JP2014085679A - Projection device and method for operating projection device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To achieve improvement for solving a defect in a conventional technology.SOLUTION: A projection device includes: a laser device; a setting-adjustable micro-mirror device; and a calculation device. The laser device is configured to generate a laser beam, and the setting-adjustable micro-mirror device is configured to adjust the setting of a projection region as the partial region of the whole projection region of the micro-mirror device, and to form an image on the projection surface by changing the laser beam in the projection region, and the calculation device is configured to control the driving of the setting-adjustable micro-mirror device and the laser device such that a predetermined contrast value of the image formed on the projection surface is achieved for the setting-adjusted projection region.

Description

  The present invention relates to a projection apparatus and a method for operating the projection apparatus.

  From DE 10 2004 060 576 A1 an image projector device and method for image projection is known. Here, the intensity of the projection beam is modulated in a biaxial scanner and further deflected to be guided to form an image on the projection surface.

  In the method disclosed herein, one current position information value is obtained corresponding to the current position of the projection beam on the projection plane, and local image information corresponding to this current position information is stored in the image memory. The intensity of the projection beam is set in accordance with the read local image information.

  The DE 10 2005 002 190 A1 specification discloses a scanner for detecting the surface convexity of an object. The scanner disclosed herein includes a projector that is configured to direct a light beam to an illumination line associated with the surface protrusion to maintain an illumination spot on the surface protrusion. The projector is also configured to send a projection signal, and the position of the light beam at the illumination location can be derived from the projection signal.

  In addition, the scanner described above includes a collector with a collector micromirror that can induce vibration in two dimensions and a pointed photodetector. The collector micromirror has a first direction of the illumination line and a first direction so that the reflection of the illumination spot within the scanning range of the microscanner mirror is mapped onto the pointed photodetector by the mirror. It arrange | positions so that a vibration is possible in a different 2nd direction.

  Furthermore, in the scanner described above, the collector is configured to send a detection signal. From this signal, the position of the illumination location in the first and second directions can be derived.

  The micromirror projector is used particularly for a miniaturized projector. In that case, a single-axis or two-axis type micromirror projector is used. In order to achieve the high robustness of the micromirror projector, a glass hermetic seal is used to hermetically seal the micromirror projector, but this sealer generates a plurality of reflections that may be reflected on the projection surface.

DE 10 2004 060 576 A1 DE 10 2005 002 190 A1

  An object of the present invention is to make improvements in order to eliminate the disadvantages in the prior art.

  According to the present invention, the object includes a laser device, a setting-adjustable micromirror device, and a calculation device, and the laser device is configured to generate a laser beam. The mirror device is configured to set and adjust the projection region as a partial region of the entire projection region of the micromirror device, and to form an image on the projection surface by changing the laser beam in the projection region, The calculation device drives and controls the micromirror device and the laser device that can be set and adjusted so that a predetermined contrast value of an image formed on the projection plane is achieved for the set and adjusted projection region. Configured to be solved.

  Further, according to the present invention, there is provided a step of generating a laser beam by a laser device, a step of setting and adjusting a projection region of a micromirror device that can be set and adjusted as a partial region of the entire projection region of the micromirror device, and a projection surface. Adjustable to deflect the laser beam into the projection area to form an image on top, and achieve a preset contrast value for the image generated on the projection plane for the adjusted projection area This is solved by the step of controlling the driving of the micromirror device and the laser device.

  The present invention is hermetically sealed so that high contrast ratios can be achieved for demanding application areas such as head-up displays (so-called HUD), or gaze direction display displays, or view direction display displays. It is based on providing a projection apparatus having a transparent interface. The high contrast ratio here is achieved by selecting an appropriate partial area from the entire projection area. As a result, this image is projected by the projection device only in a part of the entire projection area where a correspondingly high contrast ratio is possible.

1 schematically shows an embodiment of a projection apparatus according to the present invention. The figure which showed schematically another embodiment of the projection apparatus by this invention The figure which showed schematically another embodiment of the projection apparatus by this invention The figure which showed schematically the chart of all the projection areas of the projection apparatus for demonstrating this invention The figure which showed schematically the chart of all the projection areas of the projection apparatus for demonstrating this invention FIG. 6 schematically shows a configurable micromirror device according to yet another embodiment of the invention. Schematic relationship diagram of all projection areas of a projection apparatus for explaining the present invention The figure which showed the flowchart of the operating method of the projection apparatus by another embodiment of this invention.

  Advantageous embodiments and improvements of the invention are described in the dependent claims and in the description of the following specification based on the drawings.

  According to an advantageous embodiment of the invention, the adjustable micromirror device is configured as an encapsulated micromirror scanner for use in laser projection or imaging. The operation of the micromirror device as an encapsulated micromirror scanner with this local vacuum environment acts to reduce the attenuation of the micromirror motion by gas molecules. This enables scanning at the maximum frequency or the maximum speed even under a low driving voltage and a wide scanning angle.

  According to an embodiment of the present invention, the adjustable micromirror device is configured as a single-axis or biaxial micromirror scanner for use in laser projection or imaging. This advantageously achieves rapid image formation under image projection during scanning.

  According to an advantageous embodiment of the invention, the projection device is configured as a laser projection device for a head-up display. This advantageously allows important information to be projected into the field of view of the head-up display.

  According to another advantageous embodiment of the invention, the projection area can be set depending on the operation data of the projection device. This allows the projection area to be optimally adapted to the operation data of the projection device.

  According to yet another advantageous embodiment of the invention, the projection area can be set depending on pre-set contrast value data of a partial area of the entire projection area of the micromirror device. Thereby, the contrast value desired for each projection area of each image projection can be individually set by the user of the projection apparatus.

  According to an advantageous embodiment of the invention, the preset contrast value of the formed image is set depending on the angular region of the image formed from the projection device. Thereby, the preset contrast value is advantageously adapted to the angular area of the respective image projection.

  The above-described embodiments and improvements may be arbitrarily combined with each other.

  Further possible configurations, improved configurations and embodiments of the present invention include combinations which have not yet been described in detail with respect to the above-mentioned features or the features described in the following specification based on examples.

  The accompanying drawings are to be used in connection with the following description which illustrates in detail the principles and concepts of the present invention to facilitate a further understanding of embodiments of the invention.

  Alternative embodiments and many advantages will become apparent with reference to these drawings. It should also be noted that the individual components shown in the figures are not necessarily shown to scale with each other.

  In these drawings, components, components, and method steps having the same functions are denoted by the same reference numerals as long as there is no contradiction.

  FIG. 1 shows a schematic diagram of a projection apparatus according to an embodiment of the present invention.

  The projection device 100 shown in FIG. 1 includes two micromirror devices 10 that can be set and adjusted, each of which is one sealed capsule in the form of a protective glass device 62. In this case, artifacts due to scattered light are formed as scattered light reflection SR.

  The projection apparatus 100 further includes, for example, a laser apparatus 20 and a calculation apparatus 30.

  The laser device 20 is designed to generate a laser beam L, for example. The laser device 20 may be configured as a multi-color laser light source. In that case, a plurality of single laser light sources that emit laser beams of red, green, and blue spectral colors are provided.

  The configurable micromirror device 10 may be configured as a MEMS “micro-electro-mechanical system” or a MOEMS “micro-optoelectro-mechanical system”.

  In the settable micromirror device 10, for example, the projection region PB is set as a partial region TB of the entire projection region GB of the micromirror device 10, and the image B is projected on the projection plane PF by the deflection of the laser beam L in the projection region PB. It is designed to be formed.

  The two setting-adjustable micromirror devices 10 may be composed of two single-axis micromirror scanners or two-axis micromirror scanners for use in laser irradiation or imaging processing. It may be. Further, each of the two setting-adjustable micromirror devices 10 may be configured as a sealed and encapsulated MEMS type mirror scanner, or may be configured as a MOEMS type mirror scanner.

  The sealed capsules of the MEMS and MOEMS type systems on the wafer plane of the two configurable micromirror devices 10 described above are safe from all types of foreign objects in MEMS (or MOEMS type) components. And can be easily obtained with permanent protection and allows the unconstrained functionality of the adjustable micromirror device 10.

  In the calculation device 30, for example, the micromirror device 10 that can be set and adjusted is driven and controlled so that a preset contrast value of the image B formed on the projection plane PF can be achieved for the projection region PB that is set and adjusted. Designed to be.

  In this case, the first micromirror device 10 of the two setting-adjustable micromirror devices 10 is designed to scan the image B in the vertical direction, and the second setting-adjustable micromirror device 10 is the second one. The micromirror device 10 is designed to scan the image B in the horizontal direction.

  The two micromirror devices 10 continuously scan the image B over the entire projection area GB. In any case, the laser beam L of the laser device 20 is generated only during the scanning of the partial area TB of the entire projection area GB, whereby the image B is projected only within the area of the partial area TB.

  The protective glass device 62 is designed so that the micromirror device 10 that can be set and adjusted is sealed and hermetically encapsulated. The protective glass device 62 here can be fixed by the casing holding device 50. The casing holding device 50 may be configured as a partial casing unit of the projection device 100. In that case, it is used to fix individual components of the projection apparatus 100, such as the protective glass apparatus 62, the micromirror apparatus 10 or the calculation apparatus 30 that can be set and adjusted.

  The two setting-adjustable micromirror devices 10 may be used inside the projection device 100 as shown in FIG. However, when the image B is projected onto the projection plane PF, a plurality of imaging errors may occur. This imaging error or aberration represents a deviation from the ideal optical imaging position of the projection apparatus 100. This deviation is, for example, a capsule shape of the micromirror device 10 that can be set and adjusted using the protective glass device 62. It is caused by an optical system such as a section.

  In this case, scattered light reflection SR can be generated in addition to the diffusely reflected scattered light. These scattered light reflections SR occur, for example, on the refractive glass surface of the protective glass device 62. As a result, a blot of unusual light occurs. The scattered light reflection SR is completely unavoidable for physical reasons, however, this reflection is greatly reduced by further coating of the reflective surface of the protective glass device 62 and an antireflection film. It is possible.

  The surface of the protective glass device 62 acts at least partly as a mirror. Therefore, the scattered light reflection SR is formed by such a partially reflecting surface.

  By using an anti-reflection film (Anti-Reflex-Coating), the scattered light reflection SR can be suppressed to approximately 1% or less of the laser beam intensity. If the reflecting surface of the protective glass device 62 is not tilted, the scattered light reflection SR is contained in the image B.

  The scattered light reflection SR from the reflective surface of the first micromirror device 10 that can be set and adjusted is reflected in the horizontal direction by the second micromirror device 10 that can be set and adjusted. Thereby, a horizontal line is formed in the image B as an optical artifact.

  The scattered light reflection SR from the reflective surface of the second micromirror device 10 that can be set and adjusted is reflected in the vertical direction. Thereby, vertical lines are formed in the image B as optical artifacts.

  Therefore, the scattered light reflection SR forms an overall cross-shaped artifact on the image B.

  Image B is formed as a matrix of a number of pixels. Therefore, the vertical line intensity is controlled by the number of columns in image B, and the horizontal line intensity is controlled by the number of rows in image B.

  If the reflection intensity at the surface is 1% and the number of columns is 850, the intensity of the vertical line is still 850 × 0.01 = 8.5. Thereby, the scattered light reflection SR is 8.5 times brighter than the average luminance of one pixel. Therefore, this region is masked from the image projection plane in order to avoid scattered light reflection SR.

  The laser beams L1, L2, L3 correspond to the desired ideal optical imaging and represent various scanning angles within the projection area PB.

  For example, the laser beam L1 represents a laser beam deflected to the right by the second micromirror device 10 to the right. The laser beam L2 represents a laser beam deflected to the zero position by the second micromirror device 10. The laser beam L3 represents a laser beam deflected to a position deviated leftward to the limit by the second micromirror device 10.

  The projection apparatus 100 further includes a storage device 40. The storage device 40 is connected to the calculation device 30. In the storage device 40, for example, preset contrast value data of the partial region TB of the entire projection region GB of the micromirror device 10 is stored. The partial area TB here is selected from the calculation device 30 as the projection area PB.

  The computing device 30 and the storage device 40 are configured as, for example, a processor unit or other electronic data processing unit. The computing device 30 is configured as a microcontroller in which units for peripheral functions are integrated on a single chip in addition to a processor, for example.

  FIG. 2 schematically illustrates a projection apparatus according to yet another embodiment of the present invention.

  Unlike the embodiment shown in FIG. 1, in the embodiment shown in FIG. 2, the projection device 100 has a protective glass device 62 with scattered light reflection SR in the traveling direction.

  The scattered light reflection SR shown in FIG. 2 is generated by the backside surfaces of the two protective glass devices 62 after deflection in the adjustable micromirror device 10. For this reason, the intensity of the scattered light reflection SR shown in FIG. 1 is not so persistent and not intensive, but the contrast of the image B is nevertheless reduced.

  The scattered light reflection SR of the second micromirror device 10 that can be set and adjusted is projected into the image B. Based on the inclination of the protective glass device 62, the scattered light reflection SR is not imaged in the central region of the image B.

  The geometric form of the scattered light reflection SR is shown in FIG. 6 described below. When scanning image B, the adjustable micromirror device 10 is started from the right as shown in FIG. 2 and the left maximum via the zero position as shown in FIG. Tilt to deflection position. Furthermore, starting from the laser beam L2, the scattered light reflection SR is shown on the projection plane PF.

  2 are already described in the description with reference to FIG. 1, and therefore are not further described here.

  FIG. 3 schematically shows a projection apparatus according to still another embodiment of the present invention.

  In the embodiment shown in FIG. 3, unlike the embodiment shown in FIG. 1, the projection device 100 has a protective glass device 62 positioned in the null position. Again, scattered light reflection SR is generated.

  Further reference numerals shown in FIG. 3 have already been described in the description based on FIG. 1 and will not be further described here.

  FIGS. 4 and 5 are diagrams of the entire projection area of the projection apparatus for explaining the present invention.

  On the X axis, the X coordinate of the position coordinate of the image B is shown in mm, and the Y axis reproduces the Y coordinate of the position coordinate of the image B. The different gray values reproduce the intensity values of the respective position coordinates in the diagram according to the scale shown adjacent to the chart.

  FIGS. 4 and 5 show a simulation of a point-like matrix PM projected as an image B with various scattered light reflections SR formed by the protective glass device 62. This intensity scale is a log scale, and in relative intensity, a darker gray value corresponds to a higher intensity value. A plurality of points arranged in the form of a regular point matrix PM are directly projected points. The point where the deviation occurs is based on the scattered light reflection SR, and has a value of about 1/100 of the intensity of the directly projected point of the point matrix PM.

  As a contrast value, in the first partial region B1 on the left side, only a coefficient value having a relationship of approximately 200: 1 is achieved by the plurality of scattered light reflections SR.

  There is no conspicuous scattered light reflection SR on the second partial region B2 on the right side of the projected image B. The contrast value in the second partial region B2 can achieve a contrast value up to a relationship of 10,000: 1 in an ideal case.

  FIG. 6 shows a schematic view of a micromirror device with adjustable settings according to still another embodiment of the present invention.

  FIG. 6 shows the reflected SR generated in the second micromirror device 10 in detail. In particular, the angle between the incident laser beam Lin and the reflected laser beam Lrfl is shown.

  Details of an embodiment of the adjustable micromirror device 10 are also depicted in FIG. Here, the laser course of the incident laser beam Lin and the laser course of the reflected laser beam Lrfl are depicted.

The angles shown in FIG. 6 are defined as follows. That is,
α = angle between incident laser beam Lin and normal NOS of mirror surface SO at zero position β = angle between normals of mirror surface SO changed to an arbitrary position with respect to the normal of mirror surface SO at zero position γ = angle between the normal NOG of the glass plate relative to the normal NOS of the mirror surface SO at the zero position θ = the angle in the scanning direction relative to the normal NOS of the mirror surface SO at the zero position φ = the reflected laser beam Lrfl and the mirror at the zero position The angle between the normal of the surface SO.

  After the incident laser beam Lin is reflected by the mirror surface SO of the micromirror device 10 that can be set and adjusted, the scattered light reflection SR in the further beam course of the laser beam L becomes a protective glass device constituted by a glass plate. Occurs at 62.

  On the surface of the protective glass device 62, the reflected laser beam Lrfl is partly retroreflected or retroreflected at an angle of θ + 2γ. The reflected laser beam Lrfl is redirected from the mirror surface SO of the micromirror device 10 and deflected again in the direction of the projected image B. As a result, the contrast value of the image B decreases and decreases.

The angle difference δ between the scanning angle and the angle of the scattered light reflection SR is expressed by the following relational expression:
δ = θ0−φ0 = (α-4β + 2γα) − (α + -2β) = 2γ-2β
Obtained from.

The partial region TB (this is a region not affected by the secondary scattered light reflection SR with respect to the entire projection region GB) has the following ratio or relationship value r,
r = (γ−β) / (2β)
Obtained from.

  This relation value r depends only on the gradient γ of the glass plate and the scanning angle β. Here, appropriate values are selected for the two angles β and γ in order to achieve a relational value r of about 1/3.

  Thereby, for example, an image B of image format 16: 9 (which represents the ratio of height (9) to image length (16)) can be projected with a relationship value r of 16 times.

  FIG. 7 shows a relationship diagram of all projection areas of the projection apparatus for explaining the present invention.

  Here, in order to achieve the highest possible contrast value of the image B, the projection region PB of the micromirror device 10 that can be set and adjusted is set and adjusted as a partial region of the entire projection region GB of the micromirror device 10.

  FIG. 8 schematically shows a flowchart of an operation method of a projection apparatus according to still another embodiment of the present invention.

  Here, generation of the laser beam L by the laser device 20 is performed as the first method step S1.

  Next, as a second method step S2, setting adjustment of the projection region PB of the micromirror device 10 that can be set and adjusted is performed as a partial region of the entire projection region GB of the micromirror device 10.

  Next, as a third method step S3, in order to form the image B on the projection plane PF, the laser beam L is deflected in the projection area PB, and the image B generated on the projection plane is further converted. In order to achieve a preset contrast value for the adjusted projection region PB, drive control of the micromirror device 10 and the laser device 20 that can be adjusted is performed.

  The method steps may be repeated iteratively or recursively in any order.

  Although the invention has been described on the basis of several advantageous embodiments as described above, this does not mean that the invention is limited to the embodiments described above. On the contrary, various changes can be made to the embodiments of the present invention. In particular, it should be noted that the present invention can be modified or improved in various ways without departing from the core of the present invention.

DESCRIPTION OF SYMBOLS 10 Micromirror apparatus 20 Laser apparatus 30 Calculation apparatus 40 Storage apparatus 50 Casing holding apparatus 62 Protection glass apparatus 100 Projection apparatus GB All projection area PB Projection area PF Projection surface B Image L Laser beam

Claims (8)

A laser device (20);
A micromirror device (10) with adjustable settings;
A computing device (30),
The laser device (20) is configured to generate a laser beam (L),
The setting and adjusting micromirror device (10) sets and adjusts the projection region (PB) as a partial region (TB) of the entire projection region (GB) of the micromirror device (10), and the projection region (PB) ) To form an image (B) on the projection plane (PF) by the deflection of the laser beam (L) in
The calculation device (30) performs the setting adjustment so that a predetermined contrast value of the image (B) formed on the projection plane (PF) is achieved for the projection area (PB) that has been set and adjusted. A projection device (100), characterized in that it is configured to drive and control a possible micromirror device (10) and the laser device (20).   The projection device (100) according to claim 1, wherein the configurable micromirror device (10) is configured as an encapsulated micromirror scanner for use in laser projection or imaging.   The projection device (100) according to claim 1 or 2, wherein the configurable micromirror device (10) is configured as a single-axis or biaxial micromirror scanner for use in laser projection or imaging. .   The projection apparatus (100) according to any one of claims 1 to 3, wherein the projection apparatus (100) is configured as a laser projection apparatus for a head-up display.   The projection apparatus (100) according to any one of claims 1 to 4, wherein the projection area (PB) can be set depending on operation data of the projection apparatus (100).   The projection area (PB) can be set and adjusted depending on preset contrast value data of a partial area of the total projection area (GB) of the micromirror device (10). A projection apparatus (100) according to claim 1.   The contrast value set in advance for the formed image (B) is set depending on the angular region of the image (B) formed by the projection device (100). The projection apparatus (100) as described. A method for operating a projection device, comprising:
Generating a laser beam (L) by the laser device (20) (S1);
A step (S2) of setting and adjusting the projection region (PB) of the micromirror device (10) capable of setting and adjustment as a partial region (TB) of the entire projection region (GB) of the micromirror device (10);
In order to form the image (B) on the projection plane (PF), the laser beam (L) is deflected in the projection area (PB), and the image (B) generated on the projection plane (PF) is preset. A step of controlling the drive of the micromirror device (10) and the laser device (20), which can be set and adjusted, in order to achieve the contrast value to be set and adjusted for the projection region (PB). A method characterized by being.

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