JP2012513085A - 高速イオンを発生させるためのシステム及び方法 - Google Patents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/24—Ion sources; Ion guns using photo-ionisation, e.g. using laser beam
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21G—CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES
- G21G1/00—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes
- G21G1/04—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes outside nuclear reactors or particle accelerators
- G21G1/10—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes outside nuclear reactors or particle accelerators by bombardment with electrically charged particles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H6/00—Targets for producing nuclear reactions
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Abstract
Description
30 ビームユニット
32 パルス
33 プレパルス
34 偏光方向
40 OPT(配向パターン化ターゲット)
41 表面パターン層
42 ナノスケール特徴部
44 配向方向
50 ターゲット台
51 サファイヤ基板
52 冷却ユニット
54 Cu熱交換器ブロック
55 電源
56 バイアス電極
Claims (21)
- 高速イオンのビームを発生させるシステムであって、
共通軸に沿って実質的に均一に配向したナノスケールのパターン特徴部を備えたパターンのパターン化表面を有するターゲット基板と、
高出力コヒーレントの電磁放射ビームを受光して、該電磁放射ビームを前記ターゲット基板のパターン化表面上にフォーカスして、高速イオンの生成を可能にする前記電磁放射ビームと前記ターゲット基板との間の相互作用を生じさせるように構成されたビームユニットとを備えたシステム。 - 前記ビームユニットが、所定のグレージング角で前記ターゲット基板のパターン化表面上に前記電磁放射ビームを向けるように構成されていて、前記グレージング角が、前記相互作用が所望の高運動エネルギーの高速イオンの生成を可能にするのに十分な前記電磁放射ビームと前記ターゲット基板との間の結合を提供するように、前記パターンに従って選択される、請求項1に記載のシステム。
- 前記グレージング角が45°以下である、請求項2に記載のシステム。
- 前記グレージング角が略20°〜40°の範囲内である、請求項3に記載のシステム。
- 前記電磁放射ビームが所定の偏光方向を有し、該偏光方向が、前記相互作用が所望の高運動エネルギーを有する高速イオンの生成を可能にするのに十分な前記電磁放射ビームと前記ターゲット基板との間の結合を提供するように選択された前記偏光方向と前記ターゲット基板のパターン特徴部の配向軸との間の特定の角度を定める、請求項1から4のいずれか一項に記載のシステム。
- 前記偏向方向と前記配向軸との間の角度が0°〜30°の範囲内である、請求項5に記載のシステム。
- 前記偏向方向が前記配向軸と実質的に平行である、請求項5に記載のシステム。
- 前記ターゲット基板のパターン化表面が連続的な表面であり、前記パターンが溝を備える、請求項1から7のいずれか一項に記載のシステム。
- 前記ナノスケールのパターン特徴部が離散的なナノ構造を備える、請求項1から7のいずれか一項に記載のシステム。
- 前記ナノ構造が細長である、請求項9に記載のシステム。
- 前記ナノ構造がフィラメント又はナノワイヤである、請求項10に記載のシステム。
- 前記フィラメントがアイスフィラメントである、請求項11に記載のシステム。
- 前記ターゲット基板が、サファイヤ、シリコン、炭素、又はプラスチック材料のうち少なくとも一つで形成されている、請求項1から11のいずれか一項に記載のシステム。
- 前記ターゲット基板が、水蒸気と基板とを該基板にわたるバイアス電場下において真空チャンバ内で相互作用させることによって、前記バイアス電場に沿って配向したナノスケールの特徴部を形成することによって形成される、請求項1から13のいずれか一項に記載のシステム。
- 前記ビームユニットが、1016W/cm2、1017W/cm2、1018W/cm2、1019W/cm2、1020W/cm2のうち少なくとも一つと略等しいか又はよりも大きい最大強度を有する前記ターゲット基板内のスポットサイズに前記電磁放射ビームをフォーカスするように構成されていて動作する、請求項1から14のいずれか一項に記載のシステム。
- 前記高速イオンが、5MeV、50MeV、100MeV、150MeM、200MeMのうち少なくとも一つと略等しいか又はよりも大きい運動エネルギーを有する、請求項1から15のいずれか一項に記載のシステム。
- 前記高速イオンがプロトンを備える、請求項1から16のいずれか一項に記載のシステム。
- 前記高速イオンが酸素イオンを備える、請求項1から17のいずれか一項に記載のシステム。
- 高出力偏光コヒーレントの電磁放射ビームでターゲット基板を照射するステップを備えた高速イオンを発生させる方法であって、前記ターゲット基板が、共通の配向軸に沿って実質的に均一に配向したナノスケールのパターン特徴部を備えたパターンのパターン化表面を有し、前記パターンと前記電磁放射ビームの少なくとも一つのパラメータとの間の関係が、前記電磁放射ビームと前記ターゲット基板のパターン化表面との間の相互作用が高速イオンビームの発生をもたらすのに十分な前記電磁放射ビームと前記ターゲット基板との間の結合を提供するように、前記電磁放射ビームの偏光方向と前記配向軸との間の角度、及び前記電磁放射ビームの入射角のうち少なくとも一方を選択することによって、最適化される、方法。
- 前記高出力偏光コヒーレントの電磁放射ビームを受光するステップと、前記電磁放射ビームを所望のグレージング角で前記ターゲット基板の表面上に向けるステップとを備えた請求項19に記載の方法。
- 水蒸気と基板とを該基板にわたるバイアス電場下において真空チャンバ内で相互作用させることによって、前記バイアス電場に沿った実質的に一様な所定の方向に配向したナノスケールの特徴部を有するパターンのパターン化基板状のターゲットを形成することによって、前記ターゲット基板を形成するステップを備えた請求項19又は20に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US13853308P | 2008-12-18 | 2008-12-18 | |
US61/138,533 | 2008-12-18 | ||
PCT/IL2009/001201 WO2010070648A1 (en) | 2008-12-18 | 2009-12-20 | A system for fast ions generation and a method thereof |
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JP2012513085A true JP2012513085A (ja) | 2012-06-07 |
JP5591824B2 JP5591824B2 (ja) | 2014-09-17 |
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JP2011541715A Expired - Fee Related JP5591824B2 (ja) | 2008-12-18 | 2009-12-20 | 高速イオンを発生させるためのシステム及び方法 |
Country Status (6)
Country | Link |
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US (1) | US8389954B2 (ja) |
EP (1) | EP2377143B1 (ja) |
JP (1) | JP5591824B2 (ja) |
KR (1) | KR101564360B1 (ja) |
ES (1) | ES2801976T3 (ja) |
WO (1) | WO2010070648A1 (ja) |
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JP2020115138A (ja) * | 2020-03-04 | 2020-07-30 | エイチアイエル アプライド メディカル,リミテッド | イオンビームを提供するシステム及び方法 |
US10847340B2 (en) | 2017-10-11 | 2020-11-24 | HIL Applied Medical, Ltd. | Systems and methods for directing an ion beam using electromagnets |
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JP5684171B2 (ja) * | 2012-02-29 | 2015-03-11 | 株式会社東芝 | レーザイオン源 |
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US10395881B2 (en) * | 2017-10-11 | 2019-08-27 | HIL Applied Medical, Ltd. | Systems and methods for providing an ion beam |
US10039935B1 (en) | 2017-10-11 | 2018-08-07 | HIL Applied Medical, Ltd. | Systems and methods for providing an ion beam |
US9937360B1 (en) * | 2017-10-11 | 2018-04-10 | HIL Applied Medical, Ltd. | Systems and methods for providing an ion beam |
WO2019074497A1 (en) * | 2017-10-11 | 2019-04-18 | Hil Applied Medical, Ltd | SYSTEMS AND METHODS FOR PRODUCING ION BEAM |
US11501943B2 (en) | 2018-07-12 | 2022-11-15 | HIL Applied Medical, Ltd. | Systems and methods for providing a beam of charged particles |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002107494A (ja) * | 2000-09-27 | 2002-04-10 | Central Res Inst Of Electric Power Ind | 核反応の誘起方法および核反応誘起装置 |
JP2002107499A (ja) * | 2000-09-27 | 2002-04-10 | Central Res Inst Of Electric Power Ind | 高エネルギー粒子の発生方法およびこれを利用した放射化分析方法と、高エネルギー粒子発生装置および放射化分析装置 |
US20020090194A1 (en) * | 2000-08-09 | 2002-07-11 | The Regents Of The University Of California | Laser driven ion accelerator |
JP2006226790A (ja) * | 2005-02-16 | 2006-08-31 | Research Foundation For Opto-Science & Technology | 放射性同位体生成装置 |
JP2008107209A (ja) * | 2006-10-25 | 2008-05-08 | Canon Inc | 質量分析用基板、その製造方法および質量分析測定装置 |
JP2009014671A (ja) * | 2007-07-09 | 2009-01-22 | Hamamatsu Photonics Kk | レーザプラズマイオン源用ターゲットおよびレーザプラズマイオン発生装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6512385B1 (en) * | 1999-07-26 | 2003-01-28 | Paul Pfaff | Method for testing a device under test including the interference of two beams |
WO2005054119A2 (en) * | 2003-12-01 | 2005-06-16 | The Board Of Trustees Of The University Of Illinois | Methods and devices for fabricating three-dimensional nanoscale structures |
-
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- 2009-12-20 EP EP09796829.1A patent/EP2377143B1/en active Active
- 2009-12-20 KR KR1020117016627A patent/KR101564360B1/ko active IP Right Grant
- 2009-12-20 ES ES09796829T patent/ES2801976T3/es active Active
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020090194A1 (en) * | 2000-08-09 | 2002-07-11 | The Regents Of The University Of California | Laser driven ion accelerator |
JP2002107494A (ja) * | 2000-09-27 | 2002-04-10 | Central Res Inst Of Electric Power Ind | 核反応の誘起方法および核反応誘起装置 |
JP2002107499A (ja) * | 2000-09-27 | 2002-04-10 | Central Res Inst Of Electric Power Ind | 高エネルギー粒子の発生方法およびこれを利用した放射化分析方法と、高エネルギー粒子発生装置および放射化分析装置 |
JP2006226790A (ja) * | 2005-02-16 | 2006-08-31 | Research Foundation For Opto-Science & Technology | 放射性同位体生成装置 |
JP2008107209A (ja) * | 2006-10-25 | 2008-05-08 | Canon Inc | 質量分析用基板、その製造方法および質量分析測定装置 |
JP2009014671A (ja) * | 2007-07-09 | 2009-01-22 | Hamamatsu Photonics Kk | レーザプラズマイオン源用ターゲットおよびレーザプラズマイオン発生装置 |
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JP2020115137A (ja) * | 2020-03-04 | 2020-07-30 | エイチアイエル アプライド メディカル,リミテッド | イオンビームを提供するシステム及び方法 |
JP2020115138A (ja) * | 2020-03-04 | 2020-07-30 | エイチアイエル アプライド メディカル,リミテッド | イオンビームを提供するシステム及び方法 |
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WO2010070648A1 (en) | 2010-06-24 |
ES2801976T3 (es) | 2021-01-15 |
US8389954B2 (en) | 2013-03-05 |
KR20110106885A (ko) | 2011-09-29 |
KR101564360B1 (ko) | 2015-10-29 |
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US20110248181A1 (en) | 2011-10-13 |
EP2377143A1 (en) | 2011-10-19 |
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