JP2013036742A - Facility monitoring device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a facility monitoring device capable of simultaneously performing measurement using a measuring sensor and visual measurement (monitoring) for a monitoring target in a predetermined facility.SOLUTION: The facility monitoring device for observing the monitoring target in a facility E includes: a separator 22 arranged on a common route L of visible light and a microwave to be used for observing the monitoring target and capable of transmitting either one of the visible light and the microwave and reflecting the other to a direction different from the transmission direction; and a microwave detection part 24 arranged in the transmission direction or the reflection direction of the microwave by the separator 22 and capable of detecting a state of the monitoring target based on the microwave.

Description

  The present invention relates to an equipment monitoring apparatus for performing state detection by microwaves and visual monitoring of monitoring objects in equipment such as a reaction apparatus, a high temperature furnace, and a heat treatment furnace.

Various manufacturing processes in the manufacturing industry need to monitor the progress of the process in operation. Therefore, various measurement sensors (thermometer, pressure gauge, etc.) are used. However, there are cases where it is difficult to grasp only with the value of the measurement sensor and cannot be judged correctly unless a person visually observes it.
As shown in FIG. 8 (a), for example, when a liquid is reacted in a tank of a reaction apparatus, the state of the liquid level (such as bubbling or undulation of the liquid level) is difficult to detect with various measurement sensors and is directly visible. Alternatively, an observation (monitoring) method such as viewing a camera image is used. For this monitoring, a monitoring window is provided above the tank.

On the other hand, human visual observation (monitoring) is not continuously performed continuously, but is often performed as necessary or at a predetermined time (look around). On the other hand, since the level of the liquid level is an important index for process control, it is desirable to continuously measure (monitor) it.
For example, in a high temperature or dusty process, a level meter using ultrasonic waves and light is difficult to use, and a microwave level meter is used. In order to install the level meter, a measurement hole for mounting is naturally necessary. However, it is better that the number of openings provided in the facility is small, and it is desirable that the monitoring hole for visual observation that is not always used is also used for other purposes. This is because, apart from sensors that require only a small opening, such as thermometers and pressure gauges, large holes for visual or level gauges are required, and there are strength and cost constraints on the equipment. is there.

  Therefore, in order to use two types of devices (measurement sensors) or observation means, some kind of switching mechanism or simultaneous use mechanism (path sharing mechanism) is required. As shown in FIG. 8B, it is also possible to share the observation hole and move two types of devices (measurement sensors) on the sensor movement rail alternately onto the observation hole according to the required function. . However, there is a problem that a large measurement sensor is not only troublesome to move, but the other measurement sensor cannot be used if switching is forgotten after use of the measurement sensor. In particular, when the viewing direction is the horizontal direction, the measurement sensor may have to be moved against gravity, such as the movement direction of the measurement sensor being along the direction of gravity. In that case, since a large force is required to move the measurement sensor, the configuration of the measurement sensor becomes large by adding a mechanism for canceling the influence of gravity or the like, which is not preferable.

In the above description, a process using a liquid is taken as an example. However, there are a wide range of industrial processes that require measurement by a measurement sensor and visual monitoring, such as an object in a high-temperature furnace and powder in a baking apparatus.
For example, a blast furnace (a blast furnace) is a target that requires monitoring in combination with the above-described measurement sensor and visual observation.

  As a technique for monitoring a blast furnace (particularly a blast furnace raceway), there are techniques disclosed in Patent Documents 1 and 2. In Patent Documents 1 and 2, a microwave is irradiated toward a raceway, and a microwave reflected from the raceway is received. Then, the raceway depth is detected based on the received microwave. In such a configuration, there is no need to insert a measuring rod for measuring the depth of the raceway from the tuyere that blows hot air into the blast furnace. Therefore, it is possible to continuously monitor the raceway depth even during operation of the blast furnace.

Japanese Patent Laid-Open No. 53-48004 Japanese Patent Laid-Open No. 06-25720

By the way, also in the structure which can detect the depth of the raceway of a blast furnace using a microwave sensor like patent documents 1, 2, a worker can also monitor the combustion state in a blast furnace visually. Is desired. However, conventionally, both visual monitoring and microwave state detection cannot be performed simultaneously.
As described above, “simultaneously performing measurement by measurement sensor and visual monitoring” is required in various industrial process monitoring such as monitoring of reaction liquid and monitoring of powder in the baking equipment. It is.

  Therefore, the present invention has been made in view of the above circumstances, and the object of the present invention is to measure and visually observe a monitoring target in a predetermined facility using a measurement sensor (use of an infrared camera and a radiation thermometer). An object of the present invention is to provide an equipment monitoring apparatus capable of performing (monitoring) simultaneously.

In order to achieve the above object, the present invention employs the following technical means.
An equipment monitoring apparatus according to the present invention is provided on a common path of light and microwave used for observing a monitoring target in a predetermined equipment, and transmits one of the light and microwave. , A separation unit that reflects the other in a direction different from the transmission direction, and a transmission direction or a reflection direction of the microwave by the separation unit, and detects the state of the monitoring target based on the microwave And a microwave detection means.

Here, it is preferable that the separating unit is configured to transmit the visible light and reflect the microwave through a conductor formed in a net shape or an interdigital shape.
Preferably, the separating means transmits the visible light and reflects the microwave through a conductor having a length of ½ of the wavelength of the microwave arranged in parallel at a predetermined interval. .

Preferably, the separating means transmits the visible light and reflects the microwave through a conductive thin film.
Preferably, the separating means reflects the visible light and transmits the microwave through a laminated optical thin film.
Preferably, the predetermined facility has a monitoring window for observing the monitoring target, and the monitoring window partitions the inside and the outside of the predetermined facility and transmits at least the visible light. It is a member, Comprising: It is good for the said separation means to serve as the said partition member.

Here, it is preferable that the waveguide provided along the path is provided at an end of the waveguide opposite to the monitoring target to partition the inside and outside of the predetermined facility and to transmit at least the visible light. It is good to provide a member and the said separating means is provided inside the said partition member.
Preferably, the waveguide provided along the path is provided at an end opposite to the monitoring target to partition the inside and outside of the predetermined facility and transmit the visible light and the microwave. It is preferable that the partition member is provided, and the separating means is provided outside the partition member.

  According to the present invention, the visible light reflected by the monitoring object and the microwave can be guided in different directions using the separating means. It is possible to perform monitoring by both of them simultaneously.

It is a figure which shows schematic structure of the equipment monitoring apparatus which concerns on embodiment of this invention, (a) is a figure which shows the case where a microwave is reflected, (b) is a figure which shows the case where visible light is reflected. . It is a schematic diagram which shows an example of a separator. It is a schematic diagram which shows the other example of a separator. It is a schematic diagram which shows the further another example of a separator. It is a figure which shows schematic structure of the equipment monitoring apparatus X which concerns on Example 3 of this invention, (a) is a side view, (b) is a front view. It is a figure which shows the other schematic structure of the equipment monitoring apparatus X which concerns on Example 3 of this invention, (a) is a side view, (b) is a front view. It is a figure which shows schematic structure of the equipment monitoring apparatus X which concerns on Example 4 of this invention, (a) is a figure which shows a structure when the equipment monitoring apparatus X is arrange | positioned in a waveguide, (b) is equipment. It is a figure which shows the structure in case the monitoring apparatus X is arrange | positioned out of the waveguide. It is a figure which shows the conventional equipment monitoring method, (a) is a figure which shows the monitoring method by visual observation, (b) is a figure which shows the monitoring method by combined use of visual observation and a measurement sensor.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings for understanding of the present invention. In addition, the following embodiment is an example which actualized this invention, Comprising: The thing of the character which limits the technical scope of this invention is not.
First, a schematic configuration of an equipment E in which the equipment monitoring device X according to the embodiment of the present invention is used will be described with reference to FIG. The facility E is a facility device that needs to monitor the progress of an internal manufacturing process (process), such as a reactor tank, a high-temperature furnace, or a heat treatment furnace.

  For example, if the equipment E is a tank of a chemical reaction device, the state of the liquid surface (such as foaming or undulation of the liquid surface) changes as the reaction or fermentation of the internal liquid proceeds, and this change is monitored. The worker can grasp the progress of the manufacturing process. Even in a high-temperature furnace or a heat treatment furnace, the operator can grasp the progress of the manufacturing process by monitoring changes in the products processed in the furnace. In addition to these manufacturing equipment, the equipment E may be equipment that needs to monitor the amount and state of the liquid present therein, such as an oil tank of an oil tanker, for example.

  As shown in FIGS. 1A and 1B, the outer wall of the equipment E is provided with a substantially cylindrical opening protrusion 11 that protrudes from the inside of the equipment E toward the outside. A substantially disc-shaped monitoring window 23 corresponding to the opening shape is attached to the outside of the cylindrical opening protrusion 11, and the state of the monitoring target inside the equipment E is visually observed from the outside through the monitoring window 23. be able to. The monitoring window 23 is made of, for example, heat resistant glass.

Next, the facility monitoring device X that is provided in front of the observation window 23 of the facility E and monitors the internal state of the facility E will be described with reference to FIG.
As shown in FIG. 1A, the equipment monitoring device X includes a separator 22 (an example of a separation unit), a microwave detection unit 24 (an example of a microwave detection unit), and the like.
The separator 22 is provided outside the facility E and in front of the monitoring window 23. The separator 22 transmits light (including visible light, ultraviolet light, and infrared light) and reflects microwaves. The present embodiment will be described using visible light as light transmitted through the separator 22. In particular, in the equipment monitoring device X, the separator 22 is disposed in front of the monitoring window 23 in a state where the separator 22 is inclined by 45 ° with respect to the monitoring direction (path) L along the axis of the monitoring window 23. Thereby, the separator 22 reflects the microwave input from the direction parallel or perpendicular to the monitoring direction L toward a direction different from the transmission (traveling) direction of visible light at a reflection angle of 90 °. Here, the monitoring direction L shown in FIG. 1A is also a common path through which visible light and microwaves travel, and may be referred to as a path L hereinafter.

Specifically, the separator 22 reflects the microwave emitted from the microwave detection unit 24 toward the monitoring target in the facility E, and detects the microwave after being reflected by the monitoring target in the facility E. Reflected toward the portion 24.
The concept of transmission and reflection of visible light and microwave in the present invention includes not only 100% transmission and reflection but also a transmittance or reflectance that is visible or detectable.

FIG. 2 is a schematic view specifically showing a configuration example of the separator 22, where (a) is a front view and (b) is a side view.
As shown in FIG. 2, the separator 22 includes a reflective portion 22 a made of a net-like conductor having a lattice shape, and a substrate 22 b that is formed of a transparent dielectric and supports the reflective portion 22 a. Yes. The reflection part 22a is, for example, a metal such as gold, silver, copper, aluminum, or rhodium. The substrate 22b is made of, for example, calcium fluoride, quartz glass, sapphire (single crystal aluminum oxide), or the like. In addition, if the observation by infrared rays is included, visible light is not transmitted, but the reflection portion 22a can be formed of silicon.

  In the separator 22 configured as described above, most of the visible light incident on the separator 22 is transmitted through the reflecting portion 22a, but the microwave incident on the separator 22 is reflected by the reflecting portion 22a. It will be. Further, since the reflecting portion 22a is a conductor having a lattice-like net shape, the microwave can be reflected regardless of the polarization direction (linearly polarized wave, circularly polarized wave) of the microwave. In addition, since the reflection part 22a formed with a metal is excellent in heat resistance, it may be considered that the substrate 22b is omitted and the reflection part 22a is arranged in a self-supporting manner to reduce restrictions on the environment in which the separator 22 is arranged. It is done.

  Further, it is desirable that the mesh interval (conductor interval) in the reflecting portion 22a is at least less than 1/10 of the wavelength of the microwave. Thereby, the reflective ability similar to the case where the board | plate member of a conductor like a metal plate is provided in the reflection part 22a can be exhibited. Of course, when the microwave reflection capability in the separator 22 may be reduced, the mesh interval in the reflection portion 22a may be 1/10 or more of the wavelength of the microwave.

  Further, the outer peripheral shape of the separator 22 shown in FIG. 2 is a rectangle (here, a square), but the outer peripheral shape may be appropriately changed according to the shape of the monitoring window 23. For example, if the monitoring window 23 is circular or elliptical, the outer peripheral shape of the separator 22 may be circular or elliptical. In addition, if the monitoring window 23 is rectangular, the outer peripheral shape of the separator 22 may be rectangular. Of course, it is also conceivable that a separator 22 having a rectangular outer peripheral shape is provided in front of the circular or elliptical monitoring window 23 or a separator 22 having a circular or elliptical outer peripheral shape is provided in front of the rectangular monitoring window 23. It is done.

  By the way, as shown in FIG. 1, the monitoring window 23 is provided in the substantially cylindrical opening protrusion 11 formed on the outer wall of the equipment E. The monitoring window 23 divides the environment inside the facility E from the environment outside and transmits at least visible light. The monitoring window 23 is, for example, transparent heat resistant glass. The space between the monitoring window 23 and the opening protrusion 11 of the equipment E is sealed with a seal member.

  In the equipment monitoring apparatus X, as described above, the separator 22 transmits visible light. Therefore, the visible light reflected by the monitoring target inside the equipment E passes through the separator 22 and is guided to the monitoring window 23. . Thereby, the operator can visually monitor the state of the monitoring target from the monitoring window 23. In addition, the configuration in which visible light emitted from the monitoring window 23 to the outside is reflected to an arbitrary position using an auxiliary reflecting member such as a mirror so that an operator can visually observe the monitoring target at the position is also implemented. Considered as an example.

The microwave detection unit 24 is provided in a direction (upward direction in FIG. 1A) where the microwave after being reflected by the monitoring target inside the facility E is reflected by the separator 22.
The microwave detection unit 24 includes a microwave sensor that irradiates a microwave having a predetermined frequency and receives a microwave incident on the microwave detection unit 24. For the microwave detection unit 24, for example, pulse radar, FM-CW radar, and other various types of radar can be used. And the microwave detection part 24 detects the position (an example of the state of a monitoring object) of the monitoring object inside the installation E based on the microwave received by the microwave sensor.

  Specifically, in the equipment monitoring apparatus X, as described above, the separator 22 reflects microwaves. Therefore, the microwave irradiated from the microwave detection unit 24 to the reflection unit 22a of the separator 22 at an angle of 45 ° is reflected toward the monitoring target by the reflection unit 22a at a reflection angle of 90 °. Thereafter, the microwave reflected by the monitoring target and traveling along the monitoring direction (path) L is reflected toward the microwave detection unit 24 at a reflection angle of 90 ° by the reflection unit 22 a of the separator 22. Thereby, in the microwave detection part 24, the distance from the microwave detection part 24 to a monitoring object can be measured based on the received microwave. In addition, the microwave detection part 24 measures distance based on the difference of the frequency of the emitted microwave and the received microwave, for example. On the other hand, the distance from the microwave detection unit 24 through the separator 22 to the monitoring window 23 (or the outer wall position of the equipment E) is known, and the distance is stored in advance in the microwave detection unit 24 as a parameter. Yes. And the microwave detection part 24 is the distance from the microwave detection part 24 measured based on the microwave to the monitoring object, and the monitoring window 23 (or the outer wall position of the equipment E) from the known microwave detection part 24. The distance from the monitoring window 23 (or the outer wall position of the equipment E) to the monitoring target, for example, the height of the liquid level in the reaction apparatus, the processing target in the high temperature furnace or the heat treatment furnace The distance can be detected. The distance detected by the microwave detection unit 24 (the height of the liquid level in the reaction apparatus and the distance to the processing target in the high temperature furnace or heat treatment furnace) is transferred to a computer (not shown) and displayed. Further, it is also used as an index for various operation controls such as the internal temperature control of the equipment E and the air flow control.

  As described above, in the equipment monitoring apparatus X, the visible light and the microwave reflected by the monitoring target by the separator 22 can be branched in different directions. Therefore, according to the equipment monitoring apparatus X, it is possible to simultaneously perform monitoring by both visual observation of the monitoring target by the worker and depth detection (distance detection) of the monitoring target by the microwave from the microwave detection unit 24. is there. In addition, since it is not necessary to insert a measuring rod etc. in the installation E, the depth detection of this monitoring object can be performed during the operation of the installation E.

By the way, in this embodiment, the case where the reflection part 22a of the separator 22 was a rectangular net-like conductor was demonstrated. On the other hand, it is also conceivable as another embodiment that the reflecting portion 22a reflects microwaves and transmits visible light by the conductor thin film.
Specifically, it is conceivable that the substrate 22b is glass, and the reflecting portion 22a is a conductive thin film formed on the substrate 22b by vapor-depositing a metal on the substrate 22b. The reflection part 22a configured in this way can reflect microwaves and transmit visible light.

  Further, in the configuration in which the reflecting portion 22a is a conductor thin film, visible light is attenuated when passing through the reflecting portion 22a. Therefore, when there is strong light emission in the facility E, it is possible to prevent the strong light from directly reaching the worker viewing the monitoring target from the monitoring window 23 and to protect the eyes of the worker.

In the first embodiment, a separator 221 will be described as another example of the separator 22 with reference to FIG. 3A is a front view, and FIG. 3B is a side view. The separator 221 described in the first embodiment is applicable to a configuration in which the microwave detection unit 24 transmits and receives linearly polarized microwaves.
As shown in FIG. 3, the separator 221 includes an interdigital reflector 221a in which a plurality of conductors are arranged in parallel at predetermined intervals, and a substrate 221b that is formed of a transparent dielectric and supports the reflector 221a. Have. The reflection part 221a is a metal such as gold, silver, copper, aluminum, rhodium, for example. The substrate 221b is, for example, calcium fluoride, quartz glass, sapphire (single crystal aluminum oxide), or the like. In addition, since the reflection part 22a formed with a metal is excellent in heat resistance, it may be considered that the substrate 22b is omitted and the reflection part 22a is arranged in a self-supporting manner to reduce restrictions on the environment in which the separator 22 is arranged. It is done.

  And the separator 221 is arrange | positioned in the waveguide 21 in the state inclined 45 degrees with respect to the monitoring direction L similarly to the separator 22. FIG. At this time, the separator 221 is disposed in a state in which the conductor disposed in the interdigital shape in the reflecting portion 221a is parallel to the linear polarization direction of the microwave. Thereby, also in the separator 221, similarly to the separator 22, the microwave can be reflected by the reflecting portion 221 a and the visible light can be transmitted.

  Moreover, in the reflection part 221a shown in FIG. 3, although the upper end part and lower end part of the several conductor arrange | positioned in parallel are connected, not only this but a several conductor is connected, and it only on the board | substrate 221b. Arrangement side by side is also conceivable as another embodiment. At this time, the microwave is efficiently reflected when the length of the conductor arranged parallel to the direction of the linearly polarized wave is ½ the wavelength of the microwave. Therefore, it is desirable that the length of each conductor in the reflecting portion 221a is ½ of the wavelength of the microwave.

Example 2 will be described with reference to FIG.
In the second embodiment, a configuration that reflects visible light and transmits microwaves will be described. FIG. 1B is a diagram illustrating a schematic configuration of the equipment monitoring device X according to the second embodiment. In addition, the same code | symbol is attached | subjected about the structure similar to FIG. 1, and the description is abbreviate | omitted.
As shown in FIG. 1B, in the equipment monitoring apparatus X according to the second embodiment, the visual position with respect to the separator and the position of the microwave detection unit 24 are reversed as compared with FIG. . That is, the equipment monitoring apparatus X includes a separator 222 that reflects visible light and transmits microwaves instead of the separator 22.

As a result, the facility monitoring apparatus X according to the second embodiment allows the operator to visually observe the visible light reflected by the separator 222, and can detect the microwave transmitted through the separator 222 by the microwave detection unit 24. It has a configuration.
FIG. 4 is a schematic diagram specifically showing a configuration example of the separator 222, where (a) is a front view and (b) is a side view.

As shown in FIG. 4, the separator 222 is formed by laminating a substrate 223 made of a dielectric material such as calcium fluoride and several to several tens of optical thin films on the surface of the substrate 223. The dielectric multilayer film 224 is provided.
Specifically, as shown in FIG. 4A, the dielectric multilayer film 224 is formed by alternately laminating thin films 224a and thin films 224b made of a transparent dielectric material such as calcium fluoride, magnesium fluoride, silicon dioxide, and titanium dioxide. It is formed by doing. Note that the lowermost thin film 224 a is in contact with the substrate 223.

Here, the thin film 224a and the thin film 224b are both formed so that the optical thickness (= refractive index × film thickness) is ¼ wavelength of visible light, but the thin film 224a is more refracting light than the thin film 224b. It is made of a material with a high rate. The refractive index is obtained from the square root of the dielectric constant.
In the separator 222 configured as described above, an arbitrary optical reflection characteristic can be obtained by the dielectric multilayer film 224 in which the thin films 224a and 224b having different refractive indexes are alternately laminated, and visible light can be reflected. is there. In addition, the reflectance of visible light in the dielectric multilayer film 224 increases as the number of stacked thin films 224a and 224b increases.

  On the other hand, since the thickness of the thin films 224a and 224b constituting the dielectric multilayer film 224 is equal to or less than the wavelength of light (about 500 nm), the thin films 224a and 224b viewed from a microwave whose wavelength is about 10,000 times that of visible light. The thickness of is equal to zero. The dielectric multilayer film 224 is a dielectric. Therefore, the reflection of the microwave in the dielectric multilayer film 224 does not occur. Furthermore, if the substrate 223 is formed such that the product of the refractive index with respect to the microwave and the thickness (geometric thickness) of the substrate 223 is an integral multiple of ½ wavelength of the microwave, the microwave on the substrate 223 is formed. Is also suppressed.

  As described above, also in the equipment monitoring apparatus X, visible light and microwaves from the monitoring target can be branched in different directions by the separator 222. Therefore, according to the equipment monitoring apparatus X, it is possible to simultaneously perform monitoring by both visual observation of the monitoring target by the worker and depth detection (distance detection) of the monitoring target by the microwave from the microwave detection unit 24. is there.

  Note that if the reflection characteristic of the dielectric multilayer film 224 is configured to reflect microwaves and transmit visible light, the thickness of the dielectric multilayer film 224 increases, but the separator 22 of the equipment monitoring device X is used. , 221 can be used instead.

In the third embodiment, a configuration in which the monitoring window 23 has a function of separating visible light and microwaves will be described. FIGS. 5 and 6 are main part configuration diagrams of the equipment monitoring apparatus X according to the third embodiment. In addition, the same code | symbol is attached | subjected about the structure similar to FIG. 1, and the description is abbreviate | omitted.
First, as shown to Fig.5 (a), in the equipment monitoring apparatus X which concerns on Example 3, instead of the substantially cylindrical opening protrusion 11 of the equipment E demonstrated using FIG. An opening protrusion 12 (hereinafter referred to as a T-shaped opening protrusion 12) is provided. The T-shaped opening protrusion 12 has an opening directed upward at substantially the center in the longitudinal direction of the substantially cylindrical opening protrusion 11. As shown in FIG.5 (b), the cross section of the opening in the T-shaped opening protrusion 12 is substantially circular.

  The T-shaped opening projection 12 is provided with a monitoring window 231 (an example of a partition member) instead of the monitoring window 23 and the separator 22 (see FIG. 1). Specifically, the monitoring window 231 includes a reflective portion 231a that reflects microwaves and transmits visible light, and a substrate 231b that is formed of a transparent dielectric and supports the reflective portion 231a. The monitoring window 231 is formed so that the outer peripheral surface of the substrate 231 b is parallel to the inner wall of the T-shaped opening protrusion 12 when the monitoring window 231 is disposed in the T-shaped opening protrusion 12 by being inclined by 45 °. Has been. The monitoring window 231 partitions the inside and outside of the equipment E by sealing between the outer peripheral surface of the substrate 231b and the inner wall of the T-shaped opening protrusion 12.

That is, the equipment monitoring apparatus X includes a monitoring window 231 and a microwave detection unit 24, and one monitoring window 231 also functions as the separator 22 and the monitoring window 23. Therefore, if the microwave detection unit 24 is arranged on the opening side of the T-shaped projection 12, the microwave reflected by the monitoring window 231 can be detected.
As described above, by realizing the functions of the separator 22 and the monitoring window 23 by the single monitoring window 231, the components of the equipment monitoring device X can be reduced and the cost can be reduced.

  On the other hand, as shown in FIG. 6, in the equipment monitoring apparatus X according to the third embodiment, a substantially L-shaped opening protrusion instead of the substantially cylindrical opening protrusion 11 of the equipment E described using FIG. 13 (hereinafter referred to as an L-shaped opening protrusion 13) is provided. The L-shaped opening protrusion 13 has openings at both ends of the L-shape and the bent portion of the L-shape, and is connected to the equipment E through the opening at one end. A seal wall portion 21 c that is perpendicular to the monitoring direction L and protrudes in the inner diameter direction of the L-shaped opening protrusion 13 is provided at the opening of the bent portion of the L-shaped opening protrusion 13. A monitoring window 232 (an example of a partition member) is provided instead of the monitoring window 23 and the separator 22 (see FIG. 1). That is, in the equipment monitoring apparatus X, one monitoring window 232 functions as the separator 22 and the monitoring window 23.

Specifically, the monitoring window 232 is formed of a reflective portion 232a that reflects microwaves and transmits visible light, a transparent dielectric, a transparent base material 232b that supports the reflective portion 232a, and a cylindrical shape. And a sealing portion 232c.
The base material 232b is formed in a rectangular parallelepiped, a cube, a cylinder, or the like that encloses the reflecting portion 232a in a state inclined by 45 °. Accordingly, as shown in FIG. 6, when the monitoring window 232 is installed in the L-shaped opening protrusion 13, the reflecting portion 232 a is disposed with an inclination of 45 ° with respect to the monitoring direction L. Further, in the monitoring window 232 disposed in the L-shaped opening protrusion 13, the visible light incident surface and the light emitting surface in the overall shape of the base material 232 b and the seal portion 232 c are perpendicular to the incident direction of the visible light. Since it becomes a parallel plane, the influence of refraction of visible light in the monitoring window 232 can be suppressed.

  On the other hand, as shown in FIG. 6B, the base material 232b is a rectangular parallelepiped or cubic member, and has a diameter larger than the inner diameter of the seal wall portion 21c. Further, the seal portion 232c is a columnar member, and has substantially the same diameter as the inner diameter of the seal wall portion 21c. The monitoring window 232 is sealed in a state where the base material 232b and the seal wall portion 21c are in contact with each other, and the outer peripheral surface of the seal portion 232c and the inner surface of the seal wall portion 21c are in contact with each other. Partition. Thereby, the monitoring window 232 can be provided with a sealing function for partitioning the inside and outside of the facility E.

Similar to the equipment monitoring device X, the equipment monitoring device X includes a monitoring window 232 and a microwave detection unit 24, and one monitoring window 232 also functions as the separator 22 and the monitoring window 23. . Therefore, if the microwave detection unit 24 is arranged on the opening side of the L-shaped opening protrusion 13, the microwave reflected by the monitoring window 232 can be detected.
As described above, by realizing the functions of the separator 22 and the monitoring window 23 by the single monitoring window 232, the components of the equipment monitoring device X can be reduced and the cost can be reduced.

  In the third embodiment, the case where the monitoring window 231 and the monitoring window 232 reflect microwaves and transmits visible light has been described as an example. Of course, the reverse configuration may be configured similarly. Is possible.

In Example 4, the example which applied the above-mentioned equipment monitoring apparatus X to the blast furnace Z is shown. Needless to say, the present embodiment is an example embodying the present invention, and is not of a character that limits the technical scope of the present invention.
As shown in FIG. 7A, the equipment monitoring device X is configured to include a separator 22 (an example of a separation unit), a microwave detection unit 24 (an example of a microwave detection unit), and the like. Arranged in a waveguide 21 having a window 23 (an example of a partition member).

  The waveguide 21 is extended to the blow pipe 4 of the blast furnace Z. The separator 22 is provided on the monitoring direction (path) L and inside the waveguide 21 and on the front side (the blast furnace Z side) of the monitoring window 23. The separator 22 reflects the microwave emitted from the microwave detection unit 24 toward the raceway 5 of the blast furnace Z, and reflects the microwave reflected by the raceway 5 toward the microwave detection unit 24. Let

As shown in FIG. 7A, the monitoring window 23 is provided on the wall surface 21a at the end opposite to the raceway 5 of the blow pipe 4 and the waveguide 21 provided along the monitoring direction L. Yes. The monitoring window 23 divides the environment inside the blast furnace Z from the environment outside and transmits at least visible light.
According to this equipment monitoring apparatus X, it is possible to simultaneously perform monitoring by both visual observation of the raceway 5 by an operator and depth detection of the raceway 5 by the microwave detection unit 24.

7B, in the equipment monitoring apparatus X for the blast furnace Z, the separator 22 (221) may be provided outside the monitoring window 23 although it is in the monitoring direction L.
By the way, it should be thought that embodiment disclosed this time is an illustration and restrictive at no points. In particular, in the embodiment disclosed this time, matters that are not explicitly disclosed, for example, operating conditions and operating conditions, various parameters, dimensions, weights, volumes, and the like of a component deviate from a range that a person skilled in the art normally performs. Instead, values that can be easily assumed by those skilled in the art are employed.

  Again, it goes without saying that the equipment monitoring apparatus (equipment monitoring technology) according to the present invention is applicable to various industrial processes.

  INDUSTRIAL APPLICABILITY The present invention can be used as a facility monitoring apparatus that monitors the state inside a facility used in various industrial processes.

1: Blast furnace wall 2: Tuyere 3: Hot air branch pipe 4: Blow pipe 11: Opening protrusion 12: T-shaped opening protrusion 13: L-shaped opening protrusion 21: Waveguide 21a: End wall 22: Separator ( An example of separation means)
22a: Reflector 22b: Substrate 23: Monitoring window (an example of a partition member)
24: Microwave detection unit (an example of microwave detection means)
E: Equipment L: Monitoring direction X: Equipment monitoring device Z: Blast furnace

Claims (8)

Provided on a common path of light and microwave used for observing a monitoring target in a predetermined facility, and transmits one of the light and microwave, and the other is different from the transmission direction. Separating means for reflecting in the direction;
Microwave detection means provided in the transmission direction or reflection direction of the microwave by the separation means, and detecting the state of the monitoring target based on the microwave;
An equipment monitoring device comprising:   The equipment monitoring apparatus according to claim 1, wherein the separating unit transmits the visible light and reflects the microwaves through a conductor formed in a net shape or a comb shape.   The facility according to claim 1, wherein the separating means transmits the visible light and reflects the microwave through a conductor having a length of ½ of the wavelength of the microwave arranged in parallel at a predetermined interval. Monitoring device.   The facility monitoring apparatus according to claim 1, wherein the separating unit transmits the visible light and reflects the microwave through a conductive thin film.   The equipment monitoring apparatus according to claim 1, wherein the separating unit reflects the visible light and transmits the microwaves by using a laminated optical thin film. The predetermined facility has a monitoring window for observing the monitoring target,
The monitoring window is a partition member that partitions the inside and outside of the predetermined facility and transmits at least the visible light,
The equipment monitoring apparatus according to claim 1, wherein the separation unit also serves as the partition member. The waveguide provided along the path is provided at an end opposite to the monitoring target and partitions the inside and outside of the predetermined facility, and includes a partition member that transmits at least the visible light,
The equipment monitoring apparatus according to claim 1, wherein the separation unit is provided inside the partition member. A partition member provided at an end of the waveguide provided along the path opposite to the monitoring target to partition the inside and outside of the predetermined facility and to transmit the visible light and the microwave. And
The equipment monitoring apparatus according to claim 1, wherein the separation unit is provided outside the partition member.