JP2013166978A - Surface treated steel sheet having good insulation property and method for producing the same - Google Patents

Surface treated steel sheet having good insulation property and method for producing the same Download PDF

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JP2013166978A
JP2013166978A JP2012029828A JP2012029828A JP2013166978A JP 2013166978 A JP2013166978 A JP 2013166978A JP 2012029828 A JP2012029828 A JP 2012029828A JP 2012029828 A JP2012029828 A JP 2012029828A JP 2013166978 A JP2013166978 A JP 2013166978A
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steel sheet
plating layer
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JP5892806B2 (en
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Yasunori Hattori
保徳 服部
Shinya Furukawa
伸也 古川
Eiji Watanabe
栄次 渡辺
Takeshi Shimizu
剛 清水
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Nippon Steel Nisshin Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a surface treated steel sheet on which an anodic oxidation film having excellent insulation properties and uniformity in film thickness is formed by using a molten Al-based plated steel sheet containing Si and having good workability.SOLUTION: A surface treated steel sheet having good insulation properties is obtained by performing anodic oxidation treatment on a surface layer part of a plating layer of a molten Al-based plated steel sheet having an Si content in the plating layer of 3.0-15.0 mass%, and sequentially includes an Al-Fe-Si-based alloy layer, an Al-based plating layer, and the anodic oxidation film on the surface of a substrate steel sheet, wherein particles of an Si phase are dispersed in the Al-based plating layer and the anodic oxidation film, and the amount of the existing particles of the Si phase, whose length in the through-thickness direction in the Al-based plating layer and the anodic oxidation film in a cross-sectional surface parallel to the through-thickness direction is at least 10 μm, is controlled to be 100 pieces/mm or less per unit length in the direction parallel to the surface of the substrate steel sheet.

Description

本発明は、Al系めっき層の表層部に絶縁性に優れた陽極酸化皮膜を形成した絶縁性の良好な表面処理鋼板、およびその製造法に関する。   The present invention relates to a surface-treated steel sheet having good insulating properties in which an anodized film having excellent insulating properties is formed on the surface layer portion of an Al-based plating layer, and a method for producing the same.

AlまたはAl合金材料(以下「Al系材料」という)の表面処理として陽極酸化処理が知られている。陽極酸化処理によって形成された皮膜(陽極酸化皮膜)はAl23を主体とするものであり、Al系材料に耐食性、絶縁性、意匠性等を付与する手段として実用化されている。 Anodizing treatment is known as a surface treatment of Al or Al alloy material (hereinafter referred to as “Al-based material”). A film (anodized film) formed by anodizing treatment is mainly composed of Al 2 O 3 and has been put into practical use as a means for imparting corrosion resistance, insulating properties, design properties and the like to Al-based materials.

溶融Al系めっき鋼板のめっき層表層部に陽極酸化皮膜を形成する技術も知られている(特許文献1〜5)。溶融Al系めっき鋼板としては一般にSiを3〜15質量%程度含有するめっき浴を用いて製造されるものが多用される。Siを含有させることによりめっき浴温を下げることができるとともに、基材鋼板(めっき原板)の表面とAl系めっき層の間に生成する合金層の成長を抑制することができる。この合金層はめっき密着性を確保する上で重要な役割を果たす反面、脆いという欠点がある。Siを含有する溶融Al系めっき浴を用いると、めっき時に基材鋼板とめっき層の間に比較的薄いAl−Fe−Si系合金層が生成し、この種の合金層が脆いことに起因する溶融Al系めっき鋼板の加工性劣化が改善される。陽極酸化皮膜を形成するための溶融Al系めっき鋼板としても、従来、Siを含有するAl系めっき鋼板が適用されている(特許文献1〜5)。   Techniques for forming an anodized film on the surface layer portion of a molten Al-based plated steel sheet are also known (Patent Documents 1 to 5). As the hot-dip Al-based plated steel sheet, one manufactured using a plating bath containing about 3 to 15% by mass of Si is generally used. By containing Si, the plating bath temperature can be lowered, and the growth of the alloy layer formed between the surface of the base steel plate (plating original plate) and the Al-based plating layer can be suppressed. While this alloy layer plays an important role in securing plating adhesion, it has the disadvantage of being brittle. When a molten Al-based plating bath containing Si is used, a relatively thin Al-Fe-Si-based alloy layer is formed between the base steel plate and the plated layer during plating, and this type of alloy layer is brittle. The workability deterioration of the hot-dip Al-based plated steel sheet is improved. Conventionally, an Al-based plated steel sheet containing Si has been applied as a molten Al-based plated steel sheet for forming an anodized film (Patent Documents 1 to 5).

一方、Siを含有する溶融Al系めっきを施しためっき鋼板においても、その後に例えば500℃以上に加熱する工程に供される場合には、その加熱によって基材鋼板とAl系めっき層の間に介在するAl−Fe−Si系合金層が成長する。成長した合金層は曲げ加工を施す用途では加工性を損なう要因となり、問題となることがある。この問題を解消する手法として、特定量の固溶Nを含有させた基材鋼板を適用する技術が知られている(特許文6〜9)。   On the other hand, even in a plated steel sheet that has been subjected to hot-dip Al-based plating containing Si, when it is subsequently subjected to a process of heating to 500 ° C. or higher, for example, the heating causes a gap between the base steel sheet and the Al-based plating layer. The intervening Al—Fe—Si alloy layer grows. The grown alloy layer may be a factor that impairs workability in applications where bending is performed, which may be a problem. As a technique for solving this problem, a technique of applying a base steel sheet containing a specific amount of solute N is known (Patent Documents 6 to 9).

特開昭63−57795号公報Japanese Patent Laid-Open No. 63-57995 特開昭64−21094号公報Japanese Patent Laid-Open No. 64-21094 特開平1−263256号公報JP-A-1-263256 特開平3−104633号公報Japanese Patent Laid-Open No. 3-104633 特開平6−207262号公報JP-A-6-207262 特開昭58−224159号公報JP 58-224159 A 特開昭59−177355号公報JP 59-177355 A 特開昭61−52356号公報JP-A 61-52356 特開昭61−113754号公報JP 61-113754 A

上述のように、一般的に多用されている溶融Al系めっき鋼板はSiを3〜15質量%程度含有するAl系めっき浴を用いて製造されている。溶融めっき鋼板のめっき層組成はめっき浴組成をほぼ反映したものとなることから、一般的な溶融Al系めっき鋼板のめっき層中にはSiが3〜15質量%程度含まれている。   As described above, the generally used hot-dip Al-based plated steel sheet is manufactured using an Al-based plating bath containing about 3 to 15% by mass of Si. Since the plating layer composition of the hot-dip galvanized steel sheet substantially reflects the plating bath composition, the plating layer of a general hot-dip Al-based galvanized steel sheet contains about 3 to 15% by mass of Si.

図1に、Siを含有する一般的な溶融Al系めっき鋼板の断面構造を模式的に示す。基材鋼板1の表面上にAl−Fe−Si系合金層2を介してAl系めっき層3が形成されている。Al系めっき層3は素地がAl相であり、その中に針状の形態を有するSi相4の粒子が分布している。なお、Al系めっき層3中にはSi相4の他に少量のAl−Fe−Si相が混在する場合があるが、記載を省略してある。   FIG. 1 schematically shows a cross-sectional structure of a general molten Al-based plated steel sheet containing Si. An Al-based plating layer 3 is formed on the surface of the base steel plate 1 with an Al-Fe-Si-based alloy layer 2 interposed therebetween. The base of the Al-based plating layer 3 is an Al phase, and particles of an Si phase 4 having a needle shape are distributed therein. In addition, although a small amount of Al—Fe—Si phase may be mixed in addition to the Si phase 4 in the Al-based plating layer 3, the description is omitted.

図2に、図1のAl系めっき層の表面に陽極酸化処理を施した表面処理鋼板の断面構造を模式的に示す。陽極酸化処理によって元のAl系めっき層の上層部が陽極酸化皮膜5に変化している。すなわち、基材鋼板1の表面上にAl−Fe−Si系合金層2を介してAl系めっき層3(元のめっき層が残存した部分)および陽極酸化皮膜5が存在する。陽極酸化皮膜5は元のAl系めっき層の表面から深さ方向に細孔を形成しながら成長したものである。その際、元のAl系めっき層を構成するAl相の部分が溶解してAl23を主体とする酸化物質に置き換わっていくが、金属Si相は概ね元のままの形態を維持して陽極酸化皮膜5の内部にとどまる。 FIG. 2 schematically shows a cross-sectional structure of a surface-treated steel sheet in which the surface of the Al-based plating layer in FIG. The upper layer portion of the original Al plating layer is changed to the anodic oxide film 5 by the anodic oxidation treatment. That is, the Al-based plating layer 3 (the portion where the original plating layer remains) and the anodized film 5 are present on the surface of the base steel plate 1 via the Al-Fe-Si-based alloy layer 2. The anodized film 5 is grown while forming pores in the depth direction from the surface of the original Al-based plating layer. At that time, the portion of the Al phase constituting the original Al-based plating layer is dissolved and replaced with an oxidizing substance mainly composed of Al 2 O 3 , but the metal Si phase is generally maintained in its original form. It remains inside the anodized film 5.

発明者らの検討によると、めっき層中にSiを含有する溶融Al系めっき鋼板(以下「Si含有溶融Al系めっき鋼板」ということがある)の表面に形成した陽極酸化皮膜5は、アルミニウム製品の表面に形成した陽極酸化皮膜と比べ、絶縁性に劣ることがわかった。陽極酸化皮膜5の素地ともいえるAl23主体の酸化物質は絶縁性を有するが、その中に存在するSi相は導電性を有する。陽極酸化皮膜5の内部には下層のAl系めっき層3との境界を跨ぐSi相4の粒子が多く存在する。境界を跨ぐSi相4の粒子のなかには、図2中に符号aを付した粒子のように、陽極酸化皮膜5の表面近くに先端が位置するものも存在する。そのようなSi相粒子は陽極酸化皮膜5の表面付近とAl系めっき層3の間の電気抵抗を低減させ、陽極酸化皮膜5の絶縁性を劣化させる要因となる。 According to the study by the inventors, the anodic oxide film 5 formed on the surface of a molten Al-based plated steel sheet containing Si in the plating layer (hereinafter sometimes referred to as “Si-containing molten Al-based plated steel sheet”) is an aluminum product. As compared with the anodic oxide film formed on the surface, it was found that the insulating property was inferior. The Al 2 O 3 based oxide material which can be said to be the base of the anodic oxide film 5 has an insulating property, but the Si phase present therein has a conductivity. Inside the anodized film 5, there are many Si phase 4 particles straddling the boundary with the lower Al-based plating layer 3. Among the particles of the Si phase 4 straddling the boundary, there are particles having a tip located near the surface of the anodic oxide film 5, such as particles denoted by a in FIG. 2. Such Si phase particles reduce the electrical resistance between the vicinity of the surface of the anodic oxide film 5 and the Al-based plating layer 3 and become a factor of deteriorating the insulating properties of the anodic oxide film 5.

また、Si含有溶融Al系めっき鋼板のAl系めっき層の中に存在する針状のSi相は、均一な厚さの陽極酸化皮膜を安定して形成させる上でも障害となりやすい。めっき層の表面付近に先端が位置するSi相は陽極酸化処理時に局所的な電流集中を招き、陽極酸化皮膜を不均一に成長させる要因となる。   In addition, the needle-like Si phase present in the Al-based plating layer of the Si-containing hot-dip Al-plated steel sheet tends to be an obstacle to stably forming an anodic oxide film having a uniform thickness. The Si phase whose tip is located near the surface of the plating layer causes local current concentration during the anodizing treatment, and causes an anodic oxide film to grow unevenly.

図3に、図1のAl系めっき層の表面に陽極酸化処理を施した際に陽極酸化皮膜が不均一に成長した場合の断面構造を模式的に示す。電流が集中した箇所では陽極酸化皮膜5が急速に成長し、早期にAl−Fe−Si系合金層2にまで達することもある。Al系めっき層3が消失した箇所では下地の基材鋼板1が浸食されやすくなり、耐食性低下や陽極酸化皮膜5の密着性低下を招く恐れがある。   FIG. 3 schematically shows a cross-sectional structure when the anodized film grows unevenly when the surface of the Al-based plating layer in FIG. 1 is anodized. The anodic oxide film 5 grows rapidly at the location where the current is concentrated, and may reach the Al—Fe—Si alloy layer 2 at an early stage. Where the Al-based plating layer 3 has disappeared, the underlying base steel plate 1 is likely to be eroded, which may lead to a decrease in corrosion resistance and a decrease in the adhesion of the anodized film 5.

昨今、太陽電池基板など絶縁性が要求される基板材料として、従来のセラミックスやガラス材料に代わり柔軟性を有する金属ベースの材料を使用したいというニーズが高まっている。Al系材料は絶縁性を有する陽極酸化皮膜を形成させることができるので、上記基板材料となりうるが、素材コスト、強度、熱膨張係数等を考慮するとAl系材料よりも鋼材をベースとした溶融Al系めっき鋼板を使用することが有利となる場合が多い。ただし、従来一般的なSi含有溶融Al系めっき鋼板はめっき層中に上述のSi相が存在するために、その上層部に形成した陽極酸化皮膜は絶縁性に劣る。また、陽極酸化条件によっては皮膜厚さの均一性や皮膜密着性が損なわれやすいという問題がある。Siを含有しない純Al浴を用いた溶融Alめっき鋼板は脆いAl−Fe系合金層が成長しやすく、加工性が悪い。一方、鋼板表面に純Alシートをクラッド圧延にて接合したクラッド材を使用すれば、その表面に形成される陽極酸化皮膜に高い絶縁性を期待することができる。しかし、クラッド材は生産性やコスト面で溶融Al系めっき鋼板に及ばない。   Recently, there is an increasing need to use a metal-based material having flexibility instead of a conventional ceramic or glass material as a substrate material that requires insulation, such as a solar cell substrate. An Al-based material can form an insulating anodic oxide film, and thus can be the above-mentioned substrate material. However, in consideration of material cost, strength, thermal expansion coefficient, etc., molten Al based on a steel material rather than an Al-based material. It is often advantageous to use a galvanized steel sheet. However, since a conventional Si-containing hot-dip Al-based plated steel sheet has the above-described Si phase in the plating layer, the anodized film formed on the upper layer portion is inferior in insulation. Further, depending on the anodizing conditions, there is a problem that uniformity of film thickness and film adhesion are liable to be impaired. A hot-dip Al-plated steel sheet using a pure Al bath containing no Si is liable to grow a brittle Al—Fe-based alloy layer and has poor workability. On the other hand, if a clad material obtained by joining a pure Al sheet to the steel plate surface by clad rolling is used, high insulation can be expected for the anodized film formed on the surface. However, the cladding material does not reach the hot-dip Al-based plated steel sheet in terms of productivity and cost.

本発明はこのような現状に鑑み、Siを含有する加工性の良い溶融Al系めっき鋼板を用いて、絶縁性および皮膜厚さの均一性に優れた陽極酸化皮膜を形成した表面処理鋼板を提供しようというものである。   In view of the present situation, the present invention provides a surface-treated steel sheet in which an anodized film excellent in insulation and film thickness uniformity is formed using a hot-worked Al-based plated steel sheet containing Si. It is to try.

上記目的は、溶融Al系めっき層中に存在するSi相の粒子を熱処理により所定形状に球状化した溶融Al系めっき鋼板に陽極酸化処理を施すことによって実現できる。   The above object can be realized by subjecting the molten Al-based plated steel sheet obtained by spheroidizing the Si phase particles present in the molten Al-based plated layer to a predetermined shape by heat treatment.

すなわち本発明では、めっき層中のSi含有量が3.0〜15.0質量%である溶融Al系めっき鋼板の当該めっき層表層部を陽極酸化処理した表面処理鋼板であって、基材鋼板の表面に、Al−Fe−Si系合金層、Al系めっき層および陽極酸化皮膜を順次有し、Al系めっき層および陽極酸化皮膜中にはSi相の粒子が分散しており、板厚方向に平行な断面においてAl系めっき層および陽極酸化皮膜中の板厚方向長さが10μm以上であるSi相粒子の存在量が基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整されている絶縁性の良好な表面処理鋼板が提供される。   That is, in the present invention, a surface-treated steel sheet obtained by anodizing the surface layer portion of a hot-dip Al-based plated steel sheet having a Si content of 3.0 to 15.0% by mass, On the surface, an Al—Fe—Si alloy layer, an Al plating layer, and an anodic oxide film are sequentially provided. In the Al plating layer and the anodic oxide film, Si phase particles are dispersed, and the thickness direction The abundance of Si-phase particles having a plate thickness direction length of 10 μm or more in the Al-based plating layer and the anodized film in a cross section parallel to the surface is 100 particles / mm or less per unit length in the direction parallel to the substrate steel plate surface. Provided is a surface-treated steel sheet that is adjusted and has good insulation properties.

前記Al系めっき層は、例えば質量%でSi:3.0〜15.0%、Sr:0〜0.2%、Na:0〜0.1%、Ca:0〜0.1%、Sb:0〜0.6%、P:0〜0.2%、Mg:0〜5.0%、Cr:0〜1.0%、Mn:0〜2.0%、Ti:0〜0.5%、Zr:0〜0.5%、V:0〜0.5%、B:0〜0.10%、残部Alおよび不可避的不純物からなる組成を有するものである。   The Al-based plating layer is, for example, in terms of mass%, Si: 3.0 to 15.0%, Sr: 0 to 0.2%, Na: 0 to 0.1%, Ca: 0 to 0.1%, Sb. : 0 to 0.6%, P: 0 to 0.2%, Mg: 0 to 5.0%, Cr: 0 to 1.0%, Mn: 0 to 2.0%, Ti: 0 to 0.0. 5%, Zr: 0 to 0.5%, V: 0 to 0.5%, B: 0 to 0.10%, the balance Al and inevitable impurities.

前記基材鋼板として、特にN含有量が0.002〜0.020質量%である鋼板を使用することによって、基材鋼板とAl−Fe−Si系合金層の間にAlNが析出した状態とすることができる。これにより、例えば半導体層の成膜工程などで500℃以上の昇温を伴う場合であっても、Al−Fe−Si系合金層の成長を顕著に抑制することができる。   In particular, by using a steel plate having an N content of 0.002 to 0.020 mass% as the base steel plate, AlN is precipitated between the base steel plate and the Al—Fe—Si alloy layer. can do. Thereby, even if it is a case where a temperature rise of 500 ° C. or more is involved in, for example, a semiconductor layer deposition process, the growth of the Al—Fe—Si based alloy layer can be remarkably suppressed.

上記の絶縁性の良好な表面処理鋼板の製造法として、
前記の組成を有する溶融Al系めっき浴を用いて基材鋼板の表面にAl−Fe−Si系合金層を介するAl系めっき層を形成する工程、
前記Al系めっき層を形成した鋼板を加熱温度250〜570℃、保持時間0.5〜50hの条件範囲で加熱処理することにより、Al系めっき層中に存在するSi相を球状化し、板厚方向に平行な断面において板厚方向長さが10μm以上であるSi相粒子の存在量を基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整する工程、
前記加熱処理後のAl系めっき層を陽極酸化処理することにより陽極酸化皮膜を形成する工程、
を有する製造法が提供される。
As a manufacturing method of the above surface-treated steel sheet with good insulation,
Forming an Al-based plating layer via an Al-Fe-Si-based alloy layer on the surface of the base steel sheet using a molten Al-based plating bath having the above composition;
By heat-treating the steel sheet on which the Al-based plating layer is formed under the conditions of a heating temperature of 250 to 570 ° C. and a holding time of 0.5 to 50 h, the Si phase present in the Al-based plating layer is spheroidized, and the plate thickness A step of adjusting the abundance of Si phase particles having a plate thickness direction length of 10 μm or more in a cross section parallel to the direction to 100 particles / mm or less per unit length in the direction parallel to the substrate steel plate surface;
Forming an anodized film by anodizing the Al-based plating layer after the heat treatment;
A manufacturing method is provided.

その際、基材鋼板としてN含有量が0.002〜0.020質量%である鋼板を使用し、前記加熱処理を利用して基材鋼板とAl−Fe−Si系合金層の間にAlNを析出させることができる。   At that time, a steel plate having an N content of 0.002 to 0.020 mass% is used as the base steel plate, and AlN is formed between the base steel plate and the Al—Fe—Si alloy layer using the heat treatment. Can be deposited.

本発明によれば、Siを含有する従来一般的な溶融Al系めっき浴を用いて製造される溶融Al系めっき鋼板を素材に用いて、絶縁性に優れた陽極酸化皮膜を安定して形成させることが可能となった。その陽極酸化皮膜を形成した材料は柔軟性を有する各種基板材料として有用である。また、基材鋼板として所定量の固溶Nを含有するものを使用することにより、例えば半導体層の成膜工程などで500℃以上の昇温を伴う用途に適用しても、Al−Fe−Si系合金層の成長を顕著に抑制することができ、良好な加工性・柔軟性が維持される。   According to the present invention, an anodized film excellent in insulation is stably formed using a molten Al-based plated steel sheet produced using a conventional general molten Al-based plating bath containing Si as a material. It became possible. The material on which the anodized film is formed is useful as a flexible substrate material. Moreover, even if it applies to the use with a temperature rise of 500 degreeC or more by the film-forming process of a semiconductor layer etc. by using what contains a predetermined amount of solid solution N as a base-material steel plate, Al-Fe- The growth of the Si-based alloy layer can be remarkably suppressed, and good workability and flexibility are maintained.

Siを含有する一般的な溶融Al系めっき鋼板の断面構造を模式的に示す図。The figure which shows typically the cross-sectional structure of the general hot dip Al system plating steel plate containing Si. 図1のAl系めっき層の表面に陽極酸化処理を施した表面処理鋼板の断面構造を模式的に示す図。The figure which shows typically the cross-section of the surface treatment steel plate which performed the anodizing process on the surface of the Al-type plating layer of FIG. 図1のAl系めっき層の表面に陽極酸化処理を施した際に陽極酸化皮膜が不均一に成長した場合の断面構造を模式的に示す図。The figure which shows typically the cross-sectional structure when the anodized film grows nonuniformly when anodizing is performed on the surface of the Al-based plating layer of FIG. めっき層中のSi相粒子の形態が所定形状に調整された溶融Al系めっき鋼板の断面構造を模式的に示す図。The figure which shows typically the cross-section of the hot-dip Al type plated steel plate in which the form of the Si phase particle in a plating layer was adjusted to the predetermined shape. 図4のAl系めっき層の表面に陽極酸化処理を施した本発明に従う表面処理鋼板の断面構造を模式的に示す図。The figure which shows typically the cross-section of the surface treatment steel plate according to this invention which performed the anodizing process on the surface of the Al type plating layer of FIG. 基材鋼板としてN含有量が0.002〜0.020質量%である鋼板を使用し、基材鋼板とAl−Fe−Si系合金層の間にAlNが析出しているタイプの溶融Al系めっき鋼板の断面構造を模式的に示す図。A molten Al-based type in which a steel sheet having an N content of 0.002 to 0.020 mass% is used as the base steel sheet, and AlN is precipitated between the base steel sheet and the Al-Fe-Si alloy layer. The figure which shows typically the cross-section of a plated steel plate. 図6のAl系めっき層の表面に陽極酸化処理を施した本発明に従う表面処理鋼板の断面構造を模式的に示す図。The figure which shows typically the cross-section of the surface treatment steel plate according to this invention which performed the anodizing process on the surface of the Al type plating layer of FIG. 従来一般的なSi含有溶融Alめっき鋼板に陽極酸化処理を施した表面処理鋼板の断面組織写真。The cross-sectional structure photograph of the surface-treated steel sheet which anodized the conventional general Si containing hot-dip Al plating steel sheet. 従来一般的なSi含有溶融Alめっき鋼板に陽極酸化処理を施した表面処理鋼板の断面組織写真。The cross-sectional structure photograph of the surface-treated steel sheet which anodized the conventional general Si containing hot-dip Al plating steel sheet. Si相が球状化された溶融Al系めっき鋼板に陽極酸化処理を施した本発明に従う表面処理鋼板の断面組織写真。The cross-section structure | tissue photograph of the surface treatment steel plate according to this invention which performed the anodic oxidation process to the hot-dip Al type plated steel plate in which the Si phase was spheroidized. Si相が球状化された溶融Al系めっき鋼板に陽極酸化処理を施した本発明に従う表面処理鋼板の断面組織写真。The cross-section structure | tissue photograph of the surface treatment steel plate according to this invention which performed the anodic oxidation process to the hot-dip Al type plated steel plate in which the Si phase was spheroidized. 従来一般的なSi含有溶融Alめっき鋼板に陽極酸化処理を施した際に陽極酸化皮膜が不均一に成長した部分の断面組織写真。The cross-sectional structure | tissue photograph of the part which the anodic oxide film grew non-uniformly when anodizing was performed to the conventional general Si containing hot-dip Al plating steel plate. 従来一般的なSi含有溶融Alめっき鋼板に陽極酸化処理を施した際に陽極酸化皮膜が不均一に成長し、基材鋼板まで溶解した部分の断面組織写真。The cross-sectional structure | tissue photograph of the part which the anodic oxide film grew nonuniformly and it melt | dissolved even to the base-material steel plate when anodizing was performed to the conventional general Si containing hot-dip Al plating steel plate. Si相が球状化された溶融Al系めっき鋼板に図13と同様に15minの陽極酸化処理を試みた場合の断面組織写真。FIG. 14 is a cross-sectional structure photograph when an anodizing treatment of 15 min is attempted on a molten Al-based plated steel sheet having a spheroidized Si phase as in FIG. 13. 陽極酸化皮膜の絶縁破壊電圧を測定するための回路構成を示す図。The figure which shows the circuit structure for measuring the dielectric breakdown voltage of an anodized film.

〔断面構造〕
図4に、めっき層中のSi相粒子の形態が所定形状に調整された、本発明に適用可能な溶融Al系めっき鋼板の断面構造を模式的に示す。基材鋼板1の表面上にAl−Fe−Si系合金層2を介してAl系めっき層3を有している点は図1に示した従来一般的な溶融Al系めっき鋼板と同様である。しかし、Al系めっき層3の中に分散しているSi相4の粒子形態が相違する。本発明に従うもの(図4)はSi相4の粒子が球状化しており、個々のSi相4の粒子について図中にdtと示した板厚方向長さを測定したとき、当該板厚方向長さdtが10μm以上と長い粒子の存在量が、板厚方向に平行な断面において基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整されている。前記存在量は、図4に例示したような板厚方向に平行な断面について、基材鋼板1の表面に平行な方向に1000μm以上の長さに渡ってめっき層3の全厚さ内を測定することによって求めることができる。Al系めっき層3の平均厚さは10μm超えとすることが望ましく、15μm以上に管理してもよい。Al系めっき層3が薄過ぎると、陽極酸化処理においてAlめっき層3を十分に残したまま安定して絶縁性に優れた陽極酸化皮膜を形成することが難しくなる場合がある。
[Cross-section structure]
FIG. 4 schematically shows a cross-sectional structure of a hot-dip Al-based plated steel sheet applicable to the present invention in which the form of Si phase particles in the plating layer is adjusted to a predetermined shape. The point which has the Al type plating layer 3 on the surface of the base-material steel plate 1 through the Al-Fe-Si type alloy layer 2 is the same as that of the conventional general hot-dip Al type plating steel plate shown in FIG. . However, the particle form of the Si phase 4 dispersed in the Al-based plating layer 3 is different. According to the present invention (FIG. 4), the Si phase 4 particles are spheroidized, and when the length in the plate thickness direction indicated by dt in the drawing is measured for each Si phase 4 particle, The abundance of particles having a length dt of 10 μm or more is adjusted to 100 particles / mm or less per unit length in the direction parallel to the surface of the base steel plate in a cross section parallel to the plate thickness direction. The abundance is measured within the entire thickness of the plating layer 3 over a length of 1000 μm or more in a direction parallel to the surface of the base steel plate 1 with respect to a cross section parallel to the plate thickness direction as illustrated in FIG. You can ask for it. The average thickness of the Al-based plating layer 3 is preferably more than 10 μm, and may be controlled to 15 μm or more. If the Al-based plating layer 3 is too thin, it may be difficult to form an anodized film that is stable and excellent in insulating properties while leaving the Al plating layer 3 sufficiently in the anodizing process.

図5に、図4のAl系めっき層の表面に陽極酸化処理を施した本発明に従う表面処理鋼板の断面構造を模式的に示す。図2の場合と同様に、陽極酸化処理によって元のAl系めっき層の上層部が陽極酸化皮膜5に変化し、基材鋼板1の表面上にAl−Fe−Si系合金層2を介してAl系めっき層3(元のめっき層が残存した部分)および陽極酸化皮膜5が存在する。前述のように、陽極酸化皮膜5は元のAl系めっき層の表面から深さ方向に細孔を形成しながら成長したものであり、元のAl系めっき層を構成するAl相の部分が溶解してAl23を主体とする酸化物質に置き換わっていくが、Si相は概ね元のままの形態を維持して陽極酸化皮膜5の内部にとどまる。 FIG. 5 schematically shows a cross-sectional structure of a surface-treated steel sheet according to the present invention in which the surface of the Al-based plating layer in FIG. 4 is anodized. As in the case of FIG. 2, the upper layer portion of the original Al-based plating layer is changed to the anodized film 5 by the anodizing treatment, and the Al—Fe—Si-based alloy layer 2 is interposed on the surface of the base steel plate 1. Al-based plating layer 3 (portion where the original plating layer remains) and anodic oxide film 5 are present. As described above, the anodic oxide film 5 is grown while forming pores in the depth direction from the surface of the original Al-based plating layer, and the portion of the Al phase constituting the original Al-based plating layer is dissolved. As a result, it is replaced by an oxide substance mainly composed of Al 2 O 3 , but the Si phase remains in the anodic oxide film 5 while maintaining its original form.

陽極酸化皮膜5の平均厚さは、絶縁目的の場合、5μm以上とすることが望ましい。10μm以上とすることがより効果的である。ただし、陽極酸化処理時にAl系めっき層3が消失する箇所が生じると、その部分で下地の基材鋼板1が溶解する恐れがあるので、残存するAl系めっき層3の平均厚さは5μm以上を確保することが望ましい。   The average thickness of the anodized film 5 is desirably 5 μm or more for the purpose of insulation. It is more effective to set it to 10 μm or more. However, if a portion where the Al-based plating layer 3 disappears during the anodizing treatment occurs, the underlying base steel plate 1 may be dissolved at that portion, so the average thickness of the remaining Al-based plating layer 3 is 5 μm or more. It is desirable to ensure.

Si相4の粒子は球状化されて板厚方向長さdtが短くなっている。陽極酸化皮膜5とAl系めっき層3との境界を跨ぐSi相粒子も存在するが、それらの粒子のうち先端が陽極酸化皮膜5の表面付近にまで届くもの(すなわち陽極酸化皮膜5の厚さ方向の絶縁性低下要因となりやすいSi相粒子)は非常に少ない。このため、従来のSi含有溶融Al系めっき鋼板を使用した図2の場合と比べ、陽極酸化皮膜5の厚さ方向への絶縁性は高く維持される。 The particles of the Si phase 4 are spheroidized to shorten the plate thickness direction length d t . There are Si phase particles that straddle the boundary between the anodic oxide coating 5 and the Al-based plating layer 3, but among these particles, the tip reaches the vicinity of the surface of the anodic oxide coating 5 (that is, the thickness of the anodic oxide coating 5. There are very few Si phase particles) that are likely to be a cause of lowering the insulation in the direction. For this reason, the insulation in the thickness direction of the anodic oxide film 5 is maintained high compared to the case of FIG.

陽極酸化処理後にAl系めっき層および陽極酸化皮膜中に存在するSi相粒子は、概ね元の形態を維持していると見てよい。したがって、陽極酸化処理後においてAl系めっき層および陽極酸化皮膜中の板厚方向長さdtが10μm以上であるSi相粒子の存在量が基材鋼板表面に平行方向の単位長さあたり100個/mm以下である表面処理鋼板を得るためには、陽極酸化処理前のAl系めっき鋼板として、Al系めっき層中の板厚方向長さdtが10μm以上であるSi相粒子の存在量が基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整されたものを使用すればよい。なお、陽極酸化処理後における前記Si相粒子の存在量は、図5に例示したような板厚方向に平行な断面について、基材鋼板1の表面に平行な方向に1000μm以上の長さに渡ってAl系めっき層3および陽極酸化皮膜5の全厚さ内を測定することによって求めることができる。 It can be considered that the Si phase particles present in the Al-based plating layer and the anodized film after the anodizing treatment generally maintain the original form. Therefore, after the anodizing treatment, the abundance of Si-phase particles having a plate thickness direction length dt of 10 μm or more in the Al-based plating layer and the anodized film is 100 per unit length in the direction parallel to the substrate steel plate surface. In order to obtain a surface-treated steel sheet having a thickness of / mm or less, as the Al-plated steel sheet before the anodizing treatment, the abundance of Si phase particles having a thickness direction length dt of 10 μm or more in the Al-based plated layer is What is necessary is just to use what was adjusted to 100 pieces / mm or less per unit length of a parallel direction on the base-material steel plate surface. The abundance of the Si phase particles after the anodic oxidation treatment extends over a length of 1000 μm or more in the direction parallel to the surface of the base steel plate 1 in the cross section parallel to the plate thickness direction as illustrated in FIG. The total thickness of the Al-based plating layer 3 and the anodic oxide film 5 can be measured.

Al系めっき層および陽極酸化皮膜中に存在するSi相粒子のサイズが上述のように適正化されている表面処理鋼板の陽極酸化皮膜5は、優れた絶縁性を発揮することがわかった。陽極酸化皮膜5の平均厚さは10μm以上であることが好ましいが、陽極酸化皮膜5の平均厚さが5μm程度であっても、dtが10μm以上であるSi相粒子の存在量が100個/mm以下となるようにSi相4の粒子が球状化されていれば、従来のSi含有溶融Al系めっき鋼板を使用した場合と比べ絶縁性は大きく向上する。Si相粒子の球状化は溶融Al系めっき後に後述の熱処理を施すことによって実現できる。 It has been found that the anodized film 5 of the surface-treated steel sheet in which the size of the Si phase particles existing in the Al-based plating layer and the anodized film is optimized as described above exhibits excellent insulating properties. The average thickness of the anodic oxide film 5 is preferably 10 μm or more, but even if the average thickness of the anodic oxide film 5 is about 5 μm, the abundance of Si phase particles having dt of 10 μm or more is 100. If the particles of the Si phase 4 are spheroidized so as to be equal to or less than / mm, the insulation is greatly improved as compared with the case of using a conventional Si-containing hot-dip Al-based steel sheet. The spheroidization of the Si phase particles can be realized by performing a heat treatment described later after the molten Al-based plating.

図6に、基材鋼板としてN含有量が0.002〜0.020質量%である鋼板を使用し、基材鋼板とAl−Fe−Si系合金層の間にAlNが析出しているタイプの、本発明に適用可能な溶融Al系めっき鋼板の断面構造を模式的に示す。基材鋼板1とAl−Fe−Si系合金層2の間にAlN濃化帯6が存在する。このAlN濃化帯6はSi相4を球状化させるための加熱処理を利用して生成させることができる。AlN濃化帯6の存在はTEMによる電子線回折やEDX等の分析手法により確認することができる。   In FIG. 6, a steel sheet having an N content of 0.002 to 0.020 mass% is used as the base steel sheet, and AlN is precipitated between the base steel sheet and the Al—Fe—Si based alloy layer. The cross-sectional structure of the hot-dip Al type plated steel plate applicable to this invention is shown typically. An AlN enriched zone 6 exists between the base steel plate 1 and the Al—Fe—Si alloy layer 2. The AlN enriched zone 6 can be generated using heat treatment for spheroidizing the Si phase 4. The presence of the AlN concentrated zone 6 can be confirmed by an electron beam diffraction by TEM, an analysis method such as EDX, or the like.

図7に、図6のAl系めっき層の表面に陽極酸化処理を施した本発明に従う表面処理鋼板の断面構造を模式的に示す。基材鋼板1とAl−Fe−Si系合金層2の間にAlN濃化帯6が存在すること以外は図5と同様の組織状態を有する。AlN濃化帯6は、その後に当該鋼板を500℃程度以上の温度に加熱処理した際に基材鋼板1中のFeとAl系めっき層3中のAl、Siが反応することを抑制するバリアとして機能し、脆いAl−Fe−Si合金層2の成長を抑止する。したがって、陽極酸化皮膜5の上に半導体層等を500℃程度以上の高温で成膜する必要があるときなどに、Al−Fe−Si合金層2の過剰な成長が防止され、基板としての変形能低下を抑制することができる。AlN濃化帯6を有するタイプの本発明に従う表面処理鋼板は、基板の柔軟性が要求されるデバイスに適している。   FIG. 7 schematically shows a cross-sectional structure of a surface-treated steel sheet according to the present invention in which the surface of the Al-based plating layer in FIG. 6 is anodized. Except for the presence of the AlN enriched band 6 between the base steel plate 1 and the Al—Fe—Si based alloy layer 2, the structure is the same as in FIG. 5. The AlN concentration band 6 is a barrier that suppresses the reaction of Fe in the base steel sheet 1 with Al and Si in the Al-based plating layer 3 when the steel sheet is subsequently heat-treated at a temperature of about 500 ° C. or higher. And inhibits the growth of the brittle Al—Fe—Si alloy layer 2. Therefore, when it is necessary to form a semiconductor layer or the like on the anodized film 5 at a high temperature of about 500 ° C. or higher, excessive growth of the Al—Fe—Si alloy layer 2 is prevented, and deformation as a substrate is prevented. Performance degradation can be suppressed. The surface-treated steel sheet according to the present invention of the type having the AlN concentrated band 6 is suitable for a device that requires flexibility of the substrate.

〔基材鋼板の組成〕
基材鋼板としては、従来から溶融Al系めっき鋼板のめっき原板として適用されている鋼種をはじめ、用途に応じて種々の鋼種が対象となる。耐食性を重視する用途ではステンレス鋼を適用すればよい。ただし、成膜基板に用いる場合は熱膨張係数の観点からオーステナイト系ステンレス鋼よりフェライト系ステンレス鋼の方が有利となる。なお、上述のAlN濃化帯によるAl−Fe−Si合金層の成長抑制効果を期待する場合には、N含有量が0.002〜0.020質量%である鋼板を使用する。これよりN含有量が少ないとAl系めっき層中のSi相を球状化させるための熱処理によってAlN濃化帯を十分に形成することが難しい。逆にN含有量が過剰になると鋼が硬質化するので好ましくない。
[Composition of base steel sheet]
As the base steel plate, various steel types are used depending on the purpose, including steel types that have been conventionally applied as a plating base plate of a molten Al-based plated steel plate. Stainless steel may be used for applications that place importance on corrosion resistance. However, when used for a film formation substrate, ferritic stainless steel is more advantageous than austenitic stainless steel from the viewpoint of thermal expansion coefficient. In addition, when expecting the growth inhibitory effect of the Al-Fe-Si alloy layer by the above-mentioned AlN concentration zone, the steel plate whose N content is 0.002-0.020 mass% is used. If the N content is less than this, it is difficult to sufficiently form an AlN concentrated band by heat treatment for spheroidizing the Si phase in the Al-based plating layer. Conversely, if the N content is excessive, the steel becomes hard, which is not preferable.

〔Al系めっきの組成〕
本発明で適用対象とする溶融Al系めっき鋼板は、めっき層中のSi含有量が3.0〜15.0質量%のものである。溶融Al系めっき浴の組成は概ねそのまま溶融Al系めっき層の組成に反映される。Si含有量が少なすぎると溶融めっき時に形成されるAl−Fe(−Si)系合金層が厚くなりやすく、加工時にAl−Fe(−Si)系合金層の部分で割れが生じやすくなる。また、Si添加によるAl系めっき浴の液相線温度の低下効果が少なくなり、めっき浴温を高く維持するためのコストが増大する。一方、Si含有量が多くなりすぎると、共晶組成を超えて再び液相線温度が高くなるとともに、Si相が初晶として粗大化してめっき層自体の加工性を損なう。Al系めっき層中のSi含有量は5.0〜13.0質量%とすることがより好ましい。
[Composition of Al plating]
The hot-dip Al-based plated steel sheet to be applied in the present invention has a Si content in the plating layer of 3.0 to 15.0% by mass. The composition of the molten Al-based plating bath is generally reflected in the composition of the molten Al-based plating layer as it is. If the Si content is too small, the Al—Fe (—Si) -based alloy layer formed at the time of hot dipping is likely to be thick, and cracks are likely to occur in the Al—Fe (—Si) -based alloy layer during processing. Further, the effect of lowering the liquidus temperature of the Al-based plating bath due to the addition of Si is reduced, and the cost for maintaining the plating bath temperature high is increased. On the other hand, when the Si content is excessively high, the liquidus temperature is increased again exceeding the eutectic composition, and the Si phase is coarsened as an initial crystal to impair the workability of the plating layer itself. The Si content in the Al-based plating layer is more preferably 5.0 to 13.0% by mass.

溶融Al系めっき浴にはSiを上述の範囲で含有させる。ただし、浴中にはめっき原板である鋼板やポットの構成部材などからFeが不可避的に混入してくる。Feの混入量は3.0質量%まで許容される。めっき浴には必要に応じてSi以外の元素を含有させてもよい。例えば、質量%でSi:3.0〜15.0%、Sr:0〜0.2%、Na:0〜0.1%、Ca:0〜0.1%、Sb:0〜0.6%、P:0〜0.2%、Mg:0〜5.0%、Cr:0〜1.0%、Mn:0〜2.0%、Ti:0〜0.5%、Zr:0〜0.5%、V:0〜0.5%、B:0〜0.10%、残部Alおよび不可避的不純物からなる組成とすることができる。Sr、Na、Ca、Sb、P、Mg、Cr、Mn、Ti、Zr、V、Bは任意添加元素であり、それらの1種以上を含有させる場合は、Sr:0.005〜0.2%、Na:0.005〜0.1%、Ca:0.005〜0.1%、Sb:0.005〜0.6%、P:0.005〜0.2%、Mg:0.05〜5.0%、Cr:0.05〜1.0%、Mn:0.05〜2.0%、Ti:0.005〜0.5%、Zr:0.05〜0.5%、V:0.05〜0.5%、B:0.005〜0.10%の含有量を確保することがより効果的である。また、Mgは1.0質量%以下、Mnは1.0質量%以下の範囲にそれぞれ管理してもよい。上記の元素のうちSr、Na、Ca、Sb、Pはめっき層中のSi相粒子を微細化する作用を有する。   The molten Al-based plating bath contains Si in the above range. However, Fe is inevitably mixed in the bath from a steel plate as a plating original plate, a constituent member of a pot, or the like. The mixing amount of Fe is allowed up to 3.0% by mass. The plating bath may contain elements other than Si as necessary. For example, in mass%, Si: 3.0 to 15.0%, Sr: 0 to 0.2%, Na: 0 to 0.1%, Ca: 0 to 0.1%, Sb: 0 to 0.6 %, P: 0 to 0.2%, Mg: 0 to 5.0%, Cr: 0 to 1.0%, Mn: 0 to 2.0%, Ti: 0 to 0.5%, Zr: 0 It can be set as a composition which consists of -0.5%, V: 0-0.5%, B: 0-0.10%, remainder Al and an unavoidable impurity. Sr, Na, Ca, Sb, P, Mg, Cr, Mn, Ti, Zr, V, and B are optional additive elements. When one or more of these elements are contained, Sr: 0.005 to 0.2 %, Na: 0.005 to 0.1%, Ca: 0.005 to 0.1%, Sb: 0.005 to 0.6%, P: 0.005 to 0.2%, Mg: 0.00. 05-5.0%, Cr: 0.05-1.0%, Mn: 0.05-2.0%, Ti: 0.005-0.5%, Zr: 0.05-0.5% , V: 0.05-0.5%, B: 0.005-0.10%, it is more effective to secure the content. Further, Mg may be managed within a range of 1.0 mass% or less, and Mn may be managed within a range of 1.0 mass% or less. Of the above elements, Sr, Na, Ca, Sb, and P have the effect of refining the Si phase particles in the plating layer.

〔製造方法〕
素材となるSi含有溶融Al系めっき鋼板は従来一般的な手法により得ることができる。溶融Al系めっき浴中のSi含有量は上述のように3.0〜15.0質量%とし、必要に応じてSr、Na、Ca、Sb、P、Mg、Cr、Mn、Ti、Zr、V、Bの1種以上を上記の範囲で含有させる。陽極酸化処理を施す側のめっき付着量(めっき層平均厚さ)は10μm超えとすることが望ましく、15μm以上に管理してもよい。
〔Production method〕
The Si-containing molten Al-based plated steel sheet as a raw material can be obtained by a conventional general method. The Si content in the molten Al-based plating bath is 3.0 to 15.0% by mass as described above, and Sr, Na, Ca, Sb, P, Mg, Cr, Mn, Ti, Zr, as necessary. One or more of V and B are contained in the above range. The plating adhesion amount (plating layer average thickness) on the side subjected to the anodizing treatment is preferably more than 10 μm, and may be controlled to 15 μm or more.

得られたSi含有溶融Al系めっき鋼板のAl系めっき層中には図1に示したように針状のSi相が存在し、このままでは絶縁性に優れた陽極酸化皮膜を安定的に形成することが難しい。そこで、溶融Al系めっき鋼板を加熱処理し、Si相を球状化させる。所定量のNを含有する基材鋼板を用いた場合、この加熱処理によって上述のAlN濃化帯の形成も同時に行うことができる。   As shown in FIG. 1, an acicular Si phase is present in the Al-based plated layer of the obtained Si-containing hot-dip Al-plated steel sheet, and an anodic oxide film excellent in insulation can be stably formed as it is. It is difficult. Therefore, the molten Al-based plated steel sheet is heat treated to spheroidize the Si phase. When a base steel plate containing a predetermined amount of N is used, the above-described AlN enriched zone can be formed simultaneously by this heat treatment.

この加熱処理では、板厚方向に平行な断面において板厚方向長さが10μm以上であるSi相粒子の存在量を基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整することが重要である。めっき層中のSi含有量や溶融めっき条件の相違により、最適な加熱条件は多少変動するが、発明者らの検討によれば、加熱温度250〜570℃、保持時間0.5〜50hの範囲内で加熱条件を設定することができる。実際には予備実験によりSi含有量および溶融めっき条件に応じた適正な加熱条件範囲を把握しておけばよい。AlN濃化帯の形成を同時に行う場合も、上記加熱温度・保持時間の範囲内において適正な加熱条件を見出すことが可能である。   In this heat treatment, the abundance of Si phase particles having a plate thickness direction length of 10 μm or more in a cross section parallel to the plate thickness direction is adjusted to 100 particles / mm or less per unit length in the direction parallel to the substrate steel plate surface. This is very important. The optimal heating conditions vary somewhat depending on the Si content in the plating layer and the hot dipping conditions, but according to the study by the inventors, the heating temperature ranges from 250 to 570 ° C. and the holding time ranges from 0.5 to 50 hours. The heating conditions can be set in the inside. In practice, an appropriate heating condition range corresponding to the Si content and the hot dipping conditions may be determined by preliminary experiments. Even when the AlN enriched zone is formed simultaneously, it is possible to find an appropriate heating condition within the range of the heating temperature and holding time.

上記のようにSi相粒子のサイズが適正化された溶融Al系めっき鋼板のAl系めっき層に陽極酸化処理を施すことにより、本発明に従う表面処理鋼板を得ることができる。公知の陽極酸化処理方法を採用することができる。陽極酸化皮膜の平均厚さは5μm以上とすることが望ましく、10μmであることがより効果的である。   The surface-treated steel sheet according to the present invention can be obtained by subjecting the Al-based plating layer of the hot-dip Al-based plated steel sheet in which the size of the Si phase particles is optimized as described above. A well-known anodizing method can be employed. The average thickness of the anodized film is preferably 5 μm or more, more preferably 10 μm.

〔断面組織写真の例示〕
Si含有量が9.0質量%である溶融Al系めっき鋼板を陽極酸化処理して得られた材料の板厚方向に平行かつ圧延方向に垂直な断面(C断面)の光学顕微鏡写真を図8〜図14に例示する。陽極酸化処理を施す前のAl系めっき層の平均厚さはいずれも37μm(めっき付着量100g/m2)である。陽極酸化処理条件は以下の通りである。
(陽極酸化処理条件)
・処理液:硫酸150g/L+アルミニウム5g/L
・処理温度:40℃
・電流密度:5.0A/dm2
[Example of cross-sectional structure photograph]
FIG. 8 shows an optical micrograph of a cross section (C cross section) parallel to the plate thickness direction and perpendicular to the rolling direction of a material obtained by anodizing a molten Al-based plated steel plate having a Si content of 9.0 mass%. -Illustrated in FIG. The average thickness of the Al-based plating layer before the anodizing treatment is 37 μm (plating adhesion amount 100 g / m 2 ). The anodizing conditions are as follows.
(Anodizing conditions)
・ Treatment solution: 150 g / L sulfuric acid + 5 g / L aluminum
・ Processing temperature: 40 ℃
Current density: 5.0 A / dm 2

図8、図9は、従来一般的なSi含有溶融Alめっき鋼板に陽極酸化処理を施したものである。陽極酸化処理時間は図8が5min、図9が10minである。下地のグレーに見える部分が基材鋼板、その上の白く見える層がAl系めっき層であり、基材鋼板とAl系めっき層の間には基材鋼板より若干濃いグレーに見えるAl−Fe−Si系合金層がある。Al系めっき層の上にあるまっ黒よりもわずかにグレーに見える層が陽極酸化皮膜であり、その上方のまっ黒に見える部分は埋め込み樹脂である。Al系めっき層および陽極酸化皮膜中に分散している濃いグレーに見える粒子がSi相であり、それより薄いグレーに見える粒子(上記Al−Fe−Si系合金層と同程度のグレーに見えるもの)がAl−Fe−Si系合金の相である。以上の各部分の見え方は後述の各写真において同様である。   FIG. 8 and FIG. 9 show the conventional general Si-containing hot-dip Al-plated steel sheet subjected to anodizing treatment. The anodizing time is 5 min in FIG. 8 and 10 min in FIG. The base gray-colored portion of the base is a base steel plate, and the white layer above it is an Al-based plating layer. Between the base steel plate and the Al-based plating layer, Al-Fe- that appears slightly darker than the base steel plate There is a Si-based alloy layer. The layer that appears slightly grayer than the pure black on the Al-based plating layer is the anodized film, and the portion that appears black above it is the embedded resin. Particles that appear as dark gray dispersed in the Al-based plating layer and the anodized film are Si phases, and particles that appear lighter in gray (those that appear as gray as the Al-Fe-Si alloy layer) ) Is the phase of the Al-Fe-Si alloy. The appearance of each of the above parts is the same in each photo described later.

この従来一般的なSi含有溶融Alめっき鋼板を用いた例では、Si相が針状を呈していることがわかる。それらは陽極酸化皮膜中にもほぼ元のままの形態を維持したまま存在する。陽極酸化皮膜中に存在する針状のSi相は前述のように陽極酸化皮膜の絶縁性を低下させる要因となっている。   It can be seen that the Si phase has a needle shape in an example using this conventional general Si-containing hot-dip Al-plated steel sheet. They exist in the anodized film while maintaining the original form. The acicular Si phase present in the anodic oxide film is a factor that lowers the insulating properties of the anodic oxide film as described above.

図10、図11は、Si相が球状化された溶融Al系めっき鋼板に陽極酸化処理を施した本発明に従う表面処理鋼板である。陽極酸化処理時間は図10が5min、図11が10minである。Si相粒子は図8、図9のものと比べ板厚方向長さが短くなっており、板厚方向長さが10μm以上であるSi相粒子の存在量が基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整されている。陽極酸化皮膜中において表面付近からAl系めっき層まで届くSi相粒子の数は非常に少ない。そのため陽極酸化皮膜の絶縁性は高く維持される。   FIG. 10 and FIG. 11 are surface-treated steel sheets according to the present invention in which a hot-dip Al-based plated steel sheet having a spheroidized Si phase is subjected to anodization. The anodizing time is 5 min in FIG. 10 and 10 min in FIG. The thickness of the Si phase particles is shorter than that of FIGS. 8 and 9, and the abundance of the Si phase particles having a thickness direction length of 10 μm or more is a unit in the direction parallel to the substrate steel plate surface. It is adjusted to 100 pieces / mm or less per length. In the anodized film, the number of Si phase particles reaching from the surface vicinity to the Al-based plating layer is very small. Therefore, the insulating property of the anodized film is maintained high.

図12、図13は、従来一般的なSi含有溶融Alめっき鋼板に陽極酸化処理を施した際に陽極酸化皮膜が不均一に成長したものである。陽極酸化処理時間は図12が10min、図13が15minである。針状の長いSi相が存在することに起因して陽極酸化処理時に電流が局所的に集中しやすく、図12のように陽極酸化皮膜の膜厚が不均一になりやすい。Al系めっき層が消失した部分が生じると図13のように下地の基材鋼板が溶解することがある。   12 and 13 show anodized films grown unevenly when anodizing is performed on a conventional general Si-containing hot-dip Al-plated steel sheet. The anodizing time is 10 min in FIG. 12 and 15 min in FIG. Due to the presence of a long needle-like Si phase, current tends to concentrate locally during anodizing treatment, and the thickness of the anodized film tends to be nonuniform as shown in FIG. If a portion where the Al-based plating layer disappears is generated, the underlying base steel plate may be dissolved as shown in FIG.

図14は、Si相が球状化された、本発明に適用可能な溶融Al系めっき鋼板に図13と同様に15minの陽極酸化処理を試みたものである。Al系めっき層が消失する直前まで非常に均一に陽極酸化皮膜が成長していることがわかる。これは針状の長いSi相がほとんど存在しないことにより陽極酸化処理の電流集中が起こりにくいためである。   FIG. 14 shows an anodizing process for 15 min which was applied to a hot-dip Al-based plated steel sheet applicable to the present invention in which the Si phase was spheroidized, as in FIG. It can be seen that the anodized film grows very uniformly until just before the Al-based plating layer disappears. This is because the current concentration of the anodizing treatment hardly occurs because there is almost no needle-like long Si phase.

〔実施例1〕
表1に示す鋼を溶製し、熱間圧延、冷間圧延を含む工程により板厚0.8mmの冷延焼鈍鋼板を得た。
[Example 1]
The steel shown in Table 1 was melted, and a cold-rolled annealed steel sheet having a thickness of 0.8 mm was obtained by processes including hot rolling and cold rolling.

上記の冷延焼鈍鋼板をめっき原板として種々のSi含有量の溶融Al系めっき鋼板を製造した。その後、加熱処理(Si相球状化処理)を施して陽極酸化用素材とした。比較のため加熱処理を施していない陽極酸化用素材も用意した。各陽極酸化用素材の板厚方向に平行かつ圧延方向に垂直な断面(C断面)について顕微鏡観察を行い、Al系めっき層中における板厚方向長さが10μm以上であるSi相粒子の基材鋼板表面に平行方向の単位長さあたりの存在量(個/mm)を求めた。また、陽極酸化用素材に2t夾み180°曲げを施した後、曲げ戻す試験を行い、めっき層の密着性を観察することにより陽極酸化用素材の加工性を調べた。   Using the cold-rolled annealed steel plate as a plating base plate, molten Al-based plated steel plates having various Si contents were produced. Thereafter, heat treatment (Si phase spheroidization treatment) was performed to obtain an anodizing material. For comparison, an anodizing material not subjected to heat treatment was also prepared. A substrate of Si phase particles in which the cross section (C cross section) parallel to the plate thickness direction and perpendicular to the rolling direction of each anodizing material is observed with a microscope, and the plate thickness direction length in the Al-based plating layer is 10 μm or more. The abundance (units / mm) per unit length in the direction parallel to the steel sheet surface was determined. Further, after bending the anodic oxidation material by 2t and bending 180 °, a bending back test was performed, and the workability of the anodic oxidation material was examined by observing the adhesion of the plating layer.

次に、各陽極酸化用素材のAl系めっき層の表面に陽極酸化処理を施し、表層部に陽極酸化皮膜を有する表面処理鋼板を得た。陽極酸化処理条件は前述の条件を採用し、処理時間を変えることで陽極酸化皮膜の厚さを調整した。得られた表面処理鋼板について、板厚方向に平行な断面においてAl系めっき層および陽極酸化皮膜中の板厚方向長さが10μm以上であるSi相粒子の存在量(個/mm)を調べた。その結果、元のAl系めっき層中における測定結果とほぼ一致していた。   Next, the surface of the Al plating layer of each anodizing material was anodized to obtain a surface-treated steel sheet having an anodized film on the surface layer portion. The above-mentioned conditions were adopted as the anodizing treatment conditions, and the thickness of the anodized film was adjusted by changing the treatment time. About the obtained surface-treated steel sheet, the abundance (number / mm) of Si phase particles having a plate thickness direction length of 10 μm or more in the Al-based plating layer and the anodized film in a cross section parallel to the plate thickness direction was examined. . As a result, it was almost the same as the measurement result in the original Al-based plating layer.

表2、表3に、めっき条件、加熱処理条件、陽極酸化処理前のAl系めっき層の平均厚さ、そのAl系めっき層における板厚方向長さが10μm以上であるSi相粒子の基材鋼板表面に平行方向の単位長さあたりの存在量(個/mm)、陽極酸化皮膜の平均厚さを示す。陽極酸化処理後における板厚方向長さが10μm以上であるSi相粒子の存在量は、陽極酸化処理前と同様であるため、表中には記載を省略した。   Tables 2 and 3 show the plating conditions, heat treatment conditions, the average thickness of the Al-based plating layer before the anodizing treatment, and the base material of the Si phase particles whose length in the plate thickness direction in the Al-based plating layer is 10 μm or more. The abundance (unit / mm) per unit length in the direction parallel to the steel sheet surface, and the average thickness of the anodized film are shown. Since the abundance of the Si phase particles having a plate thickness direction length of 10 μm or more after the anodizing treatment is the same as that before the anodizing treatment, the description is omitted in the table.

得られた陽極酸化処理済みの供試材について、耐電圧・絶縁測定装置(菊水電子製;TOS9201)を用いて、図15に示す回路構成にて試験片の厚さ方向に電圧を印加し、電圧をステップ状に上昇させながら直流電流値を測定する手法で電圧印加時間10secにて2mA以上の電流が流れた電圧を求め、その電圧を絶縁破壊電圧とした。電極は12φであり、陽極酸化皮膜を有する評価表面を正極、反対側の表面を負極とし、負極を接触させる試料表面は基材鋼板の研磨面とした。基材鋼板の板厚は0.8mmで共通である。印加電圧は10Vからスタートした。試験環境は常温大気中である。
表4、表5に結果を示す。表4、表5中、加工性評価は上記素材の曲げ試験にてAl系めっき層の剥離が認められなかったものを○(加工性良好)、それ以外を×(加工性不良)としたものである。
For the obtained anodized specimen, a voltage was applied in the thickness direction of the test piece with the circuit configuration shown in FIG. 15 using a withstand voltage / insulation measuring device (manufactured by Kikusui Electronics; TOS9201), A voltage at which a current of 2 mA or more flowed in a voltage application time of 10 sec was obtained by a method of measuring a direct current value while increasing the voltage stepwise, and the voltage was defined as a dielectric breakdown voltage. The electrode was 12φ, the evaluation surface having the anodized film was the positive electrode, the opposite surface was the negative electrode, and the sample surface with which the negative electrode was contacted was the polished surface of the base steel sheet. The plate thickness of the base steel plate is common at 0.8 mm. The applied voltage started from 10V. The test environment is at ambient temperature.
Tables 4 and 5 show the results. In Tables 4 and 5, the workability evaluation was evaluated as ○ (good workability) when no peeling of the Al-based plating layer was observed in the bending test of the above materials, and x (poor workability) otherwise. It is.

溶融Al系めっき後に加熱処理を行ってAl系めっき層中のSi相粒子を球状化し、板厚方向長さ10μm以上のSi相粒子の存在量を基材鋼板表面に平行方向の単位長さあたり100個/mm以下とした本発明例のものは、加熱処理を実施していないNo.28や、加熱処理によるSi相粒子の球状化が不十分であるNo.26、27と比べ、絶縁破壊電圧が顕著に向上している。微量のSr、Na、Ca、Sb、Pを含有するめっき浴を用いたNo.12〜17、25、60〜65、73は、めっき後の組織においてSi相が微細化されたことにより、Si含有量および加熱処理条件が同等であるNo.4、53と比べ板厚方向長さ10μm以上のSi相粒子の存在量が少なくなっており、それに伴って絶縁破壊電圧も向上する傾向が見られた。No.1は純Alめっき浴を用いたことにより溶融めっき時にAl−Fe系合金層が厚く成長し、加工性に劣った。No.7はSi含有量が過剰であるためSi相が初晶として粗大化し、この場合も加工性に劣った。   Heat treatment is performed after hot-dip Al-based plating to spheroidize the Si-phase particles in the Al-based plating layer, and the abundance of Si-phase particles having a plate thickness direction length of 10 μm or more per unit length in the direction parallel to the substrate steel plate surface The example of the present invention set to 100 particles / mm or less is dielectric breakdown as compared with No. 28 in which heat treatment is not performed and No. 26 and 27 in which spheroidization of Si phase particles by heat treatment is insufficient. The voltage is significantly improved. Nos. 12-17, 25, 60-65, and 73 using a plating bath containing a small amount of Sr, Na, Ca, Sb, and P were obtained by refining the Si phase in the structure after plating. Compared with Nos. 4 and 53, which have the same content and heat treatment conditions, the abundance of Si phase particles having a length of 10 μm or more in the plate thickness direction is reduced, and accordingly, the breakdown voltage tends to be improved. It was. No. 1 was inferior in workability because an Al-Fe-based alloy layer grew thickly during hot dipping due to the use of a pure Al plating bath. In No. 7, since the Si content was excessive, the Si phase was coarsened as primary crystals, and in this case, the workability was also poor.

〔実施例2〕
実施例1で作製した陽極酸化処理済みの供試材のうち、表2に示したいくつかの試料と、表3に示したNを含有する基材鋼板を用いた試料について550℃×60minの加熱試験を行った。加熱試験前および後の試料について断面観察を行い、Al−Fe−Si系合金層の平均厚さの変化を調べた。結果を表6に示す。
[Example 2]
Among the anodized specimens prepared in Example 1, several samples shown in Table 2 and samples using base steel plates containing N shown in Table 3 were 550 ° C. × 60 min. A heating test was performed. The cross section of the sample before and after the heating test was observed, and the change in the average thickness of the Al—Fe—Si based alloy layer was examined. The results are shown in Table 6.

表6からわかるように、所定量のNを含有する基材鋼板(鋼B、C)を用いたものは、上記加熱試験によるAl−Fe−Si系合金層の成長が顕著に抑制されている。EDXによる分析の結果、上記のAl−Fe−Si系合金層の成長が顕著に抑制された試料には、前述のSi相球状化処理後の段階で基材鋼板とAl−Fe−Si系合金層の界面付近にAlとNの濃化が観測されたことから、AlN濃化帯がAl−Fe−Si系合金層の成長を抑止するバリアとして機能したと考えられる。このようなAlN濃化帯を有する材料は、例えばCIGS太陽電池の基板として使用する場合など500℃以上での成膜処理を施す用途においてAl−Fe−Si系合金層の成長による変形能(加工性)の低下を抑止する上で有利となる。なお、AlN濃化帯を有しない材料を500℃以上での成膜処理に供した場合でも、特段の柔軟性を要求しない用途では特に問題ない。   As can be seen from Table 6, the growth of the Al—Fe—Si alloy layer by the heating test is remarkably suppressed in the case of using the base steel plate (steel B, C) containing a predetermined amount of N. . As a result of analysis by EDX, the above-mentioned sample in which the growth of the Al-Fe-Si alloy layer is remarkably suppressed includes the base steel plate and the Al-Fe-Si alloy at the stage after the Si phase spheroidization treatment. Since enrichment of Al and N was observed in the vicinity of the interface of the layers, it is considered that the AlN enrichment zone functioned as a barrier to suppress the growth of the Al—Fe—Si based alloy layer. A material having such an AlN-concentrated band is deformable (processed) due to the growth of an Al—Fe—Si based alloy layer in applications where film formation is performed at 500 ° C. or higher, for example, when used as a substrate for a CIGS solar cell. This is advantageous in preventing the deterioration of the property. Even when a material having no AlN concentration band is subjected to a film forming process at 500 ° C. or higher, there is no particular problem in applications that do not require special flexibility.

1 基材鋼板
2 Al−Fe−Si系合金層
3 Al系めっき層
4 Si相
5 陽極酸化皮膜
6 AlN濃化帯
DESCRIPTION OF SYMBOLS 1 Base steel plate 2 Al-Fe-Si type alloy layer 3 Al type plating layer 4 Si phase 5 Anodized film 6 AlN concentration zone

Claims (6)

めっき層中のSi含有量が3.0〜15.0質量%である溶融Al系めっき鋼板の当該めっき層表層部を陽極酸化処理した表面処理鋼板であって、基材鋼板の表面に、Al−Fe−Si系合金層、Al系めっき層および陽極酸化皮膜を順次有し、Al系めっき層および陽極酸化皮膜中にはSi相の粒子が分散しており、板厚方向に平行な断面においてAl系めっき層および陽極酸化皮膜中の板厚方向長さが10μm以上であるSi相粒子の存在量が基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整されている絶縁性の良好な表面処理鋼板。   A surface-treated steel sheet obtained by anodizing the surface layer part of a hot-dip Al-based plated steel sheet having a Si content of 3.0 to 15.0% by mass. -Fe-Si alloy layer, Al plating layer and anodic oxide film in order, Si phase particles are dispersed in the Al plating layer and anodic oxide film, in a cross section parallel to the plate thickness direction Insulation in which the abundance of Si-phase particles having a plate thickness direction length of 10 μm or more in the Al-based plating layer and the anodized film is adjusted to 100 particles / mm or less per unit length in the direction parallel to the surface of the base steel plate Surface-treated steel sheet with good properties. Al系めっき層は、質量%でSi:3.0〜15.0%、Sr:0〜0.2%、Na:0〜0.1%、Ca:0〜0.1%、Sb:0〜0.6%、P:0〜0.2%、Mg:0〜5.0%、Cr:0〜1.0%、Mn:0〜2.0%、Ti:0〜0.5%、Zr:0〜0.5%、V:0〜0.5%、B:0〜0.10%、残部Alおよび不可避的不純物からなる組成を有するものである請求項1に記載の絶縁性の良好な表面処理鋼板。   The Al-based plating layer is Si: 3.0 to 15.0%, Sr: 0 to 0.2%, Na: 0 to 0.1%, Ca: 0 to 0.1%, Sb: 0% by mass. -0.6%, P: 0-0.2%, Mg: 0-5.0%, Cr: 0-1.0%, Mn: 0-2.0%, Ti: 0-0.5% 2. The insulating property according to claim 1, having a composition comprising: Zr: 0 to 0.5%, V: 0 to 0.5%, B: 0 to 0.10%, the balance Al and inevitable impurities. Good surface treated steel sheet. 基材鋼板としてN含有量が0.002〜0.020質量%である鋼板を使用し、基材鋼板とAl−Fe−Si系合金層の間にAlNが析出している請求項1または2に記載の絶縁性の良好な表面処理鋼板。   A steel plate having an N content of 0.002 to 0.020 mass% is used as the base steel plate, and AlN is precipitated between the base steel plate and the Al-Fe-Si alloy layer. A surface-treated steel sheet having good insulation properties as described in 1. Si含有量が3.0〜15.0質量%である溶融Al系めっき浴を用いて基材鋼板の表面にAl−Fe−Si系合金層を介するAl系めっき層を形成する工程、
前記Al系めっき層を形成した鋼板を加熱温度250〜570℃、保持時間0.5〜50hの条件範囲で加熱処理することにより、Al系めっき層中に存在するSi相を球状化し、板厚方向に平行な断面において板厚方向長さが10μm以上であるSi相粒子の存在量を基材鋼板表面に平行方向の単位長さあたり100個/mm以下に調整する工程、
前記加熱処理後のAl系めっき層を陽極酸化処理することにより陽極酸化皮膜を形成する工程、
を有する絶縁性の良好な表面処理鋼板の製造法。
Forming an Al-based plating layer via an Al-Fe-Si-based alloy layer on the surface of the base steel sheet using a molten Al-based plating bath having a Si content of 3.0 to 15.0% by mass;
By heat-treating the steel sheet on which the Al-based plating layer is formed under the conditions of a heating temperature of 250 to 570 ° C. and a holding time of 0.5 to 50 h, the Si phase present in the Al-based plating layer is spheroidized, and the plate thickness A step of adjusting the abundance of Si phase particles having a plate thickness direction length of 10 μm or more in a cross section parallel to the direction to 100 particles / mm or less per unit length in the direction parallel to the substrate steel plate surface;
Forming an anodized film by anodizing the Al-based plating layer after the heat treatment;
A method for producing a surface-treated steel sheet having good insulating properties.
前記溶融Al系めっき浴は、質量%でSi:3.0〜15.0%、Sr:0〜0.2%、Na:0〜0.1%、Ca:0〜0.1%、Sb:0〜0.6%、P:0〜0.2%、Mg:0〜5.0%、Cr:0〜1.0%、Mn:0〜2.0%、Ti:0〜0.5%、Zr:0〜0.5%、V:0〜0.5%、B:0〜0.10%り、残部Alおよび不可避的不純物からなる組成を有するものである請求項4に記載の絶縁性の良好な表面処理鋼板の製造法。   The molten Al-based plating bath contains Si: 3.0 to 15.0%, Sr: 0 to 0.2%, Na: 0 to 0.1%, Ca: 0 to 0.1%, and Sb in mass%. : 0 to 0.6%, P: 0 to 0.2%, Mg: 0 to 5.0%, Cr: 0 to 1.0%, Mn: 0 to 2.0%, Ti: 0 to 0.0. 5. The composition according to claim 4, having a composition comprising 5%, Zr: 0 to 0.5%, V: 0 to 0.5%, B: 0 to 0.10%, the balance Al and inevitable impurities. A method for producing a surface-treated steel sheet with good insulation. 基材鋼板としてN含有量が0.002〜0.020質量%である鋼板を使用し、前記加熱処理を利用して基材鋼板とAl−Fe−Si系合金層の間にAlNを析出させる請求項4または5に記載の絶縁性の良好な表面処理鋼板の製造法。   A steel plate having an N content of 0.002 to 0.020 mass% is used as the base steel plate, and AlN is precipitated between the base steel plate and the Al—Fe—Si alloy layer using the heat treatment. A method for producing a surface-treated steel sheet having good insulation properties according to claim 4 or 5.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170029431A (en) 2014-05-26 2017-03-15 닛신 세이코 가부시키가이샤 MOLTEN Al-PLATED STEEL PLATE OF EXCEPTIONAL WORKABILITY
WO2017164714A1 (en) * 2016-03-24 2017-09-28 덕산산업(주) Highly durable body to be plated
KR20180087414A (en) * 2016-03-24 2018-08-01 덕산산업주식회사 High durability plated body

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Publication number Priority date Publication date Assignee Title
JPH06207262A (en) * 1993-01-06 1994-07-26 Sky Alum Co Ltd Far infrared ray radiation member and manufacture thereof

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
JPH06207262A (en) * 1993-01-06 1994-07-26 Sky Alum Co Ltd Far infrared ray radiation member and manufacture thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170029431A (en) 2014-05-26 2017-03-15 닛신 세이코 가부시키가이샤 MOLTEN Al-PLATED STEEL PLATE OF EXCEPTIONAL WORKABILITY
WO2017164714A1 (en) * 2016-03-24 2017-09-28 덕산산업(주) Highly durable body to be plated
KR20180087414A (en) * 2016-03-24 2018-08-01 덕산산업주식회사 High durability plated body
KR102206147B1 (en) * 2016-03-24 2021-01-22 덕산산업(주) High durability plated body

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