JP2013049029A - Catalyst separation apparatus - Google Patents

Catalyst separation apparatus Download PDF

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JP2013049029A
JP2013049029A JP2011189501A JP2011189501A JP2013049029A JP 2013049029 A JP2013049029 A JP 2013049029A JP 2011189501 A JP2011189501 A JP 2011189501A JP 2011189501 A JP2011189501 A JP 2011189501A JP 2013049029 A JP2013049029 A JP 2013049029A
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catalyst
partition plate
reactor
gas
flow
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JP5935016B2 (en
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Kazutake Murahashi
一毅 村橋
Kentaro Morita
健太郎 森田
Yuzuru Kato
讓 加藤
Atsushi Murata
篤 村田
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Cosmo Oil Co Ltd
Japan Petroleum Exploration Co Ltd
Inpex Corp
Japan Oil Gas and Metals National Corp
Nippon Steel Engineering Co Ltd
Eneos Corp
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Cosmo Oil Co Ltd
Japan Petroleum Exploration Co Ltd
Inpex Corp
Japan Oil Gas and Metals National Corp
JX Nippon Oil and Energy Corp
Nippon Steel and Sumikin Engineering Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To eliminate a useless space inside a reactor and to separate and discharge liquid and a catalyst remaining after completion of reaction.SOLUTION: A raw material gas 28 is supplied from a delivery port of a gas distributor 30 into the reactor 21 of a generally cylindrical shape. A reacting liquid 24, the raw material gas and the catalyst 25 are made to flow vertically and react with each other inside the reactor. A catalyst separation apparatus 22 is provided with a partition plate 35 having an opening of a cylindrical wall 36 in the center on the lower side of the gas distributor 30. A riser tube 39 is inserted to the inside of the cylindrical wall 36 and an ascending flow is generated by the gas. A small hole 43 is arranged on the outer periphery side of the partition plate 35, and a down tube 44 is inserted therethrough and is placed alonside a recessed curved surface of the lower end part of the reactor. The upper end of the down tube 44 is protruded upward of the partition plate and is surrounded by a roof section 45. Catalyst separation filters 47 and discharge pipes 48 are arranged below the partition plate. The partition plate, the down tube and the riser tube form a circulation passage for slurry, the slurry discharged from a lower end outlet of the down tube is raised in a stagnation space, and product liquid is separated by the catalyst separation filters.

Description

本発明は、反応性の液体から触媒を分離するための触媒分離装置に関する。   The present invention relates to a catalyst separation device for separating a catalyst from a reactive liquid.

従来、触媒を用いて反応器内で液とガスを反応させて生成物として液やガスを生成するようにした触媒反応装置において、例えば反応終了後に反応器内に残る生成液から触媒を分離して取り出すようにした触媒分離装置が知られている。
このような触媒分離装置として、例えば特許文献1に記載されたものがある。この触媒分離装置を図5により説明する。
図5に示す触媒分離装置1において、耐高圧性であって略円筒状でカプセル状の反応器2内に反応液3が上部付近まで溜められて液面が形成されており、反応液3内には例えば微粒状の触媒4が分散されてスラリー状とされている。反応器2の略半球状の下端部分には原料ガス6を供給する供給管7が挿入され、供給管7は原料ガス6のガス分配器8に接続されている。
Conventionally, in a catalytic reaction apparatus that uses a catalyst to react liquid and gas in a reactor to produce liquid or gas as a product, for example, the catalyst is separated from the product liquid remaining in the reactor after the reaction is completed. There is known a catalyst separation apparatus that is adapted to be removed.
An example of such a catalyst separation device is described in Patent Document 1. This catalyst separation apparatus will be described with reference to FIG.
In the catalyst separation apparatus 1 shown in FIG. 5, the reaction liquid 3 is accumulated up to the vicinity of the upper part in a substantially cylindrical and capsule-shaped reactor 2 having a high pressure resistance, and a liquid surface is formed. For example, finely divided catalyst 4 is dispersed to form a slurry. A supply pipe 7 for supplying the raw material gas 6 is inserted into the substantially hemispherical lower end portion of the reactor 2, and the supply pipe 7 is connected to a gas distributor 8 for the raw material gas 6.

ガス分配器8には複数のノズルが所定間隔で下向きに形成されており、原料ガス6を気泡として吐出することになる。ガス分配器6の上部には原料ガス6の気泡からなる気泡流を形成させ、更に液と微粒状触媒を加えた気液固3相で流動するスラリー床9が形成されている。
そして、反応器2内において、反応液3の液面近くに反応後の生成液から触媒4を分離するための触媒分離フィルター10が濾過器として複数配列され、触媒分離フィルター10は排出管11を経由して触媒4を分離した生成液を外部に排出させるようになっている。スラリー床9のうち、触媒分離フィルター10の下部には冷却水を流通させるための冷却管12が垂直方向の管群として配列されている。
A plurality of nozzles are formed downward in the gas distributor 8 at predetermined intervals, and the raw material gas 6 is discharged as bubbles. Formed in the upper part of the gas distributor 6 is a bubbling flow consisting of bubbles of the raw material gas 6 and further a slurry bed 9 which flows in a gas-liquid solid three phase to which a liquid and a particulate catalyst are added.
In the reactor 2, a plurality of catalyst separation filters 10 for separating the catalyst 4 from the product solution after the reaction are arranged near the liquid surface of the reaction solution 3 as a filter, and the catalyst separation filter 10 passes through the discharge pipe 11. The product liquid from which the catalyst 4 has been separated is discharged to the outside. In the slurry bed 9, cooling pipes 12 for circulating cooling water are arranged in the lower part of the catalyst separation filter 10 as vertical pipe groups.

そして、ガス分配器8から原料ガス6を気泡として排出して上昇させることで反応液3を含むスラリーに上方への流れを生じさせる。そして、スラリーは冷却管12によって適度に冷却されて反応液3と原料ガス6と触媒4との反応を促進させて生成液を生じさせる。
また、スラリー床9では、ガス反応器8から吐出されてなる原料ガス6の気泡の上昇流によって反応液3と触媒4を含むスラリーの上昇流を反応器2内の中央領域で生じさせ、液面近くで外側に反転して外側領域での下降流となる。更に、ガス分配器8の気泡流によって再び中央領域での上昇流に変換させられる。
Then, the raw material gas 6 is discharged as bubbles from the gas distributor 8 and raised, thereby causing the slurry containing the reaction liquid 3 to flow upward. Then, the slurry is appropriately cooled by the cooling pipe 12 to promote the reaction of the reaction liquid 3, the raw material gas 6, and the catalyst 4 to generate a product liquid.
In the slurry bed 9, an upward flow of the slurry containing the reaction liquid 3 and the catalyst 4 is generated in the central region in the reactor 2 by the upward flow of the bubbles of the raw material gas 6 discharged from the gas reactor 8, and the liquid It is reversed to the outside near the surface and becomes a downward flow in the outside region. Furthermore, it is converted again into an upward flow in the central region by the bubble flow of the gas distributor 8.

そして、反応器2内で液面近くに設けた触媒分離フィルター10によって生成液と触媒4が分離され、触媒4は触媒分離フィルター10で捕捉され、生成液が一部の未反応液3と共に排出管11から外部に取り出される。また、反応後の生成ガスも一部の未反応原料ガス6と共に液面から上方に流出させられ、反応器2の上端部からガス排出管を通して外部に排出される。   The product liquid and the catalyst 4 are separated by the catalyst separation filter 10 provided near the liquid surface in the reactor 2, the catalyst 4 is captured by the catalyst separation filter 10, and the product liquid is discharged together with a part of the unreacted liquid 3. It is taken out from the tube 11 to the outside. Also, the product gas after the reaction is caused to flow upward from the liquid surface together with a part of the unreacted raw material gas 6, and is discharged from the upper end of the reactor 2 to the outside through the gas discharge pipe.

特表2007−516065号公報Special table 2007-516065 gazette

ところで、上述した触媒分離装置1は縦型円筒状の反応器2を有するため、下端底部は耐圧のために鏡板などの凹曲面構造を有しており、その一方でその直上に配設されるガス分配器8は、通常、複数のノズルが同一レベルで水平方向に配列された構造であるから、原料ガスの気泡はその上方に浮上して反応に寄与する。その結果、ガス分配器8の下側の凹曲面形状に由来する下部領域は反応のための容積として無駄な空間となる。
また、触媒と生成液を分離する濾過器としての触媒分離フィルター10は、反応液3と原料ガス6と触媒4が反応をするスラリー床9の上方部分に設けられたため、触媒分離フィルター10の設置領域では原料ガス6が残存している。そのため、原料ガス6による反応が継続しており、触媒分離フィルター10に生成して付着する緻密なケーキ層は未反応の反応液3と触媒4を含むためにスラリー床9よりも高効率反応を起こすことになる。例えば、発熱反応の場合には、上述したケーキ層及び触媒分離フィルター10が加熱されて高温になり、触媒シンタリングやフィルター目の焼き締まり等で目詰まりする。また、触媒分離フィルター10はフィルターの流動抵抗によって反応器2全体の流動に悪影響を与えるおそれがある。
By the way, since the catalyst separation apparatus 1 described above has the vertical cylindrical reactor 2, the bottom end has a concave curved surface structure such as an end plate for pressure resistance, and on the other hand, it is disposed immediately above. The gas distributor 8 usually has a structure in which a plurality of nozzles are arranged in the horizontal direction at the same level, so that the bubbles of the raw material gas float above and contribute to the reaction. As a result, the lower region derived from the concave curved shape on the lower side of the gas distributor 8 becomes a useless space as a volume for reaction.
Further, since the catalyst separation filter 10 as a filter for separating the catalyst and the product liquid is provided in the upper part of the slurry bed 9 where the reaction liquid 3, the raw material gas 6 and the catalyst 4 react, the installation of the catalyst separation filter 10 is performed. In the region, the raw material gas 6 remains. Therefore, the reaction by the raw material gas 6 continues, and the dense cake layer that is generated and adhered to the catalyst separation filter 10 contains the unreacted reaction solution 3 and the catalyst 4, so that the reaction is more efficient than the slurry bed 9. Will wake up. For example, in the case of an exothermic reaction, the cake layer and the catalyst separation filter 10 described above are heated to a high temperature and clogged due to catalyst sintering, filter burn-in, and the like. Further, the catalyst separation filter 10 may adversely affect the flow of the entire reactor 2 due to the flow resistance of the filter.

また、本来、濾過器である触媒分離フィルター10は生成液を抜き出す目的で設置されているが、原料ガスの存在によって生成液に原料ガスが随伴し、しかも触媒分離フィルター10では濾過抵抗の大小関係によって原料ガスが優先的に排出管11から流れ出てしまう。その結果、反応器2内の上部である後流の領域に気液分離装置を設置することが必要になり、装置構成が煩雑になる欠点がある。
しかも、反応器2内には、反応液3と原料ガス6と触媒4の反応が停止した後に生成液と触媒4が残留しており、これら生成液と触媒4を反応器2の外部に排出する場合、触媒分離フィルター10の設置高さまでの生成液と触媒4は抜き出し可能であるが、それより下方に残存する生成液と触媒4の残存液は触媒分離フィルター10を用いて排出させることができず、触媒を分離できないまま排出させることになるという不具合があった。
In addition, the catalyst separation filter 10 that is a filter is originally installed for the purpose of extracting the product liquid, but the raw material gas accompanies the product liquid due to the presence of the raw material gas, and the catalyst separation filter 10 is related to the magnitude of the filtration resistance. As a result, the source gas preferentially flows out of the discharge pipe 11. As a result, it is necessary to install a gas-liquid separation device in the wake region, which is the upper part in the reactor 2, and there is a disadvantage that the device configuration becomes complicated.
Moreover, in the reactor 2, the product liquid and the catalyst 4 remain after the reaction of the reaction liquid 3, the raw material gas 6, and the catalyst 4 is stopped, and these product liquid and the catalyst 4 are discharged to the outside of the reactor 2. In this case, the product liquid up to the installation height of the catalyst separation filter 10 and the catalyst 4 can be extracted, but the product liquid remaining below and the catalyst 4 remaining liquid can be discharged using the catalyst separation filter 10. There was a problem that the catalyst could not be separated and was discharged without being separated.

本発明は、このような事情を鑑みてなされたものであり、反応器内の無駄な空間をなくし、反応終了後に反応器内に残存する液と触媒を効率よく分離して排出できるようにした触媒分離装置を提供することを目的とする。   The present invention has been made in view of such circumstances, eliminates a useless space in the reactor, and can efficiently separate and discharge the liquid and catalyst remaining in the reactor after the reaction is completed. An object is to provide a catalyst separation device.

本発明による触媒分離装置は、略円筒形状の反応器に原料ガスを供給し、該反応器内で触媒を用いて液と原料ガスと触媒を反応させて生成液を得るようにした触媒分離装置において、反応器内に原料ガスを供給するガス分配器を設け、ガス分配器の下側に生成液と触媒を流動させる開口を有する仕切り板を設け、仕切り板の下側に触媒分離フィルターと排出管を設けたことを特徴とする。
本発明によれば、反応器内でガス分配器から原料ガスの気泡を吐出して上方に気泡流を形成させることで液と原料ガスと触媒の気液固3相スラリーの混合流動を生じさせて反応させ、仕切り板に向けた下降流によって原料ガスを分離させ、更に生成液と触媒が仕切り板の開口を通過する際、そして、反応器の下端部に沿って流れ下った後に反応器の底部で上下反転して仕切り板の下側に配置された触媒分離フィルターに向かって低速で上昇する際、生成液と触媒は重力沈降によって予め分離され、更に触媒分離フィルターによって触媒と分離された生成液が排出管によって外部に排出される。
The catalyst separation apparatus according to the present invention supplies a raw material gas to a substantially cylindrical reactor, and reacts the liquid, the raw material gas and the catalyst using the catalyst in the reactor to obtain a product liquid. In the reactor, a gas distributor for supplying the raw material gas is provided, a partition plate having an opening for flowing the product liquid and the catalyst is provided below the gas distributor, and a catalyst separation filter and a discharge are provided below the partition plate. A tube is provided.
According to the present invention, a gas-liquid solid-phase three-phase slurry of liquid, raw material gas, and catalyst is generated by discharging the raw material gas bubbles from the gas distributor in the reactor to form a bubble flow upward. The raw material gas is separated by a downward flow toward the partition plate, and when the product liquid and the catalyst pass through the opening of the partition plate and flow down along the lower end of the reactor, The product liquid and the catalyst are separated in advance by gravity sedimentation and then separated from the catalyst by the catalyst separation filter when rising at a low speed toward the catalyst separation filter arranged upside down at the bottom and arranged below the partition plate. The liquid is discharged to the outside through the discharge pipe.

また、仕切り板の開口は、触媒と生成液を上昇させる第一の開口と、触媒と生成液を降下させる第二の開口とを有することが好ましい。
仕切り板とその下側では、仕切り板と第一の開口と第二の開口と反応器の下端部底面とによって生成液と触媒の循環流が発生する。
Moreover, it is preferable that the opening of a partition plate has the 1st opening which raises a catalyst and a production | generation liquid, and the 2nd opening which drops a catalyst and a production | generation liquid.
On the partition plate and the lower side thereof, a circulating flow of the product liquid and the catalyst is generated by the partition plate, the first opening, the second opening, and the bottom surface of the lower end of the reactor.

また、仕切り板は、前記第二の開口を設けた外周側から前記第一の開口を設けた中央部に向けて下方に傾斜して形成され、前記第一の開口に前記反応器の底部中央から上昇するガスを供給するライザー管を設けてなることが好ましい。
ライザー管に上昇するガスを流動させることで、反応器の底部から仕切り板の上側に向けて上昇流れを生成できて、仕切り板の下側に流入する生成液と触媒を循環させることができる。
In addition, the partition plate is formed to be inclined downward from the outer peripheral side provided with the second opening toward the central part provided with the first opening, and at the bottom center of the reactor in the first opening. It is preferable to provide a riser pipe for supplying the gas rising from the tank.
By causing the gas rising to the riser pipe to flow, an upward flow can be generated from the bottom of the reactor toward the upper side of the partition plate, and the product liquid and the catalyst flowing into the lower side of the partition plate can be circulated.

また、仕切り板の第一の開口にはライザー管に沿って下方に延びる略筒状壁が形成され、該筒状壁の外周側であって該筒状壁の下端より上方に触媒分離フィルターと排出管が配設されていることが好ましい。
筒状壁の下端より上方に触媒分離フィルターを設けたことで、筒状壁とライザー管の間の環状空間の下側に流入する生成液と触媒の流れをライザー管を通して上昇流に変換できて循環流を形成でき、しかも仕切り板から下方に流れる生成液がライザー管に向かう循環路の途中で、触媒を含む生成液の流れに液よどみを生じさせ、その領域から触媒分離フィルターへ向かう低速の上昇流を得ることができる。
In addition, a substantially cylindrical wall extending downward along the riser pipe is formed in the first opening of the partition plate, and a catalyst separation filter is disposed on the outer peripheral side of the cylindrical wall and above the lower end of the cylindrical wall. A discharge pipe is preferably provided.
By providing a catalyst separation filter above the lower end of the cylindrical wall, the flow of the product liquid and catalyst flowing into the lower side of the annular space between the cylindrical wall and the riser pipe can be converted into an upward flow through the riser pipe. A circulating flow can be formed, and the product liquid flowing downward from the partition plate creates a stagnation in the flow of the product liquid containing the catalyst in the middle of the circulation path toward the riser pipe. An upward flow can be obtained.

また、仕切り板の外周側領域には、生成液と触媒を仕切り板の上側から反応器の底部中央に向けて流動させるように第二の開口にチューブが配設され、チューブの上端入口は仕切り板より上方に突出していてもよい。
生成液と触媒は仕切り板からチューブの上端入口まで上昇することでガスと触媒の一部を分離でき、そして生成液と触媒は上端入口からチューブを通して反応器の底部に沿って流下することで反応器の底部中央付近に設けたライザー管へ向けて誘導できる。このとき、チューブ下端の出口からライザー管への流れは反応器底面に沿ってスムーズになり、その領域から触媒分離フィルターに向かう低速の上昇流を得ることができる。
In addition, a tube is disposed in the second opening in the outer peripheral side region of the partition plate so that the product liquid and the catalyst flow from the upper side of the partition plate toward the center of the bottom of the reactor. You may protrude above a board.
The product liquid and catalyst can be separated from the gas and part of the catalyst by rising from the partition plate to the top inlet of the tube, and the product liquid and catalyst can be reacted by flowing down from the top inlet through the tube along the bottom of the reactor. It can be guided toward the riser pipe provided near the bottom center of the vessel. At this time, the flow from the outlet at the lower end of the tube to the riser tube becomes smooth along the bottom surface of the reactor, and a low-speed upward flow from that region toward the catalyst separation filter can be obtained.

また、チューブの上端入口は屋根部によって覆われていてもよい。
これによって、反応器内で上下に流動する液と触媒と原料ガスが、反応後に直接チューブの上端入口に流入することを防止できる。
Moreover, the upper end inlet of the tube may be covered with the roof part.
As a result, it is possible to prevent the liquid, catalyst and source gas flowing up and down in the reactor from flowing directly into the upper end inlet of the tube after the reaction.

また、ライザー管にガスを供給するガスノズルが設けられ、ガスノズルのガス流によってライザー管に上昇流を形成し、筒状壁とライザー管の間隙に上方から下方へ生成液と触媒の流れを形成するようにしてもよい。
これにより、ガスノズルのガス流によってライザー管に上昇流を形成し、筒状壁とライザー管の間隙に仕切り板上側から降下する生成液及び触媒をライザー管で反転させて上昇流を形成することができる。
Also, a gas nozzle for supplying gas to the riser pipe is provided, and an upward flow is formed in the riser pipe by the gas flow of the gas nozzle, and a flow of the product liquid and the catalyst is formed from above to below in the gap between the cylindrical wall and the riser pipe. You may do it.
As a result, an upward flow is formed in the riser pipe by the gas flow of the gas nozzle, and the upward flow is formed by inverting the product liquid and the catalyst descending from the upper side of the partition plate in the gap between the cylindrical wall and the riser pipe with the riser pipe. it can.

本発明による触媒分離装置によれば、ガス分配器から上方に向けて供給される気泡によって反応液と原料ガスと触媒との上下流と反応を進めると共に、仕切り板の下側には開口から生成液と触媒が流動することで仕切り板の下側に設けた触媒分離フィルターによって生成液と触媒を分離させて、触媒を捕捉すると共に生成液を排出管によって排出できる。そのため、従来、無駄な空間とされていた反応器内におけるガス分配器の下側に触媒分離フィルターを設けることで有効利用することができ、しかも上側に触媒分離フィルターを設けないこととすれば生成液とガスの反転流を妨げる等の流動に悪影響を与えることもない。
また、仕切り板の下側には原料ガスが流れ込み難いから、仕切り板の下側に流れ込む生成液にガスが随伴する弊害を防止できる。しかも、反応器の下側に触媒分離フィルターからなる濾過器を設けることで、反応を停止させた状態で、触媒分離フィルターを設けた反応器の底部近くまで生成液と触媒を濾過分離できることになり、反応器内に残る触媒中に残留する生成液の量を少なくできる。
According to the catalyst separation device of the present invention, the reaction liquid, the raw material gas, and the catalyst are allowed to react upstream and downstream by bubbles supplied upward from the gas distributor, and the lower side of the partition plate is generated from the opening. When the liquid and the catalyst flow, the product liquid and the catalyst are separated by the catalyst separation filter provided on the lower side of the partition plate, and the catalyst is captured and the product liquid can be discharged by the discharge pipe. For this reason, it can be used effectively by providing a catalyst separation filter below the gas distributor in the reactor, which has conventionally been wasted space, and if no catalyst separation filter is provided on the upper side, it can be produced. It does not adversely affect the flow such as obstructing the reverse flow of liquid and gas.
Further, since the raw material gas does not easily flow into the lower side of the partition plate, it is possible to prevent the adverse effect of the gas accompanying the product liquid flowing into the lower side of the partition plate. Moreover, by providing a filter consisting of a catalyst separation filter on the lower side of the reactor, the product liquid and the catalyst can be filtered and separated to the bottom of the reactor equipped with the catalyst separation filter in a state where the reaction is stopped. The amount of the product liquid remaining in the catalyst remaining in the reactor can be reduced.

また、仕切り板の開口は、触媒と生成液を上昇させる第一の開口と、触媒と生成液を降下させる第二の開口とを有するから、仕切り板の第二の開口から下側へ触媒と生成液を降下させて流入させ、反応器の底部中央のライザー管を通して第一の開口に生成液と触媒の上昇流を形成することができるため、仕切り板の第二の開口から下側へ降下する触媒を含む生成液を触媒分離フィルターによって生成液と触媒に分離できる。   Moreover, since the opening of the partition plate has a first opening for raising the catalyst and the product liquid and a second opening for lowering the catalyst and the product liquid, the catalyst is moved downward from the second opening of the partition plate. The product liquid is allowed to flow down and flow into the first opening through the riser tube at the center of the bottom of the reactor, so that the upward flow of the product liquid and catalyst can be formed downward from the second opening of the partition plate. The product liquid containing the catalyst to be separated can be separated into the product liquid and the catalyst by the catalyst separation filter.

また、仕切り板は、第二の開口を設けた外周側から第一の開口を設けた中央部に向けて下方に傾斜して形成され、第一の開口に反応器の底部中央から上昇するガスを供給するライザー管を設けてなるから、ライザー管に上昇するガスを流動させることで、反応器の底部から仕切り板の上側に向けて流れを生成できて、仕切り板の下側に流入する生成液と触媒の上昇流を生じさせて循環路を形成することができる。
また、仕切り板が中央部に向けて下方に傾斜する形状であることにより、上方のスラリー流れに関しても、外側領域での下降流がガス分配器の気泡流によって再び中央領域での上昇流に反転する際の圧力損失を抑えられ、スムーズな循環量を形成することができる。
The partition plate is formed by inclining downward from the outer peripheral side provided with the second opening toward the central part provided with the first opening, and rising from the center of the bottom of the reactor to the first opening. Since the riser pipe is supplied, the flow of gas rising to the riser pipe can generate a flow from the bottom of the reactor to the upper side of the partition plate, and it flows into the lower side of the partition plate. A circulation path can be formed by generating an upward flow of liquid and catalyst.
In addition, since the partition plate is inclined downward toward the central portion, the downward flow in the outer region is reversed again to the upward flow in the central region by the bubble flow of the gas distributor with respect to the upper slurry flow. The pressure loss at the time of performing can be suppressed, and a smooth circulation amount can be formed.

また、仕切り板の第一の開口にはライザー管に沿って下方に延びる略筒状壁が形成され、該筒状壁の外周側であって筒状壁の下端より上方に触媒分離フィルターと排出管が配設されているから、第二の開口から流入する生成液と触媒の多くは反応器の底面に沿ってゆっくりとスムーズに下降してライザー管の入口に流れ、そのスムーズな流れの領域から触媒分離フィルターに向かう低速の上昇流を得るので、上昇する液は触媒から分離される。   In addition, a substantially cylindrical wall extending downward along the riser pipe is formed in the first opening of the partition plate, and the catalyst separation filter and the discharge are disposed on the outer peripheral side of the cylindrical wall and above the lower end of the cylindrical wall. Since the pipe is arranged, most of the product liquid and catalyst flowing in from the second opening slowly descends slowly along the bottom of the reactor and flows to the inlet of the riser pipe. Is obtained from the catalyst, so that the rising liquid is separated from the catalyst.

また、仕切り板の外周側領域には、生成液と触媒を仕切り板の上側から反応器の底部中央に向けて流動させるように第二の開口にチューブが配設され、該チューブの上端入口は仕切り板より上方に突出しているから、仕切り板に降下する生成液と触媒はチューブまで流動した後、チューブの上端入口まで上昇することで原料ガスを分離でき、更に触媒の一部を分離できるため、チューブを通して仕切り板の下側に降下する生成液からガスの随伴を防止でき、触媒の随伴も抑制できて、触媒分離フィルターでの触媒負荷が軽減される。     In addition, a tube is disposed in the second opening in the outer peripheral side region of the partition plate so that the product liquid and the catalyst flow from the upper side of the partition plate toward the center of the bottom of the reactor. Since the product liquid and the catalyst that descends to the partition plate flow up to the tube and then flow up to the upper end inlet of the tube, the raw material gas can be separated and a part of the catalyst can be separated. Further, gas entrainment can be prevented from the product liquid descending to the lower side of the partition plate through the tube, catalyst entrainment can be suppressed, and the catalyst load on the catalyst separation filter is reduced.

また、チューブの上端入口は屋根部によって覆われているため、ガス分配器の上方で反応液と触媒と原料ガスが反応して生成された生成液と触媒とガスが降下して直接チューブに流入することを防止できて、仕切り板の下側に降下する生成液にガスの随伴を防止できる。   In addition, because the upper end inlet of the tube is covered with a roof, the product solution, catalyst, and gas generated by the reaction of the reaction solution, catalyst, and raw material gas above the gas distributor descend and flow directly into the tube. It is possible to prevent the gas from entraining the product liquid descending below the partition plate.

また、ライザー管にガスを供給するガスノズルが設けられ、ガスノズルのガス流によってライザー管に上昇流を形成し、筒状壁とライザー管の間隙に上方から下方へ生成液と触媒の流れを形成するため、ガスノズルのガス流によってライザー管に上昇流を形成し、筒状壁とライザー管の間隙に上方から降下する生成液及び触媒をライザー管で反転させて上昇流を形成することができ、これによって仕切り板の第二の開口から降下する生成液と触媒の流れを触媒分離フィルターへ導く流路を形成することができる。   Also, a gas nozzle for supplying gas to the riser pipe is provided, and an upward flow is formed in the riser pipe by the gas flow of the gas nozzle, and a flow of the product liquid and the catalyst is formed from above to below in the gap between the cylindrical wall and the riser pipe. Therefore, an upward flow can be formed in the riser pipe by the gas flow of the gas nozzle, and the product liquid and the catalyst descending from above in the gap between the cylindrical wall and the riser pipe can be reversed by the riser pipe to form the upward flow. Thus, a flow path can be formed that guides the flow of the product liquid and the catalyst descending from the second opening of the partition plate to the catalyst separation filter.

本発明の実施形態による触媒分離装置を含む反応器の概略構成図である。It is a schematic block diagram of the reactor containing the catalyst separation apparatus by embodiment of this invention. 図1に示す反応器の触媒分離装置の構成を示す部分拡大図である。It is the elements on larger scale which show the structure of the catalyst separation apparatus of the reactor shown in FIG. 図2に示す反応器におけるガス分配器のA−A線及びB−B線断面図の図である。It is the figure of the AA line of the gas distributor in the reactor shown in FIG. 2, and the BB sectional drawing. 触媒分離装置の触媒分離フィルターを示すC−C線要部断面図である。It is CC main part sectional drawing which shows the catalyst separation filter of a catalyst separation apparatus. 従来の反応器における触媒分離構造を示す概略説明図である。It is a schematic explanatory drawing which shows the catalyst separation structure in the conventional reactor.

以下、添付図面を参照して、本発明の実施形態による触媒分離装置について説明する。
図1及び図2に示す触媒反応装置20は反応器21の下部に触媒分離装置22を設けている。触媒反応装置20に設けられた反応器21は略円筒状であって、その上下端部には略半球状の上端部21aと下端部21bがそれぞれ形成された略カプセル形状とされている。そのため、この反応器21は高温高圧下で反応液やガスの反応に耐えることができる。
反応器21内には反応用の液である反応液24が充填され、上端部21a近傍にその液面24aが形成されている。また、反応液24内には触媒として、例えば微粒状の触媒25が分散して混入されている。なお、反応液24と触媒25とでスラリーを形成し、このスラリーに後述する原料ガス28による気泡が混入して反応させられる。
Hereinafter, a catalyst separation apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings.
The catalyst reaction device 20 shown in FIGS. 1 and 2 is provided with a catalyst separation device 22 below the reactor 21. The reactor 21 provided in the catalyst reaction apparatus 20 is substantially cylindrical, and has a substantially capsule shape in which upper and lower end portions are respectively formed with a substantially hemispherical upper end portion 21a and a lower end portion 21b. Therefore, this reactor 21 can withstand the reaction of the reaction liquid and gas under high temperature and high pressure.
The reactor 21 is filled with a reaction solution 24 which is a reaction solution, and a liquid surface 24a is formed in the vicinity of the upper end 21a. Further, for example, a fine catalyst 25 is dispersed and mixed in the reaction solution 24 as a catalyst. Note that a slurry is formed by the reaction solution 24 and the catalyst 25, and bubbles due to a raw material gas 28 described later are mixed into the slurry and reacted.

反応液24を貯留した反応器21の略円筒状部分には冷却管路27が配設されている。冷却管路27は、反応器21内の上側に供給側管路27aと排出側管路27bがそれぞれ水平方向に略平行に延びている。そして、供給側管路27aと排出側管路27bに両端部が連結された略U字型冷却管27cは下方向に略U字状に延びて形成され、この略U字形冷却管27cは供給側管路27aと排出側管路27bの延在方向に所定間隔を開けて複数本配列されている。
そのため、冷却管路27内に冷却液を流して循環させることで、反応器21内の反応液24の温度を下げて反応に適する温度に調整できる。
A cooling pipe 27 is disposed in a substantially cylindrical portion of the reactor 21 that stores the reaction liquid 24. In the cooling pipe 27, a supply side pipe 27 a and a discharge side pipe 27 b extend substantially parallel to the horizontal direction on the upper side in the reactor 21. A substantially U-shaped cooling pipe 27c having both ends connected to the supply side conduit 27a and the discharge side conduit 27b extends downward in a substantially U shape, and the substantially U-shaped cooling pipe 27c is supplied to the supply side conduit 27a and the discharge side conduit 27b. A plurality of lines are arranged at predetermined intervals in the extending direction of the side pipe line 27a and the discharge side pipe line 27b.
Therefore, the temperature of the reaction liquid 24 in the reactor 21 can be lowered and adjusted to a temperature suitable for the reaction by flowing the cooling liquid in the cooling pipe 27 and circulating it.

また、反応器21において、冷却管路27の下側には原料ガス28を上方に供給するためのガス分配器30が設けられている。ガス分配器30は、例えば反応器21と略同軸に多重環状管(図1及び図3では、例えば二重環状管とされている)が配設され、例えば外側の第一環状管31と内側の第二環状管32が配設されている。ガス分配器30は、反応器21の外部からこれら第一及び第二環状管31,32に連結して原料ガス28を供給する連通管33が設けられている。   In the reactor 21, a gas distributor 30 for supplying the raw material gas 28 upward is provided below the cooling pipe 27. The gas distributor 30 is provided with, for example, a multi-annular pipe (in FIG. 1 and FIG. 3, for example, a double annular pipe) substantially coaxially with the reactor 21, for example, an outer first annular pipe 31 and an inner side. The second annular tube 32 is disposed. The gas distributor 30 is provided with a communication pipe 33 connected to the first and second annular pipes 31 and 32 from the outside of the reactor 21 to supply the raw material gas 28.

そして、第一環状管31にはその下面に所定間隔でノズル31aが形成され、第二環状管32にもその下面に所定間隔でノズル32aが形成されている。これら複数のノズル31a、32aは同一水平面上に配列されていることが好ましい。
そのため、ガス分配器30は、外部の図示しないタンクから原料ガス28が連通管33を通して第一及び第二環状管31、32に供給され、各ノズル31a、32aから気泡となって吐出され、上方に上昇するバブリング装置を構成する。原料ガス28の気泡の上昇流に伴って反応液24と触媒25にも上昇流が生じる。
これによって、原料ガス28の気泡と反応液24と触媒25とについて、反応器21内の中央領域で上昇流が形成され、液面24a近傍まで上昇すると外側に反転して下方に降下するという循環流が形成され、原料ガス28の気泡と反応液24と触媒25とが反応する。そして、上昇流内には未反応の原料成分が多く、反転した後の下降流内には反応生成成分が多い。この部分が触媒反応装置20を構成する。
The first annular pipe 31 has nozzles 31a formed at predetermined intervals on the lower surface thereof, and the second annular pipe 32 has nozzles 32a formed at predetermined intervals on the lower surface thereof. The plurality of nozzles 31a and 32a are preferably arranged on the same horizontal plane.
Therefore, the gas distributor 30 is supplied with the raw material gas 28 from an external tank (not shown) through the communication pipe 33 to the first and second annular pipes 31 and 32 and discharged from each nozzle 31a and 32a as bubbles. The bubbling device that rises to the top is configured. An upward flow is also generated in the reaction solution 24 and the catalyst 25 along with the upward flow of bubbles of the raw material gas 28.
As a result, the bubbles of the raw material gas 28, the reaction liquid 24, and the catalyst 25 form an upward flow in the central region in the reactor 21, and when they rise to the vicinity of the liquid surface 24a, they are reversed outside and fall downward. A flow is formed, and the bubbles of the raw material gas 28 react with the reaction liquid 24 and the catalyst 25. And there are many unreacted raw material components in the upward flow, and there are many reaction product components in the downward flow after reversing. This part constitutes the catalytic reaction apparatus 20.

つぎに、触媒分離装置22について説明する。
図1及び図2に示す反応器21において、ガス分配器30の下側には略すり鉢状の仕切り板35が配設され、その外周縁は反応器21の内周面に当接している。そして、仕切り板35の中央部には例えば略円筒状の筒状壁36が形成され、筒状壁36は下端部21bに向けて略垂直方向に降下して形成されており、筒状壁36で形成する開口37を第一の開口とする。
図2において、筒状壁36の内側には、例えば略同軸上にライザー管39がその上下方向に貫通して設けられ、その上端はガス分配器30の近傍に届き、下端は筒状壁36より下方に突出しているが、引っ込んでいてもよく、或いは同じ高さにあってもよい。
Next, the catalyst separation device 22 will be described.
In the reactor 21 shown in FIGS. 1 and 2, a substantially mortar-shaped partition plate 35 is disposed below the gas distributor 30, and the outer peripheral edge thereof is in contact with the inner peripheral surface of the reactor 21. For example, a substantially cylindrical tubular wall 36 is formed at the center of the partition plate 35, and the tubular wall 36 is formed so as to descend in a substantially vertical direction toward the lower end portion 21 b. The opening 37 formed in step 1 is defined as the first opening.
In FIG. 2, for example, a riser pipe 39 is provided on the inner side of the cylindrical wall 36 so as to be substantially coaxially penetrated in the vertical direction, the upper end reaches the vicinity of the gas distributor 30, and the lower end is the cylindrical wall 36. Although it protrudes further downward, it may be retracted or at the same height.

ライザー管39には、反応器21の下端部21bを貫通して延びる原料ガス28(またはライザーガス)供給用のノズル40が挿入されており、少量の原料ガス28がノズル40から吐出されることで、ライザー管39内に上昇流が形成される。ノズル40から原料ガス28を気泡として供給するのは、ライザー管39内に上昇流を起こさせるためである。
一方、ライザー管39と筒状壁36との間に比較的狭く小面積のリング状空間41が形成される。このリング状空間41には、主に生成液28と触媒25を含むスラリーによる下降流が形成され、このスラリーはライザー管39を通して下降流から上昇流に反転させられる。
A nozzle 40 for supplying a raw material gas 28 (or riser gas) extending through the lower end 21 b of the reactor 21 is inserted into the riser tube 39, and a small amount of the raw material gas 28 is discharged from the nozzle 40. Thus, an upward flow is formed in the riser pipe 39. The reason why the raw material gas 28 is supplied as bubbles from the nozzle 40 is to cause an upward flow in the riser pipe 39.
On the other hand, a ring-shaped space 41 having a relatively small and small area is formed between the riser tube 39 and the cylindrical wall 36. In this ring-shaped space 41, a downward flow is mainly formed by a slurry containing the product liquid 28 and the catalyst 25, and this slurry is reversed from the downward flow to the upward flow through the riser pipe 39.

そして、すり鉢状の仕切り板35の外周縁近傍には第二の開口として小孔43が所定間隔で周方向に形成されており、この小孔43には仕切り板35の上側に降下するスラリーを更に降下させるためのダウンチューブ44が嵌挿されている。ダウンチューブ44の上端入口は小孔43の上方に突出し、その下部は仕切り板35の下方で反応器21の下端部21bの略半球状の凹曲面に沿って湾曲して降下し、筒状壁36の近くに下端出口が位置している。   Small holes 43 are formed in the vicinity of the outer peripheral edge of the mortar-shaped partition plate 35 as a second opening in the circumferential direction at predetermined intervals, and slurry that descends above the partition plate 35 is placed in the small holes 43. Further, a down tube 44 for lowering is inserted. The upper end inlet of the down tube 44 protrudes above the small hole 43, and the lower part of the down tube 44 is bent below the partition plate 35 along the substantially hemispherical concave curved surface of the lower end 21 b of the reactor 21, so that the cylindrical wall A bottom exit is located near 36.

しかも、各ダウンチューブ44の上端入口を囲うように断面略L字形状の屋根部45が形成され、屋根部45の天面に微小な開口が気抜き穴45aとして形成されている。また、仕切り板35には、外周縁部近傍の他の領域にも小さな開口が気抜き穴46として形成されている。これら気抜き穴45a、46はスラリーに含まれる原料ガス28や反応で生じる生成ガスの気泡を仕切り板35の上方に抜けるようにしたものである。
反応器21内において、下方に降下する原料ガス28や生成ガスの気泡を含むスラリーは、仕切り板35と屋根部45との隙間を通して屋根部45内に流入して上昇流となることで、スラリーに含まれる気泡が分離して屋根部45の気抜き穴45aから上方に抜け、気泡をほとんど含まないスラリーがダウンチューブ44の上端入口から流入することになる。
In addition, a roof portion 45 having a substantially L-shaped cross section is formed so as to surround the upper end inlet of each down tube 44, and a minute opening is formed as a vent hole 45a on the top surface of the roof portion 45. In addition, a small opening is formed in the partition plate 35 as a vent hole 46 in another region near the outer peripheral edge. These vent holes 45a and 46 are configured to allow the bubbles of the raw material gas 28 contained in the slurry and the product gas generated by the reaction to escape above the partition plate 35.
In the reactor 21, the slurry containing the bubbles of the raw material gas 28 and the product gas descending downward flows into the roof portion 45 through the gap between the partition plate 35 and the roof portion 45, and becomes an upward flow. Bubbles are separated and escape upward from the vent hole 45a of the roof portion 45, and slurry containing almost no bubbles flows from the upper end inlet of the down tube 44.

また、図2において、仕切り板35の下側には中央の筒状壁36と外周端近傍の小孔43や気抜き穴46を外れた領域に、生成液29を含むスラリーから触媒25を分離して捕捉する触媒分離フィルター47が濾過器として設けられている。更に、この触媒分離フィルター47には、スラリーから触媒25を除去した生成液29や残存する未反応原料成分を外部に排出するための排出管48が連結されている。
図4に示すように、触媒分離フィルター47は筒状壁36の周囲に例えば互いに接触しないようにリング状に配列され、更にその外側にも互いに非接触となるようにリング状に配列されている。そのため、これら触媒分離フィルター47は筒状壁36の周囲に二重に配列され、しかも筒状壁36の下端部より上方に位置している(図2参照)。これにより、ダウンチューブ44から排出されるスラリーから重力分離が可能な低速の液上昇流を経て触媒分離フィルター47で濾過されるので、高濃度な触媒スラリーが触媒分離フィルター47のフィルター面に吸着されることを防止する。
そして二重に配列された各触媒分離フィルター47に連結された排出管48は、仕切り板35の径方向外側に向けて反応器21の外側まで突出して配列されている。排出管48を通して生成液29と僅かに残った未反応原料成分が外部に排出される。
In FIG. 2, the catalyst 25 is separated from the slurry containing the product liquid 29 in a region where the central cylindrical wall 36 and the small holes 43 and the vent holes 46 in the vicinity of the outer peripheral end are removed from the lower side of the partition plate 35. Then, a catalyst separation filter 47 to be captured is provided as a filter. Further, the catalyst separation filter 47 is connected to a discharge pipe 48 for discharging the product liquid 29 obtained by removing the catalyst 25 from the slurry and the remaining unreacted raw material components to the outside.
As shown in FIG. 4, the catalyst separation filter 47 is arranged in a ring shape so as not to contact each other, for example, around the cylindrical wall 36, and further arranged in a ring shape so as not to be in contact with each other outside. . Therefore, these catalyst separation filters 47 are arranged in a double manner around the cylindrical wall 36, and are positioned above the lower end of the cylindrical wall 36 (see FIG. 2). As a result, the slurry discharged from the down tube 44 is filtered by the catalyst separation filter 47 through a low-speed liquid rising flow that can be separated by gravity, so that the high concentration catalyst slurry is adsorbed on the filter surface of the catalyst separation filter 47. To prevent it.
The discharge pipes 48 connected to the double catalyst separation filters 47 are arranged so as to protrude outward in the radial direction of the partition plate 35 to the outside of the reactor 21. Through the discharge pipe 48, the product liquid 29 and a slight amount of unreacted raw material components are discharged to the outside.

なお、ライザー管39で発生するスラリーの上昇流はノズル40からのガス上昇流によって生じるが、このときのスラリー中の未反応の原料ガス28が最小となるように、ダウンチューブ44で大半のスラリーの降下量を得るものとし、筒状壁36のリング状空間41からのスラリーの下降は最小となるように、リング状空間41の開口面積、ダウンチューブ44の配管の径と数量を設定するものとする。
このとき、リング状空間41での降下流よりダウンチューブ44を流れる流量の方が多くなり、ダウンチューブ44を流れるスラリーの流量とライザー管39を上昇するスラリーの流量とはほぼ等しくなる。
The upward flow of the slurry generated in the riser pipe 39 is generated by the upward flow of gas from the nozzle 40, but most of the slurry is generated in the down tube 44 so that the unreacted raw material gas 28 in the slurry at this time is minimized. The opening area of the ring-shaped space 41 and the diameter and quantity of the piping of the down tube 44 are set so that the slurry descends from the ring-shaped space 41 of the cylindrical wall 36 to the minimum. And
At this time, the flow rate flowing through the down tube 44 is greater than the downward flow in the ring-shaped space 41, and the flow rate of the slurry flowing through the down tube 44 and the flow rate of the slurry rising up the riser tube 39 are substantially equal.

本実施形態による触媒分離装置22は上述の構成を備えており、次にその触媒分離方法について図1及び図2を中心に説明する。
先ず、反応器21内において、触媒反応装置20では、反応器21内に触媒25を分散させた反応液24を含むスラリーが液面24aまで満たされた状態で、ガス分配器30から原料ガス28を気泡としてバブリングさせて反応液24内に吐出する。すると、気泡の上昇流によって気泡を含むスラリーは中央領域での上昇流となり、液面24a近くで外側に反転して下降流となり、仕切り板35に向かう。そして、この下降流はガス分配器30の気泡による上昇流によって再度中央領域での上昇流となる循環流となる。
そして、この循環流は、液面24aとガス分配器30との間において中央領域の上昇流では、スラリー中に反応前の反応液24と触媒25と原料ガス28の気泡が多く含まれる。そして、反応液24と触媒25と原料ガス28とが反応して生成液29と生成ガスが生成され、外側領域の下降流では、スラリー中に多く含まれる生成液29と触媒25と原料ガス28及び生成ガスとが含まれる。
The catalyst separation device 22 according to the present embodiment has the above-described configuration, and the catalyst separation method will be described with reference to FIGS. 1 and 2.
First, in the reactor 21, in the catalytic reaction device 20, the raw material gas 28 is supplied from the gas distributor 30 in a state where the slurry containing the reaction liquid 24 in which the catalyst 25 is dispersed in the reactor 21 is filled up to the liquid level 24 a. Are bubbled into the reaction solution 24 as bubbles. Then, the slurry containing bubbles becomes an upward flow in the central region due to the upward flow of the bubbles, reverses outward near the liquid surface 24 a to become a downward flow, and moves toward the partition plate 35. Then, the downward flow becomes a circulating flow that again becomes an upward flow in the central region due to the upward flow caused by the bubbles in the gas distributor 30.
The circulating flow is an upward flow in the central region between the liquid level 24a and the gas distributor 30, and the slurry contains many bubbles of the reaction solution 24, the catalyst 25, and the raw material gas 28 before the reaction. Then, the reaction liquid 24, the catalyst 25, and the raw material gas 28 react to generate a generated liquid 29 and a generated gas. In the downward flow in the outer region, the generated liquid 29, the catalyst 25, and the raw material gas 28 that are contained in a large amount in the slurry. And product gas.

そして、仕切り板35の下側の触媒分離装置22においては、反応器21内での下降流によってガス分配器30近傍まで降下した気泡を含むスラリーの一部が、屋根部45と仕切り板35の間隙から屋根部45内に流入して、ダウンチューブ44の上端入口に向けて一旦上昇流となることで、スラリーから原料ガス28や生成ガスの気泡が分離し、気抜き穴45aから上方に抜ける。これにより、スラリーにはほとんど気泡が残らない。また、触媒25の一部も重力分離によって生成液29から分離される。
残ったスラリーはダウンチューブ44の上端入口からダウンチューブ44内に流入し、反応器21の下端部21bの略半球状凹曲面に沿って低速で静かに下端部21b底面中央方向に流動し、下端出口から流出する。
In the catalyst separation device 22 on the lower side of the partition plate 35, a part of the slurry containing bubbles that have descended to the vicinity of the gas distributor 30 due to the downward flow in the reactor 21 is part of the roof 45 and the partition plate 35. By flowing into the roof portion 45 from the gap and once becoming an upward flow toward the upper end inlet of the down tube 44, the bubbles of the raw material gas 28 and the generated gas are separated from the slurry and escape upward from the vent hole 45a. . Thereby, almost no bubbles remain in the slurry. A part of the catalyst 25 is also separated from the product liquid 29 by gravity separation.
The remaining slurry flows into the down tube 44 from the upper end inlet of the down tube 44 and gently flows at a low speed along the substantially hemispherical concave curved surface of the lower end portion 21b of the reactor 21 toward the center of the bottom surface of the lower end portion 21b. It flows out from the exit.

一方、仕切り板35の中央領域では、筒状壁36とライザー管39との環状空間41内にも微少量のスラリーが開口37から下方に降下する低速で少量の流れを生じさせている。このとき降下するスラリーから気泡が分離して上昇する。また、筒状壁36にリング状空間41を介して緩く挿入されたライザー管39に、原料ガス28(またはライザーガス)の気泡がノズル40から供給され、ライザー管39内のスラリーに上昇流を生じさせている。そのため、リング状空間41内ではスラリーの低速の下降流が生じてその下端で反転してライザー管39に流入して低速の上昇流が生じている。   On the other hand, in the central region of the partition plate 35, a small amount of slurry is generated in the annular space 41 between the cylindrical wall 36 and the riser pipe 39 at a low speed at which the slurry falls downward from the opening 37. At this time, bubbles are separated from the descending slurry and rise. Further, bubbles of the raw material gas 28 (or riser gas) are supplied from the nozzle 40 to the riser pipe 39 loosely inserted into the cylindrical wall 36 via the ring-shaped space 41, and an upward flow is caused to the slurry in the riser pipe 39. It is generated. Therefore, a low-speed downward flow of the slurry is generated in the ring-shaped space 41, and is reversed at the lower end thereof and flows into the riser pipe 39 to generate a low-speed upward flow.

そして、ダウンチューブ44の下端出口から低速で出されたスラリーは気泡が殆ど含まれておらず、そして、ライザー管39まで流れて上昇流となることで、仕切り板35とダウンチューブ44とライザー管39とを介した循環流が形成される。しかも、ダウンチューブ44の下端出口からライザー管39までの間では、スラリーの流速が低速で底面に沿ったスムーズな流れが生じる。
その結果、ライザー管39に到達する前に、一部のスラリーの流れはスムーズな底面流領域の上部によどみ空間49ができて、低流速の上昇流となる。このときスラリー中の生成液29と触媒25は重力沈降によって分離され、触媒25の濃度が薄くなった生成液29が触媒分離フィルター47へ流入する。
The slurry discharged at a low speed from the lower end outlet of the down tube 44 contains almost no bubbles, and flows up to the riser pipe 39 to become an upward flow, whereby the partition plate 35, the down tube 44, and the riser pipe. A circulation flow through 39 is formed. Moreover, between the lower end outlet of the down tube 44 and the riser pipe 39, the flow rate of the slurry is low and a smooth flow along the bottom surface occurs.
As a result, before reaching the riser pipe 39, a part of the slurry flows into a stagnation space 49 in the upper part of the smooth bottom surface flow region, and becomes an ascending flow with a low flow velocity. At this time, the product liquid 29 and the catalyst 25 in the slurry are separated by gravity sedimentation, and the product liquid 29 having a reduced concentration of the catalyst 25 flows into the catalyst separation filter 47.

触媒分離フィルター47では、生成液29と触媒25の一部が予め分離されているためにケーキが形成されにくく、濾過抵抗が低くなる。そして、触媒分離フィルター47で濾過されて触媒25が捕捉され、触媒25と分離された生成液29は僅かに残った未反応の反応液24(、更に僅かに混入する原料ガス28及び生成ガス)と共に排出管48から外部に排出される。
このような作用を繰り返すことで、触媒反応装置20での反応で生成された生成液29を含むスラリーは、触媒分離装置22のダウンチューブ44の上端入口に流入する際に原料ガス28が分離除去される。更に、生成液29と触媒25のスラリーが、ダウンチューブ44の下端出口から流出する際、スムーズな底面流領域の上部に形成されるよどみ空間49で低速で上昇する際に、触媒25を重力分離することで、触媒分離フィルター47面に吸着して除去すべき触媒25の量をできるだけ低減できるようにしたから、触媒分離フィルター47の負担を低減すると共に、逆洗の頻度を減らしたり逆洗自体をなくすことができる。
また、触媒分離フィルター47及び排出管48は、反応器21におけるガス分配器30及び仕切り板35の下方の下端部21b近傍に設けたから、従来のこの種の触媒分離装置と比較して反応器21の底部近くまで生成液29を濾過分離できて、反応器21の下部に残るスラリー中の生成液29を少なくできる。
In the catalyst separation filter 47, a part of the product liquid 29 and the catalyst 25 is separated in advance, so that a cake is hardly formed, and the filtration resistance is lowered. Then, the catalyst 25 is trapped by being filtered by the catalyst separation filter 47, and the product liquid 29 separated from the catalyst 25 remains a little unreacted reaction liquid 24 (and a slightly mixed raw material gas 28 and product gas). At the same time, it is discharged from the discharge pipe 48 to the outside.
By repeating such an action, the slurry containing the product liquid 29 produced by the reaction in the catalyst reaction device 20 is separated and removed when the raw material gas 28 flows into the upper end inlet of the down tube 44 of the catalyst separation device 22. Is done. Further, when the slurry of the product liquid 29 and the catalyst 25 flows out from the lower end outlet of the down tube 44, the catalyst 25 is separated by gravity when rising at a low speed in the stagnation space 49 formed in the upper part of the smooth bottom surface flow region. As a result, the amount of the catalyst 25 to be adsorbed and removed on the surface of the catalyst separation filter 47 can be reduced as much as possible. Therefore, the burden on the catalyst separation filter 47 is reduced and the frequency of backwashing is reduced or backwashing itself is performed. Can be eliminated.
Further, since the catalyst separation filter 47 and the discharge pipe 48 are provided in the vicinity of the lower end portion 21b below the gas distributor 30 and the partition plate 35 in the reactor 21, the reactor 21 is compared with the conventional catalyst separation device of this type. The product liquid 29 can be filtered and separated to near the bottom of the reactor, and the product liquid 29 in the slurry remaining in the lower part of the reactor 21 can be reduced.

なお、仕切り板35の下側で、よどみ空間49から触媒分離フィルター47への生成液29の上昇流の流速は触媒25の沈降速度より小さくなるように操業することが好ましい。   It should be noted that it is preferable to operate so that the flow velocity of the upward flow of the product liquid 29 from the stagnation space 49 to the catalyst separation filter 47 is smaller than the sedimentation speed of the catalyst 25 below the partition plate 35.

上述のように本実施形態による触媒分離装置22によれば、仕切り板35の上方にガス分配器30を設置し、下方に触媒分離フィルター47を配列させたから、反応器21内で上部における濾過空間をなくすことができて反応液24と触媒25と原料ガス28の上下流動による反応処理を十分に行うことができると共に、従来無駄な空間であったガス分配器30より下側の空間に触媒分離フィルター47及び排出管48を設置して有効利用できる。
しかも、反応器21のガス分配器30より下側の空間に触媒分離フィルター47を設置することで、反応器21での反応を終了または停止させた際に、反応器21の底部近くに設けた触媒分離フィルター47及び排出管48の高さまで生成液29と触媒25を濾過分離できるため、反応器21内に残る生成液29や触媒25を少なくできる。
As described above, according to the catalyst separation device 22 according to the present embodiment, the gas distributor 30 is installed above the partition plate 35 and the catalyst separation filter 47 is arranged below the partition plate 35. Thus, the reaction process by the vertical flow of the reaction solution 24, the catalyst 25, and the raw material gas 28 can be sufficiently performed, and the catalyst is separated into a space below the gas distributor 30 that has been a wasteful space in the past. A filter 47 and a discharge pipe 48 can be installed and used effectively.
Moreover, by installing the catalyst separation filter 47 in the space below the gas distributor 30 of the reactor 21, it is provided near the bottom of the reactor 21 when the reaction in the reactor 21 is terminated or stopped. Since the product liquid 29 and the catalyst 25 can be separated by filtration up to the height of the catalyst separation filter 47 and the discharge pipe 48, the product liquid 29 and the catalyst 25 remaining in the reactor 21 can be reduced.

しかも、触媒分離装置22において、仕切り板35の下方には原料ガス28の気泡が殆ど流れ込まないから、生成液29にガスが随伴する弊害である、上述した高効率反応による発熱反応に起因する触媒シンタリングやフィルター目の焼き締まりによる目詰まりを防止でき、ガスの流出による気液分離装置の設置の必要性等が生じない。
また、触媒分離装置22によれば、仕切り板35とダウンチューブ44とライザー管39による循環流が形成され、しかもダウンチューブ44の上端入口の領域では屋根部45との間に上昇流が起きて原料ガス28と触媒25の一部を分離することができ、更に触媒分離フィルター47を配列した領域ではスラリーの液よどみのよどみ空間49を低速で上昇することで生成液29と触媒25とが重力沈降して分離できる。
そのため、触媒分離フィルター47では予め生成液29と触媒25が部分的に分離しているために生成液29に含まれる触媒25が少なくなり、濾過抵抗が低くケーキが形成されにくいので、効率よく生成液29から触媒25を分離して排出できる。そのため、触媒分離フィルター47への触媒吸着負荷を軽減すると共に、触媒分離フィルター47を含む反応器21の逆洗頻度を低減でき、或いは逆洗をなくすことができる。
In addition, in the catalyst separation device 22, since the bubbles of the raw material gas 28 hardly flow below the partition plate 35, the catalyst resulting from the exothermic reaction due to the high-efficiency reaction described above, which is a harmful effect accompanying the gas in the product liquid 29. It is possible to prevent clogging due to sintering or filter-tightening, and there is no need to install a gas-liquid separator due to gas outflow.
Further, according to the catalyst separation device 22, a circulation flow is formed by the partition plate 35, the down tube 44, and the riser tube 39, and an upward flow occurs between the upper end inlet of the down tube 44 and the roof portion 45. A part of the raw material gas 28 and the catalyst 25 can be separated, and in the region where the catalyst separation filter 47 is arranged, the product liquid 29 and the catalyst 25 are separated by gravity by moving up the sludge stagnation space 49 at a low speed. It can settle and separate.
Therefore, in the catalyst separation filter 47, since the product liquid 29 and the catalyst 25 are partially separated in advance, the catalyst 25 contained in the product liquid 29 is reduced, the filtration resistance is low, and it is difficult to form a cake. The catalyst 25 can be separated and discharged from the liquid 29. Therefore, the catalyst adsorption load on the catalyst separation filter 47 can be reduced, the frequency of backwashing of the reactor 21 including the catalyst separation filter 47 can be reduced, or backwashing can be eliminated.

また、反応器21における触媒反応装置20では、上昇流と反転後の下降流とからなる反応経路の終わりである下降流の終端で、触媒分離装置22のダウンチューブ44へスラリーを導入するようにしたから、下降流によって生成液29から原料ガスや生成ガスが分離されて生成液29中の残留ガスが少ないので、その後のスラリーからの触媒25の分離が容易であり生成液29を分離し易い。特に、本実施形態では反応器21の上部に触媒分離フィルター等の濾過器を設けない構成にしたから、スラリーの上下方向の流動がスムーズであり、反応とその後のガスの分離をスムーズに行える。
また、本実施形態では、触媒反応装置20は、反応器21の上側に触媒分離フィルターを設けない構成としたため、反応液24と触媒25と原料ガス28からなるスラリーの上昇流と反転による下降流の全体の流れが従来の触媒反応装置よりも良好である。
Further, in the catalytic reaction device 20 in the reactor 21, the slurry is introduced into the down tube 44 of the catalyst separation device 22 at the end of the downward flow that is the end of the reaction path consisting of the upward flow and the downward flow after inversion. Therefore, since the raw material gas and the product gas are separated from the product liquid 29 by the downward flow and the residual gas in the product liquid 29 is small, the separation of the catalyst 25 from the subsequent slurry is easy and the product liquid 29 is easily separated. . In particular, in this embodiment, since the upper part of the reactor 21 is not provided with a filter such as a catalyst separation filter, the slurry flows smoothly in the vertical direction, and the reaction and subsequent gas separation can be performed smoothly.
In the present embodiment, the catalyst reaction apparatus 20 is configured not to be provided with a catalyst separation filter on the upper side of the reactor 21, so that the upward flow of the slurry composed of the reaction liquid 24, the catalyst 25, and the raw material gas 28 and the downward flow due to inversion are reversed. The overall flow is better than the conventional catalytic reactor.

なお、本発明は上述の実施形態に限定されることなく、本発明の要旨を変更しない範囲で上述した実施形態の構成を適宜変更することができる。
例えば、上述した実施形態では、仕切り板35の外周縁近傍に小孔43を設けてダウンチューブ44を嵌挿させたが、ダウンチューブ44は必ずしも設けなくてもよく、反応器21内を降下するスラリーが仕切り板35の中央側からすり鉢状の傾斜面に沿って上昇して小孔43から仕切り板35の下側に流動するように構成してもよい。
In addition, this invention is not limited to the above-mentioned embodiment, In the range which does not change the summary of this invention, the structure of embodiment mentioned above can be changed suitably.
For example, in the above-described embodiment, the small tube 43 is provided in the vicinity of the outer peripheral edge of the partition plate 35 and the down tube 44 is fitted, but the down tube 44 is not necessarily provided, and the inside of the reactor 21 is lowered. The slurry may rise from the center side of the partition plate 35 along the mortar-shaped inclined surface and flow from the small hole 43 to the lower side of the partition plate 35.

また、上述した実施形態では、仕切り板35の中央部に開口37を設け、開口37の内側にリング状空間41と同軸のライザー管39とを設けたが、開口37をライザー管39のみで構成してリング状空間41は設けなくてもよい。また、ライザー管39の上端は仕切り板35より下側に位置していてもよい。
なお、上述した実施形態では、反応器21の上側に触媒分離フィルターを設けない構成としたため、反応液24と触媒25と原料ガス28からなるスラリーの上昇流と反転による下降流の流れが良好であるが、反応器21の上側部分に触媒分離フィルターを設けてもよい。この場合、逆洗が必要になる。
In the above-described embodiment, the opening 37 is provided in the center of the partition plate 35, and the ring-shaped space 41 and the coaxial riser pipe 39 are provided inside the opening 37. However, the opening 37 is configured only by the riser pipe 39. Thus, the ring-shaped space 41 may not be provided. Further, the upper end of the riser tube 39 may be located below the partition plate 35.
In the above-described embodiment, since the catalyst separation filter is not provided on the upper side of the reactor 21, the upward flow of the slurry composed of the reaction liquid 24, the catalyst 25, and the raw material gas 28 and the downward flow due to inversion are good. However, a catalyst separation filter may be provided in the upper part of the reactor 21. In this case, backwashing is necessary.

20 触媒反応装置
21 反応器
21b 下端部
22 触媒分離装置
24 反応液
25 触媒
28 原料ガス
29 生成液
30 ガス分配器
31a、32a ノズル
35 仕切り板
37 開口
39 ライザー管
41 リング状空間
43 小孔
44 ダウンチューブ
45 屋根部
45a、46 気抜き穴
47 触媒分離フィルター
48 排出管
49 よどみ空間
20 Catalytic reactor 21 Reactor 21b Lower end 22 Catalyst separator 24 Reaction liquid 25 Catalyst 28 Raw material gas 29 Product liquid 30 Gas distributor 31a, 32a Nozzle 35 Partition plate 37 Opening 39 Riser tube 41 Ring-shaped space 43 Small hole 44 Down Tube 45 Roof 45a, 46 Vent hole 47 Catalyst separation filter 48 Drain pipe 49 Stagnation space

Claims (7)

縦型略円筒形状の反応器に原料ガスを供給し、該反応器内で触媒を用いて反応液と原料ガスと触媒を反応させて生成液を得るようにした触媒分離装置において、
前記反応器内に原料ガスを供給するガス分配器を設け、該ガス分配器の下側に生成液と触媒を流通させる開口を有する仕切り板を設け、該仕切り板の下側に触媒分離フィルターと排出管を設けたことを特徴とする触媒分離装置。
In a catalyst separation apparatus that supplies a raw material gas to a vertical substantially cylindrical reactor and reacts the reaction liquid, the raw material gas, and the catalyst with the catalyst in the reactor to obtain a product liquid,
A gas distributor for supplying a raw material gas is provided in the reactor, a partition plate having an opening through which the product liquid and the catalyst are circulated is provided on the lower side of the gas distributor, and a catalyst separation filter is provided on the lower side of the partition plate. A catalyst separation device characterized in that a discharge pipe is provided.
前記仕切り板の開口は、触媒と生成液を上昇させる第一の開口と、触媒と生成液を降下させる第二の開口とを有する請求項1に記載された触媒分離装置。   2. The catalyst separation device according to claim 1, wherein the opening of the partition plate includes a first opening for raising the catalyst and the product liquid and a second opening for lowering the catalyst and the product liquid. 前記仕切り板は、前記第二の開口を設けた外周側から前記第一の開口を設けた中央部に向けて下方に傾斜して形成され、前記第一の開口に前記反応器の底部中央から上昇するガスを供給するライザー管を設けてなる請求項1または2に記載された触媒分離装置。     The partition plate is formed to be inclined downward from the outer peripheral side provided with the second opening toward the central part provided with the first opening, and from the center of the bottom of the reactor to the first opening. 3. The catalyst separation device according to claim 1, further comprising a riser pipe for supplying the rising gas. 前記仕切り板の第一の開口には前記ライザー管に沿って下方に延びる略筒状壁が形成され、該筒状壁の外周側であって該筒状壁の下端より上方に前記触媒分離フィルターと排出管が配設されている請求項3に記載された触媒分離装置。     A substantially cylindrical wall extending downward along the riser pipe is formed in the first opening of the partition plate, and the catalyst separation filter is on the outer peripheral side of the cylindrical wall and above the lower end of the cylindrical wall. The catalyst separation device according to claim 3, wherein a discharge pipe is provided. 前記仕切り板の外周側領域には、生成液と触媒を前記仕切り板の上側から前記反応器の底部中央に向けて流動させるように前記第二の開口にチューブが配設され、該チューブの上端入口は仕切り板より上方に突出している請求項3または4に記載された触媒分離装置。     In the outer peripheral side region of the partition plate, a tube is disposed in the second opening so that the product liquid and the catalyst flow from the upper side of the partition plate toward the center of the bottom of the reactor, and an upper end of the tube is disposed. The catalyst separation device according to claim 3 or 4, wherein the inlet projects upward from the partition plate. 前記チューブの上端入口は屋根部によって覆われている請求項5に記載された触媒分離装置。   The catalyst separation device according to claim 5, wherein an upper end inlet of the tube is covered with a roof portion. 前記ライザー管にガスを供給するガスノズルが設けられ、前記ガスノズルのガス流によって前記ライザー管に上昇流を形成し、前記筒状壁とライザー管の間隙に上方から下方へ生成液及び触媒の流れを形成するようにした請求項4乃至6のいずれか1項に記載された触媒分離装置。   A gas nozzle for supplying gas to the riser pipe is provided, and an upward flow is formed in the riser pipe by the gas flow of the gas nozzle, and the flow of the generated liquid and the catalyst flows from above to below in the gap between the cylindrical wall and the riser pipe. The catalyst separation device according to any one of claims 4 to 6, wherein the catalyst separation device is formed.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014003403A1 (en) 2013-03-12 2014-09-18 Suzuki Motor Corporation HYBRID VEHICLE

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161019U (en) * 1984-09-25 1986-04-24
JP2007516065A (en) * 2003-07-15 2007-06-21 サソール テクノロジー(プロプライエタリー)リミテッド Method for separating a catalyst from a liquid
WO2010038396A1 (en) * 2008-09-30 2010-04-08 独立行政法人石油天然ガス・金属鉱物資源機構 Unit for hydrocarbon compound synthesis reaction and method of operating same
WO2010106744A1 (en) * 2009-03-19 2010-09-23 独立行政法人石油天然ガス・金属鉱物資源機構 Catalyst separation system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161019U (en) * 1984-09-25 1986-04-24
JP2007516065A (en) * 2003-07-15 2007-06-21 サソール テクノロジー(プロプライエタリー)リミテッド Method for separating a catalyst from a liquid
WO2010038396A1 (en) * 2008-09-30 2010-04-08 独立行政法人石油天然ガス・金属鉱物資源機構 Unit for hydrocarbon compound synthesis reaction and method of operating same
WO2010106744A1 (en) * 2009-03-19 2010-09-23 独立行政法人石油天然ガス・金属鉱物資源機構 Catalyst separation system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014003403A1 (en) 2013-03-12 2014-09-18 Suzuki Motor Corporation HYBRID VEHICLE

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