JP2012226119A5 - - Google Patents
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- Publication number
- JP2012226119A5 JP2012226119A5 JP2011093772A JP2011093772A JP2012226119A5 JP 2012226119 A5 JP2012226119 A5 JP 2012226119A5 JP 2011093772 A JP2011093772 A JP 2011093772A JP 2011093772 A JP2011093772 A JP 2011093772A JP 2012226119 A5 JP2012226119 A5 JP 2012226119A5
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- producing
- chemically amplified
- irradiation
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 20
- 238000004519 manufacturing process Methods 0.000 claims 10
- 238000010894 electron beam technology Methods 0.000 claims 6
- 230000035945 sensitivity Effects 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 2
- 230000003321 amplification Effects 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000003199 nucleic acid amplification method Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011093772A JP5518787B2 (ja) | 2011-04-20 | 2011-04-20 | 化学増幅型レジスト組成物の製造方法及びフォトマスクブランク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011093772A JP5518787B2 (ja) | 2011-04-20 | 2011-04-20 | 化学増幅型レジスト組成物の製造方法及びフォトマスクブランク |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012226119A JP2012226119A (ja) | 2012-11-15 |
| JP2012226119A5 true JP2012226119A5 (cg-RX-API-DMAC10.html) | 2013-04-11 |
| JP5518787B2 JP5518787B2 (ja) | 2014-06-11 |
Family
ID=47276359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011093772A Active JP5518787B2 (ja) | 2011-04-20 | 2011-04-20 | 化学増幅型レジスト組成物の製造方法及びフォトマスクブランク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5518787B2 (cg-RX-API-DMAC10.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7742267B2 (ja) * | 2021-09-28 | 2025-09-19 | 富士フイルム株式会社 | 感光性組成物の検査方法、及び感光性組成物の製造方法 |
| WO2023053833A1 (ja) * | 2021-09-30 | 2023-04-06 | 富士フイルム株式会社 | 感光性組成物の検定方法、感光性組成物の製造方法 |
| JP7814977B2 (ja) * | 2022-02-28 | 2026-02-17 | 富士フイルム株式会社 | レジスト組成物の製造方法、及びレジスト組成物の検定方法 |
-
2011
- 2011-04-20 JP JP2011093772A patent/JP5518787B2/ja active Active
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