JP2012182353A - Curved surface substrate and method for manufacturing the same - Google Patents
Curved surface substrate and method for manufacturing the same Download PDFInfo
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- JP2012182353A JP2012182353A JP2011044961A JP2011044961A JP2012182353A JP 2012182353 A JP2012182353 A JP 2012182353A JP 2011044961 A JP2011044961 A JP 2011044961A JP 2011044961 A JP2011044961 A JP 2011044961A JP 2012182353 A JP2012182353 A JP 2012182353A
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- 239000000758 substrate Substances 0.000 title claims abstract description 101
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 39
- 239000004020 conductor Substances 0.000 claims abstract description 55
- 238000000465 moulding Methods 0.000 claims abstract description 8
- 229920002430 Fibre-reinforced plastic Polymers 0.000 claims description 39
- 239000011151 fibre-reinforced plastic Substances 0.000 claims description 35
- 239000011347 resin Substances 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 17
- 239000000835 fiber Substances 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 11
- 239000011162 core material Substances 0.000 claims description 8
- 239000004643 cyanate ester Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 238000005470 impregnation Methods 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000003754 machining Methods 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract 2
- 230000001788 irregular Effects 0.000 abstract 1
- 239000006261 foam material Substances 0.000 description 5
- 238000005498 polishing Methods 0.000 description 4
- 239000000565 sealant Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002990 reinforced plastic Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
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Abstract
Description
本発明は、導体パターンと誘電体からなり、たとえば、表面形状が球体あるいは回転楕円体のような曲面形状基板、および曲面形状基板の製造方法に関する。 The present invention relates to a curved substrate having a conductor pattern and a dielectric, and has a surface shape such as a sphere or a spheroid, and a method of manufacturing the curved substrate.
導体パターンと誘電体からなる基板として、プリント配線板が知られている。プリント配線板は、平面形状であり、その導体パターン(銅配線)は、感光性レジストを用いた露光・現像法によって形成するのが一般的である。一方で、レドーム、アンテナリフレクタ、レーダ装置などの用途では、表面形状が球体あるいは回転楕円体のような曲面形状基板への要求があり、曲面形状基板を実現するための様々な方法が従来から知られている。 A printed wiring board is known as a substrate made of a conductor pattern and a dielectric. The printed wiring board has a planar shape, and the conductor pattern (copper wiring) is generally formed by an exposure / development method using a photosensitive resist. On the other hand, for applications such as radomes, antenna reflectors, and radar devices, there is a need for curved substrates such as spheres or spheroids, and various methods for realizing curved substrates have been known. It has been.
たとえば、曲面形状基板の従来の製造方法としては、以下のようなものが知られている(例えば、特許文献1参照)。
(方法1)平面基板と同様に全面に導体を形成した後、スポット的に露光する方法
(方法2)導体パターンを形成した平面基板を曲面化加工する方法
(方法3)導体パターンを形成した平面基板を分割し、タイル状に張り合わせて全体として曲面形状を形成する方法
(方法4)全面に導体を形成した後、機械加工により導体を削る方法
For example, as a conventional method for manufacturing a curved substrate, the following is known (for example, see Patent Document 1).
(Method 1) Method of spotting exposure after forming a conductor on the entire surface in the same manner as a flat substrate (Method 2) Method of curving a flat substrate on which a conductor pattern is formed (Method 3) Plane on which a conductor pattern is formed Method of dividing a substrate and pasting it into tiles to form a curved surface as a whole (Method 4) Method of forming a conductor on the entire surface and then cutting the conductor by machining
しかしながら、従来技術には、以下のような課題がある。
方法1の露光法は、高精度のパターンを形成しようとした場合には、露光ヘッドをロボットアーム等で3次元的に制御する必要がある。したがって、大型の曲面に対応するためには、大規模な露光装置が必要となる。また、スポット的に何回も露光するため、生産性に劣る。
However, the prior art has the following problems.
In the exposure method of Method 1, when it is intended to form a highly accurate pattern, it is necessary to control the exposure head three-dimensionally with a robot arm or the like. Therefore, in order to cope with a large curved surface, a large-scale exposure apparatus is required. Moreover, since it exposes many times like a spot, it is inferior to productivity.
方法2の曲面化加工法は、平面を曲げるため、球面の曲率が大きくなるとシワやズレが生じ、高精度の曲面パターンが形成できない。同様に、方法3の平面基板を張り合わせて擬似的に曲面を実現する方法も、厳密には曲面ではないため、張り合わせ部で隙間やズレが生じる。 Since the curved surface processing method of method 2 bends the plane, if the curvature of the spherical surface increases, wrinkles and displacement occur, and a highly accurate curved surface pattern cannot be formed. Similarly, in the method 3 in which the curved substrates are pseudo-realized by bonding the flat substrates, the gaps and deviations are generated in the bonded portions because they are not strictly curved surfaces.
さらに、方法4の機械加工法は、既存の機械加工設備で製造でき、かつズレ等も生じないが、1つ1つ機械加工する必要があり、方法1の露光法と同様に、生産性に劣る。すなわち、方法1〜方法4による従来技術では、パターン精度と生産性を両立できないという課題があった。 Furthermore, the machining method of method 4 can be manufactured with existing machining equipment and does not cause misalignment or the like. However, it is necessary to perform machining one by one, and as with the exposure method of method 1, productivity is improved. Inferior. In other words, the conventional techniques according to the methods 1 to 4 have a problem that the pattern accuracy and the productivity cannot be compatible.
本発明は、前記のような課題を解決するためになされたものであり、パターン精度の向上と生産性の向上を両立することのできる曲面形状基板および曲面形状基板の製造方法を得ることを目的とする。 The present invention has been made to solve the above-described problems, and an object thereof is to obtain a curved substrate and a method of manufacturing the curved substrate that can achieve both improvement in pattern accuracy and improvement in productivity. And
本発明に係る曲面形状基板は、第1表面および第2表面を有した球面形状をなし、第1表面および第2表面の少なくとも一方の面に凹凸部が形成された誘電体と、誘電体に形成された凹部に設けられた導体とを備えるものである。 A curved substrate according to the present invention has a spherical shape having a first surface and a second surface, a dielectric having an uneven portion formed on at least one of the first surface and the second surface, and a dielectric And a conductor provided in the formed recess.
また、本発明に係る曲面形状基板の製造方法は、第1表面および第2表面を有した球面形状をなし、第1表面および第2表面の少なくとも一方の面に凹凸部が形成された誘電体と、誘電体に形成された凹部に設けられた導体とを備えた曲面形状基板の製造方法であって、曲面形状の成形型の表面に凹凸を形成する工程と、成形型を用いて第1表面および第2表面の少なくとも一方の面に凹凸部が形成された誘電体を形成する工程と、誘電体に形成された凹部に導体を形成する工程とを備えるものである。 In addition, the method of manufacturing a curved substrate according to the present invention includes a dielectric having a spherical shape having a first surface and a second surface, and an uneven portion formed on at least one of the first surface and the second surface. And a method of manufacturing a curved substrate having a conductor provided in a concave portion formed in a dielectric, wherein a step of forming irregularities on the surface of the curved mold is first performed using the mold. The method includes a step of forming a dielectric having a concavo-convex portion formed on at least one of the surface and the second surface, and a step of forming a conductor in a recess formed in the dielectric.
本発明に係る曲面形状基板および曲面形状基板の製造方法によれば、曲面形状の成形型を用いて、凹凸のある誘電体を形成し、誘電体に形成された凹部に導体を形成することで曲面形状基板を製造しており、時間を必要とする工程を機械加工による成形型の製造工程だけに限定し、曲面形状基板の製造工程に要する時間を短縮することにより、パターン精度の向上と生産性の向上を両立することのできる曲面形状基板および曲面形状基板の製造方法を得ることができる。 According to the curved substrate and the method of manufacturing a curved substrate according to the present invention, by using a curved mold, an uneven dielectric is formed, and a conductor is formed in the concave formed in the dielectric. We manufacture curved substrates and limit the time-consuming process to the manufacturing process of molds by machining, shortening the time required for the manufacturing process of curved substrates, improving pattern accuracy and producing It is possible to obtain a curved substrate and a method of manufacturing the curved substrate that can achieve both improvement in performance.
以下、本発明の曲面形状基板および曲面形状基板の製造方法の好適な実施の形態につき図面を用いて説明する。 Hereinafter, preferred embodiments of a curved substrate and a method of manufacturing a curved substrate of the present invention will be described with reference to the drawings.
実施の形態1.
図1は、本発明の実施の形態1による曲面形状基板を示す断面図である。図1に示す曲面形状基板は、たとえば、表面形状が球体あるいは回転楕円体のような曲面形状の誘電体1および導体パターン2から構成されており、誘電体1に形成された凹部に導体パターン2が形成されている。図1(a)〜図1(c)に示すように、導体パターン2は、誘電体1の内側(第1表面に相当)か外側(第2表面に相当)のいずれか一方、もしくは内側および外側の両方に形成されていてもよい。
Embodiment 1 FIG.
FIG. 1 is a cross-sectional view showing a curved substrate according to Embodiment 1 of the present invention. The curved substrate shown in FIG. 1 is composed of, for example, a dielectric 1 having a curved surface such as a sphere or a spheroid and a conductor pattern 2, and a conductor pattern 2 is formed in a recess formed in the dielectric 1. Is formed. As shown in FIGS. 1A to 1C, the conductor pattern 2 is formed either on the inner side (corresponding to the first surface) or the outer side (corresponding to the second surface) of the dielectric 1, or on the inner side and It may be formed on both outsides.
図2は、本発明の実施の形態1による曲面形状基板を示す断面図である。簡便に説明するため、これ以降の説明においては、図2に示すように、曲面の断面を平面的な断面で擬似的に表現することとする。 FIG. 2 is a cross-sectional view showing a curved substrate according to Embodiment 1 of the present invention. For the sake of simple explanation, in the following explanation, as shown in FIG. 2, the section of the curved surface is expressed in a pseudo manner by a planar section.
図3A〜図3Gは、本発明の実施の形態1による曲面形状基板の製造プロセスを示す断面図である。まず、図3Aに示すように、曲面形状の成形型3を準備する。成形型3の材質は、SUSやアルミなどの金属、あるいは石膏などが使用でき、好ましくは、重量の観点から、アルミ製が最適である。 3A to 3G are cross-sectional views showing a manufacturing process of the curved substrate according to Embodiment 1 of the present invention. First, as shown in FIG. 3A, a curved mold 3 is prepared. The material of the mold 3 can be a metal such as SUS or aluminum, or gypsum. Preferably, aluminum is optimal from the viewpoint of weight.
次に、図3Bに示すように、曲面形状の成形型3に溝4を形成する。後述するが、溝4の形成されていない部分が、後々、誘電体1に形成された凹部となり、導体パターン2が形成される部分となる。また、溝4の深さは、0.05mm以上0.3mm未満が好ましい。 Next, as shown in FIG. 3B, grooves 4 are formed in the curved mold 3. As will be described later, a portion where the groove 4 is not formed becomes a concave portion formed in the dielectric 1 later and becomes a portion where the conductor pattern 2 is formed. The depth of the groove 4 is preferably 0.05 mm or more and less than 0.3 mm.
この理由は、溝4の深さが0.05mm未満の場合には、研磨時に、導体パターンが研磨されてしまい、逆に、溝4の深さが0.3mm以上の場合には、曲面形状の曲率によっては、成形型3から製品を脱型したときに、溝4部の誘電体1が成形型3に残り、脱落してしまうためである。 The reason for this is that if the depth of the groove 4 is less than 0.05 mm, the conductor pattern is polished at the time of polishing. Conversely, if the depth of the groove 4 is 0.3 mm or more, the curved surface shape This is because, when the product is removed from the mold 3, the dielectric 1 in the groove 4 portion remains in the mold 3 and falls off depending on the curvature of.
さらに、溝4を形成した後に、成形型3は、離型性のあるフッ素樹脂によりコーティングすることが好ましい。これは、成形型3から製品をより脱型し易くするためである。 Furthermore, after forming the groove | channel 4, it is preferable to coat the shaping | molding die 3 with the fluororesin which has mold release property. This is to make it easier to remove the product from the mold 3.
次に、図3Cに示すように、溝4を形成した曲面形状の成形型3を用いて、誘電体1を形成する。ここで、誘電体1は、強度、剛性の観点から、繊維5と樹脂からなる繊維強化プラスチックとするのが好ましい。 Next, as shown in FIG. 3C, the dielectric 1 is formed using the curved mold 3 in which the grooves 4 are formed. Here, the dielectric 1 is preferably a fiber reinforced plastic made of fiber 5 and resin from the viewpoint of strength and rigidity.
また、繊維強化プラスチック1に用いる繊維5は、絶縁性の繊維5であれば、特に限定されるものではない。ただし、レドーム等に適用する場合には、電波透過性の観点から、比誘電率、誘電正接の小さな石英繊維が好ましい。また、繊維5は、平織りクロスが好ましく、さらに好ましくは、曲面へ賦型したときに(すなわち、成形型3で曲面状にしたときに)、伸びてシワにならない程度に、薄く、かつ隙間のある繊維クロスが好ましい。 Moreover, if the fiber 5 used for the fiber reinforced plastic 1 is the insulating fiber 5, it will not specifically limit. However, when applied to a radome or the like, quartz fibers having a small relative dielectric constant and dielectric loss tangent are preferable from the viewpoint of radio wave transmission. Further, the fiber 5 is preferably a plain weave cloth, and more preferably, when the fiber 5 is formed into a curved surface (that is, when it is formed into a curved surface with the mold 3), the fiber 5 is thin and does not have wrinkles. Certain fiber cloths are preferred.
繊維強化プラスチック1に用いる樹脂も、特に限定されるものではない。ただし、電波透過性と耐熱性を兼ね備え、硬化前の樹脂が常温で低粘度の液体であるビスE型のシアネートエステル樹脂が好ましい。 The resin used for the fiber reinforced plastic 1 is not particularly limited. However, a bis-E type cyanate ester resin, which has both radio wave permeability and heat resistance and is a low-viscosity liquid at room temperature, is preferable.
まず、溝4を形成した曲面形状の成形型3の上に、石英繊維5を配置し、その上に、ピールプライ6、フローメディア7を重ね、全体をバギングフィルム8で覆う。その後、シーラント9でシールされたチューブ10を介して、真空ポンプ(図示せず)でバギングフィルム8内を減圧する。次に、シーラント9でシールされたチューブ10を介して、樹脂タンク(図示せず)から低粘度の未硬化の液状樹脂を供給する。 First, a quartz fiber 5 is placed on a curved mold 3 in which a groove 4 is formed, a peel ply 6 and a flow media 7 are stacked thereon, and the whole is covered with a bagging film 8. Thereafter, the inside of the bagging film 8 is decompressed by a vacuum pump (not shown) through the tube 10 sealed with the sealant 9. Next, an uncured liquid resin having a low viscosity is supplied from a resin tank (not shown) through a tube 10 sealed with a sealant 9.
このとき、樹脂は、繊維5よりも目の粗いフローメディア7を優先的に通り、面内に拡散し、送られて、面外にしみこみ、繊維5に含浸する。繊維5の全体に樹脂が含浸した後、樹脂供給口および真空排気口をバルブ等で閉じて、バギングフィルム8内を減圧したまま、オーブンに入れて硬化する。樹脂として、ビスE型のシアネートエステル樹脂を用いた場合には、180°Cで2時間保持する。 At this time, the resin preferentially passes through the flow media 7 having a coarser mesh than the fibers 5, diffuses in the plane, is sent, soaks out of the plane, and impregnates the fibers 5. After the entire fiber 5 is impregnated with the resin, the resin supply port and the vacuum exhaust port are closed with a valve or the like, and the bagging film 8 is put in an oven while being depressurized and cured. When a bis-E type cyanate ester resin is used as the resin, the resin is held at 180 ° C. for 2 hours.
次に、成形型3から脱型し、図3Dに示すような、繊維強化プラスチック1を得る。なお、繊維強化プラスチック1上の、ピールプライ6、フローメディア7、バギングフィルム8は、繊維強化プラスチック1とピールプライ6の界面で引き剥がすことができる。 Next, the mold is removed from the mold 3 to obtain a fiber reinforced plastic 1 as shown in FIG. 3D. The peel ply 6, the flow media 7, and the bagging film 8 on the fiber reinforced plastic 1 can be peeled off at the interface between the fiber reinforced plastic 1 and the peel ply 6.
誘電体1(繊維強化プラスチック1)の成形方法は、特に限定されるものではない。ただし、このような、真空引きにより樹脂を含浸して繊維強化プラスチック1を製造する方法である、いわゆるVaRTM成形法(Vacuum Assisted Resin Transfer Molding)で成形することにより、溝4に樹脂が供給されるという利点がある。 The molding method of the dielectric 1 (fiber reinforced plastic 1) is not particularly limited. However, the resin is supplied to the groove 4 by molding by a so-called VaRTM molding method (Vacuum Assisted Resin Transfer Molding), which is a method of manufacturing the fiber reinforced plastic 1 by impregnating the resin by vacuum drawing. There is an advantage.
また、成形型3を分割して繊維強化プラスチック1を成形することで、曲面形状の曲率が大きい場合でも、繊維強化プラスチック1を脱型のために分割する必要がなく、しかも大型の繊維強化プラスチック1を一体成形できる。 Further, by dividing the mold 3 to form the fiber reinforced plastic 1, even when the curvature of the curved surface is large, it is not necessary to divide the fiber reinforced plastic 1 for demolding, and a large fiber reinforced plastic. 1 can be integrally formed.
次に、図3Eに示すように、繊維強化プラスチック1の曲率に等しいスキージ11を用いて、図3Fに示すように、繊維強化プラスチック1の凹凸面に導電性ペースト13を塗工する。スキージ11は、金属製の枝とゴム12の板を張り合わせたもので構成されており、繊維強化プラスチック1には、ゴム12の部分が接触するようにする。ここで、導電性ペースト13としては、無加圧で導電性が発現する低温乾燥型銀ペーストが好ましい。また、導電性ペースト13は、塗工後、120°Cで10分間、オーブンで乾燥する。 Next, as shown in FIG. 3E, using a squeegee 11 equal to the curvature of the fiber reinforced plastic 1, the conductive paste 13 is applied to the uneven surface of the fiber reinforced plastic 1 as shown in FIG. 3F. The squeegee 11 is composed of a metal branch and a rubber 12 plate bonded together so that the rubber reinforced plastic 1 is in contact with the rubber 12 portion. Here, the conductive paste 13 is preferably a low-temperature dry type silver paste that develops conductivity without pressure. The conductive paste 13 is dried in an oven at 120 ° C. for 10 minutes after coating.
次に、図3Gに示すように、サンドペーパー、もしくは繊維強化プラスチック1と同じ曲率を有する冶具で、凸部の導電性ペースト13を研磨により除去する。このとき、凸部以外の導電性ペースト13が削れることで繊維強化プラスチック1が露出することがないようにする必要がある。 Next, as shown in FIG. 3G, the conductive paste 13 on the convex portion is removed by polishing with a sandpaper or a jig having the same curvature as that of the fiber reinforced plastic 1. At this time, it is necessary to prevent the fiber reinforced plastic 1 from being exposed by cutting away the conductive paste 13 other than the convex portions.
このように、図3A〜図3Gの一連処理により、誘電体1に形成した凹部に導体パターン2を形成することができる。なお、図2および図3A〜図3Gでは、図1(a)のように、誘電体1の内側(第1表面)に導体パターン2を設けた曲面形状基板について説明した。これに対して、溝4を設ける面が逆(第2表面)になるような曲面形状の成形型3を用いることで、同様の方法により、図1(b)のように、誘電体1の外側(第2表面)に導体パターン2を設けた曲面形状基板を製造することも可能である。 As described above, the conductor pattern 2 can be formed in the concave portion formed in the dielectric 1 by the series of processes of FIGS. 3A to 3G. 2 and 3A to 3G, the curved substrate having the conductor pattern 2 provided on the inner side (first surface) of the dielectric 1 has been described as shown in FIG. On the other hand, by using the curved mold 3 in which the surface on which the groove 4 is provided is reversed (second surface), as shown in FIG. It is also possible to manufacture a curved substrate having the conductor pattern 2 on the outer side (second surface).
さらに、図1(a)と図1(b)の2手順を行うことで、図1(c)のように、誘電体1の内側と外側に導体パターン2を設けた曲面形状基板を製造することも可能である。 Further, by performing the two steps of FIG. 1A and FIG. 1B, a curved substrate having conductor patterns 2 provided on the inside and outside of the dielectric 1 is manufactured as shown in FIG. 1C. It is also possible.
以上のように、実施の形態1によれば、表面の少なくとも片側に凹凸を形成した曲面形状の成形型を用いて、凹凸のある誘電体を形成し、誘電体に形成された凹部に導体を形成することで曲面形状基板を製造している。ここで、時間をかけて機械加工するのは、成形型だけでよい。したがって、このような製造方法によれば、導体パターンを有する曲面形状基板を、複数、生産性よく製造することができる。 As described above, according to the first embodiment, a dielectric having irregularities is formed using a curved mold having irregularities formed on at least one side of the surface, and a conductor is provided in the concave formed in the dielectric. The curved substrate is manufactured by forming. Here, it is only necessary to machine the time-consuming machine. Therefore, according to such a manufacturing method, it is possible to manufacture a plurality of curved substrate having a conductor pattern with high productivity.
さらに、導体パターンの精度は、成形型に形成した凹凸の精度に依存し、成形型の凹凸は、機械加工により形成される。このため、高精度の導体パターンが形成できる。 Furthermore, the accuracy of the conductor pattern depends on the accuracy of the unevenness formed on the mold, and the unevenness of the mold is formed by machining. For this reason, a highly accurate conductor pattern can be formed.
さらに、凹凸のある誘電体をVaRTM法により形成している。これにより、凸部に樹脂をボイドなく充填することができ、かつ成形型を分割することで、比較的大きな曲面形状基板を一体成形できる。 Furthermore, a dielectric with unevenness is formed by the VaRTM method. Accordingly, the resin can be filled in the convex portions without voids, and a relatively large curved substrate can be integrally formed by dividing the mold.
実施の形態2.
本実施の形態2では、先の実施の形態1とは異なる工程で、誘電体1に導体パターン2を形成する方法について説明する。
Embodiment 2. FIG.
In the second embodiment, a method for forming the conductor pattern 2 on the dielectric 1 in a process different from that of the first embodiment will be described.
先の実施の形態1では、凹凸のある繊維強化プラスチック1を形成した後、導電性ペースト13を塗工し、その後、研磨することで導体パターン2を形成した。これに対して、本実施の形態2では、凹凸のある繊維強化プラスチック1に銅めっき皮膜14を形成した後、研磨することで、導体パターン2を形成する。 In previous Embodiment 1, after forming the fiber reinforced plastic 1 with an unevenness | corrugation, the conductive pattern 13 was formed by apply | coating the conductive paste 13 and grind | polishing after that. On the other hand, in this Embodiment 2, after forming the copper plating film 14 in the fiber reinforced plastic 1 with an unevenness | corrugation, the conductor pattern 2 is formed by grinding | polishing.
図4A、図4Bは、本発明の実施の形態2による曲面形状基板の製造プロセスを示す断面図である。まず、図4Aに示すように、凹凸のある繊維強化プラスチック1に銅めっき皮膜14を形成する。ここで、繊維強化プラスチック1と銅めっき皮膜14との密着性を向上させるために、繊維強化プラスチック1に前処理を行うことが好ましい。前処理としては、サンドブラストもしくは過マンガン酸塩で粗化処理を行った後、無電界ニッケルめっき処理を行うことが好ましい。 4A and 4B are cross-sectional views showing a process for manufacturing a curved substrate according to Embodiment 2 of the present invention. First, as shown to FIG. 4A, the copper plating film 14 is formed in the fiber reinforced plastic 1 with an unevenness | corrugation. Here, in order to improve the adhesion between the fiber reinforced plastic 1 and the copper plating film 14, it is preferable to pre-treat the fiber reinforced plastic 1. As pretreatment, it is preferable to perform electroless nickel plating after roughening with sandblast or permanganate.
次に、図4Bに示すように、繊維強化プラスチック1の凸部上に形成された銅めっき皮膜14を研磨することで、繊維強化プラスチック1の凹部のみに銅めっき皮膜14による導体パターン2が残るようにする。 Next, as shown in FIG. 4B, the copper plating film 14 formed on the convex portion of the fiber reinforced plastic 1 is polished, so that the conductor pattern 2 made of the copper plating film 14 remains only in the concave portion of the fiber reinforced plastic 1. Like that.
このように、図4A、図4Bの一連処理により、誘電体1に形成した凹部に導体パターン2を形成することができる。なお、本実施の形態2による製造方法によっても、図1の(a)〜(c)に示した3種類の曲面形状基板を製造することが可能である。 As described above, the conductor pattern 2 can be formed in the recess formed in the dielectric 1 by the series of processes shown in FIGS. 4A and 4B. It is possible to manufacture the three types of curved-surface substrates shown in FIGS. 1A to 1C also by the manufacturing method according to the second embodiment.
以上のように、実施の形態2によれば、銅めっき皮膜を用いて誘電体の凹部に導体パターンを形成しており、これによっても、先の実施の形態1と同様の効果を得ることができる。 As described above, according to the second embodiment, the conductor pattern is formed in the concave portion of the dielectric using the copper plating film, and this also provides the same effect as in the first embodiment. it can.
実施の形態3.
先の実施の形態1、2では、曲面形状を有する誘電体1の表面の、少なくとも片側に設けられた凹部に導体パターン2を形成した曲面形状基板およびその製造方法について説明した。これに対して、本発明の実施の形態3では、導体パターン2を誘電体1の内部に設けた曲面形状基板およびその製造方法について説明する。
Embodiment 3 FIG.
In the first and second embodiments, the curved substrate having the conductor pattern 2 formed on the concave portion provided on at least one side of the surface of the dielectric 1 having the curved shape and the manufacturing method thereof have been described. On the other hand, in Embodiment 3 of the present invention, a curved substrate having the conductor pattern 2 provided inside the dielectric 1 and a manufacturing method thereof will be described.
図5は、本発明の実施の形態3による曲面形状基板を示す断面図である。本実施の形態3における曲面形状基板は、図5に示すように、先の実施の形態1および2の製造方法で作製した片面に導体パターン2を有する曲面形状基板について、導体パターン2がある表面に、さらに繊維強化プラスチック1を形成したものである。 FIG. 5 is a cross-sectional view showing a curved substrate according to Embodiment 3 of the present invention. As shown in FIG. 5, the curved substrate in the third embodiment is a surface on which the conductor pattern 2 is provided on the curved substrate having the conductor pattern 2 on one side produced by the manufacturing method of the first and second embodiments. Further, a fiber reinforced plastic 1 is formed.
繊維強化プラスチック1の形成方法としては、特に限定されるものではないが、繊維強化プラスチック1の誘電特性を均一化する方が好ましい。このため、片面に導体パターン2を有する曲面形状基板上に、繊維を賦型してVaRTM成形する方法が好ましい。もしくは、別途、VaRTM成形により作製した繊維強化プラスチックを接着する方法が好ましい。 The method for forming the fiber reinforced plastic 1 is not particularly limited, but it is preferable to make the dielectric properties of the fiber reinforced plastic 1 uniform. For this reason, the method of forming a fiber by molding fibers on a curved substrate having the conductor pattern 2 on one side is preferable. Alternatively, a method of separately bonding fiber reinforced plastic produced by VaRTM molding is preferable.
以上のように、実施の形態3によれば、先の実施の形態1および2の製造方法で作製した曲面形状基板を基本構成とし、導体パターン2がある表面に対してさらに繊維強化プラスチックを形成した構成を備えている。このような曲面形状基板によっても、先の実施の形態1、2と同様の効果を得ることができる。 As described above, according to the third embodiment, the curved substrate formed by the manufacturing method of the first and second embodiments is used as a basic configuration, and the fiber reinforced plastic is further formed on the surface where the conductor pattern 2 is present. It has the structure which did. Even with such a curved substrate, the same effects as those of the first and second embodiments can be obtained.
実施の形態4.
本発明の実施の形態4では、コア材をサンドイッチするように、先の実施の形態3による曲面形状基板を2つ用いた曲面形状基板およびその製造方法について説明する。
Embodiment 4 FIG.
In the fourth embodiment of the present invention, a curved substrate using two curved substrates according to the third embodiment and a manufacturing method thereof will be described so as to sandwich the core material.
図6は、本発明の実施の形態4による曲面形状基板を示す断面図である。図6に示すように、本実施の形態4における曲面形状基板は、内部に導体パターン2を有する曲面形状基板の間に、発泡材15を配置したものである。このように、発泡材15をコア材として、その両面に繊維強化プラスチック1を配置した構造(いわゆる、サンドイッチ構造)とすることで、軽量で、かつ高剛性のレドーム等を形成することができる。 FIG. 6 is a cross-sectional view showing a curved substrate according to Embodiment 4 of the present invention. As shown in FIG. 6, the curved substrate in the fourth embodiment is obtained by disposing a foam material 15 between the curved substrate having the conductor pattern 2 therein. In this way, by using a structure (so-called sandwich structure) in which the foam material 15 is used as a core material and the fiber reinforced plastics 1 are disposed on both surfaces thereof, a light and highly rigid radome or the like can be formed.
この場合、発泡材15の上下に設けられる導体パターン2の位置精度が、レドーム等の電気特性に大きく影響する。そこで、発泡材15の両面に設けられる繊維強化プラスチック1の位置精度を向上させることが重要となる。 In this case, the positional accuracy of the conductor pattern 2 provided above and below the foam material 15 greatly affects the electrical characteristics of the radome and the like. Therefore, it is important to improve the positional accuracy of the fiber reinforced plastic 1 provided on both surfaces of the foam material 15.
図7は、本発明の実施の形態4による曲面形状基板の製造方法の説明図である。本実施の形態7では、2つの曲面形状基板を帽子状に作製し、縁の平面部で位置合わせする方法を採用し、位置精度の向上を図っている。具体的には、図7に示すように、位置決めピン16を用いて、帽子状に作製された2つの曲面形状基板と、その間にサンドイッチされる発泡材15とを一体化することが好ましい。さらに、導体パターン2と位置合わせ穴の関係が対応する必要があるため、凹凸のある繊維強化プラスチック1を形成するための溝4の加工時に、位置合わせ穴も形成することが好ましい。 FIG. 7 is an explanatory diagram of a method of manufacturing a curved substrate according to Embodiment 4 of the present invention. In the seventh embodiment, a method in which two curved substrates are produced in a hat shape and aligned at the flat portion of the edge is employed to improve the positional accuracy. Specifically, as shown in FIG. 7, it is preferable that the positioning pins 16 are used to integrate the two curved-shaped substrates produced in a hat shape and the foam material 15 sandwiched therebetween. Furthermore, since the relationship between the conductor pattern 2 and the alignment hole needs to correspond, it is preferable to form an alignment hole when processing the groove 4 for forming the uneven fiber reinforced plastic 1.
以上のように、実施の形態4によれば、コア材の両面に繊維強化プラスチックを配置した構造を備えたサンドイッチ構成の曲面形状基板を用いることで、軽量で、かつ高剛性のレドーム等を形成することができる。さらに、位置決めピンを用いてサンドイッチ構成を実現することで、コア材の両面に配置される導体パターンの位置決め精度を向上させ、電気特性の劣化を抑制することができる。 As described above, according to the fourth embodiment, a lightweight and high-rigid radome or the like is formed by using a curved substrate having a sandwich structure having a structure in which fiber reinforced plastics are arranged on both surfaces of a core material. can do. Furthermore, by realizing the sandwich configuration using the positioning pins, it is possible to improve the positioning accuracy of the conductor patterns arranged on both surfaces of the core material and to suppress the deterioration of the electrical characteristics.
1 誘電体(繊維強化プラスチック)、2 導体パターン、3 曲面形状の成形型、4 溝、5 繊維、6 ピールプライ、7 フローメディア、8 バギングフィルム、9 シーラント、10 チューブ、11 スキージ、12 ゴム、13 導電性ペースト、14 皮膜(銅めっき皮膜)、15 発泡材、16 位置決めピン。 DESCRIPTION OF SYMBOLS 1 Dielectric (fiber-reinforced plastic), 2 conductor pattern, 3 curved-surface mold, 4 groove, 5 fiber, 6 peel ply, 7 flow media, 8 bagging film, 9 sealant, 10 tube, 11 squeegee, 12 rubber, 13 Conductive paste, 14 film (copper plating film), 15 foam, 16 positioning pin.
Claims (16)
前記誘電体に形成された凹部に設けられた導体と
を備えることを特徴とする曲面形状基板。 A dielectric having a spherical shape having a first surface and a second surface, and having an uneven portion formed on at least one of the first surface and the second surface;
A curved substrate, comprising: a conductor provided in a recess formed in the dielectric.
前記誘電体は、繊維強化プラスチックで構成されている
ことを特徴とする曲面形状基板。 The curved substrate according to claim 1,
The dielectric substrate is made of a fiber reinforced plastic.
前記繊維強化プラスチックは、石英繊維である
ことを特徴とする曲面形状基板。 The curved substrate according to claim 2,
The curved substrate is characterized in that the fiber-reinforced plastic is a quartz fiber.
前記繊維強化プラスチックは、樹脂としてビスE型のシアネートエステル樹脂が適用される
ことを特徴とする曲面形状基板。 The curved substrate according to claim 2 or 3,
The fiber-reinforced plastic is a curved substrate, wherein a bis-E cyanate ester resin is applied as a resin.
前記導体は、前記凹部に導電性ペーストを充填することにより形成される
ことを特徴とする曲面形状基板。 In the curved substrate according to any one of claims 1 to 4,
The curved substrate, wherein the conductor is formed by filling the recess with a conductive paste.
前記導電性ペーストは、低温乾燥型銀ペーストである
ことを特徴とする曲面形状基板。 The curved substrate according to claim 5,
The conductive paste is a low-temperature drying type silver paste.
前記導体は、前記凹部を銅めっきで被覆することにより形成される
ことを特徴とする曲面形状基板。 In the curved substrate according to any one of claims 1 to 4,
The said conductor is formed by coat | covering the said recessed part with copper plating. The curved-surface-shaped board | substrate characterized by the above-mentioned.
前記誘電体に形成された前記凹部は、深さが0.05mm以上0.3mm未満である
ことを特徴とする曲面形状基板。 The curved substrate according to any one of claims 1 to 7,
The concave portion formed in the dielectric has a depth of 0.05 mm or more and less than 0.3 mm.
前記第1誘電体に形成された凹部に設けられた導体と、
前記導体が設けられた前記第1表面の上に形成された第2誘電体と
を備えたことを特徴とする曲面形状基板。 A first dielectric body having a spherical shape having a first surface and a second surface, wherein the first surface has an uneven portion;
A conductor provided in a recess formed in the first dielectric;
And a second dielectric formed on the first surface on which the conductor is provided.
コア材を間に挟むように前記曲面形状基板を2枚有するサンドイッチ構造を備える
ことを特徴とする曲面形状基板。 The curved substrate according to claim 9,
A curved substrate having a sandwich structure having two of the curved substrates so as to sandwich a core material therebetween.
曲面形状の成形型の表面に凹凸を形成する工程と、
前記成形型を用いて前記第1表面および前記第2表面の少なくとも一方の面に前記凹凸部が形成された前記誘電体を形成する工程と、
前記誘電体に形成された凹部に導体を形成する工程と
を備えることを特徴とする曲面形状基板の製造方法。 A spherical shape having a first surface and a second surface is formed, and a dielectric having an uneven portion formed on at least one of the first surface and the second surface, and a recess formed in the dielectric are provided. A method of manufacturing a curved substrate having a conductor,
Forming irregularities on the surface of the curved mold,
Forming the dielectric having the concavo-convex portion formed on at least one of the first surface and the second surface using the mold; and
And a step of forming a conductor in a recess formed in the dielectric.
前記導体を形成する工程は、
前記誘電体に形成された前記凹凸部の上に導電性ペーストを塗工する工程と、
凸部上の前記導電性ペーストを除去する工程と
を備えることを特徴とする曲面形状基板の製造方法。 In the manufacturing method of the curved-surface-shaped board | substrate of Claim 11,
The step of forming the conductor includes
Applying a conductive paste on the concavo-convex portion formed on the dielectric;
And a step of removing the conductive paste on the convex portion.
前記導体を形成する工程は、
前記誘電体に形成された前記凹凸部の上に銅めっきする工程と、
凸部上の前記銅めっきを除去する工程と
を備えることを特徴とする曲面形状基板の製造方法。 In the manufacturing method of the curved-surface-shaped board | substrate of Claim 11,
The step of forming the conductor includes
Copper plating on the irregularities formed in the dielectric;
And a step of removing the copper plating on the convex portion.
前記誘電体を形成する工程は、VaRTM法(真空含浸成形法)が採用される
ことを特徴とする曲面形状基板の製造方法。 The method of manufacturing a curved substrate according to any one of claims 11 to 13,
The process for forming the dielectric material employs a VaRTM method (vacuum impregnation molding method).
曲面形状の成形型の表面に凹凸を形成する工程と、
前記成形型を用いて前記第1表面に前記凹凸部が形成された前記第1誘電体を形成する工程と、
前記第1誘電体に形成された凹部に導体を形成する工程と
前記導体が設けられた前記第1表面の上に第2誘電体を形成する工程と
を備えることを特徴とする曲面形状基板の製造方法。 A first dielectric body having a spherical shape having a first surface and a second surface, wherein an uneven portion is formed on the first surface; a conductor provided in a recess formed in the first dielectric body; A method of manufacturing a curved substrate having a second dielectric formed on the first surface provided with a conductor,
Forming irregularities on the surface of the curved mold,
Forming the first dielectric having the irregularities formed on the first surface using the mold;
A curved substrate, comprising: forming a conductor in a recess formed in the first dielectric; and forming a second dielectric on the first surface provided with the conductor. Production method.
縁の平面部分に位置合わせ穴を有し、前記縁の平面部分と曲面形状から構成される帽子状として、2枚の前記曲面形状基板を個別に作製する工程と、
縁の平面部分に位置合わせ穴を有し、前記縁の平面部分と曲面形状から構成される帽子状として、2枚の前記曲面形状基板の間に挟まれる前記コア材を作製する工程と、
帽子状に作製された1枚目の曲面形状基板、前記コア材、2枚目の曲面形状基板を、位置決めピンを用いて順次積層することで、前記サンドイッチ構造を備えた曲面形状基板を作製する工程と
を備えることを特徴とする曲面形状基板の製造方法。 A method of manufacturing a curved substrate having a sandwich structure having two curved substrates manufactured by the method of manufacturing a curved substrate according to claim 15, with a core material interposed therebetween,
A step of individually producing the two curved-surface-shaped substrates as a hat shape having a positioning hole in the flat surface portion of the edge and comprising the flat surface portion of the edge and the curved surface shape;
A step of producing the core material sandwiched between the two curved-surface-shaped substrates as a hat shape having an alignment hole in the flat-surface portion of the edge and composed of the flat surface portion of the edge and the curved surface shape;
A curved substrate having the sandwich structure is manufactured by sequentially laminating the first curved substrate, the core material, and the second curved substrate, which are formed in a hat shape, using positioning pins. A method of manufacturing a curved substrate, comprising: a step.
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JP2015003469A (en) * | 2013-06-21 | 2015-01-08 | 三菱電機株式会社 | Sandwich structure, floor for elevator and method of producing sandwich structure |
CN106034376A (en) * | 2014-09-18 | 2016-10-19 | 三星电机株式会社 | Printed circuit board and method for manufacturing thereof |
WO2018012203A1 (en) * | 2016-07-15 | 2018-01-18 | 富士フイルム株式会社 | Wiring board production method and wiring board |
WO2018012535A1 (en) * | 2016-07-15 | 2018-01-18 | 富士フイルム株式会社 | Wiring board production method and wiring board |
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