JP2013027842A - Substrate processing apparatus, filter cleaning method, and filter cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of extending the life of a filter.SOLUTION: The substrate processing apparatus 1 includes a housing 17 for internally holding the filter 16 that filters a processing liquid supplied to a substrate W, and a spray nozzle 23 for making droplets collide with the filter 16 being held in the housing 17. Foreign matter deposited on the filter 16 is removed by the collision of the droplet.

Description

  The present invention relates to a substrate processing apparatus, a filter cleaning method, and a filter cleaning apparatus. Examples of substrates processed by the substrate processing apparatus include semiconductor wafers, liquid crystal display substrates, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, and magneto-optical disk substrates. , Photomask substrates, ceramic substrates, solar cell substrates, and the like.

In a manufacturing process of a semiconductor device, a liquid crystal display device, or the like, a substrate processing apparatus that supplies a processing liquid to a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display device and processes the substrate is used.
For example, Patent Document 1 discloses a batch-type substrate processing apparatus that processes a plurality of substrates at once and a single-wafer-type substrate processing apparatus that processes substrates one by one. Each substrate processing apparatus includes a circulation path for circulating the processing liquid supplied to the substrate. The processing liquid supplied to the substrate is filtered by a filter interposed in the circulation path, and then supplied again to the substrate.

JP 2011-061034 A

  The processing liquid supplied to the substrate contains foreign matter. Foreign matter contained in the treatment liquid is removed by the filter. Therefore, the filter may be clogged with foreign matter. When the filter is clogged, it becomes difficult for the processing liquid to pass through the filter, so that the pressure of the processing liquid circulating in the circulation path decreases. Increasing the output of the pump that feeds the processing liquid can compensate for the pressure drop, but if the pump is continuously used at a high load, the life of the pump is shortened. Therefore, it is necessary to replace the filter periodically. However, if the filter replacement frequency is high, the running cost of the substrate processing apparatus increases.

SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate processing apparatus that can extend the life of a filter.
Another object of the present invention is to provide a filter cleaning method and a filter cleaning apparatus that can remove foreign substances from a filter.

In order to achieve the above object, the invention according to claim 1 is characterized in that a housing (17) for internally holding a filter (16) for filtering the processing liquid supplied to the substrate (W) is held by the housing. And a spray nozzle (23) for causing droplets to collide with the filter in a state.
According to this configuration, the droplets can collide with the filter held in the housing by ejecting the cleaning liquid from the spray nozzle. Thereby, an impact can be given to the foreign material adhering to the filter, and the foreign material can be detached from the filter. Therefore, foreign matter can be removed from the filter. Further, even if the foreign matter does not leave the filter, the binding force of the foreign matter to the filter is reduced by the collision of the liquid droplets, so that the foreign matter can be easily washed away by the cleaning liquid that flows along the filter. Thereby, a foreign material can be removed from a filter. Therefore, clogging of the filter can be reduced and the life of the filter can be extended. Furthermore, foreign matters can be removed while the filter is held in the housing, so that work such as removing the filter from the housing is unnecessary. Therefore, the filter can be easily cleaned.

The invention according to claim 2 is the substrate processing apparatus according to claim 1, further comprising the same kind of liquid supply means (28, 31) for supplying the same kind of processing liquid as the processing liquid to be filtered by the filter to the spray nozzle. is there.
According to this configuration, the same type of processing liquid as the processing liquid to be filtered by the filter is ejected from the spray nozzle, and the same type of processing liquid is supplied to the filter held in the housing. Therefore, the same type of treatment liquid adheres to the cleaned filter. Therefore, when the processing liquid is filtered using the washed filter, it is possible to suppress or prevent the liquid different from the processing liquid from being mixed into the filtered processing liquid and changing the concentration of the processing liquid. Thereby, the change in the concentration of the processing liquid supplied to the substrate can be suppressed or prevented.

The invention according to claim 3 is characterized in that the same-type liquid supply means includes an unused liquid supply means (28) for supplying an unused processing liquid of the same type as the processing liquid to be filtered by the filter to the spray nozzle. Item 3. The substrate processing apparatus according to Item 2.
According to this configuration, since unused processing liquid is supplied from the spray nozzle to the filter held in the housing, it is possible to suppress or prevent foreign matters contained in the processing liquid from adhering to the filter and contaminating the filter. it can. Thereby, the cleanliness of the filter can be increased.

According to a fourth aspect of the present invention, the same type liquid supply means recovers the processing liquid to be filtered by the filter from the inside of the housing, and supplies the recovered processing liquid to the spray nozzle. 4. The substrate processing apparatus according to claim 2, further comprising:
According to this configuration, the processing liquid collected from the inside of the housing is supplied from the spray nozzle to the filter held in the housing. Thereby, the foreign material adhering to the filter is removed. Thus, since the processing liquid collected from the inside of the housing is used, the consumption of the processing liquid can be reduced.

Invention of Claim 5 is a substrate processing apparatus as described in any one of Claims 1-4 which further contains the water supply means (27) which supplies water to the said spray nozzle.
According to this configuration, water is supplied from the spray nozzle to the filter held in the housing. Thereby, the foreign material adhering to the filter is removed. In this way, since the filter is washed with water, the generation of foreign matters accompanying the washing of the filter can be suppressed or prevented. That is, for example, when an alkaline liquid is supplied from a spray nozzle to a filter held in a housing while an acidic liquid is attached to the filter, salt may be generated to contaminate the filter. Therefore, by washing the filter with water, the filter can be washed while suppressing or preventing the generation of foreign matters even when an acidic or alkaline liquid is attached to the filter.

The invention according to claim 6 further includes a drainage pipe (38) communicating with the interior of the housing, and a drainage valve (40) interposed in the drainage pipe. The substrate processing apparatus according to claim 1.
According to this configuration, the cleaning liquid sprayed from the spray nozzle can be stored inside the housing by closing the drain valve. Thus, the cleaning liquid can be supplied not only to the filter but also to the inner wall surface of the housing. Accordingly, the foreign matter scattered around the filter and adhering to the inner wall surface of the housing can be washed away with the cleaning liquid. Further, by opening the drainage valve and discharging the cleaning liquid inside the housing to the drainage pipe, it is possible to suppress or prevent foreign matters contained in the cleaning liquid from reattaching to the filter and the inner wall surface of the housing. Thereby, the cleanliness of the filter can be increased.

  The invention described in claim 7 includes a substrate holding means (4) for holding a substrate, a processing liquid supply means (2) for supplying a processing liquid to the substrate held by the substrate holding means, and the processing liquid supply means. And the housing, the upstream pipe (18) for guiding the processing liquid supplied to the substrate to the inside of the housing, the processing liquid supply means and the housing are connected, and the housing It is a substrate processing apparatus as described in any one of Claims 1-6 further including downstream piping (19) which guides the process liquid filtered by the said filter to the said process liquid supply means.

  According to this configuration, the substrate can be processed by supplying the processing liquid from the processing liquid supply unit to the substrate held by the substrate holding unit. Further, since the processing liquid supply means, the upstream pipe, the housing, and the downstream pipe form an annular circulation path, the processing liquid can be circulated through this circulation path. Thereby, the processing liquid filtered by the filter inside the housing can be supplied to the substrate again. Therefore, the consumption of the processing liquid can be reduced. Furthermore, since the filter can be cleaned without removing it from the housing, it is possible to reduce the downtime (resting time) of the substrate processing apparatus that occurs when the filter is replaced. Therefore, the productivity of the substrate processing apparatus can be improved.

The invention according to claim 8 is the substrate processing apparatus according to any one of claims 1 to 7, wherein the spray nozzle includes a two-fluid nozzle that collides gas and liquid to generate droplets. is there.
According to this configuration, compared to the case of using other types of nozzles such as an ultrasonic nozzle that causes droplets to which ultrasonic waves are applied to collide with the filter held in the housing, the filter damage associated with cleaning is reduced. it can. Therefore, the filter can be cleaned while reducing the damage to the filter. Thereby, the lifetime of the filter can be further extended.

A ninth aspect of the present invention is a filter cleaning method including a cleaning step (S3 to S5) in which droplets collide with a filter that filters liquid to clean the filter. According to this method, an effect similar to the effect described in regard to the invention of claim 1 can be obtained.
The invention according to claim 10 is characterized in that the washing step includes a liquid spraying step (S4, S5) in which droplets of the same kind of liquid as the liquid to be filtered by the filter collide with the filter. This is a filter cleaning method. According to this method, an effect similar to the effect described with respect to the invention of claim 2 can be obtained.

The invention according to claim 11 is characterized in that the liquid spraying step includes an unused liquid spraying step (S5) in which droplets of the same type and unused liquid as the liquid to be filtered by the filter collide with the filter. 10. The filter cleaning method according to 10. According to this method, an effect similar to the effect described in regard to the invention of claim 3 can be obtained.
According to a twelfth aspect of the present invention, in the liquid spraying step, the recovered liquid spraying step (in which the liquid droplets to be filtered by the filter collided with the filter are collected from the inside of the housing holding the filter inside). The filter cleaning method according to claim 10 or 11, comprising S4). According to this method, an effect similar to the effect described in regard to the invention of claim 4 can be produced.

A thirteenth aspect of the present invention is the filter cleaning method according to any one of the ninth to twelfth aspects, wherein the cleaning step includes a water spraying step (S3) for causing water droplets to collide with the filter. According to this method, an effect similar to the effect described with respect to the invention of claim 5 can be obtained.
In the invention according to claim 14, in the cleaning step, the liquid sprayed on the filter is held inside the spraying step (S5) for causing droplets to collide with the filter, and in parallel with the spraying step. A storage step (S5) for storing the inside of the housing, and a discharging step (S5) for discharging the liquid stored inside the housing after the storing step is performed. The filter cleaning method according to any one of the above.

  According to this method, a droplet of cleaning liquid for cleaning the filter is sprayed on the filter, and the cleaning liquid is stored inside the housing that holds the filter inside. Thereafter, the cleaning liquid stored in the housing is discharged. By storing the cleaning liquid inside the housing, the cleaning liquid is supplied not only to the filter but also to the inner wall surface of the housing. Accordingly, the foreign matter scattered around the filter and adhering to the inner wall surface of the housing can be washed away with the cleaning liquid. Furthermore, by discharging the cleaning liquid inside the housing, it is possible to suppress or prevent foreign matters contained in the cleaning liquid from reattaching to the filter and the inner wall surface of the housing. Thereby, the cleanliness of the filter can be increased.

  According to a fifteenth aspect of the present invention, before the cleaning step is performed, a circulation step of circulating a liquid in an annular circulation path (P1) including an interior of a housing that holds the filter therein, and the cleaning step are performed. Before the cleaning, the interruption step (S1) for interrupting the circulation of the liquid in the circulation path and the cleaning step are performed, and after the interruption step is performed, the liquid is discharged from the inside of the housing. A discharge step (S2) for exposing the filter held in the housing from the liquid, and a resumption step (S6) for restarting the circulation of the liquid in the circulation path after the cleaning step is performed. The filter cleaning method according to any one of claims 9 to 14, further comprising:

  According to this method, the circulation of the liquid in the annular circulation path including the inside of the housing is interrupted. Thereafter, the liquid is discharged from the inside of the housing, and the filter held in the housing is exposed from the liquid. Thereafter, the filter is washed by the collision of the droplets. Then, the liquid is supplied again into the housing, and the circulation of the liquid in the circulation path is resumed. Thus, since the filter can be washed while being held in the housing, the replacement frequency of the filter can be reduced. Therefore, the running cost can be reduced.

  According to a sixteenth aspect of the present invention, a filter (16) for filtering a liquid is attached, a housing (17) for holding the attached filter inside, and a droplet on the filter held in the housing. A filter cleaning device (201), including a spray nozzle (23) that causes the nozzle to collide with the filter. According to this configuration, it is possible to achieve an effect similar to the effect described with respect to the invention of claim 1.

The invention according to claim 17 is the filter cleaning device according to claim 16, further comprising the same kind of liquid supply means (28, 31) for supplying the same kind of liquid as the liquid to be filtered by the filter to the spray nozzle. . According to this configuration, it is possible to achieve the same effect as the effect described with respect to the invention of claim 2.
According to an eighteenth aspect of the present invention, the homogeneous liquid supply means includes an unused liquid supply means (28) for supplying an unused liquid of the same kind as the liquid to be filtered by the filter to the spray nozzle. It is a filter washing | cleaning apparatus as described in. According to this configuration, it is possible to achieve the same effect as the effect described with respect to the invention of claim 3.

The invention according to claim 19 is the filter cleaning device according to any one of claims 16 to 18, further comprising water supply means (27) for supplying water to the spray nozzle. According to this configuration, it is possible to achieve the same effect as the effect described with respect to the invention of claim 5.
The invention according to claim 20 further includes a drainage pipe (38) communicating with the inside of the housing, and a drainage valve (40) interposed in the drainage pipe. The filter cleaning apparatus according to claim 1. According to this configuration, it is possible to achieve the same effect as that described in regard to the invention of claim 6.

The invention according to claim 21 is the filter cleaning apparatus according to any one of claims 16 to 20, wherein the spray nozzle includes a two-fluid nozzle that collides gas and liquid to generate droplets. is there. With this configuration, it is possible to achieve the same effect as that described in regard to the invention of claim 8.
In this section, alphanumeric characters in parentheses represent reference numerals of corresponding components in the embodiments described later, but the scope of the claims is not limited by these reference numerals.

It is a schematic diagram for demonstrating schematic structure of the substrate processing apparatus which concerns on 1st Embodiment of this invention. It is a schematic diagram for demonstrating the filter washing | cleaning mechanism which concerns on 1st Embodiment of this invention. It is a figure for demonstrating the operation example when cleaning a filter with the substrate processing apparatus which concerns on 1st Embodiment of this invention. It is a schematic diagram for demonstrating schematic structure of the filter cleaning apparatus which concerns on 2nd Embodiment of this invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
[Substrate processing equipment]
FIG. 1 is a schematic diagram for explaining a schematic configuration of a substrate processing apparatus 1 according to the first embodiment of the present invention.
The substrate processing apparatus 1 is, for example, a batch type substrate processing apparatus that processes a plurality of substrates W at once. The substrate processing apparatus 1 includes a processing tank 2 (processing liquid supply means) that stores a chemical liquid that is an example of a processing liquid, a chemical liquid nozzle 3 that supplies the chemical liquid to the processing tank 2, and a chemical liquid stored in the processing tank 2. A lifter 4 (substrate holding means) that immerses the substrate W, a circulation mechanism 5 that circulates a chemical stored in the processing tank 2, and a control device 6 that controls each device and valve provided in the substrate processing apparatus 1. including.

  The processing tank 2 includes an inner tank 7 and an outer tank 8 opened upward. The chemical liquid nozzle 3 is connected to a chemical liquid pipe 10 in which a chemical liquid valve 9 is interposed. When the control device 6 opens the chemical liquid valve 9, the chemical liquid discharged from the chemical liquid nozzle 3 is supplied into the inner tank 7. When the chemical liquid overflows from the inner tank 7, the overflowed chemical liquid is received by the outer tank 8. The substrate W held by the lifter 4 is immersed in the chemical solution stored in the inner tank 7.

  The lifter 4 includes a plurality of holding bars 11 extending horizontally. The plurality of substrates W are supported in a vertical posture by the plurality of holding bars 11. The lifter 4 includes a lifting mechanism (not shown). The lifting mechanism includes a processing position (position shown in FIG. 1) where the substrate W held in the lifter 4 is located in the inner tank 7, and a substrate W held in the lifter 4 is located above the inner tank 7. The lifter 4 is moved up and down between the retracted position. Therefore, when the lifting mechanism moves the lifter 4 to the processing position, the plurality of substrates W held by the lifter 4 are immersed in the chemical solution. Thereby, the substrate W is processed.

  The circulation mechanism 5 circulates the chemical solution discharged from the treatment tank 2 to the treatment tank 2, a plurality of circulation nozzles 13 connected to the circulation pipe 12, and circulation for sending the chemical solution from the circulation pipe 12 to the circulation nozzle 13. The pump 14 and the heater 15 which heats the chemical | medical solution which flows through the circulation piping 12 are included. The upstream end of the circulation pipe 12 is connected to the outer tub 8, and the downstream end of the circulation pipe 12 is connected to a plurality of circulation nozzles 13. The circulation nozzle 13 is attached to the inner tank 7. The circulation nozzle 13 discharges the chemical solution in the inner tank 7. The circulation pump 14 and the heater 15 are interposed in the circulation pipe 12. A filter 16 that filters the chemical solution flowing through the circulation pipe 12 is interposed in the circulation pipe 12. The filter 16 is held inside a housing 17 (see FIG. 2), which will be described later, interposed in the circulation pipe 12.

  The substrate processing apparatus 1 includes an annular circulation path P <b> 1 including a processing tank 2, a circulation pipe 12, and a housing 17. The chemical solution stored in the processing tank 2 circulates in this circulation path P1. Specifically, the chemical liquid overflowing from the inner tank 7 is received by the outer tank 8 and then sent from the circulation pipe 12 to the circulation nozzle 13 by the circulation pump 14. Thereby, the chemical liquid is discharged from the circulation nozzle 13 and the chemical liquid is supplied into the inner tank 7. Therefore, the chemical | medical solution stored in the inner tank 7 overflows. The overflowing chemical solution is received by the outer tub 8 and then sent from the circulation pipe 12 to the circulation nozzle 13 by the circulation pump 14. Then, the chemical liquid is discharged from the circulation nozzle 13 and the chemical liquid is supplied into the inner tank 7. In this way, the circulation of the chemical solution is continued.

  The chemical solution is heated by the heater 15 as the chemical solution passes through the circulation pipe 12. Therefore, by continuing the circulation of the chemical solution, the chemical solution stored in the processing tank 2 is maintained at a high temperature (temperature higher than room temperature (20 to 30 ° C.)). Furthermore, the chemical solution is filtered by the filter 16 as the chemical solution passes through the circulation pipe 12. Thereby, the foreign material contained in a chemical | medical solution is removed. Moreover, since a high temperature chemical | medical solution is supplied to the filter 16, the filter 16 is heated with a chemical | medical solution. Therefore, the filter 16 is kept at a high temperature in a state where the chemical solution is circulating in the circulation path P1.

FIG. 2 is a schematic diagram for explaining the filter cleaning mechanism 22 according to the first embodiment of the present invention.
The substrate processing apparatus 1 includes a housing 17 that holds the filter 16 therein. The filter 16 is held by the housing 17. The housing 17 can be opened and closed, and the filter 16 is detachably attached to the housing 17. The filter 16 has, for example, a cylindrical shape whose upper end is closed. The interior of the housing 17 is partitioned by the filter 16 into an upstream space X1 and a downstream space X2. The upstream space X1 is a space outside the filter 16 to which the liquid to be filtered is supplied, and the downstream space X2 is a space inside the filter 16 to which the liquid filtered by the filter 16 is supplied. The housing 17 includes an inflow portion 17a that communicates with the upstream space X1 and an outflow portion 17b that communicates with the downstream space X2.

  The circulation pipe 12 includes an upstream pipe 18 disposed on the upstream side of the housing 17 with respect to the flow direction of the chemical solution, and a downstream pipe 19 disposed on the downstream side of the housing 17. The circulation mechanism 5 further includes an upstream valve 20 interposed in the upstream pipe 18 and a downstream valve 21 interposed in the downstream pipe 19. The end of the upstream pipe 18 is connected to the inflow part 17 a of the housing 17, and the end of the downstream pipe 19 is connected to the outflow part 17 b of the housing 17. Therefore, the chemical liquid flowing in the upstream side pipe 18 flows into the upstream side space X1 from the upstream side pipe 18 through the inflow portion 17a. Moreover, the chemical | medical solution filtered by the filter 16 flows out out of the downstream space X2 to the downstream piping 19 via the outflow part 17b.

  In a state where the chemical solution is circulating in the circulation path P1, the inside of the housing 17 is filled with the chemical solution. Therefore, in this state, the supply pressure of the circulation pump 14 is applied to the surface 16 a of the filter 16. The chemical liquid in the housing 17 (upstream space X1) passes through the surface 16a of the filter 16 by the supply pressure of the circulation pump 14, and is filtered. Thereby, a chemical | medical solution moves to the downstream space X2 from the upstream space X1. And the chemical | medical solution which moved to the downstream space X2 is discharged | emitted from the outflow part 17b to the downstream piping 19, and is sent to the circulation nozzle 13. FIG. Thereby, the filtered chemical is supplied to the inner tank 7.

  The substrate processing apparatus 1 includes a filter cleaning mechanism 22 that cleans the filter 16. The filter cleaning mechanism 22 includes the housing 17 described above and a plurality of spray nozzles 23 that cause droplets to collide with the filter 16 inside the housing 17. The spray nozzle 23 is, for example, a two-fluid nozzle that generates a droplet by colliding a gas and a liquid. Each spray nozzle 23 is held by a housing 17. The plurality of spray nozzles 23 are arranged around the filter 16. Further, the plurality of spray nozzles 23 are arranged so that a large number of droplets generated by the plurality of spray nozzles 23 are uniformly sprayed over the entire surface 16 a of the filter 16.

  The filter cleaning mechanism 22 includes a gas pipe 24 that supplies gas to the spray nozzle 23, a liquid pipe 25 that supplies liquid to the spray nozzle 23, and a gas valve 26 interposed in the gas pipe 24. The gas pipe 24 and the liquid pipe 25 are provided for each spray nozzle 23, and ends of the gas pipe 24 and the liquid pipe 25 are connected to the common spray nozzle 23. In FIG. 2, only the gas pipe 24 and the liquid pipe 25 corresponding to one spray nozzle 23 are illustrated, and the other gas pipe 24 and the liquid pipe 25 are not illustrated. The spray nozzle 23 collides the gas and liquid supplied from the gas pipe 24 and the liquid pipe 25 to generate a large number of liquid droplets, and collides these liquid droplets with the filter 16 held in the housing 17. .

  For example, an inert gas such as nitrogen gas, oxygen gas, carbon dioxide gas, or clean air is supplied from the gas pipe 24 to the spray nozzle 23. In the first embodiment, for example, nitrogen gas is supplied from the gas pipe 24 to the spray nozzle 23. Further, for example, pure water (deionized water) and a liquid of the same type as the liquid to be filtered by the filter 16 (chemical liquid in the first embodiment) are supplied from the liquid pipe 25 to the spray nozzle 23 as a cleaning liquid. Is done. That is, the filter cleaning mechanism 22 includes a water pipe 27 (water supply means) that supplies pure water to the liquid pipe 25 and a liquid pipe that supplies the same kind of unused liquid (unused chemical liquid) to be filtered by the filter 16. 25, a new liquid pipe 28 (same type liquid supply means, unused liquid supply means), a water valve 29 interposed in the water pipe 27, and a new liquid valve 30 interposed in the new liquid pipe 28. Including. When the control device 6 opens the water valve 29, the water supplied from the water pipe 27 to the liquid pipe 25 is supplied to the spray nozzle 23. Similarly, when the control device 6 opens the new liquid valve 30, a new liquid (unused chemical liquid) supplied from the new liquid pipe 28 to the liquid pipe 25 is supplied to the spray nozzle 23.

  The filter cleaning mechanism 22 includes a recovery mechanism 31 (same type liquid supply means, recovered liquid supply means) that recovers the liquid from the housing 17 and supplies the recovered liquid to the spray nozzle 23. The recovery mechanism 31 includes a tank 32 that stores the liquid discharged from the housing 17, a first recovery pipe 33 that guides the liquid in the housing 17 to the tank 32, and a second that guides the liquid in the tank 32 to the liquid pipe 25. The recovery pipe 34, the first recovery valve 35 interposed in the first recovery pipe 33, the second recovery valve 36 interposed in the second recovery pipe 34, and the recovery interposed in the second recovery pipe 34 Pump 37. One end of the first recovery pipe 33 is connected to the lower end of the housing 17, and the other end of the first recovery pipe 33 is connected to the tank 32. One end of the second recovery pipe 34 is connected to the lower end of the tank 32, and the other end of the second recovery pipe 34 is connected to the liquid pipe 25.

  When the first recovery valve 35 is opened, the liquid in the housing 17 is discharged to the first recovery pipe 33 and supplied into the tank 32. Thereby, the liquid in the housing 17 is collected in the tank 32. When the second recovery valve 36 is opened and the recovery pump 37 is driven, the liquid in the tank 32 is supplied to the liquid pipe 25 via the second recovery pipe 34. As a result, the liquid collected from the housing 17 (used chemical liquid in the first embodiment) is supplied to the spray nozzle 23. The used chemical solution supplied to the spray nozzle 23 is discharged from the spray nozzle 23 and returned to the housing 17. Thus, the liquid pipe 25, the tank 32, the first recovery pipe 33, and the second recovery pipe 34 constitute a recovery path P <b> 2 that returns the liquid recovered from the housing 17 into the housing 17.

  The filter cleaning mechanism 22 includes a drain pipe 38 and an atmosphere communication pipe 39 connected to the housing 17, a drain valve 40 interposed in the drain pipe 38, and a communication valve 41 interposed in the atmosphere communication pipe 39. Including. One end of the drainage pipe 38 is connected to the lower end of the housing 17, and the other end of the drainage pipe 38 is connected to a waste liquid mechanism (not shown). One end of the atmosphere communication pipe 39 is connected to the upper end of the housing 17, and the other end of the atmosphere communication pipe 39 communicates with the atmosphere. The drainage pipe 38 and the atmosphere communication pipe 39 communicate with the inside of the housing 17. When the drain valve 40 is opened, the liquid in the housing 17 is discharged to the drain pipe 38 and guided to a waste liquid mechanism (not shown). When the communication valve 41 is opened, the interior of the housing 17 communicates with the atmosphere.

FIG. 3 is a flowchart when the filter 16 is cleaned by the substrate processing apparatus 1 according to the first embodiment of the present invention. In the following, reference is made to FIGS. First, the first operation example of FIG. 3 will be described.
When the filter 16 is washed, first, the circulation of the chemical solution in the circulation path P1 is interrupted (S1). Specifically, the control device 6 closes the upstream valve 20 and the downstream valve 21 in a state where the valves 26, 29, 30, 35, 36, 40, 41 of the filter cleaning mechanism 22 are closed. Thereby, the supply of the chemical solution from the upstream side pipe 18 into the housing 17 is stopped, and the circulation of the chemical solution in the circulation path P1 is stopped. In a state where the chemical solution is circulating in the circulation path P1, a constant pressure (chemical solution supply pressure) is applied to the filter 16. Therefore, the hydraulic pressure applied to the filter 16 is reduced by stopping the circulation of the chemical solution in the circulation path P1. For this reason, the foreign substance is more easily detached from the filter 16 than before the circulation of the chemical liquid is interrupted.

  Next, the chemical solution in the housing 17 is discharged (S2). Specifically, the control device 6 opens the first recovery valve 35 and the communication valve 41. Thereby, the chemical liquid in the housing 17 is discharged to the first recovery pipe 33 while air is introduced into the housing 17 from the atmosphere communication pipe 39. Since the first recovery pipe 33 is connected to the tank 32, the chemical solution in the housing 17 is recovered in the tank 32. The control device 6 keeps the first recovery valve 35 and the communication valve 41 open until all the chemical solution in the housing 17 is discharged, that is, until the inside of the housing 17 becomes empty. Then, when the housing 17 becomes empty, the control device 6 closes the first recovery valve 35 and the communication valve 41. The filter 16 is exposed from the liquid by emptying the housing 17.

  Next, water is sprayed on the filter 16 (S3). Specifically, the control device 6 opens the water valve 29, the gas valve 26, and the drain valve 40. Thereby, pure water and nitrogen gas are supplied to each spray nozzle 23, and a large number of water droplets are sprayed onto the filter 16. Therefore, an impact is applied to the foreign matter adhering to the filter 16 and the foreign matter is peeled off from the filter 16. Moreover, when pure water flows down along the filter 16, the foreign material adhering to the filter 16 is washed away by the pure water. Foreign matter dropped due to the collision of water droplets or foreign matter washed away by pure water is discharged from the drainage pipe 38 together with pure water. Thereby, the reattachment of the foreign matter to the filter 16 is suppressed or prevented. The control device 6 closes the water valve 29, the gas valve 26, and the drainage valve 40 after the water droplet collides with the entire surface 16 a of the filter 16.

  Next, the chemical | medical solution collect | recovered by the tank 32 is sprayed on the filter 16 (S4). Specifically, the control device 6 opens the second recovery valve 36, the gas valve 26, and the drain valve 40 and drives the recovery pump 37. As a result, the chemical liquid and nitrogen gas are supplied to each spray nozzle 23, and a large number of liquid droplets of the chemical liquid are sprayed onto the filter 16. For this reason, the foreign matter falls from the filter 16 and the foreign matter adhering to the filter 16 is washed away by the chemical solution. And the chemical | medical solution containing a foreign material is discharged | emitted from the drainage piping 38. FIG. After the liquid droplet of the chemical liquid collides with the entire surface 16a of the filter 16, the control device 6 closes the second recovery valve 36, the gas valve 26, and the drainage valve 40, and stops the recovery pump 37. As described above, the control device 6 sprays the chemical liquid in the tank 32, which is the same type of liquid as the liquid to be filtered by the filter 16, and is recovered from the housing 17 onto the filter 16 as a cleaning liquid for cleaning the filter 16. Let Therefore, it is possible to reduce the consumption of the chemical liquid used as the cleaning liquid.

  Next, unused chemicals are sprayed onto the filter 16 (S5). Specifically, the control device 6 opens the new liquid valve 30, the gas valve 26, and the communication valve 41 in a state where the first recovery valve 35 and the drain valve 40 are closed. As a result, unused chemical liquid and nitrogen gas are supplied to each spray nozzle 23, and a large number of liquid droplets of the chemical liquid are sprayed onto the filter 16. For this reason, the foreign matter falls from the filter 16 and the foreign matter adhering to the filter 16 is washed away by the chemical solution. Further, since the first recovery valve 35 and the drainage valve 40 are closed, the chemical liquid ejected from each spray nozzle 23 accumulates in the housing 17. The control device 6 fills the inside of the housing 17 with the chemical solution by continuing the injection of the chemical solution from each spray nozzle 23. Then, after the inside of the housing 17 is filled with the chemical solution, the control device 6 closes the new liquid valve 30 and the gas valve 26 and opens the drain valve 40. Thereby, the chemical | medical solution in the housing 17 is discharged | emitted by the drainage piping 38, and the inside of the housing 17 becomes empty. Then, the control device 6 closes the drain valve 40 and the communication valve 41 after the housing 17 becomes empty.

  In this way, the control device 6 causes the unused chemical liquid droplets to collide with the filter 16 and performs final cleaning of the filter 16 and the housing 17 with the unused chemical liquid. That is, the foreign matter removed from the filter 16 by the collision of the droplets is discharged to the drainage pipe 38 together with the chemical solution. Furthermore, since the housing 17 is filled with the chemical solution, the chemical solution is also supplied to the inner wall surface of the housing 17. Therefore, the foreign matter adhering to the inner wall surface of the housing 17 is washed away by the chemical solution supplied to the inner wall surface. And these foreign materials are discharged | emitted to the drainage piping 38 with a chemical | medical solution. Thereby, the foreign matter is removed not only from the surface 16 a of the filter 16 but also from the inner wall surface of the housing 17. Therefore, the reattachment of foreign matter to the filter 16 can be suppressed or prevented. Further, the chemical solution collected from the housing 17 or an unused chemical solution is supplied to the filter 16, whereby the pure water adhering to the filter 16 is replaced with the chemical solution. Therefore, when the circulation of the chemical solution in the circulation path P1 is resumed, it is possible to suppress or prevent the pure water from being mixed into the chemical solution and the concentration of the chemical solution supplied to the substrate W from being changed.

  Next, the circulation of the chemical solution in the circulation path P1 is resumed (S6). Specifically, the control device 6 opens the upstream valve 20 and the downstream valve 21 in a state where the valves 26, 29, 30, 35, 36, 40, 41 of the filter cleaning mechanism 22 are closed. Further, the control device 6 discharges the chemical liquid from the chemical liquid nozzle 3 to the inner tank 7. Thereby, the chemical liquid overflows from the inner tank 7, and the chemical liquid is supplied to the outer tank 8. Then, the chemical solution supplied to the outer tub 8 is supplied from the upstream side pipe 18 into the housing 17. Thereby, the inside of the housing 17 is filled with the chemical solution, and the supply pressure of the chemical solution is applied to the filter 16. The chemical solution supplied into the housing 17 passes through the filter 16, that is, after being filtered by the filter 16, is discharged to the downstream side pipe 19. Thereby, the circulation of the chemical solution in the circulation path P1 is resumed.

  Thus, in the first operation example, after the water spray (S3) is performed, the recovered liquid spray (S4) and the new liquid spray (S5) are sequentially performed, and then the chemical liquid in the circulation path P1 is sprayed. The case where the circulation is resumed has been described. However, as shown in the second operation example and the third operation example of FIG. 3, the spray of recovered liquid (S4) or the spray of new liquid (S5) may be omitted. Further, as shown in the fourth operation example of FIG. 3, after the water spray (S3) is omitted and the drainage liquid (S2) in the housing 17 is performed, the recovered liquid spray (S4) and the new liquid spray are performed. (S5) may be performed sequentially. Further, as shown in the fifth operation example of FIG. 3, after the recovered liquid spray (S4) and the new liquid spray (S5) are omitted and the water spray (S3) is performed, the chemical liquid in the circulation path P1 is obtained. Circulation may be resumed.

  As described above, in the first embodiment, the droplets can collide with the filter 16 held in the housing 17 by ejecting the cleaning liquid from the spray nozzle 23. Thereby, foreign matter can be removed from the filter 16. Therefore, the life of the filter 16 can be extended, and the replacement frequency of the filter 16 can be reduced. Therefore, the running cost of the substrate processing apparatus 1 can be reduced. Furthermore, since the clogging of the filter 16 can be suppressed, the chemical liquid can be circulated at a stable pressure without increasing the output of the circulation pump 14. Thereby, the lifetime of the circulation pump 14 can be extended. Therefore, the running cost of the substrate processing apparatus 1 can be further reduced. In addition, since the filter 16 can be cleaned without removing it from the housing 17, there is no need to remove or attach the filter 16 accompanying the cleaning. Accordingly, it is possible to reduce the downtime of the substrate processing apparatus 1 generated by the replacement of the filter 16. Thereby, the productivity of the substrate processing apparatus 1 can be improved.

[Filter cleaning equipment]
FIG. 4 is a schematic diagram for explaining a schematic configuration of a filter cleaning device 201 according to the second embodiment of the present invention.
The filter cleaning device 201 includes a housing 17. The filter 16 is detachably attached to the housing 17. The filter 16 is held inside the housing 17. The filter cleaning apparatus 201 further includes a plurality of spray nozzles 23, a gas pipe 24, a liquid pipe 25, a gas valve 26, a water pipe 27, a new liquid pipe 28, a water valve 29, and a new liquid valve 30. Including. Further, the filter cleaning device 201 includes a drainage pipe 38 and an atmosphere communication pipe 39, a drainage valve 40 and a communication valve 41. The filter cleaning device 201 includes a control device 6 that controls each device and valve provided in the filter cleaning device 201.

  When the filter 16 is cleaned by the filter cleaning device 201, the filter 16 is attached to the housing 17. Thereafter, the valves 26, 29, 30, 35, 36, 40, and 41 are opened and closed by the control device 6 so that the droplets of the cleaning liquid are housed in the housing in the same manner as the cleaning of the filter 16 described with reference to FIG. 17 is sprayed on the filter 16 held in the state. However, in the second embodiment, since the recovery mechanism 31 is not provided in the filter cleaning device 201, pure water and / or unused chemical liquid is supplied to the spray nozzle 23, and water droplets and / or chemical liquid droplets are generated. The filter 16 is held by the housing 17 and sprayed. Thereby, the foreign material adhering to the filter 16 is removed.

Although the embodiments of the present invention have been described above, the present invention is not limited to the contents of the first and second embodiments described above, and various modifications can be made within the scope of the claims. is there.
For example, in the first and second embodiments described above, the case where the cleaning liquid is sprayed from the spray nozzle 23 in a state where the spray nozzle 23 is fixed to the housing 17 has been described. The spray nozzle 23 may be moved.

  In the first and second embodiments described above, the case where a chemical liquid of the same type as the chemical liquid to be filtered by the filter 16 is supplied to the spray nozzle 23 has been described. May be supplied to the spray nozzle 23. Furthermore, in the first embodiment described above, the case where nitrogen gas is supplied to the spray nozzle 23 has been described, but the gas supplied to the spray nozzle 23 may be a gas other than nitrogen gas.

  Specifically, sulfuric acid liquid and oxygen gas may be supplied to the spray nozzle 23, or pure water and carbon dioxide gas may be supplied to the spray nozzle 23. When the sulfuric acid liquid and the oxygen gas are supplied to the spray nozzle 23, the foreign matter adhering to the filter 16 can be oxidized to reduce the binding force of the foreign matter to the filter 16. In addition, when pure water and carbon dioxide gas are supplied to the spray nozzle 23, charging of the filter 16 can be suppressed or prevented, so that foreign matter can be prevented from adhering to the filter 16 due to charging of the filter 16.

In the first and second embodiments described above, the case where the spray nozzle 23 is a two-fluid nozzle has been described. However, the spray nozzle 23 may be a nozzle other than the two-fluid nozzle.
In the first and second embodiments described above, the case where the pump and the valve are controlled by the control device 6 when the filter 16 is cleaned has been described. However, the start and stop of liquid feeding from the pump, and the valve The opening and closing may be performed manually.

In the first and second embodiments described above, the case where the filter 16 is cylindrical has been described. However, the filter 16 may have a shape other than the cylindrical shape.
In the first embodiment, the substrate processing apparatus 1 is a batch-type substrate processing apparatus. However, the substrate processing apparatus 1 is a single-wafer type substrate processing apparatus that processes the substrates W one by one. It may be.

  In addition, various design changes can be made within the scope of matters described in the claims.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Processing tank (Processing liquid supply means)
4 Lifter (substrate holding means)
16 Filter 17 Housing 18 Upstream piping 19 Downstream piping 23 Spray nozzle (two-fluid nozzle)
27 Water piping (water supply means)
28 New liquid piping (same liquid supply means, unused liquid supply means)
31 Recovery mechanism (same liquid supply means, recovered liquid supply means)
38 Drainage pipe 40 Drainage valve 201 Filter cleaning device W Substrate

Claims (21)

A housing that internally holds a filter for filtering the processing liquid supplied to the substrate;
And a spray nozzle for causing droplets to collide with the filter held in the housing.   The substrate processing apparatus according to claim 1, further comprising a same-type liquid supply unit that supplies the same type of processing liquid as the processing liquid to be filtered by the filter to the spray nozzle.   The substrate processing apparatus according to claim 2, wherein the same type liquid supply unit includes an unused liquid supply unit that supplies an unused processing liquid that is the same type as the processing liquid to be filtered by the filter to the spray nozzle.   The said same kind liquid supply means contains the collection | recovery liquid supply means which collects the process liquid which should be filtered with the said filter from the inside of the said housing, and supplies the collect | recovered process liquid to the said spray nozzle. Substrate processing equipment.   The substrate processing apparatus according to claim 1, further comprising water supply means for supplying water to the spray nozzle.   The substrate processing apparatus according to claim 1, further comprising a drain pipe communicating with the interior of the housing, and a drain valve interposed in the drain pipe. Substrate holding means for holding the substrate;
Treatment liquid supply means for supplying a treatment liquid to the substrate held by the substrate holding means;
An upstream pipe that connects the processing liquid supply means and the housing, and guides the processing liquid supplied to the substrate into the housing;
The processing liquid supply means and the housing are connected, and further includes a downstream pipe that guides the processing liquid filtered by the filter inside the housing to the processing liquid supply means. The substrate processing apparatus as described in any one of Claims.   The substrate processing apparatus according to claim 1, wherein the spray nozzle includes a two-fluid nozzle that collides a gas and a liquid to generate a droplet.   A filter cleaning method, comprising: a cleaning step of cleaning a filter by causing a droplet to collide with a filter that filters liquid.   The filter cleaning method according to claim 9, wherein the cleaning step includes a liquid spraying step of causing liquid droplets of the same type as the liquid to be filtered by the filter to collide with the filter.   11. The filter cleaning method according to claim 10, wherein the liquid spraying step includes an unused liquid spraying step of causing liquid droplets of the same kind and unused as the liquid to be filtered by the filter to collide with the filter.   The liquid spraying step includes a recovered liquid spraying step of causing a liquid droplet recovered from the inside of a housing holding the filter therein to be filtered by the filter to collide with the filter. The filter cleaning method as described.   The filter cleaning method according to any one of claims 9 to 12, wherein the cleaning step includes a water spraying step of causing water droplets to collide with the filter.   The cleaning step includes a spraying step for causing droplets to collide with the filter, and a storage step for storing the liquid sprayed on the filter in a housing that holds the filter inside in parallel with the spraying step; The filter washing | cleaning method as described in any one of Claims 9-13 including the discharge step which discharges | emits the liquid stored in the said housing after the said storage step is performed. A circulation step of circulating a liquid in an annular circulation path including an interior of a housing that holds the filter therein before the cleaning step is performed;
An interruption step of interrupting the circulation of liquid in the circulation path before the washing step is performed;
Before the cleaning step is performed, and after the interruption step is performed, the liquid is discharged from the inside of the housing, and the discharging step of exposing the filter held in the housing from the liquid; ,
The filter cleaning method according to claim 9, further comprising a restarting step of restarting the circulation of the liquid in the circulation path after the cleaning step is performed. A housing that is fitted with a filter for filtering liquid, and that holds the attached filter inside;
And a spray nozzle for causing droplets to collide with the filter held in the housing.   The filter cleaning apparatus according to claim 16, further comprising a same-type liquid supply unit that supplies the same kind of liquid as the liquid to be filtered by the filter to the spray nozzle.   18. The filter cleaning apparatus according to claim 17, wherein the same-type liquid supply means includes an unused liquid supply means for supplying an unused liquid that is the same type and unused as the liquid to be filtered by the filter to the spray nozzle.   The filter cleaning apparatus according to any one of claims 16 to 18, further comprising water supply means for supplying water to the spray nozzle.   The filter cleaning apparatus according to any one of claims 16 to 19, further comprising a drainage pipe communicating with the inside of the housing and a drainage valve interposed in the drainage pipe.   The filter cleaning device according to any one of claims 16 to 20, wherein the spray nozzle includes a two-fluid nozzle that collides gas and liquid to generate droplets.

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