JP2013197000A - Organic el device and electronic apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an organic EL device with a long lifetime.SOLUTION: A pixel 71 of an organic EL device 11 includes a first sub pixel and further includes a first element region 41B and a second element region 41G. In the first element region 41B, a first light-emitting layer 63B is formed, and in the second element region 41G, a second light-emitting layer 63G is formed. The first sub pixel includes a first electrode formed across the first element region 41B and the second element region 41G, and a first color filter through which a first color is translucent is disposed to be overlapped with the first sub pixel in a plane view. Since display of the first color in the second element region is added to display of the first color in the first element region, light-emitting luminance of the first light-emitting layer 63B can be reduced. Therefore, a lifetime of the first light-emitting layer 63B is prolonged. Thus, the organic EL device 11 which indicates a high display definition and has a product lifetime of a practical level can be manufactured easily.

Description

  The present invention relates to an organic EL device and an electronic apparatus.

  An organic electroluminescence (organic EL) device has a structure in which a light emitting functional layer is sandwiched between an anode and a cathode. Examples of the light emitting functional layer include a structure in which a hole injection layer, a hole transport layer, a light emitting layer, and an electron transport layer are stacked in this order from the anode side. Then, by applying a voltage between the anode and the cathode, holes are injected from the hole transport layer and electrons are injected from the electron transport layer into the light emitting layer, and light is emitted by recombination thereof.

  In such an organic EL device, in order to realize color display, a red light emitting layer (red light emitting layer), a green light emitting layer (green light emitting layer), and a blue light emitting layer (blue light emitting layer) are formed by mask vapor deposition or Each subpixel is formed and divided using an inkjet method or the like. That is, the red subpixel, the green subpixel, and the blue subpixel constitute one pixel, and a plurality of such pixels are arranged in a matrix to display a color. Nowadays, the lifespan of the red light emitting layer and the green light emitting layer is about a practical level of about 100,000 hours. On the other hand, it is difficult to say that the blue light emitting layer has reached a practical level, and the lifetime of the blue light emitting layer is actually limited to about 5,000 hours.

  Therefore, conventionally, as described in Patent Documents 1 and 2, the light emitting area of the blue light emitting layer is larger than the light emitting areas of the red light emitting layer and the green light emitting layer. This is because if the light emitting area is widened, the light emission luminance can be lowered, and if the light emission luminance is low, the life of the light emitting layer is extended. Thereby, the lifetime of the blue light emitting layer was extended, and the product lifetime required for the organic EL device was satisfied.

JP 2004-103519 A JP 2010-118273 A

  However, the conventional organic EL device has a problem that it is difficult to manufacture efficiently and a problem that it is difficult to achieve high resolution that provides excellent display image quality. In order to make the light emitting layer of each color separately for each subpixel, it is advantageous to adopt a coating method that has high patternability, is easy to increase in area, and has high material use efficiency. As a coating method, an ink jet method is widely adopted. Specifically, in the ink jet method, an ink composition including a hole injection layer and a light emitting material is ejected from an ink jet head to a predetermined subpixel, and the ejected ink composition is dried to form a light emitting functional layer. ing. However, if the area differs depending on the subpixel for each color, the ejection amount of the ink composition differs depending on the subpixel. For this reason, process conditions such as drying conditions could not be optimized for all colors. For example, if the drying conditions are determined according to the blue light emitting layer having a large light emitting area and a large discharge amount, the red light emitting layer having a small light emitting area and a small discharge amount is dried too much (causes thermal deterioration). It was. In addition, when the resolution is increased, the small area sub-pixel (for example, the red sub-pixel and the green sub-pixel) is small, so that it is difficult to accurately apply the ink composition. Could not proceed. In other words, conventionally, there has been a problem that it is difficult to realize an organic EL device that exhibits high display quality and has a practical product life in a highly efficient manufacturing process.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples. In the following embodiments or application examples, “up” indicates the direction in which the light emitting elements are arranged when viewed from the substrate. For example, when “on the substrate” is described, the “on” substrate is arranged so as to be in contact with the substrate. Or when placed on the substrate via other components, or when placed partially on the substrate and partially placed via other components, It shall represent.

Application Example 1 An organic EL device according to this application example includes a pixel, the pixel includes a first sub-pixel and includes a first element region and a second element region. A first light emitting layer that mainly emits light of one color is formed, a second light emitting layer that mainly emits light of a second color is formed in the second element region, and the first subpixel includes a first element region and A first color filter having a first first electrode formed across the second element region and mainly transmitting the first color is disposed so as to overlap the first sub-pixel in a plan view. It is characterized by being.
According to this configuration, the display of the first color in the second element region can be added to the display of the first color in the first element region. Thereby, the light emission luminance in the first light emitting layer can be lowered, and thus the life of the first light emitting layer is extended. By causing the first light emitting layer to emit a short-lived color among a plurality of colors that realize color display, the life of the first light emitting layer can be extended and the product life of the organic EL device can be extended.

Application Example 2 In the organic EL device according to Application Example 1, the pixel further includes a second subpixel, and the second subpixel includes a second first electrode formed in the second element region. The second color filter that mainly transmits the second color is preferably arranged so as to overlap the second subpixel in plan view.
According to this configuration, in addition to displaying the first color at a location corresponding to the first first electrode of the first element region and the second element region, it corresponds to the second first electrode of the second element region. The second color can be displayed at the place where you do. Therefore, an organic EL device that displays a plurality of colors can be realized.

Application Example 3 In the organic EL device according to Application Example 1, the pixel further includes a second sub-pixel, includes a third element region, and the third element region mainly emits a third color. A third light emitting layer is formed, and the second subpixel has a second first electrode formed across the second element region and the third element region, and the second subpixel mainly transmits the second color. The color filter is preferably disposed so as to overlap the second subpixel in plan view.
According to this configuration, in addition to displaying the first color at the location corresponding to the first first electrode of the first element region and the second element region, the second element region and the third element region The second color can be displayed at a location corresponding to the second first electrode. Therefore, an organic EL device that displays a plurality of colors can be realized. Furthermore, the display of the second color in the third element region can be added to the display of the second color in the second element region. Thereby, the light emission luminance in the second light emitting layer can be lowered, and the life of the second light emitting layer can be extended.

Application Example 4 In the organic EL device according to Application Example 3, the pixel further includes a third sub-pixel, and the third sub-pixel includes a third first electrode formed in the third element region. The third color filter that mainly transmits the third color is preferably disposed so as to overlap the third subpixel in plan view.
According to this configuration, it is possible to display the third color at a position corresponding to the third first electrode in the third element region. Therefore, an organic EL device that performs color display using the three primary colors can be realized.

Application Example 5 In the organic EL device according to the application example described above, it is preferable that the area of the first element region and the area of the second element region are substantially equal.
According to this configuration, even if the light emitting functional layer such as the first light emitting layer and the second light emitting layer is formed by a coating method having excellent manufacturing efficiency, the areas of the first element region and the second element region are equal, Conditions can be optimal for both. In addition, since one of the subpixels is not small, it is possible to increase the resolution. In other words, an organic EL device that exhibits high display quality and has a practical product life can be realized by a highly efficient manufacturing process.

Application Example 6 In the organic EL device according to Application Example 3 or 4, it is preferable that the area of the first element region, the area of the second element region, and the area of the third element region are substantially equal.
According to this configuration, even if the light emitting functional layers such as the first light emitting layer, the second light emitting layer, and the third light emitting layer are formed by a coating method with excellent manufacturing efficiency, the first element region, the second element region, and the third light emitting layer are formed. Since the area with the element regions is equal, the process conditions can be optimized for the three element regions. In addition, since one subpixel is not small, the resolution can be increased. In other words, an organic EL device that exhibits high color display quality and has a practical product life can be realized by a highly efficient manufacturing process.

Application Example 7 In the organic EL device according to Application Example 2, in the first element region, the first light emitting layer is in electrical contact with the first first electrode, and in the second element region. It is preferable that the planar area in which the second light emitting layer is in electrical contact with the first first electrode and the second first electrode is substantially equal.
According to this configuration, even if the light emitting functional layer such as the first light emitting layer and the second light emitting layer is formed by a coating method having excellent manufacturing efficiency, the areas of the first element region and the second element region are equal, Conditions can be optimal for both. In addition, since one of the subpixels is not small, it is possible to increase the resolution. In other words, an organic EL device that exhibits high display quality and has a practical product life can be realized by a highly efficient manufacturing process.

Application Example 8 In the organic EL device according to Application Example 4, in the first element region, the first light emitting layer is in electrical contact with the first first electrode, and in the second element region The plane area where the second light emitting layer is in electrical contact with the first first electrode and the second first electrode, and the third light emitting layer is the second first electrode and the third first electrode in the third element region. It is preferable that the plane area in electrical contact with the substrate is substantially equal.
According to this configuration, even if the light emitting functional layers such as the first light emitting layer, the second light emitting layer, and the third light emitting layer are formed by a coating method with excellent manufacturing efficiency, the first element region, the second element region, and the third light emitting layer are formed. Since the area with the element regions is equal, the process conditions can be optimized for the three element regions. In addition, since one subpixel is not small, the resolution can be increased. In other words, an organic EL device that exhibits high color display quality and has a practical product life can be realized by a highly efficient manufacturing process.

Application Example 9 In the organic EL device according to Application Example 4, the first planar electrode is in total contact with the first light emitting layer and the second light emitting layer, and the second first electrode is The ratio of the total plane area in electrical contact with the second and third light emitting layers to the total plane area in which the third first electrode is in electrical contact with the third light emitting layer is approximately It is preferably 15: 10: 5.
An organic EL device having a high color display quality and a practical product life can be realized by a highly efficient manufacturing process.

Application Example 10 In the organic EL device according to the application example, it is preferable that the first color is blue.
According to this configuration, the lifetime of the blue light-emitting layer is increased by increasing the short-lived blue sub-pixel for the red and green sub-pixels whose lifetime has reached the practical level. You can extend your life. Therefore, an organic EL device that exhibits high color display quality and has a practical product life can be realized by a highly efficient manufacturing process.

Application Example 11 An electronic apparatus according to this application example includes the organic EL device according to the application example.
According to this configuration, an electronic device including an organic EL device that exhibits high color display quality and has a practical product life can be realized by a highly efficient manufacturing process.

FIG. 3 is an equivalent circuit diagram illustrating an electrical configuration of the organic EL device. FIG. 3 is a schematic perspective view illustrating a configuration of a pixel. The schematic plan view which shows the structure of an organic electroluminescent apparatus. 3 is a schematic diagram illustrating a structure of a pixel. FIG. FIG. 9 shows an intensity spectrum of light emitted from a light-emitting element. The figure which shows the light transmittance spectrum of color filter CF. The figure which shows the red display of a 3rd sub pixel (red sub pixel). The figure which shows the green display of a 2nd subpixel (green subpixel). The figure which shows the blue display of a 1st subpixel (blue subpixel). The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic diagram which shows the manufacturing process of an organic electroluminescent apparatus. The schematic perspective view which shows typically a television provided with an organic EL apparatus. FIG. 10 is a schematic diagram showing a manufacturing process of an organic EL device according to Modification 2. FIG. 10 is a schematic diagram showing a manufacturing process of an organic EL device according to Modification 2.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, the scale of each layer and each member is made different from the actual scale so that each layer and each member can be recognized.

(Embodiment 1)
"Configuration of organic EL device"
First, the configuration of the organic EL device 11 will be described with reference to FIG. 1, FIG. 2, and FIG. FIG. 1 is an equivalent circuit diagram showing an electrical configuration of the organic EL device according to this embodiment. As shown in FIG. 1, in the organic EL device 11, a plurality of scanning lines 12 and a plurality of signal lines 13 extending in a direction intersecting the scanning lines 12 are wired vertically and horizontally. Further, a plurality of first power supply lines 14 are wired in parallel with the signal lines 13, and a plurality of second power supply lines 17 are wired in parallel with the scanning lines 12. In the present embodiment, a positive power supply potential Vdd is supplied to the first power supply line 14 and a negative power supply potential Vss is supplied to the second power supply line 17. The signal line 13 is connected to the signal line driving circuit 15, and the scanning line 12 is connected to the scanning line driving circuit 16. An area of one matrix element divided by the scanning line 12 and the signal line 13 is an element area 41 (first element area 41B, second element area 41G, and third element area 41R). That is, the element areas 41 are arranged in a matrix in the actual display area 32a.

  One pixel 71 includes at least a first subpixel and a second subpixel, and each subpixel 42 displays a different color. Usually, one pixel 71 is composed of three or more subpixels 42. In the present embodiment, one pixel 71 includes a first subpixel, a second subpixel, and a third subpixel. As an example, the first subpixel is a blue subpixel 42B that displays blue, the second subpixel is a green subpixel 42G that displays green, and the third subpixel is a red subpixel that displays red. 42R.

  Further, one pixel 71 includes at least a first element region 41B and a second element region 41G, and the light emitting element 27 provided in each element region 41 emits light of a different color for each element region 41. Usually, one pixel 71 is composed of three or more element regions 41, and the number of subpixels and the number of element regions 41 in the one pixel 71 are the same. In the present embodiment, one pixel 71 includes a first element region 41B, a second element region 41G, and a third element region 41R. The first element region 41B includes a first light emitting element that mainly emits light of a first color (a blue light emitting element 27B that mainly emits blue light, see FIG. 4), and the first light emitting element (blue light emitting element 27B). ) Includes the first light emitting layer (blue light emitting layer 63B). The second element region 41G has a second light emitting element that mainly emits light of the second color (green light emitting element 27G that mainly emits green light, see FIG. 4), and the second light emitting element (green light emitting element). The element 27G) includes a second light emitting layer (green light emitting layer 63G). Further, the third element region 41R includes a third light emitting element that mainly emits the third color (red light emitting element 27R that mainly emits red, see FIG. 4), and the third light emitting element (red light emitting). The element 27R) includes a third light emitting layer (red light emitting layer 63R). The first subpixel is formed across a part of the first element region 41B (the whole of the first element region 41B in this embodiment) and a part of the second element region 41G, and the second subpixel is a second element. A part of the region 41G and a part of the third element region 41R are formed, and the third sub-pixel is formed in a part of the third element region 41R. Thereafter, when it is not necessary to particularly distinguish the first subpixel, the second subpixel, and the third subpixel (the red subpixel 42R, the green subpixel 42G, and the blue subpixel 42B need to be particularly distinguished from each other). If not), simply referred to as sub-pixel 42. Similarly, the first element region 41B, the second element region 41G, and the third element region 41R are simply referred to as element regions 41 when it is not necessary to distinguish them. The same applies to the light emitting element 27 and the light emitting layer 63.

  Each element region 41 includes a selection transistor 21 to which a scanning signal is supplied to the gate electrode via the scanning line 12, and a storage capacitor 22 for holding an image signal supplied from the signal line 13 via the selection transistor 21. A driving transistor 23 is provided in which an image signal held by the holding capacitor 22 is supplied to the gate electrode. Further, each element region 41 has a first electrode to which a drive current is supplied from the first power supply line 14 (positive power supply potential Vdd) when electrically connected to the first power supply line 14 via the drive transistor 23. (The anode 24 in the present embodiment), the second electrode (the cathode 25 in the present embodiment) connected to the second power supply line 17 (negative power supply potential Vss), and the anode 24 and the cathode 25 are sandwiched. A light emitting functional layer 26 is provided. The anode 24, the cathode 25, and the light emitting functional layer 26 constitute a light emitting element 27. The first electrode formed on the first subpixel (blue subpixel 42B) is the first first electrode (first anode 24B), and the first electrode formed on the second subpixel (green subpixel 42G). The electrode is the second first electrode (second anode 24G), and the first electrode formed in the third subpixel (red subpixel 42R) is the third first electrode (third anode 24R).

  The first first electrode (first anode 24B) is formed across the first element region 41B and the second element region 41G. As a result, the first subpixel (blue subpixel 42B) has the first light emitting element (blue light emitting element 27B) in the first element region 41B, and further the second light emitting element (green) in the adjacent second element region 41G. It has a light emitting element 27G). The second first electrode (second anode 24G) is formed across the second element region 41G and the third element region 41R. As a result, the second sub-pixel (green sub-pixel 42G) has the second light-emitting element (green light-emitting element 27G) in the second element region 41G, and further the third light-emitting element (red) in the adjacent third element region 41R. It has the light emitting element 27R). The third first electrode (third anode 24R) is formed in the third element region 41R. As a result, the third subpixel (red subpixel 42R) has the third light emitting element (red light emitting element 27R) in the third element region 41R.

  In short, the organic EL device 11 includes an actual display area 32a, and a plurality of pixels 71 are provided in a matrix in the actual display area 32a. Each pixel 71 includes a first subpixel, a second subpixel, and a third subpixel. Each sub-pixel 42 has one or a plurality of light emitting elements 27. With such a configuration, when the scanning line 12 is driven and the selection transistor 21 is turned on, the potential of the signal line 13 at that time is held in the holding capacitor 22, and the driving transistor 23 of the driving transistor 23 depends on the state of the holding capacitor 22. The on / off state is determined. Then, a current is supplied from the first power supply line 14 to the anode 24 through the channel of the driving transistor 23, and further a current flows to the cathode 25 through the light emitting functional layer 26. The light emitting functional layer 26 emits light with a luminance corresponding to the amount of current passing therethrough. In this embodiment, the selection transistor 21 is composed of an N-type thin film transistor, and the drive transistor 23 is composed of a P-type thin film transistor.

  FIG. 2 is a schematic perspective view illustrating the structure of the pixel. The organic EL device 11 includes a color filter substrate CF-Sub (see FIG. 4B), and the color filter CF corresponding to each subpixel 42 is arranged on the color filter substrate CF-Sub. That is, the first color filter (blue color filter CF-B) that mainly transmits the first color (blue) is disposed so as to overlap the first subpixel (blue subpixel 42B) in plan view. . Similarly, a second color filter (green color filter CF-G) that mainly transmits the second color (green) is disposed so as to overlap the second subpixel (green subpixel 42G) in plan view. Yes. Further, a third color filter (red color filter CF-R) that mainly transmits the third color (red) is disposed so as to overlap the third subpixel (red subpixel 42R) in plan view. .

  As described above, the first first electrode (first anode 24B) formed in the first subpixel (blue subpixel 42B) is formed across the first element region 41B and the second element region 41G. As a result, when current is supplied from the first power supply line 14 to the first first electrode (first anode 24B), the first light emitting layer (blue light emitting layer 63B) changes the first color in the first element region 41B. The second light emitting layer (green light emitting layer 63G) mainly emits the second color in the second element region 41G. The light mainly emitted from the first color (blue) and the light mainly emitted from the second color (green) emitted from the first color filter disposed in the first sub-pixel (blue sub-pixel 42B) ( The first color (blue) is mainly displayed through the blue color filter CF-B) (blue display B).

  Similarly, the second first electrode (second anode 24G) formed in the second subpixel (green subpixel 42G) is formed across the second element region 41G and the third element region 41R. As a result, when a current is supplied from the first power supply line 14 to the second first electrode (second anode 24G), the second light emitting layer (green light emitting layer 63G) changes the second color in the second element region 41G. The third light emitting layer (red light emitting layer 63R) mainly emits the third color in the third element region 41R. The light mainly emitted from the second color (green) and the light mainly emitted from the third color (red) emitted from the second color filter (green subpixel 42G) is arranged in the second color filter ( Through the green color filter CF-G), the second color (green) is mainly displayed (green display G).

  A third first electrode (third anode 24R) formed in the third subpixel (red subpixel 42R) is formed in the third element region 41R. As a result, when current is supplied from the first power supply line 14 to the third first electrode (third anode 24R), the third light emitting layer (red light emitting layer 63R) changes the third color in the third element region 41R. Mainly emits light. The light mainly composed of the third color (red) thus emitted passes through the third color filter (red color filter CF-R) disposed in the third subpixel (red subpixel 42R), The color (red) is mainly displayed (red display R).

  These relationships are summarized in Table 1.

  FIG. 3 is a schematic plan view showing the configuration of the organic EL device. Hereinafter, the configuration of the organic EL device 11 will be described with reference to FIG. As shown in FIG. 3, the organic EL device 11 has a display region 32 (region inside the alternate long and short dash line in the drawing) and a non-display region 33 (region outside the alternate long and short dash line) on the element substrate 31 made of glass or the like. It is configured. The display area 32 is provided with an actual display area 32a (area inside the two-dot chain line) and a dummy area 32b (area outside the two-dot chain line in the figure).

  As described above, the pixels 71 are arranged in a matrix in the actual display area 32a. On the other hand, a circuit for causing each subpixel 42 to emit light is provided in the dummy region 32b. For example, the scanning line driving circuit 16 is disposed along the left side and the right side of the actual display region 32a in the drawing, and the signal line driving circuit 15 is disposed along the upper side of the actual display region 32a in the drawing. A flexible substrate 36 is provided on the lower side of the element substrate 31. The flexible substrate 36 is provided with a driving IC 37 connected to each wiring.

"Pixel structure"
4A and 4B are schematic views for explaining the structure of the pixel, in which FIG. 4A is a plan view and FIG. Further, (b) also shows a cross-sectional view of the color filter substrate at YY ′. Hereinafter, the structure of the pixel 71 will be described with reference to FIG. FIG. 4 shows the cross-sectional positional relationship of each component and is represented on a scale that can be clearly shown.

  As shown in FIG. 4, the organic EL device 11 is controlled to emit light independently for each subpixel 42, and has an element substrate 31, a circuit element layer 43 </ b> L formed on the element substrate 31, and a circuit element layer 43 </ b> L. And the formed light emitting element layer 44. A matrix element defined by the scanning line 12 and the signal line 13 is an element region 41 (first element region 41B, second element region 41G, third element region 41R), and the area of the first element region 41B and the second element The area of the region 41G and the area of the third element region 41R are substantially equal. “Equally equal” does not mean that they are intentionally different from each other in design, but means that they match within an error range. As the element substrate 31, for example, a glass substrate having translucency is used. The light emitted from the light emitting element layer 44 is extracted to the element substrate 31 side, passes through the color filter CF (CF-R, CF-G, CF-B) disposed on the lower side of the element substrate 31, Each color display (red display R, green display G, blue display B) is performed. Therefore, the organic EL device 11 has a so-called bottom emission structure. In the color filter substrate CF-Sub, a light shielding film is formed in a lattice shape between the color filters CF (CF-R, CF-G, CF-B), and the lattice-shaped light shielding film is a black matrix BM.

In the circuit element layer 43L, a base protection film made of a silicon oxide film (SiO ₂ ) (not shown) is formed on the element substrate 31, and the selection transistor 21, the storage capacitor 22, the drive transistor 23, etc. are formed on the base protection film. A thin film circuit is formed. The region where the thin film circuit is formed is a thin film circuit region 43 (first thin film circuit region 43B, second thin film circuit region 43G, and third thin film circuit region 43R). As shown in FIG. Each is formed. The thin film circuit has the same configuration in each thin film circuit region 43 except for the planar shape of first electrodes (first first electrode, second first electrode, and third first electrode) described later. In a thin film transistor such as the select transistor 21 and the drive transistor 23, an island-shaped semiconductor film made of a polysilicon film (not shown) is formed on a base protective film, and a source region and a drain region are formed in the semiconductor film by introducing impurities. ing. A portion where no impurity is introduced is a channel region.

  Further, a transparent gate insulating film (not shown) made of a silicon oxide film or the like covering the base protective film and the semiconductor film is formed on the circuit element layer 43L. A first metal wiring layer made of aluminum (Al), molybdenum (Mo), tantalum (Ta), titanium (Ti), tungsten (W), or the like is formed on the gate insulating film. The scanning lines 12, the second power supply lines 17, the gate electrodes (not shown) of the thin film transistors shown in FIG. 4A are formed. The gate electrode is provided at a position corresponding to the channel region of the semiconductor film.

A transparent first interlayer insulating film (not shown) is formed on the gate insulating film and the first metal wiring layer. The first interlayer insulating film is composed of, for example, a silicon oxide film (SiO ₂ ) or a silicon nitride film (SiN). A second metal wiring layer made of aluminum (Al), copper (Cu), or the like is formed on the first interlayer insulating film, and the signal line 13, the first power supply line 14, etc. are formed in the second metal wiring layer. Is formed. A transparent second interlayer insulating film 55 is formed on the first interlayer insulating film and the second metal wiring layer. The second interlayer insulating film 55 is made of, for example, acrylic resin or polyimide resin.

  The source region of the selection transistor 21 is a signal line formed on the first interlayer insulating film through a first contact hole (not shown) provided through the gate insulating film and the first interlayer insulating film. 13 is electrically connected. The source region of the driving transistor 23 is electrically connected to the first power supply line 14 formed on the first interlayer insulating film through the first contact hole. On the other hand, the drain region of the driving transistor 23 is connected to the second interlayer insulating layer through a second contact hole (not shown) provided through the gate insulating film, the first interlayer insulating film, and the second interlayer insulating film 55. The anode 24 (24R, 24G, 24B) formed on the film 55 is electrically connected. The second contact hole is formed in a region where the anode 24 and the thin film circuit region 43 overlap in plan view.

  The first electrode (anode 24) is made of a transparent conductive film, and a thin film of indium tin oxide (ITO) is used as a suitable example. The planar shape of the anode 24 is substantially matched to the planar shape of the subpixel 42. Accordingly, the shape of the first anode 24B in a plan view is as shown in FIG. 4A. The shape of the opening 591 provided behind the first element region 41B and the whole of the opening 591 provided later in the first element region 41B. It is formed so as to include a part of the area. In the present embodiment, the first anode 24B is formed so as to include the entire area of the opening 591 of the first element region 41B and about half the area of the opening 591 of the second element region 41G. The shape of the second anode 24G in plan view includes a partial area of the opening 591 provided later in the second element region 41G and a partial area of the opening 591 provided later in the third element region 41R. Formed. In the present embodiment, the second anode 24G is formed so as to include approximately half of the opening 591 of the second element region 41G and approximately half of the opening 591 of the third element region 41R. The shape of the third anode 24R in plan view is formed so as to include a partial area of the opening 591 provided later in the third element region 41R. In the present embodiment, the third anode 24R is formed so as to include approximately half the region of the opening 591 of the third element region 41R.

  In each element region 41, a two-layer partition composed of a first partition 58 and a second partition 59 is provided in a substantially lattice shape in plan view, and an inner region surrounded by the two-layer partition is an opening 591. It has become. The double-layer partition wall equally divides each element region 41. Therefore, the area of the opening 591 is substantially the same in the first element region 41B, the second element region 41G, and the third element region 41R. A first light emitting layer (blue light emitting layer 63B), a second light emitting layer (green light emitting layer 63G), and a third light emitting layer (red light emitting layer 63R) are formed in the opening 591.

The first partition wall 58 is formed of an insulating material, and for example, an inorganic material such as a silicon oxide film (SiO ₂ ) is used. The first partition wall 58 ensures insulation between the adjacent anodes 24 and has the shape of the light emitting region (light emitting portion 58I, specifically, the shape of the region where the anode 24 and the light emitting functional layer 26 are in electrical contact). In order to obtain a desired shape (for example, a rounded square), it is formed so as to run on the peripheral edge of the anode 24 and the like. That is, the anode 24 and the first partition 58 are arranged so as to partially overlap each other in a plan view, and the first partition 58 is a region excluding the light emitting portion 58I in the subpixel 42. And between the sub-pixels 42. In the first element region 41B, the first partition wall 58 is formed so that the light emitting portion 58I is formed on the first anode 24B. In the second element region 41G, the first partition wall 58 is formed so that the light emitting portion 58I is formed on the first anode 24B and the second anode 24G. In the third element region 41R, the first partition wall 58 is formed so that the light emitting portion 58I is formed in the second anode 24G and the third anode 24R. The first partition wall 58 is formed so that the area of the light emitting portion 58I is substantially the same in the first element region 41B, the second element region 41G, and the third element region 41R.

  Further, the first partition wall 58 has a planar area (area of the light emitting portion 58I in the first element region 41B) in which the first light emitting layer is in electrical contact with the first electrode in the first element region 41B. A planar area in which the second light emitting layer is in electrical contact with the first first electrode and the second first electrode in the second element region 41G (the area of the light emitting portion 58I in the second element region 41G); The planar area (the area of the light emitting portion 58I in the third element region 41R) in which the third light emitting layer is in electrical contact with the second first electrode and the third first electrode in the element region 41R is substantially equal. Are formed. This is because a part of the light emitting functional layer 26 is formed by a coating method having excellent manufacturing efficiency, and in this case, the coating conditions are optimized for the three regions. Also, since one subpixel is not small, it is also possible to increase the resolution.

  As a result of forming the first electrode and the first partition wall 58 as described above, the total area (in the first subpixel) in which the first first electrode is in electrical contact with the first light emitting layer and the second light emitting layer. The total area of the light emitting portion), the total area of the second first electrode in electrical contact with the second light emitting layer and the third light emitting layer (the total area of the light emitting portion in the second subpixel), and the third The ratio of the total planar area (the total area of the light emitting portions in the third subpixel) in which the first electrode is in electrical contact with the third light emitting layer is approximately 15: 10: 5.

  The second partition wall 59 that overlaps the first partition wall 58 in plan view and is formed thereon has, for example, a trapezoidal shape with an inclined surface, and is formed so as to surround the light emitting element 27 in plan view. That is, the area surrounded by the second partition wall 59 becomes the opening 591 of the light emitting element 27, and various thin films forming the light emitting functional layer 26 are formed. The second partition wall 59 is formed so that the shape and area of the opening 591 in each element region 41 are equal. As a material of the second partition wall 59, for example, an organic material having excellent heat resistance and high solvent resistance such as an acrylic resin or a polyimide resin is used.

  Various thin films provided on the anode 24 (24R, 24G, 24B) are different for each light emitting element 27 (27R, 27G, 27B). Specifically, the red light emitting element 27R belonging to the third subpixel has a hole injection layer 61R, a hole transport layer 62R, a third light emitting layer (red) on the third anode 24R surrounded by the second partition wall 59. The light emitting layer 63R) is sequentially formed by a coating method (inkjet method). In addition, the green light emitting element 27G belonging to the second subpixel has a hole injection layer 61G, a hole transport layer 62G, a second light emitting layer (green light emitting layer 63G) on the second anode 24G surrounded by the second partition wall 59. ) Are sequentially formed by an ink jet method. On the red light emitting layer 63R and the green light emitting layer 63G, a hole blocking layer 64 serving as an intermediate layer is laminated by an evaporation method. A third light emitting layer (blue light emitting layer 63B) is formed on the hole blocking layer 64.

  In the blue light emitting element 27B belonging to the first subpixel, the hole injection layer 61B and the hole transport layer 62B are sequentially formed on the first anode 24B surrounded by the second partition wall 59 by the ink jet method. Further, on the hole transport layer 62B, a hole blocking layer 64 serving as an intermediate layer is laminated on the entire surface of the display area including the second partition wall 59 by an evaporation method. A first light emitting layer (blue light emitting layer 63B) is laminated on the hole blocking layer 64 by a vapor deposition method.

  An electron transport layer 65 is laminated on the blue light emitting layer 63B by vapor deposition, and a cathode 25 is formed on the entire surface of the element substrate 31 on the electron transport layer 65. The cathode 25 is sealed using a can sealing method (not shown). Specifically, a desiccant is placed in a concave glass or metal counter substrate, and is attached to the cathode 25 side through an adhesive such as epoxy. Since the light emitting functional layer 26 is sandwiched between the anode 24 and the cathode 25, the light emitting functional layer 26 of the second subpixel and the third subpixel includes the hole injection layer 61R or 61G, the hole Each of the transport layer 62R or 62G, the second light emitting layer (green light emitting layer 63G) or the third light emitting layer (red light emitting layer 63R), the hole blocking layer 64, the blue light emitting layer 63B, and the electron transport layer 65 is included. . On the other hand, the light-emitting functional layer 26 of the first subpixel includes the hole injection layer 61B, the hole transport layer 62B, the hole blocking layer 64, the first light-emitting layer (blue light-emitting layer 63B), and the electron transport layer 65. Comprising. The light emitting functional layer 26 is not limited to the above-described configuration, and for example, the hole blocking layer 64 that is an intermediate layer can be omitted.

  The hole injection layer 61 (61R, 61G, 61B) is composed of a conductive polymer layer containing a dopant in a conductive polymer material. Such a hole injection layer 61 can be composed of, for example, 3,4-polyethylenedioxythiophene (PEDOT-PSS) containing polystyrene sulfonic acid as a dopant.

  As a constituent material of the hole transport layer 62 (62R, 62G, 62B) formed by the coating method, for example, a material containing a triphenylamine polymer such as TFB shown in the following chemical formula 1 can be used.

  The light emitting layer 63 (63R, 63G, 63B) is a layer of an organic light emitting material that exhibits an electroluminescence phenomenon. If it is the red light emitting layer 63R formed by the coating method as a constituent material of the light emitting layer 63, for example, a material represented by the following chemical formula 2 (Poly [{9, 9-dihexyl-2, 7-bis (1-cyanovinylene) fluorene}}-alt-co- {2,5-bis (N, N-diphenylamino) -1,4-phenylene}], ADS-111RE). Similarly, in the case of the green light emitting layer 63G formed by a coating method, for example, a material represented by the following chemical formula 3 (Poly [{9, 9-dioctyl-2, 7-bis (2-cyanovinylene-fluorenerene} -alt-co- {2-methoxy-5- (2-ethyl hexyloxy) -1,4-phenylene}], ADS-109GE), and the blue light-emitting layer 63B formed by vapor deposition may be used, for example, Host material shown in Chemical Formula 4 (2- [9,9-di (4-methylphenyl) -fluoren-2-yi] -9, 9-di (4-methylphenyl) fluoren, BDAF) and guest material shown in Chemical Formula 5 below (1,4-bis [2- (3-N-ethylcarbazole) ) Vinyl] benzene, BCzVB) can be used.

  The hole blocking layer 64 is a layer having a function of retaining holes in the red light emitting layer 63R and the green light emitting layer 63G. As a constituent material of the hole blocking layer 64, for example, Balq represented by the following chemical formula 6 can be used.

  The electron transport layer 65 is a layer having a function of enhancing electron injection from the cathode 25 to the light emitting layer 63 (63R, 63G, 63B). As a constituent material of the electron transport layer 65, for example, Alq3 represented by the following chemical formula 7 can be used.

  For example, the cathode 25 may be a laminate of lithium fluoride (LiF) and aluminum (Al).

"Display principle"
Next, the display principle of the organic EL device 11 will be described with reference to FIGS. FIG. 5 shows an intensity spectrum of light emitted from the light emitting element. The first light emitting element (blue light emitting element 27B) mainly emits the first color (blue), and its spectrum is drawn in EM-B. The light from the first light emitting element (blue light emitting element 27B) has a maximum intensity at a wavelength of about 485 nm and is in a wavelength range of 420 nm to 560 nm. The second light emitting element (green light emitting element 27G) mainly emits the second color (green), and its spectrum is drawn by EM-G. The light from the second light emitting element (green light emitting element 27G) has a maximum intensity at a wavelength of about 550 nm and is in a wavelength range of 480 nm to 620 nm. The third light emitting element (red light emitting element 27R) mainly emits the third color (red), and its spectrum is drawn by EM-R. The light from the third light emitting element (red light emitting element 27R) has a maximum intensity at a wavelength of about 650 nm and is in a wavelength range of 580 nm to 720 nm.

  FIG. 6 is a light transmittance spectrum of the color filter. The first color filter (blue color filter CF-B) mainly transmits the first color (blue), and its transmittance is maximum at a wavelength of about 450 nm and transmits light in a wavelength range of about 400 nm to 560 nm. Let The second color filter (green color filter CF-G) mainly transmits the second color (green), and its transmittance is maximum at a wavelength of about 530 nm, and transmits light in a wavelength range of about 470 nm to 610 nm. Let The third color filter (red color filter CF-R) mainly transmits the third color (green), and the transmittance is maximum at a wavelength of about 630 nm, and transmits light in a wavelength range of about 580 nm or more. .

  The product of the emission spectrum of FIG. 5 and the transmittance spectrum of FIG. 6 is the display color of the organic EL device. FIG. 7 shows the red display R of the third subpixel (red subpixel 42R) thus obtained. Red display R is the product of the emission EM-R from the third light emitting element and the transmittance of the third color filter CF-R. A beautiful red display R is realized.

  FIG. 8 shows the green display G of the second subpixel (green subpixel 42G). The green display G is the product of the light emission EM-G from the second light emitting element and the transmittance of the second color filter CF-G (EM-G × CF-G), and the light emission EM-R from the third light emitting element. And the product of the transmittance of the second color filter CF-G (EM-R × CF-G). A beautiful green display G is realized.

  FIG. 9 shows a blue display B of the first subpixel (blue subpixel 42B). The blue display B is the product of the light emission EM-B from the first light emitting element and the transmittance of the first color filter CF-B (EM-B × CF-B), and the light emission EM-G from the second light emitting element. The product of the transmittance of the first color filter CF-B (EM-G × CF-B) is added. A beautiful blue display G is realized and the intensity of the blue display G is high.

"Method for manufacturing organic EL device"
10 to 19 are schematic views showing the manufacturing process of the organic EL device. 10 to 17 and 19, (a) is a plan view and (b) is a cross-sectional view taken along the line XX ′. FIG. 18A is a plan view of the element substrate, and FIG. 18B is a plan view of the color filter substrate. Hereinafter, a method for manufacturing the organic EL device 11 will be described with reference to FIGS. In addition, since a well-known process can be employ | adopted about the manufacturing process which forms various wiring, an electrode, a transistor, etc., those description is abbreviate | omitted or simplified here, and subsequent processes are demonstrated in detail. Similarly, the drawings are omitted or simplified. Furthermore, for easy understanding, the thin film circuit region 43, the first metal wiring layer, and the second metal wiring layer are omitted in the plan views of FIGS.

First, as shown in FIG. 10, a circuit element layer 43 </ b> L (refer to FIG. 3 for details) is formed on the element substrate 31 using a known film formation technique or photolithography technique, and each region to be the subpixel 42 is formed. A first electrode is formed. In the present embodiment, the first electrode is an anode 24 (24R, 24G, 24B) made of ITO formed on the circuit element layer 43L. Since the number of pixels 71 in the organic EL device 11 is 1920 × 1080, the total number of subpixels is 1920 × 1080 × 3 = 622 million 800. Subsequently, the first partition wall 58 is formed so that the anode 24 is exposed in the vicinity of the center of the region to be the element region 41. The first partition 58 is formed by depositing a silicon oxide film (SiO ₂ ) by a CVD (Chemical Vapor Deposition) method, and then removing the silicon oxide film from the vicinity of the central portion of each element region 41 using a photolithography technique and an etching technique. To form.

  Subsequently, as shown in FIG. 11, a second partition 59 is formed on the first partition 58. Specifically, first, a solution containing the material of the second partition 59 is applied on the first partition 58 and the anode 24. The material of the second partition wall 59 is, for example, an acrylic resin. Next, the applied solution is dried to form a resin layer. Thereafter, the resin layer is patterned to form the second partition wall 59, and the opening 591 is formed in each element region 41.

Since the light emitting functional layer 26 is patterned using a coating method such as an ink jet method in the next step, it is desirable that the surface of the second partition wall 59 be lyophobic and the surface of the anode 24 be lyophilic. It is desirable that Therefore, after cleaning the element substrate 31 with alcohol and rinsing with pure water, the element substrate 31 is irradiated with oxygen plasma to make the surface of the anode 24 lyophilic. Next, the element substrate 31 is irradiated with plasma of carbon tetrafluoride (CF ₄ ) to make the surface of the second partition wall 59 liquid repellent. In addition to this, as a method of imparting liquid repellency to the surface layer of the second partition wall 59, a coating liquid of a resin (for example, acrylic resin) in which a liquid repellent component such as fluorine is mixed in advance is applied. There is also a method of diffusing and accumulating the liquid repellent component on the surface of the resin during drying.

  Subsequently, as shown in FIG. 12, the hole injection layer 61 (61R, 61G, 61B) is formed in the opening 591 with a film thickness of, for example, 50 nm. This is formed by discharging a functional liquid (ink) containing the material of the hole injection layer 61 by a droplet discharge method (for example, an ink jet method), and then drying the functional liquid and baking it in the air. . As the functional liquid of the hole injection layer 61, for example, a mixture (PEDOT / PSS) in which polystyrene sulfonic acid (PSS) as a dopant is added to a polythiophene derivative such as polyethylenedioxythiophene (PEDOT) can be used. Since the area of the opening 591 is the same in each element region 41, the discharge amount of the functional liquid containing the material of the hole injection layer 61 is the same, and therefore the optimum amount for all the element regions 41. Firing conditions can be applied.

  Next, as shown in FIG. 13, the hole transport layer 62 (62R, 62G, 62B) is formed on the hole injection layer 61 (61R, 61G, 61B) in each opening 591 with a film thickness of, for example, 15 nm. Form with. This is formed by discharging a functional liquid (ink) containing the material of the hole transport layer 62 by a droplet discharge method (for example, an ink jet method), and then drying the functional liquid and baking it under low oxygen. To do. As the functional liquid of the hole transport layer 62, for example, a substance obtained by dissolving TFB described above in Chemical Formula 1 in cyclohexylbenzene (CHB) can be used. Since the area of the opening 591 is the same in each element region 41, the discharge amount of the functional liquid containing the material of the hole transport layer 62 is the same, and therefore the optimum amount for all the element regions 41. Firing conditions can be applied.

  Next, as shown in FIG. 14, the third light emitting layer (red light emitting layer 63R) is formed in the opening 591 of the third element region 41R, and the second light emitting layer (green light emitting layer) is formed in the opening 591 of the second element region 41G. 63G) is formed by a coating method. That is, the red light emitting layer 63R is formed with a film thickness of 70 nm on the hole transport layer 62R formed in the opening 591 of the third element region 41R, and the positive light emission formed in the opening 591 of the second element region 41G. A green light emitting layer 63G is formed with a film thickness of 60 nm on the hole transport layer 62G. Specifically, a functional liquid containing a light emitting material is discharged by a droplet discharge method (for example, an ink jet method), and then the functional liquid is dried and fired under low oxygen. As the functional liquid containing the light emitting material, for example, a material obtained by dissolving the light emitting material represented by the above Chemical Formula 2 or Chemical Formula 3 in a solvent can be used. Examples of the solvent include cyclohexylbenzene (CHB). In the present embodiment, a functional liquid in which a light emitting material of Chemical Formula 2 or Chemical Formula 3 is dissolved in CHB at a concentration of 1.0 wt% is applied to the opening 591 of the second element region 41G or the third element region 41R by an inkjet method. Then, 20 shots were discharged at a rate of 10 picoliters / shot and filled, and then the element substrate 31 was placed in a vacuum dryer and dried at a vacuum of 5 Pa or less for 30 minutes.

  Next, as shown in FIG. 15, on the third light emitting layer (red light emitting layer 63R) in the third element region 41R, on the second light emitting layer (green light emitting layer 63G) in the second element region 41G, On the hole transport layer 62B in the first element region 41B and the second partition wall 59, the hole blocking layer 64 is formed by a vapor deposition method with a film thickness of 3 nm, for example. As the hole blocking layer 64, Balq represented by the above chemical formula 6 can be used. In this embodiment, since the organic EL device 11 has the hole blocking layer 64 formed by the vapor deposition method, the hole blocking layer 64 and the first light emitting layer (blue light emitting layer 63B) are vapor deposited in this order. However, the hole blocking layer 64 can be omitted.

  Next, as shown in FIG. 16, on the hole blocking layer 64 in the second element region 41G and the third element region 41R, on the hole blocking layer 64 in the first element region 41B, and in each element region 41. On the hole blocking layer 64 of the second partition wall 59 that separates the openings 591, a blue light emitting layer 63 </ b> B serving as a first light emitting layer is formed with a thickness of, for example, 10 nm by a vapor deposition method. As the blue light emitting layer 63B, a host material (BDAF represented by the above-described chemical formula 4) and a guest material (BCzVB represented by the above-described chemical formula 5) can be formed by a co-evaporation method at a volume ratio of 10: 1, for example. The thickness of the blue light emitting layer 63B formed on almost the entire surface of the element substrate 31 is preferably in the range of 5 nm to 50 nm. Light emission is difficult when the thickness is less than 5 nm, but light emission with practical brightness is possible when the thickness is 5 nm or more. If the thickness is 50 nm or less, it is possible to keep the voltage for light emission to a certain extent.

  Next, as shown in FIG. 17, the electron transport is performed across the blue light emitting layer 63B of the first element region 41B, the second element region 41G, and the third element region 41R and the second partition wall 59. A layer 65 and a second electrode are formed. In the present embodiment, the second electrode is the cathode 25. In short, the electron transport layer 65 is formed in a film thickness of 20 nm, for example, in all the element regions 41, and the cathode 25 is formed on the electron transport layer 65 by the vapor deposition method. As the electron transport layer 65, for example, Alq3 represented by the above chemical formula 7 can be used. The cathode 25 is formed, for example, by laminating a 1 nm thick lithium fluoride film and a 150 nm thick aluminum film in this order. Thereafter, for example, the top of the cathode 25 is sealed using a can sealing method (not shown).

  Next, the color filter substrate CF is disposed in accordance with the element substrate 31. As shown in FIG. 18, a first color filter (blue color filter CF-B) is arranged in the first element region 41B so as to overlap in plan view. The first color filter (blue color filter CF-B) is also arranged so as to overlap in a plan view in one area where the long side of the second element area 41G is divided into two. A first first electrode (first anode 24B) is formed at a location where the first color filter (blue color filter CF-B) is disposed in the second element region 41G. The second color filter (green color filter CF-G) is disposed so as to overlap in the plan view in the other region obtained by dividing the second element region 41G so that its long side is divided into two. A second first electrode (second anode 24G) is formed at a position where the second color filter (green color filter CF-B) is arranged in the second element region 41G. The second color filter (green color filter CF-G) is also arranged so as to overlap in one area in which the third element area 41R is divided so that the long side is divided into two. A second first electrode (second anode 24G) is formed at a location where the second color filter (green color filter CF-G) is arranged in the third element region 41R. The third color filter (red color filter CF-R) is arranged so as to overlap in the plan view in the other region obtained by dividing the third element region 41R so that the long side is divided in half. A third first electrode (third anode 24R) is formed at a position where the third color filter (red color filter CF-G) is arranged in the third element region 41R. Thus, the organic EL device 11 is completed as shown in FIG. That is, the first element region 41B becomes a part of the first subpixel (blue subpixel 42B) and performs blue display B. One half of the second element region 41G (including Y-Y ′) also becomes a part of the first subpixel (blue subpixel 42B) and performs blue display B. The other half (including X-X ′) of the second element region 41 </ b> G becomes a part of the second subpixel (green subpixel 42 </ b> G) and performs green display G. One half (including Y-Y ′) of the third element region 41 </ b> R also becomes a part of the second subpixel (green subpixel 42 </ b> G) and performs green display G. The other half (including X-X ′) of the third element region 41 </ b> R becomes a third sub-pixel (red sub-pixel 42 </ b> R) and displays red.

"Improved service life"
The effect of improving the lifetime of the organic EL device according to this embodiment will be described with reference to Table 2. Table 2 shows the lifetime when white color with color coordinates (0.31, 0.33) is displayed at a luminance of 200 cd / m ² . Table 2 (a) corresponds to the comparative example, and Table 2 (b) corresponds to the organic EL device 11 according to the present embodiment. For example, as shown in Table 2 (b), green display in the organic EL device 11 according to the present embodiment has a color coordinate of (0.344, 0.621), which is necessary for white 200 cd / m ² display. The display luminance becomes 1189 cd / m ² . Since the substantial transmittance of the color filter (green transmittance in view of the emission spectrum of EM-R, the emission spectrum of EM-G, and the area ratio thereof) is 0.48, the green light emitting element 27G has 2503 cd. It is necessary to emit light at an emission luminance of / m ² , and the lifetime at that time is 40,284 hours.

In the organic EL device 11 according to this embodiment, the area ratio of the display unit in each sub-pixel 42 is red display: green display: blue display = 5: 10: 15. Thus, since the area of the first subpixel (blue subpixel 42B) is wide, the light emission luminance of the blue light emitting element 27B can be kept as low as 450 cd / m ^2. As a result, the lifetime of the blue light emitting element 27B is 10,000. Extends to 0119 hours.

  On the other hand, Table 2 (a) is a comparative example in which the element region 41 and the sub-pixel match, and the area of the light-emitting portion is the same in blue display, green display, and red display, and the area ratio is displayed in red: Green display: Blue display = 10: 10: 10. In this case, the life of the blue light emitting element is as short as 5000 hours, and the product life is limited to this time. Compared to the comparative example, the product life of the organic EL device 11 according to this embodiment is 2.02 times.

"Electronics"
Next, an electronic apparatus to which the above-described organic EL device 11 is applied will be described with reference to FIG. FIG. 20 is a schematic perspective view schematically showing a configuration of a television as an example of an electronic apparatus including the organic EL device according to the present invention. Hereinafter, the configuration of the television will be described with reference to FIG.

  As shown in FIG. 20, the television 101 includes a display unit 102, a frame unit 103, a leg unit 104, and a remote controller 105. The display unit 102 is mounted with the organic EL device 11 manufactured using the above-described manufacturing method. The frame part 103 is used for guiding the display part 102. The leg portion 104 is used to fix the display portion 102 and the frame portion 103 at a certain height. The remote controller 105 is used, for example, to turn on / off the power of the television 101 or change the channel.

  The electronic device is not limited to the television 101 as long as it includes the organic EL device 11 described above, and for example, a display, a mobile phone, a computer, a digital camera, a digital video camera, a car navigation device, an audio device, etc. It can also be applied to.

As described above, according to the organic EL device 11 according to the present embodiment, the following effects can be obtained.
The display of the first color in the second element region 41G can be added to the display of the first color in the first element region 41B. Thereby, the light emission luminance in the first light emitting layer can be lowered, and thus the life of the first light emitting layer is extended. By causing the first light emitting layer to emit a short-lived color among a plurality of colors that realize color display, the life of the first light emitting layer can be extended and the product life of the organic EL device can be extended. Furthermore, even if the light emitting functional layers such as the first light emitting layer, the second light emitting layer, and the hole injection layer are formed by a coating method having excellent manufacturing efficiency, the first element region 41B, the second element region 41G, and the third element region are formed. Since the area of 41R is equal, process conditions can be optimized for the three element regions. In addition, since one subpixel is not small, the resolution can be increased. In other words, an organic EL device that exhibits high color display quality and has a practical product life can be realized by a highly efficient manufacturing process.

  In the present embodiment, the blue subpixel 42B is the first subpixel and the green subpixel 42G is the second subpixel. However, combinations of the first subpixel and the second subpixel are limited to this. Absent. For example, one pixel 71 is composed of four subpixels, and any one of the red subpixel, the green subpixel, and the yellow subpixel is set as the second subpixel or the third subpixel, and the blue subpixel is set as the first subpixel. It is also good. Alternatively, for example, either the red subpixel or the green subpixel may be the third subpixel, the blue subpixel may be the second subpixel, and the white subpixel may be the first subpixel.

  In addition, this invention is not limited to embodiment mentioned above, A various change and improvement can be added to embodiment mentioned above. A modification is described below.

(Modification 1)
“Top emission structure”
In Embodiment 1, the organic EL device 11 having a bottom emission structure has been described as an example. However, the present invention can also be applied to the organic EL device 11 having a top emission structure. That is, the organic EL device 11 may have a structure in which light emitted from the light emitting layer 63 is extracted upward (on the opposite side of the element substrate 31). Accordingly, in the first embodiment, the first electrode is the anode 24 and the second electrode is the cathode 25, but in this modification, the first electrode is the cathode 25 and the second electrode is the anode 24. The color filter substrate CF-Sub is disposed on the upper side of the element substrate 31.

  Specifically, first, the cathode 25 as the first electrode is formed, and then the electron transport layer 65 is formed on the cathode 25. The cathode 25 and the electron transport layer 65 are formed independently for each element region 41. Next, a second light emitting layer is formed in the second element region 41G, and a third light emitting layer is formed in the third element region 41R by a coating method. Next, the first light emitting layer, the hole transport layer 62, and the hole injection layer 61 are formed in this order on the entire surface of the element substrate 31 by vapor deposition, and finally the anode 24 as the second electrode is formed. The anode 24 is formed of a transparent conductive film. Thereby, the light emitted from the light emitting element layer 44 is extracted to the upper side of the element substrate 31, and the organic EL device 11 has a so-called top emission structure. The shape of the first electrode and the arrangement of the color filter are the same as those in the first embodiment.

(Modification 2)
“The first electrode and the color filter have different shapes”
The shapes of the first electrode and the color filter are not captured by the first embodiment, and can be freely changed. FIGS. 21 and 22 are diagrams illustrating the first electrode and the color filter according to this modification. FIG. 21A is a plan view of the element substrate, and FIG. 21B is a plan view of the color filter substrate. In Embodiment 1 shown in FIG. 18, it bisected with respect to the long side of the 2nd element area | region 41G, the one was made into the 1st sub pixel, and the other was made into the 2nd sub pixel. In the first embodiment shown in FIG. 18, the long side of the third element region 41R is divided into two parts, one of which is the second subpixel and the other is the third subpixel.

  On the other hand, in this modified example, as shown in FIG. 21, the short side of the second element region 41G is divided into two, and one of them (the right side in FIG. 21) is used as the first subpixel, and the other (see FIG. 21). 21 is the second subpixel. Further, as shown in FIG. 21, the short side of the third element region 41R is divided into two parts, one of which (right side in FIG. 21) is the second sub-pixel, and the other (left side in FIG. 21) is the third sub-pixel. Pixels. Furthermore, as shown in FIG. 22, the second element region 41G is diagonally divided into two, and one of them (lower right side in FIG. 21) serves as the first subpixel, and the other (upper left side in FIG. 21) serves as the second subpixel. It may be a subpixel. Further, as shown in FIG. 22, the third element region 41R is diagonally divided into two, and one of them (lower right side in FIG. 21) serves as a second sub-pixel, and the other (upper left side in FIG. 21) serves as a third sub-pixel. It may be a pixel. As described above, the element region 41 and the sub-pixel 42 are not limited to the example shown in the first embodiment or the present modification, and can be formed in various shapes.

  DESCRIPTION OF SYMBOLS 11 ... Organic EL device, 21 ... Selection transistor, 23 ... Drive transistor, 24 ... Anode, 24B ... First anode, 24G ... Second anode, 24R ... Third anode, 25 ... Cathode, 26 ... Light emitting functional layer, 27 ... Light emitting element, 27B ... Blue light emitting element, 27G ... Green light emitting element, 27R ... Red light emitting element, 31 ... Element substrate, 32a ... Real display area, 41 ... Element area, 41B ... First element area, 41G ... Second element area , 41R ... third element region, 42 ... subpixel, 42B ... blue subpixel, 42G ... green subpixel, 42R ... red subpixel, 44 ... light emitting element layer, 58 ... first partition, 59 ... second partition, 61 DESCRIPTION OF SYMBOLS ... Hole injection layer, 62 ... Hole transport layer, 63 ... Light emission layer, 63B ... Blue light emission layer, 63G ... Green light emission layer, 63R ... Red light emission layer, 64 ... Hole blocking layer, 65 ... Electron transport layer, 71 ... pixel, 5 1 ... opening.

Claims (11)

With pixels,
The pixel has a first sub-pixel and includes a first element region and a second element region,
A first light emitting layer that mainly emits a first color is formed in the first element region, and a second light emitting layer that mainly emits a second color is formed in the second element region,
The first sub-pixel has a first first electrode formed across the first element region and the second element region,
An organic EL device, wherein a first color filter that mainly transmits the first color is disposed so as to overlap the first subpixel in a plan view. The pixel further includes a second sub-pixel,
The second subpixel has a second first electrode formed in the second element region,
2. The organic EL device according to claim 1, wherein a second color filter that mainly transmits the second color is disposed so as to overlap the second subpixel in a plan view. The pixel further includes a second subpixel and includes a third element region;
In the third element region, a third light emitting layer that mainly emits a third color is formed,
The second subpixel has a second first electrode formed across the second element region and the third element region,
2. The organic EL device according to claim 1, wherein a second color filter that mainly transmits the second color is disposed so as to overlap the second subpixel in a plan view. The pixel further includes a third sub-pixel,
The third sub-pixel has a third first electrode formed in the third element region;
The organic EL device according to claim 3, wherein a third color filter that mainly transmits the third color is disposed so as to overlap the third subpixel in a plan view.   5. The organic EL device according to claim 1, wherein an area of the first element region is substantially equal to an area of the second element region. 6.   5. The organic EL device according to claim 3, wherein an area of the first element region, an area of the second element region, and an area of the third element region are substantially equal.   A planar area in which the first light emitting layer is in electrical contact with the first first electrode in the first element region, and the second light emitting layer in the second element region is the first electrode. 3. The organic EL device according to claim 2, wherein a planar area in electrical contact with the second first electrode is substantially equal.   A planar area in which the first light emitting layer is in electrical contact with the first first electrode in the first element region, and the second light emitting layer in the second element region is the first electrode. And a planar area in electrical contact with the second first electrode, and the third light emitting layer in electrical contact with the second first electrode and the third first electrode in the third element region The organic EL device according to claim 4, wherein the flat area is substantially equal.   A total planar area in which the first first electrode is in electrical contact with the first light emitting layer and the second light emitting layer; and the second first electrode is formed with the second light emitting layer and the third light emitting layer. The ratio of the total plane area in electrical contact with the total plane area in which the third first electrode is in electrical contact with the third light emitting layer is approximately 15: 10: 5. The organic EL device according to claim 4.   The organic EL device according to any one of claims 1 to 9, wherein the first color is blue.   An electronic apparatus comprising the organic EL device according to claim 1.

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