JP2013073334A - Conductive transparent laminate for capacitive touch panel, capacitive touch panel, and image display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a conductive transparent laminate for a capacitive touch panel in which the pattern of a transparent electrode is inconspicuous and which has high transparency, a capacitive touch panel and an image display device using the conductive transparent laminate.SOLUTION: A conductive transparent laminate 10 is used for a capacitive touch panel that detects a position of a conductor (such as a finger and a metal) adjacent to or in contact with an input surface S as change in capacitance. The conductive transparent laminate 10 includes: a transparent member 20 having the input surface S; a first transparent electrode 44 disposed on a side opposite to the side with the input surface S across the transparent member 20 and formed with a pattern thereon; and a second transparent electrode 46 disposed so as to be separated from the first transparent electrode 44 through a transparent insulation layer 30 and formed with a pattern thereon. The second transparent electrode 46 has a fine asperity structure on a surface thereof with an average interval between protruding portions being 400 nm or smaller. The transparent insulation layer 30 adjacent to the second transparent electrode 46 has a fine asperity structure on the surface in contact with the second transparent electrode 46 with an average interval between projected portions 32 being 400 nm or smaller.

Description

  The present invention relates to a conductive transparent laminate for a capacitive touch panel, a capacitive touch panel, and a display device.

  The touch panel is disposed on the front surface of the image display device main body such as a liquid crystal panel, and various areas to which the touch panel and the image display device main body are connected by pressing a region corresponding to a button or the like displayed on the image display device main body with a finger or the like. An input device for operating a device (a personal computer, a mobile phone, an ATM, or the like).

  As a touch panel, a transparent member (such as a cover glass) having an input surface, a first transparent electrode that is disposed on the opposite side of the input surface with the transparent member interposed therebetween, and is transparently insulated from the first transparent electrode An input surface that is an outermost surface, and includes a second transparent electrode that is spaced apart and patterned through a layer, and a detection unit that is electrically connected to the first transparent electrode and the second transparent electrode The position of the conductor (finger, metal, etc.) approaching or in contact with the first transparent electrode and the first transparent electrode as a change in capacitance between the conductor and the first transparent electrode and the second transparent electrode. 2. Description of the Related Art A capacitive touch panel that is detected by a detection unit via two transparent electrodes is known.

  By the way, in the capacitive touch panel, since the difference between the refractive index of the transparent electrode and the refractive index of other layers (transparent member, transparent insulating layer, etc.) and air is large, the surface of the transparent electrode (that is, the transparent electrode layer) And the reflection of light increases at the interface between other layers and air. Therefore, there is a problem that a difference in light transmittance increases between a region where the patterned transparent electrode exists and a region where the transparent electrode does not exist, and the pattern of the transparent electrode is conspicuous.

  As a capacitive touch panel where the pattern of the transparent electrode is inconspicuous, by forming a transparent electrode on the surface of the transparent substrate having irregularities on the surface, the irregularities reflecting the irregularities of the transparent substrate on the surface of the transparent electrode Has been proposed (Patent Document 1).

  In this capacitive touch panel, the average interval between the convex and concave portions is about 10 μm, so that the pattern of the transparent electrode is not noticeable due to light scattering. However, there is a problem in that the transparency of the capacitive touch panel is lowered due to light scattering due to the unevenness, and the visibility of the image displayed on the image display device main body is lowered.

JP 2009-053894 A

  The present invention provides a conductive transparent laminate for a capacitive touch panel that has a transparent electrode pattern that is not conspicuous, a capacitive touch panel using the same, and an image display device including the same. .

  The conductive transparent laminate for a capacitive touch panel of the present invention is a conductive transparent laminate used for a capacitive touch panel that detects the position of a conductor approaching or contacting the input surface as a change in capacitance. A transparent member having the input surface; a first transparent electrode that is disposed on the opposite side of the input surface with the transparent member interposed therebetween; and a transparent insulating layer is formed from the first transparent electrode. And a second transparent electrode that is spaced apart and patterned, and at least one of the first transparent electrode and the second transparent electrode has a convex portion on at least one surface It is a concavo-convex transparent electrode having a fine concavo-convex structure with an average interval of 400 nm or less, and the layer adjacent to the concavo-convex transparent electrode is at least the surface of the side in contact with the concavo-convex transparent electrode The portion protruding transparent electrodes are not formed, the average distance between convex portions and having a fine textured structure is 400nm or less.

  In the conductive transparent laminate for a capacitive touch panel of the present invention, the transparent insulating layer has a transparent base material, and an uneven resin layer having the fine uneven structure formed on the surface of the transparent base material on the surface. It is preferable that the uneven transparent electrode is formed on the surface of the uneven resin layer on the fine uneven structure side.

The capacitive touch panel of the present invention is electrically connected to the conductive transparent laminate for the capacitive touch panel of the present invention and the transparent electrode of the conductive transparent laminate for the capacitive touch panel, and the input And a detector for detecting a change in capacitance when the conductor approaches or contacts the surface.
An image display device according to the present invention includes the capacitive touch panel according to the present invention and an image display device body.

The conductive transparent laminate for a capacitive touch panel of the present invention has a transparent electrode pattern that is inconspicuous and has high transparency.
In the capacitive touch panel of the present invention, the transparent electrode pattern is not conspicuous and the transparency is high.
In the image display device of the present invention, the transparent electrode pattern on the capacitive touch panel is not conspicuous, and a reduction in the visibility of the image on the capacitive touch panel is suppressed.

It is sectional drawing which shows an example of the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention. It is an expanded sectional view which shows an example of the electrode substrate used for the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention. It is a block diagram which shows an example of the manufacturing apparatus of the transparent insulating layer for electrode substrates. It is sectional drawing which shows the manufacturing process of the mold which has an anodized alumina on the surface. It is sectional drawing which shows the other example of the electrode substrate used for the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention. It is sectional drawing which shows the other example of the electrode substrate used for the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention. It is sectional drawing which shows the other example of the electrode substrate used for the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention. It is sectional drawing which shows the other example of the electrode substrate used for the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention. It is an expanded sectional view which shows the other example of the electrode substrate used for the electroconductive transparent laminated body for electrostatic capacitance type touch panels of this invention.

In the present specification, “(meth) acrylate” means acrylate and / or methacrylate.
In the present specification, “active energy rays” mean visible light, ultraviolet rays, electron beams, plasma, heat rays (infrared rays, etc.) and the like.

<Conductive transparent laminate>
The conductive transparent laminate for a capacitive touch panel of the present invention (hereinafter simply referred to as a conductive transparent laminate) is a static detecting device that detects the position of a conductor approaching or contacting the input surface as a change in capacitance. A conductive transparent laminate used for a capacitive touch panel, which has an input surface on the outermost surface and a transparent electrode provided apart from the input surface.

  Specifically, as the conductive transparent laminate, a transparent member (cover glass or the like) having an input surface and a transparent insulating layer (glass substrate, resin film substrate) disposed on the opposite side of the input surface across the transparent member , Insulating adhesive, resin coating film, and the like), and those provided with a first transparent electrode and a second transparent electrode.

  FIG. 1 is a cross-sectional view showing an example of the conductive transparent laminate of the present invention. The conductive transparent laminate 10 includes a transparent member 20 having an input surface S, and an electrode substrate 40 bonded on the opposite side of the input surface S with the transparent member 20 in between via an adhesive layer 12. It is.

(Adhesive layer)
Examples of the adhesive for the adhesive layer 12 include known transparent adhesives and transparent adhesives used for optical applications.

(Transparent material)
The transparent member 20 is made of a transparent plate, film, sheet or the like having a surface that becomes the input surface S. Examples of the material of the transparent member 20 include glass, acrylic resin, polycarbonate, styrene resin, polyester, cellulose resin (such as triacetyl cellulose), polyolefin, and alicyclic polyolefin.

(Electrode substrate)
The electrode substrate 40 has a smooth surface on one surface and a transparent insulating layer 30 having a fine concavo-convex structure on the other surface, and a plurality of electrodes extending in the first direction formed on the smooth surface of the transparent insulating layer 30. A stripe-shaped first transparent electrode 44 made of a pattern and a stripe made of a plurality of electrode patterns formed on the surface of the transparent insulating layer 30 on the fine concavo-convex structure side and extending in a second direction intersecting the first direction Second transparent electrode 46 (uneven transparent electrode).

(Transparent insulation layer)
As shown in FIG. 2, the transparent insulating layer 30 is formed on the surface of the transparent base material 34 and the surface of the transparent base material 34, which is formed on the surface of the transparent base material 34, and is in contact with the second transparent electrode 46. And an uneven resin layer 36 on the surface.

(Transparent substrate)
The transparent base material 34 consists of a transparent board, a film, a sheet | seat, etc. Examples of the material of the transparent substrate 34 include glass, acrylic resin, polycarbonate, styrene resin, polyester, cellulose resin (such as triacetyl cellulose), polyolefin, and alicyclic polyolefin.

(Uneven resin layer)
The concavo-convex resin layer 36 is a transparent film made of a cured product of an active energy ray-curable resin composition, which will be described later. Have.

  A fine concavo-convex structure (so-called moth-eye structure) in which a plurality of convex portions 32 having a substantially conical shape, a pyramid shape, etc. are arranged at an average interval not exceeding the wavelength of visible light (400 nm or less) is continuous from the refractive index of air to the refractive index of the material In addition, it is known that an effective antireflection means by increasing the refractive index.

  The fine uneven structure of the uneven resin layer 36 is preferably formed by transferring a plurality of pores of anodized alumina described later. A fine concavo-convex structure formed by transferring a plurality of pores of anodized alumina can easily form a high-convex portion 32, and thus can exhibit good low reflectivity. Further, it can be formed at a low cost and can have a large area.

The height Hc of the convex portion 32 is preferably 80 to 500 nm, more preferably 120 to 400 nm, and particularly preferably 150 to 300 nm. When the height Hc of the convex portion 32 is 80 nm or more, the reflectance is sufficiently low and the wavelength dependency of the reflectance is small. When the height Hc of the convex portion 32 is 500 nm or less, the scratch resistance of the convex portion 32 is good.
The height Hc of the convex portion 32 was measured by measuring the distance between the top of the convex portion 32 and the bottom of the concave portion existing between the convex portions 32 by electron microscope observation, and averaged these values. Is.

The average interval Pc between the convex portions 32 is not more than the wavelength of visible light, that is, not more than 400 nm, from the viewpoint that the reflectance of visible light becomes sufficiently low without reducing transparency. Since the average interval Pc between the convex portions 32 is about 100 to 300 nm, it is preferably 300 nm or less, and particularly preferably 150 nm or less.
The average interval Pc between the convex portions 32 is preferably 20 nm or more from the viewpoint of easy formation of the convex portions 32.
The average interval Pc between the convex portions 32 is obtained by measuring 50 intervals between the adjacent convex portions 32 (distance from the center of the convex portion 32 to the center of the adjacent convex portion 32) by observation with an electron microscope. Is the average.

  The aspect ratio of the convex portion 32 (height Hc of the convex portion 32 / average interval Pc between the convex portions 32) is preferably 0.8 to 5, more preferably 1.2 to 4, and particularly preferably 1.5 to 3. preferable. If the aspect ratio of the convex part 32 is 0.8 or more, the reflectance is sufficiently low. When the aspect ratio of the convex portion 32 is 5 or less, the scratch resistance of the convex portion 32 is good.

  The shape of the protrusion 32 is such that the cross-sectional area of the protrusion in the direction orthogonal to the height direction increases continuously or intermittently from the outermost surface in the depth direction, that is, the cross-sectional shape in the height direction of the protrusion 32. A shape such as a triangle, trapezoid, and bell shape is preferable.

(First transparent electrode)
The first transparent electrode 44 is a thin film that can transmit light and has conductivity.
Examples of the first transparent electrode 44 include a conductive metal oxide thin film. Examples of the conductive metal oxide include indium oxide doped with tin (hereinafter referred to as ITO).

(Second transparent electrode)
The second transparent electrode 46 is a thin film that can transmit light and has conductivity.
Examples of the second transparent electrode 46 include a conductive metal oxide thin film. Examples of the conductive metal oxide include ITO.

  The second transparent electrode 46 (uneven transparent electrode) has a fine uneven structure reflecting the fine uneven structure of the uneven resin layer 36 on the surface in contact with the uneven resin layer 36 and the surface in contact with air.

  The fine uneven structure (so-called moth-eye structure) in the second transparent electrode 46, which reflects the fine uneven structure of the uneven resin layer 36, also increases the refractive index continuously from the refractive index of air to the refractive index of the material. This is an effective anti-reflection measure.

The average interval Pe between the convex portions of the second transparent electrode 46 is not more than the wavelength of visible light, that is, not more than 400 nm, from the viewpoint that the reflectance of visible light becomes sufficiently low without degrading the transparency. Since the average interval Pe between the convex portions of the second transparent electrode 46 is also about 100 to 300 nm, it is more preferably 300 nm or less, and particularly preferably 150 nm or less.
The average interval Pe between the convex portions of the second transparent electrode 46 is preferably 20 nm or more from the viewpoint of easy formation of the second transparent electrode 46.
The average interval Pe between the convex portions of the second transparent electrode 46 is measured with an electron microscope observation by measuring 50 intervals between adjacent convex portions (the distance from the center of the convex portion to the center of the adjacent convex portion), These values are averaged.

(Method for producing conductive transparent laminate)
The conductive transparent laminate 10 includes, for example, the electrode substrate 40 on the surface opposite to the input surface S of the transparent member 20 via the adhesive layer 12 and the first transparent electrode 44 on the transparent member 20 side. It can manufacture by bonding together.

(Method for manufacturing electrode substrate)
The electrode substrate 40 is formed, for example, by depositing a transparent conductive material such as ITO on the surface of the transparent base material 34 to form a transparent conductive film, and then patterning it into a desired electrode pattern to form the first transparent electrode 44 and the second transparent electrode 44. The transparent electrode 46 can be manufactured.

(Transparent insulation layer manufacturing method)
When the transparent base material 34 is a film, the transparent insulating layer 30 is manufactured as follows using, for example, a manufacturing apparatus shown in FIG.
The surface of a roll-shaped mold 50 having anodized alumina having a plurality of pores (not shown) formed on the surface, and a strip-shaped transparent substrate that moves along the surface of the mold 50 in synchronization with the rotation of the mold 50 The active energy ray-curable resin composition 54 is supplied from the tank 52 between the surface 34 and the surface 34.
Moreover, when the transparent base material 34 is glass, it can also manufacture by sticking the film (transparent insulation layer) manufactured as mentioned above on the transparent base material 34 using the manufacturing apparatus shown in FIG. .

  The transparent substrate 34 and the active energy ray curable resin composition 54 are nipped between the mold 50 and the nip roll 58 whose nip pressure is adjusted by the pneumatic cylinder 56, and the active energy ray curable resin composition 54 is The transparent base material 34 and the mold 50 are uniformly distributed, and at the same time, the pores of the mold 50 are filled.

With the active energy ray curable resin composition 54 sandwiched between the mold 50 and the transparent base material 34, the active energy ray irradiation device 60 installed below the mold 50 is used, and the transparent base material 34 side The active energy ray curable resin composition 54 is irradiated with active energy rays to cure the active energy ray curable resin composition 54, thereby transferring a plurality of protrusions on which a plurality of pores on the surface of the mold 50 are transferred. A concavo-convex resin layer 36 having a fine concavo-convex structure consisting of portions (not shown) on the surface is formed.
The transparent insulating layer 30 is obtained by peeling the transparent substrate 34 having the uneven resin layer 36 formed on the surface by the peeling roll 62.

As the active energy ray irradiation device 60, a high-pressure mercury lamp, a metal halide lamp, or the like is preferable. The integrated light quantity is preferably 100 to 10,000 mJ / cm ² .

(mold)
The mold 50 is a mold having anodized alumina on the surface. A mold having an anodized alumina on the surface can have a large area and is easy to manufacture.

  Anodized alumina is a porous oxide film (alumite) of aluminum and has a plurality of pores on the surface.

A mold having an anodized alumina on its surface can be produced, for example, through the following steps (a) to (f). Although the regularity of the arrangement of the pores is slightly lowered, the steps (a) and (b) may be omitted and the steps (c) may be performed.
(A) A step of forming an oxide film by anodizing an aluminum substrate in an electrolytic solution.
(B) A step of removing the oxide film and forming pore generation points for anodic oxidation.
(C) A step of anodizing the aluminum substrate again in the electrolytic solution to form an oxide film having pores at the pore generation points.
(D) A step of enlarging the diameter of the pores.
(E) A step of anodizing again in the electrolytic solution after the step (d).
(F) A step of repeatedly performing the step (d) and the step (e).

Step (a):
As shown in FIG. 4, when the aluminum substrate 64 is anodized, an oxide film 68 having pores 66 is formed.
The purity of aluminum is preferably 99% or more, more preferably 99.5% or more, and particularly preferably 99.8% or more. When the purity of aluminum is low, when anodized, an uneven structure having a size to scatter visible light may be formed due to segregation of impurities, or the regularity of pores obtained by anodization may be lowered.
Examples of the electrolytic solution include sulfuric acid, an oxalic acid aqueous solution, and a phosphoric acid aqueous solution.

Step (b):
As shown in FIG. 4, the regularity of the pores can be improved by once removing the oxide film 68 and using it as the pore generation point 70 for anodic oxidation.

  Examples of the method for removing the oxide film include a method in which aluminum is not dissolved but is dissolved in a solution that selectively dissolves the oxide film and removed. Examples of such a solution include a chromic acid / phosphoric acid mixed solution.

Step (c):
As shown in FIG. 4, when the aluminum substrate 64 from which the oxide film has been removed is anodized again, an oxide film 68 having cylindrical pores 66 is formed.
Examples of the electrolytic solution include the same as in step (a).

Step (d):
As shown in FIG. 4, a process for expanding the diameter of the pore 66 (hereinafter referred to as a pore diameter expanding process) is performed. The pore diameter expansion treatment is a treatment for expanding the diameter of the pores obtained by anodic oxidation by immersing in a solution dissolving the oxide film. Examples of such a solution include a phosphoric acid aqueous solution of about 5% by mass.

Step (e):
As shown in FIG. 4, when anodized again, cylindrical pores 66 having a small diameter that extend downward from the bottom of the cylindrical pores 66 are further formed.
Examples of the electrolytic solution include the same as in step (a).

Step (f):
As shown in FIG. 4, when the pore diameter enlargement process in the step (d) and the anodization in the step (e) are repeated, the pores 66 have a shape in which the diameter continuously decreases from the opening in the depth direction. A mold 50 on which anodized alumina (aluminum porous oxide film (alumite)) is formed is obtained. It is preferable that the last end is step (d).
The total number of repetitions is preferably 3 times or more, and more preferably 5 times or more. When the number of repetitions is 2 or less, the diameter of the pores decreases discontinuously. Therefore, the effect of reducing the reflectance of the uneven resin layer 36 formed using anodized alumina having such pores is insufficient. is there.

  The surface of the anodized alumina may be treated with a release agent so that separation from the uneven resin layer 36 is facilitated. Examples of the treatment method include a method of coating a silicone resin or a fluorine-containing polymer, a method of depositing a fluorine-containing compound, and a method of coating a fluorine-containing silane compound.

  Examples of the shape of the pore 66 include a substantially conical shape, a pyramid shape, a cylindrical shape, and the like, and a cross-sectional area of the pore in a direction orthogonal to the depth direction such as a conical shape and a pyramid shape has a depth from the outermost surface. A shape that continuously decreases in the direction is preferred.

The depth of the pore 66 is preferably 80 to 500 nm, more preferably 120 to 400 nm, and particularly preferably 150 to 300 nm.
The average interval between the pores 66 is not more than the wavelength of visible light, that is, not more than 400 nm, preferably not more than 200 nm, particularly preferably not more than 150 nm. The average interval between the pores 66 is preferably 20 nm or more.
The aspect ratio of the pores 66 (depth of pores / average interval between pores) is preferably 0.8 to 5.0, more preferably 1.2 to 4.0, and 1.5 to 3.0. Is particularly preferred.
The surface of the uneven resin layer 36 formed by transferring the pores 66 as shown in FIG. 4 has a so-called moth-eye structure.

(Active energy ray-curable resin composition)
The active energy ray-curable resin composition contains a polymerizable compound and a polymerization initiator.
Examples of the polymerizable compound include monomers, oligomers, and reactive polymers having a radical polymerizable bond and / or a cationic polymerizable bond in the molecule.
The active energy ray-curable resin composition may contain a non-reactive polymer and an active energy ray sol-gel reactive composition.

Examples of the monomer having a radical polymerizable bond include a monofunctional monomer and a polyfunctional monomer.
Monofunctional monomers include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, s-butyl (meth) acrylate, t- Butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, alkyl (meth) acrylate, tridecyl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, Phenoxyethyl (meth) acrylate, isobornyl (meth) acrylate, glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, allyl (meth) acrylate, 2-hydroxyethyl ( )) (Meth) acrylate derivatives such as acrylate, hydroxypropyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate; (meth) acrylic acid, (meth) acrylonitrile; styrene, α -Styrene derivatives such as methylstyrene; (meth) acrylamide derivatives such as (meth) acrylamide, N-dimethyl (meth) acrylamide, N-diethyl (meth) acrylamide, dimethylaminopropyl (meth) acrylamide and the like. These may be used alone or in combination of two or more.

  Polyfunctional monomers include ethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, isocyanuric acid ethylene oxide modified di (meth) acrylate, triethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate , Neopentyl glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,5-pentanediol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, polybutylene glycol di (Meth) acrylate, 2,2-bis (4- (meth) acryloxypolyethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxyethoxyphenyl) propane, 2,2-bis (4- (3- ( Ta) acryloxy-2-hydroxypropoxy) phenyl) propane, 1,2-bis (3- (meth) acryloxy-2-hydroxypropoxy) ethane, 1,4-bis (3- (meth) acryloxy-2-hydroxypropoxy) ) Butane, dimethylol tricyclodecane di (meth) acrylate, ethylene oxide adduct di (meth) acrylate of bisphenol A, propylene oxide adduct di (meth) acrylate of bisphenol A, neopentyl glycol di (meth) hydroxypivalate Bifunctional monomers such as acrylate, divinylbenzene, and methylenebisacrylamide; pentaerythritol tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane ethylene oxide Functional tri (meth) acrylate, trimethylolpropane propylene oxide modified triacrylate, trimethylolpropane ethylene oxide modified triacrylate, isocyanuric acid ethylene oxide modified tri (meth) acrylate and other trifunctional monomers; succinic acid / trimethylolethane / acrylic acid 4 or more functional monomers such as dipentaerystol hexa (meth) acrylate, dipentaerystol penta (meth) acrylate, ditrimethylolpropane tetraacrylate, tetramethylolmethanetetra (meth) acrylate; bifunctional or more Urethane acrylates, bifunctional or higher functional polyester acrylates, silicones such as (meth) acrylic acid modified silicones (X-22-1602 (manufactured by Shin-Etsu Chemical Co., Ltd.)) Di) (meth) acrylate, etc.). These may be used alone or in combination of two or more.

  Examples of the monomer having a cationic polymerizable bond include monomers having an epoxy group, an oxetanyl group, an oxazolyl group, a vinyloxy group, and the like, and a monomer having an epoxy group is particularly preferable.

  Examples of the oligomer or reactive polymer include unsaturated polyesters such as a condensate of unsaturated dicarboxylic acid and polyhydric alcohol; polyester (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, epoxy (meth) Examples thereof include acrylates, urethane (meth) acrylates, cationic polymerization type epoxy compounds, homopolymers of the above-described monomers having a radical polymerizable bond in the side chain, and copolymerized polymers.

Examples of non-reactive polymers include acrylic resins, styrene resins, polyurethanes, cellulose resins, polyvinyl butyral, polyesters, thermoplastic elastomers, and the like.
Examples of the active energy ray sol-gel reactive composition include alkoxysilane compounds and alkyl silicate compounds.

As an alkoxysilane compound, the compound of following formula (1) is mentioned.
R ¹¹ _x Si (OR ¹² ) _y (1).
^However, R ^{11, R 12} each represent an alkyl group having 1 to 10 carbon atoms, x, y represents an integer satisfying the relation of x + y = 4.

  Examples of the alkoxysilane compound include tetramethoxysilane, tetra-i-propoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra-t-butoxysilane, methyltriethoxysilane, Examples include methyltripropoxysilane, methyltributoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylethoxysilane, trimethylmethoxysilane, trimethylpropoxysilane, and trimethylbutoxysilane.

Examples of the alkyl silicate compound include a compound of the following formula (2).
R ²¹ O [Si (OR ²³ ) (OR ²⁴ ) O] _z R ²² (2).
^However, R 21 ^{to R 24} each represent an alkyl group having 1 to 5 carbon atoms, z is an integer of 3 to 20.

  Examples of the alkyl silicate compound include methyl silicate, ethyl silicate, isopropyl silicate, n-propyl silicate, n-butyl silicate, n-pentyl silicate, acetyl silicate and the like.

  When utilizing a photocuring reaction, examples of the photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl, benzophenone, p-methoxybenzophenone, 2,2-diethoxy. Acetophenone, α, α-dimethoxy-α-phenylacetophenone, methylphenylglyoxylate, ethylphenylglyoxylate, 4,4′-bis (dimethylamino) benzophenone, 2-hydroxy-2-methyl-1-phenylpropane- Carbonyl compounds such as 1-one; sulfur compounds such as tetramethylthiuram monosulfide and tetramethylthiuram disulfide; 2,4,6-trimethylbenzoyldiphenylphosphine oxide, benzoyl Examples include diethoxyphosphine oxide. These may be used alone or in combination of two or more.

  When using an electron beam curing reaction, examples of the polymerization initiator include benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylbenzophenone, methyl orthobenzoylbenzoate, 4-phenylbenzophenone, t- Thioxanthone such as butylanthraquinone, 2-ethylanthraquinone, 2,4-diethylthioxanthone, isopropylthioxanthone, 2,4-dichlorothioxanthone; diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl Dimethyl ketal, 1-hydroxycyclohexyl-phenyl ketone, 2-methyl-2-morpholino (4-thiomethylphenyl) propan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholy Phenyl) -butanone and other acetophenones; benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether and other benzoin ethers; 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis (2,6-dimethoxybenzoyl)- Acylphosphine oxides such as 2,4,4-trimethylpentylphosphine oxide and bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide; methylbenzoylformate, 1,7-bisacridinylheptane, 9-phenyl Examples include acridine. These may be used alone or in combination of two or more.

  When utilizing a thermosetting reaction, examples of the thermal polymerization initiator include methyl ethyl ketone peroxide, benzoyl peroxide, dicumyl peroxide, t-butyl hydroperoxide, cumene hydroperoxide, t-butyl peroxy octoate, organic peroxides such as t-butylperoxybenzoate and lauroyl peroxide; azo compounds such as azobisisobutyronitrile; N, N-dimethylaniline, N, N-dimethyl-p- Examples thereof include a redox polymerization initiator combined with an amine such as toluidine.

  The active energy ray-curable resin composition may contain an antistatic agent, a release agent, an additive such as a fluorine compound for improving the antifouling property, fine particles, and a small amount of a solvent, if necessary.

(Function and effect)
In the conductive transparent laminate 10 described above, the second transparent electrode 46 has an average interval between the convex portions of 400 nm or less on the surface in contact with the uneven resin layer 36 and the surface in contact with air. Since it has a certain fine concavo-convex structure, reflection of light becomes sufficiently small at the interface between the second transparent electrode 46 and the concavo-convex resin layer 36 and the interface between the second transparent electrode 46 and air. In addition, the uneven resin layer 36 adjacent to the second transparent electrode 46 is not only the portion where the second transparent electrode 46 is formed in the surface on the side in contact with the second transparent electrode 46, but also the second The portion where the transparent electrode 46 is not formed also has a fine concavo-convex structure in which the average interval between the convex portions 32 is 400 nm or less, so that light reflection is sufficiently reduced at the interface between the concavo-convex resin layer 36 and air. . As a result, the difference in light transmittance between the region where the patterned second transparent electrode 46 is present and the region where the second transparent electrode 46 is not present is reduced. The electrode pattern becomes inconspicuous. Moreover, since light reflection becomes sufficiently small at the interface where the fine concavo-convex structure exists, the light transmittance is improved in the entire conductive transparent laminate 10 and the transparency of the conductive transparent laminate 10 is increased.

(Other forms)
In addition, the conductive transparent laminated body of this invention is not limited to the conductive transparent laminated body 10 of FIG.
For example, in the conductive transparent laminate 10, the fine uneven structure is formed on the surface of the uneven resin layer 36 of the transparent insulating layer 30, but directly on the surface of the transparent substrate 34 without providing the uneven resin layer 36. It may be formed. However, it is preferable that the fine concavo-convex structure is formed on the surface of the concavo-convex resin layer 36 of the transparent insulating layer 30 from the viewpoint that the fine concavo-convex structure can be efficiently formed by transferring a plurality of pores of the anodized alumina.

  Moreover, the transparent insulating layer 30 is not limited to what was obtained with the manufacturing method mentioned above, A fine uneven structure is directly formed in the surface of the transparent base material 34 by a well-known method (nanoimprint, cutting, etching, etc.). It may be manufactured by.

The electrode substrate 40 is not limited to that shown in FIG.
For example, as shown in FIG. 5, the transparent insulating layer 30 including the transparent base material 34 and the uneven resin layer 36, and a plurality of protrusions extending in the second direction formed on the surface of the uneven resin layer 36 of the transparent insulating layer 30. A stripe-shaped second transparent electrode 46 made of an electrode pattern, a transparent insulating layer 47 made of a resin formed on the second transparent electrode 46, and a second insulating electrode formed on the surface of the transparent insulating layer 47. The electrode substrate 40 may include a stripe-shaped first transparent electrode 44 including a plurality of electrode patterns extending in a first direction that intersects the first direction.

  Further, as shown in FIG. 6, a first electrode substrate 40 a in which a striped first transparent electrode 44 composed of a plurality of electrode patterns extending in the first direction is formed on the surface of a transparent base material 48, The second transparent electrode 46 in the form of a stripe composed of a plurality of electrode patterns extending in the second direction intersecting with the direction 1 is formed on the concave and convex resin layer 36 of the transparent insulating layer 30 including the transparent base material 34 and the concave and convex resin layer 36. The electrode substrate 40 may be bonded to the second electrode substrate 40b formed on the surface so that the surfaces on the transparent electrode side face each other with the adhesive layer 49 (transparent insulating layer) interposed therebetween.

  Moreover, as shown in FIG. 7, the 1st electrode by which the striped 1st transparent electrode 44 which consists of a some electrode pattern extended in a 1st direction was formed in the surface of the transparent base material 48 (transparent insulating layer) A stripe-shaped second transparent electrode 46 composed of a plurality of electrode patterns extending in a second direction intersecting the substrate 40 a and the first direction is formed on the transparent insulating layer 30 composed of the transparent substrate 34 and the concavo-convex resin layer 36. The second electrode substrate 40b formed on the surface of the concavo-convex resin layer 36 has a surface on the transparent insulating layer 48 side and a surface on the second transparent electrode 46 side through an adhesive layer 49 (transparent insulating layer). The electrode substrate 40 may be bonded to face each other.

  In the conductive transparent laminate of the present invention, at least one of the first transparent electrode and the second transparent electrode has a fine concavo-convex structure in which an average interval between convex portions is 400 nm or less. It only has to be. For example, as shown in FIGS. 1 and 5 to 7, the second transparent electrode 46 may have a fine uneven structure, and the first transparent electrode 44 may not have a fine uneven structure; The first transparent electrode may have a fine concavo-convex structure, and the second transparent electrode may not have a fine concavo-convex structure; as shown in FIG. 8, the first transparent electrode 44 and the second transparent electrode 46 Both may have a fine concavo-convex structure (in other words, on both surfaces of the transparent insulating layer 30 having the transparent substrate 34 and the concavo-convex resin layers 36 formed on both surfaces of the transparent substrate 34, the first The transparent electrode 44 and the second transparent electrode 46 may be formed. Both the first transparent electrode 44 and the second transparent electrode 46 are fine because the pattern of the first transparent electrode and the second transparent electrode is not conspicuous and the transparency of the conductive transparent laminate is further increased. It preferably has an uneven structure.

  Further, in the conductive transparent laminate of the present invention, the layer adjacent to the concavo-convex transparent electrode is an average between the convex portions on at least a portion where the concavo-convex transparent electrode is not formed on the surface in contact with the concavo-convex transparent electrode. What is necessary is just to have the fine concavo-convex structure whose space | interval is 400 nm or less. That is, as shown in FIG. 9, the portion of the surface where the concave and convex resin layer 36 adjacent to the second transparent electrode 46 is in contact with the second transparent electrode 46 where the second transparent electrode 46 is not formed. However, it may have a fine concavo-convex structure in which the average interval between the convex portions 32 is 400 nm or less (in other words, at least one of the first transparent electrode and the second transparent electrode (in FIG. 9) The second transparent electrode 46) has a fine concavo-convex structure with an average interval between convex portions of 400 nm or less on one surface (surface on the side in contact with air), and the other surface (side in contact with the concavo-convex resin layer 36). The surface may have no fine uneven structure with an average interval between the convex portions of 400 nm or less). From the point of suppressing light reflection at the interface between the concave and convex transparent electrode and the layer adjacent thereto, the layer adjacent to the concave and convex transparent electrode has an average interval between the convex portions on the entire surface in contact with the concave and convex transparent electrode. It is preferable to have a fine concavo-convex structure of 400 nm or less (in other words, at least one of the first transparent electrode and the second transparent electrode has a fine concavo-convex structure in which the average interval between the convex portions is 400 nm or less on both surfaces. Preferably having a structure).

<Capacitive touch panel>
The capacitive touch panel of the present invention is electrically connected to the conductive transparent laminate of the present invention and the transparent electrode of the conductive transparent laminate, and a conductor (finger, metal, etc.) approaches or contacts the input surface. And a detection unit that detects a change in electrostatic capacitance when the operation is performed.

  For example, the detection unit detects a change in the capacitance between the input body and the electrode when the conductor approaches or contacts the input surface while applying a predetermined voltage to the transparent electrode, It detects whether the conductor is approaching or touching.

  In the capacitive touch panel of the present invention described above, the transparent electrode pattern is inconspicuous, and the transparent electrode pattern is inconspicuous because it has the highly transparent conductive transparent laminate of the present invention. And high transparency.

<Image display device>
The image display device of the present invention includes the capacitive touch panel of the present invention and an image display device body.
The capacitive touch panel is disposed on the image display device main body on the side where the image is displayed so that the outermost input surface is on the side opposite to the image display device main body side.

  Examples of the image display apparatus main body include flat display panels (liquid crystal panels, plasma display panels, organic EL display panels, etc.), CRTs, and the like.

  In the image display device of the present invention described above, since the transparent electrode pattern is not conspicuous and the capacitive touch panel of the present invention is highly transparent, the transparent electrode in the capacitive touch panel is provided. The pattern is not conspicuous, and a reduction in image visibility by the capacitive touch panel is suppressed.

  Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited thereto.

(Pores of anodized alumina)
A part of the anodized alumina is shaved, platinum is vapor-deposited on the cross section for 1 minute, and the cross section is subjected to an acceleration voltage of 3.00 kV using a field emission scanning electron microscope (JSM-7400F, manufactured by JEOL Ltd.). Observed, the interval between the pores and the depth of the pores were measured. Each measurement was performed for 50 points, and the average value was obtained.

(Convex part of uneven resin layer)
Platinum was vapor-deposited on the fracture surface of the concavo-convex resin layer for 10 minutes, and the cross-section was observed in the same manner as the anodized alumina, and the interval between the convex portions and the height of the convex portions were measured. Each measurement was performed for 50 points, and the average value was obtained.

[Example 1]
(Mold production)
Steps (a) to (f) described above were performed to obtain a plate-like mold a having anodized alumina having a plurality of substantially conical pores with an average interval of 180 nm and a depth of 200 nm formed on the surface.
The mold a was immersed in a 0.1% by weight diluted solution of OPTOOL DSX (manufactured by Daikin Industries), air-dried overnight, and the surface of the anodized alumina was treated with a release agent.

(Preparation of active energy ray-curable resin composition)
45 parts by weight of a condensation reaction mixture of succinic acid / trimethylolethane / acrylic acid molar ratio 1: 2: 4,
45 parts by mass of 1,6-hexanediol diacrylate (manufactured by Osaka Organic Chemical Industry),
10 parts by mass of radical polymerizable silicone oil (X-22-1602, manufactured by Shin-Etsu Chemical Co., Ltd.)
3 parts by mass of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals, Irgacure (registered trademark) 184),
0.2 parts by mass of bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide (manufactured by Ciba Specialty Chemicals Co., Ltd., Irgacure (registered trademark) 819) is mixed, and the active energy ray-curable resin composition A was obtained.

(Manufacture of electrode substrate)
A thickness of 30 nm is formed on one surface of a glass plate having a thickness of 1 mm by a reactive sputtering method using a sintered body material of 97% by mass of indium oxide and 3% by mass of tin oxide in an atmosphere of 0.4 Pa composed of argon gas and oxygen. An ITO film was formed.

The active energy ray-curable resin composition A was applied to the surface of the mold a, and a glass plate was placed thereon so that the surface on which the ITO film was not formed was in contact with the active energy ray-curable resin composition A. .
Using an ultraviolet irradiator (fusion lamp D bulb), the active energy ray-curable resin composition A is cured by irradiating ultraviolet rays through the glass plate with an integrated light quantity of 1000 mJ / cm ² , and then separated from the mold a. Then, a glass plate (transparent insulating layer) having a surface of a concavo-convex resin layer having a thickness of 20 μm and having a fine concavo-convex structure composed of a plurality of convex portions having a truncated cone shape was obtained.
The average interval between the convex portions of the concavo-convex resin layer was 180 nm, the height of the convex portion was 190 nm, the width of the bottom portion of the convex portion was 180 nm, and the curvature radius of the top portion of the convex portion was 40 nm.

Thickness on the surface of the concavo-convex resin layer side of the glass plate by reactive sputtering using a sintered body material of 97 mass% indium oxide and 3 mass% tin oxide in an atmosphere of 0.4 Pa composed of argon gas and oxygen A 30 nm ITO film was formed. The average interval between the convex portions of the ITO film is 180 nm, which is the same as the average interval between the convex portions of the uneven resin layer.
Next, a stripe-patterned photoresist is applied to the surface of the ITO film, dried and cured, and then immersed in hydrochloric acid at 25 ° C. and 5% by mass for 1 minute to etch the ITO film on both sides. A transparent electrode patterned ITO film was formed.

(Manufacture of image display devices)
A conductive transparent laminate as shown in FIG. 1 was produced using an electrode substrate and a glass plate for cover glass having a thickness of 0.7 mm.
Next, the detection unit was connected to the transparent electrode of the conductive transparent laminate, and a capacitive touch panel was assembled.
Next, the capacitive touch panel was placed on the side of the liquid crystal panel where the image is displayed, and the image display device was assembled.

[Comparative Example 1]
A conductive transparent laminate was produced in the same manner as in Example 1 except that the uneven resin layer was not formed.
Next, the detection unit was connected to the transparent electrode of the conductive transparent laminate, and a capacitive touch panel was assembled.
Next, the capacitive touch panel was placed on the side of the liquid crystal panel where the image is displayed, and the image display device was assembled.

[Evaluation]
The input surfaces of the image display devices of Example 1 and Comparative Example 1 were visually compared under the conditions that the brightness of the liquid crystal panel, the illuminance from the indoor light source on the input surface, and the incident angle from the indoor light source on the input surface were the same. As a result, the image display apparatus of Example 1 was brighter, the transparent electrode pattern was not noticeable, and the image visibility was good.

  The conductive transparent laminate of the present invention is useful as a member of a capacitive touch panel.

DESCRIPTION OF SYMBOLS 10 Conductive transparent laminated body 20 Transparent member 30 Transparent insulating layer 32 Convex part (fine concavo-convex structure)
34 Transparent base material 36 Uneven resin layer 44 1st transparent electrode 46 2nd transparent electrode Pc average space | interval Pe average space | interval S input surface

Claims (4)

A conductive transparent laminate used in a capacitive touch panel that detects the position of a conductor approaching or contacting an input surface as a change in capacitance,
A transparent member having the input surface;
A first transparent electrode disposed on the opposite side of the input surface with the transparent member interposed therebetween, and patterned;
A second transparent electrode that is spaced from the first transparent electrode via a transparent insulating layer and patterned, and
At least one transparent electrode of the first transparent electrode and the second transparent electrode is a concavo-convex transparent electrode having a fine concavo-convex structure in which an average interval between convex portions is 400 nm or less on at least one surface,
A fine concavo-convex structure in which an average interval between convex portions is 400 nm or less on at least a portion where the concavo-convex transparent electrode is not formed on a surface of a layer adjacent to the concavo-convex transparent electrode on a side in contact with the concave-convex transparent electrode A conductive transparent laminate for a capacitive touch panel. The transparent insulating layer has a transparent substrate and an uneven resin layer having the fine uneven structure formed on the surface of the transparent substrate on the surface,
The conductive transparent laminate for a capacitive touch panel according to claim 1, wherein the uneven transparent electrode is formed on a surface of the uneven resin layer on the fine uneven structure side. The conductive transparent laminate for a capacitive touch panel according to claim 1 or 2,
A detection unit that is electrically connected to a transparent electrode of the conductive transparent laminate for the capacitive touch panel and detects a change in capacitance when the conductor approaches or contacts the input surface; , Capacitive touch panel. The capacitive touch panel according to claim 3,
An image display device comprising: an image display device body.

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