JP2013143216A5 - - Google Patents
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- Publication number
- JP2013143216A5 JP2013143216A5 JP2012002034A JP2012002034A JP2013143216A5 JP 2013143216 A5 JP2013143216 A5 JP 2013143216A5 JP 2012002034 A JP2012002034 A JP 2012002034A JP 2012002034 A JP2012002034 A JP 2012002034A JP 2013143216 A5 JP2013143216 A5 JP 2013143216A5
- Authority
- JP
- Japan
- Prior art keywords
- metal
- alloy particles
- bonding region
- electronic device
- functional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229910045601 alloy Inorganic materials 0.000 claims 7
- 239000000956 alloy Substances 0.000 claims 7
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 claims 7
- 239000002184 metal Substances 0.000 claims 7
- 239000002245 particle Substances 0.000 claims 7
- 239000002612 dispersion media Substances 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- 239000002114 nanocomposite Substances 0.000 claims 3
- 239000006185 dispersion Substances 0.000 claims 2
- 229910000765 intermetallic Inorganic materials 0.000 claims 2
- 150000002736 metal compounds Chemical class 0.000 claims 2
- 238000005266 casting Methods 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000011800 void material Substances 0.000 claims 1
Claims (4)
金属/合金粒子を、揮発性有機分散媒または水性分散媒に分散させた分散系を調製し、
前記分散系を型入れした後、前記型内において、前記分散媒を気化させることにより200nm以下のサイズの空隙を形成し、
次に、加熱・加圧して、前記空隙を埋める結合領域を生じさせる、
工程を含む方法。
A functional material comprising a bulk molded body, or a method for forming a functional part,
Prepare a dispersion system in which metal / alloy particles are dispersed in a volatile organic dispersion medium or an aqueous dispersion medium,
After casting the dispersion, in the mold, the dispersion medium is vaporized to form a void having a size of 200 nm or less,
Next, heating and pressurizing to produce a bonded region that fills the gap,
A method comprising steps.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012002034A JP6049121B2 (en) | 2012-01-10 | 2012-01-10 | Functional material, electronic device, electromagnetic wave absorption / shielding device, and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012002034A JP6049121B2 (en) | 2012-01-10 | 2012-01-10 | Functional material, electronic device, electromagnetic wave absorption / shielding device, and manufacturing method thereof |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013143216A JP2013143216A (en) | 2013-07-22 |
JP2013143216A5 true JP2013143216A5 (en) | 2014-12-18 |
JP6049121B2 JP6049121B2 (en) | 2016-12-21 |
Family
ID=49039691
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012002034A Active JP6049121B2 (en) | 2012-01-10 | 2012-01-10 | Functional material, electronic device, electromagnetic wave absorption / shielding device, and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6049121B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5885351B2 (en) * | 2013-10-09 | 2016-03-15 | 有限会社 ナプラ | Junction and electrical wiring |
JP6038270B1 (en) * | 2015-12-22 | 2016-12-07 | 有限会社 ナプラ | Electronic equipment |
KR102662146B1 (en) | 2018-12-17 | 2024-05-03 | 삼성전자주식회사 | Semiconductor package |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW591095B (en) * | 2000-10-25 | 2004-06-11 | Harima Chemical Inc | Electro-conductive metal paste and method for production thereof |
JP4255847B2 (en) * | 2004-01-27 | 2009-04-15 | 田中貴金属工業株式会社 | Method of forming bumps on semiconductor wafer using metal paste |
JP2007173131A (en) * | 2005-12-26 | 2007-07-05 | Hitachi Ltd | Particulate dispersion solution and conductive pattern forming device using it |
WO2009110095A1 (en) * | 2008-03-07 | 2009-09-11 | 富士通株式会社 | Conductive material, conductive paste, circuit board, and semiconductor device |
JP2010161331A (en) * | 2008-12-12 | 2010-07-22 | Hitachi Ltd | Electrode, electrode paste, and electronic component using same |
JP4563506B1 (en) * | 2010-01-13 | 2010-10-13 | 有限会社ナプラ | Electrode material |
JP2011021255A (en) * | 2009-07-16 | 2011-02-03 | Applied Nanoparticle Laboratory Corp | Three-metallic-component type composite nanometallic paste, method of bonding, and electronic component |
JP5660426B2 (en) * | 2010-03-17 | 2015-01-28 | 独立行政法人情報通信研究機構 | Wireless communication system |
JP5750259B2 (en) * | 2010-11-30 | 2015-07-15 | ハリマ化成株式会社 | Conductive metal paste |
-
2012
- 2012-01-10 JP JP2012002034A patent/JP6049121B2/en active Active
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