JP2014061664A - Light irradiation device for lens substrate, and method for producing lens - Google Patents

Light irradiation device for lens substrate, and method for producing lens Download PDF

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JP2014061664A
JP2014061664A JP2012208859A JP2012208859A JP2014061664A JP 2014061664 A JP2014061664 A JP 2014061664A JP 2012208859 A JP2012208859 A JP 2012208859A JP 2012208859 A JP2012208859 A JP 2012208859A JP 2014061664 A JP2014061664 A JP 2014061664A
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lens substrate
light source
light
lens
substrate
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JP6035091B2 (en
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勝史 ▲濱▼窪
Masashi Hamakubo
Kae Ito
可恵 伊藤
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Hoya Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a light irradiation device for lens substrates, in which the lens substrate can be exposed uniformly to light when the lens substrate is irradiated with light and to provide a method for producing a lens.SOLUTION: The light irradiation device (1) for lens substrates includes: a long light source (111); a substrate holding means (131) for clamping the lens substrate (S) at the position opposed to the long light source; rotating means (132, 133) for rotating the lens substrate; and a repetitive movement means (14) for repetitively moving at least one of the lens substrate and the long light source so that the center of a light quantity distribution to be formed by the long light source is made to pass through, at least, a zone from the center of the lens substrate to one end thereof.

Description

本発明は、光硬化膜の形成等のためにレンズ基板上に光を照射する光照射装置に関する。   The present invention relates to a light irradiation apparatus that irradiates light onto a lens substrate for forming a photocured film or the like.

従来、眼鏡レンズは、機能を付与するために、表面にハードコート膜やフォトクロミック層などの膜が形成される。レンズ基板上に膜を形成する際にして、レンズ基板上に光硬化性膜を形成し、紫外線等の光照射を行なって膜を硬化する方法が採用されることがある。当該光照射においては、レンズ基板の表面が曲面であるため、レンズ基板上に均一に光を照射することは容易でなくなる。例えば、表面の曲率半径の小さな眼鏡レンズへの光照射の場合、眼鏡レンズの中心と周辺部とで照射された光量の差が顕著になることがある。その場合には、光硬化膜はレンズ周辺部での硬化が遅い或いは不十分となるため、硬化膜の密着性などの性質が不均一になる場合がある。   Conventionally, spectacle lenses are provided with a film such as a hard coat film or a photochromic layer on the surface in order to impart functions. When forming a film on the lens substrate, a method may be employed in which a photocurable film is formed on the lens substrate, and the film is cured by irradiation with light such as ultraviolet rays. In the light irradiation, since the surface of the lens substrate is a curved surface, it is not easy to irradiate light uniformly on the lens substrate. For example, in the case of light irradiation to a spectacle lens having a small curvature radius on the surface, the difference in the amount of light irradiated between the center and the peripheral portion of the spectacle lens may become significant. In that case, the photocured film is slowly or insufficiently cured at the periphery of the lens, and the properties such as the adhesion of the cured film may be non-uniform.

特許文献1においては、光源とレンズ基板の間に透過光量調整部を配置し、当該透過光量調整部の中心部から周辺部分へと遮光量を減らしてレンズ基板上に到達する光量を均一にする方法が開示されている。透過光量調整部としては、遮光性の基板に複数の孔部を設けて、当該孔の面積等を変化させて中心部と周辺部の透過光量を調節する。
特許文献2においては、レンズ基板に光源からの光の反射光を導く反射面を設置して、レンズ基板の周辺部に対し反射光の照射光量を調整し、レンズ基板の中央部と周辺部とにおける照射光量の差を調整する方法が開示されている。
In Patent Document 1, a transmitted light amount adjustment unit is disposed between a light source and a lens substrate, and the amount of light reaching the lens substrate is made uniform by reducing the amount of light shielding from the central portion to the peripheral portion of the transmitted light amount adjustment unit. A method is disclosed. As the transmitted light amount adjusting section, a plurality of holes are provided in a light-shielding substrate, and the transmitted light amounts of the central portion and the peripheral portion are adjusted by changing the area of the holes.
In Patent Document 2, a reflection surface that guides reflected light of a light source from a light source is installed on the lens substrate, the amount of reflected light applied to the peripheral portion of the lens substrate is adjusted, and the central portion and the peripheral portion of the lens substrate are adjusted. Discloses a method for adjusting the difference in the amount of irradiation light.

特開2011−209408号公報JP 2011-209408 A 特開2012−3089号公報JP 2012-3089 A

特許文献1又は2の方法によると、レンズ基板は様々な種類の曲面を有するため、レンズ基板ごとに対応して上記の透過光量調整部や反射面について複雑な調整を行なう必要があった。
そこで、本発明は、レンズ基板上に光を照射するに際して、レンズ基板上に均一に光を当てるレンズ基板用光照射装置、及びレンズの製造方法を提供することを目的とする。
According to the method of Patent Document 1 or 2, since the lens substrate has various types of curved surfaces, it is necessary to perform complicated adjustment on the transmitted light amount adjustment unit and the reflection surface corresponding to each lens substrate.
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a lens substrate light irradiating device that uniformly irradiates light onto a lens substrate when irradiating light onto the lens substrate, and a method for manufacturing a lens.

すなわち、本発明は以下の〔1〕〜〔5〕に関する。
〔1〕 長尺光源と、
前記長尺光源に対向する位置にレンズ基板を把持する基板保持手段と、
前記レンズ基板を回転させる回転手段と、
前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させる反復動作手段と、
を備える、レンズ基板用光照射装置。
〔2〕 前記反復動作手段の動作方向が、前記回転手段の回転軸に対して垂直方向である、〔1〕に記載のレンズ基板用光照射装置。
〔3〕 前記長尺光源が設けられた外部チャンバと、
該外部チャンバ内に設けられ、前記長尺光源との対向面の少なくとも一部が光透過部材で構成される内部チャンバと、を更に備え、
前記基板保持手段が、前記光透過部材を介して前記光源に対向する位置にレンズ基板を把持するように設置され、
前記反復動作手段が前記内部チャンバを反復動作させる、〔1〕又は〔2〕に記載のレンズ基板用光照射装置。
〔4〕 前記内部チャンバが、不活性ガス導入孔と、前記レンズ基板上に不活性ガス気流が直接あたらないように該不活性ガス導入孔の近傍に設置された邪魔板と、不活性ガス排出孔と、を更に有する、〔1〕〜〔3〕のいずれかに記載のレンズ基板用光照射装置。
〔5〕 レンズ基板上に形成された光硬化性膜を長尺光源により光照射して硬化させるレンズの製造方法であって、
前記長尺光源に対向する位置で前記レンズ基板を回転させ、前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させて、前記長尺光源から光照射をおこなう、レンズの製造方法。
That is, the present invention relates to the following [1] to [5].
[1] a long light source;
Substrate holding means for holding the lens substrate at a position facing the long light source;
Rotating means for rotating the lens substrate;
Repetitive operation means for repetitively operating at least one of the lens substrate and the long light source so that the center of the light amount distribution formed by the long light source passes from at least the center to one end of the lens substrate;
A light irradiation device for a lens substrate, comprising:
[2] The lens substrate light irradiating device according to [1], wherein an operation direction of the repetitive operation unit is a direction perpendicular to a rotation axis of the rotation unit.
[3] an external chamber provided with the long light source;
An internal chamber provided in the external chamber, wherein at least a part of a surface facing the long light source is formed of a light transmissive member,
The substrate holding means is installed to hold the lens substrate at a position facing the light source through the light transmitting member;
The light irradiation apparatus for a lens substrate according to [1] or [2], wherein the repetitive operation means repeatedly operates the internal chamber.
[4] The internal chamber includes an inert gas introduction hole, a baffle plate installed in the vicinity of the inert gas introduction hole so that an inert gas flow is not directly applied to the lens substrate, and an inert gas discharge. The light irradiation device for a lens substrate according to any one of [1] to [3], further including a hole.
[5] A method for producing a lens in which a photocurable film formed on a lens substrate is cured by light irradiation with a long light source,
The lens substrate is rotated so that the lens substrate is rotated at a position facing the long light source, and the center of the light quantity distribution formed by the long light source passes from at least the center to one end of the lens substrate. A method for manufacturing a lens, wherein at least one of a long light source is repeatedly operated to emit light from the long light source.

本発明によれば、レンズ基板上に光を照射するに際して、レンズ基板上に均一に光を当てるレンズ基板用光照射装置、及びレンズの製造方法を提供することができる。
長尺光源に対向してレンズ基板を静置すると、レンズ基板上に照射光量の分布が形成される。
これに対して、長尺光源に対向するレンズ基板を回転させることで、少なくともレンズ基板の中心からの同一の距離においては照射光量の均一性を得ることができる。しかし、レンズ基板の回転のみであると、レンズ基板の曲面に由来して中心部分の照射光量が多くなり、周辺部の照射光量が少なくなる。
そのため、レンズ基板の回転に加えて、前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過をするように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させることで、周辺部の照射光量を調整することができ、レンズ基板上の照射光量を均一にすることができる。
ADVANTAGE OF THE INVENTION According to this invention, when irradiating light on a lens substrate, the light irradiation apparatus for lens substrates which irradiates light uniformly on a lens substrate, and the manufacturing method of a lens can be provided.
When the lens substrate is allowed to stand facing the long light source, a distribution of the irradiation light amount is formed on the lens substrate.
On the other hand, by rotating the lens substrate facing the long light source, it is possible to obtain the uniformity of the irradiation light amount at least at the same distance from the center of the lens substrate. However, if only the lens substrate is rotated, the amount of irradiation light at the central portion increases due to the curved surface of the lens substrate, and the amount of irradiation light at the peripheral portion decreases.
Therefore, in addition to the rotation of the lens substrate, at least one of the lens substrate and the long light source so that the center of the light amount distribution formed by the long light source passes from at least the center of the lens substrate to one end. By repeating the operation, it is possible to adjust the irradiation light amount in the peripheral portion, and to make the irradiation light amount on the lens substrate uniform.

図1は、本発明の実施形態であるレンズ基板用光照射装置1の断面模式図である。FIG. 1 is a schematic cross-sectional view of a lens substrate light irradiation apparatus 1 according to an embodiment of the present invention. 図2は、本発明の実施形態であるレンズ基板用光照射装置1の斜視模式図である。FIG. 2 is a schematic perspective view of the lens substrate light irradiation apparatus 1 according to an embodiment of the present invention. 図3(a)は棒状光源とxyz軸の位置関係を示し、図3(b)は図3(a)におけるx軸上の照射光量の分布を示すモデル図である。FIG. 3A shows the positional relationship between the rod-shaped light source and the xyz axis, and FIG. 3B is a model diagram showing the distribution of the amount of irradiation light on the x axis in FIG. 図4は、棒状光源側の視点から、レンズ基板の動作を説明する模式図である。FIG. 4 is a schematic diagram for explaining the operation of the lens substrate from the viewpoint of the rod-shaped light source side. 図5は、棒状光源側の視点から、レンズ基板の動作を説明する模式図である。FIG. 5 is a schematic diagram for explaining the operation of the lens substrate from the viewpoint of the rod-shaped light source side. 図6は、レンズ基板の回転の変形例を説明する模式図である。FIG. 6 is a schematic diagram for explaining a modification of the rotation of the lens substrate. 図7は、棒状光源側の視点から、反復動作の変形例を説明する模式図である。FIG. 7 is a schematic diagram for explaining a modification example of the repetitive operation from the viewpoint of the rod-shaped light source side. 図8は、レンズ基板上の区画の説明図である。FIG. 8 is an explanatory diagram of a section on the lens substrate.

レンズ基板用光照射装置は、長尺光源と、前記長尺光源に対向する位置にレンズ基板を把持する基板保持手段と、前記レンズ基板を回転させる回転手段と、前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させる反復動作手段と、を備える。当該回転及び反復動作によって、レンズ基板の中央部と周辺部における照射光量の差が調整される。これによってレンズ基板上の照射光量を均一にすることができる。   The light irradiation device for a lens substrate is formed by a long light source, a substrate holding unit that holds the lens substrate at a position facing the long light source, a rotating unit that rotates the lens substrate, and the long light source. Repetitive operation means for repetitively operating at least one of the lens substrate and the long light source so that the center of the light quantity distribution passes from at least the center to one end of the lens substrate. By the rotation and repetitive operation, the difference in the amount of irradiation light between the central portion and the peripheral portion of the lens substrate is adjusted. As a result, the amount of irradiation light on the lens substrate can be made uniform.

長尺光源とは、レンズ基材への対向面が長尺状である、又は光源への対向面に長尺状の光量分布を形成する光源を意味する。長尺光源は、例えば、直管状ランプ、及び発光ダイオード(LED)が直線状に多数並べられた光源等の棒状光源、U字管状ランプ、蛇管状ランプ、が用いられる。長尺光源の長手方向の長さは、少なくともレンズ基板の半径よりも大きなものを選択することが好ましい。
例えば、棒状光源は、図3に示すように対向する平面上に照射光量の分布が形成される。当該平面上において、最も高い照射光量を示す位置を光量分布の中心とする。すなわち、棒状光源においては、光源の棒形状に沿って線状の光量分布の中心が形成される。
The long light source means a light source having a long surface facing the lens substrate or forming a long light amount distribution on the surface facing the light source. As the long light source, for example, a straight tube lamp, a rod light source such as a light source in which a number of light emitting diodes (LEDs) are arranged in a straight line, a U-shaped tube lamp, and a serpentine tube lamp are used. The length of the long light source in the longitudinal direction is preferably selected to be at least larger than the radius of the lens substrate.
For example, in the rod-shaped light source, as shown in FIG. 3, the distribution of the irradiation light amount is formed on the opposing planes. A position showing the highest irradiation light amount on the plane is set as the center of the light amount distribution. That is, in the rod-shaped light source, the center of the linear light amount distribution is formed along the rod shape of the light source.

本発明において反復動作は、前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように反復動作させる。
反復動作は、特に限定されないが例えば、遥動、円形運動が挙げられる。遥動させる場合、一直線上を往復させても、円弧上を往復させる遠心遥動であってもよい。
反復動作手段の動作方向は、前記回転手段の回転軸に対して垂直方向であることが好ましい。
In the present invention, the repetitive operation is repeated so that the center of the light amount distribution formed by the long light source passes from at least the center to one end of the lens substrate.
The repetitive motion is not particularly limited, and examples thereof include a swing motion and a circular motion. When swinging, it may be reciprocating on a straight line or it may be centrifugal swinging reciprocating on an arc.
The operation direction of the repetitive operation means is preferably a direction perpendicular to the rotation axis of the rotation means.

レンズ基板としては、例えば、円形状の眼鏡用レンズ基板が挙げられる。
また、レンズ基板の径は60〜80mmが好ましい。
レンズ基板のベースカーブ(以下「BC」とすることがある)は任意のものが用いられるが、例えば、8〜10のものが用いられる。
Examples of the lens substrate include a circular lens substrate for spectacles.
The diameter of the lens substrate is preferably 60 to 80 mm.
An arbitrary base curve (hereinafter sometimes referred to as “BC”) of the lens substrate is used. For example, a base curve of 8 to 10 is used.

レンズ基板用光照射装置は、前記長尺光源が設けられた外部チャンバと、前記外部チャンバ内に設けられ、前記長尺光源との対向面の少なくとも一部が光透過部材で構成される内部チャンバと、を更に備えることが好ましい。また、前記基板保持手段が、前記光透過部材を介して前記光源に対向する位置にレンズ基板を把持するように設置され、前記反復動作手段が前記内部チャンバを反復動作させるものであることが好ましい。このように内部チャンバを設けて、当該チャンバ内でレンズ基板を回転させることで、反復動作による気流の影響を受けにくくなるので、光硬化膜を均一に形成しやすくなる。   The lens substrate light irradiation device includes an external chamber provided with the long light source, and an internal chamber provided in the external chamber, wherein at least a part of a surface facing the long light source is formed of a light transmitting member. It is preferable to further comprise. Further, it is preferable that the substrate holding means is installed so as to hold the lens substrate at a position facing the light source through the light transmitting member, and the repetitive operation means repetitively operates the internal chamber. . By providing the internal chamber in this manner and rotating the lens substrate in the chamber, it becomes difficult to be affected by the air flow caused by the repetitive operation, so that the photocured film can be easily formed uniformly.

光透過部材としては、特に制限されないが、長尺光源が紫外線ランプである場合には、合成石英等の紫外光を透過する素材で構成されることが好ましい。   Although it does not restrict | limit especially as a light transmissive member, When a long light source is an ultraviolet lamp, it is preferable to comprise with the raw material which permeate | transmits ultraviolet light, such as a synthetic quartz.

内部チャンバは、不活性ガス導入孔と、前記レンズ基板上に不活性ガス気流が直接あたらないように該不活性ガス導入孔の近傍に設置された邪魔板と、不活性ガス排出孔と、を更に有することが好ましい。このように不活性ガスを導入する手段を設けることで、不活性ガス雰囲気下で光硬化をすることが可能になり、酸素阻害を防ぐことが可能となる。特に邪魔板を設けることで、不活性ガスの気流によって硬化前の膜が荒れることを防止することができる。   The internal chamber includes an inert gas introduction hole, a baffle plate installed in the vicinity of the inert gas introduction hole so that an inert gas flow does not directly hit the lens substrate, and an inert gas discharge hole. Furthermore, it is preferable to have. By providing the means for introducing the inert gas in this way, it is possible to perform photocuring in an inert gas atmosphere and to prevent oxygen inhibition. In particular, by providing a baffle plate, it is possible to prevent the film before curing from being roughened by the flow of inert gas.

本発明のレンズの製造方法は、レンズ基板上に形成された光硬化性膜を長尺光源により光照射して硬化させる方法である。当該製造方法は、長尺光源に対向する位置で前記レンズ基板を回転させ、前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させて、前記長尺光源から光照射をおこなう。   The method for producing a lens of the present invention is a method in which a photocurable film formed on a lens substrate is cured by light irradiation with a long light source. In the manufacturing method, the lens substrate is rotated at a position facing a long light source, and the center of the light amount distribution formed by the long light source passes through at least the center to one end of the lens substrate. Light is emitted from the long light source by repeatedly operating at least one of the substrate and the long light source.

ここで光硬化性膜としては、光硬化性樹脂組成物を含む。当該光硬化性樹脂組成物は、硬化後、フォトクロミック層、ハードコート膜として機能する光硬化性組成物であることが好ましい。
光硬化性樹脂組成物としては、例えば、光ラジカル硬化系組成物、光カチオン硬化系組成物、これらのハイブリット硬化系組成物が挙げられる。
光ラジカル硬化系組成物としては、アクリレート化合物とエネルギー線感受性ラジカル重合開始剤を含有する組成物が挙げられる。
アクリレート化合物としては、特に限定されないが、多官能アクリレートや、単官能アクリレートが挙げられる。多官能アクリレートとしては、複数のアクリレート基を有する化合物であれば特に限定されないが、例えば、3官能アクリレート、末端アクリレート基を有するデンドリマー又はハイパーブランチポリマー等が挙げられる。
光カチオン硬化系組成物としては、エポキシ基を有する化合物と、シラン系化合物若しくは二以上のヒドロキシ基を有する化合物との組合せが挙げられる。ここでの光開始剤としては、エネルギー線感受性カチオン重合開始剤を用いることができる。
光硬化性樹脂組成物としては、更に金属酸化物粒子を有することが好ましい。金属酸化物としては、例えば、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ケイ素等の微粒子が挙げられる。
多官能アクリレートの含有量は、光硬化性樹脂組成物に対して、45〜95質量%が好ましく、35〜90質量%が好ましい。光カチオン硬化系組成物の重合性化合物の含有量は、光硬化性樹脂組成物に対して、45〜95質量%が好ましく、35〜90質量%が好ましい。光開始剤の含有量は、光硬化性樹脂組成物に対して、0.1〜10質量%が好ましく、0.5〜5質量%がより好ましい。金属酸化物粒子の含有量は、多官能アクリレートの合計量100質量部に対し、好ましくは5〜180質量部であり、より好ましくは60〜150質量部である。
Here, the photocurable film includes a photocurable resin composition. The photocurable resin composition is preferably a photocurable composition that functions as a photochromic layer and a hard coat film after curing.
Examples of the photocurable resin composition include a photo radical curable composition, a photo cation curable composition, and a hybrid curable composition thereof.
Examples of the photo radical curable composition include a composition containing an acrylate compound and an energy ray sensitive radical polymerization initiator.
Although it does not specifically limit as an acrylate compound, A polyfunctional acrylate and a monofunctional acrylate are mentioned. The polyfunctional acrylate is not particularly limited as long as it is a compound having a plurality of acrylate groups, and examples thereof include trifunctional acrylates, dendrimers having a terminal acrylate group, and hyperbranched polymers.
Examples of the photocationic curable composition include a combination of a compound having an epoxy group and a silane compound or a compound having two or more hydroxy groups. As the photoinitiator here, an energy ray sensitive cationic polymerization initiator can be used.
As a photocurable resin composition, it is preferable to have a metal oxide particle further. Examples of the metal oxide include fine particles such as aluminum oxide, titanium oxide, zirconium oxide, and silicon oxide.
45-95 mass% is preferable with respect to a photocurable resin composition, and, as for content of polyfunctional acrylate, 35-90 mass% is preferable. 45-95 mass% is preferable with respect to a photocurable resin composition, and, as for content of the polymeric compound of a photocationic curable composition, 35-90 mass% is preferable. 0.1-10 mass% is preferable with respect to a photocurable resin composition, and, as for content of a photoinitiator, 0.5-5 mass% is more preferable. The content of the metal oxide particles is preferably 5 to 180 parts by mass and more preferably 60 to 150 parts by mass with respect to 100 parts by mass of the total amount of the polyfunctional acrylate.

以下、図面を参照して本発明の実施形態について説明する。
図1は、本発明の実施形態であるレンズ基板用光照射装置1の断面を示した模式図である。図2は、当該レンズ基板用光照射装置1の斜視図である。なお、図2において外部チャンバ11については透視図として点線で示した。
レンズ基板用光照射装置1は、外部チャンバ11、及び該外部チャンバ内に設けられた内部チャンバ12を有する。
外部チャンバ11は、該外部チャンバ上部で棒状光源111を固定するための固定部112と、該外部チャンバの側面から光が漏れることを防止する遮光部113と、台座114とを有する。棒状光源111は、直管状の紫外線ランプが用いられる。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic view showing a cross section of a lens substrate light irradiation apparatus 1 according to an embodiment of the present invention. FIG. 2 is a perspective view of the lens substrate light irradiation apparatus 1. In FIG. 2, the external chamber 11 is indicated by a dotted line as a perspective view.
The lens substrate light irradiation apparatus 1 includes an external chamber 11 and an internal chamber 12 provided in the external chamber.
The external chamber 11 has a fixing part 112 for fixing the rod-shaped light source 111 at the upper part of the external chamber, a light shielding part 113 for preventing light from leaking from the side surface of the external chamber, and a pedestal 114. The rod-shaped light source 111 is a straight tubular ultraviolet lamp.

内部チャンバ12は、筐体121と、該筐体の棒状光源111との対向面に設けられた内部に光を取り込むための光透過窓122とを有する。光透過窓122は、光透過部材により構成される。また、内部チャンバ12には、窒素等の不活性ガスをパージするために、不活性ガス導入孔125、及び不活性ガス排出孔126を有する。また、不活性ガス導入孔125の近傍には、当該ガスの気流により、レンズ基板上に形成された膜が未硬化である場合に表面を荒らすことを防止する観点から、邪魔板127が設けられる。   The internal chamber 12 includes a housing 121 and a light transmission window 122 for taking light into the interior provided on the surface of the housing facing the rod-shaped light source 111. The light transmission window 122 is configured by a light transmission member. The internal chamber 12 has an inert gas introduction hole 125 and an inert gas discharge hole 126 in order to purge an inert gas such as nitrogen. Further, in the vicinity of the inert gas introduction hole 125, a baffle plate 127 is provided from the viewpoint of preventing the surface of the film formed on the lens substrate from being roughened due to the gas flow, when the film is uncured. .

内部チャンバ12内には、前記棒状光源111に対向する位置にレンズ基板Sを把持する基板保持部131が設けられる。基板保持部131は、棒状光源111に対して、レンズ基板の凸面を対向させるようにして保持する機構を有する。基板保持部131は、該基板保持部を回転させる回転軸132と接続し、更に当該回転軸は、回転機構を含む第一駆動機構133と接続する。   In the internal chamber 12, a substrate holding part 131 that holds the lens substrate S is provided at a position facing the rod-shaped light source 111. The substrate holding part 131 has a mechanism for holding the lens substrate so that the convex surface of the lens substrate faces the rod-shaped light source 111. The substrate holding part 131 is connected to a rotating shaft 132 that rotates the substrate holding part, and the rotating shaft is further connected to a first drive mechanism 133 including a rotating mechanism.

内部チャンバ12は、可動台座14上に設けられる。可動台座14は、台座本体141と、該台座本体を横方向(図1のx軸方向)に移動可能に取り付けたガイドレール142と、前記台座本体を横方向に遥動させる第二駆動機構143とを有する。   The internal chamber 12 is provided on the movable base 14. The movable pedestal 14 includes a pedestal main body 141, a guide rail 142 attached to the pedestal main body so as to be movable in the horizontal direction (x-axis direction in FIG. 1), and a second drive mechanism 143 that swings the pedestal main body in the horizontal direction. And have.

レンズ基板用光照射装置1は、概略以下のとおりに動作させる。
内部チャンバ12内の基板保持部131に、凸面に未硬化の光硬化性膜を形成したレンズ基板Sを搭載する。レンズ基板Sを第一駆動機構133により回転軸132を中心に回転させ、更に、第二駆動機構143により可動台座14を横方向(図1のx軸方向)に遥動させる。このように第一駆動機構133及び第二駆動機構143により動作させつつ、棒状光源111より光を照射して、レンズ基板S上の光硬化性膜を硬化させる。光照射は、外部チャンバ11内で行なわれるため、遮光部113により光が漏れることを防止でき作業の安全性を高められる。また、照射した光は内部チャンバ12上部に設けられた光透過窓122を介して、レンズ基板S上の光硬化性膜に到達して硬化が行なわれる。
The lens substrate light irradiation device 1 is operated as follows.
A lens substrate S having an uncured photocurable film formed on a convex surface is mounted on the substrate holding part 131 in the internal chamber 12. The lens substrate S is rotated around the rotation shaft 132 by the first drive mechanism 133, and the movable pedestal 14 is further moved laterally (in the x-axis direction in FIG. 1) by the second drive mechanism 143. In this way, while being operated by the first drive mechanism 133 and the second drive mechanism 143, light is irradiated from the rod-shaped light source 111 to cure the photocurable film on the lens substrate S. Since the light irradiation is performed in the external chamber 11, light can be prevented from leaking by the light shielding portion 113, and the safety of work can be improved. Further, the irradiated light reaches the photocurable film on the lens substrate S through the light transmission window 122 provided on the upper portion of the internal chamber 12 and is cured.

光照射する際には、内部チャンバ12の不活性ガス導入孔125から、不活性ガスを導入する。導入された不活性ガスの気流は、邪魔板127に衝突してレンズ基板に直接当たらないようにして、不活性ガス排出孔126から排出される。このようにして、内部チャンバ内を不活性ガスでパージする。これにより、光照射中に発生する内部チャンバ内を不活性ガス雰囲気とすることで、酸素阻害等を防止することができる。   When irradiating light, an inert gas is introduced from the inert gas introduction hole 125 of the internal chamber 12. The air flow of the introduced inert gas collides with the baffle plate 127 and is discharged from the inert gas discharge hole 126 so as not to directly hit the lens substrate. In this way, the inside chamber is purged with the inert gas. Thereby, oxygen inhibition etc. can be prevented by making the inside of the internal chamber generated during light irradiation an inert gas atmosphere.

以下、レンズ基板用光照射装置1における照射光量の分布と、レンズ基板Sの回転と遥動の動作の関係について詳細に説明する。
図3(a)は、棒状光源111とxyz軸の位置関係を示し、図3(b)は図3(a)におけるx軸上の照射光量の分布を示すモデル図である。このように棒状光源に対向する平面においては、棒状光源の長軸に対して垂直方向(図3(a)におけるx軸方向)において、棒状光源と最も近い点(図3(a)に示されるz軸と直交する点)を光量中心PCとして、照射光量の分布が発生する。当該面上の棒状光源の長軸と平行方向(図3(a)のy軸方向)のいずれの場所においても、棒状光源の長軸に対して垂直方向(x軸方向)に照射光量の分布が発生し光量中心が棒状光源の長軸と平行方向(図3(a)のy軸方向)に線状に現れる。
Hereinafter, the distribution of the irradiation light amount in the lens substrate light irradiation apparatus 1 and the relationship between the rotation of the lens substrate S and the swing operation will be described in detail.
FIG. 3A shows the positional relationship between the rod-shaped light source 111 and the xyz axis, and FIG. 3B is a model diagram showing the distribution of the irradiation light quantity on the x axis in FIG. Thus, on the plane facing the rod-shaped light source, the point closest to the rod-shaped light source (shown in FIG. 3A) is perpendicular to the major axis of the rod-shaped light source (the x-axis direction in FIG. 3A). The distribution of the amount of irradiation light occurs with the light amount center PC at a point orthogonal to the z-axis. Distribution of irradiation light quantity in a direction perpendicular to the major axis of the rod-shaped light source (x-axis direction) at any location in the direction parallel to the major axis of the rod-shaped light source on the surface (y-axis direction in FIG. 3A). Occurs and the center of the light quantity appears linearly in the direction parallel to the major axis of the rod-shaped light source (the y-axis direction in FIG. 3A).

棒状光源の性質に基づいて発生する照射光量の分布に加えて、レンズ基板表面上は、凸面のベースカーブに基づいて、照射光量の分布が発生する。すなわち、棒状光源の長軸と平行方向(図3(a)のy軸方向)においても、ベースカーブに由来して、レンズ基板の中央部の照射光量が多く、周辺部の照射光量が少なくなる。   In addition to the distribution of the irradiation light amount generated based on the properties of the rod-shaped light source, the distribution of the irradiation light amount occurs on the lens substrate surface based on the convex base curve. That is, even in the direction parallel to the major axis of the rod-shaped light source (in the y-axis direction in FIG. 3A), the amount of irradiation light at the central portion of the lens substrate is large and the amount of irradiation light at the peripheral portion is small due to the base curve. .

レンズ基板Sは、棒状光源111に対向する位置で、凸面を棒状光源に対向させて基板保持部131により把持される。続いて、レンズ基板Sは、回転軸132を介して回転させられる。ここでレンズ基板Sの回転はレンズ基板の中心を軸心として回転させる。これによって、レンズ基板Sの表面における照射光量は、少なくとも中心から同心円状に均質な照射光量となる。
レンズ基板Sの回転速度は、光硬化膜の性質に応じて、当該塗膜の表面が荒れないような回転数であることが好ましく、例えば、1〜3000ppmが好ましく、5〜1000ppmがより好ましく、10〜300ppmが更に好ましい。
The lens substrate S is held by the substrate holding part 131 at a position facing the rod-shaped light source 111 with the convex surface facing the rod-shaped light source. Subsequently, the lens substrate S is rotated via the rotation shaft 132. Here, the lens substrate S is rotated about the center of the lens substrate as an axis. Thereby, the irradiation light quantity on the surface of the lens substrate S becomes a uniform irradiation light quantity concentrically from at least the center.
The rotation speed of the lens substrate S is preferably a rotation speed such that the surface of the coating film is not rough depending on the properties of the photocured film, for example, preferably 1 to 3000 ppm, more preferably 5 to 1000 ppm, 10 to 300 ppm is more preferable.

図4は、棒状光源側の視点からのレンズ基板の反復動作を説明する模式図である。反復動作においては、レンズ基板Sの回転に加えて、図4(a)に示すように、光量分布の中心PCがレンズ基板Sの中心SCから、図4(b)に示すように、光量中心PCがレンズ基板Sの一端まで通過するように遥動させ、レンズ基板の中央部と周辺部における照射光量の差を調整し、レンズ基板S上の照射光量を均一にする。
遥動の方向は、中心が前記レンズ基板の少なくとも中心から一端までを通過するように移動すれば、特に限定されない。例えば図4に示すように、T1の遥動方向であっても、T2の遥動方向であってもよい。
遥動幅は、例えば、棒状光源の長軸に対して垂直方向の移動量がレンズ基板Sの半径rとなる幅である。この場合、遥動動作の一端が照射光量の中心とレンズ基板Sの中心部が一致する位置(図4(b))であり、遥動動作の他端が照射光量の中心とレンズ基板Sの一端とが一致する位置(図4(a))として遥動させることで、レンズ基板上の照射光量を均一にすることができる。
また図5に示すように、遥動幅は、例えば、レンズ基板Sの直径2rと同じ幅以上であってもよい。この場合、遥動動作の一端が、照射光量の中心PCとレンズ基板Sの一端とが一致する位置(図5(a))であり、遥動動作の他端が照射光量の中心とレンズ基板Sの他端とが一致する位置(図5(c))として遥動させることで、レンズ基板上の照射光量を均一にすることができる。
遥動の速度は、特に限定されず、光硬化膜の性質に応じて、当該膜の表面が荒れないような速度で動作させることが好ましいが、例えば、1〜1000mm/sが好ましく、5〜500mm/sがより好ましく、10〜300mm/sが更に好ましい。
FIG. 4 is a schematic diagram for explaining the repetitive operation of the lens substrate from the viewpoint on the rod-shaped light source side. In the repetitive operation, in addition to the rotation of the lens substrate S, as shown in FIG. 4A, the center PC of the light amount distribution is changed from the center SC of the lens substrate S as shown in FIG. The PC is swung so as to pass to one end of the lens substrate S, and the difference in the amount of irradiation light between the central portion and the peripheral portion of the lens substrate is adjusted, so that the amount of irradiation light on the lens substrate S is made uniform.
The direction of the swing is not particularly limited as long as the center moves so as to pass from at least the center to one end of the lens substrate. For example, as shown in FIG. 4, it may be the swing direction of T1 or the swing direction of T2.
The swaying width is, for example, a width at which the amount of movement in the direction perpendicular to the major axis of the rod-shaped light source becomes the radius r of the lens substrate S. In this case, one end of the swing operation is a position where the center of the irradiation light amount and the center of the lens substrate S coincide (FIG. 4B), and the other end of the swing operation is the center of the irradiation light amount and the lens substrate S. By swinging as a position where one end coincides (FIG. 4A), the amount of irradiation light on the lens substrate can be made uniform.
Further, as shown in FIG. 5, the swing width may be equal to or larger than the same width as the diameter 2r of the lens substrate S, for example. In this case, one end of the swing operation is a position where the center PC of the irradiation light amount and one end of the lens substrate S coincide (FIG. 5A), and the other end of the swing operation is the center of the irradiation light amount and the lens substrate. By swinging as a position where the other end of S coincides (FIG. 5C), it is possible to make the irradiation light amount on the lens substrate uniform.
The speed of swinging is not particularly limited, and it is preferable to operate at such a speed that the surface of the film is not rough, depending on the properties of the photocured film, for example, preferably 1 to 1000 mm / s, 500 mm / s is more preferable, and 10 to 300 mm / s is still more preferable.

(変形例)
図6は、レンズ基板の回転の変形例を説明する模式図である。レンズ基板Sの回転は、図1に示すようにその回転軸が棒状光源111に対して垂直に対向していてもよいが、図6に示すように垂直対向方向に対して傾きを有していてもよい。この場合、レンズ基板用光照射装置1において、内部チャンバ12内の回転軸132を傾けて構成する。
(Modification)
FIG. 6 is a schematic diagram for explaining a modification of the rotation of the lens substrate. The rotation of the lens substrate S may be perpendicular to the rod-shaped light source 111 as shown in FIG. 1, but has an inclination with respect to the vertical facing direction as shown in FIG. May be. In this case, the lens substrate light irradiation device 1 is configured by tilting the rotation shaft 132 in the internal chamber 12.

図7は、棒状光源側の視点から、反復動作の変形例を説明する模式図である。
図7(a)〜(d)に示すように、棒状光源111に対して、円形軌道T3上を動作させて、光量中心PCがレンズ基板Sの一端から他端までを通過するように反復動作させてもよい。この場合、レンズ基板用光照射装置1において、ガイドレール142を円形軌道上に形成し、第二駆動機構により当該ガイドレール142上を可動台座14が動作するように構成する。
FIG. 7 is a schematic diagram for explaining a modification example of the repetitive operation from the viewpoint of the rod-shaped light source side.
As shown in FIGS. 7A to 7D, the rod-shaped light source 111 is operated on the circular trajectory T3 so that the light quantity center PC passes from one end to the other end of the lens substrate S. You may let them. In this case, the lens substrate light irradiation device 1 is configured such that the guide rail 142 is formed on a circular track and the movable base 14 is operated on the guide rail 142 by the second drive mechanism.

実施例により本発明をさらに詳しく説明するが、本発明はこれらの実施例によって制限されるものではない。   The present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

ガラス製容器に、溶媒として1−メトキシ−2−プロパノール、金属酸化物(シリカゾル、商品名PGM−ST、日産化学工業株会社製)とシランカップリング剤(商品名:KBM−503、信越化学工業株式会社製)を入れ、55℃、450rpmで撹拌し、金属酸化物にシランカップリング剤を被覆させた。
続いて、多官能アクリレート{ペンタエリスリトールアクリレート(商品名M−306、東亜合成株式会社製、トリアクリレート〈1分子中水酸基1個〉65〜70%含有する混合物)50質量部、樹枝状脂肪族化合物(商品名SIRIUS−501、大阪有機化学工業株式会社製)50質量部}100質量部と、上記シランカップリング剤を被覆させた金属酸化物100質量部と、レベリング剤(商品名:Y−7006、ポリオキシアルキレン・ジメチルポリシロキサン コポリマー 東レダウコーニング株式会社製)と、反応開始剤(商品名:IRGACURE184、チバ・スペシャルティ・ケミカルズ株式会社製)とを含む光硬化性樹脂組成物溶液を調製した。
レンズ基板として、EYNOA基材(商品名、HOYA(株)製造、ポリチオウレタン樹脂、屈折率1.67、中心厚1.0mm、レンズ度数0.00)を用い、それぞれの基板に上記光硬化性樹脂組成物溶液をスピンコーター(ミカサ株式会社製)で塗布した。
レンズ基板光照射装置1を用いて上記のレンズ基板に対して、表1に示す条件で光照射を行なった。なお揺動は、揺動方向が棒状光源の長軸に対して垂直方向に、揺動幅がレンズ基板の半径rに対して2rとなるようにして行なった。以下に示す密着性の評価方法に従って評価を行なった。
In a glass container, 1-methoxy-2-propanol as a solvent, metal oxide (silica sol, trade name PGM-ST, manufactured by Nissan Chemical Industries Ltd.) and silane coupling agent (trade name: KBM-503, Shin-Etsu Chemical) Made by Co., Ltd.) and stirred at 55 ° C. and 450 rpm to coat the metal oxide with a silane coupling agent.
Subsequently, 50 parts by mass of a polyfunctional acrylate {pentaerythritol acrylate (trade name M-306, manufactured by Toa Gosei Co., Ltd., triacrylate <1 hydroxyl group in one molecule> 65 to 70%), dendritic aliphatic compound (Trade name SIRIUS-501, made by Osaka Organic Chemical Industry Co., Ltd.) 50 parts by mass} 100 parts by mass, 100 parts by mass of the metal oxide coated with the silane coupling agent, and a leveling agent (trade name: Y-7006) , Polyoxyalkylene / dimethylpolysiloxane copolymer manufactured by Toray Dow Corning Co., Ltd.) and a reaction initiator (trade name: IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) were prepared.
EYNOA base material (trade name, manufactured by HOYA Co., Ltd., polythiourethane resin, refractive index 1.67, center thickness 1.0 mm, lens power 0.00) is used as the lens substrate, and the above-mentioned photocuring is applied to each substrate. The functional resin composition solution was applied with a spin coater (Mikasa Co., Ltd.).
The lens substrate light irradiation apparatus 1 was used to irradiate the above lens substrate under the conditions shown in Table 1. The rocking was performed such that the rocking direction was perpendicular to the long axis of the rod-shaped light source, and the rocking width was 2r with respect to the radius r of the lens substrate. Evaluation was performed according to the following adhesion evaluation method.

(密着性の評価)
コーティング膜に1.5mm間隔で100目クロスカットし、このクロスカットしたところに粘着テープ(登録商標:セロテープ、ニチバン株式会社製)を強く貼り付けた後、粘着テープを急速に剥がした後の硬化膜の剥離の有無を、図8に示すように初期の光量分布の中心PCを基準にレンズ基板を9つの区画に分けて、当該区画ごとに調べた。
◎.剥がれた目が0個であった。
○.剥がれた目が1個以上2個以下であった。
△.剥がれた目が3個以上4個以下であった。
×.剥がれた目が5個以上であった。
(Evaluation of adhesion)
100 cross-cuts at 1.5 mm intervals on the coating film, and after the adhesive tape (registered trademark: cello tape, manufactured by Nichiban Co., Ltd.) is firmly attached to the cross-cut, the adhesive tape is rapidly peeled off and cured. As shown in FIG. 8, the lens substrate was divided into nine sections on the basis of the center PC of the initial light amount distribution as shown in FIG.
◎. There were no eyes peeled off.
○. The number of eyes peeled off was 1 or more and 2 or less.
Δ. The number of peeled eyes was 3 or more and 4 or less.
×. Five or more eyes were peeled off.

本発明のレンズ基板用光照射装置は、レンズ基板上に均一に光を当てるレンズ基板用光照射装置、及びレンズの製造方法を提供することができる。このため、本発明の装置によれば、光硬化性樹脂を用いてレンズ基板上にハードコート膜などを設けることができる。   The lens substrate light irradiation apparatus of the present invention can provide a lens substrate light irradiation apparatus that uniformly irradiates light onto the lens substrate, and a method for manufacturing a lens. For this reason, according to the apparatus of this invention, a hard-coat film | membrane etc. can be provided on a lens board | substrate using photocurable resin.

1:レンズ基板用光照射装置
11:外部チャンバ
111:棒状光源
112:固定部
113:遮光部
114:台座
12:内部チャンバ
121:筐体
122:光透過窓
125:不活性ガス導入孔
126:不活性ガス排出孔
127:邪魔板
131:基板保持部
132:回転軸
133:第一駆動機構
14:可動台座
141:台座本体
142:ガイドレール
143:第二駆動機構
S:レンズ基板
SC:レンズ中心
PC:光量中心
1: Lens substrate light irradiation device 11: External chamber 111: Rod light source 112: Fixed portion 113: Light shielding portion 114: Base 12: Internal chamber 121: Housing 122: Light transmission window 125: Inert gas introduction hole 126: Non Active gas discharge hole 127: Baffle plate 131: Substrate holding part 132: Rotating shaft 133: First drive mechanism 14: Movable base 141: Base body 142: Guide rail 143: Second drive mechanism S: Lens substrate SC: Lens center PC : Center of light intensity

Claims (5)

長尺光源と、
前記長尺光源に対向する位置にレンズ基板を把持する基板保持手段と、
前記レンズ基板を回転させる回転手段と、
前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させる反復動作手段と、
を備える、レンズ基板用光照射装置。
A long light source;
Substrate holding means for holding the lens substrate at a position facing the long light source;
Rotating means for rotating the lens substrate;
Repetitive operation means for repetitively operating at least one of the lens substrate and the long light source so that the center of the light amount distribution formed by the long light source passes from at least the center to one end of the lens substrate;
A lens substrate light irradiation device comprising:
前記反復動作手段の動作方向が、前記回転手段の回転軸に対して垂直方向である、請求項1に記載のレンズ基板用光照射装置。   The light irradiation apparatus for a lens substrate according to claim 1, wherein an operation direction of the repetitive operation unit is a direction perpendicular to a rotation axis of the rotation unit. 前記長尺光源が設けられた外部チャンバと、
前記外部チャンバ内に設けられ、前記長尺光源との対向面の少なくとも一部が光透過部材で構成される内部チャンバと、を更に備え、
前記基板保持手段が、前記光透過部材を介して前記光源に対向する位置にレンズ基板を把持するように設置され、
前記反復動作手段が前記内部チャンバを反復動作させる、請求項1又は2に記載のレンズ基板用光照射装置。
An external chamber provided with the long light source;
An internal chamber provided in the external chamber, wherein at least a part of a surface facing the long light source is formed of a light transmissive member,
The substrate holding means is installed to hold the lens substrate at a position facing the light source through the light transmitting member;
The light irradiation apparatus for a lens substrate according to claim 1, wherein the repetitive operation means repeatedly operates the internal chamber.
前記内部チャンバが、不活性ガス導入孔と、前記レンズ基板上に不活性ガス気流が直接あたらないように該不活性ガス導入孔の近傍に設置された邪魔板と、不活性ガス排出孔と、を更に有する、請求項1〜3のいずれかに記載のレンズ基板用光照射装置。   The internal chamber includes an inert gas introduction hole, a baffle plate installed in the vicinity of the inert gas introduction hole so that an inert gas stream does not directly hit the lens substrate, an inert gas discharge hole, The lens substrate light irradiation device according to claim 1, further comprising: レンズ基板上に形成された光硬化性膜を長尺光源により光照射して硬化させるレンズの製造方法であって、
前記長尺光源に対向する位置で前記レンズ基板を回転させ、前記長尺光源により形成される光量分布の中心が前記レンズ基板の少なくとも中心から一端までを通過するように、前記レンズ基板、前記長尺光源の少なくとも一方を反復動作させて、前記長尺光源から光照射をおこなう、レンズの製造方法。
A method for producing a lens in which a photocurable film formed on a lens substrate is cured by light irradiation with a long light source,
The lens substrate is rotated so that the lens substrate is rotated at a position facing the long light source, and the center of the light quantity distribution formed by the long light source passes from at least the center to one end of the lens substrate. A method for manufacturing a lens, wherein at least one of a long light source is repeatedly operated to emit light from the long light source.
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Publication number Priority date Publication date Assignee Title
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JP2006181455A (en) * 2004-12-27 2006-07-13 Hoya Corp Coating device of optical lens
JP2007057717A (en) * 2005-08-23 2007-03-08 Fujifilm Corp Manufacturing method of color filter, color filter and display apparatus
JP2007127841A (en) * 2005-11-04 2007-05-24 Tokuyama Corp Coating device
JP2009196144A (en) * 2008-02-20 2009-09-03 Toray Ind Inc Holder for processing of contact lens material, processing apparatus for contact lens material and method of manufacturing contact lens
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105328845A (en) * 2014-08-15 2016-02-17 奇鼎科技股份有限公司 UV curing device for contact lenses

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