JP2013165121A5 - - Google Patents
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- JP2013165121A5 JP2013165121A5 JP2012026423A JP2012026423A JP2013165121A5 JP 2013165121 A5 JP2013165121 A5 JP 2013165121A5 JP 2012026423 A JP2012026423 A JP 2012026423A JP 2012026423 A JP2012026423 A JP 2012026423A JP 2013165121 A5 JP2013165121 A5 JP 2013165121A5
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- substrate
- pixels
- dose
- charged particle
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- 239000000758 substrate Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 11
- 230000000875 corresponding Effects 0.000 claims description 9
- 230000003287 optical Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 2
Description
上記目的を達成するために、本発明の一側面としての描画装置は、荷電粒子線で基板に描画を行う描画装置であって、描画データを生成する生成部と、前記生成部で生成された描画データに基づいて前記荷電粒子線を生成する荷電粒子光学系と、を有し、前記生成部は、幅を有する目標パターンに対応する複数のピクセルを設定し、前記複数のピクセルのうち前記目標パターンの端部に対応するピクセルとそれ以外のピクセルとでは異なる予め設定された線量を前記複数のピクセルに与えた場合に前記基板上で得られる線量分布に基づいて、前記幅に対応した線量分布が前記基板上で得られるように前記予め設定された線量を調整することにより、前記描画データを生成する、ことを特徴とする。 In order to achieve the above object, a drawing apparatus according to one aspect of the present invention is a drawing apparatus that performs drawing on a substrate with a charged particle beam, the generation unit generating drawing data, and the generation unit A charged particle optical system that generates the charged particle beam based on drawing data, and the generation unit sets a plurality of pixels corresponding to a target pattern having a width, and the target among the plurality of pixels The dose distribution corresponding to the width based on the dose distribution obtained on the substrate when different preset doses are given to the plurality of pixels in the pixel corresponding to the edge of the pattern and the other pixels. The drawing data is generated by adjusting the preset dose so that can be obtained on the substrate.
Claims (9)
描画データを生成する生成部と、
前記生成部で生成された描画データに基づいて前記荷電粒子線を生成する荷電粒子光学系と、を有し、
前記生成部は、
幅を有する目標パターンに対応する複数のピクセルを設定し、
前記複数のピクセルのうち前記目標パターンの端部に対応するピクセルとそれ以外のピクセルとでは異なる予め設定された線量を前記複数のピクセルに与えた場合に前記基板上で得られる線量分布に基づいて、前記幅に対応した線量分布が前記基板上で得られるように前記予め設定された線量を調整することにより、前記描画データを生成する、
ことを特徴とする描画装置。 A drawing apparatus for drawing on a substrate with a charged particle beam,
A generator for generating drawing data;
A charged particle optical system that generates the charged particle beam based on the drawing data generated by the generation unit, and
The generator is
Set multiple pixels corresponding to the target pattern with width,
Based on the dose distribution obtained on the substrate when different preset doses are given to the pixels corresponding to the end of the target pattern and the other pixels among the plurality of pixels. by dose distribution corresponding to the width adjusting the preset dose so as to obtain on said substrate, generates the drawing data,
A drawing apparatus characterized by that.
前記生成部は、前記複数の荷電粒子線それぞれの前記基板上での線量分布に基づいて、前記描画データを生成する、ことを特徴とする請求項1乃至5のうちいずれか1項に記載の描画装置。 The drawing apparatus performs drawing on the substrate with a plurality of charged particle beams,
The said production | generation part produces | generates the said drawing data based on the dose distribution on the said board | substrate of each of these charged particle beams, The any one of Claim 1 thru | or 5 characterized by the above-mentioned. Drawing device.
幅を有する目標パターンに対応する複数のピクセルを設定するステップと、
前記複数のピクセルのうち前記目標パターンの端部に対応するピクセルとそれ以外のピクセルとでは異なる予め設定された線量を前記複数のピクセルに与えた場合に前記基板上で得られる線量分布に基づいて、前記幅に対応した線量分布が前記基板上で得られるように前記予め設定された線量を調整することにより、前記描画データを生成するステップと、
を有することを特徴とする生成方法。 A generation method for generating the drawing data used in a drawing apparatus for drawing on a substrate with a charged particle beam generated by a charged particle optical system based on the drawing data,
Setting a plurality of pixels corresponding to a target pattern having a width;
Based on the dose distribution obtained on the substrate when different preset doses are given to the pixels corresponding to the end of the target pattern and the other pixels among the plurality of pixels. by dose distribution corresponding to the width adjusting the preset dose so as to obtain on said substrate, and generating the drawing data,
A generation method characterized by comprising:
前記ステップで描画を行われた前記基板を現像するステップと、
を有することを特徴とする物品の製造方法。 Drawing on a substrate using the drawing apparatus according to any one of claims 1 to 6 ;
Developing the substrate on which the drawing has been performed in the step;
A method for producing an article comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012026423A JP2013165121A (en) | 2012-02-09 | 2012-02-09 | Drawing device, generating method, program and method for manufacturing article |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012026423A JP2013165121A (en) | 2012-02-09 | 2012-02-09 | Drawing device, generating method, program and method for manufacturing article |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013165121A JP2013165121A (en) | 2013-08-22 |
JP2013165121A5 true JP2013165121A5 (en) | 2015-03-19 |
Family
ID=49176316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012026423A Pending JP2013165121A (en) | 2012-02-09 | 2012-02-09 | Drawing device, generating method, program and method for manufacturing article |
Country Status (1)
Country | Link |
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JP (1) | JP2013165121A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6289181B2 (en) * | 2013-06-26 | 2018-03-07 | キヤノン株式会社 | Drawing apparatus and article manufacturing method |
JP6337511B2 (en) * | 2014-02-26 | 2018-06-06 | 大日本印刷株式会社 | Patterning method using multi-beam electron beam lithography system |
EP2950325B1 (en) * | 2014-05-30 | 2018-11-28 | IMS Nanofabrication GmbH | Compensation of dose inhomogeneity using overlapping exposure spots |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4498010A (en) * | 1983-05-05 | 1985-02-05 | The Perkin-Elmer Corporation | Virtual addressing for E-beam lithography |
US5393987A (en) * | 1993-05-28 | 1995-02-28 | Etec Systems, Inc. | Dose modulation and pixel deflection for raster scan lithography |
JPH10256124A (en) * | 1997-03-12 | 1998-09-25 | Sony Corp | Method for generating drawing pattern data, electron beam lithography, substrate processing method, and electron beam lithography system |
US20020104970A1 (en) * | 1999-01-06 | 2002-08-08 | Winter Stacey J. | Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
US6436607B1 (en) * | 2000-03-02 | 2002-08-20 | Applied Materials, Inc. | Border modification for proximity effect correction in lithography |
US7407252B2 (en) * | 2004-07-01 | 2008-08-05 | Applied Materials, Inc. | Area based optical proximity correction in raster scan printing |
TWI432908B (en) * | 2006-03-10 | 2014-04-01 | Mapper Lithography Ip Bv | Lithography system and projection method |
JP2008004596A (en) * | 2006-06-20 | 2008-01-10 | Canon Inc | Charged particle beam drawing method, aligner, and process for fabricating device |
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2012
- 2012-02-09 JP JP2012026423A patent/JP2013165121A/en active Pending
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