JP2012247379A - Aging device for electron beam irradiation device, electron beam irradiation device, and method of aging electron beam irradiation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To automatically age a cathode electrode, a high-frequency amplifier and an accelerator.SOLUTION: An aging device 200 includes: a parameter storage section 216 that stores a set value table 230; a parameter setting section 250 that gradually changes a set value from an initial value to a rated value based on the set value table; an electric power control section 252 that controls electric power supply processing by an electric power supply section based on the set value changed by the parameter setting section; an error determination section 254 that determines whether at least one of units satisfies a preset error determination condition or not; and a stop control section 256 that performs stop processing of stopping the electric power supply processing by the electric power supply section if it is determined that the error determination condition is satisfied. When the stop processing is performed, the parameter setting section changes the set value of a parameter to any of the set values prior to the set value during performing the stop processing.

Description

  The present invention relates to an aging apparatus for an electron beam irradiation apparatus that irradiates an irradiation object with an electron beam, an electron beam irradiation apparatus, and an aging method for an electron beam irradiation apparatus.

  Conventionally, electron beam irradiation apparatuses (for example, Patent Documents 1 and 2) used in various fields such as sterilization of medical instruments and foods, cross-linking and curing of resins, and removal of lesions such as malignant tumors are known. Yes. Such an electron beam irradiation apparatus includes a cathode electrode and an accelerator in a vacuum chamber maintained in a vacuum state, and emits thermoelectrons from the cathode electrode by supplying power to the cathode electrode. The object is irradiated with acceleration.

  The cathode electrode and the high-frequency amplifier that supplies a high-frequency voltage to the accelerator are consumables and need to be replaced. In this case, the electron beam irradiation device is stopped, the vacuum chamber is opened to the atmosphere, and the cathode electrode and the high-frequency amplifier are replaced.

  When restarting the electron beam irradiation apparatus, first, the vacuum chamber is evacuated by a vacuum pump such as an ion pump. Then, a break-in operation (aging) is performed in which the power applied to the cathode electrode and the high-frequency amplifier is gradually increased from the initial value and brought to the rated value. Only after this aging is completed, the electron beam can be irradiated.

  Conventionally, aging has been performed one by one by a user. Specifically, the user reads the value indicated by the vacuum gauge (pressure gauge) that measures the degree of vacuum in the vacuum chamber, and according to the value, the user determines the current value applied to the cathode electrode from the initial value to the rated value. The voltage or power applied to the high frequency amplifier is gradually increased from the initial value to the rated value. Further, it takes a long time of about one week to perform aging of the cathode electrode, the accelerator, and the high frequency amplifier. Therefore, when aging is performed, not only a complicated operation is forced on the user, but also the user is restrained for a long time.

  Thus, for example, a technique is disclosed in which the voltage of the accelerator applied by the high-frequency amplifier is kept constant, and the amount of current supplied to the cathode electrode is changed from the initial value to the rated value in accordance with the degree of vacuum in the vacuum chamber ( For example, Patent Document 3). In Patent Document 3, for example, if the degree of vacuum is equal to or less than a first predetermined value, the amount of current supplied to the cathode electrode is increased, and if the degree of vacuum is equal to or greater than a second predetermined value that is greater than the first predetermined value, Reduce the amount of current supplied to the cathode electrode.

JP 2001-349998 A JP 2003-139898 A JP 59-6000

  In the technique of Patent Document 3 described above, the amount of current supplied to the cathode electrode is controlled only according to the degree of vacuum, but when a voltage value abnormality such as a cathode electrode or an accelerator, a current value abnormality or the like occurs, It is necessary to stop the aging of the cathode electrode and start aging again from the beginning. Therefore, when any abnormality occurs, aging is further prolonged, and the user has to perform complicated work.

  Moreover, in the technique of the above-mentioned Patent Document 3, there is no mention of a technique for automatically aging a high-frequency amplifier or an accelerator. Since the aging of the high-frequency amplifier and the accelerator takes more than twice the time required for aging of the cathode electrode, even if only the cathode electrode is aged using the technique of Patent Document 3, a longer time is required. Furthermore, the aging of high-frequency amplifiers and accelerators requires the voltage value, pulse repetition rate, and power value to be gradually increased from the initial value to the rated value. Was supposed to be forced.

  Therefore, in view of such problems, the present invention can simplify the user's work and can age not only the cathode electrode but also the high-frequency amplifier and accelerator without restraining the user for a long time. An object of the present invention is to provide an aging apparatus for an electron beam irradiation apparatus, an electron beam irradiation apparatus, and an aging method for the electron beam irradiation apparatus.

  In order to solve the above-described problems, an aging device for an electron beam irradiation apparatus according to the present invention includes an electron gun unit that emits thermoelectrons, an accelerator unit that accelerates thermoelectrons emitted from the electron gun unit, and a high frequency for the accelerator unit. A high-frequency amplifier unit that supplies a voltage of λ, a waveguide unit that connects the accelerator unit and the high-frequency amplifier unit, an electron gun unit and an accelerator unit are connected to the internal space, and thermal electrons accelerated by the accelerator unit are converted into electron beams. And a power supply unit that supplies at least one of voltage and current to at least one of an electron gun unit, an accelerator unit, and a high-frequency amplifier unit. An aging device for an electron beam irradiation device, comprising an electron gun unit A set value of a parameter relating to at least one of a voltage value, a current value, a pulse repetition number of the supplied voltage and a pulse width of the supplied voltage supplied to at least one of the accelerator unit and the high-frequency amplifier unit Parameter storage unit that stores stepwise values from initial value to rated value, and parameter setting that changes setting values stepwise from initial value to rated value among parameter setting values stored in parameter storage unit A power control unit that controls power supply processing by the power supply unit based on the setting value changed by the parameter setting unit, and at least one of the units satisfies a predetermined error determination condition An error determination unit that determines whether or not the error determination unit determines that the error determination condition is satisfied, A stop control unit for executing a stop process for stopping supply of at least one of voltage and current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit by the force supply unit, and setting parameters The unit is characterized in that, when the stop control unit executes the stop process, the parameter setting value is changed to any one of the setting values before the set value when the stop process is executed.

  The parameter setting unit sets a holding time, which is a time for holding the parameter setting value, and when the stop process is executed by the stop control unit, the parameter setting unit starts from the holding time set to any setting value in the previous stage. Also, the holding time may be set short.

  The error determination unit may perform error determination using an error determination condition that discharge has occurred in at least one of the units.

  The error determination unit may determine that discharge has occurred when the degree of vacuum of at least one of the units is equal to or greater than a predetermined threshold.

  The parameter storage unit stores a set value of the first parameter and a set value of the second parameter, which are provided in a plurality of stages from the initial value to the rated value, in association with each other. A plurality of the setting values of the two parameters are associated with each other, and the parameter setting unit maintains the setting value of the second parameter and sets the first parameter corresponding to the setting value of the second parameter. The step of changing the setting value of the first parameter stepwise from the lowest setting value to the highest setting value among the setting values is stepwise until the setting value of the second parameter changes from the initial value to the rated value. May be repeated.

  The parameter setting unit determines whether the error is determined by the error determination unit, and maintains the setting value of the second parameter at the setting value at the time of execution of the stop process when the stop process is executed by the stop control unit. The setting value of the first parameter may be changed to the lowest setting value among the setting values of the first parameter corresponding to the maintained setting value of the second parameter.

  The parameter may be electric power supplied to the electron gun unit.

  The electron gun unit includes a cathode electrode that emits thermoelectrons, and a grid that controls the emission of thermoelectrons from the cathode electrode, and the power control unit includes a current supplied to the cathode electrode, The voltage supplied to the grid, the pulse width of the voltage supplied to the electron gun unit, the voltage supplied to the accelerator unit through the high frequency amplifier unit, and the pulse width of the voltage supplied to the accelerator unit are maintained at predetermined values. The parameter may be the pulse repetition number of the voltage supplied to the high frequency amplifier unit.

  The first parameter may be a pulse repetition number of the voltage supplied to the high frequency amplifier unit, and the second parameter may be a voltage supplied to the high frequency amplifier unit.

  The power control unit causes the power supply unit to maintain a voltage supplied to the accelerator unit through the high frequency amplifier unit and a pulse width of the voltage at a predetermined value, and the first parameter is set to the accelerator unit through the high frequency amplifier unit. The number of pulse repetitions of the voltage to be supplied, and the second parameter may be power supplied to the accelerator unit through the high frequency amplifier unit.

  The power control unit causes the power supply unit to maintain the power supplied to the accelerator unit through the high frequency amplifier unit and the pulse width of the power at a predetermined value, and the first parameter is set to the accelerator unit through the high frequency amplifier unit. The pulse repetition number of the voltage to be supplied, and the second parameter may be a voltage supplied to the accelerator unit through the high frequency amplifier unit.

  The power control unit causes the power supply unit to maintain the voltage and power supplied to the accelerator unit through the high-frequency amplifier unit at a predetermined value, and the first parameter is the voltage supplied to the accelerator unit through the high-frequency amplifier unit. The number of pulse repetitions, and the second parameter may be a pulse width of a voltage supplied to the accelerator unit through the high frequency amplifier unit.

  In order to solve the above problems, an electron beam irradiation apparatus according to the present invention includes an electron gun unit that emits thermoelectrons, an accelerator unit that accelerates thermoelectrons emitted from the electron gun unit, and a high-frequency voltage applied to the accelerator unit. The high-frequency amplifier unit to be supplied, the waveguide unit connecting the accelerator unit and the high-frequency amplifier unit, the electron gun unit and the accelerator unit are connected to the internal space, and thermionic electrons accelerated by the accelerator unit are scanned as electron beams. In addition, a scan horn unit that is taken out into an atmospheric pressure atmosphere, a power supply unit that supplies at least one of voltage and current to at least one of an electron gun unit, an accelerator unit, and a high-frequency amplifier unit, and aging for aging each unit And an electron beam irradiation device comprising a control means. The aging control means includes at least one of a voltage value, a current value, a pulse repetition number of the supplied voltage, and a pulse width of the supplied voltage supplied to at least one of the electron gun unit, the accelerator unit, and the high frequency amplifier unit. A parameter storage unit that stores a parameter setting value related to one as a stepwise value from the initial value to the rated value, and a step from the initial value to the rated value among the parameter setting values stored in the parameter storage unit In at least one of the units, a parameter setting unit that changes the setting value automatically, a power control unit that controls power supply processing by the power supply unit based on the setting value changed by the parameter setting unit, An error determination unit for determining whether or not a preset error determination condition is satisfied, and an error determination condition When the error determination unit determines that it is satisfied, the power supply unit performs a stop control to stop the supply of at least one of the voltage and current to at least one of the electron gun unit, the accelerator unit, and the high frequency amplifier unit The parameter setting unit, when the stop control unit executes the stop process, sets the parameter setting value to any one of the setting values before the set value when the stop process is executed. It is characterized by changing to.

  In order to solve the above-described problems, an aging method for an electron beam irradiation apparatus according to the present invention includes an electron gun unit that emits thermoelectrons, an accelerator unit that accelerates thermoelectrons emitted from the electron gun unit, and a high frequency in the accelerator unit. A high-frequency amplifier unit that supplies a voltage of λ, a waveguide unit that connects the accelerator unit and the high-frequency amplifier unit, an electron gun unit and an accelerator unit are connected to the internal space, and thermal electrons accelerated by the accelerator unit are converted into electron beams. And a power supply unit that supplies at least one of voltage and current to at least one of an electron gun unit, an accelerator unit, and a high-frequency amplifier unit. An aging method for an electron beam irradiation apparatus, comprising an electron gun unit A set value of a parameter relating to at least one of a voltage value, a current value, a pulse repetition number of the supplied voltage and a pulse width of the supplied voltage supplied to at least one of the accelerator unit and the high-frequency amplifier unit , Stored as stepwise values from the initial value to the rated value, and among the stored parameter setting values, the step of changing the setting value stepwise from the initial value to the rated value, and the changed setting Supplying at least one of voltage and current to at least one of an electron gun unit, an accelerator unit, and a high-frequency amplifier unit to the power supply unit based on the value; and in at least one unit of each unit Determining whether or not a preset error determination condition is satisfied; and If it is determined that the determination condition is satisfied, a stop process for stopping supply of at least one of a voltage and a current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit is executed, and the stop process is executed. In this case, the method includes a step of changing the setting value of the parameter to any one of the setting values before the setting value at the time of execution of the stop process.

  According to the present invention, the user's work can be simplified, and not only the cathode electrode but also the high frequency amplifier and the accelerator can be aged without restraining the user for a long time.

It is an external appearance perspective view of an electron beam irradiation apparatus. It is the figure which looked at the electron beam irradiation apparatus from the Z-axis direction in FIG. It is explanatory drawing for demonstrating the specific structure of a cathode power supply and an electron gun unit. It is the functional block diagram which showed the schematic function of the aging apparatus. It is explanatory drawing for demonstrating the setting value table memorize | stored in the parameter memory | storage part. It is explanatory drawing for demonstrating the setting value table memorize | stored in the parameter memory | storage part. It is explanatory drawing for demonstrating the setting value table memorize | stored in the parameter memory | storage part. It is explanatory drawing for demonstrating the setting value table memorize | stored in the parameter memory | storage part. It is explanatory drawing for demonstrating the setting value table memorize | stored in the parameter memory | storage part. It is explanatory drawing for demonstrating the setting value table memorize | stored in the parameter memory | storage part. It is a flowchart for demonstrating the flow of a specific process of the aging method using the aging apparatus concerning this embodiment. It is a flowchart for demonstrating the flow of a specific process of the aging method using the aging apparatus concerning this embodiment. It is explanatory drawing for demonstrating the GUI screen for aging and the screen which shows an aging state. It is explanatory drawing for demonstrating the GUI screen for aging and the screen which shows an aging state.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The dimensions, materials, and other specific numerical values shown in the embodiments are merely examples for facilitating the understanding of the invention, and do not limit the present invention unless otherwise specified. In the present specification and drawings, elements having substantially the same function and configuration are denoted by the same reference numerals, and redundant description is omitted, and elements not directly related to the present invention are not illustrated. To do.

(Electron beam irradiation apparatus 100)
1 is an external perspective view of the electron beam irradiation apparatus 100, and FIG. 2 is a view of the electron beam irradiation apparatus 100 viewed from the Z-axis direction in FIG. In FIG. 1, a support mechanism for supporting the electron beam irradiation apparatus 100 is omitted for easy understanding.

  As shown in FIGS. 1 and 2, the electron beam irradiation apparatus 100 includes a cathode power source (power supply unit) 104, an electron gun unit 110, a high frequency unit 112, a waveguide unit 114, and a prebuncher unit 116. , An accelerator unit 118, a scan horn unit 120, and an aging device 200. The electron gun unit 110, the prebuncher unit 116, the accelerator unit 118, and the scan horn unit 120 are continuous with an internal space (vacuum chamber). The internal space is in a high vacuum state by a vacuum pump 102 such as an ion pump. To an ultra-high vacuum state (for example, 10E-5 Pa or less).

  In the electron beam irradiation apparatus 100, the thermoelectrons emitted from the electron gun unit 110 are accelerated by the prebuncher unit 116 and the accelerator unit 118, pass through the scan horn unit 120, and are irradiated by the transfer apparatus 10. Irradiation toward W in the Y-axis direction in FIG. Hereinafter, each functional unit of the electron beam irradiation apparatus 100 will be described in detail.

(Electron gun unit 110)
The electron gun unit 110 is, for example, a triode electron gun, and heats a cathode electrode with electric power supplied from a cathode power supply (AC power supply) 104 and applies a high-voltage grid pulse voltage (pulse voltage applied from the cathode power supply 104 in a pulsed manner). The electron beam is emitted by the extraction voltage.

  FIG. 3 is an explanatory diagram for explaining specific configurations of the cathode power supply (power supply unit) 104 and the electron gun unit 110. As shown in FIG. 3A, the cathode power source 104 includes a heater power source 104a, a grid bias power source (GB) 104b, a grid pulse power source (GP) 104c, and a cathode pulse power source 104d. Power is supplied to the gun unit 110. The electron gun unit 110 includes a cathode electrode 150, a grid 152, and an anode electrode 154.

  The cathode electrode 150 is constituted by, for example, a Ba (barium) impregnation type, and a filament such as tungsten is embedded in a Ba material. A current (for example, AC 50 Hz, 10 V) is supplied to the filament of the cathode electrode 150 from the heater power supply 104a of the cathode power supply 104, and the filament is heated by this current. Then, the Ba material is heated by the filament, and thermoelectrons are generated on the surface of the Ba material. Then, thermoelectrons are pulsed by a grid pulse voltage (extraction voltage) applied to the grid 152 by a grid pulse power source 104c described later and a high voltage pulse voltage between the cathode electrode 150 and the anode electrode 154 by the cathode pulse power source 104d. The emitted thermal electrons emitted in a pulse form an electron beam.

  The grid 152 is composed of, for example, mesh (mesh) electrodes, and controls the emission of thermoelectrons by the cathode electrode 150. Specifically, one end of the grid 152 is connected to the grid bias power source 104b and the grid pulse power source 104c, and the other end is electrically floating (floating).

  The grid bias power supply 104b always applies a negative bias voltage (for example, DC-10V) for suppressing extraction of electrons to the grid 152. Further, the grid pulse power supply 104c applies a positive voltage (for example, + 22V) to the grid 152 in a pulsed manner. Then, electrons are extracted from the surface of the Ba material of the cathode electrode 150 only while a positive voltage is applied to the grid 152.

  The anode electrode 154 initially accelerates the electron beam emitted from the cathode electrode 150. As shown in FIG. 3A, the cathode pulse power supply 104d of the cathode power supply 104 has one terminal connected to the grid pulse power supply 104c side and the other terminal connected to the ground (0 V) through the anode electrode 154. . Therefore, when the cathode pulse power supply 104d applies a voltage of, for example, −30 kV, the heater power supply 104a, the grid bias power supply 104b, and the grid pulse power supply 104c float (float) at their own voltages with respect to −30 kV. .

  Then, since the anode electrode 154 is at 0 V, a potential difference (30 kV) is generated between the cathode electrode 150 and the anode electrode 154, and the electrons extracted by the cathode electrode 150 reach the anode electrode 154.

  More specifically, as shown in FIG. 3B, from time t0 to time t1 when a negative bias voltage (indicated by GB voltage in FIG. 3B) is applied to the grid 152 by the grid bias power supply 104b. In the meantime, extraction of electrons from the cathode electrode 150 is suppressed. At time t1, when a positive voltage (indicated by the GP voltage in FIG. 3B) is applied by the grid pulse power supply 104c, the difference between the positive voltage and the negative bias voltage (−10V + 22V = 12V) is effective. Therefore, electrons are drawn from the cathode electrode 150. Therefore, the time for extracting electrons from the cathode electrode 150 and the number of pulse repetitions are controlled by controlling the time (time t1 to t2) during which the grid pulse power supply 104c applies a positive voltage. Here, the extraction time of electrons in the rated state is 2 μs, for example, and the pulse repetition number is 500 pps (pulse per second), for example.

  The cathode pulse power supply 104d applies a voltage to the heater power supply 104a, the grid bias power supply 104b, and the grid pulse power supply 104c in synchronization with the time (time t1 to t2) when the grid pulse power supply 104c applies a positive voltage. Then, the electron beam drawn from the cathode electrode 150 by the grid pulse power supply 104 c is initially accelerated by the anode electrode 154 and enters the prebuncher unit 116. In other words, the electron beam is incident on the prebuncher unit 116 only during the time when the grid pulse power source 104c applies a positive voltage and the time when the cathode pulse power source 104d applies a voltage.

(High-frequency unit 112, waveguide unit 114)
Referring back to FIGS. 1 and 2, the high frequency unit 112 includes a high frequency amplifier unit 112a configured by a klystron or the like, and a high frequency power source (power supply unit) 112b that supplies power to the high frequency amplifier unit 112a. Then, for example, 3 GHz pulsed high frequency power corresponding to the S band is supplied to the prebuncher unit 116 and the accelerator unit 118 through the waveguide unit 114. The waveguide unit 114 supplies the high-frequency voltage amplified and supplied from the high-frequency amplifier unit 112a to the accelerator unit 118 through the RF windows 114a and 114b made of ceramic or the like. An insulating gas such as sulfur hexafluoride (SF ₆ ) is filled between the RF window 114a and the RF window 114b in the waveguide unit 114, and is guided by the voltage amplified and output by the high-frequency amplifier unit 112a. The situation where the wave tube unit 114 is discharged is avoided. The RF windows 114a and 114b serve as boundaries that separate the SF ₆ and the vacuum.

(Prebuncher unit 116)
The prebuncher unit 116 is provided between the electron gun unit 110 and the accelerator unit 118, and is connected to the high frequency amplifier unit 112a through the waveguide unit 114. The prebuncher unit 116 bunches the electron beam incident from the electron gun unit 110 (density compression (velocity modulation)) and sends the electron beam to the accelerator unit 118. More specifically, a high-frequency electric field is formed in the prebuncher unit 116 by a high-frequency voltage supplied from the high-frequency amplifier unit 112a, and the electron beam that has passed through the prebuncher unit 116 is bunched to be an accelerator unit 118. Is incident on. By bunching the electron beam with the pre-buncher unit 116, dispersion of the energy of the electron beam accelerated by the accelerator unit 118 can be reduced, and the uniformity of the energy of the electron beam can be improved.

  Here, only when the incident timing of the electron beam compressed by the prebuncher unit 116 to the accelerator unit 118 is synchronized with the positive phase of the high frequency in the accelerator unit 118, the electron beam is efficiently accelerated by the accelerator unit 118. Therefore, in order to adjust the incident timing of the electron beam from the prebuncher unit 116 to the accelerator unit 118, the high-frequency introduction unit 116a of the prebuncher unit 116 is provided with a phase adjusting unit (not shown). In addition, since the electron beam compression rate (the length of the bunched electron beam) also affects the acceleration efficiency by the accelerator unit 118, that is, the shorter the electron beam length, the higher the acceleration efficiency. Therefore, in order to adjust the intensity of the high frequency to be supplied and adjust the length of the electron beam, the high frequency introducing portion 116a of the prebuncher unit 116 is provided with an attenuation (attenuator) means (not shown).

(Accelerator unit 118)
The accelerator unit 118 is made of stainless steel (for example, SUS) and has a plurality of acceleration spaces therein. When a high frequency voltage (for example, 3 GHz) is supplied from the high frequency amplifier unit 112a, the plurality of acceleration spaces of the accelerator unit 118 function as a spatial resonator, and an electric field that changes with time is generated in the spatial resonator. Then, the electron beam compressed by the prebuncher unit 116 is accelerated by the electric field changing with time.

  Here, the frequency of the voltage supplied from the high-frequency amplifier unit 112a and the distance of the acceleration space are designed so that the speed of the electron beam and the timing of positive charging (becomes positive phase) in the acceleration space are synchronized. Therefore, the electron beam is gradually accelerated in the accelerator unit 118, and finally accelerated to, for example, about 10 MeV and is incident on the scan horn unit 120.

  In this example, a standing wave type linear accelerator is used as the accelerator unit 118. However, a traveling wave type linear accelerator or a circular accelerator such as a synchrotron or a cyclotron may be used as long as electrons can be accelerated. It can also be adopted.

(Scan horn unit 120)
The scan horn unit 120 has an internal space connected to the accelerator unit 118, a scan electromagnet 122 provided in the vicinity of the exit of the accelerator unit 118, and an electron provided at an end facing the end connected to the accelerator unit 118. The line extraction part 124 is comprised (refer FIG. 1, FIG. 2).

  The scan electromagnet 122 scans (scans) the electron beam incident from the accelerator unit 118 in the horizontal direction (X-axis direction in FIG. 1). Since the traveling direction of the electron beam is the vertical direction (Y-axis direction in FIG. 1), the scanning electromagnet 122 scans the electron beam traveling in the vertical direction in the horizontal direction, so that the irradiated object W having a width in the horizontal direction. It is possible to reliably irradiate an electron beam.

  The electron beam extraction part 124 is made of, for example, a Ti foil having a thickness of about 50 μm and serves as a boundary that separates the internal space from the atmosphere. The electron beam extracted from the electron beam extraction unit 124 to the atmosphere is irradiated to the irradiation object W.

  Thus, the electron beam emitted from the electron gun unit 110 is accelerated by the accelerator unit 118 and irradiated to the irradiation object W through the electron beam extraction unit 124.

  By the way, the cathode electrode 150, the grid 152, and the high-frequency amplifier unit 112a of the electron gun unit 110 described above are consumables and need to be replaced. When restarting the electron beam irradiation apparatus 100 after exchanging such consumables, the power applied to the cathode electrode 150, the grid 152, and the high frequency amplifier unit 112a is gradually increased from the initial value to obtain a rated value. Bring up to aging. Substances in the atmosphere (for example, water and nitrogen) adhering to the cathode electrode 150, the accelerator unit 118, and the high-frequency amplifier unit 112a because they were released to the atmosphere when the consumables were replaced are removed by this aging. You can also.

  Hereinafter, the high-frequency amplifier unit 112a, the accelerator unit 118 of the electron beam irradiation apparatus 100, the aging apparatus 200 for aging the electron gun unit 110, and the aging method of the electron beam irradiation apparatus 100 using the aging apparatus 200 will be described in detail.

(Aging device 200)
FIG. 4 is a functional block diagram showing a schematic function of the aging device 200. As illustrated in FIG. 4, the aging device 200 includes an operation unit 210, a display unit 212, a vacuum gauge 214, a parameter storage unit 216, and a central control unit 220.

  The operation unit 210 includes an operation key, a cross key, a joystick, a keyboard, a touch panel superimposed on a display surface of a display unit 212 described later, and receives a user operation input. When a remote controller for remote operation is provided, the remote controller also functions as the operation unit 210.

  The display unit 212 includes a liquid crystal display, an organic EL (Electro Luminescence) display, and the like, and displays an aging GUI (Graphical User Interface) screen and the like according to a control command from the central control unit 220 described later.

  The vacuum gauge 214 measures the degree of vacuum of the electron gun unit 110, the high frequency amplifier unit 112a, the waveguide unit 114, the prebuncher unit 116, the accelerator unit 118, and the scan horn unit 120, respectively. Then, the obtained measurement result is output to the central control unit 220.

  The parameter storage unit 216 is configured by a storage medium such as a ROM (Read Only Memory) and stores various information such as information based on an aging GUI screen. In the present embodiment, the parameter storage unit 216 supplies the voltage value, the current value, the pulse repetition number of the supplied voltage, and the pulse of the supplied voltage supplied to the electron gun unit 110, the accelerator unit 118, and the high frequency amplifier unit 112a. The parameter setting values related to the width are stored as stepwise values from the initial value to the rated value. In the present embodiment, the parameter storage unit 216 stores in advance a setting value table in which stepwise values of parameter setting values are tabulated.

  5 to 10 are explanatory diagrams for explaining the set value table 230 (indicated by 230a to 230f in FIGS. 5 to 10) stored in the parameter storage unit 216. FIG. As shown in FIGS. 5 to 10, the parameter storage unit 216 includes a setting value table 230a for aging the high frequency amplifier unit 112a, setting value tables 230b, 230c and 230d for aging the accelerator unit 118, an electron gun. A setting value table 230e for aging the unit 110 and a setting value table 230f for aging (degassing) the cathode electrode 150 are stored in advance.

  As shown in FIG. 5 to FIG. 8, the setting value of the first parameter 234a has a plurality of stages from the initial value to the rated value in the row direction 232a (horizontal direction in FIG. 5 to FIG. 8) of the setting value tables 230a to 230d. The setting values of the second parameter 234b are associated in multiple stages from the initial value to the rated value in the column direction 232b (vertical direction in FIGS. 5 to 8). In the setting value tables 230b to 230d, a plurality of setting values of the first parameter 234a are associated with one setting value of the second parameter 234b. In the setting value table 230a, among the setting values of the second parameter 234b, the initial value and the rated value are associated with a plurality of setting values of the first parameter 234a, but the other second parameters 234b. Each set value is associated with one first parameter 230a.

  More specifically, as shown in FIG. 5, the set value table 230a includes, as the first parameter 234a, the number of pulse repetitions of the voltage supplied from the high-frequency power source 112b to the high-frequency amplifier unit 112a as the second parameter 234b. Is associated with the voltage supplied to the high-frequency amplifier unit 112a by the high-frequency power source 112b. Note that “−” in FIG. 5 indicates that no value is set.

  Further, as shown in FIG. 6, the set value table 230b includes, as the first parameter 234a, the number of pulse repetitions of the voltage that the high frequency power supply 112b supplies to the accelerator unit 118 through the high frequency amplifier unit 112a. Are associated with power supplied from the high-frequency power source 112b to the accelerator unit 118 through the high-frequency amplifier unit 112a.

  Further, as shown in FIG. 7, the set value table 230c includes, as the first parameter 234a, the number of pulse repetitions of the voltage that the high frequency power supply 112b supplies to the accelerator unit 118 through the high frequency amplifier unit 112a, as the second parameter 234b. Is associated with the voltage that the high frequency power supply 112b supplies to the accelerator unit 118 through the high frequency amplifier unit 112a.

  As shown in FIG. 8, in the set value table 230d, as the first parameter 234a, the number of pulse repetitions of the voltage that the high frequency power supply 112b supplies to the accelerator unit 118 through the high frequency amplifier unit 112a is the second parameter 234b. The pulse width of the voltage supplied from the high-frequency power source 112b to the accelerator unit 118 through the high-frequency amplifier unit 112a is associated.

  On the other hand, as shown in FIG. 9, in the set value table 230e, the number of pulse repetitions of the voltage supplied from the high frequency power source 112b to the accelerator unit 118 through the high frequency amplifier unit 112a is associated with the holding time. Also, as shown in FIG. 10, the set value table 230f is associated with the current supplied from the cathode power supply 104 to the heater of the cathode electrode 150 and the holding time.

  Further, the parameter storage unit 216 stores in advance a fixed value 236a indicating a first holding time, which is a time for holding the parameter setting value, in association with the setting value table 230a.

  Further, the parameter storage unit 216 indicates a predetermined voltage value, power value, current value, pulse width, and first holding time thereof that are always supplied during aging in association with the set value table 230b. Fixed values 236b (voltage value, voltage pulse width, first holding time) (FIG. 6) are stored in advance. Similarly, the parameter storage unit 216 associates the fixed value 236c (power value, power pulse width, first holding time) with the setting value table 230c (FIG. 7), and associates the fixed value 236d (voltage with the setting value table 230d). Value, power value, first holding time) (FIG. 8), fixed value 236e (current value supplied to cathode electrode 150, voltage value applied to grid 152, applied to electron gun unit 110 in association with setting value table 230e. The pulse width of the voltage to be applied, the power value applied to the accelerator unit 118 through the high-frequency amplifier unit 112a, and the pulse width of the power (FIG. 9) are stored in advance.

  Returning to FIG. 4, the central control unit 220 manages and controls the entire aging device 200 by a semiconductor integrated circuit including a central processing unit (CPU), a ROM storing programs, a RAM as a work area, and the like. To do. In the present embodiment, the central control unit 220 also functions as a parameter setting unit 250, a power control unit 252, an error determination unit 254, and a stop control unit 256.

  The parameter setting unit 250 changes the setting value of each parameter stepwise from the initial value to the rated value based on the setting value table 230 stored in the parameter storage unit 216. Specific processing of parameter setting processing by the parameter setting unit 250 will be described in detail later.

  The power control unit 252 controls power supply processing by the cathode power source 104 and the high frequency power source 112b based on the setting value changed by the parameter setting unit 250.

  The error determination unit 254 determines whether or not a predetermined error determination condition is satisfied in at least one of the units. More specifically, the error determination unit 254 performs error determination using an error determination condition that discharge has occurred in at least one of the units. In the present embodiment, the error determination unit 254 determines the degree of vacuum of the electron gun unit 110, the high frequency amplifier unit 112a, the waveguide unit 114, the prebuncher unit 116, the accelerator unit 118, and the scan horn unit 120 measured by the vacuum gauge 214. If it is equal to or higher than a predetermined threshold (for example, 3.0E-5 Pa), it is determined that an error determination condition is satisfied, assuming that a discharge has occurred.

  When it is determined that the error determination condition is satisfied (an error has occurred), the stop control unit 256 supplies power to the high-frequency amplifier unit 112a by the high-frequency power source 112b and power to the electron gun unit 110 by the cathode power source 104. A stop process for stopping the supply is executed.

(Aging method)
Then, the aging method of the electron beam irradiation apparatus 100 using the aging apparatus 200 is demonstrated. In the present embodiment, the parameter setting unit 250 gradually increases the setting value of each parameter from the initial value to the rated value based on the setting value table 230, and when the error determination unit 254 satisfies the error determination condition, Return to one of the previous settings and resume aging. Hereinafter, specific processing of the aging method will be described in detail.

  FIG. 11 and FIG. 12 are flowcharts for explaining a specific processing flow of the aging method using the aging device 200 according to the present embodiment. As shown in FIG. 11, the user attempts an operation input for desiring to start aging of one or more of the high-frequency amplifier unit 112 a, the accelerator unit 118, the electron gun unit 110, and the cathode electrode 150 through the operation unit 210. (YES in S300), the central control unit 220 displays an aging GUI screen on the display unit 212 (S302). Then, when there is a selection input by the user through the operation unit 210 (YES in S304), the central control unit 220 starts an aging process (S306).

  FIGS. 13 and 14 are explanatory diagrams for explaining a GUI screen for aging and a screen showing an aging state. As shown in FIG. 13, in the screen display step S302, the screen 400 displayed on the display unit 212 includes a button 402a for aging the high-frequency amplifier unit 112a, a button 402b for aging the accelerator unit 118, an electron gun. A button 402c for aging the unit 110 and a button 402d for aging (degassing) the cathode electrode 150 are included.

  For example, when there is a selection input of the button 402a through the operation unit 210 by the user (YES in S304 in FIG. 11), the central control unit 220 causes the high-frequency amplifier unit 112a to be aged as shown in FIG. 14 (a). Is displayed on the display unit 212. For example, when the user inputs a selection of the button 402d through the operation unit 210, the central control unit 220 displays a screen 412 indicating the aging state of the cathode electrode 150 as shown in FIG. 212 is displayed. On the screen 410 and the screen 412, values according to the setting value table 230 stored in the parameter storage unit 216 (the setting value table 230a for the screen 410 and the setting value table 230f for the screen 412) are displayed. The parameter setting value can be changed in accordance with an operation input to 210.

  Returning to FIG. 11, a specific flow of the aging process will be described. Here, a case where the user attempts to age accelerator unit 118 through screen 400 (when button 402b is selected) will be described as an example.

  For example, when the user selects the button 402b (YES in S304 of FIG. 11), the central control unit 220 starts the aging process indicated by the selected button 402b (S306).

(Parameter setting process)
First, the parameter setting unit 250 refers to the corresponding setting value table 230 (here, the setting value table 230b: see FIG. 6) held in the parameter storage unit 216 in order to perform aging indicated by the selected button 402b. To do. Specifically, the parameter setting unit 250 refers to the fixed value 236b associated with the setting value table 230b and outputs the fixed value 236b to the power control unit 252. As shown in FIG. 6, assuming that the fixed value 236b is a voltage of 3.50 kV, a pulse width of 2 μs, and a first holding time of 3 min, the power control unit 252 sends a high-frequency power to the high-frequency power source 112b based on the fixed value 236b. The voltage supplied to the accelerator unit 118 through the amplifier unit 112a is fixed to 3.50 kV, the pulse width of the voltage is set to 2 μs, and the first holding time that is the time for holding the parameter setting value is fixed to 3 min (S308).

  Then, the parameter setting unit 250 maintains the setting value (here, the power value) of the second parameter 234b, and sets the setting value (here, the first parameter 234a corresponding to the setting value of the second parameter 234b). , The number of pulse repetitions), the step of setting the setting value of the first parameter 234a stepwise from the lowest setting value to the highest setting value, and the second parameter stored in the parameter storage unit 216 Among the set values of 234b, the process is performed step by step from the initial value to the rated value.

  More specifically, the parameter setting unit 250 first sets a first value as the setting value of the second parameter 234b according to the variable m in the column direction 232b of the setting value table 230 (S310). That is, the parameter setting unit 250 sets 10 W, which is the minimum value, as the set value (second parameter 234b) of the power supplied from the high frequency power supply 112b.

  Subsequently, the parameter setting unit 250 maintains the setting value of the second parameter 234b at 10 W, changes the setting value of the first parameter 234a (pulse repetition number) to the variable in the row direction 232a of the setting value table 230. First, the first value (5pps) is set according to n (S312). Then, the power control unit 252 supplies power to the high-frequency amplifier unit 112a based on the setting value set by the parameter setting unit 250 by setting the high-frequency power source 112b to 5 pps while maintaining 10 W. The process is performed (S314).

  Then, when the error determination unit 254 performs error determination and the error determination condition is not satisfied (NO in S316), when the first holding time has elapsed (YES in S318), the setting value table set by the parameter setting unit 250 The variable n in the direction 232a of the row 230 is incremented (S320).

  Subsequently, it is determined whether or not the incremented value n exceeds the maximum value (here, 11) of the variable n in the row direction 232a (S322). If not (NO in S322), the power supply step Repeat from S314. As described above, when step S314 to step S322 are repeated, the parameter setting unit 250 first sets the minimum value of 10 W as the set value of the power supplied from the high frequency power supply 112b, and maintains the 10 W while maintaining the 10 W. The number of pulse repetitions of the power supplied from the power supply 112b is set stepwise from a minimum value of 5 to a maximum value of 100.

  If the incremented value n exceeds the maximum value of the variable n in the row direction 232a (YES in S322), the variable m in the column direction 232b is incremented (S324). Then, it is determined whether or not the incremented value m exceeds the maximum value (20 in this case) of the variable m in the column direction 232b (S326). If it does not exceed (NO in S326), the first parameter setting is performed. Repeat from step S312. In this way, the parameter setting unit 250 changes the setting value according to the variables (m and n) in the setting value table 230. Therefore, for example, when the pulse repetition number 100 ends at 10 W, the parameter setting unit 250 As the set value of power supplied from the power supply 112b, 20W corresponding to the second row of the set value table 230b is set, and the pulse repetition number of power supplied from the high frequency power supply 112b is the minimum value while maintaining 20W. It is changed in steps from 5 to the maximum value of 100. That is, the parameter setting unit 250 changes the variable (m, n) of the setting value table 230 to (1,1), (1,2),..., (1,11), (2,1),. 2, 11),..., (20, 11) in order of the parameter setting values.

  When the incremented value m exceeds the maximum value (20 in this case) of the variable m in the column direction 232b (YES in S326), the aging process ends. In this way, the parameter setting unit 250 changes the setting value step by step according to the setting value table 230b, and the power control unit 252 uses the power from the high frequency power supply 112b based on the setting value changed by the parameter setting unit 250. Control the supply process.

(Error determination process and post-error determination process (stop control process, parameter change process))
Next, an error determination process by the error determination unit 254 and a post-error determination process (a stop control process by the stop control unit 256 and a parameter change process by the parameter setting unit 250) associated therewith will be described.

  As shown in FIG. 12, when the aging process is performed in accordance with the change of the parameter setting value by the parameter setting unit 250, the error determination unit 254 determines that the error determination condition is satisfied (YES in S316). First, the stop control unit 256 stops the power supply to the high-frequency amplifier unit 112a by the high-frequency power source 112b, and temporarily stores the variable n of the first parameter 234b when the stop process is executed in a memory (not shown). (S332).

  Then, the parameter setting unit 250 maintains the setting value of the second parameter 234b at the setting value at the time of execution of the stop process, and stores the setting value of the first parameter 234a in the parameter storage unit 216. Among the setting values of the first parameter 234a corresponding to the setting value of the parameter 234b, the lowest setting value is set (S334). That is, the parameter setting unit 250 sets the setting value of the first parameter 234a to the first value (5pps). More specifically, in FIG. 6, if an error occurs when m = 6 (60 W) and n = 7 (60 PPS), the parameter setting unit 250 maintains m = 6 (60 W). At the same time, n = 1 (5PPS) is set.

  When aging the high-frequency amplifier unit 112a with reference to the set value table 230a, as shown in FIG. 5, since values are not set when m = 2 to 13 and n = 1 to 9, for example, m = 6 (4.25 kV) and n = 10 (200 PPS), and an error has occurred, the parameter setting unit 250 maintains m = 6 (4.25 kV) and the first parameter 234a. The lowest setting value n = 1 (5PPS) is set.

  Here, the parameter setting unit 250 sets the second holding time (for example, 1 min) shorter than the first holding time (for example, 3 min) as the holding time (S336). Then, the power control unit 252 causes the high frequency power supply 112b to perform power supply processing to the high frequency amplifier unit 112a based on the setting value set by the parameter setting unit 250 (S338). Then, the error determination unit 254 performs error determination, and if the error determination condition is not satisfied (NO in S340), the power control unit 252 supplies power to the high-frequency power source 112b until the second holding time elapses (NO in S342). The power supply process to the high frequency amplifier unit 112a is maintained.

  On the other hand, if the error determination unit 254 performs error determination and the error determination condition is satisfied (YES in S340), the process is repeated from the stop step S332.

  When the second holding time elapses (YES in S342), the variable n in the row direction 232a of the setting value table 230b set by the parameter setting unit 250 is incremented (S344). Subsequently, it is determined whether or not the incremented value n exceeds the variable n when the stop process is executed (S346). If it does not exceed (NO in S346), the process is repeated from the power supply step S338.

  On the other hand, when the incremented value n exceeds the variable n when the stop process is executed (YES in S346), the process returns to the increment step S322.

  As described above, when an error occurs, the stop process is temporarily performed, so that the aging in the state where the error has occurred is interrupted, and the high frequency amplifier unit 112a and the electron gun unit 110 are prevented from being damaged. I have to.

  When the stop process is executed and aging is restarted, the set value of the second parameter is maintained at the set value at the time of executing the stop process, and the set value of the first parameter is set to the lowest set value. By doing so, it is possible to redo from the value (previous stage value) when no error occurred.

  It is considered that an error such as discharge is caused by abrupt gasification of impurities attached when the electric power is supplied to the high-frequency amplifier unit 112a and the electron gun unit 110 and heated and released into the atmosphere.

  Therefore, when aging is restarted, if aging is attempted again with the value set when an error occurs, impurities that have not yet been gasified may be rapidly gasified and an error may occur again. Therefore, when aging is resumed, it is possible to avoid a situation in which discharge is caused by gradually gasifying the impurities by sequentially redoing the values from the stage before the occurrence of the error.

  In addition, since aging has already been performed at a value before the occurrence of an error, there is a low possibility that impurities are rapidly gasified even if the retention time is shortened when aging is resumed. Therefore, the parameter setting unit 250 can shorten the total time required for aging by setting the holding time shorter than the time before the stop process is executed.

  The order of aging is preferably performed in the order of the high-frequency amplifier unit 112a (setting value table 230a), the accelerator unit 118 (in the order of setting value tables 230b to 230d), and the electron gun unit 110 (setting value table 230e). The cathode electrode 150 may be aged (degassed) at any time as long as it is before the electron gun unit 110 is aged.

  When the high-frequency amplifier unit 112a is replaced, the high-frequency amplifier unit 112a is aged according to the set value table 230a and the accelerator unit 118 is aged according to the set value table 230b. When the vacuum pump 102, the cathode electrode 150, the RF window 114, and the electron beam extraction unit 124 are replaced, the aging of the accelerator unit 118 according to the set value table 230b to the set value table 230c, and the electron according to the set value table 230e The aging of the gun unit 110 and the aging of the cathode electrode 150 according to the set value table 230f may be performed.

  As described above, according to the aging device 200 according to the present embodiment, the user can automatically perform the aging of the high-frequency amplifier unit 112a, the accelerator unit 118, and the electron gun unit 110 only by performing an aging start input. Can do. Therefore, it is possible to avoid a situation in which the user is restrained for a long time without forcing the user to perform complicated work.

  As mentioned above, although preferred embodiment of this invention was described referring an accompanying drawing, it cannot be overemphasized that this invention is not limited to this embodiment. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the claims, and these are naturally within the technical scope of the present invention. Is done.

  For example, in the above-described embodiment, when the parameter setting unit 250 changes the parameter setting value based on the setting value tables 230b to 230c, the second parameter 234b is maintained while the second parameter 234b is maintained. Among the setting values of the first parameter 234a corresponding to the setting value of the first parameter 234a, the step of setting the setting value of the first parameter 234a step by step from the lowest setting value to the highest setting value, and a parameter storage unit Of the set values of the second parameter 234b stored in 216, the process is performed step by step from the initial value to the rated value. However, the parameter setting unit 250 only needs to change at least the parameter setting value to any one of the setting values before the setting value when the stop process is executed. here. The previous stage is not only the previous stage but also all the past stages where the power supply processing is performed in a state where the error determination condition is not satisfied.

  Further, the parameter setting unit 250 sets the parameter setting value to be smaller than the setting value at the time of executing the stop process, regardless of whether or not the power supply process is performed in a state where the error determination condition is not satisfied It may be set. For example, when the parameter setting unit 250 changes the parameter setting value based on the setting value table 230a (see FIG. 5), and an error occurs when aging is performed at 4.10 kV and 200 pps, The aging may be restarted by changing to 5 pps which is the minimum value of the pulse repetition number as the first parameter while maintaining the voltage value which is the second parameter 234b at 4.10 kV.

  Further, in the above-described embodiment, the parameter setting unit 250 changes the holding time when the error occurs and aging is restarted from the first holding time as the holding time set in the previous stage to the second holding time. is doing. More specifically, when the parameter setting unit 250 changes the parameter setting value based on the setting value tables 230e and 230f, for example, referring to the setting value table 230e (see FIG. 9), the holding time is 160 pps. If an error occurs during aging at 8 minutes, the aging may be restarted by setting the holding time to be shorter than the previous holding time of 20 min (for example, 10 min).

  In the above-described embodiment, the error determination unit 254 determines whether or not a discharge has occurred based on the degree of vacuum of each unit measured by the vacuum gauge 214. However, the discharge is generated by another method. You may judge. In addition, the error determination unit 254 may determine that the error determination condition is satisfied when the voltage value or the current value is not within a predetermined range, not limited to the occurrence of discharge.

  Furthermore, in the above-described embodiment, the parameter storage unit 216 stores the setting value table 230. However, if the parameter setting values are stored as stepwise values from the initial value to the rated value, the table is used. It does not have to be.

  INDUSTRIAL APPLICABILITY The present invention can be used in an aging apparatus for an electron beam irradiation apparatus that irradiates an irradiation object with an electron beam, an electron beam irradiation apparatus, and an aging method for an electron beam irradiation apparatus.

DESCRIPTION OF SYMBOLS 100 ... Electron beam irradiation apparatus 102 ... Vacuum pump 104 ... Cathode power supply (electric power supply part)
110 ... electron gun unit 112 ... high frequency unit 112a ... high frequency amplifier unit 112b ... high frequency power supply (power supply unit)
114 ... Waveguide unit 116 ... Prebuncher unit 118 ... Accelerator unit 120 ... Scan horn unit 150 ... Cathode electrode 200 ... Aging device 216 ... Parameter storage unit 250 ... Parameter setting unit 252 ... Power control unit 254 ... Error determination unit 256 ... Stop control unit

Claims (14)

An electron gun unit that emits thermal electrons;
An accelerator unit for accelerating thermionic electrons emitted from the electron gun unit;
A high frequency amplifier unit for supplying a high frequency voltage to the accelerator unit;
A waveguide unit connecting the accelerator unit and the high-frequency amplifier unit;
The electron gun unit and the accelerator unit are connected to the internal space, scan the thermoelectrons accelerated by the accelerator unit as an electron beam, and take out to the atmospheric pressure atmosphere, a scan horn unit;
A power supply unit that supplies at least one of voltage and current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit;
An aging device for an electron beam irradiation device comprising:
At least one of a voltage value, a current value, a pulse repetition number of the supplied voltage, and a pulse width of the supplied voltage supplied to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit. A parameter storage unit for storing the setting values of the parameters involved as stepwise values from the initial value to the rated value;
Of the parameter setting values stored in the parameter storage unit, a parameter setting unit that changes the setting value step by step from the initial value to the rated value;
Based on the setting value changed by the parameter setting unit, a power control unit that controls power supply processing by the power supply unit;
An error determination unit that determines whether or not a preset error determination condition is satisfied in at least one of the units;
When the error determination unit determines that the error determination condition is satisfied, at least one of a voltage and a current from the power supply unit to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit. A stop control unit that executes a stop process for stopping supply,
The parameter setting unit
When the stop control unit executes a stop process, the set value of the parameter is changed to any one of the set values before the set value at the time of execution of the stop process. Aging device of the device.   The parameter setting unit sets a holding time that is a time for holding the setting value of the parameter, and when the stop process is executed by the stop control unit, sets the setting value to any one of the previous steps The aging apparatus for an electron beam irradiation apparatus according to claim 1, wherein the holding time is set shorter than the held time.   3. The electron beam irradiation apparatus according to claim 1, wherein the error determination unit performs error determination using an error determination condition that discharge is generated in at least one of the units. 4. Aging equipment.   The electronic device according to claim 3, wherein the error determination unit determines that the discharge has occurred when a degree of vacuum of at least one of the units is equal to or greater than a predetermined threshold. Aging equipment for beam irradiation equipment. In the parameter storage unit,
A set value of the first parameter and a set value of the second parameter provided in a plurality of stages from the initial value to the rated value are stored in association with each other,
A plurality of setting values of the first parameter are associated with one setting value of the second parameter,
The parameter setting unit
While maintaining the setting value of the second parameter, the first parameter setting value corresponding to the setting value of the second parameter is gradually changed from the lowest setting value to the highest setting value. 5. The step of changing a setting value of one parameter is repeated step by step until the setting value of the second parameter changes from an initial value to a rated value. 6. Aging device for electron beam irradiation equipment. The parameter setting unit
When an error is determined by the error determination unit and a stop process is executed by the stop control unit, the set value of the second parameter is maintained at a set value at the time of execution of the stop process, 6. The setting value of the first parameter is changed to the lowest setting value among the setting values of the first parameter corresponding to the maintained setting value of the second parameter. Aging device for electron beam irradiation equipment.   5. The aging apparatus for an electron beam irradiation apparatus according to claim 1, wherein the parameter is electric power supplied to the electron gun unit. 6. The electron gun unit is
A cathode electrode that emits thermal electrons;
A grid for controlling the emission of thermionic electrons by the cathode electrode;
Comprising
The power control unit includes a current supplied to the power supply unit, a voltage supplied to the grid, a pulse width of a voltage supplied to the electron gun unit, and the accelerator unit through the high-frequency amplifier unit. The power supplied to and the pulse width of the voltage supplied to the accelerator unit are maintained at predetermined values,
5. The aging apparatus according to claim 1, wherein the parameter is a pulse repetition number of a voltage supplied to the high-frequency amplifier unit. The first parameter is a pulse repetition number of a voltage supplied to the high frequency amplifier unit,
The aging apparatus for an electron beam irradiation apparatus according to claim 5 or 6, wherein the second parameter is a voltage supplied to the high-frequency amplifier unit. The power control unit causes the power supply unit to maintain a voltage supplied to the accelerator unit through the high-frequency amplifier unit and a pulse width of the voltage at a predetermined value.
The first parameter is a pulse repetition number of a voltage supplied to the accelerator unit through the high frequency amplifier unit,
7. The aging apparatus for an electron beam irradiation apparatus according to claim 5, wherein the second parameter is electric power supplied to the accelerator unit through the high frequency amplifier unit. The power control unit causes the power supply unit to maintain power supplied to the accelerator unit through the high-frequency amplifier unit and a pulse width of the power at a predetermined value.
The first parameter is a pulse repetition number of a voltage supplied to the accelerator unit through the high frequency amplifier unit,
The aging device according to claim 5 or 6, wherein the second parameter is a voltage supplied to the accelerator unit through the high-frequency amplifier unit. The power controller is configured to keep the voltage and power supplied to the accelerator unit through the high-frequency amplifier unit at a predetermined value in the power supply unit,
The first parameter is a pulse repetition number of a voltage supplied to the accelerator unit through the high frequency amplifier unit,
7. The aging apparatus for an electron beam irradiation apparatus according to claim 5, wherein the second parameter is a pulse width of a voltage supplied to the accelerator unit through the high frequency amplifier unit. An electron gun unit that emits thermal electrons;
An accelerator unit for accelerating thermionic electrons emitted from the electron gun unit;
A high frequency amplifier unit for supplying a high frequency voltage to the accelerator unit;
A waveguide unit connecting the accelerator unit and the high-frequency amplifier unit;
The electron gun unit and the accelerator unit are connected to the internal space, scan the thermoelectrons accelerated by the accelerator unit as an electron beam, and take out to the atmospheric pressure atmosphere, a scan horn unit;
A power supply unit that supplies at least one of voltage and current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit;
Aging control means for aging each unit;
An electron beam irradiation apparatus comprising:
The aging control means includes
At least one of a voltage value, a current value, a pulse repetition number of the supplied voltage, and a pulse width of the supplied voltage supplied to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit. A parameter storage unit for storing the setting values of the parameters involved as stepwise values from the initial value to the rated value;
Of the parameter setting values stored in the parameter storage unit, a parameter setting unit that changes the setting value step by step from the initial value to the rated value;
Based on the setting value changed by the parameter setting unit, a power control unit that controls power supply processing by the power supply unit;
An error determination unit that determines whether or not a preset error determination condition is satisfied in at least one of the units;
When the error determination unit determines that the error determination condition is satisfied, the power supply unit supplies at least one of a voltage and a current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit. A stop control unit that executes stop processing for stopping
The parameter setting unit
When the stop control unit executes a stop process, the set value of the parameter is changed to any one of the set values before the set value at the time of execution of the stop process. apparatus. An electron gun unit that emits thermoelectrons, an accelerator unit that accelerates thermoelectrons emitted from the electron gun unit, a high-frequency amplifier unit that supplies a high-frequency voltage to the accelerator unit, the accelerator unit, and the high-frequency amplifier unit A scanning horn unit that connects the electron gun unit and the accelerator unit to the internal space, scans thermionic electrons accelerated by the accelerator unit as an electron beam, and takes them out to an atmospheric pressure atmosphere And an aging method for an electron beam irradiation apparatus comprising: a power supply unit that supplies at least one of voltage and current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit. ,
At least one of a voltage value, a current value, a pulse repetition number of the supplied voltage, and a pulse width of the supplied voltage supplied to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit. Store the setting value of the parameter concerned as a stepwise value from the initial value to the rated value,
Of the stored setting values of the parameter, the step of changing the setting value step by step from the initial value to the rated value;
Supplying at least one of voltage and current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit to the power supply unit based on the changed setting value;
Determining whether or not a preset error determination condition is satisfied in at least one of the units;
Executing a stop process for stopping supply of at least one of a voltage and a current to at least one of the electron gun unit, the accelerator unit, and the high-frequency amplifier unit when it is determined that the error determination condition is satisfied; ,
When the stop process is executed, the setting value of the parameter is changed to any one of the setting values before the set value at the time of execution of the stop process;
An aging method for an electron beam irradiation apparatus, comprising:

Images