JP2013004550A - Solare cell module - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a solar cell module capable of surely preventing moisture from intruding into a solar cell as well as improving power generation efficiency.SOLUTION: A solar cell module includes: a substrate; a solar cell element formed by laminating a back surface electrode, a power generation layer for receiving light to generate power and a transparent electrode for transmitting light in this order; a protective layer for protecting the solar cell element; and a resin sealing layer filled between the protective layer and the substrate, where light is taken in from the protective layer side. The solar cell element is arranged such that the solar cell element is covered with a barrier film formed by laminating a plurality of layers of thin films, and the barrier film is formed such that an upper layer thereof covers an underlayer, and an outer peripheral end of each layer has a portion being contact with the substrate, and the barrier layer is covered with the sealing layer and the protective layer.

Description

  The present invention relates to a solar cell module formed by covering a solar cell element in which a back electrode, a power generation layer, and a transparent electrode are laminated in this order on a substrate with a protective film.

  In recent years, there is concern about the depletion of fossil energy resources, and new energy alternatives are being studied. In particular, photovoltaic power generation is attracting attention as a promising energy source. Known solar power generation methods include a crystalline solar cell using single crystal silicon or polycrystalline silicon, and a thin film solar cell using amorphous silicon or the like. Thin film solar cells are attracting attention as low cost because they require less raw materials per unit area.

  The thin-film solar cell module is mainly formed on a glass substrate, a transparent electrode made of a transparent conductive oxide such as ITO, SnO2, and ZnO, a photoelectric conversion layer made of amorphous silicon, and the like, Al, Ag, Cr, etc. It has a solar battery cell composed of a back electrode made of metal. A plurality of solar cells are included on the substrate, and each solar cell is connected and integrated in series or in parallel (see, for example, Patent Document 1).

  This thin-film solar cell module has been studied for improvement in power generation efficiency for many years, and one of its points of view is, for example, prevention of moisture intrusion into solar cells. That is, the solar battery cell has a property of being corroded and deteriorated when exposed to water, and the deterioration of the solar battery cell causes a decrease in power generation efficiency. Therefore, the solar battery cell includes a sealing layer made of a thermosetting resin such as ethylene-vinyl acetate copolymer (EVA), and a protective layer made of a vinyl fluoride resin or a composite film containing a vinyl fluoride resin. Are laminated. Then, the sealing layer is heated and melted to be crosslinked and cured, and sealed by a vacuum laminating method or the like to constitute a solar cell module. With these sealing layer and protective layer, moisture enters the solar cell. It is preventing.

  The solar cell module is installed so that the substrate side is on the light source side such as the sun, so that light passes through the substrate and the transparent electrode and enters the photoelectric conversion layer, and the incident light is converted into electricity. The Therefore, by using a special glass substrate or forming an antireflection film on the substrate, it is devised so that more light is incident on the photoelectric conversion layer, and power generation efficiency is improved.

JP 2003-142720 A

  However, even when the solar cell module is provided with a sealing layer and a protective layer, there is a problem that the prevention of moisture from entering the solar cell is not sufficient. In other words, weather resistance such as water resistance, moisture resistance, and alkali resistance decreases due to light degradation of EVA, and when EVA gradually deteriorates over long-term use, moisture enters from the side of the solar cell module, and the solar cells Exposed to moisture. When the solar battery cell is exposed to moisture, there is a problem that the power generation efficiency is lowered due to deterioration of the solar battery cell.

  In addition, using special glass or forming an antireflection film on the substrate increases the power generation efficiency, but also increases the cost of the solar cell module. Becomes difficult.

  The present invention has been made in view of such a problem, and an object of the present invention is to provide a solar cell module that reliably prevents moisture from entering the solar cells and at the same time increases the power generation efficiency.

  In order to solve the above problems, a solar cell module of the present invention includes a substrate, a back electrode, a power generation layer that receives light to generate power, and a transparent electrode that transmits light, which are stacked in this order on the substrate. A protective layer that protects the solar cell element, and a resin sealing layer that is filled between the protective layer and the substrate, from the protective layer side. A solar cell module that takes in light, wherein the solar cell element is covered with a barrier film formed by laminating a plurality of thin films, and the barrier film is formed so that an upper layer covers a lower layer, and each layer The outer peripheral end portion has a portion in contact with the substrate, and is covered with the sealing layer and the protective layer from above the barrier film.

  According to the solar cell module, since the solar cell is covered with the barrier film, it is possible to suppress the intrusion of moisture as compared with the case without the barrier film. That is, even when the resin sealing film deteriorates due to long-term use and moisture in the air enters, a barrier film is formed by laminating a plurality of layers, and the outer peripheral edge of each layer is a portion in contact with the substrate. Therefore, intrusion of moisture can be prevented in a triple and triple manner at the interface with the substrate where moisture easily enters. Therefore, it is possible to reliably prevent moisture from entering the solar battery cell, and to suppress reduction in power generation efficiency due to deterioration of the solar battery cell due to moisture penetration.

  As a specific mode of the barrier film, the barrier film is formed by depositing an inorganic substance.

  According to this configuration, since each layer of the barrier film is formed of an inorganic material, it is possible to more reliably suppress the intrusion of moisture compared to a case where the barrier film is formed of an organic material such as a resin.

  The barrier film may be formed by chemical vapor deposition.

  According to this configuration, since the adhesion between the barrier film and the substrate is improved, it is possible to prevent moisture from entering through the interface between the substrate and the barrier film, and to more reliably prevent moisture from entering the solar cells. Can be suppressed.

  The barrier film may have a refractive index set between the refractive index of the sealing layer and the refractive index of the transparent electrode.

  According to this configuration, since the refractive index change becomes gentler in the order of the sealing layer, the barrier film, and the transparent electrode layer than in the case without the barrier film, the light incident from the protective layer side is reflected at the boundary of each layer. Can be suppressed. Accordingly, the amount of light that enters from the protective layer side and reaches the photoelectric conversion layer is increased. Therefore, by providing the barrier film, moisture intrusion can be suppressed and power generation efficiency can be improved.

  According to the solar cell module of the present invention, it is possible to reliably prevent moisture from entering the solar cell, and at the same time, increase the power generation efficiency.

It is sectional drawing of the solar cell module of this invention. It is an expanded sectional view of the boundary part of a board | substrate and a photovoltaic cell. It is a figure explaining the manufacturing process of the solar cell module of this invention. It is sectional drawing which shows the structure of a barrier film forming apparatus. It is a top view which shows the structure of a barrier film forming apparatus.

  FIG. 1 shows a cross-sectional view of the solar cell module of the present invention. The solar cell module 1 of the present invention includes a substrate 10, a back electrode 11, a photoelectric conversion layer 12 (power generation layer), a transparent electrode 13, and a barrier film 30. Furthermore, the sealing layer 15, the protective layer 16, and the frame material 17 can also be included. The solar cell module of the present invention generates light by taking in light from the protective layer 16 side. Therefore, the side with the protective layer 16 is called the front surface of the solar cell module 1 and the opposite substrate 10 side is called the back surface.

  The substrate 10 is preferably made mainly of glass. This is because it is transparent so that sunlight can be applied to the photoelectric conversion layer 12. In addition, glass has high weather resistance and does not easily corrode against heat, light, or water. Since the glass can be an optical filter depending on the element to be contained, the glass may selectively pass the wavelength band based on the power generation efficiency of the photoelectric conversion layer 12. Further, an antireflection film on the substrate 10 or a metal layer such as a Cr layer for improving adhesion may be provided near the edge of the substrate 10.

  The back electrode 11 can use a normal conductive metal. Specifically, Al and Ag are preferably used. Since the back electrode 11 is present on the back side of the photoelectric conversion layer 12, transparency is not so required. Therefore, it is possible to select a metal member with good energization efficiency.

  The photoelectric conversion layer 12 is not particularly limited, and either a thin film type or a bulk type may be used. For example, CIGS may be used, and amorphous silicon can be suitably used from the viewpoint of cost, large area manufacturing, energy gap size, and the like. Note that the photoelectric conversion layer 12 is also simply referred to as a power generation element.

  The transparent electrode 13 is formed of a transparent material so that much light is supplied to the photoelectric conversion layer 12. Specifically, FTO (fluorine-containing tin oxide), ITO (tin oxide-containing indium oxide), SnO2 (tin oxide), ZnO (zinc oxide), or the like is preferably used. Thereby, even if it forms on the photoelectric converting layer 12, power generation efficiency is not reduced. In this embodiment, ITO is used as the transparent electrode, and the refractive index of this transparent electrode is approximately 1.9.

  A solar battery cell 20 is formed by the back electrode 11, the photoelectric conversion element 12, and the transparent electrode 13 formed on the substrate 10. A plurality of solar cells 20 may be formed on the substrate 10 and can be connected in series or in parallel by combining the transparent electrode and the back electrode 11 of each solar cell.

  Next, a barrier film 30 made of an inorganic material is formed on the solar battery cell 20 formed on the substrate 10. FIG. 2 shows an enlarged view of the barrier film 30. The barrier film 30 has a portion in contact with the substrate 10. The barrier film 30 is disposed so as to cover the space between the substrate 10 and the back electrode 11. Thereby, the penetration | invasion of the water | moisture content from the side surface direction of the photovoltaic cell 20 is prevented. It is more preferable if it is formed so as to cover the entire back surface of the solar battery cell 20 and the substrate 10. This is because it is possible to prevent moisture from entering from the back side.

  The barrier film 30 is formed of a plurality of layers. In this embodiment, the barrier film 30 is formed by alternately laminating two types of layers, a first thin film layer 31 and a second thin film layer 32. Specifically, of the first thin film layer 31 and the second thin film layer 32, the upper layer is laminated so as to cover the lower layer. The outer peripheral edge of each of the first thin film layer 31 and the second thin film layer 32 has a portion in contact with the substrate 10. That is, since the outer peripheral end portions of all the layers are in contact with the substrate 10, moisture entering from the interface between the barrier film 30 and the substrate 10 can be prevented over several layers. Thereby, it can suppress that a water | moisture content penetrate | invades even to the solar cell element 20. FIG.

  Further, the two types of layers, the first thin film layer 31 and the second thin film layer 32, need to have different densities. The first thin film layer 31 that is in direct contact with the substrate 10 or the solar battery cell 20 is formed of an inorganic layer having a low density, and the second thin film layer 32 is formed thereon with an inorganic material having a high density. Since the inorganic layer having a low density has a lower stress on the base than the inorganic layer having a high density, it is possible to avoid peeling of the back electrode 11, the electrode of the transparent electrode 13, the photoelectric conversion layer 12, and the like serving as the base from the substrate 10. It is.

  For example, the inorganic layer (first thin film layer 31) having a low density can use a Si compound film such as SiCH3 in which CH4 is contained in a Si film that can be formed using an organic silicon raw material. In addition, the inorganic layer (second thin film layer 32) having a high density can use SiO2. The SiO 2 film is dense and can effectively prevent moisture from entering. In FIG. 2, it is the second thin film layer 32. The density of the inorganic substance that can effectively prevent moisture from entering is preferably 2 g / cm 3 or more. Therefore, if the density is 2 g / cm 3 or more, an inorganic substance other than SiO 2 may be used.

  The barrier film 30 is set so that the refractive index is between the refractive index of the sealing layer 15 and the refractive index of the transparent electrode 13. In this embodiment, EVA (ethylene-vinyl acetate copolymer) is used as the sealing layer 15, and the refractive index of the sealing layer 15 is about 1.46. Further, ITO is used as the transparent electrode 13, and the refractive index of the transparent electrode 13 is about 1.9. Therefore, the refractive index of the barrier film 30 is set to 1.46 to 1.9.

  In the present embodiment, a Si compound film such as SiCH 3 is used for the first thin film layer 31 of the barrier film 30, and a Si oxide such as SiO 2 is used for the second thin film layer 32. By setting the refractive index of the first thin film layer 31 to 1.65 and the refractive index of the second thin film layer 32 to 1.46, the refractive index of the barrier film 30 is adjusted to 1.5. ing. Here, the barrier film 30 is adjusted so that the refractive index becomes 1.65 from the amount of H contained in the Si compound film of the first thin film layer 31. That is, the refractive index decreases as the amount of H increases, and conversely, the refractive index increases as the amount of H decreases. By adjusting the amount of H, the refractive index is adjusted to 1.46. On the other hand, the refractive index of the second thin film layer 32 is adjusted to 1.46 by using high-purity SiO2. That is, similar to the first thin film layer 31, the refractive index of SiO 2 can be adjusted by adjusting the amount of H at the time of forming the SiO 2 film, but the purity of SiO 2 affects the barrier property. Then, high-purity SiO2 is used and its refractive index is set to 1.46. As described above, the refractive index of EVA and the refractive index of ITO also change depending on the additive and the like. Can be adjusted. The refractive index of the barrier film 30 is an actual measurement value when the barrier film 30 is formed by laminating a plurality of first thin film layers 31 and second thin film layers.

  Thereby, the light incident from the protective layer 16 passes through the sealing layer 15, the barrier film 30, and the transparent electrode 13 in this order and reaches the photoelectric conversion layer 12, but there is no barrier film 30 by providing the barrier film 30. Since the change in the refractive index is gentle compared to the above, the amount of incident light reflected at the interface of each layer is small. Therefore, by providing such a barrier film 30, the amount of light reaching the photoelectric conversion layer 12 is increased as compared with the case where the barrier film 30 is not provided, and the power generation efficiency can be improved.

  In addition to setting the refractive index of the barrier film 30 between the refractive index of the sealing layer 15 (EVA) and the transparent electrode 13 (ITO), the first thin film layer 31 and the second thin film layer 32 of the barrier film 30 are used. It is preferable to use the first thin film layer 31 having a refractive index close to EVA on the uppermost surface (EVA side) and the first thin film layer 31 having a refractive index close to the transparent electrode 13 on the lowermost surface. With this configuration, reflection of light incident on the second thin film layer 32 from the sealing layer 15 is suppressed and reflection of light incident on the transparent electrode 13 from the first thin film layer 31 is suppressed. The amount of light that reaches can be increased, and the power generation efficiency can be improved.

  There are no particular limitations on the type of inorganic layer constituting the barrier film 30. It is sufficient that there are at least one layer of at least two layers having different densities and having a density of 2 g / cm 3 or more. Therefore, as shown in FIG. 2, the barrier film 30 may be configured by combining three or more inorganic layers.

  Moreover, the structure of the thickness of each inorganic substance layer is not specifically limited. The thickness of the inorganic layer having a low density may be increased near the base side with respect to the barrier film 30, and the thickness of the inorganic layer having a high density may be increased according to the thickness of the barrier film 30. Moreover, the boundary of each inorganic layer may not be clear. That is, the barrier film 30 may be configured by repeating a configuration that continuously changes from a low-density inorganic layer to a high-density inorganic layer.

  The number of times of lamination is not particularly limited. However, if the number of times of lamination is large, the number of man-hours increases, so that the tact time for producing one solar cell module becomes long. For example, in FIG. 2, the second thin film layer 32 is a low density inorganic layer, and the third thin film layer 33 is a high density inorganic layer. Although the second thin film layer 32 is shown for two layers and the third thin film layer 33 is shown for one layer, these may be formed of a multilayer film laminated more times.

  The manufacturing method of the barrier film 30 is not particularly limited. However, in the sputtering method or the ECR (Electron Cyclotron Resonance) CVD (Chemical Vapor Deposition) method, the deposition target is continuously plasma. Therefore, a method such as a thermal CVD method, a photo CVD method, or a plasma CVD method is preferably used. Here, when the barrier film 30 is formed by a chemical vapor deposition method, the bonding force between the outer peripheral end of the barrier film 30 and the substrate 10 becomes larger than that of the sputtering method or the like, and the barrier film 30 and the substrate 10 It is possible to sufficiently prevent moisture from entering from the interface.

  Returning to FIG. 1, the sealing layer 15 and the protective layer 16 can be formed after the barrier film 30 is formed. The sealing layer 15 may use conventionally used EVA. The protective layer 16 can also be made of a conventionally used composite film made of a vinyl fluoride resin or a vinyl fluoride resin / Al / vinyl fluoride resin, or glass. Moreover, the frame 17 is fixed to the side surface of the solar cell module 1 using a seal.

  In FIG. 3, the manufacturing process of the whole solar cell module in this invention is shown simply. FIG. 3A shows a state in which the back electrode 11, the power generation element 12, and the transparent electrode 13 are formed on one substrate 10. A plurality of power generating elements 12 are formed at the same time, and are coupled in series or in parallel by the pattern of the back electrode 11 and the transparent electrode 13. Here, the electrode terminations 22 and 23 of the solar cell module 1 are collected on both sides of the module. In addition, the electrode termination | terminus may be provided in places other than the both sides of a module.

  FIG. 3B shows a state where the lead terminals 24 and 25 are provided at the two electrode terminations 22 and 23. The lead terminals 24 and 25 are portions that become the positive electrode and the negative electrode of the solar cell module 1. The material used is not particularly limited, and a metal or alloy material that is not easily corroded and has high conductivity can be preferably used.

  FIG. 3C shows a resin for reducing the step between the extraction terminals 24 and 25 and the substrate 10 or the transparent electrode 13 and for eliminating the gap at the position where the extraction terminals 24 and 25 and the electrode terminations 22 and 23 are joined. A state in which the covering molding portion 28 covered with is disposed is shown. The reason why the resin is coated with the resin is that the CVD method has few wraparounds, so that a large step cannot be covered with the continuous film.

  FIG. 3D shows a state in which the barrier film 30 is formed from the top of the covering molding portion 28. The purpose of the barrier film 30 is to prevent moisture from entering from the side surface of the substrate 10, so that the barrier film 30 is disposed so as to integrally cover the substrate 10, the coating forming portion 28, and the transparent electrode 13. Accordingly, it is preferable to cover the entire region including these with the barrier film 30, but the barrier film 30 may be disposed only at the boundary portion between the substrate 10 and the substrate 10 where water easily enters. In other words, the barrier film 30 may not be disposed in the central portion of the solar cell module 1.

  FIG. 3E shows a state in which EVA is formed as the sealing layer 15 on the barrier film 30 and a protective film is formed as the protective layer 16 thereon. After covering with EVA and a protective film, the side surface is protected by the frame 17.

  Next, examples in which the solar cell of the present invention was specifically manufactured will be described. A normal glass substrate 10 was used as the substrate 10. The size was 400 mm in length, 300 mm in width, and the thickness was 3.5 mm.

  On the glass substrate 10, the back electrode 11 which laminated ZnO and Ag was formed in the predetermined shape. An amorphous silicon photoelectric conversion layer 12 having a pin junction was formed on the back electrode 11 so as to be partially connected. Further, a transparent electrode 13 made of ITO having a thickness of 1 μm was formed in a predetermined shape on the photoelectric conversion layer 12, and a solar battery cell was formed on the substrate. Next, a barrier film 30 was formed on the substrate 10.

  The barrier film 30 was produced with a barrier film forming apparatus. FIG. 4 (side sectional view) and FIG. 5 (plan view) show the configuration of the barrier film forming apparatus. The barrier film forming apparatus 50 includes a vacuum chamber serving as a film forming chamber 51, an exhaust system 52 including a rotary pump and a turbo molecular pump, a high frequency power source 66 for generating plasma, and a flange for introducing various gases.

  The film forming chamber 51 is connected to an exhaust system 52, an HMDS supply tank 53, an O 2 supply tank 55, an H 2 supply tank 56, and an Ar supply tank 57. The exhaust system 52 is connected to the film forming chamber 51 via a flow rate control valve 58, the HMDS supply tank 53 is connected via a flow rate control valve 59, and the H2 supply tank 56 and the Ar supply tank 57 are connected to the flow rate control valve 62. The O 2 supply tank 55 is connected via a flow rate control valve 61. A loop antenna 63 is provided inside the film forming chamber 51.

  The loop antenna 63 is a means for generating plasma and includes an insulating tube 64 and a conductive electrode 65. Two insulating tubes 64 are arranged in parallel in the film forming chamber 51 so as to face each other. The conductive electrode 65 is inserted into the two insulating tubes 64, and penetrates through the sidewalls facing each other in the film forming chamber 51 so as to have a substantially U shape in plan view as shown in FIG. Connected to a power supply 66. The frequency of the high frequency power supply 66 is preferably 13.56 MHz. The plasma to be used may be CCP, ICP, barrier discharge, hollow discharge, or the like.

  The substrate 10 on which the solar cells 20 are formed is arranged on the substrate fixing base 68 so that the solar cells face the loop antenna 63 side, and then the exhaust system 52 reduces the internal pressure of the film forming chamber 51 to 9.9. The pressure was reduced until the pressure was 10 −5 Pa or less.

  After the pressure reduction in the film forming chamber 51 was completed, a mixed gas of H 2 gas and Ar gas was introduced into the film forming chamber 51 by opening the flow valve 62. At the same time, the flow valve 59 was opened, and HMDS (hexamethyldisilazane) gas was introduced into the film forming chamber 51. By adding Ar gas, the dissociation reaction can be performed with relatively low energy plasma. The introduction speed of each gas at this time was 20 sccm to 40 sccm for the mixed gas of H2 gas and Ar gas, and 3 sccm to 5 sccm for the HMDS gas.

  Subsequently, a high frequency current was passed from the power supply 66 to the loop antenna 63. As a result, plasma is generated around the loop antenna 63. The plasma power at this time was 5 kW to 10 kW. A surface reaction was performed on the surface of the substrate, and the first thin film layer 31 covering the solar battery cell 20 shown in FIG. 2 was formed. After a predetermined time T1, the flow rate valve 62 was closed and the introduction of the mixed gas of H2 gas and Ar gas was stopped.

  Once the first thin film layer 31 was formed, the second thin film layer 32 was then formed. First, the flow rate valve 61 was opened and O 2 gas was introduced into the film forming chamber 51. At the same time, HMDS gas was introduced through the flow valve 59. The introduction speed of each gas at this time was 20 sccm to 1000 sccm for O 2 gas and 3 sccm to 20 sccm for HMDS gas. Subsequently, a high frequency current was passed from the power source 66 to the loop antenna 63 so that the plasma power was 0.1 kW to 8 kW, and plasma was generated around the loop antenna 63.

  A surface reaction was performed on the surface of the substrate 10, and a second thin film layer 32, that is, a silicon oxide film was formed so as to cover the first thin film layer 31, as shown in FIG. After a predetermined time elapsed, the introduction of O 2 gas was stopped by closing the flow valve 61. This silicon oxide film preferably contains Si and O at a composition ratio of Si: O = 1: 1.9 to 2.1.

  The processing performed on the first thin film layer 31 and the second thin film layer 32 was repeated N times (N = 2 in this example). As a result, as shown in FIG. 2, a two-layered structure in which a silicon oxide film (second thin film layer 32) was laminated on a low-density thin film (first thin film layer 31) containing silicon was formed.

As described above, first, as source gas, H2 gas, Ar gas, and HMDS gas are used,
A first thin film layer 31 is formed on the substrate K by plasma CVD, and then a second thin film layer 32, which is a silicon oxide film, is formed on the first thin film layer 31 using O 2 gas and HMDS gas. . Although not shown here, a silicon nitride film may be inserted using NH3 gas, SiH4 gas, or the like.

  It has been found that the first thin film layer 31 has good adhesion. By interposing the first thin film layer 31 between the substrate 10 and the second thin film layer 32, the adhesion between the substrate 10 and the second thin film layer 32 and the subsequent films is improved. The thin film layer 32 is less likely to crack or peel off, and can be reliable with little performance variation.

  Further, by alternately laminating a plurality of first thin film layers 31 and second thin film layers 32, the barrier property against moisture and oxygen is remarkably improved. Note that although an example in which two inorganic layers are stacked has been described in this embodiment mode, an inorganic layer using three or more kinds of inorganic materials may be used.

  The solar cell module of the present invention produced as described above has high airtightness against moisture, and has improved waterproofness in the thermal cycle test as compared to when the back surface is sealed with only EVA and a protective layer. .

  Unlike the conventional method, the method of the present invention does not use an etching process or the like, and therefore does not damage the solar battery cell 20. Moreover, since the laminated body of the 1st thin film layer 31 and the 2nd thin film layer 32 also has the function to protect the photovoltaic cell 20 from plasma energy as it carries out chemical vapor phase growth on the board | substrate 10, plasma energy The damage to the device due to is less. Further, since the formation of the first thin film layer 31 and the formation of the second thin film layer 32 are performed in the same chamber (deposition chamber 51), the apparatus structure does not become large. Moreover, since HMDS gas is used as a raw material gas, there is no risk of explosion and excellent safety.

DESCRIPTION OF SYMBOLS 1 Solar cell module 10 Board | substrate 11 Back electrode 12 Photoelectric conversion layer 13 Transparent electrode 15 Sealing layer 16 Protection layer 20 Solar cell 30 Barrier film 31 1st thin film layer 32 2nd thin film layer

Claims (4)

A substrate,
On this substrate, a solar cell element formed by laminating a back electrode, a power generation layer that receives light to generate power, and a transparent electrode that transmits light in this order,
A protective layer for protecting the solar cell element;
A resin-made sealing layer filled between the protective layer and the substrate;
A solar cell module that takes in light from the protective layer side,
The solar cell element is covered with a barrier film formed by laminating a plurality of thin films,
The barrier film is formed so that the upper layer covers the lower layer, and the outer peripheral edge of each layer has a portion in contact with the substrate, and is covered with the sealing layer and the protective layer from above the barrier film. A solar cell module characterized by comprising:   The solar cell module according to claim 1, wherein the barrier film is formed by depositing an inorganic substance.   The solar cell module according to claim 1 or 2, wherein the barrier film is formed by a chemical vapor deposition method.   The solar cell module according to claim 1, wherein a refractive index of the barrier film is set between a refractive index of the sealing layer and a refractive index of the transparent electrode.

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