JP2012198386A5 - - Google Patents

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JP2012198386A5
JP2012198386A5 JP2011062521A JP2011062521A JP2012198386A5 JP 2012198386 A5 JP2012198386 A5 JP 2012198386A5 JP 2011062521 A JP2011062521 A JP 2011062521A JP 2011062521 A JP2011062521 A JP 2011062521A JP 2012198386 A5 JP2012198386 A5 JP 2012198386A5
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electrode
electro
interlayer insulating
optical device
insulating film
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本発明の一態様の電気光学装置は、画素トランジスターと、該画素トランジスターに電気的に接続された第1の画素電極と、前記画素トランジスターと前記画素電極との間に配置された複数層の層間絶縁膜と、前記第1の画素電極と隣り合う第2の画素電極との間の前記複数層の層間絶縁膜のうちの少なくとも1つに設けられた溝状凹部と、前記溝状凹部を覆うように配置された第1電極層と、少なくとも前記溝状凹部の内部において前記第1電極層を覆うように配置された誘電体層と、および少なくとも前記溝状凹部の内部において前記誘電体層を覆うように配置された第2電極層と、を含む蓄積容量と、を有し、前記第2電極層は、前記画素トランジスターの画素電極側ソースドレイン領域と前記画素電極とに電気的に接続していることを特徴とする。
上記本発明に係る電気光学装置は、基板と、該基板の一方面側に設けられた画素トランジスターと、該画素トランジスターに対応して設けられた画素電極と、前記画素トランジスターと前記画素電極との間に設けられた複数層の層間絶縁膜と、前記画素電極と隣り合う画素電極との間に対して平面視で重なる領域において、前記複数層の層間絶縁膜のうちの少なくとも1つに設けられた溝状凹部と、少なくとも前記溝状凹部の底壁および側壁に沿って形成された第1電極層、少なくとも前記溝状凹部の内部において前記第1電極層に対して前記基板とは反対側に積層された誘電体層、および少なくとも前記溝状凹部の内部において前記誘電体層に対して前記基板とは反対側に積層された第2電極層により構成された蓄積容量と、を有し、前記第2電極層は、前記画素トランジスターの画素電極側ソースドレイン領域と前記画素電極とに電気的に接続していることを特徴とする。
An electro-optical device according to one embodiment of the present invention includes a pixel transistor, a first pixel electrode electrically connected to the pixel transistor, and a plurality of interlayers disposed between the pixel transistor and the pixel electrode. A groove-shaped recess provided in at least one of the plurality of interlayer insulating films between the insulating film and the second pixel electrode adjacent to the first pixel electrode, and covering the groove-shaped recess The first electrode layer arranged in such a manner, the dielectric layer arranged so as to cover the first electrode layer at least inside the groove-like recess, and the dielectric layer at least inside the groove-like recess. A storage capacitor including a second electrode layer disposed to cover the second electrode layer, and the second electrode layer is electrically connected to the pixel electrode side source / drain region of the pixel transistor and the pixel electrode. What And features.
The electro-optical device according to the present invention includes a substrate, a pixel transistor provided on one side of the substrate, a pixel electrode provided corresponding to the pixel transistor, the pixel transistor, and the pixel electrode. Provided in at least one of the plurality of interlayer insulating films in a region overlapping with the pixel electrode adjacent to the pixel electrode in plan view. Grooved recesses, at least a first electrode layer formed along the bottom and side walls of the grooved recesses, and at least the inside of the grooved recesses on the side opposite to the substrate with respect to the first electrode layer And a storage capacitor composed of a second electrode layer laminated on the opposite side of the dielectric layer from the dielectric layer, at least inside the groove-shaped recess. Previous The second electrode layer, characterized in that electrically connected the pixel electrode side source drain region of the pixel transistor and to said pixel electrode.

Claims (10)

画素トランジスターと、
該画素トランジスターに電気的に接続された第1の画素電極と、
前記画素トランジスターと前記画素電極との間に配置された複数層の層間絶縁膜と、
前記第1の画素電極と隣り合う第2の画素電極との間前記複数層の層間絶縁膜のうちの少なくとも1つに設けられた溝状凹部と、
前記溝状凹部を覆うように配置された第1電極層、少なくとも前記溝状凹部の内部において前記第1電極層を覆うように配置された誘電体層、および少なくとも前記溝状凹部の内部において前記誘電体層を覆うように配置された第2電極層と、を含む蓄積容量と、
を有し、
前記第2電極層は、前記画素トランジスターの画素電極側ソースドレイン領域と前記画素電極とに電気的に接続していることを特徴とする電気光学装置。
A pixel transistor,
A first pixel electrode electrically connected to the pixel transistor;
A plurality of interlayer insulating films disposed between the pixel transistor and the pixel electrode;
A groove-like recess provided in at least one of said plurality of layers of the interlayer insulating film between the second pixel electrode adjacent to the first pixel electrode,
Inside of the first electrode layer disposed to cover the groove-like recess, and the dielectric layer disposed to cover at least the first electrode layer inside of the groove-like recess, and at least the groove-like recess A storage capacitor including a second electrode layer disposed so as to cover the dielectric layer;
Have
The electro-optical device, wherein the second electrode layer is electrically connected to a pixel electrode side source / drain region of the pixel transistor and the pixel electrode.
前記第1電極層および前記第2電極層は、光を遮る導電膜を含むことを特徴とする請求項1に記載の電気光学装置。 The electro-optical device according to claim 1, wherein the first electrode layer and the second electrode layer include a conductive film that blocks light . 前記第2電極層と前記画素電極とは、前記複数層の層間絶縁膜のうち、前記第2電極層と前記画素電極との間に介在する層間絶縁膜に形成された第1のコンタクトホールを介して導通していることを特徴とする請求項1または2に記載の電気光学装置。 The second electrode layer and the pixel electrode include a first contact hole formed in an interlayer insulating film interposed between the second electrode layer and the pixel electrode among the plurality of interlayer insulating films. The electro-optical device according to claim 1, wherein the electro-optical device is electrically connected. 前記画素電極側ソースドレイン領域と前記第2電極層との間には、前記第1電極層と同層の導電膜を含む中継電極が設けられ、
当該中継電極と前記第2電極層とは、前記複数層の層間絶縁膜のうち、前記中継電極と前記第2電極層との間に介在する層間絶縁膜に形成された第2のコンタクトホールを介して導通していることを特徴とする請求項3に記載の電気光学装置。
A relay electrode including a conductive film in the same layer as the first electrode layer is provided between the pixel electrode side source / drain region and the second electrode layer,
The relay electrode and the second electrode layer include a second contact hole formed in an interlayer insulating film interposed between the relay electrode and the second electrode layer among the plurality of interlayer insulating films. The electro-optical device according to claim 3, wherein the electro-optical device is electrically connected.
前記画素電極側ソースドレイン領域と前記中継電極との間には、前記画素電極側ソースドレイン領域に電気的に接続されるドレイン電極が設けられ、
当該ドレイン電極と前記中継電極とは、前記複数層の層間絶縁膜のうち、前記ドレイン電極と前記中継電極との間に介在する層間絶縁膜に形成されたコンタクトホールを介して導通していることを特徴とする請求項4に記載の電気光学装置。
Wherein between the pixel electrode side source drain region and the relay electrode is electrically connected to Ru drain electrode provided on the pixel electrode side source drain region,
The drain electrode and the relay electrode are electrically connected through a contact hole formed in an interlayer insulating film interposed between the drain electrode and the relay electrode among the plurality of interlayer insulating films. The electro-optical device according to claim 4.
前記複数層の層間絶縁膜のうち、前記溝状凹部が形成された層間絶縁膜には、前記ドレイン電極と前記中継電極とを導通させる前記コンタクトホールが形成されている領域に第1の凹部が形成されていることを特徴とする請求項5に記載の電気光学装置。 Of the plurality of interlayer insulating films, the interlayer insulating film in which the groove-shaped recess is formed has a first recess in a region where the contact hole for conducting the drain electrode and the relay electrode is formed. The electro-optical device according to claim 5, wherein the electro-optical device is formed. 前記複数の層間絶縁膜は、前記溝状凹部が形成された第1層間絶縁膜と、該第1層間絶縁膜を覆うように配置された第2層間絶縁膜と、を含み、
前記第1電極層、前記誘電体層、および前記第2電極は、前記第2層間絶縁膜において前記溝状凹部を前記第2層間絶縁膜が覆うことにより形成される第2の凹部内に設けられていることを特徴とする請求項1乃至6の何れか一項に記載の電気光学装置。
The plurality of interlayer insulating films include a first interlayer insulating film in which the groove-shaped recess is formed, and a second interlayer insulating film disposed so as to cover the first interlayer insulating film,
The first electrode layer, the dielectric layer, and the second electrode are provided in a second recess formed by covering the groove-shaped recess in the second interlayer insulating film with the second interlayer insulating film. The electro-optical device according to claim 1, wherein the electro-optical device is provided.
前記第1の画素電極と、前記第1の画素電極に対向するように配置された対向基板との間に液晶層が配置されたことを特徴とする請求項1乃至7の何れか一項に記載の電気光学装置。 8. The liquid crystal layer according to claim 1, wherein a liquid crystal layer is disposed between the first pixel electrode and a counter substrate disposed so as to face the first pixel electrode. The electro-optical device described. 請求項1乃至8に記載の電気光学装置を備えた投射型表示装置であって、
前記電気光学装置に照射される照明光を出射する光源部と、前記電気光学装置により変調された光を投射する投射光学系と、を有していることを特徴とする投射型表示装置。
A projection display device comprising the electro-optical device according to claim 1,
A projection-type display device comprising: a light source unit that emits illumination light applied to the electro-optical device; and a projection optical system that projects light modulated by the electro-optical device.
請求項1乃至8に記載の電気光学装置を備えたことを特徴とする電子機器。   An electronic apparatus comprising the electro-optical device according to claim 1.
JP2011062521A 2011-03-22 2011-03-22 Electro-optical device, projection display device, and electronic apparatus Expired - Fee Related JP5982094B2 (en)

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