JP2014152874A - Process gas diversion supply device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To feed process gas to many process gas feeder devices installed at far locations through one unit of process gas diversion supply device.SOLUTION: This invention has some features that an inlet valve 13A comprises a main body block 34 having a valve seat 22 to which a diaphragm valve body 21 is abutted or spaced away, a valve chamber 23, an input flow passage 24 to which gas flows in, a first output flow passage 25 where gas always flows out and a second output flow passage 30 from which gas flows out while the diaphragm valve body 21 is spaced away from the valve seat 22, that the input flow passage 24 and the first output flow passage 25 have a communicating part 26 just below the valve seat 22, that an input port 24a of the input flow passage 24, a first output port 25a of the first output flow passage 25 and a second output port 30a of the second output flow passage 30 are arranged in one line at the lower surface of the main body block 34 and that a port of the second output flow passage 30 opposite to the second output port 30a is arranged on a line crossing at right angle with one line L1 in the valve chamber 23.

Description

  The present invention relates to a process gas diversion supply apparatus. More specifically, the present invention relates to a process gas diversion supply device having a plurality of process gas supply units each including a process gas main valve for supplying a process gas, a purge gas original valve for supplying a purge gas, and a process gas valve and a purge gas valve. is there.

One of the semiconductor manufacturing processes is to form a thin film such as silicon oxide as a circuit material on the surface of a wafer in a chamber by a plurality of types of process gases. The process gas is supplied to the chamber by a process gas supply device. A plurality of chambers and process gas supply apparatuses are installed in the factory.
On the other hand, in the factory, a process gas diversion supply device for supplying process gas to a plurality of process gas supply devices is installed. One process gas shunt supply device supplies one type of process gas to a plurality of process gas supply devices. At this time, the pressure of the process gas supplied from the process gas supply device to the chamber is 0.3 to 0.5 MPa.
Conventionally, an integrated valve unit used in a process gas supply apparatus is disclosed in Patent Documents 1 and 2.

Japanese Patent No. 4283884 JP 2003-49962 A

However, each of the conventional techniques described above is an integrated valve used in a process gas supply apparatus, and is not related to a process gas diversion supply apparatus.
Therefore, the present applicant has devised a process gas diversion supply device 100 (not shown) including a process gas valve 101 as shown in FIG. The process gas valve 101 includes a valve seat 22 with which the diaphragm valve body 21 contacts or separates, a valve chamber 23, an input flow path 102 into which process gas flows, and a first output flow path 103 through which process gas always flows out. The main body block 105 is formed with a second output flow path 104 through which the process gas flows when the diaphragm valve body 21 is separated from the valve seat 22.

FIG. 13 is a diagram showing the main body block 105 of the process gas valve 101 in FIG. The input port 102a of the input flow path 102, the first output port 103a of the first output flow path 103, and the second output port 104a of the second output flow path 104 are formed in a straight line L2. Around each port, a seal member storage portion 36 for the seal member 29 is formed. Although not specifically shown, the seal member 29 is a known metal gasket or an O-ring made of an elastomer member.
FIG. 12 shows a schematic diagram of the DD cross section of FIG. An output port 102b which is the opposite port in the input port 102a and the input flow path 102, a first input port 103b which is the opposite port in the first output port 103a and the first output flow path 103, and a second output port 104a The second input port 104b, which is the opposite port in the second output flow path 104, is formed on the same straight line L2 as in FIG.

  When a process gas flows through the process gas valve 101 in the closed state, it flows through the input flow path 102 and flows into the valve chamber 23 via the output port 102b. As shown in FIG. 11, since the diaphragm valve body 21 is in contact with the valve seat 22, the process gas does not flow into the second output flow path 104. On the other hand, the process gas always flows from the valve chamber 23 to the first output channel 103 via the first input port 103b. In the process gas valve 101, the process gas could be used at a pressure of 0.7 MPa or less.

  However, when a process gas having a predetermined pressure is supplied to a distant process gas supply device installed on a higher floor, as an example, a process gas of about 1 MPa is supplied from the process gas diversion supply device. However, the process gas valve 101 can be used only with a process gas having a pressure of 0.7 MPa or less. For this reason, the process gas diversion supply device 100 including the process gas valve 101 is provided on each higher floor. As a result, a large number of expensive process gas shunt supply apparatuses 100 must be purchased, resulting in an increase in cost. In addition, an extra space for installing the device on each floor had to be secured.

  On the other hand, in order to reduce the number and reduce the cost, a process gas valve that can be used even with a process gas of about 1 MPa is required. However, since the high pressure process gas always flows into the valve chamber 23 when the process gas valve 101 is closed, a high pressure is applied to the diaphragm valve body 21 with respect to the valve chamber 23. Since the pressure receiving area is large as described above, the force for pushing up the diaphragm valve body 21 becomes large, and the spring force for pushing down the pushed up diaphragm valve body 21 has to be strengthened. As a result, the valve drive unit such as an actuator for moving the diaphragm valve element 21 against the spring force has to be enlarged, and the entire apparatus has been enlarged.

  It is an object of the present invention to provide a process gas diversion supply device that solves the above problems. That is, the problem is to provide a process gas diversion supply device that can supply process gas to a number of process gas supply devices installed at a distance by one process gas diversion supply device.

In order to achieve the above object, a process gas diversion supply apparatus according to an aspect of the present invention has the following configuration.
(1) A process gas shunt supply device having a plurality of process gas supply units each including a process gas main valve for supplying a process gas, a purge gas original valve for supplying a purge gas, and a process gas valve and a purge gas valve. The valve includes a valve seat with which the valve body abuts or separates, a valve chamber, an input flow path through which gas flows, a first output flow path through which the gas always flows out, and the valve body is separated from the valve seat. Having a main body block formed with a second output flow path through which the gas flows out, the input flow path and the first output flow path having a communicating portion directly under the valve seat, The input port of the input flow path, the first output port of the first output flow path, and the second output port of the second output flow path are arranged in a straight line on the lower surface of the main body block. The second out Of the flow path, ports opposite to the second output port, being disposed in a line perpendicular to the line of the valve chamber, characterized by.
(2) In the process gas supply device described in (1), the pressure of the high-pressure process gas is applied to the valve hole formed by the communication portion of the process gas valve and the valve seat. preferable.

(3) In the process gas supply apparatus described in (1) or (2), a seal member storage portion for storing a seal member for sealing is formed on the lower surface of the main body block. Preferably, the second output flow path is formed so that the second output port side is inclined and has an inclination angle at which the drill does not interfere with the seal member housing portion when being cut by a drill.

The present invention has the following configuration and effects as follows.
According to the aspects of (1) and (2), when the process gas valve is closed, the portion that receives the high-pressure process gas is only the valve hole, and the pressure receiving area is small. Therefore, there is no need to increase the spring force to push down the valve body that has been pushed up, and the valve drive unit such as an actuator is increased to hold down the spring, contributing to the downsizing of the device without increasing the size of the entire device. can do.
Furthermore, since a process gas can be supplied to a large number of process gas supply apparatuses installed remotely by a single process gas diversion supply apparatus, it is not necessary to prepare a large number of apparatuses, thereby avoiding the problem of cost increase. be able to.
According to the aspect of (3), the original lower block can be used without newly recreating the lower block, so that replacement is easy.

It is the figure which showed the AA cross section of FIG. 3 about an inlet valve. It is the figure which showed the circuit of the process gas shunt supply apparatus concerning this invention. It is the top view which embodied FIG. 2 about the process gas shunt supply apparatus. It is the side view which showed FIG. 3 from the right direction about the process gas shunt supply apparatus. It is the figure which showed the plane of the inlet valve. It is the figure which showed FIG. 5 from the G direction about the inlet valve. It is the figure which showed FIG. 5 from the H direction about the inlet valve. It is the schematic which showed the BB cross section of FIG. 1 about the inlet valve. It is the figure which showed the main body block of FIG. 1 from the J direction about the inlet valve. It is the figure which showed CC cross section of FIG. 1 about an inlet valve. It is the figure which showed the cross section about the conventional process gas valve. It is the schematic which showed the DD cross section of FIG. 11 about the conventional process gas valve. It is the figure which showed the main body block of FIG. 11 from the K direction about the conventional process gas valve.

Next, embodiments of the present invention will be described in detail below with reference to the drawings.
<Configuration of process gas diversion supply device>
FIG. 2 is a circuit diagram of the process gas diversion supply apparatus 1 of the present invention. FIG. 3 is a plan view of the process gas diversion supply device 1 which embodies the circuit diagram of FIG.
As shown in FIG. 2, the process gas supply source S1 for supplying the process gas is connected to the inlet port of the process gas main valve 11 which is a rotary manual valve. The outlet port of the process gas main valve 11 is branched and connected to the inlet ports of the inlet valves 13A, 13B, and 13C. Furthermore, the outlet ports of the inlet valves 13A, 13B, and 13C are connected to the inlet ports of the regulators 15A, 15B, and 15C via the flow paths 37A, 37B, and 37C, respectively. The outlet ports of the regulators 15A, 15B, 15C branch off and are connected to the pressure gauges 16A, 16B, 16C and the inlet ports of the outlet valves 17A, 17B, 17C. The operator adjusts the regulator 15 while looking at the pressure gauge 16 and sets it to a necessary pressure. The outlet ports of the outlet valves 17A, 17B, and 17C are connected to the process gas supply devices 3A, 3B, and 3C.
A purge gas supply source S2 for supplying the purge gas is connected to the inlet port of the purge gas main valve 12, which is a rotary manual valve. The outlet port of the purge gas main valve 12 is connected to a check valve 19 for preventing backflow. The check valve 19 is connected to the inlet ports of the purge gas valves 14A, 14B, and 14C. The outlet ports of the purge gas valves 14A, 14B, and 14C are respectively connected between the outlet port side of the inlet valves 13A, 13B, and 13C and the inlet port side of the regulators 15A, 15B, and 15C.

  An implementation of the circuit diagram of FIG. 2 is shown in FIG. In the process gas diversion supply device 1, a process gas main valve 11 and a purge gas main valve 12 are arranged in parallel at the upper left. A plurality of rails 18 are formed on the right side of the purge gas main valve 12. On the rail 18, an inlet valve 13, a purge gas valve 14, a regulator 15, a pressure gauge 16, and an outlet valve 17 are arranged in this order from bottom to top. The process gas main valve 11 and the inlet valve 13 communicate with each other through a pipe 10. The purge gas main valve 12 and the purge gas valve 14 communicate with each other through a check valve 19 and a pipe 20.

  FIG. 4 is a side view showing FIG. 3 from the right direction. The process gas supply unit 2 is formed by the inlet valve 13, purge gas valve 14, regulator 15, pressure gauge 16, and outlet valve 17 on the rail 18. The inlet valve 13 communicates with the regulator 15 through a supply flow path 37 formed in the lower body 41 and a pipe 45. The regulator 15 and the pressure gauge 16 communicate with each other through a V-shaped flow path 46 formed in the lower body 49, and the pressure gauge 16 and the outlet valve 17 communicate with each other through a V-shaped flow path 47 formed in the lower body 49. The outlet valve 17 outputs from the process gas diversion supply device 1 to the outside through the flow path 48.

<External structure of inlet valve>
Next, the external structure of the single inlet valve 13 will be described. FIG. 5 shows a plan view of the inlet valve 13. FIG. 6 shows a side view of the inlet valve 13 shown from the direction G of FIG. FIG. 6 is a partial cross-sectional view. FIG. 7 shows a side view of the inlet valve 13 shown from the H direction in FIG.
As shown in FIG. 5, the rotary valve 44 is positioned at the center of the inlet valve 13, and “Closed” is displayed at the top and bottom. A knob 44 in FIG. 5 shows the inlet valve 13 in the valve open state. The knob 44 in the closed state is turned 90 degrees clockwise from the opened state (not shown). As shown in FIGS. 6 and 7, the inlet valve 13 is formed of an upper block 40 including a knob 44 and a main body block 34.

<Internal structure of inlet valve>
Next, an internal structure for connecting the plurality of inlet valves 13A and 13B will be described. FIG. 1 shows a cross section taken along the line AA of FIG. Portions common to the process gas valve in FIG. 11 are denoted by common numbers.
The main body block 34 of the inlet valve 13A includes a valve seat 22 with which the diaphragm valve body 21 contacts or separates, a valve chamber 23, an input flow path 24 into which process gas flows, and a first output flow through which process gas always flows out. The passage 25 and the second output passage 30 through which the process gas flows out when the diaphragm valve body 21 is separated from the valve seat 22 are formed. The diaphragm valve body 21 is brought into contact with or separated from the valve seat 22 by a pressing member 27 pressed by the pressing force from the actuator. The input channel 24 and the first output channel 25 are always in communication. On the other hand, the input flow path 24 and the second output flow path 30 are in communication with each other only when the valve is opened. A communication portion 26 that connects the input flow path 24 and the first output flow path 25 is connected immediately below the valve seat 22. A valve hole 33 is formed by the communication portion 26 and the valve seat 22. The material of the member of the valve seat 22 is a fluororesin (PCTFE). Further, the diaphragm valve body 21 is formed by superimposing thin metal plates.

A lower block 35 is attached below the main body block 34. The lower block 35 includes a lower body 41 and a common body 42. A supply channel 37 is formed in the lower body 41. The supply flow path 37 communicates with the second output flow path 30 formed in the main body block 34. The supply flow path 37 communicates with the regulator 15. A common channel 38 is formed in the common body 42. The input port 38 a of the common flow path 38 communicates with the first output flow path 25 formed in the main body block 34. The output port 38b of the common flow path 38 communicates with the input flow path 24 of the inlet valve 13B.
In addition, since the inlet valve 13B has the same configuration as the inlet valve 13A, common numbers are not shown and detailed description thereof is omitted. The inlet valve 13 corresponds to a “process gas valve” described in the claims, and the diaphragm valve body 21 corresponds to a “valve body” described in the claims.

FIG. 9 is a view showing the main body block 34 of the inlet valve 13 in FIG. On the lower surface of the main body block 34, the input port 24a of the input flow path 24, the first output port 25a of the first output flow path 25, and the second output port 30a of the second output flow path 30 are in a straight line L1. Has been placed. Around each port, a seal member accommodating portion 36 for accommodating a seal member 29 for sealing the main body block 34 and the lower block 35 is formed.
FIG. 8 is a schematic view showing a BB cross section of the inlet valve 13 in FIG. 1. The port 30 b opposite to the second output port 30 a of the second output flow path 30 is disposed on a line orthogonal to the straight line L 1 of the valve chamber 23.
FIG. 10 is a view showing a CC cross section of the inlet valve 13 in FIG. 1. The second output flow path 30 is formed so that the second output port 30a side is inclined from the middle. Further, the second output port 30a is vertically formed from the port 30b opposite to the middle to the middle. The inclination angle θ of the second output flow path 30 is an angle such that the drill does not interfere with the seal member housing portion 36 when the main body 28 is cut by a drill to form the flow path. In other words, the thickness of the closest portion between the seal member storage portion 36 and the second output flow path 30 is set to a level that can secure about 1 mm.

<Effect>
Next, the operation and effect of supplying the process gas to the process gas supply apparatus 3 after being divided by the process gas distribution supply apparatus 1 of the present invention will be described.
When the process gas is supplied to the process gas supply devices 3A, 3B, 3C,..., In order to maintain a predetermined pressure up to a distant device installed on a higher floor, a process gas of about 1 MPa is supplied from the process gas supply source S1. To the process gas diversion supply device 1.
The process gas is diverted from the process gas main valve 11 to the inlet valves 13A, 13B, 13C. At this time, it flows into the input flow path 24 of the inlet valve 13A, branches via the communication portion 26, and flows to the first output flow path 25 and the valve chamber 23. This is because the inlet valve 13 in the opened state is such that the diaphragm valve body 21 is separated from the valve seat 22, so that the input flow path 24 and the flow path of the valve chamber 23 are in communication. The process gas that has flowed to the first output flow path 25 flows to the common flow path 38 and flows into the input flow path 24 of the adjacent inlet valve 13B. Similarly, it flows into the inlet valves 13C.
On the other hand, the process gas that has flowed into the valve chamber 23 flows into the second output flow path 30 and flows into the supply flow path 37 and the pipe 45 via the second output port 30a. The operator adjusts the regulator 15A into which the process gas flows while looking at the pressure gauge 16A, and sets the pressure to a necessary pressure for supplying the process gas to the process gas supply device 3A. Further, the gas is supplied to the process gas supply device 3A via the outlet valve 17A. The process gas flowing into the inlet valves 13B, 13C,... Is also supplied to the process gas supply devices 3B, 3C,.
Thus, the process gas is supplied to the process gas supply device 3 while being divided by the process gas diversion supply device 1 of the present invention. The purge gas main valve 12 and the purge gas valve 14 are in a closed state.

Next, a case where maintenance is performed on any device of the process gas supply unit 2 of the process gas diversion supply apparatus 1 will be described.
For example, when replacing the regulator 15A of the process gas supply unit 2A, the operator closes the inlet valve 13A and stops the process gas from flowing into the process gas supply unit 2A. However, since the process gas remains in the flow path as it is, it is necessary to replace the purge gas. Therefore, the purge gas source valve 12 and the purge gas valve 14A are opened. The check valve 19 is opened by the fluid pressure of the purge gas. The purge gas supplied from the purge gas main valve 12 flows into the purge gas valve 14A, and flows out from the process gas supply unit 2A through the regulator 15A, the pressure gauge 16A, and the outlet valve 17A. As a result, the process gas is replaced with the purge gas, so that the regulator 15A can be replaced.

  Here, the closed state of the inlet valve 13A is a state in which the diaphragm valve body 21 is in contact with the valve seat 22 as shown in FIG. That is, the input flow path 24 and the flow path of the valve chamber 23 are blocked. Therefore, the process gas supplied from the process gas main valve 11 does not flow into the valve chamber 23 after flowing into the input flow path 24. On the other hand, the process gas that has flowed into the input flow path 24 flows to the first output flow path 25 via the communication portion 26. Therefore, the valve hole 33 is subjected to a high-pressure process gas pressure of about 1 MPa when the valve is closed.

The portion of the process gas valve 101 in FIG. 11 that receives the pressure of the process gas is the valve chamber 23, and the pressure receiving area was large. Therefore, since the force for separating the diaphragm valve body 21 from the valve seat is large, it is necessary to increase the spring force for pushing down the diaphragm valve body 21 that has been pushed up. As a result, the entire apparatus has been increased in size in order to increase the valve driving unit such as an actuator for pressing the spring.
On the other hand, the part that receives the pressure of the process gas with respect to the inlet valve 13 in FIG. 1 is the valve hole 33, and the pressure receiving area is smaller than the process gas valve in FIG. Therefore, since the force for separating the diaphragm valve body 21 from the valve seat 22 is small, it is not necessary to increase the spring force for pushing down the pushed-up diaphragm valve body 21. As a result, it is not necessary to enlarge the valve driving unit such as an actuator that presses the spring, and the entire apparatus may not be enlarged.

  According to the process gas diversion supply apparatus 1 of the present invention, as an example, a high-pressure process gas of about 1 MPa can be used, and therefore, a large number of process gas supplies installed far away by one process gas diversion supply apparatus 1. A process gas can be supplied to the apparatus 3. Therefore, it is not necessary to prepare a large number of apparatuses in order to install the process gas diversion supply apparatus on each floor, and the problem of cost increase can be avoided.

  The second output flow path 30 is inclined at an inclination angle θ at which the second output port 30 a side from the middle does not interfere with the seal member storage portion 36. Therefore, the lower block 35 used in the process gas valve 101 of FIG. 11 can be shared as it is. Therefore, it is only necessary to replace the main body block 105 with the main body block 34 according to the present invention, and the replacement is easy. Further, it is not necessary to manufacture a new lower block, and the problem of cost increase can be avoided.

As explained in detail above,
(1) Process gas shunt supply apparatus 1 having a plurality of process gas supply units 2 each including a process gas main valve 11 for supplying a process gas, a purge gas main valve 12 for supplying a purge gas, an inlet valve 13 and a purge gas valve 14. The inlet valve 13 includes a valve seat 22 with which the diaphragm valve body 21 contacts or separates, a valve chamber 23, an input flow path 24 into which gas flows in, a first output flow path 25 through which gas always flows out, The diaphragm valve body 21 has a main body block 34 formed with a second output flow path 30 through which gas flows out by separating from the valve seat 22, and the input flow path 24 and the first output flow path 25 have a valve seat. 22, the communication portion 26 is provided directly below the main body block 34, and the input port 24 a of the input flow path 24, the first output port 25 a of the first output flow path 25, and the second output flow path are provided on the lower surface of the main body block 34. The second output port 30a of 0 is arranged in a straight line L1, and the port 30b of the second output flow path 30 opposite to the second output port 30a is on a line orthogonal to the straight line L1 of the valve chamber 23. (2) In the process gas supply apparatus 1 described in (2) and (1), the high-pressure process gas is introduced into the communication hole 26 of the inlet valve 13 and the valve hole 33 formed by the valve seat 22. Since the pressure is applied, when the inlet valve 13 is closed, only the valve hole 33 receives the high-pressure process gas, and the pressure receiving area is small. Therefore, there is no need to increase the spring force for pushing down the diaphragm valve body 21 that has been pushed up, and the valve drive unit such as an actuator is enlarged to press down the spring, and the size of the device is reduced without increasing the size of the entire device. Can contribute.
Furthermore, since the process gas can be supplied to a large number of process gas supply devices 3 installed at a distance by one process gas diversion supply device 1, it is not necessary to prepare a large number of devices, and this raises the problem of cost increase. It can be avoided.

(3) In the process gas supply apparatus 1 described in (1) or (2), the lower surface of the main body block 34 is formed with a seal member storage portion 36 for storing the seal member 29 for sealing. The second output flow path 30 is formed so that the second output port 30a side is inclined, and has an inclination angle θ that does not interfere with the seal member storage portion 36 when the drill is cut by the drill. Therefore, the original lower block 35 can be used without recreating the lower block 35, so that the replacement is easy.

In addition, this form is only a mere illustration and does not limit this invention at all. Accordingly, the present invention can naturally be improved and modified in various ways without departing from the gist thereof.
For example, the process gas valve is a manual valve in this embodiment, but may be a pilot valve.

DESCRIPTION OF SYMBOLS 1 Process gas shunt supply apparatus 2 Process gas supply unit 3 Process gas supply apparatus 11 Process gas main valve 12 Purge gas main valve 13 Inlet valve (process gas valve)
14 Purge gas valve 21 Diaphragm valve element (valve element)
22 Valve seat 23 Valve chamber 24 Input flow path 24a Input port 25 First output flow path 25a First output port 26 Communication portion 29 Seal member 30 Second output flow path 30a Second output port 30b Port opposite to the second output port 33 Valve hole 34 Main body block 36 Sealing member storage

Claims (3)

A process gas main valve for supplying process gas;
A purge gas main valve for supplying purge gas;
In a process gas diversion supply apparatus having a plurality of process gas supply units each including a process gas valve and a purge gas valve,
The process gas valve includes a valve seat with which a valve body abuts or separates, a valve chamber, an input flow path through which gas flows, a first output flow path through which the gas always flows out, and the valve body through the valve. Having a main body block formed with a second output flow path through which the gas flows out by separating from the seat;
The input flow path and the first output flow path have a communicating portion directly under the valve seat;
The input port of the input flow path, the first output port of the first output flow path, and the second output port of the second output flow path are arranged in a straight line on the lower surface of the main body block. about,
A port opposite to the second output port of the second output flow path is disposed on a line orthogonal to the straight line of the valve chamber;
Process gas diversion supply device characterized by. In the process gas diversion supply device according to claim 1,
The pressure of the high-pressure process gas is applied to the valve hole formed by the communication portion of the process gas valve and the valve seat;
Process gas diversion supply device characterized by. In the process gas diversion supply device according to claim 1 or 2,
A seal member storage portion for storing a seal member for sealing is formed on the lower surface of the main body block;
The second output flow path is formed with an inclination on the second output port side and has an inclination angle at which the drill does not interfere with the seal member storage when cut by a drill.
Process gas diversion supply device characterized by.

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