JP2014141697A - Plasma device and method of manufacturing carbon thin film using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a plasma device capable of continuing a film deposition process for a carbon thin film for a long time.SOLUTION: A plasma device 10 includes a vacuum container 1, an arc type evaporation source 3, a cathode member 4, a shutter 5, a power source 7, a trigger electrode 8, a sending-out mechanism 15, and a cutting mechanism 16. The arc type evaporation source 3 is formed in a hollow columnar shape, and fixed to an insulation member 13. The cathode member 4 is made of laminate carbon or glassy carbon, and arranged in the vacuum container 1 and the arc type evaporation source 3 through a through hole 1A. The power source 7 applies a negative voltage to the arc type evaporation source 3. The trigger electrode 8 comes into contact with the cathode member 4 or leaves it. The sending-out mechanism 15 sends the cathode member 4 out to the side of a substrate 20 once the cutting mechanism 16 cuts a front end part of the cathode member 4 on the side of the substrate 20. The cutting mechanism 16 cuts a front end part of the cathode member 4 each time the elapsed time from the start of an arc discharge reaches a desired timing.

Description

  The present invention relates to a plasma apparatus and a carbon thin film manufacturing method using the same.

  Conventionally, in an arc evaporation source used in a thin film forming apparatus for forming a thin film using arc discharge, an arc evaporation source in which coarse particles are prevented from adhering to a substrate is known (Patent Document 1).

  This arc evaporation source includes a vacuum vessel, a plasma duct, a porous member, a magnetic coil, and an evaporation source. One end of the plasma duct is attached to the vacuum vessel. The evaporation source is attached to the other end of the plasma duct.

  The magnetic coil is wound around the plasma duct. The magnetic coil guides plasma generated in the vicinity of the evaporation source to the vicinity of the substrate disposed in the vacuum vessel.

  The porous member is attached to the inner wall of the plasma duct and captures coarse particles that have jumped out of the cathode material attached to the evaporation source.

  As described above, the conventional vacuum arc deposition apparatus connects the evaporation source to the vacuum vessel by the plasma duct, captures the coarse particles jumping out from the cathode material by the porous member provided on the inner wall of the plasma duct, and the coarse particles are formed on the substrate. Suppresses flying in.

JP 2002-105628 A

  However, in the conventional vacuum arc vapor deposition apparatus, graphite (carbon) is used as a cathode material, and since graphite is produced by sintering carbon particles, there is a grain boundary. As a result, when graphite is used as the cathode member, there is a problem that the cathode member breaks along the grain boundary and coarse particles (particles) are generated. On the other hand, in an arc discharge using laminated carbon or glassy carbon as a cathode material, a discharge in which the arc spot does not move, that is, a discharge in which coarse particles (particles) are not generated can be generated. Since the cathode member evaporates only at the position, the discharge stops in a short time, and there is a problem that it is difficult to continue the film formation process of the carbon thin film for a long time.

  Accordingly, the present invention has been made to solve such a problem, and an object of the present invention is to provide a plasma apparatus capable of continuing a film forming process of a carbon thin film for a long time.

  Another object of the present invention is to provide a carbon thin film manufacturing method capable of continuing the carbon thin film forming process for a long time.

  According to the embodiment of the present invention, the plasma apparatus includes a vacuum vessel, an arc evaporation source, a cathode member, a holding member, a trigger electrode, a power source, a cutting mechanism, and a delivery mechanism. The arc evaporation source is fixed to the vacuum vessel. The cathode member is attached to an arc evaporation source and has a columnar shape whose length is larger than the diameter. The holding member holds the substrate disposed to face the cathode member. The trigger electrode contacts or separates from the cathode member. The power source applies a negative voltage to the arc evaporation source. The cutting mechanism cuts the tip portion of the cathode member on the substrate side every time the elapsed time from the start of arc discharge reaches a desired timing. The delivery mechanism sends the cathode member to the substrate side when the tip portion is cut. The cathode member is made of laminated carbon or glassy carbon.

  According to the embodiment of the present invention, the plasma apparatus includes a vacuum vessel, an arc evaporation source, a plurality of cathode members, a holding member, a trigger electrode, a power source, and a delivery mechanism. The arc evaporation source is fixed to the vacuum vessel. The plurality of cathode members are attached to the arc evaporation source and arranged in series to be accommodated in the cylindrical structure member. The holding member holds a substrate disposed to face the plurality of cathode members. The trigger electrode contacts or separates from the cathode member closest to the substrate among the plurality of cathode members. The power source applies a negative voltage to the arc evaporation source. The delivery mechanism feeds the plurality of cathode members to the substrate side so that the cathode member closest to the substrate comes out of the cylindrical member every time the elapsed time from the start of arc discharge reaches a desired timing. Each of the plurality of cathode members is made of laminated carbon or glassy carbon, and has a columnar shape whose length is larger than the diameter.

  Furthermore, according to the embodiment of the present invention, the method for producing a carbon thin film comprises an arc evaporation source fixed to a vacuum vessel facing a substrate, made of laminated carbon or glassy carbon, and having a length. A first step of attaching a cathode member having a columnar shape larger than the diameter, a second step of applying a negative voltage to the arc evaporation source, a third step of bringing a trigger electrode into contact with the cathode member, and an arc A fourth step of cutting the tip portion of the cathode member on the substrate side every time the elapsed time from the start of discharge reaches a desired timing, and a fifth step of sending the cathode member to the substrate side when the tip portion is cut. The process is provided.

  Furthermore, according to the embodiment of the present invention, a method for producing a carbon thin film comprises an arc type evaporation source fixed to a vacuum vessel facing a substrate, made of laminated carbon or glassy carbon, and arranged in series. A first step of attaching a plurality of cathode members accommodated in the cylindrical structure member, a second step of applying a negative voltage to the arc evaporation source, and a cathode closest to the substrate among the plurality of cathode members A third step of bringing the trigger electrode into contact with the member, and a plurality of cathode members on the substrate side so that the cathode member closest to the substrate comes out of the cylindrical member every time the elapsed time from the start of arc discharge reaches a desired timing Each of the plurality of cathode members has a columnar shape whose length is larger than the diameter.

  In the plasma apparatus according to the embodiment of the present invention, every time the elapsed time from the arc discharge start time at which the arc spot does not move reaches a desired timing, the new surface of the cathode member is opposed to the substrate, Arc discharge in which the arc spot does not move on the surface is started. As a result, a carbon thin film is formed using the entire cathode member having a columnar shape.

  Accordingly, the film formation time of the carbon thin film can be continued for a long time.

  In the carbon thin film manufacturing method according to the embodiment of the present invention, a new surface of the cathode member is opposed to the substrate every time the elapsed time from the arc discharge start time at which the arc spot does not move reaches a desired timing. Then, arc discharge is started in which the arc spot does not move on the new surface. As a result, a carbon thin film is formed using the entire cathode member having a columnar shape.

  Accordingly, the film formation time of the carbon thin film can be continued for a long time.

It is the schematic which shows the structure of the plasma apparatus by embodiment of this invention. It is the schematic which shows the structure of the sending mechanism shown in FIG. It is a conceptual diagram which shows the structure of the cathode member shown in FIG. It is a perspective view of the negative electrode member shown in FIG. It is a conceptual diagram for demonstrating the method in which the cutting | disconnection mechanism shown in FIG. 1 cut | disconnects the front-end | tip part of a cathode member. It is process drawing which shows the manufacturing method of the carbon thin film using the plasma apparatus shown in FIG. It is the schematic which shows the structure of another plasma apparatus by embodiment of this invention. It is a perspective view of the cathode member shown in FIG. It is a conceptual diagram for demonstrating the usage method of the cathode member in the plasma apparatus shown in FIG. It is process drawing which shows the manufacturing method of the carbon thin film using the plasma apparatus shown in FIG.

  Embodiments of the present invention will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated.

  FIG. 1 is a schematic diagram showing the configuration of a plasma apparatus according to an embodiment of the present invention. Referring to FIG. 1, a plasma apparatus 10 according to an embodiment of the present invention includes a vacuum vessel 1, a holding member 2, an arc evaporation source 3, a cathode member 4, a shutter 5, power supplies 6 and 7. , The trigger electrode 8, the resistor 9, the insulating member 13, the bearing 14, the delivery mechanism 15, and the cutting mechanism 16.

  In the plasma apparatus 10, the x axis, the y axis, and the z axis are defined as shown in FIG.

  The vacuum container 1 has an exhaust port 11 and is evacuated from the exhaust port 11 by an exhaust device (not shown). The vacuum container 1 is connected to the ground node GND.

  The holding member 2 is disposed in the vacuum container 1. The arc evaporation source 3 has a hollow cylindrical shape and is fixed to the insulating member 13. The arc evaporation source 3 is connected to the negative electrode of the power source 7.

  The cathode member 4 is made of laminated carbon or glassy carbon, and has a cylindrical shape whose length is larger than the diameter. The diameter of the cathode member 4 is preferably 1 mmφ or more in order to ensure strength, and 10 mmφ or less is preferable in order to increase the utilization efficiency of the cathode member 4.

  Further, the cathode member 4 is disposed inside the vacuum vessel 1 and the arc evaporation source 3 through a through hole 1 </ b> A provided in the side wall of the vacuum vessel 1, and one end thereof faces one end of the trigger electrode 8.

  The shutter 5 is disposed between the cathode member 4 and the substrate 20 so as to face the cathode member 4.

  Power supply 6 is connected between holding member 2 and ground node GND. The power supply 7 is connected between the arc evaporation source 3 and the ground node GND.

  A part of the trigger electrode 8 is disposed in the vacuum container 1 through the side wall of the vacuum container 1, and the remaining part is disposed outside the vacuum container 1. The trigger electrode 8 is made of, for example, molybdenum (Mo), and is connected to the ground node GND through the resistor 9. The resistor 9 is connected between the trigger electrode 8 and the ground node GND.

  The insulating member 13 is fixed to the side wall of the vacuum vessel 1 via an O-ring (not shown) so as to surround the through hole 1A provided on the side wall of the vacuum vessel 1.

  The bearing 14 is made of a metal material, is in contact with the arc evaporation source 3 and the cathode member 4, and is disposed between the arc evaporation source 3 and the cathode member 4.

  The delivery mechanism 15 is disposed inside the arc evaporation source 3. A part of the cutting mechanism 16 is disposed in the vacuum container 1 through the side wall of the vacuum container 1, and the remaining part is disposed outside the vacuum container 1. The cutting mechanism 16 can rotate in the xy plane.

  The holding member 2 holds the substrate 20. The arc evaporation source 3 causes the cathode member 4 to be locally heated by arc discharge between the cathode member 4 and the vacuum vessel 1 to evaporate the cathode material.

  The shutter 5 is moved in the direction of the arrow 12 by an opening / closing mechanism (not shown).

  The power source 6 applies a negative voltage to the substrate 20 via the holding member 2. The power source 7 applies a negative voltage to the arc evaporation source 3.

  The trigger electrode 8 contacts or separates from the cathode member 4 by a reciprocating drive device (not shown).

  The resistor 9 suppresses the arc current from flowing to the trigger electrode 8. The sending mechanism 15 sends the cathode member 4 in the z-axis direction by a method described later. The cutting mechanism 16 cuts the tip of the cathode member 4 by a method described later.

  FIG. 2 is a schematic diagram showing the configuration of the delivery mechanism 15 shown in FIG. Referring to FIG. 2, delivery mechanism 15 includes a rod member 151, a concavo-convex member 152, a gear 153, a motor 154, and a base member 155.

  The bar member 151 is made of an insulator and is disposed along the z axis. The rod member 151 is connected to the cathode member 4 at one end. The uneven member 152 is fixed to the bar member 151. The gear 153 is fitted to the concavo-convex member 152. The motor 154 is disposed on the base member 155. The rotating shaft 154A of the motor 154 is connected to the gear 153. The base member 155 is disposed on the arc evaporation source 3.

  The motor 154 rotates the gear 153 clockwise through the rotation shaft 154A. As a result, the bar member 151 is sent out in the z-axis direction by the rotation of the gear 153. Therefore, the delivery mechanism 15 can send out the cathode member 4 in the z-axis direction.

  As described above, since the arc evaporation source 3 is fixed to the insulating member 13 and the insulating member 13 is fixed to the side wall of the vacuum vessel 1 through the O-ring, the inside of the arc evaporation source 3 is a vacuum. The pressure in the container 1 is maintained at the same pressure.

  Since the bearing 14 is made of a metal material and is in contact with both the arc evaporation source 3 and the cathode member 4, when the trigger electrode 8 contacts one end of the cathode member 4, the cathode member 4 and the anode ( When an arc discharge occurs between the vacuum vessel 1), a current flows through the cathode member 4, the bearing 14, and the arc evaporation source 3. As a result, the temperature of the cathode member 4 increases.

  In the plasma apparatus 10, when the tip of the cathode member 4 (tip on the substrate 20 side) is consumed by arc discharge, the tip of the cathode member 4 (tip on the substrate 20) is cut by the cutting mechanism 16. The cathode member 4 is sent out to the substrate 20 side by the delivery mechanism 15 so that the surface after being cut is in the same position as the surface before cutting.

  Thereby, since the carbon thin film is formed using the whole cathode member 4, the film forming process of the carbon thin film can be continued for a long time.

  FIG. 3 is a conceptual diagram showing the structure of the cathode member 4 shown in FIG. Referring to FIG. 3, cathode member 4 has a structure in which layers A and B are alternately stacked. The distance between layer A and layer B is 3.35 mm. Each of the layers A and B has a structure in which carbon atoms are two-dimensionally arranged in a hexagon. In this case, the length of one side of the hexagon is 1.415 mm.

  In each layer A and B, each carbon atom is firmly bonded to another carbon atom by a covalent bond. Layer A is loosely connected to the adjacent layer B by van der Waals forces.

  The cathode member 4 becomes a very good thermal conductor in the direction parallel to the layers A and B, and becomes a thermal insulator in the direction perpendicular to the layers A and B, like ceramics and phenol resin. The ratio of the thermal conductivity in the direction parallel to the layers A and B and the thermal conductivity in the direction perpendicular to the layers A and B is about 200: 1.

  Further, in the cathode member 4, the ratio of the specific resistance in the direction parallel to the layers A and B and the specific resistance in the direction perpendicular to the layers A and B is about 1200: 1. This value is an average value in a temperature range of 21 to 1650 ° C.

  Thus, the cathode member 4 has remarkable anisotropy in electrical characteristics and thermal characteristics. As described above, this is due to the difference in bonding force between the in-plane direction of the layers A and B and the direction perpendicular to the layers A and B.

  The cathode member 4 is manufactured by a thermal CVD (Chemical Vapor Deposition) method using a hydrocarbon gas as a raw material gas. In this case, the hydrocarbon gas flows from a direction parallel to the substrate. Thereby, the layers A and B shown in FIG. 3 are alternately laminated.

  The bulk carbon produced by this thermal CVD method is purchased from Toyo Carbon Co., Ltd., and the trade name is PYROID. Generally, it is sometimes called pyrolytic carbon.

  Thus, in the embodiment of the present invention, bulk carbon produced by the thermal CVD method is used as the cathode member 4.

  In this specification, carbon having a structure in which the layers A and B shown in FIG. 3 are alternately laminated is referred to as “laminated carbon”. And laminated carbon does not have a grain boundary.

  The cathode member 4 may be made of glassy carbon. Glassy carbon is produced by firing and carbonizing a thermosetting resin such as a phenol resin. This glassy carbon has a structure in which carbon atoms are arranged in an amorphous state, and there is no grain boundary. The cathode member 4 may be made of conductive diamond because there is no grain boundary.

  Specific examples of glassy carbon include glassy carbon made by Nisshinbo Chemical, or glassy carbon made by Tokai Carbon.

  Thus, in the embodiment of the present invention, the cathode member 4 is made of laminated carbon or glassy carbon. As a result, arc discharge in which the arc spot does not move occurs. Further, atomic carbon is released from the cathode member 4 (laminated carbon or glassy carbon) and flies to the substrate 20.

  FIG. 4 is a perspective view of the cathode member 4 shown in FIG. Referring to FIG. 4, the cathode member 4 has a plurality of cut grooves 41 to 47. The plurality of cut grooves 41 to 47 are provided at a desired interval, and each of the plurality of cut grooves 41 to 47 has a depth corresponding to the diameter of the cathode member 4. For example, the plurality of cut grooves 41 to 47 are provided at intervals of 6 to 7 mm, and each of the plurality of cut grooves 41 to 47 has a depth of 10% to 20% of the diameter of the cathode member 4.

  As a result of the plurality of cut grooves 41 to 47, the cathode member 4 can be divided into a plurality of portions 51 to 58.

  FIG. 5 is a conceptual diagram for explaining a method in which the cutting mechanism 16 shown in FIG. 1 cuts the tip of the cathode member 4.

  Referring to FIG. 5, the cutting mechanism 16 has a metal member 161 at one end on the cathode member 4 side. The metal member 161 has a flat plate shape, for example. The cutting mechanism 16 is rotated by the operator of the plasma apparatus 10 so that the metal member 161 rotates in the direction of the arrow ARW1 or the arrow ARW2 in the xy plane.

  Arc discharge in which the arc spot does not move at an arbitrary point on the surface 51A of the cathode member 4 is started, and when the arc discharge continues, a discharge hole is formed on the surface 51A.

  When the diameter of the discharge hole is about 5 mm and the depth of the discharge hole is about 5 mm, the arc discharge is stopped.

  Therefore, the time until the depth of the discharge hole is as close to 5 mm as possible in the range of less than 5 mm is measured in advance. That is, when arc discharge is started, the longest duration Tmax during which arc discharge is continued is measured in advance.

  When the elapsed time from the start of the arc discharge reaches the maximum duration Tmax, the metal member 161 of the cutting mechanism 16 is rotated in the direction of the arrow ARW1, and the portion 51 of the cathode member 4 is hit by the metal member 161 (FIG. 5). (See (a)).

  Then, the portion 51 of the cathode member 4 is bent at the cut groove 41 (the cut groove closest to the substrate 20), and a new surface 52A of the cathode member 4 appears.

  Thereafter, the cathode member 4 is moved in the z-axis direction by the delivery mechanism 15 until the position of the surface 52A matches the position of the surface 51A (see FIG. 5B).

  Then, the trigger electrode 8 is brought into contact with the surface 52A, and arc discharge in which the arc spot does not move at an arbitrary point on the surface 52A is started.

  Thereafter, each time the elapsed time from the start of arc discharge reaches the maximum duration Tmax, the cutting mechanism 16 cuts the portions 52 to 57 of the cathode member 4 into the cut grooves 41 to 47 (cut grooves closest to the substrate 20). The arc discharge is started by sequentially folding and releasing a new surface so that the arc spot does not move. In this case, the cathode member 4 is moved in the z-axis direction by the delivery mechanism 15 so that the position of the new surface matches the position of the surface before the portions 52 to 57 are folded.

  Thereby, the film formation process of the carbon thin film can be continued for a long time. Each of the portions 51 to 57 of the cathode member 4 has a length of 6 to 7 mm which is close to 5 mm which is the maximum depth of the discharge hole, and a carbon thin film is formed using the whole length direction of the cathode member 4. Therefore, the utilization efficiency of the cathode member 4 can be increased.

  In the embodiment of the present invention, the portions 51 to 57 of the cathode member 4 may be sequentially cut by the cutting mechanism 16 after the arc discharge in which the arc spot does not move is stopped.

  Therefore, in the embodiment of the present invention, each portion 51 to 57 of the cathode member 4 is sequentially cut by the cutting mechanism 16 every time the elapsed time from the start of the arc discharge where the arc spot does not move reaches a desired timing.

  FIG. 6 is a process diagram showing a carbon thin film manufacturing method using the plasma apparatus 10 shown in FIG. Referring to FIG. 6, when the production of the carbon thin film is started, laminated carbon or glassy carbon whose length is larger than the diameter is attached to arc-type evaporation source 3 as cathode member 4 (step S1).

And the inside of the vacuum vessel 1 is exhausted through the exhaust port 11, and the pressure in the vacuum vessel 1 is set to 5 × 10 ⁻⁴ Pa.

  Then, a negative voltage of -10V to -300V is applied to the substrate 20 by the power source 6 (step S2), and a negative voltage of -15V to -50V is applied to the arc evaporation source 3 by the power source 7 (step S3). .

  Then, the trigger electrode 8 is brought into contact with the cathode member 4 by a reciprocating drive device (not shown) (step S4), and then the trigger electrode 8 is separated from the cathode member 4. As a result, arc discharge starts and an arc spot appears on the surface of the cathode member 4. In this case, since the cathode member 4 is made of laminated carbon or glassy carbon, the arc spot does not move.

  Thereafter, the shutter 5 is opened (step S5). Thus, a carbon thin film (DLC: Diamond Like Carbon) is formed on the substrate 20. Then, it is determined whether or not the elapsed time from the start of arc discharge has reached a desired timing (step S6).

  In step S6, when it is determined that the elapsed time from the start of arc discharge has reached a desired timing, the shutter 5 is closed (step S7), and the tip of the cathode member 4 is cut by the cutting mechanism 16 (step S8). ) The cathode member 4 is sent out to the substrate 20 side by the delivery mechanism 15 so that the position of the surface after cutting matches the position of the surface before cutting (step SS9). Thereafter, the above-described steps S4 to S9 are repeatedly performed.

  On the other hand, when it is determined in step S6 that the elapsed time from the start of arc discharge has not reached the desired timing, it is determined whether or not one film formation has been completed (step S10).

  In step S10, when it is determined that one film formation is not completed, the above-described steps S6 to S10 are repeatedly executed.

  When it is determined in step S10 that one film formation has been completed, the production of the carbon thin film is completed.

  Thus, in the carbon thin film manufacturing process shown in FIG. 6, every time it is determined that the elapsed time from the start of the arc discharge where the arc spot does not move has reached a desired timing, the tip of the cathode member 4 is The cathode member 4 is sent to the substrate 20 side so that the surface position after cutting is coincident with the surface position before cutting, and a new arc discharge is started ("YES" in steps S4, S5, S6, (Refer to the loop of S7 to S9).

  As a result, a carbon thin film is formed using the entire length direction of the cathode member 4. Therefore, the carbon thin film forming process can be continued for a long time.

  In the plasma apparatus 10, the power supply 6 may apply a voltage of 0 V to the substrate 20. Further, the carbon thin film may be manufactured with the shutter 5 opened. Therefore, the carbon thin film manufacturing method using the plasma apparatus 10 only needs to include at least steps S1, S3, S4, S6, S8, and S9 shown in FIG.

  FIG. 7 is a schematic diagram showing the configuration of another plasma apparatus according to the embodiment of the present invention.

  The plasma apparatus according to the embodiment of the present invention may be a plasma apparatus 10A shown in FIG.

  Referring to FIG. 7, plasma apparatus 10A is the same as plasma apparatus 10 except that cathode member 4 of plasma apparatus 10 shown in FIG. .

  Similarly to the cathode member 4, the cathode member 4 </ b> A is disposed inside the vacuum vessel 1 and the arc evaporation source 3 through the through hole 1 </ b> A, and one end thereof faces one end of the trigger electrode 8.

  FIG. 8 is a perspective view of the cathode member 4A shown in FIG. With reference to FIG. 8, the cathode member 4 </ b> A includes a plurality of cathode members 61 to 66. Each of the plurality of negative electrode members 61 to 66 is made of laminated carbon or glassy carbon, and has a cylindrical shape whose length is larger than the diameter. In addition, each of the plurality of negative electrode members 61 to 66 has a length of 6 to 7 mm and a diameter of 1 mmφ or more in a range smaller than 6 to 7 mm, for example. The plurality of cathode members 61 to 66 are arranged in series and accommodated in the cylindrical structure member 17. The cylinder structure member 17 is made of metal. As a result, current flows to the plurality of cathode members 61 to 66 through the arc evaporation source 3, the bearing 14, and the cylindrical structure member 17, and the plurality of cathode members 61 to 66 are electrically connected.

  In the plasma apparatus 10 </ b> A, the rod member 151 of the delivery mechanism 15 is connected to the cathode member 66.

  FIG. 9 is a conceptual diagram for explaining a method of using the cathode member in the plasma apparatus 10A shown in FIG.

  With reference to FIG. 9, the cathode member 61 is disposed on the substrate 20 side so that the surface 61 </ b> A coincides with the end surface 17 </ b> A of the cylindrical structure member 17, and the cathode member 66 is coupled to the rod member 151 of the delivery mechanism 15.

  Then, the trigger electrode 8 is brought into contact with the surface 61A of the cathode member 61 to generate arc discharge in which the arc spot does not move (see FIG. 9A).

  Thereafter, when the elapsed time from the start of the arc discharge reaches the maximum duration Tmax, the bar member 151 of the delivery mechanism 15 causes the plurality of cathode members 61 to 66 to have the surface 62A of the cathode member 62 having a cylindrical structure by the above-described mechanism. 17 is moved in the z-axis direction until it coincides with the end face 17A. As a result, the cathode member 61 falls from the cylindrical structure member 17 to the bottom surface of the vacuum vessel 1, and the surface 62 </ b> A of the cathode member 62 faces the substrate 20. Then, the trigger electrode 8 is brought into contact with the surface 62A of the cathode member 62 to generate an arc discharge in which the arc spot does not move (see FIG. 9B).

  Thereafter, every time the elapsed time from the start of the arc discharge reaches the maximum duration Tmax, the cathode members 62 to 66 are moved in the z-axis direction by the delivery mechanism 15 to vacuum the cathode members 62 to 65 from the tubular structure member 17. It is repeatedly executed to sequentially start the arc discharge in which the arc spot does not move by sequentially dropping onto the bottom surface of the container 1 and causing the surfaces of the new cathode members 63 to 66 to face the substrate 20.

  In the embodiment of the present invention, after the arc discharge in which the arc spot does not move stops, the plurality of cathode members 61 to 65 may be sequentially dropped from the tubular structure member 17 by the delivery mechanism 15.

  Therefore, in the embodiment of the present invention, each time the elapsed time from the start of the arc discharge where the arc spot does not move reaches a desired timing, the plurality of cathode members 61 to 65 are sequentially transferred from the cylindrical structure member 17 by the delivery mechanism 15. Drop it.

  FIG. 10 is a process diagram showing a carbon thin film manufacturing method using the plasma apparatus 10A shown in FIG.

  The process diagram shown in FIG. 10 is the same as the process diagram shown in FIG. 6 except that steps S8 and S9 in the process diagram shown in FIG. 6 are replaced with process S8A.

  Referring to FIG. 10, when the production of the carbon thin film is started, the above-described steps S1 to S7 are sequentially performed.

  After the step S7, the plurality of cathode members 61 to 66 are sent out in the z-axis direction by the sending mechanism 15 so that the cathode member (any one of the cathode members 61 to 65) closest to the substrate 20 exits the cylindrical structure member 17. (Step S8A).

  Thereafter, steps S4 to S7, S8A, and S10 are performed, and the production of the carbon thin film is completed.

  As described above, in the carbon thin film manufacturing process shown in FIG. 10, every time it is determined that the elapsed time from the start of the arc discharge in which the arc spot does not move has reached a desired timing, the plurality of cathode members 61 to 66 are used. Among them, the cathode member closest to the substrate 20 is taken out from the cylindrical structure member 17, and arc discharge in which the arc spot does not move is newly started using the new cathode member ("YES" in steps S4, S5, S6, (Refer to the loop of S7 and S8A).

  As a result, a carbon thin film is formed using all of the plurality of cathode members 61 to 66. Therefore, the carbon thin film forming process can be continued for a long time.

  In the plasma apparatus 10 </ b> A, the power supply 6 may apply a voltage of 0 V to the substrate 20. Further, the plasma apparatus 10A may manufacture the carbon thin film with the shutter 5 opened. Therefore, the carbon thin film manufacturing method using the plasma apparatus 10A only needs to include at least steps S1, S3, S4, S6, and S8A shown in FIG.

  In the above description, the cathode member 4 has been described as having a cylindrical shape. However, in the embodiment of the present invention, the cathode member 4 is not limited thereto, and the cathode member 4 has a polygonal shape such as a triangle, a quadrangle, and a pentagon. In general, it is only necessary to have a columnar shape with a circular or polygonal cross-sectional shape. The same applies to the plurality of cathode members 61-66. The plurality of cathode members 61 to 66 may have different cross-sectional shapes.

  Further, in the above description, the cutting mechanism 16 has been described as cutting the tip portion of the cathode member 4 by hitting and folding the tip portion of the cathode member 4, but the embodiment of the present invention is not limited thereto. The cutting mechanism 16 may be provided with a sawtooth at the tip, and the tip of the cathode member 4 may be cut by the sawtooth. In general, if the tip of the cathode member 4 is cut, Such a method may be used.

  Furthermore, the plurality of cut grooves 41 to 47 may be provided at equal intervals, or may be provided at random intervals.

  Therefore, a plasma apparatus according to an embodiment of the present invention includes a vacuum vessel, an arc evaporation source fixed to the vacuum vessel, and a cathode member attached to the arc evaporation source and having a columnar shape whose length is larger than the diameter. A holding member that holds the substrate disposed opposite the cathode member, a trigger electrode that contacts or separates from the cathode member, a power source that applies a negative voltage to the arc evaporation source, and from the start of arc discharge A cutting mechanism that cuts the tip portion of the cathode member on the substrate side every time the elapsed time reaches a desired timing, and a delivery mechanism that feeds the cathode member to the substrate side when the tip portion is cut. What is necessary is just to consist of laminated carbon or glassy carbon.

  A plasma apparatus according to an embodiment of the present invention is a vacuum vessel, an arc evaporation source fixed to the vacuum vessel, and attached to the arc evaporation source and arranged in series and housed in a cylindrical structure member. A plurality of cathode members; a holding member that holds a substrate disposed opposite to the plurality of cathode members; a trigger electrode that contacts or separates from the cathode member closest to the substrate among the plurality of cathode members; and an arc evaporation source And a plurality of cathode members are sent to the substrate side so that the cathode member closest to the substrate comes out of the cylindrical structure every time the elapsed time from the start of arc discharge reaches a desired timing. Each of the plurality of cathode members may be made of laminated carbon or glassy carbon and have a columnar shape whose length is larger than the diameter.

  Furthermore, in the method for producing a carbon thin film according to the embodiment of the present invention, the arc evaporation source fixed to the vacuum vessel facing the substrate is made of laminated carbon or glassy carbon, and the length is longer than the diameter. A first step of attaching a cathode member having a large columnar shape, a second step of applying a negative voltage to the arc evaporation source, a third step of bringing the trigger electrode into contact with the cathode member, and starting of arc discharge A fourth step of cutting the tip portion of the cathode member on the substrate side every time the elapsed time from the desired timing, and a fifth step of feeding the cathode member to the substrate side when the tip portion is cut, As long as it has.

  Furthermore, in the method for producing a carbon thin film according to the embodiment of the present invention, an arc evaporation source fixed to a vacuum vessel facing a substrate is made of laminated carbon or glassy carbon and arranged in series. A first step of attaching a plurality of cathode members housed in the structural member, a second step of applying a negative voltage to the arc evaporation source, and a trigger to the cathode member closest to the substrate among the plurality of cathode members A third step of contacting the electrodes and a plurality of cathode members are sent out to the substrate side so that the cathode member closest to the substrate comes out of the cylindrical structure member every time the elapsed time from the start of arc discharge reaches a desired timing. 4th process, and each of the some negative electrode member should just have columnar shape whose length is larger than a diameter.

  This is because if the carbon thin film is formed using the entire cathode member having a columnar shape, the film forming process of the carbon thin film can be continued for a long time.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is shown not by the above description of the embodiments but by the scope of claims for patent, and is intended to include meanings equivalent to the scope of claims for patent and all modifications within the scope.

  The present invention is applied to a plasma apparatus and a carbon thin film manufacturing method using the plasma apparatus.

  DESCRIPTION OF SYMBOLS 1 Vacuum container, 2 Holding member, 3 Arc type evaporation source, 4, 61-66 Cathode member, 5 Shutter, 6, 7 Power supply, 8 Trigger electrode, 9 Resistance, 10, 10A Plasma apparatus, 13 Insulating member, 14 Bearing, DESCRIPTION OF SYMBOLS 15 Delivery mechanism, 20 Substrate, 41-47 Cut groove, 51-58 part, 151 Bar member, 152 Concavity and convexity member, 154 Motor, 155 Base member.

Claims (6)

A vacuum vessel;
An arc evaporation source fixed to the vacuum vessel;
A cathode member attached to the arc evaporation source and having a columnar shape whose length is larger than the diameter;
A holding member for holding a substrate disposed to face the cathode member;
A trigger electrode that contacts or separates from the cathode member;
A power source for applying a negative voltage to the arc evaporation source;
A cutting mechanism that cuts the tip of the cathode member on the substrate side every time the elapsed time from the start of arc discharge reaches a desired timing;
When the tip portion is cut, a delivery mechanism for feeding the cathode member to the substrate side,
The said cathode member is a plasma apparatus which consists of laminated carbon or glassy carbon. The cathode member includes a plurality of cut grooves provided at a desired interval,
The plasma apparatus according to claim 1, wherein the cutting mechanism cuts the tip portion by folding the cathode member at a notch groove closest to the substrate at a desired timing. A vacuum vessel;
An arc evaporation source fixed to the vacuum vessel;
A plurality of cathode members attached to the arc evaporation source and arranged in series and housed in a cylindrical structure member;
A holding member for holding a substrate disposed to face the plurality of cathode members;
A trigger electrode that contacts or separates from the cathode member closest to the substrate among the plurality of cathode members;
A power source for applying a negative voltage to the arc evaporation source;
A feed mechanism that feeds the plurality of cathode members to the substrate side so that the cathode member closest to the substrate comes out of the cylindrical member every time the elapsed time from the start of arc discharge reaches a desired timing;
Each of the plurality of cathode members is a plasma apparatus, which is made of laminated carbon or glassy carbon and has a columnar shape whose length is larger than a diameter. A first step of attaching a cathode member made of laminated carbon or glassy carbon and having a columnar shape whose length is larger than a diameter to an arc evaporation source fixed to a vacuum vessel facing a substrate;
A second step of applying a negative voltage to the arc evaporation source;
A third step of bringing a trigger electrode into contact with the cathode member;
A fourth step of cutting the tip portion of the cathode member on the substrate side every time the elapsed time from the start of arc discharge reaches a desired timing;
A carbon thin film manufacturing method comprising: a fifth step of sending the cathode member to the substrate side when the tip portion is cut. The cathode member includes a plurality of cut grooves provided at a desired interval,
5. The method for producing a carbon thin film according to claim 4, wherein in the fourth step, the cathode member is folded at a notch groove closest to the substrate at a desired timing. A first cathode member made of laminated carbon or glassy carbon and arranged in series and accommodated in a cylindrical structure member is attached to an arc evaporation source fixed to a vacuum vessel facing the substrate. Process,
A second step of applying a negative voltage to the arc evaporation source;
A third step of bringing the trigger electrode into contact with the cathode member closest to the substrate among the plurality of cathode members;
And a fourth step of sending the plurality of cathode members to the substrate side so that the cathode member closest to the substrate comes out of the cylindrical structure every time the elapsed time from the start of arc discharge reaches a desired timing. ,
Each of the plurality of negative electrode members has a columnar shape whose length is larger than a diameter.

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