JP2014013816A - Electrolyte impregnation apparatus and electrolyte injection method - Google Patents

Electrolyte impregnation apparatus and electrolyte injection method Download PDF

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JP2014013816A
JP2014013816A JP2012150450A JP2012150450A JP2014013816A JP 2014013816 A JP2014013816 A JP 2014013816A JP 2012150450 A JP2012150450 A JP 2012150450A JP 2012150450 A JP2012150450 A JP 2012150450A JP 2014013816 A JP2014013816 A JP 2014013816A
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electrolytic solution
electrolyte
workpiece
liquid level
chamber
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Masaru Tanaka
優 田中
Eisaku Nakao
栄作 中尾
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Shimadzu Corp
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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    • Y02E60/13Energy storage using capacitors

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Abstract

PROBLEM TO BE SOLVED: To provide an electrolyte impregnation apparatus and an electrolyte injection method which inhibit insufficient injection of an electrolyte that is caused by lowering of a liquid surface of the electrolyte when the electrolyte is injected into a workpiece.SOLUTION: An electrolyte impregnation apparatus includes: an electrolyte vessel which is disposed in a chamber, the electrolyte vessel where a recessed part including a workpiece wetted groove for immersing a workpiece in an electrolyte and a liquid storage region continuously connecting with the workpiece wetted groove is formed on an upper surface and the electrolyte is stored in the workpiece wetted groove and the liquid storage region; a support mechanism which supports the workpiece at a position, where an upper end of an inlet port becomes lower than a liquid surface of the electrolyte, in the chamber; a vacuum pump which evacuates the chamber; a gas introduction mechanism which introduces a gas into the chamber in the vacuum state; and a liquid surface adjustment device which supplies the electrolyte to the electrolyte vessel according to a position of the liquid surface of the electrolyte in the electrolyte vessel to adjust the position of the liquid surface so that the position of the liquid surface, which is lowered by injection of the electrolyte into the workpiece, does not become lower than the upper end of the inlet port.

Description

本発明は、電解液に浸漬させたワーク内部に電解液を注入する電解液含浸装置及び電解液注入方法に関する。   The present invention relates to an electrolytic solution impregnation apparatus and an electrolytic solution injection method for injecting an electrolytic solution into a workpiece immersed in the electrolytic solution.

電解コンデンサの製造などにおいて、真空差圧法を用いてワーク内部に電解液を注入する方法が採用されている。(例えば、特許文献1参照。)。この場合、ワークの表面に配置された電解液の注入口が電解液中になるように、ワークが電解液に浸漬される。ワークの電解液に浸漬された部分の表面には高価な電解液が付着するため、製造コストの抑制や洗浄処理の観点などから電解液に浸漬されるワークの表面積は小さいほどよい。このため、ワークの注入口の位置が電解液の液面から深くない位置にあるように、ワークを電解液に浸漬することが好ましい。   In the production of electrolytic capacitors, a method of injecting an electrolytic solution into a workpiece using a vacuum differential pressure method is employed. (For example, refer to Patent Document 1). In this case, the workpiece is immersed in the electrolytic solution so that the inlet of the electrolytic solution disposed on the surface of the workpiece is in the electrolytic solution. Since an expensive electrolytic solution adheres to the surface of the part immersed in the electrolytic solution of the workpiece, the surface area of the workpiece immersed in the electrolytic solution is preferably as small as possible from the viewpoint of suppressing the manufacturing cost and cleaning treatment. For this reason, it is preferable to immerse a workpiece | work in electrolyte solution so that the position of the injection port of a workpiece | work exists in the position which is not deep from the liquid level of electrolyte solution.

特開2003−217991号公報JP 2003-217991 A

しかしながら、ワーク内部に電解液が注入されるに従って、電解液の液面が下降する。その結果、ワークの注入口が電解液の液面よりも上方になって、ワーク内部に電解液が注入されなくなるという問題が生じる。このため、ワーク内部に十分な量の電解液が注入されずに製品不良が発生する。   However, as the electrolytic solution is injected into the work, the liquid level of the electrolytic solution is lowered. As a result, there arises a problem that the work inlet becomes higher than the liquid level of the electrolytic solution and the electrolytic solution is not injected into the work. For this reason, a defective product occurs because a sufficient amount of electrolyte is not injected into the workpiece.

上記問題点に鑑み、本発明は、ワーク内部への電解液の注入時における電解液の液面の低下による電解液の注入不足を抑制可能な電解液含浸装置及び電解液注入方法を提供する。   In view of the above problems, the present invention provides an electrolytic solution impregnation apparatus and an electrolytic solution injection method capable of suppressing insufficient injection of electrolytic solution due to a decrease in the electrolytic solution level during injection of electrolytic solution into a workpiece.

本願発明の一態様によれば、表面に注入口が配置されたワークに真空差圧法によって電解液を注入する電解液含浸装置であって、(イ)チャンバーと、(ロ)チャンバー内に配置され、ワークが電解液に浸漬されるワーク接液溝及びそのワーク接液溝に連接する蓄液領域を含む凹部が上面に形成され、ワーク接液溝及び蓄液領域に電解液が収納された電解液槽と、(ハ)ワークの少なくとも一部をワーク接液溝で電解液に浸漬させ、注入口の上端が電解液の液面よりも下になる位置でチャンバー内でワークを支持する支持機構と、(ニ)チャンバー内を真空にする真空ポンプと、(ホ)電解液に注入口全体が浸された状態で、真空状態のチャンバー内にガスを導入するガス導入機構と、(ヘ)ワークに電解液が注入されることによって低下する液面の位置が注入口の上端よりも下の位置にならないように、電解液槽内の電解液の液面の位置に応じて電解液槽に電解液を供給して液面の位置を調整する液面調整装置とを備える電解液含浸装置が提供される。   According to one aspect of the present invention, there is provided an electrolytic solution impregnating apparatus for injecting an electrolytic solution into a workpiece having an injection port disposed on a surface by a vacuum differential pressure method, wherein the (a) chamber and (b) the chamber are disposed in the chamber. An electrolytic process in which a concave part including a work wetted groove in which the work is immersed in the electrolytic solution and a liquid storage region connected to the work wetted groove is formed on the upper surface, and the electrolytic solution is stored in the work wetted groove and the liquid storage region. A support mechanism that supports the work in the chamber at a position where the upper end of the injection port is below the liquid level of the electrolytic solution by immersing at least a part of the work in the liquid bath and (c) the work wetted groove (D) a vacuum pump that evacuates the chamber; (e) a gas introduction mechanism that introduces gas into the vacuum chamber while the entire inlet is immersed in the electrolyte; and (f) a work piece Reduced by injecting electrolyte into Adjust the position of the liquid level by supplying the electrolyte to the electrolyte tank according to the position of the electrolyte in the electrolyte tank so that the position of the liquid level does not fall below the top of the inlet. An electrolytic solution impregnation device is provided that includes a liquid level adjustment device.

本願発明の他の態様によれば、(イ)処理対象のワークが電解液に浸漬されるワーク接液溝及びそのワーク接液溝に連接する蓄液領域を含む凹部が上面に形成され、ワーク接液溝及び蓄液領域に電解液が収納された電解液槽を、チャンバー内に格納するステップと、(ロ)チャンバー内を真空にした後、ワークの少なくとも一部をワーク接液溝で電解液に浸漬させ、ワークの注入口の上端が電解液の液面よりも下になる位置でチャンバー内でワークを支持するステップと、(ハ)電解液に注入口全体が浸された状態で真空状態のチャンバー内にガスを導入して、ワーク内に電解液を注入するステップと、(ニ)ワーク内に電解液を注入した後の電解液槽内の電解液の液面の位置に応じて電解液槽に電解液を供給して、新たなワークに電解液が注入されることによって低下する液面の位置が注入口の上端よりも下の位置にならないように、液面の位置を調整するステップとを含む電解液注入方法が提供される。   According to another aspect of the present invention, (a) a work wetted groove in which a workpiece to be treated is immersed in an electrolytic solution and a recess including a liquid storage region connected to the work wetted groove are formed on the upper surface. A step of storing the electrolytic solution tank in which the electrolytic solution is stored in the liquid contact groove and the liquid storage region in the chamber; and (b) after evacuating the chamber, at least a part of the work is electrolyzed by the work liquid contact groove. A step of supporting the workpiece in the chamber at a position where the upper end of the workpiece inlet is below the electrolyte level, and (c) a vacuum with the entire inlet immersed in the electrolyte. Injecting gas into the chamber in the state and injecting the electrolyte into the workpiece, and (d) depending on the position of the electrolyte surface in the electrolyte tank after injecting the electrolyte into the workpiece Supply the electrolyte to the electrolyte bath, and the electrolyte will be applied to the new workpiece. The position of the liquid surface to be lowered by being input in such a way not to a position below the upper end of the inlet, an electrolyte injection method comprising the step of adjusting the position of the liquid surface is provided.

本発明によれば、ワーク内部への電解液の注入時における電解液の液面の低下による電解液の注入不足を抑制可能な電解液含浸装置及び電解液注入方法を提供できる。   ADVANTAGE OF THE INVENTION According to this invention, the electrolyte solution impregnation apparatus and electrolyte solution injection method which can suppress the injection | pouring insufficient of the electrolyte solution by the fall of the liquid level of the electrolyte solution at the time of injection | pouring of the electrolyte solution inside a workpiece | work can be provided.

本発明の実施形態に係る電解液含浸装置の構成を示す模式図である。It is a schematic diagram which shows the structure of the electrolyte solution impregnation apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る電解液含浸装置の電解液槽の構造を示す模式的な平面図である。It is a typical top view which shows the structure of the electrolyte solution tank of the electrolyte solution impregnation apparatus which concerns on embodiment of this invention. 図1のIII−III方向に沿った模式的な断面図である。It is typical sectional drawing along the III-III direction of FIG. 図1のIV−IV方向に沿った模式的な断面図である。It is typical sectional drawing along the IV-IV direction of FIG. 本発明の実施形態に係る電解液含浸装置によって複数のワークに電解液を同時に注入する例を示す模式図である。It is a schematic diagram which shows the example which inject | pours electrolyte solution into a some workpiece | work simultaneously by the electrolyte solution impregnation apparatus which concerns on embodiment of this invention. 比較例の電解液槽の構造を示す模式的な平面図である。It is a typical top view which shows the structure of the electrolyte solution tank of a comparative example. 本発明の実施形態に係る電解液含浸装置による液面調整方法を説明するための模式図である。It is a schematic diagram for demonstrating the liquid level adjustment method by the electrolyte solution impregnation apparatus which concerns on embodiment of this invention. 基準位置と液面位置との差を示す模式図である。It is a schematic diagram which shows the difference of a reference | standard position and a liquid level position. 本発明の実施形態に係る電解液含浸装置による電解液注入方法を説明するためのフローチャートである。It is a flowchart for demonstrating the electrolyte solution injection method by the electrolyte solution impregnation apparatus which concerns on embodiment of this invention.

次に、図面を参照して、本発明の実施形態を説明する。以下の図面の記載において、同一又は類似の部分には同一又は類似の符号を付している。又、以下に示す実施形態は、この発明の技術的思想を具体化するための装置や方法を例示するものであって、この発明の技術的思想は、構成部品の構造、配置等を下記のものに特定するものでない。この発明の技術的思想は、特許請求の範囲において、種々の変更を加えることができる。   Next, an embodiment of the present invention will be described with reference to the drawings. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. Further, the following embodiments exemplify apparatuses and methods for embodying the technical idea of the present invention, and the technical idea of the present invention is the structure, arrangement, etc. of the component parts described below. It is not something specific. The technical idea of the present invention can be variously modified within the scope of the claims.

本発明の実施形態に係る電解液含浸装置1は、図1に示すように、チャンバー10と、チャンバー10内に配置され、電解液200が収納された電解液槽20と、ワーク100の少なくとも一部を電解液200に浸漬させ、チャンバー10内でワーク100を支持する支持機構30と、ワーク100が格納されたチャンバー10内を真空にする真空ポンプ40と、真空状態のチャンバー10内にガス500を導入するガス導入機構50と、電解液槽20内の電解液200の液面201の位置に応じて電解液槽20に電解液200を供給して液面201の位置を調整する液面調整装置60とを備える。   As shown in FIG. 1, an electrolytic solution impregnation apparatus 1 according to an embodiment of the present invention includes at least one of a chamber 10, an electrolytic solution tank 20 disposed in the chamber 10 and containing an electrolytic solution 200, and a workpiece 100. The support mechanism 30 that supports the workpiece 100 in the chamber 10, the vacuum pump 40 that evacuates the chamber 10 in which the workpiece 100 is stored, and the gas 500 in the vacuum chamber 10. Level adjustment for supplying the electrolytic solution 200 to the electrolytic solution tank 20 and adjusting the position of the liquid level 201 according to the position of the liquid level 201 of the electrolytic solution 200 in the electrolytic solution tank 20 Device 60.

ワーク100の表面に配置された注入口110はワーク100内部の空洞に接続しており、注入口110から電解液200がワーク100内部に注入される。ワーク100は、例えば電解二重層コンデンサ(EDLC)などの電解コンデンサ、或いは二次電池などの電解液収納容器である。   The inlet 110 arranged on the surface of the workpiece 100 is connected to a cavity inside the workpiece 100, and the electrolytic solution 200 is injected into the workpiece 100 from the inlet 110. The workpiece 100 is, for example, an electrolytic capacitor such as an electrolytic double layer capacitor (EDLC) or an electrolytic solution storage container such as a secondary battery.

液面調整装置60は、ワーク100に電解液200が注入されることによって低下する液面201の位置がワーク100の注入口110の上端よりも下の位置にならないように、液面201の位置を調整する。液面調整装置60による液面201の位置の調整は、ワーク100への電解液200の注入が終了した後、新たなワーク100に電解液200を注入する工程の前に行われる。つまり、ワーク100交換時に、次に電解液200が注入されるワーク100の注入口110が電解液200の注入工程中に液面201よりも上方にならないように、予め液面201の位置の調整が行われる。ワーク100への電解液注入工程では、図1に示すように液面調整装置60はチャンバー10の外部に配置されている。液面調整装置60の機能の詳細は後述する。   The liquid level adjusting device 60 is arranged so that the position of the liquid level 201 that decreases when the electrolytic solution 200 is injected into the workpiece 100 does not fall below the upper end of the inlet 110 of the workpiece 100. Adjust. The adjustment of the position of the liquid level 201 by the liquid level adjusting device 60 is performed after the injection of the electrolytic solution 200 into the workpiece 100 is completed and before the step of injecting the electrolytic solution 200 into the new workpiece 100. That is, when the workpiece 100 is replaced, the position of the liquid level 201 is adjusted in advance so that the injection port 110 of the workpiece 100 into which the electrolytic solution 200 is injected next does not become higher than the liquid level 201 during the injection process of the electrolytic solution 200. Is done. In the step of injecting the electrolytic solution into the workpiece 100, the liquid level adjusting device 60 is disposed outside the chamber 10 as shown in FIG. Details of the function of the liquid level adjusting device 60 will be described later.

電解液槽20は昇降機構70によって支持される。具体的には、ワーク100に電解液200を注入する場合に、電解液槽20を上昇させてチャンバー10内に格納させる。ワーク100内に電解液200を注入した後は、電解液槽20を下降させてチャンバー10の外部に移動させる。   The electrolyte bath 20 is supported by the lifting mechanism 70. Specifically, when the electrolytic solution 200 is injected into the workpiece 100, the electrolytic solution tank 20 is raised and stored in the chamber 10. After injecting the electrolytic solution 200 into the workpiece 100, the electrolytic solution tank 20 is lowered and moved to the outside of the chamber 10.

図2に電解液槽20の構造例を示す。電解液槽20の上面には、ワーク100が電解液200に浸漬されるワーク接液溝210及びワーク接液溝210に連接する蓄液領域221、222からなる凹部が上面に形成されている。そして、ワーク接液溝210及び蓄液領域221、222には電解液200が収納されている。   FIG. 2 shows an example of the structure of the electrolytic solution tank 20. On the upper surface of the electrolytic solution tank 20, a concave portion made up of a workpiece contact groove 210 in which the workpiece 100 is immersed in the electrolyte solution 200 and liquid storage regions 221 and 222 connected to the workpiece contact groove 210 is formed on the upper surface. In addition, an electrolytic solution 200 is accommodated in the workpiece liquid contact groove 210 and the liquid storage regions 221 and 222.

図3、図4に、ワーク100がワーク接液溝210に浸漬された状態を示す。電解液200は高価であるため、ワーク100の表面に付着する電解液200の量をできるだけ少なくすることが好ましい。例えば、注入口110はワーク100の底面の角部周辺に配置する。これにより電解液200中に浸漬されるワークの表面積を小さくできる。その結果、ワーク100を電解液200から引き出す際にワーク100の表面に付着する電解液200の量を少なくできる。   3 and 4 show a state in which the workpiece 100 is immersed in the workpiece contact groove 210. FIG. Since the electrolytic solution 200 is expensive, it is preferable to reduce the amount of the electrolytic solution 200 attached to the surface of the workpiece 100 as much as possible. For example, the injection port 110 is disposed around the corner of the bottom surface of the workpiece 100. Thereby, the surface area of the work immersed in the electrolytic solution 200 can be reduced. As a result, the amount of the electrolytic solution 200 that adheres to the surface of the workpiece 100 when the workpiece 100 is pulled out of the electrolytic solution 200 can be reduced.

このため、支持機構30は、ワーク100の注入口110が配置された角部周辺が最下箇所になるように傾けた姿勢でワーク100を保持する。そして、注入口110を含むワーク100の一部をワーク接液溝210で電解液200に浸漬させる。つまり、図4に示したように、電解液200の液面201に対してワーク100の底面が一定の角度をなすように、ワーク100は支持される。このとき、注入口110の上端が電解液200の液面201よりも下になる位置で、チャンバー10内でワーク100が支持される。   For this reason, the support mechanism 30 holds the workpiece 100 in an inclined posture so that the periphery of the corner where the injection port 110 of the workpiece 100 is disposed is the lowest position. Then, a part of the workpiece 100 including the injection port 110 is immersed in the electrolytic solution 200 through the workpiece contact groove 210. That is, as shown in FIG. 4, the workpiece 100 is supported so that the bottom surface of the workpiece 100 forms a certain angle with respect to the liquid level 201 of the electrolytic solution 200. At this time, the workpiece 100 is supported in the chamber 10 at a position where the upper end of the injection port 110 is below the liquid level 201 of the electrolytic solution 200.

ガス導入機構50は、電解液200にワーク100の注入口110全体が浸された状態で、真空状態のチャンバー10内に窒素ガスなどのガス500を導入する。これにより、電解液含浸装置1では、減圧を利用した真空差圧法によってワーク100の中に電解液200が注入される。なお、図5に示すように、複数のワーク100をワーク接液溝210で電解液200に浸漬させてもよい。これにより、複数のワーク100に電解液200を同時に注入することができる。   The gas introduction mechanism 50 introduces a gas 500 such as nitrogen gas into the vacuum chamber 10 in a state where the entire injection port 110 of the workpiece 100 is immersed in the electrolytic solution 200. Thereby, in the electrolytic solution impregnation apparatus 1, the electrolytic solution 200 is injected into the workpiece 100 by a vacuum differential pressure method using reduced pressure. As shown in FIG. 5, a plurality of workpieces 100 may be immersed in the electrolytic solution 200 through the workpiece wetted grooves 210. Thereby, the electrolyte solution 200 can be simultaneously injected into the plurality of workpieces 100.

ここで、蓄液領域221、222を有する電解液槽20の効果について説明する。例えば、図6に示したように、蓄液領域221、222を形成せずにワーク接液溝210のみを上面に形成した電解液槽20Aの場合、電解液槽20Aに収納される電解液200の量が少ない。このため、ワーク100に電解液200が注入されるに従って、電解液200の液面201が急速に低下する。したがって、電解液200の注入工程の途中で、ワーク100の注入口110よりも液面201が下がって、電解液200の注入不足が発生するおそれがある。   Here, the effect of the electrolytic solution tank 20 having the liquid storage regions 221 and 222 will be described. For example, as shown in FIG. 6, in the case of the electrolytic solution tank 20A in which only the workpiece contact groove 210 is formed on the upper surface without forming the liquid storage regions 221, 222, the electrolytic solution 200 stored in the electrolytic solution tank 20A. The amount of is small. For this reason, as the electrolytic solution 200 is injected into the workpiece 100, the liquid level 201 of the electrolytic solution 200 rapidly decreases. Therefore, in the middle of the injection process of the electrolytic solution 200, the liquid level 201 may be lower than the injection port 110 of the workpiece 100, and the injection of the electrolytic solution 200 may be insufficient.

これに対し、図2に示した電解液槽20では、ワーク接液溝210だけでなく、蓄液領域221、222にも電解液200が収納されている。このため、電解液槽20に収納される電解液200の全体量が多い。したがって、ワーク100への電解液200の注入に伴う電解液200の液面201の低下が緩やかである。その結果、ワーク100内部への電解液200の注入時における液面201の低下による電解液200の注入不足が抑制される。   On the other hand, in the electrolytic solution tank 20 shown in FIG. 2, the electrolytic solution 200 is stored not only in the workpiece liquid contact groove 210 but also in the liquid storage regions 221 and 222. For this reason, the total amount of the electrolytic solution 200 accommodated in the electrolytic solution tank 20 is large. Therefore, the decrease in the liquid level 201 of the electrolytic solution 200 accompanying the injection of the electrolytic solution 200 into the workpiece 100 is gradual. As a result, insufficient injection of the electrolytic solution 200 due to a decrease in the liquid level 201 when the electrolytic solution 200 is injected into the workpiece 100 is suppressed.

なお、蓄液領域221、222などの蓄液領域の形状や位置は図2に示したものに限られず、例えば蓄液領域を丸形状以外の多角形や矩形にしてもよい。また、蓄液領域の数は2つに限定されず、例えば1つでもよい。   In addition, the shape and position of liquid storage area | regions, such as the liquid storage area | regions 221 and 222, are not restricted to what was shown in FIG. 2, For example, you may make a liquid storage area | region into polygons and rectangles other than round shape. Moreover, the number of liquid storage area | regions is not limited to two, For example, one may be sufficient.

図1に示した電解液含浸装置1では、ワーク100の注入口110が電解液200の液面201よりも常に低い位置にあるように、液面調整装置60が電解液槽20内の電解液200の液面201の位置を調整する。液面調整装置60の機能を以下に説明する。   In the electrolytic solution impregnating apparatus 1 shown in FIG. 1, the liquid level adjusting device 60 is disposed in the electrolytic solution tank 20 so that the inlet 110 of the workpiece 100 is always at a position lower than the liquid level 201 of the electrolytic solution 200. The position of the liquid level 201 of 200 is adjusted. The function of the liquid level adjusting device 60 will be described below.

液面調整装置60は、図1に示したように、検出装置61と電解液供給装置62とを有する。既に述べたように、液面調整装置60による液面201の位置の調整は、ワーク100の交換時に行われる。液面201の位置調整時には、図7に示すように、検出装置61と電解液供給装置62の供給ノズル65がチャンバー10内に配置される。または、電解液槽20をチャンバー10の外に移動し、チャンバー10外において図7の位置関係で電解液槽20と検出装置61及び供給ノズル65を配置する。   As shown in FIG. 1, the liquid level adjustment device 60 includes a detection device 61 and an electrolytic solution supply device 62. As already described, the adjustment of the position of the liquid level 201 by the liquid level adjustment device 60 is performed when the workpiece 100 is replaced. When the position of the liquid surface 201 is adjusted, as shown in FIG. 7, the detection device 61 and the supply nozzle 65 of the electrolyte supply device 62 are arranged in the chamber 10. Alternatively, the electrolytic solution tank 20 is moved out of the chamber 10, and the electrolytic solution tank 20, the detection device 61, and the supply nozzle 65 are arranged outside the chamber 10 in the positional relationship of FIG. 7.

検出装置61は、電解液200の液面201の位置に関わらず電解液注入工程において一定の高さに保たれる位置(以下において、「基準位置H1」という。)、及び液面201の位置(以下において、「液面位置H2」という。)を検出する。   The detection device 61 has a position (hereinafter referred to as “reference position H <b> 1”) that is maintained at a constant height in the electrolytic solution injection process regardless of the position of the liquid level 201 of the electrolytic solution 200, and the position of the liquid level 201. (Hereinafter referred to as “liquid level H2”).

基準位置H1を測定する場所は、例えば電解液槽20の上面などに設定する。具体的には、ワーク接液溝210及び蓄液領域221、222が形成された領域の残余の領域である、例えば図2に破線で示した領域(以下において、「基準位置測定領域230」という。)に設定する。液面位置H2として、例えば蓄液領域221の液面201の位置を測定する。検出装置61には、基準位置測定領域230と蓄液領域221の液面201にそれぞれ超音波を照射して基準位置H1と液面位置H2を検出する超音波センサーなどを採用可能である。   The place where the reference position H1 is measured is set, for example, on the upper surface of the electrolytic solution tank 20 or the like. Specifically, for example, a region indicated by a broken line in FIG. 2 (hereinafter referred to as “reference position measurement region 230”), which is a remaining region of the region where the workpiece wet groove 210 and the liquid storage regions 221 and 222 are formed. )). As the liquid level position H2, for example, the position of the liquid level 201 in the liquid storage region 221 is measured. The detection device 61 may employ an ultrasonic sensor that detects the reference position H1 and the liquid surface position H2 by irradiating the liquid surface 201 of the reference position measurement region 230 and the liquid storage region 221 with ultrasonic waves, respectively.

電解液供給装置62は、図8に示すように定義される基準位置H1と液面位置H2との高低差に応じて、電解液槽20に電解液200を供給する。具体的には、電解液供給装置62は、基準位置H1と液面位置H2との差が予め設定された設定値よりも大きい場合に、電解液槽20に電解液200を供給する。   The electrolytic solution supply device 62 supplies the electrolytic solution 200 to the electrolytic solution tank 20 according to the height difference between the reference position H1 and the liquid level position H2 defined as shown in FIG. Specifically, the electrolytic solution supply device 62 supplies the electrolytic solution 200 to the electrolytic solution tank 20 when the difference between the reference position H1 and the liquid level position H2 is larger than a preset value.

このとき、基準位置H1と液面位置H2との差が設定値よりも大きい場合には次のワーク100への電解液200の注入工程中に電解液200の液面201がワーク100の注入口110の上端よりも低下する可能性が高いように、設定値が決められている。例えば、ワーク100を電解液200に浸漬したことによる液面201の上昇や、新たなワーク100に所定量の電解液200を注入することによる液面201の下降などを考慮して、次の電解液注入工程が完了するまで電解液200の液面201がワーク100の注入口110の上端よりも下の位置にならないように、電解液槽20に電解液200を供給開始する基準である設定値が決定される。   At this time, when the difference between the reference position H1 and the liquid level position H2 is larger than the set value, the liquid level 201 of the electrolytic solution 200 is changed to the inlet of the workpiece 100 during the injection process of the electrolytic solution 200 to the next workpiece 100. The set value is determined so that the possibility of lowering than the upper end of 110 is high. For example, considering the rise of the liquid level 201 caused by immersing the workpiece 100 in the electrolytic solution 200, the lowering of the liquid level 201 caused by injecting a predetermined amount of the electrolytic solution 200 into the new workpiece 100, etc. A set value that is a reference for starting to supply the electrolytic solution 200 to the electrolytic solution tank 20 so that the liquid level 201 of the electrolytic solution 200 does not fall below the upper end of the inlet 110 of the workpiece 100 until the liquid injection step is completed. Is determined.

基準位置H1と液面位置H2の差が設定値よりも大きい場合には、電解液供給装置62は、電解液200が貯蔵された電解液タンク63と供給ノズル65とをつなぐ送液ライン66の途中に設置された供給バルブ64に信号Sを送信する。これにより供給バルブ64が開き、電解液タンク63から送られた電解液200が、供給ノズル65から電解液槽20に供給される。供給ノズル65は、例えば蓄液領域222の上方に配置され、蓄液領域222から電解液槽20に電解液200を供給する。   When the difference between the reference position H1 and the liquid surface position H2 is larger than the set value, the electrolytic solution supply device 62 uses the liquid supply line 66 that connects the electrolytic solution tank 63 in which the electrolytic solution 200 is stored and the supply nozzle 65 to each other. A signal S is transmitted to the supply valve 64 installed on the way. As a result, the supply valve 64 is opened, and the electrolytic solution 200 sent from the electrolytic solution tank 63 is supplied from the supply nozzle 65 to the electrolytic solution tank 20. The supply nozzle 65 is disposed, for example, above the liquid storage region 222 and supplies the electrolytic solution 200 from the liquid storage region 222 to the electrolytic solution tank 20.

電解液タンク63から電解液槽20に供給される電解液200の量は、基準位置H1よりも液面位置H2が一定の距離だけ下方に位置するように設定される。このとき、電解液槽20が移動することによって生じる揺れや、ワーク100をワーク接液溝210に浸漬することにより、電解液槽20から電解液200が溢れないように電解液槽20に供給される電解液200の量が設定される。例えば、基準位置H1と液面位置H2との差が0.2mm程度になるように、電解液タンク63から電解液槽20に供給される電解液200の量を設定する。   The amount of the electrolytic solution 200 supplied from the electrolytic solution tank 63 to the electrolytic solution tank 20 is set such that the liquid level position H2 is positioned below the reference position H1 by a certain distance. At this time, the electrolytic bath 20 is supplied to the electrolytic bath 20 so as not to overflow from the electrolytic bath 20 by shaking the electrolytic bath 20 or by immersing the workpiece 100 in the workpiece wetted groove 210. The amount of electrolytic solution 200 to be set is set. For example, the amount of the electrolytic solution 200 supplied from the electrolytic solution tank 63 to the electrolytic solution tank 20 is set so that the difference between the reference position H1 and the liquid level position H2 is about 0.2 mm.

所定の量だけ電解液槽20に電解液200が供給された後、電解液供給装置62の制御によって供給ノズル65が閉じられ、電解液タンク63から電解液槽20への電解液200の供給が停止する。   After the electrolytic solution 200 is supplied to the electrolytic solution tank 20 by a predetermined amount, the supply nozzle 65 is closed under the control of the electrolytic solution supply device 62, and the supply of the electrolytic solution 200 from the electrolytic solution tank 63 to the electrolytic solution tank 20 is performed. Stop.

以上のようにして、液面調整装置60は、電解液注入工程において液面201の位置が注入口110の上端よりも下の位置にならないように、電解液槽20に電解液200を供給して液面201の位置を調整する。   As described above, the liquid level adjustment device 60 supplies the electrolytic solution 200 to the electrolytic solution tank 20 so that the position of the liquid level 201 does not fall below the upper end of the injection port 110 in the electrolytic solution injection step. The position of the liquid level 201 is adjusted.

以下に、図1に示した電解液含浸装置1によってワーク100に電解液200を充填する方法の例を、図9を参照して説明する。   Hereinafter, an example of a method of filling the workpiece 100 with the electrolytic solution 200 by the electrolytic solution impregnation apparatus 1 shown in FIG. 1 will be described with reference to FIG.

先ず、ステップS11において、ワーク接液溝210及び蓄液領域221、222に電解液200が収納された電解液槽20をチャンバー10内に格納する。また、ワーク100もチャンバー10内に格納する。このとき、昇降機構70により電解液槽20が上昇した配置においてワーク100の注入口110の上端が電解液200の液面201よりも下になるように、支持機構30がワーク100を支持する。   First, in step S <b> 11, the electrolytic solution tank 20 in which the electrolytic solution 200 is stored in the workpiece liquid contact groove 210 and the liquid storage regions 221 and 222 is stored in the chamber 10. The workpiece 100 is also stored in the chamber 10. At this time, the support mechanism 30 supports the workpiece 100 such that the upper end of the inlet 110 of the workpiece 100 is below the liquid level 201 of the electrolyte 200 in the arrangement in which the electrolytic solution tank 20 is raised by the lifting mechanism 70.

次いで、ステップS12において、真空ポンプ40による排気によってチャンバー10内を真空状態にする。チャンバー10内の圧力は例えば数パスカル程度である。その後、昇降機構70により電解液槽20が上昇し、ワーク100が注入口110上部まで浸漬する。その後、ステップS13において、電解液200に注入口110が浸された状態で、ガス導入機構50によって真空状態のチャンバー10内にガス500を導入する。導入されるガス500は窒素ガスなどである。例えば、チャンバー10内の圧力が大気圧又は大気圧以上になるように導入されるガス500の流量が調整される。その結果、注入口110を介してワーク100内に電解液200が注入される。   Next, in step S <b> 12, the inside of the chamber 10 is evacuated by evacuation by the vacuum pump 40. The pressure in the chamber 10 is about several Pascals, for example. Thereafter, the electrolyte tank 20 is raised by the lifting mechanism 70, and the work 100 is immersed up to the top of the injection port 110. Thereafter, in step S <b> 13, the gas 500 is introduced into the vacuum chamber 10 by the gas introduction mechanism 50 with the injection port 110 immersed in the electrolytic solution 200. The introduced gas 500 is nitrogen gas or the like. For example, the flow rate of the gas 500 introduced is adjusted so that the pressure in the chamber 10 becomes atmospheric pressure or atmospheric pressure or higher. As a result, the electrolytic solution 200 is injected into the workpiece 100 through the injection port 110.

その後、ステップS15以降において、電解液槽20内の電解液200の液面201の位置に応じて電解液槽20に電解液200を供給して、新たなワーク100に電解液200が注入されることによって低下する液面201の位置が注入口110の上端よりも下の位置にならないように、液面201の位置が調整される。この液面調整工程においては、既に説明した方法によって、液面調整装置60が電解液槽20内の電解液200の液面201の位置を調整する。   Thereafter, in step S15 and subsequent steps, the electrolytic solution 200 is supplied to the electrolytic solution tank 20 according to the position of the liquid level 201 of the electrolytic solution 200 in the electrolytic solution tank 20, and the electrolytic solution 200 is injected into the new workpiece 100. Thus, the position of the liquid level 201 is adjusted so that the position of the liquid level 201 that is lowered does not fall below the upper end of the inlet 110. In this liquid level adjustment step, the liquid level adjustment device 60 adjusts the position of the liquid level 201 of the electrolytic solution 200 in the electrolytic solution tank 20 by the method already described.

即ち、ステップS15において、検出装置61が、基準位置H1と液面位置H2を検出する。そして、ステップS16において、電解液供給装置62が、基準位置H1と液面位置H2との差が予め設定された設定値よりも大きいか否かを判定する。基準位置H1と液面位置H2との差が設定値よりも大きい場合には、ステップS17に処理が進み、電解液槽20に電解液200が供給される。その後、処理はステップS18に進む。   That is, in step S15, the detection device 61 detects the reference position H1 and the liquid level position H2. In step S16, the electrolytic solution supply device 62 determines whether or not the difference between the reference position H1 and the liquid level position H2 is greater than a preset set value. When the difference between the reference position H1 and the liquid level position H2 is larger than the set value, the process proceeds to step S17, and the electrolytic solution 200 is supplied to the electrolytic solution tank 20. Thereafter, the process proceeds to step S18.

一方、基準位置H1と液面位置H2との差が設定値以下である場合には、ステップS18に進み、電解液200が注入されていない新たなワーク100がチャンバー10内に格納される。ステップS18の後、処理はステップS12に戻り、新たなワーク100に電解液200が注入される。   On the other hand, when the difference between the reference position H1 and the liquid level position H2 is equal to or smaller than the set value, the process proceeds to step S18, and a new workpiece 100 in which the electrolyte 200 is not injected is stored in the chamber 10. After step S18, the process returns to step S12, and the electrolytic solution 200 is injected into the new workpiece 100.

なお、ワーク100内に注入される電解液200の量と注入時間との関係を予め調査しておくことにより、ワーク100内への電解液200の注入量を注入時間によって制御することができる。つまり、電解液注入を開始してからの時間経過によって、ワーク100内に十分な量の電解液200が注入されたか否かを判断できる。   In addition, by investigating the relationship between the amount of electrolyte 200 injected into workpiece 100 and the injection time in advance, the injection amount of electrolyte 200 into workpiece 100 can be controlled by the injection time. That is, it can be determined whether or not a sufficient amount of the electrolyte 200 has been injected into the workpiece 100 as time elapses after the injection of the electrolyte is started.

以上に説明したように、本発明の実施形態に係る電解液含浸装置1では、ワーク100内に電解液200が注入されるに従って低下する電解液槽20内の電解液200の液面201の位置が、常にワーク100の注入口110の上端よりも下にあるように、電解液槽20内の電解液200の量が調整される。このため、ワーク100内が電解液200で充填された状態になるまで、注入口110が電解液200に浸っている。その結果、電解液含浸装置1によれば、ワーク100内部への電解液200の注入時における電解液200の液面201の低下による電解液200の注入不足が抑制される。   As described above, in the electrolytic solution impregnation apparatus 1 according to the embodiment of the present invention, the position of the liquid level 201 of the electrolytic solution 200 in the electrolytic solution tank 20 that decreases as the electrolytic solution 200 is injected into the workpiece 100. However, the amount of the electrolytic solution 200 in the electrolytic solution tank 20 is adjusted so that it is always below the upper end of the inlet 110 of the workpiece 100. For this reason, the injection port 110 is immersed in the electrolytic solution 200 until the workpiece 100 is filled with the electrolytic solution 200. As a result, according to the electrolytic solution impregnation apparatus 1, insufficient injection of the electrolytic solution 200 due to a decrease in the liquid level 201 of the electrolytic solution 200 when the electrolytic solution 200 is injected into the workpiece 100 is suppressed.

更に、電解液含浸装置1によれば、注入口110が電解液200にぎりぎりに浸るように電解液200の液面201の位置を調整することができる。このため、ワーク100の表面に付着する電解液200の量が少なく、ワーク100に付着した電解液200を拭き取る工程の所要時間が短縮される。また、拭き取る電解液200の量を少なくすることにより、高価な電解液200の消費量を抑制できる。   Furthermore, according to the electrolytic solution impregnation apparatus 1, the position of the liquid surface 201 of the electrolytic solution 200 can be adjusted so that the inlet 110 is immersed in the electrolytic solution 200 at the last minute. For this reason, there is little quantity of the electrolyte solution 200 adhering to the surface of the workpiece | work 100, and the required time of the process of wiping off the electrolyte solution 200 adhering to the workpiece | work 100 is shortened. Moreover, the consumption of the expensive electrolyte 200 can be suppressed by reducing the amount of the electrolyte 200 to be wiped off.

(その他の実施形態)
上記のように、本発明は実施形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。
(Other embodiments)
As mentioned above, although this invention was described by embodiment, it should not be understood that the description and drawing which form a part of this indication limit this invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art.

既に述べた実施形態の説明においては、基準位置H1と液面位置H2を検出し、これらの差を用いて電解液槽20に電解液200を注入するか否かを判定する例を示した。しかし、例えば基準位置H1が常に一定である場合には、液面位置H2のみを検出して電解液槽20に電解液200を注入するか否かを判定してもよい。   In the description of the embodiment described above, an example in which the reference position H1 and the liquid level position H2 are detected and whether or not the electrolytic solution 200 is injected into the electrolytic solution tank 20 using these differences is shown. However, for example, when the reference position H1 is always constant, it may be determined whether or not to inject the electrolyte 200 into the electrolyte bath 20 by detecting only the liquid level H2.

このように、本発明はここでは記載していない様々な実施形態等を含むことは勿論である。したがって、本発明の技術的範囲は上記の説明から妥当な特許請求の範囲に係る発明特定事項によってのみ定められるものである。   As described above, the present invention naturally includes various embodiments not described herein. Therefore, the technical scope of the present invention is defined only by the invention specifying matters according to the scope of claims reasonable from the above description.

1…電解液含浸装置
10…チャンバー
20…電解液槽
30…支持機構
40…真空ポンプ
50…ガス導入機構
60…液面調整装置
61…検出装置
62…電解液供給装置
63…電解液タンク
64…供給バルブ
65…供給ノズル
66…送液ライン
70…昇降機構
100…ワーク
110…注入口
200…電解液
201…液面
210…ワーク接液溝
221、222…蓄液領域
230…基準位置測定領域
500…ガス
DESCRIPTION OF SYMBOLS 1 ... Electrolyte impregnation apparatus 10 ... Chamber 20 ... Electrolyte tank 30 ... Support mechanism 40 ... Vacuum pump 50 ... Gas introduction mechanism 60 ... Liquid level adjustment apparatus 61 ... Detection apparatus 62 ... Electrolyte supply apparatus 63 ... Electrolyte tank 64 ... Supply valve 65 ... Supply nozzle 66 ... Liquid feed line 70 ... Elevating mechanism 100 ... Workpiece 110 ... Injection port 200 ... Electrolyte solution 201 ... Liquid level 210 ... Workpiece liquid contact groove 221, 222 ... Liquid storage area 230 ... Reference position measurement area 500 …gas

Claims (7)

表面に注入口が配置されたワークに真空差圧法によって電解液を注入する電解液含浸装置であって、
チャンバーと、
前記チャンバー内に配置され、前記ワークが電解液に浸漬されるワーク接液溝及び該ワーク接液溝に連接する蓄液領域を含む凹部が上面に形成され、前記ワーク接液溝及び前記蓄液領域に前記電解液が収納された電解液槽と、
前記ワークの少なくとも一部を前記ワーク接液溝で前記電解液に浸漬させ、前記注入口の上端が前記電解液の液面よりも下になる位置で前記チャンバー内で前記ワークを支持する支持機構と、
前記チャンバー内を真空にする真空ポンプと、
前記電解液に前記注入口全体が浸された状態で、真空状態の前記チャンバー内にガスを導入するガス導入機構と、
前記ワークに前記電解液が注入されることによって低下する前記液面の位置が前記注入口の上端よりも下の位置にならないように、前記電解液槽内の前記電解液の液面の位置に応じて前記電解液槽に前記電解液を供給して前記液面の位置を調整する液面調整装置と
を備えることを特徴とする電解液含浸装置。
An electrolyte impregnation apparatus for injecting an electrolyte into a workpiece having an injection port on the surface by a vacuum differential pressure method,
A chamber;
A concave portion including a work wetted groove in which the work is immersed in an electrolyte and a liquid storage region connected to the work wetted groove is formed on the upper surface, and the work wetted groove and the liquid stored An electrolytic solution tank in which the electrolytic solution is stored in a region;
A support mechanism for immersing at least a part of the workpiece in the electrolytic solution in the workpiece wet groove and supporting the workpiece in the chamber at a position where an upper end of the injection port is lower than a liquid level of the electrolytic solution When,
A vacuum pump for evacuating the chamber;
A gas introduction mechanism for introducing a gas into the chamber in a vacuum state in a state where the entire injection port is immersed in the electrolyte solution;
The position of the liquid level, which is lowered when the electrolytic solution is injected into the workpiece, is not lower than the upper end of the injection port. In response, an electrolytic solution impregnation apparatus comprising: a liquid level adjustment device that adjusts the position of the liquid level by supplying the electrolytic solution to the electrolytic solution tank.
前記液面調整装置が、
前記液面の位置に関わらず一定の高さに保たれる基準位置、及び前記液面の液面位置を検出する検出装置と、
前記基準位置と前記液面位置との高低差が予め設定された設定値よりも大きい場合に、前記電解液容器に前記電解液を供給する電解液供給装置と
を備えることを特徴とする請求項1に記載の電解液含浸装置。
The liquid level adjustment device,
A reference position that is maintained at a constant height regardless of the position of the liquid level, and a detection device that detects the liquid level position of the liquid level;
An electrolyte supply device that supplies the electrolyte solution to the electrolyte container when a difference in height between the reference position and the liquid level position is larger than a preset value. 2. The electrolytic solution impregnation apparatus according to 1.
前記検出装置が、超音波を照射して前記基準位置と前記液面位置を検出することを特徴とする請求項2に記載の電解液含浸装置。   The electrolytic solution impregnation apparatus according to claim 2, wherein the detection device detects the reference position and the liquid level position by irradiating ultrasonic waves. 前記液面調整装置が、前記ワークに前記電解液を注入した後の前記電解液の液面の位置に応じて前記液面の位置を調整することを特徴とする請求項1乃至3のいずれか1項に記載の電解液含浸装置。   4. The liquid level adjustment device adjusts the position of the liquid level according to the position of the liquid level of the electrolytic solution after the electrolytic solution is injected into the workpiece. 5. 2. The electrolytic solution impregnation apparatus according to item 1. 処理対象のワークが電解液に浸漬されるワーク接液溝及び該ワーク接液溝に連接する蓄液領域を含む凹部が上面に形成され、前記ワーク接液溝及び前記蓄液領域に前記電解液が収納された電解液槽を、チャンバー内に格納するステップと、
前記チャンバー内を真空にした後、前記ワークの少なくとも一部を前記ワーク接液溝で前記電解液に浸漬させ、前記ワークの注入口の上端が前記電解液の液面よりも下になる位置で前記チャンバー内で前記ワークを支持するステップと、
前記電解液に前記注入口全体が浸された状態で真空状態の前記チャンバー内にガスを導入して、前記ワーク内に前記電解液を注入するステップと、
前記ワーク内に前記電解液を注入した後の前記電解液槽内の前記電解液の前記液面の位置に応じて前記電解液槽に前記電解液を供給して、新たな前記ワークに前記電解液が注入されることによって低下する前記液面の位置が前記注入口の上端よりも下の位置にならないように、前記液面の位置を調整するステップと
を含むことを特徴とする電解液注入方法。
A work wetted groove in which a workpiece to be treated is immersed in an electrolytic solution and a recess including a liquid storage region connected to the work wetted groove are formed on the upper surface, and the electrolytic solution is formed in the work wetted groove and the liquid storage region. Storing the electrolytic solution tank in which is stored in the chamber;
After evacuating the chamber, at least a part of the workpiece is immersed in the electrolyte in the workpiece wet groove, and the upper end of the workpiece inlet is below the electrolyte level. Supporting the workpiece in the chamber;
Injecting the electrolyte into the workpiece by introducing a gas into the chamber in a vacuum state with the entire injection port immersed in the electrolyte; and
The electrolytic solution is supplied to the electrolytic solution tank according to the position of the liquid level of the electrolytic solution in the electrolytic solution tank after the electrolytic solution is injected into the workpiece, and the electrolytic solution is applied to the new workpiece. Adjusting the position of the liquid level so that the position of the liquid level that is lowered by the liquid injection does not fall below the upper end of the injection port. Method.
前記液面の位置を調整するステップが、
前記液面の位置に関わらず一定の高さに保たれる基準位置、及び前記液面の液面位置を検出するステップと、
検出された前記基準位置と前記液面位置との高低差が予め設定された設定値よりも大きい場合に、前記電解液容器に前記電解液を供給するステップと
を含むことを特徴とする請求項5に記載の電解液注入方法。
Adjusting the position of the liquid level comprises:
Detecting a reference position maintained at a constant height regardless of the position of the liquid level, and a liquid level position of the liquid level;
Supplying the electrolytic solution to the electrolytic solution container when a difference in height between the detected reference position and the liquid level position is larger than a preset set value. 5. The electrolyte solution injection method according to 5.
超音波を照射して前記基準位置と前記液面位置を検出することを特徴とする請求項6に記載の電解液注入方法。   The electrolytic solution injection method according to claim 6, wherein the reference position and the liquid level position are detected by irradiating ultrasonic waves.
JP2012150450A 2012-07-04 2012-07-04 Electrolyte impregnation apparatus and electrolyte injection method Pending JP2014013816A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018106816A (en) * 2016-12-22 2018-07-05 トヨタ自動車株式会社 Method for manufacturing battery
CN115377626A (en) * 2022-08-24 2022-11-22 上海地铁维护保障有限公司 Supplementary liquid feeding device of subway train battery

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018106816A (en) * 2016-12-22 2018-07-05 トヨタ自動車株式会社 Method for manufacturing battery
CN115377626A (en) * 2022-08-24 2022-11-22 上海地铁维护保障有限公司 Supplementary liquid feeding device of subway train battery
CN115377626B (en) * 2022-08-24 2024-03-15 上海地铁维护保障有限公司 Auxiliary liquid adding device for storage battery of subway train

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