JP2012195602A5 - - Google Patents
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- JP2012195602A5 JP2012195602A5 JP2012124360A JP2012124360A JP2012195602A5 JP 2012195602 A5 JP2012195602 A5 JP 2012195602A5 JP 2012124360 A JP2012124360 A JP 2012124360A JP 2012124360 A JP2012124360 A JP 2012124360A JP 2012195602 A5 JP2012195602 A5 JP 2012195602A5
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実施形態によれば、凹凸を有する第1面と、前記第1面とは反対側の第2面と、を有する第1導電形の第1半導体層と、前記第1半導体層の前記第2面の側に設けられた第2導電形の第2半導体層と、前記第1半導体層の前記第2面のうちの第1領域と、前記第2半導体層と、の間に設けられ、発光光を放出する発光層と、前記第1半導体層の前記第2面のうちの、前記第1領域とは異なる第2領域において前記第1半導体層と接する第1電極と、前記第2半導体層の前記発光層とは反対側で前記第2半導体層と接する第2電極と、 前記第2半導体層の前記発光層とは反対側に設けられ前記第1電極と導通する支持基板と、前記第1電極と前記発光層との間、前記第1電極と前記第2半導体層との間、前記第1電極と前記第2電極との間、及び、前記第2電極と前記支持基板との間に設けられた絶縁層と、前記支持基板と前記第1電極との間、及び、前記絶縁層と前記支持基板との間に設けられた金属部と、前記第1電極と前記金属部との間に設けられ、前記第1電極と前記金属部とを接合する中間金属層と、を備えたことを特徴とする半導体発光素子が提供される。 According to the embodiment, a first semiconductor layer of a first conductivity type having a first surface having irregularities and a second surface opposite to the first surface, and the second of the first semiconductor layer. A light emitting element provided between a second semiconductor layer of a second conductivity type provided on the surface side, a first region of the second surface of the first semiconductor layer, and the second semiconductor layer; A light emitting layer that emits light; a first electrode that contacts the first semiconductor layer in a second region of the second surface of the first semiconductor layer different from the first region; and the second semiconductor layer A second electrode in contact with the second semiconductor layer on a side opposite to the light emitting layer, a support substrate provided on a side opposite to the light emitting layer of the second semiconductor layer and electrically connected to the first electrode, Between one electrode and the light emitting layer, between the first electrode and the second semiconductor layer, between the first electrode and the second electrode, and And an insulating layer provided between the second electrode and the support substrate, a metal provided between the support substrate and the first electrode, and between the insulating layer and the support substrate. And an intermediate metal layer that is provided between the first electrode and the metal part and joins the first electrode and the metal part. .
積層構造体100の第2主面100bにおける凹部100tには第1電極50が設けられている。第1電極50は積層構造体100の外側に延びて一部が露出している。この露出した部分にパッド65が設けられている。
A
そして、引き出し部を被覆している誘電体45の一部を除去し、その領域にパッド65を形成する。パッド65としては、例えばTi/Pt/Auの積層膜が用いられる。パッド65の膜厚は、例えば800nmである。このパッド65にはボンディングワイヤが接続される。ボンディング特性を向上させるため、パッド65の表面に例えばめっきによってAuを厚く(例えば10μm)形成することが望ましい。
Then, to remove a portion of the dielectric 45 covering the lead portions to form a pad 6 5 in the region. The pad 6 5, for example, a stacked film of Ti / Pt / Au is used. The film thickness of the
Claims (13)
前記第1半導体層の前記第2面の側に設けられた第2導電形の第2半導体層と、
前記第1半導体層の前記第2面のうちの第1領域と、前記第2半導体層と、の間に設けられ、発光光を放出する発光層と、
前記第1半導体層の前記第2面のうちの、前記第1領域とは異なる第2領域において前記第1半導体層と接する第1電極と、
前記第2半導体層の前記発光層とは反対側で前記第2半導体層と接する第2電極と、
前記第2半導体層の前記発光層とは反対側に設けられ前記第1電極と導通する支持基板と、
前記第1電極と前記発光層との間、前記第1電極と前記第2半導体層との間、前記第1電極と前記第2電極との間、及び、前記第2電極と前記支持基板との間に設けられた絶縁層と、
前記支持基板と前記第1電極との間、及び、前記絶縁層と前記支持基板との間に設けられた金属部と、
前記第1電極と前記金属部との間に設けられ、前記第1電極と前記金属部とを接合する中間金属層と、
を備えたことを特徴とする半導体発光素子。 A first semiconductor layer of a first conductivity type having a first surface having irregularities and a second surface opposite to the first surface;
A second semiconductor layer of a second conductivity type provided on the second surface side of the first semiconductor layer;
Said first region of said second surface of the first semiconductor layer, and said second semiconductor layer, provided between a light emitting layer emitting light emission light,
A first electrode in contact with the first semiconductor layer in a second region different from the first region of the second surface of the first semiconductor layer;
A second electrode that Sessu and the second semiconductor layer on the opposite side to the light emitting layer of the second semiconductor layer,
A support substrate provided on a side opposite to the light emitting layer of the second semiconductor layer and electrically connected to the first electrode;
Between the first electrode and the light emitting layer, between the first electrode and the second semiconductor layer, between the first electrode and the second electrode, and between the second electrode and the support substrate, An insulating layer provided between
A metal part provided between the support substrate and the first electrode, and between the insulating layer and the support substrate;
An intermediate metal layer that is provided between the first electrode and the metal part and joins the first electrode and the metal part;
A semiconductor light emitting device comprising:
前記第1電極は、前記凹部の底面において前記第1半導体層と接することを特徴とする請求項1〜10のいずれか1つに記載の半導体発光素子。 The first semiconductor layer has a recess provided in the second surface,
The semiconductor light emitting element according to claim 1, wherein the first electrode is in contact with the first semiconductor layer at a bottom surface of the recess.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2012124360A JP5740350B2 (en) | 2012-05-31 | 2012-05-31 | Semiconductor light emitting device |
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JP2012124360A JP5740350B2 (en) | 2012-05-31 | 2012-05-31 | Semiconductor light emitting device |
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JP2011055859A Division JP5050109B2 (en) | 2011-03-14 | 2011-03-14 | Semiconductor light emitting device |
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JP2014076811A Division JP5788046B2 (en) | 2014-04-03 | 2014-04-03 | Semiconductor light emitting device |
Publications (3)
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JP2012195602A JP2012195602A (en) | 2012-10-11 |
JP2012195602A5 true JP2012195602A5 (en) | 2014-05-22 |
JP5740350B2 JP5740350B2 (en) | 2015-06-24 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6011244B2 (en) * | 2012-10-24 | 2016-10-19 | 日亜化学工業株式会社 | Semiconductor light emitting device |
JP6024432B2 (en) * | 2012-12-10 | 2016-11-16 | 日亜化学工業株式会社 | Semiconductor light emitting device |
JP6159130B2 (en) * | 2013-04-12 | 2017-07-05 | スタンレー電気株式会社 | Semiconductor light emitting device |
KR102181429B1 (en) * | 2014-06-11 | 2020-11-23 | 엘지이노텍 주식회사 | Light emitting device and lighting system |
JP2017005191A (en) * | 2015-06-15 | 2017-01-05 | 株式会社東芝 | Semiconductor light-emitting device |
US10263150B2 (en) | 2016-05-10 | 2019-04-16 | Rohm Co., Ltd. | Semiconductor light emitting device capable of increasing luminous efficiency under a low applied current |
JP7324395B2 (en) * | 2018-09-27 | 2023-08-10 | 日亜化学工業株式会社 | Light emitting device and manufacturing method thereof |
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JP4122785B2 (en) * | 2002-01-30 | 2008-07-23 | 日亜化学工業株式会社 | Light emitting element |
DE102008032318A1 (en) * | 2008-03-31 | 2009-10-01 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor chip and method for producing such |
DE102008030584A1 (en) * | 2008-06-27 | 2009-12-31 | Osram Opto Semiconductors Gmbh | Method for producing an optoelectronic component and optoelectronic component |
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