JP2014189553A - Wet forming color cosmetic containing organic ultraviolet blocking agent deposited on hydrophobic-treated porous silica and method for preparing the same - Google Patents

Wet forming color cosmetic containing organic ultraviolet blocking agent deposited on hydrophobic-treated porous silica and method for preparing the same Download PDF

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JP2014189553A
JP2014189553A JP2013133112A JP2013133112A JP2014189553A JP 2014189553 A JP2014189553 A JP 2014189553A JP 2013133112 A JP2013133112 A JP 2013133112A JP 2013133112 A JP2013133112 A JP 2013133112A JP 2014189553 A JP2014189553 A JP 2014189553A
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porous silica
blocking agent
ultraviolet blocking
organic ultraviolet
organic
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Soosung Kong
洙星 孔
Weon Ki Hong
元基 洪
Dong-Myung Kim
東明 金
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Kolmar Korea Co Ltd
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Kolmar Korea Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a wet forming color cosmetic containing an organic ultraviolet blocking agent deposited on hydrophobic-treated porous silica and a method for preparing the same.SOLUTION: A wet forming color cosmetic containing an organic ultraviolet blocking agent deposited on hydrophobic-treated porous silica is obtained by hydrophobic treatment of the surface of the porous silica by silylation followed by the deposition of the organic ultraviolet blocking agent. Hydrophobic treatment of the surface of the porous silica can stabilize the deposited organic ultraviolet blocking agent and, when the organic ultraviolet blocking agent is dispersed with volatile solvents and dried for producing the wet forming color cosmetic, elimination of the organic ultraviolet blocking agent to the outside of the porous silica can be prevented and the stability of formulation can be ensured.

Description

本発明は多孔性シリカに有機紫外線遮断剤を安定して堆積して製形化の安定性を強化できる湿式成形色調化粧料及びその製造方法に関するものである。   The present invention relates to a wet-molded color cosmetic capable of stably depositing an organic ultraviolet blocking agent on porous silica and enhancing the stability of forming, and a method for producing the same.

最近わが国で紫外線による皮膚疾患が増加し、特に20〜30台の若者層でもシミや皮膚癌患者が急増したことがわかり、紫外線遮断の重要性が台頭している。特に男性は野外活動が多いにもかかわらず紫外線遮断に無関心な傾向があり、大韓皮膚科学会の調査によると20〜30台男性の皮膚癌患者が10年前に比べ5倍も増加したとされている。このように紫外線は美容だけではなく健康とも密接な関係にある。   Recently, skin diseases caused by ultraviolet rays have increased in Japan. Especially, it has been found that 20-30 young people have increased the number of spots and skin cancer patients, and the importance of ultraviolet ray blocking is emerging. In particular, men tend to be indifferent to UV protection despite a lot of outdoor activities. According to a survey by the Korean Dermatological Association, 20-30 male skin cancer patients have increased 5 times compared to 10 years ago. ing. In this way, ultraviolet rays are closely related not only to beauty but also to health.

太陽光線は波長の長さによって大きく可視光線、赤外線、紫外線に区別される。その中でも紫外線は可視光線の紫色より短い光線でUV(Ultraviolet)と呼ばれ、三つの領域に分かれる。紫外線A(UV-A)は皮膚を黒くする主原因であり、皮膚の真皮まで浸透して皮膚の再生機能を妨害し、しわを作り老化を促進させる。紫外線B(UV-B)はUV-Aより波長が短く真皮まで浸透しないが、角質層を厚くし皮膚を乾燥させ、皮膚表面を荒くしメラニン色素を生成してシミやソバカスなどを作る。また紅斑や火傷、水疱のような炎症も起こす。紫外線C(UV-C)は波長が最も短いが、最も強い紫外線であり皮膚癌を誘発させるところ、今まではオゾン層で完全遮断されあまり意識されなかったが、近時の環境汚染でオゾン層が破壊し、安心できない状況となっている。このような紫外線は皮膚だけでなく視力低下や体の免疫機能低下にも影響を及ぼし、過多露出は健康に悪いことがわかっている。   Sun rays are largely classified into visible rays, infrared rays, and ultraviolet rays according to the length of the wavelength. Among them, ultraviolet rays are shorter than visible violet rays and are called UV (Ultraviolet), and are divided into three regions. Ultraviolet rays A (UV-A) is the main cause of skin darkening and penetrates into the dermis of the skin, obstructing the skin's regenerative function, creating wrinkles and promoting aging. Ultraviolet B (UV-B) has a shorter wavelength than UV-A and does not penetrate into the dermis, but thickens the stratum corneum and dries the skin, roughens the skin surface and produces melanin pigments to make spots and freckles. It also causes inflammation like erythema, burns, and blisters. Although UV C (UV-C) has the shortest wavelength, it is the strongest UV and induces skin cancer, but until now it was completely blocked by the ozone layer and was not very conscious of it, but the ozone layer due to recent environmental pollution Has been destroyed and can not be relieved. It has been found that such ultraviolet rays affect not only the skin but also the visual acuity and the body's immune function, and overexposure is bad for health.

現在化粧品業界で使用される紫外線遮断剤は大きく有機紫外線遮断剤と無機紫外線遮断剤に分かれる。有機紫外線遮断剤は科学的紫外線遮断剤とも呼ばれ、紫外線を皮膚に吸収して化学的反応を起こして分解する原理で伸びがよく使用感も良いが、光安定性が低く時間が立つと更に塗り重ねる必要があり、皮膚に吸収されそれ自体が刺激を起こすか光反応による生成物のため敏感な肌には刺激性接触皮膚炎を起こす可能性があり、大多数の有機紫外線遮断剤は使用において多くの制約がある。また、無機紫外線遮断剤は物理的紫外線遮断剤とも呼ばれ、皮膚表面に膜を形成して日射を反射させる原理で、皮膚には刺激が少なく安全だが塗る度にべたつく使用感で不快感を誘発し、皮膚上に白濁現象を起こして肌を白くテカるようにしてしまう。無機紫外線遮断剤は1次粒子のサイズ調整及び表面個質、シリカ及びその他粉体を利用した複合体を使用して使い心地がよく白濁現象が起きないようにする多くの研究がなされている。しかし有機紫外線遮断剤は1次合成研究部分も微々たるもので、2次個質を通じた研究は皆無しの状態である。多くの研究が多孔性パウダーを利用して堆積する技術(KR 10-1221190 B1, KR 10-1175623 B1)に限られている。   The UV blocking agents currently used in the cosmetic industry are broadly divided into organic UV blocking agents and inorganic UV blocking agents. Organic UV-blockers are also called scientific UV-blockers, and they have good growth and good usability on the principle that they absorb UV rays into the skin and cause chemical reactions to decompose them. Must be re-applied and absorbed by the skin itself to cause irritation or product of photoreaction and may cause irritant contact dermatitis on sensitive skin, most organic UV blockers used There are many limitations. Inorganic UV blocking agents are also called physical UV blocking agents, and are based on the principle of forming a film on the skin surface to reflect solar radiation. The skin is less irritating and safe, but induces discomfort with a sticky feeling every time it is applied. However, it causes white turbidity on the skin and causes the skin to become white. Inorganic UV screening agents have been studied for the purpose of adjusting the size of primary particles and using composites using surface properties, silica, and other powders to make them comfortable to use and avoid clouding. However, organic UV screening agents have only a small part of the primary synthesis research, and there is no research through secondary nature. Many researches are limited to the technique of depositing using porous powder (KR 10-1221190 B1, KR 10-1175623 B1).

先行技術1(KR 10-1221190 B1)は気空内金属酸化物を 堆積させた中形気空性無機複合粉体と有機紫外線遮断剤を含んだ紫外線遮断用化粧料調整物に関するものであり、先行技術2(KR 10-1175623 B1)は有機紫外線遮断剤が持った中空性球形シリカ複合顔料の製造方法及びこれを含んだ紫外線遮断用化粧料調整物に関するものである。上記のような技術は乾式パウダー製形にのみ利用可能であり、揮発性溶媒を利用した湿式成形色調化粧料助成物は揮発性溶媒(アルコール類、パラピン類、水など)を溶剤として利用したパウダー状を分散させた後、揮発性溶剤を吸入、乾燥して完成品を製造する方法である。上記湿式成形色調化粧料助成物は製造工程上パウダー状態が揮発性溶媒で分散されるが、この状態で多孔性シリカに堆積させた紫外線遮断剤は外部に出され剤形が不安定となるため紫外線遮断効果が急激に減少する。   Prior art 1 (KR 10-1221190 B1) relates to a cosmetic preparation for ultraviolet blocking containing a medium-sized air-borne inorganic composite powder deposited with an air-air metal oxide and an organic ultraviolet blocking agent. Prior art 2 (KR 10-1175623 B1) relates to a method for producing a hollow spherical silica composite pigment possessed by an organic ultraviolet blocking agent and a cosmetic preparation for ultraviolet blocking containing the same. The above technologies can be used only for dry powder molding, and wet molding color cosmetic aids using volatile solvents are powders using volatile solvents (alcohols, parapines, water, etc.) as solvents. After the shape is dispersed, a volatile solvent is sucked and dried to produce a finished product. The wet molding color cosmetics aid is dispersed in the powder state with a volatile solvent in the manufacturing process, but the UV blocking agent deposited on the porous silica in this state is released to the outside and the dosage form becomes unstable. The UV blocking effect decreases rapidly.

したがって、上記のように有機紫外線遮断剤をもった多孔性シリカを利用して湿式成形色調化粧料を製造する場合、パウダー状態が揮発性溶剤に分散されながら多孔性シリカに堆積させた有機紫外線遮断剤がシリカの気空内部で安定化できず外部に出されることになる。   Therefore, when manufacturing wet-molded color cosmetics using porous silica with an organic UV blocking agent as described above, the organic UV blocking deposited on the porous silica while the powder state is dispersed in the volatile solvent. The agent cannot be stabilized inside the silica air and is discharged outside.

本明細書全体にわたって多数の論文及び特許文献が参照されその引用が表示される。引用された論文及び特許文献の開示内容はそれ全体として本明細書に参照として挿入され本発明が属する技術分野の水準及び本発明の内容がより明確に説明される。   Numerous papers and patent documents are referenced throughout this specification and their citations are displayed. The disclosures of the cited papers and patent documents are incorporated herein by reference in their entirety, and the level of the technical field to which the present invention belongs and the contents of the present invention are explained more clearly.

韓国特許10−1221190−B1Korean Patent 10-1221190-B1 韓国特許10−1175623−B1Korean Patent 10-1175623-B1

本発明者らは従来有機紫外線遮断剤を堆積させた多孔性シリカが乾式パウダー剤形にのみ利用が可能であり、揮発性溶剤を利用した湿式成形色調化粧料助成物では揮発性溶剤をパウダー状に分散時多孔性シリカに堆積させた有機紫外線遮断剤が外部に出されるため使用が不可能であることを発見し、これを解決するため研究をしてきた。その結果疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含んだ湿式成形色調化粧料及びその製造方法を完成した。   The present inventors have been able to use porous silica deposited with an organic ultraviolet blocking agent only in a dry powder dosage form, and in a wet molding color cosmetic aid using a volatile solvent, the volatile solvent is powdered. In order to solve this problem, it was discovered that the organic ultraviolet blocking agent deposited on the porous silica when dispersed was released to the outside and could not be used. As a result, a wet molding color cosmetic containing an organic ultraviolet blocking agent deposited on hydrophobic treated porous silica and a method for producing the same were completed.

本発明ではシリレーション反応に使用される疎水化物質であるHexamethyldisilazane、1,1,3,3-Tetramethyl-1、3-diphenyldisilazane、またはN,N′-Bis(trimethylsilyl)ureaの疎水性作用基であるメチル基(-CH3)をシリカの気空表面に付着させた後、ここで有機紫外線遮断剤を堆積させた場合、シリカの気空内部から前具体間に固まる現象を増進させ、湿式成形色調化粧料に使用される揮発性溶剤と分散及び乾燥時有機紫外線遮断剤が外部に出されず固まったままで安定化することを確認した。   In the present invention, the hydrophobic functional group of Hexamethyldisilazane, 1,1,3,3-Tetramethyl-1, 3-diphenyldisilazane, or N, N′-Bis (trimethylsilyl) urea, which is a hydrophobic substance used in the silylation reaction. When an organic UV-blocking agent is deposited after attaching a certain methyl group (-CH3) to the silica air surface, the phenomenon of solidification from the inside of the silica air space to the previous concrete is promoted, and wet molding color tone is improved. It was confirmed that the volatile solvent used in cosmetics and the organic UV-blocking agent during dispersion and drying were stabilized without being released to the outside.

したがって本発明は疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含んだ湿式成形色調化粧料及びその製造方法を提供するところにその目的がある。   Accordingly, it is an object of the present invention to provide a wet-molded color cosmetic containing an organic ultraviolet blocking agent deposited on hydrophobic-treated porous silica and a method for producing the same.

本発明は、シリレーション反応を通じて疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含んだ湿式成形色調化粧料を提供する。   The present invention provides a wet molding color cosmetic comprising an organic ultraviolet light blocking agent deposited on porous silica that has been subjected to hydrophobic treatment through a silylation reaction.

上記シリレーション反応はHexamethyldisilazane、1,1,3,3-Tetramethyl-1、3-diphenyldisilazane、及びN,N′-Bis(trimethylsilyl)ureaの中から選択された少なくとも一つのシリレーション物質を使用して遂行されるものである。
この際、シリレーション物質は多孔性シリカの総重量100重量部に対して0.1〜10.0重量部で使用できる。
The silylation reaction uses at least one silylation substance selected from Hexamethyldisilazane, 1,1,3,3-Tetramethyl-1, 3-diphenyldisilazane, and N, N′-Bis (trimethylsilyl) urea. It is to be carried out.
At this time, the silylation material may be used in an amount of 0.1 to 10.0 parts by weight with respect to 100 parts by weight of the total weight of the porous silica.

上記有機紫外線遮断剤はエチルヘキシルメトキシシンナーメイト、エチルヘキシルシリケート、オキシルディメチルパラ-アミノベンゾオキサン、ブチルメトキシディベンゾイルメタン、オキシルメキトシシンナーメイト、オクチルサリチルレート、オキトクリルレン、ブチルメトキシディベンゾイルメタン、オキシベンゾン、オキシルトリアゾン、メンチルアントラニルレート、3、4-メチルベンジルリデンケンパー及びビス-エチルオキシペノルメトキシペニルトリアジンの中で選択された少なくとも一つを含みうる。   The above organic ultraviolet ray blocking agents are ethyl hexyl methoxycinnamate, ethyl hexyl silicate, oxyldimethyl para-aminobenzoxane, butyl methoxy dibenzoyl methane, oxyl meto cincinnamate, octyl salicylate, octocrylylene, butyl methoxy dibenzoyl methane, oxybenzone, It may contain at least one selected from oxyltriazone, menthyl anthranilate, 3,4-methyl benzylidene kaemper and bis-ethyloxy penormethoxyphenyl triazine.

上記疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤は疎水処理された多孔性シリカの総重量100重量部に対して有機紫外線遮断剤を20〜100重量部で含むものでありうる。
上記湿式成形色調化粧料は疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含むパウダー成分及びバインダー成分を含むものでありうる。
The organic ultraviolet blocking agent deposited on the hydrophobic treated porous silica may include 20 to 100 parts by weight of the organic ultraviolet blocking agent with respect to 100 parts by weight of the total weight of the hydrophobic treated porous silica.
The wet molding color cosmetic may include a powder component and a binder component containing an organic ultraviolet blocking agent deposited on hydrophobic treated porous silica.

上記湿式成形色調化粧料は疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を有機紫外線遮断剤の量を基準に0.1〜10.0重量%で含むものでありうる。   The wet molding color cosmetic may include an organic UV blocking agent deposited on hydrophobic treated porous silica in an amount of 0.1 to 10.0% by weight based on the amount of the organic UV blocking agent.

本発明は多孔性シリカの表面をシリレーションを通じて疎水化させる段階;前段階から得られた疎水処理された多孔性シリカに有機紫外線遮断剤を堆積させる段階;及び前段階から得られた疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含むパウダー成分及びバインダー成分を混合した後粉砕して粉砕混合物を得て、上記粉砕混合物をエタノール、水、グリセリンからなる揮発性溶剤に分散させスラリー状で製造した後、スラリー状を成形器上に一定量充填させた後、成形物を乾燥して揮発性溶剤を除去する段階;を含む湿式成形色調化粧料の製造方法を提供する。   The present invention comprises hydrophobizing the surface of porous silica through silylation; depositing an organic UV-blocking agent on the hydrophobic treated porous silica obtained from the previous step; and hydrophobized treatment obtained from the previous step. A powder component containing an organic ultraviolet blocking agent deposited on porous silica and a binder component are mixed and then pulverized to obtain a pulverized mixture, and the pulverized mixture is dispersed in a volatile solvent composed of ethanol, water, and glycerin. And then, after the slurry is filled in a predetermined amount on the molding machine, the molded product is dried to remove the volatile solvent, and a method for producing a wet molded color cosmetic is provided.

本発明は多孔性シリカの表面をシリレーション(Silylation)反応を通じて疎水化させた後、上記疎水処理された多孔性シリカに有機紫外線遮断剤を安定的に堆積させてこれを含む湿式成形色調化粧料及びその製造方法を提供する。上記疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含む湿式成形色調化粧料は湿式成形色調化粧料を製造するに使用される揮発性溶剤と分散時、有機紫外線遮断剤が気空内部で固まる現象を増進させ外部に失われることを防ぎ、製形の安定性を確保できる。   The present invention relates to a wet-molded color cosmetic comprising the surface of a porous silica hydrophobized through a silylation reaction, and an organic ultraviolet blocking agent is stably deposited on the hydrophobic treated porous silica. And a method for manufacturing the same. The wet molding color cosmetic containing the organic UV blocking agent deposited on the hydrophobic treated porous silica is free from the organic UV blocking agent when dispersed with the volatile solvent used for manufacturing the wet molding coloring cosmetic. Improves the phenomenon of solidification inside and prevents it from being lost outside, ensuring the stability of molding.

図1は多孔性シリカの電界放出走査顕微鏡(Leo Supra 55, Germany)の写真である。(ア)多孔性シリカ、(イ)疎水処理された多孔性シリカ、(ウ)有機紫外線遮断剤が堆積させた多孔性シリカ。FIG. 1 is a photograph of a field emission scanning microscope (Leo Supra 55, Germany) of porous silica. (A) Porous silica, (b) Hydrophobic-treated porous silica, and (c) Porous silica deposited with an organic ultraviolet blocking agent. 図2は多孔性シリカの窒素等温吸着線及び気空分布曲線を表すグラフである。(ア)多孔性シリカ、(イ)疎水処理された多孔性シリカ、(ウ)有機紫外線遮断剤が堆積させた多孔性シリカ。FIG. 2 is a graph showing a nitrogen isotherm adsorption line and an air-air distribution curve of porous silica. (A) Porous silica, (b) Hydrophobic-treated porous silica, and (c) Porous silica deposited with an organic ultraviolet blocking agent. 図3は温度変化による多孔性シリカの熱重量変化を表すグラフである。(ア)多孔性シリカ、(イ)疎水処理された多孔性シリカ、(ウ)有機紫外線遮断剤が堆積させた多孔性シリカ。FIG. 3 is a graph showing the thermogravimetric change of porous silica due to temperature change. (A) Porous silica, (b) Hydrophobic-treated porous silica, and (c) Porous silica deposited with an organic ultraviolet blocking agent.

本発明はシリレーション反応を通じて疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含む湿式成形色調化粧料を提供する。   The present invention provides a wet molding color cosmetic comprising an organic ultraviolet blocking agent deposited on porous silica that has been subjected to hydrophobic treatment through a silylation reaction.

本発明の望ましい様態に従うと、多孔性シリカの表面を疎水化させるためのシリレーション物質はHexamethyldisilazane、1,1,3,3-Tetramethyl-1,3-diphenyldisilazane及びN,N′-Bis(trimethylsilyl)ureaの中から選択された少なくとも一つを使用できる。
上記シリレーション反応のため使用可能なシリレーション物質の化学構造は表1の通りである。
According to a preferred embodiment of the present invention, silylation materials for hydrophobizing the surface of porous silica are Hexamethyldisilazane, 1,1,3,3-Tetramethyl-1,3-diphenyldisilazane and N, N′-Bis (trimethylsilyl) At least one selected from urea can be used.
Table 1 shows chemical structures of silylation substances that can be used for the silylation reaction.

このようなシリレーション物質で処理された多孔性シリカに有機紫外線遮断剤を堆積させる場合、上記疎水化物質の疎水性作用其であるメチル其(-CH3)がシリカ表面に付着され電球体と周形表面との相互作用を減らし気空内部から電球体間の固まる現象を増進させ多孔性シリカ内に有機紫外線遮断剤が固まるようになり安定化する。   In the case of depositing an organic ultraviolet blocking agent on porous silica treated with such a silylation material, methyl (-CH3), which is the hydrophobic action of the hydrophobized material, is attached to the silica surface, and the bulb body and the surrounding area. It reduces the interaction with the surface of the shape and enhances the phenomenon of solidification between the bulbs from the inside of the air and stabilizes the organic ultraviolet blocking agent in the porous silica.

このように有機紫外線遮断剤が疎水処理された多孔性シリカに安定的に堆積させることで、湿式成形色調化粧料を製造する工程中揮発性有機溶剤での分散及ぶ乾燥を経ても多孔性シリカから有機紫外線遮断剤が漏れず最終的に得られる湿式成形色調化粧料内に意図して有機紫外線遮断剤の量が残存する。すなわち、湿式成形肯定を通じて製形化の安定性を向上できる。   As described above, the organic ultraviolet blocking agent is stably deposited on the porous silica subjected to the hydrophobic treatment, so that the porous silica can be dispersed from the porous silica even after being dispersed and dried with the volatile organic solvent during the process of manufacturing the wet-molded color cosmetic. The amount of the organic ultraviolet blocking agent is intentionally left in the wet molded color cosmetic that is finally obtained without leakage of the organic ultraviolet blocking agent. In other words, the stability of forming can be improved through wet forming affirmation.

本発明の望ましい様態に従えば、上記シリレーション反応のために使用される疎水化物質は多孔性シリカの総重量100重量部に対し0.1〜10.0重量部を使用できる。疎水化物質が多孔性シリカ100重量部に対して0.1重量部未満で含まれる場合には、多孔性シリカ表面のシリレーション反応が微々で疎水化特性が現れず、10.0重量部を超える場合にはシリレーション反応に必要以上の量が投入されることになり10.0重量部以上の投入は無意味である。   According to a preferred embodiment of the present invention, the hydrophobizing material used for the silylation reaction may be 0.1 to 10.0 parts by weight with respect to 100 parts by weight of the total weight of the porous silica. When the hydrophobized substance is contained in an amount of less than 0.1 parts by weight with respect to 100 parts by weight of porous silica, the silylation reaction on the surface of the porous silica is insignificant, and the hydrophobizing properties do not appear. An amount more than necessary for the silylation reaction is added, and the addition of 10.0 parts by weight or more is meaningless.

本発明の望ましい様態に従えば、有機紫外線遮断剤はエチルヘキシルメトキシシンナーメイト、エチルヘキシルシリケート、オキシルディメチルパラ-アミノベンゾオキサン、ブチルメトキシディベンゾイルメタン、オキシルメキトシシンナーメイト、オクチルサリチルレート、オキトクリルレン、ブチルメトキシディベンゾイルメタン、オキシベンゾン、オキシルトリアゾン、メンチルアントラニルレート、3、4-メチルベンジルリデンケンパー及びビス-エチルオキシペノルメトキシペニルトリアジンの中で選択された少なくとも一つでありうるが、このような有機紫外線遮断剤らは熱、有機溶媒または周辺環境によって簡単に破壊されるため安定化が必要であり、本発明の意図に符合するものといえる。   According to a preferred embodiment of the present invention, the organic UV-blocking agent is ethylhexylmethoxycinnamate, ethylhexylsilicate, oxyldimethylpara-aminobenzoxane, butylmethoxydibenzoylmethane, oxylmetocicinnamate, octylsalicylate, octocrylene, It may be at least one selected from among butyl methoxydibenzoylmethane, oxybenzone, oxyltriazone, menthyl anthranilate, 3,4-methylbenzylidene kemper and bis-ethyloxypenolmethoxyphenyl triazine. Such organic ultraviolet blocking agents are easily destroyed by heat, an organic solvent, or the surrounding environment, and need to be stabilized, and can be said to be consistent with the intention of the present invention.

本発明の望ましい様態に従えば、疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤は疎水処理された多孔性シリカの総重量100重量部に対して有機紫外線遮断剤を20〜100重量部を含みうる。有機紫外線遮断剤を疎水処理された多孔性シリカ100重量部に対して20重量部未満が含まれる場合、湿式成形色調化粧料に適用時紫外線遮断効果が微々であり、100重量部を超える場合には多孔性シリカの気空体積(1.14cc/g)に比べて過料の有機紫外線遮断剤が堆積させるため気空内全量が入りきれない可能性がある。   According to a preferred embodiment of the present invention, the organic ultraviolet blocking agent deposited on the hydrophobic treated porous silica is 20 to 100 wt% of the organic ultraviolet blocking agent with respect to 100 parts by weight of the total weight of the hydrophobic treated porous silica. Part may be included. When the organic UV blocker contains less than 20 parts by weight with respect to 100 parts by weight of the porous silica subjected to the hydrophobic treatment, the UV blocking effect is insignificant when applied to wet molding color cosmetics, and exceeds 100 parts by weight. Compared to the air volume of porous silica (1.14 cc / g), the amount of air inside the air may not be able to enter due to the deposit of the organic UV blocking agent.

本発明の望ましい様態に従えば、湿式成形色調化粧料は疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含む成分はパウダー成分及びバインダー成分を含みうる。上記水及びグリセリンを混合して作った揮発性溶剤は湿式成形色調化粧料を製造する最終段階で乾燥後除去して使用しうる。疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤以外のパウダー成分やバインダー成分には特に限定があるわけではなく、通常の色調化粧料に含まれるものを使用しうるのはもちろんである。   According to a preferred embodiment of the present invention, the wet-molded color cosmetic composition may include a powder component and a binder component as the component containing the organic ultraviolet blocking agent deposited on the hydrophobic-treated porous silica. The volatile solvent prepared by mixing the above water and glycerin can be used after being dried and removed in the final stage of producing a wet color tone cosmetic. There are no particular limitations on the powder component and binder component other than the organic ultraviolet blocking agent deposited on the hydrophobic treated porous silica, and it is of course possible to use those contained in normal color cosmetics. .

本発明の望ましい様態に従えば、湿式成形色調化粧料は疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を有機紫外線遮断剤量の基準に0.1〜10.0重量%で含みうる。疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を有機紫外線遮断剤の量を基準に0.1重量%未満で含む場合には紫外線遮断効果が微々であり、10.0重量%を超える場合には湿式成形色調化粧料製品製形性及び品質が低下する。   According to a preferred embodiment of the present invention, the wet-molded color cosmetic may include an organic ultraviolet blocking agent deposited on hydrophobic treated porous silica in an amount of 0.1 to 10.0% by weight based on the amount of the organic ultraviolet blocking agent. When the organic ultraviolet blocking agent deposited on the hydrophobic treated porous silica is contained in an amount of less than 0.1% by weight based on the amount of the organic ultraviolet blocking agent, the ultraviolet blocking effect is insignificant, and when it exceeds 10.0% by weight Formability and quality of wet molding color cosmetic products are reduced.

上記目的を達成するため、本発明は多孔性シリカの表面をシリレーションを通じて疎水化させる段階;上記疎水処理された多孔性シリカに有機紫外線遮断剤を堆積させる段階;及び上記疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含むパウダー成分及びバインダー成分を混合した後粉砕して粉砕混合物を得た後、上記粉砕混合物をエタノール、水及びグリセリンからなる揮発性溶剤で分散させスラリー状に製造した後、スラリー状を製形器上で一定量充填させた後、製形物を乾燥させ揮発性溶剤を除去する段階;を含む湿式成形色調化粧料を製造できる。このように湿式成形色調化粧料製造工程はパウダー成分とバインダー成分の粉砕混合物を揮発性溶剤に分散させ乾燥させて溶剤を除去できるか、特に揮発性溶剤の除去はサクション等の過酷な過程を随伴しうる。ここで有機紫外線遮断剤が多孔性シリカ内に安定期に堆積させられない場合、このような工程中に消失されうる。しかし疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤は安定化されこのような製形化でも安定性を保証できる。   To achieve the above object, the present invention comprises hydrophobizing the surface of porous silica through silylation; depositing an organic ultraviolet blocking agent on the hydrophobic treated porous silica; and the hydrophobic treated porosity. After mixing a powder component and a binder component containing an organic ultraviolet blocking agent deposited on silica and pulverizing to obtain a pulverized mixture, the pulverized mixture is dispersed in a volatile solvent composed of ethanol, water and glycerin to form a slurry. After the production, a fixed amount of the slurry is filled on the shaper, and then the shaped product is dried to remove the volatile solvent. In this way, the wet molding color cosmetic manufacturing process can remove the solvent by dispersing and drying the pulverized mixture of the powder component and the binder component in a volatile solvent, and particularly the removal of the volatile solvent is accompanied by a severe process such as suction. Yes. If the organic UV blocker is not deposited in a stable phase in the porous silica, it can be lost during such a process. However, the organic ultraviolet blocking agent deposited on the hydrophobic treated porous silica is stabilized, and the stability can be ensured even in such a shaping.

以下、実施例を通じて本発明をより詳細に説明する。これら実施例は本発明をより具体的に説明するためだけのものであって、本発明の要旨によって本発明の範囲がこれら実施例に限られないことは本発明が属する技術分野で通常の知識を有する者には自明である。   Hereinafter, the present invention will be described in more detail through examples. These examples are only for explaining the present invention more specifically, and it is normal knowledge in the technical field to which the present invention belongs that the scope of the present invention is not limited to these examples by the gist of the present invention. It is obvious to those who have

[実施例]疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含む湿式成形色調化粧料製造
シリレーションを通じた多孔性シリカの疎水化工程
[Example] Manufacture of wet-molded color cosmetics containing organic ultraviolet blocking agent deposited on hydrophobic treated porous silica
Hydrophobic process of porous silica through silylation

多孔性シリカ(SILNOS 350, ABC NANOTECH 社)3.0gを各々疎水化物質であるhexamethyldisilazane(99%、Fluka)、1,1,3,3-Tetramethyl-1,3-diphenyldisilazane(99%、Fluka)0.3g及びN,N′-Bis(trimethylsilyl)urea(99%、Fluka) 0.3gとn-hexane(aldrich) 150mLが混合された溶液にいれ過熱しながら還流させた後、フィルター過程を通じて疎水処理された多孔性シリカを得た。
多孔性シリカを疎水処理化した具体的助成は表2にある。
Porous silica (SILNOS 350, ABC NANOTECH) 3.0 g is a hydrophobized substance hexamethyldisilazane (99%, Fluka), 1,1,3,3-Tetramethyl-1,3-diphenyldisilazane (99%, Fluka) 0.3 G and N, N′-Bis (trimethylsilyl) urea (99%, Fluka) 0.3 g and n-hexane (aldrich) 150 mL were mixed and refluxed with heating, and then subjected to a hydrophobic treatment through a filtering process. Porous silica was obtained.
Specific subsidies for hydrophobic treatment of porous silica are shown in Table 2.

これで疎水処理しなかった多孔性シリカ(対象球1)、hexamethyldisilazaneで疎水処理された多孔性シリカ(実施例1)、1,1,3,3-Tetramethyl-1,3-diphenyldisilazaneで疎水処理された多孔性シリカ(実施例2)及びN,N′-Bis(trimethylsilyl)ureaで疎水処理された多孔性シリカ(実施例3)が得られた。
有機紫外線遮断剤を堆積させる過程
Porous silica that was not hydrophobically treated (target sphere 1), porous silica that was hydrophobically treated with hexamethyldisilazane (Example 1), and hydrophobically treated with 1,1,3,3-Tetramethyl-1,3-diphenyldisilazane Porous silica (Example 2) and porous silica treated with N, N′-Bis (trimethylsilyl) urea (Example 3) were obtained.
The process of depositing organic UV screening agents

上記実施例から製造された各々の疎水処理された多孔性シリカ及び疎水処理されていない多孔性シリカ10gに80℃で加温した有機紫外線遮断剤の成分であるエチルヘキシルメトキシシンナーメイト4gを入れ含沈法(論文:イギリス化学会発刊学術誌「Chemical communications」、2009年、第6号、pp.650‐652)を利用した堆積させた。   10 g of each of the hydrophobic treated porous silica and non-hydrophobic treated porous silica produced from the above examples were added with 4 g of ethylhexyl methoxycinnamate, which was a component of an organic ultraviolet ray blocking agent heated at 80 ° C. Deposited using the law (paper: “Chemical communications” published by the British Chemical Society, 2009, No. 6, pp. 650-652).

これで有機紫外線遮断剤の成分であるエチルヘキシルメトキシシンナーメイトが堆積された疎水処理されていない多孔性シリカ(対照群2)、有機紫外線遮断剤の成分であるエチルヘキシルメトキシシンナーメイトが堆積された「Hexamethyldisilazane」で疎水処理された多孔性シリカ(実施例4)、有機紫外線遮断剤の成分であるエチルヘキシルメトキシシンナーメイトが堆積された「1,1,3,3-Tetramethyl-1,3-diphenyldisilazane」で疎水処理された多孔性シリカ(実施例5)及び有機紫外線遮断剤の成分であるエチルヘキシルメトキシシンナーメイトが堆積された「N,N′-Bis(trimethylsilyl)urea」で疎水処理された多孔性シリカ(実施例6)が得られた。
湿式成形色調化粧料の製造
次のような工程に従い湿式成形色調化粧料を製造した。
(1)下記表4に記載されたパウダー成分(原料1〜14)を混合した。
(2)表4に記載されたバインダー成分(原料15〜19)を混合した後、80℃で加温した。
(3)上記(1)に上記(2)を噴射した後2回粉砕してパウダー状を製造した。
Non-hydrophobic porous silica deposited with ethylhexyl methoxycinnamate, a component of organic UV blocker (Control Group 2), and ethylhexylmethoxycinnamate, a component of organic UV blocker, deposited with “Hexamethyldisilazane Hydrophobic treated porous silica (Example 4), and “1,1,3,3-Tetramethyl-1,3-diphenyldisilazane” deposited with ethylhexyl methoxycinnamate, a component of an organic UV blocker Porous silica treated with `` N, N′-Bis (trimethylsilyl) urea '' deposited with treated porous silica (Example 5) and ethylhexyl methoxycinnamate, a component of organic UV blocker (implemented) Example 6) was obtained.
Manufacture of wet molding color cosmetics Wet molding color cosmetics were manufactured according to the following steps.
(1) Powder components (raw materials 1 to 14) described in Table 4 below were mixed.
(2) After mixing the binder components (raw materials 15 to 19) described in Table 4, the mixture was heated at 80 ° C.
(3) After spraying the above (2) into the above (1), it was pulverized twice to produce a powder.

(4)表5の揮発性溶剤(原料1〜3)に(3)で製造したパウダー状をいれ約10分間分散させスラリー状に製造した。スラリー状を製形器上で一定量充填した後、製形布を当て約40〜50%揮発性溶剤を除去し、60℃から12時間乾燥させ揮発性溶剤を完全に除去した。
実験例1.電界放出走査顕微鏡で測定
(4) The powder produced in (3) was added to the volatile solvent (raw materials 1 to 3) shown in Table 5 and dispersed for about 10 minutes to produce a slurry. After a certain amount of the slurry was filled on the molding machine, about 40 to 50% of the volatile solvent was removed by applying a molding cloth and dried from 60 ° C. for 12 hours to completely remove the volatile solvent.
Experimental example 1.Measured with a field emission scanning microscope

本発明から製造した疎水処理された多孔性シリカ及び有機紫外線遮断剤が堆積された多孔性シリカを疎水処理していない一般的多孔性シリカと比較して粒度及び外形の変化を確認した。(ア)多孔性シリカは対照群1、(イ)疎水処理された多孔性シリカは実施例1、(ウ)有機紫外線遮断剤が堆積された多孔性シリカは実施例4に選定して各々の多孔性シリカを電界放出走査顕微鏡(Leo Supra 55,
Germany)を利用して測定した。
The change in the particle size and the outer shape of the porous silica prepared from the present invention and the porous silica on which the organic ultraviolet blocking agent was deposited were compared with the general porous silica not subjected to the hydrophobic treatment. (A) Porous silica was selected in Control Group 1, (b) Hydrophobic-treated porous silica was selected in Example 1, and (c) Porous silica on which an organic ultraviolet blocking agent was deposited was selected in Example 4. Porous silica was subjected to field emission scanning microscopy (Leo Supra 55,
Germany).

その結果、図1で確認できるようにすべて10μm前後の粒度分布を表し、多孔性シリカと比較して疎水処理された多孔性シリカと有機紫外線遮断剤が堆積された多孔性シリカの粒度変化は起きず、外形も維持されたことが確認できた。
実験例2.比表面積及び気空の体積変化の測定
As a result, as can be seen in FIG. 1, the particle size distribution is about 10 μm, and changes in the particle size of the porous silica with hydrophobic treatment and the porous silica with organic UV light blocking agent deposited occur compared to the porous silica. It was also confirmed that the external shape was maintained.
Example 2: Measurement of specific surface area and air volume change

上記実験例1から選定された(ア)多孔性シリカ、(イ)疎水処理された多孔性シリカ及び(ウ)有機紫外線遮断剤が堆積された多孔性シリカを液体窒素温度から得られた窒素等温吸着線及び気空分布曲線を測定することで比表面積及び気空体積の変化を確認した。Micromeritics社のTriStarを利用し、等温吸着線の形態はtype-IVの拡張形態であり、これはHOLLOWタイプで典型的に現れる形態(図2参照)である。次の数式1であるBrunauer-Emmett-Teller法に基づき比表面積及び気空体積の値を算出してその結果を次の表6に表した。
Nitrogen isotherm obtained from liquid nitrogen temperature of (a) porous silica selected from the above experimental example 1, (b) porous silica subjected to hydrophobic treatment and (c) porous silica deposited with an organic ultraviolet blocking agent Changes in specific surface area and air-air volume were confirmed by measuring adsorption lines and air-air distribution curves. Utilizing MicroStar's TriStar, the form of the isothermal adsorption line is an extended form of type-IV, which is a form that typically appears in the HOLLOW type (see FIG. 2). The specific surface area and air / air volume values were calculated based on the following Formula 1 Brunauer-Emmett-Teller method, and the results are shown in Table 6 below.

その結果、上記Brunauer-Emmett-Tellerを通じて得られた比表面積の値は175m2/g
> 144m2/g > 63m2/gで急激に減少し、気空堆積も1.14cc/g >
1.12cc/g > 0.56cc/gで減少することを確認することで、多孔性シリカの疎水処理及び有機紫外線遮断剤の堆積がなされたことを間接的に確認できた。
実験例3.温度変化による熱重量の変化
As a result, the value of the specific surface area obtained through the Brunauer-Emmett-Teller is 175 m2 / g
> 144m2 / g> 63m2 / g, it decreases sharply, and air deposition is 1.14cc / g>
By confirming that it decreased with 1.12 cc / g> 0.56 cc / g, it was indirectly confirmed that the hydrophobic treatment of porous silica and the deposition of organic ultraviolet blocking agent were made.
Experimental example 3.Thermogravimetric change due to temperature change

上記実験例1から選定された(ア)多孔性シリカ、(イ)疎水処理された多孔性シリカ及び(ウ)有機紫外線遮断剤が堆積された多孔性シリカの温度変化による熱重量変化を時差熱重量分析機(Seiko
TG/DTA 7300、JAPAN)を利用して測定した。ただ、(ウ)有機紫外線遮断剤が堆積された多孔性シリカの場合は疎水処理された多孔性シリカ10gに2.3gの有機紫外線遮断剤を堆積させ得られたものを使用した。その結果、図3のように疎水処理された多孔性シリカは300℃以上で2.5重量%の質量減少が起き、有機紫外線遮断剤が堆積されたシリカでは20重量%の質量減少が発生することで多孔性シリカに疎水化処理のため適用されたHexamethyldisilazaneと多孔性シリカに有機紫外線遮断剤で適用されたエチルヘキシルメトキシシンナーメイトが堆積されていることを確認できた。
実験例4.多孔性シリカに堆積された有機紫外線遮断剤の含量分析
The thermogravimetric change due to temperature change of (a) porous silica selected from the above experimental example 1, (b) porous silica subjected to hydrophobic treatment and (c) porous silica on which an organic ultraviolet ray blocking agent is deposited is time difference heat. Gravimetric analyzer (Seiko
TG / DTA 7300, JAPAN). However, (c) in the case of porous silica on which an organic ultraviolet blocking agent was deposited, a product obtained by depositing 2.3 g of an organic ultraviolet blocking agent on 10 g of hydrophobic treated porous silica was used. As a result, as shown in FIG. 3, the porous silica treated with hydrophobic treatment has a mass loss of 2.5% by weight at 300 ° C. or higher, and the silica with the organic UV blocking agent deposited has a mass reduction of 20% by weight. It was confirmed that Hexamethyldisilazane applied to porous silica for hydrophobization treatment and ethylhexylmethoxycinnamate applied to porous silica with organic UV blocking agent were deposited.
Experimental example 4. Content analysis of organic UV-blocking agent deposited on porous silica

実施例7ないし9及び比較例1から得られた湿式成形色調化粧料の中で有機紫外線遮断剤の含量を高性能液体クロマトグラフィー分析(HPLC)を通じて分析して次の数式2に基づいて湿式成形による有機紫外線遮断剤の維持率を算出してその結果を次の表7に表した。
In wet-type color cosmetics obtained from Examples 7 to 9 and Comparative Example 1, the content of the organic UV-blocking agent was analyzed through high performance liquid chromatography analysis (HPLC), and wet molding based on the following formula 2. The maintenance rate of the organic ultraviolet blocking agent was calculated according to the results, and the results are shown in Table 7 below.

その結果、パウダー状を揮発性溶剤に分散して湿式成形色調化粧料を製造した場合、表7で確認できるように実施例7の場合は疎水処理された多孔性シリカに体積された有機紫外線遮断剤であるエチルヘキシルメトキシシンナーメイトは湿式成形工程を経た後も95%以上の維持率をみせ、実施例8は92%、実施例9は94%の維持率を表した。しかし、比較例1の場合、疎水処理をしなかった多孔性シリカ内に体積された有機紫外線遮断剤であるエチルヘキシルメトキシシンナーメイトは湿式成形工程を通じて35%のみ残存した。   As a result, when the powdered form was dispersed in a volatile solvent to produce a wet-molded color cosmetic, as shown in Table 7, in the case of Example 7, in the case of Example 7, the organic ultraviolet light blocked by hydrophobic treated porous silica was blocked. Ethylhexyl methoxycinnamate, an agent, showed a maintenance rate of 95% or more even after the wet molding process. Example 8 showed a maintenance rate of 92% and Example 9 showed a maintenance rate of 94%. However, in the case of Comparative Example 1, only 35% of ethylhexyl methoxycinnamate, which is an organic ultraviolet blocking agent that was volume-stored in porous silica that was not subjected to hydrophobic treatment, remained during the wet molding process.

実験結果を通じてもわかるように、疎水処理された多孔性シリカに堆積された有機紫外線遮断剤と疎水処理をしなかった多孔性シリカに堆積された有機紫外線遮断剤をいれ湿式成形色調化粧料を製造した以後、有機紫外線遮断剤の含量を分析した結果、溶剤を疎水処理された多孔性シリカ内に体積された有機紫外線遮断剤に包含する場合、有機紫外線遮断剤の量を基準に最初投入量に比べ90%以上残存するが、疎水処理をしなかった多孔性シリカ内に体積された有機紫外線遮断剤を包含する場合、有機紫外線遮断剤の量を基準に最初投入量に比べ35%だけ残存した。   As can be seen from the experimental results, wet molded color cosmetics are manufactured using organic UV blocking agent deposited on hydrophobic treated porous silica and organic UV blocking agent deposited on non-hydrophobic treated porous silica. As a result of analyzing the content of the organic ultraviolet blocking agent, when the solvent is included in the organic ultraviolet blocking agent volume in the hydrophobic treated porous silica, the amount of the organic ultraviolet blocking agent is set to the initial input amount based on the amount of the organic ultraviolet blocking agent. More than 90% remains, but when including an organic UV blocking agent in porous silica that has not been subjected to hydrophobic treatment, only 35% remains compared to the initial charge based on the amount of the organic UV blocking agent. .

これらから、本発明から製造された湿式成形色調化粧料は製造工程中多孔性シリカ内に体積された有機紫外線遮断剤が外部に出されることを最小化することで湿式成形工程を通じた有機紫外線遮断剤を利用した製形化の安定性を確保できたことを確認できる。
From these, the wet molding color cosmetics manufactured from the present invention minimizes the organic UV blocking agent volume in the porous silica during the manufacturing process, thereby minimizing the organic UV blocking through the wet molding process. It can be confirmed that the stability of the molding using the agent can be secured.

Claims (8)

シリレーション反応を通じて疎水処理された多孔性シリカに堆積された有機紫外線遮断剤を含んだ湿式成形色調化粧料。   Wet molded color cosmetics containing an organic UV blocking agent deposited on porous silica that has been hydrophobically treated through a silylation reaction. 第1項において、
シリレーション反応はHexamethyldisilazane、1,1,3,3-Tetramethyl-1,3-diphenyldisilazane及びN,N′-Bis(trimethylsilyl)ureaの中から選択されたシリレーション物質を使用して遂行されたことを特徴とする湿式成形色調化粧料。
In paragraph 1,
The silylation reaction was performed using a silylation substance selected from Hexamethyldisilazane, 1,1,3,3-Tetramethyl-1,3-diphenyldisilazane and N, N′-Bis (trimethylsilyl) urea Wet molded color cosmetics.
第2項において、
シリレーション物質は多孔性シリカの総重量100重量部に対して0.1〜10.0重量部で使用されることを特徴とする湿式成形色調化粧料。
In Section 2,
The wet molding color cosmetic characterized in that the silylation material is used in an amount of 0.1 to 10.0 parts by weight based on 100 parts by weight of the total weight of the porous silica.
第1項において、
有機紫外線遮断剤はエチルヘキシルメトキシシンナーメイト、エチルヘキシルシリケート、オキシルディメチルパラ-アミノベンゾオキサン、ブチルメトキシディベンゾイルメタン、オキシルメキトシシンナーメイト、オクチルサリチルレート、オキトクリルレン、ブチルメトキシディベンゾイルメタン、オキシベンゾン、オキシルトリアゾン、メンチルアントラニルレート、3、4-メチルベンジルリデンケンパー及びビス-エチルオキシペノルメトキシペニルトリアジンの中で選択された少なくとも一つ含むこと特徴とする湿式成形色調化粧料。
In paragraph 1,
Organic UV blockers are ethyl hexyl methoxycinnamate, ethyl hexyl silicate, oxyldimethyl para-aminobenzoxane, butyl methoxydibenzoyl methane, oxyl meto cincinnamate, octyl salicylate, octocrylylene, butyl methoxy dibenzoyl methane, oxybenzone, oxyl A wet-molded color cosmetic comprising at least one selected from triazone, menthylanthranylate, 3,4-methylbenzylidenekemper and bis-ethyloxypenolmethoxyphenyl triazine.
第1項において、
疎水処理された多孔性シリカに堆積された有機紫外線遮断剤は疎水処理された多孔性シリカの総重量100重量部に対して有機紫外線遮断剤を20〜100重量部含むことを特徴とする湿式成形色調化粧料。
In paragraph 1,
The organic ultraviolet blocking agent deposited on the hydrophobic treated porous silica contains 20 to 100 parts by weight of the organic ultraviolet blocking agent with respect to 100 parts by weight of the total weight of the hydrophobic treated porous silica. Tone cosmetics.
第1項において、
湿式成形色調化粧料は疎水処理された多孔性シリカに堆積された有機紫外線遮断剤を含むパウダー成分及びバインダー成分を含むことを特徴とする湿式成形色調化粧料。
In paragraph 1,
The wet molding color cosmetic comprises a powder component containing an organic ultraviolet blocking agent and a binder component deposited on hydrophobic treated porous silica, and a wet molding color cosmetic.
第1項又は第5項において、
湿式成形色調化粧料は疎水処理された多孔性シリカに堆積された有機紫外線遮断剤を有機紫外線遮断剤の量を基準に0.1〜10.0重量%で含むことを特徴とする湿式成形色調化粧料。
In paragraph 1 or paragraph 5,
The wet molding color cosmetic comprises an organic ultraviolet blocking agent deposited on hydrophobic treated porous silica in an amount of 0.1 to 10.0% by weight based on the amount of the organic ultraviolet blocking agent.
多孔性シリカの表面をシリレーションを通じて疎水化させる段階;前段階から得られた疎水処理された多孔性シリカに有機紫外線遮断剤を堆積させる段階;及び前段階から得られた疎水処理された多孔性シリカに堆積させた有機紫外線遮断剤を含むパウダー成分及びバインダー成分を混合した後粉砕して粉砕混合物を得て、上記粉砕混合物をエタノール、水、グリセリンからなる揮発性溶剤に分散させスラリー状で製造した後、スラリー状を成形器上に一定量充填させた後、成形物を乾燥して揮発性溶剤を除去する段階;を含む湿式成形色調化粧料の製造方法。
Hydrophobizing the surface of the porous silica through silylation; depositing an organic UV-blocking agent on the hydrophobic treated porous silica obtained from the previous step; and hydrophobic treated porosity obtained from the previous step A powder component containing an organic ultraviolet blocking agent deposited on silica and a binder component are mixed and then pulverized to obtain a pulverized mixture. The pulverized mixture is dispersed in a volatile solvent composed of ethanol, water, and glycerin to produce a slurry. Then, after filling a certain amount of the slurry on the molding machine, the molded product is dried to remove the volatile solvent.
JP2013133112A 2013-03-26 2013-06-25 Wet forming color cosmetic containing organic ultraviolet blocking agent deposited on hydrophobic-treated porous silica and method for preparing the same Pending JP2014189553A (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06239732A (en) * 1992-12-24 1994-08-30 Shiseido Co Ltd Fixed ultraviolet ray absorbing agent and its production
JPH06263618A (en) * 1993-03-12 1994-09-20 Pola Chem Ind Inc Oil gel cosmetic
JPH09286928A (en) * 1996-02-19 1997-11-04 Shiseido Co Ltd Ultraviolet light absorbent composite powder and its production
JPH11222421A (en) * 1998-01-31 1999-08-17 Naris Cosmetics Co Ltd Ultraviolet light shielding agent and its production, and cosmetic
JP2006219423A (en) * 2005-02-10 2006-08-24 Kao Corp Skin cosmetic
JP2009067683A (en) * 2007-09-10 2009-04-02 Shiseido Co Ltd Sunscreening water-in-oil type emulsion cosmetic

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06239732A (en) * 1992-12-24 1994-08-30 Shiseido Co Ltd Fixed ultraviolet ray absorbing agent and its production
JPH06263618A (en) * 1993-03-12 1994-09-20 Pola Chem Ind Inc Oil gel cosmetic
JPH09286928A (en) * 1996-02-19 1997-11-04 Shiseido Co Ltd Ultraviolet light absorbent composite powder and its production
JPH11222421A (en) * 1998-01-31 1999-08-17 Naris Cosmetics Co Ltd Ultraviolet light shielding agent and its production, and cosmetic
JP2006219423A (en) * 2005-02-10 2006-08-24 Kao Corp Skin cosmetic
JP2009067683A (en) * 2007-09-10 2009-04-02 Shiseido Co Ltd Sunscreening water-in-oil type emulsion cosmetic

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