JP2012203354A - Method of manufacturing mold for manufacturing anti-reflection film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a mold for manufacturing an anti-reflection film, which is capable of manufacturing an anti-reflection film with a desired anti-reflection function, a mold for manufacturing an anti-reflection film, which is manufactured by the method of manufacturing, and a method of manufacturing an anti-reflection film.SOLUTION: The method of manufacturing a mold for manufacturing an anti-reflection film, which has a plurality of micro pores formed on a surface thereof, includes; an anodic oxidation step of using a metal base having a surface made of aluminum and forming the plurality of micro pores on the surface of the metal base by an anodic oxidation method to form a mold for manufacturing an anti-reflection film; and an inspection step of measuring regular reflectance of the surface of the metal for manufacturing an anti-reflection film, which is obtained in the anodic oxidation step, and inspecting whether the regular reflectance meets a prescribed inspection criterion or not. The inspection criterion indicates that the regular reflectance is within a range from 70.9% to 78.2%.

Description

  The present invention provides an antireflection film production mold capable of producing an antireflection film production mold capable of forming an antireflection film excellent in antireflection function, and the antireflection obtained by the production method. The present invention relates to a mold for film production and a method for producing an antireflection film using the mold for producing an antireflection film.

  In recent years, with the development of personal computers, in particular with the development of portable personal computers, the demand for flat panel displays has increased. Recently, the penetration rate of flat-panel televisions for home use is also increasing, and the market for flat panel displays is expanding. Furthermore, flat panel displays that have become widespread in recent years tend to have a larger screen, and this tendency is particularly strong for home-use liquid crystal televisions. As such a flat panel display, various display methods such as a liquid crystal display, a plasma display, and an organic EL display are adopted, and the display quality of the image is improved in any display. The purposeful research is done every day. In particular, the development of anti-reflection technology for the purpose of improving display quality has become one of the important technical issues common to each type of display.

Conventionally, as such an antireflection technique, for example, a technique of obtaining an antireflection effect effective for light of a single wavelength by forming a thin film made of a low refractive index material on the surface as a single layer, Technology has been used to obtain an antireflection effect for light in a wider wavelength range by forming a plurality of layers in which thin films made of low refractive index materials and thin films made of high refractive index materials are alternately formed. It was. Among them, the technique using a plurality of layers has been useful in that an antireflection effect can be obtained even for light having a wider wavelength range by increasing the number of layers. It has been put to practical use.
However, there are some problems in such a technique using a plurality of layers. First of all, in order to form a plurality of layers having an excellent antireflection effect, it is usually necessary to form a film using a vacuum deposition method or the like. Therefore, it is necessary to provide a vacuum facility when manufacturing a display device. There was a problem of becoming. Further, in the vacuum evaporation method, since the film formation time is generally long, a problem of manufacturing efficiency has been pointed out. In particular, for displays used in environments with very strong ambient light, higher antireflection performance is required, so the number of layers that make up multiple layers must be increased, resulting in significant manufacturing costs. There was a problem of becoming high.
Second, even from a technical point of view, the antireflection technology using a plurality of layers makes use of the light interference phenomenon, so the antireflection effect greatly affects the incident angle and wavelength of light. There is a problem that it is difficult to obtain a street antireflection effect.

In order to deal with such problems, Patent Documents 1 to 6 disclose techniques for preventing reflection by forming on a surface a fine concavo-convex pattern in which the concavo-convex period is controlled to be equal to or less than the wavelength of visible light. Such a method uses the principle of a so-called moth-eye structure, and continuously changes the refractive index for light incident on the substrate, thereby eliminating the discontinuous interface of the refractive index. This prevents light reflection. Such antireflection technology using a moth-eye structure is useful in that it can prevent reflection of light in a wide wavelength range by a simple method, and its practical application is also being studied in the field of displays. .
In addition, as a fine uneven | corrugated pattern used for the said moth-eye structure, cone-shaped bodies, such as a cone shape and a quadrangular pyramid shape, are common.

  The moth-eye structure is generally manufactured by transferring the fine irregularities to an arbitrary resin layer using a mold (stamper or mold) having a shape obtained by inverting the fine irregularities. Therefore, as a method for producing an antireflection film using a moth-eye structure (hereinafter sometimes simply referred to as an antireflection film), a resin layer made of a curable resin is formed on a substrate, and then as described above. A method of forming a moth-eye structure on the surface of the resin layer using a simple mold and further curing the resin layer can be used. Such a production method has an advantage that an antireflection film can be continuously produced by a simple method and high production efficiency.

  However, whether or not the antireflection film has a desired antireflection function is evaluated by actually measuring the antireflection film obtained by the above production method. For example, it is used in the above production method. When there is a problem with the mold to be produced, there was a problem that a large amount of antireflection film would be defective.

  Examples of the mold evaluation method include a method of observing the fine unevenness of the mold with a scanning electron microscope (SEM) (Patent Document 7 and Patent). Reference 8). However, such a method has an advantage in that the fine unevenness shape of the mold can be directly evaluated, but the mold has to be damaged for evaluation, and is temporarily evaluated. As a result, even if there was no problem with the mold, there was a problem that the mold that was the object of evaluation could not be used continuously.

JP-T-2001-517319 JP 2004-205990 A JP 2004-287238 A JP 2001-272505 A JP 2002-286906 A International Publication No. 2006/059686 Pamphlet JP 2008-158013 A JP 2008-176076 A JP 2010-122599 A

  The present invention relates to a method for producing an antireflection film mold capable of producing an antireflection film having a desired antireflection function, an antireflection film production mold produced by the above production method, and an antireflection film. The main purpose is to provide a manufacturing method.

  As a result of intensive studies to solve the above-mentioned problems, the present inventors have determined that the reflectance of the antireflection film is the regular reflection of the surface of the mold for producing the antireflection film used for producing the antireflection film. The present inventors have found that it correlates with the rate and have completed the present invention.

  The present invention is a method for producing a mold for producing an antireflection film having a plurality of fine holes formed on the surface, wherein the surface of the metal substrate is anodized using a metal substrate made of aluminum. An anodizing step for forming an antireflection film manufacturing mold by forming micropores of the above, and measuring the regular reflectance of the antireflection film manufacturing mold surface obtained in the anodizing step, and measuring the regular reflectance A test step for inspecting whether or not the laser beam satisfies a predetermined inspection standard, wherein the regular reflectance is within a range of 70.9% to 78.2%. A method for producing a mold for producing a prevention film is provided.

  According to the present invention, by having the inspection step, it is possible to reliably obtain the regular reflectance of the antireflection film manufacturing mold surface within the above range. Thereby, it is possible to manufacture a mold for manufacturing an antireflection film capable of forming an antireflection film having a good antireflection function.

  The present invention is a method for producing a mold for producing an antireflection film having a plurality of micropores formed on the surface, wherein the metal substrate for evaluation comprising an aluminum surface is used, and the metal substrate for evaluation is formed by an anodic oxidation method. A plurality of micropores are formed on the surface to form a mold for manufacturing an antireflection film for evaluation, and the regular reflectance of the mold surface for manufacturing the antireflection film for evaluation is measured. The anodic oxidation method is performed so that when the plurality of micropores are formed on the surface of the metal base made of aluminum, the regular reflectance of the surface of the metal base is within the range of 70.9% to 78.2%. For the production of an antireflection film by forming the plurality of micropores on the surface of the metal substrate by performing the anodic oxidation method under the conditions determined in the condition determination step and the condition determination step Forming a mold Provides a method of manufacturing the anti-reflection film prepared mold, characterized in that it comprises pole and oxidation step.

  According to the present invention, the anti-reflection film-manufacturing mold is provided under the conditions of the anodizing method so that the specular reflectance of the anti-reflection film-manufacturing mold surface becomes a preferable value by having the condition determining step. Can be manufactured. Thereby, it is possible to manufacture a mold for manufacturing an antireflection film capable of forming an antireflection film having a good antireflection function.

  In the present invention, the method for measuring regular reflectance includes spectral reflectance (SCI) including regular reflection light on the surface of the mold for producing an antireflection film or the mold surface for producing an antireflection film for evaluation, After measuring the spectral reflectance (SCE) excluding specular reflection light on the surface of the antireflection film production mold or the evaluation antireflection film production mold surface, the spectral reflectance including the regular reflection light ( It is preferable that the spectral reflectance (SCE) excluding the regular reflection light is subtracted from the SCI). This is because the regular reflectance can be measured with higher accuracy.

  The present invention provides a mold for producing an antireflection film, which is produced using the above-described method for producing a mold for producing an antireflection film.

  According to this invention, it is set as the metal mold | die for antireflection film manufacture which can form the antireflection film which has the outstanding antireflection function by being manufactured using the manufacturing method of the metal mold | die for antireflection film manufacture mentioned above. be able to.

  The present invention relates to a method for producing an antireflection film using a mold for producing an antireflection film having a plurality of micropores formed on the surface, wherein fine irregularities are formed using the mold for producing an antireflection film. By performing the molding process of forming an antireflection film made of a curable resin composition, and after the molding process, the regular reflectance of the mold surface for producing the antireflection film is measured, and the regular reflectance is A mold inspection step for inspecting whether or not a predetermined inspection standard is satisfied, wherein the regular reflectance is in a range of 70.9% to 78.2%. A method for producing an antireflection film is provided.

  According to the present invention, after inspecting whether or not the regular reflectance of the mold surface for manufacturing the antireflection film satisfies the inspection standard in the mold inspection process, after being used for a plurality of molding processes. It becomes possible to evaluate about the shape of the micropore of the metal mold | die for antireflection film manufacture. Therefore, it becomes possible to prevent the occurrence of defects in the antireflection film due to the change in the shape of the fine holes on the surface of the mold for producing the antireflection film.

  According to the present invention, the antireflection film-manufacturing mold is manufactured such that the regular reflectance of the antireflection film-manufacturing mold surface is within a predetermined range, thereby providing a reflection having a good antireflection function. There exists an effect that it becomes possible to obtain a prevention film.

It is a graph which shows the relationship between the regular reflectance of the metal mold | die for antireflection film manufacture, and the reflectance of an antireflection film. It is a schematic sectional drawing which shows an example of the metal mold | die for antireflection film manufacture of this invention. It is process drawing which shows an example of the anodizing process used for the manufacturing method of the metal mold | die for antireflection film manufacture of this invention. It is process drawing which shows the other example of the anodizing process used for the manufacturing method of the metal mold | die for antireflection film manufacture of this invention. It is a schematic sectional drawing which shows another example of the metal mold | die for antireflection film manufacture of this invention. It is a schematic sectional drawing which shows an example of the antireflection film manufactured by the manufacturing method of the antireflection film of this invention.

  Hereinafter, the manufacturing method of the metal mold | die for antireflection film manufacture of this invention, the metal mold | die for antireflection film manufacture, and the manufacturing method of an antireflection film are demonstrated.

A. Manufacturing method of mold for manufacturing antireflection film A manufacturing method of a mold for manufacturing an antireflection film of the present invention will be described.
Here, the antireflection film-manufacturing mold obtained by the production method of the present invention has a plurality of fine holes formed on the surface, and the fine irregularities in which the period of the irregularities is controlled to be equal to or less than the wavelength of visible light. It is used for producing an antireflection film having a so-called moth eye structure in which a pattern is formed on the surface.

Conventionally, the antireflection film having the above moth-eye structure uses a mold for producing an antireflection film having a plurality of micropores on the surface, and a curable resin is poured into the mold and cured, or the curable resin is a base material. It is manufactured by a method of applying a fine unevenness by applying a coating film on the coating film and pressing the antireflection film manufacturing mold onto the coating film. In the antireflection film, whether or not the antireflection film has a desired reflectance has been evaluated by measuring an actually produced antireflection film. Even when there is a defect in the shape of the metal mold, etc., there is a problem that evaluation cannot be performed unless an antireflection film is actually formed, and a large number of defective products are formed.
In addition, as a method for evaluating the shape of the antireflection film manufacturing mold itself, the evaluation method was taken by destroying the antireflection film manufacturing mold. There was a problem that a manufacturing mold could not be used.

As a result of intensive studies to solve the above problems, the present inventor has obtained a regular reflectance of the surface of the mold for manufacturing the antireflection film and an antireflection film formed using the mold for manufacturing the antireflection film. It was found that there is a correlation with the reflectance of. Moreover, as a value of the regular reflectance of the mold surface for manufacturing an antireflection film capable of imparting a desired antireflection function to the antireflection film, it is within a range of 70.9% to 78.2%. As a result, the present invention has been completed.
As shown in FIG. 1, the reflectance of the antireflection film is actually set to 0. 1 by setting the regular reflectance of the surface of the mold for producing the antireflection film within the range of 70.9% to 78.2%. The fact that it can be made 2% or less is also shown in the examples described later.
In addition, FIG. 1 is a graph which shows the relationship between the regular reflectance of the metal mold | die for antireflection film manufacture, and the reflectance of an antireflection film.

Here, although it is not clear why the desired antireflection function can be imparted to the antireflection film by making the regular reflectance of the surface of the mold for producing the antireflection film within the above numerical range. It is considered as follows.
The regular reflectance of the surface of the mold for producing the antireflection film is greatly influenced by the shape of the micropores formed on the surface.
For example, the reason why the regular reflectance of the surface of the mold for producing the antireflection film exceeds 78.2% is that the shape of the micropores does not become a cone and does not contribute to a decrease in the reflectance of the antireflection film. There is a possibility that the shape does not have an inclination. In addition, since the average hole depth of the fine holes is shallow, the regular reflectance may be high. Therefore, when an antireflection film is produced using the mold for producing an antireflection film, it becomes difficult to mold a fine uneven shape capable of exhibiting a desired antireflection function into the antireflection film. It is considered a thing.
In addition, for example, the reason why the regular reflectance of the anti-reflection film production mold is less than 70.9% is that the average hole depth of the fine holes is too deep, the fine uneven shape is elongated, and the aspect ratio is It is possible that the shape is high. Therefore, when an antireflection film is produced using the mold for producing an antireflection film, the fine uneven shape formed on the antireflection film cannot be easily released, and stable production is difficult. It is thought to become. Therefore, in this case, it is considered difficult to form the antireflection film itself having a desired fine uneven shape.

  The present invention has a great feature in finding the numerical range of the regular reflectance of the surface of the mold for manufacturing the antireflection film, which makes it possible to impart a desired antireflection function to the antireflection film. . Further, the regular reflectance can be measured in a non-destructive and non-contact manner for a mold for producing an antireflection film. Therefore, in the manufacturing method of the antireflection film manufacturing mold of the present invention, by using the numerical range as an evaluation criterion, for example, the setting of conditions when manufacturing the antireflection film manufacturing mold, or the above Since it is possible to perform inspection after forming the antireflection film manufacturing mold, it is possible to manufacture an antireflection film manufacturing mold capable of manufacturing an antireflection film having an excellent antireflection function.

  As a manufacturing method of the metal mold for manufacturing the antireflection film of the present invention, it can be considered that it is divided into two modes from the difference of the process. Hereinafter, each aspect will be described.

1. First, the first aspect of the method for producing the antireflection film production mold of the present invention will be described.
The manufacturing method of the mold for manufacturing an antireflection film according to this embodiment is a manufacturing method of a mold for manufacturing an antireflection film having a plurality of fine holes formed on the surface thereof, using a metal substrate whose surface is made of aluminum, and an anode. An anodizing step for forming the anti-reflection film manufacturing mold by forming the plurality of micropores on the surface of the metal substrate by an oxidation method, and an anti-reflection film manufacturing mold surface obtained in the anodizing step. An inspection step of measuring regular reflectance and inspecting whether the regular reflectance satisfies a predetermined inspection standard, wherein the regular reflectance is 70.9% to 78.2%. This is a manufacturing method characterized by being within the range.

According to this aspect, by having the said inspection process, it becomes possible to obtain reliably what the regular reflectance of the metal mold | die surface for the said antireflection film manufacture is in the said range. Thereby, it is possible to manufacture a mold for manufacturing an antireflection film capable of forming an antireflection film having a good antireflection function.
Hereinafter, each process in the manufacturing method of the metal mold | die for antireflection film manufacture of this aspect is demonstrated.

(1) Anodizing step This step is a step of forming a metal mold for manufacturing an antireflection film by forming a plurality of fine holes on the surface of the metal substrate by an anodizing method using a metal substrate having a surface made of aluminum. It is.

(A) Metal substrate First, the metal substrate used in this step will be described.
The metal substrate used in this step is not particularly limited as long as the surface is made of aluminum. Therefore, the metal substrate used in this step may be composed of aluminum alone, or has a configuration in which an aluminum layer is formed on an arbitrary substrate so that it is the outermost layer. May be.

  Moreover, the form of the metal substrate used in this step is not particularly limited. More specifically, a metal substrate having either a sheet shape or a roll shape can be preferably used. In particular, in this step, it is preferable to use a metal substrate having a roll shape.

Conventionally, as a method for evaluating a roll-shaped antireflection film production mold, a method of observing the shape of the micropores of the antireflection film production mold using a scanning electron microscope has been used. Therefore, since it was necessary to destroy the mold for producing the antireflection film, it was difficult to use after evaluation.
However, in the inspection process described later, since the evaluation is performed using a regular reflectance that can be measured without destroying the antireflection film manufacturing mold, the regular reflectance is an inspection standard in the inspection process described later. For those satisfying the requirements, the measured antireflection film production mold can be used as a finished product as it is. On the other hand, in the inspection process described later, for those whose regular reflectance does not satisfy the inspection standard, the above-mentioned antireflection film-manufacturing gold is prepared by adjusting the average hole depth and the like of the fine holes by performing this process again. It is possible to adjust the regular reflectance of the mold so as to satisfy the inspection standard.
From such a thing, it can be said that the manufacturing method of the metal mold | die for antireflection film manufacture of this aspect has an effect especially when using a roll-shaped metal base | substrate.

  Moreover, the evaluation in the inspection process described later is not particularly restricted by the surface state of the portion of the metal base in the antireflection film manufacturing mold where the pores are not formed. Therefore, as the surface state of the metal substrate in the mold for producing the antireflection film, even if the surface state of the portion where the micropores are not formed is a mirror surface, or the surface is cloudy due to the large surface roughness. It may be a surface.

  Here, a description will be given of a metal mold for producing an antireflection film when the surface state of the portion where the fine holes are not formed in the metal substrate is a mirror surface and a cloudy surface, with reference to the drawings. FIG. 2 is a schematic sectional view showing an example of a mold for producing an antireflection film formed by this step. As illustrated in FIG. 2, the antireflection film manufacturing mold 10 formed by this step has a surface made of aluminum, and a plurality of fine holes A are formed. In addition, as described above, the metal substrate used in this embodiment may have a mirror surface where the fine holes A are not formed (FIG. 2A), or the fine holes A. The surface state on which no is formed may be a cloudy surface (FIG. 2B).

  Therefore, the metal substrate used in this step may have a mirror surface or a cloudy surface.

Specifically, as such a metal substrate, a high-purity rolled aluminum plate, a mirror-treated aluminum plate, or an aluminum sputtered film (aluminum sputtered glass plate) is formed on the glass plate. Can be mentioned.
In the present invention, an aluminum sputtered glass plate is particularly preferable. The aluminum sputtered glass plate has a higher regular reflectance than the rolled aluminum plate and the mirror-treated aluminum plate, and has a low spectral reflectance (SCE) excluding the regular reflectance. The surface exhibits better smoothness than the above-described rolled aluminum plate and the aluminum plate subjected to mirror finishing. Therefore, since the aluminum sputtered glass plate has good smoothness, it is possible to accurately form the micropores formed on the surface into a desired shape, and the antireflection exhibiting the reflectance in the numerical range described above. It is possible to suitably form a mold for film production. Furthermore, by using the mold for producing the antireflection film, it is possible to obtain an antireflection film having an excellent antireflection function with low reflectance.

(B) Anodizing method Next, the anodizing method used in this step will be described. The anodic oxidation method used in this step is not particularly limited as long as it is a method capable of forming micropores having a desired shape on the surface of the metal substrate. In particular, in this step, a porous alumina film forming step for forming an alumina film having micropores on the surface of the metal substrate by anodic oxidation, and an etching step for expanding the pore size of the micropores by etching the alumina film. It is preferable to use a method in which these are sequentially repeated. In the antireflection film having a so-called moth-eye structure, it is desirable that a cone-shaped microstructure such as a cone or a quadrangular pyramid is formed on the surface. According to the above method, such a cone-shaped structure is used. This is because it becomes easy to form tapered fine holes capable of forming the fine structure.

  A method of forming micropores in the metal substrate by sequentially repeating the porous alumina film forming step and the etching step in this step will be specifically described with reference to the drawings. FIG. 3 is a process diagram showing an example of an anodizing process in the method for producing a mold for producing an antireflection film according to this embodiment. As exemplified in FIG. 3, as a method of forming micropores in the metal substrate in this step, the surface of the metal substrate 1 is anodized by the anodic oxidation with respect to the metal substrate 1 whose surface is polished (FIG. 3A). A porous alumina film forming step for forming an alumina film 1 ′ having fine pores (FIG. 3B), and an etching step for expanding the pore diameter of the fine holes by etching the alumina film 1 ′ (FIG. 3). (C)) is preferably used, and this is repeated in sequence. According to such a method, by adjusting the anodizing time in the porous alumina film forming step and the etching processing time in the etching step, it is possible to form holes having various tapered shapes, the period, This is because it is possible to design an optimal refractive index change according to the hole depth (FIG. 3D).

  In the porous alumina film forming step, as a method of forming an alumina film having micropores on the surface of the metal substrate, a method capable of forming an alumina film having micropores formed in a desired depth and arrangement mode. There is no particular limitation. Here, the depth and arrangement of the micropores formed in the porous alumina film forming step depend on the liquidity of the electrolytic solution used for anodic oxidation, and the electrolytic solution used in this step is medium. Even if it is an acidic electrolytic solution or an acidic electrolytic solution, it can be suitably used. In particular, in this step, it is preferable to use an acidic electrolytic solution as the electrolytic solution. This is because by using an acidic electrolytic solution, micropores can be formed at random positions on the surface of the metal substrate in this step. Examples of the acidic electrolytic solution used in this step include a sulfuric acid aqueous solution, an oxalic acid aqueous solution, and a phosphoric acid aqueous solution.

In the etching step, the method for etching the alumina film is not particularly limited as long as the micropores formed in the alumina film can be enlarged to a desired level. Examples of such a method include an alkali etching method, an acidic etching method, and an electrolytic etching method. The alkali etching method is a method in which a 5 wt% to 10 wt% sodium hydroxide aqueous solution is heated to 40 ° C. to 80 ° C., an aluminum material is immersed for 0.5 to 10 minutes, and the surface layer is etched. This etching method is the most commonly used etching method because of its low processing cost and easy handling.
On the other hand, in the above acidic etching method, phosphoric acid-sulfuric acid (75 wt%: 25 wt%) bath is heated to 105 ° C. to 110 ° C. and polished for 2 minutes as polishing polishing for chemical polishing. In this method, the surface layer is etched by dipping for 10 minutes.
Although any of these methods can be used in the etching step, the alkali etching method has a large gloss, surface roughness, etc., and it is difficult to maintain the etching surface in a constant state, and the free alkali concentration It is preferable to use an acidic etching method because it is required to always control the dissolved aluminum component in the bath in a certain range.

  In this step, the embodiment in which the porous alumina film forming step and the etching step are repeatedly performed is not particularly limited as long as the micropore having a desired shape can be formed in this step. Absent. In particular, in this step, it is preferable to repeat the porous alumina film forming step and the etching step so that tapered fine holes can be formed on the surface of the metal substrate. The mold for producing an antireflection film produced according to this embodiment is used for producing an antireflection film having a so-called moth-eye structure, and the shape of the recess formed in this step is tapered. Thereby, it is because the antireflection function excellent in the wide wavelength range can be given to the antireflection film manufactured using the metallic mold for antireflection film manufactured by this mode.

  FIG. 4 is a process diagram showing another example of the anodizing process in the manufacturing method of the mold for manufacturing the antireflection film of this embodiment. FIG. 4 shows an example in which the porous alumina film forming step and the etching step are repeatedly performed so that tapered fine holes are formed in this step. As exemplified in FIG. 4, in this step, the alumina film having first cylindrical fine holes is first formed on the metal substrate 1 (FIG. 4A) by the first porous alumina film forming step. After forming 1 ′ (FIG. 4B), the alumina film 1 ′ is etched by the first etching step so as to enlarge the diameter of the first micropore (FIG. 4C). . Next, in the second porous alumina film forming step, second micropores having a pore diameter smaller than that of the first micropores are formed at the bottom of the first micropores having the enlarged pore diameter (FIG. 4D )). Next, the alumina film 1 ′ is etched by the second etching step so as to enlarge the diameters of the first and second micro holes (FIG. 4E). By repeating this several times (FIG. 4 (f) and FIG. 4 (g)), it is preferable to form fine holes having a tapered shape (FIG. 4 (h)).

  With respect to the shape of the micropores formed in the metal substrate by this step, as long as it can be a mold for producing an antireflection film that can produce an antireflection film having a desired antireflection function, There is no particular limitation. Specific examples include cones such as cones and quadrangular pyramids. Moreover, as shown in FIG. 2, the tip shape of the cone may be rounded. Although not shown, the tip of the cone may be formed flat or may be formed narrower toward the tip.

The period of the micropores formed in the metal substrate by this step is not particularly limited, depending on the use of the antireflection film manufactured using the antireflection film manufacturing mold manufactured according to this embodiment. It can be determined as appropriate. Here, the period in which the micropores are formed in this step affects the wavelength dependence of the reflectance of the antireflection film produced using the antireflection film production mold produced according to this embodiment. As the period becomes longer, the reflectance for light on the short wavelength side in the visible light region tends to increase. On the other hand, when the period is 200 nm or less, the change in the wavelength dependence of the reflectance due to the fluctuation of the period is small. For these reasons, the period of the micropores formed in this step is preferably in the range of 70 nm to 130 nm, and more preferably in the range of 90 nm to 110 nm.
In addition, although the said period may not be uniform in all the micropores, it shall refer to the average period of the micropore formed per unit area in that case.

  Moreover, the average hole depth of the micropores formed in this step also affects the wavelength dependence of the reflectance of the antireflection film produced using the antireflection film production mold produced according to this embodiment. As the depth increases, the reflectance can be lowered. On the other hand, when the depth becomes shallower, the reflectance on the long wavelength side tends to increase. For this reason, the average pore depth of the micropores formed in this step is preferably in the range of 150 nm to 450 nm, and more preferably in the range of 250 nm to 350 nm.

In addition, in the antireflection film manufactured using the antireflection film manufacturing mold manufactured according to the present aspect, the spacing between the micropores formed in this step becomes wider, and the reflectance in the entire wavelength region of visible light is higher. There is a tendency to increase, and as it becomes narrower, the reflectance tends to decrease in the entire wavelength region of visible light. For this reason, the interval at which the micropores are formed in this step is preferably in the range of 0 nm to 30 nm, and more preferably in the range of 10 nm to 20 nm.
In addition, although the said space | interval may not be uniform in all the micropores, the said space | interval in that case shall point out the average distance between the micropores formed per unit area.

  Here, the period, depth, and interval at which the fine holes are formed are distances represented by P, Q, and R in FIG. FIG. 5 is a schematic cross-sectional view showing an example of a mold for producing an antireflection film formed by this step.

(2) Inspection process This process measures the regular reflectance of the anti-reflection film manufacturing mold surface obtained in the anodizing process, and inspects whether the regular reflectance satisfies a predetermined inspection standard. It is a process. In this step, the inspection standard is such that the regular reflectance is in the range of 70.9% to 78.2%.

  Here, the regular reflectance means a reflectance for only regular reflected light.

The method for measuring the regular reflectance used in this step is not particularly limited as long as it is a method capable of measuring the regular reflectance on the surface of the mold for producing the antireflection film with a desired accuracy. After measuring the spectral reflectance (SCI) including the regular reflection light on the mold surface for manufacturing the antireflection film and the spectral reflectance (SCE) excluding the regular reflection light on the mold surface for manufacturing the antireflection film, By subtracting the spectral reflectance (SCE) excluding the specularly reflected light on the antireflection film manufacturing mold surface from the spectral reflectance (SCI) including the specularly reflected light on the antireflection film manufacturing mold surface. It is preferable to use a method for obtaining regular reflectance. This is because according to such a method, it is possible to measure the regular reflectance of the surface of the mold for manufacturing the antireflection film with higher accuracy.
Specific examples of such a method include the method described in JIS Z 8722.

  In this step, as a method for measuring the regular reflectance of the antireflection film production mold surface, the measurement light is usually incident on the antireflection film production mold surface and the antireflection film production mold surface. Of the reflected light reflected from the light, a method is used in which the reflectance is obtained only for specularly reflected light. At this time, the angle at which the measurement light is incident on the surface of the antireflection film manufacturing mold is specularly reflected. Although it will not specifically limit if it is in the range which can measure a rate, Especially, it exists in the range of 3 degrees-50 degrees with respect to the normal line of the said metal mold | die surface for antireflection film manufacture. Is preferably within the range of 3 ° to 45 °, more preferably within the range of 3 ° to 13 °.

  In addition, the wavelength of the measurement light used when measuring the regular reflectance in this step is particularly limited as long as it is within a range in which the regular reflectance of the antireflection film manufacturing mold surface can be measured. Instead, light having an appropriate wavelength can be appropriately selected and used according to the shape of the fine holes formed on the surface of the mold for producing the antireflection film. In particular, the wavelength of the measurement light in this embodiment is usually preferably in the range of 300 nm to 800 nm, and more preferably in the range of 380 nm to 780 nm.

  The inspection standard in this step is not particularly limited as long as the regular reflectance of the surface of the mold for producing the antireflection film is within a range of 70.9% to 78.2%, and above all, 71.4% to More preferably, it is within the range of 76.3%. An antireflection film having a high antireflection function is manufactured by using the antireflection film manufacturing mold manufactured according to the present aspect by setting the regular reflectance of the antireflection film manufacturing mold surface within the above range. Because it becomes possible to do.

In this step, the antireflection film-manufacturing mold that satisfies the above inspection criteria can be made into a product and can be used for manufacturing an antireflection film for a display device.
Further, among those that do not satisfy the inspection standard, for example, those having the regular reflectance of more than 78.2% are subjected to an anodic oxidation process such as a small depth of fine holes formed in the metal substrate. Since the shortage of processing is considered as a cause, the above-described anodizing step is performed again, and this step is performed again after the anodizing step to satisfy the above inspection standard.
Further, among those that do not satisfy the inspection standard, for example, those in which the regular reflectance is less than 70.9%, excessive processing in the anodic oxidation process such as the depth of the fine holes being too deep, etc. Therefore, after the surface of the metal substrate is flattened by a regeneration process, which will be described later, the anodization process and the inspection process are performed again, and products that satisfy the above inspection standards can be made into products. .

  In this aspect, as described above, by measuring the regular reflectance of the mold for producing an antireflection film after the anodizing step, those that satisfy the above inspection standards are regarded as products, and the above inspection standards are satisfied. For those that do not, the above-mentioned anodizing step is performed again to adjust the fine holes in the metal substrate, and then the regular reflectance is measured in this step, so that the product meets the above inspection criteria. Can do. Therefore, it is possible to reliably obtain only an antireflection film production mold capable of producing an antireflection film having an excellent antireflection function.

(3) Other processes The manufacturing method of the mold for manufacturing an antireflection film of this embodiment is not particularly limited as long as it is a manufacturing method having the anodizing process and the inspection process, and a necessary process is appropriately selected. Can be used. As such a process, the condition determination process demonstrated in the term of the "2. Manufacturing method of the metal mold | die for antireflection film manufacture of a 2nd aspect" mentioned later, for example can be mentioned.
Moreover, as a process other than the above, for example, a regeneration process or a release layer forming process can be exemplified. Hereinafter, each step will be described.

(A) Regeneration process This process is for the case where the regular reflectance of the mold for producing an antireflection film falls outside the range of 70.9% to 78.2% due to excessive processing in the anodizing process. This is a step of flattening the surface of the metal substrate.

  In this step, the method for flattening the surface of the metal substrate is not particularly limited as long as it is possible to fill and flatten the fine holes formed in the surface of the metal substrate and perform the anodization step again. For example, a method of vapor-depositing aluminum or a method of flattening the surface of the metal substrate by polishing fine holes formed on the surface of the metal substrate can be used.

(B) Release layer formation process This process is a process of forming a release layer by apply | coating a release agent to the micropore side surface of the metal mold | die for antireflection film manufacture.
In addition, as a formation method of the mold release agent and mold release layer used for this process, a well-known mold release agent and a formation method can be used.

2. Next, a second aspect of the manufacturing method of the antireflection film manufacturing mold of the present invention will be described.
The manufacturing method of the mold for manufacturing an antireflection film of this aspect is a manufacturing method of a mold for manufacturing an antireflection film having a plurality of fine holes formed on the surface, and uses a metal substrate for evaluation whose surface is made of aluminum. Forming a plurality of micropores on the surface of the metal substrate for evaluation by an anodization method to form a mold for manufacturing the antireflection film for evaluation, and the regular reflectance of the mold surface for manufacturing the antireflection film for evaluation And when the plurality of fine holes are formed on the surface of the metal substrate made of aluminum, the regular reflectance of the metal substrate surface is 70.9% to 78.2%. A condition determining step for determining the conditions of the anodizing method so as to be within a range, and performing the anodizing method under the conditions obtained in the condition determining step, whereby the surface of the metal substrate is Forming micropores An anode oxidation step of forming an anti-reflection film production mold, a manufacturing method characterized by having a.

According to this aspect, by having the condition determining step, the antireflection film-manufacturing mold is formed under the conditions of the anodizing method so that the regular reflectance of the antireflection film-manufacturing mold surface becomes a preferable value. Can be manufactured. Thereby, it is possible to manufacture a mold for manufacturing an antireflection film capable of forming an antireflection film having a good antireflection function.
Hereafter, each process in the manufacturing method of the metal mold | die for antireflection film manufacture of this aspect is each demonstrated.

(1) Condition determining step This step is for producing an antireflection film for evaluation by using a metal substrate for evaluation whose surface is made of aluminum and forming the plurality of fine holes on the surface of the metal substrate for evaluation by an anodic oxidation method. When forming the mold, measuring the regular reflectance of the surface of the mold for producing the antireflection film for evaluation, and forming the plurality of fine holes on the surface of the metal base made of aluminum based on the measurement result And determining the conditions of the anodizing method so that the regular reflectance of the surface of the metal substrate is within a range of 70.9% to 78.2%.

  The metal substrate for evaluation used in this step is not particularly limited as long as it can be used for a general mold for producing an antireflection film, but the metal substrate used in an anodic oxidation step described later. It is more preferable that they are of the same type. For the production of an antireflection film capable of producing an antireflection film having a good antireflection function by using the same type of metal substrate as that used in an actual antireflection film production mold as the metal substrate for evaluation. This is because the conditions of the anodic oxidation method capable of obtaining the mold can be determined more accurately.

  In addition, the method for measuring the regular reflectance used in this step can be the same as the method described in the above-mentioned section of “1. Method for producing antireflection film of first aspect”, so here. Description of is omitted.

  In this step, as a method for determining the conditions of the anodizing method, the regular reflectance of the antireflection film manufacturing mold surface formed in the later-described anodizing step is within a range of 70.9% to 78.2%. As long as it is a method that can determine the conditions of the anodizing method, it is not particularly limited.

In this step, the conditions for the anodizing method are usually determined by the method described below.
First, by using the evaluation metal substrate and anodizing under predetermined conditions, the plurality of micropores are formed on the surface of the evaluation metal substrate, thereby forming an evaluation antireflection film manufacturing mold. Is done.
Next, the regular reflectance of the mold surface for producing the antireflection film for evaluation is measured. At this time, when the regular reflectance is in the range of 70.9% to 78.2%, the conditions of the anodic oxidation method used when forming the evaluation antireflection film manufacturing mold are set. The conditions of the anodizing method in the anodizing step described later can be used.

  On the other hand, when the regular reflectance of the mold for producing the antireflection film for evaluation does not satisfy the range of 70.9% to 78.2%, the anodizing method is used again using the metal base for evaluation. The above-described conditions are changed to form the evaluation anti-reflection film manufacturing mold, and the regular reflectance of the evaluation anti-reflection film manufacturing mold surface is measured. At this time, when the regular reflectance is within the range of 70.9% to 78.2%, the changed condition of the anodizing method is set as the condition of the anodizing method in the anodizing step described later. Can do.

As a condition determination method other than the above, for example, the following method can be used. First, a plurality of antireflection film manufacturing molds for evaluation are formed in advance by changing the conditions of the anodizing method, and the regular reflectance is measured for each of them. Next, a calibration curve of the measurement results is created, and the conditions for the preferred anodizing method are determined in the anodizing step described later.
In the above-described method, even when various conditions such as the etching method, the time required for the process, the type of the metal substrate, etc. are changed in the anodic oxidation method, it is possible to easily determine the optimum anodic oxidation method conditions. It becomes possible.

  Examples of the method for creating the calibration curve include a method of creating a graph in which the horizontal axis represents the respective conditions of the anodizing method and the vertical reflectance represents the regular reflectance.

(2) Anodizing step This step is performed by performing the anodizing method under the conditions obtained in the condition determining step, thereby forming a plurality of micropores on the surface of the metal base and producing an antireflection film. This is a step of forming a mold.

  In this step, the points other than using the anodic oxidation method under the conditions obtained in the above-mentioned condition determining step are the above-mentioned items in “1. Manufacturing method of mold for manufacturing antireflection film of first aspect”. Therefore, the description is omitted here.

(3) Other processes The manufacturing method of the mold for manufacturing an antireflection film of this embodiment is not particularly limited as long as it is a manufacturing method having the above-described condition determining process and anodizing process, and is necessary in addition. It is possible to select and add processes as appropriate. An example of such a process is an inspection process. Hereinafter, the inspection process will be described.

(A) Inspection process This process inspects whether the regular reflectance satisfies the inspection standard by measuring the regular reflectance of the antireflection film manufacturing mold surface formed in the anodizing process. It is a process. About this process, since it can be made to be the same as that of what was demonstrated in the section of "1. Manufacturing method of metal mold | die for antireflection film of 1st aspect", description here is abbreviate | omitted.

In addition, as described in the section of “1. Manufacturing method of anti-reflection film manufacturing mold of the first aspect”, when the regular reflectance of the anti-reflection film manufacturing mold surface satisfies the inspection standard, Can be a product. In addition, when the regular reflectance does not satisfy the inspection standard, the anodizing process is performed again on the antireflection film manufacturing mold, the fine holes of the metal substrate are adjusted, and then the present process is performed. Any product that meets the inspection standards can be considered as a product.
Further, in this embodiment, when the regular reflectance does not satisfy the inspection standard, it is possible to re-determine the conditions of the anodizing method used in the anodizing process by performing the condition determining process again. It is.

(B) Other steps Steps other than the above used in this embodiment can be the same as the steps described in the above-mentioned section “1. Production method of antireflection film of first embodiment”. The description in is omitted.

B. Next, the mold for producing an antireflection film of the present invention will be described.
The mold for producing an antireflection film of the present invention was produced using the method for producing a mold for producing an antireflection film described in the above-mentioned section “A. Method for producing mold for producing an antireflection film”. It is characterized by.

  The metal mold for producing an antireflection film of the present invention is formed using a metal substrate having a surface made of aluminum, and has a plurality of fine holes on the surface of the metal substrate. Moreover, it manufactures so that the regular reflectance of the metal mold | die surface for the said antireflection film manufacture may be in the range of 70.9%-78.2%.

  According to this invention, it is set as the metal mold | die for antireflection film manufacture which can form the antireflection film which has the outstanding antireflection function by being manufactured using the manufacturing method of the metal mold | die for antireflection film manufacture mentioned above. be able to.

  The metal substrate used in the present invention and the shape, period, average hole depth, interval, etc. of the plurality of micropores are described in detail in the section “A. Method for producing mold for producing antireflection film”. Therefore, explanation here is omitted.

C. Next, a method for producing the antireflection film of the present invention will be described.
The antireflection film manufacturing method of the present invention is an antireflection film manufacturing method using an antireflection film manufacturing mold having a plurality of micropores formed on the surface, wherein the antireflection film manufacturing mold is By using the fine irregularities to mold, a molding process for forming an antireflection film made of a curable resin composition, and after the molding process, the regular reflectance of the mold surface for producing the antireflection film is measured. And a mold inspection step for inspecting whether the regular reflectance satisfies a predetermined inspection standard, wherein the regular reflectance is within a range of 70.9% to 78.2%. It is a manufacturing method characterized by these.

  Here, the antireflection film manufactured by the manufacturing method of the present invention will be described with reference to the drawings. FIG. 6 is a schematic cross-sectional view showing an example of an antireflection film produced by the production method of the present invention. As shown in FIG. 6, the antireflection film 20 formed by the production method of the present invention is made of the curable resin composition 3 and has a fine uneven pattern in which the period of the unevenness is controlled to be equal to or less than the wavelength of visible light. Is an antireflection film having a so-called moth-eye structure. Usually, in addition to the curable resin composition 3, a light transmissive substrate 2 is used.

  Here, the antireflection film is usually obtained by molding using the mold for producing the antireflection film. The antireflection film production mold is repeatedly used in the production of the antireflection film. However, by repeating the shaping, the antireflection film production mold surface is worn down and the fine film is produced. Since the shape of the hole changes, there is a problem that it is difficult to mold a desired fine uneven pattern on the antireflection film.

According to the present invention, after inspecting whether or not the regular reflectance of the mold surface for manufacturing the antireflection film satisfies the inspection standard in the mold inspection process, after being used for a plurality of molding processes. It becomes possible to evaluate about the shape of the micropore of the metal mold | die for antireflection film manufacture. Therefore, it becomes possible to prevent the occurrence of defects in the antireflection film due to the change in the shape of the fine holes on the surface of the mold for producing the antireflection film.
Hereafter, each process used for the manufacturing method of the antireflection film of this invention is each demonstrated.

1. Forming step This step is a step of forming an antireflection film made of a curable resin composition by forming fine irregularities using the above-described antireflection film-manufacturing mold.

  The anti-reflection film manufacturing mold used in this step can be the same as that described in the above-mentioned section “B. Anti-reflection film manufacturing mold”, and thus description thereof is omitted here.

  In this step, the method for shaping the fine irregularities using the antireflection film-manufacturing mold can be appropriately selected according to the configuration of the antireflection film produced according to the present invention, and is particularly limited. It is not something. As a specific method, for example, using the antireflection film manufacturing mold, filling the mold with a curable resin composition containing a curable resin, and the antireflection film manufacturing mold Placing the light transmissive substrate on the filled curable resin composition, curing the curable resin composition in a state where the curable resin composition and the light transmissive substrate are in contact with each other; A method having a step of peeling the antireflection film-manufacturing mold from the cured curable resin composition, and a curable resin containing a curable resin on the light transmissive substrate using a light transmissive substrate By applying the composition, a moth-eye structure is formed on the film made of the curable resin composition using the step of forming a film made of the curable resin composition and the mold for manufacturing the antireflection film. Process and the curable resin Curing the Narubutsu include a method in which a step of peeling off the anti-reflection film production mold.

  Here, as curable resin used for the said curable resin composition, a thermosetting resin and a photocurable resin can be mentioned, In this invention, any of these curable resins is suitable. Can be used. In particular, in the present invention, it is preferable to use a photocurable resin as the curable resin.

  Examples of the photocurable resin used in the present invention include acrylic resin, polyester resin, polyolefin resin, polycarbonate resin, polyamide resin, polyether resin, epoxy resin, urethane resin, alkyd resin, spiroacetal resin, polybutadiene resin, polythiol. Examples thereof include polyether resins, polyhydric alcohols, ethylene glycol (meth) acrylates, (meth) acrylate resins such as pentaerythritol (meth) acrylate monostearate, and mixtures thereof. Specific examples of resins belonging to these include pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, isocyanuric acid EO-modified triacrylate, urethane acrylate oligomer, and the like. Can be mentioned. In the present invention, a resin having a refractive index close to the refractive index of the light-transmitting substrate described later can be appropriately selected from these photocurable resins.

  The light-transmitting substrate is not particularly limited as long as it exhibits light transmittance and has a desired refractive index. Examples of such a light transmitting substrate include acrylic resins such as poly (meth) methyl acrylate, poly (meth) ethyl acrylate, methyl (meth) acrylate-butyl (meth) acrylate copolymer, polyethylene, and the like. , Polypropylene, polymethylpentene, cyclic olefin polymer (typically norbornene resin, etc., for example, product name “ZEONOR” manufactured by ZEON CORPORATION, product name “ARTON” manufactured by JSR Corporation, etc. Polyolefin resins such as polycarbonate resin, polyethylene terephthalate, polyethylene naphthalate, polyamide, polyimide, polystyrene, acrylonitrile-styrene copolymer, polyether sulfone, polysulfone, triacetyl cellulose, etc. cellulose Examples thereof include substrates made of resin, polyvinyl acetate, ethylene-vinyl acetate copolymer, thermoplastic resin such as vinyl chloride, polyvinylidene chloride, polyether ether ketone, polyurethane, or glass (including ceramics). .

2. Mold inspection step This step is a step of measuring the regular reflectance of the surface of the mold for manufacturing the antireflection film after the molding step and inspecting whether the regular reflectance satisfies a predetermined inspection standard. is there. The inspection standard is a process characterized in that the regular reflectance is within a range of 70.9% to 78.2%.

  About the measuring method of the regular reflectance used for this process, since it can be made to be the same as that of the method explained in the above-mentioned section of “A. Method for producing mold for producing antireflection film”, the explanation here is as follows. Omitted.

  When the regular reflectance of the mold surface for producing the antireflection film satisfies the inspection standard, it can be used for the molding process described above. Moreover, when the said regular reflectance does not satisfy | fill the said test | inspection standard, it is normally replaced | exchanged for the new metal mold | die for antireflection film manufacture.

  Although this process will not be specifically limited if it is performed after the said shaping | molding process, As frequency of this process in the manufacturing method of the antireflection film of this invention, it is 1000 times-5000 times of the said shaping process. It is preferable to carry out after performing within the range, and it is preferable to carry out after carrying out within the range of 1500 times to 4000 times. If the number of molding steps is less than the above range, the shape of the micropores in the antireflection film manufacturing mold is less likely to change, which may reduce manufacturing efficiency. If the number of times exceeds the above range, it is difficult to prevent the occurrence of defects in the antireflection film due to the change in the shape of the micropores in the antireflection film manufacturing mold even if the mold inspection step is performed. This is because there is a risk of becoming. In addition, a mold release layer coated with a mold release agent may be formed on the surface of the mold for manufacturing the antireflection film, and the mold release layer is deteriorated or removed depending on the number of molding processes. This is because it becomes difficult to prevent the occurrence of defects on the surface of the antireflection film.

3. Other Steps The production method of the antireflection film of the present invention is not particularly limited as long as it is a production method having the molding step and the mold inspection step, and other necessary steps are appropriately selected and added. Is possible.

4). Antireflective film The antireflective film produced by the production method of the present invention is composed of the curable resin composition described above, and a fine concavo-convex pattern in which the period of the concavo-convex is controlled to be equal to or less than the wavelength of visible light is formed on the surface. It is what.

  The shape of the fine irregularities in the antireflection film is not particularly limited as long as it has an antireflection function. Specifically, it is preferably fine irregularities formed by forming a cone-shaped structure such as a cone on the surface of the antireflection film. About the shape of the structure of the said cone-shaped body, since it can be made to be the same as that of the shape of the micropore demonstrated in the term of the above-mentioned "A. Manufacturing method of the metal mold | die for antireflection film manufacture", description here is Omitted.

The reflectance of the antireflection film produced according to the present invention is not particularly limited as long as it has a desired antireflection function, but is 0.2% or less, particularly 0.04% to 0.18. %, Particularly in the range of 0.04% to 0.12%. By setting the reflectance of the antireflection film within the above range, it is possible to perform image display with excellent visibility when the antireflection film is used in various display devices.
In addition, as a reflectance of an antireflection film, for example, Shimadzu Corporation, a self-recording spectrophotometer UV-3100 is used, a black tape is pasted on the back surface of the antireflection film, and an absolute reflectance incident on the antireflection film surface is 5 degrees. It can be determined by measuring.

The period of the fine irregularities in the antireflection film produced according to the present invention is not particularly limited as long as it can have an antireflection function, and is appropriately determined according to the use of the antireflection film. be able to.
Here, the period of the fine irregularities influences the wavelength dependence of the reflectance of the antireflection film, and the longer the period, the higher the reflectance with respect to light on the short wavelength side in the visible light region. It is what. On the other hand, when the period is 200 nm or less, the change in the wavelength dependence of the reflectance due to the fluctuation of the period is small. For this reason, the period of the fine irregularities is preferably in the range of 70 nm to 130 nm, and more preferably in the range of 90 nm to 110 nm.
In addition, although the said period may not be uniform in all the fine unevenness | corrugations, it shall refer to the average period of the fine unevenness | corrugation formed per unit area in that case.

  The height of the fine irregularities also affects the wavelength dependence of the reflectance of the antireflection film. The higher the height, the lower the reflectance, while the lower the wavelength, the longer wavelength side This tends to increase the reflectance. For this reason, the height of the fine irregularities is preferably in the range of 150 nm to 450 nm, and more preferably in the range of 250 nm to 350 nm.

Further, as the interval between the fine irregularities becomes wider, the reflectance tends to increase in the entire wavelength region of visible light in the antireflection film, and the reflectance tends to decrease in the entire wavelength region of visible light as it becomes narrower. It is in. For this reason, the interval between the fine irregularities is preferably in the range of 0 nm to 30 nm, and more preferably in the range of 10 nm to 20 nm.
In addition, although the said space | interval may not be uniform in all the micropores, the said space | interval in that case shall point out the average distance of the fine unevenness | corrugation formed per unit area.

  Here, the period, depth, and interval at which the fine irregularities are formed are distances represented by P ′, Q ′, and R ′ in FIG. 6, respectively.

  The antireflection film produced by the production method of the present invention is used for, for example, a liquid crystal display device, a plasma display device, an organic EL display device and the like.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples.

[Example 1]
<Preparation of anti-reflection film manufacturing mold>
After degreasing treatment using acetone on a glass plate sputtered with aluminum on its surface, it was anodized for 220 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution under conditions of formation voltage 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 140 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size enlargement process was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Further, anodization was performed for 60 seconds under the same conditions as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
A certain amount of UV curable resin layer coating solution is applied to the surface of the obtained anti-reflection film manufacturing mold, and a 80 μm thick triacetyl cellulose film (Fuji Film, Fujitac “T80SZ”) is applied obliquely thereon. After bonding, the bonded body was pressed with a roller (manufactured by Fuji Plastics, Lamipacker “LPA3301”), and it was confirmed that a uniform UV curable resin composition was applied to the entire mold, and 2000 mJ from the film side. The ultraviolet curable resin composition was photocured by irradiating ultraviolet rays with an energy of / cm ² . Thereafter, the film and the mold were peeled off to obtain an antireflection film.

[Example 2]
<Preparation of anti-reflection film manufacturing mold>
After degreasing treatment using acetone on a glass plate sputtered with aluminum on its surface, it was anodized for 220 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution under conditions of formation voltage 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in a 3 wt% phosphoric acid electrolyte solution at 35 ° C. for 9 minutes.
Next, anodization was performed for 140 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size expansion treatment was performed for 7 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Furthermore, in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, anodic oxidation was performed for 60 seconds under the same conditions as above, and a pore size expansion treatment was performed at 35 ° C. for 3 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Example 3]
<Preparation of anti-reflection film manufacturing mold>
After degreasing treatment using acetone on a glass plate sputtered with aluminum on its surface, it was anodized for 220 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution under conditions of formation voltage 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 180 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size enlargement process was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Further, anodization was performed for 60 seconds under the same conditions as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Example 4]
<Preparation of anti-reflection film manufacturing mold>
After degreasing treatment using acetone on a glass plate sputtered with aluminum on its surface, it was anodized for 200 seconds under the conditions of a formation voltage of 65 V and 5 ° C. in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 164 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size enlargement process was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Further, anodization was performed for 54 seconds under the same conditions as above in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolytic solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Example 5]
<Preparation of anti-reflection film manufacturing mold>
After degreasing treatment using acetone on a glass plate sputtered with aluminum on its surface, it was anodized for 220 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution under conditions of formation voltage 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in a 3 wt% phosphoric acid electrolyte solution at 35 ° C. for 9 minutes.
Next, anodization was performed for 140 seconds under the same conditions as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 12 minutes in an electrolyte solution of 3 wt% phosphoric acid. It was.
Furthermore, in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, anodization was performed for 80 seconds under the same conditions as above, and a pore size expansion treatment was performed in an electrolyte solution of 3 wt% phosphoric acid for 9 minutes at 35 ° C. . In an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution, anodization was performed for 60 seconds under the same conditions as above, and a pore size expansion treatment was performed in a 3 wt% phosphoric acid electrolytic solution at 35 ° C. for 9 minutes. Further, the above steps were repeated, and these were additionally performed once. Furthermore, in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, anodization was performed for 40 seconds under the same conditions as above, and a pore size expansion treatment was performed in an electrolyte solution of 3 wt% phosphoric acid for 9 minutes at 35 ° C. . As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Example 6]
<Preparation of anti-reflection film manufacturing mold>
After degreasing treatment using acetone on a glass plate sputtered with aluminum on its surface, it was anodized for 200 seconds under the conditions of a formation voltage of 65 V and 5 ° C. in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 164 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size enlargement process was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Further, anodization was performed for 54 seconds under the same conditions as above in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolytic solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Comparative Example 1]
After degreasing treatment using acetone on a glass plate sputtered with aluminum on the surface, anodization was performed for 146 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution at a formation voltage of 65 V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 94 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size expansion process was performed in an electrolyte solution of 3 wt% phosphoric acid for 14 minutes at 35 ° C. It was.
Further, anodization was performed for 40 seconds under the same conditions as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Comparative Example 2]
After degreasing using acetone on a glass plate with aluminum sputtered on its surface, it was anodized for 74 seconds under the conditions of a formation voltage of 65 V and 5 ° C. in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in a 3 wt% phosphoric acid electrolyte solution at 35 ° C. for 9 minutes.
Next, anodization was performed for 46 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size expansion treatment was performed for 7 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Furthermore, in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, anodic oxidation was performed for 20 seconds under the same conditions as above, and a pore size expansion treatment was performed in 3 wt% phosphoric acid electrolyte solution at 35 ° C. for 3 minutes. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Comparative Example 3]
After degreasing using acetone on a glass plate with aluminum sputtered on its surface, it was anodized in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution for 366 seconds under conditions of formation voltage of 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 234 seconds in the same condition as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed in a 3 wt% phosphoric acid electrolyte solution at 35 ° C. for 14 minutes. It was.
Furthermore, in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, anodization was performed for 100 seconds under the same conditions as above, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
When the antireflection film was formed by the same procedure as in Example 1, in the process of peeling the antireflection film and the antireflection film manufacturing mold, there was a part that was difficult to peel off, and part of the antireflection film was broken. . In addition, in the measurement of the reflectance of the anti-reflective film mentioned later, it performed using the anti-reflective film which could partly peel.

[Comparative Example 4]
After degreasing using acetone on a glass plate with aluminum sputtered on the surface, it was anodized for 182 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution under conditions of formation voltage of 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 150 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size enlargement process was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Further, anodization was performed for 50 seconds under the same conditions as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.
[Comparative Example 5]
After degreasing using acetone on a glass plate with aluminum sputtered on its surface, it was anodized in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution for 144 seconds at a formation voltage of 65 V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 118 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size expansion treatment was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Further, anodization was performed for 40 seconds under the same conditions as above in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Comparative Example 6]
After degreasing treatment using acetone on a glass plate sputtered with aluminum on the surface, it was anodized for 110 seconds in an electrolytic solution of 0.03 mol / L oxalic acid aqueous solution under conditions of formation voltage 65V and 5 ° C. An oxide film was formed. Next, the formed oxide film was selectively dissolved and removed in an electrolyte solution of 3 wt% phosphoric acid at 35 ° C. for 18 minutes.
Next, anodization was performed for 70 seconds in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution under the same conditions as above, and a pore size enlargement process was performed for 14 minutes at 35 ° C. in an electrolyte solution of 3 wt% phosphoric acid. It was.
Furthermore, in an electrolyte solution of 0.03 mol / L oxalic acid aqueous solution, anodization was performed for 30 seconds under the same conditions as above, and a pore size expansion treatment was performed at 35 ° C. for 6 minutes in an electrolyte solution of 3 wt% phosphoric acid. . Further, the above steps were repeated, and these were added three times in total. As a result, an antireflection film manufacturing mold having a configuration in which an anodized alumina film was formed on aluminum sputtered on a glass plate was obtained.

<Preparation of antireflection film>
An antireflection film was obtained by the same procedure as in Example 1.

[Evaluation]
The regular reflectance of the antireflection film production mold obtained in Examples 1 to 6 and Comparative Examples 1 to 6 and the reflectance of the antireflection film were measured by the following methods. The results are shown in Table 1, Table 2, and FIG. In FIG. 1, the values of Comparative Example 3 are omitted.

<Regular reflectance of mold surface>
Based on the method described in JIS Z 8722, measurement was performed using a spectrocolorimeter CM-2600d manufactured by Konica Minolta Sensing. For measurement, the measurement light is incident at an angle of 8 ° with respect to the normal of the mold surface, so that the spectral reflectance (SCI) including the regular reflection light on the mold surface and the regular reflection light on the mold surface are measured. After measuring the spectral reflectance (SCE), the spectral reflectance (SCE) obtained by removing the regular reflection light on the mold surface from the spectral reflectance (SCI) including the regular reflection light on the mold surface. The regular reflectance was obtained by subtracting.

<Reflectance of antireflection film>
Using a self-recording spectrophotometer UV-3100 manufactured by Shimadzu Corporation, a black tape was attached to the back side of the film, and the absolute reflectance at 5 degrees incident on the film surface was measured.

  As shown in Table 1 and FIG. 1, the reflectance of the antireflection film produced using the molds for producing the antireflection film of Examples 1 to 6 was 0.04% to 0.18%. Shows a reflectance of 0.20% or less as a practical standard. Since the mold for producing an antireflection film having a regular reflectance of 70.9% to 78.2% was used, the fine irregularities of the mold for producing an antireflection film had a desired shape and formed on the antireflection film. The formed fine unevenness is also a shape showing a desired reflectance.

  On the other hand, the reflectances of the antireflection films produced using the antireflection film molds of Comparative Example 1, Comparative Example 2, Comparative Example 4, Comparative Example 5, and Comparative Example 6 are all practical guidelines. The reflectivity of 0.20% or more, which is the reflectivity of the above, was exhibited. This is because the mold for producing an antireflection film having a regular reflectance greater than 78.2% is used, and the fine irregularities of the mold for producing an antireflection film are shallow, and the desired shape is obtained. This is probably because the height of the fine irregularities formed on the antireflection film was lowered.

  In addition, the reflectance of a part of the antireflection film produced using the mold for producing the antireflection film of Comparative Example 3 is 0.01%, and the reflectance that we have set as a practical standard is 0.00. It showed 20% or less. However, it was difficult to peel off the antireflection film and the mold for manufacturing the antireflection film, and the antireflection film was broken. This is because a mold for producing an antireflection film having a regular reflectance smaller than 70% was used, so that the fine irregularities of the mold for producing an antireflection film were too deep, and the ultraviolet curable resin composition was formed from the fine irregularities on the mold surface. This is probably because the cured film could not be removed cleanly. Therefore, the antireflection film manufacturing mold of Comparative Example 3 was an antireflection film manufacturing mold that hindered stable production.

In Examples 1 to 6 adjusted with the mold for producing an antireflection film according to the present invention, an antireflection film having a low reflectance can be obtained, and fine irregularities enabling stable production have been realized.
On the other hand, in Comparative Examples 1-6, although it is the antireflection film which shows the low reflectance which we have set as a practical guideline, a mold for manufacturing an antireflection film that hinders stable production, and stable production. Although it is a mold for manufacturing an antireflection film, it is an antireflection film that does not satisfy the numerical values that we have set as a practical standard.

As described above, according to the present invention, the reflectance of the antireflection film can be easily obtained simply by measuring the regular reflectance of the mold surface for an unknown sample to be evaluated. Therefore, according to the present embodiment, it is also possible to quantitatively evaluate the regular reflectance of the mold surface by nondestructive and to monitor the change in regular reflectance of the same substrate during the anodic oxidation process. . In addition, during the manufacturing process of the antireflection film, it is possible to monitor the deterioration due to wear of the mold, etc., and the mold can be used continuously by restoring the regular reflectance of the mold surface to the desired value. It can also be possible.
The above-described embodiment is an example and does not limit the present invention. For example, in the embodiment, the anodic oxidation process is performed using a glass plate whose surface is sputtered with aluminum, but the present invention is not limited to this. For example, anodization may be performed using a roll body in which aluminum is sputtered onto a roll-shaped metal surface. In the embodiment, the present invention is applied to the case where the regular reflection rate of the mold surface is evaluated by changing the treatment time for anodization. However, the evaluation method of the present invention can also be applied to the case where the regular reflectance of the mold surface is changed by changing the conditions other than the anodizing treatment time. For example, the present invention can also be applied to the evaluation of the electrolyte concentration, formation voltage, treatment temperature in the porous alumina film forming step, and the electrolyte concentration, formation voltage, treatment time, treatment temperature in the etching step.

DESCRIPTION OF SYMBOLS 1 ... Metal base | substrate 1 '... Alumina film 2 ... Light-transmitting substrate 3 ... Curable resin composition 10 ... Metal mold | die for antireflection film manufacture 20 ... Antireflection film A ... Micropore

Claims (5)

A method for producing a mold for producing an antireflection film having a plurality of fine holes formed on the surface,
An anodizing step of forming a metal mold for manufacturing an antireflection film by forming a plurality of micropores on the surface of the metal substrate by an anodizing method using a metal substrate having a surface made of aluminum;
Measuring the regular reflectance of the mold surface for manufacturing the antireflection film obtained in the anodizing step, and inspecting whether the regular reflectance satisfies a predetermined inspection standard,
The method for manufacturing a mold for manufacturing an antireflection film, wherein the inspection standard is that the regular reflectance is within a range of 70.9% to 78.2%. A method for producing a mold for producing an antireflection film having a plurality of fine holes formed on the surface,
Using a metal substrate for evaluation whose surface is made of aluminum, and forming the plurality of micropores on the surface of the metal substrate for evaluation by an anodic oxidation method to form a mold for manufacturing an antireflection film for evaluation, and the reflection for evaluation Measure the regular reflectance of the mold surface for the prevention film production,
Based on the measurement results, when the plurality of fine holes are formed on the surface of the metal substrate made of aluminum, the regular reflectance of the metal substrate surface falls within the range of 70.9% to 78.2%. The step of determining the conditions of the anodic oxidation method and the anodic oxidation method under the conditions obtained in the condition determining step to form the plurality of micropores on the surface of the metal substrate And an anodizing step of forming a mold for producing an antireflection film, and a method for producing a mold for producing an antireflection film.   Spectral reflectance (SCI) including specular reflection light on the surface of the mold for manufacturing the antireflection film or the surface of the mold for manufacturing the antireflection film for evaluation, and the method for manufacturing the antireflection film. After measuring the spectral reflectance (SCE) excluding regular reflection light on the mold surface or the mold surface for producing the antireflection film for evaluation, from the spectral reflectance (SCI) including the regular reflection light, 3. The method for producing a mold for producing an antireflection film according to claim 1, wherein spectral reflectance (SCE) excluding regular reflection light is subtracted.   An antireflection film-manufacturing mold manufactured using the method for manufacturing an antireflection film-manufacturing mold according to any one of claims 1 to 3. A method for producing an antireflection film using a mold for producing an antireflection film having a plurality of fine holes formed on the surface,
A forming step of forming an antireflection film composed of a curable resin composition by forming fine irregularities using the antireflection film manufacturing mold; and
A mold inspection step of measuring the regular reflectance of the surface of the mold for manufacturing the antireflection film after the molding step, and inspecting whether the regular reflectance satisfies a predetermined inspection standard;
The method for producing an antireflection film according to the inspection standard, wherein the regular reflectance is in a range of 70.9% to 78.2%.

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