JP2013021195A - Method of manufacturing ceramic substrate - Google Patents

Method of manufacturing ceramic substrate Download PDF

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JP2013021195A
JP2013021195A JP2011154388A JP2011154388A JP2013021195A JP 2013021195 A JP2013021195 A JP 2013021195A JP 2011154388 A JP2011154388 A JP 2011154388A JP 2011154388 A JP2011154388 A JP 2011154388A JP 2013021195 A JP2013021195 A JP 2013021195A
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ceramic
ceramic substrate
glass
alignment mark
mark
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JP5743766B2 (en
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Ken Mizoguchi
憲 溝口
Nobutaka Shikine
延隆 敷根
Takaari Nasu
孝有 奈須
Naoki Kito
直樹 鬼頭
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a ceramic substrate in which position data by image processing of an alignment mark formed on the surface of the substrate can be recognized without being hindered by glass coming up to the surface in the manufacturing process thereof.SOLUTION: A method of manufacturing a ceramic substrate 1 includes a surface reforming process for reforming the surface of the alignment mark 8 and the surface of a ceramic part, such as reducing glass coming up to these surfaces for instance, by injecting slurry made of a polishing material such as water (liquid) and alumina particles together with high pressure air to the alignment mark 8 and the ceramic part s around the mark 8, in the ceramic substrate 1 made of ceramic containing glass while having a surface 2 and a back and the alignment mark 8 formed on at least one of the surface 2 and the back.

Description

本発明は、セラミック基板の製造過程において、該基板の表面に浮き出たガラスによって、該表面に形成した位置合わせマーク付近に対する画像処理を用いた位置情報の認識に支障が生じないようにしたセラミック基板の製造方法に関する。   The present invention relates to a ceramic substrate in which, in the process of manufacturing a ceramic substrate, the glass floating on the surface of the substrate does not hinder the recognition of positional information using image processing for the vicinity of the alignment mark formed on the surface. It relates to the manufacturing method.

例えば、ガラス−セラミックなど低温焼成セラミックのからなるセラミック基板では、製造過程、具体的には焼成時において、セラミック基板の表面に形成された導体パターンから浮き出たガラスにより、該導体パターンに対するメッキ性が低下するおそれがある。これを防ぐため、上記導体パターンの表面に対し、アルミナなどの研磨材と水との混合液を高圧で吹き付けるウエットブラスト処理を施すようにした低温焼成セラミック基板の製造方法が提案されている(例えば、特許文献1参照)。   For example, in a ceramic substrate made of a low-temperature fired ceramic such as glass-ceramic, the plating property to the conductor pattern is increased by the glass raised from the conductor pattern formed on the surface of the ceramic substrate during the manufacturing process, specifically, firing. May decrease. In order to prevent this, a method for manufacturing a low-temperature fired ceramic substrate has been proposed in which wet blasting is performed on the surface of the conductor pattern by spraying a mixture of an abrasive such as alumina and water at a high pressure (for example, , See Patent Document 1).

しかし、前記のようにセラミック基板の表面に導電性ペーストにより予め形成された位置合わせマークは、前記のような導体パターンにウエットブラスト処理を施しても、焼成時にセラミック基板の表面に浮き出たガラスによって、CCDカメラによる撮像を基にした2値化処理後における位置情報の認識を行うことができない場合がある。その結果、例えば、上記セラミック基板の表面に対する電子部品の実装が、該表面における所定の位置に正確に行えない場合が生じる、という問題があった。   However, the alignment mark formed in advance on the surface of the ceramic substrate with the conductive paste as described above is formed by the glass that is raised on the surface of the ceramic substrate during firing even when the conductive pattern as described above is subjected to wet blasting. In some cases, position information cannot be recognized after binarization processing based on imaging by a CCD camera. As a result, there has been a problem that, for example, electronic components may not be mounted on the surface of the ceramic substrate accurately at a predetermined position on the surface.

特許第4089902号公報(第1〜7頁、図1,2)Japanese Patent No. 4089902 (pages 1 to 7, FIGS. 1 and 2)

本発明は、背景技術において説明した問題点を解決し、製造過程で基板の表面にガラスが浮き出し得るセラミック基板であって、該基板の表面に予め形成した位置合わせマークの画像処理による位置情報の認識が支障なく行えるようにしたセラミック基板の製造方法を提供する、ことを課題とする。   The present invention solves the problems described in the background art, and is a ceramic substrate on which glass can be raised on the surface of the substrate in the manufacturing process, and the position information obtained by image processing of the alignment mark formed in advance on the surface of the substrate. It is an object of the present invention to provide a method for manufacturing a ceramic substrate that can be recognized without any problem.

課題を解決するための手段および発明の効果Means for Solving the Problems and Effects of the Invention

本発明は、前記課題を解決するため、研磨材と水などの液体とからなるスラリを高圧エアと共に、焼成されたセラミック基板の位置合わせマークを含む表面に対して噴射する、ことに着想して成されたものである。
即ち、本発明によるセラミック基板の製造方法(請求項1)は、ガラスを含むセラミックからなり、且つ表面および裏面を有し、かかる表面および裏面の少なくとも一方に位置合わせマークが形成されたセラミック基板において、上記位置合わせマークおよび該マーク周辺のセラミック部に対し、液体および研磨材からなるスラリを高圧空気と共に噴射して、上記位置合わせマークの表面と上記セラミック部の表面とを改質する表面改質工程を含む、ことを特徴とする。
尚、本発明の対象となるセラミック基板には、複数のセラミック基板を縦横に併有する多数個取り用のセラミック基板集合体も含まれている。
In order to solve the above-mentioned problems, the present invention is conceived by injecting a slurry made of a polishing material and a liquid such as water, together with high-pressure air, onto the surface including the alignment mark of the fired ceramic substrate. It was made.
That is, a method of manufacturing a ceramic substrate according to the present invention (Claim 1) is a ceramic substrate comprising a ceramic containing glass, having a front surface and a back surface, and an alignment mark formed on at least one of the front surface and the back surface. Further, surface modification is performed by spraying a slurry made of a liquid and an abrasive together with high-pressure air onto the alignment mark and the ceramic portion around the mark to improve the surface of the alignment mark and the surface of the ceramic portion. Including a process.
In addition, the ceramic substrate which is the subject of the present invention includes a multi-piece ceramic substrate assembly having a plurality of ceramic substrates in both vertical and horizontal directions.

これによれば、研磨材と水などの液体とからなるスラリを高圧エアと共に、焼成されたセラミック基板の位置合わせマーク付近の表面に対して噴射するので、該位置合わせマークの表面とセラミック部の表面とに対して、比較的均一な圧力を伴って研磨材と水などの液体とが衝突する。その結果、セラミック部の表面と例えばAgなどの導体からなる位置合わせマークの表面とから、焼成時に浮き出ていたガラスを比較的均一に除去ないし低減もしくは変形できるか、あるいはCCDカメラによる撮像および得られた画像の2値化処理後における位置情報の認識に支障を来さない表面状態(表面粗さなど)にする表面改質が容易に行える。従って、上記2値化処理によって得られた画像(位置)情報を基にした位置決めを正確に行えるので、例えば、セラミック基板の表面における所定の位置にSAWフィルタ、水晶振動子、あるいはICチップなどの電子部品を精度良く実装したり、あるいは、多数個取り基板を個々のセラミック基板に精度良く分割することなどが可能となる。   According to this, since a slurry composed of an abrasive and a liquid such as water is jetted together with high-pressure air to the surface near the alignment mark of the fired ceramic substrate, the surface of the alignment mark and the ceramic portion An abrasive and a liquid such as water collide with the surface with a relatively uniform pressure. As a result, it is possible to remove or reduce or deform the glass that has been raised during firing relatively uniformly from the surface of the ceramic portion and the surface of the alignment mark made of a conductor such as Ag, or to obtain and obtain an image with a CCD camera. Surface modification (surface roughness or the like) that does not hinder the recognition of position information after binarization processing of the image can be easily performed. Therefore, since positioning based on the image (position) information obtained by the binarization processing can be performed accurately, for example, a SAW filter, a crystal resonator, an IC chip, or the like is placed at a predetermined position on the surface of the ceramic substrate. It is possible to mount electronic components with high accuracy, or to divide a multi-chip substrate into individual ceramic substrates with high accuracy.

尚、前記ガラス成分を含むセラミックは、例えば、ガラス−セラミックなどの低温焼成セラミック(LTCC)のほか、焼成後のセラミック基板の表面にガラスが浮き出すおそれがある高温焼成セラミック(HTCC)も含む。
また、前記位置合わせマークは、例えば、多数個取り用のグリーンシートを焼成したセラミック基板(集合体)の表面において、パッドなどの表面配線が形成される製品領域の外側(例えば、耳部の四隅の欠くコーナ付近)に、導電性ペーストを平面視が円形や角形などのパターンで印刷するか、当該セラミック基板(集合体)を構成するセラミックとは異なる明度および色彩のセラミック粉とガラスとを含むペーストを印刷することにより形成されたものである。
但し、単一のセラミック基板の表面に形成する表面配線の一部(例えば、一部のパッド)、あるいは、多数個取り用のセラミック基板集合体の基板部ごとの表面に形成する表面配線の一部を、位置合わせマークと兼用する形態としても良い。
更に、前記位置合わせマークは、前記セラミック基板の表面に形成される導体パターンと同じ金属を含むか、あるいは前記セラミック基板とは異なる種類で且つ色彩が明確に異なるガラスを含むセラミックによって形成されている。
また、前記位置合わせマーク周辺のセラミック部は、2値化処理の際に該マークと共に同じ画像に撮像されるような当該マークに隣接するセラミック基板の前記表面である。
The ceramic containing the glass component includes, for example, a low-temperature fired ceramic (LTCC) such as glass-ceramic and a high-temperature fired ceramic (HTCC) that may cause the glass to float on the surface of the fired ceramic substrate.
In addition, the alignment mark is formed on the surface of a ceramic substrate (aggregate) obtained by firing a multi-sheet green sheet, for example, on the outside of a product area where surface wiring such as pads is formed (for example, four corners of an ear). The conductive paste is printed in a pattern such as a circle or a square in plan view, or the ceramic powder and glass have a lightness and color different from the ceramic constituting the ceramic substrate (aggregate). It is formed by printing a paste.
However, a part of the surface wiring formed on the surface of a single ceramic substrate (for example, a part of pads) or one surface wiring formed on the surface of each substrate portion of the ceramic substrate assembly for multi-piece production. The portion may be used also as an alignment mark.
Furthermore, the alignment mark includes the same metal as the conductor pattern formed on the surface of the ceramic substrate, or is formed of a ceramic including glass of a different type and a color different from the ceramic substrate. .
Further, the ceramic portion around the alignment mark is the surface of the ceramic substrate adjacent to the mark so that it is captured in the same image together with the mark during the binarization process.

更に、前記液体は、純水を含む水のほか、クーラントなどの潤滑油も含む。
加えて、前記研磨材には、平均粒径が例えば10μm以下と比較的小さいアルミナ、ムライト、あるいはジルコニアなどのセラミック粉末が用いられる。
また、前記スラリを含む高圧空気の噴射は、断面円形である複数のノズル孔から円錐形状で且つこれらが直線状並んだ配置から噴射するか、あるいは、スリット形状のノズル孔から断面が膜状で且つ直線状に噴射する形態が例示される。後者のスリット形状のノズル孔から噴射する場合には、前記セラミック基板の表面に対する噴射圧を比較的均一化することが可能となる。
更に、前記表面改質工程の前には、複数のグリーンシートを作成する工程、該グリーンシートに貫通したビアホールにビア導体を形成し、且つ該グリーンシートの少なくとも表面に配線パターンおよび位置合わせ用マークを印刷にて形成する工程、複数のグリーンシートを積層し且つ圧着する工程、および得られたグリーンシート積層体を焼成する工程が行われる。
加えて、前記表面改質工程の後には、焼成により得られたセラミック積層体の表面や裏面に形成された導体パターンにメッキを施す工程、前記表面に形成した複数のパッド上にSAWフィルタ、水晶振動子、あるいはICなどの電子部品を実装する工程、および多数個取りの場合には、個々のセラミック基板に個片化する工程が行われる。上記メッキは、電解メッキでも無電解メッキでも良い。
Furthermore, the liquid contains lubricating oil such as coolant in addition to water containing pure water.
In addition, ceramic powder such as alumina, mullite, or zirconia having a relatively small average particle size of, for example, 10 μm or less is used for the abrasive.
Also, the high-pressure air containing the slurry is injected from a plurality of nozzle holes having a circular cross section in a conical shape and these are arranged in a straight line, or from a slit-shaped nozzle hole, the cross section is a film shape. And the form which injects linearly is illustrated. In the case of spraying from the latter slit-shaped nozzle hole, it is possible to make the spraying pressure on the surface of the ceramic substrate relatively uniform.
Furthermore, before the surface modification step, a step of forming a plurality of green sheets, via conductors are formed in via holes penetrating the green sheets, and wiring patterns and alignment marks are formed on at least the surface of the green sheets. Are formed by printing, a step of laminating and pressure-bonding a plurality of green sheets, and a step of firing the obtained green sheet laminate.
In addition, after the surface modification step, a step of plating the conductive pattern formed on the front and back surfaces of the ceramic laminate obtained by firing, a SAW filter, a crystal on a plurality of pads formed on the surface In the case of mounting a vibrator or an electronic component such as an IC, and in the case of taking a large number of pieces, a step of dividing into individual ceramic substrates is performed. The plating may be electrolytic plating or electroless plating.

また、本発明には、前記表面改質工程は、前記マークの表面およびセラミック部の表面に浮き出たガラスを除去し、または低減するか、あるいは該ガラスを変形させるものである、セラミック基板の製造方法(請求項2)も含まれる。
これによれば、前記位置合わせマークの表面およびその周辺のセラミック部の表面に浮き出たガラスを除去するか、あるいは撮像された画像の2値化が可能な程度に上記ガラスを薄く低減するか、該ガラスの表層側の表面粗さなどを変更できる。従って、前記マークおよびセラミック部の表面ごとにおけるガラスの浮き出しの程度に応じて、最適な表面改質を行うことができる。
尚、前記表面改質工程は、主に多数個取り用のセラミック基板の集合体に対して行うほか、単一のセラミック基板に対して行うことも可能である。
According to the present invention, in the manufacturing of a ceramic substrate, the surface modification step removes or reduces the glass raised on the surface of the mark and the surface of the ceramic portion, or deforms the glass. A method (claim 2) is also included.
According to this, whether to remove the glass raised on the surface of the alignment mark and the surface of the surrounding ceramic part, or reduce the glass thin enough to binarize the captured image, The surface roughness on the surface layer side of the glass can be changed. Therefore, the optimum surface modification can be performed according to the degree of the glass raised on the surface of each of the mark and the ceramic portion.
The surface modification step can be performed mainly on a single ceramic substrate as well as on an assembly of multiple ceramic substrates.

本発明を適用した実施例および比較例の多数個取り用のセラミック基板(集合体)を示す平面図。The top view which shows the ceramic substrate (aggregate) for multi-piece taking of the Example and comparative example to which this invention is applied. 本発明が適用される異なる形態のセラミック基板を示す平面図。The top view which shows the ceramic substrate of a different form to which this invention is applied.

以下において、本発明を実施するための形態について説明する。
(グリーンシートの作成工程)
予め、約50重量部のアルミナ粉末と、約50重量部のガラス粉末とを混合したものに対し、溶剤およびバインダ樹脂を適量ずつ配合して混練し、得られたセラミックスラリをドクターブレード法によってシート状に薄く引き延ばし、最後に乾燥することによって、多数個取り用である比較的大きい複数枚のグリーンシート(図示せず)を作成した。
尚、上記ガラス粉末は、ホウケイ酸系ガラスからなり、上記溶剤は、例えば、トルエン、エタノール、あるいはキシレンの何れかを用いた。
Hereinafter, modes for carrying out the present invention will be described.
(Green sheet creation process)
A mixture of about 50 parts by weight of alumina powder and about 50 parts by weight of glass powder is mixed and kneaded with appropriate amounts of solvent and binder resin, and the resulting ceramic slurry is made into a sheet by a doctor blade method. A plurality of relatively large green sheets (not shown) for taking a large number of pieces were prepared by thinly stretching the film and drying it at the end.
The glass powder is made of borosilicate glass, and the solvent is, for example, toluene, ethanol, or xylene.

(導体および位置合わせマークの形成工程)
次に、前記複数枚のグリーンシートにおける所定の位置に、パンチおよび受け型を用いた打ち抜き加工を行って得られた複数のビアホールに対し、Ag粉末を含む導電性ペーストを負圧を利用して充填することで、ビアホールごとの内側にビア導体(導体)を形成した。更に、上記グリーンシートの表面および裏面における少なくとも一方にマスキングをした上で、上記同様の導電性ペーストを、所定パターンに倣って印刷することにより、パッドや外部接続端子を含む表面配線(導体)、内部配線(導体)、および位置合わせマークを形成した。
尚、上記表面配線や内部配線は、縦横に隣接して位置する複数のセラミック基板となる製品領域に形成され、上記位置合わせマークは、かかる製品領域の外側に位置する耳部(捨て代)における四隅のコーナ付近ごとに形成した。
(Process for forming conductors and alignment marks)
Next, a conductive paste containing Ag powder is applied to a plurality of via holes obtained by punching using a punch and a receiving die at predetermined positions in the plurality of green sheets using negative pressure. By filling, a via conductor (conductor) was formed inside each via hole. Furthermore, after masking at least one of the front surface and the back surface of the green sheet, the same conductive paste as described above is printed in accordance with a predetermined pattern, so that the surface wiring (conductor) including pads and external connection terminals, Internal wiring (conductor) and alignment marks were formed.
The surface wiring and the internal wiring are formed in a product region to be a plurality of ceramic substrates adjacent to each other in the vertical and horizontal directions, and the alignment mark is in an ear portion (discard allowance) located outside the product region. It was formed around each corner of the four corners.

(グリーンシート積層体の形成工程)
次いで、前記グリーンシートを積層し且つこれらの厚み方向に沿って圧着することにより、グリーンシート積層体を形成した。この際、製品領域におけるセラミック基板部分では、表面配線と内部配線とがビア導体を介して互いに導通可能とされた。
(Green sheet laminate formation process)
Next, the green sheets were laminated and pressed together in the thickness direction to form a green sheet laminate. At this time, in the ceramic substrate portion in the product region, the surface wiring and the internal wiring can be electrically connected to each other through the via conductor.

(グリーンシート積層体の焼成工程)
引き続いて、得られた上記グリーンシート積層体を焼成炉(図示せず)に挿入し、300〜400℃に加熱して、バインダ樹脂を分解もしくは燃焼させる脱バインダ処理を行った後、800〜1000℃に加熱して保持する焼成工程を行った。その結果、図1で例示するように、表面2における境界8により区分された製品領域3内のセラミック基板部分4ごとに複数のパッド(表面配線)7や内部配線(図示せず)が同時に焼成され、耳部6の四隅に4個の位置合わせマーク8が同時に焼成されたセラミック積層体(セラミック基板集合体)1が得られた。
また、上記焼成に伴って、該セラミック積層体1におけるセラミック部sの表面および裏面、更には、表面配線7や位置合わせマーク8の表面や該マーク周辺のセラミック部sの表面には、部分的にガラス(ガラスフリット)が浮き出ることがある。このうち、表面配線7や位置合わせマーク8の表面に浮き出たガラスは、前記アルミナとガラスとを主成分とする本セラミック積層体(セラミック基板)1に対する上記マークの密着性を高めるため、前記導電性ペーストに含まれていたガラスである。
(Green sheet laminate firing process)
Subsequently, the obtained green sheet laminate is inserted into a firing furnace (not shown), heated to 300 to 400 ° C., and subjected to a binder removal process for decomposing or burning the binder resin, and then 800 to 1000. The baking process which heats and hold | maintains at ° C was performed. As a result, as illustrated in FIG. 1, a plurality of pads (surface wiring) 7 and internal wiring (not shown) are simultaneously fired for each ceramic substrate portion 4 in the product region 3 divided by the boundary 8 on the surface 2. As a result, a ceramic laminate (ceramic substrate aggregate) 1 in which four alignment marks 8 were simultaneously fired at the four corners of the ear 6 was obtained.
Further, along with the firing, the surface and back surface of the ceramic portion s in the ceramic laminate 1, and further, the surface of the surface wiring 7 and the alignment mark 8 and the surface of the ceramic portion s around the mark are partially applied. In some cases, glass (glass frit) may come out. Among these, the glass raised on the surface of the surface wiring 7 and the alignment mark 8 increases the adhesion of the mark to the ceramic laminate (ceramic substrate) 1 mainly composed of the alumina and glass. Glass contained in the adhesive paste.

(セラミック積層体の表面改質工程)
更に、前記セラミック積層体1において、耳部6の各コーナ付近ごとに位置合わせマーク8が形成され、且つ製品領域3のセラミック基板部分4ごとに表面配線7が形成された表面(上記マーク8の表面とその周辺に位置するセラミック部sの表面とを含む)2に対し、水(液体)およびアルミナ粒子(研磨材)からなるスラリを高圧(圧縮)エアと共に噴射した。上記アルミナ粒子は、高圧エアが併用されているため、平均粒径が10μm以下の比較的微細で且つ均一なものを使用することができた。この際、上記スラリと高圧エアとの混合物は、断面が円形である複数のノズル孔を送り方向と直角にして直線状に並べるか、あるいは断面がスリット状である単一のノズル孔から、上記表面2に対して噴射された。
(Surface modification process of ceramic laminate)
Further, in the ceramic laminate 1, a surface (position of the mark 8) is formed in which the alignment mark 8 is formed near each corner of the ear 6 and the surface wiring 7 is formed for each ceramic substrate portion 4 in the product region 3. A slurry made of water (liquid) and alumina particles (abrasive) was sprayed along with high-pressure (compressed) air onto the surface 2 including the surface and the surface of the ceramic portion s located in the vicinity thereof. Since the high-pressure air is used in combination with the above alumina particles, relatively fine and uniform particles having an average particle diameter of 10 μm or less could be used. At this time, the mixture of the slurry and the high-pressure air is formed by arranging a plurality of nozzle holes having a circular cross section in a straight line at right angles to the feed direction, or from a single nozzle hole having a slit cross section. Sprayed against surface 2.

尚、断面が円形のノズル孔の場合、該ノズル孔を有する複数のノズルを送り方向と直角方向に沿って直線状にして走査した。一方、断面がスリット状のノズル孔の場合、該ノズル孔を有する単一の細長いノズルを幅方向に沿って走査した。
その結果、上記マーク8が形成された耳部6と、該耳部6に囲まれた製品領域3とからなる前記セラミック積層体1の表面2に浮き出ていたガラスを、ほぼ全量が除去できたか、または比較的均一な厚みに薄く低減できたか、当該ガラスにおける表層側を緩やかな凹凸面などに変形したか、あるいは該ガラス部を変形する、いわゆる表面改質を行うことができた。
そのため、後述するように、前記マーク8付近を撮像して2値化処理した後で、例えば、該マーク8の表面とその周辺のセラミック部sの表面との明度差に基づく、これらの位置情報の認識を確実に行うことが可能となった。
尚、以上のような表面改質工程は、前記セラミック積層体(セラミック基板)1の裏面側に対して行うことも可能である。
In the case of a nozzle hole having a circular cross section, a plurality of nozzles having the nozzle hole were scanned in a straight line along the direction perpendicular to the feed direction. On the other hand, in the case of a nozzle hole having a slit cross section, a single elongated nozzle having the nozzle hole was scanned along the width direction.
As a result, almost all of the glass that had been raised on the surface 2 of the ceramic laminate 1 composed of the ears 6 on which the marks 8 were formed and the product region 3 surrounded by the ears 6 could be removed. Alternatively, it could be reduced to a relatively uniform thickness, the surface layer side of the glass was deformed to a gentle uneven surface, or so-called surface modification could be performed to deform the glass part.
Therefore, as described later, after the vicinity of the mark 8 is imaged and binarized, the positional information based on, for example, the brightness difference between the surface of the mark 8 and the surface of the surrounding ceramic portion s. It became possible to recognize this reliably.
The surface modification step as described above can also be performed on the back side of the ceramic laminate (ceramic substrate) 1.

(メッキ工程)
次に、前記表面改質の後で、前記セラミック積層体1に対して無電解Niメッキを行うことにより、前記表面配線や位置合わせマークの表面に、厚みが1〜8μmのNiメッキ膜を被覆した。引き続いて、無電解Auメッキを行うことにより、上記Niメッキ膜の上に更に厚みが約0.05〜1μm程度のAuメッキ膜を被覆した。この場合、前記表面改質工程で、前記マーク8の表面からガラスがほぼ全量除去されていた場合には、上記Niメッキ膜およびAuメッキ膜を所定の厚みで被覆することができた。
(Plating process)
Next, after the surface modification, the ceramic laminate 1 is subjected to electroless Ni plating to cover the surface of the surface wiring and the alignment mark with a Ni plating film having a thickness of 1 to 8 μm. did. Subsequently, electroless Au plating was performed to further cover the Ni plating film with an Au plating film having a thickness of about 0.05 to 1 μm. In this case, when almost all the glass was removed from the surface of the mark 8 in the surface modification step, the Ni plating film and the Au plating film could be coated with a predetermined thickness.

(電子部品の実装工程)
次いで、前記NiおよびAuメッキ膜が被覆された表面配線7の上に、図示ないハンダを介してSAWフィルタあるいはICチップなどの電子部品を実装した。
この際、前記耳部6の各コーナ付近ごとに位置し且つ前記Auメッキ膜などが緻密に被覆された位置合わせマーク8とその周辺のセラミック部sとを、CCDカメラで撮像し、得られた画像を2値化処理することにより、製品領域3におけるセラミック基板部分4ごとの表面に位置するパッドなどの上記表面配線7の位置を正確に認識することができた。その結果、前記ハンダの配設およびSAWフィルタなどの電子部品の実装を精度良く行うことができた。
(Electronic component mounting process)
Next, an electronic component such as a SAW filter or an IC chip was mounted on the surface wiring 7 coated with the Ni and Au plating films via solder (not shown).
At this time, the alignment mark 8 located near each corner of the ear portion 6 and densely coated with the Au plating film or the like and the surrounding ceramic portion s were imaged with a CCD camera and obtained. By binarizing the image, it was possible to accurately recognize the position of the surface wiring 7 such as a pad positioned on the surface of each ceramic substrate portion 4 in the product region 3. As a result, it was possible to accurately arrange the solder and mount electronic components such as a SAW filter.

(個片化工程)
そして、前記電子部品が実装された製品領域3内のセラミック基板部分4ごとに、これらの境界5に沿って分割する切断加工、あるいは前記境界5に沿って表面および裏面の少なくとも一方に予め形成されていた分割溝に沿って剪断加工することによって、複数個のセラミック基板4に分割された。
以上の各工程によって、電子部品が表面に実装されたセラミック基板4を複数個同時に得ることができた。
(Separation process)
Each ceramic substrate portion 4 in the product region 3 on which the electronic component is mounted is preliminarily formed on at least one of the front surface and the back surface along the boundary 5 by cutting along these boundaries 5. The plurality of ceramic substrates 4 were divided by shearing along the divided grooves.
Through the above steps, a plurality of ceramic substrates 4 having electronic components mounted on the surface could be obtained simultaneously.

以下において、本発明の具体的な実施例を比較例と対比して説明する。
前述したグリーンシートの作成工程、導体および位置合わせマークの形成工程、グリーンシート積層体の形成工程、およびグリーンシート積層体の焼成工程を経ることによって、図1の平面図に示すように、多数個取り用のセラミック積層体(セラミック基板集合体)1を20個製作した。
かかるセラミック積層体1は、重量部でほぼ1:1のアルミナとガラスとからなり、厚みが1mmであり且つ一辺が95mmの正方形からなる表面2および裏面(図示せず)を有し、図1中の破線で示す境界5に囲まれた複数のセラミック基板部分4を縦横に隣接して有する製品領域3と、その周囲を囲む四角枠形の耳部6とを備えている。尚、図1中の符号sは、表面2のセラミック部を示す。
上記セラミック基板部分4は、追って境界5に沿って分割された際に、製品のセラミック基板となるものであり、その表面の中央部には、Agとガラスとからなる複数のパッド(表面配線)7が形成されている。
また、図1に示すように、耳部6の各コーナ付近には、Agとガラスとからなり、平面視が直径600μmの円形を呈する複数の位置合わせマーク8が合計4個形成されている。
In the following, specific examples of the present invention will be described in comparison with comparative examples.
As shown in the plan view of FIG. 1, a large number of green sheets are formed through the green sheet forming process, the conductor and alignment mark forming process, the green sheet laminated body forming process, and the green sheet laminated body firing process. Twenty ceramic laminates (ceramic substrate aggregates) 1 were prepared.
The ceramic laminate 1 is made of alumina and glass of approximately 1: 1 by weight, has a front surface 2 and a back surface (not shown) made of a square having a thickness of 1 mm and a side of 95 mm. A product region 3 having a plurality of ceramic substrate portions 4 surrounded by a boundary 5 indicated by a broken line in the vertical and horizontal directions and a square frame-shaped ear portion 6 surrounding the periphery of the product region 3 are provided. In addition, the symbol s in FIG.
When the ceramic substrate portion 4 is divided along the boundary 5 later, the ceramic substrate portion 4 becomes a ceramic substrate of the product, and a plurality of pads (surface wiring) made of Ag and glass are provided at the center of the surface. 7 is formed.
As shown in FIG. 1, a total of four alignment marks 8 made of Ag and glass and exhibiting a circular shape having a diameter of 600 μm are formed in the vicinity of each corner of the ear portion 6.

以上のようなセラミック基板(4)の集合体である20個のセラミック積層体1を、10個ずつの2グループに分け、一方のグループに対しては、表1の左側に示す本発明の実施例による表面改質工程を施した。更に、他方のグループに対しては、表1の右側に示す比較例による表面改質工程を施した。この際、実施例では、幅が1mmのスリット孔を有する細長いノズルを用いて、ブラスト媒体とエアとを噴射した。一方、比較例では、内径が1〜3.5mmの楕円形孔を有するノズルを複数個並列に用いて、研磨材と水とを噴射した。
前記表面改質およびメッキ工程を実施したセラミック積層体1において、各グループのセラミック積層体1ごとにおける4つの位置合わせマーク8と、これらの周辺に位置するセラミック部sとをCCDカメラにより撮像し、得られた画像を各マーク8とこれに隣接するセラミック部sとの明度差を基準とした2値化処理を行った。かかる2値化処理後における各位置合わせマーク8の読み取りが4個全てについて行えたか否かを調べ、それらの結果についても表1中に示した。
The 20 ceramic laminates 1 that are the aggregates of the ceramic substrates (4) as described above are divided into two groups of 10 pieces, and the implementation of the present invention shown on the left side of Table 1 is performed for one group. A surface modification step according to the example was applied. Furthermore, the surface modification process by the comparative example shown on the right side of Table 1 was applied to the other group. At this time, in the example, the blast medium and air were ejected using an elongated nozzle having a slit hole having a width of 1 mm. On the other hand, in the comparative example, a plurality of nozzles having an elliptical hole with an inner diameter of 1 to 3.5 mm were used in parallel to inject abrasive and water.
In the ceramic laminate 1 subjected to the surface modification and plating step, the four alignment marks 8 for each ceramic laminate 1 in each group and the ceramic portion s located around these are imaged with a CCD camera, The obtained image was subjected to a binarization process based on a difference in brightness between each mark 8 and the ceramic portion s adjacent thereto. It was examined whether or not all four alignment marks 8 could be read after the binarization process, and the results are also shown in Table 1.

Figure 2013021195
尚、表1中に示す研磨材の濃度は、実施例および比較例共に、アルミナと水との合計体積に対するアルミナの体積率を示す。
Figure 2013021195
In addition, the density | concentration of the abrasive | polishing material shown in Table 1 shows the volume ratio of the alumina with respect to the total volume of an alumina and water with an Example and a comparative example.

表1によれば、実施例の表面改質工程を施されたセラミック積層体1は、10個における4箇所ずつの位置合わせマーク8全ての位置の認識を行うことができた。一方、比較例の表面改質工程を施されたセラミック積層体1は、10個における4個ずつの位置合わせマーク8全ての位置の認識を行うことができなかった。
以上のような結果は、実施例の表面改質工程では、水と比較的微細なアルミナ粒子(研磨材)とからなるスラリを、高圧エアと共に前記位置合わせマーク8付近の表面2に対して噴射したので、比較的均一な衝突圧力を上記マーク8やその付近のセラミック部sの表面に浮き出ていたガラスが受ける結果、該ガラスを除去あるいは変形するなどの表面改質されたことにより、2値化処理後において全てのマーク8の位置の認識を行うことができた、と推測される。更に、スリット状のノズル孔から上記スラリと高圧エアとを噴射したことも、前記結果に貢献したもの、と推測される。
一方、比較例の表面改質工程では、比較的大径のアルミナ粒子を高圧水と共に前記位置合わせマーク8付近の表面2に対して噴射したので、楕円形のノズル孔を複数個用いたことも相まって、大きなバラツキの衝突圧力を上記マーク8やその付近のセラミック部sの表面に浮き出ていたガラスが受けて、該ガラスを除去ないし変形させる表面改質がランダムとなった結果、2値化処理の後において全てのセラミック積層体1において、少なくとも1箇所の前記マーク8の位置を認識することができなかった、ものと推測される。
According to Table 1, the ceramic laminate 1 subjected to the surface modification process of the example could recognize the positions of all the four alignment marks 8 in ten. On the other hand, the ceramic laminate 1 subjected to the surface modification process of the comparative example could not recognize the positions of all four alignment marks 8 in ten.
As a result as described above, in the surface modification step of the embodiment, a slurry made of water and relatively fine alumina particles (abrasive) is sprayed onto the surface 2 in the vicinity of the alignment mark 8 together with high-pressure air. Therefore, as a result of the glass that has been raised on the surface of the mark 8 and the ceramic portion s near the mark 8 being subjected to a relatively uniform collision pressure, the surface is modified such that the glass is removed or deformed. It is presumed that the positions of all the marks 8 could be recognized after the conversion processing. Further, it is presumed that the above-described slurry and high-pressure air were ejected from the slit-like nozzle holes, which contributed to the above results.
On the other hand, in the surface modification process of the comparative example, relatively large-diameter alumina particles were sprayed onto the surface 2 near the alignment mark 8 together with high-pressure water, so that a plurality of elliptical nozzle holes were used. Combined with this, the glass that floated on the surface of the mark 8 and the ceramic part s in the vicinity thereof received a large variation of collision pressure, and the surface modification that removes or deforms the glass was randomized. Thereafter, in all the ceramic laminates 1, it is presumed that the positions of at least one mark 8 could not be recognized.

図2は、本発明が適用される単一のセラミック基板10を示す平面図である。
該セラミック基板10は、ガラスを約50重量部含むアルミナなどのセラミックからなり、図2に示すように、平面視が正方形の表面12および裏面(図示せず)を有し、該表面12には、複数のパッド13が格子状に配置されている。このうち、四隅のパッド14は、位置合わせマークを兼ねるものである。
尚、セラミック基板10は、複数のセラミック層間に内部配線(図示せず)を有し、各セラミック層には、上記パッド13と内部配線とを接続するビア導体(図示せず)が形成されている。
以上のようなセラミック基板10についても、本発明による前記表面改質処理を施すことで、4個の位置合わせマークを兼ねるパッド14と、その周辺のセラミック部sとを、例えばCCDカメラで撮像し、得られた画像を2値化処理した後において、明度差などを基準として上記マークを兼ねるパッド14の位置を確実に認識することができる。
FIG. 2 is a plan view showing a single ceramic substrate 10 to which the present invention is applied.
The ceramic substrate 10 is made of ceramic such as alumina containing about 50 parts by weight of glass, and has a surface 12 and a back surface (not shown) that are square in plan view, as shown in FIG. A plurality of pads 13 are arranged in a grid pattern. Of these, the four corner pads 14 also serve as alignment marks.
The ceramic substrate 10 has internal wiring (not shown) between a plurality of ceramic layers, and via conductors (not shown) connecting the pads 13 and the internal wiring are formed in each ceramic layer. Yes.
Also for the ceramic substrate 10 as described above, by performing the surface modification process according to the present invention, the pad 14 that also serves as four alignment marks and the surrounding ceramic portion s are imaged by, for example, a CCD camera. After the obtained image is binarized, the position of the pad 14 that also serves as the mark can be reliably recognized based on the difference in brightness.

本発明は、前述した形態に限定されるものではない。
例えば、本発明の対象となるセラミック基板は、低温焼成セラミックからなるものに限らず、ガラスを含み焼成時に該ガラスが表面に浮き出し得るものであれば、例えば高温焼成セラミックからなるものであっても良い。
また、位置合わせマークは、多数個取り用のセラミック基板集合体における個々のセラミック基板部分ごとの表面における一部のパッドを兼用させた形態とすることもできる。
更に、位置合わせマークは、単一のセラミック基板の表面、あるいは多数個取り用のセラミック基板集合体の表面において、少なくとも2個、あるいは3個を形成した形態としたり、あるいは5個以上を適所に形成した形態とした形態としも良い。
The present invention is not limited to the form described above.
For example, the ceramic substrate that is the subject of the present invention is not limited to one made of a low-temperature fired ceramic, and may be made of, for example, a high-temperature fired ceramic as long as it contains glass and can be raised on the surface during firing. good.
Further, the alignment mark may be in a form in which a part of the pads on the surface of each ceramic substrate portion in the multi-piece ceramic substrate assembly is also used.
Furthermore, the alignment marks may be formed in a form in which at least two or three are formed on the surface of a single ceramic substrate or the surface of a ceramic substrate assembly for taking multiple pieces, or five or more are placed in place. It is good also as the form made into the formed form.

本発明によれば、製造過程で基板の表面に浮き出たガラスによって、該表面に予め形成した位置合わせマークの2値化処理後における位置の認識が支障なく行えるセラミック基板の製造方法を確実に提供することが可能となる。   According to the present invention, there is provided a method for manufacturing a ceramic substrate which can reliably recognize the position of a registration mark formed on the surface after binarization processing without any trouble by using the glass which is raised on the surface of the substrate in the manufacturing process. It becomes possible to do.

1,10…セラミック積層体(セラミック基板集合体)/セラミック基板
2,12…表面
8,14…位置合わせマーク
s…………セラミック部
DESCRIPTION OF SYMBOLS 1,10 ... Ceramic laminated body (ceramic substrate aggregate) / Ceramic substrate 2,12 ... Surface 8, 14 ... Alignment mark s ............ Ceramic part

Claims (2)

ガラスを含むセラミックからなり、且つ表面および裏面を有し、かかる表面および裏面の少なくとも一方に位置合わせマークが形成されたセラミック基板において、上記位置合わせマークおよび該マーク周辺のセラミック部に対し、液体および研磨材からなるスラリを高圧空気と共に噴射して、上記位置合わせマークの表面と上記セラミック部の表面とを改質する表面改質工程を含む、
ことを特徴とするセラミック基板の製造方法。
In a ceramic substrate made of ceramic containing glass and having a front surface and a back surface, and an alignment mark is formed on at least one of the front surface and the back surface, a liquid and a ceramic portion around the alignment mark and the mark Including a surface modification step of modifying a surface of the alignment mark and a surface of the ceramic part by injecting a slurry made of an abrasive together with high-pressure air.
A method for manufacturing a ceramic substrate.
前記表面改質工程は、前記マークの表面およびセラミック部の表面に浮き出たガラスを除去し、または低減するか、あるいは該ガラスを変形させるものである、
ことを特徴とする請求項1に記載のセラミック基板の製造方法。
The surface modification step is to remove or reduce the glass raised on the surface of the mark and the surface of the ceramic part, or to deform the glass.
The method for producing a ceramic substrate according to claim 1.
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