JP2014129583A - Method for recovering metal or alloy from high-purity metal or alloy scrap - Google Patents
Method for recovering metal or alloy from high-purity metal or alloy scrap Download PDFInfo
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- JP2014129583A JP2014129583A JP2012288822A JP2012288822A JP2014129583A JP 2014129583 A JP2014129583 A JP 2014129583A JP 2012288822 A JP2012288822 A JP 2012288822A JP 2012288822 A JP2012288822 A JP 2012288822A JP 2014129583 A JP2014129583 A JP 2014129583A
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 106
- 239000002184 metal Substances 0.000 title claims abstract description 106
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 97
- 239000000956 alloy Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims abstract description 46
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 52
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 30
- -1 alcohol amine Chemical class 0.000 claims abstract description 17
- 239000002994 raw material Substances 0.000 claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 239000003792 electrolyte Substances 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 12
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical group NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 10
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 5
- 239000000243 solution Substances 0.000 abstract description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 17
- 150000002739 metals Chemical class 0.000 description 12
- 239000010936 titanium Substances 0.000 description 12
- 229910052721 tungsten Inorganic materials 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 9
- 239000010937 tungsten Substances 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 229910021529 ammonia Inorganic materials 0.000 description 8
- 229910052750 molybdenum Inorganic materials 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 238000004090 dissolution Methods 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000011733 molybdenum Substances 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 229910052715 tantalum Inorganic materials 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical class CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000000866 electrolytic etching Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 229910006164 NiV Inorganic materials 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000593 degrading effect Effects 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000174 gluconic acid Substances 0.000 description 2
- 235000012208 gluconic acid Nutrition 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- MXZROAOUCUVNHX-UHFFFAOYSA-N 2-Aminopropanol Chemical compound CCC(N)O MXZROAOUCUVNHX-UHFFFAOYSA-N 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910019974 CrSi Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910005839 GeS 2 Inorganic materials 0.000 description 1
- 229910005276 Li(CoxNiyMnz)O2 Inorganic materials 0.000 description 1
- 229910012851 LiCoO 2 Inorganic materials 0.000 description 1
- 229910015643 LiMn 2 O 4 Inorganic materials 0.000 description 1
- 229910013290 LiNiO 2 Inorganic materials 0.000 description 1
- 229910016006 MoSi Inorganic materials 0.000 description 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 1
- 229910000943 NiAl Inorganic materials 0.000 description 1
- 229910003266 NiCo Inorganic materials 0.000 description 1
- 229910005883 NiSi Inorganic materials 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910002844 PtNi Inorganic materials 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 229910004490 TaAl Inorganic materials 0.000 description 1
- 229910001117 Tb alloy Inorganic materials 0.000 description 1
- 229910001215 Te alloy Inorganic materials 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002169 ethanolamines Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910001105 martensitic stainless steel Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/84—Recycling of batteries or fuel cells
Abstract
Description
本発明は、高純度金属又は合金のスクラップからの金属又は合金の回収方法に関する。 The present invention relates to a method for recovering a metal or alloy from high-purity metal or alloy scrap.
金属回収方法としては、通常、当該金属を含有するスクラップを粉砕した後、アルカリ溶解するというプロセスが用いられている。しかしながら、例えば非常に硬く、耐薬品性も高い金属を含有するスクラップから当該金属を回収する場合、このような通常のプロセスの適用は非常に困難である。そのため、アルカリ溶融塩等の強力な処理をして酸化することでこれらの金属を溶解させて回収するのが定法となっている。 As a metal recovery method, usually, a process of pulverizing a scrap containing the metal and then dissolving with alkali is used. However, for example, when recovering the metal from scrap containing a metal that is very hard and has high chemical resistance, the application of such a normal process is very difficult. Therefore, it is a regular method to dissolve and recover these metals by oxidizing them with a strong treatment such as an alkali molten salt.
一方、例えば、モリブデン使用済みターゲットや端材は、元々高純度であるため、上記のような一般的な処理である、溶融塩処理や粉砕を用いることは、純度を大幅に低下させることになる。従って、当該金属を高純度化するために、多段精製やイオン交換処理等が必要となる等、処理工程が煩雑になる傾向がある。 On the other hand, for example, molybdenum used targets and mill ends are originally of high purity, so using molten salt treatment or pulverization, which is a general treatment as described above, greatly reduces the purity. . Therefore, in order to purify the metal, the treatment process tends to be complicated, such as requiring multistage purification or ion exchange treatment.
金属を溶解させる手法としては、電解があり、例えば、特許文献1には、電解エッチング処理、または電解酸化膜除去処理の内のいずれかを実施することを目的とした電解加工液組成物として、基本的に、(1)水溶性の電解質、(2)分極向上剤、(3)腐食抑制剤(インヒビター)の内、(1)の水溶性の電解質を基本として、(2)〜(3)のいずれか1種または2種以上を組み合わせて用いることにより、陽極表面近傍に電解溶出した金属イオンと電解液成分によって形成される粘性液体のヤッケ層の成長を抑制して電解することを特徴とする電解エッチング処理方法が開示されている。また、(1)水溶性の電解質として、塩酸、硝酸、硫酸、リン酸かそれらのアンモニウム、カリウム、またはナトリウム塩、水酸化カリウムの中から選ばれた1種または2種以上、(2)分極向上剤として、アミノカルボン酸とその塩、エタノールアミン類、カルボン酸またはその塩、の中から選ばれた1種または2種以上、(3)腐食抑制剤(インヒビター)として、脱水環化エタノール誘導体を含むアミン化合物、窒素含有ヘテロ環状化台物、チオ尿素誘導体の中から選ばれた1種または2種以上を用いることが開示されている。そして、これによれば、電解エッチング、電解酸化膜除去を含む電解加工を実施する上で、これらの電解加工を極めて有効に実施する電解液組成物を提供することができると記載されている。 As a technique for dissolving the metal, there is electrolysis. For example, in Patent Document 1, as an electrolytic processing liquid composition intended to carry out either an electrolytic etching process or an electrolytic oxide film removal process, Basically, among (1) water-soluble electrolyte, (2) polarization improver, and (3) corrosion inhibitor (inhibitor), the water-soluble electrolyte of (1) is used as a basis, and (2) to (3) By using any one or a combination of two or more of the above, it is possible to perform electrolysis while suppressing the growth of a viscous liquid formed of a metal ion electrolyzed and an electrolyte component in the vicinity of the anode surface and a viscous liquid layer. An electrolytic etching treatment method is disclosed. (1) As a water-soluble electrolyte, one or more selected from hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid or their ammonium, potassium, sodium salt, potassium hydroxide, (2) Polarization As an improver, one or more selected from aminocarboxylic acids and salts thereof, ethanolamines, carboxylic acids or salts thereof, and (3) dehydrated cyclized ethanol derivatives as corrosion inhibitors (inhibitors) It is disclosed that one or two or more selected from amine compounds containing nitrogen, nitrogen-containing heterocyclized bases, and thiourea derivatives are used. And according to this, it describes that the electrolytic solution composition which performs these electrolytic processing very effectively can be provided when implementing the electrolytic processing including electrolytic etching and electrolytic oxide film removal.
また、特許文献2には、0.1重量%以上の燐酸、クエン酸、酒石酸、シュウ酸、リンゴ酸、酢酸、グルコン酸、グリコール酸、コハク酸などステンレス鋼に対して非酸化性に働く酸および硫酸からなる群、ならびに、これら酸のナトリウム、カリウム、アンモニウムなどの各塩の群のうちの一種または二種以上の水溶液に、0.1重量%以上のトリエタノールアミン、ジエタノールアミンおよびモノエタノールアミンのうちの一種または二種以上を配合することを特徴とするステンレス鋼の電解研磨法に用いる電解液が開示されている。そして、これによれば、ステンレス鋼表面に対する電解研磨法において、交流及び直流及び交直重畳で使用できると共に、オーステナイト系ステンレス鋼だけでなくマルテンサイト系、フェライト系ステンレス鋼でも耐腐食性能を向上させる電解液を提供することができると記載されている。 Patent Document 2 discloses that 0.1% by weight or more of phosphoric acid, citric acid, tartaric acid, oxalic acid, malic acid, acetic acid, gluconic acid, glycolic acid, succinic acid, etc. 0.1% by weight or more of triethanolamine, diethanolamine and monoethanolamine in one or more aqueous solutions of the group consisting of and sulfuric acid, and each salt group of these acids such as sodium, potassium and ammonium An electrolytic solution used in an electrolytic polishing method for stainless steel, characterized in that one or more of them are blended is disclosed. And according to this, in the electrolytic polishing method for the stainless steel surface, it can be used with alternating current, direct current and AC / DC superposition, and electrolysis that improves corrosion resistance performance not only in austenitic stainless steel but also in martensitic and ferritic stainless steel. It is described that a liquid can be provided.
また、特許文献3には、鉄、タングステン、軽金属、およびこれらの金属の合金から選択される金属の表面を電解液を用いて電解研磨する方法であって、前記電解液は、メタンスルホン酸と、一般式CnH2n(OH)2、n=2〜6で示される脂肪族ジオールおよび一般式CmH2m−1OH、m=5〜8で示される脂環式アルコールからなる群から選択される少なくとも一種のアルコール化合物を含むことを特徴とする電解研磨方法が開示されている。そして、これによれば、鉄、タングステン、軽金属およびこれらの合金の表面を電解研磨するのに適した、作業の安全性や環境保護については実質的に無害な方法を提供することができると記載されている。 Patent Document 3 discloses a method for electrolytic polishing a surface of a metal selected from iron, tungsten, light metals, and alloys of these metals using an electrolytic solution, and the electrolytic solution includes methanesulfonic acid and At least one alcohol selected from the group consisting of an aliphatic diol represented by the general formula CnH2n (OH) 2, n = 2 to 6 and an alicyclic alcohol represented by the general formula CmH2m-1OH, m = 5-8 An electrolytic polishing method comprising a compound is disclosed. And according to this, it is described that it is possible to provide a substantially harmless method for work safety and environmental protection suitable for electropolishing the surfaces of iron, tungsten, light metals and their alloys. Has been.
さらに、特許文献4には、電解液中で白金を陽極として電解することで白金を溶出させる電解溶出方法であって、前記電解液は、8〜11.5規定の塩酸溶液であり、電解条件として、液温60〜80℃、電流密度60〜100A/dm2の電流を印加して前記白金電極を溶出させる方法が開示されている。そして、これによれば、化学的に安定であり溶解が容易ではない白金を、電解法により効率的に溶解させる方法を提供することができると記載されている。 Furthermore, Patent Document 4 discloses an electrolytic elution method for eluting platinum by electrolyzing platinum in an electrolytic solution as an anode, wherein the electrolytic solution is a hydrochloric acid solution of 8 to 11.5 N, and electrolytic conditions As a method, a method of eluting the platinum electrode by applying a current having a liquid temperature of 60 to 80 ° C. and a current density of 60 to 100 A / dm 2 is disclosed. According to this, it is described that a method of efficiently dissolving platinum that is chemically stable and not easily dissolved by an electrolytic method can be provided.
このように、種々の金属又は合金を電解法により溶解させる技術が知られているが、上記のような一般的な処理である溶融塩処理や粉砕を用いて回収処理することは、金属又は合金の純度を大幅に低下させてしまい、当該金属又は合金を高純度化するために、多段精製やイオン交換処理等が必要となる等、処理工程が煩雑になる。 As described above, a technique for dissolving various metals or alloys by an electrolytic method is known, but recovery processing using molten salt treatment or pulverization, which is a general treatment as described above, is a metal or alloy. In order to make the said metal or alloy highly purified, multistage refinement | purification, an ion exchange process, etc. are needed, and a process process becomes complicated.
そこで、本発明は、安価なコストで、高純度金属又は合金からなるスクラップを、純度を落とすことなく、元の用途の製造原料として用いられるような純度で金属及び合金を回収する方法を提供することを課題とする。 Therefore, the present invention provides a method for recovering metals and alloys with a purity such that scraps made of high-purity metals or alloys can be used as a raw material for production of the original application without reducing the purity at a low cost. This is the issue.
本発明者は、上記課題を解決するために鋭意検討し、アルコールアミンを用いた電解液に着目した。アルコールアミンは、Na、K、Fe及びS等の不純物を含まず、比較的沸点が高く、数%含有した水溶液は安全である。さらに、耐電圧性も高く安定であり、pH依存性も低いため、電解中の制御がしやすく、アンモニアのような揮発による補給も必要ないため、結果的にランニングコストを抑制できる。このようにアルコールアミンを用いた電解液を用いることで、高純度金属又は合金からなるスクラップを、純度を落とすことなく、元の用途の製造原料として用いられるような純度で金属及び合金を回収できることを見出した。
なお、特許文献2、3、4の電解液に関する発明において、当該電解液にアミンを用いている。しかしながら、特許文献2では、電解液中に、燐酸、クエン酸、酒石酸、シュウ酸、リンゴ酸、酢酸、グルコン酸、グリコール酸、コハク酸などステンレス鋼に対して非酸化性に働く酸および硫酸からなる群、ならびに、これら酸のナトリウム、カリウム、アンモニウムなどの各塩の群のうちの一種または二種以上の水溶液も含まれており、本発明と構成が異なる。また、特許文献3では、メタンスルホン酸も必須成分として含んでおり、本発明と構成が異なり、さらにメタンスルホン酸が強酸性であり、非常に高価である点で不利である。また、特許文献4では、電解液中に、強酸である塩酸が含まれており、本発明と構成が異なる。
The present inventor has intensively studied in order to solve the above problems, and has focused attention on an electrolytic solution using alcohol amine. Alcoholamine does not contain impurities such as Na, K, Fe and S, has a relatively high boiling point, and an aqueous solution containing several percent is safe. Furthermore, since the voltage resistance is high and stable, and the pH dependency is low, it is easy to control during electrolysis, and replenishment by volatilization such as ammonia is not necessary, so that the running cost can be suppressed as a result. In this way, by using an electrolytic solution containing alcohol amine, scraps made of high-purity metals or alloys can be recovered with such purity that it can be used as a raw material for production of the original application without reducing the purity. I found.
In the inventions related to the electrolytic solutions of Patent Documents 2, 3, and 4, amine is used for the electrolytic solution. However, in Patent Document 2, the electrolyte contains an acid and sulfuric acid that act non-oxidatively on stainless steel such as phosphoric acid, citric acid, tartaric acid, oxalic acid, malic acid, acetic acid, gluconic acid, glycolic acid, and succinic acid. As well as one or two or more aqueous solutions of each of the groups of these salts, such as sodium, potassium, ammonium, etc. of these acids, which are different in configuration from the present invention. Further, Patent Document 3 contains methanesulfonic acid as an essential component, which is disadvantageous in that the structure is different from that of the present invention, and methanesulfonic acid is strongly acidic and very expensive. Moreover, in patent document 4, hydrochloric acid which is a strong acid is contained in electrolyte solution, and a structure differs from this invention.
以上の知見を基礎として完成した本発明は一側面において、高純度金属又は合金からなるスクラップに対して、アルコールアミンを含有する電解液を用いて電気分解を行う工程を含む高純度金属又は合金のスクラップからの金属又は合金の回収方法である。 The present invention completed on the basis of the above knowledge is, in one aspect, a high-purity metal or alloy including a step of electrolyzing scrap made of a high-purity metal or alloy using an electrolyte containing alcohol amine. A method for recovering metals or alloys from scrap.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法は一実施形態において、前記アルコールアミンが、モノエタノールアミン及び/又はトリエタノールアミンである。 In one embodiment of the method for recovering a metal or alloy from scrap of high purity metal or alloy according to the present invention, the alcohol amine is monoethanolamine and / or triethanolamine.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法は別の一実施形態において、前記電解液中のアルコールアミンの濃度が1〜40mass%である。 In another embodiment of the method for recovering metal or alloy from scrap of high purity metal or alloy according to the present invention, the concentration of alcoholamine in the electrolyte is 1 to 40 mass%.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法はさらに別の一実施形態において、前記電解液の温度を50℃以上に調整して電気分解を行う。 In another embodiment of the method for recovering a metal or alloy from high-purity metal or alloy scrap according to the present invention, electrolysis is performed by adjusting the temperature of the electrolytic solution to 50 ° C. or higher.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法はさらに別の一実施形態において、前記電解液のpHが9以上である。 In still another embodiment of the method for recovering a metal or alloy from scrap of high purity metal or alloy according to the present invention, the pH of the electrolyte is 9 or more.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法はさらに別の一実施形態において、前記電気分解における設定電圧が30V以下であり、設定電流密度が500A/dm2以下である。 In yet another embodiment of the method for recovering a metal or alloy from high-purity metal or alloy scrap according to the present invention, the set voltage in the electrolysis is 30 V or less, and the set current density is 500 A / dm 2 or less. is there.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法はさらに別の一実施形態において、前記高純度金属又は合金からなるスクラップから、純度を落とすことなく、元の用途の製造原料として用いられる純度で金属及び合金を回収する。 In yet another embodiment, the method for recovering a metal or alloy from a high-purity metal or alloy scrap according to the present invention is the production of the original use without reducing the purity from the high-purity metal or alloy scrap. Metals and alloys are recovered with the purity used as raw material.
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法はさらに別の一実施形態において、前記高純度金属又は合金からなるスクラップの組成と、前記アルコールアミンを含有する電解液を用いた電気分解によって得られた金属及び合金の組成とが同じである。 In yet another embodiment of the method for recovering a metal or alloy from high-purity metal or alloy scrap according to the present invention, the composition of the scrap consisting of the high-purity metal or alloy and the electrolyte containing the alcohol amine are used. The composition of the metals and alloys obtained by electrolysis used is the same.
本発明によれば、安価なコストで、高純度金属又は合金からなるスクラップを、純度を落とすことなく、元の用途の製造原料として用いられるような純度で金属及び合金を回収する方法を提供することができる。
より具体的には:
(1)処理反応系に、Na、K、Fe及びS等の不純物を含まないことで、純度を下げずに、高純度のまま金属又は合金を回収することができる。
(2)リサイクル材等から、純度が2N以上(99%以上)の品位の金属又は合金(合金の場合は合金の構成元素の総和)を得ることができる。
(3)電解液の耐電圧性が高く安定であり、pH依存性も低いため、電解中の制御がしやすく、アンモニアのような揮発による補給も必要ないため、安価なコストで処理することができる。
According to the present invention, there is provided a method for recovering a metal and an alloy with such purity that scraps made of a high-purity metal or alloy can be used as a raw material for production of the original application without reducing the purity at a low cost. be able to.
More specifically:
(1) By not containing impurities such as Na, K, Fe and S in the treatment reaction system, the metal or alloy can be recovered with high purity without lowering the purity.
(2) A quality metal or alloy having a purity of 2N or more (99% or more) can be obtained from recycled materials or the like (in the case of an alloy, the sum of the constituent elements of the alloy).
(3) Since the electrolytic solution has a high withstand voltage and is stable and has a low pH dependency, it is easy to control during electrolysis and does not require replenishment by volatilization such as ammonia. it can.
以下に、本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法の実施形態を詳細に説明する。 Hereinafter, embodiments of a method for recovering a metal or alloy from scrap of high-purity metal or alloy according to the present invention will be described in detail.
本発明において、高純度金属又は合金のスクラップは、半導体及び電子部品、液晶ディスプレイ、工具コーティング、ガラスコーディング、光ディスク、ハードディスク、太陽電池、リチウムイオン電池の正極材等に用いるスパッタリングターゲット材のスクラップが挙げられる。このため、これらの構成材料に高純度で含まれている金属又は合金が、本発明に係る回収対象となる金属又は合金である。具体的な金属又は合金元素の種類を、各種用途とともに以下に列挙する:
・半導体及び電子部品:Ag, Al, Au, AuAs, AuSb, AuSi, AuSn, Al2O3, Cr, Cu, CuCr, CrNiAl, CrSi, GeS2, Hf, Ir, Mo, Ni, NiV, OsRu, Pd, Pt, PtNi, Rh, Ru, Si, Ta, TaAl, Ti, WTi, WTiなど
・液晶ディスプレイ:Ag, Ag合金, Al, AlNd, Cr, InSn, ITO, Mo, MoW, Si, SiO2, Ta, Ti, W, ZnAl, ZAO(ZnO+Al2O3)など
・工具コーティング:Cr, CrAl, Ti, TiAlなど
・ガラスコーティング:Ag, Ag合金, Al, Bi, Cr, InSn, ITO, Nb, Nb2O5, NiCr, Si, SiO2, Sn, Ta2O5, Ti, W, ZAO(ZnO+Al2O3), Znなど
・光ディスク:Al2O3, C, Co合金, Cr, Fe合金, Ta, Tb合金, Te合金, Pt, Pt合金など
・ハードディスク:Al2O3, C, CoCr, CoCrTa, CoCrPt, Cr, Cr合金, Cr酸化物, MgO, Mo, NiAl, NiSi, SiC, Ta, Ta2O5, Ti酸化物, V, Wなど
・太陽電池:Ag, Al, CIG(Cu+In+Ga), CuGa, ITO, Mo, Ni/NiV, Sn, ZAO(ZnO+Al2O3)など
・リチウムイオン電池の正極材:正極材としてLiCoO2、LiNiO2、LiMn2O4、Li(CoxNiyMnz)O2 〔x+y+z=1〕など、金属としてNi、Co、Mnなど、合金としてNiCoなど
In the present invention, scraps of high-purity metals or alloys include scraps of sputtering target materials used for semiconductors and electronic parts, liquid crystal displays, tool coatings, glass coatings, optical disks, hard disks, solar cells, cathode materials for lithium ion batteries, and the like. It is done. For this reason, the metal or alloy contained in these constituent materials with high purity is the metal or alloy to be collected according to the present invention. Specific metal or alloy element types are listed below along with various applications:
, Semiconductor and electronic components: Ag, Al, Au, AuAs , AuSb, AuSi, AuSn, Al 2 O 3, Cr, Cu, CuCr, CrNiAl, CrSi, GeS 2, Hf, Ir, Mo, Ni, NiV, OsRu, Pd, Pt, PtNi, Rh, Ru, Si, Ta, TaAl, Ti, WTi, WTi, etc. ・ Liquid crystal display: Ag, Ag alloy, Al, AlNd, Cr, InSn, ITO, Mo, MoW, Si, SiO 2 , Ta, Ti, W, ZnAl, ZAO (ZnO + Al 2 O 3 ), etc. Tool coating: Cr, CrAl, Ti, TiAl, etc. Glass coating: Ag, Ag alloy, Al, Bi, Cr, InSn, ITO, Nb , Nb 2 O 5 , NiCr, Si, SiO 2 , Sn, Ta 2 O 5 , Ti, W, ZAO (ZnO + Al 2 O 3 ), Zn, etc. Optical disc: Al 2 O 3 , C, Co alloy, Cr , Fe alloy, Ta, Tb alloy, Te alloy, Pt, Pt alloy etc. Hard disk: Al 2 O 3 , C, CoCr, CoCrTa, CoCrPt, Cr, Cr alloy, Cr oxide, MgO, Mo, NiAl, NiSi, SiC, Ta, Ta 2 O 5 , Ti oxide, V, W, etc. Solar cells: Ag, Al, CIG (Cu + In + Ga), CuGa, ITO, Mo, Ni / NiV, Sn, ZAO (ZnO + Al 2 O 3 ) ・ Lithium-ion battery cathode materials: LiCoO 2 , LiNiO 2 , LiMn 2 O 4 , Li (CoxNiyMnz) O 2 as cathode materials [X + y + z = 1] etc., Ni, Co, Mn etc. as metal, NiCo etc. as alloy
本発明において、「高純度」とは、純度が2N以上(99.99%以上)の品位の金属又は合金(合金の場合は合金の構成元素の総和)を意味する。 In the present invention, “high purity” means a metal or alloy having a purity of 2N or more (99.99% or more) (in the case of an alloy, the sum of the constituent elements of the alloy).
本発明に係る高純度金属又は合金のスクラップからの金属又は合金の回収方法は、まず、処理対象となる高純度金属又は合金を含有する原料混合物を準備する。当該原料混合物としては、高純度金属又は合金のスクラップを粉砕した、いわゆるリサイクル材等が挙げられる。 In the method for recovering a metal or alloy from scrap of high-purity metal or alloy according to the present invention, first, a raw material mixture containing the high-purity metal or alloy to be treated is prepared. Examples of the raw material mixture include so-called recycled materials obtained by pulverizing high-purity metal or alloy scrap.
次に、アノード及びカソード、電解液を備えた電解槽を準備し、これを用いて高純度金属又は合金を含有する原料混合物の電気分解を行う。
電解槽は、特に限定されないが、例えば、図1に示す構成であってもよい。図1は、アノードとしてチタンバスケットを用いており、このチタンバスケットの中に高純度金属又は合金を含有する原料混合物が設けられている。チタンバスケットは、本発明のような高電圧、高電流及び高温の電解処理条件で安定である点で好ましい。
Next, an electrolytic cell including an anode and a cathode and an electrolytic solution is prepared, and the raw material mixture containing a high-purity metal or alloy is used for electrolysis.
Although an electrolytic cell is not specifically limited, For example, the structure shown in FIG. 1 may be sufficient. FIG. 1 uses a titanium basket as an anode, and a raw material mixture containing a high-purity metal or alloy is provided in the titanium basket. Titanium baskets are preferred in that they are stable under high voltage, high current and high temperature electrolytic treatment conditions as in the present invention.
電解液は、アルコールアミンを含有している。アルコールアミンとしては、トリエタノールアミン、ジエタノールアミン、モノエタノールアミン、アミノプロパノール、メチルエタノールアミン等が挙げられる。特に、モノエタノールアミン、トリエタノールアミンは安価である点で好ましい。 The electrolytic solution contains alcohol amine. Examples of the alcohol amine include triethanolamine, diethanolamine, monoethanolamine, aminopropanol, and methylethanolamine. In particular, monoethanolamine and triethanolamine are preferable in that they are inexpensive.
電解液中のアルコールアミンの濃度は、1〜40mass%であるのが好ましい。電解液中のアルコールアミンの濃度が1mass%未満であると、導電性が低くなり過ぎて電気分解が不安定になる。電解液中のアルコールアミンの濃度が40mass%超であると、電解液の種類によっては水への溶解度を超えてしまうし、必要以上に濃度が高くなり、コストの面で不利となる。電解液中のアルコールアミンの濃度は、より好ましくは2〜10mass%である。 The concentration of alcohol amine in the electrolytic solution is preferably 1 to 40 mass%. If the concentration of alcoholamine in the electrolytic solution is less than 1 mass%, the conductivity becomes too low and electrolysis becomes unstable. If the concentration of alcoholamine in the electrolytic solution exceeds 40 mass%, the solubility in water may be exceeded depending on the type of the electrolytic solution, and the concentration becomes higher than necessary, which is disadvantageous in terms of cost. The concentration of alcoholamine in the electrolytic solution is more preferably 2 to 10 mass%.
電気分解の際の電解液の温度は室温でもかまわないが、高温の方が良く、特に50℃以上に調整するのが好ましい。高温である方が電解液の導電性が大きくなるためである。ここで、図2に、本発明に係る電解液及び従来の電解液を用いて純度99.99%で含まれるタングステン(W)のスクラップを電気分解したときの、電解液温度とタングステンの溶解速度との関係を示す。図中、本発明に係る電解液を用いた電解槽で電気分解を行った結果のグラフを本PAT浴と記載し、従来の電解液による電解槽で電気分解を行った結果のグラフを従来浴と記載している。本PAT浴では、電解液としてモノエタノールアミン10%水溶液を用い、10Vの定電圧で電気分解をしている。一方、従来浴では、電解液として硝安及びアンモニアを用い、10Vの定電圧で電気分解をしている。また、タングステンの溶解速度は、電解液が25℃における数値を1.0としたときの相対値としてプロットしている。この図に示すように、従来浴は、電解液の液温が45℃以上になるとアンモニア揮発が激しくなるため事実上それ以上の温度に上げることが困難となる。これに対し、本PAT浴は、高沸点溶媒で構成されているため、水の蒸発温度域以下までは問題無く電気分解でき、結果として50℃以上で溶解速度が大きくなり、生産性が上がる。 The temperature of the electrolytic solution at the time of electrolysis may be room temperature, but higher temperature is better, and it is particularly preferable to adjust to 50 ° C. or higher. This is because the conductivity of the electrolytic solution increases at higher temperatures. Here, FIG. 2 shows the electrolytic solution temperature and the dissolution rate of tungsten when electrolyzing a tungsten (W) scrap contained at a purity of 99.99% using the electrolytic solution according to the present invention and the conventional electrolytic solution. Shows the relationship. In the figure, the graph of the result of electrolysis in the electrolytic cell using the electrolytic solution according to the present invention is described as the present PAT bath, and the graph of the result of electrolysis in the electrolytic cell with the conventional electrolytic solution is shown as the conventional bath. It is described. In this PAT bath, a 10% aqueous solution of monoethanolamine is used as an electrolytic solution, and electrolysis is performed at a constant voltage of 10V. On the other hand, in a conventional bath, ammonium nitrate and ammonia are used as an electrolytic solution, and electrolysis is performed at a constant voltage of 10V. The dissolution rate of tungsten is plotted as a relative value when the value of the electrolytic solution at 25 ° C. is 1.0. As shown in this figure, it is difficult to raise the temperature of the conventional bath to a temperature higher than that since the ammonia volatilization becomes intense when the temperature of the electrolytic solution is 45 ° C. or higher. On the other hand, since this PAT bath is composed of a high boiling point solvent, it can be electrolyzed without any problem up to the water evaporation temperature range or lower, and as a result, the dissolution rate increases at 50 ° C. or higher, and the productivity increases.
電解液のpHは、電解液が弱アルカリ性となるように調整され、好ましくは9以上、より好ましくは10以上である。pHが9未満であると、生成した高純度金属又は合金に係るイオンが溶解していられなくなり、化合物を形成して析出し、結果として電解溶解を阻害してしまう可能性がある。 The pH of the electrolytic solution is adjusted so that the electrolytic solution is weakly alkaline, and is preferably 9 or more, more preferably 10 or more. When the pH is less than 9, ions relating to the produced high-purity metal or alloy cannot be dissolved, and a compound is formed and deposited, and as a result, electrolytic dissolution may be hindered.
電解液に用いるアルコールアミン類は、耐電圧性・耐電流密度性が高く、生産性のためには電気分解における設定電圧及び設定電流密度はそれぞれ高い方が好ましいが、設備の制約やカソード側へのダメージを考えると、設定電圧は30V以下とし、設定電流密度は500A/dm2以下とするのが実用的であるため好ましい。参考に、図3に電気分解における定電圧と電流効率との関係を示す。図3に示されるように、電圧・電流密度が低いということは、時間当たりの処理量(生産量)が小さくなる。 Alcoholamines used in the electrolyte have high withstand voltage and current withstand density, and it is preferable for the productivity that the set voltage and set current density in electrolysis are higher. Therefore, it is preferable that the set voltage is 30 V or less and the set current density is 500 A / dm 2 or less because it is practical. For reference, FIG. 3 shows the relationship between constant voltage and current efficiency in electrolysis. As shown in FIG. 3, when the voltage / current density is low, the processing amount (production amount) per time is small.
電気分解によって高純度金属又は合金を電解液に溶解させた後、塩酸、硝酸等で中和して、高純度金属又は合金を水酸化物として取り出す。この場合、水酸化物の状態で既に高純度金属又は合金の品位が2N以上と高純度となっている。 A high purity metal or alloy is dissolved in an electrolytic solution by electrolysis, and then neutralized with hydrochloric acid, nitric acid or the like, and the high purity metal or alloy is taken out as a hydroxide. In this case, the quality of the high-purity metal or alloy is already as high as 2N or higher in the hydroxide state.
次に、得られた高純度金属又は合金の水酸化物を濃縮して金属酸塩化合物とし、必要に応じて加熱・還元することで、高純度の金属酸化物や単体金属又は合金として回収する。また、このとき、元の用途の製造原料として用いられる純度で金属及び合金を回収することができる。 Next, the obtained high-purity metal or alloy hydroxide is concentrated to form a metalate compound, and is recovered as a high-purity metal oxide, simple metal or alloy by heating and reducing as necessary. . At this time, the metal and alloy can be recovered with the purity used as the raw material for the original application.
本発明に係る高純度金属又は合金の回収方法は、上述のようにアルコールアミンを含有する電解液を用いて電気分解することで、安価なコストで、高純度の金属又は合金を回収することができる。具体的には:
(1)処理反応系に、Na、K、Fe及びS等の不純物を含まないことで、純度を下げずに、高純度のまま金属又は合金を回収することができる。また、高純度金属又は合金からなるスクラップの組成と、アルコールアミンを含有する電解液を用いた電気分解によって得られた金属及び合金の組成とを容易に同じとすることができる。
(2)リサイクル材等から、純度が2N以上(99.99%以上)の品位の金属又は合金(合金の場合は合金の構成元素の総和)を得ることができる。
(3)電解液の耐電圧性が高く安定であり、pH依存性も低いため、電解中の制御がしやすく、アンモニアのような揮発による補給も必要ないため、安価なコストで処理することができる。
ここで、アルコールアミンの電解液の耐電圧性が高く安定なのは、明確な理由は不明であるが、おそらく溶解した金属又は合金がアルコールアミンと配位することで、安定化することが起因していると考えられる。
The method for recovering a high-purity metal or alloy according to the present invention can recover a high-purity metal or alloy at an inexpensive cost by electrolysis using an electrolytic solution containing an alcoholamine as described above. it can. In particular:
(1) By not containing impurities such as Na, K, Fe and S in the treatment reaction system, the metal or alloy can be recovered with high purity without lowering the purity. Moreover, the composition of the scrap made of a high-purity metal or alloy and the composition of the metal and alloy obtained by electrolysis using an electrolytic solution containing an alcohol amine can be easily made the same.
(2) A quality metal or alloy having a purity of 2N or more (99.99% or more) can be obtained from recycled materials or the like (in the case of an alloy, the sum of the constituent elements of the alloy).
(3) Since the electrolytic solution has a high withstand voltage and is stable and has a low pH dependency, it is easy to control during electrolysis and does not require replenishment by volatilization such as ammonia. it can.
Here, the reason why the withstand voltage and stability of the electrolyte solution of alcohol amine is high and stable is unknown, but it is probably because the dissolved metal or alloy is stabilized by coordination with alcohol amine. It is thought that there is.
以下、本発明の実施例を説明するが、実施例は例示目的であって発明が限定されることを意図しない。 Examples of the present invention will be described below, but the examples are for illustrative purposes and are not intended to limit the invention.
(実施例1)
電解槽のアノードとして、モリブデン(純度99.99%:4N)のターゲットの小片5.0kgを用いた。
電解槽のカソードとして、チタン板を用いた。
電解槽の電解液として、モノエタノールアミンに純水を加えてモノエタノールアミン濃度が5mass%の、pH11.0の電解液を20L準備した。
これらを用いて、設定電圧10V、電流密度を5A/dm2とし、100Aの定電流で、温度を60℃に調整して電気分解を10時間行った。
この結果、4N以上の高純度のモリブデンを回収できた。モリブデン溶解量は0.6kgで、電流効率はほぼ100%であった。このように、高純度の金属のスクラップから純度を落とさず、簡易な製造工程によって効率的に高純度の金属を回収することができた。
Example 1
As the anode of the electrolytic cell, 5.0 kg of a target piece of molybdenum (purity 99.99%: 4N) was used.
A titanium plate was used as the cathode of the electrolytic cell.
As an electrolytic solution for the electrolytic bath, pure water was added to monoethanolamine to prepare 20 L of a 11.0 pH electrolytic solution having a monoethanolamine concentration of 5 mass%.
Using these, the set voltage was 10 V, the current density was 5 A / dm 2 , the temperature was adjusted to 60 ° C. at a constant current of 100 A, and electrolysis was performed for 10 hours.
As a result, high purity molybdenum of 4N or higher was recovered. The amount of molybdenum dissolved was 0.6 kg, and the current efficiency was almost 100%. Thus, high purity metal could be efficiently recovered by a simple manufacturing process without degrading purity from high purity metal scrap.
(実施例2)
電解槽のアノードとして、MoSi2合金(純度99.99%:4N)スクラップの小片3.0kgを用いた。
電解槽のカソードとして、チタン板を用いた。
電解槽の電解液として、モノエタノールアミンに純水を加えてモノエタノールアミン濃度が10mass%の、pH11.0の電解液を10L準備した。
これらを用いて、設定電圧10V、電流密度を50A/dm2とし、500Aの定電流で、温度を60℃に調整して電気分解を2時間行った。
この結果、ケイ素を除いたモリブデンの純度は99.99%:4Nであった。モリブデン溶解量は0.59kgで、電流効率はほぼ100%であった。このように、高純度の金属のスクラップから純度を落とさず、簡易な製造工程によって効率的に高純度の金属を回収することができた。
(Example 2)
As an anode of the electrolytic cell, a small piece of MoSi 2 alloy (purity 99.99%: 4N) scrap 3.0 kg was used.
A titanium plate was used as the cathode of the electrolytic cell.
As an electrolytic solution for the electrolytic cell, 10 L of an electrolytic solution having a pH of 11.0 and a monoethanolamine concentration of 10 mass% was prepared by adding pure water to monoethanolamine.
Using these, the set voltage was 10 V, the current density was 50 A / dm 2 , the temperature was adjusted to 60 ° C. at a constant current of 500 A, and electrolysis was performed for 2 hours.
As a result, the purity of molybdenum excluding silicon was 99.99%: 4N. The molybdenum dissolution amount was 0.59 kg, and the current efficiency was almost 100%. Thus, high purity metal could be efficiently recovered by a simple manufacturing process without degrading purity from high purity metal scrap.
(比較例1)
電解槽のアノードとして、タングステンリサイクル材(純度99.999%:5N)の不定形端材5kgをチタンバスケットに入れたものを用いた。
電解槽のカソードとして、チタン板を用いた。
電解槽の電解液として、硝酸アンモニウム及びアンモニア水に純水を加えて、硝酸アンモニウム濃度が10mass%且つアンモニア濃度が5mass%の、pH10.6の電解液を10L準備した。
これらを用いて、設定電圧5V、電流密度を5A/dm2とし、50Aの定電流で、温度を70℃に調整して電気分解を10時間行った。
この結果、回収されたタングステンの純度は、電解液に不純物が無いため99.999%であったが、タングステン溶解量は0.5kgで電流効率はほぼ90%となり、実施例に比べて低下した。また、電気分解の際にはアンモニア分が揮発するため、随時アンモニア水を電解液に補給しなければならず、非常に手間がかかり、アンモニア供給量も多く、実施例に比べて電気分解の効率面及びコスト面で不利となった。
また、比較例1において、電解液として苛性ソーダ(NaOH)を用いた試験、及び、亜硫酸ナトリウム(Na2SO3)を用いた試験を行ったが、それぞれNa、Sが純度を低下させてしまい、回収されたタングステンの純度は99.95%となった。
(Comparative Example 1)
As the anode of the electrolytic cell, a tungsten recycling material (purity 99.999%: 5N) in which 5 kg of irregular shaped end materials were put in a titanium basket was used.
A titanium plate was used as the cathode of the electrolytic cell.
As an electrolytic solution for the electrolytic bath, pure water was added to ammonium nitrate and aqueous ammonia, and 10 L of an electrolytic solution with a pH of 10.6 having an ammonium nitrate concentration of 10 mass% and an ammonia concentration of 5 mass% was prepared.
Using these, the set voltage was 5 V, the current density was 5 A / dm 2 , the temperature was adjusted to 70 ° C. at a constant current of 50 A, and electrolysis was performed for 10 hours.
As a result, the purity of the collected tungsten was 99.999% because there was no impurity in the electrolyte, but the tungsten dissolution amount was 0.5 kg and the current efficiency was almost 90%, which was lower than that of the example. . In addition, since the ammonia component volatilizes during electrolysis, it is necessary to replenish the electrolyte solution with ammonia water as needed, which is very time-consuming and requires a large amount of ammonia supply. It was disadvantageous in terms of costs and costs.
In Comparative Example 1, a test using caustic soda (NaOH) as an electrolytic solution and a test using sodium sulfite (Na 2 SO 3 ) were performed. However, Na and S each decreased the purity. The purity of the collected tungsten was 99.95%.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016158877A1 (en) * | 2015-03-31 | 2016-10-06 | Jx金属株式会社 | Tungsten production method |
WO2016159194A1 (en) * | 2015-03-31 | 2016-10-06 | Jx金属株式会社 | Recovery method for valuable material including tungsten |
WO2016158878A1 (en) * | 2015-03-31 | 2016-10-06 | Jx金属株式会社 | Tungsten carbide production method |
CN109763147A (en) * | 2019-03-28 | 2019-05-17 | 杨俊芬 | A kind of Manganese alloy production equipment |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62161977A (en) * | 1986-01-08 | 1987-07-17 | Showa Denko Kk | Manufacture of high-purity iron |
JPS63293186A (en) * | 1987-05-27 | 1988-11-30 | Nippon Hyomen Kagaku Kk | Method for dissolving metal in aqueous alkali solution |
JP2011132553A (en) * | 2009-12-22 | 2011-07-07 | Tanaka Kikinzoku Kogyo Kk | Method for electrolytically eluting platinum and electrolytic treatment apparatus |
JP2011202245A (en) * | 2010-03-26 | 2011-10-13 | Furukawa Electric Co Ltd:The | Method of manufacturing copper alloy fine particle and copper alloy fine particle provided by the manufacturing method |
JP2012079830A (en) * | 2010-09-30 | 2012-04-19 | Toppan Printing Co Ltd | Reproduction device and method for reproducing alkaline peeling liquid |
JP2013036111A (en) * | 2011-08-10 | 2013-02-21 | Jx Nippon Mining & Metals Corp | Method of recovering tungsten |
JP2014070261A (en) * | 2012-09-28 | 2014-04-21 | Jx Nippon Mining & Metals Corp | Method for recovering transition metal |
-
2012
- 2012-12-28 JP JP2012288822A patent/JP6100525B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62161977A (en) * | 1986-01-08 | 1987-07-17 | Showa Denko Kk | Manufacture of high-purity iron |
JPS63293186A (en) * | 1987-05-27 | 1988-11-30 | Nippon Hyomen Kagaku Kk | Method for dissolving metal in aqueous alkali solution |
JP2011132553A (en) * | 2009-12-22 | 2011-07-07 | Tanaka Kikinzoku Kogyo Kk | Method for electrolytically eluting platinum and electrolytic treatment apparatus |
JP2011202245A (en) * | 2010-03-26 | 2011-10-13 | Furukawa Electric Co Ltd:The | Method of manufacturing copper alloy fine particle and copper alloy fine particle provided by the manufacturing method |
JP2012079830A (en) * | 2010-09-30 | 2012-04-19 | Toppan Printing Co Ltd | Reproduction device and method for reproducing alkaline peeling liquid |
JP2013036111A (en) * | 2011-08-10 | 2013-02-21 | Jx Nippon Mining & Metals Corp | Method of recovering tungsten |
JP2014070261A (en) * | 2012-09-28 | 2014-04-21 | Jx Nippon Mining & Metals Corp | Method for recovering transition metal |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2016158877A1 (en) * | 2015-03-31 | 2018-02-01 | Jx金属株式会社 | Method for producing tungsten |
CN107429412A (en) * | 2015-03-31 | 2017-12-01 | 捷客斯金属株式会社 | The recovery method of the utility of tungstenic |
WO2016158878A1 (en) * | 2015-03-31 | 2016-10-06 | Jx金属株式会社 | Tungsten carbide production method |
JP2016191113A (en) * | 2015-03-31 | 2016-11-10 | Jx金属株式会社 | Method for recovering valuable material including tungsten |
WO2016158877A1 (en) * | 2015-03-31 | 2016-10-06 | Jx金属株式会社 | Tungsten production method |
CN107429319A (en) * | 2015-03-31 | 2017-12-01 | 捷客斯金属株式会社 | The manufacture method of tungsten |
WO2016159194A1 (en) * | 2015-03-31 | 2016-10-06 | Jx金属株式会社 | Recovery method for valuable material including tungsten |
JPWO2016158878A1 (en) * | 2015-03-31 | 2018-02-01 | Jx金属株式会社 | Method for producing tungsten carbide |
KR20170127551A (en) * | 2015-03-31 | 2017-11-21 | 제이엑스금속주식회사 | Method for recovering valuable materials including tungsten |
EP3279345A4 (en) * | 2015-03-31 | 2018-10-17 | JX Nippon Mining & Metals Corporation | Tungsten production method |
US10227235B2 (en) | 2015-03-31 | 2019-03-12 | Jx Nippon Mining & Metals Corporation | Method for producing tungsten carbide |
US10538849B2 (en) | 2015-03-31 | 2020-01-21 | Jx Nippon Mining & Metals Corporation | Method for recovering at least one valuable containing tungsten |
KR102011588B1 (en) * | 2015-03-31 | 2019-08-16 | 제이엑스금속주식회사 | Recovery method of valuables containing tungsten |
US10422022B2 (en) | 2015-03-31 | 2019-09-24 | Jx Nippon Mining & Metals Corporation | Method for producing tungsten |
CN109763147A (en) * | 2019-03-28 | 2019-05-17 | 杨俊芬 | A kind of Manganese alloy production equipment |
CN109763147B (en) * | 2019-03-28 | 2020-11-06 | 乌海三美国际矿业有限公司 | Manganese alloy production equipment |
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