JP2013001863A - Curable resin composition, cured product of the same, phenolic resin, epoxy resin and semiconductor sealing material - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a thermosetting resin composition and a cured product of the composition, the composition having excellent fluidity of the composition, and achieving reliability in moisture resistance suitable to a material relating to electronic components of recent years and high flame retardancy while the composition is halogen-free for environmental harmony; to provide a semiconductor sealing material using the composition; and to provide a phenolic resin and an epoxy resin that give the above described performances.SOLUTION: A phenolic resin having the following resin structure is used as a raw material of an epoxy resin or a curing agent for an epoxy resin. The resin structure of the phenolic resin comprises a resin structure (α) of a plurality of phenolic hydroxy group-containing aromatic skeletons (ph) bonded through an alkylidene group or a methylene group that contains an aromatic hydrocarbon structure, wherein: a naphthyl methyl group or an antonyl methyl group is present in an aromatic nucleus of the resin structure; and 5 to 50 mol% of phenolic hydroxy groups in the resin structure (α) are modified into a naphthyl methyl ether or an antonyl methyl ether.

Description

The cured product obtained according to the present invention is excellent in heat resistance, moisture resistance reliability, flame retardancy, dielectric properties, curability during curing reaction, and suitable for semiconductor encapsulant, printed circuit board, paint, casting application, etc. The present invention relates to a thermosetting resin composition that can be used, a cured product thereof, a phenol resin, an epoxy resin, and a semiconductor sealing material using the thermosetting resin composition.

Thermosetting resin compositions containing an epoxy resin and its curing agent as essential components are excellent in various physical properties such as high heat resistance, moisture resistance, and low viscosity. Electronic components such as semiconductor encapsulants and printed circuit boards, electronic Widely used in parts field, conductive adhesives such as conductive paste, other adhesives, matrix for composite materials, paints, photoresist materials, developer materials, etc.

In recent years, in these various applications, particularly advanced material applications, further improvements in performance typified by heat resistance and moisture resistance reliability have been demanded. For example, in the field of semiconductor encapsulating materials, the transition to surface mount packages such as BGA and CSP, as well as support for lead-free solder, led to higher reflow processing temperatures, thus increasing moisture resistance and solder resistance. There is a demand for an electronic component encapsulating resin material that is excellent in performance.
Furthermore, in recent years, from the viewpoint of environmental harmony, the movement of eliminating halogen-based flame retardants has further increased, and there has been a demand for epoxy resins and phenol resins (curing agents) that are highly halogen-free and exhibit high flame retardancy.

  Examples of the phenol resin and epoxy resin for encapsulating electronic components that meet the required characteristics include, for example, a benzylated phenol resin obtained by reacting a phenol resin with a benzylating agent such as benzyl chloride, and the benzylated phenol resin as an epihalohydrin. Using a reacted epoxy resin (for example, see Patent Document 1), a phenol resin obtained by reacting a phenolic compound and dichloromethylnaphthalene, and an epoxy resin obtained by further reacting this with an epihalohydrin were used. The thing (for example, refer patent document 2) is disclosed.

  However, the phenolic resin and the epoxy resin according to Patent Document 1 have a low moisture absorption rate and improved moisture resistance and solder resistance to some extent, but in addition to the required level required in recent years, It was inferior in flame retardancy and could not be designed for halogen-free materials. Moreover, although the phenol resin (curing agent) described in Patent Document 2 has a certain degree of flame retardancy improving effect, it has a high viscosity and is inferior in fluidity at the time of molding. The epoxy resin described in Patent Document 2 has a high epoxy group content, and the cured product does not exhibit sufficient moisture resistance reliability and flame retardancy.

  As described above, in the field of electronic component-related materials, an epoxy resin composition having fluidity, moisture resistance reliability and flame retardancy has not been obtained.

JP-A-8-120039 JP 2004-57992 A

  Therefore, the problem to be solved by the present invention is that the composition is excellent in fluidity of the composition, and also has a moisture resistance reliability suitable for recent electronic component-related materials and a thermosetting that realizes halogen-free and high flame resistance for environmental harmony. The present invention provides a conductive resin composition, a cured product thereof, a semiconductor sealing material using the composition, and a phenol resin and an epoxy resin that provide these performances.

  As a result of intensive investigations to solve the above problems, the present inventors basically have a structure in which a plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) are bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group. Resin structure in which a naphthylmethyl group or antonylmethyl group is introduced into the aromatic nucleus of a phenol resin as a skeleton, and 5 to 50 mol% of the phenolic hydroxyl group of the phenol resin is naphthylmethyl etherified or antonylmethyletherified As a result, the present inventors have found that it has high resistance to moisture and solder resistance and halogen-free, and has completed the present invention.

That is, the present invention is a thermosetting resin composition comprising an epoxy resin (A) and a phenol resin (B) as essential components,
The phenol resin (B) is
A plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) have a naphthylmethyl group or an antonylmethyl group in the aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group, And,
A thermosetting resin composition (hereinafter, referred to as a phenolic resin having a resin structure in which 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyletherified or anthonymethyletherified) The thermosetting resin composition is abbreviated as “thermosetting resin composition (I)”).

  In addition to the epoxy resin and the phenol resin (B) in the thermosetting resin composition (I), the present invention further contains an inorganic filler in a proportion of 70 to 95% by mass in the composition. The present invention relates to a semiconductor sealing material characterized by the following.

  The present invention further relates to a cured product obtained by curing the thermosetting resin composition (I).

  The present invention further relates to an epoxy resin cured product obtained by curing reaction of the thermosetting resin composition (I).

The present invention further provides a naphthylmethyl group or antonyl group to an aromatic nucleus of a resin structure (α) in which a plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) are bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group. Having a methyl group and
The present invention relates to a phenol resin characterized in that 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) has a resin structure in which naphthylmethyl etherification or antonylmethyl etherification is performed.

The present invention further provides:
A thermosetting resin composition comprising an epoxy resin (A ′) and a curing agent (B ′) as essential components, wherein the epoxy resin (A ′) has a plurality of phenolic hydroxyl group-containing aromatic skeletons (ph). The aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group has a naphthylmethyl group or an antonylmethyl group, and
5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyl etherified or antonylmethyletherified, and the remaining phenolic hydroxyl group has a resin structure in which glycidyl etherification is performed. The thermosetting resin composition (hereinafter, this thermosetting resin composition is abbreviated as “thermosetting resin composition (II)”).

  In the present invention, in addition to the epoxy resin (A ′) and the curing agent (B ′) in the thermosetting resin composition (II), an inorganic filler is 70 to 95% by mass in the composition. It is related with the semiconductor sealing material characterized by containing by a ratio.

  The present invention further relates to a cured product obtained by curing the thermosetting resin composition (II).

The present invention further provides:
A plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) have a naphthylmethyl group or an antonylmethyl group in the aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group, And,
An epoxy having a resin structure in which 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyl etherified or anthonylmethyletherified, and the remaining phenolic hydroxyl group is glycidyletherified. It relates to resin.

  According to the present invention, a thermosetting resin composition that is excellent in fluidity of the composition, is moisture-resistant and suitable for recent electronic component-related materials, and is halogen-free and highly flame retardant for harmony with the environment. Hardened | cured material, the semiconductor sealing material using this composition, the phenol resin which provides these performances, and an epoxy resin can be provided.

1 is a GPC chart of the phenol resin (A-1) obtained in Example 1. FIG. FIG. 2 is a C ¹³ -NMR chart of the phenol resin (A-1) obtained in Example 1. FIG. 3 is an MS spectrum of the phenol resin (A-1) obtained in Example 1. FIG. 4 is a GPC chart of the phenol resin (A-2) obtained in Example 2. FIG. 5 is a GPC chart of the phenol resin (A-4) obtained in Example 3. 6 is a GPC chart of the epoxy resin (E-1) obtained in Example 6. FIG. FIG. 7 is a C ¹³ -NMR chart of the epoxy resin (E-1) obtained in Example 6. FIG. 8 is an MS spectrum of the epoxy resin (E-1) obtained in Example 6. FIG. 9 is a GPC chart of the epoxy resin (E-2) obtained in Example 7. FIG. 10 is a GPC chart of the epoxy resin (E-4) obtained in Example 8.

Hereinafter, the present invention will be described in detail.
The thermosetting resin composition (I) of the present invention is a thermosetting resin composition having an epoxy resin (A) and a phenol resin (B) as essential components, and the phenol resin (B) The phenol resin (B) has a naphthylmethyl group or an aromatic nucleus of a resin structure (α) in which a plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) are bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group. It is an phenol resin having an antonylmethyl group and 5-50 mol% of the phenolic hydroxyl group of the resin structure (α) having a naphthylmethyl etherified or antonylmethyl etherified resin structure. To do.

  That is, the phenol resin (B) has a naphthylmethyl group or an aromatic nucleus of a resin structure (α) in which a phenolic hydroxyl group-containing aromatic skeleton (ph) is bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group. Since it has an antonylmethyl group and 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyl etherified or antonylmethyletherified, the aromatic nucleus of the resin itself can be improved. The heat resistance and flame retardancy are very high. Moreover, since 5 to 50 mol% of the phenolic hydroxyl group is naphthylmethyletherified or antonylmethyletherified, the functional group concentration of the phenolic hydroxyl group is lowered, and the moisture resistance and flame retardancy in the cured product are greatly improved. Can be enhanced. Furthermore, although the phenol resin (B) has extremely high aromatic nucleus, the resin itself has excellent fluidity, and the affinity with inorganic fillers such as silica in semiconductor sealing material applications is also improved. When the cured product is used, the coefficient of thermal expansion is also lowered, and the moisture resistance reliability and flame retardancy are remarkably improved. In the present invention, such a phenol resin (B) is the novel phenol resin of the present invention.

  Here, the content ratio of the naphthylmethyl group or the antonylmethyl group directly bonded to the aromatic nucleus of the resin structure (α) is 100 as the total number of aromatic nuclei resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph). In this case, the ratio of the total number of naphthylmethyl groups or anthonymethyl groups to 5 to 150 is preferable from the viewpoint of further improving the balance between moisture resistance reliability and flame retardancy. Particularly preferred is 5 to 100 because the effect of improving curability, moldability, moisture resistance reliability and flame retardancy is high, and more particularly within the range of 5 to 80 is the affinity of fillers such as silica. It is preferable because it is excellent in the properties and impregnation into a glass substrate and the effect of the present invention is remarkable, and it is particularly preferably in the range of 5-60.

  On the other hand, Patent Document 2 described above describes that dichloromethylnaphthalene used as a condensing agent contains naphthylmethyl chloride as an impurity, and the content of the impurity is 10% by mass or less. It is described that heat resistance is reduced if not. However, in the present invention, a naphthylmethyl group or an antonylmethyl group is positively introduced into the resin structure, and the abundance ratio is calculated by calculating the total number of aromatic nuclei resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph). When it is set to 100, by setting the ratio to 5 to 150, a decrease in heat resistance is not recognized, and moisture resistance reliability typified by moisture resistance and solder resistance is remarkably improved.

Here, the ratio of the phenolic hydroxyl group of the resin structure (α) converted to naphthyl methyl ether or antonyl methyl ether in the C ¹³ -NMR chart of the phenol resin (B) is naphthyl methyl ether or antonyl methyl. It is a ratio obtained by dividing the integral value of the methyl ether peak of the ether by the integral value of the peak of the carbon atom to which the oxygen atom in the phenoxy skeleton is bonded, and when expressed as a percentage, the value is represented by the following formula 1.
(Formula 1)
(Integral value of methyl ether peak of naphthyl methyl ether or antonyl methyl ether) / (Integral value of carbon peak to which oxygen atom in phenoxy skeleton is bonded) × 100 (%)

Next, the content of the naphthylmethyl group or antonylmethyl group directly bonded to the aromatic nucleus of the resin structure (α) in the phenol resin (B), that is, the phenolic hydroxyl group-containing aromatic skeleton (ph) The total number of naphthylmethyl groups or antonylmethyl groups when the total number of aromatic nuclei to be taken as 100 is a value calculated by the following method.
<Method for Deriving Total Number of Nuclear-Substituted Naphthylmethyl Group or Antonylmethyl Group>
In the C ¹³ -NMR chart of the phenol resin (B), when the integrated value of the peak of the carbon atom to which the oxygen atom in the phenoxy skeleton is bonded is 1.0, the value calculated by the following formula 2 is multiplied by 100. Value.
(Formula 2)
[{(Integral ratio of carbon atom to which oxygen atom in phenoxy skeleton is not bonded to peak derived from naphthalene nucleus or anthracene nucleus) -5.0} / (number of carbon atoms constituting naphthalene nucleus or anthracene nucleus)]- Integral ratio of methyl ether peaks of naphthyl methyl ether or antonyl methyl ether

Here, as described above, the resin structure (α) has a structure in which a plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) are bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group (X). Is.
Specific examples of the phenolic hydroxyl group-containing aromatic skeleton (ph) include structural sites represented by the following Ph-1 to Ph-17.

  Among the above-described phenolic hydroxyl group-containing aromatic skeletons (ph), in particular, those having the phenol skeleton of the structural formula Ph-1 facilitate introduction of a naphthylmethyl group or an antonylmethyl group into the aromatic nucleus. To preferred. Further, those having a methyl group in the phenoxy skeleton as represented by the structural formula Ph1-4 are preferable because the effects of improving heat resistance and moisture resistance and solder resistance are remarkable.

  On the other hand, an alkylidene group or an aromatic hydrocarbon structure-containing methylene group (X) connecting a plurality of the phenolic hydroxyl group-containing aromatic skeleton (ph) (hereinafter abbreviated as “methylene-based nodule group (X)”). ), For example, as an alkylidene group, methylene group, ethylidene group, 1-propylidene group, 2,2-propylidene group, dimethylene group, propane-1,1,3,3-tetrayl group, n-butane-1, 1,4,4-tetrayl group, n-pentane-1,1,5,5-tetrayl group and the like are exemplified, and the aromatic hydrocarbon structure-containing methylene group is represented by the following structural formulas X1 to X8. Can be mentioned.

  Among these, a methylene group and a structure represented by the structural formulas X1, X2, and X5 are preferable from the viewpoint of excellent flame retardancy in the cured product of the phenol resin (B).

  The resin structure (α) in which a plurality of the above-described phenolic hydroxyl group-containing aromatic skeleton (ph) is a methylene nodule group (X) is a so-called novolak resin structure.

The phenol resin (B) described above has a naphthylmethyl group or an antonylmethyl group as a substituent directly on the aromatic nucleus resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph) in the resin structure (α). Furthermore, 5-50 mol% of the phenolic hydroxyl group of the resin structure (α) has a resin structure in which naphthylmethyl etherification or antonylmethyl etherification is performed.
Here, a naphthylmethyl group or antonylmethyl group is directly bonded as a substituent to the aromatic nucleus derived from the phenolic hydroxyl group-containing aromatic skeleton (ph) of the resin structure (α), and the phenolic hydroxyl group remains, or The structural portion (Ph1) that has been converted to naphthylmethyl ether or antonylmethyl ether is, for example, an aromatic hydrocarbon group represented by the following structural formula of Ph1 to Ph18. From the point which is excellent in it.

ここで、Ｙは、水素原子、又は、ナフチルメチル基又はアントニルメチル基を表し、また、上掲した構造のうちナフタレン骨格上に他の構造部位との結合位置を二つ以上有するものは、それらの結合位置は同一核上であってもよいし、或いは、それぞれ異核上にあってもよい。

Here, Y represents a hydrogen atom, a naphthylmethyl group or an antonylmethyl group, and among the structures listed above, those having two or more bonding positions with other structural sites on the naphthalene skeleton are: Their binding positions may be on the same nucleus or on different nuclei.

  Among the above structural parts, those having a phenoxy skeleton of the structural formula Ph1-1 are particularly preferable in that the phenol resin (B) itself has a low viscosity and is excellent in curability, heat resistance, and moisture resistance and solder resistance. Further, those having a methyl group in the phenoxy skeleton as represented by the structural formula Ph1-4 are preferable because the effects of improving heat resistance and moisture resistance and solder resistance are remarkable.

  Moreover, when it has a structure part which has a naphthylmethyl group or an antonylmethyl group as a direct substituent in the aromatic nucleus of the resin structure terminal of resin structure ((alpha)), it is represented by following structural formula Ph1-14-Ph1-22. Can be mentioned.

  Here, Y represents a hydrogen atom, a naphthylmethyl group or an antonylmethyl group, and among the structures listed above, those having two or more bonding positions with other structural sites on the naphthalene skeleton are: Their binding positions may be on the same nucleus or on different nuclei.

  In the present invention, among these, those having a phenoxy skeleton of the structural formula Ph1-14 are preferable in view of low viscosity and excellent curability, heat resistance, and moisture resistance and solder resistance. In addition, those having a methyl group in the phenoxy skeleton as represented by the structural formulas Ph1-15, Ph1-20, and Ph1-22 are preferable because the effects of improving heat resistance and moisture and solder resistance are remarkable.

  On the other hand, as the structural site (Ph2) that does not directly have a naphthylmethyl group or an antonylmethyl group in the aromatic nucleus due to the phenolic hydroxyl group-containing aromatic skeleton (ph) of the resin structure (α), specifically, Those represented by the following structural formulas Ph2-1 to Ph2-17 are exemplified.

ここで、上掲した構造のうちナフタレン骨格上に他の構造部位との結合位置を二つ以上有するものは、それらの結合位置は同一核上であってもよいし、或いは、それぞれ異核上にあってもよい。

Here, among the structures listed above, those having two or more bonding positions with other structural sites on the naphthalene skeleton may be on the same nucleus or on different nuclei. May be.

  In the present invention, among these, a structure represented by Ph2-1 is preferable in terms of excellent curability, and Ph2-4 is preferable in terms of moisture resistance and solder resistance.

  Here, each structure becomes a monovalent aromatic hydrocarbon group when the structure is located at the molecular end. In addition, among the structures listed above, those having two or more bonding positions with other structural sites on the naphthalene skeleton may be on the same nucleus or on different nuclei. There may be.

  When the phenol resin (B) is composed of the structural units represented by the above structural formula, that is, the structural part (Ph1) represented by the structural part Ph1-1 to Ph1-22, and the structural part Ph2-1 to When the structural portion (Ph2) represented by Ph1-17 has a resin structure bonded to the aromatic skeleton (Ph1) or the aromatic skeleton (Ph2) via the methylene-based nodule group (X), these bonds These forms may take any combination. Here, 5-50 mol% of the total number of Y in the structural site (Ph1) and the structural site (Ph2) is a naphthylmethyl group or anthonylmethyl group, and the remainder is a hydrogen atom.

  When the molecular structure of the phenol resin (B) is represented by “Ph1” for the aromatic skeleton (Ph1), “Ph2” for the aromatic skeleton (Ph2), and “X” for the methylene nodule group (X), Structural parts represented by the following partial structural formulas B1 and B2

を繰り返し単位とするランダム共重合体、若しくはブロック共重合体、
Ｂ２を繰り返し単位とする重合体ブロックの分子鎖中にＢ１が存在する重合体、或いは、
下記構造式Ｂ３〜Ｂ８

A random copolymer having a repeating unit or a block copolymer,
A polymer in which B1 is present in the molecular chain of the polymer block having B2 as a repeating unit, or
The following structural formulas B3 to B8

で表される構造部位を分岐点として樹脂構造中に有する重合体、或いは、これら自体を繰り返し単位とする重合体であって、その樹脂構造の末端に下記構造式Ｂ９又はＢ１０

A polymer having a structural site represented by the following formula in the resin structure as a branch point, or a polymer having these as repeating units, and having the following structural formula B9 or B10 at the end of the resin structure:

で表される構造を有するものが挙げられる。

What has the structure represented by these is mentioned.

  In this invention, since it has such a characteristic chemical structure, the aromatic content rate in molecular structure becomes high, and it can provide the heat resistance and flame retardance which were excellent in hardened | cured material.

  In the phenol resin (B), the naphthylmethyl group or anthonylmethyl group present in the aromatic skeleton (Ph1) has the following structural formula (1).

又は下記構造式（２）

Or the following structural formula (2)

で表されるように多重化した構造を有するものであってもよい。ここで、上記構造式（１）又は構造式（２）は、その平均が０〜５の値を採りうるが、本発明では優れた難燃性を発現する点から多重化していないもの、即ちｎが０のものが好ましい。また、これらのなかでも特に流動性、難燃性の点からナフチルメチル基であることが好ましい。

It may have a multiplexed structure as represented by Here, the structural formula (1) or the structural formula (2) may take an average value of 0 to 5, but is not multiplexed in the present invention because it exhibits excellent flame retardancy, n is preferably 0. Of these, a naphthylmethyl group is particularly preferred from the viewpoint of fluidity and flame retardancy.

  Furthermore, the phenol resin (B) of the present invention may have an aromatic group containing an alkoxy group-containing aromatic hydrocarbon group bonded to the aromatic nucleus via the methylene group nodule group (X). Examples of the hydrogen group include those represented by the following structural formulas A1 to A13.

  In the present invention, when the phenol resin (B) contains an alkoxy group-containing aromatic hydrocarbon group in the resin structure, the alkoxy group-containing aromatic hydrocarbon group has a structure represented by the structural formula A8. The cured epoxy resin has excellent heat resistance and flame retardancy, and can significantly reduce the dielectric loss tangent.

  The phenol resin (B) has a melt viscosity at 150 ° C. measured with an ICI viscometer of 0.1 to 50 dPa · s, particularly 0.1 to 15 dPa · s at 150 ° C. A thing is preferable at the point which is excellent in the fluidity | liquidity at the time of shaping | molding, and moisture-proof solder resistance. Furthermore, the phenol resin (B) has a hydroxyl group equivalent of 120 to 400 g / eq. The thing of this range is preferable from the point from which the heat resistance and flame retardance of hardened | cured material become still better. The hydroxyl group equivalent is 150 to 250 g / eq. Within this range, the balance between the moisture resistance solder resistance and flame resistance of the cured product and the curability of the composition is particularly excellent.

  The said phenol resin (B) can be manufactured industrially by the manufacturing method explained in full detail below.

  That is, the method for producing the phenol resin (B) is to react the novolak type phenol resin (a1) with the naphthyl methylating agent or the antonyl methylating agent (a2) in the absence of a catalyst or in the presence of an acid catalyst (step 1). Then, a method in which a naphthyl methylating agent or an antonyl methylating agent (a2) is further added and reacted under an alkali catalyst (step 2) can be mentioned.

  The novolak-type phenol resin (a1) used here is a compound having a resin structure (α) in which the phenolic hydroxyl group-containing aromatic skeleton (ph) is bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group. is there. In the present invention, among these, the reactivity with the naphthyl methylating agent or the antonyl methylating agent (a2) in Step 1 is good, and a phenol resin excellent in moisture resistance reliability and flame retardancy can be obtained. Phenol novolak resin, cresol novolak resin, and naphthol novolak resin are preferable.

  Here, the naphthyl methylating agent or the anthony methylating agent (a2) is 1-naphthylmethyl chloride, 2-naphthylmethyl chloride, (9-anthrylmethyl) chloride, 1-methoxymethylnaphthalene, 1-naphthylmethanol, Examples thereof include 2-methoxymethylnaphthalene, 2-naphthylmethanol 9- (methoxymethyl) anthracene, and 9-anthracenemethanol. Among these, 1-methyl chloride, 2-methyl chloride, and (9-anthrylmethyl) chloride are preferable in that they can be reacted without using a reaction catalyst and a purification step after the reaction is not necessary.

  In the production method, before step 1, an unsubstituted phenol compound such as phenol, resorcinol, hydroquinone, cresol, phenylphenol, ethylphenol, n-propylphenol, iso-propylphenol, t-butylphenol, etc. Substituted phenol compounds, xylenol, methylpropylphenol, methylbutylphenol, methylhexylphenol, dipropylphenol, dibutylphenol, and other disubstituted phenol compounds, mesitol, 2,3,5-trimethylphenol, 2,3,6-trimethyl A phenolic compound (Phl ') selected from the group consisting of trisubstituted phenolic compounds such as phenol, 1-naphthol, 2-naphthol, and methylnaphthol; and formaldehyde, acetaldehyde , Aliphatic aldehydes such as propionaldehyde, dialdehydes such as glyoxal, benzaldehyde, 4-methylbenzaldehyde, 3,4-dimethylbenzaldehyde, 4-biphenylaldehyde, aromatic aldehydes such as naphthylaldehyde, benzophenone, fluorenone, indanone A carbonyl compound (X ′) selected from the group consisting of ketone compounds such as the above may be reacted in advance to obtain a novolac-type phenol resin (a1), which may then be subjected to step 1.

  Here, the reaction between the phenol compound (Ph1 ′) and the carbonyl compound (X ′) is a ratio of 0.01 to 0.9 mol of the carbonyl compound (X ′) with respect to 1 mol of the phenol compound (Ph1 ′). Thus, both can be obtained by heating in the presence of a catalyst. The polymerization catalyst used here is not particularly limited, but is preferably an acid catalyst. For example, inorganic acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, and organic substances such as methanesulfonic acid, p-toluenesulfonic acid, and oxalic acid. Examples thereof include Lewis acids such as acid, boron trifluoride, anhydrous aluminum chloride, and zinc chloride. The amount used is preferably in the range of 0.1 to 5% by mass with respect to the total mass of the charged raw materials.

  In carrying out this reaction, an organic solvent can be used as necessary. Specific examples of the organic solvent that can be used include, but are not limited to, methyl cellosolve, ethyl cellosolve, toluene, xylene, and methyl isobutyl ketone. The amount of the organic solvent used is usually 10 to 500% by mass, preferably 30 to 250% by mass, based on the total mass of the charged raw materials. Moreover, as reaction temperature, it is 40-250 degreeC normally, and the range of 100-200 degreeC is more preferable. The reaction time is usually 1 to 20 hours.

  The reaction of the novolak type phenol resin (a1) with the naphthyl methylating agent or the antonyl methylating agent (a2) in the step 1 is a temperature condition of 50 ° C. to 200 ° C., preferably a reaction of 70 ° C. to 180 ° C. Under conditions. The reaction is preferably performed in the presence of an acid catalyst. Examples of the acid catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, and organic acids such as methanesulfonic acid, p-toluenesulfonic acid, and oxalic acid. Examples thereof include Lewis acids such as acid, boron trifluoride, anhydrous aluminum chloride, and zinc chloride. The amount used is preferably in the range of 0.1 to 5% by mass with respect to the total mass of the charged raw materials.

Further, when 1-naphthylmethyl chloride, 2-naphthylmethyl chloride, (9-anthrylmethyl) chloride is used as the naphthylmethylating agent or anthonymethylating agent (a2), there is no need to use a reaction catalyst. It is possible to react with self-generated hydrogen halide. When hydrogen halide is not generated at the beginning of the reaction, water or hydrochloric acid can be added in an amount of about 0.1 to 5% by mass to promote the self-generation of hydrogen halide.
At this time, it is desirable that the generated hydrogen chloride gas is promptly discharged out of the system and neutralized and rendered harmless with alkaline water or the like.

  The reaction time should just lose | disappear the naphthyl methylating agent or antonyl methylating agent (a2) which are raw materials, and is about 1 to 50 hours generally. When 1-naphthylmethyl chloride, 2-naphthylmethyl chloride, or (9-anthrylmethyl) chloride is used, the generation of hydrogen chloride gas is substantially eliminated, the chloride compound as the raw material disappears, and the raw material (a2 ) Until the chlorine content is no longer detected, and depending on the reaction temperature, in the actual reaction, the reaction temperature is controlled to such an extent that hydrogen chloride gas is generated quickly and can be stably discharged out of the system. The reaction temperature is preferably about 1 to 25 hours at such a reaction temperature.

  Next, step 2 is a method in which a naphthyl methylating agent or an antonyl methylating agent (a2) is further added to the phenol resin which is the reaction product obtained in step 1, and the reaction is carried out in the presence of an alkali catalyst. Examples of the alkali catalyst used here include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, inorganic alkalis with metal sodium, metal lithium, sodium carbonate, and potassium carbonate. The amount used is preferably in the range of 1.0 to 2.0 times the number of moles of the naphthyl methylating agent or anthony methylating agent (a2). The reaction temperature is 20 ° C to 150 ° C, preferably 40 ° C to 120 ° C.

  In carrying out this reaction, an organic solvent can be used as necessary. Specific examples of the organic solvent that can be used include, but are not limited to, methyl cellosolve, ethyl cellosolve, toluene, xylene, and methyl isobutyl ketone. However, when 1-naphthylmethyl chloride, 2-naphthylmethyl chloride, or (9-anthrylmethyl) chloride is used, it is preferable not to use an alcoholic organic solvent because side reactions occur. The amount of the organic solvent used is usually 10 to 500% by mass, preferably 30 to 250% by mass, based on the total mass of the charged raw materials.

  Further, when the resulting polyvalent hydroxy compound is highly colored, an antioxidant or a reducing agent may be added to suppress it. The antioxidant is not particularly limited, and examples thereof include hindered phenol compounds such as 2,6-dialkylphenol derivatives, divalent sulfur compounds, and phosphite compounds containing trivalent phosphorus atoms. be able to. Although it does not specifically limit as said reducing agent, For example, hypophosphorous acid, phosphorous acid, thiosulfuric acid, sulfurous acid, hydrosulfite, these salts, zinc, etc. are mentioned.

  After completion of the reaction, the reaction mixture is neutralized or washed with water as necessary until the pH value of the reaction mixture becomes 5 to 9, preferably 6 to 8. What is necessary is just to perform a neutralization process and a water washing process in accordance with a conventional method. As the neutralizing agent, an acidic substance such as acetic acid, phosphoric acid or sodium phosphate can be used as the neutralizing agent. After neutralization or washing with water, under reduced pressure heating, the unreacted naphthyl methylating agent, anthony methylating agent, organic solvent and by-products are distilled off to concentrate the product, and the phenol resin of the present invention is removed. Obtainable. In addition, it is more preferable to introduce a microfiltration step in the treatment operation after the end of the reaction because inorganic salts and foreign matters can be purified and removed.

  In order to produce the epoxy resin (A ′), which will be described later, from the phenol resin (B), when the epoxidation is continued, the neutralization or water washing treatment may not be performed.

  The phenol resin (B) described in detail above may be used as a mixture obtained by mixing two or more types obtained by the above method, and a resin produced by a method in which step 1 or step 2 is omitted is obtained by the above method. Even if the amount of modification of the naphthylmethyl group or anthonylmethyl group on the aromatic nucleus or the naphthylmethyl etherification rate or the anthonylmethyl etherification rate of the phenolic hydroxyl group is adjusted by mixing with the obtained resin Good.

  In the thermosetting resin composition (I) of the present invention, the phenol resin (B) may be used alone, but other epoxy resin curing agents (b) are used as long as the effects of the present invention are not impaired. May be. Specifically, the other epoxy resin curing agent (b) is used in a range where the phenol resin (B) is 30% by mass or more, preferably 40% by mass or more with respect to the total mass of the curing agent. Can do.

  Examples of other epoxy resin curing agent (b) that can be used in combination with the phenol resin (B) of the present invention include amine compounds, amide compounds, acid anhydride compounds, and phenols other than phenol resins (B). And aminotriazine-modified phenolic resins (polyhydric phenol compounds in which phenol nuclei are linked with melamine or benzoguanamine).

  Here, phenolic compounds other than the phenol resin (B) include phenol novolak resin, cresol novolak resin, phenol novolak resin, cresol novolak resin, naphthol novolak resin, naphthol-phenol co-condensed novolak resin, and naphthol-cresol co-polymer. A novolak resin such as a condensed novolak resin; a phenol resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the novolak resin via a methylene group, and a methoxyphenyl skeleton bonded to an aromatic nucleus of the novolak resin via a methylene group Methoxy aromatic structure-containing phenolic resin such as phenolic resin with resin structure;

The following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるフェノールアラルキル樹脂、
下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Phenol aralkyl resin represented by
The following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるナフトールアラルキル樹脂、下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Naphthol aralkyl resin represented by the following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるビフェニル変性フェノール樹脂、
下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Biphenyl-modified phenolic resin represented by
The following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるビフェニル変性ナフトール樹脂等のアラルキル型フェノール樹脂；前記アラルキル型フェノール樹脂の芳香核にメトキシナフタレン骨格がメチレン基を介して結合した樹脂構造のフェノール樹脂、前記アラルキル型フェノール樹脂の芳香核にメトキシフェニル骨格がメチレン基を介して結合した樹脂構造のフェノール樹脂；下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
An aralkyl-type phenol resin such as a biphenyl-modified naphthol resin represented by: a phenol resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the aralkyl-type phenol resin via a methylene group, and an aromatic nucleus of the aralkyl-type phenol resin A phenolic resin having a resin structure in which a methoxyphenyl skeleton is bonded via a methylene group;

（式中、Ｘは、フェニル基、ビフェニル基を表し、ｎは繰り返し単位であり、０以上の整数である。）で表される芳香族メチレンを結節基とするノボラック樹脂；トリメチロールメタン樹脂、テトラフェニロールエタン樹脂、ジシクロペンタジエンフェノール付加型フェノール樹脂が挙げられる。

(Wherein X represents a phenyl group or a biphenyl group, n is a repeating unit, and is an integer of 0 or more). A novolak resin having a nodule group represented by an aromatic methylene represented by: trimethylolmethane resin; Examples include tetraphenylolethane resin and dicyclopentadiene phenol addition type phenol resin.

  Among these, those containing a large amount of an aromatic skeleton in the molecular structure are particularly preferred from the viewpoint of the flame retardant effect. Specifically, phenol novolac resins, cresol novolak resins, novolak resins having aromatic methylene as a nodule, phenol Aralkyl resin, naphthol aralkyl resin, naphthol novolak resin, naphthol-phenol co-condensed novolak resin, naphthol-cresol co-condensed novolak resin, biphenyl-modified phenol resin, biphenyl-modified naphthol resin, methoxy aromatic structure-containing phenol resin, aminotriazine-modified phenol resin Is preferable because of its excellent flame retardancy.

  Next, examples of the epoxy resin (A) used in the thermosetting resin composition (I) of the present invention include diglycidyloxynaphthalene, 1,1-bis (2,7-diglycidyloxynaphthyl) methane 1- (2,7-diglycidyloxynaphthyl) -1- (2′-glycidyloxynaphthyl) naphthalene type epoxy resins such as methane; bisphenol type epoxy resins such as bisphenol A type epoxy resin and bisphenol F type epoxy resin; phenol novolac type Epoxy resin, cresol novolak type epoxy resin, bisphenol A novolak type epoxy resin, naphthol novolak type epoxy resin, biphenyl novolak type epoxy resin, naphthol-phenol co-condensed novolac type epoxy resin, naphthol-cresol co-condensed novolac type epoxy A novolak type epoxy resin such as fat; an epoxy resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the novolak type epoxy resin via a methylene group; and a methoxyphenyl skeleton having a methylene group on the aromatic nucleus of the novolak type epoxy resin. Epoxy resin having a resin structure bonded through the following structural formula B1

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるフェノールアラルキル型エポキシ樹脂、下記構造式Ｂ２

(In the formula, n is a repeating unit and is an integer of 0 or more.)
A phenol aralkyl type epoxy resin represented by the following structural formula B2

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるナフトールアラルキル型エポキシ樹脂、下記構造式Ｂ３

(In the formula, n is a repeating unit and is an integer of 0 or more.)
A naphthol aralkyl epoxy resin represented by the following structural formula B3

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるビフェニル型エポキシ樹脂、下記構造式Ｂ４

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Biphenyl type epoxy resin represented by the following structural formula B4

（式中、Ｘは、フェニル基、ビフェニル基を表し、ｎは繰り返し単位であり、０以上の整数である。）
で表される芳香族メチレンを結節基とするノボラック型エポキシ樹脂；
前記アラルキル型エポキシ樹脂の芳香核にメトキシナフタレン骨格がメチレン基を介して結合した樹脂構造のエポキシ樹脂、前記アラルキル型エポキシ樹脂の芳香核にメトキシフェニル骨格がメチレン基を介して結合した樹脂構造のエポキシ樹脂；その他テトラメチルビフェニル型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、テトラフェニルエタン型エポキシ樹脂、ジシクロペンタジエン−フェノール付加反応型エポキシ樹脂等が挙げられる。またこれらのエポキシ樹脂は単独で用いてもよく、２種以上を混合してもよい。これらのなかでも、ナフタレン型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂、ビフェニル型エポキシ樹脂、アルコキシ基含有ノボラック型エポキシ樹脂、又はアルコキシ基含有アラルキル型エポキシ樹脂が、難燃性や誘電特性に優れる点から特に好ましい。

(In the formula, X represents a phenyl group or a biphenyl group, n is a repeating unit, and is an integer of 0 or more.)
A novolak-type epoxy resin having a nodule group of aromatic methylene represented by:
Epoxy resin having a resin structure in which a methoxynaphthalene skeleton is bonded to the aromatic nucleus of the aralkyl epoxy resin via a methylene group, and an epoxy having a resin structure in which the methoxyphenyl skeleton is bonded to the aromatic nucleus of the aralkyl epoxy resin via a methylene group Resin; Others include tetramethylbiphenyl type epoxy resin, triphenylmethane type epoxy resin, tetraphenylethane type epoxy resin, dicyclopentadiene-phenol addition reaction type epoxy resin and the like. Moreover, these epoxy resins may be used independently and may mix 2 or more types. Among these, naphthalene type epoxy resin, naphthol novolak type epoxy resin, phenol aralkyl type epoxy resin, biphenyl type epoxy resin, alkoxy group containing novolac type epoxy resin, or alkoxy group containing aralkyl type epoxy resin are flame retardant and dielectric. This is particularly preferable from the viewpoint of excellent characteristics.

  As a compounding quantity of the epoxy resin (A) and the phenol resin (B) in the thermosetting resin composition (I) of the present invention, the epoxy resin of the epoxy resin (A) is preferable because the obtained cured product has good characteristics. It is preferable that the amount of the active group in the curing agent containing the phenol resin (B) is 0.7 to 1.5 equivalents with respect to 1 equivalent of the total group.

  Moreover, a hardening accelerator can also be used together suitably with the thermosetting resin composition (I) of this invention as needed. Various curing accelerators can be used, and examples thereof include phosphorus compounds, tertiary amines, imidazoles, organic acid metal salts, Lewis acids, and amine complex salts. In particular, when used as a semiconductor encapsulating material, it is excellent in curability, heat resistance, electrical characteristics, moisture resistance reliability, etc., so that triphenylphosphine is used for phosphorus compounds and 1,8-diazabicyclo is used for tertiary amines. -[5.4.0] -undecene (DBU) is preferred.

Another thermosetting resin composition (II) of the present invention is a thermosetting resin composition containing an epoxy resin (A ′) and a curing agent (B ′) as essential components, the epoxy resin (A ')But,
A plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) have a naphthylmethyl group or antonylmethyl group in the aromatic nucleus of the resin structure (α) bonded through an alkylidene group or an aromatic hydrocarbon structure-containing methylene group. In addition, the resin structure (α) has a resin structure in which 5 to 50 mol% of the phenolic hydroxyl group is naphthylmethyletherified or antonylmethyletherified, and the remaining phenolic hydroxyl group is glycidyletherified. It is characterized by being.

  That is, the epoxy resin (A ′) in the thermosetting resin composition (II) is obtained by epoxidizing the phenol resin (B) constituting the thermosetting resin composition (I) with epihalohydrin. And having a basic skeleton in common with the phenol resin (B). Therefore, as in the case of the phenol resin (B), the aromatic nucleus of the resin itself can be enhanced and the fluidity of the resin itself is maintained, and the affinity with inorganic fillers such as silica in semiconductor sealing material applications In addition, the coefficient of thermal expansion when cured is lowered, and the moisture resistance reliability and flame retardancy are remarkably improved. In the present invention, such an epoxy resin (A ′) is the novel epoxy resin of the present invention.

  Here, the content ratio of the naphthylmethyl group or anthonylmethyl group is the content of the naphthylmethyl group or anthonylmethyl group directly bonded to the aromatic nucleus of the resin structure (α) in the phenol resin (B), which is the raw material. Specifically, when the total number of aromatic nuclei resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph) is 100, the total number of naphthylmethyl groups or anthonymethyl groups is 5 to 150. It is preferable from the point that the balance between moisture resistance reliability and flame retardancy is further improved, and 5 to 100 is particularly high since the effect of improving curability, moldability, moisture resistance reliability, and flame retardancy is high. preferable. Furthermore, being in the range of 5 to 80 is preferable because it is excellent in the affinity of the filler such as silica and the impregnation property to the glass substrate, and the effect of the present invention is remarkable, and in particular, in the range of 5 to 60. It is preferable.

Here, in the raw material phenol resin (B), the phenolic hydroxyl group of the resin structure (α) is directly bonded to the naphthyl methyl etherified or antonyl methyl etherified aromatic nucleus of the resin structure (α). The content of the naphthylmethyl group or anthonylmethyl group is as described above. Specifically, the content can be confirmed by the following method from the C ¹³ -NMR analysis result of the epoxy resin (A ′). .

That is, in the C ¹³ -NMR chart of the epoxy resin (A ′), the integral value of the methyl ether peak of naphthyl methyl ether or anthony methyl ether is the integral of the peak of the carbon atom to which the oxygen atom in the phenoxy skeleton is bonded. From the ratio divided by the value, that is, the result of the following formula 3, the ratio in which the phenolic hydroxyl group of the resin structure (α) in the raw material phenol resin (B) is converted to naphthyl methyl ether or antonyl methyl ether can be derived.
(Formula 3)
(Integral value of methyl ether peak of naphthyl methyl ether or antonyl methyl ether) / (Integral value of carbon peak to which oxygen atom in phenoxy skeleton is bonded) × 100 (%)

Next, the content of the naphthylmethyl group or antonylmethyl group directly bonded to the aromatic nucleus of the resin structure (α) in the raw material phenol resin (B), that is, due to the phenolic hydroxyl group-containing aromatic skeleton (ph) The total number of naphthylmethyl groups or antonylmethyl groups when the total number of aromatic nuclei to be taken as 100 can be calculated by the following method.
<Method for Deriving Total Number of Nuclear-Substituted Naphthylmethyl Group or Antonylmethyl Group>
In the C ¹³ -NMR chart of the epoxy resin (A ′), when the integrated value of the peak of the carbon atom to which the oxygen atom in the phenoxy skeleton is bonded is 1.0, the value calculated by the following formula 4 is multiplied by 100 It becomes the value.
(Formula 4)
[{(Integral ratio of carbon atom to which oxygen atom in phenoxy skeleton is not bonded to peak derived from naphthalene nucleus or anthracene nucleus) -5.0} / (number of carbon atoms constituting naphthalene nucleus or anthracene nucleus)]- Integral ratio of methyl ether peaks of naphthyl methyl ether or antonyl methyl ether

  Thus, the epoxy resin (A ′) in the thermosetting resin composition (II) is a glycidyloxy group, a naphthylmethyl group or an antonylmethyl group-containing aromatic having a naphthylmethyl group or an antonylmethyl group in an aromatic nucleus. Skeletal structure (hereinafter, this structural site is abbreviated as “aromatic skeleton (Ep1)”), and glycidyloxy group, naphthylmethyl group or antonylmethyl group that does not have naphthylmethyl group or antonylmethyl group in the aromatic nucleus An aromatic skeleton (hereinafter, this structural part is abbreviated as “aromatic skeleton (Ep2)”) in the resin structure, and these structural parts are knotted by the methylene group nodule group (X). It has a resin structure.

  Here, examples of the aromatic skeleton (Ep1) include those represented by the following structural formulas Ep1-1 to Ep1-13.

ここで、「Ｚ」は、グリシジルオキシ基、又は、ナフチルメチル基若しくはアントニルメチル基を表し、また、上掲した構造のうちナフタレン骨格上に他の構造部位との結合位置を二つ以上有するものは、それらの結合位置は同一核上であってもよいし、或いは、それぞれ異核上にあってもよい。

Here, “Z” represents a glycidyloxy group, a naphthylmethyl group or an antonylmethyl group, and has two or more bonding positions with other structural sites on the naphthalene skeleton among the structures listed above. As for thing, those bond positions may be on the same nucleus, or may be on different nuclei.

  In the present invention, among these, the structure represented by the structural formula Ep1-1 is preferable in terms of low viscosity and excellent curability, heat resistance, and moisture resistance and solder resistance. Moreover, as represented by the structural formula Ep1-4, those having a methyl group in the phenol skeleton are preferable because the effects of improving heat resistance and moisture and solder resistance are remarkable.

ここで、「Ｚ」は、グリシジルオキシ基、又は、ナフチルメチル基若しくはアントニルメチル基を表し、また、上掲した構造のうちナフタレン骨格上に他の構造部位との結合位置を二つ以上有するものは、それらの結合位置は同一核上であってもよいし、或いは、それぞれ異核上にあってもよい。

Here, “Z” represents a glycidyloxy group, a naphthylmethyl group or an antonylmethyl group, and has two or more bonding positions with other structural sites on the naphthalene skeleton among the structures listed above. As for thing, those bond positions may be on the same nucleus, or may be on different nuclei.

  In the present invention, among these, the structure of the structural formula Ep1-14 is preferable in that it has low viscosity and is excellent in curability, heat resistance, and moisture resistance and solder resistance. Further, those having a methyl group in the phenol skeleton, as represented by the structural formulas Ep1-15, Ep1-20, and Ep1-22, are preferable because the effects of improving heat resistance and moisture and solder resistance are remarkable.

  On the other hand, the glycidyloxy group-containing aromatic skeleton (Ep2) having no naphthylmethyl group or antonylmethyl group in the aromatic nucleus is specifically represented by the following structural formulas Ep2-1 to Ep2-17. An aromatic hydrocarbon group formed from phenol, naphthol, and compounds having an alkyl group as a substituent on these aromatic nuclei is preferable from the viewpoint of excellent heat resistance and moisture and solder resistance.

ここで、「Ｚ」は、グリシジルオキシ基、又は、ナフチルメチル基若しくはアントニルメチル基を表し、また、上掲した構造のうちナフタレン骨格上に他の構造部位との結合位置を二つ以上有するものは、それらの結合位置は同一核上であってもよいし、或いは、それぞれ異核上にあってもよい。

Here, “Z” represents a glycidyloxy group, a naphthylmethyl group or an antonylmethyl group, and has two or more bonding positions with other structural sites on the naphthalene skeleton among the structures listed above. As for thing, those bond positions may be on the same nucleus, or may be on different nuclei.

  In the present invention, among these, Ep2-1 is preferable from the viewpoint of excellent curability, and Ep2-4 is preferable from the viewpoint of moisture resistance and solder resistance.

  Next, the methylene group nodule group (X) in the resin structure of the epoxy resin (A ′) is the structure X1 to X5 exemplified in the phenol resin (B) in the thermosetting resin composition (I). The thing of the structure represented is mentioned.

  When the epoxy resin (A ′) used in the present invention is composed of the structural units represented by the above structural formula, that is, the structural portion (Ep1) represented by the structural portions Ep1-1 to Ep1-22, and the structure The structural portion (Ep2) represented by the portion Ep2-1 to Ep1-17 has a resin structure in which the aromatic skeleton (Ph1) or the aromatic skeleton (Ph2) is bonded via the methylene nodule group (X). In such a case, these forms of bonding may take any combination. Here, 5 to 50 mol% of the total number of Z in the structural site (Ep1) and the structural site (Ep2) is a naphthylmethyl group or an antonylmethyl group, and the remainder is a glycidyl group.

  The molecular structure of the epoxy resin (A ′) composed of such constituent parts is as follows: the aromatic skeleton (Ep1) is “Ep1”, the aromatic skeleton (Ep2) is “Ep2”, and the methylene nodule group (X) Is represented by “X”, the structural moiety represented by the following partial structural formulas E1 and E2

を繰り返し単位とするランダム共重合体、若しくはブロック共重合体、Ｅ２を繰り返し単位とする重合体ブロックの分子鎖中にＥ１が存在する重合体、或いは、
下記構造式Ｅ３〜Ｅ８

A random copolymer having a repeating unit or a block copolymer, a polymer having E1 in the molecular chain of a polymer block having a repeating unit of E2, or
Following structural formulas E3-E8

で表される構造部位を分岐点として樹脂構造中に有する重合体、或いは、これら自体を繰り返し単位とする重合体であって、その樹脂構造の末端に下記構造式Ｅ９又はＥ１０

A polymer having a structural site represented by the following formula in the resin structure as a branch point, or a polymer having these as repeating units, and having the following structural formula E9 or E10 at the end of the resin structure

で表される構造を有するものが挙げられる。

What has the structure represented by these is mentioned.

  In this invention, since it has such a characteristic chemical structure, the aromatic content rate in molecular structure becomes high, and it can provide the heat resistance and flame retardance which were excellent in hardened | cured material. In particular, the aromatic nucleus constituting the aromatic skeleton (Ep1) or the aromatic skeleton (Ep2) which is the basic skeleton of the resin structure of the epoxy resin (A ′) of the present invention is composed of a phenyl group or an alkyl-substituted phenyl group However, the improvement effect of moisture resistance and solder resistance is large and preferable. By comprising a phenyl group or an alkyl-substituted phenyl group, toughness is brought to the cured product, and the condensed polycyclic skeleton arranged as a side chain develops low viscosity, thus improving adhesion with low thermal expansion. In addition to drastically improving moisture resistance and solder resistance, flame resistance can be improved.

  In the epoxy resin, the naphthylmethyl group or antonylmethyl group present in the aromatic skeleton (Ep1) has the following structural formula (1):

又は下記構造式（２）

Or the following structural formula (2)

で表されるように多重化した構造を有するものであってもよい。ここで、上記構造式（１）又は構造式（２）は、その平均が０〜５の値を採りうるが、本発明では優れた難燃性を発現する点から多重化していないもの、即ちｎが０のものが好ましい。

It may have a multiplexed structure as represented by Here, the structural formula (1) or the structural formula (2) may take an average value of 0 to 5, but is not multiplexed in the present invention because it exhibits excellent flame retardancy, n is preferably 0.

  Furthermore, as a structural site | part couple | bonded through the said methylene group etc. (X), the alkoxy group containing aromatic hydrocarbon group may be included, for example, what is represented by following Structural formula A1-A13 is mentioned. .

  In the present invention, when the epoxy resin (A ′) contains an alkoxy group-containing aromatic hydrocarbon group in the resin structure, the alkoxy group-containing aromatic hydrocarbon group is represented by the structural formula A8. Those having a structure are excellent in the heat resistance and flame retardancy of the cured epoxy resin and can significantly reduce the dielectric loss tangent.

  The epoxy resin (A ′) has an epoxy equivalent of 180 to 500 g / eq. The thing of this range is preferable from the point from which the heat resistance and flame retardance of hardened | cured material become still better. Furthermore, the melt viscosity at 150 ° C. measured with an ICI viscometer is in the range of 0.1 to 50 dPa · s, particularly 0.1 to 15 dPa · s. It is preferable in terms of excellent solderability. The epoxy equivalent is particularly 200 to 400 g / eq. It is preferable that it is in the range from the point that the balance between the moisture resistance solder resistance and flame resistance of the cured product and the curability of the composition is particularly excellent.

  Furthermore, the abundance ratio of the aromatic hydrocarbon group (Ep1) is such that when the total number of the aromatic hydrocarbon group (Ep1) and the aromatic hydrocarbon group (Ep2) is 100, the aromatic hydrocarbon group It is preferable that the total number of (Ep1) is in the range of 5 to 150 from the viewpoint of further improving the flame retardancy and moisture resistance and solder resistance of the cured product, and in particular, the ratio of 5 to 100 is curable. In view of the high effect of improving the moldability, moisture resistance reliability and flame retardancy, it is preferable. Furthermore, being in the range of 5 to 80 is excellent in impregnation into an inorganic filler such as silica or a glass substrate in the composition, and has a low thermal expansion coefficient when cured, resulting in adhesion. Increased moisture resistance and solder resistance has improved dramatically. In particular, by setting it in the range of 5 to 60, moisture resistance and solder resistance are further improved.

  The said epoxy resin (A ') can be manufactured with the manufacturing method explained in full detail below. That is, the method for producing the epoxy resin (A ′) is specifically a method in which the phenol resin (B) in the thermosetting resin composition (I) is produced by the above-described method and then reacted with epihalohydrin. Is mentioned. Specifically, 2 to 10 mol of epihalohydrin is added to 1 mol of phenolic hydroxyl group in the phenol resin (B), and 0.9 to 2.0 mol of basic catalyst is added to 1 mol of phenolic hydroxyl group. The method of making it react at the temperature of 20-120 degreeC for 0.5 to 10 hours, adding batch or adding gradually is mentioned. The basic catalyst may be solid or an aqueous solution thereof. When an aqueous solution is used, it is continuously added and water and epihalohydrins are continuously distilled from the reaction mixture under reduced pressure or normal pressure. The solution may be taken out and further separated to remove water and the epihalohydrins are continuously returned to the reaction mixture.

  In the first batch of epoxy resin production, all of the epihalohydrins used for preparation are new in industrial production, but the subsequent batches are consumed by the reaction with epihalohydrins recovered from the crude reaction product. It is preferable to use in combination with new epihalohydrins corresponding to the amount disappeared. Under the present circumstances, the impurity induced | guided | derived by reaction with epichlorohydrin, water, an organic solvent, etc. may be contained, such as glycidol. At this time, the epihalohydrin used is not particularly limited, and examples thereof include epichlorohydrin, epibromohydrin, β-methylepichlorohydrin, and the like. Of these, epichlorohydrin is preferred because it is easily available industrially.

  Specific examples of the basic catalyst include alkaline earth metal hydroxides, alkali metal carbonates, and alkali metal hydroxides. In particular, alkali metal hydroxides are preferable from the viewpoint of excellent catalytic activity of the epoxy resin synthesis reaction, and examples thereof include sodium hydroxide and potassium hydroxide. In use, these basic catalysts may be used in the form of an aqueous solution of about 10 to 55% by mass, or in the form of a solid. Moreover, the reaction rate in the synthesis | combination of an epoxy resin can be raised by using an organic solvent together. Examples of such organic solvents include, but are not limited to, ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol, 1-propyl alcohol, isopropyl alcohol, 1-butanol, secondary butanol, and tertiary butanol, methyl Examples include cellosolves such as cellosolve and ethyl cellosolve, ethers such as tetrahydrofuran, 1,4-dioxane, 1,3-dioxane and diethoxyethane, and aprotic polar solvents such as acetonitrile, dimethyl sulfoxide and dimethylformamide. These organic solvents may be used alone or in combination of two or more as appropriate in order to adjust the polarity.

  After the reaction product of the epoxidation reaction is washed with water, unreacted epihalohydrin and the organic solvent to be used in combination are distilled off by distillation under heating and reduced pressure. Further, in order to obtain an epoxy resin with less hydrolyzable halogen, the obtained epoxy resin is again dissolved in an organic solvent such as toluene, methyl isobutyl ketone, methyl ethyl ketone, and alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. Further reaction can be carried out by adding an aqueous solution of the product. At this time, a phase transfer catalyst such as a quaternary ammonium salt or crown ether may be present for the purpose of improving the reaction rate. When the phase transfer catalyst is used, the amount used is preferably in the range of 0.1 to 3.0% by mass with respect to the epoxy resin used. After completion of the reaction, the produced salt is removed by filtration, washing with water, etc., and a solvent such as toluene and methyl isobutyl ketone is distilled off under heating and reduced pressure to obtain a high-purity epoxy resin (A ′).

  Here, when the phenol resin (B) used as a raw material is a mixture of two or more kinds, or a resin produced by a method in which step 1 or step 2 is omitted in the production step of the phenol resin (B), Mixed with the resin obtained by the method for producing the phenol resin (B), the modified amount of naphthylmethyl group or antonylmethyl group on the aromatic nucleus, or the naphthylmethyl etherification rate of phenolic hydroxyl group or antonylmethyl When the etherification rate is adjusted, the epoxy resin (A ′) obtained by glycidyl etherification also becomes a mixture of plural kinds.

  In the thermosetting resin composition (II) of the present invention, the epoxy resin (A ′) obtained by the production method of the present invention can be used alone, but other epoxy can be used as long as the effects of the present invention are not impaired. Resin (a ′) can be used in combination. When the other epoxy resin (a ′) is used in combination, the ratio of the epoxy resin (A) of the present invention to the entire epoxy resin component is a ratio of 30% by mass or more, particularly a ratio of 40% by mass or more. It is preferable that

  As the other epoxy resin (a ′) that can be used in combination with the epoxy resin (A ′) of the present invention, various epoxy resins can be used. For example, diglycidyloxynaphthalene, 1,1-bis (2, 7-diglycidyloxynaphthyl) methane, 1- (2,7-diglycidyloxynaphthyl) -1- (2′-glycidyloxynaphthyl) methane and other naphthalene type epoxy resins; bisphenol A type epoxy resins, bisphenol F type epoxy Bisphenol type epoxy resins such as resins; phenol novolac type epoxy resins, cresol novolak type epoxy resins, bisphenol A novolak type epoxy resins, naphthol novolak type epoxy resins, biphenyl novolac type epoxy resins, naphthol-phenol co-condensed novolak type epoxy resins, A novolak epoxy resin such as a phthalol-cresol co-condensed novolak epoxy resin; an epoxy resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the novolac epoxy resin through a methylene group; an aromatic nucleus of the novolac epoxy resin An epoxy resin having a resin structure in which a methoxyphenyl skeleton is bonded to each other via a methylene group;

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるフェノールアラルキル型エポキシ樹脂、下記構造式Ｂ２

(In the formula, n is a repeating unit and is an integer of 0 or more.)
A phenol aralkyl type epoxy resin represented by the following structural formula B2

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるナフトールアラルキル型エポキシ樹脂、下記構造式Ｂ３

(In the formula, n is a repeating unit and is an integer of 0 or more.)
A naphthol aralkyl epoxy resin represented by the following structural formula B3

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるビフェニル型エポキシ樹脂、下記構造式Ｂ４

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Biphenyl type epoxy resin represented by the following structural formula B4

（式中、Ｘは、フェニル基、ビフェニル基を表し、ｎは繰り返し単位であり、０以上の整数である。）
で表される芳香族メチレンを結節基とするノボラック型エポキシ樹脂；前記アラルキル型エポキシ樹脂の芳香核にメトキシナフタレン骨格がメチレン基を介して結合した樹脂構造のエポキシ樹脂、前記アラルキル型エポキシ樹脂の芳香核にメトキシフェニル骨格がメチレン基を介して結合した樹脂構造のエポキシ樹脂；その他テトラメチルビフェニル型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、テトラフェニルエタン型エポキシ樹脂、
ジシクロペンタジエン−フェノール付加反応型エポキシ樹脂等が挙げられる。またこれらのエポキシ樹脂は単独で用いてもよく、２種以上を混合してもよい。

(In the formula, X represents a phenyl group or a biphenyl group, n is a repeating unit, and is an integer of 0 or more.)
A novolak-type epoxy resin having an aromatic methylene as a nodule group; an epoxy resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the aralkyl-type epoxy resin via a methylene group; and the fragrance of the aralkyl-type epoxy resin Epoxy resin with a resin structure in which a methoxyphenyl skeleton is bonded to the nucleus via a methylene group; other tetramethylbiphenyl type epoxy resins, triphenylmethane type epoxy resins, tetraphenylethane type epoxy resins,
Examples include dicyclopentadiene-phenol addition reaction type epoxy resin. Moreover, these epoxy resins may be used independently and may mix 2 or more types.

  Among these, in particular, naphthalene type epoxy resins, naphthol novolak type epoxy resins, phenol aralkyl type epoxy resins, biphenyl type epoxy resins, alkoxy group containing novolac type epoxy resins, or alkoxy group containing aralkyl type epoxy resins are flame retardant and This is particularly preferable from the viewpoint of excellent dielectric properties.

Examples of the curing agent (B ′) used in the thermosetting resin composition (II) of the present invention include various known curing agents for epoxy resins, such as amine compounds, amide compounds, acid anhydride compounds, phenols. Curing agents such as system compounds can be used. Specifically, examples of the amine compound include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, imidazole, BF ₃ -amine complex, and guanidine derivative. Examples of the amide compound include dicyandiamide. And polyamide resins synthesized from dimer of linolenic acid and ethylenediamine. Examples of acid anhydride compounds include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, and tetrahydrophthalic anhydride. Acid, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, etc., and phenolic compounds include phenol novolac resin, cresol novolac resin A novolak resin such as a naphthol novolak resin, a naphthol-phenol co-condensed novolak resin, a naphthol-cresol co-condensed novolak resin; a phenol resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the novolac resin via a methylene group, the novolac A phenol resin containing a methoxy aromatic structure such as a phenol resin having a methoxyphenyl skeleton bonded to the aromatic nucleus of the resin via a methylene group;

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるフェノールアラルキル樹脂、下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Phenol aralkyl resin represented by the following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるナフトールアラルキル樹脂、下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Naphthol aralkyl resin represented by the following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるビフェニル変性フェノール樹脂、下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Biphenyl modified phenolic resin represented by the following structural formula

（式中、ｎは繰り返し単位であり、０以上の整数である。）
で表されるビフェニル変性ナフトール樹脂等のアラルキル型フェノール樹脂；
前記アラルキル型フェノール樹脂の芳香核にメトキシナフタレン骨格がメチレン基を介して結合した樹脂構造のフェノール樹脂、前記アラルキル型フェノール樹脂の芳香核にメトキシフェニル骨格がメチレン基を介して結合した樹脂構造のフェノール樹脂；下記構造式

(In the formula, n is a repeating unit and is an integer of 0 or more.)
Aralkyl type phenolic resins such as biphenyl-modified naphthol resins represented by:
A phenol resin having a resin structure in which a methoxynaphthalene skeleton is bonded to an aromatic nucleus of the aralkyl type phenol resin via a methylene group, and a phenol having a resin structure in which the methoxyphenyl skeleton is bonded to an aromatic nucleus of the aralkyl type phenol resin via a methylene group. Resin; following structural formula

（式中、Ｘは、フェニル基、ビフェニル基を表し、ｎは繰り返し単位であり、０以上の整数である。）で表される芳香族メチレンを結節基とするノボラック樹脂；トリメチロールメタン樹脂、テトラフェニロールエタン樹脂、ジシクロペンタジエンフェノール付加型フェノール樹脂、アミノトリアジン変性フェノール樹脂（メラミンやベンゾグアナミンなどでフェノール核が連結された多価フェノール化合物）等の多価フェノール化合物が挙げられる。

(Wherein X represents a phenyl group or a biphenyl group, n is a repeating unit, and is an integer of 0 or more). A novolak resin having a nodule group represented by an aromatic methylene represented by: trimethylolmethane resin; Examples thereof include polyphenol compounds such as tetraphenylolethane resin, dicyclopentadiene phenol addition type phenol resin, aminotriazine-modified phenol resin (polyhydric phenol compound in which phenol nuclei are linked by melamine, benzoguanamine, etc.).

  Among these, those containing a large amount of an aromatic skeleton in the molecular structure are particularly preferred from the viewpoint of the flame retardant effect. Specifically, phenol novolac resins, cresol novolak resins, novolak resins having aromatic methylene as a nodule, phenol Aralkyl resin, naphthol aralkyl resin, naphthol novolak resin, naphthol-phenol co-condensed novolak resin, naphthol-cresol co-condensed novolak resin, biphenyl-modified phenol resin, biphenyl-modified naphthol resin, methoxy aromatic structure-containing phenol resin, aminotriazine-modified phenol resin Is preferable because of its excellent flame retardancy. In order to improve fluidity, dihydroxyphenols such as resorcin, catechol and hydroquinone, bisphenols such as bisphenol F and bisphenol A, and dihydroxynaphthalenes such as 2,7-dihydroxynaphthalene and 1,6-dihydroxynaphthalene It is preferable to use together.

However, in the present invention, the phenol resin (B) used in the above-described thermosetting resin composition (I) is particularly preferable because the effect of improving heat resistance and moisture resistance and solder resistance is remarkable. Is preferred. Furthermore, the phenol resin is represented by the above Ph1-14, Ph1-15, Ph1-20, and Ph1-22 as a phenolic hydroxyl group-containing aromatic skeleton (Ph1) having a naphthylmethyl group or an antonylmethyl group in an aromatic nucleus. And
It is represented by Ph2-1, Ph2-4 as a phenolic hydroxyl group-containing aromatic skeleton (Ph2) having no naphthylmethyl group or antonylmethyl group in the aromatic nucleus, and the methylene group nodule group (X ), A methylene group and a structure represented by the structural formulas X1, X2, and X5 are preferable from the viewpoint of excellent moisture resistance, solder resistance, and flame retardancy.

  The blending amount of the epoxy resin (A ′) and the curing agent (B ′) in the thermosetting resin composition (II) of the present invention is not particularly limited, but the properties of the resulting cured product are good. From this point, with respect to a total of 1 equivalent of epoxy groups in the epoxy resin containing the epoxy resin (A ′), the amount of active groups in the curing agent (B ′) is 0.7 to 1.5 equivalents. It is preferable that

  Moreover, a hardening accelerator can also be further used together with the thermosetting resin composition (II) of the present invention as needed. Various curing accelerators can be used, and examples thereof include phosphorus compounds, tertiary amines, imidazoles, organic acid metal salts, Lewis acids, and amine complex salts. In particular, when used as a semiconductor encapsulating material, it is excellent in curability, heat resistance, electrical characteristics, moisture resistance reliability, etc., so that triphenylphosphine is used for phosphorus compounds and 1,8-diazabicyclo is used for tertiary amines. -[5.4.0] -undecene (DBU) is preferred.

  In the thermosetting resin compositions (I) and (II) of the present invention described in detail above, the phenol resin (B) in the thermosetting resin composition (I) or the thermosetting resin composition (II). Since the epoxy resin (A ′) has an excellent effect of imparting flame retardancy, the flame retardancy of the cured product is good even if a conventionally used flame retardant is not blended. However, in order to exert a higher degree of flame retardancy, for example, in the field of semiconductor sealing materials, it contains substantially halogen atoms in a range that does not reduce the moldability in the sealing process and the reliability of the semiconductor device. A non-halogen flame retardant (C) may be added.

  The thermosetting resin composition containing such a non-halogen flame retardant (C) is substantially free of halogen atoms. For example, due to a trace amount of impurities of about 5000 ppm or less derived from epihalohydrin contained in an epoxy resin. Halogen atoms may be included.

  Examples of the non-halogen flame retardant (C) include phosphorus flame retardants, nitrogen flame retardants, silicone flame retardants, inorganic flame retardants, and organic metal salt flame retardants. It is not limited at all, and it may be used alone, or a plurality of flame retardants of the same system may be used, or flame retardants of different systems may be used in combination.

  As the phosphorus flame retardant, either inorganic or organic can be used. Examples of the inorganic compounds include red phosphorus, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium phosphates such as ammonium polyphosphate, and inorganic nitrogen-containing phosphorus compounds such as phosphate amide. .

  The red phosphorus is preferably subjected to a surface treatment for the purpose of preventing hydrolysis and the like. Examples of the surface treatment method include (i) magnesium hydroxide, aluminum hydroxide, zinc hydroxide, water A method of coating with an inorganic compound such as titanium oxide, bismuth oxide, bismuth hydroxide, bismuth nitrate or a mixture thereof; (ii) an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, titanium hydroxide; and A method of coating with a mixture of a thermosetting resin such as a phenol resin, (iii) thermosetting of a phenol resin or the like on a coating of an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, or titanium hydroxide For example, a method of double coating with a resin may be used.

  Examples of the organic phosphorus compound include, for example, general-purpose organic phosphorus compounds such as phosphate ester compounds, phosphonic acid compounds, phosphinic acid compounds, phosphine oxide compounds, phosphorane compounds, organic nitrogen-containing phosphorus compounds, and 9,10- Dihydro-9-oxa 10-phosphaphenanthrene = 10-oxide, 10- (2,5-dihydrooxyphenyl) -10H-9-oxa-10-phosphaphenanthrene = 10-oxide, 10- (2,7- Examples thereof include cyclic organophosphorus compounds such as dihydrooxynaphthyl) -10H-9-oxa-10-phosphaphenanthrene = 10-oxide, and derivatives obtained by reacting them with compounds such as epoxy resins and phenol resins.

  The blending amount thereof is appropriately selected according to the type of the phosphorus-based flame retardant, the other components of the thermosetting resin composition, and the desired degree of flame retardancy. For example, an epoxy resin, a curing agent, In 100 parts by mass of the thermosetting resin composition containing all of the non-halogen flame retardant and other fillers and additives, 0.1 to 2.0 mass when red phosphorus is used as the non-halogen flame retardant It is preferable to mix | blend in the range of 0.1 part, and when using an organophosphorus compound, it is preferable to mix | blend similarly in the range of 0.1-10.0 mass part, Especially the range of 0.5-6.0 mass part is preferable. It is preferable to mix with.

  In addition, when using the phosphorous flame retardant, the phosphorous flame retardant may be used in combination with hydrotalcite, magnesium hydroxide, boric compound, zirconium oxide, black dye, calcium carbonate, zeolite, zinc molybdate, activated carbon, etc. Good.

Examples of the nitrogen-based flame retardant include triazine compounds, cyanuric acid compounds, isocyanuric acid compounds, phenothiazines, and the like, and triazine compounds, cyanuric acid compounds, and isocyanuric acid compounds are preferable.

  Examples of the triazine compound include melamine, acetoguanamine, benzoguanamine, melon, melam, succinoguanamine, ethylene dimelamine, melamine polyphosphate, triguanamine, and the like, for example, (i) guanylmelamine sulfate, melem sulfate, sulfate (Iii) co-condensates of phenols such as phenol, cresol, xylenol, butylphenol and nonylphenol with melamines such as melamine, benzoguanamine, acetoguanamine and formguanamine and formaldehyde, (iii) (Ii) a mixture of a co-condensate of (ii) and a phenolic resin such as a phenol formaldehyde condensate, (iv) those obtained by further modifying (ii) and (iii) with paulownia oil, isomerized linseed oil, etc. It is.

  Specific examples of the cyanuric acid compound include cyanuric acid and cyanuric acid melamine.

  The compounding amount of the nitrogen-based flame retardant is appropriately selected depending on the type of the nitrogen-based flame retardant, the other components of the thermosetting resin composition, and the desired degree of flame retardancy. It is preferable to mix in the range of 0.05 to 10 parts by mass in 100 parts by mass of the thermosetting resin composition containing all of the curing agent, non-halogen flame retardant and other fillers and additives. It is preferable to mix | blend in the range of 0.1-5 mass parts.

  Moreover, when using the said nitrogen-type flame retardant, you may use together a metal hydroxide, a molybdenum compound, etc.

The silicone flame retardant is not particularly limited as long as it is an organic compound containing a silicon atom, and examples thereof include silicone oil, silicone rubber, and silicone resin.

The amount of the silicone-based flame retardant is appropriately selected according to the type of the silicone-based flame retardant, the other components of the thermosetting resin composition, and the desired degree of flame retardancy. It is preferable to mix in the range of 0.05 to 20 parts by mass in 100 parts by mass of the thermosetting resin composition in which all of the curing agent, non-halogen flame retardant and other fillers and additives are blended. Moreover, when using the said silicone type flame retardant, you may use a molybdenum compound, an alumina, etc. together.

  Examples of the inorganic flame retardant include metal hydroxide, metal oxide, metal carbonate compound, metal powder, boron compound, and low melting point glass.

  Specific examples of the metal hydroxide include aluminum hydroxide, magnesium hydroxide, dolomite, hydrotalcite, calcium hydroxide, barium hydroxide, zirconium hydroxide and the like.

  Specific examples of the metal oxide include, for example, zinc molybdate, molybdenum trioxide, zinc stannate, tin oxide, aluminum oxide, iron oxide, titanium oxide, manganese oxide, zirconium oxide, zinc oxide, molybdenum oxide, and cobalt oxide. Bismuth oxide, chromium oxide, nickel oxide, copper oxide, tungsten oxide and the like.

  Specific examples of the metal carbonate compound include zinc carbonate, magnesium carbonate, calcium carbonate, barium carbonate, basic magnesium carbonate, aluminum carbonate, iron carbonate, cobalt carbonate, and titanium carbonate.

  Specific examples of the metal powder include aluminum, iron, titanium, manganese, zinc, molybdenum, cobalt, bismuth, chromium, nickel, copper, tungsten, and tin.

  Specific examples of the boron compound include zinc borate, zinc metaborate, barium metaborate, boric acid, and borax.

Specific examples of the low-melting-point glass include, for example, Ceeley (Bokusui Brown), hydrated glass SiO ₂ —MgO—H ₂ O, PbO—B ₂ O ₃ system, ZnO—P ₂ O ₅ —MgO system, P ₂ O ₅ —B ₂ O ₃ —PbO—MgO, P—Sn—O—F, PbO—V ₂ O ₅ —TeO ₂ , Al ₂ O ₃ —H ₂ O, lead borosilicate, etc. The glassy compound can be mentioned.

  The blending amount of the inorganic flame retardant is appropriately selected depending on the kind of the inorganic flame retardant, the other components of the thermosetting resin composition, and the desired degree of flame retardancy. It is preferable to mix in the range of 0.05 to 20 parts by mass in 100 parts by mass of the thermosetting resin composition containing all of the curing agent, non-halogen flame retardant and other fillers and additives. It is preferable to mix in the range of 0.5 to 15 parts by mass.

  Examples of the organic metal salt flame retardant include ferrocene, acetylacetonate metal complex, organic metal carbonyl compound, organic cobalt salt compound, organic sulfonic acid metal salt, metal atom and aromatic compound or heterocyclic compound or an ionic bond or Examples thereof include a coordinated compound.

  The amount of the organometallic salt-based flame retardant is appropriately selected depending on the type of organometallic salt-based flame retardant, the other components of the thermosetting resin composition, and the desired degree of flame retardancy. For example, in 100 parts by mass of the thermosetting resin composition containing all of epoxy resin, curing agent, non-halogen flame retardant and other fillers and additives, it is blended in the range of 0.005 to 10 parts by mass. Is preferred.

  An inorganic filler can be mix | blended with the thermosetting resin composition of this invention as needed. Examples of the inorganic filler include fused silica, crystalline silica, alumina, silicon nitride, and aluminum hydroxide. When particularly increasing the blending amount of the inorganic filler, it is preferable to use fused silica. The fused silica can be used in either a crushed shape or a spherical shape. However, in order to increase the blending amount of the fused silica and suppress an increase in the melt viscosity of the molding material, it is preferable to mainly use a spherical shape. In order to further increase the blending amount of the spherical silica, it is preferable to appropriately adjust the particle size distribution of the spherical silica. The filling rate is preferably higher in consideration of flame retardancy, and particularly preferably 65% by mass or more with respect to the total amount of the thermosetting resin composition. Moreover, when using for uses, such as an electrically conductive paste, electroconductive fillers, such as silver powder and copper powder, can be used.

  Various compounding agents, such as a silane coupling agent, a mold release agent, a pigment, and an emulsifier, can be added to the thermosetting resin composition (I) or (II) of the present invention as necessary.

  The thermosetting resin composition (I) or (II) of the present invention can be obtained by uniformly mixing the above-described components. The thermosetting resin composition of the present invention can be easily made into a cured product by a method similar to a conventionally known method. Examples of the cured product include molded cured products such as laminates, cast products, adhesive layers, coating films, and films.

  Examples of uses in which the thermosetting resin composition (I) or (II) of the present invention is used include semiconductor sealing materials, resin compositions used for laminated boards and electronic circuit boards, resin casting materials, adhesives, Examples thereof include interlayer insulating materials for build-up substrates, coating materials such as insulating paints, etc. Among them, they can be suitably used for semiconductor sealing materials.

  In order to produce the thermosetting resin composition (I) or (II) prepared for a semiconductor encapsulant, each component including a filler is optionally mixed with an extruder, a kneader, and a roll. Or the like, and then mixed sufficiently until uniform to obtain a melt-mixed thermosetting resin composition. At that time, silica is usually used as the filler, but the filling rate is within a range of 30 to 95% by mass of the filler per 100 parts by mass of the thermosetting resin composition (I) or (II). Among them, 70 parts by mass or more is particularly preferable in order to improve flame retardancy, moisture resistance, solder crack resistance, and decrease in linear expansion coefficient. More than the mass part can further enhance the effect. For semiconductor package molding, the composition is molded by casting, using a transfer molding machine, an injection molding machine or the like, and further heated at 50 to 200 ° C. for 2 to 10 hours to form a semiconductor device which is a molded product. There is a way to get it.

  In order to process the thermosetting resin composition (I) or (II) of the present invention into a printed circuit board composition, for example, a prepreg resin composition can be used. Although it can be used without a solvent depending on the viscosity of the thermosetting resin composition, it is preferable to obtain a resin composition for prepreg by varnishing using an organic solvent. As the organic solvent, it is preferable to use a polar solvent having a boiling point of 160 ° C. or lower such as methyl ethyl ketone, acetone, dimethylformamide, etc., and it can be used alone or as a mixed solvent of two or more kinds. The obtained varnish is impregnated into various reinforcing substrates such as paper, glass cloth, glass nonwoven fabric, aramid paper, aramid cloth, glass mat, and glass roving cloth, and the heating temperature according to the solvent type used, preferably 50 By heating at ˜170 ° C., a prepreg that is a cured product can be obtained. The mass ratio of the resin composition and the reinforcing substrate used at this time is not particularly limited, but it is usually preferable that the resin content in the prepreg is 20 to 60% by mass. Moreover, when manufacturing a copper clad laminated board using this thermosetting resin composition, the prepreg obtained as mentioned above is laminated | stacked by a conventional method, copper foil is laminated | stacked suitably, and 1-10 MPa is added. A copper-clad laminate can be obtained by thermocompression bonding at 170 to 250 ° C. for 10 minutes to 3 hours under pressure.

  When the thermosetting resin composition (I) or (II) of the present invention is used as a resist ink, for example, a cationic polymerization catalyst is used as a curing agent for the thermosetting resin composition (II), and further a pigment. , Talc, and filler are added to obtain a resist ink composition, which is then applied to a printed circuit board by a screen printing method and then a resist ink cured product.

  When the thermosetting resin composition (I) or (II) of the present invention is used as a conductive paste, for example, fine conductive particles are dispersed in the thermosetting resin composition and used for an anisotropic conductive film. Examples thereof include a method of forming a composition, a paste resin composition for circuit connection that is liquid at room temperature, and a method of using an anisotropic conductive adhesive.

  As a method for obtaining an interlayer insulating material for a build-up substrate from the thermosetting resin composition (I) or (II) of the present invention, for example, a circuit is formed by using the curable resin composition appropriately blended with rubber, filler or the like. The coated wiring board is applied using a spray coating method, a curtain coating method, or the like, and then cured. Then, after drilling a predetermined through-hole part etc. as needed, it treats with a roughening agent, forms the unevenness | corrugation by washing the surface with hot water, and metal-treats, such as copper. As the plating method, electroless plating or electrolytic plating treatment is preferable, and examples of the roughening agent include an oxidizing agent, an alkali, and an organic solvent. Such operations are sequentially repeated as desired, and a build-up base can be obtained by alternately building up and forming the resin insulating layer and the conductor layer having a predetermined circuit pattern. However, the through-hole portion is formed after the outermost resin insulating layer is formed. In addition, a resin-coated copper foil obtained by semi-curing the resin composition on the copper foil is thermocompression-bonded at 170 to 250 ° C. on a circuit board on which a circuit is formed, thereby forming a roughened surface and plating treatment. It is also possible to produce a build-up substrate by omitting the process.

  The method for obtaining the cured product of the present invention may be based on a general method for curing an epoxy resin composition. For example, the heating temperature condition may be appropriately selected depending on the type and use of the curing agent to be combined. What is necessary is just to heat the composition obtained by the said method in the temperature range about 20-250 degreeC. As a molding method, a general method of an epoxy resin composition is used, and in particular, conditions specific to the thermosetting resin composition (I) or (II) of the present invention are unnecessary.

  Therefore, in the present invention, it is possible to obtain an epoxy resin material that is safe in an environment where high flame retardancy can be expressed without using a halogen-based flame retardant. In addition, its excellent dielectric characteristics can realize high-speed operation speed of high-frequency devices. In addition, the phenol resin (B) or the epoxy resin (A ′) can be easily and efficiently manufactured by the manufacturing method of the present invention, and molecular design according to the target level of performance described above is possible. Become.

Next, the present invention will be specifically described with reference to Examples and Comparative Examples. In the following, “parts” and “%” are based on mass unless otherwise specified. The melt viscosity at 150 ° C., GPC measurement, NMR, and MS spectrum were measured under the following conditions, and the amount of naphthyl methyl ether modified and the amount of naphthyl methyl nucleus substitution of the obtained phenol resin and epoxy resin were as follows. Derived.
1) Melt viscosity at 150 ° C .: in accordance with ASTM D4287 2) Softening point measurement method: JIS K7234
3) GPC:
・ Device: HLC-8220 GPC manufactured by Tosoh Corporation, Column: TSK-GEL G2000HXL + G2000HXL + G3000HXL + G4000HXL manufactured by Tosoh Corporation
・ Solvent: Tetrahydrofuran ・ Flow rate: 1 ml / min
・ Detector: RI
4) C ¹³ -NMR: NMR GSX270 manufactured by JEOL Ltd.
5) MS: Double Density Mass Spectrometer AX505H (FD505H) manufactured by JEOL Ltd.

6) Ratio of phenolic hydroxyl group and naphthylmethyloxy group in the phenol resin Calculated by the following formula 5 from the result of the C ¹³ -NMR chart of the phenol resin.
(Formula 5)
(Integral value of methyl ether peak of naphthyl methyl ether) / (Integral value of carbon peak to which oxygen atom in phenoxy skeleton is bonded) × 100 (%)
7) Total number of nucleus-substituted methylnaphthyl groups with respect to 100 total number of naphthylmethyloxy group-containing aromatic hydrocarbon groups and phenolic hydroxyl group-containing aromatic hydrocarbons. Calculated by the following formula 6 from the results of C ¹³ -NMR chart of phenol resin. The value that is multiplied by 100.
(Formula 6)
[{(Integral ratio of carbon atom to which oxygen atom in phenoxy skeleton is not bonded to peak derived from naphthalene nucleus) -5.0} / (number of carbon atoms constituting naphthalene nucleus)]-Methyl ether of naphthyl methyl ether Integration ratio of peaks

8) Ratio of glycidyl group-containing aromatic hydrocarbon group to naphthylmethyloxy group in epoxy resin Calculated by the following formula 7 from the result of the C ¹³ -NMR chart of the epoxy resin.
(Formula 7)
(Integral value of methyl ether peak of naphthyl methyl ether) / (Integral value of carbon peak to which oxygen atom in phenoxy skeleton is bonded) × 100 (%)

9) Total number of nucleus-substituted methylnaphthyl groups with respect to 100 total number of naphthylmethyloxy group-containing aromatic hydrocarbon groups and glycidyl group-containing aromatic hydrocarbon groups in the epoxy resin

A value obtained by multiplying the value calculated by the following formula 8 by 100 from the result of the C ¹³ -NMR chart of the epoxy resin.
(Formula 8)
[{(Integral ratio of carbon atom to which oxygen atom in phenoxy skeleton is not bonded to peak derived from naphthalene nucleus) -5.0} / (number of carbon atoms constituting naphthalene nucleus)]-Methyl ether of naphthyl methyl ether Integration ratio of peaks

Example 1 [Synthesis of phenol resin (A-1)]
A flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer was subjected to a nitrogen gas purge, while a phenol novolac resin (Showa Polymer “M-70G” softening point 70 ° C., hydroxyl group equivalent 103 g. / Eq.) 103.0 g and methyl isobutyl ketone 103.0 g were charged, and the temperature was raised to 115 ° C. After the temperature elevation, a mixture of 17.7 g of methyl isobutyl ketone and 17.7 g (0.10 mol) of 1-chloromethylnaphthalene was dropped in advance at 115 ° C. over 2 hours. After completion of dropping, the reaction was carried out at 120 ° C. for 1 hour and further at 150 ° C. for 3 hours. Thereafter, the temperature was lowered to room temperature, 17.7 g (0.10 mol) of 1-chloromethylnaphthalene and 17.7 g of methyl isobutyl ketone were charged, and the mixture was stirred at room temperature while blowing nitrogen. After the temperature was raised to 60 ° C., 8.98 g (0.11 mol) of a 49% aqueous sodium hydroxide solution was added dropwise over 1 hour. After completion of the addition, the temperature was raised and the reaction was carried out at 70 ° C. for 2 hours, at 95 ° C. for 2 hours, and further for 5 hours while refluxing. After completion of the reaction, the temperature was set to 80 ° C., and the organic layer was repeatedly washed with 100 g of water four times, and then methyl isobutyl ketone was removed by heating under reduced pressure to obtain a phenol resin (A-1). The resulting phenol resin had a softening point of 63 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometry method, measurement temperature: 150 ° C.) of 1.6 dPa · s, and a hydroxyl group equivalent of 151 g / eq. Met.
The GPC chart of the obtained phenol resin (A-1) is shown in FIG. 1, the C ¹³ -NMR chart is shown in FIG. 2, and the MS spectrum is shown in FIG. The above analysis confirmed the presence of a naphthylmethyloxy group and a methylnaphthyl group corresponding to the general formula (1). The ratio of the phenolic hydroxyl group to the naphthylmethyloxy group (the former: the latter) is 90:10, and the abundance ratio of the methylnaphthyl group directly bonded to the aromatic nucleus is the naphthylmethyloxy group-containing aromatic hydrocarbon group and The total number of nucleus-substituted methylnaphthyl groups was 10 with respect to 100 total phenolic hydroxyl group-containing aromatic hydrocarbons.

Example 2 [Synthesis of phenol resin (A-2)]
A flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer was subjected to a nitrogen gas purge, while a phenol novolac resin (Showa Polymer “M-70G” softening point 70 ° C., hydroxyl group equivalent 103 g. / Eq.) 103.0 g and methyl isobutyl ketone 103.0 g were charged, and the temperature was raised to 115 ° C. After the temperature elevation, a mixed liquid of 30.0 g of methyl isobutyl ketone and 30.0 g (0.17 mol) of 1-chloromethylnaphthalene was dropped in advance at 115 ° C. over 2 hours. After completion of dropping, the reaction was carried out at 120 ° C. for 1 hour and further at 150 ° C. for 3 hours. Thereafter, the temperature was lowered to room temperature, 58.3 g (0.33 mol) of 1-chloromethylnaphthalene and 58.3 g of methyl isobutyl ketone were charged, and the mixture was stirred at room temperature while blowing nitrogen. After the temperature was raised to 60 ° C., 29.4 g (0.36 mol) of a 49% aqueous sodium hydroxide solution was added dropwise over 1 hour. After completion of the addition, the temperature was raised and the reaction was carried out at 70 ° C. for 2 hours, at 95 ° C. for 2 hours, and further for 5 hours while refluxing. After completion of the reaction, the temperature was set to 80 ° C., and the organic layer was repeatedly washed with 100 g of water four times, and then methyl isobutyl ketone was removed under heating and reduced pressure to obtain a phenol resin (A-2). The resulting phenol resin had a softening point of 90 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 3.0 dPa · s, and a hydroxyl group equivalent of 245 g / eq. Met.
The GPC chart of the obtained phenol resin (A-2) is shown in FIG. The ratio of phenolic hydroxyl groups to naphthylmethyloxy groups is 67:33, and the proportion of methylnaphthyl groups directly bonded to aromatic nuclei is naphthylmethyloxy group-containing aromatic hydrocarbon groups and phenolic hydroxyl group-containing aromatic hydrocarbons. The total number of nuclear-substituted methylnaphthyl groups was 17 with respect to the total number of 100.

Example 3 [Synthesis of phenol resin (A-4)]
A flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer was subjected to nitrogen gas purge, while 100.0 g (1.00 mol) of bisphenol F (DIC, purity 99%) and methyl were added. 100.0 g of isobutyl ketone was charged and the temperature was raised to 115 ° C. After the temperature elevation, a mixed liquid of 126.1 g of methyl isobutyl ketone and 126.1 g (0.71 mol) of 1-chloromethylnaphthalene was dropped in advance at 115 ° C. over 2 hours. After completion of dropping, the reaction was carried out at 120 ° C. for 1 hour and further at 150 ° C. for 3 hours to obtain a phenol resin (A-3). Then, 70.0 g of the phenol resin (A-3) and 30.0 g of the phenol resin (A-2) obtained in Example 2 were charged, and the mixture was superheated and mixed at 120 ° C. for 1 hour while performing a nitrogen gas purge. -4) was obtained. The obtained phenol resin had a softening point of 68 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometry method, measurement temperature: 150 ° C.) of 1.6 dPa · s, and a hydroxyl group equivalent of 219 g / eq. Met.
A GPC chart of the obtained phenol resin is shown in FIG. The ratio of the phenolic hydroxyl group to the naphthylmethyloxy group (the former: the latter) is 90:10, and the abundance ratio of the methylnaphthyl group directly bonded to the aromatic nucleus is the naphthylmethyloxy group-containing aromatic hydrocarbon group and The total number of nucleus-substituted methylnaphthyl groups was 55 with respect to the total number of phenolic hydroxyl group-containing aromatic hydrocarbons of 100.

Comparative Example 1 [Synthesis of phenol resin (A-5): phenol resin described in Patent Document 1]
A flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer was charged with 208 g of phenol novolac resin having a softening point of 86 ° C. and 0.5 g of p-toluenesulfonic acid while purging with nitrogen gas. The temperature was raised to ° C. To this, 136 g (1 mol) of p-methylbenzyl methyl ether was added dropwise over 5 hours. On the way, the produced methanol was distilled out of the system, and aging was further performed at the same temperature for 5 hours to complete the reaction. Thereafter, deaeration was performed under reduced pressure of an aspirator to obtain a phenol resin. The softening point of the obtained phenol resin was 91 ° C. (B & R method), the melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) was 3.1 dPa · s, and the hydroxyl equivalent was 174 g / eq. Met.

Comparative Example 2 [Synthesis of phenol resin (A-6): phenol resin described in Patent Document 2]
While performing a nitrogen gas purge to a flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer, 192 g of 1,6-naphthalenediol, dichloromethylnaphthalene (1,5-dichloromethyl compound 95. 6%, other dichloromethyl compounds 3.0%, monochloromethyl compounds 1.4%) and toluene 550 g were weighed and dissolved gradually with stirring, and reacted for 2 hours while refluxing at about 116 ° C. I let you. Then, it heated up to 180 degreeC, distilling toluene, and was made to react as it was for 1 hour. After the reaction, the solvent was removed by distillation under reduced pressure to obtain a phenol resin (A-6). The obtained phenol resin has a hydroxyl group equivalent of 114 g / eq. The softening point was 102 ° C., and the melt viscosity at 150 ° C. was 21.1 dPa · s.

Example 4 [Synthesis of Epoxy Resin (E-1)]
While a nitrogen gas purge was applied to a flask equipped with a thermometer, a dropping funnel, a condenser, and a stirrer, 151 g (1 equivalent of hydroxyl group) of the phenol resin (A-1) obtained in Example 1 and 463 g of epichlorohydrin (5. 0 mol), 139 g of n-butanol and 2 g of tetraethylbenzylammonium chloride were charged and dissolved. After raising the temperature to 65 ° C., the pressure was reduced to an azeotropic pressure, and 90 g (1.1 mol) of a 49% aqueous sodium hydroxide solution was added dropwise over 5 hours. Thereafter, stirring was continued for 0.5 hours under the same conditions. During this time, the distillate distilled by azeotropic distillation was separated with a Dean-Stark trap, the water layer was removed, and the reaction was carried out while returning the oil layer to the reaction system. Thereafter, unreacted epichlorohydrin was distilled off under reduced pressure. 590 g of methyl isobutyl ketone and 177 g of n-butanol were added to the crude epoxy resin thus obtained and dissolved. Further, 10 g of a 10% aqueous sodium hydroxide solution was added to this solution and reacted at 80 ° C. for 2 hours, and then washing with water 150 g was repeated three times until the pH of the washing solution became neutral. Next, the system was dehydrated by azeotropic distillation, and after microfiltration, the solvent was distilled off under reduced pressure to obtain 237 g of an epoxy resin (E-1). The resulting epoxy resin had a softening point of 68 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometry method, measurement temperature: 150 ° C.) of 1.1 dPa · s, and an epoxy equivalent of 236 g / eq. Met.

FIG. 6 shows a GPC chart of the obtained epoxy resin (E-1), FIG. 7 shows a C ¹³ -NMR chart, and FIG. 8 shows an MS spectrum. From the above analysis, the presence of a methylnaphthyl group corresponding to the general formula (1) was confirmed. The ratio of the glycidyl group-containing aromatic hydrocarbon group to the naphthylmethyloxy group (the former: the latter) is 90:10, and the ratio of the methylnaphthyl group directly bonded to the aromatic nucleus is the naphthylmethyloxy group-containing aromatic. The total number of nucleus-substituted methylnaphthyl groups was 10 with respect to the total number of aromatic hydrocarbon groups and aromatic hydrocarbon groups containing alicyclic hydrocarbon groups and glycidyl groups.

Example 5 [Synthesis of Epoxy Resin (E-2)]
The epoxidation reaction was performed in the same manner as in Example 4 except that the phenol resin (A-1) in Example 4 was changed to 245 g (1 equivalent of hydroxyl group) of the phenol resin (A-2) obtained in Example 2. And an epoxy resin (E-2) was obtained. The resulting epoxy resin had a softening point of 76 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometry method, measurement temperature: 150 ° C.) of 2.3 dPa · s, and an epoxy equivalent of 354 g / eq. Met.
A GPC chart of the resulting epoxy resin (E-2) is shown in FIG. The ratio of the glycidyl group-containing aromatic hydrocarbon group to the naphthylmethyloxy group is 67:33, and the presence ratio of the methylnaphthyl group directly bonded to the aromatic nucleus is naphthylmethyloxy group-containing aromatic hydrocarbon group and glycidyl. The total number of methylnaphthyl groups was 17 with respect to the total number of group-containing aromatic hydrocarbon groups of 100.

Example 6 [Synthesis of Epoxy Resin (E-4)]
The epoxidation reaction was performed in the same manner as in Example 4 except that the phenol resin (A-1) in Example 4 was changed to 219 g (1 equivalent of hydroxyl group) of the phenol resin (A-4) obtained in Example 2. And an epoxy resin (E-4) was obtained. The resulting epoxy resin had a softening point of 76 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometry method, measurement temperature: 150 ° C.) of 1.2 dPa · s, and an epoxy equivalent of 313 g / eq. Met.
A GPC chart of the resulting epoxy resin (E-4) is shown in FIG. Further, the ratio of the glycidyl group-containing aromatic hydrocarbon group to the naphthylmethyloxy group or the antonylmethyloxy group is 90:10, and the presence ratio of the methylnaphthyl group directly bonded to the aromatic nucleus is the naphthylmethyloxy group or the anthony group. The total number of methylnaphthyl groups was 55 with respect to the total number of 100 rumethyloxy group-containing aromatic hydrocarbon groups and glycidyl group-containing aromatic hydrocarbon groups.

Comparative Example 3 [Synthesis of Epoxy Resin (E-5): Epoxy Resin described in Patent Document 1]
A flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer was subjected to nitrogen gas purge, while 152 g of the phenol resin (A-5) obtained in Comparative Example 1 and 555 g of epichlorohydrin (6 Mol) was charged and heated to 115 ° C. To this, 105 g (1.05 mol) of 40% aqueous sodium hydroxide solution was added dropwise over 4 hours. During the dropping, the reaction temperature was kept at 100 ° C. or higher, and the azeotropic epichlorohydrin was returned to the system through a Dean-Stark water separator, and water was removed out of the system. The end point of the reaction was defined as the point at which the distillation of water ceased after completion of the dropwise addition of the aqueous sodium hydroxide solution. After completion of the reaction, by-product inorganic salts and the like were filtered off, and excess epichlorohydrin was distilled off from the filtrate under reduced pressure to obtain an epoxy resin (E-5). The resulting epoxy resin had a softening point of 78 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 2.3 dPa · s, and an epoxy equivalent of 251 g / eq. Met.

Comparative Example 4 [Synthesis of Epoxy Resin (E-6): Epoxy Resin described in Patent Document 2]
A flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer was purged with nitrogen gas, and 100 g of the phenol resin (A-6) obtained in Comparative Example 2 and epichlorohydrin 812. 1 g and 162.4 g of diglyme were charged, and under reduced pressure (about 100 mmHg), 71 g of 48% aqueous sodium hydroxide solution was added dropwise at 60 ° C. over 4 hours. During this time, the generated water was removed from the system by azeotropy with epichlorohydrin, and the distilled epichlorohydrin was returned to the system. After completion of dropping, the reaction was continued for another hour. Thereafter, epichlorohydrin and diglyme were distilled off under reduced pressure and dissolved in 348.1 g of methyl isobutyl ketone, and then the salt produced by filtration was removed. Thereafter, 21 g of a 48% aqueous sodium hydroxide solution was added and reacted at 80 ° C. for 2 hours. After the reaction, filtration and washing with water, methyl isobutyl ketone as a solvent was distilled off under reduced pressure to obtain an epoxy resin (E-6). The resulting epoxy resin had a softening point of 62 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometry method, measurement temperature: 150 ° C.) of 1.2 dPa · s, and an epoxy equivalent of 175 g / eq. Met.

Examples 7-12 and Comparative Examples 5-9
As the epoxy resin, the above (E-1) to (E-6), “HP-5000” manufactured by DIC Corporation (epoxy equivalent: 250 g / eq.), “N-655-EXP-S” manufactured by DIC Corporation ( Orthocresol novolac type epoxy resin (epoxy equivalent: 200 g / eq), (A-1) to (A-4) as a phenol resin, and “TD-2131” (phenol novolac resin, hydroxyl group equivalent: 104 g / from DIC Corporation) eq), “XLC-3L” manufactured by Mitsui Chemicals, Inc. (phenol aralkyl resin, hydroxyl group equivalent: 172 g / eq), triphenylphosphine (TPP) as a curing accelerator, spherical silica (FB manufactured by Electrochemical Co., Ltd.) -560), and γ-glycidoxytriethoxyxysilane (Shin-Etsu Chemical Co., Ltd.) as a silane coupling agent "KBM-403"), Carnauba wax (Pearl Wax No. 1-P manufactured by Celalica Noda Co., Ltd.), carbon black, and the composition shown in Tables 1-2, and 90 using two rolls. A target composition was prepared by melt-kneading for 5 minutes at a temperature of 0 ° C. The obtained composition was pulverized with a transfer molding machine at a pressure of 70 kg / cm ² , a column speed of 5 cm / second, and a temperature of 175 ° C. , Molded into a disk shape of φ50mm × 3 (t) mm in 180 seconds, or formed into a rectangle of width 12.7mm, length 127mm, thickness 1.6mm, and further cured at 180 ° C for 5 hours As for the physical properties of the cured product, a test piece was prepared by the following method using the cured product obtained by the transfer molding, and heat resistance, linear expansion coefficient, moisture absorption rate, adhesion, moisture resistance solder resistance, flame resistance Was measured by the following method, and the results are shown in Table 1. In addition, when the transfer molding was carried out, the adhesiveness was a copper foil (manufactured by Furukawa Circuit Foil Co., Ltd., thickness 35 μm, GTS-MP treated) on one side of the mold. The shine surface of the product was used as an adhesive surface with the resin composition), and the test was conducted after further curing at 180 ° C. for 5 hours after forming a rectangle with a width of 12.7 mm, a length of 127 mm, and a thickness of 1.6 mm. Created a piece.

<Curing property>
0.15 g of the epoxy resin composition is placed on a cure plate (made by THERMO ELECTRIC) heated to 175 ° C., and time measurement is started with a stopwatch. Stir the sample evenly with the tip of the rod and stop the stopwatch when the sample breaks into a string and remains on the plate. The time until this sample was cut and remained on the plate was defined as the gel time.
<Heat resistance>
Glass transition temperature: Measured using a viscoelasticity measuring device (solid viscoelasticity measuring device RSAII manufactured by Rheometric Co., double currant lever method; frequency 1 Hz, temperature rising rate 3 ° C./min).
<Linear expansion coefficient>
The cured product was used as a test piece having a width of about 5 mm and a length of about 5 mm, and thermomechanical analysis was performed in a compression mode using a thermomechanical analyzer (TMA: SS-6100 manufactured by Seiko Instruments Inc.). (Measurement weight: 30 mN, temperature increase rate: twice at 3 ° C./min, measurement temperature range: −50 ° C. to 250 ° C.) The linear expansion coefficient at 50 ° C. in the second measurement was evaluated.
<Adhesion>
The cured product was used as a test piece having a width of 10 mm, and the peel strength was measured at a speed of 50 mm / min.
<Hygroscopic rate>
The change in weight (mass%) before and after being treated for 300 hours in a constant temperature and humidity apparatus of 85 ° C./85% RH using the disk-shaped test piece of φ50 mm × 3 (t) mm was measured as the moisture absorption rate.
<Moisture resistance and solder resistance>
The disk-shaped test piece of φ50 mm × 3 (t) mm was left standing in an atmosphere of 85 ° C./85% 168 hours for 168 hours to absorb moisture, and then immersed in a 260 ° C. solder bath for 10 seconds. The presence or absence of cracks was examined.
○: No crack occurred ×: Crack occurred

<Flame retardance>
Using a test piece for evaluation having a width of 12.7 mm, a length of 127 mm, and a thickness of 1.6 mm, a combustion test was performed using five test pieces having a thickness of 1.6 mm in accordance with the UL-94 test method.
* 1: Total burning time of 5 specimens (seconds)
* 2: Maximum burning time (seconds) in one flame contact

表中の略号は以下の通りである。
ＨＰ−５０００：メトキシナフタレン変性ノボラック型エポキシ樹脂（ＤＩＣ株式会社製「ＨＰ−５０００」、エポキシ当量：２５０ｇ／ｅｑ．）
Ｎ−６５５−ＥＸＰ−Ｓ：クレゾールノボラック型エポキシ樹脂（「エピクロンＮ−６５５−ＥＸＰ−Ｓ」、エポキシ当量：２００ｇ／ｅｑ）
ＸＬＣ−３Ｌ：フェノールアラルキル樹脂（三井化学株式会社製「ＸＬＣ−３Ｌ」、水酸基当量１７２ｇ／ｅｑ）
ＴＤ−２１３１：フェノールノボラック型フェノール樹脂（ＤＩＣ(株)製「ＴＤ−２１３１」、水酸基当量：１０４ｇ／ｅｑ）
ＴＰＰ：トリフェニルホスフィン

Abbreviations in the table are as follows.
HP-5000: Methoxynaphthalene-modified novolak type epoxy resin (“HP-5000” manufactured by DIC Corporation, epoxy equivalent: 250 g / eq.)
N-655-EXP-S: Cresol novolac type epoxy resin (“Epiclon N-655-EXP-S”, epoxy equivalent: 200 g / eq)
XLC-3L: Phenol aralkyl resin (“XLC-3L” manufactured by Mitsui Chemicals, hydroxyl equivalent 172 g / eq)
TD-2131: phenol novolac type phenolic resin (“TD-2131” manufactured by DIC Corporation, hydroxyl group equivalent: 104 g / eq)
TPP: Triphenylphosphine

Claims (16)

A thermosetting resin composition comprising an epoxy resin (A) and a phenol resin (B) as essential components,
The phenol resin (B) is
A plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) have a naphthylmethyl group or an antonylmethyl group in the aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group, And,
A thermosetting resin composition comprising a phenol resin having a resin structure in which 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyl etherified or anthonymethyletherified. When the total number of aromatic nuclei resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph) is 100, the phenol resin (B) is contained in a ratio such that the total number of naphthylmethyl groups or anthonymethyl groups is 5 to 150. The thermosetting resin composition according to claim 1. The thermosetting resin composition according to claim 1, wherein the phenol resin (B) has a melt viscosity at 150 ° C. of 0.1 to 50 dPa · s measured with an ICI viscometer. In addition to the epoxy resin (A) and the phenol resin (B) according to claim 1, 2, or 3, further containing an inorganic filler in a proportion of 70 to 95% by mass in the composition. Semiconductor sealing material. A cured product obtained by curing the thermosetting resin composition according to any one of claims 1 to 3. A plurality of phenolic hydroxyl group-containing aromatic skeletons (ph)
The aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group has a naphthylmethyl group or an antonylmethyl group, and
A phenol resin characterized by having a resin structure in which 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyl etherified or antonylmethyletherified. The phenol resin according to claim 6, comprising a total number of naphthylmethyl groups or antonylmethyl groups of 5 to 150 when the total number of phenolic hydroxyl group-containing aromatic skeletons (ph) is 100. The phenol resin according to claim 6 or 7, which has a melt viscosity at 150 ° C measured by an ICI viscometer of 0.1 to 50 dPa · s. A thermosetting resin composition comprising an epoxy resin (A ′) and a curing agent (B ′) as essential components, wherein the epoxy resin (A ′) has a plurality of phenolic hydroxyl group-containing aromatic skeletons (ph). The aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group has a naphthylmethyl group or an antonylmethyl group, and the phenolic hydroxyl group of the resin structure (α) A thermosetting resin composition having a resin structure in which 5 to 50 mol% is naphthylmethyletherified or anthonylmethyletherified and the remaining phenolic hydroxyl group is glycidyletherified. When the total number of aromatic nuclei resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph) of the epoxy resin (A ′) is 100, the total number of naphthylmethyl groups or antonylmethyl groups is 5 to 150. The thermosetting resin composition according to claim 9, comprising: The thermosetting resin composition according to claim 9 or 10, wherein the epoxy resin (A ') has a melt viscosity at 150 ° C measured by an ICI viscometer of 0.1 to 50 dPa · s. In addition to the epoxy resin (A ') and the curing agent (B'), an inorganic filler is further contained in the composition in a proportion of 70 to 95% by mass. A cured product obtained by curing reaction of any one of the thermosetting resin compositions according to claim 9. A plurality of phenolic hydroxyl group-containing aromatic skeletons (ph) have a naphthylmethyl group or an antonylmethyl group in the aromatic nucleus of the resin structure (α) bonded via an alkylidene group or an aromatic hydrocarbon structure-containing methylene group, And,
An epoxy having a resin structure in which 5 to 50 mol% of the phenolic hydroxyl group of the resin structure (α) is naphthylmethyl etherified or anthonylmethyletherified, and the remaining phenolic hydroxyl group is glycidyletherified. resin. The epoxy according to claim 14, wherein the total number of naphthylmethyl groups or anthonylmethyl groups is 5 to 150 when the total number of aromatic nuclei resulting from the phenolic hydroxyl group-containing aromatic skeleton (ph) is 100. resin. The epoxy resin according to claim 14 or 15, wherein the epoxy resin has a melt viscosity at 150 ° C measured by an ICI viscometer of 0.1 to 50 dPa · s.

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