JP2013165121A5 - - Google Patents

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Publication number
JP2013165121A5
JP2013165121A5 JP2012026423A JP2012026423A JP2013165121A5 JP 2013165121 A5 JP2013165121 A5 JP 2013165121A5 JP 2012026423 A JP2012026423 A JP 2012026423A JP 2012026423 A JP2012026423 A JP 2012026423A JP 2013165121 A5 JP2013165121 A5 JP 2013165121A5
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substrate
pixels
dose
charged particle
preset
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JP2012026423A
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JP2013165121A (en
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Priority to JP2012026423A priority Critical patent/JP2013165121A/en
Priority claimed from JP2012026423A external-priority patent/JP2013165121A/en
Publication of JP2013165121A publication Critical patent/JP2013165121A/en
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上記目的を達成するために、本発明の一側面としての描画装置は、荷電粒子線で基板に描画を行う描画装置であって、描画データを生成する生成部と、前記生成部で生成された描画データに基づいて前記荷電粒子線を生成する荷電粒子光学系と、を有し、前記生成部は、幅を有する目標パターンに対応する複数のピクセルを設定し、前記複数のピクセルのうち前記目標パターンの端部に対応するピクセルとそれ以外のピクセルとでは異なる予め設定された線量を前記複数のピクセルに与えた場合に前記基板上で得られる線量分布に基づいて、前記幅に対応した線量分布が前記基板上で得られるように前記予め設定された線量を調整することにより、前記描画データを生成する、ことを特徴とする。 In order to achieve the above object, a drawing apparatus according to one aspect of the present invention is a drawing apparatus that performs drawing on a substrate with a charged particle beam, the generation unit generating drawing data, and the generation unit A charged particle optical system that generates the charged particle beam based on drawing data, and the generation unit sets a plurality of pixels corresponding to a target pattern having a width, and the target among the plurality of pixels The dose distribution corresponding to the width based on the dose distribution obtained on the substrate when different preset doses are given to the plurality of pixels in the pixel corresponding to the edge of the pattern and the other pixels. The drawing data is generated by adjusting the preset dose so that can be obtained on the substrate.

Claims (9)

荷電粒子線で基板に描画を行う描画装置であって、
描画データを生成する生成部と、
前記生成部で生成された描画データに基づいて前記荷電粒子線を生成する荷電粒子光学系と、を有し、
前記生成部は、
幅を有する目標パターンに対応する複数のピクセルを設定し、
前記複数のピクセルのうち前記目標パターンの端部に対応するピクセルとそれ以外のピクセルとでは異なる予め設定された線量を前記複数のピクセルに与えた場合に前記基板上で得られる線量分布に基づいて、前記幅に対応した線量分布が前記基板上で得られるように前記予め設定された線量を調整することにより、前記描画データを生成する、
ことを特徴とする描画装置。
A drawing apparatus for drawing on a substrate with a charged particle beam,
A generator for generating drawing data;
A charged particle optical system that generates the charged particle beam based on the drawing data generated by the generation unit, and
The generator is
Set multiple pixels corresponding to the target pattern with width,
Based on the dose distribution obtained on the substrate when different preset doses are given to the pixels corresponding to the end of the target pattern and the other pixels among the plurality of pixels. by dose distribution corresponding to the width adjusting the preset dose so as to obtain on said substrate, generates the drawing data,
A drawing apparatus characterized by that.
前記基板上で得られる前記線量分布は、前記複数のピクセルに予め設定された前記線量に前記荷電粒子線の強度分布を畳み込むことによって得る、ことを特徴とする請求項1に記載の描画装置。The drawing apparatus according to claim 1, wherein the dose distribution obtained on the substrate is obtained by convolving an intensity distribution of the charged particle beam with the dose set in advance in the plurality of pixels. 前記生成部は、前記複数のピクセルに与えられる線量の合計値が前記幅に応じて予め設定された値になるように、前記予め設定された線量を調整する、ことを特徴とする請求項1又は2に記載の描画装置。 The said generation part adjusts the said preset dose so that the total value of the dose given to these pixels may become a preset value according to the said width | variety. Or the drawing apparatus of 2 . 前記生成部は、前記合計値に対する前記予め設定された値の比率に基づいて、前記予め設定された線量を調整する、ことを特徴とする請求項に記載の描画装置。 The drawing apparatus according to claim 3 , wherein the generation unit adjusts the preset dose based on a ratio of the preset value to the total value. 前記予め設定された線量は、前記複数のピクセルそれぞれにおける前記目標パターンの占有率に基づいて設定されている、ことを特徴とする請求項1乃至のうちいずれか1項に記載の描画装置。 Wherein the preset dose, drawing apparatus according to any one of claims 1 to 4, wherein said on the basis of the proportion of the target pattern is set, it in each of the plurality of pixels. 前記描画装置は、複数の荷電粒子線で前記基板に描画を行い、
前記生成部は、前記複数の荷電粒子線それぞれの前記基板上での線量分布に基づいて、前記描画データを生成する、ことを特徴とする請求項1乃至のうちいずれか1項に記載の描画装置。
The drawing apparatus performs drawing on the substrate with a plurality of charged particle beams,
The said production | generation part produces | generates the said drawing data based on the dose distribution on the said board | substrate of each of these charged particle beams, The any one of Claim 1 thru | or 5 characterized by the above-mentioned. Drawing device.
描画データに基づいて荷電粒子光学系により生成された荷電粒子線で基板に描画を行う描画装置で用いられる前記描画データを生成する生成方法であって、
幅を有する目標パターンに対応する複数のピクセルを設定するステップと、
前記複数のピクセルのうち前記目標パターンの端部に対応するピクセルとそれ以外のピクセルとでは異なる予め設定された線量を前記複数のピクセルに与えた場合に前記基板上で得られる線量分布に基づいて、前記幅に対応した線量分布が前記基板上で得られるように前記予め設定された線量を調整することにより、前記描画データを生成するステップと、
を有することを特徴とする生成方法。
A generation method for generating the drawing data used in a drawing apparatus for drawing on a substrate with a charged particle beam generated by a charged particle optical system based on the drawing data,
Setting a plurality of pixels corresponding to a target pattern having a width;
Based on the dose distribution obtained on the substrate when different preset doses are given to the pixels corresponding to the end of the target pattern and the other pixels among the plurality of pixels. by dose distribution corresponding to the width adjusting the preset dose so as to obtain on said substrate, and generating the drawing data,
A generation method characterized by comprising:
請求項に記載の生成方法の各ステップをコンピュータに実行させることを特徴とするプログラム。 A program causing a computer to execute each step of the generation method according to claim 7 . 請求項1乃至のうちいずれか1項に記載の描画装置を用いて基板に描画を行うステップと、
前記ステップで描画を行われた前記基板を現像するステップと、
を有することを特徴とする物品の製造方法。
Drawing on a substrate using the drawing apparatus according to any one of claims 1 to 6 ;
Developing the substrate on which the drawing has been performed in the step;
A method for producing an article comprising:
JP2012026423A 2012-02-09 2012-02-09 Drawing device, generating method, program and method for manufacturing article Pending JP2013165121A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012026423A JP2013165121A (en) 2012-02-09 2012-02-09 Drawing device, generating method, program and method for manufacturing article

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Application Number Priority Date Filing Date Title
JP2012026423A JP2013165121A (en) 2012-02-09 2012-02-09 Drawing device, generating method, program and method for manufacturing article

Publications (2)

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JP2013165121A JP2013165121A (en) 2013-08-22
JP2013165121A5 true JP2013165121A5 (en) 2015-03-19

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6289181B2 (en) * 2013-06-26 2018-03-07 キヤノン株式会社 Drawing apparatus and article manufacturing method
JP6337511B2 (en) * 2014-02-26 2018-06-06 大日本印刷株式会社 Patterning method using multi-beam electron beam lithography system
EP2950325B1 (en) * 2014-05-30 2018-11-28 IMS Nanofabrication GmbH Compensation of dose inhomogeneity using overlapping exposure spots

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4498010A (en) * 1983-05-05 1985-02-05 The Perkin-Elmer Corporation Virtual addressing for E-beam lithography
US5393987A (en) * 1993-05-28 1995-02-28 Etec Systems, Inc. Dose modulation and pixel deflection for raster scan lithography
JPH10256124A (en) * 1997-03-12 1998-09-25 Sony Corp Method for generating drawing pattern data, electron beam lithography, substrate processing method, and electron beam lithography system
US20020104970A1 (en) * 1999-01-06 2002-08-08 Winter Stacey J. Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field
US6436607B1 (en) * 2000-03-02 2002-08-20 Applied Materials, Inc. Border modification for proximity effect correction in lithography
US7407252B2 (en) * 2004-07-01 2008-08-05 Applied Materials, Inc. Area based optical proximity correction in raster scan printing
TWI432908B (en) * 2006-03-10 2014-04-01 Mapper Lithography Ip Bv Lithography system and projection method
JP2008004596A (en) * 2006-06-20 2008-01-10 Canon Inc Charged particle beam drawing method, aligner, and process for fabricating device

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