, the laminate of the present invention is easy to peel off the polyimide film, and the peeled polyimide film has excellent heat resistance and dimensional stability, and curling is suppressed. It can be suitably used as a laminate for manufacturing flexible devices.
以下、本発明を実施例に基づいて具体的に説明するが、これらの実施例によって限定されるものではない。 EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, it is not limited by these Examples.
<ポリイミド前駆体溶液の調製>
実施例及び比較例で使用したポリイミド前駆体溶液を以下のようにして調製した。
<Preparation of polyimide precursor solution>
The polyimide precursor solutions used in the examples and comparative examples were prepared as follows.
<ポリイミド前駆体溶液A>
特許第4841103号公報 参考例3記載の方法により、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物(BPDA)とp−フェニレンジアミン(PDA)からポリイミド前駆体溶液を得た。すなわち、三つ口・フラスコに窒素ガス気流下、BPDA18.38g(62.5mmol)を採取し、DMAc122.5gを加えて溶解した。これにPDA6.62g(61.2mmol)とNMP52.5gを加えて室温で一夜間撹拌して、固形分濃度12.5質量%の均一なポリイミド前駆体溶液を得た。これをポリイミド前駆体溶液Aとする。
<Polyimide precursor solution A>
Patent 4841103 gazette By the method described in Reference Example 3, a polyimide precursor solution was obtained from 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylenediamine (PDA). That is, 18.38 g (62.5 mmol) of BPDA was collected in a three-necked flask under a nitrogen gas stream, and 122.5 g of DMAc was added and dissolved. To this, 6.62 g (61.2 mmol) of PDA and 52.5 g of NMP were added and stirred overnight at room temperature to obtain a uniform polyimide precursor solution having a solid content concentration of 12.5% by mass. This is designated as polyimide precursor solution A.
<ポリイミド前駆体溶液B>
特許第4841103号公報 参考例7記載の方法により、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物(BPDA)および3,3’,4,4’−ビフェニルテトラカルボン酸(BPA)と、p−フェニレンジアミン(PDA)および4,4’−オキシジアニリン(ODA)から均一なポリイミド前駆体溶液を得た。すなわち、三つ口・フラスコに窒素ガス気流下、ODA30.03g(0.15mol)、PDA91.92g(0.85mol)、DMAc1180g及びNMP506gを採取し、このフラスコを氷水中に入れて上記内容物を30分間攪拌した後、BPDA250.09g(0.85mol)を加え、40℃の湯浴中で1時間攪拌を行った。次いで、BPA49.54(0.15mol)を加えて40℃の湯浴中で2時間攪拌し、さらに60℃の湯浴中で3時間攪拌を行い、固形分濃度20質量%の均一なポリイミド樹脂前駆体の溶液を得た。これをポリイミド前駆体溶液Bとする。
<Polyimide precursor solution B>
Patent No. 4841103 gazette 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA) and 3,3 ′, 4,4′-biphenyltetracarboxylic acid (BPA) ), P-phenylenediamine (PDA) and 4,4′-oxydianiline (ODA) to obtain a uniform polyimide precursor solution. Specifically, ODA 30.03 g (0.15 mol), PDA 91.92 g (0.85 mol), DMAc 1180 g, and NMP 506 g were collected in a three-necked flask under a nitrogen gas stream, and the flask was placed in ice water to contain the above contents. After stirring for 30 minutes, 250.09 g (0.85 mol) of BPDA was added, and the mixture was stirred in a hot water bath at 40 ° C. for 1 hour. Next, 49.54 (0.15 mol) of BPA was added and stirred in a 40 ° C. hot water bath for 2 hours, and further stirred in a 60 ° C. hot water bath for 3 hours to obtain a uniform polyimide resin having a solid concentration of 20% by mass. A solution of the precursor was obtained. This is designated as polyimide precursor solution B.
<ポリイミド前駆体溶液C>
ポリイミド前駆体溶液Aに、ポリイミド固形分100質量部あたり0.5質量部のステアリン酸を加え、均一なポリイミド前駆体溶液を得た。これをポリイミド前駆体溶液Cとする。
<Polyimide precursor solution C>
0.5 parts by mass of stearic acid per 100 parts by mass of polyimide solid content was added to the polyimide precursor solution A to obtain a uniform polyimide precursor solution. This is designated as polyimide precursor solution C.
[実施例1]
厚さ0.7mmの無アルカリガラス基板(コーニング社製 イーグル2000)の表面上に前記ポリイミド前駆体溶液Cを熱硬化後のフィルムの厚さが20μmになるようにバーコータによって塗布し、130℃で10分間乾燥してポリイミド前駆体被膜を形成した。次いで、窒素ガス気流下で、100℃から360℃まで2時間かけて昇温した後、360℃で2時間熱処理し、ポリイミド前駆体を熱硬化させてイミド化した。これによって、ガラス基板と厚さ約15μmのポリイミドフィルム層を有する積層体を得た。得られた積層体のポリイミドフィルムは、容易に手でガラス板から剥離することが出来た。(この積層体をL−1とし、ポリイミドフィルムをP−1とする。)
[Example 1]
The polyimide precursor solution C is applied on the surface of a non-alkali glass substrate (Corning Eagle 2000) having a thickness of 0.7 mm by a bar coater so that the thickness of the film after thermosetting is 20 μm, and at 130 ° C. It was dried for 10 minutes to form a polyimide precursor film. Next, under a nitrogen gas stream, the temperature was raised from 100 ° C. to 360 ° C. over 2 hours, followed by heat treatment at 360 ° C. for 2 hours, and the polyimide precursor was thermoset to imidize. Thus, a laminate having a glass substrate and a polyimide film layer having a thickness of about 15 μm was obtained. The obtained polyimide film of the laminate could be easily peeled from the glass plate by hand. (This laminate is referred to as L-1 and the polyimide film as P-1.)
[実施例2]
厚さ0.7mmの無アルカリガラス基板(コーニング社製 イーグル2000)の表面上に前記ポリイミド前駆体溶液Cを熱硬化後のフィルムの厚さが16μmになるようにバーコータによって塗布し、130℃で10分間乾燥してポリイミド前駆体被膜を形成した。次いで、室温(25℃)に戻し、このポリイミド前駆体被膜上に、前記ポリイミド前駆体溶液Bを熱硬化後のフィルムの厚さが4μmになるようにバーコータによって塗布し、100℃で5分間乾燥して2層目の塗膜を外層を形成した。次いで、実施例1と同様に熱硬化させてイミド化した。これによって、ガラス基板と、2層からなる厚さ約20μmのポリイミドフィルム層を有する積層体を得た。得られた積層体のポリイミドフィルムは、容易に手でガラス基板から剥離することが出来た。(この積層体をL−2とし、ポリイミドフィルムをP−2とする。)
[Example 2]
The polyimide precursor solution C was applied on the surface of a non-alkali glass substrate (Corning Eagle 2000) having a thickness of 0.7 mm by a bar coater so that the thickness of the film after thermosetting was 16 μm, and the temperature was 130 ° C. It was dried for 10 minutes to form a polyimide precursor film. Next, the temperature is returned to room temperature (25 ° C.), and the polyimide precursor solution B is applied onto the polyimide precursor film by a bar coater so that the thickness of the film after thermosetting is 4 μm, and dried at 100 ° C. for 5 minutes. Thus, an outer layer was formed from the second coating film. Subsequently, it was heat-cured similarly to Example 1 and imidized. Thus, a laminate having a glass substrate and a polyimide film layer having a thickness of about 20 μm composed of two layers was obtained. The obtained polyimide film of the laminate could be easily peeled from the glass substrate by hand. (This laminate is referred to as L-2, and the polyimide film as P-2.)
[比較例1]
ポリイミド前駆体溶液Cをポリイミド前駆体溶液Aに変更した以外は、実施例1と同様にして積層体を得た。得られた積層体のポリイミドフィルムは手でガラス基板から剥離することが困難であったので、温水に浸漬することによりガラス基板から剥離した。(この積層体をL−3とし、ポリイミドフィルムをP−3とする。)
[Comparative Example 1]
A laminate was obtained in the same manner as in Example 1 except that the polyimide precursor solution C was changed to the polyimide precursor solution A. Since the polyimide film of the obtained laminate was difficult to peel from the glass substrate by hand, it was peeled from the glass substrate by being immersed in warm water. (This laminate is referred to as L-3, and the polyimide film as P-3.)
[比較例2]
ポリイミド前駆体溶液Cをポリイミド前駆体溶液Aに変更した以外は、実施例2と同様にして積層体を得た。得られた積層体のポリイミドフィルムは手でガラス基板から剥離することが困難であったので、温水に浸漬することによりガラス基板から剥離した。(この積層体をL−4とし、ポリイミドフィルムをP−4とする。)
[Comparative Example 2]
A laminate was obtained in the same manner as in Example 2 except that the polyimide precursor solution C was changed to the polyimide precursor solution A. Since the polyimide film of the obtained laminate was difficult to peel from the glass substrate by hand, it was peeled from the glass substrate by being immersed in warm water. (This laminate is designated L-4, and the polyimide film is designated P-4.)
<接着強度の評価>
前記積層体L−1〜L〜4のガラス基板とポリイミドフィルム層の層間の接着強度をJIS K6854に基づいて180°剥離試験により測定した。
<Evaluation of adhesive strength>
The adhesive strength between the glass substrates of the laminates L-1 to L-4 and the polyimide film layer was measured by a 180 ° peel test based on JIS K6854.
表1から、L−1およびL−2の接着強度は、それぞれ、3.8N/cm、3.5N/mと低い値となり、剥離性に優れていることが判る。これに対し、L−3およびL−4の接着強度は7N/cmを超えており、剥離が困難であることが判る。 From Table 1, it can be seen that the adhesive strengths of L-1 and L-2 are low values of 3.8 N / cm and 3.5 N / m, respectively, and are excellent in peelability. On the other hand, the adhesive strength of L-3 and L-4 exceeds 7 N / cm, which indicates that peeling is difficult.
<カール特性の評価>
前記ポリイミドフィルムP−1〜P−4を縦100mm、横100mmの大きさの試験片に切り出し、150℃×30分の加熱処理を行った後、それぞれ23℃、60%RHの雰囲気中に24時間放置した後、曲率半径を測定した。結果を表2に示す。
<Evaluation of curl characteristics>
The polyimide films P-1 to P-4 were cut into test pieces having a size of 100 mm in length and 100 mm in width and subjected to a heat treatment at 150 ° C. for 30 minutes, and then in an atmosphere of 23 ° C. and 60% RH, respectively. After standing for a period of time, the radius of curvature was measured. The results are shown in Table 2.
表2から、P−1およびP−2の曲率半径は、それぞれ、35mm、90mmと高い値となり、カールが抑制されていることが判る。これに対し、P−3およびP−4の曲率半径は30mm未満であり、カールが充分に抑制されていないことが判る。 From Table 2, it can be seen that the curvature radii of P-1 and P-2 are as high as 35 mm and 90 mm, respectively, and curling is suppressed. On the other hand, the curvature radius of P-3 and P-4 is less than 30 mm, and it can be seen that curling is not sufficiently suppressed.
上表から、本発明の積層体は、剥離性にすぐれ、かつ、剥離されたポリイミドフィルムはカールが抑制されていることが判る。この効果により、本発明の積層体は、フレキシブルデバイス用の積層体として好適に使用することが出来る。
From the above table, it can be seen that the laminate of the present invention is excellent in releasability, and the peeled polyimide film is curled. Due to this effect, the laminate of the present invention can be suitably used as a laminate for a flexible device.
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