JP2013160387A - Drying device - Google Patents

Drying device Download PDF

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JP2013160387A
JP2013160387A JP2012019617A JP2012019617A JP2013160387A JP 2013160387 A JP2013160387 A JP 2013160387A JP 2012019617 A JP2012019617 A JP 2012019617A JP 2012019617 A JP2012019617 A JP 2012019617A JP 2013160387 A JP2013160387 A JP 2013160387A
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base material
slit plate
substrate
coating
coating film
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Nobuyuki Matsunaga
宜之 松永
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a coating film drying device capable of suppressing drying irregularities while keeping an efficient drying capability in a film forming step requiring precise film thickness control.SOLUTION: The drying device dries the coating film continuously applied with a coating liquid to a traveling belt-like flexible base material by a coating head, while allowing the base material to travel in a direction opposite to the gravitational direction. The drying device includes a slit plate which is provided close to the coating film surface side of the base material, having a size equal to or larger than the coating film surface in the width direction and provided with a plurality of slits, an air distributing/exhausting means which has an air distributing means and an air exhausting means on a side opposite to the base material relative to the slit plate, and a means for heating the base material, which is provided on a side opposite to the slit plate relative to the base material. The plurality of slits of the slit plate are formed inclined to the traveling direction of the base material, an opening on a side close to the base material of the slits is on the upper side in the gravitational direction, and an opening on a side away from the base material of the slits is on the lower side in the gravitational direction.

Description

本発明は、走行する可撓性フィルムに各種液状組成物を塗布して形成した塗布膜面を乾燥する装置に関する。   The present invention relates to an apparatus for drying a coating film surface formed by applying various liquid compositions to a traveling flexible film.

連続して走行する長尺状の可撓性フィルムに各種液状組成物を塗布して形成した塗布膜面を乾燥する乾燥装置としては、非塗布面側をローラで支持し、塗布面側にエア・ノズルから風を吹いて乾燥させる乾燥装置や、塗布面、非塗布面ともにエア・ノズルから風を吹いて、基材を浮上させた状態、すなわち基材をローラ等に接触させない状態で乾燥させる非接触式のエア・フローティング乾燥装置等が良く知られている。   As a drying device that dries the coating film surface formed by applying various liquid compositions to a long flexible film that runs continuously, the non-coating surface side is supported by a roller and the coating surface side is air・ Drying equipment that blows air from the nozzle, and air is blown from the air nozzle on both the coated and non-coated surfaces to dry the substrate in a floating state, that is, without contacting the substrate with a roller, etc. Non-contact type air floating dryers are well known.

通常これらの風を吹いて乾燥させる装置では、調湿した風を塗布面に吹きつけることにより、塗布面中に含まれる溶媒を蒸発させて乾燥させている。こういった風を吹きつける方式の乾燥装置は乾燥効率に優れるものの、塗布面に多孔板、整流板等を介して風をあてる場合であっても、直接的に風を塗布面にあてる場合と同様に、この風によって塗布面が乱れて塗布層の厚さが不均一となってムラを生じたり、対流によって塗布面での溶媒の蒸発速度が不均一になったりし、いわゆるユズ肌が発生し、均一な塗布層が得られないという問題があった。   Usually, in an apparatus for blowing and drying these winds, the solvent contained in the coating surface is evaporated and dried by blowing the conditioned air on the coating surface. Although the drying device of this type that blows air is excellent in drying efficiency, even when air is applied to the application surface through a porous plate, a rectifying plate, etc., the air is directly applied to the application surface Similarly, the coating surface is disturbed by this wind, resulting in uneven coating layer thickness and unevenness, and the solvent evaporation rate on the coating surface is uneven due to convection, resulting in so-called crushed skin. However, there is a problem that a uniform coating layer cannot be obtained.

特に、塗布液中に有機溶剤を含む場合には、このようなムラの発生は顕著である。この理由は、乾燥初期には塗布膜中に有機溶剤が十分に含まれた状態であり、この段階で有機溶剤の蒸発分布が生じると、その結果、塗布膜面に温度分布、表面張力分布を生じ、塗布膜面内で、いわゆるマランゴニ対流等の流動が起きることによる。このようなムラの発生は重大な塗布欠陥となる。   In particular, when the coating solution contains an organic solvent, the occurrence of such unevenness is remarkable. The reason for this is that the organic film is sufficiently contained in the coating film at the initial stage of drying, and if the evaporation distribution of the organic solvent occurs at this stage, the temperature distribution and surface tension distribution on the coating film surface will result. This is because a flow such as so-called Marangoni convection occurs in the coating film surface. The occurrence of such unevenness becomes a serious coating defect.

そのようなムラを起こさない方法として、塗布膜面全体に覆いを被せる事によって外乱風を遮る方法が用いられるが、塗布膜面上の気流の乱れの原因として蒸発した溶剤ガスと乾燥用の空気が混ざるときに発生する気流の乱れがある為に、塗布ムラが消えないことがしばしばあった。   As a method for preventing such unevenness, a method of blocking the turbulent wind by covering the entire coating film surface is used, but the evaporated solvent gas and the drying air are the causes of the turbulence of the air current on the coating film surface. The coating unevenness often did not disappear due to the turbulence of the air flow that was generated when the mixture was mixed.

したがって、蒸発する溶剤成分を取り除きながら、気流の乱れを起こさないために、たとえば特許文献1のような方法が開示されている。特許文献1では、乾燥装置内で基材上に形成された塗布膜に対して平行、かつ、塗布膜の搬送方向に向って熱風を送り、その層流である熱風の速度を基材の搬送速度に対して0.1m/秒〜5m/秒の相対速度になるよう制御している。しかし、この構造では、搬送する基材面上の空気の流れを層流に保つには高い精度で吹き込み風量と角度を設定しなければならず、実用的な搬送速度では困難である。   Therefore, for example, a method as disclosed in Patent Document 1 is disclosed in order not to disturb the airflow while removing the solvent component that evaporates. In Patent Document 1, hot air is sent in parallel to the coating film formed on the base material in the drying apparatus and in the transport direction of the coating film, and the speed of the hot air that is the laminar flow is transported of the base material. Control is performed so that the relative speed is 0.1 m / second to 5 m / second with respect to the speed. However, with this structure, in order to keep the air flow on the substrate surface to be conveyed in a laminar flow, it is necessary to set the blowing air volume and angle with high accuracy, which is difficult at a practical conveyance speed.

特開2002−340479号公報JP 2002-340479 A

本発明は上記問題に鑑みて、精密な膜厚制御を必要とする成膜工程において、乾燥ムラの発生を抑制することができる塗布膜の乾燥装置を提供することである。   In view of the above problems, an object of the present invention is to provide a coating film drying apparatus capable of suppressing the occurrence of drying unevenness in a film forming process that requires precise film thickness control.

上記の課題を解決する手段として、本発明の請求項1に係る発明は、帯状可撓性基材に塗工ヘッドによって連続的に塗布された塗布膜を、前記基材を重力の方向と反対方向に走行させながら乾燥する乾燥装置であって、少なくとも、
基材の塗布膜面側に近接して設けられ、塗布膜面の幅と同等以上の幅を有し、且つ、複数のスリットを設けたスリット板と、
前記スリット板に対して前記基材とは反対側に給気と排気を有する送風排気手段と、
前記基材に対し前記スリット板とは反対側に設けられ、前記基材を加熱する基板加熱手段と、を備え、
前記スリット板の複数のスリットは、基材の走行方向に対して傾斜して設けられ、且つスリットの前記基材に面した側の開口が重力の方向とは逆の上側で、スリットの前記基材とは逆側の開口が重力の方向である下側にあることを特徴とする乾燥装置である。
As means for solving the above-mentioned problems, the invention according to claim 1 of the present invention is directed to a coating film continuously applied to a belt-like flexible substrate by a coating head, and the substrate is opposite to the direction of gravity. A drying device that dries while traveling in a direction, at least,
A slit plate provided close to the coating film surface side of the substrate, having a width equal to or greater than the width of the coating film surface, and provided with a plurality of slits;
Blower exhaust means having air supply and exhaust on the opposite side of the substrate with respect to the slit plate,
Provided on the opposite side to the slit plate with respect to the base material, and comprises a substrate heating means for heating the base material,
The plurality of slits of the slit plate are provided to be inclined with respect to the traveling direction of the substrate, and the opening of the slit facing the substrate is on the upper side opposite to the direction of gravity, and the base of the slit is The drying device is characterized in that the opening opposite to the material is on the lower side in the direction of gravity.

請求項2に係る発明は、前記スリット板が基材の走行方向の塗工ヘッドの直後に設けられたことを特徴とする請求項1に記載の乾燥装置である。   The invention according to claim 2 is the drying apparatus according to claim 1, wherein the slit plate is provided immediately after the coating head in the running direction of the substrate.

請求項3に係る発明は、前記スリット板と塗工ヘッドの間がカバーで覆われていることを特徴とする請求項1または2に記載の乾燥装置である。   The invention according to claim 3 is the drying apparatus according to claim 1 or 2, characterized in that a space between the slit plate and the coating head is covered with a cover.

請求項4に係る発明は、前記スリット板と前記基材との間隔が1mmから50mmであることを特徴とする請求項1から3のいずれか1項に記載の乾燥装置である。   The invention according to claim 4 is the drying apparatus according to any one of claims 1 to 3, wherein an interval between the slit plate and the base material is 1 mm to 50 mm.

本発明の請求項1によれば、塗布膜面から蒸発した溶剤成分が、その自重によって緩やかに基材とスリット板間を落下し、重力の方向に対して逆方向である上側に位置する基材に近い側の開口から、下側に位置する基材に遠い側の開口に向かって流れを自然に形成することが出来、蒸発した溶剤成分の流れが送風排気手段によって整流され、その結果、塗布膜の乾燥ムラの発生を抑制することが出来る。また、基材を加熱することにより、ムラを抑制しつつ、乾燥効率を上げることが可能となる。   According to the first aspect of the present invention, the solvent component evaporated from the coating film surface gently falls between the substrate and the slit plate due to its own weight, and is located on the upper side opposite to the direction of gravity. From the opening on the side close to the material, the flow can be naturally formed toward the opening on the side far from the base material located on the lower side, and the flow of the evaporated solvent component is rectified by the blower exhaust means, Occurrence of drying unevenness of the coating film can be suppressed. Further, by heating the substrate, it is possible to increase the drying efficiency while suppressing unevenness.

本発明の請求項2によれば、特に、ムラの発生に大きく影響を与える、塗布直後の乾燥初期部分に上記スリット板を設置することにより、より効果を発揮することが出来る。 According to the second aspect of the present invention, the effect can be exhibited more particularly by installing the slit plate in the initial drying portion immediately after coating, which greatly affects the occurrence of unevenness.

本発明の請求項3によれば、スリット板と塗工ヘッドの間をカバーで覆うことにより、気化溶剤を含む気体をスリット板と塗工ヘッドの間から漏れ出すことなく全てスリット板を経由してボックス内に移行させることが可能となり、良好に塗布膜の乾燥ムラの発生を抑制することが出来る。   According to claim 3 of the present invention, by covering the space between the slit plate and the coating head with the cover, all the gas containing the vaporized solvent passes through the slit plate without leaking from between the slit plate and the coating head. Thus, it can be transferred into the box, and the occurrence of uneven drying of the coating film can be suppressed satisfactorily.

本発明の請求項4によれば、スリット板と基材との間隔を1mmから50mmに設定することによって、良好に塗布膜の乾燥ムラの発生を抑制することが出来る。   According to claim 4 of the present invention, by setting the distance between the slit plate and the substrate to 1 mm to 50 mm, it is possible to satisfactorily suppress the occurrence of uneven drying of the coating film.

本発明の乾燥装置の一例の断面を示す概略図であり、図1(a)は本発明の乾燥装置の一例を示す概略断面図、図1(b)はスリット板を、図1(a)の紙面の左側から見た側面を示す概略断面図である。It is the schematic which shows the cross section of an example of the drying apparatus of this invention, Fig.1 (a) is a schematic sectional drawing which shows an example of the drying apparatus of this invention, FIG.1 (b) shows a slit board, FIG.1 (a). It is a schematic sectional drawing which shows the side surface seen from the left side of this paper surface.

本発明の乾燥装置を実施の形態に沿って以下に図面を参照しながら詳細に説明する。図1(a)は本発明の乾燥装置の一例を示す概略断面図である。   The drying apparatus of the present invention will be described in detail below in accordance with embodiments with reference to the drawings. Fig.1 (a) is a schematic sectional drawing which shows an example of the drying apparatus of this invention.

図1(a)に示される本発明の乾燥装置は、巻き出しロール5より巻き出された基材8の片方の面に、塗工ヘッド7にて液状組成物を塗布した後に、塗布面近傍にスリット板2が近接して設置される。   In the drying apparatus of the present invention shown in FIG. 1 (a), the liquid composition is applied to one surface of the substrate 8 unwound from the unwinding roll 5 by the coating head 7, and then the vicinity of the coated surface. The slit plate 2 is installed in the vicinity.

スリット板2は、基材8の幅方向に、少なくとも塗布幅以上に開口しており、幅方向全体に空気の出入りが可能となっている。図1(b)はスリット板2を図1(a)の紙面の左側から見た側面を示す図である。スリット2、2〜2は、基材8の流れ方向に連続的に設けられており、例えばスリット2では、開口2a−1は基材8に近い側、開口2a−2は遠い側に設けられ、スリット2、2〜2は基材8の走行方向に対して傾斜して設けられ、且つ、スリットの前記基材8に近い側の開口が重力の方向とは逆方向である上側で、スリットの前記基材8に遠い側の開口が重力の方向である下側に設けられている。即ち、スリット2の場合、スリットの前記基材8に近い側の開口2a−1が重力の方向とは逆方向である上側で、スリットの前記基材8に遠い側の開口2a−2が重力の方向である下側に設けられている。 The slit plate 2 opens in the width direction of the base material 8 at least more than the coating width, and allows air to enter and exit the entire width direction. FIG. 1B is a diagram showing a side surface of the slit plate 2 viewed from the left side of the paper surface of FIG. The slits 2 a , 2 b to 2 n are continuously provided in the flow direction of the base material 8. For example, in the slit 2 a , the opening 2 a-1 is closer to the base material 8, and the opening 2 a-2. Is provided on the far side, the slits 2 a , 2 b to 2 n are provided to be inclined with respect to the traveling direction of the base material 8, and the opening of the slit near the base material 8 is in the direction of gravity. Is the upper side which is the opposite direction, and the opening on the side far from the base material 8 of the slit is provided on the lower side which is the direction of gravity. That is, when the slits 2 a, the upper and the direction of the side of the opening 2 a-1 gravity closer to the base 8 of the slits are opposite, on the far side to the substrate 8 of the slit opening 2 a- 2 is provided on the lower side which is the direction of gravity.

ここでスリット2、2〜2の基材8に対する傾斜角度は、塗布対象品種や、含有溶剤種類によって任意に設定される。 Here, the inclination angle of the slits 2 a , 2 b to 2 n with respect to the base material 8 is arbitrarily set depending on the type of application target and the type of solvent contained.

また、スリット板2と塗工ヘッド7の間をカバー10で覆うことで、溶剤を含む気体がスリット板2と塗工ヘッド7の間から漏れ出すことを防ぐことができる。   Further, by covering the space between the slit plate 2 and the coating head 7 with the cover 10, it is possible to prevent the gas containing the solvent from leaking out between the slit plate 2 and the coating head 7.

スリット板2に対して、基材8と反対側には、排気および吸気を備えた送風排気手段3を設置する。これにより、スリット板2のスリットより流入した、溶剤を多く含有した気体は除去され、溶剤濃度が際限なく上がることが無くなり、連続した溶剤の流入が可能となる。送風の方向は、基材8の流れ方向の上から下へでも、下から上へでも構わなく、基材8の幅方向でも構わない。また、排気ボックス13の内部の気流の乱れを防止するために、整流板1を設置しても良い。   On the opposite side of the base plate 8 with respect to the slit plate 2, a ventilation exhaust means 3 having exhaust and intake air is installed. As a result, the gas containing a large amount of the solvent flowing in from the slits of the slit plate 2 is removed, the solvent concentration does not increase without limit, and continuous solvent inflow becomes possible. The direction of the air flow may be from the top to the bottom of the flow direction of the base material 8, from the bottom to the top, or the width direction of the base material 8. Further, the rectifying plate 1 may be installed in order to prevent the turbulence of the airflow inside the exhaust box 13.

また、基材8に対してスリット板2と反対側に、基材加熱手段4を設置することができる。基材加熱方式としては、近赤外線ヒーター、遠赤外線ヒーター、熱線ヒーター、マイクロ波ヒーター、等による非接触加熱方式や、温水、蒸気、オイル、熱線等によって熱せられたロール基材を接触させることによって基材を加熱する接触加熱方式でも良い。基材加熱手段4によって、塗布液中の有機溶剤の蒸発を促進することが出来、乾燥ムラを抑制しつつ、乾燥効率を上げることが可能となる。   Further, the substrate heating means 4 can be installed on the side opposite to the slit plate 2 with respect to the substrate 8. As the substrate heating method, a non-contact heating method using a near infrared heater, a far infrared heater, a heat ray heater, a microwave heater, etc., or a roll substrate heated by hot water, steam, oil, heat ray, etc. is brought into contact. A contact heating method for heating the substrate may also be used. The substrate heating means 4 can promote the evaporation of the organic solvent in the coating liquid, and it is possible to increase the drying efficiency while suppressing drying unevenness.

本発明による乾燥装置は、塗布膜面に悪影響を与えず蒸発により溶剤を取り除き、わずかな乾燥ムラの発生を抑制することができるが、その効果が最も強く現れるのは乾燥初期である。したがって、乾燥装置の全長すべてが本発明の乾燥装置によるものではなく、基材8への塗布直後の乾燥初期段階だけに本発明の乾燥装置を導入しても効果が得られる。その場合、本発明の乾燥装置の後に、公知の乾燥装置を第二の乾燥装置として導入しても良い。   The drying apparatus according to the present invention can remove the solvent by evaporation without adversely affecting the coating film surface and suppress the occurrence of slight drying unevenness, but the effect is most apparent in the initial stage of drying. Therefore, the entire length of the drying apparatus is not based on the drying apparatus of the present invention, and the effect can be obtained even if the drying apparatus of the present invention is introduced only in the initial drying stage immediately after application to the substrate 8. In that case, you may introduce | transduce a well-known drying apparatus as a 2nd drying apparatus after the drying apparatus of this invention.

第二乾燥装置としては、スリットノズルやパンチングメタルから基材に形成された塗布膜に温度を上昇させた噴流を当てるような方式を導入しても良いし、クイックリターン方式のノズルや基材の搬送方向に平行流を流す方式のノズルから熱風を噴出する方式でも良い。また、片面だけでなく両面から加熱手段を設けても良い。一般的に使用されているいかなる乾燥装置を使用しても本発明の効果を妨げるものではない。   As the second drying device, a method of applying a jet of increased temperature to the coating film formed on the substrate from a slit nozzle or punching metal may be introduced, or a quick return nozzle or substrate A system in which hot air is ejected from a nozzle that uses a parallel flow in the transport direction may be used. Moreover, you may provide a heating means not only from one side but from both sides. Use of any commonly used drying apparatus does not hinder the effects of the present invention.

本発明で使用される塗工ヘッド7としては、ダイコーター、バーコーター、カーテンコーター、エクストルージョンコーター、ロールコーター、ディップコーター、グラビアコーターなどの装置を挙げることができるが、これらに限定されるものではない。   Examples of the coating head 7 used in the present invention include, but are not limited to, a die coater, a bar coater, a curtain coater, an extrusion coater, a roll coater, a dip coater, and a gravure coater. is not.

本発明で使用される基材8は、ポリエチレンテレフタレート、ポリエチレン−2,6ナフタレート、セルロースダイアセテート、セルローストリアセテート(トリアセチルセルロース)、セルロースアセテートプロピオネート、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリカーボネート、ポリイミド、ポリアミド等のプラスチックフイルムなどが挙げられるが、これらに限定されるものではない。また、紙および紙にポリエチレン、ポリプロピレン、エチレンブテン共重合体等の炭素数が2〜10のα−ポリオレフィン類を塗布又はラミネートしたもの、さらに、アルミニウム、銅、錫等の金属箔も挙げられるが、これらに限定されるものではない。   The base material 8 used in the present invention is polyethylene terephthalate, polyethylene-2,6 naphthalate, cellulose diacetate, cellulose triacetate (triacetyl cellulose), cellulose acetate propionate, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyimide. And plastic films such as polyamide, but are not limited thereto. In addition, paper or paper coated or laminated with α-polyolefins having 2 to 10 carbon atoms such as polyethylene, polypropylene, ethylene butene copolymer, and metal foils such as aluminum, copper, and tin are also included. However, it is not limited to these.

本発明で使用される塗布液は、溶剤を含むものであり、基材上に塗膜を形成するものであれば、公知のいずれの塗布液を用いることができる。   The coating liquid used in the present invention contains a solvent, and any known coating liquid can be used as long as it forms a coating film on a substrate.

本発明で使用される溶剤としては、メタノール、エタノール、イソプロパノール、ブタノール、2−メトキシエタノール等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチル等のケトン類、酢酸メチル、酢酸エチル、酢酸ブチル等のエステル類、ジイソプロピルエーテル等のエーテル類、エチレングリコール、プロピレングリコール、ヘキシレングリコール等のグリコール類、エチルセロソルブ、ブチルセロソルブ、エチルカルビトール・ブチルカルビトール等のグリコールエーテル類、ヘキサン、ヘプタン・オクタン等の脂肪族炭化水素類、ハロゲン化炭化水素、ベンゼン、トルエン、キシレン等の芳香族炭化水素、N−メチルピロリドン、ジメチルホルムアミド等が挙げられ、1種、または、2種類以上の混合物として用いて良いが、これらに限定されるものではない。   Examples of the solvent used in the present invention include alcohols such as methanol, ethanol, isopropanol, butanol and 2-methoxyethanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl, and esters such as methyl acetate, ethyl acetate and butyl acetate. , Ethers such as diisopropyl ether, glycols such as ethylene glycol, propylene glycol and hexylene glycol, glycol ethers such as ethyl cellosolve, butyl cellosolve, ethyl carbitol and butyl carbitol, and aliphatic carbonization such as hexane, heptane and octane Examples include hydrogens, halogenated hydrocarbons, aromatic hydrocarbons such as benzene, toluene, and xylene, N-methylpyrrolidone, dimethylformamide, and the like, or one or a mixture of two or more There may be, but is not limited to these.

<実施例>
図1(a)に示すような乾燥装置により、基材に塗布液を塗布した直後の塗布膜を乾燥させて、乾燥ムラが発生するかどうかを確認した。
<Example>
With a drying apparatus as shown in FIG. 1 (a), the coating film immediately after the coating liquid was applied to the substrate was dried, and it was confirmed whether or not uneven drying occurred.

塗布直後よりスリット板2を配置し、スリット板2に対して基材8と反対側に、同等の大きさのボックス13を設置し、その中に、給気口11より空気を給気し、排気口12より排気を行った。この時、整流板1には、ハニカム整流板を設置した。また、基材8に対してスリット板2と反対側に、遠赤外線ヒーターを設置した。ここで、スリット板2の基材8の搬送方向における全長は2mとし、基材8とスリット板2の間隔を10mmとした。スリット板2の各スリットの長手方向の長さは50mmとし、スリット板2の厚さを30mm、スリットの幅は5mmとした。また、スリットの角度は基材8の垂直方向に対して45°のものを用い、基材8側が上となるように配置した。送風排気手段3のボックス13の内部の風速を1m/minになるように、また、ボックス13内部の大気圧との差圧が0Paとなるように給気と排気のブロアを調整した。また、遠赤外線ヒーターの表面温度が100℃になるように調整し、基材8からの距離が100mmになるように配置した。   The slit plate 2 is arranged immediately after the application, and a box 13 having an equivalent size is installed on the opposite side of the base plate 8 with respect to the slit plate 2, and air is supplied from the air inlet 11 therein. Exhaust was performed from the exhaust port 12. At this time, the rectifying plate 1 was provided with a honeycomb rectifying plate. Further, a far infrared heater was installed on the side opposite to the slit plate 2 with respect to the substrate 8. Here, the total length of the slit plate 2 in the conveyance direction of the substrate 8 was 2 m, and the distance between the substrate 8 and the slit plate 2 was 10 mm. The length in the longitudinal direction of each slit of the slit plate 2 was 50 mm, the thickness of the slit plate 2 was 30 mm, and the width of the slit was 5 mm. In addition, the slit angle was 45 ° with respect to the vertical direction of the base material 8, and the slit was arranged so that the base material 8 side was on top. The air supply and exhaust air blowers were adjusted so that the air speed inside the box 13 of the blower / exhaust means 3 was 1 m / min, and the differential pressure from the atmospheric pressure inside the box 13 was 0 Pa. Moreover, it adjusted so that the surface temperature of a far-infrared heater might be set to 100 degreeC, and it has arrange | positioned so that the distance from the base material 8 may be set to 100 mm.

塗布液としては、トルエン溶剤50%、アクリル系樹脂50%の塗布液を用い、基材8には厚さ100μmのポリエチレンテレフタレートフイルムを用いた。塗布条件としては、塗布速度20m/minでダイコーティングにより塗布を行った。   As the coating solution, a coating solution of 50% toluene solvent and 50% acrylic resin was used, and a polyethylene terephthalate film having a thickness of 100 μm was used for the substrate 8. As coating conditions, coating was performed by die coating at a coating speed of 20 m / min.

上記条件にて塗布を行ったところ、問題となるようなムラは確認できなかった。   When coating was performed under the above-mentioned conditions, it was not possible to confirm unevenness that would cause a problem.

<比較例>
本発明の乾燥装置を全く設置していない状態にて、上記実施例と同じ条件にて塗布を行
ったところ、塗布膜にモヤモヤとしたムラ、或いは製品上に目視可能なこすり傷が確認でき、製品としては良品を得ることが出来なかった。
<Comparative example>
In the state where the drying apparatus of the present invention is not installed at all, when coating was performed under the same conditions as in the above examples, it was possible to confirm unevenness of the coating film as a smear, or a visible scratch on the product, As a product, a good product could not be obtained.

表1は上記条件で、本発明の乾燥装置を用いて、スリット板と塗布された基材との距離を変えた場合の乾燥後の塗布膜の外観評価を行った結果を示す。スリット板と塗布された基材との距離を、0.5mmから60mmの間で変化させた以外は、実施例と同じ条件にてサンプルを作製した。その場合の乾燥後の塗布膜は、0.5mmの場合にはスリット板と基材が接触してしまい塗布膜表面にこすり傷が認められた。55mmの場合には塗布膜にモヤモヤとした若干の乾燥ムラを確認することが出来、更に60mmの場合にはモヤモヤが明確に確認することが出来た。このことから、スリット板と塗布された基材との距離は下限間隔1mmから上限間隔50mmの間に設定することが望ましいと判断した。   Table 1 shows the results of the appearance evaluation of the coated film after drying when the distance between the slit plate and the coated substrate was changed using the drying apparatus of the present invention under the above conditions. A sample was produced under the same conditions as in the example except that the distance between the slit plate and the coated substrate was changed between 0.5 mm and 60 mm. In that case, when the coating film after drying was 0.5 mm, the slit plate and the substrate were in contact with each other, and scratches were observed on the surface of the coating film. In the case of 55 mm, it was possible to confirm slight drying unevenness that was dull in the coating film, and in the case of 60 mm, it was possible to clearly confirm the dullness. From this, it was determined that the distance between the slit plate and the coated substrate is desirably set between the lower limit interval of 1 mm and the upper limit interval of 50 mm.

Figure 2013160387
Figure 2013160387

本発明の乾燥装置は、高精度な品質を要求する、光学膜、電子基板、食品用包装材、医療用包装材等の、乾燥工程を必要とするウェットコーティング方式を利用した大量生産分野において、安定した生産品質を確保し、低コスト化、高精度化に寄与できる。   The drying apparatus of the present invention requires high-precision quality, such as optical films, electronic substrates, food packaging materials, medical packaging materials, etc., in the mass production field using a wet coating method that requires a drying process, This ensures stable production quality and contributes to lower costs and higher accuracy.

1・・・整流板
2・・・スリット板
3・・・送風排気手段
4・・・基材加熱手段
5・・・巻き出しロール
6・・・コーティングロール
7・・・塗工ヘッド
8・・・基材
10・・・カバー
11・・・給気部
12・・・排気部
13・・・ボックス
14・・・気体の状態の溶剤の流れ
2a、2b〜2n・・・スリット
2a−1、2a−2・・・スリットの開口
DESCRIPTION OF SYMBOLS 1 ... Rectifying plate 2 ... Slit plate 3 ... Air exhausting means 4 ... Base-material heating means 5 ... Unwinding roll 6 ... Coating roll 7 ... Coating head 8 ... -Base material 10 ... cover 11 ... air supply part 12 ... exhaust part 13 ... box 14 ... solvent flow 2a, 2b-2n in the gaseous state ... slit 2a-1, 2a-2 ... Slit opening

Claims (4)

帯状可撓性基材に塗工ヘッドによって連続的に塗布された塗布膜を、前記基材を重力の方向と反対方向に走行させながら乾燥する乾燥装置であって、少なくとも、
基材の塗布膜面側に近接して設けられ、塗布膜面の幅と同等以上の幅を有し、且つ、複数のスリットを設けたスリット板と、
前記スリット板に対して前記基材とは反対側に給気と排気を有する送風排気手段と、
前記基材に対し前記スリット板とは反対側に設けられ、前記基材を加熱する基板加熱手段と、を備え、
前記スリット板の複数のスリットは、基材の走行方向に対して傾斜して設けられ、且つスリットの前記基材に面した側の開口が重力の方向とは逆の上側で、スリットの前記基材とは逆側の開口が重力の方向である下側にあることを特徴とする乾燥装置。
A drying device that dries a coating film continuously applied to a belt-like flexible substrate by a coating head while running the substrate in a direction opposite to the direction of gravity, at least,
A slit plate provided close to the coating film surface side of the substrate, having a width equal to or greater than the width of the coating film surface, and provided with a plurality of slits;
Blower exhaust means having air supply and exhaust on the opposite side of the substrate with respect to the slit plate,
Provided on the opposite side to the slit plate with respect to the base material, and comprises a substrate heating means for heating the base material,
The plurality of slits of the slit plate are provided to be inclined with respect to the traveling direction of the substrate, and the opening of the slit facing the substrate is on the upper side opposite to the direction of gravity, and the base of the slit is A drying apparatus characterized in that the opening opposite to the material is on the lower side in the direction of gravity.
前記スリット板が基材の走行方向の塗工ヘッドの直後に設けられたことを特徴とする請求項1に記載の乾燥装置。   The drying apparatus according to claim 1, wherein the slit plate is provided immediately after the coating head in the running direction of the substrate. 前記スリット板と塗工ヘッドの間がカバーで覆われていることを特徴とする請求項1または2に記載の乾燥装置。   The drying apparatus according to claim 1, wherein a space between the slit plate and the coating head is covered with a cover. 前記スリット板と、前記基材との間隔が1mmから50mmであることを特徴とする請求項1から3のいずれか1項に記載の乾燥装置。   The drying apparatus according to any one of claims 1 to 3, wherein an interval between the slit plate and the base material is 1 mm to 50 mm.
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