JP2013210542A - Method of manufacturing color filter, and color filter, solid-state imaging device and liquid crystal display device manufactured by using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter, which is capable of reducing development residues such as adsorption of micro coloring materials and of reducing a defective fraction of color filters, and to provide a color filter, a solid-state imaging device, and a liquid crystal display device which are manufactured by using the same.SOLUTION: The method of manufacturing a color filter includes: a step of forming a photosensitive color layer by applying, on a substrate, a photosensitive color composition containing 40% by mass or more of coloring materials in a total solid component of the photosensitive color composition; a step of exposing and developing the photosensitive color layer to form a color pattern; and a step of removing micro coloring material residues adsorbed on the substrate or the color pattern by cleaning the substrate on which the color pattern is formed, with a warmed rinse liquid. The color filter and the solid-state imaging device are manufactured by using the method of manufacturing a color filter.

Description

  The present invention relates to a method for producing a color filter that can be used for patterning using application to peripheral devices, exposure, development, and the like. The present invention also relates to a color filter used for a liquid crystal display device, a solid-state image sensor, and the like.

  As a method for producing a color filter used in a liquid crystal display device or a solid-state imaging device, a photosensitive coloring composition is applied on a substrate, irradiated with ultraviolet rays through a predetermined mask pattern, and then developed with an alkaline solution. A method for obtaining a pattern image is generally used.

For example, a solid-state imaging device will be described as an example. A color filter in which organic pixels of a plurality of colors such as red pixels, green pixels, and blue pixels are two-dimensionally arranged is provided on a support such as a semiconductor substrate.
The parallel order of the pixels can be set arbitrarily, but n color coating, exposure, development, and thermal sintering processes are performed to form a color filter array. This will contribute to chip yield. In particular, in a composition containing a coloring material, “development residue” is considered to be the cause of the defective rate most.

In order to suppress these development residues, efforts have been made to improve the developability of the composition, but in response to the recent demand for finer and thinner color filter layers, patterning performance while suppressing development residues. It has become a difficult task to maintain. In recent years, particularly in color filters for liquid crystal display devices, it is required to increase the ratio of color forming color materials and improve color purity. For this reason, it is required to increase the filling amount of color materials such as pigments.
In addition, in a color filter for a solid-state image sensor, reduction of stray light due to scattering or the like is required as one of the means for improving the resolving power. For this reason, there is a strong demand for a thin colored layer. Also in the production, an increase in the filling amount of the color material is required. In order to increase the filling amount of the color material, it is necessary to increase the color material concentration in the photosensitive or curable coloring composition. However, increasing the colorant concentration inevitably decreases the content of the dispersion resin / curable component (monomer, polymerization initiator, etc.) in the photosensitive or curable coloring composition, so the developability deteriorates. There is a problem that the pattern formability is poor. In particular, color filters for solid-state image sensors have a very small pattern size due to the increase in the number of pixels and miniaturization, and developability, in particular, the adsorption of minute color materials onto substrates and other colored patterns is a major problem. It has become.

In order to suppress the adsorption of the minute color material, a method of reducing the concentration of the color material in the coloring composition and containing a large amount of an alkali-soluble resin is also conceivable. It is difficult to suppress the adsorption of minute color material that occurs after development while improving and maintaining the color material density because it leads to lowering the performance of the color filter. It is a difficult solution.
In recent years, the color material concentration of compositions used for color filters has exceeded 40% by mass in the solid content, which is overwhelmingly smaller than the case where the content is less than 40% by mass. It is known that the adsorption rate of the material is high.

Further, it has been found that it is difficult to quantitatively measure and manage the adsorption of the micro pigment in the development defect evaluation after the pattern formation. In particular, the n-th color adsorbed to the n-1 color pattern is known. It is difficult to determine whether or not minute color materials (pigments, etc.) have been completely removed.
In the production of color filters, it is not easy to determine the adsorption of these minute color materials, and after product inspection, it is determined that spectral fluctuations of certain arbitrary pixels have occurred (color mixing due to the adsorption of minute color materials). In many cases, it becomes a defective product.

  In general, organic or inorganic pigments used as coloring materials are strongly hydrophobic and have a property of being easily adsorbed to each other. For example, in a photosensitive coloring composition that is not photocrosslinked, when an alkali-soluble resin and a dispersant are dissolved by development, organic or inorganic pigments adsorb to each other, or adsorb to a substrate or other colored pattern. In many cases, it remains as a residue. When a pattern is observed with an electron microscope or the like, it is generally defined as “residue” when it is confirmed as a particle.

  For the problem of developing residue suppression, for example, in Patent Document 1, after processing the developer, the residue is removed with a cleaning agent and a rotating brush having a nylon-hair with a shower at a cone type nozzle pressure of 0.02 MPa. This describes that the residual component of the photosensitive resin layer in the unexposed area is removed.

  In addition, for the purpose of improving solubility by development, it has been proposed to carry out the developer at a temperature higher than room temperature (see Patent Documents 2 to 4).

  In these documents, an approach of removing a development residue by activating alkali by increasing the temperature of the developer is disclosed. In the photosensitive colored layer, unexposed portions are dissolved by development because photocrosslinking of the acrylic resin layer does not proceed. Alkali development includes methods such as dip development, shower development, and paddle development, and the developer concentration, temperature, flow rate, developer shower spray pressure, post-development washing temperature, flow rate, and flush water shower spray pressure conditions should be selected as appropriate. Thus, it is described that pattern processing can be performed without leaving a partially cured acrylic resin layer on the substrate that is not sufficiently photocrosslinked.

JP 2008-76952 A JP 2006-208480 A JP 2007-41236 A JP 2008-242365 A

  As a result of intensive studies, the present inventor has found that parameters such as the temperature of the rinsing solution contribute to further improvement of development residue suppression in addition to further improvement of development conditions. For example, in a developing method with a small effect of increasing the temperature of the developer, such as when the development time is short or when the developer discharge amount is limited in paddle development, most of the development residue is due to adhesion of the pigment to the substrate. It was found that this is caused by the aggregation of pigments along the flow of the rinsing liquid during rinsing.

  The present invention has been made in view of the problems as described above, and the object thereof is to efficiently remove development residues such as adsorption of fine color materials (mainly pigment residue) and the defective rate of color filters. It is an object to provide a method of manufacturing a color filter capable of reducing the above, a color filter manufactured using the same, a solid-state imaging device, and a liquid crystal display device.

  The present inventor has found that the temperature control of the rinsing liquid (pure water here) is very important, and has solved the above problems based on this finding. Furthermore, it has been found that color material adsorption can be further suppressed by carrying out in parallel with the management of the substrate temperature during development.

[1]
A step of forming a photosensitive colored layer by applying a photosensitive colored composition containing 40% by weight or more of a coloring material in the total solid content of the photosensitive colored composition on a substrate;
A step of exposing and developing the photosensitive colored layer to form a colored pattern; and washing the substrate on which the colored pattern is formed using a warmed rinsing liquid to form the colored pattern on the substrate or the colored pattern. A method for producing a color filter, comprising a step of removing the adsorbed minute color material residue.
[2]
The manufacturing method of the color filter as described in [1] whose temperature of the said rinse liquid is 30-80 degreeC.
[3]
In the developing step, the substrate or developer is heated to a first temperature exceeding 23 ° C., and the rinsing liquid is heated to a second temperature equal to or higher than the first temperature. [2] A method for producing a color filter according to [2].
[4]
The colorant is at least one of an organic pigment and an inorganic pigment, and the photosensitive coloring composition is a photocurable coloring composition containing a photopolymerization initiator and a polymerizable compound, [1] to [1] [3] The method for producing a color filter according to any one of [3].
[5]
A color filter obtained by the method for producing a color filter according to any one of [1] to [4].
[6]
[5] A solid-state imaging device having the color filter according to [5].
[7]
A liquid crystal display device having the color filter according to [5].

According to the method for producing a color filter of the present invention, a development residue such as adsorption of a minute color material (mainly pigment residue) is efficiently removed by processing at a rinse temperature after developing a developer at a temperature higher than room temperature. And the defective rate of the color filter can be reduced.
In addition to increasing the temperature of the rinsing liquid, further processing of the substrate / developer can further suppress development residues.

It is a schematic sectional drawing which shows the structural example of a color filter and a solid-state image sensor. It is a figure which shows the observation result by the length measurement scanning electron microscope of the green pattern in the comparative example 1. FIG. It is a figure which shows the observation result by the length measurement scanning electron microscope of the green pattern in Example 1. FIG. It is a figure which shows the observation result by the length measurement scanning electron microscope of the green pattern in Example 2. FIG.

In the description of the group (atomic group) in this specification, the notation which does not describe substitution and non-substitution includes the thing which has a substituent with the thing which does not have a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
The description of the constituent elements described below may be made based on typical embodiments of the present invention, but the present invention is not limited to such embodiments.
In the present specification, a numerical range represented by using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
In this specification, the total solid content refers to the total mass of components excluding the solvent from the total composition of the colored composition.
In the present specification, “(meth) acrylate” represents acrylate and methacrylate, “(meth) acryl” represents acrylic and methacryl, and “(meth) acryloyl” represents acryloyl and methacryloyl. In the present specification, “monomer” and “monomer” are synonymous. The monomer in the present invention is distinguished from oligomers and polymers, and refers to a compound having a mass average molecular weight of less than 2,000. In the present specification, the polymerizable compound means a compound having a polymerizable group, and may be a monomer or a polymer. The polymerizable group refers to a group that participates in a polymerization reaction.
The “radiation” as used in the present invention means a substance including visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray and the like.

The method for producing the color filter of the present invention includes:
A step of forming a photosensitive colored layer by applying a photosensitive colored composition containing 40% by weight or more of a coloring material in the total solid content of the photosensitive colored composition on a substrate;
A step of exposing and developing the photosensitive colored layer to form a colored pattern; and washing the substrate on which the colored pattern is formed using a warmed rinsing liquid to form the colored pattern on the substrate or the colored pattern. And a step of removing the adsorbed minute color material residue.

<Photosensitive colored layer forming step>
In the photosensitive colored layer forming step, a photosensitive colored composition is applied on the substrate to form a photosensitive colored layer.
The colored pattern in the present invention may be formed on the imaging element forming surface side (front surface) of the solid-state imaging element substrate, or may be formed on the imaging element non-forming surface side (back surface).
A light-shielding film may be provided between the image sensors on the solid-state image sensor substrate or on the back surface of the solid-state image sensor substrate.
Further, if necessary, an underlayer may be provided on the substrate to improve adhesion to the upper layer, prevent diffusion of substances, or planarize the substrate surface.

  As a method for applying the photosensitive coloring composition onto the substrate, various coating methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, and screen printing can be applied.

  The film thickness of the photosensitive colored layer is preferably 0.1 μm to 10 μm, more preferably 0.2 μm to 5 μm, and further preferably 0.2 μm to 3 μm.

  Drying (pre-baking) of the photosensitive colored layer applied on the substrate can be performed at a temperature of 50 ° C. to 140 ° C. for 10 seconds to 300 seconds using a hot plate, an oven or the like.

<Exposure process>
In the exposure step, the photosensitive colored layer formed in the photosensitive colored layer forming step is subjected to pattern exposure through a mask having a predetermined mask pattern, for example, using an exposure apparatus such as a stepper.
As radiation (light) that can be used for exposure, ultraviolet rays such as g-line and i-line are particularly preferable (particularly preferably i-line). Irradiation dose (exposure amount) is more preferably preferably ^{50~1000mJ / cm 2 30~1500mJ / cm 2} , 80~500mJ / cm 2 being most preferred.

<Development process>
Next, by carrying out an alkali development treatment, the photosensitive colored layer in the non-light-irradiated portion in the exposure step is eluted in the alkaline aqueous solution, and only the photocured portion remains.
The developer is preferably an organic alkali developer that does not cause damage to the underlying image sensor or circuit. The development time is conventionally 20 seconds to 90 seconds. In order to remove the residue more, in recent years, it may be carried out for 120 seconds to 180 seconds. Furthermore, in order to further improve residue removability, the process of shaking off the developer every 60 seconds and further supplying a new developer may be repeated several times.

  The temperature of the developer is preferably from room temperature (23 ° C.) to 80 ° C., more preferably from 25 ° C. to 50 ° C. In the development (mainly alkaline developer), the alkali is activated by increasing the temperature, and the developability and the removability of the fine pigment are improved. However, in the development for a long time exceeding 24 hours, there is a concern about decomposition of the alkaline developer in a temperature range exceeding 40 ° C., and it is predicted that the performance holding time is shortened. In the time development, the development temperature is preferably 30 ° C. or higher and 40 ° C. or lower.

  In order to further control the temperature of the developer, it is preferable to set the substrate to the same temperature as the developer. In order to make the temperature of the substrate the same as that of the developer, it is possible to cope with the operation by holding the temperature of the substrate with a hot plate before development. The environmental temperature of the developing unit is preferably maintained at the temperature of the developer.

Examples of the alkaline agent used in the developer include ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5, 4, 0] -7-undecene and the like, and an alkaline aqueous solution obtained by diluting these alkaline agents with pure water so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass. Is preferably used as a developer.
In addition, an inorganic alkali may be used for the developer, and as the inorganic alkali, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium oxalate, sodium metaoxalate and the like are preferable.

<Rinse process>
In the present invention, after the development, the substrate and the colored pattern are washed (rinsed) using a warmed rinsing liquid (pure water).
There is no restriction | limiting in particular as long as it exceeds normal temperature (23 degreeC) as the temperature of the said heated rinse liquid, It is preferable that it is 25 degreeC or more, It is more preferable that it is 30-80 degreeC, 50-80 More preferably, it is not higher than ° C. If the temperature exceeds 80 ° C., there is a concern that the rinsing performance is deteriorated due to the generation of bubbles due to the boiling of water, and at a temperature below room temperature, the interfacial tension of water is weak, and as a result, the ability to remove micropigments is low.
In the developing step, it is preferable that the substrate or the developer is heated to a first temperature exceeding 23 ° C., and the rinse liquid is heated to a second temperature equal to or higher than the first temperature.

Next, it is preferable to perform heat treatment (post-bake) after drying. If a multicolor coloring pattern is to be formed, a cured film can be produced by sequentially repeating the above steps for each color. Thereby, a color filter is obtained.
Post-baking is a heat treatment after development for complete curing, and a heat curing treatment is usually performed at 100 ° C. to 240 ° C., preferably 200 ° C. to 240 ° C.
This post-bake treatment is performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), a high-frequency heater, or the like so that the coating film after development is in the above-described condition. be able to.

  In addition, the manufacturing method of the color filter of this invention may have a well-known process as a manufacturing method of a color filter as processes other than the above as needed. For example, after performing the above-mentioned photosensitive colored layer forming step, exposing step, and developing step, a curing step of curing the formed colored pattern by heating and / or exposure may be included as necessary.

Further, when the photosensitive colored layer according to the present invention is used, for example, clogging of a nozzle or a pipe part of a coating apparatus discharge unit, contamination due to adhesion, sedimentation, or drying of the photosensitive colored layer or pigment in the coating machine occurs. There is a case. Therefore, in order to efficiently clean the contamination caused by the photosensitive coloring composition of the present invention, it is preferable to use the solvent related to the present composition as the cleaning liquid. JP-A-7-128867, JP-A-7-146562, JP-A-8-278737, JP-A-2000-273370, JP-A-2006-85140, JP-A-2006-291191, The cleaning liquids described in JP2007-2101A, JP2007-2102A, JP2007-281523A, and the like can also be suitably used for cleaning and removing the colored curable composition according to the present invention.
Of the above, alkylene glycol monoalkyl ether carboxylate and alkylene glycol monoalkyl ether are preferred.
These solvents may be used alone or in combination of two or more. When mixing 2 or more types, it is preferable to mix the solvent which has a hydroxyl group, and the solvent which does not have a hydroxyl group. The mass ratio of the solvent having a hydroxyl group and the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from 10/90 to 90/10, more preferably from 20/80 to 80/20. In a mixed solvent of propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME), the ratio is particularly preferably 60/40. In addition, in order to improve the permeability of the cleaning liquid with respect to contaminants, a surfactant related to the present composition described above may be added to the cleaning liquid.
<Color material>
In the present invention, the photosensitive coloring composition contains 40% by mass or more of a coloring material in the total solid content.
The colorant content in the total solid content of the curable composition in the present invention is preferably 50% by mass or more and less than 100% by mass, and more preferably 55% by mass or more and 90% by mass or less. When the content is 40% by mass or more, an appropriate chromaticity as a color filter can be obtained. Moreover, the strength fall as a film | membrane can be suppressed by setting it as less than 100 mass%.
The color material that can be used in the present invention is not particularly limited, and various conventionally known dyes and pigments can be used singly or in combination.

  Examples of the pigment that can be used in the present invention include conventionally known various inorganic pigments or organic pigments. Further, considering that it is preferable to have a high transmittance, whether it is an inorganic pigment or an organic pigment, it is preferable to use a pigment having an average particle size as small as possible, and considering the handling properties, the average particle size of the pigment is 0.01 μm to 0.1 μm is preferable, and 0.01 μm to 0.05 μm is more preferable.

  Examples of pigments that can be preferably used in the present invention include the following. However, the present invention is not limited to these.

C. I. Pigment yellow 11,24,108,109,110,138,139,150,151,154,167,180,185;
C. I. Pigment orange 36, 71;
C. I. Pigment red 122,150,171,175,177,209,224,242,254,255,264;
C. I. Pigment violet 19, 23, 32;
C. I. Pigment blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
C. I. Pigment Green 36, 7, 58

  In the present invention, when the coloring material is a dye, it can be uniformly dissolved in the composition.

  The dye that can be used as the color material constituting the composition in the present invention is not particularly limited, and conventionally known dyes for color filters can be used.

  The chemical structure includes pyrazole azo, anilino azo, triphenyl methane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, Xanthene-based, phthalocyanine-based, benzopyran-based and indigo-based dyes can be used.

<Board>
The substrate in the present invention is not particularly limited. For example, soda glass, borosilicate glass, quartz glass used for liquid crystal display elements and the like, and those having a transparent conductive film attached thereto, photoelectric elements used for image pickup elements, and the like. Examples of the conversion element substrate include a silicon substrate, an oxide film, and silicon nitride. Moreover, you may provide other layers, such as an intermediate | middle layer, between these board | substrates and an organic film layer, unless the effect of this invention is impaired.

<Various additives>
In the photosensitive coloring composition of the present invention, various additives such as a binder, a solvent, a polymerizable compound, a polymerization initiator, a surfactant, and an adhesion promoter are added as necessary within a range not impairing the effects of the present invention. An agent, an antioxidant, an ultraviolet absorber, an aggregation inhibitor, a dispersant and the like can be blended.
In the present invention, the colorant is at least one of an organic pigment and an inorganic pigment, and the photosensitive coloring composition contains a photopolymerization initiator and a polymerizable compound, which will be described later. It is preferable that it is a thing.

~binder~
The binder is often added at the time of preparing the pigment dispersion, does not require alkali solubility, and is only required to be soluble in an organic solvent and to maintain dispersion stability and curability.

  The binder is preferably a linear organic polymer that is soluble in an organic solvent. Examples of such linear organic high molecular polymers include polymers having a carboxylic acid in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, and JP-B-54-. No. 25957, JP-A-59-53836, JP-A-59-71048, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, etc. Examples thereof include polymers, maleic acid copolymers, partially esterified maleic acid copolymers, and acidic cellulose derivatives having a carboxylic acid in the side chain are also useful.

  Among these various binders, from the viewpoint of heat resistance, polyhydroxystyrene resins, polysiloxane resins, acrylic resins, acrylamide resins, and acrylic / acrylamide copolymer resins are preferable. Acrylic resins, acrylamide resins, and acrylic / acrylamide copolymer resins are preferred.

As the acrylic resin, a copolymer comprising monomers selected from benzyl (meth) acrylate, (meth) acrylic acid, hydroxyethyl (meth) acrylate, (meth) acrylamide, and the like, for example, benzyl methacrylate / methacrylic acid, Each copolymer such as benzyl methacrylate / benzylmethacrylamide, KS resist-106 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), cyclomer P series (manufactured by Daicel Chemical Industries, Ltd.) and the like are preferable.
By dispersing the colorant in these binders at a high concentration, adhesion to the lower layer and the like can be imparted, which also contributes to the spin coat application surface shape.

~ Dispersant ~
The dispersant can be added to improve the dispersibility of the pigment. As the dispersant, known ones can be appropriately selected and used, and examples thereof include a cationic surfactant, a fluorosurfactant, and a polymer dispersant.
Examples of pigment dispersants that can be used in the present invention include polymer dispersants [for example, polyamidoamines and salts thereof, polycarboxylic acids and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, and modified poly (meth) acrylates. , (Meth) acrylic copolymers, naphthalene sulfonic acid formalin condensates], and surfactants such as polyoxyethylene alkyl phosphate esters, polyoxyethylene alkyl amines, alkanol amines, and pigment derivatives, etc. Can do.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.

  Examples of the terminal-modified polymer having an anchor site to the pigment surface include polymers having a phosphate group at the terminal described in JP-A-3-112992, JP-T2003-533455, and the like. Examples thereof include a polymer having a sulfonic acid group at the terminal end described in JP-A-273191, and a polymer having a partial skeleton of an organic dye or a heterocyclic ring described in JP-A-9-77994. In addition, a polymer in which two or more anchor sites (acid group, basic group, partial skeleton of organic dye, heterocycle, etc.) to the surface of the pigment described in JP-A-2007-277514 are introduced. It is preferable because of excellent dispersion stability.

  Examples of the graft polymer having an anchor site to the pigment surface include poly (lower alkyleneimine) described in JP-A-54-37082, JP-A-8-507960, JP-A-2009-258668, and the like. ) And a polyester reaction product, a reaction product of polyallylamine and polyester described in JP-A-9-169821, etc., a macromonomer described in JP-A-10-339949, JP-A-2004-37986, and the like, Copolymers with nitrogen atom monomers, graft-type polymers having partial skeletons or heterocyclic rings of organic dyes described in JP-A-2003-238837, JP-A-2008-9426, JP-A-2008-81732, etc. And a copolymer of a macromonomer and an acid group-containing monomer described in JP2010-106268A. It is. In particular, the amphoteric dispersion resin having a basic group and an acidic group described in JP-A-2009-203462 exhibits dispersibility of the pigment dispersion, dispersion stability, and a colored curable composition using the pigment dispersion. Particularly preferred from the viewpoint of developability.

  As the macromonomer used when the graft polymer having an anchor site to the pigment surface is produced by radical polymerization, a known macromonomer can be used. Macromonomer AA-6 (terminal) manufactured by Toa Gosei Co., Ltd. Polymethyl methacrylate whose group is a methacryloyl group), AS-6 (polystyrene whose terminal group is a methacryloyl group), AN-6S (a copolymer of styrene and acrylonitrile whose terminal group is a methacryloyl group), AB-6 ( Polybutyl acrylate whose end group is a methacryloyl group), PLACEL FM5 manufactured by Daicel Chemical Industries, Ltd. (5 molar equivalent addition product of ε-caprolactone of 2-hydroxyethyl methacrylate), FA10L (2-hydroxyethyl acrylate) ε-caprolactone 10 molar equivalent addition product), and JP-A-2-2720 Polyester macromonomer described in No. 09 publication. Among these, polyester-based macromonomers that are particularly flexible and have good solvophilic properties are particularly preferred from the viewpoint of the dispersibility of the pigment dispersion, the dispersion stability, and the developability exhibited by the colored curable composition using the pigment dispersion. The polyester macromonomer represented by the polyester macromonomer described in JP-A-2-272009 is most preferable.

  As the block polymer having an anchor site to the pigment surface, block polymers described in JP-A Nos. 2003-49110 and 2009-52010 are preferable.

  The pigment dispersant that can be used in the present invention is also available as a commercial product, and specific examples thereof include “Disperbyk-101 (polyamideamine phosphate), 107 (carboxylic acid ester)”, 110 (by BYK Chemie). Copolymer containing acid groups), 130 (polyamide), 161, 162, 163, 164, 165, 166, 170 (polymer copolymer), "BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid) ) "EFKA 4047, 4050-4010-4165 (polyurethane)", EFKA 4330-4340 (block copolymer), 4400-4402 (modified polyacrylate), 5010 (polyesteramide), 5765 (high molecular weight polycarboxylic acid) Salt), 6220 (fatty acid polyester), 6745 Phthalocyanine derivatives), 6750 (azo pigment derivatives) ”,“ Ajisper PB821, PB822, PB880, PB881 ”manufactured by Ajinomoto Fan Techno Co.,“ Floren TG-710 (urethane oligomer) ”manufactured by Kyoeisha Chemical Co.,“ Polyflow No. 50E, No. .300 (acrylic copolymer) ”,“ Disparon KS-860, 873SN, 874, # 2150 (aliphatic polycarboxylic acid), # 7004 (polyether ester), DA-703-50, manufactured by Enomoto Kasei Co., Ltd. DA-705, DA-725 "," Demol RN, N (Naphthalenesulfonic acid formalin polycondensate), MS, C, SN-B (aromatic sulfonic acid formalin polycondensate) "manufactured by Kao Corporation," Homogenol L- 18 (polymer polycarboxylic acid) "," Emulgen 920, 930, 935, 85 (polyoxyethylene nonylphenyl ether) ”,“ acetamine 86 (stearylamine acetate) ”,“ Solsperse 9000, 12000, 13940, 20000, 26000, 5000 (phthalocyanine derivatives), 22000 (azo pigments) manufactured by Nippon Lubrizol Co., Ltd. Derivatives), 13240 (polyesteramine), 3000, 17000, 27000 (polymer having a functional part at the end), 24000, 28000, 32000, 38500 (graft type polymer) ”,“ Nikkor T106 (poly) Oxyethylene sorbitan monooleate), MYS-IEX (polyoxyethylene monostearate), Kawano Fine Chemical Co., Ltd. Hinoact T-8000E, Shin-Etsu Chemical Co., Ltd., Organoshiroki Polymer KP341, “W001: Cationic surfactant” manufactured by Yusho Co., Ltd., polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether , Nonionic surfactants such as polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, anionic surfactants such as “W004, W005, W017”, and fluorine-based interfaces such as MegaFuck F781 (manufactured by DIC) Activator, manufactured by Morishita Sangyo Co., Ltd. “EFKA-46, EFKA-47, EFKA-47EA, EFKA polymer 100, EFKA polymer 400, EFKA polymer 401, EFKA polymer 50 ”, polymer dispersants such as“ Disperse Aid 6, Disperse Aid 8, Disperse Aid 15, Disperse Aid 9100 ”manufactured by San Nopco Co., Ltd.,“ Adeka Pluronic L31, F38, L42 ”manufactured by ADEKA Corporation L44, L61, L64, F68, L72, P95, F77, P84, F87, P94, L101, P103, F108, L121, P-123 ”, and“ Ionet (trade name) S-20 ”manufactured by Sanyo Chemical Co., Ltd. Etc.

  These pigment dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant. The pigment dispersant of the present invention may be used in combination with an alkali-soluble resin together with a terminal-modified polymer, a graft polymer, or a block polymer having an anchor site to the pigment surface. Alkali-soluble resins include (meth) acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer, etc., and carboxylic acid in the side chain. Examples of the acid cellulose derivative include a resin having a hydroxyl group modified with an acid anhydride, and a (meth) acrylic acid copolymer is particularly preferable. Further, N-substituted maleimide monomer copolymers described in JP-A-10-300902, ether dimer copolymers described in JP-A-2004-300204, and polymerizable groups described in JP-A-7-319161. An alkali-soluble resin containing is also preferred.

  From the viewpoint of dispersibility and sedimentation, the following resins described in JP-A 2010-106268 are also preferable, and in particular, from the viewpoint of dispersibility, a polymer dispersant having a polyester chain in the side chain is preferable, and an acid group A resin having a polyester chain can also be suitably exemplified.

The dispersion resin described in JP 2010-106268 A, which is preferably used in the present invention, will be described below.
A preferred dispersant is a graft copolymer having a graft chain selected from a polyester structure, a polyether structure, and a polyacrylate structure, in which the number of atoms excluding hydrogen atoms is in the range of 40 to 10,000 in the molecule. It is preferable that at least a structural unit represented by any one of the following formulas (1) to (4) is included, and at least the following formula (1A), the following formula (2A), the following formula (3A), the following formula ( 3B) and a structural unit represented by any one of the following formulas (4) are more preferable.

In the formulas (1) to (4), X ¹ , X ² , X ³ , X ⁴ , and X ⁵ each independently represent a hydrogen atom or a monovalent organic group. From the viewpoint of synthesis restrictions, a hydrogen atom or an alkyl group having 1 to 12 carbon atoms is preferable, a hydrogen atom or a methyl group is more preferable, and a methyl group is particularly preferable.
In the formulas (1) to (4), W ¹ , W ² , W ³ , and W ⁴ each independently represent an oxygen atom or NH, and particularly preferably an oxygen atom.
In Formula (1) to Formula (4), Y ¹ , Y ² , Y ³ , and Y ⁴ are each independently a divalent linking group and are not particularly limited in structure. Specific examples include the following (Y-1) to (Y-21) linking groups. In the following structures, A and B each represent a bond with the left terminal group and the right terminal group in formulas (1) to (4). Of the structures shown below, (Y-2) and (Y-13) are more preferable from the viewpoint of ease of synthesis.

In formulas (1) to (4), Z ¹ , Z ² , Z ³ , and Z ⁴ are each independently a hydrogen atom or a monovalent substituent, and the structure of the substituent is not particularly limited, Specific examples include an alkyl group, a hydroxyl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, a heteroarylthioether group, and an amino group. Among these, it is preferable to have a steric repulsion effect particularly from the viewpoint of improving dispersibility, and the monovalent substituents represented by Z ^{1 to} Z ³ are each independently an alkyl group having 5 to 24 carbon atoms or carbon. An alkoxy group having 5 to 24 carbon atoms is preferable, and among them, an alkoxy group having a branched alkyl group having 5 to 24 carbon atoms or a cyclic alkyl group having 5 to 24 carbon atoms is particularly preferable. The monovalent substituent represented by Z ⁴ is preferably an alkyl group having 5 to 24 carbon atoms, and among them, each independently a branched alkyl group having 5 to 24 carbon atoms or a cyclic group having 5 to 24 carbon atoms. Alkyl groups are preferred.
In Formula (1)-Formula (4), n, m, p, and q are integers of 1 to 500, respectively.
In Formula (1) and Formula (2), j and k each independently represent an integer of 2 to 8. J and k in Formula (1) and Formula (2) are preferably integers of 4 to 6, and most preferably 5, from the viewpoint of dispersion stability.

In the formula (3), R ′ represents a branched or straight chain alkylene group. R ′ in formula (3) is preferably an alkylene group having 1 to 10 carbon atoms, and more preferably an alkylene group having 2 or 3 carbon atoms.
Further, as R ′ in the formula (3), two or more types of R ′ having different structures may be mixed and used in the dispersion resin.
In formula (4), R represents a hydrogen atom or a monovalent organic group and is not particularly limited in terms of structure, but is preferably a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, more preferably a hydrogen atom. An atom or an alkyl group. When R is an alkyl group, the alkyl group is preferably a linear alkyl group having 1 to 20 carbon atoms, a branched alkyl group having 3 to 20 carbon atoms, or a cyclic alkyl group having 5 to 20 carbon atoms. A linear alkyl group having 1 to 20 carbon atoms is more preferable, and a linear alkyl group having 1 to 6 carbon atoms is particularly preferable.
Moreover, as R in Formula (4), two or more types of R having different structures may be mixed and used in the specific resin.

The structural unit represented by the formula (1) is more preferably a structural unit represented by the following formula (1A) from the viewpoint of dispersion stability.
The structural unit represented by the formula (2) is more preferably a structural unit represented by the following formula (2A) from the viewpoint of dispersion stability.

Wherein ^(1A), X ^1, Y 1, ^{Z 1} and n are as defined ^{X 1,} Y 1, ^{Z 1} and n in Formula (1), and preferred ranges are also the same.
Wherein ^(2A), X ^2, Y 2, ^{Z 2} and m are as defined ^{X 2,} Y 2, ^{Z 2} and m in the formula (2), and preferred ranges are also the same.
The structural unit represented by the formula (3) is more preferably a structural unit represented by the following formula (3A) or the following formula (3B) from the viewpoint of dispersion stability.

Wherein (3A) or ^{(3B), X 3, Y} 3, Z 3 and p, the formula ^{(3) X 3, Y 3} , have the same meaning as ^{Z 3} and p in, preferred ranges are also the same.

  Specific examples include the compounds described in paragraph numbers 0241 to 0257 of JP2012-032556A.

  The dispersants may be used alone or in combination of two or more. The amount of the dispersant added in the photosensitive coloring composition of the present invention is usually preferably about 0.1 to 50 parts by mass with respect to 100 parts by mass of the pigment.

-Polymerizable compound-
The photosensitive coloring composition of this invention can be comprised suitably by containing at least 1 type of a polymeric compound. The polymerizable compound is mainly contained when the photosensitive coloring composition is configured as a negative type.

  Specifically, the polymerizable compound is selected from compounds having at least one terminal ethylenically unsaturated bond, preferably two or more. Such a compound group is widely known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers, or mixtures thereof and multimers thereof. The polymeric compound in this invention may be used individually by 1 type, and may use 2 or more types together.

More specifically, examples of monomers and prepolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, amides, And multimers thereof, preferably esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyhydric amine compounds, and multimers thereof. is there. Also, addition reaction products of monofunctional or polyfunctional isocyanates or epoxies with unsaturated carboxylic acid esters or amides having a nucleophilic substituent such as hydroxyl group, amino group, mercapto group, monofunctional or polyfunctional. A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an isocyanate group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, and further a halogen group A substitution reaction product of an unsaturated carboxylic acid ester or amide having a detachable substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a compound group in which an unsaturated phosphonic acid, a vinylbenzene derivative such as styrene, vinyl ether, allyl ether or the like is used instead of the unsaturated carboxylic acid.
As these specific compounds, the compounds described in paragraphs 0095 to 0108 of JP-A-2009-288705 can also be suitably used in the present invention.

The polymerizable compound is also preferably a compound having at least one addition-polymerizable ethylene group as a polymerizable monomer and having an ethylenically unsaturated group having a boiling point of 100 ° C. or higher under normal pressure. Examples include monofunctional acrylates and methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, trimethylolethanetri (Meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexanediol (Meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) iso (Meth) acrylate obtained by adding ethylene oxide or propylene oxide to polyfunctional alcohols such as annulate, glycerin and trimethylolethane; Urethane (meth) acrylates as described in JP-B-37193, polyester acrylates described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490, Mention may be made of polyfunctional acrylates and methacrylates such as epoxy acrylates and the like, which are reaction products of epoxy resins and (meth) acrylic acid, and mixtures thereof.
A polyfunctional (meth) acrylate obtained by reacting a polyfunctional carboxylic acid with a compound having a cyclic ether group such as glycidyl (meth) acrylate and an ethylenically unsaturated group can also be used.
Further, as other preferable polymerizable compounds, there are fluorene rings described in JP 2010-160418 A, JP 2010-129825 A, Japanese Patent No. 4364216, etc., and 2 ethylenically polymerizable groups. It is also possible to use a compound having a functionality or higher, a cardo resin.

  Further, compounds having a boiling point of 100 ° C. or higher under normal pressure and having at least one addition-polymerizable ethylenically unsaturated group are disclosed in paragraphs [0254] to [0257] of JP-A-2008-292970. The compounds described are also suitable.

  In addition to the above, radically polymerizable monomers represented by the following general formulas (MO-1) to (MO-5) can also be suitably used. In the formula, when T is an oxyalkylene group, the terminal on the carbon atom side is bonded to R.

In the said general formula, n is 0-14 and m is 1-8. A plurality of R and T present in one molecule may be the same or different.
In each of the radical polymerizable monomers represented by the general formulas (MO-1) to (MO-5), at least one of the plurality of Rs is —OC (═O) CH═CH ₂ , or represents an _{-OC (= O) C (CH} 3) = groups represented by CH _2.
Specific examples of the radical polymerizable monomer represented by the above general formulas (MO-1) to (MO-5) include compounds described in paragraph numbers 0248 to 0251 of JP2007-26979A. Can also be suitably used in the present invention.

  In addition, a compound which has been (meth) acrylated after adding ethylene oxide or propylene oxide to the polyfunctional alcohol described in JP-A-10-62986 as general formulas (1) and (2) together with specific examples thereof. Can be used as a polymerizable compound.

Among them, as the polymerizable compound, RP1040 (manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol triacrylate (as a commercial product, KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (as a commercial product) Is KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd. Dipentaerythritol penta (meth) acrylate (commercially available products are KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (commercially available product) And KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.), and a structure in which these (meth) acryloyl groups are mediated by ethylene glycol and propylene glycol residues. These oligomer types can also be used.
As a polymeric compound, it is a polyfunctional monomer, Comprising: You may have acid groups, such as a carboxyl group, a sulfonic acid group, and a phosphoric acid group. Therefore, if the ethylenic compound has an unreacted carboxyl group as in the case of a mixture as described above, this can be used as it is. The acid group may be introduced by reacting the group with a non-aromatic carboxylic acid anhydride. In this case, specific examples of the non-aromatic carboxylic acid anhydride used include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, alkylated hexahydrophthalic anhydride, succinic anhydride, anhydrous Maleic acid is mentioned.

  In the present invention, the monomer having an acid value is an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and a non-aromatic carboxylic acid anhydride is reacted with an unreacted hydroxyl group of the aliphatic polyhydroxy compound. A polyfunctional monomer having an acid group is preferable, and in this ester, the aliphatic polyhydroxy compound is pentaerythritol and / or dipentaerythritol. Examples of commercially available products include M-510 and M-520 as polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd.

These monomers may be used alone, but since it is difficult to use a single compound in production, two or more kinds may be used in combination. Moreover, you may use together the polyfunctional monomer which does not have an acid group as a monomer, and the polyfunctional monomer which has an acid group as needed.
A preferable acid value of the polyfunctional monomer having an acid group is 0.1 to 40 mg-KOH / g, and particularly preferably 5 to 30 mg-KOH / g. If the acid value of the polyfunctional monomer is too low, the developing dissolution properties are lowered, and if it is too high, the production and handling are difficult, the photopolymerization performance is lowered, and the curability such as the surface smoothness of the pixel is deteriorated. Accordingly, when two or more polyfunctional monomers having different acid groups are used in combination, or when a polyfunctional monomer having no acid group is used in combination, the acid groups as the entire polyfunctional monomer should be adjusted so as to fall within the above range. Is essential.
Moreover, it is preferable to contain the polyfunctional monomer which has a caprolactone structure as a polymerizable monomer.
The polyfunctional monomer having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule. For example, trimethylolethane, ditrimethylolethane, trimethylolpropane, ditrimethylolpropane, penta Ε-caprolactone modified polyfunctionality obtained by esterifying polyhydric alcohol such as erythritol, dipentaerythritol, tripentaerythritol, glycerin, diglycerol, trimethylolmelamine, (meth) acrylic acid and ε-caprolactone ( Mention may be made of (meth) acrylates. Among these, a polyfunctional monomer having a caprolactone structure represented by the following formula (1) is preferable.

(In the formula, all 6 Rs are groups represented by the following formula (2), or 1 to 5 of 6 Rs are groups represented by the following formula (2), The remainder is a group represented by the following formula (3).)

(In the formula, R ¹ represents a hydrogen atom or a methyl group, m represents a number of 1 or 2, and “*” represents a bond.)

(In the formula, R ¹ represents a hydrogen atom or a methyl group, and “*” represents a bond.)
Such a polyfunctional monomer having a caprolactone structure is commercially available from Nippon Kayaku Co., Ltd. as KAYARAD DPCA series, and DPCA-20 (m = 1 in the above formulas (1) to (3)). , Number of groups represented by formula (2) = 2, compound in which R ¹ is all hydrogen atoms, DPCA-30 (same formula, m = 1, number of groups represented by formula (2) = 3 , Compounds in which R ¹ is all hydrogen atoms), DPCA-60 (same formula, m = 1, number of groups represented by formula (2) = 6, compounds in which R ¹ are all hydrogen atoms), DPCA- 120 (a compound in which m = 2 in the same formula, the number of groups represented by formula (2) = 6, and all R ¹ are hydrogen atoms).
In this invention, the polyfunctional monomer which has a caprolactone structure can be used individually or in mixture of 2 or more types.

  Moreover, it is also preferable that it is at least 1 sort (s) selected from the group of the compound represented by the following general formula (i) or (ii) as a polyfunctional monomer in this invention.

In the general formula (i) and (ii), E are each _{independently, - ((CH 2) y} CH 2 O) -, or _{- ((CH 2) y CH} (CH 3) O) - a represents , Y each independently represents an integer of 0 to 10, and X each independently represents an acryloyl group, a methacryloyl group, a hydrogen atom, or a carboxyl group.
In said general formula (i), the sum total of acryloyl group and methacryloyl group is 3 or 4, m represents the integer of 0-10 each independently, and the sum of each m is an integer of 0-40. However, when the total of each m is 0, any one of X is a carboxyl group.
In the general formula (ii), the total number of acryloyl groups and methacryloyl groups is 5 or 6, each n independently represents an integer of 0 to 10, and the total of each n is an integer of 0 to 60. However, when the total of each n is 0, any one of X is a carboxyl group.

In the general formula (i), m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
Moreover, the integer of 2-40 is preferable, the integer of 2-16 is more preferable, and the integer of 4-8 is especially preferable as the sum total of each m.
In the general formula (ii), n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
Further, the total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12.
In general formula (i) or formula (ii) in the _{- ((CH 2) y CH} 2 O) - or _{- ((CH 2) y CH} (CH 3) O) - , the oxygen atom side ends Is preferred in which X is bonded to X.

  The compounds represented by the general formula (i) or (ii) may be used alone or in combination of two or more. In particular, in the general formula (ii), a form in which all six Xs are acryloyl groups is preferable.

  Moreover, as a total content in the specific monomer of the compound represented by general formula (i) or (ii), 20 mass% or more is preferable, and 50 mass% or more is more preferable.

  The compound represented by the general formula (i) or (ii) is a ring-opening skeleton obtained by ring-opening addition reaction of ethylene oxide or propylene oxide to pentaerythritol or dipentaerythritol, which is a conventionally known process. And a step of reacting, for example, (meth) acryloyl chloride with the terminal hydroxyl group of the ring-opening skeleton to introduce a (meth) acryloyl group. Each step is a well-known step, and a person skilled in the art can easily synthesize a compound represented by the general formula (i) or (ii).

Among the compounds represented by the general formulas (i) and (ii), pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
Specific examples include compounds represented by the following formulas (a) to (f) (hereinafter also referred to as “exemplary compounds (a) to (f)”), and among them, exemplary compounds (a) and ( b), (e) and (f) are preferred.

  Examples of commercially available products of the specific monomers represented by the general formulas (i) and (ii) include SR-494, which is a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, and pliers manufactured by Nippon Kayaku Co., Ltd. DPCA-60, which is a hexafunctional acrylate having six lenoxy chains, and TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.

Examples of the polymerizable compound include urethane acrylates described in JP-B-48-41708, JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765, Also suitable are urethane compounds having an ethylene oxide-based skeleton described in 58-49860, JP-B 56-17654, JP-B 62-39417, and JP-B 62-39418. Further, as polymerizable compounds, addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are exemplified. By using it, it is possible to obtain a curable composition having an extremely excellent photosensitive speed.
Commercially available polymerizable compounds include urethane oligomers UAS-10, UAB-140 (manufactured by Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 "(manufactured by Shin-Nakamura Chemical Co., Ltd., DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA- 306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha), M-460 (manufactured by Toagosei) and the like.
As the polymerizable compound, ethylenically unsaturated compounds having an acid group are also suitable. The ethylenically unsaturated compounds having an acid group can be obtained by, for example, converting (meth) acrylate a part of the hydroxy group of the polyfunctional alcohol and adding an acid anhydride to the remaining hydroxy group to form a carboxy group. can get. Examples of commercially available products include M-510 and M-520 as polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd.
A polyfunctional thiol compound having two or more mercapto (SH) groups in the same molecule is also suitable as the polymerizable compound. Particularly preferred are those represented by the following general formula (I).

(In the formula, R ¹ is an alkyl group, R ² is an n-valent aliphatic group that may contain atoms other than carbon, R ⁰ is an alkyl group that is not H, and n is 2 to 4.)

  If the polyfunctional thiol compound represented by the general formula (I) is specifically exemplified, 1,4-bis (3-mercaptobutyryloxy) butane [formula (II)] having the following structural formula: 1,3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triasian-2,4,6 (1H, 3H, 5H) -trione [formula (III)] and pentaerythritol tetrakis (3-mercaptobutyrate) [formula (IV)] and the like. These polyfunctional thiols can be used alone or in combination.

  About the compounding quantity of the polyfunctional thiol in a photosensitive coloring composition, it is 0.3-8.9 mass% with respect to the total solid content except a solvent, More preferably, it is the range of 0.8-6.4 mass%. It is desirable to add in. By adding a polyfunctional thiol, the stability, odor, sensitivity, resolution, developability, adhesion and the like of the photosensitive coloring composition can be improved.

  About these polymeric compounds, the details of usage methods, such as the structure, single use, combined use, and addition amount, can be arbitrarily set according to the final performance design of the photosensitive coloring composition. For example, from the viewpoint of sensitivity, a structure having a high unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Also, from the viewpoint of increasing the strength of the colored cured film, those having three or more functionalities are preferable, and those having different functional numbers and different polymerizable groups (for example, acrylic acid esters, methacrylic acid esters, styrene compounds, vinyl ether compounds). It is also effective to adjust both sensitivity and intensity by using together. Further, it is preferable to use a polymerizable compound having a trifunctional or higher functional group and different ethylene oxide chain lengths in that the developability of the photosensitive coloring composition can be adjusted and an excellent pattern forming ability can be obtained. . In addition, the selection of the polymerizable compound is also possible with respect to the compatibility and dispersibility with other components (for example, photopolymerization initiator, colorant (pigment), binder polymer, etc.) contained in the photosensitive coloring composition. The method of use is an important factor. For example, compatibility may be improved by using a low-purity compound or using two or more kinds in combination. In addition, a specific structure may be selected from the viewpoint of improving adhesion to a hard surface such as a support.

  As for content of the polymeric compound in the photosensitive coloring composition of this invention, 0.1 mass%-90 mass% are preferable with respect to solid content in this photosensitive coloring composition, 1.0 mass%-80 % By mass is more preferable, and 2.0% by mass to 70% by mass is particularly preferable.

  In the photosensitive coloring composition of the present invention, the mass ratio of the coloring material and the polymerizable monomer is preferably 1: 2 to 20: 1 from the viewpoint of thinning, and is preferably 1: 1 to 10: 1. It is more preferable that

~ Radical polymerization initiator ~
The photosensitive coloring composition of the present invention preferably further contains a radical polymerization initiator from the viewpoint of further improving sensitivity.
The radical photopolymerization initiator is preferably contained because it imparts photosensitivity to the polymerizable composition, can be used as a photosensitive composition, and can be suitably used for a color resist or the like. As the radical polymerization initiator, those known as photopolymerization initiators described below can be used.
The photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the polymerizable compound, and can be appropriately selected from known photopolymerization initiators, for example, visible from the ultraviolet region. Those having photosensitivity to light are preferable, and may be an activator that generates an active radical by causing some action with a photoexcited sensitizer, and initiates cationic polymerization according to the type of monomer. It may be an initiator.
The photopolymerization initiator preferably contains at least one component having a molecular extinction coefficient of at least about 50 within a range of about 300 to 800 nm (more preferably 330 to 500 nm).

  Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime. Examples include oxime compounds such as derivatives, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, and hydroxyacetophenones.

  Examples of the halogenated hydrocarbon compound having a triazine skeleton include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent 1388492, a compound described in JP-A-53-133428, a compound described in German Patent 3337024, F.I. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), compounds described in JP-A-62-258241, compounds described in JP-A-5-281728, compounds described in JP-A-5-34920, US Pat. No. 4,221,976 And the compounds described in the book.

  Examples of the compound described in US Pat. No. 4,221,976 include compounds having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2- Trichloromethyl-5- (4-chlorophenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5 -(2-naphthyl) -1,3,4-oxadiazole, 2-tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-tribromomethyl-5- (2-naphthyl) -1,3,4-oxadiazole; 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (4-chlorostyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (4-methoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1, 3,4-oxadiazole, 2-trichloromethyl-5- (4-n-butoxystyryl) -1,3,4-oxadiazole, 2-tripromomethyl-5-styryl-1,3,4 Oxadiazole, etc.).

  In addition, as photopolymerization initiators other than those described above, polyhalogen compounds (for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.), N-phenylglycine (for example, Carbon tetrabromide, phenyl tribromomethyl sulfone, phenyl trichloromethyl ketone, etc.), coumarins (for example, 3- (2-benzofuroyl) -7-diethylaminocoumarin, 3- (2-benzofuroyl) -7- (1-pyrrolidinyl) ) Coumarin, 3-benzoyl-7-diethylaminocoumarin, 3- (2-methoxybenzoyl) -7-diethylaminocoumarin, 3- (4-dimethylaminobenzoyl) -7-diethylaminocoumarin, 3,3′-carbonylbis (5 , 7-di-n-propoxycoumarin), 3,3′-carbo Rubis (7-diethylaminocoumarin), 3-benzoyl-7-methoxycoumarin, 3- (2-furoyl) -7-diethylaminocoumarin, 3- (4-diethylaminocinnamoyl) -7-diethylaminocoumarin, 7-methoxy-3 -(3-pyridylcarbonyl) coumarin, 3-benzoyl-5,7-dipropoxycoumarin, 7-benzotriazol-2-ylcoumarin, JP-A-5-19475, JP-A-7-271028, JP 2002-363206, JP-A 2002-363207, JP-A 2002-363208, JP-A 2002-363209, etc.), acylphosphine oxides (for example, bis (2,4 , 6-Trimethylbenzoyl) -phenylphosphite Oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphenylphosphine oxide, Lucirin TPO, etc.), metallocenes (for example, bis (η5-2,4-cyclopentadien-1-yl)- Bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium, η5-cyclopentadienyl-η6-cumenyl-iron (1 +)-hexafluorophosphate (1-), etc.) Examples thereof include compounds described in JP-A-53-133428, JP-B-57-1819, JP-A-57-6096, and US Pat. No. 3,615,455.

  Examples of the ketone compound include benzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 4-methoxybenzophenone, 2-chlorobenzophenone, 4-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone, 2-ethoxycarbonylbenzolphenone, benzophenonetetracarboxylic acid or tetramethyl ester thereof, 4,4′-bis (dialkylamino) benzophenone (for example, 4,4′-bis (dimethylamino) benzophenone, 4,4′- Bisdicyclohexylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4,4′-bis (dihydroxyethylamino) benzophenone, 4-methoxy-4′-dimethylamino Nzophenone, 4,4'-dimethoxybenzophenone, 4-dimethylaminobenzophenone, 4-dimethylaminoacetophenone, benzyl, anthraquinone, 2-t-butylanthraquinone, 2-methylanthraquinone, phenanthraquinone, xanthone, thioxanthone, 2-chloro -Thioxanthone, 2,4-diethylthioxanthone, fluorenone, 2-benzyl-dimethylamino-1- (4-morpholinophenyl) -1-butanone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino -1-propanone, 2-hydroxy-2-methyl- [4- (1-methylvinyl) phenyl] propanol oligomer, benzoin, benzoin ethers (for example, benzoin methyl ether, benzoin ethyl ether, In propyl ether, benzoin isopropyl ether, benzoin phenyl ether, benzyl dimethyl ketal), acridone, chloro acridone, N- methyl acridone, N- butyl acridone, N- butyl - such as chloro acrylic pyrrolidone.

As the photopolymerization initiator, hydroxyacetophenone compounds, aminoacetophenone compounds, and acylphosphine compounds can also be suitably used. More specifically, for example, aminoacetophenone initiators described in JP-A-10-291969 and acylphosphine oxide initiators described in Japanese Patent No. 4225898 can also be used.
As the hydroxyacetophenone-based initiator, IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, IRGACURE-127 (trade names: all manufactured by BASF) can be used. As an aminoacetophenone-based initiator, commercially available products IRGACURE-907, IRGACURE-369, and IRGACURE-379 (trade names: all manufactured by BASF) can be used. As the aminoacetophenone-based initiator, a compound described in JP-A-2009-191179 in which an absorption wavelength is matched with a long-wave light source such as 365 nm or 405 nm can also be used. As the acylphosphine-based initiator, commercially available products such as IRGACURE-819 and DAROCUR-TPO (trade names: both manufactured by BASF) can be used.

  More preferred examples of the photopolymerization initiator include oxime compounds. Specific examples of the oxime initiator include compounds described in JP-A No. 2001-233842, compounds described in JP-A No. 2000-80068, and compounds described in JP-A No. 2006-342166.

  Examples of oxime compounds such as oxime derivatives that are preferably used as a photopolymerization initiator in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutane-2-one, and 3-propionyloxyimino. Butan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3- (4 -Toluenesulfonyloxy) iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one and the like.

Examples of oxime ester compounds include J.M. C. S. Perkin II (1979) pp. 1653-1660), J.M. C. S. Perkin II (1979) pp. 156-162, Journal of Photopolymer Science and Technology (1995) pp. 202-232, compounds described in JP-A No. 2000-66385, compounds described in JP-A No. 2000-80068, JP-T 2004-534797, JP-A No. 2006-342166, and the like.
IRGACURE-OXE01 (manufactured by BASF) and IRGACURE-OXE02 (manufactured by BASF) are also preferably used as commercial products.

Further, as oxime ester compounds other than those described above, compounds described in JP-T 2009-519904 in which oxime is linked to the carbazole N position, compounds described in US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone moiety, and dyes A compound described in Japanese Patent Application Laid-Open No. 2010-15025 and US Patent Publication No. 2009-292039 in which a nitro group is introduced, a ketoxime compound described in International Publication No. 2009-131189, a triazine skeleton and an oxime skeleton are contained in the same molecule The compound described in US Pat. No. 7,556,910, the compound described in JP2009-221114A having an absorption maximum at 405 nm and good sensitivity to a g-line light source, and the like may be used.

Preferably, it can also be suitably used for the cyclic oxime compounds described in JP2007-231000A and JP2007-322744A. Among the cyclic oxime compounds, the cyclic oxime compounds fused to carbazole dyes described in JP2010-32985A and JP2010-185072A are particularly preferable in terms of high light absorption and high sensitivity.
In addition, the compound described in JP-A-2009-242469 having an unsaturated bond at a specific site of the oxime compound can achieve high sensitivity by regenerating an active radical from a polymerization inert radical, and can be suitably used. .

Most preferably, the oxime compound which has a specific substituent shown by Unexamined-Japanese-Patent No. 2007-267979 and the oxime compound which has a thioaryl group shown by Unexamined-Japanese-Patent No. 2009-191061 are mentioned.
Specifically, the oxime photopolymerization initiator is preferably a compound represented by the following formula (1). The N—O bond of the oxime may be an (E) oxime compound, a (Z) oxime compound, or a mixture of (E) and (Z) isomers. .

(In formula (1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.)
The monovalent substituent represented by R is preferably a monovalent nonmetallic atomic group.
Examples of the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group. Moreover, these groups may have one or more substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
Examples of the substituent include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.

  As the alkyl group which may have a substituent, an alkyl group having 1 to 30 carbon atoms is preferable, and specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group. , Dodecyl group, okdadecyl group, isopropyl group, isobutyl group, sec-butyl group, t-butyl group, 1-ethylpentyl group, cyclopentyl group, cyclohexyl group, trifluoromethyl group, 2-ethylhexyl group, phenacyl group, 1- Naphthoylmethyl group, 2-naphthoylmethyl group, 4-methylsulfanylphenacyl group, 4-phenylsulfanylphenacyl group, 4-dimethylaminophenacyl group, 4-cyanophenacyl group, 4-methylphenacyl group, 2- Methylphenacyl group, 3-fluorophenacyl group, 3-trifluoromethylphenacyl group, and , 3 Nitorofenashiru group can be exemplified.

  The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, specifically, a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, or a 9-anthryl group. 9-phenanthryl group, 1-pyrenyl group, 5-naphthacenyl group, 1-indenyl group, 2-azurenyl group, 9-fluorenyl group, terphenyl group, quarterphenyl group, o-, m- and p-tolyl group, Xylyl group, o-, m- and p-cumenyl group, mesityl group, pentarenyl group, binaphthalenyl group, tarnaphthalenyl group, quarternaphthalenyl group, heptalenyl group, biphenylenyl group, indacenyl group, fluoranthenyl group, acenaphthylenyl group, ASEAN Trirenyl group, phenalenyl group, fluorenyl group, anthryl group, bianthracenyl group, ter Nthracenyl group, quarteranthracenyl group, anthraquinolyl group, phenanthryl group, triphenylenyl group, pyrenyl group, chrysenyl group, naphthacenyl group, preadenyl group, picenyl group, perylenyl group, pentaphenyl group, pentacenyl group, tetraphenylenyl group, Examples include a hexaphenyl group, a hexacenyl group, a rubicenyl group, a coronenyl group, a trinaphthylenyl group, a heptaphenyl group, a heptacenyl group, a pyranthrenyl group, and an ovalenyl group.

  The acyl group which may have a substituent is preferably an acyl group having 2 to 20 carbon atoms, specifically, an acetyl group, a propanoyl group, a butanoyl group, a trifluoroacetyl group, a pentanoyl group, a benzoyl group, 1-naphthoyl group, 2-naphthoyl group, 4-methylsulfanylbenzoyl group, 4-phenylsulfanylbenzoyl group, 4-dimethylaminobenzoyl group, 4-diethylaminobenzoyl group, 2-chlorobenzoyl group, 2-methylbenzoyl group, 2 -Methoxybenzoyl group, 2-butoxybenzoyl group, 3-chlorobenzoyl group, 3-trifluoromethylbenzoyl group, 3-cyanobenzoyl group, 3-nitrobenzoyl group, 4-fluorobenzoyl group, 4-cyanobenzoyl group, and And 4-methoxybenzoyl group.

  The alkoxycarbonyl group which may have a substituent is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, specifically, a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, or a hexyloxy group. Examples thereof include a carbonyl group, an octyloxycarbonyl group, a decyloxycarbonyl group, an octadecyloxycarbonyl group, and a trifluoromethyloxycarbonyl group.

  Specific examples of the aryloxycarbonyl group which may have a substituent include phenoxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 4-methylsulfanylphenyloxycarbonyl group, 4-phenylsulfanyl. Phenyloxycarbonyl group, 4-dimethylaminophenyloxycarbonyl group, 4-diethylaminophenyloxycarbonyl group, 2-chlorophenyloxycarbonyl group, 2-methylphenyloxycarbonyl group, 2-methoxyphenyloxycarbonyl group, 2-butoxyphenyloxy Carbonyl group, 3-chlorophenyloxycarbonyl group, 3-trifluoromethylphenyloxycarbonyl group, 3-cyanophenyloxycarbonyl group, 3-nitrophenyloxycarbonyl , 4-fluorophenyl oxycarbonyl group, 4-cyanophenyl oxycarbonyl group, and a 4-methoxy phenyloxy carbonyl group can be exemplified.

The heterocyclic group which may have a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom.
Specifically, thienyl group, benzo [b] thienyl group, naphtho [2,3-b] thienyl group, thiantenyl group, furyl group, pyranyl group, isobenzofuranyl group, chromenyl group, xanthenyl group, phenoxathiyl Nyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, indolizinyl group, isoindolyl group, 3H-indolyl group, indolyl group, 1H-indazolyl group, purinyl group 4H-quinolidinyl group, isoquinolyl group, quinolyl group, phthalazinyl group, naphthyridinyl group, quinoxanilyl group, quinazolinyl group, cinnolinyl group, pteridinyl group, 4aH-carbazolyl group, carbazolyl group, β-carbolinyl group, phenanthridinyl group, acridinyl Group Midinyl group, phenanthrolinyl group, phenazinyl group, phenalsadinyl group, isothiazolyl group, phenothiazinyl group, isoxazolyl group, furazanyl group, phenoxazinyl group, isochromanyl group, chromanyl group, pyrrolidinyl group, pyrrolinyl group, imidazolidinyl group, imidazolinyl group, pyrazolidinyl group, pyrazolidinyl group Examples include a group, pyrazolinyl group, piperidyl group, piperazinyl group, indolinyl group, isoindolinyl group, quinuclidinyl group, morpholinyl group, and thioxanthryl group.

  Specific examples of the alkylthiocarbonyl group which may have a substituent include a methylthiocarbonyl group, a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, a decylthiocarbonyl group, and an octadecylthiocarbonyl group. Examples thereof include a group and a trifluoromethylthiocarbonyl group.

  Specific examples of the arylthiocarbonyl group which may have a substituent include a 1-naphthylthiocarbonyl group, a 2-naphthylthiocarbonyl group, a 4-methylsulfanylphenylthiocarbonyl group, and a 4-phenylsulfanylphenylthiocarbonyl group. 4-dimethylaminophenylthiocarbonyl group, 4-diethylaminophenylthiocarbonyl group, 2-chlorophenylthiocarbonyl group, 2-methylphenylthiocarbonyl group, 2-methoxyphenylthiocarbonyl group, 2-butoxyphenylthiocarbonyl group, 3 -Chlorophenylthiocarbonyl group, 3-trifluoromethylphenylthiocarbonyl group, 3-cyanophenylthiocarbonyl group, 3-nitrophenylthiocarbonyl group, 4-fluorophenylthiocarbonyl group, 4-cyanophenyl Two thiocarbonyl group, and a and a 4-methoxyphenylthiocarbonyl group.

  The monovalent substituent represented by B represents an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.

Of these, the structures shown below are particularly preferred.
In the following structure, Y, X, and n have the same meanings as Y, X, and n in formula (2) described later, and preferred examples are also the same.

Examples of the divalent organic group represented by A include an alkylene group having 1 to 12 carbon atoms, a cyclohexylene group, and an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
Among them, A is an alkylene substituted with an unsubstituted alkylene group or an alkyl group (for example, a methyl group, an ethyl group, a tert-butyl group, or a dodecyl group) from the viewpoint of increasing sensitivity and suppressing coloration due to heating. Group, alkylene group substituted with alkenyl group (for example, vinyl group, allyl group), aryl group (for example, phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl group, phenanthryl group, styryl group) An alkylene group substituted with

The aryl group represented by Ar is preferably an aryl group having 6 to 30 carbon atoms and may have a substituent. Examples of the substituent include the same substituents as those introduced into the substituted aryl group mentioned above as specific examples of the aryl group which may have a substituent.
Among these, a substituted or unsubstituted phenyl group is preferable from the viewpoint of increasing sensitivity and suppressing coloring due to heating.

  In the formula (1), it is preferable in terms of sensitivity that the structure of “SAr” formed by Ar and adjacent S is the following structure. Me represents a methyl group, and Et represents an ethyl group.

  The oxime compound is preferably a compound represented by the following formula (2).

(In formula (2), R and X each independently represent a monovalent substituent, A and Y each independently represent a divalent organic group, Ar represents an aryl group, and n represents 0-5. (It is an integer.)
R, A, and Ar in formula (2) have the same meanings as R, A, and Ar in formula (1), and preferred examples are also the same.

  Examples of the monovalent substituent represented by X include an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyloxy group, an acyl group, an alkoxycarbonyl group, an amino group, a heterocyclic group, and a halogen atom. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.

Among these, X is preferably an alkyl group from the viewpoints of solvent solubility and improved absorption efficiency in the long wavelength region.
Moreover, n in Formula (2) represents the integer of 0-5, and the integer of 0-2 is preferable.

Examples of the divalent organic group represented by Y include the structures shown below. In the groups shown below, “*” represents a bonding position between Y and an adjacent carbon atom in the formula (2).

  Among these, from the viewpoint of increasing sensitivity, the following structures are preferable.

  Furthermore, the oxime compound is preferably a compound represented by the following formula (3).

(In formula (3), R and X each independently represent a monovalent substituent, A represents a divalent organic group, Ar represents an aryl group, and n is an integer of 0 to 5.)
R, X, A, Ar, and n in Formula (3) have the same meanings as R, X, A, Ar, and n in Formula (2), respectively, and preferred examples are also the same.

  Specific examples (C-4) to (C-13) of oxime compounds that can be suitably used are shown below, but the present invention is not limited thereto.

  The oxime compound has a maximum absorption wavelength in a wavelength region of 350 nm to 500 nm, preferably has an absorption wavelength in a wavelength region of 360 nm to 480 nm, and particularly preferably has a high absorbance at 365 nm and 405 nm.

The molar extinction coefficient at 365 nm or 405 nm of the oxime compound is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, more preferably 5,000 to 200, from the viewpoint of sensitivity. Is particularly preferred.
A known method can be used for the molar extinction coefficient of the compound. Specifically, for example, 0.01 g of an ultraviolet-visible spectrophotometer (Varian Inc., Carry-5 spctrophotometer) is used with an ethyl acetate solvent. It is preferable to measure at a concentration of / L.

The radical photopolymerization initiator used in the present invention may be used in combination of two or more as required.
The content of the radical photopolymerization initiator in the photosensitive coloring composition (the total content in the case of two or more) is 0.1 to 20% by mass relative to the total solid content of the photosensitive coloring composition. A range is preferable, More preferably, it is the range of 0.5-10 mass%, Most preferably, it is the range of 1-8 mass%. Within this range, good sensitivity and pattern formability can be obtained.

  The photosensitive coloring composition may contain a sensitizer for the purpose of improving the radical generation efficiency of the radical initiator and increasing the photosensitive wavelength. As the sensitizer that can be used in the present invention, a sensitizer that sensitizes the above-mentioned (C) photoradical polymerization initiator by an electron transfer mechanism or an energy transfer mechanism is preferable.

Examples of the sensitizer used in the photosensitive coloring composition include compounds described in paragraph numbers [0101] to [0154] of JP-A-2008-32803.
The content of the sensitizer in the photosensitive coloring composition is preferably 0.1% by mass to 20% by mass in terms of solid content from the viewpoint of light absorption efficiency to the deep part and initiation decomposition efficiency, and 0 More preferably, the content is 5% by mass to 15% by mass.
A sensitizer may be used individually by 1 type and may use 2 or more types together.

~Organic solvent~
Generally the photosensitive coloring composition of this invention can be comprised using an organic solvent. The organic solvent is basically not particularly limited as long as it satisfies the solubility of each component and the coating property of the photosensitive coloring composition, but it should be selected in consideration of the solubility, coating property and safety of the binder. Is preferred. Moreover, when preparing the photosensitive coloring composition in this invention, it is preferable that at least 2 type of organic solvent is included.

  Examples of organic solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate. , Alkyl oxyacetate (eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)), alkyl 3-oxypropionate Esters (eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.) )), 2- Xylpropionic acid alkyl esters (eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (eg, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxy) Propyl propionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate (eg 2-methoxy-2- Methyl methyl propionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, etc. And as ethers For example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, Propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate and the like and ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone and aromatic hydrocarbons such as toluene, Xylene and the like are preferred.

  It is also preferable to mix two or more of these organic solvents from the viewpoints of solubility of monomers and resins, improvement of the coating surface condition, and the like. In this case, particularly preferably, the above-mentioned methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl It is a mixed solution composed of two or more selected from carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.

  The content of the organic solvent in the photosensitive coloring composition is preferably such that the total solid concentration of the composition is 5 to 80% by mass, more preferably 5 to 60% by mass, from the viewpoint of applicability. 10 to 50% by mass is particularly preferable.

~ Other additives ~
Various additives can be further added to the photosensitive coloring composition of the present invention as necessary. Specific examples of the various additives include, for example, various additives described in JP-A-2005-326453.

The manufacturing method of the color filter of the present invention requires a minute size such that the thickness is 0.7 μm or less and / or the pixel pattern size (one side in the square pattern) is 2 μm or less (for example, 0.5 to 2.0 μm). This is effective for producing a color filter for a solid-state imaging device.
The present invention also relates to a color filter manufactured by the method for manufacturing a color filter of the present invention.

The color filter for a solid-state image sensor of the present invention is manufactured by the above-described method for manufacturing a color filter for a solid-state image sensor to which the method for manufacturing a color filter of the present invention is applied. There is little color mixing between.
Hereinafter, the color filter for the solid-state imaging device may be simply referred to as “color filter”.
The color filter for a solid-state imaging device of the present invention can be suitably used for a solid-state imaging device such as a CCD or CMOS, and is particularly suitable for a CCD or CMOS having a high resolution exceeding 1 million pixels. The color filter for a solid-state image sensor of the present invention can be used as a color filter disposed between, for example, a light receiving portion of each pixel constituting a CCD or CMOS and a microlens for condensing light.
As a specific form of the color filter for a solid-state imaging device of the present invention, for example, a form of a multicolored color filter that combines the red pattern and another colored pattern (for example, the red pattern, the blue pattern, and the green pattern) 3 or more color filters having at least

The film thickness of the colored pattern in the color filter for the solid-state imaging device is preferably 2.0 μm or less, and more preferably 1.0 μm or less.
Further, the size (pattern width) of the colored pattern is preferably 2.0 μm or less, and more preferably 1.7 μm or less.

[Solid-state imaging device]
The solid-state image sensor of the present invention includes the above-described color filter for a solid-state image sensor of the present invention. The configuration of the solid-state imaging device of the present invention is a configuration provided with the color filter for the solid-state imaging device of the present invention, and is not particularly limited as long as the configuration functions as a solid-state imaging device. A configuration is mentioned.

A transfer electrode made of a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and a photo is formed on the photodiode and the transfer electrode. A device having a light-shielding film made of tungsten or the like that is opened only in the light-receiving portion of the diode, and a device protective film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and the photodiode light-receiving portion; The color filter for a solid-state imaging device of the present invention is provided on the protective film.
Further, a configuration having light collecting means (for example, a microlens, etc., the same shall apply hereinafter) on the device protective layer and under the color filter (on the side close to the support), or a structure having the light collecting means on the color filter. Etc.

Here, the solid-state imaging device will be briefly described with reference to FIG. 1 as an example.
As shown in FIG. 1, the solid-state imaging device 10 includes a light receiving element (photodiode) 42 provided on a silicon substrate, a color filter 13, a planarization layer (underlayer) 14, a microlens 15 and the like. In the present invention, the planarizing layer 14 is not necessarily provided. In FIG. 1, in order to clarify each part, the ratios of the thicknesses and widths are disregarded and some of them are exaggerated.

  The support is not particularly limited as long as it is used for a color filter in addition to a silicon substrate. For example, soda glass, borosilicate glass, quartz glass, and a transparent conductive film attached to these are used for liquid crystal display elements. And a photoelectric conversion element substrate used for a solid-state imaging device, such as an oxide film or silicon nitride. Further, an intermediate layer or the like may be provided between the support and the color filter 13 as long as the present invention is not impaired.

  A P well 41 is provided on the silicon substrate, and a photodiode 42 is provided on a part of the surface of the P well. The photodiode 42 is formed by performing heat treatment after ion-implanting N-type impurities such as P and As into a part of the surface of the P-well. Further, an impurity diffusion layer 43 having an N-type impurity concentration higher than that of the photodiode 42 is provided in a region different from the part of the surface of the P well 41 of the silicon substrate. The impurity diffusion layer 43 is formed by ion implantation of N-type impurities such as P and As and then performing heat treatment, and the role of the floating diffusion layer that transfers charges generated when the photodiode 42 receives incident light. Fulfill. In addition to the well 41 being a P-type impurity layer and the photodiode 42 and the impurity diffusion layer 43 being an N-type impurity layer, the well 41 is an N-type impurity layer, and the photodiode 42 and the impurity diffusion layer 43 being a P-type impurity layer. You can also

An insulating film 47 such as SiO ₂ or SiO ₂ / SiN / SiO ₂ is provided on the P well 41, the photodiode 42, and the impurity diffusion layer 43. On the insulating film 47, poly-Si, tungsten, An electrode 44 made of tungsten silicide, Al, Cu or the like is provided. The electrode 44 serves as the gate of the gate MOS transistor, and can serve as a transfer gate for transferring charges generated in the photodiode 42 to the impurity diffusion layer 43. Further, a wiring layer 45 is formed above the electrode 44. Above the wiring layer 45, a BPSG film 46 and a P-SiN film 48 are provided. The interface between the BPSG film 46 and the P-SiN film 48 is formed so as to curve downward above the photodiode 42, and serves as an in-layer lens for efficiently guiding incident light to the photodiode 42. Fulfill. On the BPSG film 46, a planarizing layer (underlying layer) 49 is formed for the purpose of planarizing the surface of the P-SiN film 48 or uneven portions other than the pixel region.

  The color filter 13 is formed on the planarizing layer (underlying layer) 49. In the following description, a colored film (so-called solid film) formed on a silicon substrate without dividing the region is referred to as a “colored (colored radiation sensitive) layer”, and is formed by dividing the region into a pattern. A colored film (for example, a film patterned in a stripe shape) is referred to as a “colored pattern”. In addition, among the colored patterns, a colored pattern that is an element constituting the color filter 13 (for example, a colored pattern patterned into a square or a rectangle) is referred to as a “colored (red, green, blue) pixel”.

  The color filter 13 includes a plurality of two-dimensionally arranged green pixels (first color pixels) 20G, red pixels (second color pixels) 20R, and blue pixels (third color pixels) 20B. Each of the colored pixels 20R, 20G, and 20B is formed above the light receiving element 42. The green pixels 20G are formed in a checkered pattern, and the blue pixels 20B and the red pixels 20R are formed between the green pixels 20G. In FIG. 1, in order to explain that the color filter 13 is composed of pixels of three colors, the colored pixels 20R, 20G, and 20B are displayed in a line.

  The planarization layer 14 is formed so as to cover the upper surface of the color filter 13 and planarizes the color filter surface.

  The microlens 15 is a condensing lens disposed with the convex surface facing upward, and is provided above the planarizing layer 14 (or a color filter when no planarizing film is provided) and above the light receiving element 42. Each microlens 15 efficiently guides light from the subject to each light receiving element 42.

The color filter of the present invention is also suitable as a color filter for a liquid crystal display device.
A liquid crystal display device provided with such a color filter can display a high-quality image having a good display image color tone and excellent display characteristics.

  For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Devices (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Devices (Junaki Ibuki, Industrial Books Co., Ltd.) Issued in the first year). The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.

The color filter of the present invention is useful for a color TFT type liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Furthermore, the present invention is applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
The color filter of the present invention can also be used for a bright and fine COA (Color-filter On Array) system.
The colored layer formed by the COA method has a rectangular shape with a side length of about 1 to 15 μm in order to connect the ITO electrode arranged on the colored layer and the terminal of the driving substrate below the colored layer. It is necessary to form a conduction path such as a through hole or a U-shaped depression, and the dimension of the conduction path (that is, the length of one side) is particularly preferably 5 μm or less, but by using the present invention, It is also possible to form a conduction path of 5 μm or less. These image display methods are described, for example, on page 43 of "EL, PDP, LCD display-Technology and latest trends in the market (issued by Toray Research Center Research Division 2001)".

The liquid crystal display device of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film in addition to the color filter of the present invention. The color filter of the present invention can be applied to a liquid crystal display element composed of these known members. Regarding these materials, for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima, CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
Regarding backlights, SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, 18-24 pages (Yasuhiro Shima), 25-30 pages (Yukiaki Yagi), etc. Have been described.

  When the color filter of the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, but further, red, green and blue LED light sources (RGB-LED). By using as a backlight, a liquid crystal display device having high luminance and high color purity and good color reproducibility can be provided.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples unless it exceeds the gist thereof. In each step, when processing using a commercially available processing solution was performed, each processing was performed according to the method specified by the manufacturer unless otherwise specified.

Comparative Example 1
<Preparation of photosensitive coloring composition A>
The photosensitive coloring composition A whose color material density | concentration is 41.0 mass% in composition solid content by mixing the following components was prepared.
・ Pigment dispersion ... 59.9g
Green pigment (PG36 / PG7 / PY139 = 80/20/30 (mass ratio)) / dispersant / dispersion resin [BYK-BYK-2001 / benzyl methacrylate / methacrylic acid copolymer (70/30 molar ratio, Mw: 30000)] Dispersant / dispersion resin ratio (mass ratio) = 4/21
Solid content: 19.6% by mass, pigment content: 12.0% by mass
・ Photopolymerization initiator (BASF Irgacure OXE01) ... 0.49g
-Polymerizable compound 1 (Nippon Kayaku KAYARAD DPHA) ... 2.74 g
Polymerizable compound 2 (Nippon Kayaku KAYARAD RP1040) 0.68 g
-Binder-containing solution (Daicel Chemicals Cyclomer P 50% by mass) ... 3.42 g
・ Surfactant (nonionic surfactant PIIONIN D-6315 (Takemoto Yushi Co., Ltd.)) ... 0.18 g
Solvent: Propylene glycol monomethyl ether acetate (PGMEA) / 3 ethyl ethoxypropionate (EEP) 12.1 g / 16.5 g

<Pattern formation conditions with photosensitive coloring composition A (200 mm wafer V notch)>
A transparent flattening layer (transparent underlayer) was formed on a silicon substrate using the following base agent, and a Bayer pattern was formed thereon with a 1.0 μm pattern using the photosensitive coloring composition A prepared above. Due to the visibility of the development residue, no heat treatment after development is performed.

・ Base material: CT-4000 (manufactured by FUJIFILM Electronics Materials)
Film thickness of transparent underlayer: 0.1 μm, baking condition: 220 ° C. × 5 minutes Photosensitive coloring composition A
-Film thickness of photosensitive colored layer: 0.6 μm (after pre-baking)
・ Pre-baking: 100 ° C. × 120 seconds ・ Exposure processing FPA3000i5 + (i-line stepper manufactured by Canon Inc.)
350 mJ / cm ² Bayer pattern, reticle bias: −0.1 μm
Pattern size after development (one side of square lattice): 1.0 μm
·developing:
Substrate temperature: 23 ° C
Development: CD-2000 (Fuji Film Electronics Materials) 40% diluted product
Straight nozzle 50ml discharge, 60 seconds paddle treatment, wobble
Liquid temperature: 23 ° C
Rinse: Use a straight nozzle and fix the nozzle to the center of the wafer top surface.
Rinse solution: pure water
Liquid temperature: 23 ° C
Rotation speed: 200rpm
Time: 30 seconds
Flow rate: 1000 ml / min Observation: Length-measuring scanning electron microscope S9240 (manufactured by Hitachi High-Technologies Corporation) Mag: x 30.0k
・ Observation points: Center of wafer upper surface, diagonally upward to the right (10 mm from edge) 2 points in total

FIG. 2 is a diagram showing an observation result of a green pattern formed in Reference Example 1 as a reference by a length-measuring scanning electron microscope.
Since more pigment residue was generated at the upper right corner of the wafer upper surface (10 mm from the edge edge) than at the center of the upper wafer surface, FIG. 2 shows the observation result at the upper right corner of the wafer upper surface (10 mm from the edge edge). FIG.
In FIG. 2, 100 indicates a green pattern of the Bayer pattern, and 101 indicates a minute color material (minute pigment) residue existing between the green patterns. The same applies to the subsequent drawings.
As is clear from FIG. 2, it can be seen that a large amount of fine pigment residue is generated between the green patterns.

Example 1
Based on the results of Comparative Example 1, the effect of reducing the residue when the temperature of the rinse solution was changed was observed and evaluated.
A green pattern was formed and observed in the same manner as in Comparative Example 1 except that the temperature of the rinse solution was 30 ° C., 45 ° C., and 75 ° C. Hereinafter, only the observation points on the upper right side of the wafer upper surface (10 mm from the edge end) observed as having a lot of residue in Comparative Example 1 (reference) are shown.
FIGS. 3A, 3B, and 3C are diagrams showing the observation results of the rinse liquid at 30 ° C., 45 ° C., and 75 ° C., respectively.
As is apparent from FIGS. 3A, 3B, and 3C, it is observed that the development residue removability between the patterns is improved in proportion to the increase in the rinse temperature. In particular, at 75 ° C., it was confirmed that the development residue was reduced to half or less compared to Comparative Example 1 as a reference.
The evaluation results compared with Comparative Example 1 (reference) are summarized in Table 1 below.

  From the above results, when removing the residue of the non-cured portion of the photosensitive material, the higher the water temperature of the rinsing liquid, the higher the cleaning power and the ability to remove the development residue attached to the substrate is improved. This is considered to be related to the surface tension of water, and the higher the temperature, the higher the surface tension of water, and the lower the development residue, the higher the temperature.

Example 2
Under the conditions of the rinsing liquid temperatures of 45 ° C. and 75 ° C. in Example 1, the development residue removability when the substrate temperature was also heated was observed and evaluated while the substrate temperature was also increased.
Regarding the substrate temperature change, heating was performed for 1 minute with a hot plate until the start of development, and the substrate was immediately installed in the development apparatus and development was started. The temperature control of the substrate is carried out for the purpose of suppressing the temperature drop of the developer. For example, if the temperature of the substrate can be controlled by adding temperature-controlled water before development, it is not limited to the above. .

4A is a diagram showing the observation results of the substrate and the developer 45 ° C. and the rinse solution 45 ° C., and FIG. 4B is a diagram showing the observation results of the substrate and the developer 75 ° C. and the rinse solution 75 ° C. .
As is apparent from a) of FIG. 4, the residue removal performance was almost the same as that of the rinse liquid temperature of 75 ° C. in Example 1 at the substrate and developer temperature, and the rinse liquid temperature of 45 ° C.
As is apparent from FIG. 4 b), it was confirmed that the development residue was almost lost when the substrate and developer temperature were 75 ° C. and the rinse temperature was 75 ° C.
As described above, it was confirmed that the development residue was further suppressed as compared with Example 1 in which only the rinse temperature was changed.
The evaluation results compared with Comparative Example 1 (reference) are summarized in Table 2 below.

  As described above, it is possible to achieve residue removal by heating the temperature of the rinsing solution, and at the same time, developing and rinsing by heating the temperature of the developing solution and the substrate to remove the residue. It can be seen that further can be achieved.

In the present invention, the example in which the developer and the rinse liquid are discharged with a straight nozzle has been shown. However, the discharge method and the development / rinse time are not limited to these, and liquid crystals such as shower discharge, slit discharge, and spray discharge may be used. The present invention can be applied to any developing method applied to a developing unit for display elements and semiconductor elements.
In recent years, a color filter having a transparent pixel filter has also been recognized as a color filter, and is useful for removing development residues generated during the production of such a transparent pixel filter.

  The method for producing a color filter of the present invention can be applied to a liquid crystal display device or a solid-state imaging device, and is particularly suitable for a high-resolution CCD device, CMOS, or the like exceeding 1 million pixels. In particular, it is effective for removing development residues generated during the manufacture of a color filter having a pixel size of 1.0 μm or less. In addition to increasing the temperature of the rinsing liquid, it is more effective to increase the temperature of members and materials that contribute to the development of the developing liquid temperature, the support temperature, and the rinsing liquid temperature.

DESCRIPTION OF SYMBOLS 10 Solid-state image sensor 13 Color filter 14 Flattening layer 15 Micro lens 20G Green pixel (1st color pixel)
20R red pixel (second color pixel)
20B Blue pixel (third color pixel)
41 P well 42 Light receiving element (photodiode)
43 Impurity diffusion layer 44 Electrode 45 Wiring layer 46 BPSG film 47 Insulating film 48 P-SiN film 49 Flattening layer 100 Green pattern 101 Micro color material (micro pigment) residue

Claims (7)

A step of forming a photosensitive colored layer by applying a photosensitive colored composition containing 40% by weight or more of a coloring material in the total solid content of the photosensitive colored composition on a substrate;
A step of exposing and developing the photosensitive colored layer to form a colored pattern; and washing the substrate on which the colored pattern is formed using a warmed rinsing liquid to form the colored pattern on the substrate or the colored pattern. A method for producing a color filter, comprising a step of removing the adsorbed minute color material residue.   The manufacturing method of the color filter of Claim 1 whose temperature of the said rinse liquid is 30-80 degreeC.   3. The developing step, wherein the substrate or developer is heated to a first temperature exceeding 23 ° C., and the rinse liquid is heated to a second temperature equal to or higher than the first temperature. The manufacturing method of the color filter as described in any one of.   The said coloring material is at least any one of an organic pigment and an inorganic pigment, and the said photosensitive coloring composition is a photocurable coloring composition containing a photoinitiator and a polymeric compound. The manufacturing method of the color filter of any one of these.   The color filter obtained by the manufacturing method of the color filter of any one of Claims 1-4.   A solid-state imaging device having the color filter according to claim 5.   A liquid crystal display device comprising the color filter according to claim 5.