JP2013124377A - Method of producing metal vapor-deposition film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of producing a metal vapor-deposition film, capable of: decreasing static electricity on a part of a metal vapor-deposition film comprising a margin part, peeled off from a film-forming drum; preventing a discharge mark and a reverse-face scratch from occurring on the metal vapor-deposition film comprising the margin part having been peeled off from the film forming drum; and making a good winding shape.SOLUTION: The method of producing metal vapor-deposition film includes: vapor-depositing a metal film layer over a polymer film substrate 4 comprising a preformed margin part, on a film forming drum 5 to form a metal vapor-deposition film 8 comprising a margin part; subsequently bringing the whole area of a part 11 peeled off from the film forming drum 5, of the polymer film substrate 4 constituting the metal vapor-deposition film 8 into an atmosphere of an inert gas of 0.1 to 10 Pa; irradiating the whole area of the part 11 with a vacuum ultraviolet ray 14 at 5 to 100 mW/cm; and thereafter winding the metal vapor-deposition film 8 on a winding reel 9.

Description

  The present invention relates to a method for producing a metal vapor deposition film, and more particularly, the electrostatic force at a peeling portion between a metal vapor deposition film having a margin portion (a portion where metal vapor deposition is not performed) and the film deposition drum is reduced, and the film deposition drum The present invention relates to a method for producing a metal vapor-deposited film in which no discharge marks or back scratches are observed on the metal vapor-deposited film having a margin part after peeling, and the winding shape is also good.

Metal vapor deposition films used for film capacitors, transparent holograms, confidential wrapping paper, etc., must be manufactured on a polymer film substrate with a wound-type vacuum vapor deposition apparatus that heat-deposits metal by induction heating or electron beam. Is common. Specifically, (1) the evaporation material inserted into a crucible made of a material having a high heat resistance and a large heat capacity is heated and evaporated by induction heating or electron beam, and (2) the high volume unwound from the unwinding roll Transporting the molecular film substrate to the film forming drum; (3) depositing a thin film of evaporation material on the polymer film substrate in the film forming chamber; and (4) winding the film with a winding roll after leaving the film forming drum. It is manufactured by. In this case, the film-forming drum is normally 0 in order to prevent the base material from being deformed by the released gas generated by the heat generated in the evaporation process from the film base material and the heat rays radiated from the crucible or the evaporation material. Cooling is adjusted to around ℃ ~ -20 ℃. Further, by introducing a reactive gas such as oxygen or nitrogen into the film formation chamber in the evaporation process, a thin film such as a metal oxide or metal nitride can be formed.
At this time, static electricity caused by heating vapor deposition or static electricity due to current from the bias application roll often occurs on the deposited film substrate. For this reason, an electrostatic force acts when the film base material is charged and peels from the film formation drum. If the winding tension overcomes this force, the film substrate peels off from the film forming drum and can be wound. However, if it cannot be overcome, the film is wound around the film forming drum and cannot be wound. In addition, even when winding is possible, the interface between the film formation drum and the film base material causes a discharge corresponding to the electrostatic force at the time of peeling, and not only damages the film base material such as discharge marks (pinholes). Since the winding tension is also unstable, it is extremely difficult to wind the formed film without applying stress such as wrinkles.

In order to cope with such a problem, in Patent Document 1, in a reactive vapor deposition method in which a metal oxide is coated with an electron beam on a film substrate that runs in a vacuum by a winding device, a vapor deposition material is used as a film base. After depositing on the film formation drum on the material, liquid vapor is jetted from the film formation drum to the part where the film base is peeled off, and when the electron beam deposition is performed, charging disturbance of the film base is suppressed as much as possible. A winding-type vacuum deposition method that stably forms a film is disclosed.
In Patent Document 2, in a reactive vapor deposition method in which a metal oxide is coated with an electron beam on a film substrate that travels in a vacuum by a winding device, an evaporation material is deposited on the film substrate on a film formation drum. After deposition, a magnetic field is formed on the surface of the film forming drum by placing a permanent magnet inside the film forming drum in the vicinity where the film base is peeled off from the film forming drum. It is disclosed that a stable glow discharge is caused at a peeled portion by using electric energy generated at the time of performing the process, a charging failure of the film base is suppressed as much as possible, and a stable film formation without damage is performed.
In Patent Document 3, when performing electron beam evaporation while avoiding problems such as major modifications of existing facilities, increase in equipment cost, and large scale, the charging failure of the film substrate is suppressed as much as possible, and stable formation without damage is achieved. A winding type vacuum deposition method and apparatus capable of performing a film operation are disclosed. Permanent magnets are installed inside the film forming drum in the vicinity where the film base material is in close contact with the film forming drum and inside the film forming drum in the vicinity where the film base material is peeled off from the film forming drum. The counter electrode is an outer wall of the chamber, and a high-frequency potential of 40 KHz to 100 KHz is applied to the film formation drum.

JP 2006-348338 A JP 2008-75164 A JP 2009-228014 A

  The method of reducing the electrostatic force generated at the separation point between the film formation drum and the metal vapor deposition film in the conventional winding type vacuum vapor deposition apparatus cannot be said to be sufficiently effective. In the case of a metal vapor-deposited film having a portion not formed), the charge on the film surface is non-uniform, and the generated electrostatic force is unstable and has a large variation. It was easy to cause problems such as scratches on the back.

  In the present invention, the above-mentioned problems are solved, and the electrostatic force at the separation point between the metal vapor deposition film having the margin and the film formation drum is reduced, and the discharge from the film formation drum to the metal vapor deposition film having the margin part is performed. Provided is a method for producing a metal-deposited film without any marks or scratches on the back surface.

As a result of intensive studies, the inventors of the present invention have applied vacuum ultraviolet rays of 5 to 100 mW over the entire area under a specific inert gas pressure atmosphere at the separation site between the metal vapor deposition film having a margin and the film formation drum. / Cm ² irradiation significantly reduces the electrostatic force of the peeled portion, smoothly peels the metal vapor deposition film having a margin portion from the film formation drum, and does not show any discharge marks or scratches on the back surface. It was also found that a good metal deposited film can be produced.

That is, the method for producing a metal vapor deposition film of the present invention is a production of a metal vapor deposition film in which a metal film layer is formed by vapor deposition on a polymer film substrate that is run by a winding device having a film formation drum in a vacuum vapor deposition device. A metal having a margin portion after forming a metal vapor deposition film having a margin portion by vapor-depositing a metal film layer on a film forming drum on a polymer film substrate on which a margin portion is previously formed. The whole area where the polymer film substrate side of the vapor deposition film peels from the film-forming drum is in an inert gas atmosphere of 0.1 to 10 Pa, and vacuum ultraviolet rays are 5-100 mW / cm toward the whole area where the peeling occurs. ^{After 2} irradiation, the metal vapor deposition film which has the said margin part is wound up on a winding reel, It is characterized by the above-mentioned.

In order to discharge the electrostatic energy accumulated in the entire area where the metal vapor deposition film having a margin and the film formation drum peels easily, the pressure in the entire area of the peeling area is set to an appropriate pressure (Pa) level with an inert gas. It is necessary to raise, and a favorable effect is acquired as the pressure zone of an inert gas atmosphere is 0.1-10 Pa. When the pressure zone is less than 0.1 Pa or exceeds 10 Pa, the effect decreases.
The margin part meant in the present invention is formed in advance by masking such as oil vapor deposition on a polymer film substrate, and the vacuum ultraviolet ray irradiated at the time of peeling is not deposited on the film formation drum. For example, when it is used for a film capacitor, it is used as an electrode margin portion, a T-type electrode margin portion, or the like.
In the metal vapor deposition film with a margin part, the charge on the film surface is uneven, the generated electrostatic force is also unstable and varies widely, and the metal vapor deposition film after peeling has defects such as discharge marks, winding shape, and scratches on the back surface. It is easy to occur, and it has been difficult to solve such problems by conventional methods such as injecting liquid vapor, installing a permanent magnet inside the film forming drum, and applying a high frequency potential of 40 KHz to 100 KHz to the film forming drum.
In the present invention, by irradiating a predetermined amount of vacuum ultraviolet rays toward the entire area of the peeled portion, the vacuum ultraviolet rays are transmitted through the margin portion of the metal vapor deposition film, and the charge of the entire film is homogenized, and Further, due to the charge eliminating action of the vacuum ultraviolet ray, the metal vapor deposition film having the margin portion and the film forming drum can be smoothly peeled off.
When the irradiation amount of vacuum ultraviolet rays is less than 5 mW / cm ² , the effect is insufficient, and when the irradiation amount exceeds 100 mW / cm ² , not only the effect is saturated, but the margin portion tends to deteriorate.
The vacuum ultraviolet ray in the present invention is a kind of electromagnetic wave, and means a region near 10 to 20 nm having the shortest wavelength in the ultraviolet ray. Sometimes overlap

Furthermore, the method for producing a metal-deposited film of the present invention is characterized in that the polymer film substrate is polypropylene (PP) or polyethylene terephthalate (PET).
When the polymer film substrate is polypropylene (PP) or polyethylene terephthalate (PET), a better electrostatic force reducing effect can be obtained, and in particular, a metal vapor-deposited film having good characteristics for a film capacitor can be obtained.

Furthermore, the metal vapor deposition film manufacturing method of the present invention is characterized in that the metal film layer is a metal oxide film layer.
If the metal film layer to be formed is a metal oxide, the metal film layer itself becomes a dielectric, so that electric charges are likely to be accumulated and winding troubles are likely to occur. Can be taken.

  According to the manufacturing method of the present invention, the electrostatic force at the separation point between the metal vapor deposition film having a margin portion and the film formation drum is reduced, and the metal vapor deposition film having the margin portion after separation from the film formation drum has discharge marks and back surface scratches. A metal vapor-deposited film that is not seen and has a good winding shape can be obtained.

It is the schematic of the vacuum evaporation system used for one Embodiment of the manufacturing method of the metal vapor deposition film of this invention.

One embodiment of the method for producing a metal-deposited film of the present invention will be described in detail below with reference to FIG.
FIG. 1 shows a vacuum vapor deposition apparatus for producing a metal vapor deposition film. The vacuum vapor deposition apparatus 1 unwinds a polymer film base material 4 from a roll 3 in a vacuum vessel 2, and a margin in an oil vapor deposition apparatus 10. After the oil is attached to the part to be the part, it is guided onto the film forming drum 5, and a metal such as aluminum, copper, and zinc from the boat 6 heated by resistance on the film forming drum 5 is vapor-deposited to form a polymer film base After the metal film 7 is formed on one surface of the material 4, the metal vapor-deposited film 8 is wound around the take-up reel 9.
At this time, an inert gas is ejected from the gas ejection device 12 toward the entire area of the portion 11 where the polymer film substrate side of the metal vapor-deposited film 8 peels from the film-forming drum 5 (hereinafter also referred to as the peeling portion). By setting the band to 0.1 to 10 Pa, irradiating the vacuum ultraviolet ray 14 from the vacuum ultraviolet ray irradiation device 13 toward the peeling portion 11 with 5 to 100 mW / cm ^2, and winding the metal vapor deposited film 8 on the take-up reel 9, The wound metal vapor-deposited film 8 does not show any discharge marks or backside scratches, and the winding shape is also good.

When the vacuum ultraviolet ray 14 passes through the margin portion of the metal vapor-deposited film 8 in an inert gas atmosphere of 0.1 to 10 Pa, the charge of the entire film is homogenized, and the charge removal action of the vacuum ultraviolet ray 14 has. Thus, the electrostatic energy accumulated in the peeling portion 11 between the metal vapor deposition film 8 and the film formation drum 5 is released without difficulty, and the metal vapor deposition film 8 and the film formation drum 5 are smoothly peeled off.
When the irradiation amount of the vacuum ultraviolet ray 14 is less than 5 mW / cm ² , the effect is insufficient, and when the irradiation amount exceeds 100 mW / cm ² , the effect is not only saturated but also the margin portion tends to deteriorate. When the pressure zone of the inert gas atmosphere is less than 0.1 Pa or exceeds 10 Pa, the effect is reduced.
The vacuum ultraviolet ray 14 in the present invention is a kind of electromagnetic wave, and means a region near 10 to 200 nm having the shortest wavelength in the ultraviolet ray. In addition, a T-type security mechanism margin portion is formed on the metal film 7 by the laser processing machine 15 while the metal vapor-deposited film 8 having the metal film 7 formed on one side of the polymer film substrate 4 is run. You may do it.

Examples of the polymer film substrate 4 used in the present invention include polyolefin (polyethylene, polypropylene, etc.), polyester (polyethylene terephthalate, polyethylene naphthalate, etc.), and the like, although not particularly limited, polypropylene (PP) or polyethylene A terephthalate (PET) is preferable because the effect is particularly remarkable.
The metal deposited on the surface of the polymer film substrate 4 in the present invention is not particularly limited as long as it has conductivity, such as Al, Zn, Cu, Ag, Au, Sn, Ni, or alloys thereof. However, Al, Zn, Cu, Sn, and the like are particularly preferable from the viewpoint of electrical characteristics and productivity of the film capacitor.
Further, the metal film 7 may be a metal oxide film, and an oxide or nitride ceramic thin film can be easily formed by introducing a reactive gas such as oxygen or nitrogen into the vacuum vessel 2 during the evaporation process. Can do. If the metal film 7 to be formed is a metal oxide, the metal film 7 itself becomes a dielectric, so that electric charges are likely to be accumulated and winding troubles are likely to occur. However, smooth winding is facilitated by the manufacturing method of the present invention. Can be taken.

A margin portion having a width of 10 mm at three equal intervals in a vertical direction on a film substrate (thickness 12 μm × width 600 mm) of the type shown in Table 1 that travels by a winding device before reaching the film-forming drum in the vacuum evaporation apparatus. Is formed by oil vapor deposition, and an Al vapor deposition film having a vapor deposition thickness of 1 to 300 Ω / □ is formed on the portion excluding the margin portion to produce an Al vapor deposition film. The entire area where the film substrate side of the film peels is introduced into the gas pressure atmosphere as shown in Table 1 by introducing Ar or Ne gas from the gas outlet, and further, IRISSYS-UV vacuum ultraviolet irradiation manufactured by Takasago Thermal Engineering Co., Ltd. After using a static eliminator to irradiate vacuum ultraviolet rays over the entire area to be peeled as shown in Table 1, the Al vapor-deposited film was wound on a reel.
In Table 1, PP is polypropylene, PET is polyethylene terephthalate, and PE is polyethylene.
About these Al vapor deposition films, the pinhole of the Al vapor deposition layer, the winding shape of the film, and the back surface scratches of the film were observed.

The pinhole of the Al vapor deposition layer was observed visually by spraying a strong permeable liquid from the thin film surface side and infiltrating it and exuding on the back surface.
The roll of the film was observed by visually observing the wound web, and the amount of winding deviation due to wobbling caused by wrinkles and meandering caused by unstable winding tension was measured with a ruler. The case where almost no winding deviation was observed was marked with ◯, the slight winding deviation was recognized but was usable, and Δ was marked when the winding deviation was large and could not be used.
As for the scratches on the back surface of the film, the raw film formed by winding was peeled off, and vertical scratches in the winding direction of the formed film were visually observed.
These results are shown in Table 1.

  From these results, the metal vapor deposition film produced by the production method of the present invention reduces the electrostatic force at the separation point between the metal vapor deposition film having a margin portion and the film formation drum, and the margin portion after separation from the film formation drum. It can be seen that the metal vapor deposition film having no discharge marks and rear surface scratches are seen, and the winding shape is good.

A margin portion having a width of 10 mm at equal intervals in three vertical positions on a film substrate (thickness 12 μm × width 600 mm) of the type shown in Table 2 that travels by a winding device before reaching the film-forming drum in the vacuum evaporation apparatus. Is formed by oil vapor deposition, and an Al vapor deposition film is formed by forming an Al oxide vapor deposition film having a vapor deposition thickness of 1 to 300 Ω / □ at a portion excluding the margin while introducing oxygen gas. Then, the entire area where the film base side of the Al oxide vapor deposition film peels from the film forming drum is introduced into the gas pressure atmosphere as shown in Table 2 by introducing Ar gas from the gas outlet, and Takasago Thermal Engineering Co., Ltd. After using the IRISSYS-UV vacuum ultraviolet irradiation neutralization device manufactured and irradiating the entire area where the vacuum ultraviolet rays were peeled off as shown in Table 1, the Al oxide evaporated film was wound on a reel.
In Table 2, PP is polypropylene, PET is polyethylene terephthalate, and PE is polyethylene.
About these Al oxide vapor deposition films, the pinhole of the Al oxide vapor deposition layer, the winding shape of the film, and the back surface scratches of the film were observed.
The pinholes in the Al oxide deposition layer were visually observed to see if they were sprayed with a highly permeable liquid from the thin film surface side and permeated into the back surface.
The roll of the film was observed by visually observing the wound web, and the amount of winding deviation due to wobbling caused by wrinkles and meandering caused by unstable winding tension was measured with a ruler.
As for the scratches on the back surface of the film, the raw film formed by winding was peeled off, and vertical scratches in the winding direction of the formed film were visually observed.
These results are shown in Table 2.

  From these results, the metal vapor deposition film produced by the production method of the present invention has a reduced electrostatic force at the separation point between the metal oxide film vapor deposition film having a margin and the film formation drum, and after the separation from the film formation drum. It can be seen that the metal oxide film-deposited film having the margin portion has no discharge marks and no back scratches, and the winding shape is good.

  As mentioned above, although the manufacturing method of embodiment of this invention was demonstrated, this invention is not limited to this description, A various change can be added in the range which does not deviate from the meaning of this invention.

DESCRIPTION OF SYMBOLS 1 Vacuum vapor deposition apparatus 2 Vacuum container 3 Roll 4 Polymer film base material 5 Film-forming drum 6 Board 7 Metal film 8 Metal vapor deposition film 9 Winding reel 10 Oil vapor deposition apparatus 11 Stripping location 12 Gas ejection apparatus 13 Vacuum ultraviolet irradiation apparatus 14 Vacuum Ultraviolet 15 laser processing equipment

Claims (3)

A method for producing a metal-deposited film in which a metal film layer is formed by vapor deposition on a polymer film substrate that is run by a winding device having a film-forming drum in a vacuum deposition apparatus, and a polymer having a margin portion formed in advance After a metal film layer is deposited on a film formation drum on a film substrate to form a metal vapor deposition film having a margin portion, the polymer film substrate side of the metal vapor deposition film having the margin portion is the film formation drum. The metal vapor deposition film which has the said margin part after making the whole area of the location peeled from 0.1-10 Pa in inert gas atmosphere, and irradiating 5-100 mW / cm < ² > of vacuum ultraviolet rays toward the whole area of the said peeling location Is wound on a take-up reel.   The method for producing a metal vapor-deposited film according to claim 1, wherein the polymer film substrate is polypropylene (PP) or polyethylene terephthalate (PET).   The said metal film layer is a metal oxide film layer, The manufacturing method of the metal vapor deposition film of Claim 1 or Claim 2 characterized by the above-mentioned.

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