JP2013209636A - Liquid-repellent treatment agent, liquid-repellent film, member having water-repellent region and hydrophilic region, method for producing the same, and method for producing member having pattern of functional material formed thereon - Google Patents

Liquid-repellent treatment agent, liquid-repellent film, member having water-repellent region and hydrophilic region, method for producing the same, and method for producing member having pattern of functional material formed thereon Download PDF

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JP2013209636A
JP2013209636A JP2013037958A JP2013037958A JP2013209636A JP 2013209636 A JP2013209636 A JP 2013209636A JP 2013037958 A JP2013037958 A JP 2013037958A JP 2013037958 A JP2013037958 A JP 2013037958A JP 2013209636 A JP2013209636 A JP 2013209636A
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Masayuki Harada
昌之 原田
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Abstract

PROBLEM TO BE SOLVED: To provide a water-repellent treatment agent that can form a liquid-repellent film having excellent liquid repellency, and that, by having excellent base resistance, can form a pattern having high contrast even when a basic functional material is used.SOLUTION: A liquid-repellent treatment agent includes a fluorine-containing compound represented by general formula (1) and a fluorine-containing compound represented by general formula (12) or (13).

Description

本発明は、撥液性処理剤、該撥液性処理剤を用いて形成された撥液性膜、撥水性領域と親水性領域とを有する部材及びその製造方法、並びに機能性材料のパターンが形成された部材の製造方法に関する。   The present invention relates to a liquid repellent treatment agent, a liquid repellent film formed using the liquid repellent treatment agent, a member having a water repellent region and a hydrophilic region, a method for producing the member, and a pattern of a functional material. The present invention relates to a method for manufacturing the formed member.

撥水処理剤は種々の用途に用いられており、例えば、半導体素子、ディスプレイ、発光素子などの分野において、親水性基材上に、撥水処理剤を塗布して、親水性領域と撥水性領域とからなる所望のパターンを形成し、所望の特性を有する機能性材料を、前記親水性領域と撥水性領域の性質の違いを利用して、所望位置に配置させた(例えば、親水性領域上には機能性材料を有し、撥水性領域上には機能性材料を有さない)パターンを有する機能性部材を形成する方法が知られている。
該機能性部材は、例えば、配線、電極、絶縁層、発光層、および光学薄膜等として利用される。
The water repellent agent is used in various applications. For example, in the field of semiconductor elements, displays, light emitting elements, etc., a water repellent agent is applied on a hydrophilic base material to form a hydrophilic region and a water repellent agent. A functional material having a desired characteristic is formed at a desired position using a difference in properties between the hydrophilic region and the water-repellent region (for example, a hydrophilic region). There is known a method of forming a functional member having a pattern (having a functional material on the top and no functional material on the water-repellent region).
The functional member is used as, for example, a wiring, an electrode, an insulating layer, a light emitting layer, and an optical thin film.

近年、このような撥水性領域に、硬度や耐摩擦性が必要とされる場合がある。例えば機能性部材の生産性向上を目的とする場合においてであり、より具体的には、例えば、インクジェット法により機能性材料として無機微粒子を分散させた液体を高速で親水性領域に付与する使用形態や、ロールツーロール法(Roll to Roll法)により機能性材料を親水性領域に転写させる使用形態などが挙げられる。そのため、撥水性領域に硬度や耐摩擦性が必要とされる使用形態に好適に使用できる撥水性処理剤に対して高い需要がある。撥水性領域の硬度や耐摩擦性を向上させるためには、撥水性処理剤組成物に2官能以上の重合性化合物を添加することが有効である。   In recent years, such a water-repellent region may require hardness and friction resistance. For example, in the case of aiming to improve the productivity of functional members, more specifically, for example, a usage form in which a liquid in which inorganic fine particles are dispersed as a functional material is applied to a hydrophilic region at high speed by an inkjet method, for example. And a usage form in which a functional material is transferred to a hydrophilic region by a roll-to-roll method (Roll to Roll method). For this reason, there is a high demand for a water-repellent treatment agent that can be suitably used in a usage pattern that requires hardness and friction resistance in the water-repellent region. In order to improve the hardness and friction resistance of the water repellent region, it is effective to add a bifunctional or higher polymerizable compound to the water repellent treatment agent composition.

特許文献1には、多価アルコール誘導体である重合性含フッ素化合物を含む組成物を硬化させて撥水性領域を形成することが記載されている。
特許文献2には、エポキシ基を1個又は2個有する重合性含フッ素化合物を含む組成物を硬化させて撥水性領域を形成することが記載されている。
Patent Document 1 describes that a water-repellent region is formed by curing a composition containing a polymerizable fluorine-containing compound that is a polyhydric alcohol derivative.
Patent Document 2 describes that a water-repellent region is formed by curing a composition containing a polymerizable fluorine-containing compound having one or two epoxy groups.

また、重合性含フッ素化合物に関し、特許文献3には、反射防止膜として好適な重合体薄膜の形成に適した含フッ素多官能モノマーが開示されている。   Regarding the polymerizable fluorine-containing compound, Patent Document 3 discloses a fluorine-containing polyfunctional monomer suitable for forming a polymer thin film suitable as an antireflection film.

国際公開第08/018599号International Publication No. 08/018599 特開2007−248726号公報JP 2007-248726 A 特開2006−028280号公報JP 2006-028280 A

しかしながら、特許文献1に記載の重合性含フッ素化合物を含む組成物を用いて形成した撥水性領域と、親水性領域を有する部材において、前記親水性領域に塩基性の機能性材料を含む液体を塗布して機能性材料のパターンを形成しようとすると、耐摩擦性は優れているものの、該撥水性領域が耐塩基性に乏しいことから、親水性領域と撥水性領域との境界の乱れが生じ、親水性領域と撥水性領域の境界におけるコントラストが低下し、所望のパターンを有する機能性部材が得られないという問題がある。
特許文献2に記載の重合性含フッ素化合物を含む組成物を撥水性膜とした場合、該重合性含フッ素化合物のフッ素含有率が低いことから、膜の撥水性が不十分であり、高いコントラストを有する部材が得られないという問題があり、また重合性基密度が低いために耐摩擦性に劣ることから、硬度や耐摩擦性を必要とされる使用形態には適さない。
また、特許文献3には、該含フッ素多官能モノマーを撥水性膜として用いうるという記載も示唆もない。
However, in a member having a water-repellent region and a hydrophilic region formed using the composition containing the polymerizable fluorine-containing compound described in Patent Document 1, a liquid containing a basic functional material in the hydrophilic region. When an attempt is made to form a functional material pattern by coating, the frictional resistance is excellent, but the water-repellent region is poor in base resistance, resulting in disturbance of the boundary between the hydrophilic region and the water-repellent region. There is a problem that the contrast at the boundary between the hydrophilic region and the water repellent region is lowered, and a functional member having a desired pattern cannot be obtained.
When the composition containing the polymerizable fluorine-containing compound described in Patent Document 2 is used as a water-repellent film, the fluorine content of the polymerizable fluorine-containing compound is low, so that the film has insufficient water repellency and high contrast. In addition, there is a problem that a member having the above cannot be obtained, and since the polymerizable group density is low, the friction resistance is inferior, so that it is not suitable for a usage form that requires hardness and friction resistance.
In addition, Patent Document 3 neither describes nor suggests that the fluorine-containing polyfunctional monomer can be used as a water-repellent film.

したがって、本発明の課題は、撥液性及び耐摩擦性に優れた撥液性膜を形成することができ、かつ耐塩基性に優れることで、塩基性の機能性材料を用いた場合でも高いコントラストを有するパターンを形成することができる撥水処理剤を提供することである。   Therefore, the problem of the present invention is high even when a basic functional material is used because a liquid-repellent film excellent in liquid repellency and friction resistance can be formed and the base resistance is excellent. It is an object of the present invention to provide a water repellent agent capable of forming a pattern having contrast.

本発明者等は上記した実情に鑑みて鋭意検討した結果、含フッ素コア部を有する特定の化合物と、別種の特定の含フッ素化合物とを有する撥液性処理剤を用いた撥液性膜において、耐塩基性及び耐摩擦性が良好で、非常に撥液性が高くなることを見出した。さらには、非常に撥液性が高いにもかかわらず、撥液性処理剤を親水性表面に塗布した場合でも弾かれない(均質な塗膜を形成できる)という予想外の効果を見出し、本発明を完成するに至った。   As a result of intensive studies in view of the above circumstances, the present inventors have found that in a liquid-repellent film using a liquid-repellent treatment agent having a specific compound having a fluorine-containing core part and another specific type of fluorine-containing compound. The inventors have found that the base resistance and the friction resistance are good and the liquid repellency is very high. Furthermore, even though the liquid repellency is very high, an unexpected effect was found that even when a liquid repellent treatment agent was applied to a hydrophilic surface, it was not repelled (a uniform coating film could be formed). The invention has been completed.

即ち、本発明は以下のとおりである。   That is, the present invention is as follows.

〔1〕
下記一般式(1)で表される含フッ素化合物と、下記一般式(12)又は(13)で表される含フッ素化合物とを含有する撥液性処理剤。
[1]
A liquid repellent treatment agent comprising a fluorine-containing compound represented by the following general formula (1) and a fluorine-containing compound represented by the following general formula (12) or (13).

Figure 2013209636
Figure 2013209636

一般式(1)中、aは3〜8の整数を表し、bは0〜3の整数を表し、cは0〜10の整数を表し、d及びeはそれぞれ独立に0又は1を表し、rは0又は1を表し、Yは下記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記一般式(6)又は(7)で表される基を表し、L及びLは、それぞれ独立に、下記一般式(8)、(9)、(10)又は(11)で表される基を表し、Rfは(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。 In general formula (1), a represents an integer of 3 to 8, b represents an integer of 0 to 3, c represents an integer of 0 to 10, d and e each independently represents 0 or 1, r represents 0 or 1, Y represents a group represented by the following general formula (2), (3), (4) or (5), an allyl group, or a vinyl group, and L 1 represents the following general formula ( 6) or a group represented by (7), L 2 and L 3 each independently represent a group represented by the following general formula (8), (9), (10) or (11) , Rf 1 represents a (a + b) -valent, may contain an etheric oxygen atom, a linear, branched or cyclic saturated perfluoroalkyl group having 3 to 20 carbon atoms, Rf 2 is etheric oxygen atoms may contain, represents a monovalent perfluoroalkyl group or a fluorine atom, linear or branched C1-5, Rf 3 is It may contain ether oxygen atoms, a straight, branched or cyclic, monovalent perfluoroalkyl group of 3 to 100 carbon atoms.

Figure 2013209636
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)中、mは0〜10の整数を表す。
一般式(8)、(9)、(10)、(11)中、nは0〜10の整数を表す。
一般式(7)中、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
In general formula (2), X represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a trifluoromethyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6) and (7), m represents an integer of 0 to 10.
In general formula (8), (9), (10), (11), n represents the integer of 0-10.
In the general formula (7), Y represents a group represented by the above general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.

Figure 2013209636
Figure 2013209636

一般式(12)中、fは1〜5の整数を表し、gは0又は1を表し、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは上記一般式(6)若しくは(7)、又は下記一般式(14)若しくは(15)で表される基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
一般式(13)中、h及びiはそれぞれ独立に1〜5の整数を表し、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lはそれぞれ独立に上記一般式(6)若しくは(7)、又は下記一般式(14)若しくは(15)で表される基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の2価のパーフルオロアルキル基を表す。
In general formula (12), f represents an integer of 1 to 5, g represents 0 or 1, and Y represents a group represented by the general formula (2), (3), (4) or (5). , An allyl group, or a vinyl group, L 4 represents a group represented by the above general formula (6) or (7), or the following general formula (14) or (15), and Rf 4 represents an etheric oxygen A linear, branched or cyclic monovalent perfluoroalkyl group having 1 to 100 carbon atoms which may contain an atom is represented.
In general formula (13), h and i each independently represent an integer of 1 to 5, Y is a group represented by the above general formula (2), (3), (4) or (5), or an allyl group Or a vinyl group, L 4 each independently represents a group represented by the above general formula (6) or (7), or the following general formula (14) or (15), and Rf 5 represents an etheric oxygen A linear, branched or cyclic divalent perfluoroalkyl group having 1 to 100 carbon atoms which may contain an atom is represented.

Figure 2013209636
Figure 2013209636

一般式(14)中、mは0〜10の整数を表す。
一般式(15)中、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
〔2〕
上記一般式(1)で表される含フッ素化合物の含有比率が5質量%以上90質量%以下であり、かつ上記一般式(12)又は(13)で表される含フッ素化合物の含有比率が10質量%以上95質量%である、〔1〕に記載の撥液性処理剤。
〔3〕
一般式(12)又は(13)で表される含フッ素化合物のフッ素原子含率が30質量%以上75質量%以下である、〔1〕又は〔2〕に記載の撥液性処理剤。
〔4〕
さらに下記一般式(16)で表される非フッ素化合物を含有する〔1〕〜〔3〕のいずれか1項に記載の撥液性処理剤。
In general formula (14), m represents an integer of 0 to 10.
In general formula (15), Y represents a group represented by the above general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.
[2]
The content ratio of the fluorine-containing compound represented by the general formula (1) is 5% by mass or more and 90% by mass or less, and the content ratio of the fluorine-containing compound represented by the general formula (12) or (13) is The liquid repellent treatment agent according to [1], which is 10% by mass or more and 95% by mass.
[3]
The liquid repellent treatment agent according to [1] or [2], wherein a fluorine atom content of the fluorine-containing compound represented by the general formula (12) or (13) is 30% by mass or more and 75% by mass or less.
[4]
Furthermore, the liquid-repellent processing agent of any one of [1]-[3] containing the non-fluorine compound represented by following General formula (16).

Figure 2013209636
Figure 2013209636

一般式(16)中、jは1〜6の整数を表し、Yは下記一般式(21)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記一般式(6)、(7)、(14)又は(15)で表される基を表し、Rは、水素原子、又は、置換基を有してもよい炭素数1〜20の直鎖状、分枝状又は環状のj価の有機基を表す。 In general formula (16), j represents an integer of 1 to 6, and Y represents a group represented by the following general formula (21), (3), (4) or (5), an allyl group, or a vinyl group. L 5 represents a group represented by the following general formula (6), (7), (14) or (15), and R 7 is a hydrogen atom or a carbon number which may have a substituent. 1-20 linear, branched or cyclic j-valent organic groups are represented.

Figure 2013209636
Figure 2013209636

一般式(21)中、Xは水素原子、塩素原子、メチル基、又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)、(14)中、mは0〜10の整数を表す。
一般式(7)、(15)中、Yは上記一般式(21)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
〔5〕
一般式(1)中の(a+b)が3〜8の整数である〔1〕〜〔4〕のいずれか1項に記載の撥液性処理剤。
〔6〕
一般式(1)中のd及びeが1である〔1〕〜〔5〕のいずれか1項に記載の撥液性処理剤。
〔7〕
上記一般式(1)で表される含フッ素化合物が下記一般式(17)で表される含フッ素化合物であり、且つ上記一般式(12)又は(13)で表される含フッ素化合物が下記一般式(18)又は(19)で表される含フッ素化合物である〔1〕〜〔6〕のいずれか1項に記載の撥液性処理剤。
In General Formula (21), X 1 represents a hydrogen atom, a chlorine atom, a methyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6), (7), and (14), m represents an integer of 0 to 10.
In general formulas (7) and (15), Y represents a group represented by the above general formula (21), (3), (4) or (5), an allyl group, or a vinyl group.
[5]
The liquid repellent treatment agent according to any one of [1] to [4], wherein (a + b) in the general formula (1) is an integer of 3 to 8.
[6]
The liquid repellent treatment agent according to any one of [1] to [5], wherein d and e in the general formula (1) are 1.
[7]
The fluorine-containing compound represented by the general formula (1) is a fluorine-containing compound represented by the following general formula (17), and the fluorine-containing compound represented by the general formula (12) or (13) is The liquid repellent treatment agent according to any one of [1] to [6], which is a fluorine-containing compound represented by the general formula (18) or (19).

Figure 2013209636
Figure 2013209636

一般式(17)中、aは3〜8の整数を表し、bは0〜3の整数を表し、cは0〜10の整数を表し、Yは下記式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記式(6)又は(7)で表される基を表し、Rfは(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表し、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。 In general formula (17), a represents an integer of 3 to 8, b represents an integer of 0 to 3, c represents an integer of 0 to 10, Y represents the following formulas (2), (3), ( 4) or a group represented by (5), an allyl group, or a vinyl group, L 1 represents a group represented by the following formula (6) or (7), and Rf 1 is an (a + b) -valent group. may contain an etheric oxygen atom, a linear, branched or cyclic saturated perfluoroalkyl group having 3 to 20 carbon atoms, Rf 2 may contain an etheric oxygen atom, 1 to carbon atoms 5 represents a linear or branched monovalent perfluoroalkyl group or a fluorine atom, and Rf 6 may contain an etheric oxygen atom having at least one trifluoromethyl group, having 3 to 3 carbon atoms 100 linear, branched or cyclic monovalent perfluoroalkyl groups are represented.

Figure 2013209636
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)中、mは0〜10の整数を表す。
一般式(8)、(9)、(10)、(11)中、nは0〜10の整数を表す。
一般式(7)中、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
In general formula (2), X represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a trifluoromethyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6) and (7), m represents an integer of 0 to 10.
In general formula (8), (9), (10), (11), n represents the integer of 0-10.
In the general formula (7), Y represents a group represented by the above general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.

Figure 2013209636
Figure 2013209636

一般式(18)中、fは1〜5の整数を表し、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
一般式(19)中、h及びiはそれぞれ独立に1〜5の整数を表し、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状又は分枝状の2価のパーフルオロアルキル基を表す。
〔8〕
一般式(1)中のRfが下記f−1〜f−14から選ばれる基である〔1〕〜〔7〕のいずれか1項に記載の撥液性処理剤。
In general formula (18), f represents an integer of 1 to 5, and Y represents a group represented by the above general formula (2), (3), (4) or (5), an allyl group, or a vinyl group. Rf 7 represents a linear, branched or cyclic monovalent perfluoroalkyl group having 1 to 100 carbon atoms, which may contain an etheric oxygen atom, and has at least one trifluoromethyl group. .
In general formula (19), h and i each independently represent an integer of 1 to 5, Y is a group represented by the above general formula (2), (3), (4) or (5), an allyl group Or Rf 8 represents a linear or branched divalent perfluoroalkyl group having 1 to 100 carbon atoms, which may contain an etheric oxygen atom.
[8]
The liquid repellent treatment agent according to any one of [1] to [7], wherein Rf1 in the general formula (1) is a group selected from the following f- 1 to f-14.

Figure 2013209636
Figure 2013209636

式中、*はY−L−O−CH−(CF−[CF(Rf)]−(O)−L−又はRf―(O)−L−と結合する位置を表す。
〔9〕
〔1〕〜〔8〕のいずれか1項に記載の撥液性処理剤を硬化させた撥液性膜。
〔10〕
基材の表面に撥水性領域と親水性領域とを有する部材であって、上記撥水性領域は〔1〕〜〔8〕のいずれか1項に記載の撥液性処理剤を硬化させた撥液性膜からなる部材。
〔11〕
上記撥水性領域と上記親水性領域がパターンを形成している〔10〕に記載の部材。
〔12〕
親水性表面を有する基材の表面に〔1〕〜〔8〕のいずれか1項に記載の撥液性処理剤を含む塗膜を形成する工程、次いで上記塗膜の一部に光を照射して撥液性処理剤を含む塗膜を硬化させる工程、次いで基材表面の未硬化の撥液性処理剤を除去して親水性表面を露出させる工程を含む、〔10〕又は〔11〕に記載の部材の製造方法。
〔13〕
〔10〕若しくは〔11〕に記載の部材、又は〔12〕に記載の製造方法により製造された部材の親水性領域に、機能性材料を含む液体を塗布する工程、次いで上記液体を塗布した部材を乾燥させる工程を含む、機能性材料のパターンが形成された部材の製造方法。
Wherein * Y-L 1 -O-CH 2 - (CF 2) c - [CF (Rf 2)] r - (O) d -L 2 - or Rf 3 - (O) e -L 3 - Represents the position to be combined.
[9]
A liquid repellent film obtained by curing the liquid repellent treatment agent according to any one of [1] to [8].
[10]
A member having a water-repellent region and a hydrophilic region on the surface of a substrate, wherein the water-repellent region is obtained by curing the liquid-repellent treatment agent according to any one of [1] to [8]. A member made of a liquid film.
[11]
The member according to [10], wherein the water-repellent region and the hydrophilic region form a pattern.
[12]
A step of forming a coating film containing the liquid repellent treatment agent according to any one of [1] to [8] on the surface of a substrate having a hydrophilic surface, and then irradiating a part of the coating film with light A step of curing the coating film containing the liquid repellent treatment agent, and then a step of removing the uncured liquid repellent treatment agent on the substrate surface to expose the hydrophilic surface, [10] or [11] The manufacturing method of the member as described in any one of.
[13]
The step of applying a liquid containing a functional material to the hydrophilic region of the member according to [10] or [11] or the member manufactured by the manufacturing method according to [12], and then a member to which the liquid is applied The manufacturing method of the member in which the pattern of the functional material was formed including the process of drying.

本発明によれば、耐塩基性及び耐摩擦性が良好で、非常に高い撥液性を有しながら、同時に親水性表面に塗布した場合でも弾かれない撥液性処理剤、該撥液性処理剤を用いた撥液性膜及び処理基材、処理基材の製造方法、並びに機能性材用を付与した部材の製造方法が提供される。   According to the present invention, a liquid-repellent treatment agent that has good base resistance and friction resistance, has very high liquid repellency, and does not repel even when applied to a hydrophilic surface at the same time, the liquid repellency Provided are a liquid repellent film and a treated substrate using a treating agent, a method for producing a treated substrate, and a method for producing a member provided with a functional material.

本発明の処理基材の製造方法の一態様を示す断面模式図Cross-sectional schematic diagram showing one embodiment of a method for producing a treated substrate of the present invention 本発明の部材の製造方法の一態様を示す断面模式図Cross-sectional schematic diagram showing one embodiment of a method for producing a member of the present invention

本発明の撥液性処理剤は、下記一般式(1)で表される含フッ素化合物と、下記一般式(12)又は(13)で表される含フッ素化合物とを含有する。
以下に一般式(1)、一般式(12)、一般式(13)で表される化合物について詳細に説明する。
The liquid repellent treatment agent of the present invention contains a fluorine-containing compound represented by the following general formula (1) and a fluorine-containing compound represented by the following general formula (12) or (13).
The compounds represented by general formula (1), general formula (12), and general formula (13) are described in detail below.

<一般式(1)で表される化合物>
本発明に用いられる一般式(1)で表される化合物とは、主に複数のフッ素原子と炭素原子から成る(但し、一部に酸素原子を含んでもよい)、実質的に重合に関与しない原子団(以下、「含フッ素コア部」ともいう)と、エステル結合やエーテル結合などの連結基を介して、ラジカル重合性、カチオン重合性、または縮合重合性などの重合性を有する、3つ以上の重合性基を有する含フッ素化合物である。
<Compound represented by the general formula (1)>
The compound represented by the general formula (1) used in the present invention is mainly composed of a plurality of fluorine atoms and carbon atoms (however, oxygen atoms may be partly included), and does not substantially participate in polymerization. 3 groups having radical polymerizability, cationic polymerizability, or condensation polymerizability via an atomic group (hereinafter also referred to as “fluorine-containing core”) and a linking group such as an ester bond or an ether bond. This is a fluorine-containing compound having the above polymerizable group.

Figure 2013209636
Figure 2013209636

一般式(1)中、aは3〜8の整数を表し、bは0〜3の整数を表し、cは0〜10の整数を表し、d及びeはそれぞれ独立に0又は1を表し、rは0又は1を表し、Yは下記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記一般式(6)又は(7)で表される基を表し、L及びLは、それぞれ独立に、下記一般式(8)、(9)、(10)又は(11)で表される基を表し、Rfは(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。 In general formula (1), a represents an integer of 3 to 8, b represents an integer of 0 to 3, c represents an integer of 0 to 10, d and e each independently represents 0 or 1, r represents 0 or 1, Y represents a group represented by the following general formula (2), (3), (4) or (5), an allyl group, or a vinyl group, and L 1 represents the following general formula ( 6) or a group represented by (7), L 2 and L 3 each independently represent a group represented by the following general formula (8), (9), (10) or (11) , Rf 1 represents a (a + b) -valent, may contain an etheric oxygen atom, a linear, branched or cyclic saturated perfluoroalkyl group having 3 to 20 carbon atoms, Rf 2 is etheric oxygen atoms may contain, represents a monovalent perfluoroalkyl group or a fluorine atom, linear or branched C1-5, Rf 3 is It may contain ether oxygen atoms, a straight, branched or cyclic, monovalent perfluoroalkyl group of 3 to 100 carbon atoms.

Figure 2013209636
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)中、mは0〜10の整数を表す。
一般式(8)、(9)、(10)、(11)中、nは0〜10の整数を表す。
一般式(7)中、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
In general formula (2), X represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a trifluoromethyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6) and (7), m represents an integer of 0 to 10.
In general formula (8), (9), (10), (11), n represents the integer of 0-10.
In the general formula (7), Y represents a group represented by the above general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.

一般式(1)中、aは3〜8の整数を表す。aは原料素材の入手性及び製造の容易さの観点から、3〜6の整数であることが好ましく、3〜5の整数であることがより好ましく、3又は4であることがさらに好ましい。   In general formula (1), a represents an integer of 3 to 8. a is preferably an integer of 3 to 6, more preferably an integer of 3 to 5, and even more preferably 3 or 4 from the viewpoint of availability of raw materials and ease of production.

一般式(1)中、bは0〜3の整数を表す。bは製造の容易さの観点から、0〜2の整数であることが好ましく、0又は1であることがより好ましい。   In general formula (1), b represents an integer of 0 to 3. From the viewpoint of ease of production, b is preferably an integer of 0 to 2, and more preferably 0 or 1.

一般式(1)中、a+bは3〜11の整数を表す。a+bは撥液性と耐摩擦性とのバランスの観点から、3〜8の整数であることが好ましく、3〜6の整数であることがより好ましく、3又は4であることがさらに好ましい。   In general formula (1), a + b represents an integer of 3 to 11. a + b is preferably an integer of 3 to 8, more preferably an integer of 3 to 6, and further preferably 3 or 4, from the viewpoint of the balance between liquid repellency and friction resistance.

一般式(1)中、cは0〜10の整数を表す。cは0〜6の整数であることが好ましく、0〜3の整数であることがより好ましく、0又は1であることがさらに好ましく、1であることがさらにより好ましい。   In general formula (1), c represents an integer of 0 to 10. c is preferably an integer of 0 to 6, more preferably an integer of 0 to 3, further preferably 0 or 1, and still more preferably 1.

一般式(1)中、dは0又は1を表す。dは製造の容易さの観点から、1であることが好ましい。   In general formula (1), d represents 0 or 1. d is preferably 1 from the viewpoint of ease of production.

一般式(1)中、eは0又は1を表す。eは1であることが好ましい。   In general formula (1), e represents 0 or 1. e is preferably 1.

一般式(1)中、rは0又は1を表す。rは1であることが好ましい。   In general formula (1), r represents 0 or 1. r is preferably 1.

一般式(1)中、Yは下記一般式(2)、(3)、(4)若しくは(5)で表される基(但し、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表し、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表し、kは1又は2を表す。)、アリル基、又はビニル基を表す。 In general formula (1), Y is a group represented by the following general formula (2), (3), (4) or (5) (where X is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, Represents a fluoromethyl group or a hydroxyl group, and R 1 , R 2 , R 3 , R 4 , R 5 and R 6 each independently have 1 to 5 carbon atoms which may have a hydrogen atom or a substituent. Represents a linear or branched monovalent alkyl group, and k represents 1 or 2.), an allyl group, or a vinyl group.

Figure 2013209636
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子又はメチル基であることが好ましく、水素原子であることが好ましい。   In general formula (2), X is preferably a hydrogen atom, a fluorine atom or a methyl group, and more preferably a hydrogen atom.

一般式(3)〜(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。アルキル基が置換基を有する場合の置換基としては、フッ素原子、アルコキシル基、水酸基が挙げられる。
、R、R、R、R及びRは、それぞれ独立に、水素原子、メチル基、又はエチル基であることが好ましく、水素原子であることがより好ましい。
In the general formulas (3) to (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are each independently a hydrogen atom or a carbon atom which may have a substituent 1 Represents a linear or branched monovalent alkyl group of ˜5. Examples of the substituent when the alkyl group has a substituent include a fluorine atom, an alkoxyl group, and a hydroxyl group.
R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are each independently preferably a hydrogen atom, a methyl group or an ethyl group, more preferably a hydrogen atom.

一般式(5)中、kは1又は2を表す。kは1であることが好ましい。   In general formula (5), k represents 1 or 2. k is preferably 1.

一般式(1)中のYは、すべて同一であっても、互いに異なっていてもよいが、製造適性の観点からすべて同一であることが好ましい。互いに異なる場合は、2種類以上の硬化処理を組み合わせることにより、より強固な硬化物を作製できる点で好ましい。   Y in the general formula (1) may be the same or different from each other, but is preferably the same from the viewpoint of production suitability. When mutually different, it is preferable at the point which can produce harder hardened | cured material by combining two or more types of hardening processes.

一般式(1)中のYとしては、撥液性と耐摩擦性とのバランスの観点から、上記一般式(2)又は一般式(3)で表される基であることが好ましい。   Y in the general formula (1) is preferably a group represented by the general formula (2) or the general formula (3) from the viewpoint of a balance between liquid repellency and friction resistance.

一般式(1)中、Lは下記一般式(6)又は(7)で表される基(但し、mは0〜10の整数を表す。)を表す。 In General Formula (1), L 1 represents a group represented by the following General Formula (6) or (7) (where m represents an integer of 0 to 10).

Figure 2013209636
Figure 2013209636

一般式(6)及び(7)中、mは0〜4であることが好ましく、0又は1であることがより好ましく、0であることがさらに好ましい。mが0の場合は、Lが単結合であることを表す。 In general formulas (6) and (7), m is preferably 0 to 4, more preferably 0 or 1, and still more preferably 0. When m is 0, L 1 is a single bond.

一般式(1)中、L及びLは、それぞれ独立に、下記一般式(8)、(9)、(10)又は(11)で表される基(但し、nは0〜10の整数を表す。)を表す。 In general formula (1), L 2 and L 3 are each independently a group represented by the following general formula (8), (9), (10) or (11) (where n is 0 to 10). Represents an integer).

Figure 2013209636
Figure 2013209636

一般式(8)、(9)、(10)及び(11)中、nは0〜4であることが好ましく、0又は1であることがより好ましく、0であることがさらに好ましい。nが0の場合は、L及びLが単結合であることを表す。 In general formulas (8), (9), (10), and (11), n is preferably 0 to 4, more preferably 0 or 1, and still more preferably 0. When n is 0, it represents that L 2 and L 3 are single bonds.

一般式(1)中、Rfは「含フッ素コア部」を構成し、(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表す。パーフルオロアルキル基とは、実質的に全ての水素原子がフッ素原子に置換されたアルキル基であり、且つ、水酸基、カルボキシル基、或いはニトロ基などの置換基を有さない基である。
Rfは好ましくは、(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜16の分枝状又は環状の飽和パーフルオロアルキル基であり、より好ましくは、(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数4〜12の分枝状又は環状の飽和パーフルオロアルキル基である。
In the general formula (1), Rf 1 constitutes a “fluorine-containing core part” and has a (a + b) -valent, C3-C20 linear, branched or cyclic group which may contain an etheric oxygen atom. Represents a saturated perfluoroalkyl group. The perfluoroalkyl group is an alkyl group in which substantially all hydrogen atoms are substituted with fluorine atoms, and is a group having no substituent such as a hydroxyl group, a carboxyl group, or a nitro group.
Rf 1 is preferably a (a + b) -valent branched or cyclic saturated perfluoroalkyl group having 3 to 16 carbon atoms which may contain an etheric oxygen atom, more preferably an (a + b) -valent. A branched or cyclic saturated perfluoroalkyl group having 4 to 12 carbon atoms, which may contain an etheric oxygen atom.

Rfで表される「含フッ素コア部」の好ましい例として、下記の構造が挙げられる。 Preferable examples of the “fluorinated core portion” represented by Rf 1 include the following structures.

Figure 2013209636
Figure 2013209636

式中、*はY−L−O−CH−(CF−[CF(Rf)]−(O)−L−又はRf―(O)−L−と結合する位置を表す。 Wherein * Y-L 1 -O-CH 2 - (CF 2) c - [CF (Rf 2)] r - (O) d -L 2 - or Rf 3 - (O) e -L 3 - Represents the position to be combined.

Rfは、原料素材の入手性の観点から、上記f−1、f−2、f−4、f−5、f−6、f−8、f−10、f−11又はf−12であることが好ましく、撥液性と耐摩擦性とのバランスの観点からf−5、f−8、又はf−11であることがより好ましく、f−8であることが最も好ましい。 Rf 1 is the above f-1, f-2, f-4, f-5, f-6, f-8, f-10, f-11 or f-12 from the viewpoint of availability of raw material. Preferably, it is f-5, f-8, or f-11 from the viewpoint of the balance between liquid repellency and friction resistance, and most preferably f-8.

一般式(1)中、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表す。パーフルオロアルキル基の例としては、CF―、CFCF−、CF(CF−、(CFCF−、CFCFOCFCF−、CFCFOCFCFOCF−、(CFCFO(CF−等が挙げられる。
Rfは、CF−又はフッ素原子であることが好ましく、フッ素原子であることがより好ましい。
In the general formula (1), Rf 2 represents an etheric oxygen atom may include, monovalent perfluoroalkyl group or a fluorine atom, linear or branched C1-5. Examples of perfluoroalkyl groups include CF 3- , CF 3 CF 2- , CF 3 (CF 2 ) 3- , (CF 3 ) 2 CF-, CF 3 CF 2 OCF 2 CF 2- , CF 3 CF 2 OCF 2 CF 2 OCF 2 -, 2 (CF 3) 2 CFO (CF 2) - and the like are.
Rf 2 is preferably CF 3 — or a fluorine atom, and more preferably a fluorine atom.

一般式(1)中、Rfは、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
Rfは、エーテル性酸素原子を含んでもよい、炭素数3〜60のパーフルオロアルキル基であることが好ましく、エーテル性酸素原子を含んでもよい、炭素数4〜40のパーフルオロアルキル基であることがより好ましく、エーテル性酸素原子を含んでもよい、炭素数6〜20のパーフルオロアルキル基であることが更に好ましい。
以下にRfの具体例を示す。
なお、下記例中のx、yは、Rf中の炭素数が3〜100を満たすような整数の組み合わせを表す。xは好ましくは、1〜40であり、より好ましくは3〜20である。yは好ましくは、1〜40であり、より好ましくは3〜20である。
In the general formula (1), Rf 3 may contain an etheric oxygen atom, a straight, branched or cyclic, monovalent perfluoroalkyl group of 3 to 100 carbon atoms.
Rf 3 is preferably a perfluoroalkyl group having 3 to 60 carbon atoms which may contain an etheric oxygen atom, and is a perfluoroalkyl group having 4 to 40 carbon atoms which may contain an etheric oxygen atom. More preferred is a perfluoroalkyl group having 6 to 20 carbon atoms which may contain an etheric oxygen atom.
Specific examples of Rf 3 are shown below.
In the following examples, x and y represent an integer combination such that the number of carbon atoms in Rf 3 satisfies 3 to 100. x is preferably 1 to 40, and more preferably 3 to 20. y is preferably 1 to 40, and more preferably 3 to 20.

CF(CF−、
(CFCFOCFCF−、
CFOCFCF−、
CF(OCFCF−、
CFCF(OCFCF−、
CF(OCF(OCFCF−、
CF(OCFCFCF−、
CFCFCF(OCF(CF)CF−、
CFCFOCFCF−、
CFCF(OCFCF−、
CFCF(OCFCF−、
CFOCFCFCFCF−、
((CFCF)CFCF(CF)−、
(CFCOCFCF−、
(CFCFOCFCFOCFCF−、
(CFCCFCF(CF)CFCF−、
(CFCFCFCFCFCF(CF)CFCF−、
CF 3 (CF 2 ) 5- ,
(CF 3 ) 2 CFOCF 2 CF 2- ,
CF 3 OCF 2 CF 2- ,
CF 3 (OCF 2 CF 2 ) 4 −,
CF 3 CF 2 (OCF 2 CF 2) x -,
CF 3 (OCF 2) x ( OCF 2 CF 2) y -,
CF 3 (OCF 2 CF 2 CF 2) x -,
CF 3 CF 2 CF 2 (OCF (CF 3) CF 2) 4 -,
CF 3 CF 2 OCF 2 CF 2- ,
CF 3 CF 2 (OCF 2 CF 2) 4 -,
CF 3 CF 2 (OCF 2 CF 2 ) 6- ,
CF 3 OCF 2 CF 2 CF 2 CF 2- ,
((CF 3) 2 CF) 2 CFCF (CF 3) -,
(CF 3 ) 3 COCF 2 CF 2- ,
(CF 3 CF 2 OCF 2 ) 2 CFOCF 2 CF 2- ,
(CF 3 ) 3 CCF 2 CF (CF 3 ) CF 2 CF 2- ,
(CF 3 ) 2 CFCF 2 CF 2 CF 2 CF (CF 3 ) CF 2 CF 2- ,

CF(CF−、
CF(CF−、
CF(CF−、
CFCFCFOCF−、
CFCFCFOCFCF−、
CFCFCFOCF(CF)−、
CFCFCFOCF(CF)CF−、
CFCFCFOCF(CF)CFOCFCF−、
CFCFCFOCF(CF)CFOCF(CF)−、
CFCFCFOCF(CF)CFOCF(CF)CF
CF 3 (CF 2 ) 3 −,
CF 3 (CF 2) 7 - ,
CF 3 (CF 2 ) 9 −,
CF 3 CF 2 CF 2 OCF 2- ,
CF 3 CF 2 CF 2 OCF 2 CF 2- ,
CF 3 CF 2 CF 2 OCF ( CF 3) -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF 2 CF 2 -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF (CF 3) -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF (CF 3) CF 2 -

一般式(1)で表される化合物は、撥液性の観点から、フッ素原子含有量が該化合物の32質量%以上であることが好ましく、より好ましくは35質量%以上、さらに好ましくは40質量%以上である。   From the viewpoint of liquid repellency, the compound represented by the general formula (1) preferably has a fluorine atom content of 32% by mass or more of the compound, more preferably 35% by mass or more, and still more preferably 40% by mass. % Or more.

前記一般式(1)で表される含フッ素化合物は、下記一般式(17)で表される含フッ素化合物であることが好ましい。   The fluorine-containing compound represented by the general formula (1) is preferably a fluorine-containing compound represented by the following general formula (17).

Figure 2013209636
Figure 2013209636

一般式(17)中、aは3〜8の整数を表し、bは0〜3の整数を表し、cは0〜10の整数を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは前記一般式(6)又は(7)で表される基を表し、Rfは(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表し、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。 In general formula (17), a represents an integer of 3 to 8, b represents an integer of 0 to 3, c represents an integer of 0 to 10, Y represents the general formulas (2), (3), (4) or (5) represents a group, an allyl group, or a vinyl group, L 1 represents a group represented by the general formula (6) or (7), and Rf 1 represents an (a + b) value. Represents a linear, branched or cyclic saturated perfluoroalkyl group having 3 to 20 carbon atoms which may contain an etheric oxygen atom, and Rf 2 may contain an etheric oxygen atom. 1 to 5 linear or branched monovalent perfluoroalkyl group or fluorine atom, Rf 6 having at least one trifluoromethyl group, which may contain an etheric oxygen atom, carbon number 3 to 100 linear, branched or cyclic monovalent perfluoroalkyl groups are represented.

一般式(17)中、a、b、c、Y、L、Rf、Rfの具体例及び好ましい範囲は、前記一般式(1)中におけるa、b、c、Y、L、Rf、Rfと同様である。 In the general formula (17), specific examples and preferred ranges of a, b, c, Y, L 1 , Rf 1 , Rf 2 are a, b, c, Y, L 1 in the general formula (1), The same as Rf 1 and Rf 2 .

一般式(17)中、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数3〜60のパーフルオロアルキル基であることが好ましく、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数4〜40のパーフルオロアルキル基であることがより好ましく、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数6〜20のパーフルオロアルキル基であることが更に好ましい。
Rfの具体例及び好ましい範囲は、前記一般式(1)中におけるRfの具体例及び好ましい範囲と同様である。
In the general formula (17), Rf 6 is a linear, branched or cyclic monovalent peroxy group having 3 to 100 carbon atoms, which may contain an etheric oxygen atom, having at least one trifluoromethyl group. Represents a fluoroalkyl group.
Rf 6 is preferably a C 3-60 perfluoroalkyl group having at least one trifluoromethyl group, which may contain an etheric oxygen atom, and an ether having at least one trifluoromethyl group It is more preferably a perfluoroalkyl group having 4 to 40 carbon atoms which may contain a functional oxygen atom, and may contain an etheric oxygen atom having at least one trifluoromethyl group and having 6 to 20 carbon atoms. More preferred is a perfluoroalkyl group.
Specific examples and preferred ranges of Rf 6 are the same as the specific examples and preferred ranges of Rf 3 in the general formula (1).

以下に一般式(1)で表される化合物の具体例を挙げるが、本発明はこれらによって限定されない。具体例として同一分子中のYがすべて同一の構造のみを挙げる。しかしながら、前記のようにYが互いに異なる場合に好ましい効果を得られる場合があり、同一分子中のYが異なる構造についてなんら排除するものではない。下記具体例化合物中のx、yは各々独立に1〜40の整数を表す。n1、n2、n3、n4は、各々独立に0〜10の整数を表す。   Although the specific example of a compound represented by General formula (1) below is given, this invention is not limited by these. As a specific example, only structures in which all Y in the same molecule are the same are listed. However, when Y is different from each other as described above, a favorable effect may be obtained, and this does not exclude any structure with different Y in the same molecule. In the following specific example compounds, x and y each independently represents an integer of 1 to 40. n1, n2, n3, and n4 each independently represents an integer of 0 to 10.

Figure 2013209636
Figure 2013209636

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Figure 2013209636

上記具体例化合物の中でも、MA1、MA2、MA3、MA4、MA5、MA6、MA7、MA9、MA12、MA13、MA14、MA17、MA23、MA24、MA30、MA31、MA32、MA33、MA35、MA37、MA38、ME1、ME2、ME3、ME4、ME5、ME6、ME7、ME12、ME13、ME14、ME17、ME23、ME24、ME29、ME31、ME32、ME33、ME35、ME37、ME39、ME40が好ましく、MA1、MA3、MA6、MA17、MA30、MA31、MA33、ME1、ME6、ME17、ME29、ME33、ME39がより好ましく、MA30、MA31、MA33、ME29、ME33、ME39がさらに好ましく、MA31、ME29が最も好ましい。   Among the above specific examples, MA1, MA2, MA3, MA4, MA5, MA6, MA7, MA9, MA12, MA13, MA14, MA17, MA23, MA24, MA30, MA31, MA32, MA33, MA35, MA37, MA38, ME1 , ME2, ME3, ME4, ME5, ME6, ME7, ME12, ME13, ME14, ME17, ME23, ME24, ME29, ME31, ME32, ME33, ME35, ME37, ME39, ME40 are preferred, MA1, MA3, MA6, MA17 MA30, MA31, MA33, ME1, ME6, ME17, ME29, ME33, ME39 are more preferable, MA30, MA31, MA33, ME29, ME33, ME39 are more preferable, and MA31, ME29 are most preferable. .

これらの含フッ素多官能モノマーの製造方法としては、エステル結合、ジアルコキシ基、および/またはハロゲン原子を有する化合物を、好ましくはエステル結合を有する化合物を、液相フッ素化することにより、実質的にすべての水素原子をフッ素原子に置換した後、3つ以上の重合性基を導入する方法が好適である。液相フッ素化については、例えば、米国特許第5093432号明細書に記載されている。   As a method for producing these fluorine-containing polyfunctional monomers, a compound having an ester bond, a dialkoxy group and / or a halogen atom, preferably a compound having an ester bond, is preferably substantially liquid-phase fluorinated. A method in which three or more polymerizable groups are introduced after all hydrogen atoms have been replaced with fluorine atoms is preferred. Liquid phase fluorination is described, for example, in US Pat. No. 5,093,432.

液相フッ素化に供される化合物としては、液相フッ素化する際に用いるフッ素系の溶媒に溶解するか、または、液体であることが要求されるが、それ以外は特に制限は無い。こうした溶解性や反応性の観点から、予めフッ素を含有する化合物を用いても良い。また、エステル結合、ジアルコキシ基、および/またはハロゲン原子を有する化合物は、液相フッ素化後に重合性基を導入する際の反応点とすることができるため、好適である。
液相フッ素化によってフッ素原子の導入を行うことにより、後から導入する重合性基以外の部分のフッ素含有率を極めて高くすることが可能である。
The compound subjected to liquid phase fluorination is required to be dissolved in a fluorine-based solvent used for liquid phase fluorination or to be liquid, but there is no particular limitation other than that. From the viewpoint of such solubility and reactivity, a compound containing fluorine in advance may be used. A compound having an ester bond, a dialkoxy group, and / or a halogen atom is preferable because it can serve as a reaction point when a polymerizable group is introduced after liquid phase fluorination.
By introducing fluorine atoms by liquid phase fluorination, it is possible to extremely increase the fluorine content of the portion other than the polymerizable group introduced later.

本発明の撥水処理剤は、一般式(1)で表される含フッ素化合物を1種のみ含有していてもよいし、2種以上含有していてもよい。   The water repellent agent of the present invention may contain only one type of fluorine-containing compound represented by the general formula (1), or may contain two or more types.

<一般式(12)又は(13)で表される化合物>
本発明の撥液性処理剤に含まれる一般式(12)又は(13)で表される化合物につき、説明する。
<Compound represented by formula (12) or (13)>
The compound represented by formula (12) or (13) contained in the liquid repellent treatment agent of the present invention will be described.

Figure 2013209636
Figure 2013209636

一般式(12)中、fは1〜5の整数を表し、gは0又は1を表し、Yは下記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記一般式(6)、(7)、(14)、又は(15)で表される基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
一般式(13)中、h及びiはそれぞれ独立に1〜5の整数を表し、Yは下記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lはそれぞれ独立に下記一般式(6)、(7)、(14)、又は(15)で表される基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の2価のパーフルオロアルキルを表す。
In general formula (12), f represents an integer of 1 to 5, g represents 0 or 1, and Y represents a group represented by the following general formula (2), (3), (4) or (5). , An allyl group, or a vinyl group, L 4 represents a group represented by the following general formula (6), (7), (14), or (15), and Rf 4 contains an etheric oxygen atom. Alternatively, it represents a linear, branched or cyclic monovalent perfluoroalkyl group having 1 to 100 carbon atoms.
In General Formula (13), h and i each independently represent an integer of 1 to 5, Y is a group represented by the following General Formula (2), (3), (4) or (5), or an allyl group Or a vinyl group, L 4 each independently represents a group represented by the following general formula (6), (7), (14), or (15), and Rf 5 contains an etheric oxygen atom. Alternatively, it represents a linear, branched or cyclic divalent perfluoroalkyl having 1 to 100 carbon atoms.

Figure 2013209636
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)、(14)中、mは0〜10の整数を表す。
一般式(7)、(15)中、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
In general formula (2), X represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a trifluoromethyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6), (7), and (14), m represents an integer of 0 to 10.
In the general formulas (7) and (15), Y represents a group represented by the general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.

一般式(12)中、fは1〜5の整数を表す。fは1〜3の整数であることが好ましく、1又は2であることがより好ましい。   In general formula (12), f represents the integer of 1-5. f is preferably an integer of 1 to 3, and more preferably 1 or 2.

一般式(12)中、gは0又は1を表す。gは1であることが好ましい。   In general formula (12), g represents 0 or 1. g is preferably 1.

一般式(12)中、Yは上記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
一般式(12)中のYは、一般式(1)におけるYと同義である。一般式(12)中のYとしては、撥液性と耐摩擦性とのバランスの観点から、上記式(2)又は式(3)で表される基であることが好ましい。
In general formula (12), Y represents a group represented by the above general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.
Y in general formula (12) is synonymous with Y in general formula (1). Y in the general formula (12) is preferably a group represented by the above formula (2) or formula (3) from the viewpoint of the balance between liquid repellency and friction resistance.

一般式(12)中、Lは上記一般式(6)、(7)、(14)又は(15)で表される基(但し、mは0〜10の整数を表す。)を表す。一般式(15)中のYは、一般式(12)におけるYと同義であり、好ましい基も同様である。mは0〜4であることが好ましく、0又は1であることがより好ましく、0であることがさらに好ましい。すなわち、Lが単結合であることが好ましい。 In General Formula (12), L 4 represents a group represented by the above General Formula (6), (7), (14) or (15) (where m represents an integer of 0 to 10). Y in the general formula (15) has the same meaning as Y in the general formula (12), and preferred groups are also the same. m is preferably 0 to 4, more preferably 0 or 1, and still more preferably 0. That is, L 4 is preferably a single bond.

一般式(12)中、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
Rfは、エーテル性酸素原子を含んでもよい、炭素数2〜75のパーフルオロアルキル基であることが好ましく、エーテル性酸素原子を含んでもよい、炭素数4〜60のパーフルオロアルキル基であることがより好ましく、エーテル性酸素原子を含んでもよい、炭素数6〜50のパーフルオロアルキル基であることがさらに好ましい。
Rfは、エーテル性酸素原子を含んでもよい、直鎖状、又は分岐鎖としてトリフルオロメチル基を有する直鎖状のパーフルオロアルキル基であることが好ましい。
以下にRfの具体例を示す。
なお、下記例中のzは、Rf中の炭素数が1〜100を満たす整数の組み合わせを表す。zは好ましくは1〜40であり、より好ましくは3〜20である。
In General Formula (12), Rf 4 represents a linear, branched or cyclic monovalent perfluoroalkyl group having 1 to 100 carbon atoms which may contain an etheric oxygen atom.
Rf 4 is preferably a perfluoroalkyl group having 2 to 75 carbon atoms which may contain an etheric oxygen atom, and is a perfluoroalkyl group having 4 to 60 carbon atoms which may contain an etheric oxygen atom. More preferred is a perfluoroalkyl group having 6 to 50 carbon atoms which may contain an etheric oxygen atom.
Rf 4 is preferably a linear perfluoroalkyl group which may contain an etheric oxygen atom, or which has a trifluoromethyl group as a branched chain.
Specific examples of Rf 4 are shown below.
Incidentally, z in the following examples, the number of carbons in Rf 4 represents an integer of combinations satisfying 1-100. z is preferably 1 to 40, and more preferably 3 to 20.

−、
13−、
CF(CF−、
CF(CF−、
CFOCFCF−、
CFCFOCFCF−、
CFOCFCFCFCF−、
(CFCFOCF−、
((CFCF)CFCF(CF)−、
CFO(CFCFO)CF−、
(CFCFOCFCFOCFCF−、
(CFCCFCF(CF)CFCF−、
(CFCFCFCFCFCF(CF)CFCF−、
CFCFO(CFCFO)CF−、
(CFCOCFCF−、
(CFCO(CFCFO)CF−、
(CFCFO(CFCFCFO)CFCF−、
CFO(CFCFCFO)CFCF−、
CFCFCFO(CF(CF)CFO)CF(CF)−、
CFCFOCFCFOCFCF−、
CFCFOCFCFOCFCFOCFCFOCFCF−、
CFCFCFOCF−、
CFCFCFOCFCF−、
CFCFCFOCF(CF)−、
CFCFCFOCF(CF)CF−、
CFCFCFOCF(CF)CFOCFCF−、
CFCFCFOCF(CF)CFOCF(CF)CF
C 4 F 9- ,
C 6 F 13- ,
CF 3 (CF 2) 7 - ,
CF 3 (CF 2 ) 9 −,
CF 3 OCF 2 CF 2- ,
CF 3 CF 2 OCF 2 CF 2- ,
CF 3 OCF 2 CF 2 CF 2 CF 2- ,
(CF 3 ) 2 CFOCF 2 −,
((CF 3) 2 CF) 2 CFCF (CF 3) -,
CF 3 O (CF 2 CF 2 O) z CF 2 -,
(CF 3 CF 2 OCF 2 ) 2 CFOCF 2 CF 2- ,
(CF 3 ) 3 CCF 2 CF (CF 3 ) CF 2 CF 2- ,
(CF 3 ) 2 CFCF 2 CF 2 CF 2 CF (CF 3 ) CF 2 CF 2- ,
CF 3 CF 2 O (CF 2 CF 2 O) z CF 2 -,
(CF 3 ) 3 COCF 2 CF 2- ,
(CF 3) 3 CO (CF 2 CF 2 O) z CF 2 -,
(CF 3) 2 CFO (CF 2 CF 2 CF 2 O) z CF 2 CF 2 -,
CF 3 O (CF 2 CF 2 CF 2 O) z CF 2 CF 2 -,
CF 3 CF 2 CF 2 O ( CF (CF 3) CF 2 O) z CF (CF 3) -,
CF 3 CF 2 OCF 2 CF 2 OCF 2 CF 2- ,
CF 3 CF 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 -,
CF 3 CF 2 CF 2 OCF 2- ,
CF 3 CF 2 CF 2 OCF 2 CF 2- ,
CF 3 CF 2 CF 2 OCF ( CF 3) -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF 2 CF 2 -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF (CF 3) CF 2 -

一般式(13)中、h及びiはそれぞれ独立に1〜5の整数を表す。h及びiはそれぞれ独立に1〜3の整数であることが好ましく、1又は2であることがより好ましく、1であることがさらに好ましい。   In general formula (13), h and i each independently represent an integer of 1 to 5. h and i are each independently preferably an integer of 1 to 3, more preferably 1 or 2, and still more preferably 1.

一般式(13)中のYは、一般式(12)におけるYと同義であり、好ましい基も同様である。   Y in the general formula (13) has the same meaning as Y in the general formula (12), and preferred groups are also the same.

一般式(13)中のLは一般式(12)におけるLと同義であり、好ましい基も同様である。 L 4 in the general formula (13) has the same meaning as L 4 in the formula (12), which is also the same preferable groups.

一般式(13)中、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の2価のパーフルオロアルキレン基を表す。
Rfは、エーテル性酸素原子を含んでもよい、直鎖状の炭素数2〜90の2価のパーフルオロアルキレン基であることが好ましく、エーテル性酸素原子を含んでもよい、直鎖状の炭素数6〜80の2価のパーフルオロアルキレン基であることがより好ましい。
Rfは、エーテル性酸素原子を含んでもよい、直鎖状、又は分岐鎖としてトリフルオロメチル基を有する直鎖状のパーフルオロアルキレン基であることが好ましい。
以下にRfの具体例を示す。
なお、下記例中のp、qは、Rf中の炭素数が1〜100を満たすような整数の組み合わせを表す。pは好ましくは、1〜40であり、より好ましくは3〜20である。qは好ましくは、1〜40であり、より好ましくは3〜20である。
In General Formula (13), Rf 5 represents a linear, branched or cyclic divalent perfluoroalkylene group having 1 to 100 carbon atoms which may contain an etheric oxygen atom.
Rf 5 is preferably a linear divalent perfluoroalkylene group having 2 to 90 carbon atoms which may contain an etheric oxygen atom, and may be a linear carbon which may contain an etheric oxygen atom. A divalent perfluoroalkylene group having a number of 6 to 80 is more preferable.
Rf 5 is preferably a linear perfluoroalkylene group which may contain an etheric oxygen atom, or which has a trifluoromethyl group as a branched chain.
Specific examples of Rf 5 are shown below.
In addition, p and q in the following example represent the combination of integers in which the carbon number in Rf 5 satisfies 1 to 100. p is preferably 1 to 40, and more preferably 3 to 20. q is preferably 1 to 40, more preferably 3 to 20.

−CFO−(CFCFO)−CF−、
−CFO−(CFCFCFO)−CF−、
−CFO−(CFCFCFCFO)−CF−、
−CFO−(CFCFO)(CFO)−CF−、
−(CF−、
−(CF−、
−(CF−、
−(CF−、
−(CF10−、
−(CF)CF[OCFCF(CF)]OCF(CFCFO[CF(CF)CFO]CF(CF)−、
−CF[OCFCF(CF)]OCF−、
−(CFCFO[CF(CF)CFO]CF(CF)CFOCFCF
-CF 2 O- (CF 2 CF 2 O) p -CF 2 -,
-CF 2 O- (CF 2 CF 2 CF 2 O) p -CF 2 -,
-CF 2 O- (CF 2 CF 2 CF 2 CF 2 O) p -CF 2 -,
-CF 2 O- (CF 2 CF 2 O) p (CF 2 O) q -CF 2 -,
- (CF 2) 2 -,
- (CF 2) 4 -,
- (CF 2) 6 -,
- (CF 2) 8 -,
- (CF 2) 10 -,
- (CF 3) CF [OCF 2 CF (CF 3)] p OCF 2 (CF 2) 4 CF 2 O [CF (CF 3) CF 2 O] q CF (CF 3) -,
-CF 2 [OCF 2 CF (CF 3)] p OCF 2 -,
- (CF 2) 4 CF 2 O [CF (CF 3) CF 2 O] p CF (CF 3) CF 2 OCF 2 CF 2 -

前記一般式(12)又は(13)で表される含フッ素化合物は下記一般式(18)又は(19)で表される含フッ素化合物であることが好ましい。   The fluorine-containing compound represented by the general formula (12) or (13) is preferably a fluorine-containing compound represented by the following general formula (18) or (19).

Figure 2013209636
Figure 2013209636

一般式(18)中、fは1〜5の整数を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状又は分枝状の1価のパーフルオロアルキル基を表す。
一般式(19)中、h及びiはそれぞれ独立に1〜5の整数を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状又は分枝状の2価のパーフルオロアルキル基を表す。
In general formula (18), f represents an integer of 1 to 5, and Y represents a group represented by the general formula (2), (3), (4) or (5), an allyl group, or a vinyl group. Rf 7 represents a linear or branched monovalent perfluoroalkyl group having 1 to 100 carbon atoms, which may contain an etheric oxygen atom, and has at least one trifluoromethyl group.
In general formula (19), h and i each independently represent an integer of 1 to 5, Y is a group represented by the general formula (2), (3), (4) or (5), or an allyl group Or Rf 8 represents a linear or branched divalent perfluoroalkyl group having 1 to 100 carbon atoms, which may contain an etheric oxygen atom.

一般式(18)及び(19)中、f、Y、h及びiの具体例及び好ましい範囲は、前記一般式(12)又は(13)中におけるf、Y、h及びiと同様である。   In general formulas (18) and (19), specific examples and preferred ranges of f, Y, h and i are the same as those in f, Y, h and i in general formula (12) or (13).

一般式(18)中、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状又は分枝状の1価のパーフルオロアルキル基を表す。
Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数2〜75の、直鎖状、又は分岐鎖としてトリフルオロメチル基を有する直鎖状のパーフルオロアルキル基であることが好ましく、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数4〜60の、直鎖状、又は分岐鎖としてトリフルオロメチル基を有する直鎖状のパーフルオロアルキル基であることがより好ましく、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数6〜50のパーフルオロアルキル基であることがさらに好ましい。
Rfの具体例及び好ましい範囲は、一般式(12)中のRfと同様である。
以下にRfの具体例を示す。
なお、下記例中のz1は、Rf中の炭素数が1〜100を満たす整数の組み合わせを表す。z1は好ましくは0〜20であり、より好ましくは1〜10である。
In General Formula (18), Rf 7 is a linear or branched monovalent perfluoroalkyl having 1 to 100 carbon atoms, which may contain an etheric oxygen atom, having at least one trifluoromethyl group. Represents a group.
Rf 7 has at least one trifluoromethyl group, may contain an etheric oxygen atom, has 2 to 75 carbon atoms, is linear, or is linear perfluoro having a trifluoromethyl group as a branched chain It is preferably an alkyl group, has at least one trifluoromethyl group, may contain an etheric oxygen atom, has 4 to 60 carbon atoms, is linear, or has a trifluoromethyl group as a branched chain The perfluoroalkyl group is more preferably a perfluoroalkyl group having 6 to 50 carbon atoms and having at least one trifluoromethyl group, which may contain an etheric oxygen atom.
Specific examples and preferred ranges of Rf 7 are the same as those of Rf 4 in the general formula (12).
Specific examples of Rf 7 are shown below.
In addition, z1 in the following example represents the combination of the integers in which the carbon number in Rf 7 satisfies 1 to 100. z1 becomes like this. Preferably it is 0-20, More preferably, it is 1-10.

−、
13−、
CF(CF−、
CF(CF−、
CFOCFCF−、
CFCFOCFCF−、
CFOCFCFCFCF−、
(CFCFOCF−、
((CFCF)CFCF(CF)−、
CFO(CFCFO)CF−、
(CFCCFCF(CF)CFCF−、
(CFCFCFCFCFCF(CF)CFCF−、
CFCFO(CFCFO)z1CF−、
(CFCOCFCF−、
(CFCO(CFCFO)z1CF−、
(CFCFO(CFCFCFO)z1CFCF−、
CFO(CFCFCFO)z1CFCF−、
CFCFCFO(CF(CF)CFO)z1CF(CF)−、
CFCFOCFCFOCFCF−、
CFCFOCFCFOCFCFOCFCFOCFCF−、
CFCFCFOCF−、
CFCFCFOCFCF−、
CFCFCFOCF(CF)−、
CFCFCFOCF(CF)CF−、
CFCFCFOCF(CF)CFOCFCF−、
CFCFCFOCF(CF)CFOCF(CF)CF
C 4 F 9- ,
C 6 F 13- ,
CF 3 (CF 2) 7 - ,
CF 3 (CF 2 ) 9 −,
CF 3 OCF 2 CF 2- ,
CF 3 CF 2 OCF 2 CF 2- ,
CF 3 OCF 2 CF 2 CF 2 CF 2- ,
(CF 3 ) 2 CFOCF 2 −,
((CF 3) 2 CF) 2 CFCF (CF 3) -,
CF 3 O (CF 2 CF 2 O) z CF 2 -,
(CF 3 ) 3 CCF 2 CF (CF 3 ) CF 2 CF 2- ,
(CF 3 ) 2 CFCF 2 CF 2 CF 2 CF (CF 3 ) CF 2 CF 2- ,
CF 3 CF 2 O (CF 2 CF 2 O) z1 CF 2 -,
(CF 3 ) 3 COCF 2 CF 2- ,
(CF 3) 3 CO (CF 2 CF 2 O) z1 CF 2 -,
(CF 3) 2 CFO (CF 2 CF 2 CF 2 O) z1 CF 2 CF 2 -,
CF 3 O (CF 2 CF 2 CF 2 O) z1 CF 2 CF 2 -,
CF 3 CF 2 CF 2 O ( CF (CF 3) CF 2 O) z1 CF (CF 3) -,
CF 3 CF 2 OCF 2 CF 2 OCF 2 CF 2- ,
CF 3 CF 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 OCF 2 CF 2 -,
CF 3 CF 2 CF 2 OCF 2- ,
CF 3 CF 2 CF 2 OCF 2 CF 2- ,
CF 3 CF 2 CF 2 OCF ( CF 3) -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF 2 CF 2 -,
CF 3 CF 2 CF 2 OCF ( CF 3) CF 2 OCF (CF 3) CF 2 -

一般式(19)中、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状又は分枝状の2価のパーフルオロアルキル基を表す。
Rfの具体例及び好ましい範囲は、一般式(13)中のRfと同様である。
In General Formula (19), Rf 8 represents a linear or branched divalent perfluoroalkyl group having 1 to 100 carbon atoms which may contain an etheric oxygen atom.
Specific examples and preferred ranges of Rf 9 are the same as those of Rf 5 in the general formula (13).

一般式(12)又は(13)で表される化合物は、撥液性の観点から、フッ素原子含有率が30質量%以上75質量%以下であることが好ましく、より好ましくは32質量%以上37質量%以下であり、さらに好ましくは33質量%以上60質量%以下である。   From the viewpoint of liquid repellency, the compound represented by the general formula (12) or (13) preferably has a fluorine atom content of 30% by mass to 75% by mass, more preferably 32% by mass to 37%. It is not more than mass%, more preferably not less than 33 mass% and not more than 60 mass%.

以下に一般式(12)又は(13)で表される化合物の具体例を挙げるが、本発明はこれらによって限定されない。下記具体例化合物中のzは1〜40の整数を表し、p、qは各々独立に1〜40の整数を表す。   Although the specific example of a compound represented by General formula (12) or (13) below is given, this invention is not limited by these. Z in the following specific example compounds represents an integer of 1 to 40, and p and q each independently represents an integer of 1 to 40.

Figure 2013209636
Figure 2013209636

Figure 2013209636
Figure 2013209636

Figure 2013209636
Figure 2013209636

Figure 2013209636
Figure 2013209636

上記具体例化合物の中でも、AA−2、AA−3、AA−9、AA−12、AA−13、AA−14、AA−15、AA−17、AE−2、AE−5、AE−9、AE−12、AE−13、AE−15、AE−17が好ましく、AA−2、AA−3、AA−9、AA−13、AA−14、AA−15、AE−2、AE−5、AE−9、AE−13、AE−15がより好ましく、AA−2、AA−13、AA−15、AE−2、AE−13、AE−15が最も好ましい。   Among the above specific examples, AA-2, AA-3, AA-9, AA-12, AA-13, AA-14, AA-15, AA-17, AE-2, AE-5, AE-9 AE-12, AE-13, AE-15, AE-17 are preferred, and AA-2, AA-3, AA-9, AA-13, AA-14, AA-15, AE-2, AE-5. AE-9, AE-13, and AE-15 are more preferable, and AA-2, AA-13, AA-15, AE-2, AE-13, and AE-15 are most preferable.

一般式(12)又は(13)で表される化合物は、商業的に入手してもよく、合成により製造してもよい。合成する場合はその合成法に特に制限はなく、公知の方法、例えば、商業的に入手できる含フッ素アルコール化合物と、アクリル酸の脱水縮合による方法や、エピクロロヒドリンとの置換反応による方法により合成することができる。   The compound represented by the general formula (12) or (13) may be obtained commercially or may be produced by synthesis. In the case of synthesis, there is no particular limitation on the synthesis method, and it is known by a known method, for example, a method by dehydration condensation of a commercially available fluorinated alcohol compound and acrylic acid, or a substitution reaction with epichlorohydrin. Can be synthesized.

本発明の撥水処理剤は、一般式(12)又は(13)で表される含フッ素化合物を1種のみ含有していてもよいし、2種以上含有していてもよい。   The water repellent agent of the present invention may contain only one type of fluorine-containing compound represented by the general formula (12) or (13), or may contain two or more types.

<撥液性処理剤>
本発明の撥液性処理剤は、少なくとも1種類以上の上記一般式(1)で表される含フッ素化合物と、上記一般式(12)又は(13)で表される含フッ素化合物とを含有する。
一般式(1)で表される含フッ素化合物、例えば上記化合物MA31は、分子の中心部分に高フッ素含率の撥液性部分が存在し、その周囲に撥液性の低い重合性基Yが分散している分子構造を有する。そのため、高フッ素含率にもかかわらず、分子表面の自由エネルギーは比較的高く、基材の親水性表面との親和性は比較的高い。
一方、一般式(12)又は(13)で表される含フッ素化合物、例えば上記化合物AA−2やAA−15は、高フッ素含率部分と重合性基Yが偏在する分子構造を有する。そのため、分子表面の自由エネルギーは非常に低く、基材の親水性表面との親和性は非常に低い。このような分子構造を有するため、一般式(12)又は(13)で表される含フッ素化合物を、基材の親水性表面に塗布した場合には弾かれてしまい、均質な塗膜を形成できない。
<Liquid repellent treatment agent>
The liquid repellent treatment agent of the present invention contains at least one fluorine-containing compound represented by the above general formula (1) and the fluorine-containing compound represented by the above general formula (12) or (13). To do.
The fluorine-containing compound represented by the general formula (1), for example, the compound MA31, has a liquid repellent part having a high fluorine content at the center of the molecule, and a polymerizable group Y having a low liquid repellent property around it. It has a dispersed molecular structure. Therefore, despite the high fluorine content, the free energy on the molecular surface is relatively high and the affinity for the hydrophilic surface of the substrate is relatively high.
On the other hand, the fluorine-containing compounds represented by the general formula (12) or (13), for example, the compounds AA-2 and AA-15 have a molecular structure in which the high fluorine content portion and the polymerizable group Y are unevenly distributed. Therefore, the free energy on the molecular surface is very low, and the affinity with the hydrophilic surface of the substrate is very low. Since it has such a molecular structure, when the fluorine-containing compound represented by the general formula (12) or (13) is applied to the hydrophilic surface of the substrate, it is rebounded to form a uniform coating film. Can not.

驚くべきことに、一般式(1)で表される含フッ素化合物と一般式(12)又は(13)で表される含フッ素化合物とを含む撥液性処理剤は、高フッ素含率でありながら親水性表面に塗布した場合にも弾かれなく、均質な塗膜を形成できる。これは、以下のような現象によるものと推測する。
即ち、塗布後の塗布内において、非常に低い分子表面自由エネルギーを有する一般式(12)又は(13)で表される含フッ素化合物は空気との界面に偏在し、比較的高い分子表面自由エネルギーを有する一般式(1)で表される含フッ素化合物は親水性表面との界面に偏在していると推測する。
このようにして、非常に高い撥液性を有しながら同時に、親水性表面に塗布した場合でも弾かれないという、優れた特徴を有する撥液性処理剤を得ることができる。
また、一般式(1)で表される含フッ素化合物と一般式(12)又は(13)で表される含フッ素化合物とは相溶性が高いため、一般式(1)で表される含フッ素化合物と一般式(12)又は(13)で表される含フッ素化合物とを含む撥液性処理剤を塗布して形成した塗膜は透明性にも優れる。
Surprisingly, the liquid repellent treatment agent containing the fluorine-containing compound represented by the general formula (1) and the fluorine-containing compound represented by the general formula (12) or (13) has a high fluorine content. However, even when applied to a hydrophilic surface, a uniform coating film can be formed without being repelled. This is presumed to be due to the following phenomenon.
That is, in the coating after coating, the fluorine-containing compound represented by the general formula (12) or (13) having a very low molecular surface free energy is unevenly distributed at the interface with air and has a relatively high molecular surface free energy. It is presumed that the fluorine-containing compound represented by the general formula (1) having the above is unevenly distributed at the interface with the hydrophilic surface.
In this way, it is possible to obtain a liquid-repellent treatment agent having an excellent characteristic that it has very high liquid repellency and is not repelled even when applied to a hydrophilic surface.
Moreover, since the fluorine-containing compound represented by the general formula (1) and the fluorine-containing compound represented by the general formula (12) or (13) are highly compatible, the fluorine-containing compound represented by the general formula (1) A coating film formed by applying a liquid repellent treatment agent containing a compound and a fluorine-containing compound represented by the general formula (12) or (13) is also excellent in transparency.

撥液性処理剤中、一般式(1)で表される含フッ素化合物は、耐摩擦性の向上の観点から、撥液性処理剤の全固形分に対して、5〜90質量%であることが好ましく、7〜70質量%であることがより好ましく、10〜50質量%であることがさらに好ましい。
また、一般式(12)又は(13)で表される含フッ素化合物は、撥液性の発現の観点から、撥液性処理剤の全固形分に対して、10〜95質量%であることが好ましく、30〜93質量%であることがより好ましく、50〜90質量%であることがさらに好ましい。
In the liquid repellent treatment agent, the fluorine-containing compound represented by the general formula (1) is 5 to 90% by mass with respect to the total solid content of the liquid repellent treatment agent from the viewpoint of improving the friction resistance. It is preferably 7 to 70% by mass, more preferably 10 to 50% by mass.
In addition, the fluorine-containing compound represented by the general formula (12) or (13) is 10 to 95% by mass with respect to the total solid content of the liquid repellent treatment agent from the viewpoint of liquid repellency. Is preferable, it is more preferable that it is 30-93 mass%, and it is further more preferable that it is 50-90 mass%.

本発明の撥液処理剤における、一般式(1)で表される含フッ素化合物と一般式(12)又は(13)で表される含フッ素化合物との含有比は、質量比で、(一般式(1)で表される含フッ素化合物)/(一般式(12)又は(13)で表される含フッ素化合物)が、0.05〜9であることが好ましく、0.07〜2.33であることがより好ましく、0.1〜1であることが更に好ましい。(一般式(1)で表される含フッ素化合物)/(一般式(12)又は(13)で表される含フッ素化合物)の比が0.05以上であると、硬化後に耐摩擦性向上効果を得られるという理由から好ましく、9以下であると硬化後に十分な撥液性効果を得られるという理由から好ましい。
なお、「一般式(12)又は(13)で表される含フッ素化合物」の含有量は、撥液処理剤中に、一般式(12)で表される含フッ素化合物と一般式(13)で表される含フッ素化合物の両方を含む場合は、一般式(12)で表される含フッ素化合物と一般式(13)で表される含フッ素化合物の合計の含有量である。
In the liquid repellent treatment agent of the present invention, the content ratio of the fluorine-containing compound represented by the general formula (1) and the fluorine-containing compound represented by the general formula (12) or (13) is a mass ratio (general The fluorine-containing compound represented by the formula (1) / (the fluorine-containing compound represented by the general formula (12) or (13)) is preferably 0.05 to 9, and preferably 0.07 to 2. More preferably, it is 33, and it is still more preferable that it is 0.1-1. When the ratio of (fluorinated compound represented by general formula (1)) / (fluorinated compound represented by general formula (12) or (13)) is 0.05 or more, the friction resistance is improved after curing. It is preferable from the reason that an effect can be obtained, and is preferably 9 or less from the reason that a sufficient liquid repellency effect can be obtained after curing.
The content of the “fluorinated compound represented by the general formula (12) or (13)” is the same as that of the fluorinated compound represented by the general formula (12) and the general formula (13) in the liquid repellent agent. When both of the fluorine-containing compounds represented by general formula (12) are included, the total content of the fluorine-containing compound represented by general formula (12) and the fluorine-containing compound represented by general formula (13).

本発明の撥水処理剤は、一般式(1)で表される化合物として、上記MA1、MA2、MA3、MA4、MA5、MA6、MA7、MA9、MA12、MA13、MA14、MA17、MA23、MA24、MA30、MA31、MA32、MA33、MA35、MA37、MA38、ME1、ME2、ME3、ME4、ME5、ME6、ME7、ME12、ME13、ME14、ME17、ME23、ME24、ME29、ME31、ME32、ME33、ME35、ME37、ME39、又はME40を有し、一般式(12)又は(13)で表される化合物として、上記AA−2、AA−3、AA−9、AA−12、AA−13、AA−14、AA−15、AA−17、AE−2、AE−5、AE−9、AE−12、AE−13、AE−15、又はAE−17を有することが好ましい。   The water repellent treatment agent of the present invention has the above-mentioned MA1, MA2, MA3, MA4, MA5, MA6, MA7, MA9, MA12, MA13, MA14, MA17, MA23, MA24, as the compound represented by the general formula (1). MA30, MA31, MA32, MA33, MA35, MA37, MA38, ME1, ME2, ME3, ME4, ME5, ME6, ME7, ME12, ME13, ME14, ME17, ME23, ME24, ME29, ME31, ME32, ME33, ME35, As compounds having ME37, ME39, or ME40 and represented by the general formula (12) or (13), AA-2, AA-3, AA-9, AA-12, AA-13, AA-14 , AA-15, AA-17, AE-2, AE-5, AE-9, AE-12, AE-13, AE- 5, or preferably has a AE-17.

<非フッ素化合物>
本発明の撥液性処理剤は、さらに下記一般式(16)で表される非フッ素化合物を含有することが撥液性処理剤の硬化促進の観点から好ましい。
<Non-fluorine compound>
The liquid repellent treatment agent of the present invention preferably further contains a non-fluorine compound represented by the following general formula (16) from the viewpoint of promoting the curing of the liquid repellent treatment agent.

Figure 2013209636
Figure 2013209636

一般式(16)中、jは1〜6の整数を表し、Yは下記一般式(21)、(3)、(4)若しくは(5)で表される基(但し、Xは水素原子、塩素原子、メチル基、又は水酸基を表し、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表し、kは1又は2を表す。)、アリル基、又はビニル基を表し、Lは下記一般式(6)、(7)、(14)又は(15)で表される基(但し、mは0〜10の整数を表す。)を表し、Rは、水素原子、又は、置換基を有してもよい炭素数1〜20の直鎖状、分枝状又は環状のj価の有機基を表す。一般式(7)、(15)中、Yは一般式(21)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。 In General Formula (16), j represents an integer of 1 to 6, Y is a group represented by the following General Formula (21), (3), (4) or (5) (where X 1 is a hydrogen atom) Represents a chlorine atom, a methyl group, or a hydroxyl group, and R 1 , R 2 , R 3 , R 4 , R 5, and R 6 are each independently a hydrogen atom or a carbon number that may have a substituent. 1 to 5 represents a linear or branched monovalent alkyl group, k represents 1 or 2, and an allyl group or a vinyl group, and L 5 represents the following general formula (6), ( 7) represents a group represented by (14) or (15) (where m represents an integer of 0 to 10), and R 7 represents a hydrogen atom or a carbon which may have a substituent. A linear, branched or cyclic j-valent organic group represented by formulas 1 to 20 is represented. In general formulas (7) and (15), Y represents a group represented by general formula (21), (3), (4) or (5), an allyl group, or a vinyl group.

Figure 2013209636
Figure 2013209636

一般式(16)中、jは1〜6の整数を表す。jは4〜6の整数であることが好ましい。   In general formula (16), j represents the integer of 1-6. j is preferably an integer of 4-6.

一般式(16)中、Yは上記一般式(21)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。   In the general formula (16), Y represents a group represented by the above general formula (21), (3), (4) or (5), an allyl group, or a vinyl group.

一般式(21)中、Xは水素原子であることが好ましい。 In general formula (21), X 1 is preferably a hydrogen atom.

一般式(3)〜(5)は、一般式(1)におけるYがとりうる式(3)〜(5)と同義である。   General formula (3)-(5) is synonymous with formula (3)-(5) which Y in General formula (1) can take.

一般式(16)中のYとしては、硬化促進効果の観点から、上記式(21)又は式(3)で表される基であることが好ましい。   Y in the general formula (16) is preferably a group represented by the above formula (21) or formula (3) from the viewpoint of a curing acceleration effect.

一般式(16)中、Lは一般式(12)におけるLと同義であり、好ましい基も同様である。 In General Formula (16), L 5 has the same meaning as L 4 in General Formula (12), and preferred groups are also the same.

一般式(16)中、Rは、水素原子、又は、置換基を有してもよい炭素数1〜20の直鎖状、分枝状又は環状のj価の有機基を表す。有機基は、特に限定されるものではないが、ジペンタエリスリトール、ペンタエリスリトール、ジトリメチロールプロパンから水酸基を除いた骨格等が挙げられる。有機基が置換基を有する場合の置換基としては、水酸基、カルボキシル基、アミノ基等が挙げられる。 In General Formula (16), R 7 represents a hydrogen atom or a linear, branched, or cyclic j-valent organic group having 1 to 20 carbon atoms that may have a substituent. The organic group is not particularly limited, and examples thereof include a skeleton obtained by removing a hydroxyl group from dipentaerythritol, pentaerythritol, and ditrimethylolpropane. Examples of the substituent when the organic group has a substituent include a hydroxyl group, a carboxyl group, and an amino group.

一般式(16)で表される非フッ素化合物の具体例としては、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジトリメチロールプロパンテトラ(メタ)アクリレート、ペンタエリスリトールテトラグリシジルエーテル等が挙げられる。   Specific examples of the non-fluorine compound represented by the general formula (16) include pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, ditrimethylolpropane tetra (meth). ) Acrylate, pentaerythritol tetraglycidyl ether and the like.

上記一般式(16)で表される非フッ素化合物は、撥液性の発現の観点から、一般式(1)で表される含フッ素化合物に対して、1〜25質量%含ませることが好ましい。   The non-fluorine compound represented by the general formula (16) is preferably included in an amount of 1 to 25% by mass with respect to the fluorine-containing compound represented by the general formula (1) from the viewpoint of liquid repellency. .

<重合開始剤>
本発明の撥液性処理剤は、さらに重合開始剤を含むことが好ましい。重合開始剤としては、熱により重合を開始させる熱重合開始剤や、光により重合を開始させる光重合開始剤が挙げられる。用いる重合開始剤は特に制限されないが、後述の親水性領域と撥水性領域が所望のパターンを有する部材を得る目的においては、フォトマスクを用いたパターン形成に適するように、光重合開始剤を用いることが好ましい。
<Polymerization initiator>
The liquid repellent treatment agent of the present invention preferably further contains a polymerization initiator. Examples of the polymerization initiator include a thermal polymerization initiator that initiates polymerization by heat and a photopolymerization initiator that initiates polymerization by light. The polymerization initiator to be used is not particularly limited, but for the purpose of obtaining a member having a desired pattern in the hydrophilic region and the water repellent region described later, a photopolymerization initiator is used so as to be suitable for pattern formation using a photomask. It is preferable.

光重合開始剤には、光を吸収してラジカルを発生することにより重合反応を開始させる光ラジカル重合開始剤や、光を吸収してカチオンを発生することにより重合反応を開始させる光カチオン重合開始剤がある。
光ラジカル重合開始剤としては、例えば2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン(BASFジャパン(株)社製、ダロキュア1173)、1−ヒドロキシシクロヘキシルフェニルケトン(BASFジャパン(株)社製、イルガキュア184)、ベンジルジメチルケタール(BASFジャパン(株)社製、イルガキュア651)、2−メチル−1−[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン(BASFジャパン(株)社製、イルガキュア907)、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン−1(BASFジャパン(株)社製、イルガキュア369)、2,4−ジエチルチオキサントン(日本化薬社製、カヤキュアDETX)を好ましい例として挙げることができる。
光カチオン重合開始剤としては、例えば[CH−ph−I−ph−CH−(CH][PF ](ただし、phは1,4−フェニレン基を示す)が好ましく、[CH−ph−I−ph−CH−(CH][PF ](ただし、phは1,4−フェニレン基を示す)とプロピレンカーボネートの3:1の混合物(BASFジャパン(株)社製、イルガキュア250)が例示される。他の好ましい例としては、ジメチル−4−メチルフェニルスルホニウムトリフルオロメタンスルホネート(和光純薬工業(株)社製、WPAG−336)が挙げられる。
光カチオン重合開始剤としては、スルホニウム塩化合物又はヨードニウム塩化合物が好ましい。
これらは単独で用いても、2種類以上を混合して用いてもよい。光重合開始剤の量は、撥液性処理剤中の重合性化合物の総量に対して0.1〜50質量%が好ましく、1〜10質量%がより好ましい。
Photoinitiators include photoradical polymerization initiators that initiate light polymerization by generating radicals by absorbing light, and photocationic polymerization initiators that initiate polymerization reaction by absorbing light and generating cations. There is an agent.
Examples of the radical photopolymerization initiator include 2-hydroxy-2-methyl-1-phenylpropan-1-one (manufactured by BASF Japan Ltd., Darocur 1173), 1-hydroxycyclohexyl phenyl ketone (BASF Japan Ltd.). Irgacure 184), benzyl dimethyl ketal (Irgacure 651, manufactured by BASF Japan Ltd.), 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one (BASF Japan) (Irgacure 907), 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 (BASF Japan, Irgacure 369), 2,4-diethyl As a preferred example, thioxanthone (manufactured by Nippon Kayaku Co., Ltd., Kayacure DETX) It can gel.
The cationic photopolymerization initiator, for example, [CH 3 -ph-I + -ph -CH- (CH 3) 2] [PF 6 -] ( although, ph represents a 1,4-phenylene group) is preferred, [CH 3 -ph-I + -ph -CH- (CH 3) 2] [PF 6 -] ( although, ph is a 1,4-phenylene group show a) 3 propylene carbonate: a mixture of 1 (BASF Japan An example is Irgacure 250 manufactured by Co., Ltd. Other preferred examples include dimethyl-4-methylphenylsulfonium trifluoromethanesulfonate (manufactured by Wako Pure Chemical Industries, Ltd., WPAG-336).
As a photocationic polymerization initiator, a sulfonium salt compound or an iodonium salt compound is preferable.
These may be used alone or in combination of two or more. 0.1-50 mass% is preferable with respect to the total amount of the polymeric compound in a liquid-repellent processing agent, and, as for the quantity of a photoinitiator, 1-10 mass% is more preferable.

<溶媒>
本発明の撥液性処理剤は、塗布性を向上させるために溶媒を含んでもよい。溶媒としては、アセトン、2−ブタノン等のケトン類、メタノール、エタノール、イソプロパノール等のアルコール類、酢酸エチル、酢酸ブチル等のエステル類、ヘキサン等の炭化水素類、ノナフルオロブチルメチルエーテル(住友スリーエム(株)社製、ノベックHFE−7100)、ジクロロペンタフルオロプロパン(旭硝子(株)社製、アサヒクリンAK−225;CFCFCHClとCClFCFCHClFの混合物)等の含フッ素化合物類が好ましい。これらは単独で用いても、2種類以上を混合して用いてもよい。溶液中の固形分濃度は0.01〜50質量%が好ましく、0.1〜10質量%がより好ましい。
<Solvent>
The liquid repellent treatment agent of the present invention may contain a solvent in order to improve applicability. Solvents include ketones such as acetone and 2-butanone, alcohols such as methanol, ethanol and isopropanol, esters such as ethyl acetate and butyl acetate, hydrocarbons such as hexane, nonafluorobutyl methyl ether (Sumitomo 3M ( Fluorine-containing compounds such as Nobec HFE-7100), dichloropentafluoropropane (Asahi Glass Co., Ltd., Asahi Clin AK-225; a mixture of CF 3 CF 2 CHCl 2 and CClF 2 CF 2 CHClF) Is preferred. These may be used alone or in combination of two or more. The solid content concentration in the solution is preferably 0.01 to 50% by mass, more preferably 0.1 to 10% by mass.

その他、撥液性処理剤中には、本発明の趣旨に反しない限りにおいて、重合禁止剤、蛍光体、樹脂、モノマー、無機粒子、粒子状有機ポリマー、熱安定剤等を含んでもよい。   In addition, the liquid repellent treatment agent may contain a polymerization inhibitor, a phosphor, a resin, a monomer, an inorganic particle, a particulate organic polymer, a heat stabilizer and the like as long as it does not contradict the gist of the present invention.

<撥液性膜、及び親水性領域と撥水性領域とを有する部材>
本発明の撥液性処理剤を用いて撥液性膜を形成することができる。
また、本発明の撥液性処理剤を用いて、基材の表面に親水性領域と撥水性領域とを有する部材(「処理基材」とも呼ぶ)を製造することができる。本発明の処理基材は、親水性の表面を有する基材の該表面に本発明の撥液性処理剤を含む塗膜を形成する工程、ついで該塗膜の表面の一部に光を照射して撥液性処理剤を硬化させ撥液性膜を形成する工程、ついで基材の表面に存在する未硬化の撥液性処理剤を除去して親水性の表面を露出させる工程、によって製造することができる。
<Liquid repellent film and member having hydrophilic region and water repellent region>
A liquid repellent film can be formed using the liquid repellent treatment agent of the present invention.
In addition, using the liquid repellent treatment agent of the present invention, a member having a hydrophilic region and a water repellent region on the surface of the substrate (also referred to as “treated substrate”) can be produced. The treatment substrate of the present invention is a step of forming a coating film containing the liquid repellent treatment agent of the present invention on the surface of the substrate having a hydrophilic surface, and then irradiates a part of the surface of the coating film with light. To form a liquid-repellent film by curing the liquid-repellent treatment agent, and then to remove the uncured liquid-repellent treatment agent present on the surface of the substrate to expose the hydrophilic surface. can do.

本発明の処理基材は、例えば、図1に示すように下記の工程1〜4によって製造できる。
工程1:基材1の表面を親水化処理して表面を親水性の表面2にする工程(図1(a))。
工程2:ついで該表面2に、本発明の撥液性処理剤を含む塗膜3を形成する工程(図1(b))。
工程3:ついで塗膜3の表面の一部に光6を照射して撥液性処理剤を硬化させ、撥液性膜4を形成する工程(図1(c))。
工程4:ついで基材の表面に存在する未硬化の撥液性処理剤を除去して親水性の表面2を露出させる工程(図1(d))。
The treated substrate of the present invention can be produced, for example, by the following steps 1 to 4 as shown in FIG.
Step 1: A step of hydrophilizing the surface of the substrate 1 to make the surface a hydrophilic surface 2 (FIG. 1A).
Step 2: Next, a step of forming a coating film 3 containing the liquid repellent treatment agent of the present invention on the surface 2 (FIG. 1B).
Step 3: Next, a part of the surface of the coating film 3 is irradiated with light 6 to cure the liquid repellent treatment agent, thereby forming the liquid repellent film 4 (FIG. 1C).
Step 4: Next, a step of removing the uncured liquid repellent treatment agent present on the surface of the substrate to expose the hydrophilic surface 2 (FIG. 1D).

工程1:
基材の表面が親水性を示すときは工程1を省略することができるが、基材の表面を親水化処理することが好ましい。
本発明における基材としては、ガラス;シリコンウェハ;Pd、Pt、Ru、Ag、Au、Ti、In、Cu、Cr、Fe、Zn、Sn、Ta、W、またはPb等の金属;PdO、SnO、In、PbO、またはSb等の金属酸化物;HfB、ZrB、LaB、CeB、YB、またはGdB等の硼化物;TiC、ZrC、HfC、TaC、SiC、またはWC等の炭化物;TiN、ZrN、またはHfN等の窒化物;SiまたはGe等の半導体;カーボン;ポリイミド、ポリスチレン、ポリエチレンテレフタレート、トリアセチルセルロース、またはポリテトラフルオロエチレン等の樹脂;等の材料からなる基材から選択できる。ガラス、シリコンウェハ、金属酸化物、またはポリイミドが好ましい。
Step 1:
When the surface of the substrate exhibits hydrophilicity, step 1 can be omitted, but it is preferable that the surface of the substrate is hydrophilized.
As the base material in the present invention, glass; silicon wafer; metal such as Pd, Pt, Ru, Ag, Au, Ti, In, Cu, Cr, Fe, Zn, Sn, Ta, W, or Pb; PdO, SnO Metal oxides such as 2 , In 2 O 3 , PbO, or Sb 2 O 3 ; borides such as HfB 2 , ZrB 2 , LaB 6 , CeB 6 , YB 4 , or GdB 4 ; TiC, ZrC, HfC, TaC Carbides such as TiN, ZrN, or HfN; semiconductors such as Si or Ge; carbon; resins such as polyimide, polystyrene, polyethylene terephthalate, triacetylcellulose, or polytetrafluoroethylene; etc. The substrate can be selected from the following materials. Glass, silicon wafer, metal oxide, or polyimide is preferred.

基材の形状としては、特に限定されず、平面、曲面、または部分的に曲面を有する平面が好ましく、平面がより好ましい。また基材の面積も特に限定されず、従来の塗布方法が適用できる限りの大きさの面を有する基材を採用できる。また、本発明における基材の表面における処理は、平面上の基材の片面で行うのが好ましい。   The shape of the substrate is not particularly limited and is preferably a flat surface, a curved surface, or a partially curved surface, and more preferably a flat surface. Further, the area of the substrate is not particularly limited, and a substrate having a surface having a size as long as a conventional coating method can be applied can be employed. Moreover, it is preferable to perform the process in the surface of the base material in this invention by the single side | surface of the base material on a plane.

処理基材の製造にあたって予め基材の表面を洗浄することが好ましい。また、基材表面を親水化処理することも好ましく、さらに表面に親水性薄膜を有する基材を使用することも好ましい。これらの表面の処理は共通する方法で行うことができ、また、その処理がこれらの処理のいずれかであるかを区別しがたい場合もある。本明細書では、これらを全て基材の親水化処理とみなして、以下説明する。
基材の表面を親水化処理する方法としては、プラスチック、金属、ガラス、セラミックスなどの表面を親水化処理する一般的な方法が適用可能である。該方法としては、基材の表面を湿式洗浄する方法、基材の表面を湿式酸化する方法、基材の表面を光洗浄もしくは光酸化する方法、基材の表面に親水性化合物を塗布する方法、またはこれらを組み合わせた方法が例示できる。基材の材質が親水性である場合にはそのまま用いることもできるが、このような基材は通常汚れやすい。そのため、基材を使用前に湿式洗浄、光洗浄、またはこれらの組合せにより親水化処理することが好ましい。基材の材質が疎水性である場合、基材の表面を湿式酸化、光酸化、または親水性化合物の塗布により親水化処理することが好ましい。
It is preferable to wash the surface of the substrate in advance in the production of the treated substrate. Moreover, it is also preferable to hydrophilize the substrate surface, and it is also preferable to use a substrate having a hydrophilic thin film on the surface. The treatment of these surfaces can be done in a common way, and it may be difficult to distinguish whether the treatment is any of these treatments. In the present specification, these are all regarded as a hydrophilic treatment of the base material and will be described below.
As a method for hydrophilizing the surface of the substrate, a general method for hydrophilizing the surface of plastic, metal, glass, ceramics, or the like is applicable. Examples of the method include a method of wet-cleaning the surface of the substrate, a method of wet-oxidizing the surface of the substrate, a method of photo-cleaning or photo-oxidizing the surface of the substrate, and a method of applying a hydrophilic compound to the surface of the substrate Or a combination of these. When the material of the substrate is hydrophilic, it can be used as it is, but such a substrate is usually easily soiled. Therefore, it is preferable to hydrophilize the substrate by wet cleaning, light cleaning, or a combination thereof before use. When the material of the substrate is hydrophobic, it is preferable that the surface of the substrate is hydrophilized by wet oxidation, photooxidation, or application of a hydrophilic compound.

基材の湿式洗浄には、水、水系洗浄剤、または非水系洗浄剤(有機溶剤、フッ素系溶剤等)を使用できる。特に基材を水または界面活性剤を含んだ水系洗浄剤を用いて洗浄した後に、イソプロピルアルコールやエチルアルコール等の低沸点の有機溶剤を用いて、表面の異物や水分等を除去しつつ乾燥する方法が好ましい。さらに基材の種類や汚れの種類・程度に応じて、工程の追加、または工程の一部の省略ができる。有機系の汚れが付着した基材の湿式洗浄は、まず該汚れを除去するために、ジクロロペンタフルオロプロパン(旭硝子(株)社製AK−225;CFCFCHClとCClFCFCHClFの混合物)等のフッ素系溶剤であらかじめ洗浄しておき、つぎに水系洗浄剤または有機溶剤で基材を浸漬洗浄するのが好ましい。浸漬洗浄する際には、超音波洗浄を併用してもよい。ガラスについては、浸漬洗浄の代わりに、または浸漬洗浄とともに、酸化セリウム系微粒子を含む研磨剤で研磨洗浄し、純水ですすいで風乾して用いる方法を採用してもよい。 For wet cleaning of the substrate, water, an aqueous cleaning agent, or a non-aqueous cleaning agent (organic solvent, fluorine-based solvent, etc.) can be used. In particular, the substrate is washed with water or an aqueous detergent containing a surfactant, and then dried using a low-boiling organic solvent such as isopropyl alcohol or ethyl alcohol while removing foreign substances or moisture on the surface. The method is preferred. Further, depending on the type of substrate and the type and degree of dirt, a process can be added or a part of the process can be omitted. In order to remove the soil, wet cleaning of the substrate with organic soil adhered is first performed with dichloropentafluoropropane (AK-225 manufactured by Asahi Glass Co., Ltd .; CF 3 CF 2 CHCl 2 and CClF 2 CF 2 CHClF). It is preferable to wash in advance with a fluorinated solvent such as a mixture of the above, and then immerse and wash the substrate with an aqueous cleaner or an organic solvent. When performing immersion cleaning, ultrasonic cleaning may be used in combination. With respect to glass, instead of immersion cleaning or in combination with immersion cleaning, a method of polishing and cleaning with an abrasive containing cerium oxide fine particles, rinsing with pure water, and air drying may be employed.

基材の湿式酸化は、過酸化物等の酸化剤の水溶液を用いて表面を酸化する。酸化剤としては特に限定されず、硫酸、硝酸、過酸化水素、過硫酸カリウム、過硫酸アンモニウム、過マンガン酸カリウム等が挙げられる。基材を湿式酸化する方法は該水溶液を基材の表面に塗布できるものであれば特に限定されず、スピンコート法、ディップコート法、スプレー法、ロールコート法等が採用できる。   In the wet oxidation of the substrate, the surface is oxidized using an aqueous solution of an oxidizing agent such as a peroxide. It does not specifically limit as an oxidizing agent, A sulfuric acid, nitric acid, hydrogen peroxide, potassium persulfate, ammonium persulfate, potassium permanganate etc. are mentioned. The method for wet-oxidizing the substrate is not particularly limited as long as the aqueous solution can be applied to the surface of the substrate, and a spin coating method, a dip coating method, a spray method, a roll coating method and the like can be employed.

基材を光洗浄または光酸化する方法としては、UV照射処理、UV/O処理、プラズマ処理、コロナ放電処理、フレーム処理等があり、UV/O処理が好ましい。
また、湿式洗浄のみでは微少な有機物の汚れ(例えば、中性洗剤の界面活性剤の残り滓、クリーンルームの浮遊物など)が残りやすい。これに対して、上述の光洗浄は、そのおそれがない。従って、最初に、湿式洗浄で比較的大きな汚れを除去し、その後、光洗浄により洗浄する方法も好ましい。
Examples of the method for photocleaning or photooxidizing the substrate include UV irradiation treatment, UV / O 3 treatment, plasma treatment, corona discharge treatment, flame treatment and the like, and UV / O 3 treatment is preferred.
Further, only wet cleaning tends to leave a slight amount of organic dirt (for example, residual detergent residue of neutral detergent, clean room floating substance, etc.). On the other hand, the above-mentioned optical cleaning does not have the fear. Therefore, a method of removing relatively large dirt first by wet cleaning and then cleaning by light cleaning is also preferable.

基材の表面の親水化処理に用いうる親水性化合物としては、ポリ(ビニルアルコール)、ポリ(ビニルピロリドン)、ポリ(エチレングリコール)等の親水性ポリマー;グリセリン、ペンタエリスリトール、ソルビトール等の多価アルコール等がある。また、基材表面に反応して表面にシラノール基等の親水性残基を形成する親水化処理化合物としては、Si(OCH、Si(OCHCH、[(CHSi]NH、H−Si(OCHCH、NHCHCHCH−Si(OCHCH等の加水分解性基を有するシラン化合物または該化合物の一部または全部が加水分解物された化合物、または該化合物の加水分解縮合物が挙げられる。 Examples of hydrophilic compounds that can be used for the hydrophilic treatment of the surface of the substrate include hydrophilic polymers such as poly (vinyl alcohol), poly (vinyl pyrrolidone), and poly (ethylene glycol); multivalents such as glycerin, pentaerythritol, and sorbitol. There is alcohol. Examples of the hydrophilic treatment compound that reacts with the surface of the substrate to form a hydrophilic residue such as a silanol group on the surface include Si (OCH 3 ) 4 , Si (OCH 2 CH 3 ) 4 , [(CH 3 ). Silane compound having a hydrolyzable group such as 3 Si] 2 NH, H—Si (OCH 2 CH 3 ) 3 , NH 2 CH 2 CH 2 CH 2 —Si (OCH 2 CH 3 ) 3 , or part of the compound Or the compound by which all were hydrolyzed, or the hydrolysis-condensation product of this compound is mentioned.

親水性化合物は溶媒に溶解させた溶液として塗布することが好ましい。親水性ポリマーや多価アルコールは水に溶解させることが好ましく、シラン化合物はイソプロピルアルコール等のアルコール系溶媒に溶解させることが好ましい。溶液中の親水性化合物の濃度は0.01〜10質量%が好ましく、0.1〜1質量%がより好ましい。
基材への塗布方法は特に限定されず、スピンコート法、ディップコート法、スプレー法、ロールコート法、メニスカスコート法、スクリーン印刷法等が採用できる。
The hydrophilic compound is preferably applied as a solution dissolved in a solvent. The hydrophilic polymer and polyhydric alcohol are preferably dissolved in water, and the silane compound is preferably dissolved in an alcohol solvent such as isopropyl alcohol. The concentration of the hydrophilic compound in the solution is preferably 0.01 to 10% by mass, and more preferably 0.1 to 1% by mass.
The coating method on the substrate is not particularly limited, and spin coating, dip coating, spraying, roll coating, meniscus coating, screen printing, and the like can be employed.

基材の表面が異なる材料で形成されている場合の親水化処理として、親水性化合物を塗布する方法を採用すると、異なる材料の表面に対して同じ親水性を付与することができるので好ましい。   It is preferable to employ a method of applying a hydrophilic compound as the hydrophilization treatment when the surface of the base material is formed of different materials because the same hydrophilicity can be imparted to the surfaces of different materials.

工程2:
親水性の表面を有する基材の表面に本発明の撥液性処理剤を含む塗膜を形成するには、撥液性処理剤を基材に塗布後、乾燥するのが好ましい。撥液性処理剤は上述の溶媒を含む溶液として塗布するのが好ましい。
Step 2:
In order to form a coating film containing the liquid repellent treatment agent of the present invention on the surface of a substrate having a hydrophilic surface, it is preferable that the liquid repellent treatment agent is applied to the substrate and then dried. The liquid repellent treatment agent is preferably applied as a solution containing the above-mentioned solvent.

塗布する方法としては、スピンコート、ディップコート、ワイヤーバーコート、ブレードコート、ロールコートなどの方法が採用できる。塗布は、室温下または加熱下で行うことが好ましい。また塗布後の基材は、大気中または窒素気流中等で乾燥されることが好ましい。該乾燥は室温で行うのが好ましい。乾燥を加熱下で行う場合には、基材の材質の耐熱性によって温度および時間を適宜変更するのが好ましい。   As a coating method, methods such as spin coating, dip coating, wire bar coating, blade coating, and roll coating can be employed. The application is preferably performed at room temperature or under heating. Moreover, it is preferable that the base material after application | coating is dried in air | atmosphere or nitrogen stream. The drying is preferably performed at room temperature. When drying is performed under heating, it is preferable to appropriately change the temperature and time depending on the heat resistance of the base material.

工程3:
塗膜を形成後、塗膜の表面の一部に光を照射する。光照射に用いる光は、波長200nm以上の光が好ましく、波長300nm以上の光がより好ましい。また、波長380nm以下の光が好ましく、波長365nm以下の光がより好ましい。波長200nm以上の光は、基材を分解するおそれが少ない利点がある。また、波長380nm以下の光照射により重合を開始させる光重合開始剤は入手しやすく、光源も安価である。照射時間は、光の波長、光の強度・光源の種類、組成物の種類等に応じて、適宜変更しうる。超高圧水銀ランプの場合、2〜100mW/cmで5〜120秒照射すればよい。高圧水銀ランプの場合は一般に、超高圧水銀ランプより短時間の照射でよい。
Step 3:
After forming the coating film, a part of the surface of the coating film is irradiated with light. The light used for light irradiation is preferably light having a wavelength of 200 nm or more, and more preferably light having a wavelength of 300 nm or more. Moreover, light with a wavelength of 380 nm or less is preferable, and light with a wavelength of 365 nm or less is more preferable. Light having a wavelength of 200 nm or more has an advantage that there is little possibility of decomposing the substrate. Moreover, the photoinitiator which starts superposition | polymerization by light irradiation with a wavelength of 380 nm or less is easy to obtain, and a light source is also cheap. The irradiation time can be appropriately changed according to the wavelength of light, the intensity of light, the type of light source, the type of composition, and the like. In the case of an ultra high pressure mercury lamp, irradiation may be performed at 2 to 100 mW / cm 2 for 5 to 120 seconds. In general, in the case of a high-pressure mercury lamp, irradiation can be performed in a shorter time than an ultra-high pressure mercury lamp.

光源としては、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、キセノンランプ、ナトリウムランプ、窒素等の気体レーザー、有機色素溶液の液体レーザー、無機単結晶に希土類イオンを含有させた固体レーザー等が挙げられる。また、単色光が得られるレーザー以外の光源としては、広帯域の線スペクトル、連続スペクトルをバンドパスフィルター、カットオフフィルター等の光学フィルターを使用して取出した特定波長の光を使用してもよい。一度に大きな面積を照射することができることから、光源としては高圧水銀ランプまたは超高圧水銀ランプが好ましい。   Light sources include low-pressure mercury lamps, high-pressure mercury lamps, ultrahigh-pressure mercury lamps, xenon lamps, sodium lamps, gas lasers such as nitrogen, liquid lasers of organic dye solutions, solid-state lasers containing rare earth ions in inorganic single crystals, etc. Can be mentioned. Further, as a light source other than the laser from which monochromatic light is obtained, light having a specific wavelength obtained by extracting a broadband line spectrum or continuous spectrum using an optical filter such as a bandpass filter or a cutoff filter may be used. Since a large area can be irradiated at a time, a high pressure mercury lamp or an ultrahigh pressure mercury lamp is preferable as the light source.

光の照射はフォトマスクを介して光を照射することが好ましい。この方法により、膜の表面の所望の領域でのみ硬化反応を起こすことが可能であり、親水性領域と撥水性領域が所望のパターンを形成した処理基材を得ることができる。本発明における所望のパターンとは、用途によりそのパターンは異なるが、例えば、線状、ドット状、リング状、格子状、ハニカム状等の繰返しパターンや、用途に応じた配線、電極、絶縁層、発光層等のパターン等であり、間隔は、例えば0.5μm〜1cmである。   The light irradiation is preferably performed through a photomask. By this method, it is possible to cause a curing reaction only in a desired region on the surface of the film, and it is possible to obtain a treated substrate in which a hydrophilic region and a water-repellent region form a desired pattern. The desired pattern in the present invention is different depending on the application, but for example, a linear pattern, a dot pattern, a ring pattern, a lattice pattern, a honeycomb pattern, etc., a wiring, an electrode, an insulating layer according to the application, The pattern is a light emitting layer or the like, and the interval is, for example, 0.5 μm to 1 cm.

光照射する雰囲気は任意に選択することができる。膜厚100nm以下の撥液性処理剤を硬化させた撥液性の膜を形成する場合には、酸素による硬化阻害を受ける場合があるため、窒素ガス雰囲気等の不活性ガス雰囲気下に光照射するのが好ましい。不活性ガスとしては、窒素、アルゴン、ヘリウム、二酸化炭素等から選ばれるガスが挙げられ、安価に入手できるため窒素ガスが最も好ましい。   The atmosphere for light irradiation can be arbitrarily selected. When forming a liquid-repellent film obtained by curing a liquid-repellent treatment agent with a film thickness of 100 nm or less, light irradiation may be performed under an inert gas atmosphere such as a nitrogen gas atmosphere because it may be inhibited by oxygen. It is preferable to do this. Examples of the inert gas include a gas selected from nitrogen, argon, helium, carbon dioxide, and the like, and nitrogen gas is most preferable because it can be obtained at a low cost.

撥液性膜の膜厚は、その利用形態により最適な膜厚が異なるために特に制限はないが、1nm以上10mm以下が好ましく、5nm以上1mm以下がより好ましく、10nm以上500μm以下がさらに好ましい。   The film thickness of the liquid repellent film is not particularly limited because the optimum film thickness varies depending on the application form, but is preferably 1 nm or more and 10 mm or less, more preferably 5 nm or more and 1 mm or less, and further preferably 10 nm or more and 500 μm or less.

光照射は、基材が光照射に用いる光を透過する波長の光であれば、基材のどちらの面側から行ってもよく、通常は基材の撥液性処理剤を含む膜の面側から光照射を行うのが好ましい。   Light irradiation may be performed from either side of the base material as long as the base material transmits light used for light irradiation, and usually the surface of the film containing the liquid repellent treatment agent of the base material. It is preferable to perform light irradiation from the side.

フォトマスクを解した光やレーザー光を用いて光照射を行った場合には、親水性領域と撥水性領域が所望のパターンを形成してなる処理基材が得られる。また、親水性領域と撥水性領域の線幅が10μm以下であるパターンを形成できる。   When light irradiation is performed using light or laser light that has been removed from a photomask, a treated substrate in which a hydrophilic region and a water-repellent region form a desired pattern is obtained. Further, a pattern in which the line width between the hydrophilic region and the water repellent region is 10 μm or less can be formed.

工程4:
撥液性処理剤を硬化させた撥液性の膜を形成した後、基材の表面に存在する未硬化の撥液性処理剤を除去する。未硬化の撥液性処理剤を除去することにより、親水性の表面を露出させることとなる。未硬化の撥液性処理剤を除去する方法としては、重合性含フッ素化合物が残存する表面を有機溶媒で洗浄するのが好ましい。洗浄に用いる有機溶媒としては、重合性含フッ素化合物を溶解する溶媒が好ましい。該有機溶媒としては、アセトン、2−ブタノン等のケトン類、メタノール、エタノール、イソプロパノール等のアルコール系溶媒;酢酸エチル、酢酸ブチル等のエステル系溶媒;ヘキサン等の炭化水素系溶媒、ノナフルオロブチルメチルエーテル(住友スリーエム(株)社製、ノベックHFE−7100)、ジクロロペンタフルオロプロパン(旭硝子(株)社製、アサヒクリンAK−225;CFCFCHClとCClFCFCHClFの混合物)等の含フッ素溶媒等が挙げられる。
Step 4:
After forming a liquid repellent film obtained by curing the liquid repellent treatment agent, the uncured liquid repellent treatment agent present on the surface of the substrate is removed. By removing the uncured liquid repellent treatment agent, the hydrophilic surface is exposed. As a method for removing the uncured liquid repellent treatment agent, it is preferable to wash the surface on which the polymerizable fluorine-containing compound remains with an organic solvent. As the organic solvent used for washing, a solvent that dissolves the polymerizable fluorine-containing compound is preferable. Examples of the organic solvent include ketones such as acetone and 2-butanone, alcohol solvents such as methanol, ethanol and isopropanol; ester solvents such as ethyl acetate and butyl acetate; hydrocarbon solvents such as hexane and nonafluorobutylmethyl. Ether (Sumitomo 3M Co., Ltd., Novec HFE-7100), dichloropentafluoropropane (Asahi Glass Co., Ltd., ASAHIKLIN AK-225; mixture of CF 3 CF 2 CHCl 2 and CClF 2 CF 2 CHClF), etc. And the like.

上記のようにして、基材の表面に親水性領域と、撥水性領域とを有する処理基材が提供される。親水性領域と撥水性領域は、水に対する接触角で区別できる。   As described above, a treated substrate having a hydrophilic region and a water-repellent region on the surface of the substrate is provided. The hydrophilic region and the water repellent region can be distinguished by the contact angle with water.

親水性領域の水に対する接触角は、50度以下が好ましく、40度以下がより好ましく、20度以下が特に好ましい。撥水性領域の水に対する接触角は、80度以上が好ましく、100度以上がより好ましく、110度以上が特に好ましい。
親水性領域の水に対する接触角と撥水性領域の水に対する接触角の差は50度以上であるのが好ましく、70度以上がより好ましく、80度以上が特に好ましい。
The contact angle of the hydrophilic region with respect to water is preferably 50 degrees or less, more preferably 40 degrees or less, and particularly preferably 20 degrees or less. The contact angle of water in the water repellent region is preferably 80 degrees or more, more preferably 100 degrees or more, and particularly preferably 110 degrees or more.
The difference between the water contact angle of the hydrophilic region and the water contact angle of the water repellent region is preferably 50 ° or more, more preferably 70 ° or more, and particularly preferably 80 ° or more.

本発明の処理基材における撥水性領域は、本発明の重合性含フッ素化合物を含む撥液性処理剤を硬化させた撥液性の膜からなるため、水だけでなく有機溶剤に対しても撥液性を奏する。撥水性領域が有機溶剤に対して撥液性を奏するため、相対的に親水性領域は有機溶剤に対して親液性を奏する。   Since the water-repellent region in the treated substrate of the present invention is composed of a liquid-repellent film obtained by curing the liquid-repellent treating agent containing the polymerizable fluorine-containing compound of the present invention, not only water but also an organic solvent is used. Provides liquid repellency. Since the water repellent region exhibits liquid repellency with respect to the organic solvent, the relatively hydrophilic region exhibits lyophilicity with respect to the organic solvent.

後述する機能性材料を含む液を塗布した場合、親水性領域と撥水性領域の接触角の差が大きいほど、撥水性領域と親水性領域にまたがった機能性材料を含む液は親水性領域に流れ込みやすくなり、機能性材料を含む液を乾燥させることで得られる機能性材料のパターンは撥水性領域と親水性領域とのパターンをより正確に再現できる。
また、親水性領域の接触角の絶対値が小さいほど、機能性材料を含む液は親水性領域で良く濡れ広がり、機能性材料を含む液を乾燥させることで得られる機能性材料のパターンの膜厚をより均一にすることができる。
When a liquid containing a functional material, which will be described later, is applied, the larger the difference in the contact angle between the hydrophilic region and the water-repellent region, the more the liquid containing the functional material straddling the water-repellent region and the hydrophilic region enters the hydrophilic region. The pattern of the functional material obtained by allowing the liquid to easily flow and drying the liquid containing the functional material can more accurately reproduce the pattern of the water repellent region and the hydrophilic region.
In addition, the smaller the absolute value of the contact angle of the hydrophilic region, the better the liquid containing the functional material wets and spreads in the hydrophilic region, and the functional material pattern film obtained by drying the liquid containing the functional material The thickness can be made more uniform.

本発明において、基材としてプラスチック基板や超薄板ガラス等のフレキシブル基板を用いた場合には、ロールツーロール法(Roll to Roll法)が実施できるように設置した複数のロールと、複数のロールの間に露光機を設置して基板への光照射を行うことにより、高スループットで処理基材を得ることができる。   In the present invention, when a flexible substrate such as a plastic substrate or ultra-thin glass is used as a base material, a plurality of rolls installed so that a roll-to-roll method (Roll to Roll method) can be performed, and a plurality of rolls A processing base material can be obtained with high throughput by installing an exposure machine between them and irradiating the substrate with light.

<機能性材料のパターンが形成された部材>
親水性領域と撥水性領域が所望のパターンを形成してなる処理基材を用いて、機能性材料のパターンが形成された部材を製造することができる。本発明の部材は、処理基材の表面に機能性材料を含む液を塗布して、処理基材のパターンを形成した親水性領域に該液を付着させる工程、ついで乾燥させることによって機能性材料のパターンを形成させる工程、必要に応じて、撥液性の膜を除去する工程によって製造できる。
<Member on which functional material pattern is formed>
A member on which a pattern of a functional material is formed can be manufactured using a treatment substrate in which a hydrophilic region and a water-repellent region form a desired pattern. The member of the present invention is a process in which a liquid containing a functional material is applied to the surface of a treated substrate, and the liquid is attached to a hydrophilic region in which a pattern of the treated substrate is formed, and then dried to be a functional material. The pattern can be produced by a step of forming a pattern and, if necessary, a step of removing the liquid repellent film.

本発明の機能性材料のパターンが形成された部材は、例えば、図2に示すように下記の工程5、6、必要に応じて工程7によって製造できる。
工程5:処理基材9の表面に機能性材料を含む液11を塗布して(図2(e))、処理基材のパターンを形成した親水性領域7に該液11を付着させる工程(図2(f))。
工程6:ついで乾燥させることによって機能性材料12のパターンを形成させる工程(図2(g))。
工程7:ついで撥液性の膜4からなる撥水性領域8を除去する工程(図2(h))。
The member in which the pattern of the functional material of the present invention is formed can be manufactured by, for example, the following steps 5 and 6 and, if necessary, step 7 as shown in FIG.
Step 5: A step of applying a liquid 11 containing a functional material to the surface of the treated substrate 9 (FIG. 2E), and attaching the solution 11 to the hydrophilic region 7 in which the pattern of the treated substrate is formed ( FIG. 2 (f)).
Process 6: Next, the process of forming the pattern of the functional material 12 by making it dry (FIG.2 (g)).
Step 7: Next, a step of removing the water-repellent region 8 made of the liquid-repellent film 4 (FIG. 2 (h)).

工程5:
機能性材料としては、金属配線を形成する金属粒子分散ペースト、カラーフィルタを形成する色素材料、電子デバイス・有機ディスプレイを形成するセラミック材料、有機半導体材料等が挙げられる。
Step 5:
Examples of the functional material include a metal particle dispersed paste for forming a metal wiring, a dye material for forming a color filter, a ceramic material for forming an electronic device / organic display, an organic semiconductor material, and the like.

機能性材料を含む液とは、機能性材料を水、有機溶剤、またはそれらの混合物に溶解または分散させた液体もしくは液状体をいう。本発明の処理基材の撥水性領域においては前述のとおり撥油性をも示すため、上記有機溶剤としては極性の低い有機溶剤も使用できる。有機溶剤としては、特に限定されず、メタノール、エタノール、プロパノール、ブタノール等のアルコール類;n−ペンタン、n−ヘキサン、n−ヘプタン、n−オクタン、デカン、ドデカン、テトラデカン、ヘキサデカン、オクタデカン、シクロヘキサン、トルエン、キシレン、テトラヒドロナフタレン、デカヒドロナフタレン等の炭化水素類;エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、エチレングリコールメチルエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールメチルエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系化合物;プロピレンカーボネート、γ−ブチロラクトン、N−メチル−2−ピロリドン、ジメチルホルムアミド、ジメチルスルホキシド、シクロヘキサノン等の極性化合物が上げられる。これらのうち、溶解性、分散性、それらの安定性の点で、好適な溶媒を選択することが好ましい。これらの有機溶媒は、単独で使用してもよく、2種以上の混合物として使用してもよい。   The liquid containing the functional material refers to a liquid or liquid material in which the functional material is dissolved or dispersed in water, an organic solvent, or a mixture thereof. Since the water-repellent region of the treated substrate of the present invention also exhibits oil repellency as described above, an organic solvent having a low polarity can also be used as the organic solvent. The organic solvent is not particularly limited, and alcohols such as methanol, ethanol, propanol and butanol; n-pentane, n-hexane, n-heptane, n-octane, decane, dodecane, tetradecane, hexadecane, octadecane, cyclohexane, Hydrocarbons such as toluene, xylene, tetrahydronaphthalene and decahydronaphthalene; ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol methyl ethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, tetrahydrofuran and dioxane Compound; propylene carbonate, γ-butyrolactone, N-methyl-2-pyrrolidone, Methylformamide, dimethylsulfoxide, polar compounds such as cyclohexanone and the like. Among these, it is preferable to select a suitable solvent in terms of solubility, dispersibility, and stability. These organic solvents may be used alone or in a mixture of two or more.

液の塗布方法としては、スピンコート、ディップコート、ワイヤーバーコート、ブレードコート、ロールコート等の塗布方法、スクリーン印刷、インクジェット法等の特定領域への印刷方法が挙げられる。これらのうち、親水性領域と撥水性領域とからなるパターン上の親水性領域に選択的に塗布することが可能という点で、スクリーン印刷、インクジェット法が好ましい。   Examples of the coating method of the liquid include a coating method such as spin coating, dip coating, wire bar coating, blade coating, and roll coating, and a printing method in a specific region such as screen printing and an inkjet method. Among these, screen printing and an ink jet method are preferable because they can be selectively applied to a hydrophilic region on a pattern composed of a hydrophilic region and a water-repellent region.

工程6:
塗布後の基材を乾燥させ、工程5で用いた溶剤を除去することによって、機能性材料のパターンが形成された部材が得られる。乾燥は大気中または窒素気流中等で行うことが好ましい。また、乾燥は室温または加熱下で行うのが好ましい。乾燥を加熱下で行う場合には、基材の材質の耐熱性によって温度および時間を適宜変更するのが好ましい。
Step 6:
By drying the substrate after application and removing the solvent used in step 5, a member on which a pattern of the functional material is formed is obtained. Drying is preferably performed in the air or in a nitrogen stream. The drying is preferably performed at room temperature or under heating. When drying is performed under heating, it is preferable to appropriately change the temperature and time depending on the heat resistance of the base material.

工程7:
機能性材料のパターンが形成された部材において、さらに撥液性の膜を除去したものは電子素子として有用である。撥液性の膜を除去するのは、該部材を電子素子として使用する場合に、撥液性の膜が素子の動作に影響するおそれがあるからである。
Step 7:
In a member on which a pattern of a functional material is formed, a member from which a liquid-repellent film is further removed is useful as an electronic element. The reason why the liquid repellent film is removed is that the liquid repellent film may affect the operation of the element when the member is used as an electronic element.

撥液性の膜の除去には、アルカリ性水溶液を用いて洗浄することが好ましい。アルカリ性水溶液としては、アルカリ金属水酸化物(水酸化ナトリウム、水酸化カリウム等)の水溶液もしくはメタノール溶液、テトラメチルアンモニウム水酸化物の水溶液もしくはメタノール溶液が挙げられるが、なかでも、水酸化ナトリウムの水溶液が好ましい。   In order to remove the liquid repellent film, it is preferable to wash with an alkaline aqueous solution. Examples of the alkaline aqueous solution include an aqueous solution of an alkali metal hydroxide (sodium hydroxide, potassium hydroxide, etc.) or a methanol solution, an aqueous solution of tetramethylammonium hydroxide or a methanol solution, and among them, an aqueous solution of sodium hydroxide. Is preferred.

以下に本発明を具体的に説明する実施例を挙げるが、本発明はこれらによって限定されるものではない。またここでは、核磁気共鳴法はNMRと、記す。H−NMRスペクトルではテトラメチルシランを内部標準として用い、19F−NMRスペクトルではフルオロトリクロロメタンを外部標準として用いて測定を行った。 Examples that specifically illustrate the present invention are given below, but the present invention is not limited thereto. Here, the nuclear magnetic resonance method is referred to as NMR. In the 1 H-NMR spectrum, tetramethylsilane was used as an internal standard, and in the 19 F-NMR spectrum, fluorotrichloromethane was used as an external standard.

[合成例1]化合物MA1の合成   [Synthesis Example 1] Synthesis of Compound MA1

Figure 2013209636
Figure 2013209636

(合成例1−1) 化合物MA1−Aの合成
化合物(MA1−A)は、非特許文献(J.Org.Chem.第55巻、1990年、6368ページ)に記載の方法を参考に合成した。
蒸留器を取り付けた反応器にペンタエリスリトール(和光純薬工業(株)社製)136g(1.00mol)、トルエン100mL、オルトギ酸トリエチル(和光純薬工業(株)社製)183mL(1.00mol)、p−トルエンスルホン酸1水和物0.50gを取り、留出するエタノールを除きながら反応器温度を徐々に100℃まで上昇させてそのまま12時間反応させ、さらに125℃で1時間反応させた。反応終了後、50℃減圧下で低沸点成分を留去した後、得られた生成物を乾燥させて白色固体を得た。
反応器に水酸化カリウム26.4g(0.470mol)及びジメチルスルホキシド160mLを取り、室温で攪拌させながら前記の白色固体16.0g(0.100mol)を加え、次いで1−ブロモヘキサン20.0g(0.121mol)を加えて、そのまま30分間反応させた。反応液を水1.5Lに加えて、これを酢酸エチル200mLで2回抽出し、得られた有機層を水洗し乾燥させた後、低沸点物を留去して白色固体を得た。
この白色固体をメタノール70mLに溶解させてから0.01mol/L塩酸250mLを加え、室温で2時間反応させ、次いで炭酸水素ナトリウム9.3gを加えて室温で1時間攪拌させた。得られた反応液から減圧下溶媒を留去した後、メタノール125mLを加えて12時間攪拌させ、次いで不溶物をろ別し、得られたろ液から溶媒を留去して、無色油状の化合物MA1−Aを得た。収量18.5g(収率83%)。
(Synthesis Example 1-1) Synthesis of Compound MA1-A Compound (MA1-A) was synthesized with reference to a method described in non-patent literature (J. Org. Chem. Vol. 55, 1990, page 6368). .
In a reactor equipped with a distiller, 136 g (1.00 mol) of pentaerythritol (manufactured by Wako Pure Chemical Industries, Ltd.), 100 mL of toluene, triethyl orthoformate (manufactured by Wako Pure Chemical Industries, Ltd.) 183 mL (1.00 mol) ), Taking 0.50 g of p-toluenesulfonic acid monohydrate, gradually raising the reactor temperature to 100 ° C. while removing the distilled ethanol, allowing the reaction to proceed for 12 hours, and further reacting at 125 ° C. for 1 hour. It was. After completion of the reaction, low-boiling components were distilled off under reduced pressure at 50 ° C., and the resulting product was dried to obtain a white solid.
To the reactor, 26.4 g (0.470 mol) of potassium hydroxide and 160 mL of dimethyl sulfoxide were added, and 16.0 g (0.100 mol) of the white solid was added while stirring at room temperature, and then 20.0 g of 1-bromohexane ( 0.121 mol) was added and allowed to react for 30 minutes. The reaction solution was added to 1.5 L of water, and this was extracted twice with 200 mL of ethyl acetate. The obtained organic layer was washed with water and dried, and then the low boiling point product was distilled off to obtain a white solid.
This white solid was dissolved in 70 mL of methanol, and then added with 250 mL of 0.01 mol / L hydrochloric acid, reacted at room temperature for 2 hours, and then added with 9.3 g of sodium bicarbonate and stirred at room temperature for 1 hour. After distilling off the solvent under reduced pressure from the obtained reaction liquid, 125 mL of methanol was added and stirred for 12 hours, then insoluble matters were filtered off, and the solvent was distilled off from the obtained filtrate to obtain colorless oily compound MA1. -A was obtained. Yield 18.5 g (83% yield).

(合成例1−2) 化合物MA1−Bの合成
化合物MA1−Bは、特許文献(特開2009−149595号公報)に記載の方法を参考に合成した。
トルエン40mLに、化合物MA1−A 17.6g(0.080mol)、40wt%水酸化カリウム水溶液13.4g、及びベンジルトリメチルアンモニウムクロライド0.10gを取り、水浴中で攪拌させながら、15〜20℃でアクリロニトリル13.2g(0.249mol)を3時間かけて滴下した。薄黄色の反応液にトルエン50mL加え分液し、得られた有機層を、5wt%食塩水、希塩酸、さらに5wt%食塩水で洗浄した。硫酸ナトリウム上で乾燥させた後、固体をろ過し、溶媒を減圧留去して、淡黄色油状の化合物MA1−Bを得た。収量28.5g(収率94%)。
(Synthesis example 1-2) Synthesis | combination of compound MA1-B Compound MA1-B was synthesize | combined with reference to the method as described in a patent document (Unexamined-Japanese-Patent No. 2009-149595).
In 40 mL of toluene, 17.6 g (0.080 mol) of the compound MA1-A, 13.4 g of 40 wt% potassium hydroxide aqueous solution, and 0.10 g of benzyltrimethylammonium chloride are taken and stirred at 15 to 20 ° C. while stirring in a water bath. Acrylonitrile (13.2 g, 0.249 mol) was added dropwise over 3 hours. 50 mL of toluene was added to the pale yellow reaction liquid and the phases were separated, and the resulting organic layer was washed with 5 wt% saline, dilute hydrochloric acid, and further 5 wt% saline. After drying over sodium sulfate, the solid was filtered and the solvent was distilled off under reduced pressure to obtain pale yellow oily compound MA1-B. Yield 28.5 g (94% yield).

(合成例1−3) 化合物MA1−Cの合成
化合物MA1−Cは、非特許文献(J.Fluorine Chem.、2004年、第125号、749ページ)に記載の方法を参考に合成した。
脱水メタノール125mLに化合物MA1−B 25.0g(0.066mol)を加えた。室温で攪拌させながら塩化水素ガスを飽和するまでゆっくりと流し込み、さらに塩素ガスを流通させながら加熱還流条件で6時間反応させた。窒素ガスを流通させてから溶媒を留去した後、残査を酢酸エチル200mLに溶解させ、飽和重曹水、水、さらに飽和食塩水で洗浄した。硫酸ナトリウム上で乾燥させた後、固体をろ過し、溶媒を減圧留去して、淡黄色油状の化合物MA1−Cを得た。さらにカラムクロマトグラフィー(展開溶媒:ヘキサン/酢酸エチル=5/1〜1/1)で精製し、無色油状の化合物MA1−Cを得た。収量24.3g(収率77%)。
(Synthesis Example 1-3) Synthesis of Compound MA1-C Compound MA1-C was synthesized with reference to a method described in non-patent literature (J. Fluorine Chem., 2004, No. 125, page 749).
25.0 g (0.066 mol) of the compound MA1-B was added to 125 mL of dehydrated methanol. While stirring at room temperature, hydrogen chloride gas was slowly poured to saturation, and the reaction was continued for 6 hours under heating and refluxing conditions while circulating chlorine gas. After circulating nitrogen gas, the solvent was distilled off, and the residue was dissolved in 200 mL of ethyl acetate and washed with saturated aqueous sodium hydrogen carbonate, water, and saturated brine. After drying over sodium sulfate, the solid was filtered and the solvent was distilled off under reduced pressure to obtain pale yellow oily compound MA1-C. Further purification by column chromatography (developing solvent: hexane / ethyl acetate = 5/1 to 1/1) gave colorless oily compound MA1-C. Yield 24.3 g (77% yield).

(合成例1−4) 化合物MA1−Dの合成
シクロペンチルメチルエーテル150mL、エタノール20mL、MA1−C 20.0g(0.042mol)を取り、これに水素化ホウ素ナトリウム5.7gを加えて氷水浴中で攪拌させながら、塩化カルシウム二水和物16.5gのエタノール70mL溶液をゆっくりと滴下し、そのまま1時間攪拌させた。これを50℃まで昇温させ、次いで濃塩酸17.7mLを加えて1時間攪拌させた後、さらに水酸化ナトリウム水溶液を加えて中和し、生成した固体をろ別した。得られたろ液から溶媒を留去した後、残査にメタノール100mLを加えてから再び溶媒を留去し、無色油状の化合物MA1−Dを得た。収量16.3g(収率99%)。
(Synthesis example 1-4) Synthesis | combination of compound MA1-D Cyclopentyl methyl ether 150mL, ethanol 20mL, MA1-C 20.0g (0.042mol) is taken, and sodium borohydride 5.7g is added to this in an ice water bath. While stirring, the solution of calcium chloride dihydrate 16.5g in 70 mL of ethanol was slowly added dropwise and allowed to stir for 1 hour. The mixture was heated to 50 ° C., then 17.7 mL of concentrated hydrochloric acid was added and stirred for 1 hour, and further neutralized with an aqueous sodium hydroxide solution, and the resulting solid was filtered off. After the solvent was distilled off from the obtained filtrate, 100 mL of methanol was added to the residue, and then the solvent was distilled off again to obtain colorless oily compound MA1-D. Yield 16.3 g (99% yield).

(合成例1−5) 化合物MA1−Eの合成
酢酸エチル200mLにMA1−D 16.3g(0.041mol)及びピリジン14.8mLを加え、室温で攪拌させながら、H(CFCOCl 66.7g(0.137mol、ダイキン工業(株)社製)を加えて4時間攪拌させた。これにヘキサン100mLを加え、希塩酸、食塩水、重曹水、さらに食塩水で洗浄した。硫酸ナトリウム上で乾燥させた後、固体をろ過し、溶媒を減圧留去して、無色油状の化合物MA1−Eを得た。収量51.3g(収率90%)。
(Synthesis Example 1-5) Synthesis of Compound MA1-E 16.3 g (0.041 mol) of MA1-D and 14.8 mL of pyridine were added to 200 mL of ethyl acetate, and H (CF 2 ) 6 COCl 66 was stirred at room temperature. 0.7 g (0.137 mol, manufactured by Daikin Industries, Ltd.) was added and stirred for 4 hours. Hexane 100mL was added to this, and it wash | cleaned by dilute hydrochloric acid, salt solution, sodium hydrogen carbonate solution, and also salt solution. After drying over sodium sulfate, the solid was filtered and the solvent was removed in vacuo to give colorless oily compound MA1-E. Yield 51.3 g (90% yield).

(合成例1−6) 化合物MA1−Fの合成
化合物MA1−F〜化合物MA1の工程は、特許文献(特開2010−53084号公報)に記載の方法を参考に合成した。
原料供給口、フッ素供給口、へリウムガス供給口及びドライアイスで冷却した還流装置を経由してフッ素トラップに接続されている排気口を備えた500mLフッ素樹脂製容器に、FC−72溶媒300mL(住友スリーエム(株)社製)及びフッ化ナトリウム70.6gを取り、内温10℃にてヘリウムガスを流速100mL/minで30分間吹き込んだ。次いで20%F/80%N混合ガス(フッ素ガス)を流速100mL/minで30分間吹き込んだ後、フッ素ガス流速を250mL/minに上げて流通させながら、化合物MA1−E 27.6g(0.020mol)とヘキサフルオロベンゼン4.0g(0.021mol)の混合溶液を内温10〜15℃で8.5時間かけて添加した。フッ素ガス流量を100mL/minに下げ、ヘキサフルオロベンゼン2.0gのFC−7 25mL溶液を1時間かけて添加し、さらにフッ素ガスを100mL/minで15分間流通させた。反応容器内をヘリウムガスで置換してから固体をろ別し、得られたろ液をフッ化ナトリウム20gのメタノール100mL分散液に加えて室温で1時間攪拌後、減圧下で溶媒を留去した。残渣にHFE−7100 100mL(住友スリーエム(株)社製)を加えて溶解させ、重曹水で洗浄した。硫酸マグネシウム上で乾燥させた後、固体をろ別し、溶媒を留去した。得られた残査を減圧下蒸留して無色油状の化合物MA1−Fを得た。収量13.9g(収率65%)。
(Synthesis example 1-6) The synthesis | combination of compound MA1-F The process of compound MA1-F-compound MA1 was synthesize | combined with reference to the method as described in a patent document (Unexamined-Japanese-Patent No. 2010-53084).
In a 500 mL fluororesin container equipped with a raw material supply port, a fluorine supply port, a helium gas supply port and an exhaust port connected to a fluorine trap via a reflux device cooled with dry ice, 300 mL of FC-72 solvent (Sumitomo 30.6) and 70.6 g of sodium fluoride were taken, and helium gas was blown at an internal temperature of 10 ° C. at a flow rate of 100 mL / min for 30 minutes. Next, 20% F 2 /80% N 2 mixed gas (fluorine gas) was blown in at a flow rate of 100 mL / min for 30 minutes, and then the fluorine gas flow rate was increased to 250 mL / min and the compound MA1-E 27.6 g ( 0.020 mol) and 4.0 g (0.021 mol) of hexafluorobenzene were added at an internal temperature of 10 to 15 ° C. over 8.5 hours. The fluorine gas flow rate was lowered to 100 mL / min, a solution of 2.0 g of hexafluorobenzene in 25 mL of FC-7 was added over 1 hour, and fluorine gas was further circulated at 100 mL / min for 15 minutes. After replacing the inside of the reaction vessel with helium gas, the solid was filtered off. The obtained filtrate was added to a methanol 100 mL dispersion of 20 g of sodium fluoride and stirred at room temperature for 1 hour, and then the solvent was distilled off under reduced pressure. To the residue, 100 mL of HFE-7100 (manufactured by Sumitomo 3M Limited) was added and dissolved, and washed with aqueous sodium bicarbonate. After drying over magnesium sulfate, the solid was filtered off and the solvent was distilled off. The obtained residue was distilled under reduced pressure to obtain colorless oily compound MA1-F. Yield 13.9 g (65% yield).

(合成例1−7) 化合物MA1−Gの合成
氷水浴中、窒素雰囲気下で、無水THF120mLに水素化ホウ素ナトリウム2.7g(0.071mol)を加え攪拌させた。内温10〜20℃で調整しながら、化合物MA1−F 20.4g(0.019mol)の無水THF30mL溶液を滴下し、そのまま1時間攪拌した後、さらに室温で3時間攪拌した。3mol/L塩酸25mLを加えてpHを1にした後、1時間攪拌させた。次いで飽和食塩水60mL及び酢酸エチル60mL加えて分離した有機層を重曹水及び食塩水で洗浄し、硫酸マグネシウム上で乾燥させた後、固体をろ別し、溶媒を留去して、無色油状の化合物MA1−Gを得た。収量18.0g(収率96%)。
(Synthesis Example 1-7) Synthesis of Compound MA1-G In an ice-water bath, 2.7 g (0.071 mol) of sodium borohydride was added to 120 mL of anhydrous THF and stirred in a nitrogen atmosphere. While adjusting at an internal temperature of 10 to 20 ° C., a solution of 20.4 g (0.019 mol) of compound MA1-F in 30 mL of anhydrous THF was added dropwise and stirred as it was for 1 hour, and further stirred at room temperature for 3 hours. 25 mL of 3 mol / L hydrochloric acid was added to bring the pH to 1, followed by stirring for 1 hour. Next, 60 mL of saturated brine and 60 mL of ethyl acetate were added, and the separated organic layer was washed with aqueous sodium bicarbonate and brine, dried over magnesium sulfate, the solid was filtered off, and the solvent was distilled off to remove colorless oil. Compound MA1-G was obtained. Yield 18.0 g (96% yield).

(合成例1−8) 化合物MA1の合成
アセトニトリル500mLに、化合物MA1−G 88.9g(0.090mol)及び炭酸カリウム186.3gを取り、10℃以下の温度でアクリル酸クロリド60.8g(0.672mol)を滴下し、次いで室温で5時間攪拌させた。反応液に酢酸エチル120mL及びヘキサン120mLを加え、内温10℃以下で64wt%硫酸135mL滴下した後、析出した固体をろ別した。得られたろ液を、食塩水、重曹水、飽和食塩水で洗浄した後、溶媒を留去して粗生成物を得た。これをカラムクロマトグラフィー(展開溶媒:ヘキサン/酢酸エチル=6/1〜3/1)で精製し、無色油状の化合物MA1を得た。収量56.9g(収率55%)。
(Synthesis Example 1-8) Synthesis of Compound MA1 To 500 mL of acetonitrile, 88.9 g (0.090 mol) of Compound MA1-G and 186.3 g of potassium carbonate were taken, and 60.8 g (0 .672 mol) was added dropwise and then allowed to stir at room temperature for 5 hours. 120 mL of ethyl acetate and 120 mL of hexane were added to the reaction solution, and 135 mL of 64 wt% sulfuric acid was added dropwise at an internal temperature of 10 ° C. or lower, and the precipitated solid was separated by filtration. The obtained filtrate was washed with brine, aqueous sodium bicarbonate, and saturated brine, and then the solvent was distilled off to obtain a crude product. This was purified by column chromatography (developing solvent: hexane / ethyl acetate = 6/1 to 3/1) to obtain colorless oily compound MA1. Yield 56.9 g (55% yield).

[合成例2]化合物MA3の合成   [Synthesis Example 2] Synthesis of Compound MA3

Figure 2013209636
Figure 2013209636

(合成例2−1) 化合物MA3−Aの合成
化合物(MA3−A)は、非特許文献(J.Org.Chem.第55巻、1990年、6368ページ)に記載の方法を参考に合成した。
蒸留器を取り付けた反応器にペンタエリスリトール(和光純薬工業(株)社製)136g(1.00mol)、トルエン100mL、オルトギ酸トリエチル(和光純薬工業(株)社製)183mL(1.00mol)、p−トルエンスルホン酸1水和物0.50gを取り、留出するエタノールを除きながら反応器温度を徐々に100℃まで上昇させてそのまま12時間反応させ、さらに125℃で1時間反応させた。反応終了後、50℃減圧下で低沸点成分を留去した後、得られた生成物を乾燥させて白色固体を得た。
反応器に水酸化カリウム26.4g(0.470mol)及びジメチルスルホキシド160mLを取り、氷水浴中で攪拌させながら前記の白色固体16.0g(0.100mol)を加え、次いでトリフルオロメタンスルホン酸−1−(1H,1H−パーフルオロ−3,6,9,12−テトラオキサトリデシル)84.0g(0.130mol、x=)を加えて、そのまま30分間反応させた。反応液を水1.5Lに加えて、これを酢酸エチル200mLで2回抽出し、得られた有機層を水洗し乾燥させた後、低沸点物を留去して微黄色油状物を得た。
この油状物をメタノール100mLに分散させてから0.01mol/L塩酸250mLを加え、室温で2時間反応させ、次いで炭酸水素ナトリウム9.3gを加えて室温で1時間攪拌させた。得られた反応液から減圧下溶媒を留去した後、メタノール125mLを加えて12時間攪拌させ、次いで不溶物をろ別し、得られたろ液から溶媒を留去して、微黄色油状物を得た。さらにこれをカラムクロマトグラフィーで精製し、無色油状物の化合物MA3−Aを得た。収量36.0g(収率54%)。
(Synthesis Example 2-1) Synthesis of Compound MA3-A Compound (MA3-A) was synthesized with reference to a method described in non-patent literature (J. Org. Chem. Vol. 55, 1990, page 6368). .
In a reactor equipped with a distiller, 136 g (1.00 mol) of pentaerythritol (manufactured by Wako Pure Chemical Industries, Ltd.), 100 mL of toluene, triethyl orthoformate (manufactured by Wako Pure Chemical Industries, Ltd.) 183 mL (1.00 mol) ), Taking 0.50 g of p-toluenesulfonic acid monohydrate, gradually raising the reactor temperature to 100 ° C. while removing the distilled ethanol, allowing the reaction to proceed for 12 hours, and further reacting at 125 ° C. for 1 hour. It was. After completion of the reaction, low-boiling components were distilled off under reduced pressure at 50 ° C., and the resulting product was dried to obtain a white solid.
To the reactor, 26.4 g (0.470 mol) of potassium hydroxide and 160 mL of dimethyl sulfoxide were added, and 16.0 g (0.100 mol) of the white solid was added while stirring in an ice-water bath, and then trifluoromethanesulfonic acid-1 84.0 g (0.130 mol, x =) of-(1H, 1H-perfluoro-3,6,9,12-tetraoxatridecyl) was added and allowed to react for 30 minutes. The reaction solution was added to 1.5 L of water, and this was extracted twice with 200 mL of ethyl acetate. The obtained organic layer was washed with water and dried, and then the low boiling point was distilled off to obtain a slightly yellow oil. .
This oily substance was dispersed in 100 mL of methanol, 250 mL of 0.01 mol / L hydrochloric acid was added and reacted at room temperature for 2 hours, and then 9.3 g of sodium bicarbonate was added and stirred at room temperature for 1 hour. After the solvent was distilled off from the obtained reaction solution under reduced pressure, 125 mL of methanol was added and the mixture was stirred for 12 hours, then insoluble matter was filtered off, and the solvent was distilled off from the obtained filtrate to give a slightly yellow oil. Obtained. This was further purified by column chromatography to obtain colorless oily compound MA3-A. Yield 36.0 g (54% yield).

(合成例2−2) 化合物MA3の合成
化合物MA3−B〜化合物MA3を合成する工程は合成例1と同様に行い、化合物MA3を得た。
(Synthesis example 2-2) The synthesis | combination of compound MA3 The process of synthesize | combining compound MA3-B-compound MA3 was performed like the synthesis example 1, and compound MA3 was obtained.

[合成例3]化合物MA15の合成   [Synthesis Example 3] Synthesis of Compound MA15

Figure 2013209636
Figure 2013209636

(合成例3−1)化合物MA15−Cの合成
公知の方法を組み合わせ、前記合成経路で、化合物MA15−Cを合成した。化合物MA15−Cは、カラムクロマトグラフィーにより精製し、次工程に使用した。
(Synthesis example 3-1) Synthesis | combination of compound MA15-C Compound MA15-C was synthesize | combined with the said synthetic pathway combining the well-known method. Compound MA15-C was purified by column chromatography and used in the next step.

(合成例3−2)化合物MA15の合成
化合物MA15を合成する工程は、合成例1と同様に行い、化合物MA15を得た。
(Synthesis Example 3-2) Synthesis of Compound MA15 The step of synthesizing Compound MA15 was performed in the same manner as in Synthesis Example 1 to obtain Compound MA15.

[合成例4]化合物MA17の合成   [Synthesis Example 4] Synthesis of Compound MA17

Figure 2013209636
Figure 2013209636

(合成例4−1) 化合物MA17−Aの合成
ディーンスターク型蒸留器を取り付けた反応器にジペンタエリスリトール(和光純薬工業(株)社製)254g(1.00mol)、トルエン200mL、アセトフェノン252g(2.10mol)、p−トルエンスルホン酸1水和物1.0gを取り、反応器温度を徐々に上昇させて還流条件にして、規定量の水がディーンスターク型蒸留器内に得られるまで12時間反応させた。反応終了後、減圧下で低沸点成分を留去し、得られた生成物を乾燥させて白色固体を得た。
反応器に水酸化カリウム26.4g(0.470mol)及びジメチルスルホキシド160mLを取り、氷水浴中で攪拌させながら前記の白色固体45.9g(0.100mol)を加え、次いでメタンスルホン酸エステル化したポリエチレングリコールモノメチルエーテル(和光純薬工業(株)社製、平均分子量350、x=7.6)90.3g(0.210mol)を加えて、そのまま60分間反応させた。反応液を水1.5Lに加えて、これを酢酸エチル150mLで2回抽出し、得られた有機層を水洗し乾燥させた後、低沸点物を留去して微黄色油状物を得た。
この油状物をメタノール100mLに分散させてから0.01mol/L塩酸250mLを加え、室温で2時間反応させ、次いで炭酸水素ナトリウム9.3gを加えて室温で1時間攪拌させた。得られた反応液から減圧下溶媒を留去した後、メタノール125mLを加えて12時間攪拌させ、次いで不溶物をろ別し、得られたろ液から溶媒を留去して、微黄色油状物の化合物MA17−Aを得た。収量66.8g(収率70%)。
(Synthesis Example 4-1) Synthesis of Compound MA17-A 254 g (1.00 mol) of dipentaerythritol (manufactured by Wako Pure Chemical Industries, Ltd.), 200 mL of toluene, and 252 g of acetophenone were attached to a reactor equipped with a Dean-Stark distiller. (2.10 mol), taking 1.0 g of p-toluenesulfonic acid monohydrate, gradually raising the reactor temperature to reflux conditions until a defined amount of water is obtained in the Dean-Stark still The reaction was performed for 12 hours. After completion of the reaction, the low-boiling components were distilled off under reduced pressure, and the resulting product was dried to obtain a white solid.
To the reactor, 26.4 g (0.470 mol) of potassium hydroxide and 160 mL of dimethyl sulfoxide were added, and 45.9 g (0.100 mol) of the white solid was added while stirring in an ice-water bath, and then converted into methanesulfonic acid ester. 90.3 g (0.210 mol) of polyethylene glycol monomethyl ether (manufactured by Wako Pure Chemical Industries, Ltd., average molecular weight 350, x = 7.6) was added and allowed to react for 60 minutes. The reaction solution was added to 1.5 L of water, and this was extracted twice with 150 mL of ethyl acetate. The obtained organic layer was washed with water and dried, and then the low boiling point product was distilled off to obtain a slightly yellow oil. .
This oily substance was dispersed in 100 mL of methanol, 250 mL of 0.01 mol / L hydrochloric acid was added and reacted at room temperature for 2 hours, and then 9.3 g of sodium bicarbonate was added and stirred at room temperature for 1 hour. After the solvent was distilled off from the obtained reaction solution under reduced pressure, 125 mL of methanol was added and allowed to stir for 12 hours. Then, insoluble matters were filtered off, and the solvent was distilled off from the obtained filtrate to give a slightly yellow oily substance. Compound MA17-A was obtained. Yield 66.8 g (70% yield).

(合成例4−2) 化合物MA17−Cの合成
化合物MA17−B及び化合物MA17−Cを合成する工程は、合成例1と同様に行い、化合物MA17−Cを得た。
(Synthesis example 4-2) The synthesis | combination of compound MA17-C The process of synthesize | combining compound MA17-B and compound MA17-C was performed like the synthesis example 1, and compound MA17-C was obtained.

(合成例4−3) 化合物MA17−Dの合成
化合物MA17−Dの工程は、特許文献(特開2010−53084号公報)に記載の方法を参考に合成した。
原料供給口、フッ素供給口、へリウムガス供給口及び20℃に冷却した還流装置を経由してフッ素トラップに接続されている排気口を備えた300mLフッ素樹脂製容器に、ハロカーボン1.8オイル200mL(ハロカーボン・プロダクツ・コーポレーション社製)を取り、内温30℃にてヘリウムガスを流速100mL/minで30分間吹き込んだ。次いで20%F/80%N混合ガス(フッ素ガス)を流速100mL/minで30分間吹き込んだ後、フッ素ガス流速を250mL/minに上げて流通させながら、化合物MA17−C 16.0g(0.0124mol)、ヘキサフルオロベンゼン0.80g(0.043mol)、及びハロカーボン1.8オイル30mLの混合溶液を、内温30〜40℃で20時間かけて添加した。フッ素ガス流量を100mL/minに下げ、ヘキサフルオロベンゼン1.0gのハロカーボン1.8オイル5mL溶液を1時間かけて添加し、さらにフッ素ガスを100mL/minで15分間流通させた。反応容器内をヘリウムガスで置換してから、反応液をフッ化ナトリウム20gのメタノール100mL分散液に加えて室温で1時間攪拌後、減圧下で溶媒を留去した。残渣にHFE−7100 100mL(住友スリーエム(株)社製)を加えて溶解させ、重曹水で洗浄し、硫酸マグネシウム上で乾燥させた後、溶媒を留去した。得られた残査を減圧下蒸留して無色油状の化合物MA17−Dを得た。収量13.9g(収率65%)。
(Synthesis example 4-3) The synthesis | combination of compound MA17-D The process of compound MA17-D was synthesize | combined with reference to the method as described in a patent document (Unexamined-Japanese-Patent No. 2010-53084).
In a 300 mL fluororesin container equipped with a raw material supply port, a fluorine supply port, a helium gas supply port and an exhaust port connected to a fluorine trap via a reflux device cooled to 20 ° C., 200 mL of halocarbon 1.8 oil (Halocarbon Products Corporation) was taken, and helium gas was blown at an internal temperature of 30 ° C. at a flow rate of 100 mL / min for 30 minutes. Next, 20% F 2 /80% N 2 mixed gas (fluorine gas) was blown in at a flow rate of 100 mL / min for 30 minutes, and then the flow rate of the fluorine gas was increased to 250 mL / min while flowing 16.0 g of compound MA17-C ( 0.0124 mol), 0.80 g (0.043 mol) of hexafluorobenzene, and 30 mL of halocarbon 1.8 oil were added at an internal temperature of 30 to 40 ° C. over 20 hours. The fluorine gas flow rate was lowered to 100 mL / min, a 1.0 mL halocarbon 1.8 oil 5 mL solution of hexafluorobenzene was added over 1 hour, and fluorine gas was further circulated at 100 mL / min for 15 minutes. After replacing the inside of the reaction vessel with helium gas, the reaction solution was added to a methanol 100 mL dispersion of 20 g of sodium fluoride and stirred at room temperature for 1 hour, and then the solvent was distilled off under reduced pressure. To the residue, 100 mL of HFE-7100 (manufactured by Sumitomo 3M Co., Ltd.) was added and dissolved, washed with aqueous sodium bicarbonate, dried over magnesium sulfate, and then the solvent was distilled off. The obtained residue was distilled under reduced pressure to obtain colorless oily compound MA17-D. Yield 13.9 g (65% yield).

(合成例4−4) 化合物MA17の合成
化合物MA17−E〜化合物MA17を合成する工程は、合成例1と同様に行い、化合物MA17を得た。
(Synthesis Example 4-4) Synthesis of Compound MA17 The step of synthesizing Compound MA17-E to Compound MA17 was performed in the same manner as in Synthesis Example 1 to obtain Compound MA17.

[合成例5]化合物MA31の合成   [Synthesis Example 5] Synthesis of Compound MA31

Figure 2013209636
Figure 2013209636

(合成例5−1) 化合物MA31−Eの合成
化合物MA31−A〜化合物MA31−Eを合成する工程は、合成例1と同様に行い、化合物MA31−Eを得た。
(Synthesis example 5-1) The synthesis | combination of compound MA31-E The process of synthesize | combining compound MA31-A-compound MA31-E was performed like the synthesis example 1, and compound MA31-E was obtained.

(合成例5−2) 化合物MA31の合成
反応器にTHF580mLを取り、氷水浴中、窒素雰囲気下で、水素化ホウ素ナトリウム20.7g(0.548mol)を加え、さらに水140mLを加えて攪拌させた。内温10〜20℃で調整しながら、化合物MA31−E 100g(0.110mol)のTHF25mL溶液を滴下して、そのまま30分間攪拌し、次いで20℃で3時間攪拌した。内温を10℃にした後、6mol/L塩酸120mLを加えてpHを1にした後、食塩水250mLを加えて1時間攪拌させた。次いで酢酸エチル280mLを加えて分離した有機層を食塩水で4回洗浄した。この溶液をそのまま次工程に使用した。
反応器に前記有機層、n−ヘキサン500mL、ピリジン50g、水170mL、及び重曹133gを取り、氷水浴中で攪拌した。これに3−クロロプロピオン酸クロリド160g(1.26mol)を1.5時間かけて滴下し、そのまま3.5時間攪拌した後、内温を25℃まで昇温させてから10%炭酸カリウム水溶液600mLを加えて1時間攪拌した。これから有機層を分離して、10%炭酸カリウム水溶液、2mol/L塩酸、さらに食塩水で洗浄し、硫酸マグネシウム上で乾燥させた。この溶液をそのまま次工程に使用した。
反応器に前記有機層、4−メトキシフェノール0.05g、トリエチルアミン81.8g(0.808mol)を取り、50℃で4時間攪拌した。室温まで放冷後、2mol/L塩酸400mL、重曹水、及び食塩水で洗浄し、硫酸マグネシウム上で乾燥させた後、活性アルミナ40gを加えて30分間攪拌してから固体をろ別した。得られたろ液に4−メトキシフェノール0.05gを加えてた後、溶媒を留去し、微黄色油状の化合物MA31を得た。収量92.5g(収率83%)。
(Synthesis Example 5-2) Synthesis of Compound MA31 580 mL of THF was placed in a reactor, 20.7 g (0.548 mol) of sodium borohydride was added in an ice-water bath under a nitrogen atmosphere, and 140 mL of water was further added and stirred. It was. While adjusting the internal temperature at 10 to 20 ° C., a solution of compound MA31-E 100 g (0.110 mol) in 25 mL of THF was dropped, and the mixture was stirred as it was for 30 minutes and then at 20 ° C. for 3 hours. After setting the internal temperature to 10 ° C., 120 mL of 6 mol / L hydrochloric acid was added to adjust the pH to 1, and then 250 mL of brine was added and stirred for 1 hour. Next, 280 mL of ethyl acetate was added, and the separated organic layer was washed 4 times with brine. This solution was directly used in the next step.
The organic layer, 500 mL of n-hexane, 50 g of pyridine, 170 mL of water, and 133 g of sodium bicarbonate were taken in the reactor and stirred in an ice-water bath. To this was added dropwise 160 g (1.26 mol) of 3-chloropropionic acid chloride over 1.5 hours, and the mixture was stirred as it was for 3.5 hours. After the internal temperature was raised to 25 ° C., 600 mL of 10% aqueous potassium carbonate solution was added. And stirred for 1 hour. The organic layer was separated from this, washed with 10% aqueous potassium carbonate solution, 2 mol / L hydrochloric acid, and further with brine, and dried over magnesium sulfate. This solution was directly used in the next step.
The organic layer, 0.05 g of 4-methoxyphenol, and 81.8 g (0.808 mol) of triethylamine were taken in a reactor and stirred at 50 ° C. for 4 hours. The mixture was allowed to cool to room temperature, washed with 400 mL of 2 mol / L hydrochloric acid, aqueous sodium hydrogen carbonate, and brine, dried over magnesium sulfate, added with 40 g of activated alumina, stirred for 30 minutes, and then the solid was filtered off. After adding 0.05 g of 4-methoxyphenol to the obtained filtrate, the solvent was distilled off to obtain compound MA31 as a slightly yellow oil. Yield 92.5 g (83% yield).

[合成例6]化合物ME1の合成   [Synthesis Example 6] Synthesis of Compound ME1

Figure 2013209636
Figure 2013209636

(合成例6−1) 化合物ME1−Gの合成
化合物ME1−A〜化合物ME1−Gを合成する工程は合成例1と同様に行った。
(Synthesis Example 6-1) Synthesis of Compound ME1-G The steps of synthesizing Compound ME1-A to Compound ME1-G were performed in the same manner as in Synthesis Example 1.

(合成例6−2) 化合物ME1の合成
反応器に水酸化ナトリウム2.00g(0.05mol)、エピクロロヒドリン4.63g(0.05mol)を取り、窒素雰囲気下50℃で攪拌しながら、ME1−G 9.88g(0.01mol)をゆっくりと加えて、そのまま3時間攪拌させた。室温まで放冷してから析出した固体をろ別し、減圧下で低沸点物を留去した後、酢酸エチル200mLと水100mLを加えて分液し、得られた有機層を硫酸ナトリウムで乾燥させ、溶媒を留去させて、粗生成物を得た。これをカラムクロマトグラフィーにより精製し、無色油状の化合物ME1を得た。収量4.05g(収率41%)。
化合物ME1:
H−NMR(300MHz,CDCl) δppm 3.99(m,3H)、3.48(dd,J=12,6Hz,1H)、3.2(m,1H)、2.77(dd,J=5,4Hz,1H)、2.58(dd,J=5,3Hz,1H)。
19F−NMR(282.4MHz,CDCl) δppm −66.1(s,6F)、−82.4(t,J=9Hz,3F)、−83.3(m,2F)、−85.8(s,8F)、−123.4(m,10F)、−126.8(m,2F)、−127.2(m,2F)。
(Synthesis Example 6-2) Synthesis of Compound ME1 In a reactor, 2.00 g (0.05 mol) of sodium hydroxide and 4.63 g (0.05 mol) of epichlorohydrin were taken and stirred at 50 ° C. in a nitrogen atmosphere. Then, 9.88 g (0.01 mol) of ME1-G was slowly added and allowed to stir for 3 hours. After allowing to cool to room temperature, the precipitated solid was filtered off, and low-boiling substances were distilled off under reduced pressure. Then, 200 mL of ethyl acetate and 100 mL of water were added for liquid separation, and the resulting organic layer was dried over sodium sulfate. And the solvent was distilled off to obtain the crude product. This was purified by column chromatography to obtain a colorless oily compound ME1. Yield 4.05 g (41% yield).
Compound ME1:
1 H-NMR (300 MHz, CDCl 3 ) δ ppm 3.99 (m, 3H), 3.48 (dd, J = 12.6 Hz, 1H), 3.2 (m, 1H), 2.77 (dd, J = 5, 4 Hz, 1H), 2.58 (dd, J = 5, 3 Hz, 1H).
19 F-NMR (282.4 MHz, CDCl 3 ) δ ppm −66.1 (s, 6F), −82.4 (t, J = 9 Hz, 3F), −83.3 (m, 2F), −85. 8 (s, 8F), -123.4 (m, 10F), -126.8 (m, 2F), -127.2 (m, 2F).

[合成例7]化合物ME6の合成   [Synthesis Example 7] Synthesis of Compound ME6

Figure 2013209636
Figure 2013209636

(合成例7−1) 化合物ME6−Aの合成   (Synthesis Example 7-1) Synthesis of Compound ME6-A

化合物(ME6−A)は、非特許文献(J.Org.Chem.第55巻、1990年、6368ページ)に記載の方法を参考に、合成例2−1と同様に合成した。
この油状物をメタノール100mLに分散させてから0.01mol/L塩酸250mLを加え、室温で2時間反応させ、次いで炭酸水素ナトリウム9.3gを加えて室温で1時間攪拌させた。得られた反応液から減圧下溶媒を留去した後、メタノール125mLを加えて12時間攪拌させ、次いで不溶物をろ別し、得られたろ液から溶媒を留去して、微黄色油状物を得た。さらにこれをカラムクロマトグラフィーで精製し、無色油状物の化合物ME6−Aを得た。収量36.0g(収率54%)。
Compound (ME6-A) was synthesized in the same manner as in Synthesis Example 2-1, with reference to the method described in non-patent literature (J. Org. Chem. Vol. 55, 1990, page 6368).
This oily substance was dispersed in 100 mL of methanol, 250 mL of 0.01 mol / L hydrochloric acid was added and reacted at room temperature for 2 hours, and then 9.3 g of sodium bicarbonate was added and stirred at room temperature for 1 hour. After the solvent was distilled off from the obtained reaction solution under reduced pressure, 125 mL of methanol was added and the mixture was stirred for 12 hours, then insoluble matter was filtered off, and the solvent was distilled off from the obtained filtrate to give a slightly yellow oil. Obtained. Further, this was purified by column chromatography to obtain a colorless oily compound ME6-A. Yield 36.0 g (54% yield).

(合成例7−2) 化合物ME6−Gの合成
化合物ME6−B〜化合物ME6―Gを合成する工程は、合成例1と同様に行った。
(Synthesis Example 7-2) Synthesis of Compound ME6-G The steps of synthesizing Compound ME6-B to Compound ME6-G were performed in the same manner as Synthesis Example 1.

(合成例7−3) 化合物ME6の合成
化合物ME6を合成する工程は、合成例6−2と同様に行った。
化合物ME6:
H−NMR(300MHz,CDCl) δppm 3.99(m,3H)、3.48(dd,J=12,6Hz,1H)、3.22(m,1H)、2.77(dd,J=5 ,4Hz,1H)、2.58(dd,J=5,3Hz,1H)。
19F−NMR(282.4MHz,CDCl) δppm −66.0(s,6F)、−79.1(m,4F)、−80.6(m,6F)、−82.1(s,3F)、−86.1(m,10F)、−123.2(m,6F)、−130.3(s,2F)、−145.8(m,2F)。
(Synthesis Example 7-3) Synthesis of Compound ME6 The step of synthesizing Compound ME6 was performed in the same manner as in Synthesis Example 6-2.
Compound ME6:
1 H-NMR (300 MHz, CDCl 3 ) δ ppm 3.99 (m, 3H), 3.48 (dd, J = 12.6 Hz, 1H), 3.22 (m, 1H), 2.77 (dd, J = 5, 4 Hz, 1H), 2.58 (dd, J = 5, 3 Hz, 1H).
19 F-NMR (282.4 MHz, CDCl 3 ) δ ppm -66.0 (s, 6F), -79.1 (m, 4F), -80.6 (m, 6F), -82.1 (s, 3F), -86.1 (m, 10F), -123.2 (m, 6F), -130.3 (s, 2F), -145.8 (m, 2F).

[合成例8]化合物ME29の合成   [Synthesis Example 8] Synthesis of Compound ME29

Figure 2013209636
Figure 2013209636

(合成例8−1) 化合物ME29−Fの合成
化合物ME29−A〜化合物ME29―Fを合成する工程は、合成例4と同様に行った。
(Synthesis Example 8-1) Synthesis of Compound ME29-F The steps of synthesizing Compound ME29-A to Compound ME29-F were performed in the same manner as in Synthesis Example 4.

(合成例8−2) 化合物ME29の合成
化合物ME29を合成する工程は、合成例6−2と同様に行った。
化合物ME29:
H−NMR(300MHz,CDCl) δppm 3.98(m,3H)、3.49(dd,J=12,6Hz,1H)、3.24(m,1H)、2.78(dd,J=5,4Hz,1H)、2.59(dd,J=5,3Hz,1H)。
19F−NMR(282.4MHz,CDCl) δppm −65.9(s,1F)、−85.8(s,1F)、−123.0(t,J=13Hz,1F)。
(Synthesis Example 8-2) Synthesis of Compound ME29 The step of synthesizing Compound ME29 was performed in the same manner as in Synthesis Example 6-2.
Compound ME29:
1 H-NMR (300 MHz, CDCl 3 ) δ ppm 3.98 (m, 3H), 3.49 (dd, J = 12.6 Hz, 1H), 3.24 (m, 1H), 2.78 (dd, J = 5, 4 Hz, 1H), 2.59 (dd, J = 5, 3 Hz, 1H).
19 F-NMR (282.4 MHz, CDCl 3 ) δ ppm −65.9 (s, 1F), −85.8 (s, 1F), −123.0 (t, J = 13 Hz, 1F).

[合成例9]化合物N1の合成   [Synthesis Example 9] Synthesis of Compound N1

Figure 2013209636
Figure 2013209636

国際公開第08/018599号パンフレットの実施例1に記載の方法に従い、化合物N1を合成した。   Compound N1 was synthesized according to the method described in Example 1 of WO08 / 018599.

[実施例1]撥液性処理剤の調製
(実施例1−1〜1−13)
サンプル瓶に、下記表1に記載した種類及び添加量の一般式(1)で表される含フッ素化合物、下記表1に記載した種類及び添加量の一般式(12)又は(13)で表される含フッ素化合物、及び光重合開始剤0.05gを取り、必要に応じて一般式(16)で表される非フッ素化合物を加え、これに2−ブタノン10.0gを加えて、十分に攪拌させ均一な溶液とした。調製した撥液性処理剤の一覧を表1に示す。
光重合開始剤A:IRGACURE184、BASFジャパン(株)社製。
光重合開始剤B:WPAG−336、和光純薬工業(株)社製。
DPHA:ジペンタエリスリトール ヘキサアクリレート、ダイセル・サイテック(株)社製。
PETG:ペンタエリスリトール テトラグリシジルエーテル、ナガセケムテックス(株)社製。
AA−2:アクリル酸−2−(パーフルオロヘキシル)エチル、ダイキン工業(株)社製。
AA−12:上記構造式AA−12中のZが3である化合物として、CFO(CFCFCFO)CFCFCHOHを、公知の方法に従いアクリル酸エステル化したものを用いた。
AA−13:上記構造式AA−13中のZが3である化合物として、CFCFCFO[CF(CF)CFO]CF(CF)CHOH(シンクエストラボラトリーズインコーポレイテッド社製)を、公知の方法に従いアクリル酸エステル化したものを用いた。
AA−15:フルオロリンクD10−H(平均分子量700、フッ素原子含量61%、ソルベイソレクシス社製)を、公知の方法に従いアクリル酸エステル化したものを用いた。
AE−2:2−(パーフルオロヘキシル)エタノール(ダイキン工業(株)社製)を、公知の方法に従いグリシジルエーテル化したものを用いた。
AE−13:上記構造式AE−13中のZが3である化合物として、CFCFCFO[CF(CF)CFO]CF(CF)CHOH(シンクエストラボラトリーズインコーポレイテッド社製)を、公知の方法に従いグリシジルエーテル化したものを用いた。
AE−15:フルオロリンクD10−H(平均分子量700、フッ素原子含量61%、ソルベイソレクシス社製)を、公知の方法に従いグリシジルエーテル化したものを用いた。
[Example 1] Preparation of liquid repellent treatment agent (Examples 1-1 to 1-13)
In the sample bottle, the fluorine-containing compound represented by the general formula (1) of the types and addition amounts described in Table 1 below, and the general formula (12) or (13) of the types and addition amounts described in Table 1 below. 0.05 g of the fluorine-containing compound and the photopolymerization initiator, and if necessary, add the non-fluorine compound represented by the general formula (16), add 10.0 g of 2-butanone to this, and A homogeneous solution was obtained by stirring. Table 1 shows a list of the prepared liquid repellent treatment agents.
Photopolymerization initiator A: IRGACURE184, manufactured by BASF Japan Ltd.
Photopolymerization initiator B: WPAG-336, manufactured by Wako Pure Chemical Industries, Ltd.
DPHA: dipentaerythritol hexaacrylate, manufactured by Daicel-Cytec Corporation.
PETG: Pentaerythritol tetraglycidyl ether, manufactured by Nagase ChemteX Corporation.
AA-2: Acrylic acid-2- (perfluorohexyl) ethyl, manufactured by Daikin Industries, Ltd.
AA-12: CF 3 O (CF 2 CF 2 CF 2 O) 3 CF 2 CF 2 CH 2 OH is converted into an acrylate according to a known method as a compound in which Z in the structural formula AA-12 is 3 What was done was used.
AA-13: As a compound in which Z in the structural formula AA-13 is 3, CF 3 CF 2 CF 2 O [CF (CF 3 ) CF 2 O] 3 CF (CF 3 ) CH 2 OH (Sinquest Laboratories) Incorporated) was made into an acrylate according to a known method.
AA-15: Fluorolink D10-H (average molecular weight 700, fluorine atom content 61%, manufactured by Solvay Solexis) and acrylated according to a known method was used.
AE-2: 2- (perfluorohexyl) ethanol (manufactured by Daikin Industries, Ltd.) obtained by glycidyl etherification according to a known method was used.
AE-13: As a compound in which Z in the above structural formula AE-13 is 3, CF 3 CF 2 CF 2 O [CF (CF 3 ) CF 2 O] 3 CF (CF 3 ) CH 2 OH (Sinquest Laboratories) Incorporated) was used after glycidyl etherification according to a known method.
AE-15: Fluorolink D10-H (average molecular weight 700, fluorine atom content 61%, manufactured by Solvay Solexis) and glycidyl etherified according to a known method was used.

[比較例1]処理剤の調製
(比較例1−1〜1−4)
サンプル瓶に、一般式(1)で表される含フッ素化合物、又は、一般式(12)又は(13)で表される含フッ素化合物、光重合開始剤0.05g、2−ブタノン10.0gを取り、十分に攪拌させ均一な溶液とした。調製した処理剤の一覧を表1に示す。
[Comparative Example 1] Preparation of treating agent (Comparative Examples 1-1 to 1-4)
In a sample bottle, the fluorine-containing compound represented by the general formula (1) or the fluorine-containing compound represented by the general formula (12) or (13), a photopolymerization initiator 0.05 g, and 2-butanone 10.0 g Was stirred sufficiently to obtain a uniform solution. Table 1 shows a list of prepared treatment agents.

[比較例2]化合物N1を用いた処理剤の調製
(比較例2−1、2−2)
一般式(1)で表される含フッ素化合物に変えて、合成例9で合成した化合物N1を使用した以外は、実施例1及び比較例1と同様に溶液を調製した。調製した処理剤の一覧を表1に示す。
[Comparative Example 2] Preparation of treating agent using Compound N1 (Comparative Examples 2-1 and 2-2)
A solution was prepared in the same manner as in Example 1 and Comparative Example 1 except that the compound N1 synthesized in Synthesis Example 9 was used instead of the fluorine-containing compound represented by the general formula (1). Table 1 shows a list of prepared treatment agents.

Figure 2013209636
Figure 2013209636

[実施例2]処理基材及び部材の作製、及び評価
(実施例2−1〜2−9)
5cm角のガラス基材を水酸化カリウム水溶液に1時間浸漬した後、純水で十分に洗浄してから、90℃オーブン中で加熱乾燥した。
実施例1−1〜実施例1−9で調製した撥液性処理剤を、前記のガラス基材にスピンコート(3000rpm、20秒)した後、室温で送風乾燥させ、さらに90℃オーブン中で加熱乾燥して、塗膜を形成した。
前記のように作成した塗膜表面に、200ppm以下の酸素濃度に調節した窒素雰囲気下、線幅100μm、間隔100μmパターンを形成するフォトマスク上から、高圧水銀灯i線(365nm)を300mJ/cm(照度20mW/cm)露光を行った。
光照射後のガラス基材を2−ブタノンで洗浄した後、送風乾燥したものを処理基材とした。
[Example 2] Preparation and evaluation of treated substrate and member (Examples 2-1 to 2-9)
After immersing a 5 cm square glass substrate in an aqueous potassium hydroxide solution for 1 hour, the glass substrate was thoroughly washed with pure water and then dried by heating in a 90 ° C. oven.
The liquid repellent treatment agent prepared in Example 1-1 to Example 1-9 was spin-coated on the glass substrate (3000 rpm, 20 seconds), then air-dried at room temperature, and further in an oven at 90 ° C. Heat-dried to form a coating film.
A high pressure mercury lamp i-line (365 nm) is applied at 300 mJ / cm 2 on the photomask that forms a pattern with a line width of 100 μm and a spacing of 100 μm in a nitrogen atmosphere adjusted to an oxygen concentration of 200 ppm or less on the surface of the coating film prepared as described above. (Illuminance 20 mW / cm 2 ) Exposure was performed.
The glass substrate after the light irradiation was washed with 2-butanone and then blown and dried to obtain a treated substrate.

[静的接触角測定]
接触角計[“CA−X”型接触角計、協和界面科学(株)製]を用い、乾燥状態(20℃/65%RH)で、液体として純水を使用して液量1.0μLの液滴を針先に作り、これを上記処理基材の撥水性領域の表面に接触させてフイルム上に液滴を作った。フイルムと液体とが接する点における、液体表面に対する接線とフイルム表面がなす角で、液体を含む側の角度を接触角とし、測定した。また、水の代わりにヨウ化メチレンを用いての接触角の測定も行った。
[Static contact angle measurement]
Using a contact angle meter [“CA-X” type contact angle meter, manufactured by Kyowa Interface Science Co., Ltd.] and using pure water as the liquid in a dry state (20 ° C./65% RH), a liquid volume of 1.0 μL Was made on the needle tip, and this was brought into contact with the surface of the water-repellent region of the treated substrate to form a droplet on the film. The angle formed by the film surface and the tangent to the liquid surface at the point where the film and the liquid contact each other, and the angle on the side containing the liquid was defined as the contact angle. The contact angle was also measured using methylene iodide instead of water.

[耐摩擦性評価]
ラビングテスターを用いて、以下の条件でこすりテストを行うことで、耐摩擦性を評価した。
評価環境条件:25℃、60%RH
こすり材:スチールウール(日本スチールウール(株)製、グレードNo.0000)
試料と接触するテスターのこすり先端部(1cm×1cm)に巻いて、バンド固定。
移動距離(片道):3cm、
こすり速度:3cm/秒、
荷重:200g/cm
先端部接触面積:1cm×1cm、
こすり回数:10往復。
こすり終えた反射防止フイルム試料の裏側に油性黒インキを塗り、反射光で目視観察して、こすり部分の傷を、以下の基準で評価した。
A :注意深く見ても、全く傷が見えない。
B :注意深く見ると、僅かに傷が見える。
C :弱い傷が見える。
D :一目見ただけで分かる傷がある。
[Abrasion resistance evaluation]
Using a rubbing tester, the rubbing resistance was evaluated by performing a rubbing test under the following conditions.
Evaluation environmental conditions: 25 ° C., 60% RH
Rubbing material: Steel wool (manufactured by Nippon Steel Wool Co., Ltd., Grade No. 0000)
Wrap around the tip (1cm x 1cm) of the scraper of the tester that comes into contact with the sample, and fix the band.
Travel distance (one way): 3cm
Rubbing speed: 3cm / second,
Load: 200 g / cm 2 ,
Tip contact area: 1 cm × 1 cm,
Number of rubs: 10 round trips.
An oil-based black ink was applied to the back side of the antireflection film sample that had been rubbed, and visually observed with reflected light, and scratches on the rubbed portion were evaluated according to the following criteria.
A: Even if you look carefully, no scratches are visible.
B: Slight scratches can be seen when looking carefully.
C: A weak wound is visible.
D: There is a scratch that can be seen at first glance.

作製した処理基材の一覧と、パターンを形成していない撥水性領域での静的接触角測定結果、耐摩擦性評価を表2に示す。   Table 2 shows a list of the prepared treatment base materials, static contact angle measurement results in a water-repellent region where no pattern is formed, and friction resistance evaluation.

前記処理基材に、顔料を分散させたアルカリ性インク水溶液(pH10.8)をスプレーコートした後、室温で送風乾燥させ、さらに90℃オーブン中で加熱硬化させて、部材を作製した。また比較対照用の部材として、前記処理基材にカーボンブラックを分散させた中性インク水溶液(pH8.0)をスプレーコートした後、室温で送風乾燥させ、さらに90℃オーブン中で加熱硬化させて、部材を作製した。   After spray-coating an alkaline ink aqueous solution (pH 10.8) in which the pigment was dispersed on the treated substrate, the substrate was blown and dried at room temperature, and further heated and cured in a 90 ° C. oven to prepare a member. Also, as a comparative member, after spray-coating a neutral ink aqueous solution (pH 8.0) in which carbon black is dispersed on the treated substrate, it is blown and dried at room temperature, and further heated and cured in a 90 ° C. oven. A member was produced.

[境界部コントラスト評価]
インクが付着した領域と付着していない領域の境界を光学顕微鏡で目視観察し、境界部コントラストを以下のように評価した。結果を表2に示す。
A:比較対照部材と同レベルの境界直線性を有し、撥水領域へのインク付着は観察されなかった。
B:比較対照部材と同レベルの境界直線性を有しているが、撥水領域へのインク付着が僅かに観察された。
C:比較対照部材に対し明らかに境界直線性が乱れており、撥水領域へのインク付着が観察された。
[Boundary contrast evaluation]
The boundary between the area where the ink adhered and the area where the ink did not adhere was visually observed with an optical microscope, and the boundary contrast was evaluated as follows. The results are shown in Table 2.
A: The boundary linearity was at the same level as that of the comparative control member, and ink adhesion to the water repellent area was not observed.
B: Although the boundary linearity was the same level as that of the comparative control member, ink adhesion to the water-repellent area was slightly observed.
C: The boundary linearity was clearly disturbed with respect to the comparative member, and ink adhesion to the water-repellent region was observed.

[比較例3]処理基材及び部材の作製、及び評価
(比較例3−1〜3−4)
比較例1−1〜1−2、及び比較例2−1〜2−2で調製した処理剤を用いた以外は、実施例2と同様に処理基材及び部材を作製し、評価した。結果を表2に示す。
[Comparative Example 3] Preparation and evaluation of treated substrate and member (Comparative Examples 3-1 to 3-4)
Except having used the processing agent prepared by Comparative Examples 1-1 to 1-2 and Comparative Examples 2-1 to 2-2, the processing base material and member were produced and evaluated similarly to Example 2. The results are shown in Table 2.

Figure 2013209636
Figure 2013209636

[実施例3]処理基材及び部材の作製、及び評価
(実施例3−1〜3−4)
5cm角のガラス基材を水酸化カリウム水溶液に1時間浸漬した後、純水で十分に洗浄してから、90℃オーブン中で加熱乾燥した。
実施例1−10〜1−13で調製した撥液性処理剤を、前記のガラス基材にスピンコート(3000rpm、20秒)した後、室温で送風乾燥させ、さらに80℃オーブン中で3分間加熱乾燥して、塗膜を作製した。
前記塗膜に、空気雰囲気下、線幅100μm、間隔100μmパターンを形成するフォトマスク上から、高圧水銀灯i線(365nm)を300mJ/cm(照度30mW/cm)露光を行い、次いで80℃オーブン中で3分間加熱処理した。このガラス基材を2−ブタノン及びエタノールで洗浄した後、送風乾燥したものを処理基材とした。
作製した処理基材について、実施例2と同様に撥水性領域での静的接触角、及び耐摩擦性を評価した。
作製した処理基材の一覧、パターンを形成していない撥水性領域での静的接触角測定結果、及び耐摩擦性の評価結果を表3に示す。
[Example 3] Preparation and evaluation of treated substrate and member (Examples 3-1 to 3-4)
After immersing a 5 cm square glass substrate in an aqueous potassium hydroxide solution for 1 hour, the glass substrate was thoroughly washed with pure water and then dried by heating in a 90 ° C. oven.
The liquid repellent treatment agent prepared in Examples 1-10 to 1-13 was spin-coated on the glass substrate (3000 rpm, 20 seconds), then air-dried at room temperature, and further in an 80 ° C. oven for 3 minutes. A coating film was prepared by heating and drying.
The coating film is exposed to 300 mJ / cm 2 (illuminance 30 mW / cm 2 ) with a high-pressure mercury lamp i-line (365 nm) from a photomask that forms a pattern with a line width of 100 μm and a spacing of 100 μm in an air atmosphere, and then 80 ° C. Heat-treated in an oven for 3 minutes. This glass substrate was washed with 2-butanone and ethanol and then blown and dried to obtain a treated substrate.
About the produced process base material, the static contact angle in a water-repellent area | region and friction resistance were evaluated similarly to Example 2. FIG.
Table 3 shows a list of the prepared processing base materials, a static contact angle measurement result in a water-repellent region where no pattern is formed, and an evaluation result of friction resistance.

表3に記載の処理基材に、有機溶剤を含有する液晶ディスプレイ・カラーフィルター用着色インク剤をスプレーコートした後、室温で送風乾燥させ、さらに120℃オーブン中で加熱乾燥させて、部材を作製した。   After spray-coating a colored ink for liquid crystal display and color filter containing an organic solvent on the treatment substrate shown in Table 3, it is blown and dried at room temperature and further heated and dried in an oven at 120 ° C. to produce a member. did.

[境界部コントラスト評価]
部材表面の着色インク剤が付着した領域と付着していない領域の境界を光学顕微鏡で目視観察し、コントラストを以下のように評価した。結果を表3に示す。
A:撥水性領域に着色インク剤硬化物が付着した箇所が観察されなかった。
B:撥水性領域に着色インク剤硬化物が付着した箇所が多く観察された。
[Boundary contrast evaluation]
The boundary between the area where the colored ink agent adhered and the area where the colored ink agent did not adhere on the surface of the member was visually observed with an optical microscope, and the contrast was evaluated as follows. The results are shown in Table 3.
A: The location where the colored ink agent cured material adhered to the water-repellent region was not observed.
B: Many locations where the colored ink agent cured product adhered to the water-repellent region were observed.

[比較例4]処理基材及び部材の作製、及び評価
(比較例4−1、4−2)
比較例1−3〜1−4で調製した処理剤を用いた以外は、実施例3と同様に処理基材及び部材を作製し、評価した。結果を表3に示す。
[Comparative Example 4] Preparation and evaluation of treated substrate and member (Comparative Examples 4-1 and 4-2)
Except having used the processing agent prepared by Comparative Examples 1-3 to 1-4, the process base material and the member were produced similarly to Example 3, and were evaluated. The results are shown in Table 3.

Figure 2013209636
Figure 2013209636

[実施例4]撥液性処理剤の調製
(実施例4−1〜4−3)
サンプル瓶に、一般式(1)で表される含フッ素化合物、一般式(12)又は(13)で表される含フッ素化合物、一般式(16)で表される非フッ素化合物、光カチオン重合開始剤(WPAG−336、和光純薬工業(株)社製)の10%2−ブタノン溶液0.24g、を取り、十分に攪拌させ均一な溶液とした。
[Example 4] Preparation of liquid repellent treatment agent (Examples 4-1 to 4-3)
In a sample bottle, a fluorine-containing compound represented by the general formula (1), a fluorine-containing compound represented by the general formula (12) or (13), a non-fluorine compound represented by the general formula (16), photocationic polymerization A 10% 2-butanone solution 0.24 g of an initiator (WPAG-336, manufactured by Wako Pure Chemical Industries, Ltd.) was taken and sufficiently stirred to obtain a uniform solution.

[比較例5]処理剤の調製
一般式(12)又は(13)で表される含フッ素化合物、一般式(16)で表される非フッ素化合物を用いなかったこと以外は、実施例4と同様に処理液を調製した。
[Comparative Example 5] Preparation of treatment agent Except that the fluorine-containing compound represented by the general formula (12) or (13) and the non-fluorine compound represented by the general formula (16) were not used, Example 4 and Similarly, a treatment solution was prepared.

[比較例6]比較処理剤の調製
サンプル瓶に、両末端にエポキシ基を有するポリジメチルシロキサン(X−22−163c、信越化学工業(株)社製、分子量5,400)10.0g、光カチオン重合開始剤(IRGACURE250、BASFジャパン(株)社製)0.60g、光増感剤(DETX−S、日本化薬(株)社製)0.30gを取り、十分に攪拌させ均一な溶液とした。
[Comparative Example 6] Preparation of Comparative Treatment Agent In a sample bottle, 10.0 g of polydimethylsiloxane having an epoxy group at both ends (X-22-163c, manufactured by Shin-Etsu Chemical Co., Ltd., molecular weight 5,400), light Take 0.60 g of cationic polymerization initiator (IRGACURE250, manufactured by BASF Japan Ltd.) and 0.30 g of photosensitizer (DETX-S, manufactured by Nippon Kayaku Co., Ltd.) and stir well to obtain a uniform solution. It was.

[実施例5]処理基材及び部材の作製、及び評価
(実施例5−1〜5−3)
5cm角のガラス基材に、実施例4で調製した撥液性処理剤をバーコーターNo.5(11.45μm)で塗布した後、80℃オーブン中で3分間加熱乾燥させて、塗膜を形成した。
前記塗膜表面に、空気雰囲気下、線幅100μm、線長200μm、間隔50μmの細孔パターンを縦1.5cm、横1.5cmの正方形内に形成するフォトマスク上から、高圧水銀灯i線(365nm)を800mJ/cm(照度50mW/cm)露光を行い、さらに80℃オーブン中で3分間加熱処理した。このガラス基材を2−ブタノン及びエタノールで洗浄した後、送風乾燥したものを処理基材とした。以下、ここで作成した撥水性領域の無い細孔を、画素と呼称する。ここで形成した画素の容積は、計算上、0.229μLとなる。
前記で作製した処理基材の画素に、有機溶剤を含有する液晶ディスプレイ・カラーフィルター用着色インク剤(緑色及び赤色、蒸発残分濃度70重量%)0.20μLを、インクジェット法により、緑色画素と赤色画素を交互に形成するように付与した。室温で送風乾燥させ、次いで120℃オーブン中で加熱乾燥させて、部材を作製した。部材表面を光学顕微鏡で目視観察し、隣接する画素間でインク剤が混ざり画素色が変化する現象(以下、混色と呼称する。)を以下のように評価した。結果を表4に示す。
A:混色した画素の割合が5%未満。
B:混色した画素の割合が5%以上。
[Example 5] Preparation and evaluation of treated substrate and member (Examples 5-1 to 5-3)
The liquid repellent treatment agent prepared in Example 4 was applied to a bar coater No. 5 on a 5 cm square glass substrate. 5 (11.45 μm), and then dried by heating in an 80 ° C. oven for 3 minutes to form a coating film.
A high pressure mercury lamp i-line (on a photomask in which a pore pattern having a line width of 100 μm, a line length of 200 μm, and an interval of 50 μm is formed in a square of 1.5 cm in length and 1.5 cm in width on the surface of the coating film in an air atmosphere ( (365 nm) was exposed to 800 mJ / cm 2 (illuminance 50 mW / cm 2 ), and further heat-treated in an 80 ° C. oven for 3 minutes. This glass substrate was washed with 2-butanone and ethanol and then blown and dried to obtain a treated substrate. Hereinafter, the pores having no water-repellent region created here are referred to as pixels. The volume of the pixel formed here is 0.229 μL in calculation.
0.20 μL of a color ink for liquid crystal display and color filter (green and red, 70% by weight of evaporation residue) containing an organic solvent is added to the pixel of the treated substrate prepared above by an inkjet method. Red pixels were provided so as to be alternately formed. The member was produced by air drying at room temperature and then heat drying in a 120 ° C. oven. The surface of the member was visually observed with an optical microscope, and the phenomenon in which the ink agent was mixed between adjacent pixels and the pixel color changed (hereinafter referred to as color mixing) was evaluated as follows. The results are shown in Table 4.
A: The ratio of mixed pixels is less than 5%.
B: The ratio of mixed pixels is 5% or more.

[比較例7]処理基材の作製
(比較例7−1及び7−2)
比較例5及び比較例6で調製した処理剤を用いた以外は、実施例5と同様に処理基材及び部材を作製し、評価した。結果を表4に示す。
[Comparative Example 7] Preparation of treated substrate (Comparative Examples 7-1 and 7-2)
Except having used the processing agent prepared by the comparative example 5 and the comparative example 6, the process base material and the member were produced similarly to Example 5, and were evaluated. The results are shown in Table 4.

Figure 2013209636
Figure 2013209636

1 基材
2 親水性の表面
3 本発明の撥液性処理剤を含む塗膜
4 撥液性の膜
5 フォトマスク
6 光
7 親水性領域
8 撥水性領域
9 処理基材
10 インクジェット装置
11 機能性材料を含む液
12 機能性材料
13 機能性材料のパターンが形成された部材
DESCRIPTION OF SYMBOLS 1 Substrate 2 Hydrophilic surface 3 Coating film containing liquid repellent treatment agent of the present invention 4 Liquid repellent film 5 Photomask 6 Light 7 Hydrophilic region 8 Water repellent region 9 Treated substrate 10 Inkjet device 11 Functionality Liquid containing material 12 Functional material 13 Member in which pattern of functional material is formed

Claims (13)

下記一般式(1)で表される含フッ素化合物と、下記一般式(12)又は(13)で表される含フッ素化合物とを含有する撥液性処理剤。
Figure 2013209636

一般式(1)中、aは3〜8の整数を表し、bは0〜3の整数を表し、cは0〜10の整数を表し、d及びeはそれぞれ独立に0又は1を表し、rは0又は1を表し、Yは下記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記一般式(6)又は(7)で表される基を表し、L及びLは、それぞれ独立に、下記一般式(8)、(9)、(10)又は(11)で表される基を表し、Rfは(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)中、mは0〜10の整数を表す。
一般式(8)、(9)、(10)、(11)中、nは0〜10の整数を表す。
一般式(7)中、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
Figure 2013209636

一般式(12)中、fは1〜5の整数を表し、gは0又は1を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは前記一般式(6)若しくは(7)、又は下記一般式(14)若しくは(15)で表される基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
一般式(13)中、h及びiはそれぞれ独立に1〜5の整数を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lはそれぞれ独立に前記一般式(6)若しくは(7)、又は下記一般式(14)若しくは(15)で表される基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の2価のパーフルオロアルキル基を表す。
Figure 2013209636

一般式(14)中、mは0〜10の整数を表す。
一般式(15)中、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
A liquid repellent treatment agent comprising a fluorine-containing compound represented by the following general formula (1) and a fluorine-containing compound represented by the following general formula (12) or (13).
Figure 2013209636

In general formula (1), a represents an integer of 3 to 8, b represents an integer of 0 to 3, c represents an integer of 0 to 10, d and e each independently represents 0 or 1, r represents 0 or 1, Y represents a group represented by the following general formula (2), (3), (4) or (5), an allyl group, or a vinyl group, and L 1 represents the following general formula ( 6) or a group represented by (7), L 2 and L 3 each independently represent a group represented by the following general formula (8), (9), (10) or (11) , Rf 1 represents a (a + b) -valent, may contain an etheric oxygen atom, a linear, branched or cyclic saturated perfluoroalkyl group having 3 to 20 carbon atoms, Rf 2 is etheric oxygen atoms may contain, represents a monovalent perfluoroalkyl group or a fluorine atom, linear or branched C1-5, Rf 3 is It may contain ether oxygen atoms, a straight, branched or cyclic, monovalent perfluoroalkyl group of 3 to 100 carbon atoms.
Figure 2013209636

In general formula (2), X represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a trifluoromethyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6) and (7), m represents an integer of 0 to 10.
In general formula (8), (9), (10), (11), n represents the integer of 0-10.
In the general formula (7), Y represents a group represented by the general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.
Figure 2013209636

In general formula (12), f represents an integer of 1 to 5, g represents 0 or 1, and Y represents a group represented by the general formula (2), (3), (4) or (5). , An allyl group, or a vinyl group, L 4 represents a group represented by the general formula (6) or (7), or the following general formula (14) or (15), and Rf 4 represents an etheric oxygen A linear, branched or cyclic monovalent perfluoroalkyl group having 1 to 100 carbon atoms which may contain an atom is represented.
In general formula (13), h and i each independently represent an integer of 1 to 5, Y is a group represented by general formula (2), (3), (4) or (5), or an allyl group. Or L 4 represents a group represented by the general formula (6) or (7) or the following general formula (14) or (15), and Rf 5 represents an etheric oxygen. A linear, branched or cyclic divalent perfluoroalkyl group having 1 to 100 carbon atoms which may contain an atom is represented.
Figure 2013209636

In general formula (14), m represents an integer of 0 to 10.
In the general formula (15), Y represents a group represented by the general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.
前記一般式(1)で表される含フッ素化合物の含有比率が5質量%以上90質量%以下であり、かつ前記一般式(12)又は(13)で表される含フッ素化合物の含有比率が10質量%以上95質量%である、請求項1に記載の撥液性処理剤。   The content ratio of the fluorine-containing compound represented by the general formula (1) is 5% by mass or more and 90% by mass or less, and the content ratio of the fluorine-containing compound represented by the general formula (12) or (13) is The liquid repellent treatment agent according to claim 1, which is 10% by mass or more and 95% by mass. 一般式(12)又は(13)で表される含フッ素化合物のフッ素原子含率が30質量%以上75質量%以下である、請求項1又は2に記載の撥液性処理剤。   The liquid repellent treatment agent according to claim 1 or 2, wherein a fluorine atom content of the fluorine-containing compound represented by the general formula (12) or (13) is 30% by mass or more and 75% by mass or less. さらに下記一般式(16)で表される非フッ素化合物を含有する請求項1〜3のいずれか1項に記載の撥液性処理剤。
Figure 2013209636

一般式(16)中、jは1〜6の整数を表し、Yは下記一般式(21)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記一般式(6)、(7)、(14)又は(15)で表される基を表し、Rは、水素原子、又は、置換基を有してもよい炭素数1〜20の直鎖状、分枝状又は環状のj価の有機基を表す。
Figure 2013209636

一般式(21)中、Xは水素原子、塩素原子、メチル基、又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)、(14)中、mは0〜10の整数を表す。
一般式(7)、(15)中、Yは前記一般式(21)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
Furthermore, the liquid-repellent processing agent of any one of Claims 1-3 containing the non-fluorine compound represented by following General formula (16).
Figure 2013209636

In general formula (16), j represents an integer of 1 to 6, and Y represents a group represented by the following general formula (21), (3), (4) or (5), an allyl group, or a vinyl group. L 5 represents a group represented by the following general formula (6), (7), (14) or (15), and R 7 is a hydrogen atom or a carbon number which may have a substituent. 1-20 linear, branched or cyclic j-valent organic groups are represented.
Figure 2013209636

In General Formula (21), X 1 represents a hydrogen atom, a chlorine atom, a methyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6), (7), and (14), m represents an integer of 0 to 10.
In the general formulas (7) and (15), Y represents a group represented by the general formula (21), (3), (4) or (5), an allyl group, or a vinyl group.
一般式(1)中の(a+b)が3〜8の整数である請求項1〜4のいずれか1項に記載の撥液性処理剤。   (A + b) in General formula (1) is an integer of 3-8, The liquid-repellent processing agent of any one of Claims 1-4. 一般式(1)中のd及びeが1である請求項1〜5のいずれか1項に記載の撥液性処理剤。   D and e in General formula (1) are 1, The liquid-repellent processing agent of any one of Claims 1-5. 前記一般式(1)で表される含フッ素化合物が下記一般式(17)で表される含フッ素化合物であり、且つ前記一般式(12)又は(13)で表される含フッ素化合物が下記一般式(18)又は(19)で表される含フッ素化合物である請求項1〜6のいずれか1項に記載の撥液性処理剤。
Figure 2013209636

一般式(17)中、aは3〜8の整数を表し、bは0〜3の整数を表し、cは0〜10の整数を表し、Yは下記式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Lは下記式(6)又は(7)で表される基を表し、Rfは(a+b)価の、エーテル性酸素原子を含んでもよい、炭素数3〜20の直鎖状、分枝状又は環状の飽和パーフルオロアルキル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜5の直鎖状又は分枝状の1価のパーフルオロアルキル基又はフッ素原子を表し、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数3〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
Figure 2013209636

一般式(2)中、Xは水素原子、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又は水酸基を表す。
一般式(3)、(4)、(5)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子、又は、置換基を有してもよい炭素数1〜5の直鎖状又は分枝状の1価のアルキル基を表す。
一般式(5)中、kは1又は2を表す。
一般式(6)、(7)中、mは0〜10の整数を表す。
一般式(8)、(9)、(10)、(11)中、nは0〜10の整数を表す。
一般式(7)中、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表す。
Figure 2013209636

一般式(18)中、fは1〜5の整数を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Rfは、少なくとも1つのトリフルオロメチル基を有する、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状、分枝状又は環状の1価のパーフルオロアルキル基を表す。
一般式(19)中、h及びiはそれぞれ独立に1〜5の整数を表し、Yは前記一般式(2)、(3)、(4)若しくは(5)で表される基、アリル基、又はビニル基を表し、Rfは、エーテル性酸素原子を含んでもよい、炭素数1〜100の直鎖状又は分枝状の2価のパーフルオロアルキル基を表す。
The fluorine-containing compound represented by the general formula (1) is a fluorine-containing compound represented by the following general formula (17), and the fluorine-containing compound represented by the general formula (12) or (13) is The liquid repellent treatment agent according to any one of claims 1 to 6, which is a fluorine-containing compound represented by the general formula (18) or (19).
Figure 2013209636

In general formula (17), a represents an integer of 3 to 8, b represents an integer of 0 to 3, c represents an integer of 0 to 10, Y represents the following formulas (2), (3), ( 4) or a group represented by (5), an allyl group, or a vinyl group, L 1 represents a group represented by the following formula (6) or (7), and Rf 1 is an (a + b) -valent group. may contain an etheric oxygen atom, a linear, branched or cyclic saturated perfluoroalkyl group having 3 to 20 carbon atoms, Rf 2 may contain an etheric oxygen atom, 1 to carbon atoms 5 represents a linear or branched monovalent perfluoroalkyl group or a fluorine atom, and Rf 6 may contain an etheric oxygen atom having at least one trifluoromethyl group, having 3 to 3 carbon atoms 100 linear, branched or cyclic monovalent perfluoroalkyl groups are represented.
Figure 2013209636

In general formula (2), X represents a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group, a trifluoromethyl group, or a hydroxyl group.
In general formulas (3), (4) and (5), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 may each independently have a hydrogen atom or a substituent. It represents a good linear or branched monovalent alkyl group having 1 to 5 carbon atoms.
In general formula (5), k represents 1 or 2.
In general formulas (6) and (7), m represents an integer of 0 to 10.
In general formula (8), (9), (10), (11), n represents the integer of 0-10.
In the general formula (7), Y represents a group represented by the general formula (2), (3), (4) or (5), an allyl group, or a vinyl group.
Figure 2013209636

In general formula (18), f represents an integer of 1 to 5, and Y represents a group represented by the general formula (2), (3), (4) or (5), an allyl group, or a vinyl group. Rf 7 represents a linear, branched or cyclic monovalent perfluoroalkyl group having 1 to 100 carbon atoms, which may contain an etheric oxygen atom, and has at least one trifluoromethyl group. .
In general formula (19), h and i each independently represent an integer of 1 to 5, Y is a group represented by the general formula (2), (3), (4) or (5), or an allyl group Or Rf 8 represents a linear or branched divalent perfluoroalkyl group having 1 to 100 carbon atoms, which may contain an etheric oxygen atom.
一般式(1)中のRfが下記f−1〜f−14から選ばれる基である請求項1〜7のいずれか1項に記載の撥液性処理剤。
Figure 2013209636

式中、*はY−L−O−CH−(CF−[CF(Rf)]−(O)−L−又はRf―(O)−L−と結合する位置を表す。
The liquid repellent treatment agent according to any one of claims 1 to 7, wherein Rf1 in the general formula (1) is a group selected from the following f- 1 to f-14.
Figure 2013209636

Wherein * Y-L 1 -O-CH 2 - (CF 2) c - [CF (Rf 2)] r - (O) d -L 2 - or Rf 3 - (O) e -L 3 - Represents the position to be combined.
請求項1〜8のいずれか1項に記載の撥液性処理剤を硬化させた撥液性膜。   A liquid repellent film obtained by curing the liquid repellent treatment agent according to claim 1. 基材の表面に撥水性領域と親水性領域とを有する部材であって、前記撥水性領域は請求項1〜8のいずれか1項に記載の撥液性処理剤を硬化させた撥液性膜からなる部材。   A member having a water-repellent region and a hydrophilic region on the surface of a substrate, wherein the water-repellent region is a liquid-repellent material obtained by curing the liquid-repellent treatment agent according to any one of claims 1 to 8. A member made of a film. 前記撥水性領域と前記親水性領域がパターンを形成している請求項10に記載の部材。   The member according to claim 10, wherein the water-repellent region and the hydrophilic region form a pattern. 親水性表面を有する基材の表面に請求項1〜8のいずれか1項に記載の撥液性処理剤を含む塗膜を形成する工程、次いで該塗膜の一部に光を照射して撥液性処理剤を含む塗膜を硬化させる工程、次いで基材表面の未硬化の撥液性処理剤を除去して親水性表面を露出させる工程を含む、請求項10又は11に記載の部材の製造方法。   The process of forming the coating film containing the liquid-repellent processing agent of any one of Claims 1-8 on the surface of the base material which has a hydrophilic surface, Then, light is irradiated to a part of this coating film. The member according to claim 10 or 11, comprising a step of curing a coating film containing a liquid repellent treatment agent, and then a step of removing the uncured liquid repellent treatment agent on the substrate surface to expose a hydrophilic surface. Manufacturing method. 請求項10若しくは11に記載の部材、又は請求項12に記載の製造方法により製造された部材の親水性領域に、機能性材料を含む液体を塗布する工程、次いで該液体を塗布した部材を乾燥させる工程を含む、機能性材料のパターンが形成された部材の製造方法。   The step of applying a liquid containing a functional material to the hydrophilic region of the member according to claim 10 or 11, or the member manufactured by the manufacturing method according to claim 12, and then drying the member to which the liquid is applied The manufacturing method of the member in which the pattern of the functional material was formed including the process to make.
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