JP2014049624A - Method of manufacturing organic thin film solar cell element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing an organic thin film solar cell element by a roll-to-roll system which is less likely to scratch a lamination plane.SOLUTION: A method of manufacturing an organic thin film solar cell element by a roll-to-roll system includes a conveyance step for conveying a laminate, having layers formed on a substrate, by using a nip roll mechanism. In the conveyance step, the laminate is conveyed so that the lamination plane abuts against a roll having a surface hardness T1, when the surface hardnesses of two rolls used in the nip roll mechanism are T1, T2(T1≥T2).

Description

  The present invention relates to a method for producing an organic thin film solar cell element.

  As a method for efficiently coating a film, roll-to-roll conveyance is used. In addition, an organic thin film solar cell using a flexible substrate is also proposed to be manufactured by roll-to-roll (for example, Patent Document 1).

JP2012-124264A

When the present inventors tried to manufacture an organic thin film solar cell element by roll-to-roll, it was found that the surface of the solar cell had scratches considered to be caused by the manufacturing process.
This invention solves the above problems, and makes it a subject to provide the manufacturing method of the organic thin-film solar cell element by a roll-to-roll system in which a lamination | stacking surface is hard to be damaged in a lamination process.

  As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that the cause of scratches is a nip roll used in roll-to-roll conveyance. In roll-to-roll conveyance, a nip roll mechanism is often used to convey a film with tension. Usually, the nip roll mechanism includes a drive roll such as a metal roll and a nip roll such as a rubber roll. The drive roll is rotationally driven by a drive device such as a motor, and the nip roll can be moved forward and backward so that it can contact and separate from the drive roll.

  When the nip roll mechanism is adopted, the arrangement of the drive rolls and the nip rolls is determined for the sake of layout so that the respective drive mechanisms can be easily arranged, and it has not been considered which roll contacts the laminated surface. However, when a thin film is laminated like an organic thin film solar cell, when the film on which the thin film is laminated passes through the nip roll, if the rubber roll is on the lamination surface side, the laminated film contacts and separates from the rubber. In the process, it was thought that the laminated surface was damaged due to expansion and contraction due to elastic deformation of rubber.

As a result of further studies, the inventors of the present invention are a method for producing an organic thin-film solar cell by a roll-to-roll method, in which a laminate having a layer formed on a substrate is conveyed using a nip roll mechanism. Process, and when the surface hardness of the two rolls used in the nip roll mechanism is T1 and T2 (T1 ≧ T2), the laminated surface of the laminate is in contact with the roll having the surface hardness T1. It discovered that the said subject could be solved by conveying.
That is, the present invention is as follows.

The present invention is a method for manufacturing an organic thin-film solar cell element by a roll-to-roll method, and includes a transporting step of transporting a laminate in which a layer is formed on a substrate using a nip roll mechanism. In the process, when the surface hardness of the two rolls used in the nip roll mechanism is T1, T2 (T1 ≧ T2), the laminate is transported so that the laminated surface is in contact with the roll having the surface hardness T1. This is a method for producing an organic thin film solar cell element.

The laminate in which the layer is formed on the substrate is preferably a laminate of the substrate, the lower electrode, and the active layer and / or the buffer layer.
The active layer and / or buffer layer is preferably formed by coating, and the total film thickness of the active layer and / or buffer layer is preferably 10 nm or more.

  The roll having a surface hardness T1 is preferably a metal roll, and the roll having a surface hardness T2 is preferably a rubber roll.

  ADVANTAGE OF THE INVENTION By this invention, the manufacturing method of the organic thin-film solar cell element by the roll-to-roll which is hard to be damaged on a laminated surface can be provided.

It is a conceptual diagram which shows the one aspect | mode of an organic thin-film solar cell element. It is a schematic diagram showing the layer structure of the solar cell module using an organic thin film solar cell element. It is a schematic diagram showing the layer structure of the solar cell module using an organic thin film solar cell element.

Hereinafter, the present invention will be described in detail while showing specific embodiments, but it is needless to say that the present invention is not limited to the illustrated specific embodiments.
The manufacturing method of the organic thin film solar cell element of the present invention is performed by a roll-to-roll method. The roll-to-roll method is a method in which the substrate wound in a roll shape is fed out and intermittently or continuously conveyed, and each process is performed until the substrate is wound up by a winding roll. , Long substrates of the order of km can be batch-processed, which is preferable because it can be easily mass-produced.

<1. Transport process>
The present invention includes a transporting step of transporting a laminate having a layer formed on a substrate using a nip roll mechanism. A laminate in which a layer is formed on a substrate is a laminate in which any one or more of a lower electrode, an upper electrode, an active layer, and a buffer layer are laminated on a substrate in the process of manufacturing an organic thin film solar cell element. Point to.

In each step of laminating the lower electrode, the upper electrode, the active layer and / or the buffer layer on the substrate, and before and after that step, when the laminate formed with the layer on the substrate is conveyed by a roll-to-roll method, A conveyance process using the nip roll mechanism of the present invention can be adopted at an arbitrary position. That is, any of the steps are carried out while the roll is unrolled and conveyed by the roll-to-roll method, and the conveying step of the present invention can be adopted as long as it is taken up. For example, the nip roll mechanism can be installed at any position between the time when the roll in which the substrate and the lower electrode are stacked is fed and then transferred to the step of forming the active layer and transporting the next layer. Can be used to transport.
In the present invention, the solar cell may be manufactured in a continuous manner in which all necessary layers are laminated after the substrate roll is unrolled and the conveyance is started until it is wound. You may manufacture by the batch system which rolls up the laminated | stacked roll-out for every lamination | stacking of each layer, and stores in a roll state until the next layer is formed.

The layer structure of the laminated body in which the conveyance process of the present invention is adopted is not particularly limited. In the manufacturing process of the solar cell, an arbitrary period from when the roll of the laminated body in which any one or more of the lower electrode, the upper electrode, the active layer, and the buffer layer are laminated on the substrate to when the roll is wound The conveyance process of this invention can be employ | adopted with respect to the laminated body of a state.
In particular, when a substrate, lower electrode and buffer layer laminate, a substrate, lower electrode and active layer laminate, or a substrate, lower electrode, active layer and buffer layer laminate is conveyed by roll-to-roll. Furthermore, it is preferable to carry out the transporting process of the present invention from the viewpoint of preventing the active layer from being damaged.

<1-2. Nip roll mechanism>
In the present invention, when the surface hardness of the two rolls used in the nip roll mechanism is set to T1 and T2 (T1 ≧ T2) in the transporting process, the stacking surface of the stacked body is transported so as to come into contact with the roll having the surface hardness T1. It is characterized by that. The laminate surface of the laminate means a surface on the side where each layer is laminated on the substrate, that is, a surface opposite to the substrate side in the laminate. The contact refers to a state where the roll and the laminated body are in contact with each other.
The nip roll mechanism includes a drive roll that is rotationally driven by a driving device such as a motor, and a nip roll (pressing roll) that can be moved forward and backward by an air cylinder or the like so as to be in contact with or separated from the drive roll. The two rolls used in the nip roll mechanism refer to the drive roll and the nip roll (pressing roll). The nip roll mechanism can also be used as a laminate roll by using a heating means.
The surface hardness in the present invention refers to the durometer hardness of the roll surface. The durometer hardness is JIS K 6253-3 “vulcanized rubber and thermoplastic rubber-how to determine hardness-
It is the value measured using type A in "Part 3: Durometer hardness".

  A metal, resin, or the like is usually used for the drive roll, and among these, metals such as SS, SUS, and aluminum, carbon fiber reinforced resin, and the like are preferable. The roll surface may be subjected to HCr plating or the like. The surface hardness of the drive roll is usually durometer hardness of 20 or more, preferably 30 or more. Moreover, the upper limit is 100 or less normally, Preferably it is 90 or less. The durometer hardness is a value obtained from the push-in depth of the push needle when the specified push needle is pushed into the roll surface. In the present invention, the roll in which the push needle such as metal cannot be pushed, that is, the durometer hardness. The surface hardness of a roll that cannot be measured is 100.

For the nip roll (pressing roll), rubber, resin, metal, etc. are usually used. The surface hardness of the roll is usually durometer hardness of 20 or more, preferably 30 or more. Moreover, the upper limit is 100 or less normally, Preferably it is 90 or less.
Among them, it is preferable to use various rubbers described in Table 1 of JIS K 6397 “Symbols of raw rubber and latex”. As the hardness of the rubber, the durometer hardness is usually 20 or more, preferably 30 or more, more preferably 40 or more, still more preferably 50 or more, preferably 90 or less, more preferably 85 or less, still more preferably 80 or less. It is.

The nip roll is used to convey the substrate with an appropriate tension, and the tension is usually 10 N / m or more, preferably 20 N / m or more, more preferably 40 N / m or more as the tensile stress with respect to the cross-sectional area of the substrate. It is usually 4000 N / m or less, preferably 3000 N / m or less, more preferably 2000 N / m or less.
When the substrate is a resin film, it is usually 10 N / m or more, preferably 20 N / m or more, more preferably 40 N / m or more, usually 2000 N / m or less, preferably 1500 N / m or less, more preferably 1000 N. / M or less. When the substrate is a metal foil, it is usually 40 N / m or more, preferably 100 N / m or more, more preferably 200 N / m or more, usually 4000 N / m or less, preferably 3000 N / m or less, more preferably 2000 N / m. m or less. The maximum value of the tension is determined by the pressing force of the nip roll, the friction coefficient, and the contact area, and is given by the rotation of the drive roll.

The hardness of the rubber used for the nip roll is appropriately selected depending on the layer formed on the substrate and the tension required for conveyance. That is, when the layer formed on the substrate is not easily damaged, it is possible to press a nip roll using a hard rubber and apply a strong tension with a narrow contact area. It is possible to apply tension by pressing a low rubber and widening the contact area using deformation of the rubber.
It is also possible to change the tension before and after the nip roll (so-called tension cut). For example, a nip roll may be used to transport the coating section at a high tension and to transport the coating section at a low tension.

  In the present invention, when the surface hardness of the two rolls is set to T1 and T2 (T1 ≧ T2), the substrate is conveyed so that the laminated surface of the substrate comes into contact with the roll having the surface hardness T1. By transporting the two rolls so that the roll having the higher surface hardness is in contact with the laminated surface of the substrate, scratches on the laminated surface due to expansion and contraction due to elastic deformation of the rolls can be prevented. The roll having the surface hardness T1 is determined by the relationship of the surface hardness, and may be a driving roll or a nip roll (pressing roll). The roll having a surface hardness T1 is preferably a metal roll. Moreover, it is preferable that the roll of surface hardness T2 is a rubber roll.

In the nip roll mechanism, the deformation rate of the roll having the surface hardness T1 when in contact with the roll having the surface hardness T2 is usually 1% or less, preferably 0.1% or less. The lower limit is not particularly limited, but is usually 0% or more. The deformation rate is the ratio of the distance from the center point of the roll with surface hardness T1 that is in contact with the roll with surface hardness T2 to the radius of the roll with surface hardness T1 before deformation to the contact point of the two rolls. It can be calculated. If the said deformation rate is the said range, since the damage | wound of a laminated surface can be suppressed, it is preferable.
Furthermore, it is preferable that the maximum deformation amount in the radial direction of the roll having the surface hardness T1 when in contact with the roll having the surface hardness T2 is 0.01 mm or less.

Further, the deformation rate of the roll having the surface hardness T2 in contact with the roll having the surface hardness T1 is usually 20% or less, preferably 10% or less, more preferably 5% or less, and further preferably 3% or less. . Although a minimum in particular is not restrict | limited, Usually, it is 0% or more, Preferably it is 0.1% or more, More preferably, it is 1% or more.
Furthermore, the maximum amount of deformation in the radial direction of the roll having the surface hardness T2 in contact with the roll having the surface hardness T1 is usually 10 mm or less, preferably 5 mm or less, more preferably 1 mm or less, and usually 0.01 mm or more. is there.

  There is no restriction | limiting in particular in the number of nip roll mechanisms in a conveyance process, A several nip roll mechanism can be used.

<2. Organic thin film solar cell element>
The organic thin-film solar cell element usually has at least a pair of electrodes, an active layer existing between the electrodes, and an electron extraction layer existing between the active layer and one of the electrodes. FIG. 1 shows a general layer structure of an organic thin film solar cell element. An organic thin film solar cell element 107 shown in FIG. 1 includes a solar cell element substrate 106, a lower electrode 101 as a cathode, an electron extraction layer 102, an active layer 103 (a layer containing a p-type semiconductor compound and an n-type semiconductor material), It has a layer structure in which a hole extraction layer 104 and an upper electrode 105 as an anode are sequentially formed. In FIG. 1, the lower electrode 101 exists above the upper electrode 105. In this specification, the upper electrode and the lower electrode refer to the upper electrode and the lower electrode when the solar cell element substrate 106 is the bottom. The electrode laminated on the solar cell element substrate is referred to as a lower electrode.

<2-1. Substrate>
Since the organic thin film solar cell element according to the present invention is manufactured by roll-to-roll, a flexible substrate is used as the substrate. The material of the substrate is not particularly limited as long as the effects of the present invention are not significantly impaired. Preferable examples of the material for the substrate include polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polyimide, nylon, polystyrene, polyvinyl alcohol, ethylene vinyl alcohol copolymer, fluororesin film, polyolefin such as vinyl chloride or polyethylene; cellulose , Organic materials such as polyvinylidene chloride, aramid, polyphenylene sulfide, polyurethane, polycarbonate, polyarylate, polynorbornene or epoxy resin; paper materials such as paper or synthetic paper; impart insulation to metals such as stainless steel, titanium or aluminum For example, a composite material such as a coated or laminated surface may be used. Among these, a resin substrate using an organic material is preferable.

  Moreover, although there is no restriction | limiting in the thickness of a board | substrate, it is 5 micrometers or more normally, Preferably it is 10 micrometers or more, More preferably, it is 20 micrometers or more, on the other hand, 1 mm or less normally, Preferably it is 500 micrometers or less, More preferably, it is 200 micrometers or less. It is preferable that the thickness of the substrate is 5 μm or more because the possibility that the strength of the organic thin film solar cell element is insufficient is reduced. It is preferable that the thickness of the substrate is 1 mm or less because the cost is suppressed and the weight does not increase.

<2-2. Lower electrode, upper electrode>
In the manufacture of the organic thin film solar cell element, a step of laminating a pair of electrodes (a lower electrode and an upper electrode) is included. The pair of electrodes usually means an anode and a cathode described below, but the lower electrode may be an anode, the upper electrode may be a cathode, the lower electrode is a cathode, and the upper electrode is an anode. May be.

  The pair of electrodes has a function of collecting holes and electrons generated by light absorption. Accordingly, the pair of electrodes includes an electrode suitable for collecting holes (hereinafter sometimes referred to as an anode) and an electrode suitable for collecting electrons (hereinafter sometimes referred to as a cathode). It is preferable to use it. Any one of the pair of electrodes may be translucent, and both may be translucent. Translucency means that sunlight passes through 40% or more. Further, the solar light transmittance of the transparent electrode is preferably 70% or more in order to allow light to reach the active layer through the transparent electrode. The light transmittance can be measured with a normal spectrophotometer.

The anode is an electrode generally made of a conductive material having a work function higher than that of the cathode and having a function of smoothly extracting holes generated in the active layer.
Examples of anode materials include conductive metal oxides such as nickel oxide, tin oxide, indium oxide, indium tin oxide (ITO), indium-zirconium oxide (IZO), titanium oxide, indium oxide, and zinc oxide; Examples thereof include metals such as gold, platinum, silver, chromium and cobalt, or alloys thereof. These substances are preferable because they have a high work function, and further, a conductive polymer material represented by PEDOT: PSS in which a polythiophene derivative is doped with polystyrene sulfonic acid can be stacked. When laminating such a conductive polymer, the work function of this conductive polymer material is high, so even if it is not a material with a high work function as described above, it is suitable for cathodes such as Al and Mg. Metals can also be widely used. PEDOT: PSS in which a polythiophene derivative is doped with polystyrene sulfonic acid, or a conductive polymer material in which polypyrrole, polyaniline, or the like is doped with iodine or the like can also be used as an anode material. When the anode is a transparent electrode, it is preferable to use a light-transmitting conductive metal oxide such as ITO, zinc oxide or tin oxide, and ITO is particularly preferable.

The film thickness of the anode is not particularly limited, but is usually 10 nm or more, preferably 20 nm or more, and more preferably 50 nm or more. On the other hand, it is usually 10 μm or less, preferably 1 μm or less, more preferably 500 nm or less. When the thickness of the anode is 10 nm or more, the sheet resistance is suppressed, and when the thickness of the anode is 10 μm or less, light can be efficiently converted into electricity without decreasing the light transmittance. When the anode is a transparent electrode, it is necessary to select a film thickness that can achieve both light transmittance and sheet resistance.
The sheet resistance of the anode is not particularly limited, but is usually 1Ω / □ or more, on the other hand, 1000Ω / □ or less, preferably 500Ω / □ or less, more preferably 100Ω / □ or less.

  Examples of the anode forming method include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.

The cathode is generally an electrode made of a conductive material having a low work function and having a function of smoothly extracting electrons generated in the active layer. The cathode is adjacent to the electron extraction layer.
Examples of cathode materials include platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, cesium, calcium, and magnesium, and alloys thereof; lithium fluoride And inorganic salts such as cesium fluoride and metal oxides such as nickel oxide, aluminum oxide, lithium oxide, and cesium oxide. These materials are preferable because they are materials having a low work function. Similarly to the anode, a material having a high work function can be used for the cathode by using an n-type semiconductor such as titania having conductivity as the electron extraction layer. From the viewpoint of electrode protection, the cathode material is preferably a metal such as platinum, gold, silver, copper, iron, tin, aluminum, calcium or indium, or an alloy using these metals such as indium tin oxide.

The film thickness of the cathode is not particularly limited, but is usually 10 nm or more, preferably 20 nm or more, more preferably 50 nm or more. On the other hand, it is usually 10 μm or less, preferably 1 μm or less, more preferably 500 nm or less. When the film thickness of the cathode is 10 nm or more, the sheet resistance is suppressed, and when the film thickness of the cathode is 10 μm or less, light can be efficiently converted into electricity without decreasing the light transmittance. When the cathode is a transparent electrode, it is necessary to select a film thickness that achieves both light transmittance and sheet resistance.
The sheet resistance of the cathode is not particularly limited, but is usually 1000Ω / □ or less, preferably 500Ω / □ or less, and more preferably 100Ω / □ or less. Although there is no restriction on the lower limit, it is usually 1Ω / □ or more.

  As a method for forming the cathode, there are a vacuum film formation method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.

  Furthermore, the anode and the cathode may have a laminated structure of two or more layers. In addition, characteristics (electric characteristics, wetting characteristics, etc.) may be improved by performing surface treatment on the anode and the cathode.

After laminating the anode and cathode, the organic thin-film solar cell element is heated in a temperature range of usually 50 ° C. or higher, preferably 80 ° C. or higher, usually 300 ° C. or lower, preferably 280 ° C. or lower, more preferably 250 ° C. or lower. It is preferable to do this (this step may be referred to as an annealing treatment step). By performing the annealing treatment step at a temperature of 50 ° C. or higher, an effect of improving the adhesion between the layers of the organic thin film solar cell element, for example, the adhesion between the electron extraction layer and the cathode and / or the electron extraction layer and the active layer is obtained. Therefore, it is preferable. By improving the adhesion between the layers, the thermal stability and durability of the organic thin film solar cell element can be improved. It is preferable to set the temperature of the annealing treatment step to 300 ° C. or lower because the possibility that the organic compound in the active layer is thermally decomposed is reduced. In the annealing treatment step, stepwise heating may be performed within the above temperature range.

The heating time is usually 1 minute or longer, preferably 3 minutes or longer, and usually 3 hours or shorter, preferably 1 hour or shorter. The annealing treatment step is preferably terminated when the open-circuit voltage, the short-circuit current, and the fill factor, which are parameters of the solar cell performance, reach a constant value. Further, the annealing treatment step is preferably performed under normal pressure and in an inert gas atmosphere.
The heating method is not particularly limited, but preferred is a method using heating with hot air, irradiation with far infrared rays and / or near infrared rays, and an organic thin film solar cell element may be placed on a heat source such as a hot plate, or an oven. You may put an organic thin film solar cell element in heating atmospheres, such as. Heating may be performed batchwise or continuously, but is preferably performed continuously.

<2-3. Buffer layer (electron extraction layer, hole extraction layer)>
The organic thin film solar cell element according to the present invention has at least a pair of electrodes, an active layer present between the electrodes, and an electron extraction layer present between the active layer and one of the electrodes. Usually, an electron extraction layer is provided between the cathode and the active layer. The organic thin film solar cell element has a hole extraction layer between the active layer and the anode. The electron extraction layer and / or the hole extraction layer may be referred to as a buffer layer. The electron extraction layer and the hole extraction layer are not essential.

  The electron extraction layer and the hole extraction layer are preferably disposed so as to sandwich the active layer between the pair of electrodes. That is, when the organic thin-film solar cell element includes both an electron extraction layer and a hole extraction layer, the upper electrode, the hole extraction layer, the active layer, the electron extraction layer, and the lower electrode can be arranged in this order. When the organic thin film solar cell element includes an electron extraction layer and does not include a hole extraction layer, the upper electrode, the active layer, the electron extraction layer, and the lower electrode can be disposed in this order. The stacking order of the electron extraction layer and the hole extraction layer may be reversed, or at least one of the electron extraction layer and the hole extraction layer may be composed of a plurality of different films.

<2-3-1. Electron extraction layer>
The material of the electron extraction layer is not particularly limited as long as it is a material that improves the efficiency of extracting electrons from the active layer to the cathode, and examples thereof include inorganic compounds and organic compounds.

  Examples of the material of the inorganic compound include salts of alkali metals such as Li, Na, K or Cs; n-type semiconductor oxides such as titanium oxide (TiOx) and zinc oxide (ZnO). Among them, the alkali metal salt is preferably a fluoride salt such as LiF, NaF, KF or CsF, and the n-type semiconductor oxide is preferably zinc oxide (ZnO). The operation mechanism of such a material is unknown, but it is conceivable to reduce the work function of the cathode when combined with a cathode made of Al or the like and increase the voltage applied to the inside of the solar cell element.

Examples of organic compound materials include, for example, phosphine compounds having a double bond between a phosphorus atom and a group 16 element such as triarylphosphine oxide compounds; bathocuproin (BCP) or bathophenanthrene (Bphen), A phenanthrene compound which may have a substituent and may be substituted at the 1-position and the 10-position with a heteroatom; a boron compound such as triarylboron; and (8-hydroxyquinolinato) aluminum (Alq3) Organometallic oxide; Compound having 1 or 2 ring structure which may have a substituent such as oxadiazole compound or benzimidazole compound; Naphthalenetetracarboxylic anhydride (NTCDA) or perylenetetracarboxylic acid Of dicarboxylic anhydrides, such as anhydrides (PTCDA) Aromatic compounds having Unachijimigo dicarboxylic acid structure.

  The LUMO energy level of the material of the electron extraction layer is not particularly limited, but is usually −4.0 eV or more, preferably −3.9 eV or more. On the other hand, it is usually −1.9 eV or less, preferably −2.0 eV or less. It is preferable that the LUMO energy level of the material for the electron extraction layer is −1.9 eV or less because charge transfer can be promoted. It is preferable that the LUMO energy level of the material for the electron extraction layer is −4.0 eV or more in terms of preventing reverse electron transfer to the n-type semiconductor material.

  The HOMO energy level of the material for the electron extraction layer is not particularly limited, but is usually −9.0 eV or more, preferably −8.0 eV or more. On the other hand, it is usually −5.0 eV or less, preferably −5.5 eV or less. The HOMO energy level of the material for the electron extraction layer is preferably −5.0 eV or less from the viewpoint of preventing movement of holes.

  As a method for calculating the LUMO energy level and the HOMO energy level of the material of the electron extraction layer, a cyclic voltammogram measurement method may be mentioned. For example, it can implement with reference to the method as described in well-known literature (International Publication 2011/016430).

  When the material of the electron extraction layer is an organic compound, the glass transition temperature (hereinafter sometimes referred to as Tg) of this compound as measured by the DSC method is not particularly limited, but is not observed, or It is preferable that it is 55 degreeC or more. That the glass transition temperature is not observed by the DSC method means that there is no glass transition temperature. Specifically, the determination is made based on the presence or absence of a glass transition temperature of 400 ° C. or lower. A material in which the glass transition temperature by the DSC method is not observed is preferable in that it has high thermal stability.

  Among the compounds having a glass transition temperature of 55 ° C. or higher as measured by the DSC method, the glass transition temperature is preferably 65 ° C. or higher, more preferably 80 ° C. or higher, more preferably 110 ° C. or higher, particularly preferably. Compounds that are 120 ° C. or higher are desirable. On the other hand, the upper limit of the glass transition temperature is not particularly limited, but is usually 400 ° C. or lower, preferably 350 ° C. or lower, more preferably 300 ° C. or lower. Moreover, it is preferable that the material of an electron taking-out layer is a thing by which the glass transition temperature by DSC method is not observed below 30 degreeC or more and less than 55 degree | times.

  The glass transition temperature in the present specification is defined as a point at which specific heat changes in an amorphous solid, which is a temperature at which local molecular motion is started by thermal energy. When the temperature rises further than Tg, the solid structure changes and crystallization occurs (the temperature at this time is defined as the crystallization temperature (Tc)). When the temperature rises further, it generally melts at the melting point (Tm) and changes to a liquid state. However, these phase transitions may not be observed due to molecular decomposition or sublimation at high temperatures.

  The DSC method is a thermophysical property measurement method (differential scanning calorimetry method) defined in JIS K-0129 “General Rules for Thermal Analysis”. In order to determine the glass transition temperature more clearly, it is desirable to measure after rapidly cooling a sample once heated to a temperature higher than the glass transition temperature. For example, the measurement can be carried out by a method described in a known document (International Publication No. 2011/016430).

When the glass transition temperature of the compound used for the electron extraction layer is 55 ° C. or higher, the structure of this compound is difficult to change against external stress such as applied electric field, flowing current, stress due to bending or temperature change. It is preferable in terms of durability. Furthermore, since there is a tendency that the crystallization of the thin film of the compound does not proceed easily, the stability of the electron extraction layer is improved by making it difficult for the compound to change between the amorphous state and the crystalline state in the operating temperature range. Therefore, it is preferable in terms of durability. This effect becomes more prominent as the glass transition temperature of the material is higher.

  The thickness of the electron extraction layer is not particularly limited, but is usually 0.01 nm or more, preferably 0.1 nm or more, more preferably 0.5 nm or more. On the other hand, it is usually 400 nm or less, preferably 200 nm or less. When the film thickness of the electron extraction layer 102 is equal to or more than the above lower limit, even if it is damaged during conveyance by the nip roll mechanism, the influence can be suppressed to a small level, and the function as a buffer material can be achieved. When the film thickness of the electron extraction layer is not more than the above upper limit, electrons can be easily extracted and the photoelectric conversion efficiency can be improved.

  There is no restriction | limiting in the formation method of an electronic taking-out layer. For example, when a material having sublimation property is used, it can be formed by a vacuum deposition method or the like. For example, when using a material soluble in a solvent, reverse roll coating method, gravure coating method, kiss coating method, slit die coating method, roll brush method, spray coating method, air knife coating method, wire bar coating method, pipe doctor It can be formed by a wet coating method such as a method, an impregnation / coating method, a curtain coating method, flexographic printing, or an ink jet. The electron extraction layer is preferably formed by a coating method.

When the electron extraction layer is formed by a coating method, a surfactant may be further contained in the coating solution. By using the surfactant, the occurrence of dents due to adhesion of fine bubbles or foreign matters and / or uneven coating in the drying process is suppressed. Known surfactants (cationic surfactants, anionic surfactants, nonionic surfactants) can be used as the surfactant. Of these, silicon-based surfactants, acetylenic diol-based surfactants, and fluorine-based surfactants are preferable. In addition, as surfactant, only 1 type may be used and 2 or more types may be used together by arbitrary combinations and a ratio.
Specifically, for example, when an alkali metal salt is used as a material for the electron extraction layer, the electron extraction layer can be formed by using a vacuum film formation method such as vacuum deposition or sputtering. Especially, it is desirable to form an electron taking-out layer by vacuum vapor deposition by resistance heating. By using vacuum deposition, damage to other layers such as an active layer can be reduced.

  On the other hand, for metal oxides of n-type semiconductors, for example, when zinc oxide ZnO is used as the material for the electron extraction layer, a vacuum film formation method such as sputtering can be used. It is desirable to form the extraction layer. For example, Sol-Gel Science, C.I. J. et al. Brinker, G.M. W. According to the sol-gel method described by Scherer, Academic Press (1990), an electron extraction layer composed of zinc oxide can be formed. In this case, the film thickness is usually 0.1 nm or more, preferably 2 nm or more, more preferably 5 nm or more, and usually 1 μm or less, preferably 100 nm or less, more preferably 50 nm or less. If the electron extraction layer is too thin, the effect of improving the electron extraction efficiency is not sufficient, and if it is too thick, the electron extraction layer tends to deteriorate the characteristics of the device by acting as a series resistance component.

<2-3-2. Hole extraction layer>
There is no particular limitation on the material of the hole extraction layer, and any material can be used as long as it can improve the efficiency of extracting holes from the active layer to the anode. Specifically, polythiophene, polypyrrole, polyacetylene, triphenylenediamine, polyaniline, or the like, a conductive polymer doped with sulfonic acid and / or iodine, a polythiophene derivative having a sulfonyl group as a substituent, or a conductive organic such as arylamine Examples thereof include compounds, copper oxide, nickel oxide, manganese oxide, molybdenum oxide, vanadium oxide, metal oxide such as tungsten oxide, Nafion, and a p-type semiconductor described later. Among them, a conductive polymer doped with sulfonic acid is preferable, and (3,4-ethylenedioxythiophene) poly (styrenesulfonic acid) (PEDOT: PSS) in which a polythiophene derivative is doped with polystyrene sulfonic acid is more preferable. It is. A thin film of metal such as gold, indium, silver or palladium can also be used. A thin film of metal or the like may be formed alone or in combination with the above organic material.

  The thickness of the hole extraction layer is not particularly limited, but is usually 0.2 nm or more. On the other hand, it is usually 400 nm or less, preferably 200 nm or less. If the film thickness of the hole extraction layer is equal to or greater than the above lower limit, even if the film is damaged by the nip roll mechanism, the influence can be suppressed to a small level, and the function as a buffer material can be achieved. When the film thickness of the hole extraction layer is not more than the above upper limit, holes can be easily extracted and the photoelectric conversion efficiency can be improved.

  There is no restriction | limiting in the formation method of a positive hole taking-out layer. For example, when a material having sublimation property is used, it can be formed by a vacuum deposition method or the like. For example, when using a material soluble in a solvent, reverse roll coating method, gravure coating method, kiss coating method, slit die coating method, roll brush method, spray coating method, air knife coating method, wire bar coating method, pipe doctor It can be formed by a wet coating method such as a method, an impregnation / coating method, a curtain coating method, flexographic printing, or an ink jet. The hole extraction layer is preferably formed by coating. When a semiconductor material is used for the hole extraction layer, the precursor may be converted into a semiconductor compound after forming the layer using the precursor, similarly to the low-molecular organic semiconductor compound of the organic active layer described later.

Especially, when using PEDOT: PSS as a material of a hole taking-out layer, it is preferable to form a hole taking-out layer by the method of apply | coating a dispersion liquid. PEDOT: The dispersion of PSS, and CLEVIOS ^TM series of Heraeus, Inc., include Agfa Corp. of ORGACON ^TM series and the like.

  When the hole extraction layer is formed by a coating method, a surfactant may be further contained in the coating solution. By using the surfactant, the occurrence of dents due to adhesion of fine bubbles or foreign matters and / or uneven coating in the drying process is suppressed. Known surfactants (cationic surfactants, anionic surfactants, nonionic surfactants) can be used as the surfactant. Of these, silicon-based surfactants, acetylenic diol-based surfactants, and fluorine-based surfactants are preferable. In addition, as surfactant, only 1 type may be used and 2 or more types may be used together by arbitrary combinations and a ratio.

<2-4. Active layer>
The active layer refers to a layer in which photoelectric conversion is performed, and usually includes a p-type semiconductor compound and an n-type semiconductor compound. The p-type semiconductor compound is a compound that works as a p-type semiconductor material, and the n-type semiconductor compound is a compound that works as an n-type semiconductor material. When the organic thin film solar cell element receives light, the light is absorbed by the active layer, electricity is generated at the interface between the p-type semiconductor compound and the n-type semiconductor compound, and the generated electricity is extracted from the electrode.

  As the material for the active layer, either an inorganic compound or an organic compound may be used, but a layer that can be formed by a simple coating process is preferable. More preferably, the active layer is an organic active layer made of an organic compound. In the following description, it is assumed that the active layer is an organic active layer.

As the layer structure of the active layer, a thin film stacked type in which a p-type semiconductor compound layer and an n-type semiconductor compound layer are stacked, a bulk heterojunction type having a layer in which a p-type semiconductor compound and an n-type semiconductor compound are mixed, and p-type Examples thereof include a semiconductor compound layer, a layer (i layer) in which a p-type semiconductor compound and an n-type semiconductor compound are mixed, and an n-type semiconductor compound layer laminated. Among these, a bulk heterojunction type having a layer in which a p-type semiconductor compound and an n-type semiconductor compound are mixed is preferable.

  The thickness of the active layer is not particularly limited, but is usually 10 nm or more, preferably 50 nm or more. On the other hand, the upper limit is usually 1000 nm or less, preferably 500 nm or less, more preferably 300 nm or less. If the film thickness of the active layer is equal to or more than the above lower limit, the influence can be suppressed to a small extent even if the active layer is scratched during conveyance by the nip roll mechanism. Further, it is preferable because the uniformity of the film is maintained and short circuit is hardly caused. Moreover, it is preferable that the thickness of the active layer is not more than the above upper limit in that the internal resistance is reduced and the diffusion of charges is good without the electrodes being separated too much.

  In the present invention, the total film thickness of either or both of the electron extraction layer and the hole extraction layer and the active layer is usually 10 nm or more, preferably 50 nm or more. On the other hand, the upper limit is usually 1800 nm or less, preferably 900 nm or less, more preferably 700 nm or less. If it is the said range, even if it receives a damage | wound at the time of conveyance by a nip roll mechanism, an influence can be restrained small.

  A method for forming the active layer is not particularly limited, but a coating method is preferable. As the coating method, any method can be used, for example, reverse roll coating method, gravure coating method, kiss coating method, slit die coating method, roll brush method, spray coating method, air knife coating method, wire bar coating method, Examples include the pipe doctor method, impregnation / coating method, curtain coating method, flexographic printing, and inkjet.

  For example, the p-type semiconductor compound layer and the n-type semiconductor compound layer can be produced by applying a coating liquid containing a p-type semiconductor compound or an n-type semiconductor compound. Moreover, the layer in which the p-type semiconductor compound and the n-type semiconductor compound are mixed can be prepared by applying a coating solution containing the p-type semiconductor compound and the n-type semiconductor compound. As will be described later, the semiconductor compound precursor may be converted into a semiconductor compound after the coating liquid containing the semiconductor compound precursor is applied.

<2-4-1. p-type semiconductor compound>
The p-type semiconductor compound included in the active layer is not particularly limited, and examples thereof include a low molecular organic semiconductor compound and a high molecular organic semiconductor compound.

<2-4-1-1. Low molecular organic semiconductor compound>
The molecular weight of the low-molecular organic semiconductor compound is not particularly limited both at the upper limit and the lower limit, but is usually 5000 or less, preferably 2000 or less, and is usually 100 or more, preferably 200 or more.

Further, the low molecular organic semiconductor compound preferably has crystallinity. A p-type semiconductor compound having crystallinity has a strong intermolecular interaction, and holes generated at the interface between the p-type semiconductor compound and the n-type semiconductor compound in the active layer can be efficiently transported to the anode. In the present specification, crystallinity is a property of a compound that takes a three-dimensional periodic arrangement with uniform orientation due to intermolecular interaction or the like. Examples of the crystallinity measuring method include an X-ray diffraction method (XRD) and a field effect mobility measuring method. In particular, in the field effect mobility measurement, the hole mobility is preferably 1.0 × 10 ⁻⁵ cm ² / Vs or more, and more preferably 1.0 × 10 ⁻⁴ cm ² / Vs or more. On the other hand, the hole mobility is usually preferably 1.0 × 10 ⁴ cm ² / Vs or less, more preferably 1.0 × 10 ³ cm ² / Vs or less, and 1.0 × 10 ² cm. More preferably, it is ² / Vs or less.

  The low-molecular organic semiconductor compound is not particularly limited as long as it can function as a p-type semiconductor material. Specifically, condensed aromatic hydrocarbons such as naphthacene, pentacene, or pyrene; α-sexithiophene, etc. Oligothiophenes containing 4 or more thiophene rings; including at least one of thiophene ring, benzene ring, fluorene ring, naphthalene ring, anthracene ring, thiazole ring, thiadiazole ring and benzothiazole ring, and a total of 4 or more linked A phthalocyanine compound and a metal complex thereof, or a porphyrin compound such as tetrabenzoporphyrin and a macrocycle such as a metal complex thereof. Preferably, they are a phthalocyanine compound and its metal complex, or a porphyrin compound and its metal complex.

Examples of the porphyrin compound and its metal complex (Z ¹ in the figure is CH), and the phthalocyanine compound and its metal complex (Z ¹ in the figure is N) include compounds having the following structures.

Here, M represents a metal or two hydrogen atoms, and the metal includes a divalent metal such as Cu, Zn, Pb, Mg, Pd, Ag, Co, or Ni, and an axial ligand 3 Metals having a valence higher than that, for example, TiO, VO, SnCl ₂ , AlCl, InCl, Si, and the like are also included.

R ^{11 to} R ¹⁴ are each independently a hydrogen atom or an alkyl group having 1 to 24 carbon atoms. The alkyl group having 1 to 24 carbon atoms is a saturated or unsaturated chain hydrocarbon group having 1 to 24 carbon atoms or a saturated or unsaturated cyclic hydrocarbon group having 3 to 24 carbon atoms. Among these, a saturated or unsaturated chain hydrocarbon group having 1 to 12 carbon atoms or a saturated or unsaturated cyclic hydrocarbon group having 3 to 12 carbon atoms is preferable.

  Among the phthalocyanine compounds and metal complexes thereof, 29H, 31H-phthalocyanine, copper phthalocyanine complex, zinc phthalocyanine complex, titanium phthalocyanine oxide complex, magnesium phthalocyanine complex, lead phthalocyanine complex or copper 4,4 ′, 4 ″, 4 '' '-Tetraaza-29H, 31H-phthalocyanine complex, more preferably 29H, 31H-phthalocyanine or copper phthalocyanine complex. One of the above compounds may be used, or a mixture of a plurality of compounds may be used.

  Among the porphyrin compounds and metal complexes thereof, 5,10,15,20-tetraphenyl-21H, 23H-porphine, 5,10,15,20-tetraphenyl-21H, 23H-porphine cobalt (II), 5,10,15,20-tetraphenyl-21H, 23H-porphine copper (II), 5,10,15,20-tetraphenyl-21H, 23H-porphine zinc (II), 5,10,15,20- Tetraphenyl-21H, 23H-porphine nickel (II), 5,10,15,20-tetraphenyl-21H, 23H-porphine vanadium (IV) oxide, 5,10,15,20-tetra (4-pyridyl)- 21H, 23H-porphine, 29H, 31H-tetrabenzo [b, g, l, q] porphine, 2 H, 31H-tetrabenzo [b, g, l, q] porphine cobalt (II), 29H, 31H-tetrabenzo [b, g, l, q] porphine copper (II), 29H, 31H-tetrabenzo [b, g, l, q] porphine zinc (II), 29H, 31H-tetrabenzo [b, g, l, q] porphine nickel (II) or 29H, 31H-tetrabenzo [b, g, l, q] porphine vanadium (IV) oxide And preferably 5,10,15,20-tetraphenyl-21H, 23H-porphine or 29H, 31H-tetrabenzo [b, g, l, q] porphine. One of the above compounds may be used, or a mixture of a plurality of compounds may be used.

  Examples of the method for forming a low molecular organic semiconductor compound include a vapor deposition method and a coating method. The latter is preferred because of the process advantage that coating can be formed. When the coating method is used, there is a method of converting a low molecular organic semiconductor compound precursor into a low molecular organic semiconductor compound after coating. A method using a semiconductor compound precursor is more preferable in that coating film formation is easier.

  A low molecular organic semiconductor compound precursor is a compound that changes its chemical structure and is converted into a low molecular organic semiconductor compound by applying an external stimulus such as heating or light irradiation. The low molecular organic semiconductor compound precursor is preferably excellent in film formability. In particular, in order to be able to apply the coating method, it is preferable that the precursor itself can be applied in a liquid state, or the precursor is highly soluble in some solvent and can be applied as a solution. For this reason, the solubility with respect to the solvent of a low molecular organic-semiconductor compound precursor is usually 0.1 weight% or more, Preferably it is 1 weight% or more, More preferably, it is 5 weight% or more. On the other hand, the upper limit is not particularly limited, but is usually 50% by weight or less, preferably 40% by weight or less.

The type of solvent is not particularly limited as long as it can uniformly dissolve or disperse the semiconductor precursor compound. For example, aliphatic hydrocarbons such as hexane, heptane, octane, isooctane, nonane or decane; toluene, xylene Aromatic hydrocarbons such as cyclohexylbenzene, chlorobenzene or orthodichlorobenzene; lower alcohols such as methanol, ethanol or propanol; ketones such as acetone, methyl ethyl ketone, cyclopentanone or cyclohexanone; ethyl acetate, butyl acetate or methyl lactate Esters such as chloroform, halogen hydrocarbons such as methylene chloride, dichloroethane, trichloroethane, or trichloroethylene; ethers such as ethyl ether, tetrahydrofuran, or dioxane; Amides such as amide or dimethylacetamide, and the like. Among them, preferably, aromatic hydrocarbons such as toluene, xylene, cyclohexylbenzene, chlorobenzene or orthodichlorobenzene; ketones such as acetone, methyl ethyl ketone, cyclopentanone or cyclohexanone; chloroform, methylene chloride, dichloroethane, trichloroethane or trichloroethylene Halogen hydrocarbons; ethers such as ethyl ether, tetrahydrofuran or dioxane.
Of these, non-halogen solvents are preferred. Although it is possible to use a halogen-based solvent, an alternative is demanded from the viewpoint of environmental load. The non-halogen solvent is preferably a non-halogen aromatic hydrocarbon such as toluene, xylene or cyclohexylbenzene; a non-halogen ketone such as cyclopentanone or cyclohexanone; a non-halogen such as tetrahydrofuran or 1,4-dioxane. Aliphatic ethers. Particularly preferred are non-halogen aromatic hydrocarbons such as toluene, xylene or cyclohexylbenzene. In addition, 1 type of solvent may be used independently and 2 or more types of solvents may be used together by arbitrary combinations and a ratio.

  Furthermore, it is preferable that the low molecular organic semiconductor compound precursor can be easily converted into a semiconductor compound. In the step of converting a low molecular organic semiconductor compound precursor to a semiconductor compound, which will be described later, what kind of external stimulus is given to the semiconductor precursor is arbitrary, but usually heat treatment or light treatment is performed. Preferably, it is heat treatment. In this case, the low-molecular organic semiconductor compound precursor preferably has a solvophilic group with respect to a predetermined solvent, which can be eliminated by a reverse Diels-Alder reaction as a part of the skeleton.

  Moreover, it is preferable that a low molecular organic-semiconductor compound precursor is converted into a semiconductor compound with a high yield through a conversion process. At this time, the yield of the semiconductor compound obtained by conversion from the low molecular organic semiconductor compound precursor is arbitrary as long as the performance of the organic thin film solar cell element is not impaired, but the low molecular weight obtained from the low molecular organic semiconductor compound precursor The yield of the organic semiconductor compound is usually 90 mol% or more, preferably 95 mol% or more, more preferably 99 mol% or more.

  The low molecular organic semiconductor compound precursor is not particularly limited as long as it has the above characteristics, and specifically, compounds described in JP-A-2007-324587 can be used. Particularly preferred examples include compounds represented by the following formula.

In the above formula, at least one of D ¹ and D ² represents a group that forms a π-conjugated divalent aromatic ring, Z ² —Z ³ is a group that can be removed by heat or light, and Z ² A π-conjugated compound obtained by elimination of —Z ³ represents a low molecular organic semiconductor compound. In addition, D ¹ and D ² which are not a group that forms a π-conjugated divalent aromatic ring represent a substituted or unsubstituted ethenylene group.

In the compound represented by the above formula, Z ² —Z ³ is eliminated by heat or light as shown in the following chemical reaction formula to form a π-conjugated compound having high planarity. This produced π-conjugated compound is a low-molecular organic semiconductor compound. This low molecular organic semiconductor compound is used as a material having p-type semiconductor characteristics.

  The following are mentioned as an example of a low molecular organic-semiconductor compound precursor. In the following, t-Bu represents a t-butyl group, and M is the same as described for porphyrin and phthalocyanine.

  Specific examples of the conversion of the low-molecular organic semiconductor compound precursor into the low-molecular organic semiconductor compound include the following.

  The low molecular organic semiconductor compound precursor may have a structure in which positional isomers exist, and in that case, it may be a mixture of a plurality of positional isomers. A mixture of a plurality of positional isomers is preferable because it has a higher solubility in a solvent than a low-molecular organic semiconductor compound precursor composed of a single positional isomer component, and is easy to form a coating film. The reason why the solubility of the mixture of multiple positional isomers is high is that the detailed mechanism is not clear, but the crystallinity of the compound itself is potentially retained, but the mixture of multiple isomers is mixed in the solution. It is assumed that three-dimensional regular intermolecular interaction becomes difficult. The solubility of the mixture of a plurality of regioisomers in a non-halogen solvent is usually 0.1% by weight or more, preferably 1% by weight or more, more preferably 5% by weight or more. Although there is no restriction | limiting in an upper limit, Usually, it is 50 weight% or less, More preferably, it is 40 weight% or less.

<2-4-1-2. Polymer Organic Semiconductor Compound>
The polymer organic semiconductor compound is not particularly limited, and is a conjugated polymer semiconductor such as polythiophene, polyfluorene, polyphenylene vinylene, polythienylene vinylene, polyacetylene or polyaniline; a polymer such as oligothiophene substituted with an alkyl group or other substituents Semiconductor; and the like. Moreover, the semiconductor polymer which copolymerized 2 or more types of monomer units is also mentioned. The conjugated polymers, ^{e.g., Handbook of Conducting Polymers, 3 rd} Ed. (2 volumes), 2007, Materials Science and Engineering, 2001, 32, 1-40, Pure Appl. Chem. Use polymers that can be synthesized by a combination of polymers described in known literature such as 2002, 74, 2031-3044, Handbook of THIOPHENE-BASED MATERIALS (2 volumes), 2009, and derivatives thereof, and combinations of the described monomers. Can do. The polymer organic semiconductor compound used as the p-type semiconductor compound may be a single compound or a mixture of a plurality of compounds.

  The monomer skeleton and monomer substituent of the polymer organic semiconductor compound can be selected to control the solubility, crystallinity, film-forming property, HOMO energy level, LUMO energy level, and the like. Moreover, it is preferable that the polymer organic semiconductor compound is soluble in an organic solvent in that an active layer can be formed by a coating method when an organic thin film solar cell element is produced. Specific examples of the polymer organic semiconductor compound include the following, but are not limited thereto.

  Among the p-type semiconductor compounds, the low-molecular organic semiconductor compound is preferably a condensed aromatic hydrocarbon such as naphthacene, pentacene, or pyrene, a phthalocyanine compound and a metal complex thereof, or a porphyrin compound such as tetrabenzoporphyrin (BP) and The metal complex and the polymer organic semiconductor compound is a conjugated polymer semiconductor such as polythiophene. The p-type semiconductor compound used in the active layer may be a single compound or a mixture of multiple compounds.

  The low-molecular organic semiconductor compound and / or the high-molecular organic semiconductor compound may have some self-organized structure in the film-formed state, or may be in an amorphous state.

  The HOMO (highest occupied molecular orbital) energy level of the p-type semiconductor compound is not particularly limited, and can be selected according to the type of the n-type semiconductor compound described later. In particular, when a fullerene compound is used as an n-type semiconductor compound, the HOMO energy level of the p-type semiconductor compound is usually −5.7 eV or more, more preferably −5.5 eV or more, on the other hand, usually −4.6 eV or less. Preferably it is -4.8 eV or less. When the HOMO energy level of the p-type semiconductor compound is −5.7 eV or more, the characteristics as a p-type semiconductor are improved, and when the HOMO energy level of the p-type semiconductor compound is −4.6 eV or less, Stability is improved and the open circuit voltage (Voc) is also improved.

The LUMO (lowest unoccupied molecular orbital) energy level of the p-type semiconductor compound is not particularly limited, but can be selected according to the type of the n-type semiconductor compound described later. In particular, when a fullerene compound is used as an n-type semiconductor compound, the LUMO energy level of the p-type semiconductor compound is usually −3.7 eV or more, preferably −3.6 eV or more. On the other hand, it is usually −2.5 eV or less, preferably −2.7 eV or less. When the LUMO energy level of the p-type semiconductor is −2.5 eV or less, the band gap is adjusted, light energy having a long wavelength can be effectively absorbed, and the short-circuit current density is improved. When the LUMO energy level of the p-type semiconductor compound is −3.7 eV or more, electron transfer to the n-type semiconductor compound is likely to occur and the short-circuit current density is improved.

<2-4-2. N-type semiconductor compound>
The n-type semiconductor compound is not particularly limited. Specifically, it is a fullerene compound, a quinolinol derivative metal complex represented by 8-hydroxyquinoline aluminum; a condensed ring such as naphthalenetetracarboxylic acid diimide or perylenetetracarboxylic acid diimide. Tetracarboxylic acid diimides; perylene diimide derivatives, terpyridine metal complexes, tropolone metal complexes, flavonol metal complexes, perinone derivatives, benzimidazole derivatives, benzoxazole derivatives, thiazole derivatives, benzthiazole derivatives, benzothiadiazole derivatives, oxadiazole derivatives, thiadiazoles Derivatives, triazole derivatives, aldazine derivatives, bisstyryl derivatives, pyrazine derivatives, phenanthroline derivatives, quinoxaline derivatives, benzoquinoline derivatives Bipyridine derivatives, borane derivatives, anthracene, pyrene, total fluoride condensed polycyclic aromatic hydrocarbons such as naphthacene or pentacene; single-walled carbon nanotubes, and the like.

  Among them, fullerene compounds, borane derivatives, thiazole derivatives, benzothiazole derivatives, benzothiadiazole derivatives, N-alkyl-substituted naphthalenetetracarboxylic acid diimides and N-alkyl-substituted perylene diimide derivatives are preferable, and fullerene compounds, N- Alkyl substituted perylene diimide derivatives and N-alkyl substituted naphthalene tetracarboxylic acid diimides are more preferred. One of the above compounds may be used, or a mixture of a plurality of compounds may be used. Examples of the n-type semiconductor compound include an n-type polymer semiconductor compound.

  The LUMO energy level of the n-type semiconductor compound is not particularly limited. For example, the value with respect to the vacuum level calculated by the cyclic voltammogram measurement method is usually −3.85 eV or more, preferably −3.80 eV or more. . In order to efficiently transfer electrons from a p-type semiconductor compound to an n-type semiconductor compound, the relative relationship of LUMO energy levels between the p-type semiconductor compound and the n-type semiconductor compound is important. Specifically, the LUMO energy level of the p-type semiconductor compound is above the LUMO energy level of the n-type semiconductor compound by a predetermined value, in other words, the electron affinity of the n-type semiconductor compound is p-type semiconductor compound. It is preferable that a predetermined energy is larger than the electron affinity. Since the open circuit voltage (Voc) depends on the difference between the HOMO energy level of the p-type semiconductor compound and the LUMO energy level of the n-type semiconductor compound, increasing the LUMO of the n-type semiconductor compound tends to increase the Voc. On the other hand, the LUMO value is usually −1.0 eV or less, preferably −2.0 eV or less, more preferably −3.0 eV or less, and still more preferably −3.3 eV or less. By lowering the LUMO energy level of the n-type semiconductor compound, electrons tend to move and the short circuit current (Jsc) tends to increase.

  As a method for calculating the LUMO energy level of an n-type semiconductor compound, there are a theoretically calculated method and a method of actually measuring. Theoretically calculated methods include semi-empirical molecular orbital methods and non-empirical molecular orbital methods. Examples of the actual measurement method include an ultraviolet-visible absorption spectrum measurement method and a cyclic voltammogram measurement method. Among them, the cyclic voltammogram measurement method is preferable.

The HOMO energy level of the n-type semiconductor compound is not particularly limited, but is usually −5.0 eV or less, preferably −5.5 eV or less. On the other hand, it is usually −7.0 eV or more, preferably −6.6 eV or more. It is preferable that the HOMO energy level of the n-type semiconductor compound is −7.0 eV or more because light absorption of the n-type semiconductor compound can also be used for power generation. The HOMO energy level of the n-type semiconductor compound is preferably −5.0 eV or less from the viewpoint of preventing reverse movement of holes.

The electron mobility of the n-type semiconductor compound is not particularly limited, but is usually 1.0 × 10 ⁻⁶ cm ² / Vs or more, preferably 1.0 × 10 ⁻⁵ cm ² / Vs or more. 0 × 10 ⁻⁵ cm ² / Vs or more is more preferable, and 1.0 × 10 ⁻⁴ cm ² / Vs or more is more preferable. On the other hand, it is usually 1.0 × 10 ³ cm ² / Vs or less, preferably 1.0 × 10 ² cm ² / Vs or less, and more preferably 5.0 × 10 ¹ cm ² / Vs or less. When the electron mobility of the n-type semiconductor compound is 1.0 × 10 ⁻⁶ cm ² / Vs or more, effects such as improvement of the electron diffusion rate, short circuit current, and conversion efficiency of the organic thin film solar cell element can be obtained. This is preferable. As a method for measuring electron mobility, there is a field effect transistor (FET) method, which can be carried out by a method described in a known document (Japanese Patent Laid-Open No. 2010-045186).

  The solubility of the n-type semiconductor compound in toluene at 25 ° C. is usually 0.5% by weight or more, preferably 0.6% by weight or more, and more preferably 0.7% by weight or more. On the other hand, it is usually preferably 90% by weight or less, more preferably 80% by weight or less, and further preferably 70% by weight or less. When the solubility of the n-type semiconductor compound in toluene at 25 ° C. is 0.5% by weight or more, the dispersion stability of the n-type semiconductor compound in the solution is improved, and aggregation, sedimentation, separation, and the like are less likely to occur. Therefore, it is preferable.

Hereinafter, examples of preferable n-type semiconductor compounds will be described.
<2-4-2-1. Fullerene Compound>
As a fullerene compound, what has the partial structure represented by general formula (n1), (n2), (n3), and (n4) is mentioned as a preferable example.

In the above formula, FLN represents fullerene, which is a carbon cluster having a closed shell structure. The carbon number of fullerene is not particularly limited as long as it is an even number of usually 60 or more and 130 or less. Examples of fullerenes include C ₆₀ , C ₇₀ , C ₇₆ , C ₇₈ , C ₈₂ , C ₈₄ , C ₉₀ , C ₉₄ , C ₉₆ and higher carbon clusters having more carbon than these. . Among these, _C60 or _C70 is preferable. As fullerenes, carbon-carbon bonds on some fullerene rings may be broken. Moreover, some of the carbon atoms constituting the fullerene may be replaced with other atoms. Further, the fullerene may include a metal atom, a non-metal atom, or an atomic group composed of these in a fullerene cage.

a, b, c and d are integers, and the sum of a, b, c and d is usually 1 or more, and usually 5 or less, preferably 3 or less. The partial structures in (n1), (n2), (n3) and (n4) are bonded to the same 5-membered ring or 6-membered ring in the fullerene skeleton. In the general formula (n1), —R ²¹ and — (CH ₂ ) _L are bonded to two adjacent carbon atoms on the same 5-membered ring or 6-membered ring in the fullerene skeleton. . In the general formula (n2), -C (R ²⁵ ) (R ²⁶ ) -N (R ²⁷ ) -C with respect to two adjacent carbon atoms on the same 5-membered ring or 6-membered ring in the fullerene skeleton. (R ²⁸ ) (R ²⁹ ) — are added to form a 5-membered ring. In the general formula (n3), —C (R ³⁰ ) (R ³¹ ) —C—C—C (R) with respect to two adjacent carbon atoms on the same 5-membered ring or 6-membered ring in the fullerene skeleton. ³² ) (R ³³ ) — are added to form a 6-membered ring. In the general formula (n4), —C (R ³⁴ ) (R ³⁵ ) — is added to two adjacent carbon atoms on the same 5-membered ring or 6-membered ring in the fullerene skeleton to form a 3-membered ring. Forming. L is an integer of 1 to 8. L is preferably an integer of 1 to 4, more preferably an integer of 1 to 2.

R ²¹ in the general formula (n1) is an alkyl group having 1 to 14 carbon atoms which may have a substituent, an alkoxy group having 1 to 14 carbon atoms which may have a substituent, or a substituent. An aromatic group which may have a group.

  The alkyl group is preferably an alkyl group having 1 to 10 carbon atoms, more preferably a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group or an isobutyl group, and even more preferably a methyl group or an ethyl group. . The alkoxy group is preferably an alkoxy group having 1 to 10 carbon atoms, more preferably an alkoxy group having 1 to 6 carbon atoms, and particularly preferably a methoxy group or an ethoxy group. The aromatic group is preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aromatic heterocyclic group having 2 to 20 carbon atoms, more preferably a phenyl group, a thienyl group, a furyl group, or a pyridyl group. More preferred are groups or thienyl groups.

  Although it does not specifically limit as a substituent which said alkyl group, an alkoxy group, and an aromatic group may have, A halogen atom or a silyl group is preferable. As the halogen atom, a fluorine atom is preferable. The silyl group is preferably a diarylalkylsilyl group, a dialkylarylsilyl group, a triarylsilyl group or a trialkylsilyl group, more preferably a dialkylarylsilyl group, and even more preferably a dimethylarylsilyl group.

R ^{22 to} R ²⁴ in the general formula (n1) may each independently have a hydrogen atom, an alkyl group having 1 to 14 carbon atoms which may have a substituent, or a substituent. It is an aromatic group.

  As the alkyl group, an alkyl group having 1 to 10 carbon atoms is preferable, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group, or an n-hexyl group is preferable. . The substituent that the alkyl group may have is preferably a halogen atom. As the halogen atom, a fluorine atom is preferable. The alkyl group substituted with a fluorine atom is preferably a perfluorooctyl group, a perfluorohexyl group or a perfluorobutyl group.

The aromatic group is preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aromatic heterocyclic group having 2 to 20 carbon atoms, more preferably a phenyl group, a thienyl group, a furyl group, or a pyridyl group. More preferred are groups or thienyl groups. The substituent that the aromatic group may have is not particularly limited, but is a fluorine atom, an alkyl group having 1 to 14 carbon atoms, a fluorinated alkyl group having 1 to 14 carbon atoms, or a carbon atom having 1 to 14 carbon atoms. An alkoxy group or an aromatic group having 3 to 10 carbon atoms is preferred, a fluorine atom or an alkoxy group having 1 to 14 carbon atoms is more preferred, and a methoxy group, n-butoxy group or 2-ethylhexyloxy group is still more preferred. When the aromatic group has a substituent, the number is not limited, but is preferably 1 or more and 3 or less, and more preferably 1. When the aromatic group has a plurality of substituents, the types of the substituents may be different, but are preferably the same.

R ^{25 to} R ²⁹ in the general formula (n2) may each independently have a hydrogen atom, an alkyl group having 1 to 14 carbon atoms which may have a substituent, or a substituent. It is an aromatic group.

  The alkyl group is preferably a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, n-hexyl group or octyl group, and more preferably a methyl group. The substituent that the alkyl group may have is not particularly limited, but a halogen atom is preferable. As the halogen atom, a fluorine atom is preferable. The alkyl group substituted with a fluorine atom is preferably a perfluorooctyl group, a perfluorohexyl group or a perfluorobutyl group.

  As the aromatic group, an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aromatic heterocyclic group having 2 to 20 carbon atoms is preferable, a phenyl group or a pyridyl group is more preferable, and a phenyl group is further preferable. Although it does not specifically limit as a substituent which an aromatic group may have, Preferably they are a fluorine atom, a C1-C14 alkyl group, or a C1-C14 alkoxy group. The alkyl group may be substituted with a fluorine atom. More preferably, it is an alkoxy group having 1 to 14 carbon atoms, and more preferably a methoxy group. When it has a substituent, the number is not limited, but it is preferably 1 or more and 3 or less, more preferably 1. The types of substituents may be different, but are preferably the same.

Ar ¹ in the general formula (n3) is an optionally substituted aromatic hydrocarbon group having 6 to 20 carbon atoms or an aromatic heterocyclic group having 2 to 20 carbon atoms, preferably A phenyl group, a naphthyl group, a biphenyl group, a thienyl group, a furyl group, a pyridyl group, a pyrimidyl group, a quinolyl group or a quinoxalyl group, more preferably a phenyl group, a thienyl group or a furyl group.

  Although there is no limitation as a substituent which may have, an amino group which may be substituted with a fluorine atom, a chlorine atom, a hydroxyl group, a cyano group, a silyl group, a boryl group or an alkyl group, having 1 to 14 carbon atoms An alkyl group, an alkoxy group having 1 to 14 carbon atoms, an alkylcarbonyl group having 2 to 14 carbon atoms, an alkylthio group having 1 to 14 carbon atoms, an alkenyl group having 2 to 14 carbon atoms, and 2 to 14 carbon atoms An alkynyl group, an ester group having 2 to 14 carbon atoms, an arylcarbonyl group having 3 to 20 carbon atoms, an arylthio group having 2 to 20 carbon atoms, an aryloxy group having 2 to 20 carbon atoms, and 6 or more carbon atoms An aromatic hydrocarbon group having 20 or less or a heterocyclic group having 2 to 20 carbon atoms is preferable, a fluorine atom, an alkyl group having 1 to 14 carbon atoms, 1 or less carbon atoms 1 An alkoxy group, having 2 to 14 ester groups carbons, an alkyl group or having 3 to 20 arylcarbonyl group carbons of 2 to 14 carbon atoms and more preferable. The alkyl group having 1 to 14 carbon atoms may be substituted with 1 or 2 or more fluorine atoms.

The alkyl group having 1 to 14 carbon atoms is preferably a methyl group, an ethyl group or a propyl group. The alkoxy group having 1 to 14 carbon atoms is preferably a methoxy group, an ethoxy group, or a propoxy group. The alkylcarbonyl group having 1 to 14 carbon atoms is preferably an acetyl group. The ester group having 2 to 14 carbon atoms is preferably a methyl ester group or an n-butyl ester group. The arylcarbonyl group having 3 to 20 carbon atoms is preferably a benzoyl group.

  When it has a substituent, the number is not limited, but it is preferably 1 or more and 4 or less, more preferably 1 or more and 3 or less. When there are a plurality of substituents, the types may be different, but are preferably the same.

R ^{30 to} R ³³ in the general formula (n3) each independently have a hydrogen atom, an alkyl group which may have a substituent, an amino group which may have a substituent, or a substituent. It is an optionally substituted alkoxy group or an optionally substituted alkylthio group. R ³⁰ or R ³¹ may be bonded to any one of R ³² and R ³³ to form a ring. As a structure in the case of forming a ring, the structure shown to the general formula (n5) which is a bicyclo structure which the aromatic group condensed is mentioned, for example.

F In the general formula (n5) has the same meaning as c, Z ⁴ is an oxygen atom, a sulfur atom, an amino group, an alkylene group or an arylene group. The alkylene group preferably has 1 to 2 carbon atoms. The arylene group preferably has 5 to 12 carbon atoms, and examples thereof include a phenylene group. The amino group may be substituted with an alkyl group having 1 to 6 carbon atoms such as a methyl group or an ethyl group. The alkylene group is an alkoxy group having 1 to 6 carbon atoms such as a methoxy group, an aliphatic hydrocarbon group having 1 to 5 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or 2 to 20 carbon atoms. The aromatic heterocyclic group may be substituted. The arylene group is an alkoxy group having 1 to 6 carbon atoms such as a methoxy group, an aliphatic hydrocarbon group having 1 to 5 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or 2 to 20 carbon atoms. The aromatic heterocyclic group may be substituted.

  The structure represented by the formula (n5) is particularly preferably a structure represented by the following formula (n6) or formula (n7).

R ^{34 to} R ³⁵ in the general formula (n4) each independently have a hydrogen atom, an alkoxycarbonyl group, an alkyl group having 1 to 14 carbon atoms which may have a substituent, or a substituent. An aromatic group that may be present.

  The alkoxy group constituting the alkoxycarbonyl group is preferably an alkoxy group having 1 to 12 carbon atoms or a fluorinated alkoxy group having 1 to 12 carbon atoms, more preferably an alkoxy group having 1 to 12 carbon atoms, and a methoxy group. Ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, n-hexoxy group, octoxy group, 2-propylpentoxy group, 2-ethylhexoxy group, cyclohexylmethoxy group or benzyloxy group A methoxy group, an ethoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group or an n-hexoxy group is particularly preferable.

  As the alkyl group, a linear alkyl group having 1 to 8 carbon atoms is preferable, and an n-propyl group is more preferable. The substituent that the alkyl group may have is not particularly limited, but is preferably an alkoxycarbonyl group. The alkoxy group constituting the alkoxycarbonyl group is preferably an alkoxy group having 1 to 14 carbon atoms or a fluorinated alkoxy group, more preferably a hydrocarbon group having 1 to 14 carbon atoms, a methoxy group, an ethoxy group, n- Propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, n-hexoxy group, octoxy group, 2-propylpentoxy group, 2-ethylhexoxy group, cyclohexylmethoxy group or benzyloxy group are more preferable, methoxy group or n A butoxy group is particularly preferred.

  As the aromatic group, an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aromatic heterocyclic group having 2 to 20 carbon atoms is preferable, and a phenyl group, a biphenyl group, a thienyl group, a furyl group, or a pyridyl group is preferable. More preferred are a phenyl group and a thienyl group. The substituent that the aromatic group may have is preferably an alkyl group having 1 to 14 carbon atoms, a fluorinated alkyl group having 1 to 14 carbon atoms, or an alkoxy group having 1 to 14 carbon atoms. An alkoxy group having a number of 1 or more and 14 or less is more preferable, and a methoxy group or 2-ethylhexyloxy group is particularly preferable. When it has a substituent, the number is not limited, but it is preferably 1 or more and 3 or less, more preferably 1. The types of substituents may be different or the same, preferably the same.

As the structure of the general formula (n4), preferably R ³⁴ and R ³⁵ are both alkoxycarbonyl groups, R ³⁴ and R ³⁵ are both aromatic groups, or R ³⁴ is an aromatic group and R ^{And those in which 35} is a 3- (alkoxycarbonyl) propyl group.

  As the fullerene compound, one kind of the above compounds may be used, or a mixture of plural kinds of compounds may be used.

In order to form a fullerene compound by a coating method, it is preferable that the fullerene compound itself can be applied in a liquid state, or that the fullerene compound is highly soluble in some solvent and can be applied as a solution. When the preferable range of solubility is raised, the solubility in toluene at 25 ° C. is usually 0.1% by weight or more, preferably 1% by weight or more, more preferably 5% by weight or more. It is preferable that the solubility of the fullerene compound is not less than the above lower limit because the dispersion stability of the fullerene compound in the solution increases and aggregation, sedimentation, separation, and the like are less likely to occur.

  The solvent for dissolving the fullerene compound is not particularly limited as long as it is a nonpolar organic solvent, but a non-halogen solvent is preferable. Although it is possible to use a halogen-based solvent such as dichlorobenzene, an alternative is demanded from the viewpoint of environmental load. Examples of non-halogen solvents include non-halogen aromatic hydrocarbons. Of these, toluene, xylene, cyclohexylbenzene, and the like are preferable.

  Although there is no restriction | limiting in particular as a manufacturing method of a fullerene compound, For example, the synthesis | combination of the fullerene compound which has a partial structure (n1) is international publication 2008/059771 or J.N. Am. Chem. Soc. , 2008, 130 (46), 15429-15436.

  Synthesis of fullerene compounds having a partial structure (n2) is described in J. Org. Am. Chem. Soc. 1993, 115, 9798-9799, Chem. Mater. 2007, 19, 5363-5372 and Chem. Mater. It can be carried out according to the description of known documents such as 2007, 19, 5194-5199.

  Synthesis of a fullerene compound having a partial structure (n3) is described in Angew. Chem. Int. Ed. Engl. 1993, 32, 78-80, Tetrahedron Lett. It can be carried out according to the description of known documents such as 1997, 38, 285-288, WO 2008/018931 and WO 2009/086212.

  Synthesis of fullerene compounds having a partial structure (n4) is described in J. Org. Chem. Soc. Perkin Trans. 1, 1997 1595, Thin Solid Films 489 (2005) 251-256, Adv. Funct. Mater. 2005, 15, 1979-1987 and J. Org. Org. Chem. It can be carried out according to the description of known documents such as 1995, 60, 532-538.

<2-4-2-2. N-alkyl-substituted perylene diimide derivatives>
N-alkyl-substituted perylene diimide derivatives are not particularly limited, and specifically, International Publication No. 2008/063609, International Publication No. 2009/115553, International Publication No. 2009/098250, International Publication No. Examples thereof include compounds described in 2009/000756 and International Publication No. 2009/091670. These compounds are preferable in that they have high electron mobility and can absorb light in the visible range, and thus can contribute to both charge transport and power generation.

<2-4-2-3. Naphthalenetetracarboxylic acid diimide>
The naphthalenetetracarboxylic acid diimide is not particularly limited, and specific examples thereof include compounds described in International Publication No. 2008/063609, International Publication No. 2007/146250 and International Publication No. 2009/000756. It is done. These compounds are preferable because they have high electron mobility, high solubility, and excellent coating properties.

<2-4-2-4. n-type Polymer Semiconductor Compound>
There are no particular restrictions on the n-type polymer semiconductor compound, but condensed ring tetracarboxylic acid diimides such as naphthalenetetracarboxylic acid diimide and perylenetetracarboxylic acid diimide, perylene diimide derivatives, benzimidazole derivatives, benzoxazole derivatives, thiazoles N-type polymer semiconductor comprising at least one of a derivative, a benzothiazole derivative, a benzothiadiazole derivative, an oxadiazole derivative, a thiadiazole derivative, a triazole derivative, a pyrazine derivative, a phenanthroline derivative, a quinoxaline derivative, a bipyridine derivative and a borane derivative Compounds and the like.

  Among them, a polymer having at least one of a borane derivative, a thiazole derivative, a benzothiazole derivative, a benzothiadiazole derivative, an N-alkyl-substituted naphthalenetetracarboxylic acid diimide and an N-alkyl-substituted perylene diimide derivative as a constituent unit is provided. Preferably, an n-type polymer semiconductor compound having at least one of N-alkyl-substituted perylene diimide derivative and N-alkyl-substituted naphthalenetetracarboxylic acid diimide as a constituent unit is more preferable. One of the above compounds may be used as the n-type polymer semiconductor compound, or a mixture of a plurality of compounds may be used.

  Specific examples of the n-type polymer semiconductor compound include compounds described in International Publication No. 2009/098253, International Publication No. 2009/098250, International Publication No. 2010/012710, and International Publication No. 2009/098250. Can be mentioned. Since these compounds can absorb light in the visible range, they can contribute to power generation, are preferred because of their high viscosity and excellent coating properties.

<2-5. Photoelectric conversion characteristics>
The photoelectric conversion characteristics of the organic thin film solar cell element can be obtained as follows. The organic thin-film solar cell element is irradiated with AM1.5G light with a solar simulator at an irradiation intensity of 100 mW / cm ² to measure current-voltage characteristics. From the obtained current-voltage curve, photoelectric conversion characteristics such as photoelectric conversion efficiency (PCE), short circuit current density (Jsc), open circuit voltage (Voc), fill factor (FF), series resistance, and shunt resistance can be obtained.

  Although there is no special restriction | limiting, the photoelectric conversion efficiency of an organic thin-film solar cell element is 1% or more normally, Preferably it is 2% or more, More preferably, it is 5% or more. On the other hand, there is no particular limitation on the upper limit, and the higher the better.

Moreover, as a method for measuring the durability of the organic thin film solar cell element, there is a method for obtaining a maintenance rate of photoelectric conversion efficiency before and after the organic thin film solar cell element is exposed to the atmosphere.
(Maintenance rate) = (Photoelectric conversion efficiency after N hours of atmospheric exposure) / (Photoelectric conversion efficiency immediately before atmospheric exposure)

  In order to put an organic thin-film solar cell element into practical use, it is important to have high photoelectric conversion efficiency and high durability in addition to simple and inexpensive manufacture. From this viewpoint, the maintenance rate of photoelectric conversion efficiency before and after exposure to the atmosphere for one week is preferably 60% or more, more preferably 80% or more, and the higher the better.

<3. Organic thin film solar cell module>
Next, an organic thin film solar cell module including the organic thin film solar cell element according to this embodiment will be described with reference to the drawings. FIG. 2 is a cross-sectional view schematically showing the configuration of the organic thin film solar cell module. As shown in FIG. 2, the organic thin-film solar cell module 14 of this embodiment includes a weather-resistant protective film 1, an ultraviolet cut film 2, a gas barrier film 3, a getter material film 4, a sealing material 5, and an organic material. The thin film solar cell element 6, the sealing material 7, the getter material film 8, the gas barrier film 9, and the back sheet 10 are provided in this order. And light is irradiated from the side (downward in the figure) where the weather-resistant protective film 1 was formed, and the organic thin-film solar cell element 6 generates electric power. In addition, when using a highly waterproof sheet such as a sheet in which a fluororesin film is bonded to both surfaces of an aluminum foil as the back sheet 10 described later, the getter material film 8 and / or the gas barrier film 9 may not be used depending on the application. Good.

<3-1. Weatherproof protective film 1>
The weather-resistant protective film 1 is a film that protects the organic thin-film solar cell element 6 from weather changes. By covering the organic thin-film solar cell element 6 with the weather-resistant protective film 1, the organic thin-film solar cell element 6 and the like are protected from weather changes and the power generation capacity is kept high. Since the weather-resistant protective film 1 is located on the outermost surface layer of the organic thin-film solar cell module 14, the weather-resistant protective film 1 of the organic thin-film solar cell module such as weather resistance, heat resistance, transparency, water repellency, contamination resistance and / or mechanical strength It is preferable to have properties suitable for a surface coating material and to maintain it for a long period of time in outdoor exposure.

  Moreover, it is preferable that the weather-resistant protective film 1 transmits visible light from a viewpoint which does not prevent the light absorption of the organic thin-film solar cell element 6. For example, the transmittance of visible light (wavelength 360 to 830 nm) is preferably 80% or more, and the upper limit is not limited. Furthermore, since the organic thin film solar cell module 14 is often heated by receiving light, it is preferable that the weather-resistant protective film 1 also has heat resistance. From this viewpoint, the melting point of the constituent material of the weather-resistant protective film 1 is usually 100 ° C. or higher and 350 ° C. or lower.

  The material which comprises the weather-resistant protective film 1 is arbitrary if the organic thin-film solar cell element 6 can be protected from a weather change. Examples of the material include polyethylene resin, polypropylene resin, cyclic polyolefin resin, AS (acrylonitrile-styrene) resin, ABS (acrylonitrile-butadiene-styrene) resin, polyvinyl chloride resin, fluorine resin, polyethylene terephthalate, polyethylene Examples thereof include polyester resins such as naphthalate, phenol resins, polyacrylic resins, polyamide resins such as various nylons, polyimide resins, polyamide-imide resins, polyurethane resins, cellulose resins, silicon resins, and polycarbonate resins.

In addition, the weather-resistant protective film 1 may be formed with 1 type of material, and may be formed with 2 or more types of materials. Moreover, although the weather-resistant protective film 1 may be formed with the single layer film, the laminated | multilayer film provided with the film of two or more layers may be sufficient as it.
The thickness of the weather-resistant protective film 1 is not particularly defined, but is usually 10 μm or more and 200 μm or less.
Moreover, you may perform surface treatment, such as a corona treatment and / or a plasma treatment, for the weather-resistant protective film 1 in order to improve the adhesiveness with another film.

  It is preferable to provide the weatherproof protective film 1 on the outer side of the organic thin film solar cell module 14 as much as possible. This is because more of the constituent members of the organic thin film solar cell module 14 can be protected.

<3-2. UV cut film 2>
The ultraviolet cut film 2 is a film that prevents the transmission of ultraviolet rays. The organic thin film solar cell element 6 and, if necessary, a gas barrier film are provided by providing the ultraviolet cut film 2 on the light receiving portion of the organic thin film solar cell module 14 and covering the light receiving surface 6a of the organic thin film solar cell element 6 with the ultraviolet cut film 2. 3, 9 etc. are protected from ultraviolet rays, and the power generation capacity can be kept high.

The degree of the ability to suppress the transmission of ultraviolet rays required for the ultraviolet cut film 2 is preferably such that the transmittance of ultraviolet rays (for example, wavelength of 300 nm) is 50% or less, and there is no limit on the lower limit. Moreover, it is preferable that the ultraviolet cut film 2 transmits visible light from the viewpoint of not preventing the light absorption of the organic thin film solar cell element 6. For example, the transmittance of visible light (wavelength 360 to 830 nm) is preferably 80% or more, and the upper limit is not limited.

Furthermore, since the organic thin film solar cell module 14 is often heated by receiving light, the ultraviolet cut film 2 preferably has resistance to heat. From this viewpoint, the melting point of the constituent material of the ultraviolet cut film 2 is usually 100 ° C. or higher and 350 ° C. or lower.
Moreover, it is preferable that the ultraviolet cut film 2 is high in flexibility, has good adhesion to an adjacent film, and can cut water vapor and oxygen.

  The material which comprises the ultraviolet cut film 2 is arbitrary if the intensity | strength of an ultraviolet-ray can be weakened. Examples of the material include films formed by blending an ultraviolet absorber with an epoxy, acrylic, urethane, or ester resin. Further, a film in which a layer of an ultraviolet absorbent dispersed or dissolved in a resin (hereinafter referred to as “ultraviolet absorbing layer” as appropriate) is formed on a base film may be used.

Examples of the ultraviolet absorber that can be used include salicylic acid-based, benzophenone-based, benzotriazole-based, and cyanoacrylate-based ones. In addition, a ultraviolet absorber may use 1 type and may use 2 or more types together by arbitrary combinations and a ratio. As described above, a film in which an ultraviolet absorbing layer is formed on a base film can also be used as the ultraviolet absorbing film. Such a film can be produced, for example, by applying a coating solution containing an ultraviolet absorber on a substrate film and drying it.
Although the material of a base film is not specifically limited, For example, polyester is mentioned at the point from which the balance of heat resistance and a softness | flexibility is obtained.

  Examples of specific products of the ultraviolet cut film 2 include cut ace (MKV Plastic Co., Ltd.). In addition, the ultraviolet cut film 2 may be formed with 1 type of material, and may be formed with 2 or more types of materials.

  Further, the ultraviolet cut film 2 may be formed of a single layer film, but may be a laminated film including two or more layers. The thickness of the ultraviolet cut film 2 is not particularly limited, but is usually 5 μm or more and 200 μm or less.

  Although the ultraviolet cut film 2 should just be provided in the position which covers at least one part of the light-receiving surface 6a of the organic thin film solar cell element 6, Preferably it is provided in the position which covers all the light-receiving surfaces 6a of the organic thin film solar cell element 6. FIG. However, the ultraviolet cut film 2 may be provided at a position other than the position covering the light receiving surface 6 a of the organic thin film solar cell element 6.

<3-3. Gas barrier film 3>
The gas barrier film 3 is a film that prevents permeation of water and oxygen. By covering the organic thin-film solar cell element 6 with the gas barrier film 3, the organic thin-film solar cell element 6 can be protected from water and oxygen, and the power generation capacity can be kept high.

The degree of moisture-proof capability required for the gas barrier film 3 varies depending on the type of the organic thin-film solar cell element 6 and the like, but the water vapor transmission rate per unit area (1 m ² ) per day is usually 1 × 10. It is preferably ⁻¹ g / m ² / day or less, and the lower limit is not limited.

The degree of oxygen permeability required for the gas barrier film 3 varies depending on the type of the organic thin film solar cell element 6 and the like, but the oxygen permeability per unit area (1 m ² ) is usually 1 ×. It is preferable that it is 10 < ^-1 > cc / m < ² > / day / atm or less, and there is no restriction | limiting in a lower limit.

  Moreover, it is preferable that the gas barrier film 3 transmits visible light from the viewpoint of not preventing the organic thin film solar cell element 6 from absorbing light. For example, the transmittance of visible light (wavelength 360 to 830 nm) is usually 60% or more, and there is no upper limit.

  Furthermore, since the organic thin film solar cell module 14 is often heated by receiving light, the gas barrier film 3 preferably has heat resistance. From this viewpoint, the melting point of the constituent material of the gas barrier film 3 is usually 100 ° C. or higher and 350 ° C. or lower.

  The specific structure of the gas barrier film 3 is arbitrary as long as the organic thin-film solar cell element 6 can be protected from water. However, since the manufacturing cost increases as the amount of water vapor or oxygen that can permeate the gas barrier film 3 increases, it is preferable to use an appropriate film considering these points comprehensively.

Particularly suitable gas barrier film 3 includes, for example, a film obtained by vacuum-depositing SiO _x on a base film such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN).

In addition, the gas barrier film 3 may be formed with 1 type of material, and may be formed with 2 or more types of materials. The gas barrier film 3 may be formed of a single layer film, but may be a laminated film including two or more layers.
The thickness of the gas barrier film 3 is not particularly defined, but is usually 5 μm or more and 200 μm or less.

  As long as the gas barrier film 3 can cover the organic thin-film solar cell element 6 and protect it from moisture and oxygen, the formation position is not limited, but the front surface of the organic thin-film solar cell element 6 (surface on the light-receiving surface side; lower side in FIG. 2). And the back surface (the surface opposite to the light receiving surface; the upper surface in FIG. 2). This is because the organic thin-film solar cell module 14 often has a front surface and a back surface formed in a larger area than the other surfaces. In this embodiment, the gas barrier film 3 covers the front surface of the organic thin film solar cell element 6, and a gas barrier film 9 described later covers the back surface of the organic thin film solar cell element 6. In addition, when using a highly waterproof sheet such as a sheet in which a fluororesin film is bonded to both surfaces of an aluminum foil as the back sheet 10 described later, the getter material film 8 and / or the gas barrier film 9 may not be used depending on the application. Good.

<3-4. Getter Material Film 4>
The getter material film 4 is a film that absorbs moisture and / or oxygen. By covering the organic thin film solar cell element 6 with the getter material film 4, the organic thin film solar cell element 6 and the like are protected from moisture and / or oxygen, and the power generation capacity is kept high. Here, unlike the gas barrier film 3 as described above, the getter material film 4 does not prevent moisture permeation but absorbs moisture. By using a film that absorbs moisture, when the organic thin-film solar cell element 6 is covered with the gas barrier film 3 or the like, the getter material film 4 captures moisture that slightly enters the space formed by the gas barrier films 3 and 9. Thus, the influence of moisture on the organic thin film solar cell element 6 can be eliminated.

The degree of moisture absorption capacity of the getter material film 4 is usually 0.1 mg / cm ² or more, and although there is no upper limit, it is usually 10 mg / cm ² or less. Further, when the organic thin film solar cell element 6 is covered with the gas barrier films 3 and 9 or the like by the getter material film 4 absorbing oxygen, oxygen that slightly enters the space formed by the gas barrier films 3 and 9 is absorbed. The getter material film 4 can capture and eliminate the influence of oxygen on the organic thin film solar cell element 6.

  Furthermore, it is preferable that the getter material film 4 transmits visible light from the viewpoint of not hindering the light absorption of the organic thin film solar cell element 6. For example, the transmittance of visible light (wavelength 360 to 830 nm) is usually 60% or more, and there is no upper limit.

  Furthermore, since the organic thin-film solar cell module 14 is often heated by receiving light, the getter material film 4 preferably has resistance to heat. From this viewpoint, the melting point of the constituent material of the getter material film 4 is usually 100 ° C. or higher and 350 ° C. or lower.

  The material constituting the getter material film 4 is arbitrary as long as it can absorb moisture and / or oxygen. Examples of the material include alkali metal, alkaline earth metal or alkaline earth metal oxides; alkali metal or alkaline earth metal hydroxides; silica gel, zeolitic compounds, magnesium sulfate. And sulfates such as sodium sulfate and nickel sulfate; and organometallic compounds such as aluminum metal complexes and aluminum oxide octylates. Specifically, examples of the alkaline earth metal include Ca, Sr, and Ba. Examples of the alkaline earth metal oxide include CaO, SrO, and BaO. In addition, Zr-Al-BaO and aluminum metal complexes are also included. Specific product names include, for example, OleDry (Futaba Electronics).

  Examples of the substance that absorbs oxygen include activated carbon, silica gel, activated alumina, molecular sieve, magnesium oxide, and iron oxide. In addition, Fe, Mn, Zn, and inorganic salts such as sulfates, chlorides, and nitrates of these metals are also included.

In addition, the getter material film 4 may be formed of one type of material or may be formed of two or more types of materials. The getter material film 4 may be formed of a single layer film, but may be a laminated film including two or more layers.
The thickness of the getter material film 4 is not particularly specified, but is usually 5 μm or more and 200 μm or less.

  The getter material film 4 is not limited in its formation position as long as it is in the space formed by the gas barrier films 3 and 9, but the front surface of the organic thin-film solar cell element 6 (the surface on the light receiving surface side. Surface) and the back surface (the surface opposite to the light receiving surface; the upper surface in FIG. 2) is preferably covered. This is because the organic thin film solar cell module 14 often has a front surface and a back surface formed in a larger area than the other surfaces, and therefore moisture and oxygen tend to enter through these surfaces. From this viewpoint, the getter material film 4 is preferably provided between the gas barrier film 3 and the organic thin film solar cell element 6. In this embodiment, the getter material film 4 covers the front surface of the organic thin film solar cell element 6, the getter material film 8 described later covers the back surface of the organic thin film solar cell element 6, and the getter material films 4 and 8 are respectively organic thin film solar cells. It is located between the element 6 and the gas barrier films 3 and 9. In addition, when using a highly waterproof sheet such as a sheet in which a fluororesin film is bonded to both surfaces of an aluminum foil as the back sheet 10 described later, the getter material film 8 and / or the gas barrier film 9 may not be used depending on the application. Good.

<3-5. Sealing material 5>
The sealing material 5 is a film that reinforces the organic thin film solar cell element 6. Since the organic thin film solar cell element 6 is thin, the strength is usually weak, and thus the strength of the organic thin film solar cell module tends to be weak. However, the strength can be maintained high by the sealing material 5.

Moreover, it is preferable that the sealing material 5 has high strength from the viewpoint of maintaining the strength of the organic thin-film solar cell module 14. The specific strength is related to the strength of the weatherproof protective film 1 other than the sealing material 5 and the strength of the back sheet 10 and is generally difficult to define, but the entire organic thin-film solar cell module 14 has good bending workability. It is desirable to have strength that does not cause peeling of the bent portion.

Moreover, it is preferable that the sealing material 5 permeate | transmits visible light from a viewpoint which does not prevent the light absorption of the organic thin film solar cell element 6. FIG. For example, the transmittance of visible light (wavelength 360 to 830 nm) is usually 60% or more, and there is no upper limit.
The thickness of the sealing material 5 is not particularly specified, but is usually 2 μm or more and 700 μm or less.

  The T-type peel adhesion strength of the sealing material 5 to the substrate is usually 1 N / inch or more and usually 2000 N / inch or less. It is preferable that the T-type peel adhesive strength is 1 N / inch or more in terms of ensuring the long-term durability of the module. It is preferable that the T-type peel adhesive strength is 2000 N / inch or less in that the base material, the barrier film, and the adhesive can be separated and discarded when the solar cell is discarded. The T-type peel adhesion strength is measured by a method according to JIS K6854.

  The constituent material of the sealing material 5 is not particularly limited as long as it has the above characteristics, but sealing of organic / inorganic solar cells, sealing of organic / inorganic LED elements, sealing of electronic circuit boards, etc. In general, a sealing material generally used can be used.

  Specifically, a thermosetting resin composition or a thermoplastic resin composition and an active energy ray curable resin composition can be mentioned. The active energy ray-curable resin composition is, for example, a resin that is cured by ultraviolet rays, visible light, electron beams, or the like. More specifically, an ethylene-vinyl acetate copolymer (EVA) resin composition, a hydrocarbon resin composition, an epoxy resin composition, a polyester resin composition, an acrylic resin composition, and a urethane resin composition. Or a silicon-based resin composition, etc., depending on the main chain, branched chain, terminal chemical modification of each polymer, adjustment of molecular weight, additives, etc., thermosetting, thermoplastic and active energy ray curable, etc. The characteristics are expressed.

  Moreover, since the organic thin-film solar cell module 14 is often heated by receiving light, it is preferable that the sealing material 5 also has heat resistance. From this viewpoint, the melting point of the constituent material of the sealing material 5 is usually 100 ° C. or higher and 350 ° C. or lower.

The density of the constituent material for sealing material in the sealing material 5 is preferably 0.80 g / cm ³ or more, and there is no upper limit. The measurement and evaluation of density can be performed by a method based on JIS K7112.

  Although there is no restriction | limiting in the position which provides the sealing material 5, Usually, it provides so that the organic thin-film solar cell element 6 may be inserted | pinched. It is for protecting the organic thin film solar cell element 6 reliably. In this embodiment, the sealing material 5 and the sealing material 7 are provided on the front surface and the back surface of the organic thin film solar cell element 6, respectively.

<3-6. Organic Thin Film Solar Cell Element 6>
The organic thin film solar cell element 6 is the same as the organic thin film solar cell element 107 shown in FIG. The organic thin film solar cell module 14 can be manufactured using the organic thin film solar cell element shown in FIG.

Although only one organic thin film solar cell element 6 may be provided for each organic thin film solar cell module 14, two or more organic thin film solar cell elements 6 are usually provided. What is necessary is just to set the number of the specific organic thin film solar cell elements 6 arbitrarily. When a plurality of organic thin film solar cell elements 6 are provided, the organic thin film solar cell elements 6 are often arranged in an array.

  When a plurality of organic thin film solar cell elements 6 are provided, usually, the organic thin film solar cell elements 6 are electrically connected to each other, and electricity generated from the connected group of organic thin film solar cell elements 6 is a terminal (not shown). In this case, the solar cell elements are usually connected in series in order to increase the voltage.

  Thus, when connecting the organic thin film solar cell elements 6 to each other, it is preferable that the distance between the organic thin film solar cell elements 6 is small, and as a result, between the organic thin film solar cell element 6 and the organic thin film solar cell element 6. The gap is preferably narrow. This is because the light receiving area of the organic thin film solar cell element 6 is widened to increase the amount of light received, and the amount of power generated by the organic thin film solar cell module 14 is increased.

<3-7. Sealing material 7>
The sealing material 7 is a film similar to the sealing material 5 described above, and the same material as the sealing material 7 can be used in the same manner except that the arrangement position is different. Moreover, since the constituent member on the back side of the solar cell element 6 does not necessarily need to transmit visible light, a member that does not transmit visible light can be used.

<3-8. Getter Material Film 8>
The getter material film 8 is the same film as the getter material film 4 described above, and the same material as the getter material film 4 can be used as necessary, except for the arrangement position. Moreover, since the constituent member on the back side of the organic thin film solar cell element 6 does not necessarily need to transmit visible light, a member that does not transmit visible light can be used.

<3-9. Gas barrier film 9>
The gas barrier film 9 is the same film as the gas barrier film 3 described above, and the same material as the gas barrier film 9 can be used as necessary except that the arrangement position is different. Moreover, since the constituent member on the back side of the organic thin film solar cell element 6 does not necessarily need to transmit visible light, a member that does not transmit visible light can be used.

<3-10. Back sheet 10>
The back sheet 10 is the same film as the weather-resistant protective film 1 described above, and the same material as the weather-resistant protective film 1 can be used in the same manner except that the arrangement position is different. In addition, if the back sheet 10 is difficult to permeate water and oxygen, the back sheet 10 can also function as a gas barrier layer. Moreover, since the constituent member on the back side of the organic thin film solar cell element 6 does not necessarily need to transmit visible light, a member that does not transmit visible light can be used.

<3-11. Dimensions>
The organic thin film solar cell module 14 using the organic thin film solar cell element according to this embodiment is usually a thin film member. Thus, by forming the organic thin film solar cell module 14 as a film-like member, the organic thin film solar cell module 14 can be easily installed in a building material, an automobile, an interior, or the like. The organic thin-film solar cell module 14 is light and difficult to break, and thus a highly safe solar cell can be obtained and can be applied to a curved surface, so that it can be used for more applications. Since it is thin and light, it is preferable in terms of distribution such as transportation and storage. Furthermore, since it is in the form of a film, it is possible to manufacture a roll-to-roll system, and a significant cost cut is possible.
Although there is no restriction | limiting in the specific dimension of the organic thin film solar cell module 14, The thickness is usually 300 micrometers or more and 3000 micrometers or less.

<3-12. Manufacturing method>
Although there is no restriction | limiting in the manufacturing method of the organic thin film solar cell module 14 using the organic thin film solar cell element which concerns on this embodiment, For example, as a solar cell manufacturing method of the form of FIG. 2, the laminated body shown by FIG. A method of performing a laminate sealing step after the creation is mentioned. The organic thin film solar cell element according to this embodiment is excellent in heat resistance, and thus is preferable in that deterioration due to the laminate sealing step is reduced.

  The laminate production shown in FIG. 2 can be performed using a known technique. The method of the laminate sealing step is not particularly limited as long as the effects of the present invention are not impaired, but for example, wet lamination, dry lamination, hot melt lamination, extrusion lamination, coextrusion molding lamination, extrusion coating, photocuring adhesive Laminate, thermal laminate, etc. are mentioned. Among them, a laminating method using a photo-curing adhesive having a proven record in organic EL device sealing, a hot melt laminate or a thermal laminate having a proven record in solar cells is preferable, and a hot melt laminate or a thermal laminate is a sheet-like sealing material. It is more preferable at the point which can be used.

  The heating temperature in the laminate sealing step is usually 130 ° C or higher, preferably 140 ° C or higher, and is usually 180 ° C or lower, preferably 170 ° C or lower. The heating time in the laminate sealing step is usually 10 minutes or longer, preferably 20 minutes or longer, and is usually 100 minutes or shorter, preferably 90 minutes or shorter. The pressure in the laminate sealing step is usually 0.001 MPa or more, preferably 0.01 MPa or more, and usually 0.2 MPa or less, preferably 0.1 MPa or less. By setting the pressure within this range, sealing can be performed reliably, and the reduction of the film thickness due to the protrusion of the sealing materials 5 and 7 from the end portion and overpressurization can be suppressed, thereby ensuring dimensional stability. In addition, what connected two or more solar cell elements 6 in series or in parallel can be manufactured similarly to the above.

<3-13. Application>
There is no restriction | limiting in the use of the organic thin film solar cell module 14 using the organic thin film solar cell element which concerns on this embodiment, It can use for arbitrary uses. Examples of fields to which organic thin-film solar cell modules are applied include building material solar cells, automotive solar cells, interior solar cells, railway solar cells, marine solar cells, airplane solar cells, and spacecraft solar cells. , Solar cells for home appliances, solar cells for mobile phones, solar cells for toys, and the like.

  The organic thin film solar cell module may be used as it is, or an organic thin film solar cell module may be installed on a substrate and used as an organic thin film solar cell panel. For example, as schematically shown in FIG. 3, an organic thin film solar cell panel 13 provided with an organic thin film solar cell module 14 on a substrate 12 may be prepared and used at a place of use. That is, the organic thin film solar cell panel 13 can be manufactured using the organic thin film solar cell module 14. As a specific example, when a building material plate is used as the base material 12, a solar cell panel can be produced as the organic thin film solar cell panel 13 by providing the organic thin film solar cell module 14 on the surface of the plate material. .

The substrate 12 is a support member that supports the organic thin film solar cell module 14. Examples of the material for forming the substrate 12 include inorganic materials such as glass, sapphire, and titania; polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polyimide, nylon, polystyrene, polyvinyl alcohol, ethylene vinyl alcohol copolymer, fluorine. Organic materials such as resin, vinyl chloride, polyethylene, cellulose, polyvinylidene chloride, aramid, polyphenylene sulfide, polyurethane, polycarbonate, polyarylate and polynorbornene; paper materials such as paper and synthetic paper; metals such as stainless steel, titanium and aluminum; Examples thereof include composite materials such as those obtained by coating or laminating a surface of a metal such as stainless steel, titanium, and aluminum to impart insulation.

  In addition, 1 type may be used for the material of a base material, and 2 or more types may be used together by arbitrary combinations and a ratio. Moreover, carbon fiber may be included in these organic materials or paper materials to reinforce the mechanical strength. When the example of the base material 12 is given, Alpolic (registered trademark; manufactured by Mitsubishi Plastics) and the like may be mentioned.

  Although there is no restriction | limiting in the shape of the base material 12, Usually, a board | plate material is used. Moreover, what is necessary is just to set the material of the base material 12, a dimension, etc. arbitrarily according to the use environment. This solar cell panel can be installed on the outer wall of a building.

  EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited only to the Example illustrated below.

<Example 1>
A PEN-lower electrode laminate in which a lower electrode (ITO: film thickness 200 nm) was laminated on a 125 μm thick PEN substrate was used (transmittance of 80% or more and sheet resistance of 15Ω / □ or less).
The laminate was coated with zinc oxide ink (by BYK-Chemie NANOBYK-3841 diluted to 11 wt% with IPA) with a wire bar and dried to form an electron extraction layer having a thickness of 200 nm.
After forming the electron extraction layer, it is attached to a roll substrate (thickness: 125 μm, material: PEN), a tension of 130 N / m is applied, and the laminated surface comes into contact with the drive roll when transported by the nip roll mechanism. Was conveyed as follows.
The drive roll and nip roll of the nip roll mechanism are as follows.
・ Drive roll (metal): Outer diameter 100mm, SS + HCr plating Surface hardness 100
-Nip roll (rubber): outer diameter 75mm, SS + antistatic NBR rubber lining, surface hardness about 70
When the state of the surface of the electron extraction layer after conveyance was confirmed, scars were hardly confirmed.

<Comparative Example 1>
When transported by the nip roll mechanism, formation of the electron extraction layer and transport by the nip roll mechanism were performed in the same manner as in Example 1 except that the stacked surface was transported so as to contact the nip roll. When the state of the surface of the electron extraction layer after conveyance was confirmed, scratches were confirmed.
From the above results, it can be seen that according to the present invention, a method for producing an organic thin-film solar cell element using a roll-to-roll which is difficult to damage the laminated surface can be provided.

DESCRIPTION OF SYMBOLS 101 Cathode 102 Electron taking-out layer 103 Active layer 104 Hole taking-out layer 105 Anode 106 Substrate 107 Organic thin-film solar cell element 1 Weather-resistant protective film 2 UV cut film 3, 9 Gas barrier film 4, 8 Getter material film 5, 7 Sealing material 6 Organic thin film solar cell element 10 Back sheet 12 Base material 13 Organic thin film solar cell panel 14 Organic thin film solar cell module

Claims (6)

A method of manufacturing an organic thin film solar cell element by a roll-to-roll method,
Including a transporting step of transporting a laminate having a layer formed on a substrate using a nip roll mechanism;
In the transporting process, when the surface hardness of the two rolls used in the nip roll mechanism is T1 and T2 (T1 ≧ T2), the stacking surface of the stacked body is transported so as to be in contact with the roll having the surface hardness T1. A method for producing an organic thin film solar cell element.   The manufacturing method according to claim 1, wherein the laminate in which the layer is formed on the substrate is a laminate of the substrate, the lower electrode, and the active layer and / or the buffer layer.   The manufacturing method according to claim 2, wherein the active layer and / or the buffer layer is formed by coating.   The manufacturing method according to claim 2, wherein the total thickness of the active layer and / or the buffer layer is 10 nm or more.   The manufacturing method according to any one of claims 1 to 4, wherein the roll having a surface hardness T1 is a metal roll.   The manufacturing method according to any one of claims 1 to 5, wherein the roll having a surface hardness T2 is a rubber roll.

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