JP2013527626A - GaN端面発光レーザの高められた平坦性 - Google Patents
GaN端面発光レーザの高められた平坦性 Download PDFInfo
- Publication number
- JP2013527626A JP2013527626A JP2013513228A JP2013513228A JP2013527626A JP 2013527626 A JP2013527626 A JP 2013527626A JP 2013513228 A JP2013513228 A JP 2013513228A JP 2013513228 A JP2013513228 A JP 2013513228A JP 2013527626 A JP2013527626 A JP 2013527626A
- Authority
- JP
- Japan
- Prior art keywords
- waveguide layer
- gan
- layer
- gainn
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3201—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures incorporating bulkstrain effects, e.g. strain compensation, strain related to polarisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3202—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth
- H01S5/320275—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth semi-polar orientation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3216—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities quantum well or superlattice cladding layers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
15 バッファ層
20 活性領域
30 N側導波層
40 P側導波層
50 N型クラッド層
55 N型GaN遷移層
60 P型クラッド層
65 P型GaN遷移層
70 P側コンタクト構造
80 電流阻止層
100 GaN端面発光レーザ
Claims (8)
- 半極性GaN基板、活性領域、N側導波層、P側導波層、N型クラッド層及びP型クラッド層を有するGaN端面発光レーザにおいて、
前記GaN基板が{2021}結晶成長面及びすべり面を定める、
前記N側導波層がGaInN/GaNまたはGaInN/GaInNの超格子(SL)導波層を含む、
前記P側導波層がGaInN/GaNまたはGaInN/GaInNの超格子(SL)導波層を含む、
前記N側SL導波層及び前記P側SL導波層の前記超格子層が導波路平坦性に対して最適化されたそれぞれの層厚を定め、前記層厚は1nmと5nmの間にある、
前記活性領域が、前記N側SL導波層と前記P側SL導波層の間に配置され、前記N側SL導波層及び前記P側SL導波層に実質的に平行に拡がる、
前記N型クラッド層が前記N側導波層と前記GaN基板の間に配置される、
前記P型クラッド層が前記P側導波層に重ねて形成される、及び
得られる歪緩和が前記GaN基板の前記すべり面に沿う単方向性であるように、前記N側SL導波層の歪-厚さ積が前記N側SL導波層の歪緩和臨界値をこえ、前記N型クラッド層の歪-厚さ積が前記N型クラッド層の歪緩和臨界値をこえる、
ことを特徴とするGaN端面発光レーザ。 - 半極性GaN基板、活性領域、N側導波層、P側導波層、N型クラッド層及びP型クラッド層を有するGaN端面発光レーザを作製する方法において、
前記GaN基板が{2021}結晶成長面及びすべり面を定める、
前記N側導波層がGaNベースの超格子(SL)導波層またはバルク導波層を含む、
前記P側導波層がGaNベースの超格子(SL)導波層またはバルク導波層を含む、
前記活性領域が、前記N側SL導波層と前記P側SL導波層の間に配置され、前記N側SL導波層及び前記P側SL導波層に実質的に平行に拡がる、
前記N型クラッド層が前記N側導波層と前記GaN基板の間に配置される、
前記P型クラッド層が前記P側導波層に重ねて形成される、
得られる歪緩和が前記GaN基板の前記すべり面に沿う単方向性であるように、前記N側SL導波層の歪-厚さ積が前記N側SL導波層の歪緩和臨界値をこえ、前記N型クラッド層の歪-厚さ積が前記N型クラッド層の歪緩和臨界値をこえる、及び
前記N側GaNベース導波層及び前記P側GaNベース導波層を、導波路平坦性を最適化するため、0.09nm/秒をこえる成長速度で成長させる、
ことを特徴とするGaN端面発光レーザを作製する方法。 - 前記N側GaNベース導波層及び前記P側GaNベース導波層を成長させる成長速度が0.095nm/秒であるかまたは0.09nm/秒と0.10nm/秒の間にあることを特徴とする請求項2に記載のGaN端面発光レーザを作製する方法。
- 請求項2に記載のGaN端面発光レーザを作製する方法において、
前記N側導波層がGaInN/GaNまたはGaInN/GaInNの超格子(SL)導波層を含む、
前記P側導波層がGaInN/GaNまたはGaInN/GaInNの超格子(SL)導波層を含む、及び
前記N側SL導波層側及び前記P側SL導波層の前記超格子層を導波路平坦性に対して最適化されたそれぞれの層厚を定めるように成長させ、前記層厚は1nmと5nmの間にある、
ことを特徴とするGaN端面発光レーザを作製する方法。 - 前記P側SL導波層及び前記N側SL導波層のそれぞれの組成が実質的に等価である、及び
前記N側SL導波層の厚さが前記P側SL導波層の厚さと少なくともほぼ同じである、
ことを特徴とする請求項1に記載のGaN端面発光レーザ。 - 前記活性領域の歪-厚さ積が前記活性領域の歪緩和臨界値より小さいことを特徴とする請求項1に記載のGaN端面発光レーザ。
- 前記活性領域が単GaInN量子井戸あるいは複周期GaInN量子井戸を含み、前記GaInN量子井戸のIn含有量が前記N側SL導波層のIn含有量より多い、及び
前記活性領域がAlGaInNバリア層をさらに含み、前記AlGaInNバリア層のIn含有量が前記N側SL導波層のIn含有量より少ない、
ことを特徴とする請求項1に記載のGaN端面発光レーザ。 - (a)前記N型クラッド層の歪-厚さ積が前記N型クラッド層の歪緩和臨界値を10%上回る、または
(b)前記N側SL導波層の歪-厚さ積が前記N側SL導波層の歪緩和臨界値を10%上回る、
の少なくとも一方であることを特徴とする請求項1に記載のGaN端面発光レーザ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/789,956 | 2010-05-28 | ||
US12/789,956 US8218595B2 (en) | 2010-05-28 | 2010-05-28 | Enhanced planarity in GaN edge emitting lasers |
PCT/US2011/038015 WO2011150135A2 (en) | 2010-05-28 | 2011-05-26 | ENHANCED PLANARITY IN GaN EDGE EMITTING LASERS |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013527626A true JP2013527626A (ja) | 2013-06-27 |
JP2013527626A5 JP2013527626A5 (ja) | 2015-10-08 |
Family
ID=45004794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013513228A Pending JP2013527626A (ja) | 2010-05-28 | 2011-05-26 | GaN端面発光レーザの高められた平坦性 |
Country Status (7)
Country | Link |
---|---|
US (2) | US8218595B2 (ja) |
EP (1) | EP2577821A4 (ja) |
JP (1) | JP2013527626A (ja) |
KR (1) | KR20130090797A (ja) |
CN (1) | CN102918727A (ja) |
TW (1) | TW201203761A (ja) |
WO (1) | WO2011150135A2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105811243B (zh) * | 2016-03-28 | 2018-10-26 | 中国科学院半导体研究所 | 应力调控波导层绿光激光器外延片及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10270756A (ja) * | 1997-03-27 | 1998-10-09 | Sanyo Electric Co Ltd | 窒化ガリウム系化合物半導体装置 |
JP2004104088A (ja) * | 2003-06-27 | 2004-04-02 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4961197A (en) | 1988-09-07 | 1990-10-02 | Hitachi, Ltd. | Semiconductor laser device |
US5679152A (en) | 1994-01-27 | 1997-10-21 | Advanced Technology Materials, Inc. | Method of making a single crystals Ga*N article |
US6459096B1 (en) | 1998-01-14 | 2002-10-01 | Manijeh Razeghi | Multi quantum well grinsch detector |
JP2002026456A (ja) | 2000-06-30 | 2002-01-25 | Toshiba Corp | 半導体装置、半導体レーザ及びその製造方法並びにエッチング方法 |
US6881983B2 (en) | 2002-02-25 | 2005-04-19 | Kopin Corporation | Efficient light emitting diodes and lasers |
KR101351396B1 (ko) * | 2005-06-01 | 2014-02-07 | 재팬 사이언스 앤드 테크놀로지 에이젼시 | 반극성 (Ga,Al,In,B)N 박막들, 헤테로구조들, 및소자들의 성장 및 제조에 대한 기술 |
KR20090018106A (ko) * | 2006-05-09 | 2009-02-19 | 더 리전츠 오브 더 유니버시티 오브 캘리포니아 | 비극성 및 준극성 (al, ga, in)n을 위한 인-시츄 결함 감소 기술 |
KR100835116B1 (ko) * | 2007-04-16 | 2008-06-05 | 삼성전기주식회사 | 질화물 반도체 발광 소자 |
WO2009035648A1 (en) * | 2007-09-14 | 2009-03-19 | Kyma Technologies, Inc. | Non-polar and semi-polar gan substrates, devices, and methods for making them |
JP2009239084A (ja) * | 2008-03-27 | 2009-10-15 | Rohm Co Ltd | 半導体レーザ素子 |
US20090238227A1 (en) * | 2008-03-05 | 2009-09-24 | Rohm Co., Ltd. | Semiconductor light emitting device |
JP4390007B2 (ja) * | 2008-04-07 | 2009-12-24 | 住友電気工業株式会社 | Iii族窒化物半導体素子及びエピタキシャルウエハ |
JP5077303B2 (ja) * | 2008-10-07 | 2012-11-21 | 住友電気工業株式会社 | 窒化ガリウム系半導体発光素子、窒化ガリウム系半導体発光素子を作製する方法、窒化ガリウム系発光ダイオード、エピタキシャルウエハ、及び窒化ガリウム系発光ダイオードを作製する方法 |
US8481991B2 (en) * | 2009-08-21 | 2013-07-09 | The Regents Of The University Of California | Anisotropic strain control in semipolar nitride quantum wells by partially or fully relaxed aluminum indium gallium nitride layers with misfit dislocations |
KR20130056206A (ko) * | 2010-04-05 | 2013-05-29 | 더 리전츠 오브 더 유니버시티 오브 캘리포니아 | 반극성 면 ⅲ-족 질화물 반도체-계 발광 다이오드들 및 레이저 다이오드들을 위한 알루미늄 갈륨 질화물 배리어들 및 분리 구속 헤테로구조 층들 |
-
2010
- 2010-05-28 US US12/789,956 patent/US8218595B2/en not_active Expired - Fee Related
-
2011
- 2011-05-19 TW TW100117622A patent/TW201203761A/zh unknown
- 2011-05-26 JP JP2013513228A patent/JP2013527626A/ja active Pending
- 2011-05-26 CN CN2011800263266A patent/CN102918727A/zh active Pending
- 2011-05-26 KR KR1020127033871A patent/KR20130090797A/ko not_active Application Discontinuation
- 2011-05-26 WO PCT/US2011/038015 patent/WO2011150135A2/en active Application Filing
- 2011-05-26 EP EP11787379.4A patent/EP2577821A4/en not_active Withdrawn
-
2012
- 2012-06-11 US US13/493,355 patent/US8355422B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10270756A (ja) * | 1997-03-27 | 1998-10-09 | Sanyo Electric Co Ltd | 窒化ガリウム系化合物半導体装置 |
JP2004104088A (ja) * | 2003-06-27 | 2004-04-02 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
Non-Patent Citations (1)
Title |
---|
JPN6015013918; 小松原松幸ら: '歪補償InAsP-MQWのMOMBE成長と臨界膜厚の解析' 信学技報 ED95-119, 1995, p19-24 * |
Also Published As
Publication number | Publication date |
---|---|
EP2577821A4 (en) | 2015-08-12 |
EP2577821A2 (en) | 2013-04-10 |
CN102918727A (zh) | 2013-02-06 |
US8218595B2 (en) | 2012-07-10 |
US20110292958A1 (en) | 2011-12-01 |
US8355422B2 (en) | 2013-01-15 |
KR20130090797A (ko) | 2013-08-14 |
TW201203761A (en) | 2012-01-16 |
WO2011150135A2 (en) | 2011-12-01 |
WO2011150135A3 (en) | 2012-04-05 |
US20120244654A1 (en) | 2012-09-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11552452B2 (en) | Semi-polar III-nitride optoelectronic devices on m-plane substrates with miscuts less than +/− 15 degrees in the c-direction | |
Hardy et al. | Group III-nitride lasers: a materials perspective | |
US20100309943A1 (en) | LONG WAVELENGTH NONPOLAR AND SEMIPOLAR (Al,Ga,In)N BASED LASER DIODES | |
US8189639B2 (en) | GaN-based laser diodes with misfit dislocations displaced from the active region | |
KR20120104990A (ko) | 에칭된 미러들을 구비하는 반극성 {20-21} ⅲ-족 질화물 레이저 다이오드들 | |
US20130329760A1 (en) | Semiconductor lasers with indium containing cladding layers | |
US20130100978A1 (en) | Hole blocking layer for the prevention of hole overflow and non-radiative recombination at defects outside the active region | |
US10186835B2 (en) | Monolithic integration of optically pumped III-nitride devices | |
JP2013527626A (ja) | GaN端面発光レーザの高められた平坦性 | |
JP2013527626A5 (ja) | ||
WO2015123566A1 (en) | Monolithically integrated white light-emitting devices | |
WO2014127136A1 (en) | High power blue-violet iii-nitride semipolar laser diodes | |
JP2006210795A (ja) | 化合物半導体発光素子 | |
Hardy et al. | Demonstration of a Relaxed Waveguide Semipolar (20 2¯ 1) InGaN/GaN Laser Diode | |
Kelchner et al. | Progress in Nonpolar and Semipolar GaN Materials and Devices | |
Tyagi | 500 nm Semipolar Gallium Nitride-Based Laser Diodes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20140522 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20150326 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150414 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20150710 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20150814 |
|
A524 | Written submission of copy of amendment under section 19 (pct) |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20150820 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20151222 |