JP2013225638A - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
JP2013225638A
JP2013225638A JP2012184085A JP2012184085A JP2013225638A JP 2013225638 A JP2013225638 A JP 2013225638A JP 2012184085 A JP2012184085 A JP 2012184085A JP 2012184085 A JP2012184085 A JP 2012184085A JP 2013225638 A JP2013225638 A JP 2013225638A
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Prior art keywords
semiconductor package
semiconductor
recess
connection
connection terminal
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JP2012184085A
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Inventor
Osamu Minaminaka
理 南中
Yoshimune Kodama
義宗 小玉
Yukio Katamura
幸雄 片村
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Toshiba Corp
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Toshiba Corp
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Priority to JP2012184085A priority Critical patent/JP2013225638A/en
Priority to TW101131621A priority patent/TWI495053B/en
Priority to CN201210320295.1A priority patent/CN103325745B/en
Publication of JP2013225638A publication Critical patent/JP2013225638A/en
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    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
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    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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Abstract

PROBLEM TO BE SOLVED: To contribute to the prevention of poor connection and positional deviation between upper and lower two when stacking a plurality of semiconductor packages and the like.SOLUTION: A resin encapsulated semiconductor chip comprises: a semiconductor chip 13 mounted on a wiring medium 11; a plurality of connection conductors 12 which are provided on the wiring medium 11 and connected to external devices; and a coating member 15 which is provided to coat the wiring medium 11, the semiconductor chip 13 and the connection conductors 12 and which includes a plurality of recesses 110 for exposing upper parts of the respective connection conductors 12. The recess 110 of the coating member 15 includes a part having a shorter distance from the center to a sidewall and a part having a longer distance from the center to a sidewall.

Description

本発明の実施形態は、樹脂封止された半導体装置に関する。   Embodiments described herein relate generally to a resin-sealed semiconductor device.

近年、樹脂封止された半導体パッケージ(半導体装置)を複数個積層することにより、パッケージ・オン・パッケージ(PoP)を作製することが注目されている。このPoPを作製する場合、次のようにしている。   In recent years, attention has been focused on manufacturing a package-on-package (PoP) by stacking a plurality of resin-encapsulated semiconductor packages (semiconductor devices). When producing this PoP, it is as follows.

第1の半導体パッケージとして、配線基板上に半導体チップと外部接続のための接続用導電体を設けておき、樹脂封止後に、接続用導電体の上面を露出させるように樹脂に円形の凹部を設ける。第2の半導体パッケージの下面の半田ボールを第1の半導体パッケージの上面の凹部に合わせて第1のパッケージ上に搭載する。そして、半田ボールをリフローすることにより、PoPが完成することになる。   As a first semiconductor package, a connection conductor for external connection with a semiconductor chip is provided on a wiring board, and after resin sealing, a circular recess is formed in the resin so that the upper surface of the connection conductor is exposed. Provide. Solder balls on the lower surface of the second semiconductor package are mounted on the first package in alignment with the recesses on the upper surface of the first semiconductor package. Then, the PoP is completed by reflowing the solder balls.

しかし、この種の装置にあっては次のような問題があった。即ち、半導体パッケージの凹部の開口が小さいと、第1の半導体パッケージに第2の半導体パッケージを積層してリフロー炉に通した時に、接続用導電体と半田ボールの周辺から発生したガスが、半田ボールの下から抜けず、接続用導電体と半田ボールの接合不良が生じる場合があった。   However, this type of apparatus has the following problems. That is, if the opening of the recess of the semiconductor package is small, when the second semiconductor package is stacked on the first semiconductor package and passed through the reflow furnace, the gas generated from the periphery of the connecting conductor and the solder ball is In some cases, the connection conductor and the solder ball may be poorly bonded without coming out from under the ball.

接続用導電体と半田ボールの周辺から発生するガスを抜くために、凹部の開口を大きくすると、製造設備の振動等で、半田ボールの位置がずれ、第1及び第2の半導体パッケージが相互にずれた状態で接続されてしまう場合があった。特に、多段積層する場合に、半導体パッケージの相互の位置ずれが問題となった。   If the opening of the recess is enlarged to remove the gas generated from the periphery of the connecting conductor and the solder ball, the position of the solder ball is displaced due to vibration of the manufacturing equipment, etc., and the first and second semiconductor packages are mutually connected. There was a case where it was connected in a shifted state. In particular, in the case of multi-layer stacking, the mutual displacement of semiconductor packages has become a problem.

このように、PoPを作製する場合、接続用導電体と半田ボールの接合不良、及び上段と下段の半導体パッケージの位置ずれの両方の問題を解決することは難しかった。   As described above, when producing PoP, it has been difficult to solve both the problem of poor connection between the connecting conductor and the solder ball and the positional deviation between the upper and lower semiconductor packages.

米国特許出願公開第2010/0283140号明細書US Patent Application Publication No. 2010/0283140

発明が解決しようとする課題は、複数個を積層する場合に、上下間での接続不良及び位置ずれの防止に寄与し得る半導体装置を提供することである。   The problem to be solved by the invention is to provide a semiconductor device that can contribute to prevention of poor connection and misalignment between the upper and lower sides when a plurality of layers are stacked.

実施形態の半導体装置は、配線媒体上に搭載された半導体チップと、前記配線媒体上に設けられ、外部との接続に供される複数の接続用導電体と、前記配線媒体、前記半導体チップ、及び前記接続用導電体を被覆するように設けられ、且つ前記各接続用導電体の上部を露出させる複数の凹部を有する被覆部材と、を具備している。そして、前記被覆部材の凹部は、中心から側壁までの距離が短い部分と、中心から側壁までの距離が長い部分を有する形状である。   The semiconductor device of the embodiment includes a semiconductor chip mounted on a wiring medium, a plurality of connection conductors provided on the wiring medium and used for connection to the outside, the wiring medium, the semiconductor chip, And a covering member provided so as to cover the connecting conductor and having a plurality of recesses exposing the upper portions of the connecting conductors. And the recessed part of the said covering member is a shape which has a part with a short distance from a center to a side wall, and a part with a long distance from a center to a side wall.

第1の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。FIG. 2 is a plan view and a cross-sectional view showing a schematic configuration of the semiconductor package according to the first embodiment. 図1の半導体パッケージを用いてPoPを製造する工程を示す断面図。Sectional drawing which shows the process of manufacturing PoP using the semiconductor package of FIG. 第1の実施形態の変形例を説明するためのもので、接続用導電体を露出させるための凹部の形状を示す平面図。The top view which is for demonstrating the modification of 1st Embodiment, and shows the shape of the recessed part for exposing the conductor for a connection. 第1の実施形態の変形例を説明するためのもので、接続用導電体を露出させるための凹部の形状を示す断面図。Sectional drawing which is for demonstrating the modification of 1st Embodiment, and shows the shape of the recessed part for exposing the conductor for a connection. 第2の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional view which show schematic structure of the semiconductor package concerning 2nd Embodiment. 図5の半導体パッケージを用いてPoPを構成した例を示す断面図。Sectional drawing which shows the example which comprised PoP using the semiconductor package of FIG. 第3の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional view showing the schematic structure of the semiconductor package concerning a 3rd embodiment. 図7の半導体パッケージを用いてPoPを構成した例を示す断面図。Sectional drawing which shows the example which comprised PoP using the semiconductor package of FIG. 第3の実施形態の変形例を説明するためのもので、接続用導電体を露出させるための凹部の形状を示す断面図。Sectional drawing which is for demonstrating the modification of 3rd Embodiment, and shows the shape of the recessed part for exposing the conductor for a connection. 第4の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional drawing which show schematic structure of the semiconductor package concerning 4th Embodiment. 図10の半導体パッケージを用いてPoPを製造する工程を示す断面図。Sectional drawing which shows the process of manufacturing PoP using the semiconductor package of FIG. 第5の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional drawing which show schematic structure of the semiconductor package concerning 5th Embodiment. 図12の半導体パッケージを用いてPoPを構成した例を示す断面図。Sectional drawing which shows the example which comprised PoP using the semiconductor package of FIG. 第5の実施形態の変形例を示す平面図と断面図。The top view and sectional drawing which show the modification of 5th Embodiment. 図14の半導体パッケージを用いてPoPを構成した例を示す断面図。Sectional drawing which shows the example which comprised PoP using the semiconductor package of FIG. 第5の実施形態の別の変形例を示す平面図と断面図。The top view and sectional drawing which show another modification of 5th Embodiment. 図16の半導体パッケージを用いてPoPを構成した例を示す断面図。Sectional drawing which shows the example which comprised PoP using the semiconductor package of FIG. 第5の実施形態の更に別の変形例を説明するためのもので、接続用導電体を露出させるための凹部の形状を示す断面図。Sectional drawing which is for demonstrating another modification of 5th Embodiment, and shows the shape of the recessed part for exposing the conductor for a connection. 第6の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional view showing the schematic structure of the semiconductor package concerning a 6th embodiment. 図19の半導体パッケージの製造工程を示す断面図。FIG. 20 is a cross-sectional view showing a manufacturing process of the semiconductor package of FIG. 19. 図19の半導体パッケージを積層した状態を示す断面図。FIG. 20 is a cross-sectional view illustrating a state where the semiconductor packages of FIG. 19 are stacked. 第7の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional drawing which show schematic structure of the semiconductor package concerning 7th Embodiment. 図22の半導体パッケージを用いてPoPを製造する工程を示す断面図。FIG. 23 is a cross-sectional view showing a process for manufacturing PoP using the semiconductor package of FIG. 22; 図23のPoPを実装基板に実装する工程を示す断面図。FIG. 24 is a cross-sectional view illustrating a process of mounting the PoP of FIG. 23 on a mounting substrate. 第7の実施形態の半導体パッケージの変形例を示す平面図。The top view which shows the modification of the semiconductor package of 7th Embodiment. 第8の実施形態に係わる半導体パッケージの概略構成を示す平面図と断面図。The top view and sectional drawing which show schematic structure of the semiconductor package concerning 8th Embodiment. 図26の半導体パッケージを用いてPoPを製造する工程を示す断面図。FIG. 27 is a cross-sectional view showing a process for manufacturing PoP using the semiconductor package of FIG. 26; 図27のPoPを実装基板に実装する工程を示す断面図。FIG. 28 is a cross-sectional view illustrating a process of mounting the PoP of FIG. 27 on a mounting substrate.

以下、実施形態の半導体装置を、図面を参照して説明する。   Hereinafter, a semiconductor device of an embodiment will be described with reference to the drawings.

(第1の実施形態)
図1は、第1の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図1(a)は平面図、図1(b)は(a)のA−A’断面図である。
(First embodiment)
1A and 1B are diagrams for explaining a schematic configuration of a semiconductor package according to the first embodiment. FIG. 1A is a plan view, and FIG. 1B is a cross-sectional view taken along line AA ′ of FIG. is there.

本実施形態の半導体パッケージ10は、配線媒体11、接続用導電体12、半導体チップ13、ワイヤ14、封止材(被覆部材)15、及び接続端子16等で構成されている。   The semiconductor package 10 of the present embodiment includes a wiring medium 11, a connecting conductor 12, a semiconductor chip 13, a wire 14, a sealing material (covering member) 15, a connection terminal 16, and the like.

配線媒体11上の周辺部に接続用導電体12が接合され、配線媒体11上の中央部に半導体チップ13が1個若しくは複数個搭載されている。配線媒体11と半導体チップ13はワイヤ14で接続され、配線媒体11と接続用導電体12及び半導体チップ13は電気的に接続されている。配線媒体11としては、例えばプリント配線基板やフレキシブル配線基板を用いることができる。接続用導電体12は、例えば半田や錫や銅などを用い、形状は球形状、方形状、円柱状、円筒状、角柱状、角筒状など任意の形状でよい。   A connecting conductor 12 is bonded to the peripheral portion on the wiring medium 11, and one or more semiconductor chips 13 are mounted on the central portion on the wiring medium 11. The wiring medium 11 and the semiconductor chip 13 are connected by a wire 14, and the wiring medium 11, the connecting conductor 12, and the semiconductor chip 13 are electrically connected. As the wiring medium 11, for example, a printed wiring board or a flexible wiring board can be used. The connecting conductor 12 is made of, for example, solder, tin, or copper, and may have any shape such as a spherical shape, a square shape, a columnar shape, a cylindrical shape, a prismatic shape, or a rectangular tube shape.

配線媒体11の一方の面、接続用導電体12、及び半導体チップ13は、樹脂製の封止材15で封止されている。配線媒体11の他方の面に接続端子16が接合され、半導体パッケージ10と外部回路を電気的に接続できる。接続端子16としては、例えば半田ボールを用いることができる。   One surface of the wiring medium 11, the connecting conductor 12, and the semiconductor chip 13 are sealed with a resin sealing material 15. The connection terminal 16 is joined to the other surface of the wiring medium 11 so that the semiconductor package 10 and an external circuit can be electrically connected. As the connection terminal 16, for example, a solder ball can be used.

半導体パッケージ10の接続用導電体12が配置されている部分の封止材15の上部を除去して凹部110を形成することにより、接続用導電体12の一部又は全部が露出されている。封止材15の除去方法としては、例えばレーザ加工、ドライエッチング、ウェットエッチング、又は切削加工などを用いればよい。   By removing the upper portion of the sealing material 15 where the connecting conductor 12 of the semiconductor package 10 is disposed to form the recess 110, a part or all of the connecting conductor 12 is exposed. As a method for removing the sealing material 15, for example, laser processing, dry etching, wet etching, cutting, or the like may be used.

一方、本実施形態の半導体パッケージ(第1の半導体パッケージ)10の上に搭載する別の半導体パッケージ(第2の半導体パッケージ)80は、図2(a)に示すように、半導体パッケージ10の構成において接続用導電体12及び凹部110が無いものに相当しており、下面に接続端子86が形成されている。接続端子86は、例えば半田ボールであり、半導体パッケージ10の接続用導電体12と位置が合うように設けられる。   On the other hand, another semiconductor package (second semiconductor package) 80 mounted on the semiconductor package (first semiconductor package) 10 of the present embodiment has a configuration of the semiconductor package 10 as shown in FIG. In FIG. 2, the connecting conductor 12 and the recess 110 are not provided, and a connection terminal 86 is formed on the lower surface. The connection terminal 86 is, for example, a solder ball, and is provided so as to be aligned with the connection conductor 12 of the semiconductor package 10.

図2(a)に示すように、半導体パッケージ10の接続用導電体12と、半導体パッケージ80の接続端子86の位置が合うように、半導体パッケージ80を半導体パッケージ10の上に搭載し、接続端子86を凹部110内に挿入する。そして、例えばリフロー炉に通すことにより接続端子86をリフローする。これにより、図2(b)に示すように、接続用導電体12と接続端子86が接合して一体の接続部87となり、半導体パッケージ10と半導体パッケージ80が接続され、PoP構造が完成することになる。   As shown in FIG. 2A, the semiconductor package 80 is mounted on the semiconductor package 10 so that the connection conductor 12 of the semiconductor package 10 and the connection terminal 86 of the semiconductor package 80 are aligned, and the connection terminal 86 is inserted into the recess 110. Then, for example, the connection terminal 86 is reflowed by passing through a reflow furnace. As a result, as shown in FIG. 2B, the connecting conductor 12 and the connecting terminal 86 are joined to form an integrated connecting portion 87, the semiconductor package 10 and the semiconductor package 80 are connected, and the PoP structure is completed. become.

本実施形態では、半導体パッケージ10の凹部110の開口形状を、図1に示すように四角形(正方形)としているので、四角形の一辺の長さを半導体パッケージ80の接続端子86の直径よりも僅かに長くしておくことにより、凹部110の側壁面で、接続端子86の位置を規定することができる。このため、半導体パッケージ10と半導体パッケージ80が相互にずれて接続されるのを防止することができる。   In the present embodiment, since the opening shape of the recess 110 of the semiconductor package 10 is a square (square) as shown in FIG. 1, the length of one side of the square is slightly smaller than the diameter of the connection terminal 86 of the semiconductor package 80. By making it long, the position of the connection terminal 86 can be defined on the side wall surface of the recess 110. For this reason, it is possible to prevent the semiconductor package 10 and the semiconductor package 80 from being displaced from each other.

また、凹部110の開口形状が四角形であることから、凹部110は中心から側壁までの距離が短い部分と、中心から側壁までの距離が長い部分を有する。即ち、凹部110内にパッケージ80の接続端子86を挿入した状態においても、凹部110の側壁の角部と接続端子86との間に必ず隙間ができる。このため、接続用導電体12と接続端子86を高温で溶融接合する時に、接続用導電体12と接続端子86の周辺から生じるガスが、接続端子86の下から凹部110の側壁角部の隙間を通って上方に抜ける。これにより、接続用導電体12と接続端子86の接合不良を防止することができる。なお、封止材15は吸湿性であるため、接続端子86を高温溶融する際に封止材15からガスが発生するのは避けられない。   Moreover, since the opening shape of the recessed part 110 is a rectangle, the recessed part 110 has a part with a short distance from a center to a side wall, and a part with a long distance from a center to a side wall. That is, even when the connection terminal 86 of the package 80 is inserted into the recess 110, a gap is always formed between the corner of the side wall of the recess 110 and the connection terminal 86. For this reason, when the connection conductor 12 and the connection terminal 86 are melt-bonded at a high temperature, the gas generated from the periphery of the connection conductor 12 and the connection terminal 86 flows from under the connection terminal 86 to the gap between the corners of the side wall of the recess 110. Pass through through. Thereby, it is possible to prevent a bonding failure between the connecting conductor 12 and the connection terminal 86. Since the sealing material 15 is hygroscopic, it is inevitable that gas is generated from the sealing material 15 when the connection terminal 86 is melted at a high temperature.

凹部110の形状は四角形に限るものではなく、図3(a)〜(e)に示すように、三角形、多角形、十字形、星形、花形など、封止材15と接続端子86の間にガスが抜ける隙間ができ、且つ接続端子86の位置ずれを抑制する形状であればよい。   The shape of the recess 110 is not limited to a quadrangle, and as shown in FIGS. 3A to 3E, between the sealing material 15 and the connection terminal 86 such as a triangle, a polygon, a cross, a star, and a flower. Any shape may be used as long as a gap is formed to allow gas to escape and the displacement of the connection terminal 86 is suppressed.

接続端子86の位置ずれを防止するためには、凹部110の側壁と接続端子86のクリアランスは小さい方がよいが、クリアランスが小さいと凹部110に接続端子86を挿入する時に高い精度が必要となり、挿入が難しい。そこで、図4(a)〜(c)に示すように、凹部110の開口寸法を、上部は接続端子86の外形より大きくし、下部は接続端子86の形状に合わせて小さくしてもよい。なお、図4(a)〜(c)に示す寸法(mm)は一例である。   In order to prevent the displacement of the connection terminal 86, the clearance between the side wall of the recess 110 and the connection terminal 86 should be small. However, if the clearance is small, high accuracy is required when the connection terminal 86 is inserted into the recess 110. Insertion is difficult. Therefore, as shown in FIGS. 4A to 4C, the opening size of the recess 110 may be made larger than the outer shape of the connection terminal 86 at the upper part and made smaller according to the shape of the connection terminal 86 at the lower part. In addition, the dimension (mm) shown to Fig.4 (a)-(c) is an example.

図4(a)(b)では凹部110の側壁面を階段状にし、図4(c)では凹部110の側壁面を傾斜させている。何れも、凹部110の図4における上方向とした場合における上部の寸法を、上部は接続端子86の外形より大きくし、下部は接続端子86の形状に合わせて小さくした例である。凹部110の上部の寸法が、接続端子86の外形に対し大きくなっているので、接続端子86を凹部110に挿入し易くなる。そして、凹部110の下部の寸法が、接続端子86の形状に合わせて小さくなっているので、接続端子86の位置ずれを防止することができる。   4A and 4B, the side wall surface of the recess 110 is stepped, and in FIG. 4C, the side wall surface of the recess 110 is inclined. In either case, the upper dimension of the concave portion 110 in the upward direction in FIG. 4 is an example in which the upper part is made larger than the outer shape of the connection terminal 86 and the lower part is made smaller in accordance with the shape of the connection terminal 86. Since the dimension of the upper portion of the recess 110 is larger than the outer shape of the connection terminal 86, the connection terminal 86 can be easily inserted into the recess 110. And since the dimension of the lower part of the recessed part 110 is small according to the shape of the connection terminal 86, the position shift of the connection terminal 86 can be prevented.

半導体パッケージの積層段数は、図2に示すような2段だけでなく、3段、4段、それ以上と多段積層してもよい。また、積層するものは半導体パッケージだけでなく、半導体パッケージ以外のものでもよく、半導体パッケージと半導体パッケージ以外のものを積層してモジュール部品を構成してもよい。   The number of stacked layers of the semiconductor package is not limited to two as shown in FIG. 2, but may be stacked in three, four, or more layers. In addition to the semiconductor package, what is stacked may be other than a semiconductor package, or a module component may be configured by stacking a semiconductor package and a package other than the semiconductor package.

このように本実施形態によれば、半導体パッケージ10の接続用導電体12の一部を露出させるために封止材15に設ける凹部110の開口形状を、円形ではなく四角形又は図3に示すような形状にしている。このため、凹部110の開口寸法を大きくしなくても、接続端子86と凹部110の側壁面との間に常に隙間を形成することができる。従って、複数個を積層する場合に、上下パッケージ間での接続不良を防止できると共に、位置ずれを防止することができる。   As described above, according to the present embodiment, the opening shape of the recess 110 provided in the sealing material 15 to expose a part of the connecting conductor 12 of the semiconductor package 10 is not a circle but a square or as shown in FIG. It has a simple shape. For this reason, a gap can always be formed between the connection terminal 86 and the side wall surface of the recess 110 without increasing the opening size of the recess 110. Therefore, when a plurality of layers are stacked, it is possible to prevent a connection failure between the upper and lower packages and to prevent a positional shift.

(第2の実施形態)
図5(a)(b)は第2の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図5(a)は平面図、図5(b)は(a)のA−A’断面図である。なお、図1(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Second Embodiment)
FIGS. 5A and 5B are diagrams for explaining a schematic configuration of the semiconductor package according to the second embodiment. FIG. 5A is a plan view, and FIG. 5B is an A- It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to FIG. 1 (a) (b) and an identical part, and the detailed description is abbreviate | omitted.

本実施形態が先に説明した第1の実施形態と異なる点は、封止材15に設ける凹部の形状である。即ち本実施形態では、半導体パッケージ20の接続用導電体12が配置されている部分の封止材15の上部を、接続用導電体12の配列に沿って溝状に開口し、図6に示すように、半導体パッケージ(第1の半導体パッケージ)20の凹部120と別の半導体パッケージ(第2の半導体パッケージ)80の接続端子86とが嵌り合う構造とした。   The difference between the present embodiment and the first embodiment described above is the shape of the recess provided in the sealing material 15. That is, in the present embodiment, the upper portion of the sealing material 15 where the connection conductor 12 of the semiconductor package 20 is disposed is opened in a groove shape along the arrangement of the connection conductors 12, as shown in FIG. As described above, the recess 120 of the semiconductor package (first semiconductor package) 20 and the connection terminal 86 of another semiconductor package (second semiconductor package) 80 are fitted to each other.

凹部120を連続した溝状にしているので、接続端子86の周囲の一方向は開放されている。従って、リフロー時に接続用導電体12と接続端子86の周辺から生じるガスが開放部分から抜けるため、導電体12と接続端子86の接続不良を防止できる。   Since the recess 120 has a continuous groove shape, one direction around the connection terminal 86 is open. Therefore, the gas generated from the periphery of the connection conductor 12 and the connection terminal 86 at the time of reflow escapes from the open portion, so that connection failure between the conductor 12 and the connection terminal 86 can be prevented.

また、凹部120の側壁面で半導体パッケージ80の接続端子86の位置を決めるようにしているので、半導体パッケージ20と半導体パッケージ80の相互の位置ずれを防止することができる。即ち、凹部120のX方向に沿った側壁面で半導体パッケージ80のY方向の位置を規定し、凹部120のY方向に沿った側壁面で半導体パッケージ80のX方向の位置を規定することができる。   In addition, since the position of the connection terminal 86 of the semiconductor package 80 is determined by the side wall surface of the recess 120, the mutual displacement between the semiconductor package 20 and the semiconductor package 80 can be prevented. That is, the position of the semiconductor package 80 in the Y direction can be defined by the side wall surface along the X direction of the recess 120, and the position of the semiconductor package 80 in the X direction can be defined by the side wall surface along the Y direction of the recess 120. .

また、凹部120の断面形状(Y方向に沿った部分ではX方向に切った断面形状、X方向に沿った部分ではY方向に切った断面形状)は、第1の実施形態で述べたように、上部は接続端子86の外形より大きくして接続端子86を凹部120内に挿入し易くし、下部は接続端子86の形状に合わせて小さくして接続端子86の位置ずれを防止するようにしてもよい。半導体パッケージの積層段数も2段だけでなく、多段積層してもよい。さらに、積層するものは半導体パッケージだけでなく、半導体パッケージ以外のものでもよい。   The cross-sectional shape of the recess 120 (the cross-sectional shape cut in the X direction in the portion along the Y direction and the cross-sectional shape cut in the Y direction in the portion along the X direction) is as described in the first embodiment. The upper part is made larger than the outer shape of the connection terminal 86 so that the connection terminal 86 can be easily inserted into the recess 120, and the lower part is made smaller in accordance with the shape of the connection terminal 86 to prevent displacement of the connection terminal 86. Also good. The number of stacking stages of the semiconductor package is not limited to two but may be stacked in multiple stages. Furthermore, what is laminated | stacked may be other than a semiconductor package as well as a semiconductor package.

このような構成であっても、凹部120の形状により上下パッケージの位置決めとガス抜きを行うことができ、先の第1の実施形態と同様の効果が得られる。   Even in such a configuration, the upper and lower packages can be positioned and degassed by the shape of the recess 120, and the same effect as in the first embodiment can be obtained.

(第3の実施形態)
図7(a)(b)は第3の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図7(a)は平面図、図7(b)は(a)のA−A’断面図である。なお、図1(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Third embodiment)
FIGS. 7A and 7B are diagrams for explaining the schematic configuration of the semiconductor package according to the third embodiment. FIG. 7A is a plan view, and FIG. It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to FIG. 1 (a) (b) and an identical part, and the detailed description is abbreviate | omitted.

本実施形態が先の第1の実施形態と異なる点は、封止材に設ける凹部の形状である。即ち本実施形態では、半導体パッケージ30の接続用導電体12が配置されている部分より外側の外周部の封止材15の上部を除去し、図8に示すように、半導体パッケージ(第1の半導体パッケージ)30の除去部131と半導体パッケージ(第2の半導体パッケージ)80の接続端子86とが嵌り合う構造とした。   The present embodiment is different from the first embodiment in the shape of the recess provided in the sealing material. That is, in the present embodiment, the upper portion of the sealing material 15 on the outer peripheral portion outside the portion where the connecting conductor 12 of the semiconductor package 30 is disposed is removed, and as shown in FIG. The removal portion 131 of the semiconductor package 30 and the connection terminal 86 of the semiconductor package (second semiconductor package) 80 are fitted.

除去部131は、半導体パッケージ30の上面より下がった構造になっているので、接続端子86の周囲(パッケージ外側方向)は開放されており、接続用導電体12と接続端子86の周辺から生じるガスが抜け、導電体12と接続端子86の接続不良を防止できる。   Since the removal portion 131 has a structure lowered from the upper surface of the semiconductor package 30, the periphery of the connection terminal 86 (in the package outer direction) is open, and the gas generated from the periphery of the connection conductor 12 and the connection terminal 86. And the connection failure between the conductor 12 and the connection terminal 86 can be prevented.

また、除去部131の側面132で半導体パッケージ80の接続端子86の位置を決めるようにしているので、半導体パッケージ30と半導体パッケージ80の相互の位置ずれを防止できる。   Further, since the position of the connection terminal 86 of the semiconductor package 80 is determined by the side surface 132 of the removal portion 131, the mutual displacement of the semiconductor package 30 and the semiconductor package 80 can be prevented.

さらに、図9(a)〜(c)に示すように、除去部131は、側面上部は接続端子86より離れる形状にして接続端子86を除去部131に挿入し易くし、側面下部は接続端子86の形状に合わせて接続端子86に接近する形状にして、接続端子86の位置ずれを防止するようにしてもよい。なお、図9(a)〜(c)に示す寸法は一例である。   Further, as shown in FIGS. 9A to 9C, the removal unit 131 has a shape in which the upper part of the side surface is separated from the connection terminal 86 so that the connection terminal 86 can be easily inserted into the removal unit 131, and the lower part of the side surface is the connection terminal. A shape close to the connection terminal 86 according to the shape of 86 may be used to prevent the displacement of the connection terminal 86. In addition, the dimension shown to Fig.9 (a)-(c) is an example.

図9(a)(b)では除去部131の側面を階段状にして、図9(c)では除去部131の側面を傾斜させて、側面上部は接続端子86と離れるように、側面下部は接続端子86の形状に合わせて接続端子86に接近するようにした。除去部131の上部は接続端子86と離れるようにしているので、接続端子86を除去部131に挿入し易くなる。そして、除去部131の下部は接続端子86の形状に合わせて接続端子86に接近するようにしているので、接続端子86の位置ずれを防止することができる。   9 (a) and 9 (b), the side surface of the removal portion 131 is stepped, and in FIG. 9 (c), the side surface of the removal portion 131 is inclined so that the upper side surface is separated from the connection terminal 86, and the lower side surface is According to the shape of the connection terminal 86, the connection terminal 86 is approached. Since the upper portion of the removal portion 131 is separated from the connection terminal 86, the connection terminal 86 can be easily inserted into the removal portion 131. And since the lower part of the removal part 131 is made to approach the connection terminal 86 according to the shape of the connection terminal 86, the position shift of the connection terminal 86 can be prevented.

半導体パッケージの積層段数も2段だけでなく、多段積層してもよい。また、積層するものは半導体パッケージだけでなく、半導体パッケージ以外のものでもよい。   The number of stacking stages of the semiconductor package is not limited to two but may be stacked in multiple stages. Moreover, what is laminated | stacked may be other than a semiconductor package as well as a semiconductor package.

このような構成であっても、除去部131の形成により上下パッケージの位置決めとガス抜きを行うことができ、先の第1の実施形態と同様の効果が得られる。また、本実施形態では、除去部130が外周側面に通ずる形状としたので、パッケージ側面に充填材を塗布する際に、除去部13を介してパッケージ30,80間に充填材を充填できる利点もある。   Even with such a configuration, the upper and lower packages can be positioned and degassed by forming the removal portion 131, and the same effect as in the first embodiment can be obtained. Further, in the present embodiment, since the removal portion 130 has a shape that communicates with the outer peripheral side surface, there is an advantage that the filler can be filled between the packages 30 and 80 via the removal portion 13 when the filler is applied to the package side surface. is there.

(第4の実施形態)
図10(a)(b)は第4の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図10(a)は平面図、図10(b)は(a)のA−A’断面図である。なお、図1(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Fourth embodiment)
FIGS. 10A and 10B are views for explaining a schematic configuration of a semiconductor package according to the fourth embodiment. FIG. 10A is a plan view, and FIG. It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to FIG. 1 (a) (b) and an identical part, and the detailed description is abbreviate | omitted.

本実施形態が先の第1の実施形態と異なる点は、接続用導電体を周辺部ではなく中央部に配置したことである。   The difference between the present embodiment and the first embodiment is that the connecting conductor is disposed not in the peripheral portion but in the central portion.

配線媒体11に半導体チップ13が1個若しくは複数個搭載され、接続用導電体12が接合された再配線媒体17が最上段の半導体チップ上に搭載されている。配線媒体11と半導体チップ13と再配線媒体17はワイヤ14で接続され、配線媒体11と接続用導電体12と半導体チップ13と再配線媒体17は電気的に接続されている。配線媒体11としては、例えばプリント配線基板やフレキシブル配線基板を用いることができる。接続用導電体12は、例えば半田や錫や銅などを用い、形状は球形状、方形状、円柱状、円筒状、角柱状、角筒状など任意の形状でよい。また、再配線媒体17としては、例えばプリント配線基板や半導体チップ上に形成された再配線層を用いることができる。   One or more semiconductor chips 13 are mounted on the wiring medium 11, and a rewiring medium 17 to which the connecting conductor 12 is bonded is mounted on the uppermost semiconductor chip. The wiring medium 11, the semiconductor chip 13, and the rewiring medium 17 are connected by wires 14, and the wiring medium 11, the connecting conductor 12, the semiconductor chip 13, and the rewiring medium 17 are electrically connected. As the wiring medium 11, for example, a printed wiring board or a flexible wiring board can be used. The connecting conductor 12 is made of, for example, solder, tin, or copper, and may have any shape such as a spherical shape, a square shape, a columnar shape, a cylindrical shape, a prismatic shape, or a rectangular tube shape. As the rewiring medium 17, for example, a rewiring layer formed on a printed wiring board or a semiconductor chip can be used.

配線媒体11の一方の面、接続用導電体12、再配線媒体17、及び半導体チップ13は、封止材15で封止されている。配線媒体11の下部に接続端子16が接合され、半導体パッケージと外部回路を電気的に接続できる構成となっている。接続端子16は、例えば半田ボールを用いる。   One surface of the wiring medium 11, the connecting conductor 12, the rewiring medium 17, and the semiconductor chip 13 are sealed with a sealing material 15. A connection terminal 16 is joined to the lower part of the wiring medium 11 so that the semiconductor package and an external circuit can be electrically connected. For example, solder balls are used as the connection terminals 16.

半導体パッケージ40の接続用導電体12が配置されている部分の封止材15の上部を除去して凹部140を形成し、接続用導電体12の一部又は全部を露出させる。封止材15の除去方法としては、例えばレーザ加工、ドライエッチング、ウェットエッチング、又は切削加工などがある。   The upper portion of the sealing material 15 where the connecting conductor 12 of the semiconductor package 40 is disposed is removed to form a recess 140 to expose part or all of the connecting conductor 12. Examples of the method for removing the sealing material 15 include laser processing, dry etching, wet etching, and cutting.

一方、本実施形態の半導体パッケージ(第1の半導体パッケージ)40の上に搭載する別の半導体パッケージ(第2の半導体パッケージ)90は、図11(a)に示すように、半導体パッケージ40の構成において接続用導電体12,再配線媒体17及び凹部140が無いものに相当しており、下面に接続端子96が形成されている。接続端子96は、例えば半田ボールであり、半導体パッケージ40の接続用導電体12と位置が合うように設けられる。   On the other hand, another semiconductor package (second semiconductor package) 90 mounted on the semiconductor package (first semiconductor package) 40 of the present embodiment has a configuration of the semiconductor package 40 as shown in FIG. In FIG. 8, the connecting conductor 12, the rewiring medium 17, and the recess 140 are not provided, and a connection terminal 96 is formed on the lower surface. The connection terminal 96 is, for example, a solder ball, and is provided so as to be aligned with the connection conductor 12 of the semiconductor package 40.

図11(a)に示すように、半導体パッケージ40の接続用導電体12と、半導体パッケージ90の接続端子96の位置が合うように、半導体パッケージ90を半導体パッケージ40の上に搭載する。その後、例えばリフロー炉に通すと、図11(b)に示すように、接続用導電体12と接続端子96が接合して一体の接続部97となり、半導体パッケージ40と半導体パッケージ90が接続され、PoP構造が完成することになる。   As shown in FIG. 11A, the semiconductor package 90 is mounted on the semiconductor package 40 so that the connection conductor 12 of the semiconductor package 40 and the connection terminal 96 of the semiconductor package 90 are aligned. Thereafter, for example, when it is passed through a reflow furnace, as shown in FIG. 11B, the connecting conductor 12 and the connecting terminal 96 are joined to form an integrated connecting portion 97, and the semiconductor package 40 and the semiconductor package 90 are connected. The PoP structure will be completed.

本実施形態では、半導体パッケージ40の凹部140の形状を、図10に示すように四角形としているので、凹部140の角部において、封止材15と接続端子96との間に隙間ができる。従って、接続用導電体12と接続端子96を高温で溶融接合する時に、接続用導電体12と接続端子96の周辺から生じるガスが、接続端子96の下から凹部140の角部の隙間を通って上方に抜け、接続用導電体12と接続端子96の接合不良を防止できる。   In the present embodiment, since the shape of the recess 140 of the semiconductor package 40 is a square as shown in FIG. 10, a gap is formed between the sealing material 15 and the connection terminal 96 at the corner of the recess 140. Therefore, when the connection conductor 12 and the connection terminal 96 are melt-bonded at a high temperature, the gas generated from the periphery of the connection conductor 12 and the connection terminal 96 passes through the gap at the corner of the recess 140 from under the connection terminal 96. Thus, the connection conductor 12 and the connection terminal 96 can be prevented from being defectively bonded.

また、凹部140の側面で、接続端子96の位置を決めるようにしているので、半導体パッケージ40と半導体パッケージ90が相互にずれて接続されることを防止できる。   In addition, since the position of the connection terminal 96 is determined by the side surface of the recess 140, the semiconductor package 40 and the semiconductor package 90 can be prevented from being displaced from each other.

凹部140の形状は四角形だけでなく、前記図3に示したように、三角形、多角形、十字形、星形、花形など、封止材5と接続端子66の間にガスが抜ける隙間ができ、且つ接続端子96の位置ずれを抑制する形状であればよい。   The shape of the recess 140 is not limited to a quadrangle, and as shown in FIG. 3, there is a gap through which gas escapes between the sealing material 5 and the connection terminal 66 such as a triangle, a polygon, a cross, a star, and a flower. Any shape that suppresses the displacement of the connection terminal 96 may be used.

このように本実施形態によれば、凹部140の形状により上下パッケージの位置決めとガス抜きを行うことができ、先の第1の実施形態と同様の効果が得られる。   Thus, according to the present embodiment, positioning of the upper and lower packages and degassing can be performed by the shape of the recess 140, and the same effect as in the first embodiment can be obtained.

(第5の実施形態)
図12(a)(b)は第5の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図12(a)は平面図、図12(b)は(a)のA−A’断面図である。なお、図1(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Fifth embodiment)
12A and 12B are views for explaining a schematic configuration of a semiconductor package according to the fifth embodiment. FIG. 12A is a plan view, and FIG. 12B is an A- It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to FIG. 1 (a) (b) and an identical part, and the detailed description is abbreviate | omitted.

本実施形態が先の4の実施形態と異なる点は、凹部を個別に設けるのではなく、連続して設けたことである。即ち、凹部150は、全ての接続用導電体12を包括するように開口されている。そして、図13に示すように、半導体パッケージ50の凹部150と半導体パッケージ90の接続端子96とが嵌り合う構造となっている。   This embodiment is different from the previous four embodiments in that the concave portions are not provided individually but are provided continuously. That is, the recess 150 is opened so as to cover all the connecting conductors 12. As shown in FIG. 13, the recess 150 of the semiconductor package 50 and the connection terminal 96 of the semiconductor package 90 are fitted together.

この場合、半導体パッケージ90の接続端子96の周囲は開放されているため、リフロー時に生じるガスは開放部分から抜け易くなり、導電体12と接続端子96の接続不良を防止することができる。また、凹部150のX方向に沿った側壁面で半導体パッケージ90のY方向の位置を規定し、凹部150のY方向に沿った側壁面で半導体パッケージ90のX方向の位置を規定することができる。   In this case, since the periphery of the connection terminal 96 of the semiconductor package 90 is open, the gas generated at the time of reflow can easily escape from the open portion, and connection failure between the conductor 12 and the connection terminal 96 can be prevented. Further, the position of the semiconductor package 90 in the Y direction can be defined by the side wall surface along the X direction of the recess 150, and the position of the semiconductor package 90 in the X direction can be defined by the side wall surface along the Y direction of the recess 150. .

図14(a)(b)は、凹部160を接続用導電体12を一定の数毎に開口した例であり、図15に示すように、半導体パッケージ50’の凹部160と半導体パッケージ90の接続端子96が嵌り合う構造となっている。   14 (a) and 14 (b) are examples in which the recess 160 is opened with a certain number of connecting conductors 12, and as shown in FIG. 15, the connection between the recess 160 of the semiconductor package 50 ′ and the semiconductor package 90 is shown. The terminal 96 fits into the structure.

図16(a)(b)は、凹部170を接続用導電体12毎に開口する部分と接続用導電体12をある数毎に開口する部分とを混在させた例であり、図17に示すように、半導体パッケージ50”の凹部170と接続端子96が嵌り合う構造となっている。   16 (a) and 16 (b) are examples in which a portion in which the concave portion 170 is opened for each connecting conductor 12 and a portion in which the connecting conductor 12 is opened in every certain number are mixed, as shown in FIG. As described above, the recess 170 of the semiconductor package 50 ″ and the connection terminal 96 are fitted together.

第1の実施形態で述べたように、接続端子96を凹部150,160,170に挿入し易くし、且つ接続端子96の位置ずれを防止するために、凹部150,160,170の開口寸法を、上部は接続端子96の外形より大きくし、下部は接続端子96の形状に合わせて小さくしてもよい。図18(a)(b)では、凹部150の側面を階段状にして、図18(c)では凹部150の側面を傾斜させて、凹部150の開口寸法を、上部は接続端子96の外形より大きくし、下部は接続端子96の形状に合わせて小さくした例である。凹部150の上部の開口寸法が接続端子96の外形より大きくなっているので、接続端子96を凹部150に挿入し易くなる。そして、凹部150の下部が、接続端子96の形状に合わせて小さくなっているので、接続端子96の位置ずれを防止することができる。   As described in the first embodiment, in order to facilitate the insertion of the connection terminal 96 into the recesses 150, 160, and 170 and to prevent the displacement of the connection terminal 96, the opening dimensions of the recesses 150, 160, and 170 are set. The upper part may be larger than the outer shape of the connection terminal 96, and the lower part may be made smaller in accordance with the shape of the connection terminal 96. 18 (a) and 18 (b), the side surface of the recess 150 is stepped, and in FIG. 18 (c), the side surface of the recess 150 is inclined so that the opening size of the recess 150 is larger than the outer shape of the connection terminal 96. In this example, the size is increased and the lower portion is reduced in accordance with the shape of the connection terminal 96. Since the opening size of the upper part of the recess 150 is larger than the outer shape of the connection terminal 96, the connection terminal 96 can be easily inserted into the recess 150. And since the lower part of the recessed part 150 is small according to the shape of the connection terminal 96, the position shift of the connection terminal 96 can be prevented.

半導体パッケージの積層段数も2段だけでなく、多段積層してもよい。また、積層するものは半導体パッケージだけでなく、半導体パッケージ以外のものでもよい。   The number of stacking stages of the semiconductor package is not limited to two but may be stacked in multiple stages. Moreover, what is laminated | stacked may be other than a semiconductor package as well as a semiconductor package.

このように本実施形態によれば、凹部150,160,170形状を工夫することにより、上下パッケージの位置決めとガス抜きを行うことができ、従って先の第1の実施形態と同様の効果が得られる。   As described above, according to the present embodiment, by devising the shapes of the recesses 150, 160, and 170, the upper and lower packages can be positioned and degassed. Therefore, the same effect as in the first embodiment can be obtained. It is done.

(第6の実施形態)
図19(a)(b)は第6の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図19(a)は平面図、図19(b)は(a)のA−A’断面図である。なお、図1(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Sixth embodiment)
FIGS. 19A and 19B are views for explaining a schematic configuration of a semiconductor package according to the sixth embodiment. FIG. 19A is a plan view, and FIG. It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to FIG. 1 (a) (b) and an identical part, and the detailed description is abbreviate | omitted.

本実施形態の半導体パッケージ60は、前記図10で示した半導体パッケージ40の接続端子16を除去し、接続用導電体12の部分に接続端子26を形成したものである。   In the semiconductor package 60 of the present embodiment, the connection terminal 16 of the semiconductor package 40 shown in FIG. 10 is removed, and the connection terminal 26 is formed in the connection conductor 12 portion.

図20(a)に示すように、接続用導電体12毎に封止材15の上部を除去して凹部140を形成する。続いて、図20(b)に示すように、凹部140の接続用導電体12の上に接続用導電体22を搭載する。接続用導電体22としては例えば半田ボールを用いる。そして、例えばリフロー炉に通して、接続用導電体12と接続用導電体22を溶融接合し、図19のように接続端子26を形成する。   As shown in FIG. 20A, the upper portion of the sealing material 15 is removed for each connection conductor 12 to form a recess 140. Subsequently, as shown in FIG. 20B, the connecting conductor 22 is mounted on the connecting conductor 12 in the recess 140. For example, a solder ball is used as the connecting conductor 22. Then, for example, through a reflow furnace, the connecting conductor 12 and the connecting conductor 22 are melt-bonded to form the connection terminal 26 as shown in FIG.

本実施形態では、半導体パッケージ60の凹部140の開口形状を四角形としているので、凹部140の角部において、封止材15と接続用導電体26との間に隙間ができる。従って、接続用導電体12と接続用導電体22を高温で溶融接合する時に、接続用導電体12と接続用導電体22の周辺から生じるガスが、接続用導電体22の下から凹部140の角部の隙間を通って上方に抜け、接続用導電体12と接続用導電体22の接合不良を防止できる。   In this embodiment, since the opening shape of the recess 140 of the semiconductor package 60 is a square, a gap is formed between the sealing material 15 and the connecting conductor 26 at the corner of the recess 140. Therefore, when the connecting conductor 12 and the connecting conductor 22 are melt-bonded at a high temperature, the gas generated from the periphery of the connecting conductor 12 and the connecting conductor 22 flows from below the connecting conductor 22 into the recess 140. It is possible to prevent the connection conductor 12 and the connection conductor 22 from being poorly bonded by passing upward through the gaps at the corners.

また、凹部140の側壁面で、接続用導電体22の位置を決めるようにしているので、接続用導電体12と接続用導電体22が相互にずれて接合されることを防止できる。さらに、凹部140の形状は四角形だけでなく、前記図3(a)〜(e)に示すように、三角形、多角形、十字形、星形、花形など、封止材15と接続用導電体22との間にガスが抜ける隙間ができ、且つ接続用導電体22の位置ずれを抑制する形状であればよい。   Further, since the position of the connecting conductor 22 is determined by the side wall surface of the recess 140, it is possible to prevent the connecting conductor 12 and the connecting conductor 22 from being displaced from each other and joined. Furthermore, the shape of the recess 140 is not limited to a quadrangle, and as shown in FIGS. 3A to 3E, the sealing material 15 and the connecting conductor such as a triangle, a polygon, a cross, a star, and a flower are used. Any shape can be used as long as a gap through which gas can escape is formed between the connecting conductor 22 and the connecting conductor 22 is prevented from being displaced.

また、第1の実施形態で述べたように、接続用導電体22を凹部140に挿入し易くし、且つ接続用導電体22の位置ずれを防止するため、前記図4(a)〜(c)に示すように、凹部140の開口寸法を、上部は接続用導電体22の外形より大きくし、下部は接続用導電体2合わせて小さくしてもよい。   Further, as described in the first embodiment, in order to facilitate the insertion of the connecting conductor 22 into the recess 140 and to prevent the connecting conductor 22 from being displaced, the above-described FIGS. ), The opening size of the recess 140 may be made larger than the outer shape of the connecting conductor 22 in the upper part and may be made smaller together with the connecting conductor 2 in the lower part.

また、半導体パッケージ60は単体で使用してもよいし、図21(a)(b)に示すように積層してもよい。図21(a)は、図19の半導体パッケージ60を積層した例である。図21(b)は、図19の半導体パッケージ60を上下逆にし、配線媒体11の上に接続端子16を接合し、前記図20(b)の半導体パッケージ60’を上下逆にして積層した例である。   In addition, the semiconductor package 60 may be used alone or may be stacked as shown in FIGS. FIG. 21A shows an example in which the semiconductor packages 60 of FIG. 19 are stacked. FIG. 21B shows an example in which the semiconductor package 60 of FIG. 19 is turned upside down, the connection terminals 16 are joined on the wiring medium 11, and the semiconductor package 60 ′ of FIG. It is.

このように本実施形態によれば、上面側に突出した接続端子26を有する半導体パッケージを作製することができる。そしてこの場合、凹部140の形状を工夫することにより、接続端子26を形成する際に、位置ずれや接続不良が生じるのを防止することができる。また、これを積層した積層パッケージを作製しやすい利点もある。   As described above, according to the present embodiment, a semiconductor package having the connection terminal 26 protruding on the upper surface side can be manufactured. In this case, by devising the shape of the recess 140, it is possible to prevent the occurrence of displacement and poor connection when the connection terminal 26 is formed. In addition, there is an advantage that it is easy to produce a stacked package in which these are stacked.

(第7の実施形態)
図22(a)(b)は第7の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図22(a)は平面図、図22(b)は(a)のA−A’断面図である。なお、図1(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Seventh embodiment)
FIGS. 22A and 22B are views for explaining a schematic configuration of the semiconductor package according to the seventh embodiment. FIG. 22A is a plan view, and FIG. It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to FIG. 1 (a) (b) and an identical part, and the detailed description is abbreviate | omitted.

本実施形態が先に説明した第1の実施形態と異なる点は、封止材15に設けた凹部110を封止材15の側面につなげたことである。即ち、凹部110は、凹部110と同じ深さの溝210により封止材15の側面に開口している。   The difference between the present embodiment and the first embodiment described above is that the recess 110 provided in the sealing material 15 is connected to the side surface of the sealing material 15. That is, the recess 110 is opened on the side surface of the sealing material 15 by the groove 210 having the same depth as the recess 110.

一方、本実施形態の半導体パッケージ(第1の半導体パッケージ)10の上に搭載する別の半導体パッケージ(第2の半導体パッケージ)80は、第1の実施形態で用いた半導体パッケージと同じである。   On the other hand, another semiconductor package (second semiconductor package) 80 mounted on the semiconductor package (first semiconductor package) 10 of the present embodiment is the same as the semiconductor package used in the first embodiment.

図23(a)に示すように、半導体パッケージ10の接続用導電体12と、半導体パッケージ80の接続端子86の位置が合うように、半導体パッケージ80を半導体パッケージ10の上に搭載し、接続端子86を凹部110内に挿入する。そして、例えばリフロー炉に通すことにより接続端子86をリフローする。これにより、図23(b)に示すように、接続用導電体12と接続端子86が接合して一体の接続部87となり、半導体パッケージ10と半導体パッケージ80が接続され、PoP構造が完成することになる。ここで、部品の小型化の要求から積層状態での高さ寸法を最小にするため、半導体パッケージ10と半導体パッケージ80との間は、隙間が無い(又はごく小さい、以下同じ)状態となっている。   As shown in FIG. 23A, the semiconductor package 80 is mounted on the semiconductor package 10 so that the connection conductors 12 of the semiconductor package 10 and the connection terminals 86 of the semiconductor package 80 are aligned, and the connection terminals 86 is inserted into the recess 110. Then, for example, the connection terminal 86 is reflowed by passing through a reflow furnace. As a result, as shown in FIG. 23B, the connecting conductor 12 and the connection terminal 86 are joined to form an integrated connection portion 87, the semiconductor package 10 and the semiconductor package 80 are connected, and the PoP structure is completed. become. Here, in order to minimize the height dimension in the stacked state in order to reduce the size of parts, there is no gap (or very small, the same applies hereinafter) between the semiconductor package 10 and the semiconductor package 80. Yes.

ここで、PoP構造の半導体装置において、衝撃、振動、及び熱サイクルストレスに対する信頼性を向上させるため、半導体装置の接合部に充填材を充填する場合がある。このような場合、半導体パッケージ間に隙間が無いと、半導体装置の周囲に充填材を塗布しても、パッケージ間には充填材が充填されないという問題が生じることがある。これに対し本実施形態では、溝を設けることによりこの問題を解決している。   Here, in a semiconductor device having a PoP structure, a filler may be filled in a joint portion of the semiconductor device in order to improve reliability against shock, vibration, and thermal cycle stress. In such a case, if there is no gap between the semiconductor packages, there may be a problem that even if the filler is applied around the semiconductor device, the filler is not filled between the packages. On the other hand, in this embodiment, this problem is solved by providing a groove.

本実施形態では、図24(a)に示すように、PoP構造の半導体装置100を、実装基板200上に実装し、図24(b)に示すように、充填材300を半導体装置100の周囲に塗布する。充填材300は、半導体パッケージ10と実装基板200の接続部、及び半導体パッケージ10と半導体パッケージ80との接続部の周囲に充填させて硬化する。   In this embodiment, as shown in FIG. 24A, the PoP structure semiconductor device 100 is mounted on the mounting substrate 200, and as shown in FIG. 24B, the filler 300 is placed around the semiconductor device 100. Apply to. The filler 300 is filled and cured around the connection portion between the semiconductor package 10 and the mounting substrate 200 and the connection portion between the semiconductor package 10 and the semiconductor package 80.

ここで、本実施形態では、半導体パッケージ10の凹部110が溝210により外周側面と通じているので、充填材300が半導体パッケージ10の外部から、溝210を通って、半導体パッケージ10と半導体パッケージ80の接続部の周囲に充填される。よって、半導体パッケージ10と半導体パッケージ80が隙間なく積層されていても、接続部の周囲を充填材300で充填することができ、半導体装置100の信頼性向上と薄厚化の両立が可能となる。   Here, in this embodiment, since the concave portion 110 of the semiconductor package 10 communicates with the outer peripheral side surface by the groove 210, the filler 300 passes from the outside of the semiconductor package 10 through the groove 210 to the semiconductor package 10 and the semiconductor package 80. Is filled around the connection. Therefore, even if the semiconductor package 10 and the semiconductor package 80 are stacked without a gap, the periphery of the connection portion can be filled with the filler 300, and both the reliability improvement and the thickness reduction of the semiconductor device 100 can be achieved.

半導体装置100の積層段数は、図23に示すような2段だけでなく、3段、4段、それ以上と多段積層してもよい。また、積層するものは半導体パッケージだけでなく、半導体パッケージ以外のものでもよく、半導体パッケージと半導体パッケージ以外のものを積層してモジュール部品を構成してもよい。   The number of stacked layers of the semiconductor device 100 is not limited to two as shown in FIG. 23, but may be stacked in three, four, or more layers. In addition to the semiconductor package, what is stacked may be other than a semiconductor package, or a module component may be configured by stacking a semiconductor package and a package other than the semiconductor package.

なお、本実施形態では、封止材15の側面に連通する溝を有することから、凹部の形状は四角形でなくてもガス抜きは可能である。従って、図25に示すように、凹部と溝を一体化した切り欠き構造180を設けるようにしても良い。この場合も、位置決め及びガス抜きができるのは勿論のこと、実装基板に実装した際に充填材を効率良く充填することが可能である。   In addition, in this embodiment, since it has the groove | channel connected to the side surface of the sealing material 15, degassing is possible even if the shape of a recessed part is not square. Therefore, as shown in FIG. 25, a notch structure 180 in which the recess and the groove are integrated may be provided. In this case as well, positioning and degassing can be performed, and it is possible to efficiently fill the filler when mounted on the mounting board.

このように本実施形態においては、先の第1の実施形態と同様の効果が得られるのは勿論のこと、半導体パッケージ同士を隙間無く積層しても、充填材300が外周側面から溝210を通って、半導体パッケージ同士の接続部まで充填され、信頼性の向上と半導体装置の薄厚化の両立が可能になる。また、凹部110が外周側面に通ずる形状としたので、充填材300が半導体パッケージの中央部まで確実に充填でき、半導体パッケージ同士の接続部の位置の制限が少なくなる。このため、半導体パッケージの設計自由度が向上する利点もある。   As described above, in this embodiment, the effect similar to that of the first embodiment can be obtained, and even if the semiconductor packages are stacked without a gap, the filler 300 forms the groove 210 from the outer peripheral side surface. Through this, the connection portion between the semiconductor packages is filled, and it is possible to achieve both improvement in reliability and thinning of the semiconductor device. Further, since the concave portion 110 is formed so as to communicate with the outer peripheral side surface, the filler 300 can be reliably filled up to the central portion of the semiconductor package, and the restriction on the position of the connection portion between the semiconductor packages is reduced. For this reason, there is also an advantage that the degree of freedom in designing the semiconductor package is improved.

(第8の実施形態)
図26(a)(b)は第8の実施形態に係わる半導体パッケージの概略構成を説明するためのもので、図26(a)は平面図、図26(b)は(a)のA−A’断面図である。なお、図12(a)(b)と同一部分には同一符号を付して、その詳しい説明は省略する。
(Eighth embodiment)
FIGS. 26A and 26B are views for explaining a schematic configuration of the semiconductor package according to the eighth embodiment. FIG. 26A is a plan view, and FIG. It is A 'sectional drawing. In addition, the same code | symbol is attached | subjected to the same part as FIG.

本実施形態が先に説明した第5の実施形態と異なる点は、封止材15に設けた凹部150の一部を溝230により封止材15の側面につなげたことである。即ち、凹部150は、封止材15の表面部に凹部150と同じ深さに設けた4つの溝230により封止材15の4つの側面に開口している。   The difference of this embodiment from the fifth embodiment described above is that a part of the recess 150 provided in the sealing material 15 is connected to the side surface of the sealing material 15 by the groove 230. That is, the recess 150 is opened on four side surfaces of the sealing material 15 by four grooves 230 provided in the surface portion of the sealing material 15 at the same depth as the recess 150.

一方、本実施形態の半導体パッケージ(第1の半導体パッケージ)50の上に搭載する別の半導体パッケージ(第2の半導体パッケージ)90は、第4の実施形態に用いた半導体パッケージと同じである。   On the other hand, another semiconductor package (second semiconductor package) 90 mounted on the semiconductor package (first semiconductor package) 50 of the present embodiment is the same as the semiconductor package used in the fourth embodiment.

図27(a)に示すように、半導体パッケージ50の接続用導電体12と、半導体パッケージ90の接続端子96の位置が合うように、半導体パッケージ90を半導体パッケージ50の上に搭載する。その後、例えばリフロー炉に通すと、図27(b)に示すように、接続用導電体12と接続端子96が接合して一体の接続部97となり、半導体パッケージ40と半導体パッケージ90が接続され、PoP構造が完成することになる。ここで、積層状態での高さ寸法を最小にするため、半導体パッケージ50と半導体パッケージ90との間は、隙間が無い状態となっている。   As shown in FIG. 27A, the semiconductor package 90 is mounted on the semiconductor package 50 so that the connection conductor 12 of the semiconductor package 50 and the connection terminal 96 of the semiconductor package 90 are aligned. Thereafter, for example, when passed through a reflow furnace, as shown in FIG. 27B, the connecting conductor 12 and the connecting terminal 96 are joined to form an integrated connecting portion 97, and the semiconductor package 40 and the semiconductor package 90 are connected. The PoP structure will be completed. Here, in order to minimize the height dimension in the stacked state, there is no gap between the semiconductor package 50 and the semiconductor package 90.

そして、図28(a)に示すように、PoP構造の半導体装置500を、実装基板200上に実装し、図28(b)に示すように、充填材300を半導体装置500の周囲に塗布する。充填材300は、半導体パッケージ50と実装基板200の接続部、及び半導体発ケージ50と半導体パッケージ90との接続部の周囲に充填させて硬化する。   Then, as shown in FIG. 28A, the PoP structure semiconductor device 500 is mounted on the mounting substrate 200, and as shown in FIG. 28B, the filler 300 is applied around the semiconductor device 500. . The filler 300 is filled and cured around the connection portion between the semiconductor package 50 and the mounting substrate 200 and the connection portion between the semiconductor cage 50 and the semiconductor package 90.

ここで、本実施形態では、半導体パッケージ50の凹部150が溝230により外周側面と通じているので、充填材300が半導体パッケージ50の外部から、溝230を通って、半導体パッケージ50と半導体パッケージ90の接続部の周囲に充填される。よって、半導体パッケージ50と半導体パッケージ90が隙間なく積層されていても、接続部の周囲を充填材300で充填することができ、半導体装置500の信頼性向上と薄厚化の両立が可能となる。   Here, in the present embodiment, since the concave portion 150 of the semiconductor package 50 communicates with the outer peripheral side surface by the groove 230, the filler 300 passes from the outside of the semiconductor package 50 through the groove 230 to the semiconductor package 50 and the semiconductor package 90. Is filled around the connection. Therefore, even if the semiconductor package 50 and the semiconductor package 90 are stacked without a gap, the periphery of the connection portion can be filled with the filler 300, and both the reliability of the semiconductor device 500 can be improved and the thickness can be reduced.

なお、半導体装置の積層段数も2段だけでなく、多段積層してもよい。さらに、積層するものは半導体パッケージだけでなく、半導体パッケージ以外のものでもよい。また、本実施形態は前記図12の構成に限らず、前記図5に示す構成に適用することも可能である。即ち、図5の凹部120の一部を封止材15の外周側面に開口するための溝を設けるようにしても良い。   Note that the number of stacking stages of the semiconductor device is not limited to two but may be stacked in multiple stages. Furthermore, what is laminated | stacked may be other than a semiconductor package as well as a semiconductor package. Further, the present embodiment is not limited to the configuration shown in FIG. 12, but can be applied to the configuration shown in FIG. That is, you may make it provide the groove | channel for opening a part of recessed part 120 of FIG.

このように本実施形態においては、先の第5の実施形態と同様の効果が得られるのは勿論のこと、半導体パッケージ同士を隙間無く積層しても、充填材300が外周側面から溝230を通って、半導体パッケージ同士の接続部まで充填され、信頼性の向上と半導体装置の薄厚化の両立が可能になる。また、凹部150が外周側面に通ずる形状としたので、充填材300が半導体パッケージの中央部まで確実に充填でき、半導体パッケージ同士の接続部の位置の制限が少なくなる。このため、半導体パッケージの設計自由度が向上する利点もある。   As described above, in this embodiment, the effect similar to that of the fifth embodiment can be obtained, and even if the semiconductor packages are stacked without a gap, the filler 300 forms the groove 230 from the outer peripheral side surface. Through this, the connection portion between the semiconductor packages is filled, and it is possible to achieve both improvement in reliability and thinning of the semiconductor device. In addition, since the recess 150 is formed so as to communicate with the outer peripheral side surface, the filler 300 can be reliably filled up to the central portion of the semiconductor package, and the restriction on the position of the connection portion between the semiconductor packages is reduced. For this reason, there is also an advantage that the degree of freedom in designing the semiconductor package is improved.

(変形例)
なお、本発明は上述した各実施形態に限定されるものではない。
(Modification)
The present invention is not limited to the above-described embodiments.

被覆部材に設ける接続用導電体毎の凹部の開口形状は、四角形や前記図3に示した形状に限定されるものではなく、位置規定するための中心から側壁までの距離が短い部分と、ガス抜きのための中心から側壁までの距離が長い部分を有する構造であればよい。   The opening shape of the concave portion for each connection conductor provided on the covering member is not limited to the quadrangle or the shape shown in FIG. 3, but a portion having a short distance from the center to the side wall for positioning, a gas Any structure having a long distance from the center for removal to the side wall may be used.

さらに、凹部の形成方法としては、被覆部材の形成後にレーザ加工やエッチング等により一部を除去するのではなく、被覆部材の形成時に凹部を除く領域に被覆部材を充填することにより、最初から凹部を有する被覆部材を形成するようにしてもよい。   Furthermore, as a method for forming the recess, the recess is not formed by removing a part by laser processing or etching after the formation of the covering member, but by filling the covering member in the region excluding the recess when forming the covering member. You may make it form the coating | coated member which has.

また、必ずしも複数の半導体パッケージを積層するのに限らず、半導体パッケージ上に半導体以外の部品を積層することも可能である。   In addition, a plurality of semiconductor packages are not necessarily stacked, and components other than semiconductors can be stacked on the semiconductor package.

本発明の幾つかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれると同様に、特許請求の範囲に記載された発明とその均等の範囲に含まれるものである。   Although several embodiments of the present invention have been described, these embodiments are presented by way of example and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the spirit of the invention. These embodiments and their modifications are included in the scope and gist of the invention, and are also included in the invention described in the claims and the equivalents thereof.

10,20,30,40,50,60…第1の半導体パッケージ
80,90…第2の半導体パッケージ
11…配線媒体
12,26…接続用導電体
13…半導体チップ
14…ワイヤ
15…封止材(被覆部材)
16,22…接続端子
17…再配線媒体
100,500…POP構造の半導体装置
110,120,140,150,160,170…凹部
131…除去部
132…除去部側面
180…切り欠き構造
200…実装基板
210,230…溝
300…充填材
DESCRIPTION OF SYMBOLS 10, 20, 30, 40, 50, 60 ... 1st semiconductor package 80, 90 ... 2nd semiconductor package 11 ... Wiring medium 12, 26 ... Conducting conductor 13 ... Semiconductor chip 14 ... Wire 15 ... Sealing material (Coating member)
DESCRIPTION OF SYMBOLS 16,22 ... Connection terminal 17 ... Rewiring medium 100,500 ... POP structure semiconductor device 110,120,140,150,160,170 ... Recess 131 ... Removal part 132 ... Removal part side surface 180 ... Notch structure 200 ... Mounting Substrate 210, 230 ... groove 300 ... filler

Claims (8)

配線媒体上に搭載された半導体チップと、
前記配線媒体上に設けられ、外部との接続に供される複数の接続用導電体と、
前記配線媒体、前記半導体チップ、及び前記接続用導電体を被覆するように設けられ、且つ前記各接続用導電体の上部を露出させる複数の凹部を有する被覆部材と、
を具備し、
前記被覆部材の凹部は、中心から側壁までの距離が短い部分と、中心から側壁までの距離が長い部分を有する形状であり、
前記被覆部材の凹部は、上部は前記接続用導電体の外形よりも大きく形成され、下部は前記接続用導電体の形状に合わせて小さく形成されていることを特徴とする半導体装置。
A semiconductor chip mounted on a wiring medium;
A plurality of connecting conductors provided on the wiring medium and provided for connection to the outside;
A covering member that is provided so as to cover the wiring medium, the semiconductor chip, and the connecting conductor, and that has a plurality of recesses that expose the upper portions of the connecting conductors;
Comprising
The concave portion of the covering member has a portion having a short distance from the center to the side wall and a portion having a long distance from the center to the side wall,
The semiconductor device according to claim 1, wherein the concave portion of the covering member has an upper portion formed larger than an outer shape of the connecting conductor, and a lower portion formed smaller in accordance with the shape of the connecting conductor.
配線媒体上に搭載された半導体チップと、
前記配線媒体上に設けられ、外部との接続に供される複数の接続用導電体と、
前記配線媒体、前記半導体チップ、及び前記接続用導電体を被覆するように設けられ、且つ前記各接続用導電体の上部を露出させる複数の凹部を有する被覆部材と、
を具備し、
前記被覆部材の凹部は、中心から側壁までの距離が短い部分と、中心から側壁までの距離が長い部分を有する形状であることを特徴とする半導体装置。
A semiconductor chip mounted on a wiring medium;
A plurality of connecting conductors provided on the wiring medium and provided for connection to the outside;
A covering member that is provided so as to cover the wiring medium, the semiconductor chip, and the connecting conductor, and that has a plurality of recesses that expose the upper portions of the connecting conductors;
Comprising
The recess of the covering member has a shape having a portion having a short distance from the center to the side wall and a portion having a long distance from the center to the side wall.
前記被覆部材の表面部に、前記各凹部を前記被覆部材の側面にそれぞれ連通させる溝が更に形成されていることを特徴とする、請求項1又は2に記載の半導体装置。   3. The semiconductor device according to claim 1, wherein a groove is further formed in the surface portion of the covering member so that the recesses communicate with the side surfaces of the covering member. 配線媒体上に搭載された半導体チップと、
前記配線媒体上に該媒体の周辺に沿って設けられ、外部との接続に供される複数の接続用導電体と、
前記配線媒体、前記半導体チップ、及び前記接続用導電体を被覆するように設けられ、且つ前記各接続用導電体の上部を露出させるように前記配線媒体の周辺に沿って連続して設けられた凹部を有する被覆部材と、
を具備したことを特徴とする半導体装置。
A semiconductor chip mounted on a wiring medium;
A plurality of connecting conductors provided on the wiring medium along the periphery of the medium and provided for connection to the outside;
Provided so as to cover the wiring medium, the semiconductor chip, and the connecting conductor, and continuously provided along the periphery of the wiring medium so as to expose an upper portion of each connecting conductor. A covering member having a recess;
A semiconductor device comprising:
配線媒体上に搭載された半導体チップと、
前記配線媒体上に該媒体の周辺に沿って設けられ、外部との接続に供される複数の接続用導電体と、
前記配線媒体、前記半導体チップ、及び前記接続用導電体を被覆するように設けられ、且つ前記各接続用導電体の上部を露出させるように周辺部を低くした段差を有する被覆部材と、
を具備したことを特徴とする半導体装置。
A semiconductor chip mounted on a wiring medium;
A plurality of connecting conductors provided on the wiring medium along the periphery of the medium and provided for connection to the outside;
A covering member that is provided so as to cover the wiring medium, the semiconductor chip, and the connecting conductor, and that has a stepped portion with a lower peripheral portion so as to expose an upper portion of each connecting conductor;
A semiconductor device comprising:
配線媒体上に搭載された半導体チップと、
前記半導体チップ上に又は前記半導体チップ上に別の配線媒体を介して設けられ、外部との接続に供される複数の接続用導電体と、
前記配線媒体、前記半導体チップ及び、前記接続用導電体を被覆するように設けられ、且つ前記各接続用導電体の上部を露出させるように複数の接続用導電体に跨って設けられた凹部を有する被覆部材と、
を具備したことを特徴とする半導体装置。
A semiconductor chip mounted on a wiring medium;
A plurality of connecting conductors provided on the semiconductor chip or on the semiconductor chip via another wiring medium and provided for connection to the outside;
A recess provided to cover the wiring medium, the semiconductor chip, and the connecting conductor, and to be provided across a plurality of connecting conductors so as to expose an upper portion of each connecting conductor. A covering member having,
A semiconductor device comprising:
前記被覆部材の表面部に、前記凹部の一部を前記被覆部材の側面に連通させる溝が更に形成されていることを特徴とする、請求項4又は6に記載の半導体装置。   The semiconductor device according to claim 4, wherein a groove is further formed in the surface portion of the covering member so as to communicate a part of the recess with a side surface of the covering member. 請求項3,5,又は7に記載の構成を有する第1の半導体パッケージと、
前記第1の半導体パッケージ上に積層された第2の半導体パッケージと、
前記第2の半導体パッケージが積層された前記第1の半導体パッケージがマウントされる実装基板と、
前記第1の半導体パッケージの側面に形成され、且つ前記第1及び第2の半導体パッケージの接続部に充填された充填材と、
を具備したことを特徴とする半導体装置。
A first semiconductor package having the configuration according to claim 3, 5, or 7;
A second semiconductor package stacked on the first semiconductor package;
A mounting substrate on which the first semiconductor package on which the second semiconductor package is stacked is mounted;
A filler formed on a side surface of the first semiconductor package and filled in a connection portion of the first and second semiconductor packages;
A semiconductor device comprising:
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JP2017112325A (en) * 2015-12-18 2017-06-22 Towa株式会社 Semiconductor device and manufacturing method of the same
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JP4441328B2 (en) * 2004-05-25 2010-03-31 株式会社ルネサステクノロジ Semiconductor device and manufacturing method thereof
JP4409455B2 (en) * 2005-01-31 2010-02-03 株式会社ルネサステクノロジ Manufacturing method of semiconductor device
JP4322844B2 (en) * 2005-06-10 2009-09-02 シャープ株式会社 Semiconductor device and stacked semiconductor device
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JP2015170854A (en) * 2014-03-05 2015-09-28 インテル・コーポレーション Package structure to enhance yield of tmi interconnections
US9613933B2 (en) 2014-03-05 2017-04-04 Intel Corporation Package structure to enhance yield of TMI interconnections
JP2017126806A (en) * 2014-03-05 2017-07-20 インテル・コーポレーション Apparatus and method
US10049971B2 (en) 2014-03-05 2018-08-14 Intel Corporation Package structure to enhance yield of TMI interconnections
US10231338B2 (en) 2015-06-24 2019-03-12 Intel Corporation Methods of forming trenches in packages structures and structures formed thereby
JP2017112325A (en) * 2015-12-18 2017-06-22 Towa株式会社 Semiconductor device and manufacturing method of the same

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