JP2013201231A5 - - Google Patents
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- JP2013201231A5 JP2013201231A5 JP2012068031A JP2012068031A JP2013201231A5 JP 2013201231 A5 JP2013201231 A5 JP 2013201231A5 JP 2012068031 A JP2012068031 A JP 2012068031A JP 2012068031 A JP2012068031 A JP 2012068031A JP 2013201231 A5 JP2013201231 A5 JP 2013201231A5
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- JP
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- Prior art keywords
- magnetic sensing
- hall
- control current
- impurity region
- voltage output
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- 239000012535 impurity Substances 0.000 claims description 14
- 125000004429 atoms Chemical group 0.000 claims description 6
- 238000009987 spinning Methods 0.000 claims description 2
- 230000002093 peripheral Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Description
図1は本発明のホール素子の構成を示した図である。本発明のホール素子は1辺が50〜150umの正方形のN型不純物領域121の磁気感受部及びその各頂点にN型高濃度不純物領域の制御電流入力端子及びホール電圧出力端子11,12,13,14を有する。磁気感受部のN型不純物領域は深さ500〜800nmの間に、不純物濃度は1×1016(atoms/cm3)≦N≦5×1016(atoms/cm3)の間となるピークを有している。制御電流入力端子及びホール電圧出力端子となる高濃度N型不純物領域の深さは300nm程度にすることが好ましい。つまり、磁気感受部は深くし,制御電流入力端子及びホール電圧出力端子は、ホール磁気感受部より浅い位置に配置する。
FIG. 1 is a diagram showing the configuration of the Hall element of the present invention. The Hall element of the present invention has a magnetic sensing portion of a square N-type impurity region 121 having a side of 50 to 150 μm and a control current input terminal and Hall voltage output terminals 11, 12, 13 of the N-type high concentration impurity region at each apex thereof. , 14. N-type impurity region of the magnetic sensing portion between the depth 500 to 800 nm, the peak is between the impurity concentration of 1 × 10 16 (atoms / cm 3) ≦ N ≦ 5 × 10 16 (atoms / cm 3) Have . The depth of the high-concentration N-type impurity region serving as the control current input terminal and the Hall voltage output terminal is preferably about 300 nm. That is, the magnetic sensing part is deepened, and the control current input terminal and the Hall voltage output terminal are arranged at a position shallower than the Hall magnetic sensing part.
さらに、実施例として正方形の磁気感受部及びその各頂点に制御電流入力端子とホール電圧出力端子を有し、N型不純物領域は深さ500〜800nm、濃度1×1016(atoms/cm3)≦N≦5×1016(atoms/cm3)の範囲にピークを有するとして、制御電流入力端子とホール電圧出力端子を浅く配置したホール素子形状を例にとったがこの素子形状は正方形に限らない。N型不純物領域の深さ500〜800nmにピークを持つ磁気感受部及びその各頂点にN型高濃度不純物領域の制御電流入力端子及びホール電圧出力端子を有する、スピニングカレントによるオフセット電圧を消去できる形状の対称型ホール素子であればよい。例えば、N型不純物領域の深さ500〜800nmにピークを持つ45°傾けた十字型のホール素子磁気感受部とその各端部にN型不純物領域よりも浅いホール電流制御電極及びホール電圧出力端子を配置した形状など正方形状以外のでも同様の効果が得られる。
Further, as an embodiment, a square magnetic sensing portion and a control current input terminal and a Hall voltage output terminal at each apex thereof, the N-type impurity region has a depth of 500 to 800 nm, and a concentration of 1 × 10 16 (atoms / cm 3 ). Assuming that there is a peak in the range of ≦ N ≦ 5 × 10 16 (atoms / cm 3 ) , the Hall element shape in which the control current input terminal and the Hall voltage output terminal are arranged shallowly is taken as an example, but this element shape is limited to a square. Absent. A shape having a magnetic sensing portion having a peak at a depth of 500 to 800 nm of the N-type impurity region, and a control current input terminal and a Hall voltage output terminal of the N-type high-concentration impurity region at each vertex thereof, and a shape capable of erasing offset voltage due to spinning current Any symmetrical Hall element may be used. For example, an N-type impurity region having a peak at a depth of 500 to 800 nm and a 45 ° tilted cross-shaped Hall element magnetic sensing portion, and a hole current control electrode and a hall voltage output terminal shallower than the N-type impurity region at each end thereof The same effect can be obtained even when the shape is other than the square shape such as the shape in which is arranged.
Claims (4)
P型基板である前記磁気感受部の周辺部と
前記磁気感受部と前記周辺部とが形成する接合部と
前記磁気感受部に配置された制御電流入力端子及びホール電圧出力端子と
を有するホール素子を備えたホールセンサであって、
前記制御電流入力端子及び前記ホール電圧出力端子は、前記磁気感受部の底より浅い位置に配置されており、
前記N型不純物領域は前記制御電流入力端子及びホール電圧出力端子の底よりも深いところに濃度のピークを有しており、
前記ホール素子中を流れる制御電流は、前記接合部及び前記磁気感受部の表面から離れて、前記磁気感受部の内部を流れることを特徴とするホールセンサ。 A magnetic sensing portion that is an N-type impurity region; a peripheral portion of the magnetic sensing portion that is a P-type substrate; a junction formed by the magnetic sensing portion and the peripheral portion; and a control current input terminal disposed in the magnetic sensing portion And a Hall sensor having a Hall element having a Hall voltage output terminal,
The control current input terminal and the Hall voltage output terminal are arranged at a position shallower than the bottom of the magnetic sensing part,
The N-type impurity region has a concentration peak deeper than the bottoms of the control current input terminal and the Hall voltage output terminal,
A hall sensor characterized in that a control current flowing in the hall element flows inside the magnetic sensing part away from the surface of the joint and the magnetic sensing part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012068031A JP6043076B2 (en) | 2012-03-23 | 2012-03-23 | Hall sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012068031A JP6043076B2 (en) | 2012-03-23 | 2012-03-23 | Hall sensor |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013201231A JP2013201231A (en) | 2013-10-03 |
JP2013201231A5 true JP2013201231A5 (en) | 2015-02-26 |
JP6043076B2 JP6043076B2 (en) | 2016-12-14 |
Family
ID=49521249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012068031A Expired - Fee Related JP6043076B2 (en) | 2012-03-23 | 2012-03-23 | Hall sensor |
Country Status (1)
Country | Link |
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JP (1) | JP6043076B2 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6327076A (en) * | 1986-07-18 | 1988-02-04 | Sanyo Electric Co Ltd | Hall element |
JPH0697530A (en) * | 1992-09-16 | 1994-04-08 | Toshiba Corp | Gaas hall element |
JP2005333103A (en) * | 2004-03-30 | 2005-12-02 | Denso Corp | Vertical hall device and manufacturing method of the same |
JP4613661B2 (en) * | 2005-03-29 | 2011-01-19 | ヤマハ株式会社 | Manufacturing method of 3-axis magnetic sensor |
US8085035B2 (en) * | 2006-04-03 | 2011-12-27 | Asahi Kasei Emd Corporation | Hall element and magnetic sensor |
JP5815986B2 (en) * | 2010-07-05 | 2015-11-17 | セイコーインスツル株式会社 | Hall sensor |
JP2012212700A (en) * | 2011-03-30 | 2012-11-01 | Asahi Kasei Electronics Co Ltd | Hall element and semiconductor device with hall element |
-
2012
- 2012-03-23 JP JP2012068031A patent/JP6043076B2/en not_active Expired - Fee Related
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