JP2014114888A - Diaphragm type valve device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a diaphragm type valve device that can maintain the performance of a diaphragm in a good state without being influenced by temperature increase of a chemical liquid, even in a case where a fluorine resin having a good heat resistant characteristic in general is employed as the formation member of the diagram.SOLUTION: In a main valve device Vm, a diaphragm 80 comprising PTFE is provided in an inner hole part 42 with steps of a lower side housing member 40 to section and form an air pressure chamber Ra and a liquid pressure chamber Rb. Air pressure generated in the air pressure chamber Ra resists liquid pressure generated in the liquid pressure chamber Rb through the diaphragm 80 on the basis of the high temperature of a chemical liquid, to thereby reduce the differential pressure between both surfaces of the diaphragm 80.

Description

  The present invention relates to a diaphragm type valve device suitable for controlling the flow of a chemical used for manufacturing a semiconductor element or a liquid crystal panel.

  Conventionally, for example, in the manufacture of semiconductor elements, a resist formed by coating a pattern formed on a semiconductor wafer is etched based on the pattern and then peeled off by a chemical solution. In stripping the resist, the flow rate of the chemical solution is controlled based on the displacement of the diaphragm by a diaphragm type valve device interposed in the flow system.

  With respect to the resist peeling as described above, as the chemical solution, since a chemical solution having a high temperature, for example, a temperature exceeding 200 (° C.) is used from the viewpoint of improving productivity, the diaphragm of the diaphragm type valve device is good. It is necessary to have heat resistance characteristics.

  In response to this, for example, a resin diaphragm valve disclosed in Patent Document 1 below may be adopted as the diaphragm valve device. The diaphragm provided in the diaphragm valve is interposed between the valve box and the cylinder case. The diaphragm valve includes a valve body, an annular thin film portion integrally formed around the valve body, and the annular film portion. It is comprised by the cylindrical holding part integrally formed in the circumference | surroundings of the thin film part. Here, the valve body is supported by the front-end | tip part of the piston rod of a piston. Moreover, the cylindrical holding | maintenance part is pressed down between the groove | channel of a valve box, and the diaphragm holding | suppressing of a cylinder case.

  Thus, the diaphragm valve disengages the resist from the valve seat by opening the valve body away from the valve seat of the valve box by displacing the annular thin film portion of the diaphragm against the spring based on the air pressure. The chemical is flowed to the semiconductor wafer.

  Here, the diaphragm valve causes the chemical solution to flow while being in contact with the annular thin film portion of the diaphragm. Therefore, since the above-mentioned good heat resistance is required for the annular thin film portion of the diaphragm, in the diaphragm valve, polytetrafluoroethylene resin (PTFE) which is a material for forming the valve box is made of the annular thin film of the diaphragm. It is required to be adopted as a material for forming the part.

JP-A-11-37329

  By the way, in recent years, it is necessary to employ a chemical solution at a higher temperature, for example, 250 (° C.), in order to further improve productivity in the future, as the above-described chemical solution in peeling resist in the manufacture of semiconductor elements. Tend to be. Along with this, heat resistance characteristics to high temperatures of 250 (° C.) are also required for the annular thin film portion of the diaphragm of the resin diaphragm valve described above.

  However, even if the material for forming the annular thin film portion of the diaphragm is PFA or PTFE, when the temperature of the chemical solution exceeds 200 (° C.), water vapor or gas penetrates into the annular thin film portion. Such permeation further proceeds at a high temperature of 250 (° C.).

  Here, PFA and PTFE inevitably include a plurality of amorphous parts in the process of manufacturing. For this reason, when water vapor | steam and gas penetrate | invade into an annular thin film part as mentioned above, the said water vapor | steam and gas will penetrate | invade also into each amorphous part. In such a process, when the temperature of the annular thin film portion repeatedly fluctuates, the water vapor or gas that has entered the amorphous portion repeats vaporization, condensation, or solidification in the amorphous portion.

  Along with this, the volume (volume) of each amorphous portion changes with repetition of vaporization, condensation or solidification as described above. Accordingly, each amorphous portion expands or cracks are generated, causing a problem such as damage to the diaphragm or the like, or shortening the life of the diaphragm. In other words, the higher the temperature of the chemical solution, the more problems occur even with fluororesins that are generally considered to have good heat resistance properties such as PFA and PTFE.

  Therefore, in order to deal with the above, the present invention adopts a fluororesin, which is generally considered to have good heat resistance characteristics, as a diaphragm forming material, and the performance of the diaphragm is not affected by the high temperature of the chemical solution. It is an object of the present invention to provide a diaphragm type valve device that can be well maintained over a long period of time without being affected by the increase in the size.

In solving the above problems, the diaphragm type valve device according to the present invention, according to the description of claim 1,
A housing (H) having an inflow path (44, 43a) and an outflow path (45, 43b) for allowing a high-temperature chemical solution flowing into the inflow path to flow from the inflow path, and valve means (90, 90) provided in the housing 40c) and opening / closing means (32d, 32e, 60, 70, 80) for opening or closing the valve means,
The valve means includes an annular valve seat (40c) formed at the inner end opening of the inflow passage and a valve body (90) facing the annular valve seat so as to be seated, and through the annular valve seat. When the inflowing chemical liquid to the inflow path flows to the outflow path side, the valve is opened by dissociation from the annular valve seat of the valve body, and when the flow of the inflowing chemical liquid to the outflow path side is interrupted, to the annular valve seat of the valve body It is designed to close when seated.
The opening and closing means
Driving means (32d, 32e, 60, 70) for driving the valve body to be seated on or disengaged from the annular valve seat;
A pneumatic chamber portion (Ra) that is connected and formed between the outer wall portion of the valve body and the inner wall portion of the housing with a fluororesin having a predetermined heat resistance performance together with the housing and the valve body, and in which an air flow flows through the wall portion of the housing. And a diaphragm (80) that encloses and forms a hydraulic chamber (Rb) that encloses the valve body and communicates with the outflow path from the inner end opening thereof in the housing,
In the state where the inflow air flow into the air pressure chamber part causes air pressure to act on the diaphragm, when the valve part is opened by the driving means, the inflow chemical liquid to the inflow path passes through the annular valve seat and the liquid pressure An annular valve seat for inflowing chemical liquid into the inflow path when the valve section is closed by the driving means while flowing into the outflow path from the hydraulic pressure chamber section while flowing into the chamber and applying hydraulic pressure to the diaphragm. The flow to the outflow passage through the slab was blocked.

  According to this, the valve device includes a pneumatic chamber portion that opposes the hydraulic chamber portion via the diaphragm, and has an air pressure generated in the pneumatic chamber portion against the hydraulic pressure generated in the hydraulic chamber portion. The differential pressure between each pressure acting on both sides of the diaphragm was reduced.

  As a result, as the temperature of the chemical solution increases, even if water vapor or gas tends to penetrate the diaphragm, the differential pressure between the pressures acting on both surfaces of the diaphragm decreases as described above. Penetration to the diaphragm is well suppressed. As a result, even if the chemical solution repeatedly fluctuates in temperature, a long life can be maintained without damaging a material having a predetermined heat resistance, for example, a diaphragm made of PTFE or PFA. This means that the valve device can satisfactorily maintain the above-described on-off valve operation over a long period of time despite the further increase in the temperature of the chemical solution.

According to a second aspect of the present invention, in the diaphragm type valve device according to the first aspect,
The housing is provided with cylindrical peripheral walls (30a, 40a) and both end walls (30b, 40b) that close both axial ends of the cylindrical peripheral wall.
The driving means is
Between the partition member (50) coaxially fitted in the axial intermediate portion of the hollow portion (32, 42) of the cylindrical peripheral wall and one end wall (30b) of the both end walls of the housing. An open chamber portion (32d) that is slidably fitted in the hollow portion of the cylindrical peripheral wall in the axial direction and opened to the outside through the housing, and a control chamber portion to which an air flow is supplied from the outside through the housing A piston body (61) for partitioning and forming (32e) between the one end wall and the partition member, and from the piston body through the control chamber portion, the partition member and the diaphragm, into the hydraulic chamber portion A piston rod (63) having a piston rod (63) extending coaxially and supporting the valve body coaxially at its extended end;
An urging means (70) provided in the open chamber for urging the piston body toward the control chamber,
The inflow of the air flow into the pneumatic chamber is made to pass through both the cylindrical peripheral wall and the partition wall member or the cylindrical peripheral wall from the outside,
The valve means opens the valve body by disengaging the valve body from the annular valve seat in accordance with the sliding toward the open chamber side against the biasing means of the piston by supplying air flow into the control chamber. The valve element is seated on the annular valve seat in accordance with the sliding toward the control chamber portion based on the urging of the urging means of the piston while the supply of air flow into the chamber is stopped. To do.

  Thus, the drive means is configured as described above with the partition member, the piston, and the urging means, so that the piston is supplied with the air flow into the control chamber portion, and the urging means of the urging means in the piston body. Slides toward the open chamber against the bias to open the valve, and is controlled by the biasing means on the piston body as the air flow is stopped into the control chamber Slide to the chamber side to close the valve.

  Therefore, even with such a configuration of the driving means, the valve device can maintain the above-described on-off valve operation satisfactorily for a long period of time despite the higher temperature of the chemical solution.

According to a third aspect of the present invention, in the diaphragm type valve device according to the second aspect,
The cylindrical peripheral wall is formed with a passage (35, 35a) so as to communicate the inside of the hollow portion to the outside,
The partition member communicates the passage of the cylindrical peripheral wall with the pneumatic chamber and communicates an external air flow into the pneumatic chamber through the passage of the cylindrical peripheral wall (53). It is characterized by forming.

  Thus, by forming the communication passage portion in the partition wall member for allowing the air flow from the outside to flow into the pneumatic chamber portion through the passage of the cylindrical peripheral wall, the effect of the invention of claim 2 is specifically achieved. obtain.

  According to a fourth aspect of the present invention, there is provided the diaphragm valve device according to the third aspect, wherein the partition wall member has a branch passage portion that communicates an intermediate portion of the communication passage portion with the control chamber portion. (56) is formed.

  According to this, the air flow that is supplied from the outside through the passage of the cylindrical peripheral wall and the communication passage portion of the partition wall member into the air pressure chamber portion and generates air pressure in the air pressure chamber portion is an upstream portion of the communication passage portion. In addition, the gas flows into the control chamber through the branch path and generates a control pressure in the control chamber.

  Therefore, the same effect as that of the invention according to claim 3 can be substantially achieved while a single air flow supply source for supplying an air flow to both the pneumatic chamber and the control pressure chamber is used. It can be achieved as well.

According to a fifth aspect of the present invention, in the diaphragm type valve device according to the second aspect,
The cylindrical peripheral wall is provided with a passage (33, 33a) that communicates the control chamber with the outside.
The partition member forms a communication passage portion (55) for communicating the control chamber portion with the pneumatic chamber portion,
An air flow passes through the passage of the cylindrical peripheral wall and flows into the control chamber portion to cause air pressure to act on the piston body, and into the air chamber portion through the communication passage portion of the control chamber portion and the partition member. It is characterized in that it flows in and air pressure is applied to the diaphragm.

  According to this, the air flow that flows from the outside through the passage of the cylindrical peripheral wall into the control chamber and generates the control pressure in the control pressure chamber further passes through the communication passage of the partition wall member from the control chamber. The air flows into the air chamber and generates air pressure in the air pressure chamber.

  Therefore, the same effect as that of the invention of claim 2 can be substantially achieved while the air flow supply source for supplying the air flow to both the pneumatic chamber portion and the control pressure chamber portion is made common. It can be achieved as well.

  According to the sixth aspect of the present invention, in the diaphragm type valve device according to any one of the second to fifth aspects, the pressure receiving area of the piston body is set to a value wider than the pressure receiving area of the diaphragm. It is characterized by being.

  Thereby, the sliding of the piston for opening or closing the valve portion is ensured, and the function and effect of the invention according to any one of claims 2 to 5 can be further improved.

  According to a seventh aspect of the present invention, in the diaphragm type valve device according to the first to sixth aspects, the heat insulating layer (80a) provided along the inner side surface of the pneumatic chamber portion of both surfaces of the diaphragm. It is characterized by providing.

  According to this, a heat insulation layer plays the role which reduces the temperature difference between both surfaces of a diaphragm based on the heat insulation characteristic. Therefore, even if gas or water vapor penetrates into the diaphragm, the temperature from the chemical solution chamber side of the diaphragm to the pneumatic chamber side prevents the gas or water vapor from condensing or solidifying in the amorphous part of the diaphragm. The gradient is relaxed by the thermal insulation layer.

  Along with this, gas and water vapor pass through the diaphragm without being solidified or condensed in the diaphragm, and are solidified or condensed in the air chamber. Therefore, the lifetime of the diaphragm can be further improved, and as a result, the on-off valve operation of the valve device can be maintained better for a longer period of time.

  In addition, the code | symbol in the bracket | parenthesis of each said means shows a corresponding relationship with the specific means as described in embodiment mentioned later.

It is a block circuit diagram showing a 1st embodiment formed by applying the diaphragm type valve device concerning the present invention to the resist exfoliation system of a semiconductor manufacturing device. FIG. 2 is an enlarged longitudinal sectional view showing the diaphragm main valve device of FIG. 1 in a closed state. FIG. 2 is an enlarged longitudinal sectional view showing the diaphragm main valve device of FIG. 1 in a valve open state. FIG. 2 is an enlarged longitudinal sectional view showing the diaphragm type sub valve device of FIG. 1 in a valve open state. It is a longitudinal cross-sectional view which shows 2nd Embodiment of the diaphragm type valve apparatus which concerns on this invention. It is a longitudinal cross-sectional view which shows the principal part of 3rd Embodiment of the diaphragm type valve apparatus which concerns on this invention.

Hereinafter, each embodiment of the present invention will be described with reference to the drawings.
(First embodiment)
FIG. 1 shows a first embodiment of the present invention applied to a resist stripping system of a semiconductor manufacturing apparatus. In the semiconductor manufacturing apparatus, when forming a plurality of semiconductor wafers that have already been procured (see the respective symbols W1 and W2 in FIG. 1) as semiconductor elements, a predetermined pattern is roughly formed by each of the semiconductor wafers W1 and W2. In contrast, the resist is coated as a resist film on each of the semiconductor wafers W1 and W2 through the predetermined pattern. The resist film coated in this way is etched according to the predetermined pattern. Thereafter, the resist film etched in this way is peeled off in the resist peeling system of the semiconductor manufacturing apparatus, whereby each semiconductor element is manufactured.

  Here, the configuration of the resist stripping system will be described with reference to FIG. The resist stripping system includes a chemical solution supply source 10 and a supply pump 20 that store chemical solutions. With the operation, the supply pump 20 draws out the chemical solution from the chemical solution supply source 10 through the piping Q1 and discharges it into the piping Q2.

  The resist stripping system includes a diaphragm main valve device Vm, and this main valve device Vm is interposed between both pipes Q2 and Q3. The main valve device Vm includes a cylindrical housing H as shown in an enlarged manner in FIG. The housing H has upper and lower cylindrical housing members 30 and 40, and the upper housing member 30 has a shaft of the lower housing member 40 at its axially open end 31 as shown in FIG. The housing H is configured together with the lower housing member 40 by being joined to the direction opening end portion 41. In the first embodiment, the upper and lower cylindrical housing members 30 and 40 are made of polytetrahedral having predetermined heat resistance characteristics (for example, heat resistance characteristics that can withstand high temperatures of 20 (° C.) to 250 (° C.)). Fluoroethylene (hereinafter also referred to as PTFE) is employed.

  The upper housing member 30 includes a cylindrical peripheral wall 30a and an upper wall 30b. The upper wall 30b is formed integrally with the cylindrical peripheral wall 30a so as to close the upper end opening of the cylindrical peripheral wall 30a. The upper housing member 30 is configured.

  The cylindrical peripheral wall 30a is formed as a stepped inner hole portion 32 (hereinafter also referred to as an upper stepped inner hole portion 32) in the hollow portion, and the upper stepped inner hole portion 32 has a large inner diameter. It consists of a hole 32a, a medium diameter inner hole 32b, and a small diameter inner hole 32c.

  Here, the large-diameter inner hole portion 32a, the medium-diameter inner hole portion 32b, and the small-diameter inner hole portion 32c are sequentially coaxial from the axially open end 31 of the upper housing member 30 to the upper wall 30b of the upper housing member 30. Is formed. The upper stepped inner hole portion 32 constitutes a stepped inner hole portion that is a hollow portion of the housing H together with a stepped inner hole portion 42 of the lower housing member 40 described later.

  The upper housing member 30 has an inflow hole portion 33 and a discharge hole portion 34. The inflow hole portion 33 has a medium diameter through a communication passage portion 33a formed in a penetrating manner in an intermediate portion of the cylindrical peripheral wall 30a. It communicates with the inner hole 32b.

  As a result, the high-pressure airflow from the airflow supply source A1 passes through the opening / closing valve 33c into the lower chamber portion 32e (described later) of the medium-diameter inner hole portion 32b of the housing member 30 and the communication passage portion. It flows in through 33a. The air flow supply source A1 is configured to supply a high-pressure air flow. The communication passage 34a is formed in the cylindrical peripheral wall 30a so that the inside of the upper chamber 32d (described later) communicates with the outside of the cylindrical peripheral wall 30a through the discharge hole 34.

  Further, the upper housing member 30 has another inflow hole portion 35. The inflow hole portion 35 is directly below the inflow hole portion 33 and the communication passage portion 33a in FIG. 2 together with the communication passage portion 35a. Thus, the cylindrical peripheral wall 30a is formed in a penetrating manner.

  As a result, the air flow from the pneumatic pressure supply source A2 flows into the lower housing member 40 through the inflow hole portion 35 and the communication passage portion 35a as described later. The air pressure supply source A2 is configured to supply an air flow having a predetermined pressure. Further, the communication passage portion 35a is formed in the cylindrical peripheral wall 30a so as to allow the inflow hole portion 35 to communicate with the lower housing member 40 as described later.

  On the other hand, the lower housing member 40 includes a cylindrical peripheral wall 40a and a bottom wall 40b. The bottom wall 40b is integrated with the cylindrical peripheral wall 40a so as to close the lower end opening of the cylindrical peripheral wall 40a. The lower housing member 40 is formed. In the present embodiment, the upper wall 30b and the bottom wall 40b constitute the upper wall and the bottom wall of the housing H, respectively.

  As shown in FIG. 2, the cylindrical peripheral wall 40 a is formed as a stepped inner hole portion 42 (hereinafter also referred to as a lower stepped inner hole portion 42) in the hollow portion, and the lower stepped portion is formed. The inner hole portion 42 is formed in a U-shaped longitudinal section in the lower housing member 40 so as to be positioned coaxially with the large-diameter inner hole portion 32 a of the upper housing member 30.

  The lower stepped inner hole portion 42 includes a small diameter inner hole portion 42a and a large diameter inner hole portion 42b. As shown in FIG. 2, the large-diameter inner hole portion 42b is formed coaxially with the small-diameter inner hole portion 42a on the opening end side of the small-diameter inner hole portion 42a. It joins so that the opening part of the part 32a may be opposed. In the large-diameter inner hole portion 42b, a large-diameter portion 51 (described later) of the partition wall member 50 is coaxially fitted at the extended end portion.

  Further, as shown in FIG. 2, the lower housing member 40 has an annular valve seat 40c, and the annular valve seat 40c is formed so as to open at the center of the bottom wall of the small-diameter inner hole portion 42a. Thus, it functions as a seating member for the valve body 90 (described later).

  The lower housing member 40 includes an inflow path portion 43a, an outflow path portion 43b, an inflow tube portion 44, and an outflow tube portion 45. The inflow passage portion 43a is formed between the annular valve seat 40c and the inner end opening of the inflow cylinder portion 44 inside the bottom wall 40b of the lower housing member 40, and the inflow passage portion 43a is The inner end opening communicates with the small diameter inner hole portion 42a of the stepped inner hole portion 42 through the hollow portion of the annular valve seat 40c.

  On the other hand, the outflow passage 43 b is formed between the peripheral wall opening of the small diameter inner hole 42 a of the stepped inner hole 42 and the inner end opening of the outflow cylinder 45 in the lower housing member 40. The outflow path portion 43 b allows the inside of the small diameter inner hole portion 42 a to communicate with the inside of the outflow cylinder portion 45.

  The inflow cylinder portion 44 is connected to the outer end opening portion of the inflow passage portion 43a at the inner end opening portion, and the inflow cylinder portion 44 is connected to the outflow end opening of the pipe Q2 at the outer end opening portion. It is connected to the part. Accordingly, the chemical solution from the pipe Q2 can flow into the stepped inner hole portion 42 through the inflow cylinder portion 44, the communication passage portion 43, and the annular valve seat 40c.

  The outflow cylinder 45 is connected to the outer end opening of the outflow passage 43b at the inner end opening, and the outflow cylinder 45 is connected to the inflow end of the pipe Q3 at the outer end opening. It is connected to the part. Accordingly, the chemical solution in the stepped inner hole portion 42 flows into the pipe Q3 through the outflow passage portion 43b and the outflow tube portion 45.

  The main valve device Vm includes a partition member 50, a cylindrical piston 60, a coil spring 70, a diaphragm 80, and a valve body 90 assembled in a housing H as shown in FIG.

  As shown in FIG. 2, the partition wall member 50 is configured as follows and coaxially fitted inside both the large-diameter inner hole portion 32 a and the medium-diameter inner hole portion 32 b of the upper housing member 30. Yes.

  The partition member 50 is integrally configured with a cylindrical large diameter portion 51 and a cylindrical small diameter portion 52. The cylindrical large-diameter portion 51 is fitted coaxially and airtightly from the axially open end portion 31 side of the upper housing member 30 into the large-diameter inner hole portion 32a of the upper housing member 30. The large-diameter portion 51 has a lower end portion that extends downward from the large-diameter inner hole portion 32 a into the large-diameter inner hole portion 42 b of the lower housing member 40. The cylindrical small-diameter portion 52 extends coaxially from the upper end portion of the cylindrical large-diameter portion 51 and is airtightly fitted into the lower half of the medium-diameter inner hole portion 32b of the upper housing member 30. In the first embodiment, PTFE is adopted as a material for forming the partition member 50.

  Further, the partition member 50 has a communication passage portion 53, and the communication passage portion 53 communicates the communication passage portion 35 a of the upper housing member 30 into the large-diameter inner hole portion 42 b of the lower housing member 40. As shown in the figure, the cylindrical large-diameter portion 51 and the cylindrical small-diameter portion 52 of the partition wall member 50 are formed in an L shape over the respective peripheral walls. As a result, the air flow from the pneumatic supply source A2 passes through the inflow hole portion 35 and the communication passage portion 35a of the upper housing member 30 and the communication passage portion 53 of the partition wall member 50, and the large-diameter inner hole portion of the lower housing member 40. 42b flows into 42b.

  As shown in FIG. 2, the columnar piston 60 includes a large-diameter piston main body 61, a medium-diameter head 62, and a small-diameter piston rod 63. The piston main body 61 has a medium diameter through an O-ring 61a between the cylindrical small diameter portion 52 of the partition member 50 and the annular boundary step portion of the medium diameter inner hole portion 32b of the upper housing member 30 with respect to the small diameter inner hole portion 32c. The inner hole 32b is fitted coaxially and slidably.

  Accordingly, the piston main body 61 divides the hollow portion of the upper housing member 30 between the upper wall 30b of the upper housing member 30 and the cylindrical small diameter portion 52 of the partition wall member 50, thereby separating the upper chamber portion 32d and the lower chamber. A portion 32e is formed. Accordingly, the upper chamber portion 32d communicates with the discharge hole portion 34 through the communication passage portion 34a of the upper housing member 30, and the lower chamber portion 32e communicates with the inlet portion via the communication passage portion 33a of the upper housing member 30. 33 communicates with the inside. The O-ring 61a is fitted in an annular groove formed in the outer peripheral portion of the piston main body 61, and the outer peripheral surface of the piston main body 61 and the inner peripheral surface of the medium-diameter inner hole portion 32b of the upper housing member 30. Seal the space hermetically.

  The medium-diameter head 62 extends coaxially from the piston body 61 into the upper chamber portion 32d. The piston rod 63 has a rod portion 63a and a male screw portion 63b. The rod portion 63a is coaxially directed from the piston main body 61 in the direction opposite to the head portion 62, so that the lower chamber portion 32e and the partition wall member 50 It extends through the hollow portion into the stepped inner hole portion 42 of the lower housing member 40 through the O-ring 54 in an airtight manner.

  The male screw portion 63b is formed with a smaller diameter than the rod portion 63a, and the male screw portion 63b extends into the stepped inner hole portion 42 from the extending end portion of the rod portion 63a. The O-ring 54 is fitted in an annular groove formed on the inner peripheral surface of the hollow portion of the large-diameter portion 51 of the partition wall member 50, and is between the outer peripheral surface of the rod portion 63 a and the inner peripheral surface of the hollow portion of the partition member 50. Seal hermetically.

  The coil spring 70 is coaxially interposed between the upper wall 30 b and the piston main body 61 of the piston 60 in the upper chamber portion 32 d of the upper housing member 30, and the coil spring 70 is connected to the piston main body 61. Is urged toward the lower chamber portion 32e.

  The diaphragm 80 is configured integrally with the valve body 90. The diaphragm 80 is accommodated in the large-diameter inner hole portion 42b of the stepped inner hole portion 42, and is integrally formed of PTFE with the annular thin film portion 81 and the annular thick film portion 82.

  Here, the annular thin film portion 81 is formed concentrically and integrally with an opening end portion 91 (described later) of the valve body 90 at the inner peripheral edge portion thereof. The annular thick film portion 82 is integrally formed with the annular thin film portion 81 along the outer peripheral edge portion of the annular thin film portion 81, and the annular pressure film portion 82 is a lower end surface of the large diameter portion 51 of the partition wall member 50. And the annular bottom surface of the large-diameter inner hole portion 42b of the lower housing member 40. Thereby, the diaphragm 80 partitions the inside of the stepped inner hole portion 42 to form the pneumatic chamber portion Ra and the hydraulic chamber portion Rb.

  In the first embodiment, since the outer peripheral portion of the annular thin film portion 81 is integrated with the inner peripheral lower edge portion of the annular thick film portion 82, the diaphragm 80 is formed in a concave shape in the longitudinal section as shown in FIG. Has been. Accordingly, in the diaphragm 80, the pneumatic chamber portion Ra is formed on the upper surface of the annular thin film portion 81 on the inner peripheral surface side of the annular thick film portion 82, and the communication passage portion 53 of the partition wall member 50 and The upper housing member 30 communicates with the inflow hole portion 35 of the upper housing member 30 through the communication passage portion 35 a. On the other hand, the hydraulic chamber portion Rb is constituted by a small-diameter inner hole portion 42 a of a lower stepped inner hole portion 42 located below the annular thin film portion 81 of the diaphragm 80. Here, the hydraulic chamber Rb communicates with the inflow passage 43a of the lower housing member 40 via the annular valve seat 40c located at the center opening of the bottom wall (the bottom wall of the small-diameter inner hole 42a). The opening formed in the peripheral wall of the hydraulic pressure chamber Rb communicates with the outflow passage 43b.

  Accordingly, the air pressure supply source A2 passes through the inflow hole 35 and the communication passage 35a of the upper housing member 30 and the communication passage 53 of the partition wall member 50 and is supplied into the large-diameter inner hole 42b of the lower housing member 40. The air flow flows into the pneumatic chamber Ra, while the chemical liquid flowing into the inlet passage 43a of the lower housing member 40 flows into the hydraulic chamber Rb via the annular valve seat 40c.

  This is because the air flow that flows into the pneumatic chamber Ra generates an air pressure that acts on the diaphragm 80 in the pneumatic chamber Ra and the flow of the chemical solution that flows into the hydraulic chamber Rb. Means that a hydraulic pressure acting on the diaphragm 80 is generated in the hydraulic pressure chamber Rb. The air pressure generated in the air pressure chamber portion Ra (substantially the pressure of the air flow from the air pressure supply source A2) may be substantially equal to the liquid pressure generated in the air pressure chamber portion Rb. The pressure may be higher or lower than the hydraulic pressure.

  Thus, in the diaphragm 80, the annular thin film portion 81 has the piston 60 under the pressure difference between the air pressure of the air flow into the pneumatic chamber Ra and the hydraulic pressure of the chemical into the hydraulic chamber Rb. As the shaft slides in the axial direction, it is curved and displaced by elastic deformation.

  Here, the grounds for additionally employing the inflow hole portion 35 and the communication passage portion 35a of the upper housing member 30 and the communication passage portion 53 of the partition wall member 50 in the first embodiment will be described.

  As described at the beginning of the present specification, the penetration of water vapor or gas into the diaphragm 80 increases as the temperature of the chemical increases, and the amorphous portion in the material forming the diaphragm 80 increases in volume (volume). Cracks are generated. Such an increase in the penetration of water vapor or gas in the diaphragm 80 is caused by a large difference between the pressures acting on both surfaces of the diaphragm 80, and as a result, the life of the diaphragm 80 is shortened due to damage or the like.

  In the first embodiment, if there is no inflow of air flow into the pneumatic chamber Ra, the diaphragm 80 is placed on the lower surface of the annular thin film portion 81 (surface on the hydraulic chamber Rb side). Only receiving the pressure of the chemical solution. This means that the difference between the pressures acting on both surfaces of the diaphragm 80 is large.

  Therefore, in the first embodiment, an air flow is caused to flow into the pneumatic chamber Ra to reduce the difference between the pressures acting on both surfaces of the diaphragm 80, so that the amorphous material in the forming material of the diaphragm 80 is reduced. The change in volume (volume) of the part and the generation of cracks were prevented in advance, and the performance of the diaphragm 80 was maintained well over a long period of time.

  The valve body 90 is accommodated in the small-diameter inner hole portion 42a (hydraulic pressure chamber portion Rb) of the lower housing member 40, and constitutes the valve portion of the main valve device Vm together with the annular valve seat 40c. The valve body 90 is integrally formed with the diaphragm 80 and is formed into a substantially cylindrical shape with a vertical cross section by PTFE. The valve body 90 has a male thread portion 63b and a rod portion of the rod 63 of the piston 60 in its hollow portion. It fits over the extended end part of 63a, and is fastened by the external thread part 63b. Accordingly, the opening end 91 of the valve body 90 is formed integrally with the inner peripheral edge of the annular thin film portion 81 of the diaphragm 80 so as to follow the outer peripheral surface of the extending end of the rod portion 63a.

  Further, the valve body 90 has a seating portion 92, and the seating portion 92 is formed to be thickly formed at the center of the bottom wall of the valve body 90 so as to face the annular valve seat 40c. Yes.

  Thus, in the main valve device Vm configured as described above, when the piston 60 is located at the lower moving end, the valve body 90 is seated on the annular valve seat 40c at the seating portion 92 and hydraulic pressure is increased. The communication between the chamber portion Rb and the inflow path portion 43a of the lower housing member 40 is blocked (see FIG. 2). This means that the main valve device Vm shuts off the inflow of the chemical liquid from the pipe Q2 to the pipe Q3 by closing the valve portion.

  Further, the valve body 90 is dissociated from the annular valve seat 40c as the piston 60 moves upward, and causes the hydraulic chamber Rb to communicate with the inflow passage 43a of the lower housing member 40 (see FIG. 3). This means that the main valve device Vm allows the chemical solution from the pipe Q2 to flow into the pipe Q3 by opening the valve portion.

  The operation characteristics of the main valve device Vm in the first embodiment will be described. In this description, in the main valve device Vm, from the pneumatic pressure supply source A2, the inlet hole portion 35 and the communication passage portion 35a of the upper housing member 30, the communication passage portion 53 of the partition wall member 50, and the pneumatic chamber portion of the lower housing member 40 are provided. The operating characteristics of the valve device having a configuration excluding the air flow supply path configuration up to Ra, that is, the conventional valve device will be described.

  When this conventional valve device is in the closed state, the following inequality (1) is established.

W> P1 × Ss + P2 × Sd (1)
In this inequality (1), W, P1, Ss, P2 and Sd represent the following physical quantities.

W ... Spring load P1 ... Valve fluid pressure Ss ... Valve pressure receiving area P2 ... Diaphragm fluid pressure Sd ... Diaphragm pressure receiving area Here, the spring load W is applied to the piston from the upper chamber portion 32d side. The biasing load of the coil spring 70 acting on the main body 61 is said. The valve body fluid pressure P1 refers to the pressure of the chemical solution in the inflow path portion 43a that acts on the seating portion 92 of the valve body 90 via the annular valve seat 40c. The valve body pressure receiving area Ss refers to the surface area of the seating portion 92 of the valve body 90.

  The diaphragm fluid pressure P <b> 2 is the pressure of the chemical solution in the fluid pressure chamber Rb that acts on the lower surface of the annular thin film portion 81 of the diaphragm 80. The diaphragm pressure receiving area Sd refers to each area of the upper surface and the lower surface of the annular thin film portion 81.

  On the other hand, when the conventional valve device is in an open state, the following inequality (2) is established.

P1 * Ss + P2 * Sd + Pa * Sp> W (2)
In this inequality (2), Pa and Sp represent the following physical quantities.

Pa—Piston control pressure Sp—Piston pressure receiving area Here, the piston control pressure Pa refers to the pressure of the air flow in the lower chamber portion 32 e that acts on the annular lower surface of the piston body 61. The piston pressure receiving area Sp refers to the area of the annular lower surface of the piston body 61.

  In the conventional valve device having the above-described configuration having the above-described operation characteristics, as described at the beginning of the present specification, the higher the temperature of the chemical solution exceeds 200 (° C.), the more the diaphragm Due to the progress of water vapor or gas intrusion into the amorphous part, it causes deterioration such as breakage or shortened life. For this reason, in the conventional valve apparatus of the said structure, there exists a possibility that the original action | operation cannot be maintained.

  As a measure for preventing the deterioration of the diaphragm in such a conventional valve device, it is possible to suppress the intrusion of water vapor or gas into the amorphous part of the diaphragm. Therefore, from this point of view, in the first embodiment, attention is paid to the fact that the intrusion of water vapor and gas into the amorphous portion of the diaphragm can be suppressed by reducing the differential pressure acting between both surfaces of the diaphragm. The main valve device Vm is different from the conventional valve device having the above-described configuration, as described above, from the air pressure supply source A2 to the inlet hole portion 35 and the communication passage portion 35a of the upper housing member 30, and the communication passage of the partition wall member 50. An air flow supply path configuration extending to the portion 53 and the pneumatic chamber Ra of the lower housing member 40 is provided.

  According to such a configuration, the air pressure of the air flow from the air pressure supply source A2 resists the liquid pressure of the chemical liquid acting on the diaphragm 80 in the liquid pressure chamber portion Rb in the air pressure chamber portion Ra. Thus, it acts on the diaphragm 80. For this reason, the differential pressure with respect to both surfaces of the diaphragm 80 decreases.

  However, since the air pressure acting on the diaphragm 80 in the air pressure chamber Ra acts in the direction of closing the main valve device Vm, the main valve device Vm is opened with the above inequality (2). Can not do it. Therefore, in order to open the main valve device Vm, the area of the annular lower surface of the piston body 61 (piston pressure receiving area Sp) is greater than the area of the upper and lower surfaces of the annular thin film portion 81 of the diaphragm 80 (diaphragm pressure receiving area Sd). Also, it is necessary to set a wide value. That is, the following inequality (3) must be established.

Pa × Sp> W + Pc × Sd (3)
In this inequality (3), Pc represents the air pressure (diaphragm air pressure) applied to the upper surface of the annular thin film portion 81 of the diaphragm 80 by the pressure of the air flow in the air pressure chamber portion Ra.

  Therefore, in the main valve device Vm referred to in the first embodiment, from the pneumatic supply source A2, the inflow hole portion 35 and the communication passage portion 35a of the upper housing member 30, the communication passage portion 53 of the partition wall member 50, and the lower housing member 40 are provided. In addition to the air flow supply path configuration up to the air pressure chamber Ra, the piston pressure receiving area Sp is larger than the diaphragm pressure receiving area Sd in order to establish the inequality (3).

  Thus, when the main valve device Vm is in a closed state, the following inequality (4) is established, unlike the inequality (1) described above.

W + Pc × Sd> P1 × Ss + P2 × Sd (4)
On the other hand, when the main valve device Vm is in the valve open state, the following inequality (5) is established on the assumption of the above inequality (3), unlike the above inequality (2).

P1 * Ss + P2 * Sd + Pa * Sp> W + Pc * Sd (5)
However, in the first embodiment, the air flow from the air flow supply source A2 flows into the pneumatic chamber Ra regardless of whether the main valve device Vm is open or closed. Yes.

  The resist stripping system includes a heater 100 and a back pressure valve 110 as shown in FIG. The heater 100 is supplied with a chemical solution from the main valve device Vm via the pipe Q3, heats the chemical solution to a predetermined high temperature (for example, 250 (° C.)), and flows the chemical solution into the pipe Q4 as a heated chemical solution. The back pressure valve 110 maintains the pressure of the heated chemical solution in the pipe Q4 below a predetermined relief pressure. When the pressure of the heated chemical liquid in the pipe Q4 rises above the predetermined relief pressure, the back pressure valve 110 discharges the heated chemical liquid in the pipe Q4 into the pipe Q5 and returns it to the chemical liquid supply source 10. This means that the back pressure valve 110 maintains the liquid pressure of the heated chemical solution in the pipe Q4 at the predetermined relief pressure.

  Further, as shown in FIG. 1, the resist stripping system includes a diaphragm type sub-valve devices Vsa and Vsb. The both sub-valve devices Vsa and Vsb are connected to the air inlet 33 by air. An air flow is supplied from the flow supply source A1 and is connected to the pipe Q4 via the pipes Q6 and Q7 at the respective inflow cylinder portions 44.

  In the first embodiment, since both the auxiliary valve devices Vsa and Vsb have the same configuration, the auxiliary valve device Vsa will be described as an example.

  As shown in FIG. 4, the sub-valve device Vsa has a configuration in which a communication passage portion 55 is provided in the partition wall member 50 instead of the communication passage portion 53 in the main valve device Vm.

  Here, the communication passage portion 55 is formed in a penetrating shape along the axial direction of the peripheral wall of the partition wall member 50 so as to allow the inside of the above-described pneumatic chamber portion Ra to communicate with the inside of the lower chamber portion 32e. Therefore, as shown in FIG. 4, the air flow from the air flow supply source A1 flows into the lower chamber portion 32e and passes through the communication passage portion 55 of the partition wall member 50 and also into the pneumatic chamber portion Ra. Inflow. Therefore, the pressure of the air flow from the air flow supply source A1 acts as a control pressure on the piston body 61 in the lower chamber portion 32e and acts as an air pressure on the diaphragm 80 in the air pressure chamber portion Ra. .

  When the sub valve device Vsa is closed, the air flow from the air flow supply source A1 is not supplied into the lower chamber portion 32e, so that no air pressure is generated in the air pressure chamber portion Ra. Therefore, in the closed state of the sub valve device Vsa, the following inequality (6) is established instead of the above inequality (4).

W> P1 × Ss + P2 × Sd (6)
On the other hand, when the sub valve device Vsa is opened, the air flow from the air flow supply source A1 is supplied to both the lower chamber portion 32e and the pneumatic chamber portion Ra. For this reason, although the control pressure generated in the lower chamber portion 32e acts in the valve opening direction of the sub valve device Vsa, the air pressure generated in the pneumatic chamber portion Ra acts in the valve closing direction of the sub valve device Vsa. To do. Therefore, in the valve open state of the sub-valve device Vsa, the above inequality (5) is established on the premise of the above inequality (3).

  Thus, when the sub-valve device Vsa is closed, air is supplied from the air flow supply source A1 to the inside of the lower chamber portion 32e and the pneumatic chamber portion Ra via the on-off valve 33a (see FIG. 1 or 4). Based on the inequality (6), the valve spring 90 is stopped based on the urging force of the coil spring 70 against the piston body 61 and the fluid pressures on the valve body 90 and the diaphragm 80 due to the chemical in the inflow passage 43a. The body 90 is seated on the annular valve seat 40c to block the flow of the chemical solution from the pipe Q6 into the pipe Q8.

  In addition, the sub-valve device Vsa, when opened, is based on the inequality (5 ), The biasing force of the coil spring 70 against the piston body 61, the air pressure acting on the diaphragm 80 in the air pressure chamber Ra, the control pressure acting on the piston body 61 in the lower chamber portion 32e, and the inflow The chemical solution from the pipe Q6 is directed to the semiconductor wafer W1 through the pipe Q8 by dissociation from the annular valve seat 40c of the valve body 90 according to the respective liquid pressures with respect to the valve body 90 and the diaphragm 80 by the chemical liquid in the passage portion 43a. Make it flow.

  As described above, the auxiliary valve device Vsb has the same configuration as the auxiliary valve device Vsa. Therefore, the sub-valve device Vsb blocks the inflow of the chemical solution from the pipe Q7 to the pipe Q9 by seating the valve body 90 on the annular valve seat 40c when the valve is closed. In addition, when the sub-valve device Vsb is opened, the chemical solution from the pipe Q7 flows toward the semiconductor wafer W2 through the pipe Q9 by dissociating the valve body 90 from the annular valve seat 40c.

  In the first embodiment configured as described above, it is assumed that the main valve device Vm and the sub valve devices Vsa and Vsb of the resist stripping system are both closed. Accordingly, the supply of airflow from the airflow supply source A1 to the main valve device Vm and the sub valve devices Vsa and Vsb is stopped under the closing of the on-off valves 33a to 33c. However, the air flow from the air flow supply source A2 is not related to the on / off valve operation with respect to the main valve device Vm, but the inflow hole portion 35, the communication passage portion 35a of the main valve device Vm, and the communication passage portion of the partition wall member 50. It is assumed that the air flows into the pneumatic chamber Ra through 53 and the pneumatic pressure is applied to the diaphragm 80 in the pneumatic chamber Ra.

  In such a state, the supply pump 20 pumps up the chemical liquid from the chemical liquid supply source 10 via the pipe Q1 and discharges it into the pipe Q2, and the air flow supply source A1 opens the open / close valves 33a to 33c. When an air flow is supplied to the main valve device Vm and the sub valve devices Vsa and Vsb, the chemical liquid discharged into the pipe Q2 flows into the inflow cylinder portion 44 and the inflow passage portion in the hydraulic pressure chamber portion Rb of the main valve device Vm. 43a and flows into the hydraulic chamber Rb to cause the diaphragm 80 to act on the diaphragm 80. On the other hand, the air flow from the air flow supply source A2 is supplied to the main valve device Vm and the sub valve devices Vsa, The Vsb flows into the lower chamber portions 32e through the corresponding inflow hole portions 33 and the communication passage portions 33a, and a control pressure is applied to the piston body 61 in the lower chamber portions 32e. Further, as described above, the air flow that has flowed into the lower chamber portions 32e of the auxiliary valve devices Vsa and Vsb passes through the communication passage portions 55 of the corresponding partition members 50 and enters the corresponding pneumatic chamber portions Ra. Inflow. For this reason, the air flow that has flowed into the corresponding pneumatic chambers Ra causes air pressure to act on the corresponding diaphragms 80 in the pneumatic chambers Ra of the auxiliary valve devices Vsa and Vsb. .

  Then, in the main valve device Vm, the piston 60 resists the urging force of the coil spring 70 against the piston main body 61 and the air pressure against the diaphragm 80 in the air pressure chamber Ra based on the inequality (2). Based on the control pressure in the lower chamber 32e, the hydraulic pressure of the chemical acting on the valve body 90 of the chemical from the inflow passage 43a via the annular valve seat 40c, and the hydraulic pressure on the diaphragm 80 in the hydraulic pressure chamber Rb. By sliding, the valve body 90 is dissociated from the annular valve seat 40c and opened. Then, the chemical liquid that has flowed into the hydraulic chamber Rb of the main valve device Vm flows into the heater 100 through the outflow passage 43b and the pipe Q3.

  Here, the difference between the pressures acting on both surfaces of the diaphragm 80 decreases based on the air pressure in the pneumatic chamber Ra acting on the diaphragm 80 against the fluid pressure in the fluid pressure chamber Rb. Therefore, even if the temperature of the chemical solution is high, the penetration of water vapor or the like into the amorphous part of the material forming the diaphragm 80 is suppressed, and the diaphragm 80 is good for a long period of time without causing deterioration due to damage or the like. Can be maintained. This leads to an improvement in the lifetime of the diaphragm 80.

  As described above, when the chemical solution flows into the heater 100, the chemical solution is heated by the heater 100 and flows into the pipe Q4 as the predetermined high-temperature heating chemical solution. Thus, the heated chemical liquid that has flowed into the pipe Q4 is maintained at the predetermined relief pressure by the back pressure valve 110 and flows into the auxiliary valve devices Vsa and Vsb through the corresponding pipes Q6 and Q7. When the pressure of the heated chemical liquid in the pipe Q4 rises above the predetermined relief pressure, the heated chemical liquid in the pipe Q4 passes through the back pressure valve 110 and passes through the pipe Q5 until the pressure decreases to the predetermined relief pressure. Return to the chemical solution supply source 10. Therefore, the temperature of the chemical liquid discharged by the supply pump 20 is usually high.

  When the heated chemical liquid flows into the auxiliary valve device Vsa as described above, in the auxiliary valve device Vsa, the heated chemical solution from the pipe Q6 flows into the hydraulic pressure chamber portion Rb through the inflow cylinder portion 44 and the inflow passage portion 43a. Then, a hydraulic pressure is applied to the diaphragm 80.

  Then, the sub-valve device Vsa resists the urging force of the coil spring 70 against the piston body 61 and the air pressure in the air pressure chamber portion Ra acting on the diaphragm 80, and the inside of the lower chamber portion 32e acting on the piston body 61. The valve body 90 is adjusted to the valve seat 40c on the basis of the control pressure, the hydraulic pressure of the chemical liquid acting on the valve body 90 of the chemical liquid from the inflow passage 43a through the annular valve seat 40c and the hydraulic pressure on the diaphragm 80 in the hydraulic pressure chamber Rb Dissociate from and open.

  Here, also in the auxiliary valve device Vsa, the difference between the pressures acting on both surfaces of the diaphragm 80 is caused by the air pressure in the air pressure chamber portion Ra acting on the diaphragm 80 against the fluid pressure in the fluid pressure chamber Rb. Decrease based on. Therefore, even if the temperature of the chemical solution is high, the penetration of water vapor or the like into the amorphous part of the material forming the diaphragm 80 is suppressed, and the diaphragm 80 is good for a long period of time without causing deterioration due to damage or the like. Can be maintained. This leads to an improvement in the lifetime of the diaphragm 80.

  When the auxiliary valve device Vsa is opened as described above, in the auxiliary valve device Vsa, the heated chemical liquid in the pipe Q6 flows into the inflow cylinder portion 44, the inflow passage portion 43a, the annular valve seat 40c, the hydraulic pressure chamber portion Rb, It flows toward the semiconductor wafer W1 through the outflow passage 43b and the pipe Q8. Thereby, the etched resist film of the semiconductor wafer W1 is peeled off and manufactured as a semiconductor element.

  The auxiliary valve device Vsb is also opened in the same manner as the auxiliary valve device Vsa, and the heated chemical solution in the pipe Q7 is supplied with the inflow cylinder portion 44, the inflow passage portion 43a, the annular valve seat 40c, the hydraulic pressure chamber portion Rb, and the outflow passage portion 43b. And flows through the pipe Q9 toward the semiconductor wafer W2. Thereby, the etched resist film of the semiconductor wafer W2 is peeled off and manufactured as a semiconductor element.

  Here, also in the sub-valve device Vsb, the difference between the pressures acting on both surfaces of the diaphragm 80 is such that the pneumatic pressure in the pneumatic chamber portion Ra acting on the diaphragm 80 against the hydraulic pressure in the hydraulic pressure chamber Rb. Decrease based on Therefore, even if the temperature of the chemical solution is high, the penetration of water vapor or the like into the amorphous part of the material forming the diaphragm 80 is suppressed, and the diaphragm 80 is good for a long period of time without causing deterioration due to damage or the like. Can be maintained. This leads to an improvement in the lifetime of the diaphragm 80.

  As described above, in the first embodiment, the main valve device Vm includes the pneumatic chamber portion Ra facing the hydraulic chamber portion Rb through the diaphragm 80, and the hydraulic pressure generated in the hydraulic chamber portion Rb. The differential pressure between the pressures acting on both surfaces of the diaphragm 80 is reduced by the air pressure generated in the air pressure chamber portion Ra against the above.

  Therefore, even if the temperature of the chemical solution is high, the penetration of water vapor or the like into the amorphous part of the material forming the diaphragm 80 is suppressed, and the diaphragm 80 is good for a long period of time without causing deterioration due to damage or the like. Can be maintained. This means that even if the temperature of the chemical solution is high, the lifetime of the diaphragm 80 having predetermined heat resistance characteristics is improved. As a result, the main valve device Vm can maintain the above-described on-off valve operation satisfactorily over a long period of time, leading to a long life. The above is also true for the two auxiliary valve devices Vsa and Vsb.

Here, in any of the main valve device Vm and the both sub-valve devices Vsa and Vsb, the pressure receiving area of the piston body 61 of the piston 60 is set wider than the pressure receiving area of the annular thin film portion 81 of the diaphragm 80 as described above. Therefore, the valve opening operation of the main valve device Vm and the both sub-valve devices Vsa and Vsb can be ensured.
(Second Embodiment)
FIG. 5 shows an auxiliary valve device Vsa that is a main part of the second embodiment of the present invention. The sub-valve device Vsa is characterized in that the branch passage portion 56 is additionally provided in the partition wall 50 in the main valve device Vm described in the first embodiment.

  Here, the branch path portion 56 is formed by branching along the axial direction of the peripheral wall of the partition wall 50 so that the inside of the intermediate portion of the communication passage portion 53 described above communicates with the inside of the lower chamber portion 32e. . For this reason, the airflow from the airflow supply source A2 flows into the upstream portion of the inflow hole portion 35 and the communication passage portion 35a of the upper housing member 30 and the communication passage portion 53 of the partition wall member 50 described in the first embodiment. In this way, the inflowing lower air flow into the upstream portion in this way flows into the lower chamber portion 32e through the branch path portion 56 and into the pneumatic chamber Ra through the downstream portion of the communication passage portion 53. .

  Accordingly, the pressure of the air flow from the air flow supply source A2 acts as a control pressure on the piston body 61 in the lower chamber portion 32e and acts as an air pressure on the diaphragm 80 in the air pressure chamber portion Ra. . Accordingly, it is not necessary to supply an air flow from the air flow supply source A1 to the auxiliary valve device Vsa. The other configuration of the sub valve device Vsa in the second embodiment is the same as that of the sub valve device Vsa described in the first embodiment. In addition, the other subvalve device Vsb of the second embodiment has the same configuration as the subvalve device Vsa in the second embodiment. Other configurations in the second embodiment are the same as those in the first embodiment.

  According to the second embodiment configured as described above, the partition wall member 50 is configured to have the branch path portion 56 with respect to the communication path portion 53 as described above, and therefore, when the main valve device Vm is opened. The air flow supply source A2 is supplied into the pneumatic chamber Ra through the inlet hole 35 and the communication passage 35a of the upper housing member 30 and the communication passage 53 of the partition wall member 50, and is supplied to the pneumatic chamber Ra. An air flow that generates air pressure in Ra passes through the upstream portion of the communication passage portion 53 and the branch passage portion 56 and also flows into the control chamber portion 32e to generate a control pressure in the control chamber portion 32e.

Accordingly, while the air flow supply source for the air pressure chamber portion and the control pressure chamber portion is made to be a single unit, the piston 60 has the air pressure in the air pressure chamber portion Ra and the liquid pressure in the liquid pressure chamber portion Rb. Based on the difference, based on the control pressure in the control pressure chamber portion 32e, the valve body 90 can be reliably dissociated from the annular valve seat 40c by sliding upward against the coil spring 70. As a result, the valve opening operation of the main valve device Vm can be satisfactorily performed. Other functions and effects are the same as those of the first embodiment.
(Third embodiment)
FIG. 6 shows a main part of the third embodiment of the present invention. The third embodiment is characterized in that the main valve device Vm described in the first embodiment is additionally provided with a heat insulating film 80a.

  The heat insulating film 80a is made of PTFE, and the heat insulating film 80a is adhered to the annular thin film portion 81 of the diaphragm 80 in the pneumatic chamber portion Ra described in the first embodiment. Thereby, the said heat insulation film | membrane 80a plays the role which reduces the temperature difference between both surfaces of the diaphragm 80 based on the heat insulation characteristic. In the third embodiment, the material for forming the heat insulating film 80a includes a heat insulating material such as PTFE or Gore-Tex (registered trademark). Other configurations are the same as those in the first embodiment.

  In the third embodiment configured as described above, the heat insulating film 80a is attached to the surface of the diaphragm 80 from the air pressure chamber Ra as described above, and both surfaces of the diaphragm 80 are based on the heat insulating characteristics. It serves to reduce the temperature difference between.

  For this reason, even if gas or water vapor penetrates into the diaphragm, the pneumatic chamber portion Ra from the chemical solution chamber portion Rb side of the diaphragm 80 prevents the gas or water vapor from condensing or solidifying in the amorphous portion of the diaphragm 80. The temperature gradient toward the side is relaxed by the heat insulating film 80a.

  Along with this, the gas or water vapor passes through the diaphragm 80 without being solidified or condensed in the diaphragm 80, and is solidified or condensed in the air chamber Ra. Therefore, the lifetime of the diaphragm 80 can be further improved, and as a result, the above-described on-off valve operation of the main valve device Vm can be favorably maintained for a longer period of time. Other functions and effects are the same as those of the first embodiment.

In carrying out the present invention, the following various modifications are possible without being limited to the above embodiment.
(1) In carrying out the present invention, the stepped inner hole portion of the housing H may be an inner hole portion having the same inner diameter, unlike the above embodiment. Note that the outer diameter of the partition member 50 may be the same outer diameter in accordance with the inner hole portion having the same inner diameter.
(2) In carrying out the present invention, the stepped inner hole portion of the housing H may have a rectangular cross section, unlike the above embodiment. Accordingly, both the partition wall member 50 and the piston 60 may have a rectangular cross section.
(3) In carrying out the present invention, in at least one of the valve devices of the main valve device Vm and each of the sub valve devices Vsa and Vsa, the coil spring 70 differs from the above embodiments in the lower chamber portion 32a. You may make it interpose coaxially between the piston main body 61 and the partition member 50. FIG. Thereby, any one of the valve devices described above functions as a diaphragm-type normally open valve device.
(4) In implementing the present invention, the housing H, the diaphragm 80, and the valve body 90 are not limited to the PTFE described in the above embodiment, but are made of PFA or other fluororesins with good heat resistance. May be.
(5) In carrying out the present invention, the material for forming the partition member 50 is not limited to PTFE described in the above embodiment, but may be PFA or other fluororesins having good heat resistance.
(6) In the implementation of the present invention, the heat insulating film 80a described in the third embodiment is not limited to the main valve device Vm, and the diaphragms 80 of the sub valve devices Vsa and Vsb are provided from the pneumatic chamber Ra side. Even if it sticks, the effect similar to the said 3rd Embodiment can be achieved.
(7) In implementing the present invention, in the valve device of at least one of the main valve device Vm and the auxiliary valve devices Vsa and Vsa described in the first embodiment, the coil spring 70 and the upper housing member 30 Instead of the configuration including the inflow hole portion 33, the outflow hole portion 34, the respective communication passage portions 33a and 34a, the upper chamber portion 32d and the lower chamber portion 32e, and the air supply source A1, for example, an electromagnetic actuator is employed. A piston actuator may be driven to slide up and down in the same manner as in the first embodiment.

30a, 40a ... cylindrical peripheral wall, 30b ... upper wall, 32, 42 ... stepped inner hole,
32d ... Open chamber portion, 32e ... Control pressure chamber portion, 33, 35 ... Inlet hole portion,
33a, 35a, 55 ... communication passage part, 40b ... bottom wall, 40c ... annular valve seat,
43a ... Inflow passage portion, 43b ... Outflow passage portion, 44 ... Inflow tube portion, 45 ... Outflow tube portion,
50 ... partition member, 56 ... branch passage, 60 ... piston, 61 ... piston body,
63 ... piston rod, 70 ... coil spring, 80 ... diaphragm,
80a ... heat insulation film, 90 ... valve body, H ... housing, Ra ... pneumatic chamber,
Rb: Hydraulic chamber.

Claims (7)

A housing having an inflow path and an outflow path through which the high-temperature chemical liquid flowing into the inflow path flows from the inflow path;
Valve means provided in the housing;
Opening and closing means for opening or closing the valve means,
The valve means includes an annular valve seat formed in the inner end opening of the inflow passage, and a valve body facing the annular valve seat so as to be able to be seated, and through the annular valve seat to the inflow passage. When the inflowing chemical liquid flows to the outflow path side, the valve body opens due to dissociation from the annular valve seat, and when the inflowing chemical liquid flows to the outflow path side, the valve body opens to the annular valve seat. It is designed to close when seated.
The opening / closing means includes
Drive means for driving the valve body to be seated on or disengaged from the annular valve seat;
An air flow is formed between the outer wall portion of the valve body and the inner wall portion of the housing with a fluororesin having a predetermined heat resistance performance together with the housing and the valve body, and an air flow flows through the wall portion of the housing. A diaphragm that encloses the pressure chamber portion and the valve body and that defines a fluid pressure chamber portion that communicates with the outflow passage from the inner end opening portion in the housing;
In the state in which the inflow air flow into the air pressure chamber part causes air pressure to act on the diaphragm, the inflowing chemical liquid to the inflow path passes through the annular valve seat when the valve means is opened by the driving means. While flowing into the hydraulic chamber and applying hydraulic pressure to the diaphragm, the hydraulic chamber flows into the outflow passage, and when the valve is closed by the driving means, the inflow into the inflow passage A diaphragm type valve device configured to block the flow of the chemical liquid to the outflow passage through the annular valve seat. The housing is provided with a cylindrical peripheral wall and both end walls that close both axial ends of the cylindrical peripheral wall,
The driving means includes
In the hollow part of the cylindrical peripheral wall between the partition wall member coaxially fitted in the axially intermediate portion of the hollow part of the cylindrical peripheral wall and one end wall of the both end walls of the housing An open chamber portion that is slidably fitted in the axial direction and is opened to the outside through the housing, and a control chamber portion to which an air flow is supplied from the outside through the housing are provided between the one end wall and the A piston main body that forms a partition with the partition wall member, and a piston rod that extends from the piston main body through the control chamber portion, the partition wall member, and the diaphragm into the hydraulic pressure chamber portion, and an extension end thereof A piston having a piston rod coaxially supporting the valve body at the portion;
A biasing means provided in the open chamber and biasing the piston body toward the control chamber;
The inflow of the air flow into the pneumatic chamber part is made to pass through both the cylindrical peripheral wall and the partition wall member or the cylindrical peripheral wall from the outside,
The valve means is opened by disengaging the valve body from the annular valve seat as the piston slides against the biasing means against the biasing means by supplying air flow into the control chamber. The valve body is moved to the annular valve seat along with the sliding of the piston toward the control chamber side based on the urging of the urging means while the supply of the air flow into the control chamber is stopped. 2. The diaphragm valve device according to claim 1, wherein the diaphragm valve device is seated. The cylindrical peripheral wall is formed with a passage so that the inside of the hollow portion communicates with the outside,
The partition member communicates the passage of the cylindrical peripheral wall with the pneumatic chamber portion to form a communication passage portion that allows an external air flow to flow into the pneumatic chamber portion through the passage of the cylindrical peripheral wall. The diaphragm type valve device according to claim 2, wherein the diaphragm type valve device is formed.   The diaphragm type valve device according to claim 3, wherein the partition member is formed with a branch passage portion that communicates an intermediate portion of the communication passage portion into the control chamber portion. The cylindrical peripheral wall is provided with a passage communicating the control chamber part to the outside,
The partition member is formed with a communication passage portion for communicating the control chamber portion with the pneumatic chamber portion,
The air flow passes through the passage of the cylindrical peripheral wall and flows into the control chamber to cause air pressure to act on the piston body, and through the communication chamber of the control chamber and the partition member, 3. The diaphragm type valve device according to claim 2, wherein a pneumatic pressure is applied to the diaphragm by flowing into the diaphragm.   The diaphragm type valve device according to any one of claims 2 to 5, wherein a pressure receiving area of the piston body is set to a value wider than a pressure receiving area of the diaphragm.   The diaphragm type valve device according to any one of claims 1 to 6, further comprising a heat insulating layer provided along an inner side surface of the pneumatic chamber portion among both surfaces of the diaphragm.

Images