JP2014159010A - Water treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a water treatment apparatus which efficiently performs water treatment while reducing electric power to be supplied to an electrode.SOLUTION: The water treatment apparatus comprises: a nozzle member 1 which has a gas chamber 10 formed therein; a pair of electrodes 4 which are arranged so as to face each other while sandwiching the gas chamber 10 therebetween; a treatment tank 2 which stores treatment water W in a space that communicates with the gas chamber 10; a gas supply device 3 which supplies a gas to the gas chamber 10 and thereby generates a bubble B in the treatment water W; and a power source 5 which applies electric voltage between the pair of electrodes 4 to generate plasma discharge.

Description

  The present invention relates to a water treatment apparatus that performs treatment such as sterilization on water.

  2. Description of the Related Art Conventionally, a water treatment apparatus is known in which a discharge reaction is caused in bubbles supplied in water, and water is sterilized by various radicals generated in association with the discharge reaction. Patent Document 1 below shows an example of such a water treatment apparatus.

  The water treatment apparatus disclosed in Patent Document 1 below includes a pair of electrodes arranged separately on both sides of a container containing water, and a pulse power source electrically connected to the pair of electrodes. An oxygen-rich gas is blown into the container from the bottom of the container, and the gas blown into the container becomes bubbles and floats in the water. The pulse power source applies an alternating pulse voltage to a pair of electrodes, thereby generating an electric field in the water between the pair of electrodes. In the bubbles floating in the water between the pair of electrodes, an electric field acts to cause an in-bubble discharge. As a result, hydroxy radicals (OH radicals), ozone, ultraviolet rays, and the like are generated from the bubbles, and water treatment such as sterilization of water in the container is performed by these.

Japanese Patent No. 4101979

  In Patent Document 1 described above, an electric field generated in water induces a charge on the inner surface of the bubble, and as a result, a strong magnetic field is generated in the bubble to cause an in-bubble discharge. In-bubble discharge in the process cannot be generated unless a very high electric field is generated in water by applying a very high voltage to the pair of electrodes. As described above, the technique disclosed in Patent Document 1 has a problem in terms of energy saving because high energy is required for water treatment.

  This invention is made | formed in view of the above situations, and it aims at providing the water treatment apparatus which can perform a water treatment efficiently, suppressing the electric power supplied to an electrode.

  In order to solve the above problem, the water treatment apparatus of the present invention communicates with the gas chamber, a nozzle member that forms a gas chamber therein, a pair of electrodes that are arranged to face each other with the gas chamber interposed therebetween, and the gas chamber. A gas is generated in the treated water by supplying a gas to the treatment tank storing the treated water in the space, and sending the gas from the downstream end of the gas chamber to the treated water in the treatment tank. And a power source that generates a plasma discharge by applying a voltage to the pair of electrodes (Claim 1).

  In this water treatment apparatus, plasma is supplied to the gas chamber by plasma discharge between a pair of electrodes, so that a discharge reaction (electron emission reaction) occurs in a predetermined component contained in the gas in the gas chamber, and various radicals and ultraviolet rays are generated. Is generated. And the process water can be sterilized strongly by the gas containing these components being supplied to the treated water in a processing tank as a bubble from the downstream end part of a gas chamber.

  In addition, a voltage is applied to a pair of electrodes arranged opposite to each other across a gas chamber in which gas exists, and various radicals and the like are generated by the plasma discharge generated along with this, so that, for example, normal gas that has not been radicalized is treated. Unlike the case of radicalizing this after supplying it to water (in this case, it is necessary to generate a strong electric field in the water), the value of the voltage to be applied can be kept low. Necessary energy can be suppressed.

  In the present invention, preferably, the pair of electrodes extend along a gas flow direction in a gas chamber that flows toward the processing tank.

  As described above, when the pair of electrodes are formed so as to extend along the gas flow direction in the gas chamber, it is possible to prevent the gas flow from being obstructed by the electrodes, and efficiently supply the bubbles to the treated water. be able to.

  In this invention, Preferably, the refinement | miniaturization means for refining the bubble supplied to the said treated water is provided in the downstream end part of the said gas chamber (Claim 3).

  According to this configuration, since the microbubbles are supplied to the treated water through the micronization means, the entire surface area of the bubbles in the treated water can be increased, and the above-described sterilizing effect can be further enhanced.

  In the present invention, it is preferable that at least one of the pair of electrodes is covered with an insulator.

  According to this configuration, since silent discharge (dielectric barrier discharge) can be generated as plasma discharge, it is possible to effectively suppress electrode consumption.

  The water treatment apparatus of the present invention preferably further includes a wetting means for adding moisture to the gas supplied from the gas supply apparatus to the gas chamber (Claim 5).

  According to this configuration, since moisture is surely contained in the gas supplied to the gas chamber, when a voltage for plasma discharge is applied between the pair of electrodes, a sufficient amount of hydroxy radical (OH radical) is generated. Can be generated. Hydroxyl radicals have a particularly strong oxidizing power among the molecular species called active oxygen. By supplying gas containing such hydroxy radicals as bubbles to the treated water, the treated water becomes more effective. Can be sterilized.

  In the present invention, preferably, the treated water in the treatment tank flows in a specific direction, and the nozzle member has a plurality of nozzles arranged side by side in the specific direction, from a gas chamber inside each nozzle. Gas is sent out in a direction perpendicular to the specific direction (Claim 6).

  According to this structure, since a sufficient amount of bubbles can be supplied into the flow while flowing the treated water in one direction in the treatment tank, a relatively large amount of treated water can be sterilized efficiently in a short time. Can do.

  The water treatment apparatus of the present invention preferably further includes a pair of underwater electrodes disposed opposite to each other in a state of being separated from each other inside the treatment tank, and a power supply for the underwater electrode that applies a voltage to the underwater electrode. A gas generated by the nozzle member is supplied between the pair of underwater electrodes (Claim 7).

  According to this configuration, since the electric field formed between the pair of underwater electrodes acts on the bubbles in the treated water to continuously generate various radicals and ultraviolet rays, the sterilizing effect of the treated water can be further enhanced.

  As described above, according to the water treatment apparatus of the present invention, water treatment can be performed efficiently while suppressing the power supplied to the electrodes.

It is a figure which shows the structure of the water treatment apparatus concerning 1st Embodiment of this invention. It is a figure which shows the structure of the water treatment apparatus concerning 2nd Embodiment of this invention. It is a figure which shows the structure of the water treatment apparatus concerning 3rd Embodiment of this invention. It is a figure which shows the structure of the water treatment apparatus concerning 4th Embodiment of this invention. It is a figure for demonstrating the modification of the said 4th Embodiment. It is a figure which shows the structure of the water treatment apparatus concerning 5th Embodiment of this invention. It is a figure which shows the structure of the water treatment apparatus concerning 6th Embodiment of this invention. It is a figure which shows the structure of the water treatment apparatus concerning 7th Embodiment of this invention. It is a figure for demonstrating the modification of the said 7th Embodiment.

  Embodiments of the present invention will be described below with reference to the drawings.

<First Embodiment>
FIG. 1 is a diagram showing a configuration of a water treatment apparatus according to the first embodiment of the present invention. The water treatment apparatus according to the first embodiment is an apparatus used for sterilizing, for example, ship ballast water, waste water from various factories and offices, water used as drinking water, drinking water, and the like. . Hereinafter, water before sterilization is referred to as “treated water”.

  The water treatment apparatus is disposed inside a hollow nozzle member 1, a treatment tank 2 that stores treated water W therein, a gas supply device 3 that supplies gas to the nozzle member 1, and the nozzle member 1. A pair of electrodes 4 and a power source 5 for applying a voltage to the pair of electrodes 4 are provided.

  The cavity formed inside the nozzle member 1 is formed as a gas chamber 10 filled with the gas supplied from the gas supply device 3. At the downstream end of the gas chamber 10 (that is, the end on the downstream side of the gas feed direction supplied from the gas supply device 3), an outlet member made of a porous material or a mesh member having a large number of fine holes. 11 is attached in a state of being fixed to the wall surface of the tip portion of the nozzle member 1. The outlet member 11 corresponds to a refining means for refining bubbles B described later.

  The gas supply device 3 includes a pump 15 that pumps gas and a gas introduction pipe 16 that connects the pump 15 and the nozzle member 1 to each other. A gas containing oxygen (for example, air, oxygen-rich gas, or pure oxygen) is pumped from the pump 15. The gas contains a certain amount of moisture.

  The gas pumped from the pump 15 is supplied to the gas chamber 10 inside the nozzle member 1 through the gas introduction pipe 16, and is sent out to the treated water W in the treatment tank 2 through the outlet member 11 of the gas chamber 10. Thereby, a large number of bubbles B are generated in the treated water W. In particular, in this embodiment, since the gas is sent out through the outlet member 11 having a large number of fine holes, a so-called microvalve having a bubble diameter of 100 μm or less is generated as the bubble B.

  The pair of electrodes 4 are each made of a flat metal plate, and are attached to two spaced apart locations on the inner wall surface of the nozzle member 1. That is, the pair of electrodes 4 are provided so as to face each other with the gas chamber 10 in the nozzle member 1 interposed therebetween and to be exposed to the gas chamber 10. Each electrode 4 is formed so as to extend along the gas flow direction so as not to inhibit the gas flow in the gas chamber 10 flowing toward the treatment tank 2.

  The power source 5 applies a DC voltage of about several kV to the pair of electrodes 4 and is electrically connected to the pair of electrodes 4 via a covered electric wire or the like.

  When the voltage as described above is applied from the power source 5 to the pair of electrodes 4, plasma is generated in the gas chamber 10. Then, oxygen and moisture contained in the gas in the gas chamber 10 react as in, for example, the following reaction formulas (1), (2), and (3). In the following reaction formula, the symbol “·” in front of the element symbol indicates that the chemical bond is broken (a state having an unpaired electron), that is, it is radicalized. Yes.

H ₂ O + e → OH + e H + e (1)
O ₂ + 2e → 2.O + 2e (2)
・ O + H ₂ O → 2.OH (3)
Specifically, as shown in the above reaction formula (1), electrons collide with moisture (H ₂ O) contained in the gas to release electrons (discharge reaction), and hydroxy radical (.OH) and hydrogen A radical (.H) is generated. Accompanying this discharge reaction, ultraviolet rays (UV) are also generated.

Further, as shown in the above reaction formula (2), electrons collide with oxygen (O ₂ ) contained in the gas to cause electron emission (discharge reaction) to generate oxygen radicals (.O), Ultraviolet rays (UV) are generated. Further, oxygen radicals (.O) generated by this discharge reaction react with moisture (H ₂ O) in the air to generate hydroxy radicals (.OH) as shown in the above reaction formula (3). .

Although a specific reaction formula is omitted, ozone (O ₃ ) may be generated by the reaction of oxygen radicals generated in the above reaction formula (2) with oxygen contained in the gas. Further, hydrogen radicals (H ₂ O ₂ ) may be generated by the reaction between the hydroxy radicals generated in the above reaction formulas (1) and (3).

  As described above, when plasma is supplied to the gas chamber 10 by applying a voltage to the pair of electrodes 4, a gas containing oxygen radicals, hydroxy radicals, ozone, hydrogen peroxide, ultraviolet rays, etc. is created inside the gas chamber 10. Is issued. Such gas is supplied to the treated water W through the outlet member 11 of the gas chamber 10, and becomes a large number of bubbles B and drifts in the treated water W, thereby strongly sterilizing the treated water W.

  That is, oxygen radicals, hydroxy radicals, ozone, and hydrogen peroxide are all active oxygen having strong oxidizing power, and have an effect of reducing bacteria, microorganisms, and the like, that is, a bactericidal effect. As is well known, ultraviolet rays also have a bactericidal effect. In particular, the hydroxy radical is the most reactive among the active oxygens and has a strong oxidizing power, and therefore exerts a very strong effect on killing bacteria and microorganisms. Therefore, when the gas containing such a hydroxy radical is supplied to the treated water W as the bubbles B, the treated water W is strongly sterilized and the quality of the treated water W is improved.

  As described above, in the water treatment apparatus of the first embodiment, oxygen radicals, hydroxy radicals, ozone, hydrogen peroxide, ultraviolet rays, and the like are generated in the gas chamber 10 by plasma discharge between the pair of electrodes 4. And the gas containing these is supplied to the treated water W in the processing tank 2 as the bubble B from the downstream end part of the gas chamber 10, and the treated water W can be sterilized strongly.

  Moreover, since various radicals and the like are generated in the gas chamber 10 in which gas exists, the voltage to be applied between the pair of electrodes 4 can be suppressed as compared with the case where the bubbles supplied to the treated water W are radicalized. .

  Furthermore, in the first embodiment, since the pair of electrodes 4 are formed so as to extend along the gas flow direction in the gas chamber 10, the gas flow in the gas chamber 10 is not hindered. The bubbles B can be efficiently supplied to the treated water W in the treatment tank 2.

  Moreover, in the said 1st Embodiment, since the outlet member 11 (miniaturization means) is provided in the downstream end part of the gas chamber 10, the gas supplied in the treated water W turns into the fine bubble B. FIG. Thereby, since the area which gas and treated water W contact increases, the sterilization effect mentioned above can be heightened more.

  In the first embodiment, a DC voltage is applied to each electrode 4 in order to generate a plasma discharge between the pair of electrodes 4. However, the voltage applied to the electrode 4 can generate a plasma discharge. For example, a high frequency (several hundred Hz to several hundred kHz) AC voltage may be applied to the electrode 4.

Second Embodiment
Next, with reference to FIG. 2, the structure of the water treatment apparatus concerning 2nd Embodiment of this invention is demonstrated. In FIG. 2, the same components as those in the first embodiment (FIG. 1) are denoted by the same reference numerals, and detailed description thereof is omitted.

  In the water treatment apparatus of the second embodiment, the nozzle member 21 that forms the gas chamber 30 is attached to the treatment tank 2 in the same manner as in the first embodiment, and the downstream end of the gas chamber 30 is An outlet member 31 made of a porous material or a mesh-like member is provided. However, in the second embodiment, unlike the first embodiment, the pair of electrodes 24 are provided so as to be embedded in the wall portion of the nozzle member 21 made of an insulator (the surrounding wall of the gas chamber 30). That is, in the second embodiment, the pair of electrodes 24 are covered with the insulator and are not exposed to the gas chamber 30.

  A power supply 25 that generates a high-frequency AC voltage is electrically connected to the pair of electrodes 24. When an AC voltage is applied from the power supply 25 to the pair of electrodes 24 covered with an insulator (here, the wall portion of the nozzle member 21), a so-called silent discharge (dielectric barrier discharge) is caused between the pair of electrodes 24. Plasma is also generated. As described in the first embodiment, this plasma causes a discharge reaction in oxygen and water contained in the gas in the gas chamber 30 to generate active oxygen such as oxygen radicals, hydroxyl radicals, ozone and hydrogen peroxide, and ultraviolet rays. Is generated. And the treated water W is sterilized by supplying the gas containing these components to the treated water W in the processing tank 2 from the downstream end part (exit member 31) of the gas chamber 10 as the bubble B.

  As described above, in the second embodiment, since the pair of electrodes 24 are covered with the insulator, silent discharge can be generated between the pair of electrodes 24, and consumption of the electrodes 24 is effectively suppressed. be able to. Other functions and effects of the water treatment device of the second embodiment are the same as those of the first embodiment.

  In the second embodiment, the pair of electrodes 24 are embedded in the wall portion of the nozzle member 21 made of an insulator, but the electrode 24 covered with an insulator separate from the nozzle member 21 is covered with the inner wall surface of the nozzle member 21. You may make it attach to. In the second embodiment, both the pair of electrodes 24 are covered with an insulator. However, only one of the pair of electrodes 24 may be covered with an insulator. These points are the same in the following embodiments.

<Third Embodiment>
Next, with reference to FIG. 3, the structure of the water treatment apparatus concerning 3rd Embodiment of this invention is demonstrated. In FIG. 3, the same components as those of the second embodiment (FIG. 2) are denoted by the same reference numerals, and detailed description thereof is omitted. This also applies to the fourth to sixth embodiments described later.

  In the water treatment apparatus of the third embodiment, the gas introduction pipe 16 through which the gas sent out from the pump 15 circulates and the inside of the treatment tank 2 in which the treated water W is stored are communicated with each other via a pipe 41. ing. A tip 41a, which is an end of the pipe 41 on the gas introduction pipe 16 side, is formed in a tapered shape and communicates with the inside of the gas introduction pipe 16 through an opening having a minute diameter.

  In the above configuration, when the gas from the pump 15 passes through the gas introduction pipe 16, the treated water W in the treatment tank 2 passes through the pipe 41 due to the pressure difference between the treated water W and the inside of the gas introduction pipe 16. Suctioned to the 16th side. The suctioned treated water W is supplied to the inside of the gas introduction pipe 16 in a mist state by being ejected from a small-diameter opening provided at the tip 41a of the pipe 41. As a result, moisture (water vapor) is forcibly replenished to the gas passing through the gas introduction pipe 16, so that a sufficiently wetted gas is supplied to the gas chamber 30.

  As described above, in the third embodiment of the present invention, the pipe 41 that connects the gas introduction pipe 16 and the processing tank 2 forcibly includes moisture in the gas supplied to the gas chamber 30. Function as. Thereby, since moisture is surely contained in the gas supplied to the gas chamber 30, when a voltage for plasma discharge is applied between the pair of electrodes 24, the reaction formula described in the first embodiment ( Based on 1) to (3), a sufficient amount of hydroxy radical (.OH) can be generated. Since the hydroxy radical has a strong oxidizing power as described above, the treated water W can be more effectively supplied by supplying a gas sufficiently containing such a hydroxyl radical as the bubble B to the treated water W. It can be sterilized.

<Fourth embodiment>
Next, with reference to FIG. 4, the structure of the water treatment apparatus concerning 4th Embodiment of this invention is demonstrated.

  In addition to the pipe 41 described above, the water treatment apparatus according to the fourth embodiment includes an electric flow rate adjustment valve 43 provided in the middle of the pipe 41 so as to be openable and closable, and a controller 45 for controlling the flow rate adjustment valve 43. And a humidity sensor 47 for detecting the humidity of the gas sent from the pump 15 through the gas introduction pipe 16.

  The controller 45 is composed of a well-known CPU, RAM, ROM, etc., and receives the humidity information input from the humidity sensor 47 and has a function of controlling the opening degree of the flow rate adjusting valve 43 according to the humidity value. Have.

  Specifically, when the humidity of the gas sent from the pump 15 is low, the controller 45 increases the opening degree of the flow rate adjustment valve 43 and increases the flow rate of the treated water W sucked through the pipe 41. As a result, a relatively large amount of water (water vapor) is supplied into the gas introduction pipe 16, so that the humidity of the gas is sufficiently increased. On the other hand, when the humidity of the gas sent from the pump 15 is high, the controller 45 reduces the opening of the flow rate adjustment valve 43 and decreases the flow rate of the treated water W sucked through the pipe 41. Thereby, the rise range of the humidity of gas is suppressed. Note that when the humidity of the gas is sufficiently high, the flow rate adjustment valve 43 may be closed.

  Thus, the controller 45 controls the opening degree of the flow rate adjustment valve 43 according to the humidity of the gas sent from the pump 15 and adjusts the amount of moisture supplied to the gas introduction pipe 16, thereby providing a gas chamber. 30 has a function of maintaining the humidity of the gas supplied to 30 within a certain range.

  As described above, the water treatment apparatus of the fourth embodiment is provided in the middle of the pipe 41 and the pipe 41 as the wetting means for forcibly including moisture in the gas supplied to the gas chamber 30. It has a flow control valve 43 and a controller 45 that controls the opening of the flow control valve 43 in accordance with the humidity of the gas. Thereby, since the humidity of the gas supplied to the gas chamber 30 can be maintained constant, the sterilizing effect of the treated water W can be stably exhibited.

  As an aspect different from the fourth embodiment, for example, as shown in FIG. 5, a pump 50 that forcibly sucks the treated water W in the treatment tank 2 may be provided in the pipe 41. In this case, it is possible to adjust the moisture replenishment amount, and hence the humidity of the gas, by controlling the rotational speed of the pump 50 and the like.

<Fifth Embodiment>
Next, with reference to FIG. 6, the structure of the water treatment apparatus concerning 5th Embodiment of this invention is demonstrated.

  In the water treatment device of the fifth embodiment, the gas supply device 63 that supplies gas to the gas chamber 30 includes a pump 65 that pumps the gas, a first pipe 66 connected to the pump 65, and a downstream of the first pipe 66. And a second pipe 67 provided on the side.

  A water tank 68 in which liquid water W ′ is stored is provided between the first pipe 66 and the second pipe 67. The gas supplied from the first pipe 66 to the water tank 68 is introduced into the second pipe 67 after passing through the water W ′ stored in the water tank 68 as indicated by an arrow shown in the water tank 68. Thereby, sufficient moisture (water vapor) is contained in the gas introduced into the second pipe 67.

  In the water treatment apparatus of the fifth embodiment, the water supply unit 63 is provided with a water tank 68 as a wetting means for forcibly including moisture in the gas supplied to the gas chamber 30, so that it is supplied to the gas chamber 30. Gas to be moistened.

<Sixth Embodiment>
Next, with reference to FIG. 7, the structure of the water treatment apparatus concerning 6th Embodiment of this invention is demonstrated.

  In addition to the components of the second embodiment (FIG. 2), the water treatment device of the seventh embodiment includes a pair of submerged electrodes 71 disposed opposite to each other in the state of being separated from each other inside the treatment tank 2, and And an underwater electrode power source 72 that repeatedly applies high-frequency high-voltage pulses to the underwater electrode 71.

  When a voltage is applied from the underwater electrode power source 72, an electric field is formed between the pair of underwater electrodes 71. This electric field acts on the bubbles B released from the gas chamber 30 and drifting in the treated water W to cause the discharge reaction and the generation reaction of hydroxy radicals as shown in the above reaction formulas (1) to (3). Repeatedly in B. Furthermore, ultraviolet rays, ozone, hydrogen peroxide, and the like are also generated with the reaction.

  As already described, since the gas radicalized by the plasma discharge is supplied from the gas chamber 30 to the treated water W as the bubbles B, free electrons already exist in the bubbles B. For this reason, it is possible to continue the discharge reaction or the like in the bubble B without applying a very large voltage to the underwater electrode 71.

  As described above, according to the seventh embodiment in which the underwater electrode 71 is provided inside the treatment tank 2, an electric field acts on the bubbles B in the treated water W to continuously generate active oxygen such as hydroxy radicals and ultraviolet rays. Since it produces | generates, the disinfection effect of the treated water W can be improved more.

<Seventh embodiment>
Next, with reference to FIG. 8, the structure of the water treatment apparatus concerning 7th Embodiment of this invention is demonstrated.

  As shown in FIG. 8, in the seventh embodiment, an introduction part 106 for introducing treated water W is connected to one end of the treatment tank 102, and treated water W is fed to the other end of the treatment tank 102. A discharge unit 107 for discharging is connected. That is, the treated water W introduced into the treatment tank 102 through the introduction unit 106 flows through the inside of the treatment tank 102 in a certain direction (specific direction X shown in FIG. 8), and then passes through the derivation unit 107 to the outside of the treatment tank 102. Is discharged.

  A nozzle member 81 for supplying bubbles B to the treated water W inside the treatment tank 102 is attached. The nozzle member 81 has a plurality of nozzles 81A to 81C attached to the processing tank 102 and a plurality of nozzles 81D to 81F attached to the surface of the processing tank 102 facing the nozzles 81A to 81C. The plurality of nozzles 81A to 81C are arranged side by side in the specific direction X and extend in a direction perpendicular to the specific direction X. The same applies to the plurality of nozzles 81D to 81F.

  A gas chamber 90 is formed in each of the nozzles 81 </ b> A to 81 </ b> F, and gas is supplied to each gas chamber 90 from a gas supply device 93. The gas supply device 93 includes a pump (not shown) and a plurality of gas introduction pipes 96 extending from the pump, and downstream ends of the gas introduction pipes 96 are connected to the nozzles 81A to 81F. ing. An outlet member 91 made of a porous material or a mesh member is provided at the downstream end of each gas chamber 90.

  When gas is supplied to the gas chamber 90 of each nozzle 81 </ b> A to 81 </ b> F, the gas passes through the outlet member 91 downstream of the gas chamber 90 in the flow direction of the treated water W in the treatment tank 102 (that is, the specific direction X). Sent in a vertical direction. As a result, a large number of bubbles B are supplied to the treated water W, and the supplied bubbles B ride on the flow of the treated water W and flow downstream.

  Each nozzle 81 </ b> A to 81 </ b> F is provided with a pair of electrodes 74. Specifically, the pair of electrodes 74 are attached in a state where they are not exposed to the gas chamber 90 by being embedded in each wall portion of the nozzles 81A to 81F made of an insulator.

  A power source 105 that generates a high-frequency AC voltage is electrically connected to the pair of electrodes 74 provided in each of the nozzles 81A to 81F. However, in FIG. 8, for convenience of illustration, one power source 105 is shown on the left and right.

  When an AC voltage is applied from the power source 105 to the electrodes 74 of the nozzles 81A to 81F, a gas containing various radicals such as oxygen radicals, hydroxy radicals, ozone, hydrogen peroxide, etc. is generated by silent discharge. It is generated in the gas chamber 90. And the gas containing this radical is discharge | released as the bubble B from the exit member 91 of the gas chamber 90, and the process water W is sterilized by being supplied to the process water W which flows through the inside of the process tank 102 in the specific direction X. The

  As described above, in the seventh embodiment of the present invention, the gas containing radicals is sent to the treated water W from the plurality of nozzles 81A to 81F arranged along the flow of the treated water W in the treatment tank 102. As a result, the treated water W can be sterilized in a shorter time. In FIG. 8, a single power source 105 is used for the nozzles 81A to 81F. However, different power sources may be prepared for the left nozzles 81A to 81C and the right nozzles 81D to 81F in the drawing. Alternatively, a separate power source may be prepared for each of the nozzles 81A to 81F.

  FIG. 9 is a diagram showing a modification of the seventh embodiment. In this modification, a plurality of nozzles 81 </ b> A ′ to 81 </ b> F ′ that are long in the depth direction Y of the processing tank 102 are provided as nozzle members. According to such a configuration, even if the size of the processing tank 102 is large, the bubbles B can be supplied to the entire processing tank 102, and the sterilizing effect can be further enhanced. In FIG. 9, a set of nozzles whose positions in the vertical direction are the same, that is, a set of nozzles 81A ′ and 81D ′, a set of nozzles 81B ′ and 81E ′, and a set of nozzles 81C ′ and 81F ′. Common power supplies 105A, 105B, and 105C are prepared.

  In addition, when a nozzle having a long cross section is attached to the treatment tank 102 as described above, since a relatively large number of bubbles are supplied from one nozzle, the treatment water W is not necessarily provided as in the seventh embodiment. It is not necessary to provide a plurality of nozzles along the flow direction (specific direction X), and one nozzle may be provided in the same direction.

  As mentioned above, although preferable embodiment of this invention was described, various deformation | transformation are possible in the range which does not deviate from the scope of this invention besides each embodiment mentioned above.

  For example, the gas supply device may supply a gas containing chlorine to the gas chamber (inside the nozzle member). In this case, chlorine radicals are generated by plasma discharge generated between a pair of electrodes sandwiching the gas chamber. Since the chlorine radical has a strong sterilizing effect, the treated water can be effectively sterilized.

  Further, the bubbles generated by the gas supplied from the gas chamber to the treated water are not necessarily limited to microbubbles (bubbles having a diameter of 100 μm or less). Depending on the required level of sterilization effect, bubbles having a diameter exceeding 100 μm may be supplied to the treated water. In the case where the bubble diameter can be increased, it is possible to omit the outlet member (miniaturization means) for miniaturizing the bubbles.

1,21,81 Nozzle member 2,102 Treatment tank 3,63,93 Gas supply device 4,24,74 Electrode 5,25,105 Power source 10,30,90 Gas chamber 11,31,91 Outlet member (miniaturization means) )
41 Piping (wetting means)
71 Underwater electrode 72 Power supply for underwater electrode 81A to 81F Nozzle B Bubble W W Treated water

Claims (7)

A nozzle member forming a gas chamber therein;
A pair of electrodes opposed to each other with the gas chamber interposed therebetween;
A treatment tank for storing treated water in a space communicating with the gas chamber;
A gas supply device for generating bubbles in the treated water by supplying gas to the gas chamber and sending the gas from the downstream end of the gas chamber to the treated water in the treatment tank;
A water treatment apparatus comprising: a power source that generates plasma discharge by applying a voltage to the pair of electrodes. The water treatment device according to claim 1,
The pair of electrodes extend along a gas flow direction in a gas chamber that flows toward the treatment tank. The water treatment apparatus according to claim 1 or 2,
A water treatment apparatus, characterized in that a finer means for refining bubbles supplied to the treated water is provided at a downstream end of the gas chamber. In the water treatment apparatus of any one of Claims 1-3,
A water treatment apparatus, wherein at least one of the pair of electrodes is covered with an insulator. In the water treatment apparatus of any one of Claims 1-4,
A water treatment apparatus, further comprising a wetting means for containing moisture in the gas supplied from the gas supply apparatus to the gas chamber. In the water treatment apparatus of any one of Claims 1-5,
The treated water in the treatment tank flows in a specific direction,
The said nozzle member has a some nozzle arrange | positioned along with the said specific direction, Gas is sent out in the direction perpendicular | vertical to the said specific direction from the gas chamber inside each nozzle, The water treatment apparatus characterized by the above-mentioned. In the water treatment apparatus of any one of Claims 1-6,
A pair of underwater electrodes disposed opposite to each other inside the treatment tank;
A power source for an underwater electrode for applying a voltage to the underwater electrode;
A water treatment apparatus, wherein a gas generated by the nozzle member is supplied between the pair of underwater electrodes.

Images