JP2014056215A - Antireflection film, optical member using the same, and optical equipment - Google Patents
Antireflection film, optical member using the same, and optical equipment Download PDFInfo
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Abstract
Description
本発明はテレビカメラ、ビデオカメラ、デジタルカメラ、車載カメラ、顕微鏡、望遠鏡等の光学機器に搭載するレンズ、プリズム、フィルター等の光学部材に適用される反射防止膜、それを用いた光学部材、及び光学機器に関する。 The present invention relates to an antireflection film applied to optical members such as lenses, prisms, and filters mounted on optical devices such as television cameras, video cameras, digital cameras, vehicle cameras, microscopes, and telescopes, optical members using the same, and It relates to optical equipment.
写真用や放送用等に広く用いられている単焦点レンズやズームレンズは、一般的に多数枚のレンズからなる鏡筒構成を有しており、そのレンズ数は10枚程度から40枚程度にもなる。 Single focus lenses and zoom lenses that are widely used for photography, broadcasting, etc., generally have a lens barrel structure consisting of a large number of lenses, and the number of lenses is about 10 to 40. Also become.
レンズ枚数が多くなると各レンズ表面の反射光の総量が増加し、またその反射光が多重反射を繰り返して感光面に入射することでフレアやゴーストといった光学特性を著しく劣化させる弊害を発生させる原因となる。そのためこれらのレンズの表面には、基板とは異なる屈折率をもつ誘電体膜を組み合わせ、各誘電体膜の光学膜厚を中心波長λに対して1/2λや1/4λに設定して干渉効果を利用した多層膜による反射防止処理が施されている。 When the number of lenses increases, the total amount of reflected light on the surface of each lens increases, and the reflected light repeatedly enters the photosensitive surface after multiple reflections, which causes adverse effects such as flare and ghost. Become. Therefore, a dielectric film having a refractive index different from that of the substrate is combined on the surface of these lenses, and the optical film thickness of each dielectric film is set to 1 / 2λ or 1 / 4λ with respect to the center wavelength λ to interfere. An antireflection treatment using a multilayer film utilizing the effect is performed.
例えば、特開2007-213021号公報(特許文献1)は、基板上に設けられ、基板と反対側から順に積層された第1層〜第8層を含む反射防止膜であって、第1層及び第4層はd線に対して1.35以上1.50以下の屈折率を示す低屈折率材料からなり、第3層及び第5層は、d線に対して1.55以上1.85以下の屈折率を示す中間屈折率材料からなり、第2層及び第6層は、d線に対して1.70以上2.50以下の範囲において前記中間屈折率材料よりも高い屈折率を示す高屈折率材料からなる反射防止膜を開示している。この反射防止膜は、おおよそ400〜700 nmの波長帯においてほぼ0.15%以下の反射率を有する。 For example, Japanese Patent Application Laid-Open No. 2007-213021 (Patent Document 1) is an antireflection film including a first layer to an eighth layer which are provided on a substrate and are sequentially stacked from the opposite side of the substrate. And the fourth layer is made of a low refractive index material exhibiting a refractive index of 1.35 or more and 1.50 or less with respect to the d line, and the third layer and the fifth layer are intermediate members exhibiting a refractive index of 1.55 or more and 1.85 or less with respect to the d line. An antireflection film made of a refractive index material, wherein the second layer and the sixth layer are made of a high refractive index material exhibiting a higher refractive index than the intermediate refractive index material in the range of 1.70 to 2.50 with respect to the d-line. doing. This antireflection film has a reflectance of approximately 0.15% or less in a wavelength band of approximately 400 to 700 nm.
特開2002-267801号公報(特許文献2)は、基板上に該基板側から順に第1層〜第9層の誘電体よりなる薄膜を施した反射防止膜であって、第2層、第4層、第6層、第8層の材質の波長550 nmでの屈折率をNhとし、第1層、第3層、第5層、第7層の材質の波長550 nmでの屈折率をNmとし、第9層の材質の波長550 nmでの屈折率をNlとしたとき、2.00 ≦ Nh ≦ 2.20,1.50 ≦ Nm ≦ 1.80,Nl ≦ 1.46を満足する反射防止膜を開示している。この反射防止膜は、おおよそ400〜680 nmの波長帯においてほぼ0.2%以下の反射率を有する。 Japanese Patent Laid-Open No. 2002-267801 (Patent Document 2) is an antireflection film in which a thin film made of a dielectric material of first to ninth layers is formed on a substrate in order from the substrate side. four layers, the sixth layer, a refractive index at a wavelength 550 nm of the material of the eighth layer and N h, the first layer, the third layer, the refractive index of the fifth layer, the wavelength 550 nm of the material of the seventh layer was a N m, and the refractive index at a wavelength 550 nm of the material of the ninth layer was N l, 2.00 ≦ N h ≦ 2.20,1.50 ≦ N m ≦ 1.80, the antireflection film satisfies N l ≦ 1.46 Disclosure. This antireflection film has a reflectance of approximately 0.2% or less in a wavelength band of approximately 400 to 680 nm.
特開2002-107506号公報(特許文献3)は、基板上に積層された10層の薄膜を有する設計波長λ0 =550 nmの反射防止膜であって、第2層、第4層、第6層、第9層の設計波長λ0 における屈折率が2.00以上であり、第1層及び第7層の設計波長λ0 における屈折率が1.50〜1.80の範囲内であり、第3層、第5層、第8層及び第10層の設計波長λ0 における屈折率が1.46以下である反射防止膜を開示している。この反射防止膜は、おおよそ400〜710 nmの波長帯においてほぼ0.2%以下の反射率を有する。 Japanese Patent Application Laid-Open No. 2002-107506 (Patent Document 3) is an antireflection film having a design wavelength λ 0 = 550 nm having 10 thin films laminated on a substrate, and includes a second layer, a fourth layer, 6 layers, having a refractive index at the design wavelength lambda 0 of the ninth layer is 2.00 or more, the refractive index at the design wavelength lambda 0 of the first layer and the seventh layer is in the range of 1.50 to 1.80, the third layer, the An antireflection film having a refractive index of 1.46 or less at the design wavelength λ 0 of the fifth layer, the eighth layer, and the tenth layer is disclosed. This antireflection film has a reflectance of approximately 0.2% or less in a wavelength band of approximately 400 to 710 nm.
特開2001-100002号公報(特許文献4)は、基板上に該基板側から順に第1層〜第10層の誘電体よりなる薄膜を施した反射防止膜であって、第2層,第4層,第6層,第9層の材質の波長550 nmでの屈折率をNhとし、第1層,第8層の材質の波長550 nmでの屈折率をNmとし、該第3,第5,第7,第10層の材質の波長550 nmでの屈折率をNLとしたとき、2.0 ≦ Nh,1.5 ≦ Nm ≦ 1.8,NL ≦ 1.46を満足する反射防止膜を開示している。この反射防止膜は、おおよそ410〜690 nmの波長帯においてほぼ0.2%以下の反射率を有する。 Japanese Patent Laid-Open No. 2001-100002 (Patent Document 4) is an antireflection film in which a thin film made of a dielectric of first to tenth layers is applied on a substrate in order from the substrate side. The refractive index at a wavelength of 550 nm of the material of the fourth layer, the sixth layer, and the ninth layer is N h, and the refractive index at a wavelength of 550 nm of the material of the first layer and the eighth layer is N m , and the third , fifth, seventh, and the refractive index at a wavelength 550 nm of the material of the tenth layer was N L, 2.0 ≦ N h, 1.5 ≦ N m ≦ 1.8, an anti-reflection film that satisfies N L ≦ 1.46 Disclosure. This antireflection film has a reflectance of approximately 0.2% or less in a wavelength band of approximately 410 to 690 nm.
しかし、これらの反射防止膜は、一般的に可視域とされる波長帯380〜780 nmにおいて、反射防止帯域幅が300 nm程度と小さいという問題がある。人間の目はこの可視域の中でも特に波長390〜720 nmの範囲において、色みをより強く感じる視覚感度を有する。このことは明所視の際に働く視細胞である錐体の分光視感効率から分かる。 However, these antireflection films have a problem that the antireflection bandwidth is as small as about 300 nm in a wavelength band of 380 to 780 nm, which is generally in the visible range. The human eye has a visual sensitivity that makes the color feel stronger in this visible range, particularly in the wavelength range of 390 to 720 nm. This can be seen from the spectral luminous efficiency of the cone, which is the photoreceptor that works during photopic vision.
従って本発明の目的は、従来の反射防止帯域幅の300 nmを超える、より広い波長帯域390〜720 nmの範囲において優れた反射防止性能を発揮する反射防止膜を提供することを目的とする。 Accordingly, an object of the present invention is to provide an antireflection film that exhibits excellent antireflection performance in a wider wavelength band range of 390 to 720 nm, which exceeds the conventional antireflection bandwidth of 300 nm.
本発明の別の目的は、かかる反射防止膜を施した光学部材を提供することである。 Another object of the present invention is to provide an optical member provided with such an antireflection film.
本発明のさらに別の目的は、かかる光学部材を有する光学機器を提供することである。 Still another object of the present invention is to provide an optical apparatus having such an optical member.
上記課題に鑑み鋭意研究の結果、本発明者は、屈折率差の大きい高屈折率層と中間屈折率層とを交互に積層させ、最上層を低屈折率層とすることにより、少ない積層数でありながら、波長390〜720 nmの広い可視光域において0.2%以下の反射率を有する反射防止膜が得られることを発見し、本発明に想到した。 As a result of diligent research in view of the above problems, the present inventors have made it possible to reduce the number of layers by alternately stacking a high refractive index layer and an intermediate refractive index layer having a large refractive index difference and making the uppermost layer a low refractive index layer. However, the present inventors have found that an antireflection film having a reflectance of 0.2% or less in a wide visible light region having a wavelength of 390 to 720 nm can be obtained, and arrived at the present invention.
即ち、本発明の反射防止膜、光学部材及び光学機器は以下の特徴を有している。
[1] 基材の表面上に、第1層〜第9層を前記基材側からこの順に積層してなる反射防止膜であって、第2層、第4層、第6層及び第8層は波長587.56 nmのd線に対して2.21以上2.70以下の屈折率を示す高屈折率材料により形成された高屈折率層であり、第1層、第3層、第5層及び第7層は前記d線に対して1.40以上1.55未満の屈折率を示す中間屈折率材料により形成された中間屈折率層であり、第9層は前記d線に対して1.35以上1.40未満の屈折率を示す低屈折率材料により形成された低屈折率層であり、可視域の波長帯390〜720 nmの光に対する反射率が0.2%以下であることを特徴とする反射防止膜。
[2] 上記[1] に記載の反射防止膜において、前記中間屈折率層と前記高屈折率層との間の屈折率差は0.67〜1.30であることを特徴とする反射防止膜。
[3] 上記[1] 又は[2] に記載の反射防止膜において、前記高屈折率材料はTiO2、Nb2O5、又はTiO2、Nb2O5、CeO2、Ta2O5、ZnO、ZrO2、In2O3、SnO2及びHfO2の混合物又は化合物であり、前記中間屈折率材料はSiO2、YbF3、YF3、又はSiO2、Al2O3、CeF3、NdF3、GdF3、LaF3、YbF3及びYF3の混合物又は化合物であり、前記低屈折率材料はMgF2、AlF3、又はMgF2、AlF3及びSiO2の混合物又は化合物であることを特徴とする反射防止膜。
[4] 上記[1]〜[3] のいずれかに記載の反射防止膜において、前記基材は前記d線に対して1.40以上2.10以下の屈折率を有することを特徴とする反射防止膜。
[5] 上記[1]〜[4] のいずれかに記載の反射防止膜を施したことを特徴とする光学部材。
[6] 上記[5] に記載の光学部材を有することを特徴とする光学機器。
That is, the antireflection film, the optical member, and the optical apparatus of the present invention have the following characteristics.
[1] An antireflection film obtained by laminating a first layer to a ninth layer on a surface of a base material in this order from the base material side. The second layer, the fourth layer, the sixth layer, and the eighth layer The layer is a high refractive index layer formed of a high refractive index material exhibiting a refractive index of 2.21 or more and 2.70 or less with respect to a d-line having a wavelength of 587.56 nm. The first layer, the third layer, the fifth layer, and the seventh layer Is an intermediate refractive index layer formed of an intermediate refractive index material having a refractive index of 1.40 or more and less than 1.55 with respect to the d line, and the ninth layer shows a refractive index of 1.35 or more and less than 1.40 with respect to the d line. An antireflection film which is a low refractive index layer formed of a low refractive index material, and has a reflectance of 0.2% or less with respect to light in a visible wavelength range of 390 to 720 nm.
[2] The antireflection film as described in [1] above, wherein the refractive index difference between the intermediate refractive index layer and the high refractive index layer is 0.67 to 1.30.
[3] In the antireflection film according to the above [1] or [2], the high refractive index material is TiO 2 , Nb 2 O 5 , or TiO 2 , Nb 2 O 5 , CeO 2 , Ta 2 O 5 , ZnO, ZrO 2 , In 2 O 3 , SnO 2 and HfO 2 mixture or compound, the intermediate refractive index material is SiO 2 , YbF 3 , YF 3 , or SiO 2 , Al 2 O 3 , CeF 3 , NdF 3 , a mixture or compound of GdF 3 , LaF 3 , YbF 3 and YF 3 , wherein the low refractive index material is MgF 2 , AlF 3 , or a mixture or compound of MgF 2 , AlF 3 and SiO 2 Antireflection film.
[4] The antireflection film according to any one of [1] to [3], wherein the base material has a refractive index of 1.40 to 2.10 with respect to the d-line.
[5] An optical member comprising the antireflection film according to any one of [1] to [4].
[6] An optical apparatus comprising the optical member according to [5].
本発明によれば、少ない積層数でありながら、波長390〜720 nmの広い可視光域において反射率0.2%以下を確保できるため、極めて高い透過率特性と優れたカラーバランスを備えた反射防止膜、それを用いたフレアやゴースト等の光学特性を著しく劣化させる弊害を発生しない高性能な光学部材、及びそれを有する光学機器が得られる。 According to the present invention, since the reflectance is 0.2% or less in a wide visible light region with a wavelength of 390 to 720 nm even though the number of laminated layers is small, the antireflection film having extremely high transmittance characteristics and excellent color balance. In addition, a high-performance optical member that does not cause a harmful effect of remarkably degrading optical properties such as flare and ghost using the same, and an optical apparatus having the same can be obtained.
図1は本発明の一実施例による基材10の表面上に基材10から順に第1層21〜第9層29を積層してなる反射防止膜20を示す図である。 FIG. 1 is a view showing an antireflection film 20 in which a first layer 21 to a ninth layer 29 are laminated in order from a base material 10 on the surface of the base material 10 according to an embodiment of the present invention.
図1に示す基材10は平板であるが、本発明はこれに限らず、レンズ、プリズム、ライトガイド、フィルム又は回折素子でも良い。基材10の屈折率は、d線(波長:587.56 nm)に対して1.40以上2.10以下であるのが好ましい。基材10の材料は、ガラス、結晶性材料、プラスチック等の透明材料を用いても良い。具体的には、FK03、FK5、BK7、SK20、SK14、LAK7、LAK10、LASF016、LASF04 SFL03、LASF08、NPH2、TAFD4等の光学ガラス、パイレックス(登録商標)ガラス、石英、青板ガラス、白板ガラス、ルミセラ(登録商標)、ゼロデュア(登録商標)、蛍石、サファイア、アクリル、ポリカーボネート、ポリエチレンテレフタレート、アペル(登録商標)、ゼオネクス(登録商標)、アートン(登録商標)等が挙げられる。 The substrate 10 shown in FIG. 1 is a flat plate, but the present invention is not limited to this, and may be a lens, a prism, a light guide, a film, or a diffraction element. The refractive index of the substrate 10 is preferably 1.40 or more and 2.10 or less with respect to d-line (wavelength: 587.56 nm). As the material of the substrate 10, a transparent material such as glass, a crystalline material, or plastic may be used. Specifically, optical glass such as FK03, FK5, BK7, SK20, SK14, LAK7, LAK10, LASF016, LASF04 SFL03, LASF08, NPH2, TAFD4, Pyrex (registered trademark) glass, quartz, blue plate glass, white plate glass, Lumisera (Registered trademark), Zerodur (registered trademark), fluorite, sapphire, acrylic, polycarbonate, polyethylene terephthalate, Apel (registered trademark), Zeonex (registered trademark), Arton (registered trademark), and the like.
反射防止膜20の第2層22、第4層24、第6層26及び第8層28はd線に対して2.21以上2.70以下の屈折率を示す高屈折率材料により形成された高屈折率層であり、第1層21、第3層23、第5層25及び第7層27はd線に対して1.40以上1.55未満の屈折率を示す中間屈折率材料により形成された中間屈折率層であり、第9層29はd線に対して1.35以上1.40未満の屈折率を示す低屈折率材料により形成された低屈折率層である。 The second layer 22, the fourth layer 24, the sixth layer 26 and the eighth layer 28 of the antireflection film 20 are formed of a high refractive index material having a refractive index of 2.21 or more and 2.70 or less with respect to the d line. The first refractive index layer is an intermediate refractive index layer formed of an intermediate refractive index material having a refractive index of 1.40 or more and less than 1.55 with respect to the d-line, the first layer 21, the third layer 23, the fifth layer 25, and the seventh layer 27. The ninth layer 29 is a low refractive index layer formed of a low refractive index material having a refractive index of 1.35 or more and less than 1.40 with respect to the d line.
本発明の反射防止膜としての特性に影響を与えない範囲であれば反射防止膜20にさらに膜を追加しても良い。例えば、反射防止膜の特性に影響を与えない範囲であれば、高屈折率層、中間屈折率層及び低屈折率層の間に屈折率の異なる薄い膜を挿入しても良い。また、高屈折率層、中間屈折率層及び低屈折率層と同じ光学特性が得られるのであれば、高屈折率層、中間屈折率層及び低屈折率層のうち少なくとも1層を複数の膜で置き換えても良い。 A film may be further added to the antireflection film 20 as long as it does not affect the characteristics of the antireflection film of the present invention. For example, a thin film having a different refractive index may be inserted between the high refractive index layer, the intermediate refractive index layer, and the low refractive index layer as long as it does not affect the characteristics of the antireflection film. In addition, if the same optical characteristics as the high refractive index layer, the intermediate refractive index layer, and the low refractive index layer can be obtained, at least one of the high refractive index layer, the intermediate refractive index layer, and the low refractive index layer is a plurality of films. It may be replaced with.
基材10の表面上に基材10から順に上記の屈折率を有する第1層21〜第9層29を積層して反射防止膜20を形成することにより、少ない積層数でありながら、より広い波長帯に亘って反射率を十分に低減することができる。具体的には、可視域380〜780 nmのうち特に感度が高い波長帯390〜720 nmの光に対して0.2%以下の反射率に抑えることができる。 By forming the antireflection film 20 by laminating the first layer 21 to the ninth layer 29 having the above-mentioned refractive index in order from the base material 10 on the surface of the base material 10, it is wider while having a small number of layers. The reflectance can be sufficiently reduced over the wavelength band. Specifically, the reflectance can be suppressed to 0.2% or less with respect to light in a wavelength band of 390 to 720 nm, which is particularly sensitive in the visible range of 380 to 780 nm.
このように、第2層22、第4層24、第6層26及び第8層28の高屈折率層と、第1層21、第3層23、第5層25及び第7層27の中間屈折率層との間の屈折率差を大きくすることにより、反射防止膜20全体の膜厚を大きくすることなく、可視域の広い波長帯390〜720 nmの光に対して反射率を十分に低減することができる。高屈折率層と中間屈折率層との間の屈折率差は0.67〜1.30であるのが好ましく、0.68〜1.29であるのがより好ましい。 Thus, the high refractive index layers of the second layer 22, the fourth layer 24, the sixth layer 26, and the eighth layer 28, the first layer 21, the third layer 23, the fifth layer 25, and the seventh layer 27 Enlarging the difference in refractive index with the intermediate refractive index layer provides sufficient reflectivity for light in the wide wavelength range of 390 to 720 nm without increasing the overall film thickness of the antireflection film 20. Can be reduced. The refractive index difference between the high refractive index layer and the intermediate refractive index layer is preferably 0.67 to 1.30, and more preferably 0.68 to 1.29.
高屈折率材料としては、TiO2、Nb2O5、又はTiO2、Nb2O5、CeO2、Ta2O5、ZnO、ZrO2、In2O3、SnO2及びHfO2の混合物又は化合物を用いることができる。すなわち、TiO2及びNb2O5は高屈折率層の屈折率を有するため、単独で高屈折率材料として用いることができ、CeO2、Ta2O5、ZnO、ZrO2、In2O3、SnO2及びHfO2は単独では高屈折率層の屈折率から外れているため、他の化合物と組み合わせて用いることができる。同様に中間屈折率材料としては、SiO2、YbF3、YF3、又はSiO2、Al2O3、CeF3、NdF3、GdF3、LaF3、YbF3及びYF3の混合物又は化合物を用いることができる。低屈折率材料としては、MgF2、AlF3、又はMgF2、AlF3及びSiO2の混合物又は化合物を用いることができる。高屈折率材料、中間屈折率材料及び低屈折率材料は上記のものに限定されず、所望の屈折率が得られるものであれば、適宜用いることができる。 As the high refractive index material, TiO 2, Nb 2 O 5 , or TiO 2, Nb 2 O 5, CeO 2, Ta 2 O 5, ZnO, ZrO 2, a mixture of In 2 O 3, SnO 2 and HfO 2 or Compounds can be used. That is, since TiO 2 and Nb 2 O 5 have a refractive index of a high refractive index layer, they can be used alone as a high refractive index material, such as CeO 2 , Ta 2 O 5 , ZnO, ZrO 2 , In 2 O 3. SnO 2 and HfO 2 singly deviate from the refractive index of the high refractive index layer and can be used in combination with other compounds. Similarly, as the intermediate refractive index material, SiO 2 , YbF 3 , YF 3 , or a mixture or compound of SiO 2 , Al 2 O 3 , CeF 3 , NdF 3 , GdF 3 , LaF 3 , YbF 3 and YF 3 is used. be able to. As the low refractive index material, MgF 2 , AlF 3 , or a mixture or compound of MgF 2 , AlF 3 and SiO 2 can be used. The high refractive index material, intermediate refractive index material, and low refractive index material are not limited to those described above, and any material can be used as long as a desired refractive index can be obtained.
第1層21〜第9層29の光学膜厚[屈折率(n)×物理膜厚(d)]は、基板10及び各層21〜29の屈折率に応じてコンピュータを用いて最適値を求めることができる。 The optical film thickness [refractive index (n) × physical film thickness (d)] of the first layer 21 to the ninth layer 29 is determined using a computer in accordance with the refractive index of the substrate 10 and each of the layers 21 to 29. be able to.
高屈折率層、中間屈折率層及び低屈折率層はスパッタリング法、イオンプレーティング法、真空蒸着法等の物理蒸着法により形成するのが好ましい。特に第1層〜第8層をスパッタリング法又はイオンプレーティング法により形成し、第9層を加工精度の良い真空蒸着法により形成するのが好ましい。それにより屈折率が安定した反射防止膜20を効率良く形成することができる。 The high refractive index layer, intermediate refractive index layer, and low refractive index layer are preferably formed by physical vapor deposition such as sputtering, ion plating, or vacuum vapor deposition. In particular, the first layer to the eighth layer are preferably formed by sputtering or ion plating, and the ninth layer is preferably formed by vacuum deposition with high processing accuracy. Thereby, the antireflection film 20 having a stable refractive index can be efficiently formed.
本発明の反射防止膜を施した光学部材は、優れた屈折率特性を有し、テレビカメラ、ビデオカメラ、デジタルカメラ、車載カメラ、顕微鏡、望遠鏡等の光学機器に搭載するレンズ、プリズム、フィルター等に好適に用いることができる。 The optical member provided with the antireflection film of the present invention has excellent refractive index characteristics, and is mounted on an optical device such as a TV camera, a video camera, a digital camera, an in-vehicle camera, a microscope, a telescope, a lens, a prism, a filter, etc. Can be suitably used.
以下実施例により本発明を具体的に説明するが、本発明はこれらに限定されるものではない。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.
実施例1-1〜1-13
図2〜14の表(A) に示すように、高屈折率層22、24、26及び28の成膜材料としてd線に対して屈折率2.46を示すTiO2、中間屈折率層21、23、25及び27の成膜材料としてd線に対して屈折率1.48を示すSiO2、低屈折率層29の成膜材料としてd線に対して屈折率1.39を示すMgF2を使用し、所定の屈折率を有する各基材10に対する最適な各層21〜29の光学膜厚の設計値をシミュレーションにより求めた。λ0は設計波長(550 nm)である。各実施例1-1〜1-13の反射防止膜20に垂直に光を入射させたときの分光反射率をシミュレーションにより求めた。得られた計算結果をそれぞれ図2〜14のグラフ(B) に示す。このとき、基材10及び各層21〜29の屈折率分散を考慮し、基材10の反射防止膜20が形成されていない面での反射はないものとした。
Examples 1-1 to 1-13
As shown in Table (A) of FIGS. 2 to 14, TiO 2 having a refractive index of 2.46 with respect to the d-line as a film forming material for the high refractive index layers 22, 24, 26 and 28, and the intermediate refractive index layers 21, 23. , 25 and 27, SiO 2 showing a refractive index of 1.48 with respect to the d-line, and MgF 2 showing a refractive index of 1.39 with respect to the d-line as a film forming material of the low refractive index layer 29 are used. The optimal design value of the optical film thickness of each of the layers 21 to 29 for each substrate 10 having a refractive index was obtained by simulation. λ 0 is the design wavelength (550 nm). Spectral reflectivity when light was vertically incident on the antireflection film 20 of each of Examples 1-1 to 1-13 was determined by simulation. The obtained calculation results are shown in graphs (B) of FIGS. At this time, in consideration of the refractive index dispersion of the substrate 10 and each of the layers 21 to 29, it was assumed that there was no reflection on the surface of the substrate 10 on which the antireflection film 20 was not formed.
実施例2-1〜2-13
図15〜27の表(A) に示すように、高屈折率層22、24、26及び28の成膜材料としてd線に対して屈折率2.31を示すNb2O5、中間屈折率層21、23、25及び27の成膜材料としてd線に対して屈折率1.48を示すSiO2、低屈折率層29の成膜材料としてd線に対して屈折率1.39を示すMgF2を使用し、所定の屈折率を有する各基材10に対する最適な各層21〜29の光学膜厚の設計値をシミュレーションにより求めた。λ0は設計波長(550 nm)である。各実施例2-1〜2-13の反射防止膜20に垂直に光を入射させたときの分光反射率をシミュレーションにより求めた。得られた計算結果をそれぞれ図15〜27のグラフ(B) に示す。このとき、基材10及び各層21〜29の屈折率分散を考慮し、基材10の反射防止膜20が形成されていない面での反射はないものとした。
Examples 2-1 to 2-13
As shown in Tables (A) of FIGS. 15 to 27, Nb 2 O 5 showing a refractive index of 2.31 with respect to the d-line as the film forming material of the high refractive index layers 22, 24, 26 and 28, the intermediate refractive index layer 21 , 23, 25, and 27, SiO 2 showing a refractive index of 1.48 with respect to d-line, and MgF 2 showing a refractive index of 1.39 with respect to d-line as a film forming material of low refractive index layer 29, The optimum design value of the optical film thickness of each of the layers 21 to 29 for each base material 10 having a predetermined refractive index was obtained by simulation. λ 0 is the design wavelength (550 nm). Spectral reflectivity when light was vertically incident on the antireflection film 20 of each of Examples 2-1 to 2-13 was obtained by simulation. The obtained calculation results are shown in graphs (B) of FIGS. At this time, in consideration of the refractive index dispersion of the substrate 10 and each of the layers 21 to 29, it was assumed that there was no reflection on the surface of the substrate 10 on which the antireflection film 20 was not formed.
実施例3-1〜3-13
図28〜40の表(A) に示すように、高屈折率層22、24、26及び28の成膜材料としてd線に対して屈折率2.21を示すNb2O5+HfO2、中間屈折率層21、23、25及び27の成膜材料としてd線に対して屈折率1.47を示すSiO2、低屈折率層29の成膜材料としてd線に対して屈折率1.39を示すMgF2を使用し、所定の屈折率を有する各基材10に対する最適な各層21〜29の光学膜厚の設計値をシミュレーションにより求めた。λ0は設計波長(550 nm)である。各実施例3-1〜3-13の反射防止膜20に垂直に光を入射させたときの分光反射率をシミュレーションにより求めた。得られた計算結果をそれぞれ図28〜40のグラフ(B) に示す。このとき、基材10及び各層21〜29の屈折率分散を考慮し、基材10の反射防止膜20が形成されていない面での反射はないものとした。
Examples 3-1 to 3-13
As shown in Table (A) of FIGS. 28 to 40, Nb 2 O 5 + HfO 2 having a refractive index of 2.21 with respect to the d-line as a film forming material for the high refractive index layers 22, 24, 26 and 28, intermediate refraction SiO 2 showing a refractive index of 1.47 with respect to the d-line as a film forming material for the refractive index layers 21, 23, 25 and 27, and MgF 2 showing a refractive index of 1.39 with respect to the d-line as a film forming material for the low refractive index layer 29. The optimal design value of the optical film thickness of each of the layers 21 to 29 for each base material 10 having a predetermined refractive index was obtained by simulation. λ 0 is the design wavelength (550 nm). Spectral reflectivity when light was vertically incident on the antireflection film 20 of each of Examples 3-1 to 3-13 was obtained by simulation. The obtained calculation results are shown in graphs (B) of FIGS. At this time, in consideration of the refractive index dispersion of the substrate 10 and each of the layers 21 to 29, it was assumed that there was no reflection on the surface of the substrate 10 on which the antireflection film 20 was not formed.
実施例4-1〜4-13
図41〜53の表(A) に示すように、高屈折率層22、24、26及び28の成膜材料としてd線に対して屈折率2.30を示すTiO2、中間屈折率層21、23、25及び27の成膜材料としてd線に対して屈折率1.54を示すAl2O3+SiO2、低屈折率層29の成膜材料としてd線に対して屈折率1.39を示すMgF2を使用し、所定の屈折率を有する各基材10に対する最適な各層21〜29の光学膜厚の設計値をシミュレーションにより求めた。λ0は設計波長(550 nm)である。各実施例4-1〜4-13の反射防止膜20に垂直に光を入射させたときの分光反射率をシミュレーションにより求めた。得られた計算結果をそれぞれ図41〜53のグラフ(B) に示す。このとき、基材10及び各層21〜29の屈折率分散を考慮し、基材10の反射防止膜20が形成されていない面での反射はないものとした。
Examples 4-1 to 4-13
As shown in Table (A) of FIGS. 41 to 53, TiO 2 having a refractive index of 2.30 with respect to the d-line as a film forming material of the high refractive index layers 22, 24, 26 and 28, the intermediate refractive index layers 21, 23 25 and 27, Al 2 O 3 + SiO 2 showing a refractive index of 1.54 with respect to the d line, and MgF 2 showing a refractive index of 1.39 with respect to the d line as a film forming material of the low refractive index layer 29. The optimal design value of the optical film thickness of each of the layers 21 to 29 for each base material 10 having a predetermined refractive index was obtained by simulation. λ 0 is the design wavelength (550 nm). Spectral reflectivity when light was vertically incident on the antireflection film 20 of each of Examples 4-1 to 4-13 was obtained by simulation. The obtained calculation results are shown in graphs (B) of FIGS. At this time, in consideration of the refractive index dispersion of the substrate 10 and each of the layers 21 to 29, it was assumed that there was no reflection on the surface of the substrate 10 on which the antireflection film 20 was not formed.
図2〜図53のグラフ(B) から分かるように、波長390〜720 nmの範囲(波長帯域幅は約330 nm)において、最大反射率が0.2%以下に抑えられた反射防止膜を得られた。このことから本発明の反射防止膜は、少ない積層数でありながら、より広い波長帯に亘って反射率を十分に低減することができ、もってフレアやゴーストといった光学特性を著しく劣化させる弊害の発生を抑制するとともに、より優れたカラーバランスを効果的に得ることができることが分かった。 As can be seen from the graph (B) in FIGS. 2 to 53, an antireflection film having a maximum reflectance of 0.2% or less can be obtained in the wavelength range of 390 to 720 nm (wavelength bandwidth is about 330 nm). It was. Therefore, the antireflection film of the present invention can sufficiently reduce the reflectance over a wider wavelength band while having a small number of laminated layers, thereby causing adverse effects such as flare and ghost. It has been found that a more excellent color balance can be effectively obtained while suppressing the above.
比較例1
図54の表(A) に示すように、高屈折率層22、24、26及び28の成膜材料として波長550 nmの光に対して屈折率2.11を示すTiO2、中間屈折率層21、23、25及び27の成膜材料として波長550 nmの光に対して屈折率1.62を示すAl2O3、低屈折率層29の成膜材料として波長550 nmの光に対して屈折率1.38を示すMgF2を使用し、所定の屈折率を有する各基材10に対する最適な各層21〜29の光学膜厚の設計値をシミュレーションにより求めた。比較例1の反射防止膜20に垂直に光を入射させたときの分光反射率をシミュレーションにより求めた。得られた計算結果を図54のグラフ(B) に示す。このとき、基材10及び各層21〜29の屈折率分散を考慮し、基材10の反射防止膜20が形成されていない面での反射はないものとした。
Comparative Example 1
As shown in Table (A) of FIG. 54, TiO 2 showing a refractive index of 2.11 with respect to light having a wavelength of 550 nm as a film forming material of the high refractive index layers 22, 24, 26 and 28, an intermediate refractive index layer 21, Al 2 O 3 showing a refractive index of 1.62 for light having a wavelength of 550 nm as a film forming material for 23, 25 and 27, and a refractive index of 1.38 for light having a wavelength of 550 nm as a film forming material for the low refractive index layer 29 The optimum design value of the optical film thickness of each of the layers 21 to 29 for each base material 10 having a predetermined refractive index was obtained by simulation using MgF 2 shown. Spectral reflectance when light was incident perpendicularly to the antireflection film 20 of Comparative Example 1 was determined by simulation. The obtained calculation results are shown in graph (B) in FIG. At this time, in consideration of the refractive index dispersion of the substrate 10 and each of the layers 21 to 29, it was assumed that there was no reflection on the surface of the substrate 10 on which the antireflection film 20 was not formed.
図54のグラフ(B) から分かるように、最大反射率が0.2%以下の波長帯域はおおよそ波長390〜670 nmの範囲(波長帯域幅は約280 nm)と狭かった。 As can be seen from the graph (B) in FIG. 54, the wavelength band having a maximum reflectance of 0.2% or less was narrow in the range of about 390 to 670 nm (the wavelength band was about 280 nm).
10・・・基材
20・・・反射防止膜
10 ... Base material 20 ... Antireflection film
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