JP2013257582A5 - - Google Patents
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- JP2013257582A5 JP2013257582A5 JP2013157116A JP2013157116A JP2013257582A5 JP 2013257582 A5 JP2013257582 A5 JP 2013257582A5 JP 2013157116 A JP2013157116 A JP 2013157116A JP 2013157116 A JP2013157116 A JP 2013157116A JP 2013257582 A5 JP2013257582 A5 JP 2013257582A5
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- JP
- Japan
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- 230000005855 radiation Effects 0.000 claims 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 14
- 239000002253 acid Substances 0.000 claims 12
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 239000011342 resin composition Substances 0.000 claims 11
- 125000003118 aryl group Chemical group 0.000 claims 10
- 150000001875 compounds Chemical class 0.000 claims 10
- 125000000753 cycloalkyl group Chemical group 0.000 claims 10
- 239000000203 mixture Substances 0.000 claims 7
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 6
- 125000002947 alkylene group Chemical group 0.000 claims 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims 6
- 125000005843 halogen group Chemical group 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 6
- 229920005989 resin Polymers 0.000 claims 6
- 239000007787 solid Substances 0.000 claims 6
- 239000003513 alkali Substances 0.000 claims 5
- 125000003342 alkenyl group Chemical group 0.000 claims 4
- 125000000732 arylene group Chemical group 0.000 claims 4
- 230000007261 regionalization Effects 0.000 claims 3
- 150000001450 anions Chemical class 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 125000002993 cycloalkylene group Chemical group 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 125000002950 monocyclic group Chemical group 0.000 claims 2
- 230000001681 protective effect Effects 0.000 claims 2
- 125000003107 substituted aryl group Chemical group 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013157116A JP5740441B2 (ja) | 2013-07-29 | 2013-07-29 | 感活性光線または感放射線性樹脂組成物、および該組成物を用いたパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013157116A JP5740441B2 (ja) | 2013-07-29 | 2013-07-29 | 感活性光線または感放射線性樹脂組成物、および該組成物を用いたパターン形成方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009018781A Division JP5514448B2 (ja) | 2009-01-29 | 2009-01-29 | 感活性光線または感放射線性樹脂組成物、および該組成物を用いたパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013257582A JP2013257582A (ja) | 2013-12-26 |
| JP2013257582A5 true JP2013257582A5 (enrdf_load_stackoverflow) | 2014-02-27 |
| JP5740441B2 JP5740441B2 (ja) | 2015-06-24 |
Family
ID=49954013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013157116A Active JP5740441B2 (ja) | 2013-07-29 | 2013-07-29 | 感活性光線または感放射線性樹脂組成物、および該組成物を用いたパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5740441B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5802369B2 (ja) | 2010-07-29 | 2015-10-28 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜及びパターン形成方法 |
| US9864275B2 (en) | 2015-02-26 | 2018-01-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithographic resist with floating protectant |
| KR102757070B1 (ko) * | 2022-12-27 | 2025-01-24 | 주식회사 휴인터내셔널 | 반사방지용 하드마스크 조성물 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4579811B2 (ja) * | 2005-01-06 | 2010-11-10 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
| JP2009080161A (ja) * | 2007-09-25 | 2009-04-16 | Fujifilm Corp | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に於ける化合物 |
| EP2101217B1 (en) * | 2008-03-14 | 2011-05-11 | Shin-Etsu Chemical Co., Ltd. | Sulfonium salt-containing polymer, resist compositon, and patterning process |
| JP4998746B2 (ja) * | 2008-04-24 | 2012-08-15 | 信越化学工業株式会社 | スルホニウム塩を含む高分子化合物、レジスト材料及びパターン形成方法 |
| JP5401910B2 (ja) * | 2008-10-17 | 2014-01-29 | セントラル硝子株式会社 | 重合性アニオンを有する含フッ素スルホン塩類とその製造方法、含フッ素樹脂、レジスト組成物及びそれを用いたパターン形成方法 |
| US20100159392A1 (en) * | 2008-12-22 | 2010-06-24 | Shin-Etsu Chemical Co., Ltd. | Patterning process and resist composition |
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2013
- 2013-07-29 JP JP2013157116A patent/JP5740441B2/ja active Active